JP2003229403A - Spin processing device and method therefor - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a spin processing device capable of detecting the slanted state of a substrate retained on a turn table. <P>SOLUTION: The spin processing device for processing the substrate W while turning the same is provided with a turn table 3 driven to be turned, a plurality of supporting members 4 provided on the turn table to retain the peripheral part of the substrate supplied to the turn table, and a detecting means 35 for detecting the retaining state of the substrate retained by the supporting members. <P>COPYRIGHT: (C)2003,JPO

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a spin processing apparatus and a spin processing method for holding a substrate on a rotary table and processing the substrate while rotating the rotary table.

[0002]

2. Description of the Related Art For example, in a manufacturing process of a liquid crystal display device or a semiconductor device, there is a film forming process or a photo process for forming a circuit pattern on a substrate such as a glass substrate or a semiconductor wafer. In these processes, the film forming process and the cleaning process are repeatedly performed on the substrate.

A spin processing apparatus is used to perform the cleaning processing of the substrate and the drying processing after the cleaning processing. This spin processing apparatus has a cup body, and a rotary table that is driven to rotate is provided in the cup body. A holding mechanism is provided on the turntable, and the substrate is detachably held by the holding mechanism.

The substrate held by this holding mechanism rotates together with the turntable. The cleaning process is performed by injecting the processing liquid onto the rotating substrate, and after the cleaning process, the substrate is rotated at a higher speed than during the cleaning process, whereby the drying process is performed by the centrifugal force.

The holding mechanism comprises a plurality of, for example, four, which are rotatably provided at predetermined intervals in the circumferential direction of the turntable.
~ It has a shaft-shaped holding member as six holding portions. A claw member having an inclined surface on the upper end surface of each holding member and having a locking portion at the upper end in the inclined direction of the inclined surface is provided at a position eccentric from the rotation center of the holding member.

The substrate is supplied to the turntable by the robot. That is, the substrate is supplied so that the peripheral portion thereof is located on the inclined surface of each claw member. In that state, the plurality of holding members are rotated by the drive mechanism. As a result, the claw member rotates eccentrically, so that the peripheral portion of the substrate competes with the inclined surface and is held by being engaged with the locking portion.

[0007]

When the substrate is supplied to the rotary table by the robot, an error may occur in the accuracy of gripping the substrate by the hand of the robot, the positioning accuracy of the hand, and the like. Will be displaced from the predetermined position with respect to the rotary table.

If the substrate supply position to the rotary table is deviated, a part of the peripheral edge of the substrate may come off the inclined surface of the claw member. When the holding member is rotated to clamp the substrate in that state, the portion of the peripheral edge of the substrate that is off the inclined surface may not be clamped by the locking portion.
If the turntable is rotated in that state, the substrate will be scattered from the turntable and damaged.

When a part of the board is not clamped by the claw member, the board is inclined with respect to the horizontal state. However, since the inclination angle of the substrate is often small, it is often difficult for the operator to visually confirm it.

It is an object of the present invention to provide a spin processing apparatus and a spin processing method capable of detecting when a substrate is not reliably held by a plurality of holding parts.

[0011]

According to a first aspect of the present invention, in a spin processing apparatus for processing while rotating a substrate, a rotary table which is rotationally driven, and a rotary table provided on the rotary table are supplied to the rotary table. According to another aspect of the present invention, there is provided a spin processing apparatus, comprising: a plurality of holders for holding a peripheral portion of the substrate; and a detection unit for detecting a holding state of the substrate held by the holders.

According to a second aspect of the present invention, the detection means includes a transmitter for outputting a detection signal from above the turntable toward the substrate at a predetermined inclination angle, and the transmitter for outputting a detection signal. The spin processing apparatus according to claim 1, further comprising: a receiver that detects a reflection angle of the detection signal reflected on the upper surface.

