JP2003230830A - Insulating structure of plasma reactor - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To satisfactorily ensure an insulation distance for ensuring satisfactory insulating properties while minimizing an increase in the size of a plasma reactor. <P>SOLUTION: Terminals (30, 31) of both electrodes (26, 27) disposed in a space surrounded by a plurality of insulating walls (25) are provided respectively on upper and lower opposed faces of the insulating wall (25). <P>COPYRIGHT: (C)2003,JPO

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an insulating structure of a plasma reactor for decomposing components to be treated (odorous components and harmful components) in a gas to be treated by low temperature plasma.

[0002]

2. Description of the Related Art Generally, in a plasma reactor, a high voltage is applied between a discharge electrode and a counter electrode for decomposing components to be treated (odorous components and harmful components) in a gas to be treated by low temperature plasma. Therefore, both electrodes are arranged in a space surrounded by an insulating wall such as an insulator and electrically insulated from the outside.

[0003]

However, when the plasma reactor is used for a long period of time, various contaminants in the air may adhere to the inside and outside of the plasma reactor to deteriorate the insulation.
For example, even with an insulator having a sufficient insulating property, when conductive dirt adheres, electricity flows more easily on the dirty surface than on the space between the electrodes, making it impossible to maintain a desired discharge. Also,
If the insulation of the plasma reactor from the outside is reduced, leakage to members and spaces around the outer periphery of the discharge part occurs and the safety for the equipment operator is reduced.

Further, in the case of a plasma reactor using streamer discharge, the above problem becomes particularly important. That is, in order to stably generate the streamer discharge, it is necessary to accurately configure the electrodes, and the streamer discharge forms a wide plasma region in the space, and the component to be treated in the gas to be treated is formed in the region. Since it decomposes (odorous components and harmful components), it is desirable to widen the plasma region by widening the distance between the electrodes as much as possible. for that reason,
An electrode having a certain size is required to exhibit sufficient performance, resulting in a high discharge voltage.

By the way, in the normal insulation design, the operating voltage (k
It is necessary to secure a creepage distance of approximately V) x 4 (mm). However, the streamer discharge may have a high voltage of several + kV, and if an electrode structure with a sufficient creepage distance is secured, the plasma reactor becomes large.

The present invention has been made in view of the above points, and an object thereof is to ensure a sufficient insulation distance while ensuring the insulation property while keeping the size of the plasma reactor large. It is about to come.

[0007]

In order to achieve the above object, the present invention is directed to a positional relationship between terminals of a discharge electrode and a counter electrode, a structure of an insulating wall surrounding both electrodes, and an electrode positioning member. It is characterized by properly setting the positional relationship and the like.

Specifically, the present invention provides a plurality of insulating walls (2
Plasma reactor for decomposing the components to be treated in the gas to be treated by low temperature plasma by applying a discharge voltage between the discharge electrode (26) and the counter electrode (27) facing each other in the space surrounded by 5)
Based on the insulation structure of (16), the following solutions were taken.

That is, according to the first aspect of the invention, on the above-mentioned premise, the terminals (30, 31) of the electrodes (26, 27) are provided on different surfaces of the insulating wall (25). Is characterized by.

With the above structure, in the invention according to claim 1, since the terminals (30, 31) of both electrodes (26, 27) are provided on different surfaces of the insulating wall (25), both terminals (30 , 31) is widened and the insulation distance is secured.

According to a second aspect of the invention, in the first aspect of the invention, the terminals (30, 31) of the both electrodes (26, 27) are
It is characterized in that it is provided on the opposing surface of the insulating wall (25).

With the above structure, in the invention according to claim 2, since both terminals (30, 31) are provided on the opposing surfaces of the insulating wall (25), the distance between both terminals (30, 31) is increased. Maximum,
A sufficient insulation distance is secured.

According to a third aspect of the invention, on the above-mentioned premise, a recess is formed between the electrodes (26, 27) on the inner surface of the insulating wall (25).
(38) is provided.

