JP2003252885A - アルキル第ｖａ族金属化合物 - Google Patents

アルキル第ｖａ族金属化合物

Info

Publication number
JP2003252885A
JP2003252885A JP2003008094A JP2003008094A JP2003252885A JP 2003252885 A JP2003252885 A JP 2003252885A JP 2003008094 A JP2003008094 A JP 2003008094A JP 2003008094 A JP2003008094 A JP 2003008094A JP 2003252885 A JP2003252885 A JP 2003252885A
Authority
JP
Japan
Prior art keywords
group
metal
monoalkyl
alkyl
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP2003008094A
Other languages
English (en)
Japanese (ja)
Other versions
JP2003252885A5 (enExample
Inventor
Deodatta V Shenai-Khatkhate
デオダッタ・ビナヤク・シェナイ−ハトハテ
Michael Brendan Power
マイケル・ブレンダン・パワー
Artashes Amamchyan
アルタシェス・アマンカイアン
Ronald L Dicarlo Jr
ロナルド・エル・ジカルロ，ジュニア
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
DuPont Electronic Materials International LLC
Original Assignee
Shipley Co LLC
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shipley Co LLC filed Critical Shipley Co LLC
Publication of JP2003252885A publication Critical patent/JP2003252885A/ja
Publication of JP2003252885A5 publication Critical patent/JP2003252885A5/ja
Withdrawn legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/301—AIII BV compounds, where A is Al, Ga, In or Tl and B is N, P, As, Sb or Bi
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
    • C07F9/02—Phosphorus compounds
    • C07F9/28—Phosphorus compounds with one or more P—C bonds
    • C07F9/50—Organo-phosphines
    • C07F9/505—Preparation; Separation; Purification; Stabilisation
    • C07F9/5063—Preparation; Separation; Purification; Stabilisation from compounds having the structure P-H or P-Heteroatom, in which one or more of such bonds are converted into P-C bonds
    • C07F9/5068—Preparation; Separation; Purification; Stabilisation from compounds having the structure P-H or P-Heteroatom, in which one or more of such bonds are converted into P-C bonds from starting materials having the structure >P-Hal
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
    • C07F9/02—Phosphorus compounds
    • C07F9/28—Phosphorus compounds with one or more P—C bonds
    • C07F9/50—Organo-phosphines
    • C07F9/52—Halophosphines
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
    • C07F9/66—Arsenic compounds
    • C07F9/70—Organo-arsenic compounds
    • C07F9/72—Aliphatic compounds

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Molecular Biology (AREA)
  • General Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
JP2003008094A 2002-01-17 2003-01-16 アルキル第ｖａ族金属化合物 Withdrawn JP2003252885A (ja)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US34972502P 2002-01-17 2002-01-17
US60/349725 2002-01-17
US35512402P 2002-02-08 2002-02-08
US60/355124 2002-02-08

Publications (2)

Publication Number Publication Date
JP2003252885A true JP2003252885A (ja) 2003-09-10
JP2003252885A5 JP2003252885A5 (enExample) 2006-03-09

Family

ID=27616746

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2003008094A Withdrawn JP2003252885A (ja) 2002-01-17 2003-01-16 アルキル第ｖａ族金属化合物

Country Status (5)

Country Link
EP (1) EP1335416A1 (enExample)
JP (1) JP2003252885A (enExample)
KR (1) KR20030063175A (enExample)
CN (1) CN1445233A (enExample)
TW (1) TW200302203A (enExample)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108409784B (zh) * 2017-02-09 2020-07-14 上海交通大学 一种磷手性重要中间体的制备方法
KR102680700B1 (ko) 2017-12-20 2024-07-01 바스프 에스이 금속-함유 필름의 생성 방법
KR102509744B1 (ko) * 2018-07-30 2023-03-15 주식회사 유피케미칼 알루미늄 화합물 및 이를 사용한 알루미늄-함유 막의 형성 방법
TWI862702B (zh) * 2019-10-08 2024-11-21 法商液態空氣喬治斯克勞帝方法研究開發股份有限公司 用於沉積含鋰層、島或簇的鋰前驅體及使用彼之方法

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1344051A (en) * 1951-08-09 1974-01-16 Supply Minister Of Manufacture of organic phosphorus compounds
US4734514A (en) * 1984-10-25 1988-03-29 Morton Thiokol, Inc. Hydrocarbon-substituted analogs of phosphine and arsine, particularly for metal organic chemical vapor deposition
US4942252A (en) * 1988-08-16 1990-07-17 Cvd Incorporated Synthesis of phosphorus and arsenic, halides and hydrides
JP3912436B2 (ja) * 1996-11-29 2007-05-09 日本化学工業株式会社 高純度モノアルキルホスフィンおよびその製造方法

Also Published As

Publication number Publication date
KR20030063175A (ko) 2003-07-28
CN1445233A (zh) 2003-10-01
TW200302203A (en) 2003-08-01
EP1335416A1 (en) 2003-08-13

Similar Documents

Publication Publication Date Title
US7166734B2 (en) Method for making organometallic compounds
US7141488B2 (en) Method of depositing germanium-containing films
US7659414B2 (en) Method of preparing organometallic compounds
US4734514A (en) Hydrocarbon-substituted analogs of phosphine and arsine, particularly for metal organic chemical vapor deposition
EP1464647B1 (en) Process for the preparation of germanium compounds
JP2688965B2 (ja) 有機金属化合物
KR100852361B1 (ko) 트리알킬 ｖａ족 금속 화합물
JP2011162542A (ja) 有機金属化合物を製造する方法
JP2011168576A (ja) 有機金属化合物を製造する方法
US20040122248A1 (en) Preparation of organometal compounds
JP2003252885A (ja) アルキル第ｖａ族金属化合物
US6956127B2 (en) Alkyl group VA metal compounds
US6939983B2 (en) Alkyl group VA metal compounds
US20030199704A1 (en) Alkyl group VA metal compounds

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20060113

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20060119

A761 Written withdrawal of application

Free format text: JAPANESE INTERMEDIATE CODE: A761

Effective date: 20060915