JP2003248302A - Infrared ray-sensitive composition - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide an IR-sensitive composition giving a good coated surface state of a layer and excellent in suitability to processing with an exhausted developer having lowered activity (development latitude) when used in a photosensitive layer of a planographic printing plate precursor or the like. <P>SOLUTION: The IR-sensitive composition comprises (A) a fluoroaliphatic group-containing copolymer obtained by copolymerizing at least two specified monomers and (B) a fluoroaliphatic group-containing copolymer obtained by copolymerizing at least two specified monomers. <P>COPYRIGHT: (C)2003,JPO

Description

DETAILED DESCRIPTION OF THE INVENTION [0001] The present invention relates to an infrared sensitive composition.
Related to objects, especially digital computers
For so-called direct plate making
When used in the photosensitive layer of a positive photosensitive lithographic printing plate
To obtain an excellent coating surface and development latitude.
It is related with the infrared-sensitive photosensitive composition which can be performed. [0002] Conventionally, digital data of a computer
As a system for making plates directly from
, Ar laser exposure and post-heating combination
Photopolymerization system with a silver salt sensitive material laminated on a photosensitive resin
Thing, silver master type thing, electric discharge destruction and
By destroying the silicone rubber layer with laser light
Things are known. However, using electrophotography
Has complicated processes such as charging, exposure, development, etc. and complicated equipment
It becomes a big thing. This method requires a post-heating step.
In addition, it requires a highly sensitive printing plate and is difficult to handle in the light room.
Become. In this method, since silver salt is used, processing is troublesome.
There is a disadvantage that it becomes complicated and the cost is high. Another way
Is a relatively complete method, but the remaining silicon
There remains a problem with the removal of the rice cake. On the other hand, in recent years
The development of lasers is remarkable, especially from the near infrared to the infrared.
Solid-state lasers / semiconductor lasers with optical regions have high output and small size
Molds are easily available. Compu
Exposure light when making plate directly from digital data
As a source, these lasers are very useful. As a conventional lithographic printing plate material, Shoko 46
No. 27919 discloses insolubility before heating or
Slightly soluble and more soluble in solvents under the influence of heat
Recording layer containing a polymer compound or composition that can be prepared
To form images by heating recording materials containing
The law is described. JP-A-56-69192
The gazette includes a novolac phenolic resin and carbon black.
A heat-sensitive recording material having a heat-sensitive layer containing
Yes. However, these do not use laser light.
Only the example when the image was recorded is disclosed, and
Dew when making plates directly from digital data such as computers
As a light source, it has a light emitting region from near infrared to infrared.
If an image is recorded using a laser, dirt or printing
It is not always possible to obtain good prints due to a decrease in force.
There wasn't. In order to obtain a good print,
A portion irradiated with light during re-development processing (non-image
Part) was easily dissolved and the part that was not exposed to light (image)
Part) remains, and the durability of the remaining image part is good.
There must be. That is, in the above known technique, laser light is used.
When used, the non-image area
Is difficult to dissolve and the image area is easily dissolved
It was considered. In response to the problems of the above-mentioned known technology.
JP-A-7-285275 discloses an image forming layer.
And a binder, a substance that absorbs light and generates heat, and pyrolysis
In the state that is soluble and does not decompose, the solubility of the binder is realized.
Use image recording materials that contain qualitatively degrading substances
Allows you to use conventional processing equipment and printing equipment
Plate making directly from digital data of computers, etc.
Disclosure that we can provide products with good recordability
doing. However, the above-mentioned JP-A-7-285275.
Even in the technology disclosed in the Gazette No.
Processability with labor developer (development latitude) and on coated surface
Was not enough. [0006] SUMMARY OF THE INVENTION The object of the present invention is to
Overcoming the shortcomings of conventional technology, for example, for lithographic printing plate precursors
When used as a photosensitive layer, the coating surface of the layer is good,
Furthermore, processability with fatigue developer with reduced activity (development latitude)
To provide an infrared-sensitive composition having excellent properties)
It is. [0007] [Means for Solving the Problems] The present inventors have conducted intensive research.
As a result, for example, it is used for the photosensitive layer of lithographic printing plate precursors.
Two types specific to the infrared-sensitive composition that can be used
A fluoroaliphatic group-containing copolymer
From the above, it has been found that the above object is achieved. That is, this departure
Ming has the following configuration. (1) (A) At least the following (i) and
Obtained by copolymerizing monomers containing (ii)
Fluoroaliphatic group-containing copolymer (I) A module having a partial structure represented by the following general formula (1)
Nomer, (ii) repeating unit represented by the following general formula (2)
Monomer corresponding to the position (B) Monomer containing at least the following (i) and (ii)
Containing fluoroaliphatic groups obtained by copolymerizing
Copolymer (I) A module having a partial structure represented by the following general formula (1)
Nomer, (ii) a repeating unit represented by the following general formula (3)
Monomer corresponding to the position Containing an infrared-sensitive composition. [0009] [Formula 4] (In the general formula (1), R₂And R_ThreeIs
Each independently a hydrogen atom, an alkyl group having 1 to 4 carbon atoms
X represents a single bond or a divalent linking group, and m is 0.
The above integer, n represents an integer of 1 or more. ) [0011] [Chemical formula 5] (In the general formula (2), R_FourIs a hydrogen field
Represents an alkyl group having 1 to 4 carbon atoms, and t is 3 or more.
An integer, u represents an integer of 2-6. ) [0013] [Chemical 6] (In the general formula (3), R_FiveIs a hydrogen field
Child, an alkyl group having 1 to 4 carbon atoms. R₆Is a hydrogen field
A child, an alkyl group or an aryl group; o, p, q,
r and s are each independently an integer of 1 to 4, and o and p are
Not the same. a and b are each independently an integer of 4 or more.
is there. c, d, and e are each independently an integer of 0 or 1 or more
Represents. ) [0015] DESCRIPTION OF THE PREFERRED EMBODIMENTS The present invention will be described in detail below.
To do. [1] (A) At least the above (i) and above
Obtained by copolymerizing a monomer containing the above (ii)
Fluoroaliphatic group-containing copolymer (hereinafter referred to as “(A)
(Also referred to as “union” or “component (A)”) (A) The copolymer comprises at least the above (i) and (ii)
Fluoro obtained by copolymerizing monomers containing
It is an aliphatic group-containing copolymer. (I) Partial structure represented by the following general formula (1)
A monomer having a structure, [0018] [Chemical 7] (In the general formula (1), R₂And R_ThreeEach
Each independently represents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms.
X represents a single bond or a divalent linking group, and m is 0 or more.
The upper integer, n represents an integer of 1 or more. ) R₂And R_ThreeSpecific examples of alkyl groups in
Are methyl, ethyl, propyl, isopropyl
Group, n-butyl group, isobutyl group, tert-butyl group, etc.
Is mentioned. R₂And R_ThreePreferably as a hydrogen source
And a methyl group, more preferably a hydrogen atom.
X is a covalent bond or a substituent represented by the general formula (1)
Divalent linking group (organic group) for bonding the amide to the polymer side chain
Represents. Preferred X is -O-, -S-, -N (R4).
-, -CO- represents direct or divalent with the polymer main chain
Bond through a linking group. Here, R4 is a hydrogen atom, C
1-C4 alkyl group is represented. As a specific example of an alkyl group
For methyl, ethyl, propyl, isopropyl
Group, n-butyl group, isobutyl group, tert-butyl group, etc.
Among them, a hydrogen atom and a methyl group are preferable.
X may be any of the above, but -O- is more
preferable. m is an integer greater than or equal to 0, and an integer from 2 to 8
Preferably, m = 2 is particularly preferable. M is 2 or more
If the functional groups on adjacent carbons are bonded together,
A family ring may be formed. n represents an integer of 1 or more, or 1
An integer of 10 is preferred. Here, n is particularly preferably 3-6.
Good. It has a partial structure represented by the general formula (1).
As the monomer to be used, a monomer represented by the following general formula (4) is used.
Nomers are preferred. General formula (4) [Chemical 8] Where R₁Is a hydrogen atom or a halogen atom (eg
For example, fluorine atom, chlorine atom, bromine atom) or substituent
A methyl group which may have Y₀Is a divalent organic group, X,
R₂, R _Three, M, and n have the same meaning as in the general formula (1). Y₀Is
Specific examples of the divalent organic group are the same as those of X described above.
It is done. The perf of the general formula (4) used in the present invention
Examples of specific structures of monomers containing a fluoroalkyl group
Shown in Specific example of n = 4 [0025] [Chemical 9]Specific example of n = 3 [0027] [Chemical Formula 10]Specific example of n = 5 [0029] Embedded imageSpecific example of n = 6 [0031] Embedded image(Ii) Repeat represented by the following general formula (2)
Monomer corresponding to the unit [0033] Embedded image (In the general formula (2), R_FourIs a hydrogen field
Represents an alkyl group having 1 to 4 carbon atoms, and t is 3 or more.
An integer, u represents an integer of 2-6. ) R_FourAn alkyl group having 1 to 4 carbon atoms in
Are methyl, ethyl, propyl, isopropyl
Group, n-butyl group, isobutyl group, tert-butyl group, etc.
Is mentioned. t is an integer greater than or equal to 3, from 4 to 100
An integer of is preferred. u represents an integer of 2 to 6, 2 to 3
An integer of is preferred. The above general formula used in the present invention will be described below.
Monomer component corresponding to the repeating unit represented by (2)
Examples are shown, but the present invention is not limited to these examples.
Yes. [0037] Embedded image[0038] Embedded image [0039] Embedded image [0040] Embedded image One used in the copolymer (A) of the present invention
Amount of monomer having partial structure represented by general formula (1)
Is 5 moles based on the total amount of each monomer of the (A) copolymer.
