JP2003165175A - Oriented film, method for forming oriented film, liquid crystal device and projection-type display device - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a highly durable oriented film and a liquid crystal device equipped with this film. <P>SOLUTION: The oriented film 40(60) is structured of an organic oriented film layer 42 which shows lower moisture-absorptive characteristics than an inorganic oriented film and is oriented in a direction where the inorganic oriented film is oriented on the surface, formed on an inorganic oriented film layer 41. The inorganic oriented film layer 41 is formed by, for example, a rhombic vapor-deposition process and the organic oriented film layer 42 is formed by an ion vapor-deposition process using an acrylic monomer as a vapor deposition material. The liquid crystal device equipped with the oriented film 40(60) is hardly susceptible of a generated liquid crystal orientation failure. <P>COPYRIGHT: (C)2003,JPO

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an alignment film, a method for forming an alignment film, a liquid crystal device and a projection display device, and more particularly to an alignment film having excellent durability.

[0002]

2. Description of the Related Art A liquid crystal device used as a light modulating means mounted in a projection type display device such as a liquid crystal projector or a direct view type display device mounted in a mobile phone or the like is, for example, a pair of substrates arranged to face each other. A liquid crystal layer is sandwiched therebetween, and electrodes for applying a voltage to the liquid crystal layer are formed on the liquid crystal layer side of these substrates. In such a liquid crystal device, an alignment film for controlling the alignment of liquid crystal molecules when no voltage is applied is formed on the outermost surface of the pair of substrates on the liquid crystal layer side. The display is performed based on the change in the alignment of the liquid crystal molecules.

Conventionally, as the above-mentioned alignment film, a film obtained by rubbing the surface of an organic film made of polyimide or the like with a cloth or the like in a predetermined direction is widely used because of its excellent liquid crystal alignment ability (liquid crystal alignment control function). It is used. However, for example, when it is mounted on a projection type display device or the like that is irradiated with light having a light intensity of about ² to 10 lm / mm ² , the alignment film is gradually decomposed by light or heat, and after long-term use, In some cases, the liquid crystal molecules cannot be aligned at a desired pretilt angle when no voltage is applied, and thus the liquid crystal alignment control function is deteriorated and the display quality is deteriorated. This problem was particularly remarkable when a polyimide film having an imide bond which is easily decomposed by light or heat was used as the organic film. It is known that the liquid crystal device is exposed to a temperature of about 50 to 70 ° C. when it is mounted on a projection type display device.

Therefore, in order to solve such a problem, a liquid crystal device is proposed in which an inorganic alignment film made of an inorganic material such as silicon oxide is used as an alignment film, and liquid crystal molecules are aligned by the surface shape effect of the inorganic alignment film. Has been done. This inorganic alignment film is formed by an oblique vapor deposition method in which a substrate is fixed at a certain angle, an inorganic material is vapor-deposited from one direction, and columnar structures arranged at a predetermined angle with respect to the substrate are grown. The inorganic alignment film thus formed is superior in light resistance and heat resistance to that formed of an organic film such as polyimide, and can improve the durability of the liquid crystal device.

[0005]

However, since the inorganic alignment film made of an inorganic material such as silicon oxide has a hygroscopic property, moisture penetrates into the liquid crystal device, corrodes the metal wiring in the liquid crystal device, and causes a drive circuit. There is a risk of causing deterioration. Further, this inorganic alignment film is superior in light resistance and heat resistance to the polyimide film, but the alignment ability itself is inferior to that of the polyimide film. Furthermore, for example, when an alignment film is formed on the electrode surface of an active matrix type liquid crystal device including a switching element for controlling energization of electrodes, a stepped portion is formed on the electrode surface corresponding to the switching element formation position, In the step portion, a shadow portion is formed in the oblique vapor deposition direction, and vapor deposition unevenness or vapor deposition defect may occur in the shadow portion. Such a defect can be one of the factors that lead to a decrease in reliability as an alignment film (occurrence of alignment defect, etc.), and causes a display defect or the like when a liquid crystal device is used as a display device, for example. There are cases.

An object of the present invention is to provide an alignment film having high alignment properties and excellent durability, a method for forming the alignment film, a liquid crystal device having the alignment film having excellent durability, and a projection type liquid crystal device having the liquid crystal device. It is to provide a display device.

[0007]

In order to solve the above-mentioned problems, the alignment film of the present invention is an alignment film capable of controlling the alignment of target molecules, and is more hygroscopic than the inorganic alignment film on the inorganic alignment film. It is characterized in that a small organic alignment film capable of aligning target molecules is formed. In this case, since an organic alignment film having a lower hygroscopicity than the inorganic alignment film is formed on the inorganic alignment film, this organic alignment film lowers the hygroscopicity of the film, and the target molecules can be aligned by the organic alignment film. Therefore, it becomes possible to provide an alignment film having high orientation and durability. Liquid crystal molecules can be exemplified as the target molecule, and in this case,
The alignment film of the present invention functions as a liquid crystal alignment film. The hygroscopicity referred to in the present invention can be defined by, for example, the water absorption rate or water vapor transmission rate of the film.

