JP2003229647A - Prepreg for nonhalogen based printed wiring board and its use - Google Patents

Prepreg for nonhalogen based printed wiring board and its use

Info

Publication number
JP2003229647A
JP2003229647A JP2002028359A JP2002028359A JP2003229647A JP 2003229647 A JP2003229647 A JP 2003229647A JP 2002028359 A JP2002028359 A JP 2002028359A JP 2002028359 A JP2002028359 A JP 2002028359A JP 2003229647 A JP2003229647 A JP 2003229647A
Authority
JP
Japan
Prior art keywords
prepreg
weight
component
parts
resin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2002028359A
Other languages
Japanese (ja)
Other versions
JP4055049B2 (en
Inventor
Hiroshi Sakai
広志 酒井
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Showa Denko Materials Co Ltd
Original Assignee
Hitachi Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Chemical Co Ltd filed Critical Hitachi Chemical Co Ltd
Priority to JP2002028359A priority Critical patent/JP4055049B2/en
Publication of JP2003229647A publication Critical patent/JP2003229647A/en
Application granted granted Critical
Publication of JP4055049B2 publication Critical patent/JP4055049B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Abstract

<P>PROBLEM TO BE SOLVED: To provide a environment-friendly nonhalogen based prepreg for printed wiring board exhibiting excellent flame retardance, Tg, and substrate solder heat resistance, and its use. <P>SOLUTION: The glass basic material polyimide resin prepreg for printed wiring board is produced of thermosetting resin varnish not containing halogen element but containing (a) polyimide resin prepolymer, (b) aluminium hydroxide, and (c) organic silane having one or more functional group reacting on a hydroxy group at the terminal and having one or more aryl group of 6-12C as a hydrocarbon group. <P>COPYRIGHT: (C)2003,JPO

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【発明の属する技術分野】本発明は、プリント配線板等
の電気絶縁材料に使用する、非ハロゲン系のポリイミド
樹脂系プリプレグの製造方法及びその用途に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for producing a non-halogen polyimide resin prepreg used for an electric insulating material such as a printed wiring board and its use.

【0002】[0002]

【従来の技術】通常、ポリイミド樹脂積層板は、ポリイ
ミド樹脂組成物のワニス溶液をガラス布に含浸し、硬化
させてBステージ化したプリプレグを積層し、加熱加圧
して製造されている。
2. Description of the Related Art Generally, a polyimide resin laminated plate is manufactured by impregnating a glass cloth with a varnish solution of a polyimide resin composition, curing the varnish, and laminating B-staged prepregs, heating and pressurizing.

【0003】ポリイミド樹脂は、エポキシ樹脂に比べる
とガラス転移温度(以下、Tgと略す)が高いため、こ
れを用いた積層板はスルーホール信頼性等に優れてい
る。その反面、積層時の硬化温度をエポキシ樹脂系より
も高く設定する必要があり、積層作業効率が悪いという
欠点がある。また、ポリイミド樹脂は硬くて脆いため、
エポキシ樹脂を用いた積層板に比べてドリル加工性等が
劣る傾向にある。そのため、プリント配線板にポリイミ
ド樹脂組成物を使用する場合、改質剤としてエポキシ樹
脂を配合し、積層性やドリル加工性を向上することが多
い。
Since a polyimide resin has a higher glass transition temperature (hereinafter abbreviated as Tg) than an epoxy resin, a laminated board using the same has excellent through hole reliability and the like. On the other hand, the curing temperature at the time of stacking needs to be set higher than that of the epoxy resin system, and there is a drawback that the stacking work efficiency is poor. Also, because polyimide resin is hard and brittle,
Drill workability and the like tend to be inferior to those of a laminated board using an epoxy resin. Therefore, when a polyimide resin composition is used for a printed wiring board, an epoxy resin is often blended as a modifier to improve the stackability and drill workability.

【0004】また、従来、ポリイミド樹脂組成物に難燃
性を付与するため、臭素等のハロゲン元素を含有する樹
脂を使用していた。特に、前述のようにエポキシ樹脂を
配合することが多いため、ハロゲン化したエポキシ樹脂
を用いたり、テトラブロモビスフェノールAやそのグリ
シジルエーテル化物のような難燃樹脂を用いることが多
かった。
Further, conventionally, a resin containing a halogen element such as bromine has been used in order to impart flame retardancy to the polyimide resin composition. In particular, since an epoxy resin is often blended as described above, a halogenated epoxy resin or a flame-retardant resin such as tetrabromobisphenol A or its glycidyl ether compound is often used.

【0005】ところが、ポリイミド樹脂組成物を用いた
積層板は、エポキシ樹脂積層板に比べて吸湿処理時の吸
水率が大きい傾向にあり、その結果、基板はんだ耐熱性
が不充分になってしまう。また、樹脂組成物中のハロゲ
ン元素は、マイグレーションやトラッキング性等の電気
的信頼性を低下させる一因であり、更に近年では環境問
題に対する関心が高まったこともあり、燃焼時にダイオ
キシン等の有害物質を発生させる原因となるハロゲン元
素を含まない非ハロゲン系の材料が求められている。
However, the laminated board using the polyimide resin composition tends to have a higher water absorption rate during the moisture absorption treatment than the epoxy resin laminated board, and as a result, the solder heat resistance of the board becomes insufficient. In addition, the halogen element in the resin composition is one of the causes of lowering the electrical reliability such as migration and tracking properties, and in recent years, there has been a growing interest in environmental issues. There is a demand for a non-halogen-based material that does not contain a halogen element that causes the generation of the.

【0006】[0006]

【発明が解決しようとする課題】本発明の目的は、ハロ
ゲン元素を用いず、難燃性を有し、Tgが高く、耐熱性
に優れ、環境問題に対応したポリイミド樹脂系プリント
配線板用プリプレグ及びその用途を提供することであ
る。
SUMMARY OF THE INVENTION An object of the present invention is to use a prepreg for a polyimide resin-based printed wiring board which does not use a halogen element, has flame retardancy, has a high Tg, is excellent in heat resistance, and is environmentally friendly. And its use.

【0007】[0007]

【課題を解決するための手段】本発明は、プリント配線
板用プリプレグであって、(a)ポリイミド樹脂プレポ
リマー;(b)水酸化アルミニウム;及び(c)末端に
水酸基と反応する官能基を1個以上有し、かつ炭化水素
基として炭素数6〜12のアリール基を少なくとも1個
以上有する有機シランを含む、ハロゲン元素を含有しな
い熱硬化性樹脂ワニスから得られたことを特徴とする、
プリント配線板用のガラス基材ポリイミド樹脂プリプレ
グに関する。
The present invention is a prepreg for a printed wiring board, comprising: (a) a polyimide resin prepolymer; (b) aluminum hydroxide; and (c) a functional group reactive with a hydroxyl group at the terminal. A thermosetting resin varnish containing no halogen element, containing one or more and an organosilane having at least one aryl group having 6 to 12 carbon atoms as a hydrocarbon group,
The present invention relates to a glass-based polyimide resin prepreg for printed wiring boards.