% Or more, preferably 5 to 70 mol%.
More preferably, it is the range of 7-60 mol%. Also general
The amount of the monomer represented by the formula (2) is the copolymer (A)
10 mol% or more based on the total amount of each monomer,
It is preferably 15 to 70 mol%, more preferably 20
~ 60 mol%. The molecular weight of (A) copolymer used in the present invention
The range is usually 3000 to 200,0 as a weight average molecular weight.
Up to 00, preferably 6,000 to 10
Those up to 10,000 can be used. these
The molecular weight is, for example, GP using a polystyrene standard substance.
It can be determined by the C method. Also used in the present invention
The amount of the copolymer (A) added in the composition is the total amount excluding the solvent.
It is in the range of 0.001 to 10% by weight with respect to the composition.
More preferably, it is in the range of 0.01 to 5% by weight.
Moreover, the (A) copolymer of the present invention may be used in combination of two or more.
And may be used in combination with many surfactants. [2] (B) At least the above (i) and above
Obtained by copolymerizing a monomer containing the above (ii)
Fluoroaliphatic group-containing copolymer (hereinafter referred to as “(B)
(Also referred to as “union” or “component (B)”) (B) The copolymer contains at least the above (i) and (ii).
Fluoro obtained by copolymerizing monomers containing
It is an aliphatic group-containing copolymer. (I) A module having a partial structure represented by the following general formula (1)
Nomer, (ii) a repeating unit represented by the following general formula (3)
Monomer corresponding to the position (I) a part represented by the above general formula (1)
For the monomer having a partial structure, (A) copolymerization
It is the same as that described on the body. (Ii) Repeat represented by the following general formula (3)
Monomer corresponding to the unit [0046] Embedded image (In the general formula (3), R_FiveIs a hydrogen field
Represents an alkyl group having 1 to 4 carbon atoms. R₆Is a hydrogen field
A child, an alkyl group or an aryl group; o, p, q,
r and s are each independently an integer of 1 to 4, and o and p are
Not the same. a and b are each independently an integer of 4 or more.
is there. c, d, and e are each independently an integer of 0 or 1 or more
Represents. ) R_FiveAn alkyl group having 1 to 4 carbon atoms in
Are methyl, ethyl, propyl, isopropyl
Group, n-butyl group, isobutyl group, tert-butyl group, etc.
Is mentioned. R₆The alkyl group in
1 to 6 alkyl groups are preferred, and specific examples include
For example, methyl group, ethyl group, n-butyl group, i-butyl
Group, etc., and these further have a substituent.
May be. R₆Examples of the aryl group in
Phenyl group, tolyl group, dimethylphenyl group, naphthyl
Group, etc., and these further have a substituent.
May be. The above further substituents include alkyl
Group, aryl group, hydroxyl group, carboxyl group, etc.
Can be mentioned. O, p, q, r, and s are each independently 1 to
It is an integer of 4, and an integer of 2 to 3 is preferable. a and b are
Each independently an integer greater than or equal to 4, an integer between 10 and 30
Is preferred. c, d, and e are each independently 0 or 1 or more
An integer of 10 to 30 is preferable. The above general formula used in the present invention will be described below.
Monomer component corresponding to the repeating unit represented by (3)
Examples are shown, but the present invention is not limited to these examples.
Yes. [0054] Embedded image [0055] Embedded image[0056] Embedded image One used in the copolymer (B) of the present invention
Amount of monomer having partial structure represented by general formula (1)
Is 5 moles based on the total amount of each monomer of the (B) copolymer.
% Or more, preferably 5 to 70 mol%.
More preferably, it is the range of 7-60 mol%. Also general
The amount of the monomer represented by the formula (3) is the copolymer (B)
10 mol% or more based on the total amount of each monomer,
It is preferably 15 to 70 mol%, more preferably 20
~ 60 mol%. The molecular weight of the (B) copolymer used in the present invention
The range is usually 3000 to 200,0 as a weight average molecular weight.
Up to 00, preferably 6,000 to 10
Those up to 10,000 can be used. these
The molecular weight is, for example, GP using a polystyrene standard substance.
It can be determined by the C method. Also used in the present invention
(B) The added amount of the copolymer in the composition is the total amount excluding the solvent.
It is in the range of 0.001 to 10% by weight with respect to the composition.
More preferably, it is in the range of 0.01 to 5% by weight.
In addition, the copolymer (B) of the present invention may be used in combination of two or more.
And may be used in combination with many surfactants. The above (A) copolymer and (B) copolymer of the present invention
In coalescence, each independently, in addition to the essential ingredients
Copolymerizable monomers can be reacted. (A) The preference of this copolymerizable monomer in the copolymer
The preferred copolymerization ratio is 20 mol% of the total monomer.
Below, more preferably 10 mol% or less. Also,
(B) The preference of this copolymerizable monomer in the copolymer
The preferred copolymerization ratio is 20 mol% of the total monomer.
Below, more preferably 10 mol% or less. As such a monomer, for example, acidic
Mention may be made of monomers having hydrogen atoms. Acid water
Examples of the group having an elementary atom include a carboxyl group and pheno
In addition to the hydroxyl group, any of the known acid groups in the literature may be used.
You can. Known documents of acidic groups include J.A. Dean e.
d., Lange's Handbook of Chemistry 3rd. ed. 1985 McG
You can list raw-Hill Book Co. Also this
Acid groups in which acidic hydrogen atoms are bonded to nitrogen atoms
Specific examples of the partial structure of the functional group include the following (A1) to
What is represented by (A7) can be mentioned. -SO₂NH₂  (A1) -SO₂NH- (A2) -CONHSO₂-(A3) -CONHCO- (A4) -SO₂NH-SO₂-(A5) -CONHSO₂NH- (A6) -NHCONHSO₂-(A7) In addition, the acidity described in JP-A-8-15858
Groups are also useful. As described in JP-A-7-248628
Includes nitrogen atom-containing heterocyclic ring structure with coupler structure
It is. Examples of these nitrogen-containing heterocyclic structures are
Those represented by (H) and (I) can be mentioned. [0063] Embedded image Similarly, Japanese Patent Laid-Open No. 2000-19724
Hydrogen bonded to a carbon atom adjacent to the described electron withdrawing group
Acidic groups having atoms are also useful. In addition, JP-A-11
-352681, JP-A-11-327142, JP-A-1
1-327131, JP-A-11-327126, JP-A-11-327126
10-339948, JP 10-207052, JP
Described in Hei 10-186642 and JP-A 10-161303
Application to the listed copolymers is also suitable. As monomers having these acidic hydrogen atoms
Is a vinyl monomer with an unsaturated group capable of radical polymerization.
Used. Preferred among these vinyl monomers
As acrylate, methacrylate, acrylic
And methacrylamide, styrene, and vinyl.
An example of a preferable structure is disclosed in JP-A-10-142778.
And compounds described in the publication. Furthermore, as another copolymer component, JP-A-4
A monomer having a bridge-like bond described in JP-A-222805,
Having 9 or more carbon atoms as described in Hei 10-142778
Aliphatic group or aliphatic group having two or more carbon atoms
An acrylate having an aromatic group substituted with a group in the side chain,
Methacrylate, acrylamide, or methacryl
Copolymerization with amide monomers is also suitable. Furthermore, the present invention
Are disclosed in JP-A-10-186640 and JP-A-10-18664.
1, JP 2000-3032, JP 2000-30
Application to urethane polymer technology described in 40
Or the degeneracy as disclosed in JP-A-11-327129
In addition, application to a polyaddition polymer is also possible. further,
3 to 20 in the molecule described in JP-A-2000-187318
Having 2 or 3 perfluoroalkyl groups
The present invention can be applied to acrylate monomers.
it can. The fluoropolymers of the present invention are known and commonly used.
Can be manufactured by the method. For example, fluoroaliphatic groups
(Meth) acrylate having polyoxyalkylene group
(Meth) acrylate and acidic hydrogen atom or nitrogen
An acidic group-containing vinyl monomer bonded to an elementary atom
In the medium, add a general-purpose radical polymerization initiator and perform thermal polymerization.
