JP2003218004A - Spin processing device - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a spin processing device which is capable of reducing the contamination of processing solutions by particles to an irreducible minimum when two types of processing solutions used for processing substrates are separated from each other for recovery. <P>SOLUTION: A spin processing device is equipped with an annular wall 15 which partitions a processing tank into an inner space 37 and an outer space 38, an inner discharge pipe 54 and an outer discharge pipe 55 which are provided as communicating with the inner space 37 and the outer space 38 respectively, an annular upper cap 13 covering the peripheral part of a rotating table 46, a lower cap 12 which is set movable in a vertical direction in the processing tank and whose upper end is positioned outside of the inner peripheral edge of the upper end of the upper cap 13 in a radial direction and lower end confronts the annular wall 15, and a first cylinder which drives the lower cap 12 to move up for enabling either a first type of processing solution or a second type of processing solution flying off from the substrate to flow into the inner space 37 or move down for enabling the other type of processing solution flying from the substrate to flow into the outer space 38. <P>COPYRIGHT: (C)2003,JPO

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a spin processing apparatus which processes a substrate which is rotationally driven with a first processing liquid and then a second processing liquid.

[0002]

2. Description of the Related Art For example, in a manufacturing process of a liquid crystal display device or a semiconductor device, a circuit pattern is formed on a substrate such as a rectangular glass substrate or a semiconductor wafer. When forming a circuit pattern, development processing, etching processing, resist stripping processing, or the like is performed on the substrate. When performing these processes, first, a developing solution, an etching solution, a stripping solution or the like is supplied to the substrate as a first processing solution to perform a predetermined processing, and then a cleaning solution such as pure water is supplied as a second processing solution. Then, the cleaning process is performed.

Since the first processing liquid such as the developing liquid, the etching liquid or the stripping liquid is expensive, it is used in a circulating manner. When the first treatment liquid is circulated and used, it is necessary to collect the first treatment liquid and the second treatment liquid without mixing them.

In order to avoid mixing of the first processing liquid and the second processing liquid, the first processing liquid and the second processing liquid supplied to the substrate must be recovered through separate routes. I won't. Such prior art is disclosed in Japanese Patent Laid-Open No. 8-262741.

The configuration shown in the above publication is shown in FIG.
As shown in (b), a rotary chuck (not shown) for holding the substrate W is provided in the first container 101, and the lower surface side of the rotary chuck is fixed to the first container side to cover it. 102 is provided. The outer dimensions of the cover 102 are larger than those of the rotary chuck.

Inside the first container 101, a second container 103 which is vertically driven is provided. When the second container 103 is raised, the first substrate W is rotated and driven.
When the processing liquid of (1) is supplied, the first processing liquid scattered from the substrate W collides with the inner peripheral surface of the second container 103, and is thus collected in the second container 103.

When the second container 103 is lowered until the inclined portion of the upper end portion thereof is joined to the upper surface of the cover, the second processing liquid supplied to the substrate W is supplied from around the rotating substrate. Since the particles are scattered and collide with the inner peripheral surface of the first container 101, they are collected in the first container 101.

That is, by raising or lowering the second container 103, the first processing liquid and the second processing liquid can be separated and recovered.

Although not shown, drain pipes are connected to the bottoms of the containers 101 and 103, respectively. An exhaust fan is connected to each drain pipe via a gas-liquid separator. Each drain pipe not only discharges the processing liquid supplied to the substrate, but also removes the processing liquid adhering to the substrate W by the centrifugal force due to the rotation of the substrate W, by the suction force of the exhaust fan to each container 101. , 103 is sucked and discharged together with the atmosphere in the container. As a result, the mist floating in the container is reduced, so that the mist is less likely to adhere to the substrate from which the processing liquid has been removed, and contamination of the substrate can be prevented.

When the mist is sucked and discharged from the inside of each container 101, 103, the gap G formed by the inner peripheral edge of the opening of each container and the outer peripheral edge of the substrate held and rotated by the rotary chuck.
₁ , G ₂ become the flow paths 104 and 105 of the atmosphere discharged by the suction force of the exhaust fan. Therefore, the discharge state of the mist in each container largely depends on the flow path interval.