The above-mentioned inorganic alignment film may be an inorganic vapor deposition film mainly composed of silicon oxide. Among the inorganic alignment films, an inorganic vapor deposition film mainly composed of an inorganic oxide such as silicon oxide exhibits particularly high hygroscopicity, but according to the alignment film of the present invention, it is relatively hygroscopic. Since the structure includes a small organic alignment film, even if such an inorganic vapor deposition film mainly composed of silicon oxide having high hygroscopicity is included, the alignment film is less likely to cause defects due to moisture absorption.

The organic alignment film may be an organic vapor deposition film formed on the inorganic alignment film by vapor deposition. The inorganic alignment film is for orienting the target molecules based on the surface shape, but by forming the organic vapor deposition film on the inorganic alignment film, the organic vapor deposition film has a mode along the surface shape of the inorganic alignment film. It is oriented, and thus the organic vapor deposition film allows the molecules of interest to be oriented.

The above-mentioned organic alignment film may be composed mainly of a crystalline fluorine-containing polymer.
The crystalline fluorine-containing polymer is chemically stable, has extremely low hygroscopicity, and has high crystallinity. Therefore, when it is formed on the inorganic alignment film, the target molecules are aligned and the hygroscopicity is extremely low. A membrane can be provided. Further, such a crystalline fluorine-containing polymer can be formed in a state having a high orientation ability according to the surface shape of the inorganic orientation film. In this case, the alignment direction of the crystalline fluorine-containing polymer on the inorganic alignment film is such that the long chain direction is aligned substantially parallel to the in-plane direction of the film, and the target molecule is also the organic alignment film. It is supposed to be oriented in substantially the same direction as the orientation direction. Examples of the crystalline fluorine-containing polymer include tetrafluoroethylene and the like.

The organic alignment film may be composed mainly of polyolefin. Polyolefin can also be formed in a state in which it has a low hygroscopic property and also has a high orientation ability according to the surface shape of the inorganic orientation film. Therefore, an alignment film having such a structure that an organic alignment film mainly composed of polyolefin is formed on an inorganic alignment film has low hygroscopicity and can align target molecules. In this case, the alignment direction of the polyolefin on the inorganic alignment film is such that the long chain direction is aligned substantially perpendicular to the in-plane direction of the film, and the target molecule is also in the same direction as the alignment direction of the organic alignment film. It is supposed to be oriented. As the polyolefin, for example, polyethylene having high orientation ability can be exemplified.

The organic alignment film may be mainly composed of a liquid crystal monomer-derived polymer obtained by polymerizing a liquid crystal monomer. In this case, the liquid crystal monomer is one that can take a liquid crystal phase by itself,
Alternatively, it means that it does not itself take a liquid crystal phase, but does not lose the liquid crystal state of the mixture when mixed in the liquid crystal phase. Such a liquid crystalline monomer-derived polymer has lower hygroscopicity than an inorganic alignment film, and can also align itself. Therefore, an alignment film formed by forming such an organic alignment film on an inorganic alignment film is a target. The oriented film has a low hygroscopicity while orienting the molecules. In addition, such a liquid crystal monomer-derived polymer can be formed on the inorganic alignment film by ion vapor deposition of the liquid crystal monomer. Specifically, a part of the liquid crystal monomer is ionized to form a film on the inorganic alignment film. It is possible to form an organic alignment film containing a polymer derived from a liquid crystalline monomer by vapor-depositing the same onto the inorganic alignment film and proceeding a polymerization reaction on the inorganic alignment film. Therefore, such an organic alignment film can have a high alignment ability according to the surface shape of the inorganic alignment film.

Specifically, the liquid crystal monomer is mainly composed of one or more compounds represented by any one of the following general formulas (1), (2) and (3). be able to.

[0014]

[Chemical 4]

[0015]

[Chemical 5]

[0016]

[Chemical 6]

The compounds represented by the above general formulas (1), (2) and (3) all have a rod-shaped molecular structure and are similar to liquid crystal monomers or liquid crystal molecules which themselves form a liquid crystal phase. It is a monomer having properties. Further, when these monomers are vapor-deposited on the inorganic alignment film by an ion vapor deposition method or the like, a polymerization reaction proceeds, and the polymer is vapor-deposited while being oriented along the surface alignment of the inorganic alignment film. Moreover, the compounds represented by the general formulas (1), (2), and (3) are excellent in polymerization reactivity because they are acrylate-based or methacrylate-based monomers. When these monomers are vapor-deposited by, the monomers spontaneously polymerize and polymerize.