【0008】[0008]

【発明の実施の形態】本発明に用いる(a)ポリイミド
樹脂プレポリマーは、テトラカルボン酸の無水物、ジイ
ミド又はモノイミド(以下、テトラカルボン酸の無水物
等と略す)とジアミンとを反応させて得ることができ
る。慣用の方法を用いて、反応させることができ、上市
品を用いることもできる。線状ポリイミドが好ましい。
テトラカルボン酸の無水物等としては、マレイン酸、ト
リメリト酸、ピロメリト酸、ビス(3,4−ジカルボキ
シフェニル)エーテル等の無水物、ジイミド又はモノイ
ミドが挙げられる。テトラカルボン酸ジイミドが好まし
く、ビスマレイミドが特に好ましい。
BEST MODE FOR CARRYING OUT THE INVENTION (a) The polyimide resin prepolymer used in the present invention is obtained by reacting a tetracarboxylic acid anhydride, a diimide or a monoimide (hereinafter abbreviated as tetracarboxylic acid anhydride, etc.) with a diamine. Obtainable. The reaction can be carried out using a conventional method, and a commercially available product can also be used. Linear polyimide is preferred.
Examples of the tetracarboxylic acid anhydrides include maleic acid, trimellitic acid, pyromellitic acid, anhydrides such as bis (3,4-dicarboxyphenyl) ether, and diimides or monoimides. Tetracarboxylic acid diimides are preferred, and bismaleimides are particularly preferred.

【0009】ビスマレイミドとしては、分子内にマレイ
ミド基を2個含有する化合物で、ハロゲン元素を含まな
いものであれば、特に制限されない。例えば、マレイン
酸N,N’−エチレン−ビスイミド、マレイン酸N,
N’−ヘキサメチレン−ビスイミド、マレイン酸N,
N’−メタフェニレン−ビスイミド、マレイン酸N,
N’−4,4’−ジフェニルメタン−ビスイミド(N,
N’−メチレンビス(−N−フェニルマレイミドともい
う)、マレイン酸N,N’−4,4’−ジフェニルエー
テル−ビスイミド、マレイン酸N,N’−4,4’−ジ
フェニルスルホン−ビスイミド、4,4’−ジアミノ−
3,3’−ジエチル−5,5’−ジメチルジフェニルメ
タン−ビスイミド、マレイン酸4,4’−メチレン−ジ
−2,6−ジイソプロピルアニリン−ビスイミド等が挙
げられ、これらを単独あるいは併用して使用することが
できる。
The bismaleimide is not particularly limited as long as it is a compound containing two maleimide groups in the molecule and does not contain a halogen element. For example, maleic acid N, N′-ethylene-bisimide, maleic acid N,
N'-hexamethylene-bisimide, maleic acid N,
N'-metaphenylene-bisimide, maleic acid N,
N'-4,4'-diphenylmethane-bisimide (N,
N'-methylenebis (also referred to as -N-phenylmaleimide), maleic acid N, N'-4,4'-diphenylether-bisimide, maleic acid N, N'-4,4'-diphenylsulfone-bisimide, 4,4 '-Diamino-
3,3′-diethyl-5,5′-dimethyldiphenylmethane-bisimide, maleic acid 4,4′-methylene-di-2,6-diisopropylaniline-bisimide and the like are used, and these are used alone or in combination. be able to.

【0010】本発明に用いるジアミンとしては、分子内
にアミノ基を2個含有する化合物であり、ハロゲン元素
を含まないものであれば、特に制限されない。例えば、
4,4’−ジアミノジシクロヘキシルメタン、3,3’
−ジメチル−4,4’−ジアミノジシクロヘキシルメタ
ン、1,4−ジアミノシクロヘキサン、2,6−ジアミ
ノピリジン、メタフェニレンジアミン、4,4’−ジア
ミノジフェニルメタン、ビス(4−アミノフェニル)プ
ロパン、4,4’−ジアミノジフェニルスルホン、1,
3−ビス(2−p−アニリノプロピリデン)ベンゼン、
1,4−ビス(2−p−アニリノプロピリデン)ベンゼ
ン、4,4’−ジアミノ−3,3’−ジエチル−5,
5’−ジメチルジフェニルメタン、ジシアンジアミド、
アセトグアナミン、ベンゾグアナミン、m−トルイレン
ジアミン、2,4−ジアミノ−6−(2’−ウンデシル
イミダゾリル−(1’)−)エチル−S−トリアジン、
2,2−ビス(4−(4−アミノフェノキシ)フェニ
ル)プロパン、1,3−ビス(3−アミノフェノキシ)
ベンゼン、ビス−4−(4−アミノフェノキシ)フェニ
ルスルホン、ビス−4−(3−アミノフェノキシ)フェ
ニルスルホン等が挙げられ、これらを単独あるいは併用
して使用することができる。
The diamine used in the present invention is not particularly limited as long as it is a compound containing two amino groups in the molecule and does not contain a halogen element. For example,
4,4'-diaminodicyclohexylmethane, 3,3 '
-Dimethyl-4,4'-diaminodicyclohexylmethane, 1,4-diaminocyclohexane, 2,6-diaminopyridine, metaphenylenediamine, 4,4'-diaminodiphenylmethane, bis (4-aminophenyl) propane, 4,4 '-Diaminodiphenyl sulfone, 1,
3-bis (2-p-anilinopropylidene) benzene,
1,4-bis (2-p-anilinopropylidene) benzene, 4,4'-diamino-3,3'-diethyl-5,
5'-dimethyldiphenylmethane, dicyandiamide,
Acetoguanamine, benzoguanamine, m-toluylenediamine, 2,4-diamino-6- (2'-undecylimidazolyl- (1 ')-) ethyl-S-triazine,
2,2-bis (4- (4-aminophenoxy) phenyl) propane, 1,3-bis (3-aminophenoxy)
Examples thereof include benzene, bis-4- (4-aminophenoxy) phenyl sulfone, and bis-4- (3-aminophenoxy) phenyl sulfone, and these can be used alone or in combination.

【0011】本発明によれば、ジアミンは、プレポリマ
ー化及び硬化後の耐熱性と、硬化後のTgとの両方を考
慮すると、テトラカルボン酸無水物等1モル当たりジア
ミン0.3〜1.2モルの比率で、テトラカルボン酸無
水物等と反応させることが好ましく、0.5〜1.0モ
ルの比率で反応させることがより好ましい。
According to the present invention, when considering both the heat resistance after prepolymerization and curing and the Tg after curing, the diamine is used in an amount of 0.3 to 1. It is preferable to react with tetracarboxylic acid anhydride or the like at a ratio of 2 mol, and more preferable to react at a ratio of 0.5 to 1.0 mol.