FIG. 7 is a graph in which the number of particles adhering to the substrate is measured when the distance between the outer peripheral edge of the substrate held by the rotary chuck and rotationally driven and the inner peripheral edge of the opening of the container is changed. .

As can be seen from this graph, the number of particles adhering to the substrate is minimized when the interval is a predetermined value (optimum value) G, and when the interval is larger than the predetermined value G, particles adhering to the substrate are The number increases. It is considered that when the interval becomes large and the flow velocity of the gas flowing through the flow path becomes slow, particles are not sufficiently discharged from the container and easily adhere to the substrate.

When the interval becomes smaller than the predetermined value G,
The particles adhering to the substrate may increase more than when the distance is the predetermined value G. This is because the mist contained in the gas becomes droplets and easily adheres to the inner surface of the container when the space becomes smaller and the flow velocity of the atmosphere flowing through the flow path becomes faster, so that the droplets adhere to the substrate. It is thought to be because there are things.

Therefore, in order to minimize the particles adhering to the substrate, the above interval should be maintained at the predetermined value G regardless of whether the substrate is treated with the first or second treatment liquid. Is desirable.

[0015]

By the way, in the configuration disclosed in the above publication, as shown in FIG.
Lower the container 101 until it contacts the cover 102,
When the processing liquid scattered from the substrate W is collected through the first container 103 as shown by the arrow in the figure, the inner peripheral edge of the upper end of the first container 103 and the outer peripheral edge of the substrate W form as described above. The first flow path 104 is formed by the gap G ₁ .

Further, as shown in FIG.
The processing liquid that rises up the vessel 101 and scatters from the substrate W is shown in FIG.
When collecting through the second container 101 as shown by the arrow
In the case of the above, as described above, the inner peripheral edge of the upper end of the second container 101
G between the substrate and the outer peripheral edge of the substrate W _TwoBy the second channel 1
05 is formed.

The second container 101 is the first container 103.
Since they are housed inside, the inner diameter of the inner peripheral edge of the upper end of these containers is larger in the first container 103 than in the second container 101.

Therefore, as shown in FIG.
The first flow path 10 formed by the inner peripheral edge of the upper end of the first container 103 and the outer peripheral edge of the substrate W when the container 101 of FIG.
No. 4 is the second container 1 due to the second container 101 rising.
01 formed by the inner peripheral edge of the upper end and the outer peripheral edge of the substrate W
It becomes larger than the flow path 105.

As a result, when the second container 101 descends, the flow velocity of the gas discharged from the first container 103 through the first flow path 104 increases as the second container 101 rises. , And becomes slower than the flow velocity of the gas discharged from the second container 101 through the second flow path 105.

Therefore, the number of particles adhering to the substrate W is different due to the change in the flow velocity as described above. That is, the substrate W may not be processed at a predetermined cleanliness.

According to the present invention, when the substrate is sequentially treated with the first treatment liquid and the second treatment liquid and the treatment liquids are separated and recovered, whichever treatment liquid is used to treat the substrate. Another object of the present invention is to provide a spin processing apparatus capable of maintaining a predetermined cleanliness of a substrate substantially constant.

[0022]

According to a first aspect of the present invention, there is provided a spin treatment apparatus in which a substrate is treated with a first treatment liquid and then a second treatment liquid. A rotary table which is provided to hold the substrate and is driven to rotate, an annular wall body which divides the inside of the processing bath into an inner space portion and an outer space portion, and the inner space portion and the outer space portion of the processing bath. An inner discharge pipe and an outer discharge pipe respectively provided in communication with and a peripheral wall of the rotary table which is provided in the processing tank and which slopes inwardly in a radial direction of the rotary table. An upper cup body that forms a flow path with the inner peripheral edge of the upper end of this inclined wall and the outer peripheral edge of the substrate held on the rotary table,
A lower cup body that is vertically movable in the processing tank, has its upper end located radially outward of an inner peripheral edge of the upper end of the inclined wall of the upper cup body, and has a lower end side facing the annular wall body; , Either the first processing liquid or the second processing liquid scattered from the substrate by vertically driving and lowering the lower cup body is flowed into the inner space portion, and is lowered to scatter from the substrate. And a first vertical drive means for causing the other processing liquid to flow into the outer space portion.

