JP2003215304A - Method for manufacturing filter with antireflection function for display device - Google Patents
Method for manufacturing filter with antireflection function for display deviceInfo
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- JP2003215304A JP2003215304A JP2002011619A JP2002011619A JP2003215304A JP 2003215304 A JP2003215304 A JP 2003215304A JP 2002011619 A JP2002011619 A JP 2002011619A JP 2002011619 A JP2002011619 A JP 2002011619A JP 2003215304 A JP2003215304 A JP 2003215304A
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- Prior art keywords
- antireflection
- film
- layer
- function
- glass substrate
- Prior art date
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- Optical Filters (AREA)
- Surface Treatment Of Optical Elements (AREA)
- Devices For Indicating Variable Information By Combining Individual Elements (AREA)
Abstract
Description
【０００１】[0001]
【発明の属する技術分野】本発明は、プラズマディスプ
レイパネル（以下、ＰＤＰと略す。）、ＣＲＴ、蛍光表
示管、電界放射型ディスプレイ、液晶ディスプレイ、プ
ロジェクションＴＶ、フィールドエミッションディスプ
レイ（ＦＥＤ）等の表示装置の前面に設置される反射防
止機能付フィルターの製造方法に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a display device such as a plasma display panel (hereinafter abbreviated as PDP), CRT, fluorescent display tube, field emission display, liquid crystal display, projection TV, field emission display (FED). The present invention relates to a method for manufacturing a filter with antireflection function installed on the front surface of a vehicle.
【０００２】[0002]
【従来の技術】従来ＰＤＰに代表される表示装置は非常
に精密な電機製品で構成されているために、そのままの
状態で使用すると、外部から表面に力が加わるような場
合に破損する危険性が非常に高かった。したがって、そ
れを防止するために何らかの保護をする必要があり、こ
れまで表示装置の前面にガラス樹脂板などの保護板を取
り付けることが提案されている。また、ＰＤＰは大型の
画像表示装置として知られているが、その高輝度の表示
を実現するために強力なプラズマ放電を必要とする。こ
のため放電領域からＰＤＰの前方（観察者側）に向かっ
て、電磁波とともに近赤外線が放出される。従来、電磁
波遮蔽層や近赤外線遮蔽層を備え、ＰＤＰの保護を兼ね
たフィルターが提案されているが、視認性向上のため
に、観察者側にフッ素樹脂コートや反射防止フィルム貼
付による反射防止処理が施されることが多い。2. Description of the Related Art Since a display device typified by a conventional PDP is made up of extremely precise electric products, there is a risk that it will be damaged if a force is applied to the surface from the outside when used as it is. Was very high. Therefore, some protection is required to prevent this, and it has been proposed to attach a protective plate such as a glass resin plate to the front surface of the display device. Although the PDP is known as a large-sized image display device, it requires a strong plasma discharge in order to realize a high-luminance display. Therefore, near infrared rays are emitted together with electromagnetic waves from the discharge region toward the front of the PDP (observer side). Conventionally, a filter that has an electromagnetic wave shielding layer and a near infrared ray shielding layer and also serves as protection of the PDP has been proposed. However, for improving visibility, an antireflection treatment by attaching a fluororesin coat or an antireflection film to the viewer side. Is often applied.
【０００３】このような要望に応えて、ＷＯ９８／１３
８５０号公報においてＰＤＰ用保護板が提案されてい
る。この公報には、導電性機能を有するガラスの両面に
反射防止樹脂フィルムを各々貼り合わせたＰＤＰ用保護
板が開示されている。In response to such demands, WO98 / 13
Japanese Patent No. 850 proposes a protective plate for PDP. This publication discloses a PDP protective plate in which antireflection resin films are attached to both surfaces of glass having a conductive function.
【０００４】反射防止樹脂フィルムを貼付する場合に
は、フィルム貼り合せ加工時にゴミや空気を巻き込む確
率が高くなることや、生産性の面でも問題がある。ま
た、観察者側が直接触れることができるため、フッ素樹
脂コートや反射防止フィルムでは耐擦傷性や外観におい
ても問題がある。また、フィルター端部のフィルムは、
面内に比べて剥れやすく、フィルム裁断時に形成した剥
離部がデバイスに取り付けた後に外から見えたり、高湿
下で端部から粘着剤に水分が混入し、そのためフィルム
が剥れたり、浮いたりする確率が高くなる。When an antireflection resin film is attached, there is a problem in that dust and air are more likely to be entrapped during the film attaching process, and productivity is also increased. Further, since the observer can directly touch it, the fluororesin coat and the antireflection film have problems in scratch resistance and appearance. Also, the film at the end of the filter is
It is easier to peel off than in-plane, the peeled part formed when cutting the film can be seen from the outside after attaching to the device, or moisture is mixed into the adhesive from the edge part under high humidity, so the film peels off or floats The probability that you will
【０００５】従って、本発明の目的は、生産性および外
観に優れ、観察者に対する耐擦傷性にも優れた表示装置
用反射防止フィルターの製造方法を提供することであ
る。Therefore, an object of the present invention is to provide a method for producing an antireflection filter for a display device, which is excellent in productivity and appearance, and is also excellent in scratch resistance to an observer.
【０００６】[0006]
【課題を解決するための手段】本発明の上記の課題は、
下記の表示装置用反射防止フィルターの製造方法により
達成された。以下に好ましい実施態様と共に列挙する。The above problems of the present invention are as follows.
This has been achieved by the following method for manufacturing an antireflection filter for a display device. The preferred embodiments will be listed below.
【０００７】（１） ガラス基板の片面上に反射防止膜
をスパッタリング法によって成膜する工程（工程１）
と、前記ガラス基板を所定の大きさに切断した後切断部
分を面取する工程（工程２）と、前記ガラス基板全体を
熱処理し強化する工程（工程３）と、前記ガラス基板の
反射防止膜を成膜する面とは反対側に電磁波遮蔽機能と
近赤外線遮蔽機能と色調補正機能と反射防止機能の少な
くとも１つを発現する層を設ける工程（工程４）とをこ
の順に含むことを特徴とする表示装置用反射防止フィル
ターの製造方法。(1) A step of forming an antireflection film on one surface of a glass substrate by a sputtering method (step 1)
A step of cutting the glass substrate into a predetermined size and then chamfering the cut portion (step 2); a step of heat-treating the entire glass substrate to strengthen it (step 3); and an antireflection film for the glass substrate. A step (step 4) of providing a layer exhibiting at least one of an electromagnetic wave shielding function, a near infrared ray shielding function, a color tone correcting function and an antireflection function on the side opposite to the surface on which the film is formed (step 4) in this order. Manufacturing method of anti-reflection filter for display device.
【０００８】（２） ガラス基板を所定の大きさに切断
した後切断部分を面取する工程（工程Ａ）と、前記ガラ
ス基板全体を熱処理し強化する工程（工程Ｂ）と、前記
ガラス基板の片面上に反射防止膜をスパッタリング法に
よって成膜する工程（工程Ｃ）と、前記ガラス基板の反
射防止膜を成膜する面とは反対側に電磁波遮蔽機能と近
赤外線遮蔽機能と色調補正機能と反射防止機能の少なく
とも１つを発現する層を設ける工程（工程Ｄ）とをこの
順に含むことを特徴とする表示装置用反射防止フィルタ
ーの製造方法。(2) A step of cutting the glass substrate into a predetermined size and then chamfering the cut portion (step A), a step of heat treating and strengthening the entire glass substrate (step B), and A step of forming an antireflection film on one side by a sputtering method (step C), and an electromagnetic wave shielding function, a near infrared ray shielding function and a color tone correcting function on the side of the glass substrate opposite to the surface on which the antireflection film is formed. A method for producing an antireflection filter for a display device, which includes a step (step D) of providing a layer exhibiting at least one antireflection function in this order.