Can be manufactured. Or other
Addition polymerizable unsaturated compound and the same method as above
Can be manufactured. Other additional weights used depending on circumstances
As a polyunsaturated compound, Polymer Handbo
ok 2nd ed. , J .; Brandrup, Wil
eylnterscience (1975) Chapter
er 2Page 1-483 should be used
I can do it. For example, acrylic acid, methacrylic acid, acrylic
Acid esters, methacrylates, acrylic
, Methacrylamides, allyl compounds, vinyl acetate
Non-addition polymerizable substances selected from tellurium and vinyl esters
The compound etc. which have one saturated bond can be mention | raise | lifted. Specifically, the following monomers can be mentioned:
it can. Acrylic esters: methyl acrylate, acrylic acid
Ethyl, propyl acrylate, chloroethyl acrylate
, 2-hydroxyethyl acrylate, trimethylo
Lepropane monoacrylate, benzyl acrylate,
Methoxybenzyl acrylate, furfuryl acrylate
, Tetrahydrofurfuryl acrylate, etc. Methacrylates: methyl methacrylate, methacrylate
Ethyl laurate, propyl methacrylate, chloroethyl ester
Tacrylate, 2-hydroxyethyl methacrylate,
Trimethylolpropane monomethacrylate, benzyl
Methacrylate, methoxybenzyl methacrylate,
Rufuryl methacrylate, tetrahydrofurfuryl meta
Crilate, etc. Acrylamides: Acrylamide, N-
Alkylacrylamide (the alkyl group has 1 carbon atom)
~ 3, such as methyl, ethyl, propyl
Group), N, N-dialkylacrylamide (alkyl group)
As those having 1 to 3 carbon atoms), N-hydroxyethyl
-N-methylacrylamide, N-2-acetamido
Chill-N-acetylacrylamide and the like. Methacrylamide: methacrylamide, N-alkyl
Methacrylamide (alkyl group having 1 to 3 carbon atoms
Ones such as methyl, ethyl, propyl), N,
N-dialkylmethacrylamide (as alkyl group
Having 1 to 3 carbon atoms), N-hydroxyethyl-N-me
Tyl methacrylamide, N-2-acetamidoethyl
N-acetylmethacrylamide and the like. Allyl compounds: allyl esters (eg allyl acetate,
Allyl caproate, allyl caprylate, allyl laurate
, Allyl palmitate, Allyl stearate, Benzo
Allyl acid, allyl acetoacetate, allyl lactate, etc.), ants
Luoxyethanol etc. Vinyl ethers: alkyl vinyl ether
(E.g. hexyl vinyl ether, octyl vinyl ether)
Ether, decyl vinyl ether, ethyl hexyl vinyl
Ether, methoxyethyl vinyl ether, ethoxy ether
Til vinyl ether, chloroethyl vinyl ether, 1
-Methyl-2,2-dimethylpropyl vinyl ether,
2-ethylbutyl vinyl ether, hydroxyethyl vinyl
Nyl ether, diethylene glycol vinyl ether,
Dimethylaminoethyl vinyl ether, diethylamino
Ethyl vinyl ether, butyl aminoethyl vinyl ether
Tellurium, benzyl vinyl ether, tetrahydrofurfuryl
Ruvinyl ether, etc. Vinyl esters: vinyl vinylate, vinyl isobuty
Rate, vinyl trimethyl acetate, vinyl diethyl
Acetate, vinyl valerate, vinyl caproate, vinyl
Nyl chloroacetate, vinyl dichloroacetate, vinyl
Nyl methoxyacetate, vinyl butoxyacetate,
Vinyl lactate, vinyl-β-phenylbutyrate,
Vinyl cyclohexyl carboxylate and the like. Dialkyl itaconates: dimethyl itaconate
Chill, diethyl itaconate, dibutyl itaconate, etc. Dialkyl esters or monoalkyl esters of fumaric acid
Stealth: Dibutyl fumarate, etc. Others, crotonic acid, itaconic acid, acrylonitrile,
Methacrylonitrile, maleilonitrile, styrene
Do. The infrared-sensitive photosensitive composition of the present invention has the above-described properties.
In addition to the components, it contains the following components. [(C) Novolak Resin] Novolak Tree Used in the Present Invention
As fat, phenol formaldehyde resin, m-c
Resole formaldehyde resin, p-cresol form
Aldehyde resin, m- / p-mixed cresol formal
Dehydric resin, phenol / cresol (m-, p-, or
May be any of m- / p-mixed)
Novolak resin such as hydride resin and pyrogallol acetone tree
Fat is preferred. Still further, US Pat. No. 4,123,279
T-butylphenol as described in the specification
Formaldehyde resin, octylphenol formaldehyde
Place an alkyl group with 3 to 8 carbon atoms, such as aldehyde resin.
Condensation of phenol and formaldehyde as a substituent
A polymer is mentioned. Moreover, the weight average molecular weight is 50
Preferably it is 0 or more, 1,000-700,0
More preferably, it is 00. In addition, the number average molecule
The amount is preferably 500 or more, 750 to 65.
More preferably, it is 0.00. Dispersion (weight level
The average molecular weight / number average molecular weight) is 1.1-10.
Is preferred. The novolak resin used in the present invention is:
The infrared-sensitive composition of the present invention is applied to the photosensitive layer of a lithographic printing plate.
When used, it is 50% by weight or more in the total solid content of the photosensitive layer.
If it is less than that,
The effect of improving printing durability is low and cannot be used. 60% by weight or more
It is more preferable that it is 65% by weight or more.
Is particularly preferred. [(D) Photothermal conversion agent] Used in the present invention
(D) A photothermal conversion agent absorbs infrared light and generates heat
There is no particular limitation as long as the quality is good.
Various pigments known as external absorption pigments or examples
Infrared absorbing dyes other than those described above can be used. Pigment
As commercially available pigments and color indexes (C.I.
I. ) Handbook, “Latest Pigment Handbook” (edited by Japan Pigment Technology Association)
1977), "Latest Pigment Application Technology" (CMC Publishing,
1986), "Printing Ink Technology" CMC Publishing, 19
84)) can be used. The types of pigment include black pigment, yellow face
, Orange pigment, brown pigment, red pigment, purple pigment,
Blue pigment, green pigment, fluorescent pigment, metal powder pigment, etc.
Examples include polymer-bound dyes. Specifically, insoluble
Zo pigment, azo lake pigment, condensed azo pigment, chelate azo
Pigments, phthalocyanine pigments, anthraquinone pigments,
Perylene and perinone pigments, thioindigo pigments, key
Nacridone pigments, dioxazine pigments, isoindole
Non-based pigments, quinophthalone pigments, dyed lake pigments,
Azine pigment, nitroso pigment, nitro pigment, natural pigment, firefly
Light pigments, inorganic pigments, carbon black, etc. can be used. These pigments may be used without surface treatment.
Alternatively, a surface treatment may be applied. Surface treatment
Methods include surface coating with resin and wax, surface activity
Methods of attaching agents, reactive substances (eg silane
(Pulling agents, epoxy compounds, polyisocyanates, etc.)
For example, a method of binding the pigment to the pigment surface can be considered. Above table
The surface treatment method is "Characteristics and application of metal soap" (Sachishobo)
“Printing Ink Technology” (CMC Publishing, 1984) and
To "Latest Pigment Applied Technology" (CMC Publishing, 1986)
Has been described. The particle size of the pigment is in the range of 0.01 μm to 10 μm.
Preferably in the range of 0.05 μm to 1 μm
More preferably, it is particularly 0.1 μm to 1 μm.
It is preferable that it exists in the range. The pigment particle size is 0.01μ
If it is less than m, the stability of the dispersion in the recording layer coating solution
It is not preferable, and if it exceeds 10 μm, the recording layer is uniform.
It is not preferable in terms of uniformity. As a method of dispersing pigment
Is a known dispersion used in ink production, toner production, etc.
Technology can be used. Dispersers include ultrasonic dispersers and supporters.
Wind mill, attritor, pearl mill, super mill,
Ball mill, impeller, disperser, KD mill, co
Lloyd mill, Dynatron, 3-roll mill, pressure knee
And the like. For details, see “Latest Pigment Application Technology”.
(CMC Publishing, published in 1986). As the dye, commercially available dyes and literature (for example,
“Dye Handbook” edited by the Society of Synthetic Organic Chemistry, published in 1970
The well-known thing described in can be utilized. Specifically
Azo dyes, metal complex azo dyes, pyrazolone azo dyes
Material, anthraquinone dye, phthalocyanine dye, carbo
Nium dye, quinoneimine dye, methine dye, cyanine
And dyes such as dyes. In the present invention, these
Infrared light or near infrared light
That absorbs light emits infrared light or near infrared light
This is particularly preferable because it is suitable for use with a laser. Absorbs such infrared light or near infrared light.
Carbon black is preferably used as the pigment
The In addition, dyes that absorb infrared light or near infrared light
For example, JP-A-58-125246, JP-A-5
9-84356, JP 59-202829, JP
Cyanine dyeing described in Sho 60-78787
, JP-A-58-173696, JP-A-58-181
690, JP-A-58-194595, etc.
Methine dyes, JP-A 58-112793, JP-A
58-224793, JP-A-59-48187,
No. 59-73996, JP-A-60-52940,
Naftoki described in JP-A-60-63744
Non-dyes, described in JP-A No. 58-112792, etc.
Squaryllium dye, British Patent 434,875
Listed cyanine dyes and the like. Also, as a dye, US Pat. No. 5,156,
The near infrared absorption sensitizer described in No. 938 is also preferably used.
Substituted in U.S. Pat. No. 3,881,924
Arylbenzo (thio) pyrylium salt, JP-A-57-1
42645 (U.S. Pat. No. 4,327,169)
Trimethine thiapyrylium salt, JP-A 58-1810
51, 58-220143, 59-41363
No. 59-84248 No. 59-84249 No.
Described in 59-146063 and 59-146061
Pyryllium-based compounds, JP 59-2161
46, a cyanine dye described in U.S. Pat. No. 4,283,4
No. 75 pentamethine thiopyrylium salt, etc.
Disclosure in Japanese Patent Laid-Open Nos. 5-13514 and 5-19702
As a commercially available product, an epoxy
Epolight III-178, Epoli manufactured by Phosphorus
ght III-130, Epolight III-125, etc.
Is particularly preferably used. Another example that is particularly preferred as a dye is
In U.S. Pat. No. 4,756,993.
Near-infrared absorbing dyes described as (I) and (II)
Can be mentioned. These pigments or dyes are all
0.01 to 50% by weight, preferably 0.1%, based on solids
-10% by weight, particularly preferably in the case of dyes 0.5-10
% By weight, particularly preferably in the case of pigments, 3.1 to 10% by weight
Can be added at a ratio of Addition amount of pigment or dye is 0.01 wt.
If it is less than 50%, the sensitivity will be low, and will exceed 50% by weight.
Then, the uniformity of the image forming layer is lost and the durability of the image forming layer is lost.
Becomes worse. These dyes or pigments are the same as other ingredients.