According to a second aspect of the present invention, when the lower cup body is raised by the first vertical drive means, the upper end portion of the lower cup body contacts the inner surface of the inclined wall of the upper cup body. The spin processing apparatus according to claim 1, further comprising: a shield member that prevents the processing liquid scattered from the substrate from flowing into the outer space.

According to a third aspect of the present invention, the first suction means is connected to the inner space portion, and the second suction means is connected to the outer space portion. In the spin processing equipment.

According to a fourth aspect of the present invention, the first vertical drive means lowers the lower cup body to a position where an upper end of the lower cup body is lower than a substrate held by the rotary table. 1. The spin processing apparatus according to 1.

According to a fifth aspect of the present invention, the upper cup body is
Provided so as to be vertically movable by a second vertical driving means,
The lower wall can be lowered together with the lower cup body to a position where the upper end of the inclined wall is below the substrate held on the turntable, and the substrate held on the turntable is placed in the processing tank. The spin processing apparatus according to claim 1, wherein a loading / unloading opening for loading / unloading is formed.

According to the present invention, in the structure in which the lower cup body is driven up and down to separate and collect the first treatment liquid and the second treatment liquid, the upper end portion of the lower cup body is separated from the inner peripheral edge of the upper cup body. Also, by locating it radially outward, regardless of the vertical movement of the lower cup body, the outer peripheral edge of the substrate and the inner peripheral edge of the upper cup body always form a flow path for exhaust at a constant interval. You can

[0028]

BEST MODE FOR CARRYING OUT THE INVENTION Embodiments of the present invention will be described below with reference to the drawings.

1 to 6 show an embodiment of the present invention, and the spin processing apparatus shown in FIG. A frame 2 is provided on the upper surface of the gantry 1, and a processing tank 3 is provided in the frame 2.

A cup body 4 for processing a substrate W such as a semiconductor wafer is provided inside the processing tank 3, and a loading / unloading port 5 for loading / unloading the substrate W is formed on one side surface.

A fan / filter unit 6 is provided on the upper wall of the processing tank 3 to further purify the clean air in the clean room and supply the purified air into the processing tank 3. Further, inside the processing tank 3, partition walls 8 that form exhaust passages 7 are provided at both widthwise ends of one side surface where the inlet / outlet 5 of the processing tank 3 is formed.

The lower ends of the exhaust ducts 9 are connected to the upper ends of the pair of exhaust passages 7, respectively. The lower ends of the straight pipes 11 are connected to the upper ends of the exhaust ducts 9, and the upper ends of the straight pipes 11 are connected to an exhaust fan (not shown) or an exhaust duct of a factory. Thereby, the atmosphere in the processing tank 3 can be exhausted through the exhaust passage 7.

As shown in FIGS. 3 to 6, the processing tank 3 is
The cup body 4 provided inside has an annular lower cup body 12 and an annular upper cup body 13, respectively. The lower cup body 12 has a double wall structure in which a peripheral wall has an insertion groove 14 opened at a lower end, and a vertical portion 12b is formed on an upper portion of the peripheral wall via an inclined portion 12a as shown in FIG. There is. An annular wall body 15 is provided at the bottom of the processing tank 3. The annular wall body 15 is inserted into the insertion groove 14 of the lower cup body 13.

As shown in FIG. 3, the lower cup body 12 is formed.
A plurality of (only one shown) first connecting members 1 are provided on the outer peripheral surface of the
One end of 6 is fixed. The upper end of the first connecting rod 17 is connected to the other end of each connecting member 16. The first connecting rod 17 is inserted into a first seal pipe 18 penetrating the bottom of the processing tank 3 and has a lower end protruding to the outer bottom of the processing tank 3.

At the upper part of the first connecting rod 17, a first outer tube 19 covering the upper end opening of the first seal tube 18 is provided.
Is provided. This prevents the inside of the processing tank 3 from directly communicating with the outside by the first seal pipe 18.