【０００９】（３） 前記反射防止膜が、少なくとも２
層の金属酸化物層からなる多層膜であることを特徴とす
る前記表示装置用反射防止フィルターの製造方法。
（４） 前記反射防止膜が、基板面上に酸窒化スズ層と
二酸化ケイ素層とをこの順に積層した多層膜からなるこ
とを特徴とする前記表示装置用反射防止フィルターの製
造方法。
（５） 前記酸窒化スズ層の膜厚が９０〜１４０ｎｍで
あり、前記二酸化ケイ素層の膜厚が６０〜１１０ｎｍで
あることを特徴とする前記表示装置用反射防止フィルタ
ーの製造方法。(3) The antireflection film has at least 2
The method for producing an antireflection filter for a display device, wherein the antireflection filter for a display device is a multilayer film including a metal oxide layer. (4) The method for producing an antireflection filter for a display device, wherein the antireflection film is a multilayer film in which a tin oxynitride layer and a silicon dioxide layer are laminated in this order on a substrate surface. (5) The method for producing an antireflection filter for a display device, wherein the tin oxynitride layer has a thickness of 90 to 140 nm and the silicon dioxide layer has a thickness of 60 to 110 nm.
【００１０】（６） 前記電磁波遮蔽機能と近赤外線遮
蔽機能と色調補正機能と反射防止機能の少なくとも１つ
を発現する層を設ける工程が、ガラス基板面上に電磁波
遮蔽層をスパッタリング法により成膜する工程又は電磁
波遮蔽層が成膜されたフィルムを積層する工程と、前記
電磁波遮蔽層上に低反射フィルムを貼り付ける工程とか
らなることを特徴とする前記表示装置用反射防止フィル
ターの製造方法。
（７） 前記電磁波遮蔽機能と近赤外線遮蔽機能と色調
補正機能と反射防止機能の少なくとも１つを発現する層
を設ける工程が、ガラス基板面上に電磁波遮蔽層をスパ
ッタリング法により成膜する工程又は電磁波遮蔽層が成
膜されたフィルムを積層する工程と、前記電磁波遮蔽層
上に防湿フィルムを貼り付ける工程とからなることを特
徴とする前記表示装置用反射防止フィルターの製造方
法。
（８） 前記電磁波遮蔽機能と近赤外線遮蔽機能と色調
補正機能と反射防止機能の少なくとも１つを発現する層
を設ける工程が、ガラス基板面上に電磁波遮蔽メッシュ
付きフィルムを貼り付ける工程と、前記電磁波遮蔽メッ
シュ付きフィルム上に近赤外線遮蔽機能と色調補正機能
を含む低反射フィルムを貼り付ける工程とからなること
を特徴とする前記表示装置用反射防止フィルターの製造
方法。
（９） 前記電磁波遮蔽機能と近赤外線遮蔽機能と色調
補正機能と反射防止機能の少なくとも１つを発現する層
を設ける工程が、ガラス基板面上に電磁波遮蔽メッシュ
付きフィルムを貼り付ける工程と、前記電磁波遮蔽メッ
シュ付きフィルム上に近赤外線遮蔽機能と色調補正機能
の少なくとも１つを発現するフィルムを貼り付ける工程
とからなることを特徴とする前記表示装置用反射防止フ
ィルターの製造方法。(6) In the step of providing a layer exhibiting at least one of the electromagnetic wave shielding function, the near infrared ray shielding function, the color tone correcting function and the antireflection function, an electromagnetic wave shielding layer is formed on a glass substrate surface by a sputtering method. Or a step of laminating a film having an electromagnetic wave shielding layer formed thereon, and a step of attaching a low reflection film on the electromagnetic wave shielding layer, the method for producing an antireflection filter for a display device. (7) The step of providing a layer exhibiting at least one of the electromagnetic wave shielding function, the near infrared ray shielding function, the color tone correcting function, and the antireflection function is a step of forming an electromagnetic wave shielding layer on a glass substrate surface by a sputtering method or The method for producing an antireflection filter for a display device, comprising: a step of laminating films having an electromagnetic wave shielding layer formed thereon; and a step of attaching a moisture-proof film on the electromagnetic wave shielding layer. (8) The step of providing a layer exhibiting at least one of the electromagnetic wave shielding function, the near infrared ray shielding function, the color tone correcting function, and the antireflection function includes a step of pasting a film with an electromagnetic wave shielding mesh on a glass substrate surface, The method for producing an antireflection filter for a display device, which comprises a step of attaching a low reflection film having a near infrared ray shielding function and a color correction function onto a film with an electromagnetic wave shielding mesh. (9) The step of providing a layer that exhibits at least one of the electromagnetic wave shielding function, the near infrared ray shielding function, the color tone correcting function, and the antireflection function includes a step of attaching a film with an electromagnetic wave shielding mesh on a glass substrate surface, The method for producing an antireflection filter for a display device, comprising the step of attaching a film exhibiting at least one of a near infrared ray shielding function and a color tone correcting function onto a film with an electromagnetic wave shielding mesh.
【００１１】本発明の製造方法によれば、反射防止膜を
スパッタリング法により基板面上に形成するため、大面
積の基板に均一な膜厚でコーティングが可能となり、生
産性に優れる。また、面内の反射色ムラが抑えられ、均
一な外観を得ることができる。さらに、観察者側の基板
面上にスパッタコートするため、耐擦傷性にも優れる。
また本発明はガラス基板表面上にきわめて薄い膜がスパ
ッタコートされているため、従来の反射防止フィルムを
貼り付けたフィルターや、フッ素樹脂コートされたフィ
ルターと比べて端部まで欠点なく外観にも優れる。更
に、本発明の製造方法において、特定の膜材料を用いた
ときには後加熱が可能となり、生産性に特に優れる。According to the manufacturing method of the present invention, since the antireflection film is formed on the substrate surface by the sputtering method, it is possible to coat a large-area substrate with a uniform film thickness, and the productivity is excellent. In addition, in-plane reflection color unevenness is suppressed, and a uniform appearance can be obtained. Furthermore, since the substrate surface on the observer side is sputter coated, it has excellent scratch resistance.
Further, according to the present invention, since an extremely thin film is sputter-coated on the surface of the glass substrate, it is excellent in appearance up to the end without any defect as compared with a filter to which a conventional antireflection film is attached or a fluororesin-coated filter. . Further, in the production method of the present invention, post-heating becomes possible when a specific film material is used, and the productivity is particularly excellent.
【００１２】[0012]
【発明の実施の形態】以下に本発明の表示装置用反射防
止フィルターの製造方法についての実施の形態について
詳細に説明するが、本発明は以下に説明するものに限定
されるものではない。BEST MODE FOR CARRYING OUT THE INVENTION Hereinafter, embodiments of the method for producing an antireflection filter for a display device of the present invention will be described in detail, but the present invention is not limited to those described below.
【００１３】本発明で用いられるガラス基板は特に限定
されず、例えば、透明または着色のフロートガラス（フ
ロート法で製造されたガラス）が挙げられる。具体的に
はフロート法によるソーダライムガラスが好適に用いら
れる。ガラス基板の厚みとしては特に限定されないが、
好適には１〜５ｍｍ、より好適には２〜４ｍｍの範囲で
ある。The glass substrate used in the present invention is not particularly limited, and examples thereof include transparent or colored float glass (glass produced by the float method). Specifically, soda lime glass by the float method is preferably used. The thickness of the glass substrate is not particularly limited,
The range is preferably 1 to 5 mm, more preferably 2 to 4 mm.