It can be added to one layer or another layer can be added
May be. [Other components] Infrared sensitive of the present invention
When using the composition for the photosensitive layer of a lithographic printing plate,
In addition, if necessary, contain various additives
Can do. For example, it is thermally decomposable and does not decompose
In the state, the solubility of the (C) novolak resin is substantially low.
When used together with the substances to be removed, the dissolution of the image area in the developer is prevented.
It is preferable because it can improve the stopping property. That
Examples of such substances include onium salts and quinonediazides.
, Aromatic sulfone compounds, aromatic sulfonate esters
Compounds. As the onium salt, a diazonium salt, an an
Monium salt, phosphonium salt, iodonium salt, sulfo
Listed are nium salts, selenonium salts, arsonium salts, etc.
I can do things. As the onium salt used in the present invention
For example, S. I. Schlesinger,
Photogr. Sci. Eng., 18, 387 (1974), T. S. Bal eta
l, Polymer, 21, 423 (1980), JP-A-5-158230
No. 4,069,055, diazonium salts described in US Pat.
No. 4,069,056, No. Re 27,992, Japanese Patent Application No. 3-140140
Ammonium salt described in the specification of No., D. C. Necker et
al, Macromolecules, 17, 2468 (1984), C. S. Wen et a
l, Teh, Proc. Conf. Rad. Curing ASIA, p478Tokyo, Oc
t (1988), U.S. Pat.Nos. 4,069,055 and 4,069,056
The phosphonium salts described, J. V. Crivello et al, Macrom
orecules, 10 (6), 1307 (1977), Chem. & Eng. News, N
ov. 28, p31 (1988), European Patent No. 104,143, US Patent
No.339,049, No.410,201, JP-A-2-150848, Special
Iodonium salts described in Kaihei 2-965514, J. V. Crivel
lo et al, Polymer J. 17, 73 (1985), J. V. Crivello
et al. J. Org. Chem., 43, 3055 (1978), W. R. Watt
et al, J. PolymerSci., Polymer Chem. Ed., 22, 1789
 (1984), J. V. Crivello et al, PolymerBull., 14,
279 (1985), J. V. Crivello et al, Macromorecules,
 14 (5), 1141 (1981), J. V. Crivello et al, J. Poly
mer Sci., Polymer Chem. Ed., 17,2877 (1979), Europe
Patent Nos. 370,693, 3,902,114, 233,567,
297,443, 297,442, U.S. Pat.No. 4,933,377,
161,811, 410,201, 339,049, 4,760,0
No. 13, No. 4,734,444, No. 2,833,827, German Patent No.
Listed in 2,904,626, 3,604,580 and 3,604,581
The sulfonium salt of J. V. Crivello et al, Macromorec
ules, 10 (6), 1307 (1977), J. V. Crivelloetal, J. P
olymer Sci., Polymer Chem. Ed., 17, 1047 (1979)
The described selenonium salt, C. S. Wen et al, Teh, Proc.
Conf. Rad. Curing ASIA, p478 Tokyo, Oct (1988)
Listed arsonium salts. The counter ion of the onium salt is tetrafluoride.
Boric acid, hexafluorophosphoric acid, triisopropylnaphthalene
Sulfonic acid, 5-nitro-o-toluenesulfonic acid, 5
-Sulfosalicylic acid, 2,5-dimethylbenzenesulfo
Acid, 2,4,6-trimethylbenzenesulfonic acid, 2
-Nitrobenzenesulfonic acid, 3-chlorobenzenesulfuric acid
Phosphonic acid, 3-bromobenzenesulfonic acid, 2-fluoro
Capryl naphthalene sulfonic acid, dodecyl benzene sul
Phosphonic acid, 1-naphthol-5-sulfonic acid, 2-methoxy
Ci-4-hydroxy-5-benzoyl-benzenesulfo
Acid and p-toluenesulfonic acid
The Among these, especially hexafluorophosphoric acid and triisopro
Pyrnaphthalene sulfonic acid or 2,5-dimethylbenzene
Alkyl aromatic sulfonic acids such as sulfonic acids are preferred.
is there. Suitable quinonediazides include o-quino.
And diazide compounds. Used in the present invention
The o-quinonediazide compound obtained is at least one
It is a compound having o-quinonediazide group.
Compounds with various structures that increase alkali solubility
Can be used. That is, o-quinonediazide is
Inhibition of dissolution of copolymer and novolak resin by thermal decomposition
Loss of ability and o-quinonediazide itself can be alkaline
The effect of changing to a soluble material
Help solubility. O-Quinonediazi used in the present invention
Examples of the compound include J.I. Wright by Korser
Sensitive Systems "(John Wiley & Sons. In
c.) The compounds described on pages 339 to 352 can be used.
In particular, various aromatic polyhydroxy compounds or aromatic compounds
O-Quinonediazide reacted with aromatic amino compounds
Preferred are sulfonic acid esters or sulfonic acid amides.
The It is also described in Japanese Patent Publication No. 43-28403.
Such benzoquinone (1,2) -diazidosulfonic acid chloride
Ride or naphthoquinone- (1,2) -diazide-5
-Sulfonic acid chloride and pyrogallol-acetone resin
Esters, U.S. Pat.Nos. 3,046,120 and 3,18
Benzoquinone- (1,2)-described in No. 8,210
Diazide sulfonic acid chloride or naphthoquinone
(1,2) -Diazide-5-sulfonic acid chloride and fluorine
Esters with enol-formaldehyde resin are also suitable
used. Further, naphthoquinone- (1,2) -diazi
Do-4-sulfonic acid chloride and phenol formal
Dehydric resin or cresol-formaldehyde resin
And naphthoquinone- (1,2) -diazide-
4-sulfonic acid chloride and pyrogallol-acetone tree
Ester with fat is also preferably used. Other existence
Numerous patents for o-quinonediazide compounds
Reported and known. For example, JP-A-47-5303,
Kaisho 48-63802, JP 48-63803, JP 48-96
No. 575, JP-A-49-38701, JP-A-48-13354, Special
No. 41-11222, No. 45-9610, No. 49-17481
 U.S. Pat.Nos. 2,797,213, 3,454,400,
3,544,323, 3,573,917, 3,674,495
No. 3,785,825, British Patent No. 1,227,602, No.
1,251,345, 1,267,005, 1,329,888,
No. 1,330,932, German Patent No. 854,890, etc.
The ones listed in the booklet can be mentioned. Onium salts and o-quinonediazide compounds
Addition amount of the infrared-sensitive photosensitive composition of the present invention is lithographic printing plate
When used in the photosensitive layer, the total solid content of the photosensitive layer is 1 to
50% by weight is preferred, more preferably 5-30%.
%, Particularly preferably in the range of 10 to 30% by weight. This
These compounds can be used alone, but as a mixture of several kinds.
May be used. Also, image discrimination (sparse
(Water / hydrophilic discrimination) and resistance to surface scratches
For the purpose of strengthening the drag, JP 2000-187318 A
3-20 carbon atoms in the molecule as described in the publication
Having 2 or 3 perfluoroalkyl groups (meth)
Use a polymer containing an acrylate monomer as a polymerization component
be able to. The amount of such a compound added is
Use of the infrared-sensitive composition of the invention for the photosensitive layer of a lithographic printing plate
0.1 to 10 weight with respect to the total solid content of the photosensitive layer
%, More preferably 0.5 to 5% by weight.
The In the infrared-sensitive composition of the present invention, a key is included.
For the purpose of imparting resistance to
It is also possible to add a compound that lowers. Specifically
Is used in US Pat. No. 6,117,913
Name long-chain alkyl carboxylic acid esters, etc.
I can do it. As the amount of such a compound added, the present invention
Infrared photosensitive composition is used for the photosensitive layer of a lithographic printing plate
In this case, 0.1 to 10% by weight is based on the total solid content of the photosensitive layer.
Preferably, it is 0.5 to 5% by weight. Further, in the infrared-sensitive photosensitive composition of the present invention,
Contains compounds with low molecular weight acidic groups as needed.
I don't mind. Acidic groups include sulfonic acid, carboxylic acid,
Mention may be made of phosphate groups. Above all, sulfonic acid group
The compound which has is preferable. Specifically, p-toluenes
Aromatic sulfonic acids such as sulfonic acid and naphthalene sulfonic acid
And aliphatic sulfonic acids. Further, in order to further improve the sensitivity, an annular shape is used.
Use of acid anhydrides, phenols, and organic acids in combination
it can. Examples of cyclic acid anhydrides include U.S. Pat.
Phthalic anhydride, teto described in No. 115,128
Lahydrophthalic anhydride, hexahydrophthalic anhydride,
3,6-endooxy-Δ4 -tetrahydroanhydrophthalic acid
Acid, tetrachlorophthalic anhydride, maleic anhydride, chlorine
Maleic anhydride, α-phenylmaleic anhydride, anhydrous
Succinic acid, pyromellitic anhydride, etc. can be used. As phenols, bisphenol is used.
A, p-nitrophenol, p-ethoxyphenol,
2,4,4'-trihydroxybenzophenone, 2,
3,4-trihydroxybenzophenone, 4-hydroxy
Cibenzophenone, 4,4 ', 4 "-trihydroxyto
Riphenylmethane, 4,4 ', 3 ", 4" -tetrahydr
Roxy-3,5,3 ', 5'-tetramethyltripheny
For example, rumethane. Further, as organic acids, JP-A-60-8894
2 and JP-A-2-96755, etc.