The lower end of the first connecting rod 17 protruding to the outer bottom of the processing tank 3 is connected to the first movable member 21. A first vertical cylinder 22 is connected to the first movable member 21. As a result, the lower cup body 12 is vertically driven by the first vertical cylinder 22 along the annular wall body 15.

The upper cup body 13 has an inclined wall 13a inclined inward in the radial direction and a vertical wall 13b provided at the lower end of the inclined wall 13a. The inclined wall 1
A ring-shaped shield member 26 is provided at a radially intermediate portion of the inner surface (lower surface) of 3a. When the lower cup body 12 is lifted, the upper end of the vertical portion 12b abuts the outer peripheral surface of the shielding member 26.

That is, the vertical portion 12b of the lower cup body 12
The inner peripheral edge of the opening formed by is the inclined wall 1 of the upper cup body 13.
The diameter is larger than the inner peripheral edge of the opening formed by the upper end of 3a. Thereby, the upper edge of the lower cup body 12 is
It is located radially outward from the inner peripheral edge of the upper cup body 13 by a dimension indicated by D in FIG.

On the outer peripheral surface of the upper cup body 13, a plurality of (only one is shown) second connecting members 31 are provided with one ends thereof being connected. The upper end of the second connecting rod 32 is connected to the other end of each connecting member 31. The second connecting rod 32 is inserted into a second seal pipe 33 which is provided so as to penetrate the bottom portion of the processing tank 3, and the lower end portion thereof projects to the outer bottom portion of the processing tank 3.

On the upper part of the second connecting rod 32, there is a second outer tube 34 that covers the upper end opening of the second seal tube 33.
Is provided. Thereby, the inside of the processing tank 3 is prevented from directly communicating with the outside by the second seal pipe 33.

The lower end portion of the second connecting rod 32 protruding to the outer bottom portion of the processing tank 3 is connected to the second movable member 35. A second up-and-down cylinder 36 is connected to the second movable member 34. Thereby, the upper cup body 13 is vertically driven by the second vertical cylinder 36.

The inner space of the processing tank 3 is defined by the inner wall portion 37 by the annular wall body 15 and the lower cup body 12.
And an outer space 38. As shown in FIG. 4, when the lower cup body 12 rises and its upper end abuts the shielding member 26, the inner space portion 37 and the outer space portion 38 are shut off, and as shown in FIG. These spaces communicate with each other.

An opening 41 is formed at the bottom of the processing tank 3. A drive motor 42 is provided in the opening 41. The drive motor 42 has a tubular stator 43 and a tubular rotor 44 rotatably provided in the stator 43. At the upper end of the rotor 44, the rotor 4
A tubular coupling body 45 that rotates integrally with the motor 4 is provided.

A rotary table 46 is attached to the upper end of the connecting body 45 so that the peripheral portion is surrounded by the upper cup body 13. A plurality of, for example, 5 to 6 supports 47 are rotatably provided on the rotary table 46 at predetermined intervals in the circumferential direction. A support pin 48 having an inclined surface is provided at a position eccentric from the center of rotation of the upper end of each support 47.

As shown in FIG. 4, a sector gear 49 is provided at the lower end of each support 47 projecting from the lower surface of the rotary table 46.
Is provided. This sector gear 49 has a parent gear 51
Are in mesh. Therefore, when the parent gear 51 is rotated, the support pin 48 is eccentrically rotated together with the support body 47.

The upper surface and the outer peripheral surface of the rotary table 46 are covered with a turbulent flow prevention cover 52. The inner peripheral surface of the lower end portion of the peripheral wall of the turbulent flow prevention cover 52 faces the outer peripheral surface of the annular rising wall 41a of the processing tank 3 in which the opening 41 is formed, at a predetermined interval. This prevents the atmosphere in the processing tank 3 from flowing out from the opening 41.

Support pins 48 provided on the support 47
Is projected to the upper surface side of the turbulence prevention cover 52, and the substrate W is supplied and placed on the inclined surfaces of the support pins 48.
In that state, when the support pins 48 are eccentrically rotated, the substrate W is rotated by the support pins 48.
It is designed to be held at 6.