【００１４】本発明においては、前記ガラス基板の片面
上に反射防止膜をスパッタリング法によって成膜する。
スパッタリング法は、例えば、ＤＣ（直流）スパッタリ
ング方式、ＡＣ（交流）スパッタリング方式、ＲＦ（高
周波）スパッタリング方式が挙げられる。中でも、プロ
セスが安定しており、大面積への成膜が容易であるとい
う利点があるので、ＤＣマグネトロンスパッタリング法
またはＡＣスパッタリング法が好ましい。なお、ＤＣマ
グネトロンスパッタリング法には、パルス化（パルス波
状に電圧を印加する）ＤＣマグネトロンスパッタリング
法を含む。ＡＣスパッタリング法及びパルス化ＤＣマグ
ネトロンスパッタリング法は、異常放電の防止に有効で
ある。本発明において、スパッタリング法を用いる場
合、例えばターゲットとしてスズを用い、スパッタガス
として酸素ガスと窒素原子を含むガスとを含有するガス
を用いて反応性スパッタリング法を行う。ターゲット
は、スズ単独でもよいが、Ａｌ、Ｓｉ、Ｚｎ等公知のド
ーパントを本発明の特徴を損なわない範囲でドープして
もよい。In the present invention, an antireflection film is formed on one surface of the glass substrate by a sputtering method.
Examples of the sputtering method include a DC (direct current) sputtering method, an AC (alternating current) sputtering method, and an RF (high frequency) sputtering method. Among them, the DC magnetron sputtering method or the AC sputtering method is preferable because they have advantages of stable process and easy film formation on a large area. The DC magnetron sputtering method includes a pulsed (applying voltage in pulse wave) DC magnetron sputtering method. The AC sputtering method and the pulsed DC magnetron sputtering method are effective in preventing abnormal discharge. In the present invention, when the sputtering method is used, for example, tin is used as the target and the reactive sputtering method is performed using a gas containing oxygen gas and a gas containing nitrogen atoms as the sputtering gas. The target may be tin alone, or may be doped with a known dopant such as Al, Si, or Zn within a range that does not impair the characteristics of the present invention.
【００１５】スパッタガスとしては各種反応性ガスが用
いられ、例えば、酸素ガスと窒素原子を含むガスとを含
有するものが挙げられる。具体的には、酸素ガスおよび
窒素ガスの混合ガス、酸素ガス、窒素ガスおよび不活性
ガスの混合ガスを用いることができる。また、窒素原子
を含むガスとしては、窒素ガス（Ｎ2）以外にも、Ｎ
2Ｏ、ＮＯ、ＮＯ2、ＮＨ3等を用いることができる。不
活性ガスは、例えば、ヘリウム、ネオン、アルゴン、ク
リプトン、キセノン等の希ガスが挙げられる。中でも、
経済性および放電のし易さの点から、アルゴンが好まし
い。これらは、単独でまたは２種以上を混合して用いら
れる。Various reactive gases are used as the sputtering gas, and examples thereof include those containing oxygen gas and gas containing nitrogen atoms. Specifically, a mixed gas of oxygen gas and nitrogen gas, a mixed gas of oxygen gas, nitrogen gas, and an inert gas can be used. In addition to nitrogen gas (N 2 ), the gas containing nitrogen atoms may be N
2 O, NO, NO 2 , NH 3, etc. can be used. Examples of the inert gas include rare gases such as helium, neon, argon, krypton, and xenon. Above all,
Argon is preferred from the viewpoints of economy and ease of discharge. These may be used alone or in admixture of two or more.
【００１６】スパッタガスにおける酸素ガスおよび窒素
原子を含むガスの分圧、ならびにスパッタガスの全圧
は、特に限定されず、グロー放電が安定に行われる圧力
であればよい。The partial pressure of the oxygen gas and the gas containing nitrogen atoms in the sputter gas and the total pressure of the sputter gas are not particularly limited as long as the glow discharge is stably performed.
【００１７】スパッタリング法を行う場合、スパッタリ
ングチャンバーの大きさは特に限定されない。基板の大
きさ等を考慮し、適当な大きさのスパッタリングチャン
バーを用いることができる。例えば、０．１〜３５ｍ3
のスパッタリングチャンバーが好適に用いられる。スパ
ッタリング法を行う場合、電力密度は、０．９〜３．６
Ｗ／ｃｍ2であるのが好ましく、０．９〜１．８Ｗ／ｃ
ｍ2であるのがより好ましい。成膜時間は、成膜速度お
よび所望の膜厚に応じて決定すればよい。When carrying out the sputtering method, the size of the sputtering chamber is not particularly limited. A sputtering chamber having an appropriate size can be used in consideration of the size of the substrate and the like. For example, 0.1 to 35 m 3
The sputtering chamber of is preferably used. When performing the sputtering method, the power density is 0.9 to 3.6.
W / cm 2 is preferable, and 0.9 to 1.8 W / c
More preferably m 2 . The film formation time may be determined according to the film formation rate and the desired film thickness.
【００１８】反射防止膜としては、酸化物膜、酸炭化物
膜、窒化物膜、窒炭化物膜、酸窒化物膜等を複数積層さ
せた多層膜であることが好ましい。The antireflection film is preferably a multilayer film in which a plurality of oxide films, oxycarbide films, nitride films, nitriding carbide films, oxynitride films and the like are laminated.
【００１９】反射防止膜を構成する膜の具体例として
は、チタン、ケイ素、亜鉛、アルミニウム、スズ、ジル
コニウム、タンタル、タングステン、ビスマスおよびニ
オブからなる群から選ばれる少なくとも１種の元素の酸
化物膜、酸窒化物膜もしくは酸炭化物膜、または、ケイ
素、アルミニウムおよびホウ素からなる群から選ばれる
少なくとも１種の元素の窒化物膜もしくは窒炭化物膜な
どが挙げられる。A specific example of the film constituting the antireflection film is an oxide film of at least one element selected from the group consisting of titanium, silicon, zinc, aluminum, tin, zirconium, tantalum, tungsten, bismuth and niobium. , An oxynitride film or an oxycarbide film, or a nitride film or a nitride carbide film of at least one element selected from the group consisting of silicon, aluminum and boron.
【００２０】反射防止膜の具体的な態様としては、基板
側から順に酸窒化スズ層、二酸化ケイ素（ＳｉＯ2）層
を積層した２層構成や、酸窒化スズ層、酸化チタン（Ｔ
ｉＯ2）層、ＳｉＯ2層を積層した３層構成などが挙げら
れる。本発明では特に酸窒化スズ層、ＳｉＯ2層を積層
した２層構成が好ましい。以下に酸窒化スズ層について
具体的に説明する。Specific embodiments of the antireflection film include a two-layer structure in which a tin oxynitride layer and a silicon dioxide (SiO 2 ) layer are laminated in this order from the substrate side, a tin oxynitride layer, and a titanium oxide (T
Examples include a three-layer structure in which an iO 2 ) layer and a SiO 2 layer are laminated. In the present invention, a two-layer structure in which a tin oxynitride layer and a SiO 2 layer are laminated is particularly preferable. The tin oxynitride layer will be specifically described below.
