JP2003232352A - エアパッド、このエアパッドを用いたステージ装置及びこのステージ装置を備える露光装置 - Google Patents

エアパッド、このエアパッドを用いたステージ装置及びこのステージ装置を備える露光装置

Info

Publication number
JP2003232352A
JP2003232352A JP2002029011A JP2002029011A JP2003232352A JP 2003232352 A JP2003232352 A JP 2003232352A JP 2002029011 A JP2002029011 A JP 2002029011A JP 2002029011 A JP2002029011 A JP 2002029011A JP 2003232352 A JP2003232352 A JP 2003232352A
Authority
JP
Japan
Prior art keywords
orifice
air pad
air
bush
pad
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2002029011A
Other languages
English (en)
Japanese (ja)
Other versions
JP2003232352A5 (enrdf_load_stackoverflow
Inventor
Hideki Takizawa
英樹 滝沢
Atsushi Taguchi
淳 田口
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Priority to JP2002029011A priority Critical patent/JP2003232352A/ja
Publication of JP2003232352A publication Critical patent/JP2003232352A/ja
Publication of JP2003232352A5 publication Critical patent/JP2003232352A5/ja
Pending legal-status Critical Current

Links

Classifications

    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16C—SHAFTS; FLEXIBLE SHAFTS; ELEMENTS OR CRANKSHAFT MECHANISMS; ROTARY BODIES OTHER THAN GEARING ELEMENTS; BEARINGS
    • F16C29/00—Bearings for parts moving only linearly
    • F16C29/02—Sliding-contact bearings
    • F16C29/025—Hydrostatic or aerostatic
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16C—SHAFTS; FLEXIBLE SHAFTS; ELEMENTS OR CRANKSHAFT MECHANISMS; ROTARY BODIES OTHER THAN GEARING ELEMENTS; BEARINGS
    • F16C32/00—Bearings not otherwise provided for
    • F16C32/06—Bearings not otherwise provided for with moving member supported by a fluid cushion formed, at least to a large extent, otherwise than by movement of the shaft, e.g. hydrostatic air-cushion bearings
    • F16C32/0603—Bearings not otherwise provided for with moving member supported by a fluid cushion formed, at least to a large extent, otherwise than by movement of the shaft, e.g. hydrostatic air-cushion bearings supported by a gas cushion, e.g. an air cushion
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages

Landscapes

  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Magnetic Bearings And Hydrostatic Bearings (AREA)
  • Bearings For Parts Moving Linearly (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2002029011A 2002-02-06 2002-02-06 エアパッド、このエアパッドを用いたステージ装置及びこのステージ装置を備える露光装置 Pending JP2003232352A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2002029011A JP2003232352A (ja) 2002-02-06 2002-02-06 エアパッド、このエアパッドを用いたステージ装置及びこのステージ装置を備える露光装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2002029011A JP2003232352A (ja) 2002-02-06 2002-02-06 エアパッド、このエアパッドを用いたステージ装置及びこのステージ装置を備える露光装置

Publications (2)

Publication Number Publication Date
JP2003232352A true JP2003232352A (ja) 2003-08-22
JP2003232352A5 JP2003232352A5 (enrdf_load_stackoverflow) 2005-08-11

Family

ID=27773543

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2002029011A Pending JP2003232352A (ja) 2002-02-06 2002-02-06 エアパッド、このエアパッドを用いたステージ装置及びこのステージ装置を備える露光装置

Country Status (1)

Country Link
JP (1) JP2003232352A (enrdf_load_stackoverflow)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2005027206A1 (ja) * 2003-09-11 2005-03-24 Nikon Corporation 定盤、ステージ装置及び露光装置
WO2008093617A1 (ja) * 2007-01-30 2008-08-07 Kabushiki Kaisha Yaskawa Denki ステージ装置および露光装置
WO2009004853A1 (ja) * 2007-07-04 2009-01-08 Ntn Corporation 静圧軸受パッド
JP2009209962A (ja) * 2008-02-29 2009-09-17 Nikon Corp 流体軸受、ステージ装置、露光装置、及びデバイス製造方法
JP2010155342A (ja) * 2009-01-05 2010-07-15 Kofukin Seimitsu Kogyo (Shenzhen) Yugenkoshi エアガイド
CN110939655A (zh) * 2019-12-06 2020-03-31 天津航天机电设备研究所 V型节流式重载静压气浮轴承
WO2024090442A1 (ja) * 2022-10-26 2024-05-02 京セラ株式会社 静圧気体軸受装置