The organic alignment film may be composed mainly of polyalkyl acrylate or polyalkyl methacrylate, and specifically, a poly long-chain alkyl having an alkyl chain of 5 or more carbon atoms. It may be mainly composed of acrylate or poly long-chain alkyl methacrylate. In this case, the polyalkyl acrylate or polyalkyl methacrylate has a lower hygroscopicity than the inorganic alignment film, and since it is also possible to align the target molecule itself, such an organic alignment film is formed on the inorganic alignment film. The formed alignment film becomes an alignment film having low hygroscopicity while aligning the target molecules. In addition, since polyalkyl acrylate or polyalkyl methacrylate can be formed on the inorganic alignment film by ion vapor deposition of alkyl acrylate or alkyl methacrylate, organic polyalkyl acrylate or polyalkyl methacrylate mainly composed of such polyalkyl acrylate or polyalkyl methacrylate is used. The alignment film can also have a high alignment ability according to the surface shape of the inorganic alignment film.

The alkyl acrylate or acrylic methacrylate is represented by the following general formula (1).

[0020]

[Chemical 7]

Next, the alignment film of the present invention as described above can be formed by the following method. That is, the method for forming an alignment film of the present invention includes an inorganic alignment film forming step of forming an inorganic alignment film and an organic alignment film forming step of forming an organic alignment film capable of aligning target molecules on the inorganic alignment film. And an organic alignment film is formed by a vapor deposition method in the organic alignment film formation step. By thus forming the organic alignment film by the vapor deposition method, it becomes possible to obtain the organic alignment film aligned along the surface alignment of the inorganic alignment film. In addition, in the inorganic alignment film forming step, for example, the inorganic alignment film can be formed by an oblique vapor deposition method.

Further, for example, in the organic alignment film forming step, the organic alignment film can be formed by an ion vapor deposition method. In this case, a part of the monomer corresponding to the polymer, which is the main constituent of the organic alignment film, is deposited on the inorganic alignment film in an ionized state, and the polymerization of the monomer naturally proceeds on the inorganic alignment film. . Therefore, it becomes possible to easily obtain the organic alignment film aligned along the surface alignment of the inorganic alignment film.

Further, the above-mentioned alignment film of the present invention can be provided in a liquid crystal device. That is, the liquid crystal device of the present invention has a configuration in which a liquid crystal layer is sandwiched between a pair of substrates facing each other, and the alignment film is provided on the liquid crystal layer side outermost surface of at least one of the pair of substrates. It is characterized by that. In this case, since the above-mentioned alignment film of the present invention is provided on the outermost surface of the substrate on the liquid crystal layer side, it is excellent in stability against light and heat and can maintain the liquid crystal alignment ability (liquid crystal alignment control function) for a long time. In addition, the hygroscopicity is low, and it is possible to prevent or suppress the intrusion of water into the liquid crystal layer.
The thickness of the alignment film in this case is, for example, 10 nm to 1
It can be about 00 nm. When the film thickness exceeds 100 nm, a high driving voltage is required to drive the liquid crystal, and when the film thickness is less than 10 nm, the alignment ability may decrease.

That is, in the manufacturing process of the liquid crystal device,
For example, after the alignment film is formed on the surface of the substrate, it is exposed to the air until the liquid crystal injection step, and the surface of the inorganic alignment film such as silicon oxide, which easily adsorbs water, may adsorb water molecules. If the liquid crystal panel is assembled in this state, water molecules adsorbed on the substrate surface (alignment film surface) will penetrate into the liquid crystal, causing a decrease in the specific resistance of the liquid crystal layer or causing a hydrolysis reaction of the liquid crystal molecules. There is a fear that water may enter the liquid crystal device, causing corrosion of the metal wiring in the liquid crystal device and deterioration of the drive circuit. However, in the present invention, since the alignment film having a configuration in which the organic alignment film having a lower hygroscopicity than the inorganic alignment film is formed on the surface of the inorganic alignment film is applied to the liquid crystal device, after the alignment film is formed on the substrate, However, the organic alignment film hardly absorbs water, and thus it is possible to prevent the infiltration of water into the liquid crystal device as described above. Furthermore, for example, even if some water molecules are adsorbed on the inorganic alignment film before forming the organic alignment film, the organic alignment film covers the upper layer of the inorganic alignment film. It is possible to prevent the adsorbed water molecules from entering the liquid crystal.

In the case where the inorganic alignment film is formed by oblique vapor deposition, the alignment film of the present invention is applied to an active matrix liquid crystal device including a switching element for controlling energization of electrodes as the liquid crystal device. When formed, the following effects can be brought about.

