JP2003230858A - Coating apparatus - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a coating apparatus capable of easily wiping a solution adhering to the nozzle face without prolonging the tact time. <P>SOLUTION: An ink-jet type coating apparatus 1 for spraying and applying a solution to the top face of a substrate W is provided with a nozzle head 3 in which a plurality of nozzles for jetting the solution are formed, a transportation table 6 placed with the substrate W on the upper face, reciprocating to the nozzle head below the nozzle head, and wiping means 15a, 16b sliding on the nozzle face 14 of the nozzle head following the reciprocating movement of the transportation table for wiping the solution adhering to the nozzle face. <P>COPYRIGHT: (C)2003,JPO

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a coating device for spraying a solution from a nozzle and coating the solution on the plate surface of a substrate.

[0002]

2. Description of the Related Art For example, in a manufacturing process of a liquid crystal display device or a semiconductor device, there is a film forming process for forming a functional thin film on a substrate such as a glass substrate or a semiconductor wafer. In this process, an inkjet-type coating device that sprays a solution for forming a functional thin film from a nozzle to coat the solution on the upper surface of the substrate may be used.

This coating apparatus has a carrying table for carrying the substrate and a plurality of nozzle heads arranged in parallel on the upper surface side of the carrying table along a direction orthogonal to the carrying direction of the substrate. Each nozzle head has a piezo element, and by driving these piezo elements, a solution is ejected from a plurality of nozzles formed in each nozzle head.

By the way, when a solution is applied to a substrate by using an ink jet type applying apparatus, if the solution remains attached to the nozzle surface of the nozzle head so as to cover the nozzle, the nozzle is ejected from the nozzle even when the piezo element is driven. There was a case where the solution was not ejected and a tooth drop or misdirection where the solution ejected from the nozzle was not ejected perpendicularly to the nozzle surface was caused.

Therefore, conventionally, the nozzle head is made movable, and the nozzle head is moved to a position deviated from the substrate transfer path every time a predetermined number of times of ejection is performed from the nozzle, and the nozzle head is provided there. The nozzle surface of the nozzle head is brought into sliding contact with a high-absorbent material such as cotton to wipe off the solution adhering to the nozzle surface.

[0006]

However, in the coating apparatus as described above, it is necessary to move the nozzle head to a position away from the transfer path of the substrate every time the nozzle surface is wiped, which shortens the takt time. It was an evil.

An object of the present invention is to provide a coating apparatus capable of easily wiping off the solution adhering to the nozzle surface without extending the tact time.

[0008]

According to a first aspect of the present invention, there is provided a nozzle head having a plurality of nozzles for jetting a solution in an ink jet type coating device for jetting a solution on a top surface of a substrate. A carrier table that is placed on the upper surface and is reciprocally driven with respect to the nozzle head below the nozzle head, and a carrier table provided on the carrier table and reciprocally driven to the nozzle surface of the nozzle head. And a wiping means for wiping off the solution adhering to this nozzle surface.

According to a second aspect of the invention, the wiping means is
The coating device according to claim 1, wherein the coating device is provided at a front end portion in the moving direction of the transport table, and wipes off the solution adhering to the nozzle surface before the solution is sprayed onto the substrate.

According to the invention of claim 3, the wiping means is
The wiping surface used for wiping is transferred each time the nozzle surface is wiped, and a new wiping surface is used in the next wiping.

According to a fourth aspect of the present invention, the wiping means comprises:
It comprises a cylindrical wiping roll and a support means for supporting the wiping roll so as to be rotatable only in a predetermined direction and elastically displaceable, and the wiping roll moves when the transport table is reciprocated. The coating apparatus according to claim 1, wherein one of the movement and the back movement is non-rotating and is in sliding contact with the nozzle surface of the nozzle head, and the other is rotating by contact with the nozzle surface.

According to a fifth aspect of the present invention, one end of the supporting means is rotatably provided on both sides of the leading end of the carrying table in the moving direction, and the other end of the wiping roll is in a predetermined direction via a one-way clutch. A pair of undulating links provided rotatably only in the above, and an elastic member for urging the pair of undulating links in the upright direction to bring the outer peripheral surface of the wiping roll into contact with the nozzle surface of the nozzle head. The coating apparatus according to claim 4, wherein:

According to a sixth aspect of the present invention, there is provided the coating device according to the first aspect, wherein the wiping means is provided at both ends in the moving direction of the transport table.