According to a third aspect of the present invention, the detection signal received by the receiving section is input to a control device for controlling the rotation of the turntable, and the receiving section is before or after the turntable is rotated. 2. The spin processing apparatus according to claim 1, wherein the control device stops the rotation of the turntable when the holding state of the substrate is detected by, and the abnormality of the holding state of the substrate is detected after the rotation. is there.

According to a fourth aspect of the present invention, the detecting means includes a light projecting portion arranged on one end side in the radial direction of the turntable and a light projecting portion arranged on the other end side in the radial direction of the turntable. The spin processing apparatus according to claim 1, further comprising: a light receiving unit that receives the detected light that has been detected through a substrate held on the rotary table.

According to a fifth aspect of the present invention, the detecting means has a transmitting section and a receiving section and is arranged above the rotary table, and the detection signal output from the transmitting section is held on the rotary table. The spin processing apparatus according to claim 1, comprising a displacement detector that detects the height of the upper surface of the substrate by reflecting the light on the upper surface of the substrate and receiving the light by the receiving unit.

The invention of claim 6 has two displacement detectors, and the two displacement detectors are arranged at a predetermined angle in the circumferential direction of the rotary table. 5 is a spin processing apparatus.

According to a seventh aspect of the present invention, in a spin processing method for processing while rotating a substrate, the step of supplying the substrate to a rotary table, the step of holding the substrate supplied to the rotary table, and the rotary table The spin processing method is characterized by comprising a step of detecting the tilt of the held substrate before and after rotating the rotary table, at least before rotating the rotary table.

According to the present invention, it is possible to reliably detect the holding state of the substrate held on the turntable and judge whether the holding state of the substrate is good or bad.

[0019]

BEST MODE FOR CARRYING OUT THE INVENTION Embodiments of the present invention will be described below with reference to the drawings.

1 to 4 show a first embodiment of the present invention. FIG. 1 shows a spin for cleaning a substrate W such as a semiconductor wafer or a glass substrate with a treatment liquid to which ultrasonic vibration is applied. The processing device is shown. This spin processing apparatus includes a cup body 1. A plurality of discharge pipes 2 are connected to the bottom of the cup body 1 at predetermined intervals in the circumferential direction. Each discharge pipe 2 communicates with an exhaust pump (not shown).

A rotary table 3 is provided in the cup body 1. A plurality of support members 4 are rotatably provided in the peripheral portion of the upper surface of the turntable 3 at predetermined intervals in the circumferential direction. A claw member 5 is provided on the upper end surface of each support member 4 at a position eccentric from the center of rotation of the support member 4.
The claw member 5 has an inclined surface 6 as shown in FIGS. 2 and 3C.
Also, it has a reverse taper-shaped locking portion 7 provided at the upper end of the inclined surface 6 in the inclination direction.

A substrate W such as a semiconductor wafer is supplied to the turntable 3. That is, the substrate W is supplied so that the lower surface of the peripheral edge portion is placed on the inclined surface 6. When the support member 4 rotates in that state, the claw member 5 eccentrically rotates, so that the peripheral edge portion of the substrate W bumps up the inclined surface 6, and the outer peripheral surface abuts on the locking portion 7. As a result, the substrate W is clamped on the turntable 3.

The rotary table 3 is rotationally driven by the control motor 11. In this control motor 11, a cylindrical rotor 13 is also rotatably inserted in a cylindrical stator 12, and the rotary table 3 is connected to the rotor 13 via a power transmission member 13a. .

The rotation of the control motor 11 is controlled by the control device 14. Thereby, the rotary table 3 can be rotated at a predetermined rotational speed by the control device 14.

A cylindrical fixed shaft 15 is inserted in the rotor 13. A nozzle head 16 located on the upper surface side of the rotary table 3 is provided at the upper end of the fixed shaft 15. That is, the nozzle head 16 is connected to the rotary table 3
It is provided so that it does not rotate with. The nozzle head 16 has nozzles 17 for injecting a processing liquid and a gas,
18 is provided.