That is, in an active matrix type liquid crystal device, generally, a step portion is formed on the electrode surface corresponding to the switching element forming position, and a portion which is shaded from the oblique vapor deposition direction is formed in the step portion. Deposition unevenness or deposition failure may occur in the shaded portion. Such a defect may be one of the factors that lead to a decrease in reliability of the alignment film (occurrence of defective alignment, etc.). For example, when a liquid crystal device is used as a display device, it causes defective display. However, in the alignment film of the present invention, after the inorganic alignment film is formed by the oblique vapor deposition method, the organic alignment film is formed on the inorganic alignment film. The liquid crystal molecules are reliably aligned based on the alignment ability of the film. Therefore, by applying the alignment film of the present invention to an active matrix type liquid crystal device, liquid crystal alignment defects are less likely to occur, and the reliability of the liquid crystal device can be improved. Note that, for example, even in a position where the inorganic alignment film is not formed in the shaded portion, the organic alignment film is aligned based on the surface shape of the surrounding inorganic alignment film.

Next, by providing the liquid crystal device of the present invention, the following projection type display device of the present invention can be provided. That is, the projection display device of the present invention includes a light source,
It is characterized in that it is provided with a light modulating means composed of the liquid crystal device of the present invention for modulating the light from the light source, and a projection means for projecting the light modulated by the light modulating means. Since such a projection type display device is provided with the liquid crystal device of the present invention, a display defect due to water infiltration into the liquid crystal layer or a display defect due to deterioration of the alignment film due to light or heat is unlikely to occur. The display quality can be maintained for a long time, and the durability is excellent.

In the present specification, "mainly"
The component means the component with the highest content among the constituent components.

[0029]

BEST MODE FOR CARRYING OUT THE INVENTION Embodiments of the present invention will be described below with reference to the drawings. [Liquid Crystal Device] The liquid crystal device of this embodiment described below is an active matrix transmissive liquid crystal device using a TFT (Thin-Film Transistor) element as a switching element. Further, the liquid crystal device of the present embodiment is provided with the alignment film of the present invention, and the structure of the alignment film is particularly characteristic.

FIG. 1 is an equivalent circuit diagram of switching elements, signal lines, etc. in a plurality of pixels arranged in a matrix which form an image display area of the transmissive liquid crystal device of this embodiment. FIG. 2 is a plan view showing a structure of a plurality of pixel groups adjacent to each other on a TFT array substrate on which data lines, scanning lines, pixel electrodes and the like are formed. FIG. 3 is a cross-sectional view showing the structure of the transmissive liquid crystal device of this embodiment and is a cross-sectional view taken along the line AA ′ of FIG. FIG. 4 is an enlarged partial cross-sectional view showing an alignment film included in the transmissive liquid crystal device of this embodiment. Note that FIG.
In the figure, the upper side in the figure is the light incident side, and the lower side in the figure is the viewing side (observer side). Also,
In each drawing, the scale is made different for each layer and each member in order to make each layer and each member a size that can be recognized in the drawings.

In the transmissive liquid crystal device of the present embodiment, as shown in FIG. 1, a plurality of pixels arranged in a matrix forming an image display area are provided with a pixel electrode 9 and a current supply control to the pixel electrode 9. TFT elements 30 which are switching elements for performing the above are respectively formed, and the data line 6a to which the image signal is supplied is electrically connected to the source of the TFT element 30. The image signals S1, S2, ..., Sn to be written to the data line 6a are line-sequentially supplied in this order, or are supplied to a plurality of adjacent data lines 6a for each group.

Further, the scanning line 3a is electrically connected to the gate of the TFT element 30, and the scanning signals G1, G2, ..., Gm are pulse-sequentially line-sequential to the plurality of scanning lines 3a at a predetermined timing. Is applied at. In addition, the pixel electrode 9 is T
, Sn, which are electrically connected to the drain of the FT element 30 and are turned on for a certain period of time, by switching the TFT element 30 which is a switching element, the image signals S1, S2, ... Write in.

The image signals S1, S2, ..., Sn of a predetermined level written in the liquid crystal through the pixel electrode 9 are held for a certain period between the common electrodes described later. The liquid crystal modulates light by changing the orientation and order of the molecular assembly depending on the applied voltage level, and enables gradation display. Here, in order to prevent the held image signal from leaking, a storage capacitor 70 is added in parallel with the liquid crystal capacitor formed between the pixel electrode 9 and the common electrode.

Next, the planar structure of the transmissive liquid crystal device of this embodiment will be described with reference to FIG. As shown in FIG. 2, a rectangular pixel electrode 9 made of a transparent conductive material such as indium tin oxide (hereinafter abbreviated as “ITO”) on the TFT array substrate (outlined by a dotted line portion 9A). Are provided in a matrix, and the data lines 6a, the scanning lines 3a, and the capacitance lines 3b are provided along the vertical and horizontal boundaries of the pixel electrode 9, respectively. In the present embodiment, each pixel electrode 9 and a region where the data line 6a, the scanning line 3a, the capacitance line 3b, etc., which are arranged so as to surround the pixel electrode 9, are pixels, and are arranged in a matrix. The structure is such that display can be performed for each pixel.