With the above structure, in the third aspect of the invention, the creepage distance between the electrodes (26, 27) is increased by the concave shape of the concave portion (38), and the insulation distance is secured.

According to a fourth aspect of the present invention, on the above-mentioned premise, a recess (39) is provided on the outer surface of the insulating wall (25) near the discharge electrode (26) having the high voltage terminal (30). Is characterized by.

With the above construction, in the invention according to claim 4, the creepage distance to the members and spaces around the outer periphery of the plasma reactor is increased by the concave shape of the concave portion (39), which is safe for the equipment operator. Is guaranteed.

According to a fifth aspect of the present invention, on the above-mentioned premise, the electrodes (26, 27) are positioned and fixed by the positioning members (33, 34) to serve as the positioning member (33) for the discharge electrode (26). The positioning members (33, 34) of the counter electrode (27) are characterized by being arranged at different positions in the same plan view.

With the above structure, in the invention according to claim 5, the positioning member (33) for the discharge electrode (26) and the counter electrode (27).
Since the positioning members (33, 34) are displaced from each other, the creeping distance between the electrodes (26, 27) becomes long, and the insulation distance is secured.

The invention according to claim 6 is, on the above-mentioned premise, characterized in that the joint between the adjacent insulating walls (25) is covered with an insulating plate (24).

With the above structure, in the invention according to claim 6, the insulating plate (24) prevents leakage from the joint of the insulating wall (25).

According to a seventh aspect of the present invention, on the above-mentioned premise, a plurality of sets of the both electrodes (26, 27) are arranged in series, and the counter electrode (27) having the ground terminal (31) is of the gas to be treated. It is characterized in that it is arranged at both ends which are the entrance and exit sides.

With the above construction, in the invention according to claim 7, the counter electrodes (27) arranged at both ends of the inlet / outlet side of the gas to be treated are grounded, so that an insulating plate is separately provided to the gas to be treated. It is not necessary to provide both ends of the plasma reactor, and the plasma reactor can be downsized accordingly.

[0023]

BEST MODE FOR CARRYING OUT THE INVENTION Embodiments of the present invention will be described below with reference to the drawings.

5 and 6 show a gas treatment device. In the figure, (1) is a box-shaped movable hermetic casing, and casters (2) are attached to the four corners of the lower end of the casing (1). In the casing (1), an adsorption rotor (3) is sandwiched by a lower lid member (4a) and an upper lid member (4b) from above and below so as to be rotatable about a vertical axis. The adsorption rotor (3) is composed of a honeycomb-shaped disc-shaped substrate having a large number of small holes (not shown) penetrating along the up-down direction, which is the flow direction of the gas to be treated, and the surface of the substrate By adsorbing an adsorbent on the adsorbent and adsorbing the components to be treated (odorous components and harmful components) when the gas to be treated passes through the small holes, the components to be treated are removed from the gas to be treated. ing. As the adsorbent, for example, activated carbon or zeolite is used, but porous ceramics, activated carbon fiber, mordenite,
Ferrierite, silicalite or the like may be used.

The insides of the lower lid member (4a) and the upper lid member (4b) are partitioned by a V-shaped partition wall (not shown) to remove the adsorption rotor portion corresponding to the fan-shaped small area. The suction rotor portion corresponding to another large area is used as the suction portion.

A rotor rotation motor (5) is installed on the side of the adsorption rotor (3), and a pulley (6) is fixed to an output shaft (5a) extending below the rotor rotation motor (5). , This pulley (6) and the adsorption rotor (3) have endless belts.
(7) is wound around, the rotational torque of the rotor rotation motor (5) is transmitted to the suction rotor (3) via the pulley (6) and the endless belt (7), and the suction rotor (3) is rotated. It has become. Then, while the adsorption rotor (3) is rotated, the component to be treated is adsorbed by the adsorption unit and the component is desorbed by the desorption unit. That is,
By regenerating the adsorption rotor (3), the gas to be treated can be continuously treated.

