JP2003255516A - Method for manufacturing pellicle - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To industrially easily obtain a pellicle which is below 300 μm in the thickness of a pellicle plate made of synthetic quartz glass and is uniform in an intra-surface transmittance distribution. <P>SOLUTION: This method includes an outside surface side supporting plate pasting process step of pasting an outside surface side supporting plate to a surface on the side, configuring the outside surface of the pellicle, of a synthetic quartz glass plate which is the blank for the pellicle plate, an inside surface side depositing process step of depositing an antireflection film on the surface of the synthetic quartz glass plate on the side opposite to the side pasted to the outside surface side supporting plate, a pellicle frame attaching process step of attaching a pellicle frame to the surface of the synthetic quartz glass plate deposited with the antireflection film on the inside surface side depositing process step, and an outside surface side supporting plate peeling process step of peeling the outside surface side supporting plate from the synthetic quartz glass plate in this order. <P>COPYRIGHT: (C)2003,JPO

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a mask or reticle (hereinafter, both are collectively referred to as a mask) used in a manufacturing process of an integrated circuit, and more particularly to an F ₂ laser (wavelength 15).
7.6 nm) and a method for manufacturing a pellicle mounted on a mask or reticle used in a lithography process for the purpose of preventing foreign matter from adhering.

[0002]

2. Description of the Related Art In a photolithography process used in a process of manufacturing an integrated circuit, a semiconductor wafer coated with a resist material is exposed to form a pattern.
If the mask used at this time has scratches / foreign matter, the scratches / foreign matter is transferred onto the wafer together with the pattern, which may cause a short circuit or disconnection of the circuit.

For this reason, a method of mounting a pellicle on one or both sides of the mask has been adopted to prevent foreign matter on the surface of the mask.

Conventionally, the pellicle has an outer shape as shown in the plan view and side view of FIG. 3, and has a pellicle frame 1 made of aluminum or the like and having an opening of several nm to several μm made of an organic resin such as nitrocellulose or fluororesin. A pellicle film 2 having a thickness attached with an adhesive 3 is used, and the pellicle film 2 is fixed and used so as to cover the pattern on the mask.

In recent years, exposure using light having a wavelength of 220 nm or less has been studied in response to the demands for pattern miniaturization and high density. However, the pellicle using the organic resin film described above has low durability because the organic content of the organic resin film is decomposed when exposure light of a short wavelength is used in order to improve the exposure resolution. Therefore, in a short wavelength exposure system, the use of a pellicle plate made of synthetic quartz glass as a pellicle film has been studied. This synthetic quartz glass is, for example, a substantially silicon oxide obtained by reacting a silicon source and an oxygen source in a gas phase to grow a porous body made of silicon oxide called soot and sintering the porous body. It is a synthetic quartz glass consisting of only. At the same time, it has been studied to form an antireflection film on a synthetic quartz glass pellicle plate in order to improve the transmittance of the short wavelength light.

[0006]

By the way, when the thickness of the pellicle plate 2 varies, the position of the transfer pattern changes because the optical path of the refracted light of the exposure light 4 changes during exposure as shown in FIG. There is a possibility that deviation may occur and good lithography cannot be performed.

As a method of reducing the influence of this thickness variation, the thickness of the pellicle plate may be reduced, but when the thickness is reduced to 300 μm or less, the following problems are remarkable.

First, there is a problem of variations in light transmittance due to variations in the thickness of the antireflection film. That is, in the pellicle plate made of synthetic quartz glass, it is desirable to form an antireflection film on both surfaces of the pellicle plate in order to reduce a decrease in transmittance due to surface reflection. During the film formation, the work holder is used to hold the synthetic quartz glass plate, but if the synthetic quartz glass plate is thin, the substrate is bent due to its own weight. The variation in the in-plane transmittance of the pellicle plate is required to be ± 0.2%. However, when the antireflection film is formed in a flexed state, the film thickness varies, which in turn results in the pellicle plate. There is a possibility that the variation in the transmittance of 1 becomes large.