The data line 6a is included in the semiconductor layer 1a of the TFT element 30 and is made of, for example, a polysilicon film.
The pixel region 9 is electrically connected to a source region described below via a contact hole 5, and the pixel electrode 9 is electrically connected to a drain region described below in the semiconductor layer 1a via a contact hole 8. In addition, in the semiconductor layer 1a,
The scanning line 3a is arranged so as to oppose a channel region (a diagonally upward-sloping region in the drawing) described below.
Serves as a gate electrode in a portion facing the channel region.

The capacitance line 3b is a main line portion extending in a substantially straight line along the scanning line 3a (that is, the scanning line 3 in plan view).
a first region formed along a) and a protruding portion (that is, the data line when seen in a plan view) protruding from the intersection with the data line 6a to the front side (upward in the figure) along the data line 6a. 6a and the 2nd area | region extended along). Then, in FIG. 2, a plurality of first light-shielding films 11a are provided in the region shown by the diagonal lines rising to the right.

Next, the cross-sectional structure of the transmissive liquid crystal device of this embodiment will be described with reference to FIG. As shown in FIG. 3, in the transmissive liquid crystal device of this embodiment, the TFT
Array substrate 10 and counter substrate 20 arranged to face it
And the liquid crystal layer 50 is sandwiched between. The TFT array substrate 10 is a substrate body 10A made of a translucent material such as quartz.
And the TFT element 30 formed on the surface of the liquid crystal layer 50 side,
Mainly composed of the pixel electrode 9 and the alignment film 40,
The counter substrate 20 is mainly composed of a substrate body 20A made of a translucent material such as glass or quartz, a common electrode 21 formed on the liquid crystal layer 50 side surface thereof, and an alignment film 60.

In the TFT array substrate 10, the pixel electrode 9 is provided on the surface of the substrate body 10A on the liquid crystal layer 50 side.
A pixel switching TFT element 30 that controls switching of each pixel electrode 9 is provided at a position adjacent to each pixel electrode 9. The pixel switching TFT element 30 is
It has an LDD (Lightly Doped Drain) structure and insulates the scanning line 3a, the channel region 1a ′ of the semiconductor layer 1a in which a channel is formed by the electric field from the scanning line 3a, the scanning line 3a and the semiconductor layer 1a. The gate insulating film 2, the data line 6a, the low concentration source region 1b and the low concentration drain region 1c of the semiconductor layer 1a, the high concentration source region 1d and the high concentration drain region 1e of the semiconductor layer 1a are provided.

The gate insulating film 2 is formed on the scanning line 3a.
The high-concentration source region 1d is formed on the substrate body 10A including the upper part.
A second interlayer insulating film 4 is formed in which a contact hole 5 leading to the high concentration drain region 1e and a contact hole 8 leading to the high-concentration drain region 1e are opened. That is, the data line 6a is electrically connected to the high-concentration source region 1d through the contact hole 5 penetrating the second interlayer insulating film 4. Further, on the data line 6a and the second interlayer insulating film 4, a third interlayer insulating film 7 having a contact hole 8 leading to the high concentration drain region 1e is formed. That is, the high-concentration drain region 1e is electrically connected to the pixel electrode 9 through the contact hole 8 penetrating the second interlayer insulating film 4 and the third interlayer insulating film 7.

Further, in this embodiment, the gate insulating film 2 is extended from the position facing the scanning line 3a and used as a dielectric film, and the semiconductor film 1a is extended to form the first storage capacitor electrode 1f. The storage capacitor 70 is configured by using a part of the capacitance line 3b facing these as the second storage capacitor electrode.

Further, the substrate body 1 of the TFT array substrate 10
On the surface of the liquid crystal layer 50 side of 0A, the area where each pixel switching TFT element 30 is formed is transmitted through the TFT array substrate 10 and the lower surface of the TFT array substrate 10 in the drawing (an interface between the TFT array substrate 10 and air). The first light-shielding film 11a is provided to prevent the return light reflected by the liquid crystal layer 50 from entering the channel region 1a ′ and the low-concentration source / drain regions 1b and 1c of the semiconductor layer 1a. Has been. In addition, the first light shielding film 11a
Between the pixel switching TFT element 30 and the pixel switching TFT element 30.
A first interlayer insulating film 12 is formed to electrically insulate the first light shielding film 11a from the first light shielding film 11a. Further, as shown in FIG. 2, in addition to providing the first light-shielding film 11a on the TFT array substrate 10, the first light-shielding film 11a is electrically connected to the capacitance line 3b at the front stage or the rear stage through the contact hole 13. Is configured to connect to.

Further, the liquid crystal layer 50 of the TFT array substrate 10
Side outermost surface, that is, the pixel electrode 9 and the third interlayer insulating film 7
An alignment film 40 that controls the alignment of the liquid crystal molecules in the liquid crystal layer 50 when no voltage is applied is formed thereon.