According to a seventh aspect of the present invention, there is provided the coating apparatus according to the first aspect, wherein the transport table is provided with a drying means for drying the solution absorbed by the wiping means.

According to the present invention, a wiping means for wiping the solution adhering to the nozzle surface is provided on the carrying table, and the carrying table is reciprocally driven so that the wiping means is brought into sliding contact with the nozzle surface of the nozzle head. So
The solution adhering to the nozzle surface can be easily wiped off without extending the tact time.

[0016]

BEST MODE FOR CARRYING OUT THE INVENTION An embodiment of the present invention will be described below with reference to the drawings.

The coating apparatus 1 shown in FIGS. 1 and 2 has a base 2 having a substantially rectangular parallelepiped shape. Legs 3 are provided at predetermined positions on the lower surface of the base 2 to horizontally support the base 2. Mounting plates 4 are fixed to both ends of the upper surface of the base 2 in the width direction along the longitudinal direction. At one end of the upper surface of each mounting plate 4 inward in the width direction of the base 2, a guide member 5 is provided along the longitudinal direction.
Is stuck.

On the upper surface of the pair of guide members 5, a substantially rectangular plate-shaped transport table 6 is provided via a slide member 7 so as to be slidable in the longitudinal direction. The transport table 6 is provided with a drive device (not shown), and the transport table 6 is operated by operating the drive device.
Can be reciprocally driven along the guide member 5.

A substrate W such as a glass substrate or a semiconductor wafer is detachably held on the upper surface of the transfer table 6 by holding means such as an electrostatic chuck or a suction chuck. That is, the substrate W is held on the upper surface of the transfer table 6 so as to be reciprocally transferred along the longitudinal direction on the upper surface side of the base 2.

As shown in FIG. 1, one end portion in the longitudinal direction of the upper surface of the base 2 constitutes a loading / unloading portion 9 for loading / unloading the substrate W, and the other end portion is reciprocally driven to carry the transport table 6.
Forms a turn-back portion 10 for reversing the moving direction.

That is, the substrate W carried into the coating apparatus 1 from the carrying-in / carrying-out section 9 is held on the upper surface of the carrying table 6 and carried in the direction shown by the arrow A in FIG. When it arrives, the carrying direction is changed and the carrying direction is carried to the carry-in / carry-out section 9 in the direction shown by the arrow B in FIG.

A gate-shaped support 11 is erected on the midway portion of the base 2 in the longitudinal direction so as to straddle the pair of guide members 5. On the upper part of the support body 11, a mounting member 12 formed of a prism is horizontally provided along the width direction of the base 2.

On one side surface of the mounting member 12, a plurality of, in this embodiment, eight ink jet type nozzle heads 13 each having a piezoelectric element are arranged side by side over substantially the entire length in the longitudinal direction. The length dimension formed by these nozzle heads 13 is set to be substantially equal to or slightly longer than the width dimension of the substrate W, and the entire substrate W to be transported passes below the plurality of nozzle heads 13. ing.

A plurality of nozzles (not shown) are formed on the lower surface of each nozzle head 13 along a direction orthogonal to the transport direction of the substrate W, and the substrate transported by driving the piezo element. A solution for forming a functional thin film such as an alignment film, a resist, a color filter, or organic electroluminescence can be sprayed onto the upper surface of W.

As shown in FIG. 1 and FIG. 3, the nozzle surface 14 of the nozzle head 13 is provided on the forward end portion of the transport table 6 in the moving direction, that is, on the folded portion 10 side of the transport table 6. A forward path wiping means 15a is provided for wiping off the remaining solution adhering thereto during the forward movement.

The outward path wiping means 15a has a pair of support portions 16 provided on the folded portion 10 side of each slide member 7, and each support portion 16 has one end of an undulating link 17 rotated. It is possible.

At the other end of the pair of undulating links 17, a forward path wiping roll 19a made of a high-absorbent material is provided in a predetermined direction by a one-way clutch 18, in this embodiment, in the clockwise direction shown by arrow X in FIG. It is only rotatably provided.

The undulating link 17 is urged by a spring 20 as an elastic body in the erection direction shown by an arrow Q in FIGS. 2 and 3, whereby the forward path wiping roll 19a is moved to the nozzle of the nozzle head 13. It elastically contacts the surface 14.