Further, a decrease in yield due to breakage of the pellicle plate is also a big problem. That is, the synthetic quartz glass plate that is the base plate of the pellicle plate has many opportunities for handling before being formed as a pellicle. For example, load and unload to the polishing machine in the polishing process, cleaning to remove the polishing agent etc. after polishing, measurement of flatness and parallelism of the base plate, load and unload to the film forming equipment. Loading, cleaning after film formation, cutting to have the same size as the pellicle frame in the state of being attached to the pellicle frame or the state before being attached, adhesion of the pellicle frame, etc. in some cases. In these steps, if the synthetic quartz glass plate is thin, it may be damaged and the product yield may be reduced.

That is, an object of the present invention is to provide a method of manufacturing a pellicle provided with a thin pellicle plate, which is capable of obtaining a pellicle with suppressed variations in light transmittance with high yield.

[0011]

SUMMARY OF THE INVENTION The present invention is a method for manufacturing a pellicle provided with a pellicle frame and a pellicle plate made of synthetic quartz glass attached so as to cover an opening of the pellicle frame. The outer side support plate attaching step of attaching the outer side support plate to the outer side surface of the pellicle of the synthetic quartz glass plate, which is the base plate, is opposite to the side attached to the outer side support plate. -Side film forming step of forming an antireflection film on the surface of the synthetic quartz glass plate on the side, and mounting of a pellicle frame on the surface of the synthetic quartz glass plate on which the antireflection film has been formed in the film forming step on the inner surface side There is provided a method for manufacturing a pellicle, comprising: a step, and an outer surface side support plate peeling step of peeling the outer surface side support plate from a synthetic quartz glass plate in this order. As a result, even if the pellicle plate is thin, it is possible to manufacture a pellicle in which the variation in the transmittance due to the variation in the thickness of the antireflection film is suppressed with a good yield.

In particular, after the step of peeling the outer surface side support plate, there is further included a step of forming an antireflection film on the surface of the synthetic quartz glass plate opposite to the side on which the pellicle frame is attached, or the outer surface side support is carried out. It is preferable to further include a step of forming an antireflection film in advance on the surface of the synthetic quartz glass plate on the side to which the outer surface side support plate is attached, before the plate attaching step. As a result, it is possible to form the antireflection film on both surfaces of the synthetic quartz glass plate that will be the base plate of the pellicle plate with good yield.

Before the step of attaching the outer surface side support plate, the method further includes the step of previously polishing the surface of the synthetic quartz glass plate on the side to which the outer side support plate is attached, and the step of attaching the outer surface side support plate, Between the inner surface side film forming step and the step of polishing the surface of the synthetic quartz glass plate opposite to the side adhered to the outer surface side support plate, or before the outer surface side support plate sticking step It is preferable to further include a step of previously polishing both surfaces of the synthetic quartz glass plate. According to the former method, even if the pellicle plate is thin, cracks and the like during polishing can be suppressed. According to the latter method, the pellicle plate can be processed by a known double-sided polishing machine, and a pellicle plate with high parallelism can be easily obtained.

[0014]

BEST MODE FOR CARRYING OUT THE INVENTION The method for producing a pellicle of the present invention is
An outer support plate attaching step of attaching the outer support plate to the outer surface of the pellicle of the synthetic quartz glass plate that is the base plate of the pellicle plate; and a side attached to the outer support plate. And a pellicle for attaching a pellicle frame to the surface of the synthetic quartz glass plate on which the antireflection film has been formed in the step of forming the antireflection film on the surface of the synthetic quartz glass plate on the opposite side. A frame mounting step and an outer surface side support plate peeling step of peeling the outer surface side support plate from the synthetic quartz glass plate are included in this order.