【0012】本発明で用いる(b)水酸化アルミニウム
には、組成式Al・3H Oで表されるギブサ
イト、バイヤライト若しくはノルドストランダイト、ま
たは、Al・HOで表されるベーマイト、
ダイアスポアのいずれも用いることができる。また、こ
れらの1種以上を混合して用いることもできる。製造コ
スト及びプリント配線板の難燃性を考慮すると、結晶水
を分子内に多く有するギブサイト型が好ましい。
(B) Aluminum hydroxide used in the present invention
Has the composition formula AlTwoOThree・ 3HTwo Gibusa represented by O
Ito, Bayer Light or Nord Strandite,
Or AlTwoOThree・ HTwoBoehmite represented by O,
Any of the diaspores can be used. Also, this
It is also possible to use a mixture of one or more of these. Manufacturing
Considering the flame retardancy of strikes and printed wiring boards, crystal water
A gibbsite type having a large amount of γ in the molecule is preferable.

【0013】また、(b)成分に含まれる不純物Na
Oの含有率は、耐熱性を考慮すると0.2重量%未
満であることが好ましい。(b)成分は、形状について
は特に制限されない。(b)成分は、市販されている水
酸化アルミニウムを用いることができる。
Further, the impurity Na contained in the component (b)
The content of 2 O is preferably less than 0.2% by weight in consideration of heat resistance. The shape of the component (b) is not particularly limited. As the component (b), commercially available aluminum hydroxide can be used.

【0014】また、(b)成分に加えて、無機充填剤を
任意に添加することができる。例えば、ボロン、カーボ
ン、クレー、ガラス、炭酸カルシウム、タルク、アルミ
ナ、シリカ、マイカ、酸化チタン、炭酸アルミニウム、
ケイ酸マグネシウム、ケイ酸アルミニウム、ホウ酸アル
ミニウム、炭化ケイ素等が挙げられる。ビーズ、粉末、
繊維、粉砕品、ウィスカ、りん片等の形状で用いること
ができる。例えば、ホウ酸アルミニウム、炭化ケイ素の
ウィスカ、ガラスの単繊維等が挙げられる。
Further, in addition to the component (b), an inorganic filler can be optionally added. For example, boron, carbon, clay, glass, calcium carbonate, talc, alumina, silica, mica, titanium oxide, aluminum carbonate,
Examples thereof include magnesium silicate, aluminum silicate, aluminum borate, and silicon carbide. Beads, powder,
It can be used in the form of fibers, crushed products, whiskers, flakes and the like. Examples thereof include aluminum borate, silicon carbide whiskers, and glass single fibers.

【0015】(b)成分は、難燃効果の発現と塗工作業
性、成形性、耐熱性、及びピール強度を考慮すると、有
機樹脂成分100重量部当たり、50〜150重量部配
合することが好ましく、70〜130重量部配合するこ
とがより好ましい。
The component (b) may be blended in an amount of 50 to 150 parts by weight per 100 parts by weight of the organic resin component in consideration of the expression of flame retardant effect, coating workability, moldability, heat resistance and peel strength. It is more preferable to add 70 to 130 parts by weight.

【0016】本発明に用いる(c)有機シランは、
(b)水酸化アルミニウムの表面処理に加えて、任意に
配合し得る(b)成分以外の無機充填剤の表面処理にも
使用することができる。(c)成分は、ハロゲン元素を
含まないもので、末端に水酸基と反応する官能基を1個
以上有し、かつ炭化水素基として炭素数6〜12のアリ
ール基を少なくとも1個以上有するものであり、その
他、構造等は特に制限されない。
The (c) organosilane used in the present invention is
In addition to the surface treatment of the aluminum hydroxide (b), it can also be used for the surface treatment of an inorganic filler other than the component (b) which can be optionally blended. The component (c) does not contain a halogen element, has at least one functional group that reacts with a hydroxyl group at the terminal, and has at least one aryl group having 6 to 12 carbon atoms as a hydrocarbon group. However, the structure and the like are not particularly limited.

【0017】本発明の(c)成分が末端に有する官能基
としては、例えば、シラン類のヒドロキシル基、アルコ
ール類のヒドロキシル基、カルボン酸類のカルボキシル
基、ケトン類のカルボニル基等が挙げられる。炭素数1
または2のアルコキシ基や、シラノール基等が好まし
い。
Examples of the functional group at the end of the component (c) of the present invention include hydroxyl groups of silanes, hydroxyl groups of alcohols, carboxyl groups of carboxylic acids, carbonyl groups of ketones and the like. Carbon number 1
Alternatively, an alkoxy group of 2, a silanol group and the like are preferable.

【0018】また、(c)成分の分子中の炭化水素基と
しては、炭素数6〜12のアリール基が2つ以上含まれ
ているものが好ましく、炭素数6〜12のアリール基が
3つ以上含まれているものがより好ましい。ここで、ア
リール基はアラルキル、アルカリルを含む。例えば、フ
ェニル、トリル、ナフチル、ベンジル、クメニル、スチ
リル、フェネチル、キシリル、メシチル、シンナミル等
が挙げられる。メチル基、エチル基等の炭化水素基のみ
を有する有機シランに比べ、分子量の大きなアリール基
を1個以上有する(c)成分が水酸化アルミニウムの表
面に付着した場合、水酸化アルミニウムの結晶水を脱水
するのに必要な熱エネルギー量が増加する結果、水酸化
アルミニウムの脱水温度は上昇して、水酸化アルミニウ
ムの耐熱性を向上することが可能となる。
The hydrocarbon group in the molecule of component (c) preferably contains two or more aryl groups having 6 to 12 carbon atoms, and three aryl groups having 6 to 12 carbon atoms. Those contained above are more preferable. Here, the aryl group includes aralkyl and alkaryl. Examples thereof include phenyl, tolyl, naphthyl, benzyl, cumenyl, styryl, phenethyl, xylyl, mesityl, cinnamyl and the like. When the component (c) having at least one aryl group having a large molecular weight adheres to the surface of aluminum hydroxide as compared with an organic silane having only a hydrocarbon group such as a methyl group and an ethyl group, the water of crystallization of aluminum hydroxide is removed. As a result of an increase in the amount of heat energy required for dehydration, the dehydration temperature of aluminum hydroxide rises, and the heat resistance of aluminum hydroxide can be improved.

【0019】(c)成分は、(b)成分の表面に付着さ
せるため、耐熱性を考慮するとゲル状態ではないことが
好ましく、付着むらが生じない状態が好ましい。本発明
の(c)成分を(b)成分及び任意に配合し得る(b)
成分以外の無機充填剤の表面に付着させる方法は、特に
制限されない。(c)成分を直接添加する乾式法、有機
溶媒等で希釈した処理液を用いる湿式法等が好ましい。
熱硬化性樹脂ワニス中に配合して攪拌することによって
も効果が得られる。
Since the component (c) is attached to the surface of the component (b), it is preferable that it is not in a gel state in consideration of heat resistance, and it is preferable that uneven attachment does not occur. The component (c) of the present invention may be blended with the component (b) and optionally (b).
The method of adhering to the surface of the inorganic filler other than the components is not particularly limited. A dry method in which the component (c) is directly added, a wet method using a treatment liquid diluted with an organic solvent, and the like are preferable.
The effect can also be obtained by blending in a thermosetting resin varnish and stirring.