Sulfonic acids, sulfinic acids, alkyl sulfates, phosphines
Phonic acids, phosphate esters and carboxylic acids
Yes, specifically, p-toluenesulfonic acid, dodecyl
Benzenesulfonic acid, p-toluenesulfinic acid, ethyl
Sulfuric acid, phenylphosphonic acid, phenylphosphinic acid,
Phenyl phosphate, diphenyl phosphate, benzoic acid, isof
Taric acid, adipic acid, p-toluic acid, 3,4-dimeth
Xylbenzoic acid, phthalic acid, terephthalic acid, 4-cyclohe
Xene-1,2-dicarboxylic acid, erucic acid, laurin
Acid, n-undecanoic acid, ascorbic acid, etc.
The The above cyclic acid anhydrides, phenols and
And lithographic printing plate precursors
When used in the photosensitive layer, the total solid content of the photosensitive layer is 0.
05 to 20% by weight is preferable, and more preferably 0.1 to 20% by weight.
15% by weight, particularly preferably 0.1 to 10% by weight
The In addition, the infrared-sensitive composition in the present invention.
In order to increase the stability of processing against development conditions
Therefore, Japanese Patent Laid-Open No. 62-251740 and Japanese Patent Laid-Open No. 3-208514
Nonionic surfactants as described in JP-A-59
No.-121044 and JP-A-4-13149
Such amphoteric surfactants can be added. Specific examples of nonionic surfactants include so
Rubitan tristearate, sorbitan monopalmitate
, Sorbitan trioleate, monoglyceride stearate
Lido, polyoxyethylene nonylphenyl ether, etc.
Can be mentioned. Specific examples of double-sided activators include alkyl dialkyls.
(Aminoethyl) glycine, alkyl polyaminoethyl
Glycine hydrochloride, 2-alkyl-N-carboxyethyl
-N-hydroxyethyl imidazolinium betaine or N
-Tetradecyl-N, N-betaine type (eg trade name
Amorgen K, manufactured by Daiichi Kogyo Co., Ltd.) and the like. Up
Infrared sensitive infrared of nonionic surfactants and amphoteric surfactants
0.05 to 15% by weight based on the total solid content of the photosensitive composition
Preferably, it is 0.1 to 5% by weight. In the infrared-sensitive photosensitive composition in the present invention.
Bakeout to obtain a visible image immediately after heating by exposure
Or adding dyes and pigments as image colorants
it can. As print-out agent, by heating by exposure
Can form salts with acid-releasing compounds (photoacid releasing agents)
A combination of mechanical dyes can be mentioned as a representative. Concrete
Specifically, in JP-A-50-36209 and 53-8128
O-Naphthoquinonediazide-4-sulfo described
Combinations of acid halides and salt-forming organic dyes,
53-36223, 54-74728, 60-3626, 61-14
No. 3748, 61-151644 and 63-58440
And salt-forming organic compounds described in
Mention may be made of combinations of dyes. Such trihalome
Examples of chill compounds include oxazole compounds and triazides.
Both have excellent stability over time and are clear
Give a printout image. As the colorant of the image, the above-mentioned salt forming property is present.
Other dyes can be used in addition to the machine dye. Salt formation
Oil-soluble dyes and bases as suitable dyes, including organic dyes
Sex dyes can be listed. Specifically, oil yellow
-# 101, Oil Yellow # 103, Oil Pink #
312, Oil Green BG, Oil Blue BOS, Oh
Ilblue # 603, Oil Black BY, Oil Bra
BS, Oil Black T-505 (orientated
Chemical Industry Co., Ltd.), Victoria Pure Blue, Chris
Tal violet (CI42555), methyl violet
(CI42535), ethyl violet, loader
Min B (CI145170B), Malachite Green
(CI42000), methylene blue (CI5201)
5). Also, Japanese Patent Laid-Open No. 62-2932
The dye described in Japanese Patent No. 47 is particularly preferred. this
The amount of these dyes added is based on the total solid content of the infrared-sensitive composition.
On the other hand, 0.01 to 10% by weight is preferable, 0.1 to 3 times
More preferably, the amount is%. Furthermore, the infrared-sensitive composition of the present invention includes
A plasticizer is added to give flexibility of the coating film as necessary.
Can be added. For example, butylphthalyl, polyester
Tylene glycol, tributyl citrate, die phthalate
Chill, dibutyl phthalate, dihexyl phthalate, phthalate
Dioctyl phosphate, tricresyl phosphate, tributy phosphate
, Trioctyl phosphate, tetrahydrofurate oleate
Furyl, acrylic acid or methacrylic acid oligomers
And polymers are used. Infrared sensitive of the present invention
When the photosensitive composition is used for the photosensitive layer of the lithographic printing plate precursor,
The photosensitive layer may be a single layer, or JP-A-11-218914.
A two-layer structure as described in the publication may be provided. The infrared-sensitive composition of the present invention is lithographically printed.
When used for the photosensitive layer of a plate precursor, the photosensitive layer is usually
Each component is dissolved in a solvent and coated on a suitable support.
And can be manufactured. The solvent used here and
Are ethylene dichloride, cyclohexanone,
Tyl ethyl ketone, methanol, ethanol, propano
, Ethylene glycol monomethyl ether, 1-methyl
Toxi-2-propanol, 2-methoxyethyl acetate
, 1-methoxy-2-propyl acetate, dimeth
Xiethane, methyl lactate, ethyl lactate, N, N-dimethyl
Ruacetamide, N, N-dimethylformamide, Tet
Lamethylurea, N-methylpyrrolidone, dimethylsulfur
Hoxide, sulfolane, γ-butyl lactone, toluene
Etc., but is not limited to this
Absent. These solvents can be used alone or in combination.
The Concentration of the above components in the solvent (total solid content including additives)
Is preferably 1 to 50% by weight. As a coating method, various methods are used.
For example, bar coater coating, spin coating
Cloth, spray coating, curtain coating, dip coating, air
-Knife coating, blade coating, roll coating, etc.
You can. Apparent feel as the application amount decreases
However, the film properties of the photosensitive film deteriorate. The present invention
In the photosensitive layer, the interface for improving the coatability
Activators, such as those described in JP-A 62-170950
Such a fluorosurfactant can be added.
A preferable addition amount is 0.01 to 1 weight of the total photosensitive composition.
%, More preferably 0.05 to 0.5% by weight. Lithographic printing of the infrared-sensitive composition of the present invention
When used in the photosensitive layer of a plate precursor, it is suitable for use in the planographic printing plate.
The support is not particularly limited, but the required strength
Dimensionally stable plates with durability and examples
For example, paper, plastic (eg, polyethylene, poly
Propylene, polystyrene, etc.) laminated paper,
Metal plate (eg, aluminum, zinc, copper, etc.), plus
Tick film (eg cellulose diacetate,
Roulose, cellulose propionate, cellulose butyrate,
Cellulose acetate butyrate, cellulose nitrate, polyethylene
Phthalate, polyethylene, polystyrene, polypro
Pyrene, polycarbonate, polyvinyl acetal
Etc.) The above metals are laminated or vapor-deposited.
Included paper or plastic film. Lithographic printing of the infrared-sensitive composition of the present invention
As a support when used in the photosensitive layer of an original plate
Polyester film or aluminum plate is preferred
Among them, it has good dimensional stability and is relatively inexpensive.
A ruminium plate is particularly preferred. Suitable aluminum plate
Is mainly composed of pure aluminum plate and aluminum,
It is an alloy plate containing a small amount of foreign elements, and aluminum
With laminated or vapor-deposited plastic film
Also good. The foreign elements contained in the aluminum alloy include
Elemental, iron, manganese, copper, magnesium, chromium, zinc,
Bismuth, nickel, titanium, etc. Heterogeneity in alloys
The elemental content is at most 10% by mass. Especially suitable
Luminium is pure aluminum but completely pure
Aluminum is difficult to manufacture due to refining technology.
May contain a different element. Thus, the present invention
Infrared photosensitive composition used for photosensitive layer of lithographic printing plate precursor
The composition of the aluminum plate applied when
Aluminum that has been publicly known and publicly used
A nickel plate can be used as appropriate. Used in the present invention
The thickness of the resulting aluminum plate is approximately 0.1 mm to 0.
About 6 mm, preferably 0.15 mm to 0.4 mm
It is preferably 0.2 mm to 0.3 mm. The infrared-sensitive composition of the present invention is lithographically printed.
When using it for the photosensitive layer of the original plate,
When used, the aluminum plate may be roughened.
When roughening the aluminum plate, prior to roughening
E.g. to remove surface rolling oil if desired
Surface active agent, organic solvent or alkaline aqueous solution.
The degreasing process is performed. Surface roughening of aluminum plate
The processing can be performed by various methods, for example, mechanical
Surface roughening method, electrochemically dissolving and roughening the surface
By a method and a method of selectively dissolving the surface chemically.
It is. Mechanical methods include ball polishing and brush polishing
A known method such as a polishing method, a blast polishing method, or a buff polishing method.
Can be. In addition, as an electrochemical roughening method
Is a method of alternating current or direct current in hydrochloric acid or nitric acid electrolyte
There is. Also disclosed in Japanese Patent Laid-Open No. 54-63902.
As well as using a combination of both
Can do. Such a roughened aluminum plate is essential.
Alkaline etching treatment and neutralization treatment were performed as needed
Later, if desired, to increase the water retention and wear resistance of the surface
Anodizing treatment is performed. Anodizing of aluminum plate
A porous oxide film is formed as the electrolyte used for processing.
It is possible to use various types of electrolytes.
Acid, succinic acid, chromic acid or their mixed acids are used.
The The concentration of those electrolytes depends on the type of electrolyte.
It is decided. The anodizing treatment conditions depend on the electrolyte used.
However, in general, it cannot be specified.