As a result, the processing liquid or gas can be selectively ejected from the nozzles 17 and 18 toward the central portion of the lower surface of the substrate W held on the turntable 3. That is, the bottom surface of the substrate W can be cleaned and dried.

The upper surface side of the rotary table 3 is covered with a turbulent flow prevention cover 19. This turbulence prevention cover 1
Reference numeral 9 is for preventing turbulence from being generated on the lower surface side of the substrate W held on the turntable 3, and at the central portion thereof, the processing liquid or gas is applied from the nozzles 17, 18 to the lower surface of the substrate W. A through hole 20 is formed to allow the injection of water.

An ultrasonic cleaning unit 22 for cleaning the upper surface of the substrate W is provided on the side of the cup body 1. The ultrasonic cleaning unit 22 has an arm body 23. The arm body 23 has a vertical portion 24 and a horizontal portion 25 whose base end is connected to the upper end of the vertical portion 24. The lower end of the vertical portion 24 is connected to a rotary motor 26. The rotary motor 26 drives the arm body 23 to rotate at a predetermined angle.

The rotary motor 26 is attached to a movable plate 27 which is slidable in the vertical direction by a linear guide (not shown). The movable plate 27 is vertically driven by a vertical drive cylinder 28.

An ultrasonic nozzle body 29 is provided at the tip of the horizontal portion 25 of the arm body 23. A liquid supply pipe 31 for supplying a cleaning liquid and a lead pipe (not shown) for supplying electric power to an ultrasonic transducer (not shown) provided in the nozzle body 29 are passed through the ultrasonic nozzle body 29. 32 and 32 are connected.

The ultrasonic oscillator has an oscillation frequency of, for example, 1.
A drive signal of 6 MHz is applied. As a result, the cleaning liquid supplied to the ultrasonic nozzle body 29 through the liquid supply pipe 31 is subjected to ultrasonic vibration of 1.6 MHz and is sprayed onto the upper surface of the substrate W.

The ultrasonic nozzle body 29 is reciprocally driven above the substrate W by the arm body 23 along the radial direction of the substrate W. Therefore, by driving the ultrasonic nozzle body 29 in the radial direction of the substrate 23 while rotating the substrate W by the rotary table 3, the processing liquid to which ultrasonic vibration is applied can be jetted over the entire upper surface of the substrate W. .

The claw member 5 is supplied to the rotary table 3 and
The substrate W clamped by is detected by the detecting means 35 in the clamped state, that is, whether the plate surface is inclined with respect to the horizontal state. As shown in FIG. 2, the detection means 35 has a light projector 36 that outputs, for example, a laser beam L as a transmitting portion, and is disposed obliquely above the rotary table 3, that is, on the upper portion of the rotary table 3 radially outward.

From the projector 36, the rotary table 3
Laser light L is emitted toward the upper surface of the substrate W clamped at. The emission angle of the laser light L is set so as to irradiate the peripheral portion in the radial direction, which is a portion deviated from the central portion of the substrate W.

The laser light L emitted from the projector 36 is reflected on the upper surface of the substrate W. The laser light L reflected on the upper surface of the substrate W is incident on the light receiver 37 as a receiving unit installed in the reflecting direction. Like the light projector 36, the light receiver 37 is arranged on the upper portion of the rotary table 3 radially outward.

The light receiver 37 is composed of, for example, a line sensor having a light receiving surface 38 of a predetermined length, and the laser light L whose longitudinal direction changes according to the inclination angle of the upper surface of the substrate W. It is arranged along the reflection direction. If the substrate W is horizontal, this light receiver 37
It is set so that the laser light L reflected by is incident on the central portion of the light receiving surface 38 in the longitudinal direction.

Therefore, depending on whether the laser light L reflected on the upper surface of the substrate W is incident on the light receiving surface 38 of the light receiver 37 or in which position in the longitudinal direction, the laser light L of the substrate W clamped on the rotary table 3 is detected. The tilt angle with respect to the horizontal state can be detected.