In the step of attaching the outer surface side support plate, in order to suppress the thickness variation of the antireflection film to be provided in the subsequent step, the surface of the synthetic quartz glass plate, which is the base plate of the pellicle plate, which is the outer surface of the pellicle is attached. Adhere to the outer support plate in advance,
This is a step of suppressing the deflection during film formation, and in the next inner surface side film forming step, an antireflection film is formed on the surface of the synthetic quartz glass plate opposite to the side adhered to the outer surface side support plate.

In the next pellicle frame mounting step,
A pellicle frame is formed by attaching a pellicle frame to the surface of the synthetic quartz glass plate on which the antireflection film is formed in the inner surface side film forming step. The adhesive used to bond the synthetic quartz glass plate to the pellicle frame is an epoxy-based, acrylic-based, silicone-based or fluororesin-based thermosetting adhesive,
Alternatively, an ultraviolet curable adhesive or the like can be used. In the present invention, since the synthetic quartz glass plate, which is the base plate of the pellicle plate, is adhered to the pellicle frame in the state of being adhered to the outer surface side support plate, even if the synthetic quartz glass plate is thin, distortion due to its own weight hardly occurs at the time of adhesion. . After the pellicle frame is attached to the synthetic quartz glass plate, the outer surface side supporting plate is peeled from the synthetic quartz glass plate in the outer surface side supporting plate peeling step.

It is preferable to form an antireflection film on both surfaces of the pellicle plate in order to improve the light transmittance. In order to obtain a pellicle plate having antireflection films formed on both sides using the manufacturing method of the present invention, antireflection is also applied to the surface of the synthetic quartz glass plate, which is the base plate of the pellicle plate, which is the outer surface of the pellicle. Step of forming a film (hereinafter, this step is referred to as "external surface side film forming step").
That is, the inner surface side film forming step and the outer surface side film forming step are simply referred to as “film forming step”. ) Is required, but one of the following methods can be used, for example.

One method is, after the supporting plate peeling step,
This is a method of forming an antireflection film on the surface of the synthetic quartz glass plate on the side opposite to the side on which the pellicle frame is attached. Another method is to form an antireflection film in advance on the surface of the synthetic quartz glass plate on the side where the support plate is attached, before the step of attaching the support plate. When forming an antireflection film on the surface of a synthetic quartz glass plate in advance,
According to each step of the present invention described above, an antireflection film may be formed after the synthetic quartz glass plate is attached to the support plate. The supporting plate in this case is a supporting plate that is attached to the surface of the synthetic quartz glass plate, which is the base plate of the pellicle plate, which is the outer surface of the pellicle. The plate is referred to as an "inner side support plate". Also,
Outer side support plate and inner side support plate are combined and simply referred to as "support plate"
Called. The outer surface side support plate and the inner surface side support plate may be the same thing.

The antireflection film formed in the film forming step is composed of a single layer or a plurality of layers, and the material constituting the film is Mg.
F ₂ , CaF ₂ , SiO ₂ , Al ₂ O ₃ and HfO ₂
It is preferable that at least one selected from the following. And
For example, a film can be formed on the surface of the synthetic quartz glass plate by using a known film forming device such as an electron beam vapor deposition device, an ion plating device, and a sputtering device.

When vacuum deposition is used in the film forming process, particles adhere to the film forming surface due to purging. Therefore, if the outer surface side support plate is attached to the film forming surface in this state, a flat surface is obtained. It does not stick. Therefore, it is desirable to attach the outer support plate after cleaning the film-formed surface.

Further, a flatness sufficient as a pellicle plate,
In order to obtain parallelism, it is necessary to polish the synthetic quartz glass plate which is the base plate, but this step is performed after the step of attaching the outer surface side support plate of the present invention, and then attaching the synthetic quartz glass plate to the support plate. It can be done while wearing. That is, between the outer surface side support plate attaching step and the inner surface side film forming step, the surface of the synthetic quartz glass plate opposite to the side adhered to the outer side support plate is polished (hereinafter, this step The inner surface side polishing step "). Polishing with the outer surface side support plate adhered has the advantage of enabling accurate polishing because the substantial thickness of the synthetic quartz glass plate increases. Further, by forming the film after polishing, it is possible to form an antireflection film having a smaller variation in film thickness.