Solution concentration is 1-80% by mass solution, liquid temperature is 5-70 ° C.,
Current density 5-60A / dm², Voltage 1-100V, electrolysis
A time range of 10 seconds to 5 minutes is appropriate. anodization
The amount of film is 1.0 g / m²If it is less, the printing durability is insufficient.
Or scratches on the non-image area of the planographic printing plate
The so-called `` scratch that ink adheres to the scratched part during printing
Dirt "tends to occur. After anodizing,
The ruminium surface is subjected to a hydrophilic treatment if necessary. Book
As the hydrophilization treatment used in the invention, US Pat.
No. 714,066, No. 3,181,461, No. 3,
Disclosed in 280,734 and 3,902,734.
Alkali metal silicates such as silica
Sodium aqueous solution) method. In this method,
The holder is soaked with an aqueous sodium silicate solution, or
Electrolytically treated. In addition, in Japanese Patent Publication No. 36-22063
Disclosed potassium fluoride zirconate and US patents
No. 3,276,868, No. 4,153,461,
Poly as disclosed in US Pat. No. 4,689,272
A method of treating with vinylphosphonic acid is used. The infrared-sensitive composition of the present invention is lithographically printed.
When used in the photosensitive layer of the original plate,
An undercoat layer can be provided between the optical layer. Undercoat layer component
Various organic compounds are used as, for example, carbo
Xymethylcellulose, dextrin, gum arabic,
Phosphorus having an amino group such as 2-aminoethylphosphonic acid
Sphonic acids, optionally substituted phenylphosphones
Acid, naphthylphosphonic acid, alkylphosphonic acid, glyce
Lophosphonic acid, methylenediphosphonic acid and ethylenedi
Organic phosphonic acid such as phosphonic acid, may have a substituent
Phenyl phosphate, naphthyl phosphate, alkyl phosphate
And organic phosphoric acid such as glycerophosphoric acid, with substituents
Phenylphosphinic acid, naphthylphosphinic acid,
Alkylphosphinic acid and glycerophosphinic acid
Organic phosphinic acid, glycine and β-alanine
Such as mino acids and hydrochloride of triethanolamine
Selected from hydrochlorides of amines having a hydroxy group
However, you may use it in mixture of 2 or more types. This organic undercoat should be provided by the following method.
You can. Water or methanol, ethanol,
Organic solvents such as methyl ethyl ketone or mixtures thereof
A solution in which the above organic compound is dissolved in a solvent mixture is mixed with aluminum.
A method of coating and drying on a metal plate and water or
Organic solvents such as diol, ethanol and methyl ethyl ketone
Dissolve the above organic compounds in the agent or solvent mixture
An aluminum plate is immersed in the solution so that the above compound is added.
Adsorbed, then washed with water etc., dried and organic
This is a method of providing a coating layer. In the former method, the above organic
Various concentrations of the compound from 0.005 to 10% by weight
It can be applied by the method. In the latter method, the concentration of the solution is
0.01 to 20% by weight, preferably 0.05 to 5% by weight
The immersion temperature is 20 to 90 ° C., preferably 25 to 5
0 ° C., immersion time is 0.1 second to 20 minutes, preferably
2 seconds to 1 minute. The solution used for this is ammonia,
Basic substances such as triethylamine and potassium hydroxide
PH 1-12 due to acidic substances such as hydrochloric acid and phosphoric acid
The range can also be adjusted. Also, infrared sensitive group
Adding yellow dye to improve the tone reproducibility of the composition
You can also. The coating amount of the organic undercoat is 2 to 200 mg / m²
Is suitable, preferably 5 to 100 mg / m²In
The The above coating amount is 2 mg / m²Less than enough
Printing durability cannot be obtained. 200 mg / m²Greater
It is the same even if you ask. A positive type lithographic plate produced as described above.
The printing plate precursor is usually subjected to image exposure and development.
The active light source used for image exposure is near infrared.
A light source having an emission wavelength in the infrared region is preferable, and a solid state laser
The semiconductor laser is more preferable. As the emission wavelength,
700-1200 nm is preferable, 760-850 nm
Is more preferable. The developer of the present invention contains a development inhibitor.
An alkaline developer having a pH of 11 or more
Are preferred. The alkaline developer of the present invention is presently used.
It is preferable to contain an image suppressor. What is development inhibition?
As described later, the immersion time in the alkaline developer is extended.
In general, such performance is in the surfactant.
Therefore, it expresses. For example, cationic, anionic,
Nonionic or amphoteric surfactants as development inhibitors
Can be mentioned. Hereinafter, development inhibitors, particularly surfactants will be described.
I will explain. Specific examples of cationic surfactants
For example, lauryltrimethylammonium chloride
, Cetyltrimethylammonium chloride, steer
Ryltrimethylammonium chloride, behenyltri
Methyl ammonium chloride, distearyl dimethyl
Ammonium chloride, perfluorotrimethylan
Monium chloride, lauryl pyridinium chloride
Quaternary ammonium salts such as 2-octadecyl-hydride
Induction of imidazolines such as loxyethyl-2-imidazoline
Body, N, N-diethyl-stearamide-methylamino
Such as dihydrochloride, polyoxyethylene stearylamine
Min salts can be mentioned. Further, as anionic surfactants, laur
Sodium phosphate, sodium stearate, olein
Higher fatty acid salts such as sodium acid, sodium lauryl sulfate
Almum sulfate esthetics such as sodium and sodium stearyl sulfate
Salts, sodium octyl alcohol sulfate,
Sodium lauryl alcohol sulfate, lauryl
High grade alcohol such as ammonium alcohol sulfate ester
Sulfate esters, acetyl alcohol sulfate
Aliphatic alcohol sulfates such as sodium,
Alkylbens such as sodium decylbenzenesulfonate
Zen sulfonates, isopropyl naphthalene sulfone
Alkyl naphthalene sulfonates such as sodium acid,
Sodium alkyldiphenyl ether disulfonate, etc.
Alkyl diphenyl ether disulfonates, laur
Sodium ril phosphate, sodium stearyl phosphate, etc.
Rukyll phosphates, sodium lauryl ether sulfate
Um polyethylene oxide adduct, lauryl ether
Polyethylene oxide adduct of ammonium sulfate
Polyethylene of lauryl ether sulfate triethanolamine
Polyalkylene sulfate adducts such as lenoxide adducts
Liethylene oxide adducts, nonylphenyl ether
Sodium disulfate polyethylene oxide adduct, etc.
Polyethylene oxalate of alkyl phenyl ether sulfate
Id adducts, poly (sodium lauryl ether)
Alkyl ether phosphates such as ethylene oxide adducts
Polyethylene oxide adducts, nonylphenyl ether
-Sodium oxide phosphate adduct with polyethylene oxide
Alkyl phenyl ether phosphate polyethylene
Xide adducts and the like can be mentioned. In addition, as the nonionic surfactant, poly
Ethylene glycol, polyethylene glycol polypro
Polyethylene such as pyrene glycol block copolymer
Glycols, polyethylene glycol cetylate
Polyethylene glycol stearyl ether, poly
Ethylene glycol oleyl ether, polyethylene group
Polyethylene glycol such as recall behenyl ether
Alkyl ethers, polyethylene glycol polypro
Pyrene glycol cetyl ether, polyethylene glycol
Polypropylene glycol decyl tetradecyl A
Polyethylene glycol polypropylene glyco such as Tell
Alkyl ethers, polyethylene glycol oct
Tylphenyl ether, polyethylene glycol nonyl
Polyethylene glycol alkyl such as phenyl ether
Phenyl ethers, ethylene glycol monostearate
, Ethylene glycol distearate, stearin
Diethylene glycol acid, polyethylene distearate
Glycol, polyethylene glycol monolaurate,
Polyethylene glycol monostearate, mono olei
Polyethylene glycol such as polyethylene glycolate
Fatty acid esters, glyceryl monomyristate,
Glyceryl nostearate, glyceryl monoisostearate
Seryl, glyceryl distearate, monooleate
Glycerin fats such as lyseryl and glyceryl dioleate
Acid esters and their polyethylene oxide adducts
Sorbitan monopalmitate, sodium monostearate
Rubitan, sorbitan tristearate, monoolein
Sorbitan such as sorbitan acid, sorbitan trioleate
Fatty acid esters and polyethylene oxide thereof
Additives, sorbitol monolaurate, tetrasteary
Acid sorbite, hexastearate sorbite, tet
Sorbit fatty acid esters such as sorbite laoleate
, And its polyethylene oxide adducts, castor
Examples include polyethylene oxide adducts of oil.
it can. In addition, as the amphoteric surfactant, N-lauri is used.
Ru-N, N-dimethyl-N-carboxymethylammoni
, N-stearyl-N, N-dimethyl-N-carbo
Ximethylammonium, N-lauryl-N, N-dihi
Droxyethyl-N-carboxymethylammonium,
N-lauryl-N, N, N-tris (carboxymethyl)
E) Betaine-type compounds such as ammonium, 2-alkyl
Ru-N-carboxymethyl-N-hydroxyethylimi
Imidazolium salts such as dazolium, imidazoline-N
-Sodium ethyl sulfonate, imidazoline-N-
Imidazolines such as sodium ethyl sulfate
Can be mentioned. Among the above surfactants, in the present invention,
Is a quaternary ammonia as a cationic surfactant.
Umum salts and various types of nonionic surfactants
Liethylene glycol derivatives, various polyethylenes
Polyethylene oxide derivatives such as oxide adducts
Preferred are betaine-type compounds as amphoteric surfactants.
Good. In addition, the alkaline developer in the present invention is
The pH is preferably 11 or more, but more preferably
Is 12.5 to 14.0. pH is less than the above range
Causes poor exposure, and narrows the range of development conditions.