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2005027206A1 (ja) * 2003-09-11 2005-03-24 Nikon Corporation 定盤、ステージ装置及び露光装置
WO2008093617A1 (ja) * 2007-01-30 2008-08-07 Kabushiki Kaisha Yaskawa Denki ステージ装置および露光装置
JPWO2008093617A1 (ja) * 2007-01-30 2010-05-20 株式会社安川電機 ステージ装置および露光装置
WO2009004853A1 (ja) * 2007-07-04 2009-01-08 Ntn Corporation 静圧軸受パッド
US8240919B2 (en) 2007-07-04 2012-08-14 Ntn Corporation Hydrostatic bearing pad
JP2009209962A (ja) * 2008-02-29 2009-09-17 Nikon Corp 流体軸受、ステージ装置、露光装置、及びデバイス製造方法
JP2010155342A (ja) * 2009-01-05 2010-07-15 Kofukin Seimitsu Kogyo (Shenzhen) Yugenkoshi エアガイド
CN110939655A (zh) * 2019-12-06 2020-03-31 天津航天机电设备研究所 V型节流式重载静压气浮轴承
WO2024090442A1 (ja) * 2022-10-26 2024-05-02 京セラ株式会社 静圧気体軸受装置

Similar Documents

Publication Publication Date Title
JP6855010B2 (ja) 基板保持装置、露光装置及びデバイス製造方法
CN101657750B (zh) 整体式光学安装件
JP4488005B2 (ja) 液浸リソグラフィ装置用の液体を捕集するための流出通路
JP2003232352A (ja) エアパッド、このエアパッドを用いたステージ装置及びこのステージ装置を備える露光装置
KR20230055404A (ko) 반송 시스템, 노광 장치, 반송 방법, 노광 방법 및 디바이스 제조방법, 및 흡인 장치
JP2009515724A (ja) 微細構造を製造するための工作物に沿う横方向のｚ方向に可変な移動をする切削工具
JP2013232673A (ja) リソグラフィ装置およびデバイス製造方法
JP2009515722A (ja) 同時に２つの独立した速度でワークピース内へのｘ方向の変動動作を有するマイクロ構造作製用切削ツール
JP3283767B2 (ja) 露光装置およびデバイス製造方法
US20070205548A1 (en) Semiconductor element holding apparatus and semiconductor device manufactured using the same
US6594093B2 (en) Adjusting apparatus for an optical element in a lens system
JP2003258071A (ja) 基板保持装置及び露光装置
TW202127571A (zh) 製造用於微影設備之基板支撐件的方法、基板台、微影設備、器件製造方法、使用方法
WO1999033725A1 (en) Contactless wafer pick-up chuck
JP5032627B2 (ja) 液剤塗布用マルチノズル
JP2005001042A (ja) 切削加工方法および切削加工装置
JP2002254121A (ja) 微小穴プレス機
JP5082929B2 (ja) 流体軸受、ステージ装置、露光装置、及びデバイス製造方法
JPH05259263A (ja) Ｘｙ微動ステージ
KR20120100956A (ko) 기판 반송 장치, 노광 장치, 기판 지지 장치 및 디바이스 제조 방법
KR100816456B1 (ko) 대면적 고하중을 위한 틸트 스테이지
JPS6386430A (ja) パタ−ン転写方法
KR102710612B1 (ko) 5축 가공 머시닝 센터용 지그장치
US6666611B2 (en) Three degree of freedom joint
US4595257A (en) Support mechanism utilizing flexual pivots

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20050120

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20050124

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20071024

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20071106

A02 Decision of refusal

Free format text: JAPANESE INTERMEDIATE CODE: A02

Effective date: 20080311