【0020】(c)成分の配合量は、界面接着性及び耐
熱性の両方を考慮すると、(b)成分及び他の充填材の
総重量当たり、0.01〜10重量部が好ましく、1〜
7重量部がより好ましい。また、有機樹脂固形分100
重量部当たり、0.005〜15重量部が好ましく、
0.5〜10.5重量部がより好ましい。
Considering both interfacial adhesion and heat resistance, the blending amount of component (c) is preferably 0.01 to 10 parts by weight, based on the total weight of component (b) and other fillers,
7 parts by weight is more preferred. In addition, organic resin solid content 100
0.005 to 15 parts by weight is preferable per part by weight,
0.5 to 10.5 parts by weight is more preferable.

【0021】本発明によれば、積層板特性の改質剤とし
て、(d)非ハロゲン系エポキシ樹脂を配合することが
好ましい。本発明の(d)成分は、分子内にエポキシ基
を2個以上有し、かつハロゲン化されていない樹脂であ
る。有機臭素化合物、有機塩素化合物、または無機塩素
化合物等のハロゲン化物を実質的に含有しない。例え
ば、ビスフェノールA型エポキシ樹脂、ビスフェノール
F型エポキシ樹脂、ビスフェノールS型エポキシ樹脂、
ビフェニル型エポキシ樹脂、脂環式エポキシ樹脂、多官
能フェノールのグリシジルエーテル化物、多官能アルコ
ールのグリシジルエーテル化物、これらの水素添加物等
が挙げられる。これらを1種類以上併用することもでき
る。
According to the present invention, it is preferable to add (d) a non-halogen type epoxy resin as a modifier for the properties of the laminate. The component (d) of the present invention is a resin that has two or more epoxy groups in the molecule and is not halogenated. It is substantially free of halides such as organic bromine compounds, organic chlorine compounds, or inorganic chlorine compounds. For example, bisphenol A type epoxy resin, bisphenol F type epoxy resin, bisphenol S type epoxy resin,
Examples thereof include a biphenyl type epoxy resin, an alicyclic epoxy resin, a polyfunctional phenol glycidyl ether compound, a polyfunctional alcohol glycidyl ether compound, and hydrogenated products thereof. One or more of these may be used in combination.

【0022】また、本発明によれば、(d)成分には、
樹脂ワニスの硬化後のTgや耐熱性を改善するために、
フェノール類とホルムアルデヒドの重縮合物のグリシジ
ルエーテル化物を用いることが好ましい。このような樹
脂としては、例えば、フェノールノボラック型エポキシ
樹脂、クレゾールノボラック型エポキシ樹脂、ビスフェ
ノールAノボラック型エポキシ樹脂等が挙げられ、これ
らは単独若しくは併用して用いることができる。
According to the present invention, the component (d) includes
In order to improve the Tg and heat resistance of the resin varnish after curing,
It is preferable to use a glycidyl ether compound of a polycondensation product of phenols and formaldehyde. Examples of such a resin include a phenol novolac type epoxy resin, a cresol novolac type epoxy resin, and a bisphenol A novolac type epoxy resin. These can be used alone or in combination.

【0023】本発明の(d)成分の配合量は、ドリル加
工性とTg及び耐熱性との両方を考慮すると、(a)成
分100重量部当たり、30〜150重量部が好まし
く、50〜100重量部が好ましい。
The amount of the component (d) used in the present invention is preferably 30 to 150 parts by weight, preferably 50 to 100 parts by weight, per 100 parts by weight of the component (a), in consideration of both drill workability, Tg and heat resistance. Parts by weight are preferred.

【0024】上記(a)、(b)、(c)及び(d)成
分に加えて、本発明の目的を阻害しない範囲で、任意
に、硬化促進剤、水酸化アルミニウム以外の充填剤、着
色剤、酸化防止剤、還元剤、紫外線不透過剤等を加える
ことができる。特に無機充填剤は、難燃性を改善するの
に効果がある。これらは、1種類を用いても2種類以上
を併用しても良い。
In addition to the above-mentioned components (a), (b), (c) and (d), a curing accelerator, a filler other than aluminum hydroxide, and a coloring agent may be optionally used as long as the object of the present invention is not impaired. Agents, antioxidants, reducing agents, UV opaque agents and the like can be added. In particular, the inorganic filler is effective in improving flame retardancy. These may be used alone or in combination of two or more.

【0025】本発明において、全有機樹脂固形分の重量
に対し、難燃性を考慮すると、窒素元素の含有率である
窒素含有率が5重量%以上であることが好ましい。全有
機樹脂固形分とは、(a)ポリイミド樹脂プレポリマ
ー、(d)非ハロゲン系エポキシ樹脂、及びその他に配
合した有機樹脂重量の合計量である。窒素含有率とはそ
の合計量に対する窒素元素の含有率である。
In the present invention, considering the flame retardancy, the nitrogen content, which is the content of nitrogen element, is preferably 5% by weight or more based on the weight of the total solid content of the organic resin. The total organic resin solid content is the total amount of (a) the polyimide resin prepolymer, (d) the non-halogen-based epoxy resin, and the weight of the organic resin blended with the other. The nitrogen content is the content of elemental nitrogen with respect to the total amount.

【0026】本発明によれば、上記(a)、(b)、
(c)及び任意に(d)成分を溶剤中で配合して得たポ
リイミド樹脂ワニスをガラス基材に含浸させて、乾燥す
ることによりプリプレグを得ることができる。慣用のプ
リプレグの製造方法を用いることができる。ここで使用
するガラス基材の種類は特に制限されない。例えば、ガ
ラス織布、ガラス不織布等が挙げられる。厚さ0.02
〜0.4mmのものを、目的のプリプレグまたは積層板
の厚さに合わせて使用することができる。ここで、含浸
量は樹脂分として示されるが、樹脂分とは、プリプレグ
の全重量に対する有機樹脂固形分と無機充填剤との合計
重量部の割合である。含浸量または樹脂分は、30〜8
0重量%であることが好ましく、40〜70重量%であ
ることがより好ましい。樹脂分は目的のプリプレグの性
能、及び積層後の絶縁層の厚さに合わせて適宜決定する
ことができる。プリプレグを製造する乾燥条件は、乾燥
温度60〜200℃、乾燥時間1〜30分間の範囲で、
目的のプリプレグ特性に合わせて自由に選択することが
できる。
According to the present invention, the above (a), (b),
A prepreg can be obtained by impregnating a glass substrate with a polyimide resin varnish obtained by blending (c) and optionally component (d) in a solvent and drying. Conventional prepreg manufacturing methods can be used. The type of glass substrate used here is not particularly limited. For example, glass woven cloth, glass non-woven cloth and the like can be mentioned. Thickness 0.02
Those having a thickness of up to 0.4 mm can be used depending on the thickness of the target prepreg or laminate. Here, the impregnated amount is shown as a resin content, and the resin content is a ratio of a total weight part of the organic resin solid content and the inorganic filler to the total weight of the prepreg. The impregnation amount or resin content is 30 to 8
It is preferably 0% by weight, more preferably 40 to 70% by weight. The resin content can be appropriately determined according to the performance of the desired prepreg and the thickness of the insulating layer after lamination. The drying conditions for producing the prepreg are a drying temperature of 60 to 200 ° C. and a drying time of 1 to 30 minutes.
It can be freely selected according to the desired prepreg characteristics.

