JP2003234381A - Display device - Google Patents

Display device

Info

Publication number
JP2003234381A
JP2003234381A JP2002029343A JP2002029343A JP2003234381A JP 2003234381 A JP2003234381 A JP 2003234381A JP 2002029343 A JP2002029343 A JP 2002029343A JP 2002029343 A JP2002029343 A JP 2002029343A JP 2003234381 A JP2003234381 A JP 2003234381A
Authority
JP
Japan
Prior art keywords
flexible substrate
pattern
pitch
mounting
display device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2002029343A
Other languages
Japanese (ja)
Other versions
JP3875569B2 (en
Inventor
Tsutomu Matsudaira
努 松平
Yoshihiro Makita
吉弘 蒔田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Seiko Instruments Inc
Original Assignee
Seiko Instruments Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Seiko Instruments Inc filed Critical Seiko Instruments Inc
Priority to JP2002029343A priority Critical patent/JP3875569B2/en
Publication of JP2003234381A publication Critical patent/JP2003234381A/en
Application granted granted Critical
Publication of JP3875569B2 publication Critical patent/JP3875569B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Abstract

<P>PROBLEM TO BE SOLVED: To provide the microconnection of a flexible substrate and an IC. <P>SOLUTION: As for the extension of a biaxially extended polyimide film 1 when it is mounted, the cumulative pitch dimension of a pattern is corrected in a state of separating MD and TD directions of FPC. Then, the pattern 2 is no longer dislocated when the IC 4 and the flexible substrate are mounted, so that a microconnection of a 30 μm pitch, etc., is stabilized. Thus, a low-cost display device can be provided by cost reduction accompanying the miniaturization of the IC. <P>COPYRIGHT: (C)2003,JPO

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【発明の属する技術分野】本発明は、携帯機器等や、電
子手帳に使用されているパッシブマトリクス液晶パネル
やアクティブマトリクス液晶パネルや、有機ELなどの
表示パネルを駆動するためのドライバICやメモリー、
コントローラ等のフェイスダウン実装している表示装置
及びその実装方法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a driver IC and a memory for driving a display panel such as a passive matrix liquid crystal panel or an active matrix liquid crystal panel used for a portable device or an electronic notebook, an organic EL, and the like.
The present invention relates to a face-down mounted display device such as a controller and a mounting method thereof.

【0002】[0002]

【従来の技術】従来、表示装置を駆動するための半導体
ICのフェイスダウン実装は、ポリイミドをベースとし
たフレキシブル基板に、接着を用いて接続する場合、I
CのパットにAuからなるバンプをメッキで形成したメ
ッキバンプやワイヤーボンディングを応用したスタッド
バンプを用いて、回路基板に異方性導電膜で圧着する
か、または銀ペーストをバンプに転写して基板と接続
し、その間にアンダーフィルを充填し接続していた。
2. Description of the Related Art Conventionally, in face-down mounting of a semiconductor IC for driving a display device, when connecting to a polyimide-based flexible substrate by adhesion, I
Using a plated bump formed by plating a bump made of Au on the pad of C or a stud bump applied by wire bonding, it is pressure-bonded to the circuit board with an anisotropic conductive film, or a silver paste is transferred to the bump and the substrate is transferred. It was connected with and was filled with underfill in between.

【0003】また、金属拡散接続を用いた場合、ICの
バンプに半田を用い、基板の電極に半田付けしアンダー
フィルを充填する工法とICのバンプにAuを用い基板
側の電極にSnメッキを行い、Au−Sn共晶接続を行
い、アンダーフィルを充填していた。
When metal diffusion connection is used, solder is used for the bumps of the IC, solder is applied to the electrodes of the substrate to fill the underfill, and Au is used for the bumps of the IC and Sn plating is applied to the electrodes on the substrate side. The Au-Sn eutectic connection was performed and the underfill was filled.