【００２１】酸窒化スズ層中のＳｎ、ＯおよびＮの組成
比は特に限定されないが、Ｎの含有量は、Ｓｎ、Ｏおよ
びＮの合計に対して、０ａｔ％超、４．０ａｔ％未満が
好ましい。上記範囲であると、酸窒化スズ膜付き基板を
高温で熱処理した際に、基板に実用上問題となる程度の
反りが生じたり、酸窒化スズ膜にクラックが生じたりす
ることがない。酸窒化スズ膜におけるＮの含有量は、Ｓ
ｎ、ＯおよびＮの合計に対してより好ましくは０ａｔ％
超、０．９ａｔ％未満である。上記範囲であると、高温
で熱処理しても組成の変化が小さく、個体ごとのバラツ
キが小さいため、工業的生産が容易となる。The composition ratio of Sn, O and N in the tin oxynitride layer is not particularly limited, but the content of N is more than 0 at% and less than 4.0 at% with respect to the total of Sn, O and N. preferable. Within the above range, when the substrate with a tin oxynitride film is heat-treated at a high temperature, the substrate does not warp to such an extent that it poses a practical problem, or the tin oxynitride film does not crack. The content of N in the tin oxynitride film is S
More preferably 0 at% relative to the sum of n, O and N
It is more than 0.9 at%. Within the above range, the composition change is small even when heat-treated at a high temperature, and the variation among individuals is small, so that industrial production becomes easy.
【００２２】なお、本発明においては、酸窒化スズ膜の
Ｎ、ＯおよびＳｎの組成はＸ線光電子分光法（ＸＰＳ）
により分析することができる。具体的にはＸＰＳ測定装
置（ＰＨＩ社勢ＥＳＣＡ５４００）を用いて以下の条件
で測定することができる。In the present invention, the composition of N, O and Sn of the tin oxynitride film is X-ray photoelectron spectroscopy (XPS).
Can be analyzed by Specifically, it can be measured under the following conditions using an XPS measuring device (ESI 5400 manufactured by PHI Corporation).
【００２３】＜ＸＰＳ測定条件＞
Ｘ線源：ＭｇＫα線、ビーム径２ｍｍ、出力１５ｋＶ、
４００Ｗ
Ａｒ+イオンビーム（４ｋｅＶ、２５ｍｍＡ／ｃｍ2）を
用いて、サンプル面上３ｍｍ×３ｍｍの領域をラスター
スキャンし、表面層をスパッタエッチングした面を測定
する。
光電子の検出角度：４５°、
光電子分析器のパスエネルギー幅：７１．５５ｅＶ
上記条件で測定したＮ1s、Ｏ1s、Ｓｎ3d5/2ピークの各
ピーク面積を求め、相対感度係数を用いて表面原子数比
を算出し、窒素の含有割合ａｔ％（原子％）を求める。
相対感度係数は、Ｎ1sは０．４９９、Ｏ1sは０．７３
３、Ｓｎ3d5/2は４．８９０である。<XPS Measurement Conditions> X-ray source: MgKα ray, beam diameter 2 mm, output 15 kV,
Using a 400 W Ar + ion beam (4 keV, 25 mmA / cm 2 ), a region of 3 mm × 3 mm on the sample surface is raster-scanned, and the surface on which the surface layer is sputter-etched is measured. Photoelectron detection angle: 45 °, pass energy width of photoelectron analyzer: 71.55 eV Each peak area of N 1s , O 1s , and Sn 3d5 / 2 peaks measured under the above conditions was obtained, and surface atoms were calculated using the relative sensitivity coefficient. The number ratio is calculated to obtain the nitrogen content ratio at% (atomic%).
The relative sensitivity coefficient is 0.499 for N 1s and 0.73 for O 1s.
3, Sn 3d5 / 2 is 4.890.
【００２４】反射防止膜の膜厚としては、２層構成の場
合には第１層の膜厚は好ましくは９０〜１４０ｎｍ、よ
り好ましくは１００〜１２０ｎｍであり、第２層の膜厚
は６０〜１１０ｎｍ、より好ましくは７０〜９０ｎｍで
ある。また、３層構成の場合には第１層の膜厚は好まし
くは７５〜１０５ｎｍ、より好ましくは８０〜９５ｎｍ
であり、第２層の膜厚は好ましくは１０〜４５ｎｍ、よ
り好ましくは１５〜３０ｎｍであり、第３層の膜厚は好
ましくは８５〜１１５ｎｍ、より好ましくは９０〜１０
０ｎｍである。As for the film thickness of the antireflection film, in the case of the two-layer structure, the film thickness of the first layer is preferably 90 to 140 nm, more preferably 100 to 120 nm, and the film thickness of the second layer is 60 to. It is 110 nm, more preferably 70 to 90 nm. In the case of a three-layer structure, the thickness of the first layer is preferably 75 to 105 nm, more preferably 80 to 95 nm.
The thickness of the second layer is preferably 10 to 45 nm, more preferably 15 to 30 nm, and the thickness of the third layer is preferably 85 to 115 nm, more preferably 90 to 10 nm.
It is 0 nm.
【００２５】なお、前記酸窒化スズ層、二酸化ケイ素層
および酸化チタン層ともに、本発明における作用効果を
損なわない範囲で他の元素を含んでいてもよい。The tin oxynitride layer, the silicon dioxide layer and the titanium oxide layer may contain other elements as long as the effects of the present invention are not impaired.
【００２６】本発明の製造方法において、ガラス基板の
前記反射防止膜を成膜する面とは反対面に設ける、電磁
波遮蔽機能と近赤外線遮蔽機能と色調補正機能と反射防
止機能の少なくとも１つを発現する層の構成としては、
電磁波遮蔽機能と近赤外線遮蔽機能と反射防止機能とを
発現する積層膜が挙げられる。具体的には、ガラス基板
側から、１）導電膜（電磁波遮蔽機能と近赤外線遮蔽機
能を発現する）、防湿性および色調補正機能を備えた反
射防止フィルムの順に積層された積層膜、２）導電メッ
シュ層（電磁波遮蔽機能を発現する）、近赤外線吸収剤
含有反射防止フィルム（近赤外線遮蔽機能と反射防止機
能を発現する）の順に積層された積層膜、３）導電膜
（電磁波遮蔽機能と近赤外線遮蔽機能を発現する）、近
赤外線遮蔽フィルム、反射防止フィルムの順に積層され
た積層膜、などが挙げられる。尚、本発明において「電
磁波遮蔽」とは周波数３０〜１０００ＭＨｚの領域を遮
蔽しうることを意味し、「近赤外線遮蔽」とは波長８０
０〜１３００ｎｍの領域を遮蔽しうることを意味する。In the manufacturing method of the present invention, at least one of an electromagnetic wave shielding function, a near infrared ray shielding function, a color tone correcting function and an antireflection function is provided on the surface of the glass substrate opposite to the surface on which the antireflection film is formed. As the constitution of the layer to be expressed,
A laminated film that exhibits an electromagnetic wave shielding function, a near infrared ray shielding function, and an antireflection function can be given. Specifically, from the glass substrate side, 1) a conductive film (which exhibits an electromagnetic wave shielding function and a near infrared ray shielding function), an antireflection film having a moisture-proof property and a color-tone correction function, and a laminated film 2) A laminated film in which a conductive mesh layer (which exhibits an electromagnetic wave shielding function) and a near-infrared absorber-containing antireflection film (which exhibits a near infrared ray shielding function and an antireflection function) are laminated in this order. 3) Conductive film (electromagnetic wave shielding function and A film that exhibits a near-infrared shielding function), a near-infrared shielding film, and a laminated film in which an antireflection film is laminated in this order. In the present invention, “electromagnetic wave shielding” means capable of shielding a region of frequency 30 to 1000 MHz, and “near infrared shielding” has a wavelength of 80.