One end of the upper surface of the lower lid member (4a) (see FIGS. 5 and 6).
The mainstream fan (8) is installed on the (left end) side, and the mainstream fan (8) is connected to the suction duct (9) that opens to the outside of the casing (1), and the gas to be treated is discharged from the suction duct (9) to the bottom. Side cover member (4
It is designed to be introduced below the adsorption part of the adsorption rotor (3) in a). On the other hand, a regeneration fan (10) is installed on the other end (right end in FIGS. 5 and 6) of the upper surface of the lower lid member (4a), and the regeneration fan (10) lowers the gas in the casing (1). Side cover member (4
It is designed to be introduced below the desorption part of the adsorption rotor (3) in a). Further, below the adsorption rotor (3), there is a desorption heater (1) for desorbing a component to be treated from the adsorption rotor (3).
1) is provided.

A closed container (12) is installed above the adsorption rotor (3), and a heat exchanger is installed in the closed container (12).
(13) is located. The upper end of the heat exchanger (13) is a duct
(14) is connected to the detaching portion side of the upper lid member (4b), and the lower end is connected to the detaching portion side of the lower lid member (4a) by a duct (15). Then, as shown by the broken line arrow in FIG. 5, the air in the casing (1) is introduced by the regeneration fan (10) to the desorption part side in the lower lid member (4a), and the residual heat of the desorption part is removed. To cool the adsorption rotor (3), and the air warmed by this is introduced into the heat exchanger (13) through the duct (14),
Here, the air whose temperature has risen due to heat exchange with the gas from the plasma reactor (16) described below passes through the duct (15) and the lower lid member.
It is designed to be introduced to the detachment side of (4a).

A plasma reactor (16) is arranged in parallel on the back side of the heat exchanger (13). One side surface (the right side surface in FIG. 5) of the plasma reactor (16) is connected to the desorption side of the upper lid member (4b) by a duct (17), and the component to be treated desorbed from the adsorption rotor (3). Is decomposed by low temperature plasma. Further, one side surface (left side surface in FIG. 5) of the plasma reactor (16) is connected to one side surface (left side surface in FIG. 5) of the closed vessel (12) by a duct (18), and The other side (the right side in FIG. 5) is connected to the discharge duct (20) by the duct (19), and the heat is exchanged with the gas in the heat exchanger (13) to cool it as shown by the white arrow in FIG. The gas that has passed through the plasma reactor (16) is discharged from the discharge duct (20) to the outside of the casing (1) via the duct (19).

A catalytic decomposer (21) is installed in the closed container (12) on the downstream side of the plasma reactor (16) to catalytically decompose the components to be treated which have passed through the plasma reactor (16). Bowl (2
It is further decomposed by the catalytic action of 1). Further, a catalyst activation heater (2
2) is installed, and the catalyst activating heater (22) heats and activates the catalyst of the catalyst decomposer (21).

The plasma reactor 16 has a structure as shown in FIGS. That is, this plasma reactor
In (16), the six discharge electrodes (26) are arranged in pairs in a space surrounded by four insulating walls (25) made of an insulating material such as an insulator and are approached so as to face each other. It is arranged. As shown in FIG. 3, the space surrounded by the insulating wall (25) is 4
The ends of the insulating walls (25) are abutted against each other, and a screw (23) is screwed into a screw hole (25a) formed at each end to form a tubular shape having a rectangular cross section. In these discharge electrodes (26), a large number of needle electrodes (26b) are fixed by a base member (26c) to a substrate (26a) made of a mesh material, punching metal or the like, and the needle electrodes (26b) of one of the discharge electrodes (26). ) Is projected from the substrate (26a) of the other discharge electrode (26). Further, in the plasma reactor (16), four counter electrodes (27) are arranged so as to sandwich the discharge electrode set, and two counter electrodes (27) in the middle are described in detail on both sides later. The processing members (28) are fixed with bolts (29), and the processing members (28) are also attached to the inner surfaces of the two opposing electrodes (27) at both ends by the bolts (29).
It is fixed at. This counter electrode (27) is also the discharge electrode (2
Like 6), it is composed of a substrate made of mesh material or punching metal. As a result, both electrodes (26,27)
Are arranged in series in a space surrounded by the insulating wall (25).