In this case, it is necessary to previously polish the surface of the synthetic quartz glass plate on the side to which the outer surface side support plate is attached, before the step of attaching the outer surface side support plate. It can be adhered to the inner support plate according to the polishing step.

The support plate must have good flatness and parallelism in order to suppress variations in film thickness during film formation and variations in polishing amount, and at least in a region where the synthetic quartz glass plate is bonded and held. Is preferably 2 μm or less and the parallelism is preferably 2 μm or less. The thickness of the support plate is 5 to 50.
mm, and particularly preferably 20 to 30 mm.

Further, in the film forming step, the synthetic quartz glass plate and the supporting plate may be heated at about 200 to 300 ° C., so that the difference in the coefficient of thermal expansion between the synthetic quartz glass plate and the supporting plate should be made small. The adhesive strength can be maintained and the warpage can be reduced. Therefore, as the material of the support plate, synthetic quartz glass is most desirable, and then fused silica glass (both are collectively referred to as quartz glass) is desirable. Multi-component glass, ceramics, or metal having a thermal expansion coefficient close to that of quartz glass can also be used. Reducing the difference in the coefficient of thermal expansion between the synthetic quartz glass plate and the support plate is also effective for improving the accuracy of polishing.

The size of the support plate depends on the size of the apparatus used in these steps and is not limited by the present invention. Therefore, depending on the size of the apparatus, it is possible to hold a plurality of synthetic quartz glass plates on the support plate and perform film formation.

The adhesive used for attaching the support plate is not limited as long as it can be peeled off later, but is not limited to olefin,
Styrene-based thermoplastic adhesives, phenolic resins,
Thermosetting adhesive such as epoxy resin type, silicone type,
Photocurable adhesives and pressure sensitive adhesives such as acrylic resins are exemplified, but thermoplastic adhesives are preferable because they have a certain degree of heat resistance and can be easily peeled off by heating.

When the synthetic quartz glass plate is affixed to a support plate and polished, it has an adhesive force or a suction force for holding the blank plate against the horizontal resistance due to polishing, and There is no limitation as long as the operability when peeling the base plate from the support plate is good.

For example, when a synthetic quartz glass plate is attached to a support plate and polished, the support may be used in addition to the above-mentioned adhesives and pressure-sensitive adhesives, as seen in the polishing process of silicon wafers. If you use a method such as bonding a template that suppresses horizontal displacement of the synthetic quartz glass plate to the plate, pasting a non-woven fabric with a foam layer in the template frame, and holding the substrate by the ringing effect of this foam layer The peeling process can be simplified.

In the outer surface polishing step which is carried out in advance, the synthetic quartz glass plate may be sliced as it is, but it is preferable that the synthetic quartz glass plate is subjected to double-side lapping and processed to a predetermined accuracy in flatness and parallelism. Further, it is desirable that the synthetic quartz glass plate is chamfered to prevent damage, mirror-finished on the outer peripheral portion after chamfering, or subjected to HF etching to stop the expansion of cracks to increase the working strength. .

The polishing step generally includes a lapping step for obtaining parallelism and a polishing step for mirroring.
In either case, a generally known single sided polishing machine such as an Oscar type or a multi-axis single sided polishing machine may be used. You may provide each process in multiple steps. Of course, it is also possible to process the whole supporting plate with a double-sided polishing machine.

The shape of the support plate may be either circular or rectangular, but in the case of performing double-sided polishing as described above, the support plate rotates in the work holder due to the resistance of the polishing, so that the precision is higher. It is advantageous to use a circular support plate as it allows processing.

After polishing, in order to remove the polishing agent and the like attached by polishing, cleaning is carried out in a state of being attached to the support plate. The washing may be performed by an immersion type multi-tank washing machine in consideration of production efficiency, but a single-wafer brush washing machine is preferable from the viewpoint of maintaining the adhesive strength of the adhesive surface and convenience of handling.