At the bottom of the processing tank 3, four inner discharge pipes 54 are provided, which communicate with the inner space 37 in the processing tank 3.
And an outer discharge pipe 55 communicating with the outer space portion 38.

The four inner discharge pipes 54 are connected to the pair of inner gas-liquid separators 56, respectively, and the four outer discharge pipes 55 are connected to the pair of outer gas-liquid separators 57, respectively.
Books are connected one by one. An exhaust pipe 58 and a drain pipe 59 are connected to each of the gas-liquid separators 56 and 57. The exhaust pipe 58 of the first gas-liquid separator 56 serves as a first suction means.
Of the second gas / liquid separator 57, and the exhaust pipe 58 of the second gas / liquid separator 57 is connected to the second gas / liquid separator 57 as the second suction means.

When the exhaust fans 60 and 61 are operated, the atmosphere (gas) in the inner space 37 and the outer space 38 of the processing tank 3 becomes the first and second gas-liquid separators 56 and 5, respectively.
7 is sucked. The first and second gas-liquid separators 56 and 57 separate the processing liquid contained in the gas.

The gas from which the treatment liquid has been separated is exhausted through the exhaust pipe 58 by the first and second exhaust fans 60 and 61, and the treatment liquid is recovered through the drain pipe 59 into a recovery tank (not shown). In this embodiment, the first exhaust fan 60 and the second exhaust fan 61 have the same exhaust capacity.

As shown in FIG. 3, the upper cup body 13 is formed.
A holder 62 is provided on the inclined wall 13a. The holder 62 holds a plurality of nozzles 63 (only one is shown). From each nozzle 63, turntable 4
Different types of processing liquids can be jetted toward the upper surface of the substrate W held by the nozzle 6.

In this embodiment, the first treatment liquid and the second treatment liquid are used.
And the treatment liquid of (3) are selectively jetted. A chemical solution such as a developing solution, an etching solution or a stripping solution is used as the first processing solution, and a cleaning solution such as pure water is used as the second processing solution.

A nozzle head 64 is arranged on the lower surface of the substrate W. The nozzle head 64 is a fixed shaft 6 through which the rotor 44 and the connecting body 45 of the drive motor 42 are passed.
It is provided at the upper end of 5. A plurality of nozzle holes (not shown) are formed in the nozzle head 64, and the first processing liquid and the second processing liquid can be selectively ejected toward the lower surface of the substrate W from these nozzle holes. There is.

Next, a case where the substrate W is sequentially processed by the first processing liquid and the second processing liquid by the spin processing apparatus having the above-mentioned configuration will be described with reference to FIGS. 4 to 6.

First, as shown in FIG. 6, the lower cup body 12
The upper cup body 13 and the upper cup body 13 are lowered by the first and second vertical cylinders 22 and 36, respectively, and the unprocessed substrate W is supplied to the rotary table 46 from the loading / unloading port 5 formed in the processing bath 3.

Then, as shown in FIG. 4, the lower cup body 1
2 and the upper cup body 13 are respectively raised, and then the first
The exhaust fan 60 is operated to suck the inner space 37 in the processing tank 3, and the drive motor 42 is operated to rotate the rotary table 46.

When the rotary table 46 is operated, the first processing liquid is sprayed onto at least the upper surface and the lower surface of the substrate W, and the substrate W is processed by the first processing liquid. The first processing liquid supplied to the substrate W is scattered from the peripheral portion of the substrate W, collides with the raised inner peripheral surface of the lower cup body 12, drops into the inner space portion 37, and is connected to the inner space portion 37. The first gas-liquid separator 5 together with the gas in the processing tank 3 by the suction force of the first exhaust fan 60 through the formed inner exhaust pipe 54.
6 is sucked. In the first gas-liquid separator 56, the first processing liquid and the gas are separated, and the first processing liquid is collected in a recovery tank (not shown) and used repeatedly.

The upper end of the lower cup body 12 is in contact with the outer peripheral surface of the shielding member 26 provided on the inner surface of the inclined wall 13a of the upper cup body 13. Therefore, it is possible to prevent the first processing liquid that is scattered from the substrate W from leaking from the joint portion between the lower cup body 12 and the upper cup body 13 to the outer space portion 38, so that the first processing liquid can be reliably supplied. Can be collected.