【0004】近年、表示パネルを駆動するICには、バ
ンプピッチは45μmピッチ、電極数は900のドライ
バICが量産されている。通常、45μmピッチを実装
するために、Au−Sn共晶接続が最も適した接続工法
として用いられている。フレキシブル基板は、2軸延伸
して作ったポリイミドフィルムに銅を密着するためのニ
ッケルなどからなるシード層を1000Åスパッタし、
続けて銅を2000Åスパッタリングする。電極の総厚
が約8μmになるように電解メッキをする。フォト法を
用いてパターニングし、無電解スズメッキを0.2μm
つける。ソルダーレジストを形成してフレキシブル基板
は完成し、ICをフェイスダウンで加熱加圧して接続を
完了する。補強と耐腐蝕性を確保するためにアンダーフ
ィルを注入硬化し、抵抗やコンデンサをSMT実装し、
異方性導電膜を用いて表示パネルと接続して完成する。
In recent years, a driver IC having a bump pitch of 45 μm and an electrode number of 900 has been mass-produced as an IC for driving a display panel. Usually, Au-Sn eutectic connection is used as the most suitable connection method for mounting a 45 μm pitch. The flexible substrate is a biaxially stretched polyimide film that is sputtered with 1000 Å of a seed layer made of nickel for adhering copper,
Then, sputter 2000 liters of copper. Electrolytic plating is performed so that the total thickness of the electrodes is about 8 μm. 0.2 μm electroless tin plating after patterning using photo method
Put on. The flexible substrate is completed by forming the solder resist, and the IC is heated and pressed face down to complete the connection. Inject and harden underfill to secure reinforcement and corrosion resistance, mount resistors and capacitors with SMT,
It is completed by connecting to a display panel using an anisotropic conductive film.

【0005】[0005]

【発明が解決しようとする課題】ドライバICは年々小
型化が進み、30μmピッチのバンプ配置で、電極数も
1000ピンを超えるICでは、フレキシブル基板、実
装位置ズレが発生した。ズレは、ICとFPCの累積ピ
ッチが合わなく、センターは合うが、端部が合わない現
象であった。
Driver ICs have been miniaturized year by year, and bumps with a pitch of 30 .mu.m and ICs with more than 1000 electrodes have a displacement of the flexible substrate and mounting position. The deviation was a phenomenon in which the integrated pitches of the IC and the FPC did not match, the centers matched, but the edges did not match.

【0006】ズレの原因は、主に実装工法により加熱条
件と加圧条件は異なるが、実装時の熱でフレキシブル基
板が熱変形を起こすために生ずる。特にAu−Sn共晶
接続では、接続部温度を350〜380℃に加熱するた
め、耐熱性の高いポリイミドを用いたとしてもズレが生
ずる。ズレの対策として、FPCのパターンに全体もし
くは、IC実装部のみに伸び分を補正するためのパター
ンの縮小を一定倍率でおこなった。補正を行ったパター
ンでは、ズレの程度は小さくなったが、原因解決には至
らなかった。
The cause of the displacement is mainly caused by the fact that the flexible substrate is thermally deformed by the heat at the time of mounting although the heating condition and the pressurizing condition differ depending on the mounting method. Particularly in the Au-Sn eutectic connection, the connection temperature is heated to 350 to 380 [deg.] C., so that a deviation occurs even if a highly heat-resistant polyimide is used. As a measure against the deviation, the entire FPC pattern or only the IC mounting portion is reduced in size to correct the extension at a constant magnification. In the corrected pattern, the degree of deviation was small, but the cause could not be resolved.

【0007】また、フレキシブル基板はロール方式で製
造される。200〜500幅の原反を用いるため、製品
をより多く取るためのマスクレイアウトは、製品を0
°、90°、180°、270°と自在に配置をし、製
品同士を抱き合わせるように、もっとも取り個数が多く
なるように製造していた。フレキシブル基板の原反は、
ポリイミドを二軸延伸しているため、流れ方向(MD:
Machine Direction)と幅方向(T
D:Transfer Direction)の特性が
異なる。フィルムメーカーの公開する物性特性では、強
度、伸度、ヤング率、熱収縮率、熱膨張係数、湿度膨張
係数の特性がMDとTDで同一の特性値であっても、実
質のMDとTD方向で寸法変化の特性が異なる。また、
FPCのマスクレイアウトのレイアウトによって、IC
の接続するある辺が、MD方向であったりTDであった
りすることもある。表示パネルとのFPCの接続端子も
同様であった。
The flexible substrate is manufactured by a roll method. Since a blank of 200 to 500 width is used, the mask layout for taking more products is 0
They were arranged freely at 90 °, 90 °, 180 °, and 270 °, and the products were manufactured so as to tie the products together and to obtain the largest number of products. The original of flexible substrate is
Since the polyimide is biaxially stretched, the flow direction (MD:
Machine Direction) and width direction (T
The characteristics of D: Transfer Direction are different. In the physical properties disclosed by the film manufacturer, even if the properties of strength, elongation, Young's modulus, thermal shrinkage, thermal expansion coefficient, and humidity expansion coefficient are the same in MD and TD, the actual MD and TD directions The characteristics of dimensional changes are different. Also,
Depending on the layout of the FPC mask layout, IC
There is a case where a certain side connected to is in the MD direction or TD. The same applies to the connection terminal of the FPC with the display panel.