It means that the region of 0 to 1300 nm can be shielded.
【００２７】導電膜としては、高屈折率透明層と銀（Ａ
ｇ）層からなる多層膜が好ましく、具体的には、１）高
屈折率透明層、銀層、高屈折率透明層、銀層、高屈折率
透明層の順に積層された多層膜、２）高屈折率透明層、
銀層、高屈折率透明層、銀層、高屈折率透明層、銀層、
高屈折率透明層の順に積層された多層膜、３）高屈折率
透明層、銀層、高屈折率透明層、銀層、高屈折率透明
層、銀層、高屈折率透明層、銀層、高屈折率透明層の順
に積層された多層膜、などが挙げられる。高屈折率透明
層としては、屈折率が１．８〜２．４程度の層であるこ
とが好ましく、例えばＺｎＯ層が挙げられ、特にＡｌが
添加されたＺｎＯ層が好ましい。銀層とは、銀を主成分
とする層であり、銀の比抵抗を大きく減じない範囲でパ
ラジウム、金、ニッケル、チタニウムなど他の金属を添
加することができるが、とりわけパラジウム（Ｐｄ）
は、それが少量添加されることにより、導電膜（電磁波
遮蔽膜）の耐湿性および耐熱性が向上するので好まし
い。なお、銀の耐久性を向上させるために防湿性に優れ
た層やフィルムを銀層の上に積層することが好ましい。
そのために防湿性を備えた反射防止機能付フィルムを用
いると工程が少なくてすむため好ましい。更に、このフ
ィルムに色素を含有させて着色することで色調補正や透
過率調整を行うこともできる。As the conductive film, a high refractive index transparent layer and silver (A
A multilayer film composed of g) layers is preferable, and specifically, 1) a multilayer film in which a high refractive index transparent layer, a silver layer, a high refractive index transparent layer, a silver layer, and a high refractive index transparent layer are laminated in this order, 2). High refractive index transparent layer,
Silver layer, high refractive index transparent layer, silver layer, high refractive index transparent layer, silver layer,
A multilayer film in which a high refractive index transparent layer is laminated in this order, 3) a high refractive index transparent layer, a silver layer, a high refractive index transparent layer, a silver layer, a high refractive index transparent layer, a silver layer, a high refractive index transparent layer, a silver layer. , A multilayer film in which a high refractive index transparent layer is laminated in this order, and the like. The high refractive index transparent layer is preferably a layer having a refractive index of about 1.8 to 2.4, and examples thereof include a ZnO layer, and a ZnO layer to which Al is added is particularly preferable. The silver layer is a layer containing silver as a main component, and other metals such as palladium, gold, nickel and titanium can be added within a range that does not significantly reduce the specific resistance of silver, but especially palladium (Pd)
Is preferable because the addition of a small amount thereof improves the moisture resistance and heat resistance of the conductive film (electromagnetic wave shielding film). In addition, in order to improve the durability of silver, it is preferable to laminate a layer or film having excellent moisture resistance on the silver layer.
Therefore, it is preferable to use a film with an antireflection function having a moisture-proof property because the number of steps can be reduced. Further, color tone correction and transmittance adjustment can be performed by adding a pigment to this film and coloring it.
【００２８】反射防止フィルムとしては、樹脂フィルム
が挙げられる。また、反射防止フィルムは色調調整のた
めに、有色のフィルムとすることもできる。本発明にお
いて用いることができる反射防止フィルムとして、具体
的には旭硝子社製のＡＲＣＴＯＰ（商品名）を挙げるこ
とができる。ＡＲＣＴＯＰ（商品名）は、自己修復性と
飛散防止特性とを有するポリウレタン系軟質樹脂フィル
ムの片面に、非結晶性の含フッ素重合体からなる低屈折
率の反射防止層を形成して反射防止処理を施したもので
ある。また、日本油脂社製のリアルック（商品名）も挙
げることができる。Examples of the antireflection film include resin films. Further, the antireflection film may be a colored film for adjusting the color tone. Specific examples of the antireflection film that can be used in the present invention include ARCTOP (trade name) manufactured by Asahi Glass Co., Ltd. ARCTOP (trade name) is an antireflection treatment by forming a low refractive index antireflection layer made of an amorphous fluoropolymer on one side of a polyurethane-based soft resin film having self-repairing properties and anti-scattering properties. Is applied. Also, Rialuk (trade name) manufactured by NOF CORPORATION can be mentioned.
【００２９】導電メッシュ層としては、導電性物質をメ
ッシュ状に付着させてなるフィルム等が代表例として挙
げられ、その具体的なフィルム構成や導電性物質の付着
方法などについては特開平９−３３０６６７号公報に記
載されている。A typical example of the conductive mesh layer is a film formed by depositing a conductive substance in a mesh shape. The specific film structure and method of depositing the conductive substance are described in JP-A-9-330667. It is described in Japanese Patent Publication No.
【００３０】本発明において、反射防止フィルムや導電
性メッシュフィルム等各種フィルムを接着するに際し
て、熱によって両者を貼り合せることもできるが、粘着
剤層を介して両者を接着させることもできる。この粘着
剤層に使用することができる粘接着剤としては、例えば
アクリル系、アクリル共重合系、シリコーン系、ゴム
系、ポリビニルエーテル系等の粘着剤；エチレン−酢酸
ビニル共重合体、エチレン−アクリル酸エステル共重合
体、ポリエステル系、ポリアミド等のホットメルト型の
接着剤、ウレタン系、エポキシ系、アミノ樹脂系、フェ
ノール樹脂系、アクリレート系等の熱硬化型あるいは紫
外線硬化型接着剤等が挙げられる。In the present invention, when various films such as an antireflection film and a conductive mesh film are adhered, they may be adhered together by heat, or they may be adhered via an adhesive layer. Examples of the tackiness adhesive that can be used in this pressure-sensitive adhesive layer include acrylic-based, acrylic copolymer-based, silicone-based, rubber-based, polyvinyl ether-based pressure-sensitive adhesives; ethylene-vinyl acetate copolymer, ethylene- Acrylic ester copolymers, polyester, hot melt adhesives such as polyamide, urethane-based, epoxy-based, amino resin-based, phenol resin-based, acrylate-based thermosetting or UV-curing adhesives, etc. To be
【００３１】なお、本発明においては、反射防止フィル
ム及び／または粘着剤を着色させて色調補正を行うこと
が好ましい。In the present invention, it is preferable to color the antireflection film and / or the adhesive to correct the color tone.
【００３２】本発明のフィルターに近赤外線遮蔽機能を
もたせるためには、メッシュフィルム、粘着剤、および
反射防止フィルムの少なくとも１つに近赤外線遮蔽性物
質を含有させてもよいし、これらとは別に近赤外線遮蔽
機能を有するフィルムを設けてもよい。また、これらの
フィルムに可視光の色素を添加、着色することで色調補
正してもよい。In order for the filter of the present invention to have a near infrared ray shielding function, at least one of the mesh film, the pressure sensitive adhesive and the antireflection film may contain a near infrared ray shielding substance, or in addition thereto. A film having a near infrared ray shielding function may be provided. Further, the color tone may be corrected by adding and coloring a visible light pigment to these films.