A restricting member 21 is provided so as to project almost directly above the supporting portion 16 of the carrying table 6, and restricts the hoisting link 17 from being urged by the spring 20 and standing up at a predetermined angle or more. is doing. As a result, the forward pass wiping roll 19a is positioned so that the upper end thereof is slightly above the nozzle surface 14 of the nozzle head 13.

That is, the supporting portion 16 and the undulating link 1
7, one-way clutch 18, spring 20, and restriction member 21
And the forward path supporting means 80a are constituted by the forward path supporting means 8a.
0a supports the forward path wiping roll 19a so as to be rotatable only in the direction of the arrow X and elastically displaceable in the vertical direction.

The solution remaining on the nozzle surface 14 of the nozzle head 13 is wiped off at the forward end of the transport table 6 in the moving direction, that is, at the carrying-in / carrying-out portion 9 side of the transport table 6, at the time of the backward movement. Return path wiping means 1
5b is provided.

The backward path wiping means 15b and the outward path wiping means 15a are mirror-symmetrical, that is, their construction and operation are symmetrical. That is, the return pass wiping means 15b has a return pass support means 80b which is mirror-symmetrical to the forward pass support means 80a. It is supported so as to be rotatable only in the direction opposite to the arrow X direction, that is, in the counterclockwise direction shown by arrow Y in FIG.

When the carrying table 6 is located at the carry-in / carry-out section 9, the forward path wiping means 15a is located at the carry-in / carry-out section 9 side of the nozzle head 13. Further, when the transport table 6 is located at the folding section 10, the backward path wiping means 15b is located at the folding section 10 side of the nozzle head 13. As a result, both the wiping means 15a and 15b pass below the nozzle head 1 when the transport table 6 moves forward or backward.

The transport table 6 has a heater 22 as a drying means substantially directly below the wiping rolls 19a and 19b. These heaters 22 are provided over the pair of slide members 7 so that the wiping rolls 19a and 19b can be heated by a control means (not shown).

By the way, each of the above-mentioned wiping rolls 19a and 19b made of a high-absorbent body has a limit in the amount of solution that can be absorbed. That is, the above-mentioned wiping rolls 19a and 19b
Cannot exhibit the desired absorption capacity when absorbing a predetermined amount or more of the solution. However, each of the above-mentioned wiping rolls 19
By drying the absorbed solution, a and 19b exhibit their original absorption ability again.

Therefore, each of the above-mentioned wiping rolls 19
By heating and drying the solution absorbed by a and 19b by the heaters 22, the absorption capacity of the portion used for wiping the solution can be regenerated.

Next, the operation when using the coating apparatus 1 having the above structure will be described. When the substrate W is coated with the solution by the coating apparatus 1, it is sequentially performed based on the flowchart shown in FIG.

When the substrate W is supplied to the transfer table 6 standing by at the loading / unloading section 9 of the coating apparatus 1, the transfer table 6 is driven in the direction indicated by the arrow A in FIG. 1 while holding the substrate W. , And proceeds to the first step S ₁ .

In the first step S ₁ , the solution that remains on the nozzle surface 14 of the nozzle head 13 is wiped off by the outward wiping means 15a. In Figure 5 the operation of the forward wiping means 15a at the first step _{S 1} (a) ~
This will be described with reference to (d). The arrow A in the figure
Indicates the moving directions of the transport table 6 and the outward path wiping means 15a during the forward movement.

The transport table 6 is driven, and FIG.
As shown in FIG. 5A, when the outward-path wiping roll 19a of the outward-path wiping means 15a reaches the nozzle head 13, the outward-path wiping roll 19a is moved to the state shown in FIG.
As shown in FIG. 5, the nozzle head 13 pushes the nozzle surface downward, and as shown in FIG.
4 is moved in the direction of arrow A while elastically contacting a new wiping surface 81s on the upper side.

At this time, the forward pass wiping roll 19a
Is slidably in contact with the nozzle surface 14 by the action of the one-way clutch 18, so that the solution adhering to the nozzle surface 14 is wiped off by the new wiping surface 81s.

When the wiping roll 19a passes below the nozzle head 13, the wiping roll 19a again rises to a predetermined height by the restoring force of the spring 20, as shown in FIG. 5 (d). As shown in FIG. 5, the new wiping surface 81s, by wiping the solution adhered remaining on the nozzle surface 14 at a first step S _1, it reduces the absorption capacity of the solution, the used wiping surface 81t Become.