Peeling can be performed by heating or using an organic solvent, depending on the type of adhesive used for attaching the support plate.

The polishing process may be independent of the film forming process. In this case, both surfaces of the synthetic quartz glass plate are polished in advance before the step of attaching the outer support plate.
In this case, the polishing method may be such that it is attached to the support plate and polished on each side as described above, or may be polished on both sides.

Further, it is efficient to finish the synthetic quartz glass plate to a predetermined size of the pellicle plate before it is attached to the outer surface side support plate, but in the polishing step, the flatness of the outer peripheral portion of the raw plate is the inner periphery. Since the change due to processing is large compared to the part,
For high-precision processing, make the size of the blank plate 10 mm or more larger than the size of the specified pellicle plate, and cut the part protruding from the frame with a laser cutting machine after adhering to the frame as the pellicle plate. It is preferable.

The present invention will be described below with reference to specific embodiments. That is, each processing procedure shown in the embodiment shown in FIGS. 1 and 2. The details will be described below.

In the embodiment of FIG. 1 (a), as the outer surface side film forming method, before the outer surface side supporting plate sticking step, the surface of the synthetic quartz glass plate on which the outer side supporting plate is stuck is attached. The antireflection film is formed in advance.As the outer surface side polishing method, the surface of the synthetic quartz glass plate on the side to which the outer surface side support plate is adhered is preliminarily polished, and the outer surface side support plate adhesion step and the inner surface are performed. During the side film formation step, the surface of the synthetic quartz glass plate opposite to the side adhered to the outer surface side support plate is polished.

In this procedure, the surface of the synthetic quartz glass plate on the side to which the support plate is attached is polished in advance (outer surface side), and then an antireflection film is formed (outer surface side film formation) (step Sa- 1), step of attaching outer support plate (step Sa-
2), a step of polishing (inside surface polishing) the surface of the synthetic quartz glass plate on the side opposite to the side to which the outer surface side support plate is attached (step Sa-3), an inner surface side film forming step (step Sa-4), It includes a frame mounting step (step Sa-5) and an outer surface side support plate peeling step (step Sa-6). Step Sa-1 is a step of preparing an unpolished synthetic quartz glass base plate, a step of adhering the synthetic quartz glass plate to an inner surface side support plate, and a synthetic quartz glass plate opposite to the inner surface side support plate. A step of polishing the surface (polishing the outer surface), a step of cleaning, and a step of forming an antireflection film (film forming the outer surface),
The step of peeling off the inner support plate and the step of cleaning are included in this order.

In the embodiment shown in FIG. 1 (b), as the outer surface side film forming method, before the outer surface side support plate sticking step, the surface of the synthetic quartz glass plate on which the outer side support plate is stuck is attached. The antireflection film is formed in advance, and as the outer surface side polishing method, both surfaces of the synthetic quartz glass plate are previously polished before the outer surface side support plate attaching step.

This procedure is performed by preliminarily polishing both surfaces of the synthetic quartz glass plate (step Sb-1), and forming an antireflection film on the surface of the synthetic quartz glass plate on which the support plate is to be adhered (outer surface). Side film formation) (Step Sb
-2), an outer surface side support plate attaching step (step Sb-3),
It includes an inner surface side film forming step (step Sb-4), a frame attaching step (step Sb-5), and an outer surface side support plate peeling step (step Sb-6). Step Sb-2 is a step of attaching the synthetic quartz glass plate to the inner support plate, and forming an antireflection film on the surface of the synthetic quartz glass plate opposite to the inner support plate (external film formation). The process includes a process, a process of peeling the inner support plate, and a cleaning process in this order.

In the embodiment of FIG. 2 (a), as the outer surface side film forming method, an antireflection film is formed on the surface of the synthetic quartz glass plate on the side opposite to the side on which the pellicle frame is attached after the outer surface side supporting plate is peeled off. The outer surface side polishing method includes polishing the surface of the synthetic quartz glass plate on the side where the outer surface side support plate is adhered in advance, and the outer surface side support plate adhesion step and the inner surface side film formation step. And the surface of the synthetic quartz glass plate on the opposite side to the side adhered to the outer surface side support plate.