The detection signal from the light receiver 37 is input to the controller 14. The control device 14 is the turntable 3
The inclination state of the substrate W clamped at is determined, and the drive of the control motor 11 is controlled based on the determination. For example, when the substrate W is inclined and clamped on the turntable 3 as shown by the chain line in FIG. 2, an alarm is issued or the control motor 11 cannot be driven before the turntable 3 is rotated. When the rotary table 3 is rotating, the rotation is stopped.

Further, depending on a specific angle and height deviation, the detection signal from the light receiver 37 may be output as a normal value even when the substrate W is not clamped to the turntable 3 correctly. Even in this case, the rotary table 3 is rotated at a low speed so that the substrate W does not drop, and it is possible to determine whether or not the substrate W is normally clamped on the rotary table 3 based on the change in the detection signal by the light receiver 37. it can.

Next, the operation of the spin processing apparatus having the above structure will be described.

An unprocessed substrate W is supplied to the turntable 3 by a robot (not shown) and then clamped. The state of supply of the substrate W to the turntable 3 is shown in FIG.
As shown in (a) and (b), the substrate W is clamped if it is normal, that is, if the peripheral portion of the substrate W is supplied while being placed on the inclined surfaces 6 of the claw members 5 of the six support members 4. Therefore, when each support member 4 is rotated, the peripheral edge of the substrate W is clamped without being disengaged from the engaging portion 7 of each support member 4 as shown in FIG. 3C.

After clamping the substrate W, the rotary table 3
The holding state of the substrate W is detected by the detecting means 35 before rotating. That is, laser light is emitted from the light projector 36 toward the substrate W, and the laser light L is reflected by the upper surface of the substrate W and enters the light receiving surface 38 of the light receiver 37.

Since the substrate W is horizontally clamped on the turntable 3 without tilting, the laser light L reflected on the upper surface of the substrate W is incident on the central portion of the light receiving surface 38 in the longitudinal direction. As a result, it is determined that the substrate W is clamped horizontally, and the rotary table 3 is rotationally driven based on the determination.

After rotating the turntable 3, the substrate W is sequentially washed and dried. During the processing of the substrate W, the tilted state of the substrate W is measured regularly or continuously. Therefore, if a part of the substrate W is disengaged from the locking portion 7 and the substrate W is tilted during the processing, this is detected, and the turntable 3 is detected by the detection signal.
Will be stopped.

On the other hand, when the supply position of the substrate W supplied by the robot to the turntable 3 is displaced as shown in FIG. 4A, a part of the peripheral edge of the substrate W is shown in FIGS. 4B and 4C. As shown in FIG. 5, the claw member 5 is in a state of being mounted on the locking portion 7. When the support member 4 is rotated in this state to clamp the substrate W, a part of the peripheral edge of the substrate W is disengaged from the locking portion 7, so that the substrate W is inclined.

When the laser light L is emitted from the projector 36 of the detecting means 35 with the substrate W tilted, the laser light L reflected by the upper surface of the substrate W and incident on the light receiving surface 38 of the light receiver 37.
The position of is shifted as compared with the case where the substrate W is clamped horizontally as shown by the chain line in FIG. 2, so that it is detected that the substrate W is tilted.

Therefore, an alarm is output from the control device 14 in accordance with the detection result, or the rotation table 3 cannot be rotated. Therefore, the rotation table 3 is rotated with the substrate W being uncertainly clamped. Can be prevented.

The light projector 36 and the light receiver 3 of the detecting means 35.
The reference numeral 7 is arranged on the upper side of the rotary table 3 in the radial direction, that is, diagonally above. Therefore, when cleaning the substrate W by reciprocating the ultrasonic nozzle body 29 in the radial direction of the substrate W,
The light projector 36 and the light receiver 37 are the ultrasonic nozzle body 2
It does not get in the way of 9.