【００３３】本発明の製造方法の好ましい態様として
は、ガラス基板を所定の大きさに切断した後切断部分を
面取（切面）したのちに、ガラス基板の片面の周辺全体
に着色セラミック層と銀ぺーストとをこの順に印刷して
電極を形成する。ここで、「所定の大きさ」とはＰＤＰ
などの表示装置の前面に取り付けるために適切な大きさ
であり、表示装置の画面サイズに応じて適宜決められ
る。印刷方法としてはスクリーン印刷が挙げられる。例
えば、ガラス基板の片面の周辺全体に着色セラミック層
と銀ペーストとをこの順に印刷する。この印刷の工程
は、工程２と工程３の間に、または、工程Ａと工程Ｂの
間に行われることが好ましく、次工程の熱処理を電極形
成のための焼成に利用することができる。電極用銀ペー
ストは、銀とガラスフリットを含むペーストであり、着
色セラミック層は、電極が観察者側から直接見えてしま
うことを隠蔽するために設けるもので主に顔料、ガラス
フリットからなる。In a preferred embodiment of the manufacturing method of the present invention, the glass substrate is cut into a predetermined size, the cut portion is chamfered (cut surface), and then the colored ceramic layer and silver are formed on the entire periphery of one side of the glass substrate. The paste is printed in this order to form an electrode. Here, the “predetermined size” means PDP
The size is suitable for mounting on the front surface of the display device, and is appropriately determined according to the screen size of the display device. Screen printing can be mentioned as a printing method. For example, the colored ceramic layer and the silver paste are printed in this order on the entire periphery of one side of the glass substrate. This printing step is preferably performed between step 2 and step 3 or between step A and step B, and the heat treatment of the next step can be used for firing for electrode formation. The silver paste for electrodes is a paste containing silver and glass frit, and the colored ceramic layer is provided for concealing that the electrode is directly visible from the observer side, and is mainly composed of pigment and glass frit.
【００３４】熱処理は、特に限定されず、所望の特性に
応じて条件を変動させることができる。中でも、好適な
具体例の一つとして、酸素ガスを含有する雰囲気（例え
ば、大気雰囲気）の中で、５００〜７００℃で３〜５分
間熱処理することが挙げられる。The heat treatment is not particularly limited, and the conditions can be changed according to the desired characteristics. Among them, as one of the preferred specific examples, heat treatment at 500 to 700 ° C. for 3 to 5 minutes in an atmosphere containing oxygen gas (for example, air atmosphere) can be mentioned.
【００３５】本発明において、ガラス基板上に反射防止
膜をスパッタリング法によって成膜する工程は基板を切
面する前でも、あるいは切面して電極を形成した後でも
よいが、生産性の観点からは反射防止膜をスパッタリン
グ法によって成膜した後に基板を切面するのが好まし
い。In the present invention, the step of forming the antireflection film on the glass substrate by the sputtering method may be performed before the substrate is cut, or after the electrode is formed by cutting the substrate. It is preferable to cut the substrate after forming the protective film by a sputtering method.
【００３６】このようにして製造された反射防止機能付
フィルターは、ＰＤＰ等の表示装置前面に取り付けて使
用する。尚、本発明によるフィルターを取り付ける際に
は反射防止膜をスパッタコートした基板面が表側（観察
者側）となるようにする。The filter with antireflection function thus manufactured is used by being attached to the front surface of a display device such as a PDP. When the filter according to the present invention is attached, the surface of the substrate on which the antireflection film is sputter-coated is the front side (observer side).
【００３７】本発明の製造方法によって得られる反射防
止フィルターの可視光線透過率は３０〜７０％が好まし
く、より好ましくは４０〜６０％である。尚、ここでい
う「可視光線透過率」とは、透明基板として２．５ｍｍ
厚のソーダライムガラスを用いて測定した値であり、Ｊ
ＩＳ Ｋ６７１４に準じて測定されたものである。尚、
色調はユーザーの嗜好に応じて適宜調整すればよく、ま
たＰＤＰから発光される５９０ｎｍのネオン光をカット
する光吸収機能を付与してもよい。The visible light transmittance of the antireflection filter obtained by the production method of the present invention is preferably 30 to 70%, more preferably 40 to 60%. The "visible light transmittance" referred to here is 2.5 mm for a transparent substrate.
It is the value measured using thick soda lime glass.
It is measured according to IS K6714. still,
The color tone may be appropriately adjusted according to the taste of the user, and may have a light absorbing function of cutting the 590 nm neon light emitted from the PDP.
【００３８】[0038]
【実施例】つぎに、本発明を実施例により具体的に説明
するが、本発明はこれら実施例に限定されるものではな
い。EXAMPLES Next, the present invention will be specifically described with reference to examples, but the present invention is not limited to these examples.
【００３９】[例１]図１を参照しながら、本実施例を説
明する。真空槽内に、縦４３１ｍｍ、横１２７ｍｍの平
板形状の、金属スズ（Ｓｎ）およびシリコン（Ｓｉ）を
スパッタターゲットとしてそれぞれカソード上に設置
し、真空槽（ＩＬＳ１６００、Ａｉｒｃｏ社製）を圧力
が２．６×１０-3Ｐａとなるまで排気した。真空槽内に
設置した無着色のソーダライムガラス基板１（厚み２．
５ｍｍ）上に、次のようにして反射防止層２を形成し
た。Example 1 This example will be described with reference to FIG. Metallic tin (Sn) and silicon (Si) in the form of a flat plate having a length of 431 mm and a width of 127 mm were placed on the cathode as sputtering targets in a vacuum chamber, and a vacuum chamber (ILS1600, manufactured by Airco) was used at a pressure of 2. It was evacuated to 6 × 10 −3 Pa. Uncolored soda lime glass substrate 1 (thickness 2.
5 mm), the antireflection layer 2 was formed as follows.
【００４０】＜第１層＞放電ガスとして酸素２５０ｓｃ
ｃｍと窒素３５０ｓｃｃｍとの混合ガスを導入した。こ
のとき、圧力は０．４５Ｐａとなった。ついで、Ｓｎの
反応性ＤＣスパッタリング（電力密度１．５Ｗ／ｃ
ｍ2）により、膜厚が１０７ｎｍの酸窒化スズ膜（波長
５５０ｎｍにおける屈折率が１．９５、窒素含有割合が
０．５原子％）を第１層として前記基板に直接成膜し
た。<First layer> 250 sc of oxygen as discharge gas
cm and nitrogen 350 sccm mixed gas was introduced. At this time, the pressure was 0.45 Pa. Then, reactive DC sputtering of Sn (power density 1.5 W / c
m 2 ), a tin oxynitride film having a film thickness of 107 nm (refractive index at wavelength 550 nm of 1.95, nitrogen content ratio of 0.5 atomic%) was directly formed on the substrate as a first layer.
【００４１】＜第２層＞放電ガスとしてアルゴン１００
ｓｃｃｍと酸素５００ｓｃｃｍとの混合ガスを真空槽内
に導入した。このとき、圧力は０．５Ｐａとなった。つ
いで、シリコンの反応性ＡＣスパッタリング（電力密度
１．５Ｗ／ｃｍ2）により、膜厚が７２ｎｍの二酸化ケ
イ素（ＳｉＯ2、波長５５０ｎｍにおける屈折率が１．
４６）を第２層として成膜した。<Second Layer> Argon 100 as discharge gas
A mixed gas of sccm and 500 sccm of oxygen was introduced into the vacuum chamber. At this time, the pressure became 0.5 Pa. Then, by reactive AC sputtering of silicon (power density 1.5 W / cm 2 ), silicon dioxide (SiO 2 having a film thickness of 72 nm, a refractive index at a wavelength of 550 nm of 1.