【0027】目的とする積層板の厚みに合わせて得られ
たプリプレグを積層し、その片側または両側に金属箔を
重ね、加熱加圧して積層板を製造する。金属箔には、主
に銅箔やアルミ箔を用いるが、他の金属箔を用いること
もできる。金属箔の厚みは通常3〜200μmであるこ
とが好ましい。積層板製造時の加熱温度は130〜25
0℃が好ましく、160〜200℃がより好ましい。圧
力は0.5〜10MPaが好ましく、1〜4MPaがよ
り好ましい。プリプレグ特性や、プレス機の能力、目的
の積層板の厚み等により適宜決定することができる。
The prepreg obtained according to the desired thickness of the laminated plate is laminated, one side or both sides of the prepreg are laminated, and heated and pressed to produce a laminated plate. Copper foil or aluminum foil is mainly used as the metal foil, but other metal foils can also be used. The thickness of the metal foil is usually preferably 3 to 200 μm. The heating temperature at the time of manufacturing the laminated plate is 130 to 25
0 degreeC is preferable and 160-200 degreeC is more preferable. The pressure is preferably 0.5 to 10 MPa, more preferably 1 to 4 MPa. It can be appropriately determined depending on the prepreg characteristics, the ability of the press, the desired thickness of the laminate, and the like.

【0028】[0028]

【実施例】以下、本発明を実施例に基づき、より詳細に
説明する。これらの実施例は、本発明を如何なる意味に
おいても制限するものではない。なお、実施例中、他に
断らない限り、部は重量部を意味する。
EXAMPLES The present invention will now be described in more detail based on examples. These examples do not limit the invention in any way. In the examples, "parts" means "parts by weight" unless otherwise specified.

【0029】実施例1 マレイン酸N,N’−4,4’−ジフェニルメタン−ビ
スイミド100部及び4,4’−ジアミノジフェニルメ
タン30部をエチレングリコールモノメチルエーテル1
50部中に入れ、攪拌しながら、125℃で90分間還
流下加熱した。その後、液温を80℃まで冷却し、o−
クレゾールノボラック型エポキシ樹脂(東都化成株式会
社製、商品名:YDCN−703Sを使用)130部を
加え、更に60分攪拌し、その後30℃まで冷却した。
次いで、ジシアンジアミド6部、イミダゾール硬化促進
剤(四国化成株式会社製、商品名:キュアゾールC11
Z−Aを使用)0.3部、トリメトキシモノフェニルシ
ラン16部、水酸化アルミニウム(ギブサイト型)32
0部及びエチレングリコールモノメチルエーテル10
8.1部を加えて攪拌し、不揮発分70重量%、窒素含
有率6.0重量%の樹脂ワニスを作成した。このワニス
を100μmのガラス織布(IPC品番#2116タイ
プ)に含浸し、180℃の乾燥器中で6分間乾燥し、樹
脂分60%のB−ステージ状態のプリプレグを得た。
Example 1 100 parts of maleic acid N, N'-4,4'-diphenylmethane-bisimide and 30 parts of 4,4'-diaminodiphenylmethane were mixed with 1 part of ethylene glycol monomethyl ether.
It was put in 50 parts and heated at 125 ° C. for 90 minutes under reflux with stirring. After that, the liquid temperature is cooled to 80 ° C., and o-
130 parts of cresol novolac type epoxy resin (manufactured by Tohto Kasei Co., Ltd., trade name: YDCN-703S) was added, and the mixture was further stirred for 60 minutes and then cooled to 30 ° C.
Next, 6 parts of dicyandiamide and an imidazole curing accelerator (manufactured by Shikoku Kasei Co., Ltd., trade name: Curezol C 11
0.3 part, methoxy monophenylsilane 16 parts, aluminum hydroxide (gibbsite type) 32
0 parts and ethylene glycol monomethyl ether 10
8.1 parts were added and stirred to prepare a resin varnish having a nonvolatile content of 70% by weight and a nitrogen content of 6.0% by weight. A 100 μm glass woven fabric (IPC product number # 2116 type) was impregnated with this varnish and dried in a dryer at 180 ° C. for 6 minutes to obtain a prepreg in a B-stage state having a resin content of 60%.

【0030】実施例2 実施例1において、トリメトキシモノフェニルシランの
代わりにモノヒドロキシトリフェニルシランを9.6部
用いた以外は、実施例1と同様にして不揮発分70重量
%、窒素含有率6.0重量%の樹脂ワニスを得た。得ら
れたワニスを実施例1と同様にして、樹脂分60%のB
−ステージ状態のプリプレグを得た。
Example 2 In the same manner as in Example 1 except that 9.6 parts of monohydroxytriphenylsilane was used instead of trimethoxymonophenylsilane, the nonvolatile content was 70% by weight and the nitrogen content was the same. A resin varnish of 6.0% by weight was obtained. The varnish thus obtained was treated in the same manner as in Example 1 to obtain B having a resin content of 60%.
-A stage prepreg is obtained.

【0031】有機シラン処理A溶液の調整 攪拌装置を備えたガラス製フラスコに、トリメトキシモ
ノフェニルシラン及びエチレングリコールモノメチルエ
ーテルを入れ、トリメトキシモノフェニルシランの10
wt%溶液を作成した。さらに、攪拌を継続しながら、
溶液1部に対して水酸化アルミニウム(ギブサイト型)
2部を入れて、有機シラン処理A溶液を作成した。
Preparation of solution of organosilane treatment A In a glass flask equipped with a stirrer, trimethoxymonophenylsilane and ethylene glycol monomethyl ether were placed, and 10 parts of trimethoxymonophenylsilane was added.
A wt% solution was made. Furthermore, while continuing stirring,
Aluminum hydroxide (gibbsite type) for 1 part of solution
An organic silane-treated A solution was prepared by adding 2 parts.