A plurality of positioning members (33, 34) made of an insulating material such as Teflon (R) are provided on the inner surface of the insulating wall (25).
Are attached by screws (27) corresponding to the positions of the electrodes (26, 27). The two discharge electrodes (26) in the above set are
The positioning member (33) positions and fixes the insulating wall (25), and the counter electrode (27) also positions and fixes the insulating wall (25) by the positioning member (34). The positioning member (33) of the discharge electrode (26) and the positioning member (33, 34) of the counter electrode (27) are arranged at different positions corresponding to the vertices of a triangle in the same plan view.

As described above, the positioning member for the discharge electrode (26)
Since the (33) and the positioning member (33, 34) of the counter electrode (27) are displaced from each other, the creepage distance between both electrodes (26, 27) can be increased to secure the insulation distance. You can

Two high voltage terminals (30) are provided on the upper end of the discharge electrode (26), and these two high voltage terminals (30) are connected to the insulating wall.
(25) It protrudes to the outside through the upper surface. On the other hand, one ground terminal (31) is provided at the lower end of the counter electrode (27), and this ground terminal (31) also penetrates the lower surface of the insulating wall (25) and projects to the outside. That is, the terminals (30, 31) of both electrodes (26, 27) are
The insulating walls (25) are provided on different facing surfaces that face each other vertically.

In this way, the terminals (30, 31) of both electrodes (26, 27) are
Are installed on the upper and lower facing surfaces of the insulating wall (25), so both terminals (3
The distance between 0 and 31) can be maximized and the insulation distance can be sufficiently secured.

Of the two electrodes (26, 27) arranged in series in the space surrounded by the insulating wall (25) as described above, the counter electrode (27) having the ground terminal (31) is treated. Since it is located at the left and right ends of the gas in the figure and is grounded by the grounding terminals (31), it is not necessary to separately install insulating plates at both the left and right ends of the gas to be processed, and only that much is needed. The size of the plasma reactor (16) can be reduced.

A recess (38) is provided between the electrodes (26, 27) on the inner surface of the insulating wall (25), and the insulating walls (25) corresponding to the left and right ends on the inlet / outlet side of the gas to be treated are provided. ) A recess (39) is also provided on the outer surface, that is, near the discharge electrode (26) having the two high-voltage terminals (30) located at the left and right ends.

Therefore, due to the concave shape of the concave portion (38), the creeping distance between the electrodes (26, 27) can be increased and the insulation distance can be secured. In addition, the recess (3
Due to the concave shape of 9), the creeping distance to the members and spaces around the outer periphery of the plasma reactor (16) can be increased, and the safety for the equipment operator can be secured.

As shown in FIG. 4, adjacent insulating walls (2
In the corner of 5), a thin insulating plate (24) made of an insulating material such as Teflon (R) and bent at a right angle insulates the screw (32) from the insulating wall.
It is attached by screwing it into the screw hole (25b) of (25),
The joint between the adjacent insulating walls (25) is covered with the insulating plate (24).

Since the joint between the adjacent insulating walls (25) is covered with the insulating plate (24) in this manner, leakage from the joint between the insulating walls (25) can be prevented.