On the other hand, the counter substrate 20 has a substrate body 20A.
On the liquid crystal layer 50 side of the data line 6a and the scanning line 3
a, in a region facing the formation region of the pixel switching TFT element 30, that is, in a region other than the opening region of each pixel portion, the incident light has a channel region 1a ′ of the semiconductor layer 1a of the pixel switching TFT device 30 or a low concentration source. Area 1
b, the second light-shielding film 23 is provided to prevent the light-shielding drain region 1c from penetrating. Furthermore, the second
On the liquid crystal layer 50 side of the substrate body 20A on which the light shielding film 23 is formed, a common electrode 21 made of ITO or the like is formed over almost the entire surface thereof, and on the liquid crystal layer 50 side, the liquid crystal when no voltage is applied. An alignment film 60 that controls the alignment of the liquid crystal molecules in the layer 50 is formed.

As described above, in this embodiment,
The structure of the alignment films 40 and 60 is particularly characteristic. Hereinafter, the structures of the alignment films 40 and 60 and the method of forming the alignment films will be described with reference to FIG. 4 is an enlarged partial cross-sectional view of the alignment film 40 (60), and the upper side in the figure is the side in contact with the liquid crystal layer 50. Further, in the present embodiment, the alignment film 40 on the TFT array substrate 10 side and the alignment film 60 on the counter substrate 20 side have the same structure.

As shown in FIG. 4, the alignment film 40 (60)
Is the inorganic alignment film layer 4 located on the side opposite to the liquid crystal layer 50 side.
1 and an alignment film 40 (6) formed on the inorganic alignment film layer 41.
0) and the organic alignment film layer 42 located on the liquid crystal layer 50 side. In this embodiment, the inorganic alignment film layer 41 is an oblique vapor deposition film of silicon oxide, and has a structure in which columnar structures are aligned in a predetermined direction. Further, the organic alignment film layer 42 is a polymer film in which a thin film of an acrylic monomer (including a methacrylic monomer) is formed by an ion deposition method in the present embodiment, and specifically, the following general formula (1), Monomers capable of forming a liquid crystal phase shown in (2), (3) and (4), or a monomer that does not lose its liquid crystal state by addition to its own liquid crystal phase, or a long chain alkyl acrylic monomer (long chain alkyl). It is a polymer film in which a methacrylic monomer) is deposited by ion deposition to form a polymer.

[0046]

[Chemical 8]

[0047]

[Chemical 9]

[0048]

[Chemical 10]

[0049]

[Chemical 11]

In this embodiment, the organic alignment film layer 42 is formed along the surface alignment of the inorganic alignment film layer 41, and the organic alignment film layer 42 further comprises molecules of the organic molecules constituting the liquid crystal molecules of the liquid crystal layer 50. It has a liquid crystal orientation control function due to the interaction between them. In addition, since the organic alignment film layer 42 is mainly composed of a polymer compound obtained by polymerizing the monomers represented by the general formulas (1) to (4), Si
The hygroscopicity is smaller than that of the inorganic alignment film layer 41 mainly composed of O.

The method of forming the alignment film 40 (60) as described above includes an inorganic alignment film layer forming step and an organic alignment film layer forming step performed thereafter. Specifically, a light-shielding film, a first interlayer insulating film, a semiconductor layer, a channel region, a low-concentration source region, a low-concentration drain region, a high-concentration source region, a high-concentration drain region, a storage capacitor on a transparent substrate made of quartz or the like. A pre-substrate on which electrodes, insulating thin films, scanning lines, capacitance lines, second interlayer insulating films, data lines, third interlayer insulating films, contact holes, pixel electrodes, etc. are formed by a method similar to the conventional method (for example, photolithography method). To prepare.
Then, on the surface of the pre-substrate on which these pixel electrodes and the like are formed, silicon oxide as an inorganic vapor deposition material is obliquely vapor-deposited from a predetermined direction by using the oblique vapor deposition apparatus 300 shown in FIG. 6 (inorganic alignment film layer formation Process). Then, an organic alignment film is further formed on the inorganic alignment film of silicon oxide thus formed by using the ion deposition apparatus 100 shown in FIG. 5 (organic alignment film forming step).

FIG. 6 is an explanatory view schematically showing the outer appearance of the oblique vapor deposition apparatus 300 used for forming the above-mentioned inorganic alignment film. The vapor deposition apparatus 300 includes a vapor deposition source 302 for producing vapor of silicon oxide and an opening 303 through which vapor of silicon oxide can flow.
A vapor deposition chamber 308 and a vapor deposition chamber 308 each including a vapor circulation unit 303 including a and a substrate placement unit 307 that places the pre-substrate 200 at a predetermined angle with respect to the vapor deposition source 302.
A vacuum pump 310 for evacuating

The vapor deposition method in this case is as follows.
First, when the vacuum pump 310 is operated, the vapor deposition chamber 308
Is evacuated, and the evaporation source 3 is heated by a heating device (not shown).
When 02 is heated, vapor of silicon oxide is generated from the vapor deposition source 302. The vapor stream of silicon oxide generated from the vapor deposition source 302 passes through the opening 303a and is vapor-deposited on the surface of the pre-substrate 200 at a predetermined angle (vapor deposition angle).