In this procedure, the surface of the synthetic quartz glass plate on the side to which the outer surface side support plate is attached is polished in advance (outer surface side polishing) (step Sc-1), and the outer surface side support plate attachment step (step Sc). -2), a step (step Sc-3) of polishing the surface of the synthetic quartz glass plate on the side opposite to the side to which the outer surface side support plate is attached (step Sc-3), and an inner surface side film forming step (step Sc-4) , Frame attachment step (step Sc-5) and outer surface side support plate peeling step (step S)
c-6), a step of forming a film on the surface of the synthetic quartz glass plate on the side to which the outer surface side support plate was adhered (outer surface side film formation) (step S)
c-7) is included. Further, Sc-1 is a step of preparing an unpolished synthetic quartz glass base plate, a step of adhering the synthetic quartz glass plate to an inner surface side support plate, a surface of the synthetic quartz glass plate opposite to the inner surface side support plate. The step of polishing (polishing the outer surface), the step of peeling the inner support plate, and the step of cleaning are included in this order.

In the embodiment shown in FIG. 2B, as an outer surface side film forming method, an antireflection film is formed on the surface of the synthetic quartz glass plate opposite to the side where the pellicle frame is attached after the outer surface side supporting plate is peeled off. As the outer surface side polishing method, both surfaces of the synthetic quartz glass plate are previously polished before the outer surface side support plate attaching step.

This procedure is performed by preliminarily polishing both surfaces of the synthetic quartz glass plate (step Sd-1), attaching the outer surface side support plate (step Sd-2), and forming the inner surface side film (step Sd-3). ), Frame mounting step (step Sd-4) and outer surface side support plate peeling step (step S).
d-5) and a step (step Sd-6) of forming a film on the surface of the synthetic quartz glass plate on which the outer surface side support plate was adhered (outer surface side film formation).

[0045]

EXAMPLES The present invention will be specifically described below with reference to examples, but the present invention is not limited to these examples. A synthetic quartz glass ingot that has been synthesized by a known method and has a predetermined wavelength of 82% or more and transmits through it is cut into a thickness of 151 mm × 124 mm × 1.2 mm with an inner peripheral blade slicer, and then a commercially available NC chamfering machine is used. External dimensions are 149 mm x 12
Chamfering was carried out so that the thickness was 2 mm.

Next, in order to stop the progress of the cracks due to cutting and the cracks due to chamfering, it is immersed in a 5 mass% HF solution for etching, and then the peripheral portion is mirror-finished by using a commercially available end-face mirror finishing machine to obtain a pellicle plate. A synthetic quartz glass plate, which is a blank plate of Then, the surface of the plate obtained by double-side polishing in advance has a flatness of 2 μm or less, and the parallelism between the two surfaces is 2 μm or less. A synthetic quartz glass plate is provided on one side of a synthetic quartz glass support plate (φ230 mm × 30 mm thickness). Glued. The adhesive used at this time was an ultraviolet curable adhesive (manufactured by ThreeBond, trade name 3052B).

Next, the surface to be polished was lapped and polished by a commercially available Oscar type single-side polishing machine (outer surface side polishing step) to make the synthetic quartz glass plate thickness 0.8 mm.
After removing the abrasive with an ultrasonic cleaner using detergent and ultrapure water, it was dried by a hot water drawing method and hot air. After that, an antireflection film was formed by a vacuum vapor deposition machine (external surface side film forming step).

The synthetic quartz glass plate was peeled from the support plate, washed with isopropyl alcohol, and then adhered again to the support plate with the film-formed surface as an adhesive surface (outer surface side support plate attaching step). This is lapped and polished again using an Oscar type single-side polishing machine until it becomes 0.25 mm thick.
(Inner surface side polishing step) and washed. Next, after forming an antireflection film in the same manner as in the above step (inner surface side film forming step), cleaning with isopropyl alcohol was performed.