46) was deposited as a second layer.
【００４２】上記のようにして反射防止層を成膜したガ
ラス基板を必要な大きさに切断、面取りした後、洗浄し
た。次いで、ガラス基板の反射防止層を成膜した面とは
反対側の面周辺全体に着色セラミック層３用のインクを
スクリーン印刷で印刷し、充分に乾燥した。その後、そ
の上に電極用の銀ペースト４を、ガラス板周辺全体にス
クリーン印刷し乾燥した。更に、インク及びペーストの
焼成とガラスの強化処理を目的として、このガラスを大
気雰囲気中で６６０℃まで加熱し、その後風冷強化を施
した。The glass substrate on which the antireflection layer was formed as described above was cut into a required size, chamfered, and then washed. Then, the ink for the colored ceramic layer 3 was printed by screen printing on the entire periphery of the surface of the glass substrate opposite to the surface on which the antireflection layer was formed and dried sufficiently. Then, the silver paste 4 for electrodes was screen-printed on the entire periphery of the glass plate and dried. Further, for the purpose of firing the ink and paste and strengthening the glass, the glass was heated to 660 ° C. in an air atmosphere, and then subjected to air-cooling strengthening.
【００４３】こうして作製したガラス板の電極が形成さ
れている面上に、電磁波遮蔽機能と近赤外線遮蔽機能と
を発現する透明導電膜５を以下の方法により形成した。
すなわち、前記のガラス基板をスパッタリング装置内に
セットし、１０-6Ｔｏｒｒ台まで排気した。次に、ガラ
ス／３Ａｌ−ＺｎＯ（４０ｎｍ）／２．５Ｐｄ−Ａｇ
（１５ｎｍ）／３Ａｌ−ＺｎＯ（８０ｎｍ）／２．５Ｐ
ｄ−Ａｇ（１５ｎｍ）／３Ａｌ−ＺｎＯ（４０ｎｍ）の
多層導電膜を成膜した。それぞれの膜の成膜条件は表１
のとおりである。なお、３Ａｌ−ＺｎＯとは、ＡｌをＡ
ｌとＺｎとの総量に対し３原子％含有するＺｎＯの意で
あり、２．５Ｐｄ−Ａｇとは、ＰｄをＰｄとＡｇとの総
量に対し２．５原子％含有するＡｇの意であり、他も同
様である。A transparent conductive film 5 exhibiting an electromagnetic wave shielding function and a near infrared ray shielding function was formed by the following method on the surface of the glass plate thus prepared on which the electrodes were formed.
That is, the above glass substrate was set in a sputtering apparatus and exhausted to a level of 10 −6 Torr. Next, glass / 3Al-ZnO (40 nm) /2.5Pd-Ag
(15 nm) / 3Al-ZnO (80 nm) /2.5P
A multilayer conductive film of d-Ag (15 nm) / 3Al-ZnO (40 nm) was formed. Table 1 shows the film forming conditions for each film.
It is as follows. 3Al-ZnO means Al
1 means ZnO containing 3 atom% with respect to the total amount of 1 and Zn, and 2.5Pd-Ag means Ag containing 2.5 atom% of Pd with respect to the total amount of Pd and Ag, Others are the same.
【００４４】[0044]
【表１】
次に、前記導電膜上に色調補正したＰＥＴ付反射防止フ
ィルム６（旭硝子社製、商品名：ＡＲＣＴＯＰ（着色タ
イプ））をアクリル系粘着剤を介して貼り合わせ反射防
止フィルターを作製した。尚、この着色はフィルター色
がニュートラルグレイになるように調整されたものであ
る。[Table 1] Next, a color-corrected anti-reflection film 6 with PET (manufactured by Asahi Glass Co., Ltd., trade name: ARCTOP (colored type)) was laminated on the conductive film via an acrylic pressure-sensitive adhesive to prepare an anti-reflection filter. In addition, this coloring is adjusted so that the filter color becomes neutral gray.
【００４５】このようにして作製した反射防止フィルタ
ーの可視光線透過率は５８％、反射率は２％、透過色は
ニュートラルグレイであり、反射防止効果を確認した。
尚、可視光線透過率はＪＩＳ Ｋ６７１４に準じて測定
されたものであり、反射率はＪＩＳ Ｚ８７０１に準じ
て測定されたものである。The visible light transmittance of the antireflection filter thus produced was 58%, the reflectance was 2%, and the transmitted color was neutral gray. The antireflection effect was confirmed.
The visible light transmittance is measured according to JIS K6714, and the reflectance is measured according to JIS Z8701.
【００４６】[例２]例１において、ＰＥＴ付反射防止フ
ィルム（ＡＲＣＴＯＰ）の代わりに、ＴＡＣ反射防止フ
ィルム（リアルック）を着色粘着剤を介して貼り合わせ
て反射防止フィルターを作製した。[Example 2] In Example 1, a TAC antireflection film (REALUC) was attached instead of the PET antireflection film (ARCTOP) via a colored adhesive to prepare an antireflection filter.
【００４７】このようにして作製した反射防止フィルタ
ーの透過色はニュートラルグレイであり、反射防止効果
を確認した。The transmitted color of the antireflection filter thus produced was neutral gray, and the antireflection effect was confirmed.
【００４８】[例３]例１において、スパッタリング法に
よって成膜した導電膜の代わりに、日立化成工業（株）
製電磁波遮蔽メッシュフィルム（着色タイプ）を無色透
明のアクリル系粘着剤を介して貼り合わせ、更に近赤外
線遮蔽フィルムと着色ＡＲＣＴＯＰを貼り合わせた。Example 3 In Example 1, instead of the conductive film formed by the sputtering method, Hitachi Chemical Co., Ltd. was used.
The electromagnetic wave shielding mesh film (colored type) manufactured was pasted through a colorless and transparent acrylic adhesive, and the near infrared ray shielding film and the colored ARCTOP were further pasted.
【００４９】このようにして作製した反射防止フィルタ
ーの透過色はニュートラルグレイであり、反射防止効果
を確認した。The transmitted color of the antireflection filter thus produced was neutral gray, and the antireflection effect was confirmed.
【００５０】[0050]
【発明の効果】本発明の製造方法によれば、反射防止膜
をスパッタリング法により基板面上に形成するため、生
産性に優れる。また、本発明により得られるフィルター
は、観察者側の基板面上に反射防止膜がスパッタコート
されるため、従来の反射防止フィルムを貼り付けたフィ
ルターや、フッ素樹脂コートされたフィルターと比べて
耐擦傷性に優れ、外観にも優れる。更に、本発明の製造
方法において、特定の膜材料を用いたときには後加熱が
可能となり、生産性に特に優れる。According to the manufacturing method of the present invention, since the antireflection film is formed on the substrate surface by the sputtering method, the productivity is excellent. Further, the filter obtained according to the present invention has an antireflection film sputter-coated on the surface of the substrate on the observer side, so that it is more resistant than a filter to which a conventional antireflection film is attached or a fluororesin-coated filter. Excellent scratch resistance and appearance. Further, in the production method of the present invention, post-heating becomes possible when a specific film material is used, and the productivity is particularly excellent.
【図１】本発明の製造方法によって得られる表示装置用
反射防止フィルターの一例の層構造を示す模式的概略断
面図である。FIG. 1 is a schematic schematic cross-sectional view showing a layer structure of an example of an antireflection filter for a display device obtained by a manufacturing method of the present invention.