In this embodiment, the organic vapor deposition film layer 4 is also used.
2 is formed by the ion vapor deposition method. Figure 5
3 schematically shows the structure of the ion deposition apparatus 100. The ion vapor deposition apparatus 100 is provided with a vapor deposition chamber 101 that is connected to a vacuum pump and can bring the inside into a decompressed state (vacuum state). A vapor deposition material container 102 containing a vapor deposition material 201 such as an acrylic monomer represented by the general formulas (1) to (4) shown is provided, and the above-mentioned inorganic alignment film is formed above the container 102. It is configured such that the pre-substrate 200 can be installed. It should be noted that the pre-substrate 200 is installed so that the side on which the inorganic alignment film is formed faces the container 102 side.

The vapor deposition material 201 in the vapor deposition material container 102 is heated to evaporate (volatilize), the vaporized vapor deposition material 201 is guided upward in the drawing, and when passing through the ionization section 103, a part of the vapor deposition material 201 is ionized. To be done. An electric field is applied between the ionization section 103 and the deposition target substrate 200, and the ionized deposition material 201 is configured to be accelerated by the electric field and deposited on the deposition target substrate 200. In the ionization unit 103, the vapor deposition material 201
The vapor deposition material 201 can be ionized by applying a voltage to.

That is, the ion deposition method uses the deposition material 20.
1 is vaporized, and then partially ionized, and the ionized vapor deposition material 201 is accelerated to deposit it on the pre-substrate 200. According to this method, the pre-substrate 200 of the vapor deposition material 201 (specifically, the inorganic alignment film layer on the pre-substrate 200) is controlled by controlling the ionization conditions in the ionization section 103 and the acceleration conditions of the ionized vapor deposition material 201. Since it is possible to control the vapor deposition on the substrate, it is easier to control the vapor deposition conditions of the vapor deposition material 201 on the substrate 200 to be vapor-deposited, as compared with other vapor deposition methods. As described above, in the ion vapor deposition method, the vapor deposition conditions can be easily controlled, so that the organic vapor deposition film can be formed along the surface alignment of the inorganic alignment film layer.

Here, as the vapor deposition material, the above chemical formulas 1 to 1 are used.
After using the acrylic monomers represented by the general formulas (1) to (4) shown in 1 and evaporating the acrylic monomers,
Partially ionized and ionized monomers are deposited on the inorganic alignment film layer. Since the ionized monomer has high activity, the polymerization reaction of the monomer deposited on the inorganic alignment film layer spontaneously proceeds to polymerize, and the monomer represented by the general formulas (1) to (4) is polymerized. An organic alignment film mainly composed of a polymer is formed.

The acrylic monomers represented by the general formulas (1) to (3) shown in the chemical formulas 8 to 10 have a liquid crystallinity which shows a liquid crystal phase or does not lose the liquid crystal state when added to the liquid crystal phase. It is regarded as a monomer. These liquid crystalline monomers are polymerized by vapor deposition while aligning along the surface alignment of the inorganic alignment film layer, so that the organic alignment film 42 can be formed along the surface alignment of the inorganic alignment film layer. Therefore, since the alignment property of the organic polymer forming the organic alignment film layer to be formed can be made higher than that in the case of using a monomer having no liquid crystallinity, the organic polymer forming the organic alignment film layer is formed. It is possible to further enhance the intermolecular interaction between the liquid crystal molecules and the liquid crystal molecules, and to form an organic alignment film layer having an excellent liquid crystal alignment control function.

Specific examples of the compound represented by the general formula (1) shown in the chemical formula 8 above include compounds M1 to M25 (UV cureable liquid crystal of Rodic Co., Ltd.) shown in Table 1 or Table 2. Can be illustrated. Further, as the compound represented by the general formula (2) shown in Chemical formula 9 above,
Specifically, compounds M26 to M3 shown in Table 3 or Table 5
3, M38 to M45 and the like can be exemplified. Examples of the compound represented by the general formula (3) shown in Chemical formula 10 above include
Specifically, compounds M34 to M3 shown in Table 4 or Table 6
7, M46 to M51 and the like can be exemplified.

[0060]

[Table 1]

[0061]

[Table 2]

[0062]

[Table 3]

[0063]

[Table 4]

[0064]

[Table 5]

[0065]

[Table 6]

As described above, in the present embodiment, the alignment film 4
0, 60 on the inorganic alignment film layer 41, and the organic alignment film layer 42 having lower hygroscopicity than the inorganic alignment film, the inorganic alignment film layer 4
1 was formed along the surface orientation. Such an alignment film 4
0 and 60 have low hygroscopicity, excellent stability to light and heat, and high durability. Therefore, the liquid crystal device of the present embodiment has excellent stability to light and heat and liquid crystal alignment ability (liquid crystal alignment). The orientation control function) can be maintained for a long period of time, and the hygroscopicity is low, and the function of preventing water from entering the liquid crystal layer is provided.