The light receiving surface 38 of the light receiver 37 has a length that can receive the laser light L even if the reflection angle of the laser light L reflected on the upper surface of the substrate W changes. Therefore, not only the optical axes of the light projector 36 and the light receiver 37 can be easily aligned, but also when the substrate W is bent downward or upward by rotating the rotary table 3, this can be detected. can do.

In the first embodiment, a laser beam projector is used as the transmitter of the detection means 35, but an ultrasonic wave oscillator may be used instead of the laser beam. An ultrasonic receiver may be used as the unit.

5 to 7 show a second embodiment of the present invention. This embodiment is a modification of the detection means. In the detection means of this embodiment, 35A is a projector 4 which is a laser oscillator and is arranged at one end of the rotary table 3 in the radial direction.
1 and a light receiver 42 including a line sensor arranged on the other end side in the radial direction.

Laser light L emitted from the projector 41
Is a strip-shaped beam having a predetermined width in the vertical direction, and the light receiver 42 is formed by a line sensor having a light receiving surface 43 that is long in the vertical direction.

Laser light L output from the projector 41
Is a substrate W having a predetermined width in the vertical direction as shown in FIG.
The light passes through the clamped support member 4 and enters the light receiving surface 43 of the light receiver 42.

When the substrate W is horizontally clamped on the turntable 3, as shown in FIG.
The laser light L received by 3 is blocked by the thickness of the substrate W. Its thickness is indicated by t.

On the other hand, when a part of the peripheral edge of the substrate W is disengaged from the engaging portion 7 of the claw member 5 and the substrate W is inclined and clamped on the rotary table 3, FIG. As shown, the strip-shaped laser light L received by the light receiving surface 43 is blocked with a size larger than the thickness t of the substrate W shown by T in the figure.

Therefore, in the second embodiment,
It is possible to determine whether or not the substrate W is clamped on the turntable 3 in a horizontal or inclined manner depending on the vertical dimension of the laser light L blocked according to the holding state of the substrate W.

8 and 9 show a third embodiment of the present invention. The detection means 35B in this embodiment is arranged directly above the turntable 3 and comprises a displacement detector 45 for detecting the height to the upper surface of the substrate W clamped on the turntable 3. The displacement detector 35 has a configuration in which a transmission unit and a reception unit are integrated, and the transmission unit can output laser light or ultrasonic waves as a detection signal. The detection signal output and reflected by the object can be received.

That is, the detection signal is output from the displacement part of the displacement detector 45 with a slight angle with respect to the vertical state with respect to the plate surface of the substrate W, and the reception part is output from the plate surface of the substrate W. It is possible to receive the detection signal reflected at.

As a result, the displacement detector 45 determines the distance (height) from the displacement detector 45 to the upper surface of the substrate W due to the change in the time from the output of the detection signal to the reception of the detection signal. Can be detected.

Accordingly, when the substrate W is tilted and clamped on the turntable 3, the distance from the displacement detector 45 to the upper surface of the substrate W changes as compared with the case where the substrate W is clamped horizontally. The tilted state of the substrate W can be measured according to the change in the distance.

As shown in FIG. 9, when the substrate W is clamped by the six support members 4, the substrate W does not have a tilt in the direction indicated by X in the figure, but has a tilt in the Y direction orthogonal to the X direction. May occur. That is, although the clamp in the X direction is performed, if the clamp in the Y direction is released, the tilt occurs only in the Y direction.

When the substrate W is tilted only in the Y direction, Y
Only the tilt in the X direction orthogonal to the direction is detected by one displacement detector 4
If the detection is made by 5, accurate detection may not be possible.

Therefore, when the inclination of the substrate W is detected by the displacement detector 45, the two displacement detectors 45 are arranged above the peripheral portion of the substrate W at intervals of 90 degrees in the circumferential direction, and the substrate W is removed. 9 can detect the heights at two positions indicated by a and b, the inclination can be detected even when the substrate W is inclined in either the X direction or the Y direction. .