Although not shown, instead of covering the joint of the insulating wall (25) with the insulating plate (24), the insulating wall (25) has a double structure to prevent leakage from the joint. You may

A processing member (2) fixed to the counter electrode (27)
8) is composed of a honeycomb-shaped base material having a large number of small holes (not shown) penetrating along the air flow direction, and the surface of which supports a catalyst substance. Specifically, this processing member (28) uses Pt, Pd, Ni, I as a catalytic substance.
r, Rh, Co, Os, Ru, Fe, Re, Tc, M
It contains at least one of n, Au, Ag, Cu, W, Mo and Cr. These catalytic substances promote a chemical reaction when treating the gas to be treated. Also,
The treatment member (28) carries an adsorbent as well as a catalyst substance on the surface of the base material. This adsorbent is for adsorbing components to be treated (odorous substances and harmful substances) contained in the gas to be treated. For example, activated carbon or zeolite is used, but porous ceramics, activated carbon fibers, mordenite, ferriere are used. Light, silicalite, or the like may be used, and at least one of them may be used. The catalyst decomposer (21) is also constructed in the same manner as the processing member (28).

In the above structure, both electrodes (26, 27)
When a discharge voltage is applied to the discharge electrode (26) and the counter electrode (27)
Streamer discharge is generated between and. By this streamer discharge, active species such as highly active ions and radicals are generated and low temperature plasma is generated. Specifically, the discharge generates radicals such as fast electrons, ions, ozone, and hydroxyl radicals, and other activated species such as excited molecules (excited oxygen molecules, excited nitrogen molecules, excited water molecules, etc.),
The components to be treated are decomposed by these active species.

In the streamer discharge, a minute arc continues from the tip of the needle electrode (26b) to the counter electrode (27),
It is formed as a plasma column accompanied by light emission, and the minute arcs continuously propagate between the needle electrode (26b) and the counter electrode (27) where the equipotential surface space is narrow. In this embodiment, although not shown in detail, the tip of the needle electrode (26b) is set to 3
The cutting angle is 0 ° or more and 90 ° or less, preferably 60 °, and the tip is a spherical shape having a radius of about 0.5 mm and slightly rounded. And needle electrode
Since the tip angle of (26b) is specified as the above-mentioned angle, the micro arc easily spreads while spreading over a wide range, and streamer discharge is generated over a wide range. That is, the streamer discharge in this case occurs in a region flared from the needle electrode (26b) toward the counter electrode (27). Then, in the streamer discharge using a high DC voltage, the discharge area for each needle electrode (26b) is widened so that the plasma generation area can be expanded even if the number of needle electrodes (26b) is relatively small. I have to.

Next, the operation of the gas treatment device will be described.

During operation of the device, the rotor rotation motor
(5), the mainstream fan (8) and the regeneration fan (10) are driven, and the adsorption rotor (3) is rotating. First, as shown by the black arrow in FIG. 5, the gas to be treated is introduced from the suction duct (9) to the adsorption portion side of the lower lid member (4a), and the adsorption rotor (3)
In the process of passing through, the component to be treated is adsorbed by the adsorbent, becomes a clean gas, and is discharged from the discharge duct (20) to the outside of the casing (1).

Since the adsorption rotor (3) rotates around the vertical axis, the portion of the gas to be treated which has adsorbed the component to be treated will eventually move to the desorption side. Meanwhile, playing fans (10)
The air inside the casing (1) is driven by the lower lid member (4a).
Is introduced to the desorption part side of the adsorption rotor (3) and removes residual heat at the time of desorption in the process of passing through the desorption part of the adsorption rotor (3), and the adsorption rotor (3) is cooled and regenerated by being deprived of heat. . Adsorption rotor
The air passing through the desorption part of (3) passes through the duct (14) by the ascending air current generated by being heated by the heat of the adsorption rotor (3), as shown by the broken line arrow in FIG. It is introduced into (13), where it merges with the heat generated in the plasma reactor (16) and undergoes heat exchange to further raise the temperature. This air is introduced again to the desorption side of the lower lid member (4a) through the duct (15) and heated by the desorption heater (11), and the components to be treated in the gas to be treated from the adsorption rotor (3) are treated. It is desorbed and concentrated, and this concentrated gas is introduced into the plasma reactor (16) through the duct (17) as shown by the white arrow in FIG. Here, the component to be treated in the gas is decomposed by the action of the low temperature plasma generated by the streamer discharge. Further, the gas is introduced into the closed container (12) through the duct (18). Closed container (1
The gas introduced into 2) passes through the catalytic decomposer (21) and enters the heat exchanger (13). Since the catalyst in the catalyst decomposer (21) is heated and activated by the catalyst activation heater (22), it is smoothly and completely decomposed. The gas entering the heat exchanger (13) is deprived of heat and cooled, and is discharged from the duct (19) to the discharge duct (2
It is discharged to the outside of the casing (1) via 0).