In the second step S ₂ , the solution is jetted from the nozzle toward the substrate W which has reached below the nozzle head 13 next to the outward wiping roll 19 a. At this time, since the solution remaining on the nozzle surface 14 in the first step S ₁ is wiped off, the solution is stably ejected from the nozzle.

That is, a harmful effect due to the solution adhering to the nozzle surface 14, for example, even if the piezo element in the nozzle head 13 is driven, even if the solution is not ejected from the nozzle, missing teeth or even if it is ejected. The nozzle surface 14
In contrast, the solution is not ejected perpendicularly to the nozzles, and the misdirection or the like that the solutions ejected from the plurality of nozzles are collectively ejected does not occur.

[0045] rotating the backward wiping roll 19b of the third step S ₃ in the backward wiping means 15b having reached the lower part of the nozzle head 13 next to the substrate W. Third
The operation of the backward wiping means 15b in step _{S 3} will be described with reference to the FIG. 6 (e) ~ (h) of the. The arrow A in the figure indicates the carrying table 6 at this time.
And the moving direction of the return path wiping means 15b is shown.

The transport table 6 is driven, and FIG.
As shown in (e), when the return path wiping roll 19b of the return path wiping means 15b reaches the nozzle head 13, it is pushed downward by the nozzle head 13 as shown in FIG. As shown in FIG. 5 (g), it moves in the direction of arrow A while rotating in the direction indicated by arrow Y by contact with the nozzle surface 14.

As a result, this return path wiping roll 1
As shown in FIG. 5 (h), 9 b shows the used wiping surface 82 t that has already been used and the above-mentioned return path wiping roll 19
A predetermined angle θ ₂ is shifted from the upper part of b, to a position shifted by approximately 90 degrees in the direction of the arrow Y in this embodiment. At this position, the homeward wiper roll 19b is disengaged from the nozzle head 13 and is raised to a predetermined height by the restoring force of the spring 20.

At this time, the return path wiping roll 19b
While rolling on the nozzle surface 14
The solution remaining on and is wiped roughly by the rough wiping surface 83.

[0049] When the third step S ₃ is completed, the conveying table 6 is driven directly in the arrow A direction. When the transport table 6 reaches the folding section 10, its moving direction is reversed to the direction shown by the arrow B in FIG. 1, and the process proceeds to the fourth step S ₄ .

The solution adhered remaining on the nozzle head 14 is wiped by the fourth step _{S 4} the wiping return means 15b. With reference to (i) ~ (l) in FIG. 7 the operation of the fourth step _S wiping backward in ₄ unit 15b will be described. The arrow B in the figure indicates the moving direction of the transport table 6 and the backward path wiping means 15b during the backward movement.

The transport table 6 is driven, and FIG.
As shown in (i), when the return-path wiping roll 19b of the return-path wiping means 15b reaches the nozzle head 13, the return-path wiping roll 19b is turned to FIG. 7 (j).
As shown in FIG. 7A, the nozzle head 13 pushes the nozzle surface downward, and as shown in FIG.
4 wipe in a third step _{S 3} the return to the roll 19
The new wiping surface 82s set on the upper part of b is moved in the direction of arrow B while contacting it.

At this time, the return path wiping roll 19b
Is slidably contacted with the nozzle surface 14 by the action of the one-way clutch 18, so that the solution remaining on the nozzle surface 14 is wiped off by the new wiping surface 82s.

The return path wiping roll 19b is
When it passes under the slide head 13, it is shown in FIG.
So that the spring 20 raises it again to the desired height.
To do. As shown in FIG. 7, the new wiping surface
82s is the fourth step S _FourRemaining on the nozzle surface 14 with
By wiping off the remaining solution, the absorption capacity of the solution decreases
Then, the used wiping surface 82t is obtained.

In the fifth step S ₅ , the solution is jetted from the nozzle toward the backward wiping roll 19 b and then toward the substrate W which has reached below the nozzle head 13 again. At this time, since the solution adhering to the nozzle surface 14 has been wiped off in the fourth step S ₄ , the solution is stably ejected from the nozzle.