To do. The developer of the present invention is conventionally known.
Alkaline aqueous solution can be used. For example, sodium silicate
Thorium, potassium, tribasic sodium phosphate, potassium
Um, ammonium, dibasic sodium phosphate, potassium
Um, ammonium, sodium carbonate, potassium,
Same ammonium, sodium bicarbonate, potassium, same
Ammonium, sodium borate, potassium, an
Monium, sodium hydroxide, ammonium, potassium
Inorganic alkali salts such as um and lithium
The Monomethylamine, dimethylamine, trimer
Tylamine, monoethylamine, diethylamine, tri
Ethylamine, monoisopropylamine, diisopropyl
Luamine, triisopropylamine, n-butylamino
Monoethanolamine, diethanolamine, triethanol
Ethanolamine, monoisopropanolamine, dii
Sopropanolamine, ethyleneimine, ethylenedia
Organic alkali agents such as min and pyridine are also used. These alkali agents may be used alone or in combination of two or more.
Used in combination with the above. Of these alkaline agents
Among them, particularly preferred developers are sodium silicate and silicic acid.
It is an aqueous solution of silicate such as potassium. The reason is silicic acid
Silicon oxide SiO which is a component of salt₂And alkali metal oxides
(M₂O) The developability can be adjusted by the ratio and density.
For example, Japanese Patent Laid-Open No. 54-62004
As described in Japanese Patent Publication No.57-7427
An effective alkali metal silicate is used. Further, when developing using an automatic processor
Is an aqueous solution (replenisher) with higher alkali strength than the developer.
In the developer tank for a long time by adding
A large amount of lithographic printing plates can be processed without changing the developer.
It is known that This replenishment method is also used in the present invention.
Is preferably applied. Developer and replenisher include developer
Promotion and suppression, dispersion of development residue, and printing plate image area
In order to improve the ink affinity, various surface activity
Sexual agents and organic solvents can be added. Furthermore, as necessary for the developer and replenisher.
Hydroquinone, resorcin, sulfite, hydrogen sulfite
Reduction of sodium and potassium salts of inorganic acids such as acids
Add organic carboxylic acid, antifoaming agent, water softener
You can also The developer of the present invention contains the alkali.
In addition to the surfactant and the surfactant, if necessary, hard water
It may contain additives such as softeners, pH adjusters and antifoaming agents.
You can. These additives can be used in alkaline developers.
Preferably it is 0.001-5 mass%, Most preferably, it is 0.00.
It can be contained at a concentration of 005 to 3% by mass.
Development is immersion development, spray development, brush development, super development.
Usually, preferably about 10 to 50 ° C. by sonic development or the like.
Degree, particularly preferably at a temperature of about 20-40 ° C.
The Sensation using the infrared-sensitive composition of the present invention
For light lithographic printing plates, image exposure, development, and water washing
And / or lithographic plates obtained by rinsing and / or gumming
Unnecessary image areas on the printing plate (for example, original film fill
Unneeded image areas, etc.)
Is deleted. Such erasure is, for example,
Erasing solution as described in JP-A-2-13293
I applied it to an unnecessary image area and left it for a predetermined time.
A method of washing with water is preferred, but
An audio system such as that described in Japanese Patent Laid-Open No. 59-174842.
Unnecessary image of actinic ray guided by optical fiber
A method of developing after irradiating the part can also be used. The lithographic printing plate obtained as described above is
Applying desensitized gum as desired, then use in printing process
Lithographic printing plates with even higher printing durability
If so, a burning process is performed. Lithographic printing plate
If you are burning, before the burning
-2518, 55-28062, JP 62-3
1859 and 61-159655.
It is preferable to treat with a surface-conditioning liquid as described above. That
As a method, sponge or degreasing soaked with the surface-adjusting liquid is used.
Coated with lithographic printing plate with cotton or filled with surface-conditioning liquid
A method of immersing the printing plate in a vat and applying it
The application with a filter is applied. Also after applying
Application amount with squeegee or squeegee roller
Is more preferable. The coating amount of the surface conditioning liquid is generally 0.03 to 0.8.
g / m²(Dry weight) is appropriate. The surface-adjusting solution is applied
If necessary, the planographic printing plate is dried and then burned.
Processor (for example, Fuji Photo Film Co., Ltd.)
Burning processor on sale: “BP-130
0 ") or the like. In this case, the heating temperature and
Depending on the type of ingredients that form the image,
The range of 1 to 20 minutes is preferable in the range of 180 to 300 ° C.
Yes. A lithographic printing plate that has been burned is necessary.
Depending on the conventional method, washing with water, gumming, etc.
Can be treated with water-soluble polymer compounds
If a surface-conditioning liquid containing materials is used, gumming
So-called desensitizing treatment such as can be omitted.
The lithographic printing plate obtained by such treatment is offset
It is applied to a printing machine and used for printing a large number of sheets. [0128] The present invention will be described in detail with reference to the following examples.
However, the present invention is not limited to these. << Production of Support >> JIS-A-105 with a thickness of 0.3 mm
Combine the following steps using 0 aluminum plate
The support A, B, C, D, E is produced by processing
It was. (A) Mechanical roughening treatment Polishing suspension of abrasive (silica sand) with specific gravity of 1.12 and water
While supplying the slurry liquid to the surface of the aluminum plate
And a mechanical roller rough nylon brush
Surfaced. The average particle size of the abrasive is 8μm and the maximum particle size is
It was 50 μm. The material of nylon brush is 6 · 10
Iron, hair length 50mm, hair diameter is 0.3mm
It was. Nylon brush is a 300mm stainless steel tube
The hair was planted so as to be dense with a hole. 3 rotating brushes
Used this book. Two support rollers at the bottom of the brush (φ200
mm) was 300 mm. Brush roller
The load of the drive motor that rotates the brush
7 kW against the load before pressing against the aluminum plate
Pressed until it was positive. The direction of brush rotation is
The direction of movement of the ruminium plate was the same. Brush rotation
The number was 200 rpm. (B) Alkali etching treatment NaOH having a temperature of 70 ° C. was applied to the aluminum plate obtained above.
Aqueous solution (concentration 26 wt%, aluminum ion concentration 6.
5 wt%) is sprayed and etched
Minium plate 6g / m²Dissolved. Then use well water
The water was washed by spraying. (C) Desmut processing 1% by weight aqueous solution of nitric acid with a temperature of 30 ° C.
Contains 0.5% by weight of ON. )
And then washed with water by spraying. Said de
The aqueous nitric acid solution used for the smut is exchanged in the aqueous nitric acid solution.
The waste liquid from the process of electrochemical surface roughening was used. (D) Electrochemical roughening treatment Continuous electrochemical rough surface using 60Hz AC voltage
The treatment was performed. The electrolyte at this time was 10.5 g of nitric acid.
/ Liter aqueous solution (5g / lit of aluminum ions
The temperature was 50 ° C. The AC power supply waveform has a current value of zero.
Time from peak to peak reaches TP 0.8mse
c, DUTY ratio 1: 1, trapezoidal rectangular wave AC
-Electrochemical roughening treatment with the Bon electrode as the counter electrode
It was. Ferrite was used for the auxiliary anode. Electrolyzer used
A radial cell type was used. Current density is electric
30 A / dm at the peak value of the flow²The quantity of electricity is aluminum
The total amount of electricity when the plate is an anode is 220 C / dm²So
It was. The auxiliary anode shunts 5% of the current flowing from the power source
It was. Then, wash with water using well water
It was. (E) Alkali etching treatment Aluminum plate with caustic soda concentration of 26% by weight, aluminum
Etching by spray at a concentration of 6.5% by weight of nium ions
Processing at 32 ° C. and 0.20 g of aluminum plate
/ M²Dissolve and electrochemical roughening using the previous stage alternating current
Mainly made of aluminum hydroxide produced when
The smut component is removed and the generated pit edge is removed.
The edge portion was melted to smooth the edge portion. after that,
Water washing by spraying was performed using well water. (F) Desmut treatment 15% by weight aqueous solution of sulfuric acid at a temperature of 30 ° C. (aluminum
Contains 4.5% by weight of ions. ) And spray death
Perform mat treatment, then spray water with well water
Washed. The aqueous nitric acid solution used for the desmut is nitric acid water.
Process of electrochemical surface roughening using alternating current in solution
Waste liquid was used. (G) Electrochemical roughening treatment Continuous electrochemical rough surface using 60Hz AC voltage
The treatment was performed. The electrolyte at this time was 7.5 g of hydrochloric acid /
Liter aqueous solution (aluminum ion 5g / liter
Including. ), And the temperature was 35 ° C. AC power supply waveform is rectangular
Electrochemical roughening with carbon electrode as counter electrode
Processed. Ferrite was used for the auxiliary anode.
The electrolytic cell used was a radial cell type. Current density
Degree is 25A / dm at peak current²The amount of electricity is aluminum
50C / dm as the total amount of electricity when the nickel plate is the anode²In
It was. Then, wash with water using well water
It was. (H) Alkali etching treatment Aluminum plate with caustic soda concentration of 26% by weight, aluminum
Etching by spray at a concentration of 6.5% by weight of nium ions
Processing at 32 ° C. and 0.10 g of aluminum plate
/ M²Dissolve and electrochemical roughening using the previous stage alternating current
Mainly aluminum hydroxide produced during processing
Remove the smut component and also generate pits
The edge portion was melted to smooth the edge portion. That
Thereafter, water was washed by spraying using well water. (I) Desmut treatment 25% by weight aqueous solution of sulfuric acid at 60 ° C (aluminum
Contains 0.5% by weight of ions. ) And spray death
Perform mat treatment and then spray with well water.