【0032】実施例3 実施例1において、トリメトキシモノフェニルシラン1
6部、水酸化アルミニウム(ギブサイト型)320部及
びエチレングリコールモノメチルエーテル108.1部
の代わりに、有機シラン処理A溶液を480部使用した
以外は、実施例1と同様にして不揮発分67重量%、窒
素含有率6.0重量%の樹脂ワニスを得た。得られたワ
ニスを実施例1と同様にして、樹脂分60%のB−ステ
ージ状態のプリプレグを得た。
EXAMPLE 3 In Example 1, trimethoxymonophenylsilane 1
Nonvolatile content 67% by weight in the same manner as in Example 1 except that 480 parts of organosilane-treated A solution was used instead of 6 parts, 320 parts of aluminum hydroxide (gibbsite type) and 108.1 parts of ethylene glycol monomethyl ether. A resin varnish having a nitrogen content of 6.0% by weight was obtained. The obtained varnish was treated in the same manner as in Example 1 to obtain a prepreg in a B-stage state having a resin content of 60%.

【0033】実施例4 マレイン酸N,N’−4,4’−ジフェニルメタン−ビ
スイミド100部及び2,2−ビス(4−(4−アミノ
フェノキシ)フェニル)プロパン50部をエチレングリ
コールモノメチルエーテル150部中に投入し、125
℃にて90分還流加熱、攪拌した。液温100℃まで冷
却した後、ベンゾグアナミン20部及びフェノールノボ
ラック型エポキシ樹脂(東都化成株式会社製、商品名:
YDPN−638Pを使用)110部を加え、更に90
分攪拌し、その後室温にて、ジメトキシジフェニルシラ
ン8部、水酸化アルミニウム(ギブサイト型)200部
及びエチレングリコールモノメチルエーテル90部を加
えて攪拌し、不揮発分67重量%、窒素含有率6.7重
量%の樹脂ワニスを作成した。このワニスを50μmの
ガラス織布(IPC品番#1080タイプ)に含浸し、
170℃の乾燥器中で7分間乾燥し、樹脂分70%のB
−ステージ状態のプリプレグを得た。
Example 4 100 parts of N, N'-4,4'-diphenylmethane-bisimide maleate and 50 parts of 2,2-bis (4- (4-aminophenoxy) phenyl) propane were added to 150 parts of ethylene glycol monomethyl ether. Throw in 125
The mixture was heated at reflux at 90 ° C. for 90 minutes and stirred. After cooling to a liquid temperature of 100 ° C., 20 parts of benzoguanamine and a phenol novolac type epoxy resin (manufactured by Toto Kasei Co., Ltd., trade name:
YDPN-638P is used) 110 parts are added, and further 90
After stirring for minutes, at room temperature, 8 parts of dimethoxydiphenylsilane, 200 parts of aluminum hydroxide (gibbsite type) and 90 parts of ethylene glycol monomethyl ether were added and stirred to give a nonvolatile content of 67% by weight and a nitrogen content of 6.7% by weight. % Resin varnish was prepared. This varnish is impregnated into a 50 μm glass woven cloth (IPC product number # 1080 type),
After drying for 7 minutes in a dryer at 170 ° C, B containing 70% resin
-A stage prepreg is obtained.

【0034】実施例5 実施例4において、ジメトキシジフェニルシランの代わ
りにモノヒドロキシトリフェニルシランを6部使用した
以外は、実施例1と同様にして不揮発分67重量%、窒
素含有率6.7重量%の樹脂ワニスを得た。得られたワ
ニスを実施例4と同様にして、樹脂分70%のB−ステ
ージ状態のプリプレグを得た。
Example 5 In the same manner as in Example 4 except that 6 parts of monohydroxytriphenylsilane was used instead of dimethoxydiphenylsilane, the nonvolatile content was 67% by weight and the nitrogen content was 6.7% by weight. % Resin varnish was obtained. The varnish obtained was treated in the same manner as in Example 4 to obtain a prepreg in a B-stage state having a resin content of 70%.

【0035】比較例1 実施例4において、水酸化アルミニウムの配合量を12
0部にした以外は、実施例4と同様な方法で、不揮発分
63重量%、窒素含有率6.7重量%の樹脂ワニスを得
た。このワニスを用いて実施例4と同様の方法にて、樹
脂分68%のB−ステージ状態のプリプレグを得た。
Comparative Example 1 In Example 4, the compounding amount of aluminum hydroxide was 12
A resin varnish having a nonvolatile content of 63% by weight and a nitrogen content of 6.7% by weight was obtained in the same manner as in Example 4 except that the content was 0 part. Using this varnish, a prepreg in a B-stage state having a resin content of 68% was obtained in the same manner as in Example 4.

【0036】比較例2 実施例1におけるトリメトキシモノフェニルシランを用
いずに、エチレングリコールモノメチルエーテルの配合
量を100部にした以外は、実施例1と同様な方法でワ
ニスを合成し、樹脂分60%のB−ステージ状態のプリ
プレグを得た。
Comparative Example 2 A varnish was synthesized in the same manner as in Example 1 except that trimethoxymonophenylsilane in Example 1 was not used and the amount of ethylene glycol monomethyl ether was changed to 100 parts. A 60% B-stage prepreg was obtained.

【0037】比較例3 実施例1における4,4’−ジアミノジフェニルメタン
の配合量を20部に、o−クレゾールノボラック型エポ
キシ樹脂の配合量を175部に、ジシアンジアミドの配
合量を5部にした以外は実施例1と同様な方法で、不揮
発分71重量%、窒素含有率4.7重量%の樹脂ワニス
を得た。このワニスを用いて実施例1と同様の方法にて
樹脂分59%のB−ステージ状態のプリプレグを得た。
Comparative Example 3 In Example 1, except that the content of 4,4'-diaminodiphenylmethane was 20 parts, the content of o-cresol novolac type epoxy resin was 175 parts, and the content of dicyandiamide was 5 parts. In the same manner as in Example 1, a resin varnish having a nonvolatile content of 71% by weight and a nitrogen content of 4.7% by weight was obtained. Using this varnish, a prepreg in a B-stage state having a resin content of 59% was obtained in the same manner as in Example 1.

【0038】金属張り積層板の製造方法 実施例1、2、3及び比較例1、2については、上記の
工程で得られたプリプレグ4枚を重ね、その外側に厚さ
18μmの銅箔を配し、圧力3MPa、温度200℃で
80分間加熱加圧して両面銅張積層板を得た。実施例
4、5及び比較例3については、得られたプリプレグ8
枚を重ね、同様の積層方法にて両面銅張積層板を得た。
Manufacturing Method of Metal-clad Laminated Plates In Examples 1, 2 and 3 and Comparative Examples 1 and 2, four prepregs obtained in the above steps were stacked and a copper foil having a thickness of 18 μm was arranged on the outside thereof. Then, it was heated and pressed at a pressure of 3 MPa and a temperature of 200 ° C for 80 minutes to obtain a double-sided copper clad laminate. For Examples 4 and 5 and Comparative Example 3, the obtained prepreg 8
The sheets were stacked and a double-sided copper clad laminate was obtained by the same laminating method.