【0008】本発明は、ICとフレキシブル基板の高密
度実装を実現するために、安定したフレキシブル基板の
累積パターンピッチを得ることにある。
The present invention is to obtain a stable cumulative pattern pitch of a flexible substrate in order to realize high-density mounting of an IC and a flexible substrate.

【0009】[0009]

【問題が解決するための手段】本問題を解決するため
に、ポリイミド等の絶縁フィルムに銅などからなるパタ
ーンが形成してあるフレキシブル基板にICをフェイス
ダウン実装し、表示パネルと接続して成る表示装置にお
いて、該絶縁フィルムは2軸延伸しており、ICの電極
と接続するフレキシブル基板のパターンは、延伸軸方向
毎に別々の補正率で累積パターンピッチを補正して形成
してあり、ICをフェイスダウン実装するとともにフレ
キシブル基板の累積パターンピッチが伸びてICのバン
プと所定の位置で接続することで解決した。また、FP
Cのパターニングマスクの配列とポリイミドフィルムの
MDとTD方向毎に補正をすることで、一層安定した接
続が可能となった。表示パネルとの接続端子も、レイア
ウトに応じてMDとTD方向の補正率を別々に補正して
形成することにより、安定した接続が可能になる。
In order to solve this problem, an IC is face down mounted on a flexible substrate having a pattern made of copper or the like formed on an insulating film of polyimide or the like and connected to a display panel. In the display device, the insulating film is biaxially stretched, and the pattern of the flexible substrate connected to the electrodes of the IC is formed by correcting the cumulative pattern pitch with different correction factors for each stretching axis direction. The problem was solved by mounting the device face down and increasing the cumulative pattern pitch of the flexible substrate and connecting it to the bump of the IC at a predetermined position. Also, FP
By correcting the arrangement of the patterning mask of C and the MD and TD directions of the polyimide film, more stable connection became possible. The connection terminal with the display panel is also formed by separately correcting the correction factors in the MD and TD directions according to the layout, so that stable connection is possible.

【0010】[0010]

【発明の実施の形態】本発明による表示装置は、パター
ンピッチをMD方向とTD方向でICのフェイスダウン
実装時に生ずる熱変形を、別々に補正することで、精度
を向上した。補正率は、ICとフレキシブル基板の実装
確認を行い求める。IC実装前のFPCの累積パターン
ピッチをそれぞれ測定し、次にICを実装して同一箇所
を測定し、実装前の累積パターンピッチを実装後のパタ
ーンピッチで割った値が補正率になる。このときMD方
向とTD方向を別々に求めておき、フレキシブル基板の
露光マスクのパターンにMD方向とTD方向毎に累積パ
ターンピッチを補正し再度露光マスクを作成する。
BEST MODE FOR CARRYING OUT THE INVENTION The display device according to the present invention has improved accuracy by separately correcting thermal deformation that occurs during face-down mounting of an IC in the MD direction and the TD direction of the pattern pitch. The correction rate is obtained by checking the mounting of the IC and the flexible board. The cumulative pattern pitch of the FPC before IC mounting is measured, then the IC is mounted and the same position is measured, and the value obtained by dividing the cumulative pattern pitch before mounting by the pattern pitch after mounting is the correction factor. At this time, the MD direction and the TD direction are separately obtained, and the cumulative pattern pitch is corrected for the MD direction and the TD direction in the pattern of the exposure mask of the flexible substrate to create the exposure mask again.

【0011】補正した露光マスクによって製造したフレ
キシブル基板を用いて、ICを実装する。表示装置との
接続端子も同様である。
The IC is mounted using the flexible substrate manufactured by the corrected exposure mask. The same applies to the connection terminal with the display device.

【0012】[0012]

【実施例】以下に本発明の実施例を図面に基づいて説明
する。
Embodiments of the present invention will be described below with reference to the drawings.