The water was washed. (J) Anodizing treatment Sulfuric acid was used as the electrolytic solution. All electrolytes are sulfur
Acid concentration 170 g / liter (aluminum ions
Contains 5% by weight. ), The temperature was 43 ° C. Then well
Water was washed by spraying with water. Current density is
About 30A / dm²Met. The final oxide film amount is
2.7 g / m²Met. <Support A> Steps (a) to (j) above
The etching amount in step (e) is 3.5 g.
/ M²Thus, a support was prepared. <Support B> Of the above steps, steps (g), (h) and (i)
Except omitting, each step was performed in order to prepare a support. <Support C> Of the above steps (a) and (g) (h)
Except that the step (i) is omitted, each step is performed in order and the support
Was made. <Support D> Of the above steps, (a) and
(D) (e) The steps were sequentially performed except that the step (f) was omitted.
The total amount of electricity in step (g) is 450 C /
dm²Thus, a support was prepared. Supports A, B, C, D obtained as above are continuously
The hydrophilic treatment and undercoat treatment described above were performed. (K) Alkali metal silicate treatment The temperature of the aluminum support obtained by anodizing treatment
In the treatment layer of 1 wt% aqueous solution of No. 3 sodium silicate at 30 ° C
To alkali metal silicate by soaking for 10 seconds
Processing (silicate processing) was performed. Then use well water
Washed with water by spray. With silicate at that time
Wearing amount is 3.5mg / m²Met. [(1) Formation of Undercoat] As described above
The obtained aluminum support after alkali metal silicate treatment
An undercoat liquid having the composition shown below is applied onto the holder, and 15 ° C. at 15 ° C.
Dry for 2 seconds. The coating amount after drying is 15 mg / m²So
It was. [0141] <Undercoat liquid composition>   The following polymer compound 0.3g   Methanol 100g   1g of water [0142] Embedded image (Examples 1 to 14 and Comparative Examples 1 to 4)
The following photosensitive solution A was applied to the support and the orb at 150 ° C.
After drying for 1 minute, the dry film thickness is 2.0 g / m²Positive feeling
Producing a lithographic printing plate precursor having an infrared photosensitive composition layer
did. [0144] [Photosensitive solution A] M, p-cresol novolak (m / p ratio = 6/4,   Weight average molecular weight 7500, containing 0.5% by weight of unreacted cresol) 0.90 g ・ The following binder A 0.10g ・ The following photothermal conversion substance (cyanine dye A) 0.04 g 2,4,6-tris (hexyloxy) benzenediazonium-2-hydroxy Ci-4-methoxybenzophenone-5-sulfonate 0.01 g ・ 0.002 g of p-toluenesulfonic acid ・ Tetrahydrophthalic anhydride 0.05 g ・ Counter anion of Victoria Pure Blue BOH   0.015 g of dye converted to 1-naphthalenesulfonic acid anion -Copolymer (A) of the present invention (described in Table 3) 0.02 g -(B) copolymer of the present invention (described in Table 3) 0.03 g ・ Methyl ethyl ketone 15g ・ 7g of 1-methoxy-2-propanol [0145] Embedded image [0146] Embedded image (Examples 15 to 25)
Apply the lower Photosensitizer B and dry in an oven at 150 ° C for 1 minute
After that, the dry film thickness is 2.0 g / m²Positive-type infrared sensitive
A lithographic printing plate precursor having a composition layer was prepared. [0148] [Photosensitive solution B] M, p-cresol novolak (m / p ratio = 6/4,   Weight average molecular weight 7500, containing 0.5% by weight of unreacted cresol) 0.95g ・ The following binder B 0.05g ・ Photothermal conversion substance (cyanine dye A) 0.04 g ・ 2,4,6-Tris (hexyloxy) benzenediazonium-2-hydroxy -4-methoxybenzophenone-5-sulfonate 0.01 g ・ P-Toluenesulfonic acid 0.002 g ・ Tetrahydrophthalic anhydride 0.05g ・ The counter anion of Victoria Pure Blue BOH is 1-naphthalene     Dye converted to sulfonate anion 0.015 g -Copolymer (A) of the present invention (described in Table 3) 0.02 g -Copolymer (B) of the present invention (described in Table 3) 0.02 g ・ Methyl ethyl ketone 15g ・ 7g of 1-methoxy-2-propanol <Binder B> Diisosodium as shown in Table 1
Cyanate, using the diol compound shown in [Table 2]
Thus, Binder B was synthesized. Acid content measured by titration
Table 2 shows the amount and molecular weight measured by GPC.
The [0150] [Table 1] [0151] [Table 2] << Evaluation of original plate for lithographic printing plate >> [Evaluation of the surface state of the photosensitive layer coating surface]
For the plate printing plate precursor, visually check the surface of the photosensitive layer coating surface.
Observed. 6 pinholes per square meter
Less than "good", 6 to less than 10
“Normal” and 10 or more were considered “evil”. Pinho
Even if there is no film, the entire surface is mottled and becomes a non-uniform film.
Was “non-uniform”. The evaluation results are shown in Table 3. [Evaluation of development latitude] The obtained lithographic plate
The original plate for printing is used as a Trend setter manufactured by Creo
Test with a beam intensity of 9W and drum rotation speed of 150rpm
The pattern was drawn in the form of an image. Then the following
Fuji Photo Film with an alkaline developer of composition
Using PS processor 900H manufactured by Co., Ltd., the liquid temperature is 30
Development was performed at a development time of 20 seconds while maintaining the temperature. Conductivity of developer
In the higher direction from the reference developer, sodium hydroxide
Are added in small portions to change the carbon dioxide gas in the lower direction.
It was made to fluctuate by dissolving. At this time, the image part is eluted.
And stains and coloring caused by poorly developed photosensitive layer residual film
The highest conductivity of the developer that was able to develop well without any
The lowest difference is evaluated as the development latitude.
It was. The results are shown in Table 3. [0154] <Alkali developer A composition> ・ SiO₂・ K₂O (K₂O / SiO₂= 1/1 (molar ratio)) 4.0 wt% ・ Citric acid 0.5% by weight ・ Polyethylene glycol lauryl ether (weight average molecular weight 1,000)   ("Pionine D-1107" manufactured by Takemoto Yushi Co., Ltd.)                                                           0.5% by weight ・ Water 95.0% by weight <Alkali developer B composition> ・ D sorbite 2.5% by weight -Sodium hydroxide 0.85% by weight ・ Polyethylene glycol lauryl ether (weight average molecular weight 1,000)   ("Pionine D-1107" manufactured by Takemoto Yushi Co., Ltd.)                                                             0.5% by weight ・ Water 96.15% by weight [0155] [Table 3] (A) Copolymer in Table 3 and (B)
The composition of the copolymer is shown below. [0157] [Table 4] As is apparent from Table 3, the examples of the present invention
1 to 25, compared with Comparative Examples 1 to 4, the coated surface of the photosensitive layer surface
The shape is excellent and the development latitude is excellent.
It was. [0159] According to the present invention, the exposure of a lithographic printing plate precursor is performed.
When used as a layer, the coated surface of the layer is good, and
Processability with fatigue developer with reduced activity (development latitude
To provide an infrared-sensitive composition that excels in
Yes.

─────────────────────────────────────────────────── ─── Continued on the front page (51) Int.Cl. ⁷ Identification symbol FI Theme code (reference) C08F 290/04 C08F 290/04 290/06 290/06 G03F 7/00 503 G03F 7/00 503 7/039 501 7/039 501 F-term (reference) 2H025 AA04 AB03 AC08 AD03 CB29 CC04 CC20 FA03 FA17 2H096 AA07 AA08 BA16 BA20 EA04 GA08 4J027 AA08 AC03 AC04 AC06 AC09 AJ01 BA04 BA07 BA08 BA14 BA17 BA22 CB10 CC04 CD70 CG10 CC04 CDS AG10S AJ01S AJ08S AL03S AL08P AL08Q AL08R AL08S AL09S AL26P AL44S AM02S AM15S AM17S AM19S AM21P AM21S BA03Q BA03R BA03S BA04Q BA04R BA04S BA06Q BA08Q BA08R BA31S BA51P BB01 BC53 BC01 BC43 DA01

Claims (1)

What is claimed is: (A) at least the following (i) and (ii):
(I) a monomer having a partial structure represented by the following general formula (1), (ii) a compound represented by the following general formula (2) A monomer corresponding to the repeating unit (B), a fluoroaliphatic group-containing copolymer obtained by copolymerizing at least a monomer containing the following (i) and (ii): (i) in the following general formula (1) A monomer having a partial structure represented, (ii) a monomer corresponding to a repeating unit represented by the following general formula (3), comprising an infrared-sensitive composition. [Chemical 1] (In General Formula (1), R ₂ and R ₃ are each independently
A hydrogen atom, an alkyl group having 1 to 4 carbon atoms, X represents a single bond or a divalent linking group, m is an integer of 0 or more,
n represents an integer of 1 or more. ) [Chemical formula 2] (In the general formula (2), R ₄ is a hydrogen atom having 1 to 1 carbon atoms.
4 represents an alkyl group, t is an integer of 3 or more, u is 2 to
Represents an integer of 6. ) [Chemical formula 3] (In the general formula (3), R ₅ is a hydrogen atom having 1 to 1 carbon atoms.
Four alkyl groups are represented. R ₆ represents a hydrogen atom, an alkyl group or an aryl group. o, p, q, r, and s are each independently an integer of 1 to 4, and o and p are not the same.
a and b are each independently an integer of 4 or more. c, d,
Each e independently represents an integer of 0 or 1 or more. )