After the substrate W has been treated with the first treatment liquid for a predetermined time, the supply of the first treatment liquid is stopped and the substrate W is rotated so that the first treatment liquid remaining on the substrate W remains. Are removed and recovered.

The air flow indicated by the arrow in FIG. 4 generated by the suction force of the first exhaust fan 60 is determined by the distance X between the flow paths 71 formed by the peripheral edge of the rotating substrate W and the inner peripheral edge of the upper end of the upper cup body 13. It is discharged at a flow rate.

As described with reference to FIG. 7, the optimum value G exists in the flow velocity of the gas generated by the first exhaust fan 60 where the particles are most unlikely to adhere to the substrate W, that is, the above interval X.

Therefore, when the interval X is set to the optimum value G, when the first processing liquid is removed from the substrate W,
It is possible to minimize the degree to which the substrate W is contaminated by particles floating in the cup body 3.
The optimum value G of the interval X can be experimentally obtained.

After the substrate W is treated with the first treatment liquid, the lower cup body 12 is lowered to a position where the upper end of the vertical portion 12b is below the substrate W as shown in FIG. Next, the second exhaust fan 61 is operated, the second processing liquid is supplied to the rotating substrate W, and the substrate W is processed by the second processing liquid.

The second processing liquid supplied to the rotating substrate W is scattered from the peripheral portion of the substrate W, and the upper cup body 13 is formed.
Collide with the inner surface of the inclined wall 13a or the vertical wall 13b and drip into the outer space 38, and the suction force generated in the outer space 38 causes the atmosphere in the cup body 4 and the outer exhaust pipe 5
It is discharged to the second gas-liquid separator 57 through 5 and is separated into a gas and a second treatment liquid here. If the second treatment liquid is pure water, for example, it is discarded, and if it is a chemical liquid, it is recovered. ,
Reused if necessary.

Since the upper end of the vertical portion 12b of the lower cup body 12 is located below the substrate W, the second processing liquid scattered from the substrate W collides with the lower cup body 12 and enters the inner space portion 37. Never drip. That is, it is possible to prevent the second processing liquid from flowing into the inner space portion 37 that collects the first processing liquid.

After the treatment with the second treatment liquid has been performed for a predetermined time, the supply of the second treatment liquid is stopped and the substrate W is rotated to remove the second treatment liquid remaining on the substrate W. Remove.

When the lower cup body 12 is lowered, the air flow generated by the suction force of the second exhaust fan 61 as shown by the arrow in FIG. 5 is generated at the peripheral edge of the rotating substrate W and the inner peripheral edge of the upper cup body 13. Interval X of the flow path 71 formed by
It is discharged at a flow rate determined by.

The upper end of the vertical portion 12b of the lower cup body 12 is located radially outward of the inner peripheral edge of the inclined wall 13a of the upper cup body 13. Therefore, even if the lower cup body 12 is lowered as shown in FIG. 5, the interval X of the flow passages 71 that determines the flow velocity of the gas discharged from the cup body 4 is set to the lower cup body 12 as shown in FIG. It is no different from when it is raised.

That is, the interval X is maintained at the optimum value G even when the lower cup body 12 is being lowered, as is the case when the lower cup body 12 is being raised, so that the number of particles adhering to the substrate W is minimized at this time as well. Can be limited.

In this way, after the lower cup body 12 is raised and the substrate W is treated with the first treatment liquid, the lower cup body 1 is processed.
2 is lowered and treated with the second treatment liquid, and
When separating and recovering the treatment liquid of No. 2 and the second treatment liquid, the flow passage 71 that influences the flow velocity of the gas discharged from the cup body 4 regardless of whether the lower cup body 12 is raised or lowered.
The interval X can be constant.

Therefore, if the interval X is set to the optimum value G shown in FIG. 7 where particles are most unlikely to adhere, when the substrate W is processed with either the first processing liquid or the second processing liquid. Even in this case, contamination of the substrate W with particles can be suppressed to a minimum.