The arrangement angle of the two displacement detectors 45 in the circumferential direction of the rotary table 3 is not limited to 90 degrees, and may be an angle less than that. For example, when six support members 4 that clamp the substrate W are provided at 60-degree intervals, two displacement detectors 45 that are adjacent to each other at 60-degree intervals are provided.
The displacement detectors 45 may be arranged above one of the support members 4. In short, the pair of displacement detectors 45 are spaced at a predetermined angle in the circumferential direction of the turntable 3 so that the inclination of the substrate W in both the X and Y directions can be detected. And place it.

In the first to third embodiments, the case where the substrate W is a disk-shaped semiconductor wafer has been described.
The substrate W'may be a rectangular glass substrate used in a liquid crystal display device.

When the substrate W'has a rectangular shape, the structure of the rotary table holding the substrate W is different. FIG. 10 shows a turntable 3A holding a rectangular substrate W '. The rotary table 3A has a base 51, and the base 51 is provided with four arms 52. At the tip of each arm 52, a support pin 53 for supporting the lower surface of the corner of the substrate W'and the substrate W '.
A pair of engaging pins 54 that engage with the side surfaces of the corners of the are provided. As a result, when the turntable 3A rotates, the substrate W'rotates integrally with the turntable 3.

When the substrate W'is supplied to the turntable 3A having such a structure, the corners of the substrate W'may be lifted up on the engagement pins 54 and the clamped state of the substrate W'may become uncertain.

Therefore, the substrate W'is placed on the turntable 3A.
Then, if the height of the upper surface of the corner portion of the substrate W ′ is detected by the displacement detector 45, the quality of the clamped state of the substrate W ′ can be determined.

The position detected by the displacement detector 45 is the substrate W.
Not only above one corner of ′, but also in a plurality, eg FIG.
As shown in FIG. 1, changes in the height of the upper surface of four corners (only two displacement detectors 45 are shown) may be detected.

That is, since the size of the substrate W'has tended to increase recently, when only one of the four corners of the substrate W'is mounted on the engagement pin 52, the substrate W'is mounted. The raised part is inclined, but other parts may not be inclined.

Therefore, if changes in the heights of the upper surfaces of the four corners of the substrate W'are detected by the displacement detectors 45, respectively, even one of the four corners of the substrate W'can be engaged. If it is mounted on the dowel pin 52, it can be detected as an abnormality in the clamped state.

While the rotary table 3A is being rotated, the displacement detector 45 may perform the detection in synchronization with the rotation of the rotary table 3A. That is, 4
When the corners of the substrate W ′ are located below the two displacement detectors 45, the displacement detectors 45 perform the detection so that the substrate W ′ is rectangular even if the substrate W ′ is rectangular.
It is possible to measure the clamped state during rotation of the.

[0073]

As described above, according to the present invention, since the holding state of the substrate held on the turntable can be reliably detected, it is possible to judge whether the holding state of the substrate is good or bad.

[Brief description of drawings]

FIG. 1 is a schematic configuration diagram of a spin processing apparatus showing a first embodiment of the present invention.

FIG. 2 is an explanatory diagram showing a detection unit that detects a holding state of a substrate.

FIG. 3 is an explanatory diagram when a substrate is held horizontally on a turntable.

FIG. 4 is an explanatory diagram when a substrate is held on a turntable while being inclined.

FIG. 5 is a side view of a schematic configuration of a detection means showing a second embodiment of the present invention.

FIG. 6 is a plan view showing the arrangement of a light emitter and a light receiver of the detection means.

FIG. 7 is an explanatory diagram of a relationship between a tilted state of a substrate and a laser beam that is blocked.

FIG. 8 is an explanatory diagram of a detection means showing a third embodiment of the present invention.

FIG. 9 is a plan view of a rotary table.

FIG. 10 is a plan view of a rotary table showing a fourth embodiment of the present invention.