As described above, since the catalyst decomposer (21) is provided on the downstream side of the plasma reactor (16), the plasma reactor (1
The component to be treated which is not sufficiently decomposed in 6) can be completely decomposed by the catalytic action of the catalytic decomposer (21).

Further, since the catalyst activation heater (22) is provided on the upstream side of the catalyst decomposing unit (21), the catalyst of the catalytic decomposing unit (21) can be activated and the catalytic action can be sufficiently exhibited. .

Further, since the heat exchanger (13) is provided on the downstream side of the catalyst decomposer (21), the heat generated in the catalyst decomposer (21) is used as the heat for desorption of the adsorption rotor (3). It can be used without waste.

Furthermore, adsorption, desorption and regeneration are continuously performed while rotating the adsorption rotor (3) around the vertical axis, and the desorption heater provided below the adsorption rotor (3).
Since the rising airflow is generated by (11) and the gas is circulated, the gas treatment can be efficiently performed.

In addition, the plasma reactor (16) was attached to the adsorption rotor.
Since it is provided above (3), it is possible to increase the processing speed of the gas to be treated by continuously adsorbing / desorbing and decomposing the component to be treated.

Further, the catalyst decomposer (21) and the catalyst activation heater (2
Since 2) and the heat exchanger (13) are arranged in one closed container (12), it is possible to prevent these heat influences from reaching the outside.

[0054]

As described above, according to the invention of claim 1, the terminals (30, 31) of both electrodes (26, 27) are connected to the insulating wall (25).
Since they are provided on different surfaces, the insulation distance can be secured.

According to the invention of claim 2, both electrodes (26,
Since the terminals (30, 31) of (27) are provided on the facing surface of the insulating wall (25),
A sufficient insulation distance can be secured.

According to the invention of claim 3, the insulating wall (25)
Since the recess (38) is provided between the inner electrodes (26, 27), the recess
It is possible to secure a long creepage distance and thus an insulation distance by the concave shape of (38).

According to the invention of claim 4, the insulating wall (25)
A recess (3) is formed near the discharge electrode (26) having the high voltage terminal (30) on the outer surface.
Since 9) is provided, the creepage distance to the members and spaces around the outer periphery of the plasma reactor becomes long, and the safety of the equipment operator can be secured.

According to the invention of claim 5, the discharge electrode (2
6) Positioning member (33) and counter electrode (27) positioning member (3
3, 34) are arranged at different positions in the same plane view, so that the insulation distance can be secured as much as the creepage distance between both electrodes (26, 27) becomes longer.

According to the invention of claim 6, since the joint between the adjacent insulating walls (25) is covered with the insulating plate (24), the insulating wall (2
It is possible to prevent leakage from the joint of 5).

According to the invention of claim 7, the ground terminal (3
Since the counter electrodes (27) having 1) are arranged at both ends of the processed gas inlet / outlet side, it is not necessary to separately provide an insulating plate at both ends of the processed gas inlet / outlet side, so that the plasma reactor can be downsized. Can be converted.

[Brief description of drawings]

FIG. 1 is a perspective view showing an internal configuration of a plasma reactor.