【0013】(実施例1)図1は、フレキシブル基板の
上面図で、二軸延伸して製造したポリイミドフィルム2
5μmに6μmの厚みのパターン2が形成してある。パ
ターンは銅からなり表面に無電解スズメッキ0.2μm
が形成されている。さらにパターン2上にソルダーレジ
ストが形成されている。図2はIC4の回路面の上面図
であり、金からなるバンプ5が形成してある。バンプの
ピッチは30μmである。このIC4のバンプ5と接続
するフレキシブル基板のインナーリード2−1、2−2
は、実装時に伸びる分をMD方向とTD方向毎に別々の
補正をかけ縮小して形成してある。補正率は長手側のパ
ターン2−1がTD方向で実装時に100.1%の伸び
が生ずるため、設計値に対し99.9%の補正をおこな
ってある。短手方向方向のパターン2−2はMD方向で
実装時に100.3%の伸びが生ずるため、99.72
%の補正を行ってある。図3はIC4とフレキシブル基
板7を実装する工程の図で、IC4は加熱加圧ヘッド6
に設けてある微細な吸着穴からバキュームでチャックさ
れて、ヘッド温度450℃に加熱してある。フレキシブ
ル基板7のパターン2と位置合わせた後に加圧してスズ
と金の共晶接続をおこなう。図4は実装のパターンのズ
レを確認するために、フレキシブル基板のポリイミドフ
ィルム1を透視してみた透視図である。実装時の伸びに
より各パターンとバンプがほぼセンターに接続されてい
る。補正は、フレキシブル基板の製造工程で生ずる補正
も同じに行っても良い。ICとフレキシブル基板の接続
はAu−Sn共晶接続に限るものではなく、Au−Au
接続でも接着剤のみでコンタクトを保持するNCPでも
異方性導電膜の接続でもまた、他の方式でも良い。
Example 1 FIG. 1 is a top view of a flexible substrate, which is a polyimide film 2 produced by biaxial stretching.
A pattern 2 having a thickness of 6 μm is formed on 5 μm. The pattern is made of copper and the surface is electroless tin plated 0.2 μm
Are formed. Further, a solder resist is formed on the pattern 2. FIG. 2 is a top view of the circuit surface of the IC 4, on which bumps 5 made of gold are formed. The bump pitch is 30 μm. Inner leads 2-1 and 2-2 of the flexible substrate connected to the bumps 5 of the IC 4
Is formed by applying a different correction to each of the MD direction and the TD direction to reduce the extension during mounting. Since the elongation of the pattern 2-1 on the longitudinal side in the TD direction is 100.1% during mounting, the correction rate is 99.9% of the design value. The pattern 2-2 in the lateral direction has an elongation of 100.3% when mounted in the MD direction.
% Has been corrected. FIG. 3 is a diagram showing a process of mounting the IC 4 and the flexible substrate 7. The IC 4 is the heating / pressurizing head 6
It is chucked with a vacuum through a fine adsorption hole provided in the head and heated to a head temperature of 450 ° C. After aligning with the pattern 2 of the flexible substrate 7, pressure is applied to perform eutectic connection of tin and gold. FIG. 4 is a perspective view of the polyimide film 1 of the flexible substrate seen through to confirm the displacement of the mounting pattern. The patterns and bumps are almost connected to the center due to the elongation during mounting. The correction may be the same as the correction that occurs in the manufacturing process of the flexible substrate. The connection between the IC and the flexible substrate is not limited to Au-Sn eutectic connection, but Au-Au
For connection, NCP in which a contact is held only with an adhesive, connection with an anisotropic conductive film, or another method may be used.

【0014】(実施例2)図5は、フレキシブル基板の
ロール工程でスズメッキ上がりの上面図である。二軸延
伸したポリイミドフィルムにNiなどからなるシード層
を1000Å蒸着し更にCuを2000Å蒸着した後に
電気メッキで6μm銅を形成した、幅500mmのロー
ル状の原反をパターニングし、1次スズメッキを行い、
ソルダーレジストを形成し、二次スズメッキをおこなっ
た。
(Embodiment 2) FIG. 5 is a top view of tin-plated after the flexible substrate is rolled. A seed layer made of Ni or the like is vapor-deposited on a biaxially stretched polyimide film by 1000Å and Cu by 2000Å and then 6 μm copper is formed by electroplating. ,
A solder resist was formed and secondary tin plating was performed.

【0015】製品のレイアウトは、できるだけ取り個数
を多くするために、製品を0°,90°,180°,2
70°の位置で配置してある。各配置の方向後とにTD
とMD方向別に補正をかけてパターニングをしているた
め、できあがりの累積ピッチ寸法は、0°,180°と
90°,180°のレイアウトで異なる。FPCの取り
個数を減らすことなく、実施例1同様にICを実装して
同様の効果を得ることができた。表示パネルとの接続端
子も上記同様に補正を行うことで、一層安定した接続が
可能となった。
The layout of the products is 0 °, 90 °, 180 °, 2 in order to maximize the number of products to be taken.
It is arranged at a position of 70 °. TD after and after each placement direction
Since the patterning is performed by making a correction for each MD direction, the cumulative pitch dimension of the finished product differs between the layouts of 0 °, 180 ° and 90 °, 180 °. The same effects could be obtained by mounting the IC as in the first embodiment without reducing the number of FPCs to be taken. By correcting the connection terminals with the display panel in the same manner as above, more stable connection was made possible.