[0055] rotating the forward wiping roll 19a of the forward wiping means 15a has reached the lower part of the nozzle head 13 subsequent to the sixth step S ₆ the substrates W. Sixth
The operation of the forward wiping means 15a in step _{S 6} will be described with reference to FIG. 8 (m) ~ (p) of the. The arrow B in the figure indicates the moving direction of the transport table 6 and the outward wiping means 15a when returning.

The transport table 6 is driven, and FIG.
As shown in FIG. 8M, when the outward-path wiping roll 19a of the outward-path wiping means 15a reaches the nozzle head 13, the outward-path wiping roll 19a is moved downward by the nozzle head 13 as shown in FIG. It is pushed down, and then, as shown in FIG. 7 (o), it moves in the direction of arrow B while rotating in the direction indicated by arrow X by contact with the nozzle surface 14.

As a result, the outward wiping roll 19a
As shown in FIG. 7 (p), the used wiping surface 81t is transferred to a position displaced from the upper portion of the outward wiping roll 19a by a predetermined angle θ ₁ , which is approximately 90 degrees in this embodiment. At this position, the outward pass wiping roll 19a is disengaged from the nozzle head 13 and raised to a predetermined height by the restoring force of the spring 20.

At this time, the outward pass wiping roll 19a
While rolling on the nozzle surface 14
The solution that remains attached to the surface is roughly wiped with the rough wiping surface 84.

[0059] Step S ₆ of the sixth ends, conveying table 6 is driven directly in the arrow B direction. When the transport table 6 reaches the loading / unloading section 9, the substrate W held on the upper surface is unloaded from the coating apparatus 1. Thus, the coating process of the solution on the substrate W by the coating device 1 is completed.

Since the coating apparatus 1 is a single-wafer type, only one substrate W can be processed while the transport table 6 reciprocates on the upper surface of the base 2. Therefore, when the solution is applied to the plurality of substrates W, the first step S ₁ to the second step S ₆ are repeatedly performed on the substrates W sequentially loaded into the application device 1. .

By the way, in the third step _{S 3,} the used wiping surface 82t of the roll 19b wiping backward above rotates by approximately 90 degrees to the arrow Y direction. That is, the return path wiping roll 19b undergoes the third step S ₃ twice, that is, the two substrates W
When the solution is applied to, the used wiping surface 82t on the upper side
Is set below the return path wiping roll 19b.

When the used wiping surface 82t of the return wipe roller 19b is shifted downward, the used wipe surface 82t is heated by the heater 22 provided immediately below the return wipe roller 19b. As a result, the solution absorbed by the used wiping surface 82t is dried, and the used wiping surface 82t is regenerated as a new wiping surface 82s having a high absorption capacity.

The new wiping surface 82s is
By going through the third step S ₃ two more times, that is,
When the solution is applied to the two substrates W, the solution is set on the upper part of the return path wiping roll 19b again, and the solution attached to the nozzle surface 14 is wiped again.

[0064] Therefore, the upper always new wiping surface of the roll 19b wiping third step _{S 3} in backward 82
s will be set. Therefore, in the fourth step S ₄ , the solution remaining on the nozzle surface 14 can be completely wiped off.

[0065] Further, similarly to the sixth step _{S 6} the third step _{S 3} also of, set new wiping surface 81s is on the top of the always forward wiping roll 19a. Therefore, in the first step S ₁ , the nozzle surface 1
The remaining solution adhering to No. 4 can be wiped off completely.

According to the coating apparatus 1 having the above-described structure, the forward path wiping means 15a and the backward path wiping means 15b are provided at the forward end portions of the moving direction of the reciprocating transport table 6 during the forward and backward movements, respectively. The solution remaining on the nozzle surface 14 of the nozzle head 13 can be wiped off simply by driving the transport table 6. As a result, the takt time when applying the solution to the substrate W can be shortened.

Furthermore, since the solution remaining on the nozzle surface 14 is wiped off before the solution is sprayed from the nozzle, a stable solution is always sprayed from the nozzle.

The heater 2 is used as the drying means.
The number is not limited to 2, and for example, gas may be blown from the blower toward the lower portions of the wiping rolls 19a and 19b. In that case, a higher drying effect can be obtained by heating the blown gas.

Further, in order to wipe off the solution remaining on the nozzle surface 14, the wiping means 15a, 15 described above are used.
Instead of b, a block-shaped wiping member made of a high-absorbent material is provided at both ends in the moving direction of the transport table 6, and when the wiping member passes below the nozzle head 13, the upper surface becomes the nozzle surface 14. It may be in sliding contact. By doing so, the configuration can be simplified as compared with the one embodiment.