【0039】得られた両面銅張積層板の銅箔をエッチン
グした後、UL−94耐熱性試験、Tgの測定及び基板
はんだ耐熱性試験を行った。結果を表1に示す。
After etching the copper foil of the obtained double-sided copper-clad laminate, UL-94 heat resistance test, Tg measurement and substrate solder heat resistance test were conducted. The results are shown in Table 1.

【0040】なお、Tgの測定は、株式会社ユービーエ
ム製、Rheogel E−4000型粘弾性測定装置
を用いて測定した。また、基板はんだ耐熱性は、表1に
記載した吸湿処理後、288℃のはんだ槽に20秒間浸
漬した基材を観察し、評価した。各記号はそれぞれ、
○:変化無し、△:ミーズリング発生、×:ふくれ発生
を意味する。
The Tg was measured using a Rheogel E-4000 viscoelasticity measuring device manufactured by UBM Co., Ltd. Further, the soldering heat resistance of the substrate was evaluated by observing the substrate immersed in a solder bath at 288 ° C. for 20 seconds after the moisture absorption treatment shown in Table 1. Each symbol is
◯: No change, Δ: occurrence of measling, ×: occurrence of blister.

【0041】[0041]

【表1】 [Table 1]

【0042】表1から明らかなように、本発明のプリプ
レグを用いた金属張り積層板は、ハロゲン元素を用いず
にUL−94耐熱性試験においてV−0を達成した。ま
た、TgもDVE法で230℃以上の高Tgを有し、基
板はんだ耐熱性も良好であった。一方、比較例では、水
酸化アルミニウムの配合量を有機樹脂固形分100重量
部当たり50重量部未満とした比較例1、及び全有機樹
脂固形分中の窒素含有率を5重量%未満に低くした比較
例3は、耐熱性試験でV−0を達成できなかった。更
に、(c)成分を使用しなかった比較例2は、耐熱性試
験はV−0であったが、基板はんだ耐熱性が劣り、所望
の性能を達成し得なかった。
As is clear from Table 1, the metal-clad laminate using the prepreg of the present invention achieved V-0 in the UL-94 heat resistance test without using a halogen element. Further, Tg also had a high Tg of 230 ° C. or higher by the DVE method, and the substrate soldering heat resistance was also good. On the other hand, in Comparative Examples, the content of aluminum hydroxide was less than 50 parts by weight per 100 parts by weight of the organic resin solids, and the nitrogen content in the total organic resin solids was reduced to less than 5% by weight. Comparative Example 3 could not achieve V-0 in the heat resistance test. Further, in Comparative Example 2 in which the component (c) was not used, the heat resistance test was V-0, but the solder heat resistance of the substrate was poor and the desired performance could not be achieved.

【0043】[0043]

【発明の効果】本発明によるプリプレグは、ハロゲン元
素を用いず、難燃性を有し、Tgが高く、基板はんだ耐
熱性に優れており、これを用いることにより、プリント
配線板用金属張り積層板を得ることができる。また、こ
の積層板は優れた難燃性を示すと同時に、燃焼時にダイ
オキシン等の有害物質を発生する原因となるハロゲン元
素成分を実質的に含有せず、環境問題に対応した金属張
り積層板である。
EFFECTS OF THE INVENTION The prepreg according to the present invention does not use a halogen element, has flame retardancy, has a high Tg, and is excellent in heat resistance to soldering on a substrate. By using this, a metal-clad laminate for a printed wiring board is obtained. The board can be obtained. In addition, this laminated plate shows excellent flame retardancy, and at the same time, it does not substantially contain halogen element components that cause harmful substances such as dioxins during combustion, and is a metal-clad laminated plate that is environmentally friendly. is there.

───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.7 識別記号 FI テーマコート゛(参考) C08L 63/00 C08L 79/08 A 79/08 C08K 5/54 Fターム(参考) 4F072 AA05 AA07 AA09 AD27 AD45 AE07 AF03 AF21 AG03 AG19 AH02 AJ04 AK02 AL13 4F100 AA19A AB01B AB01C AB17 AB33B AB33C AH06A AK01A AK49A AK53A AK54A AL05A BA02 BA03 BA07 BA10B BA10C DH01A EJ172 EJ422 GB43 JB16A YY00A 4J002 CD012 CD022 CD052 CD072 CM041 DE146 EX037 EX047 GF00 GQ00 ─────────────────────────────────────────────────── ─── Continuation of front page (51) Int.Cl. 7 Identification code FI theme code (reference) C08L 63/00 C08L 79/08 A 79/08 C08K 5/54 F term (reference) 4F072 AA05 AA07 AA09 AD27 AD45 AE07 AF03 AF21 AG03 AG19 AH02 AJ04 AK02 AL13 4F100 AA19A AB01B AB01C AB17 AB33B AB33C AH06A AK01A AK49A AK53A AK54A AL05A BA02 BA03 BA07 BA10 B07 CD10 EX0G0 CD02 CD047CD02Q2 CD43 J2J040CD2 J4160 001

Claims (8)

【特許請求の範囲】[Claims] 【請求項1】プリント配線板用プリプレグであって、
(a)ポリイミド樹脂プレポリマー;(b)水酸化アル
ミニウム;および、(c)末端に水酸基と反応する官能
基を1個以上有し、かつ炭化水素基として炭素数6〜1
2のアリール基を少なくとも1個以上有する有機シラン
を含む、ハロゲン元素を含有しない熱硬化性樹脂ワニス
から得られたことを特徴とする、プリント配線板用のガ
ラス基材ポリイミド樹脂プリプレグ。
1. A prepreg for a printed wiring board, comprising:
(A) a polyimide resin prepolymer; (b) aluminum hydroxide; and (c) having at least one functional group that reacts with a hydroxyl group at the terminal and having 6 to 1 carbon atoms as a hydrocarbon group.
A glass-based polyimide resin prepreg for a printed wiring board, which is obtained from a thermosetting resin varnish containing no halogen element, which contains an organic silane having at least one aryl group of 2.
【請求項2】熱硬化性樹脂ワニスが、該(a)成分中の
有機樹脂固形分100重量部、該(b)成分50〜15
0重量部、および該(c)成分0.005〜15重量部
を含む、請求項1記載のプリプレグ。
2. A thermosetting resin varnish comprises 100 parts by weight of an organic resin solid content in the component (a) and 50 to 15 parts of the component (b).
The prepreg according to claim 1, comprising 0 part by weight and 0.005 to 15 parts by weight of the component (c).
【請求項3】該熱硬化性樹脂ワニスが、更に、(d)1
分子中にエポキシ基を少なくとも2個以上有する非ハロ
ゲン系エポキシ樹脂を含む、請求項1または2に記載の
プリプレグ。
3. The thermosetting resin varnish further comprises (d) 1
The prepreg according to claim 1 or 2, comprising a non-halogen epoxy resin having at least two epoxy groups in the molecule.
【請求項4】該(c)成分中に炭化水素基として炭素数
6〜12のアリール基が2つ以上含まれていることを特
徴とする請求項1、2または3に記載のプリプレグ。
4. The prepreg according to claim 1, 2 or 3, wherein the component (c) contains two or more aryl groups having 6 to 12 carbon atoms as hydrocarbon groups.
【請求項5】該(c)成分中に炭素数6〜12のアリー
ル基が3つ以上含まれていることを特徴とする請求項
1、2または3に記載のプリプレグ。
5. The prepreg according to claim 1, wherein the component (c) contains three or more aryl groups having 6 to 12 carbon atoms.
【請求項6】該ワニスの全有機樹脂固形分中の窒素含有
量が、5重量%以上である請求項1〜5のいずれか記1
項記載のプリプレグ。
6. The nitrogen content in the total organic resin solids content of the varnish is 5% by weight or more, 1).
The prepreg described in the item.
【請求項7】該(d)成分がフェノール類とホルムアル
デヒドとの重縮合物のグリシジルエーテル化物である、
請求項1〜6のいずれか1項記載のプリプレグ。
7. The component (d) is a glycidyl ether compound of a polycondensation product of phenols and formaldehyde.
The prepreg according to any one of claims 1 to 6.
【請求項8】請求項1〜7のいずれか1項記載のプリプ
レグを少なくとも1枚以上積層し、その片面若しくは両
面に金属箔を配して加熱加圧成形して得られる金属張り
積層板。
8. A metal-clad laminate obtained by laminating at least one prepreg according to any one of claims 1 to 7 and arranging a metal foil on one side or both sides of the prepreg and heat-pressing.
JP2002028359A 2002-02-05 2002-02-05 Pre-preg for non-halogen printed wiring board and its use Expired - Lifetime JP4055049B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2002028359A JP4055049B2 (en) 2002-02-05 2002-02-05 Pre-preg for non-halogen printed wiring board and its use

