JP2003268549A5 - - Google Patents

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Publication number
JP2003268549A5
JP2003268549A5 JP2002072086A JP2002072086A JP2003268549A5 JP 2003268549 A5 JP2003268549 A5 JP 2003268549A5 JP 2002072086 A JP2002072086 A JP 2002072086A JP 2002072086 A JP2002072086 A JP 2002072086A JP 2003268549 A5 JP2003268549 A5 JP 2003268549A5
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JP
Japan
Prior art keywords
film
plasma atmosphere
forming method
film forming
reactive gas
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JP2002072086A
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English (en)
Japanese (ja)
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JP4062940B2 (ja
JP2003268549A (ja
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Priority claimed from JP2002072086A external-priority patent/JP4062940B2/ja
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Publication of JP2003268549A5 publication Critical patent/JP2003268549A5/ja
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JP2002072086A 2002-03-15 2002-03-15 製膜方法 Expired - Fee Related JP4062940B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2002072086A JP4062940B2 (ja) 2002-03-15 2002-03-15 製膜方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2002072086A JP4062940B2 (ja) 2002-03-15 2002-03-15 製膜方法

Publications (3)

Publication Number Publication Date
JP2003268549A JP2003268549A (ja) 2003-09-25
JP2003268549A5 true JP2003268549A5 (enExample) 2005-09-02
JP4062940B2 JP4062940B2 (ja) 2008-03-19

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JP2002072086A Expired - Fee Related JP4062940B2 (ja) 2002-03-15 2002-03-15 製膜方法

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JP (1) JP4062940B2 (enExample)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101020463B1 (ko) * 2004-09-29 2011-03-08 세키스이가가쿠 고교가부시키가이샤 플라즈마 처리 장치
JP2008031541A (ja) * 2006-07-31 2008-02-14 Tokyo Electron Ltd Cvd成膜方法およびcvd成膜装置
JP2012017478A (ja) * 2010-07-06 2012-01-26 Honjo Metal Co Ltd リチウム積層部材およびその製造方法
CN119265513B (zh) * 2024-09-23 2025-09-09 广东彩龙新材料股份有限公司 一种新能源电池蓄能用镀氧化铝膜及其制备工艺

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