FIG. 2 is a side view showing an internal configuration of a plasma reactor.

FIG. 3 is an exploded perspective view of an insulating wall.

FIG. 4 is an enlarged sectional view showing a joint portion of an insulating wall.

FIG. 5 is a front view of the gas treatment device.

FIG. 6 is a left side view of the gas treatment device.

[Explanation of symbols]

(25) Insulation wall (26) Discharge electrode (27) Counter electrode (16) Plasma reactor (30) High voltage terminal (31) Ground terminal (38,39) recess (33,34) Positioning member (24) Insulation plate

   ─────────────────────────────────────────────────── ─── Continued front page    (72) Inventor Kenkichi Kagawa             1304 Kanaoka-cho, Sakai City, Osaka Prefecture Daikin Industries             Sakai Plant Kanaoka Factory F-term (reference) 4G075 AA03 AA37 BA05 CA15 CA47                       DA02 EB01 EC21 FA05 FC15

Claims (7)

[Claims] 1. A component to be treated in a gas to be treated by applying a discharge voltage between a discharge electrode (26) and a counter electrode (27) facing each other in a space surrounded by a plurality of insulating walls (25). In the insulating structure of the plasma reactor (16) for decomposing the plasma with low temperature plasma, the terminals (30, 31) of the both electrodes (26, 27) are provided on different surfaces of the insulating wall (25). An insulating structure of a plasma reactor characterized by the above. 2. The insulating structure for a plasma reactor according to claim 1, wherein the terminals (30, 31) of the both electrodes (26, 27) are provided on opposite surfaces of the insulating wall (25). An insulating structure of a plasma reactor characterized by the above. 3. A component to be treated in a gas to be treated by applying a discharge voltage between a discharge electrode (26) and a counter electrode (27) facing each other in a space surrounded by a plurality of insulating walls (25). In the insulating structure of the plasma reactor (16) for decomposing the by low temperature plasma, between the electrodes (26, 27) on the inner surface of the insulating wall (25), a recess (38)
An insulating structure for a plasma reactor, wherein: 4. A component to be treated in a gas to be treated by applying a discharge voltage between a discharge electrode (26) and a counter electrode (27) facing each other in a space surrounded by a plurality of insulating walls (25). Which is an insulating structure of a plasma reactor (16) for decomposing plasma by low-temperature plasma, the discharge electrode (2) having a high voltage terminal (30) on the outer surface of the insulating wall (25).
6) An insulating structure for a plasma reactor, characterized in that a recess (39) is provided on the side thereof. 5. A component to be treated in a gas to be treated by applying a discharge voltage between a discharge electrode (26) and a counter electrode (27) facing each other in a space surrounded by a plurality of insulating walls (25). In the insulating structure of the plasma reactor (16) for decomposing by the low temperature plasma, the electrodes (26, 27) are positioned and fixed by the positioning members (33, 34), and the positioning member of the discharge electrode (26) ( 33) and counter electrode
The insulating structure of the plasma reactor, wherein the positioning members (33, 34) of (27) are arranged at different positions in the same plan view. 6. A component to be treated in a gas to be treated by applying a discharge voltage between a discharge electrode (26) and a counter electrode (27) facing each other in a space surrounded by a plurality of insulating walls (25). An insulating structure of a plasma reactor (16) for decomposing a plasma by low-temperature plasma, wherein the joint between adjacent insulating walls (25) is covered with an insulating plate (24). Insulation structure. 7. A component to be treated in a gas to be treated by applying a discharge voltage between a discharge electrode (26) and a counter electrode (27) facing each other in a space surrounded by a plurality of insulating walls (25). In the insulating structure of the plasma reactor (16) for decomposing the plasma with low temperature plasma, a plurality of pairs of the electrodes (26, 27) are arranged in series, and the counter electrode (27) having the ground terminal (31) is covered. An insulating structure of a plasma reactor, which is arranged at both ends of a processing gas inlet / outlet side.