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2002028359A JP4055049B2 (en) 2002-02-05 2002-02-05 Pre-preg for non-halogen printed wiring board and its use

Publications (2)

Publication Number Publication Date
JP2003229647A true JP2003229647A (en) 2003-08-15
JP4055049B2 JP4055049B2 (en) 2008-03-05

Family

ID=27749602

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2002028359A Expired - Lifetime JP4055049B2 (en) 2002-02-05 2002-02-05 Pre-preg for non-halogen printed wiring board and its use

Country Status (1)

Country Link
JP (1) JP4055049B2 (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006176726A (en) * 2004-12-24 2006-07-06 Hitachi Chem Co Ltd Prepreg for printed wiring board and metal clad laminated board using it
JP2007507588A (en) * 2003-10-01 2007-03-29 アルベマール・コーポレーシヨン Flame retardant epoxy prepreg, laminate, and printed wiring board with increased thermal stability
JP2009024146A (en) * 2006-09-29 2009-02-05 Hitachi Chem Co Ltd Thermosetting resin composition and prepreg and laminate using the same

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007507588A (en) * 2003-10-01 2007-03-29 アルベマール・コーポレーシヨン Flame retardant epoxy prepreg, laminate, and printed wiring board with increased thermal stability
JP2006176726A (en) * 2004-12-24 2006-07-06 Hitachi Chem Co Ltd Prepreg for printed wiring board and metal clad laminated board using it
JP2009024146A (en) * 2006-09-29 2009-02-05 Hitachi Chem Co Ltd Thermosetting resin composition and prepreg and laminate using the same

Also Published As

Publication number Publication date
JP4055049B2 (en) 2008-03-05

Similar Documents

Publication Publication Date Title
JP5186221B2 (en) Flame retardant resin composition, prepreg, laminate, metal-clad laminate, printed wiring board and multilayer printed wiring board using the same
JP2004059643A (en) Prepreg and laminated plate
WO2012083727A1 (en) Halogen-free high-tg resin composition and prepreg and laminate fabricated by using the same
US20120024580A1 (en) Epoxy resin composition, and prepreg and printed circuit board using the same
JP2004182850A (en) Prepreg having excellent balance of characteristics and laminated sheet
JP2006291098A (en) Thermosetting resin composition and prepreg, metal-coated laminate board and wiring board using the same
JP5310472B2 (en) High heat-resistant aluminum hydroxide particles, production method thereof, resin composition containing the particles, and printed wiring board using the resin composition
JP2004175925A (en) Prepreg and laminate
JP2001294689A (en) Prepreg and laminated board
JP2003231762A (en) Prepreg and laminated sheet
JP4770019B2 (en) Prepreg and metal foil-clad laminate
JP3664124B2 (en) Flame retardant resin composition, prepreg, laminate, metal-clad laminate, printed wiring board and multilayer printed wiring board using the same
JP2003277591A (en) Epoxy resin composition, prepreg and laminate
TWI700328B (en) Resin composition, prepreg, resin sheet, metal foil-clad laminate, and printed wiring board
JP2002249552A (en) Phosphorus-containing epoxy resin composition, resin sheet, metal foil having resin, prepreg, laminate, and multilayer board
JP2000239525A (en) Flame-retardant resin composition and layer insulation adhesive
JP2001081282A (en) Epoxy resin composition and flexible printed wiring board material containing the same
JP2003147171A (en) Method for producing insulating resin composition, insulating resin composition, and copper-foil laminated insulating material and copper-clad laminate
JP4089173B2 (en) Pre-preg for printed wiring board and metal-clad laminate
CN108219134B (en) Prepolymer and resin composition of modified composite bismaleimide resin, and prepreg and laminated board manufactured by using prepolymer and resin composition
JP2009120696A (en) Prepreg and metal-clad laminate
JP4055049B2 (en) Pre-preg for non-halogen printed wiring board and its use
JP2002220435A (en) Phosphorus-containing epoxy resin composition, prepreg, resin-coated metal foil, adhesive sheet, laminated board and multilayer board, phosphorus-containing epoxy resin varnish for coating, phosphorus-containing epoxy resin sealing material, phosphorus-containing epoxy resin casting material and phosphorus-containing epoxy resin varnish for immersion
JP4714970B2 (en) Epoxy resin composition, prepreg, and copper-clad laminate using the same
JP2002012739A (en) Flame-retardant epoxy resin composition and use thereof

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20050202

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20070510

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20070709

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20071115

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20071128

R151 Written notification of patent or utility model registration

Ref document number: 4055049

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R151

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20101221

Year of fee payment: 3

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20101221

Year of fee payment: 3

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20111221

Year of fee payment: 4

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20111221

Year of fee payment: 4

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20121221

Year of fee payment: 5

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20121221

Year of fee payment: 5

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20131221

Year of fee payment: 6

S531 Written request for registration of change of domicile

Free format text: JAPANESE INTERMEDIATE CODE: R313531

S533 Written request for registration of change of name

Free format text: JAPANESE INTERMEDIATE CODE: R313533

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20131221

Year of fee payment: 6

R350 Written notification of registration of transfer

Free format text: JAPANESE INTERMEDIATE CODE: R350

EXPY Cancellation because of completion of term