FIG. 11 is an explanatory diagram of an arrangement state of detection means.

[Explanation of symbols] 3 ... rotary table 4 ... Holding member (holding part) 35, 35A ... Detecting means 36 ... Floodlight 37 ... Light receiver 38 ... Light receiving surface 45 ... Displacement detector

─────────────────────────────────────────────────── ─── Continuation of front page (51) Int.Cl. ⁷ Identification code FI theme code (reference) B05D 3/00 B05D 3/00 C B08B 3/02 B08B 3/02 B (72) Inventor Konosuke Hayashi 2-5-1 Kasama, Sakae-ku, Yokohama-shi, Kanagawa Inside Shibaura Mechatronics Co., Ltd. (72) Inventor Hidetaka Nakajima 2-5-1, Kasama, Sakae-ku, Yokohama, Yokohama (72) Inventor Sadaaki Kurokawa 2-5-1, Kasama, Sakae-ku, Yokohama-shi, Kanagawa Inside Shibaura Mechatronics Co., Ltd. (72) Inventor Akihiro Shigeyama 2-5-1, Kasama, Sakae-ku, Yokohama-shi, Kanagawa (72) Inventor Shizuo Kabaya 2-5-1 Kasama, Sakae-ku, Yokohama-shi, Kanagawa Shibaura Mechatronics Kusu Co., Ltd. Yokohama Office (72) Inventor Naohiko Okuda 2-5-1, Kasama, Sakae-ku, Yokohama-shi, Kanagawa Shibaura Mechatronics Co., Ltd. Yokohama Office F-term (reference) 3B201 AA02 AA03 AB34 AB42 BB22 BB83 CD42 CD43 4D075 AC64 AC78 AC91 DB13 DC22 DC24 EA05 EA60 4F042 AA07 CC04 CC09 DA01 DA08 DF04 EB09

Claims (7)

[Claims] 1. A spin processing apparatus for processing a substrate while rotating the substrate, comprising: a rotary table which is rotationally driven; and a plurality of holders for holding the peripheral portion of the substrate which is provided on the rotary table and is supplied to the rotary table. A spin processing apparatus comprising: a unit; and a detection unit that detects a holding state of the substrate held by the holding unit. 2. The detecting means outputs a detection signal from above the turntable toward the substrate at a predetermined tilt angle, and a detection signal output from the transmitting part and reflected on the upper surface of the substrate. The spin processing apparatus according to claim 1, further comprising a receiving unit that detects a reflection angle of a signal. 3. The detection signal received by the receiving unit is input to a control device that controls the rotation of the rotary table, and the receiving unit holds the substrate before or after rotating the rotary table. 2. The spin processing apparatus according to claim 1, wherein the rotation of the rotary table is stopped by the control device when the state is detected and an abnormality in the holding state of the substrate is detected after the rotation. 4. The detecting means includes a light projecting portion disposed on one end side in the radial direction of the turntable and a detection light emitted from the light projecting portion disposed on the other end side in the radial direction of the turntable. The spin processing apparatus according to claim 1, further comprising: a light receiving unit that receives light via a substrate held on the rotary table. 5. The detection means has a transmitter and a receiver and is arranged above the rotary table, and a detection signal output from the transmitter is reflected on an upper surface of a substrate held on the rotary table. The spin processing apparatus according to claim 1, further comprising a displacement detector that detects the height of the upper surface of the substrate by receiving the light by the receiving unit. 6. A displacement detector having two displacement detectors, wherein the two displacement detectors are arranged at a predetermined angle in the circumferential direction of the rotary table.
The spin processing apparatus described. 7. A spin processing method for processing a substrate while rotating the substrate, the step of supplying the substrate to a rotary table, the step of holding the substrate supplied to the rotary table, and the step of removing the substrate held on the rotary table. A spin processing method, comprising: a step of detecting an inclination at least before rotating the rotary table before and after rotating the rotary table.