[0073]

As described above, according to the present invention, when the first processing liquid and the second processing liquid for processing the substrate are separated and recovered, which processing liquid is used to process the substrate However, since the atmosphere in the cup body can be discharged at a constant flow rate, it is possible to minimize the number of particles adhering to the substrate, which changes depending on the flow rate.

[Brief description of drawings]

FIG. 1 is a perspective view showing an overall configuration of a spin processing apparatus showing an embodiment of the present invention.

FIG. 2 is a perspective view of the spin processing apparatus with a frame removed.

FIG. 3 is a vertical sectional view showing a schematic configuration of a spin processing apparatus.

FIG. 4 is a partially enlarged sectional view showing a state in which a lower cup body is raised.

FIG. 5 is a partially enlarged sectional view showing a state in which a lower cup body is lowered.

FIG. 6 is a partially enlarged sectional view showing a state where a lower cup body and an upper cup body are lowered.

FIG. 7 is a graph showing the relationship between the distance between the substrate and the inner peripheral edge of the container and the number of particles attached to the substrate.

FIG. 8 is an explanatory diagram of a change in the distance between the substrate and the inner peripheral edge of the container when the first processing liquid and the second processing liquid are separated and collected.

[Explanation of symbols]

3 ... Treatment tank 4 ... Cup body 12 ... Lower cup body 15 ... Ring wall 23 ... Upper cup body 37 ... Inner space 38 ... Outer space 46 ... rotary table 54 ... Inside discharge pipe 55 ... Outer discharge pipe 56 ... First gas-liquid separator 57 ... Second gas-liquid separator 60 ... First exhaust fan 61 ... Second exhaust fan

   ─────────────────────────────────────────────────── ─── Continued front page    F-term (reference) 2H096 AA25 AA27 GA17 GA20 GA29                       GA32 GA33 HA19 LA02                 4F042 AA07 AB00 BA05 CC07 CC15                       EB05 EB07 EB09 EB13 EB18                       EB24                 5F046 JA04 LA01 LA03 LA06 MA01                       MA06 MA10

Claims (5)

[Claims] 1. A substrate is treated with a first treatment liquid and then treated with a second treatment liquid.
In the spin processing apparatus for processing with the processing liquid of 1., a processing tank, a rotary table which is provided in the processing tank and holds the substrate and is driven to rotate, and the inside of the processing tank is divided into an inner space portion and an outer space portion. Separated annular wall body, inner discharge pipe and outer discharge pipe provided in communication with the inner space portion and the outer space portion of the processing tank, and the periphery of the rotary table provided in the processing tank. An annular shape having a sloped wall which covers the portion and is inclined inwardly in the radial direction of the rotary table is formed, and a flow path is formed by the inner peripheral edge of the upper end of the sloped wall and the outer peripheral edge of the substrate held on the rotary table. And an upper cup body that is vertically movable in the processing tank, has its upper end located radially outward from the inner peripheral edge of the upper end of the inclined wall of the upper cup body, and the lower end side of the annular wall body. versus And a lower cup body which is vertically moved to raise and lower the lower cup body so that either the first treatment liquid or the second treatment liquid scattered from the substrate is caused to flow into the inner space portion and then lowered. And a first vertical drive means for causing the other processing liquid scattered from the substrate to flow into the outer space portion. 2. The inner surface of the inclined wall of the upper cup body,
A shield that prevents the processing liquid scattered from the substrate from coming into contact with the upper end portion of the lower cup body when the lower cup body is raised by the first vertical drive means from flowing into the outer space portion. The spin processing apparatus according to claim 1, wherein a member is provided. 3. The spin processing apparatus according to claim 1, wherein a first suction means is connected to the inner space portion, and a second suction means is connected to the outer space portion. 4. The spin process according to claim 1, wherein the first vertical drive means lowers the lower cup body to a position where an upper end of the lower cup body is lower than a substrate held on the rotary table. apparatus. 5. The lower cup body is provided so that the upper cup body can be vertically driven by a second vertical drive means, and the upper end of the inclined wall is located below the substrate held on the rotary table. 2. The spin processing apparatus according to claim 1, wherein the spin processing apparatus can be lowered together with the processing tank, and the processing tank is formed with a loading / unloading opening for loading / unloading the substrate held on the rotary table.