Finally, a pellicle frame (outer dimensions: 149 mm × 122 mm) made by using synthetic quartz glass
X 5 mm thickness and 2 mm frame width) is attached to a synthetic quartz glass plate with an adhesive (pellicle frame attaching step), then the support plate is peeled from the synthetic quartz glass plate (external side support plate peeling step), and the frame is isopropyl alcohol Washed by.

The pellicle frame made of synthetic quartz glass used here is one in which a sliced material having a thickness of 152 mm × 152 mm × 6.2 mm is double-sided polished to a thickness of 5 mm and then carved by an end mill. The flatness of the two surfaces is 1 μm or less, and the parallelism of both surfaces is 2 μm.
m or less.

The pellicle consisting of a synthetic quartz pellicle plate with an antireflection film and a synthetic quartz frame obtained in the above steps was held in a horizontal state, and the deflection of the pellicle plate was measured by an optical flatness measuring device. However, the flatness was 2 μm or less, and sufficient accuracy was maintained.

[0052]

According to the present invention, it is possible to industrially easily obtain a pellicle in which the thickness of the synthetic quartz glass pellicle plate is less than 300 μm and the in-plane light transmittance distribution is uniform.

[Brief description of drawings]

FIG. 1 is a diagram showing a schematic procedure of an embodiment of the present invention.

FIG. 2 is a diagram showing a schematic procedure of an embodiment of the present invention.

FIG. 3 is a front view and a side view showing a conventional pellicle.

FIG. 4 is a conceptual diagram of a shift of an exposure optical path due to variation in plate thickness.

[Explanation of symbols]

1: Pellicle frame 2: Pellicle film 3: Adhesive 4: Exposure ray

Claims (7)

[Claims] 1. A method of manufacturing a pellicle comprising a pellicle frame and a pellicle plate made of synthetic quartz glass attached so as to cover an opening of the pellicle frame, the synthetic quartz glass being a raw plate of the pellicle plate. On the surface of the plate, which is the outer surface of the pellicle, on the outer support plate sticking step, which is stuck to the outer support plate, and on the surface of the synthetic quartz glass plate on the opposite side to the side stuck to the outer support plate. An inner surface side film forming step of forming an antireflection film, a pellicle frame attaching step of attaching a pellicle frame to the surface of the synthetic quartz glass plate on which the antireflection film is formed in the inner surface side film forming step, and a synthetic quartz glass plate An outer surface side support plate peeling step of peeling off the outer surface side support plate, in this order, a pellicle manufacturing method. 2. The pellicle according to claim 1, further comprising a step of forming an antireflection film on the surface of the synthetic quartz glass plate opposite to the side on which the pellicle frame is attached after the step of peeling the outer surface side support plate. Manufacturing method. 3. The method according to claim 1, further comprising a step of forming an antireflection film in advance on the surface of the synthetic quartz glass plate on the side to which the outer side support plate is attached, before the step of attaching the outer side support plate. Manufacturing method of pellicle. 4. A step of preliminarily polishing the surface of the synthetic quartz glass plate on the side to which the outer side support plate is attached, prior to the step of attaching the outer side support plate, and the step of attaching the outer side support plate, The method further comprising a step of polishing the surface of the synthetic quartz glass plate on the side opposite to the side adhered to the outer surface side support plate between the inner surface side film forming step and the inner surface side film forming step.
A method for producing the pellicle described. 5. The method of manufacturing a pellicle according to claim 1, further comprising a step of previously polishing both surfaces of the synthetic quartz glass plate before the step of adhering the outer surface side support plate. 6. The method of manufacturing a pellicle according to claim 1, wherein the outer surface side support plate is made of quartz glass. 7. The method for producing a pellicle according to claim 1, wherein the pellicle plate has a thickness of 300 μm or less.