Further, in the above-described one embodiment, the solution is sprayed toward the upper surface of the substrate W which is reciprocally transported, when the transport table 6 is moved forward and backward, respectively. The solution may be sprayed only on either one of them. In this case, only one wiping means for wiping off the solution adhering to the nozzle surface 14 may be provided at the tip of the transport table 6 in the moving direction so as to wipe off the nozzle surface 14 before spraying the solution.

[0071]

According to the present invention, since the solution remaining on the nozzle surface of the nozzle head is wiped off without moving the nozzle head, the tact time when applying the solution to the substrate can be shortened. .

[Brief description of drawings]

FIG. 1 is a front view of a coating apparatus showing an embodiment of the present invention.

FIG. 2 is a sectional view taken along line ZZ of FIG.

FIG. 3 is an enlarged view of the outward wiping means.

FIG. 4 is a flowchart showing _first step S ₁ to sixth step S ₆ .

FIG. 5 is an operation diagram showing the operation of the outward path wiping means in the first step S ₁ .

FIG. 6 is an operation diagram showing an operation of a backward path wiping means in a _third step S ₃ .

FIG. 7 is an operation diagram showing an operation of a backward path wiping unit in a _fourth step S ₄ .

FIG. 8 is an operation diagram showing the operation of the outward path wiping means in a _sixth step S ₆ .

[Explanation of symbols]

1 ... Coating device 2 ... Base 6 ... Transport table 7 ... Slide member 9 ... Carry-in / carry-out section 10 ... Folding part 13 ... Nozzle head 14 ... Nozzle surface 15a ... outward wiping means 15b ... Return path wiping means 16 ... Supporting part 17 ... undulating link 18 ... One way clutch 19a ... outward wiping roll 19b ... Return path wiping roll 20 ... Spring 21 ... Regulating member 22 ... Heater 80a ... Forward support means 80b ... Return path support means 81s, 82s ... New wiping surface 81t, 82t ... Used wiping surface 83, 84 ... Rough wiping surface

   ─────────────────────────────────────────────────── ─── Continued front page    F-term (reference) 2H025 AB16 AB17 EA04                 4F041 AA02 AA06 AB01 BA13 BA51                       BA60                 4F042 AA02 AA07 AB00 BA08 CB24                       CC08 CC14 DA01 DE01 DF15                       ED05                 5F046 JA02

Claims (7)

[Claims] 1. An inkjet coating apparatus for spraying a solution onto the upper surface of a substrate, wherein the nozzle head has a plurality of nozzles for spraying the solution, and the substrate is placed on the upper surface of the nozzle head. And a carrier table which is reciprocally driven below the nozzle head, and which is provided on the carrier table and slidably contacts the nozzle surface of the nozzle head by reciprocating the carrier table to remove the solution adhering to the nozzle surface. A wiping means for wiping off the coating device. 2. The wiping means is provided at a front end portion in the moving direction of the transport table, and wipes the solution adhering to the nozzle surface before the solution is sprayed onto the substrate. Coating device. 3. The wiping means transfers the wiping surface used for wiping each time the nozzle surface is wiped, and a new wiping surface is used in the next wiping. The coating device described. 4. The wiping means comprises a cylindrical wiping roll and a supporting means for supporting the wiping roll so as to be rotatable only in a predetermined direction and elastically displaceable. When the table is reciprocated, one of the forward movement and the backward movement is non-rotating and comes into sliding contact with the nozzle surface of the nozzle head, and the other is rotated by contact with the nozzle surface. 1. The coating device according to 1. 5. The supporting means has one end rotatably provided on both sides of a front end portion in the moving direction of the transport table, and the other end allows the wiping roll to rotate only in a predetermined direction via a one-way clutch. A pair of undulating links provided, and an elastic member that urges the pair of undulating links in the upright direction to bring the outer peripheral surface of the wiping roll into contact with the nozzle surface of the nozzle head. The coating device according to claim 4, which is characterized in that. 6. The coating apparatus according to claim 1, wherein the wiping means is provided at both ends of the transport table in the moving direction. 7. The coating apparatus according to claim 1, wherein the transport table is provided with a drying means for drying the solution absorbed by the wiping means.