【0016】[0016]

【発明の効果】ICピッチの高密度化に対応し、安定し
た歩留まりと小型化したICのコストダウンにより安価
な表示モジュールを提供できるようになった。また、表
示パネルとの接続も安定して可能となった。
EFFECTS OF THE INVENTION It has become possible to provide an inexpensive display module in response to higher IC pitch density, stable yield, and cost reduction of miniaturized IC. Also, stable connection with the display panel is now possible.

【図面の簡単な説明】[Brief description of drawings]

【図1】実施例1のフレキシブル基板の上面図FIG. 1 is a top view of a flexible substrate according to a first embodiment.

【図2】実施例1によるICの回路面の上面図FIG. 2 is a top view of a circuit surface of an IC according to the first embodiment.

【図3】実施例1のIC実装工程を示す図FIG. 3 is a diagram showing an IC mounting process according to the first embodiment.

【図4】実施例1のICとフレキシブル基板の接続状態
を示す透視図
FIG. 4 is a perspective view showing a connection state between the IC of Example 1 and a flexible substrate.

【図5】実施例2によるフレキシブル基板のスズメッキ
上がりの上面図
FIG. 5 is a top view of a flexible substrate according to the second embodiment after tin plating.

【図6】従来技術のICとフレキシブル基板の接続状態
を示す透視図
FIG. 6 is a perspective view showing a connection state between a conventional IC and a flexible substrate.

【符号の説明】[Explanation of symbols]

1 ポリイミドフィルム 2 パターン 2−1 長手側のパターン 2−2 短手側のパターン 3 ソルダーレジスト 4 IC 5 バンプ 6 加熱加圧ヘッド 7 フレキシブル基板 1 Polyimide film 2 patterns 2-1 Pattern on the long side 2-2 Short side pattern 3 Solder resist 4 IC 5 bumps 6 heating and pressing head 7 Flexible substrate

───────────────────────────────────────────────────── フロントページの続き Fターム(参考) 2H092 GA50 GA52 HA24 HA28 KB06 MA34 NA11 5F044 MM03 MM25 MM48 NN01    ─────────────────────────────────────────────────── ─── Continued front page    F-term (reference) 2H092 GA50 GA52 HA24 HA28 KB06                       MA34 NA11                 5F044 MM03 MM25 MM48 NN01

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 2軸延伸した絶縁フィルムにパターンが
形成されたフレキシブル基板と、前記フレキシブル基板
に実装されたICと、前記フレキシブル基板と接続する
表示パネルと、を備えるとともに、前記ICを実装する
ときに前記フレキシブル基板の累積パターンピッチが伸
びてICのバンプと所定の位置で接続するように、前記
ICの電極と接続する前記フレキシブル基板のパターン
の累積パターンピッチが延伸軸方向毎に別々の補正率で
補正されていることを特徴とする表示装置。
1. A flexible substrate having a pattern formed on a biaxially stretched insulating film, an IC mounted on the flexible substrate, and a display panel connected to the flexible substrate, and mounting the IC. At this time, the cumulative pattern pitch of the patterns of the flexible substrate connected to the electrodes of the IC is corrected separately for each stretching axis direction so that the cumulative pattern pitch of the flexible substrate is extended and connected to the bumps of the IC at predetermined positions. A display device characterized by being corrected by a rate.
【請求項2】 2軸延伸した絶縁フィルムにパターンが
形成されたフレキシブル基板と、前記フレキシブル基板
に実装されたICと、前記フレキシブル基板と接続する
表示パネルと、を備えるとともに、前記パターンは、前
記フレキシブル基板の製造上のレイアウト方向とポリイ
ミドフィルムの延伸軸方向に応じて、ピッチが補正され
たことを特徴とする表示装置
2. A flexible substrate having a pattern formed on a biaxially stretched insulating film, an IC mounted on the flexible substrate, and a display panel connected to the flexible substrate, wherein the pattern has the A display device characterized in that the pitch is corrected according to the layout direction in manufacturing the flexible substrate and the stretching axis direction of the polyimide film.
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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006190989A (en) * 2005-01-06 2006-07-20 Samsung Electronics Co Ltd Carrier film, display device having the same, and its manufacturing method
JP2011258996A (en) * 2011-09-29 2011-12-22 Sharp Corp Solar cell module and its manufacturing method

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006190989A (en) * 2005-01-06 2006-07-20 Samsung Electronics Co Ltd Carrier film, display device having the same, and its manufacturing method
JP2011258996A (en) * 2011-09-29 2011-12-22 Sharp Corp Solar cell module and its manufacturing method

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