１ ガラス基板 ２ 反射防止層 ３ 着色セラミック層 ４ 銀ペースト ５ 導電膜 ６ 反射防止フィルム 1 glass substrate 2 Antireflection layer 3 Colored ceramic layer 4 silver paste 5 Conductive film 6 Anti-reflection film
───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.7 識別記号 ＦＩ テーマコート゛(参考） Ｇ０９Ｆ 9/00 ３４２ Ｇ０２Ｂ 1/10 Ｚ (72)発明者 森 雅史 東京都千代田区有楽町１丁目12番１号 旭 硝子株式会社内 (72)発明者 櫻田 信良 東京都千代田区有楽町１丁目12番１号 旭 硝子株式会社内 Ｆターム(参考） 2H048 CA05 CA12 CA19 CA24 2K009 AA05 BB02 CC03 DD02 DD04 EE00 5G435 AA02 AA14 AA16 BB02 BB06 GG11 GG33 KK05 KK07 ─────────────────────────────────────────────────── ─── Continuation of front page (51) Int.Cl. 7 Identification code FI theme code (reference) G09F 9/00 342 G02B 1/10 Z (72) Inventor Masafumi Mori 1-12-1 Yurakucho, Chiyoda-ku, Tokyo No. Asahi Glass Co., Ltd. (72) Inventor Nobuyoshi Sakurada 1-12-1 Yurakucho, Chiyoda-ku, Tokyo F-Term (Reference) 2H048 CA05 CA12 CA19 CA24 2K009 AA05 BB02 CC03 DD02 DD04 EE00 5G435 AA02 AA14 AA16 in Asahi Glass Co., Ltd. BB02 BB06 GG11 GG33 KK05 KK07
Claims (7)
タリング法によって成膜する工程と、前記ガラス基板を
所定の大きさに切断した後切断部分を面取する工程と、
前記ガラス基板全体を熱処理し強化する工程と、前記ガ
ラス基板の反射防止膜を成膜する面とは反対側に電磁波
遮蔽機能と近赤外線遮蔽機能と色調補正機能と反射防止
機能の少なくとも１つを発現する層を設ける工程とをこ
の順に含むことを特徴とする表示装置用反射防止フィル
ターの製造方法。1. A step of forming an antireflection film on one surface of a glass substrate by a sputtering method, a step of cutting the glass substrate into a predetermined size, and then chamfering a cut portion,
A step of heat treating and strengthening the entire glass substrate, and at least one of an electromagnetic wave shielding function, a near infrared ray shielding function, a color correction function and an antireflection function on the side opposite to the surface of the glass substrate on which the antireflection film is formed. A method of manufacturing an antireflection filter for a display device, which comprises the steps of providing a layer that develops in this order.
断部分を面取する工程と、前記ガラス基板全体を熱処理
し強化する工程と、前記ガラス基板の片面上に反射防止
膜をスパッタリング法によって成膜する工程と、前記ガ
ラス基板の反射防止膜を成膜する面とは反対側に電磁波
遮蔽機能と近赤外線遮蔽機能と色調補正機能と反射防止
機能の少なくとも１つを発現する層を設ける工程とをこ
の順に含むことを特徴とする表示装置用反射防止フィル
ターの製造方法。2. A step of cutting a glass substrate into a predetermined size and then chamfering the cut portion, a step of heat treating and strengthening the entire glass substrate, and a sputtering method with an antireflection film on one surface of the glass substrate. And the step of forming a layer on the side opposite to the surface of the glass substrate on which the antireflection film is formed by providing at least one of an electromagnetic wave shielding function, a near infrared ray shielding function, a color tone correcting function and an antireflection function. A method of manufacturing an antireflection filter for a display device, which comprises:
酸化物層からなる多層膜であることを特徴とする請求項
１または２に記載の表示装置用反射防止フィルターの製
造方法。3. The method for manufacturing an antireflection filter for a display device according to claim 1, wherein the antireflection film is a multilayer film including at least two metal oxide layers.
層と二酸化ケイ素層とをこの順に積層した多層膜からな
ることを特徴とする請求項１〜３のいずれかに記載の表
示装置用反射防止フィルターの製造方法。4. The display according to claim 1, wherein the antireflection film is a multilayer film in which a tin oxynitride layer and a silicon dioxide layer are laminated in this order on a substrate surface. Manufacturing method of antireflection filter for device.
ｍであり、前記二酸化ケイ素層の膜厚が６０〜１１０ｎ
ｍであることを特徴とする請求項４に記載の表示装置用
反射防止フィルターの製造方法。5. The tin oxynitride layer has a thickness of 90 to 140 n.
and the silicon dioxide layer has a thickness of 60 to 110 n.
m is the manufacturing method of the antireflection filter for display devices of Claim 4 characterized by the above-mentioned.
色調補正機能と反射防止機能の少なくとも１つを発現す
る層を設ける工程が、ガラス基板面上に電磁波遮蔽層を
スパッタリング法により成膜する工程又は電磁波遮蔽層
が成膜されたフィルムを積層する工程と、前記電磁波遮
蔽層上に低反射フィルムを貼り付ける工程とからなるこ
とを特徴とする請求項１〜５のいずれかに記載の表示装
置用反射防止フィルターの製造方法。6. The step of providing a layer exhibiting at least one of the electromagnetic wave shielding function, the near infrared ray shielding function, the color tone correcting function and the antireflection function forms an electromagnetic wave shielding layer on a glass substrate surface by a sputtering method. The display according to any one of claims 1 to 5, comprising a step or a step of laminating a film on which an electromagnetic wave shielding layer is formed, and a step of attaching a low reflection film on the electromagnetic wave shielding layer. Manufacturing method of antireflection filter for device.
色調補正機能と反射防止機能の少なくとも１つを発現す
る層を設ける工程が、ガラス基板面上に電磁波遮蔽メッ
シュ付きフィルムを貼り付ける工程と、前記電磁波遮蔽
メッシュ付きフィルム上に近赤外線遮蔽機能と色調補正
機能を含む低反射フィルムを貼り付ける工程とからなる
ことを特徴とする請求項１〜５のいずれかに記載の表示
装置用反射防止フィルターの製造方法。7. The step of providing a layer exhibiting at least one of the electromagnetic wave shielding function, the near infrared ray shielding function, the color tone correcting function and the antireflection function includes a step of attaching a film with an electromagnetic wave shielding mesh on a glass substrate surface. The antireflection for display device according to any one of claims 1 to 5, further comprising: a step of attaching a low reflection film having a near infrared ray shielding function and a color tone correcting function onto the film with the electromagnetic wave shielding mesh. Filter manufacturing method.
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|---|---|---|---|
| JP2002011619A JP4078520B2 (en) | 2002-01-21 | 2002-01-21 | Manufacturing method of filter with antireflection function for display device |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2002011619A JP4078520B2 (en) | 2002-01-21 | 2002-01-21 | Manufacturing method of filter with antireflection function for display device |
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|---|---|---|---|
| JP2007286357A Division JP2008077102A (en) | 2007-11-02 | 2007-11-02 | Method for manufacturing filter with antireflection function for display device |
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| Publication Number | Publication Date |
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| US8054554B2 (en) | 2009-03-11 | 2011-11-08 | Lg Electronics Inc. | Display apparatus |
| US8482691B2 (en) | 2009-03-31 | 2013-07-09 | Lg Electronics Inc. | Display apparatus having a minimized non-display region |
| WO2010117115A1 (en) * | 2009-04-09 | 2010-10-14 | Lg Electronics Inc. | Display apparatus |
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| US9588264B2 (en) | 2011-10-12 | 2017-03-07 | Corning Incorporated | Bezel-concealing display covers and display devices |
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