Further, in the structure including the pixel switching TFT element 30 as shown in FIG.
A step portion is formed on the surface of the electrode 9 corresponding to the formation position of, and when the inorganic alignment film layer 41 of the alignment film 40 is formed, a portion is shaded in the step portion from the oblique deposition direction, Deposition unevenness or deposition failure may occur in the shaded portion. However, in the present embodiment, since the inorganic alignment film layer 41 is formed by the oblique vapor deposition method, the organic alignment film layer 42 is formed on the inorganic alignment film layer 41 without using the oblique vapor deposition. Even in the shaded area, the liquid crystal molecules are reliably aligned based on the alignment ability of the organic alignment film layer 42. Therefore, by applying the alignment film 40 of the present invention to an active matrix type liquid crystal device, liquid crystal alignment defects are less likely to occur, and the reliability of the liquid crystal device can be improved.

Further, in the present embodiment, the alignment films 40 and 60 of both the TFT array substrate 10 and the counter substrate 20 have the above-mentioned structure, but the present invention is not limited to this, and at least one of the substrates. With the above-mentioned configuration of the alignment film of No. 3, it is possible to provide a liquid crystal device having more excellent durability. However, it goes without saying that a liquid crystal device having more excellent durability can be provided by making the alignment films of both substrates have the above-described configurations.

Further, in the present embodiment, only the active matrix type liquid crystal device using the TFT element is explained, but the present invention is not limited to this, and the TFD is not limited to this.
It is also applicable to an active matrix type liquid crystal device using a (Thin-Film Diode) element, a passive matrix type liquid crystal device, and the like. Further, although only the transmissive liquid crystal device has been described in the present embodiment, the present invention is not limited to this, and is applicable to a reflective liquid crystal device or a transflective liquid crystal device. As described above, the present invention can be applied to a liquid crystal device having any structure.

Further, in the present embodiment, the organic polymer film is formed by the ion vapor deposition method using the above acrylic monomer as the vapor deposition material, and the organic alignment film formed is formed because the polymerization is advanced on the inorganic alignment film layer 41. It is possible to increase the molecular weight of the polymer forming the film 42. The higher the molecular weight of a polymer, the more stable it is to light and heat. Therefore, by adopting the ion vapor deposition method using the above acrylic monomer as a vapor deposition material, the organic alignment film layer is superior in stability to light and heat. 42 can be formed.

Next, in this embodiment, an acrylic monomer is used as a vapor deposition material, and this is polymerized by an ion vapor deposition method to form an organic alignment film. However, an organic polymer can be directly vapor deposited. In this case, if the molecular weight of the organic polymer becomes large, vapor deposition becomes difficult. Therefore, the molecular weight of the polymer forming the organic alignment film layer 42 to be formed is preferably about several thousand, specifically about 2000 to 10,000. Examples of such organic polymers include polystyrene, polyethylene (hereinafter abbreviated as “PE”), polytetrafluoroethylene (hereinafter abbreviated as “PTFE”), and other fluorine-based polymers. it can. Fluorine-based polymers are particularly preferable because they have high crystallinity and excellent stability against light and heat.

As shown in FIG. 7, PTFE and PE
In the vapor deposition of, the orientation direction is different. As shown in FIG. 7A, in the vapor deposition of PTFE, PTF is formed on the columnar structure of the inorganic alignment film layer 41 formed on the pre-substrate 200.
The organic alignment film 42 of E is arranged in parallel in the in-plane direction of the film along the alignment of the columnar structure. In this way, the substrate 1 on which the alignment film 40 including the PTFE organic alignment film 42 in the surface layer is formed
0 and the opposing substrate 20 sandwich the liquid crystal layer 50, the liquid crystal molecules of the liquid crystal layer 50 become the organic alignment film 4 of PTFE.
It is oriented parallel to the in-plane direction of the film along the orientation direction of 2.

On the other hand, as shown in FIG. 7B, in the PE vapor deposition, the inorganic alignment film layer 4 formed on the pre-substrate 200 is used.
On one columnar structure, the PE organic alignment film 42 is arranged vertically in the in-plane direction along the alignment of the columnar structure. Thus, the alignment film 40 including the organic alignment film 42 of PE in the surface layer
When the liquid crystal layer 50 is sandwiched between the substrate 10 on which the film is formed and the opposing substrate 20, the liquid crystal molecules of the liquid crystal layer 50 are
The organic alignment film 42 is aligned perpendicularly to the in-plane direction of the film.

As described above, the vapor deposition of PTFE and PE have different orientation directions, and particularly PE is oriented perpendicular to the in-plane direction of the film. In order to obtain such an alignment film that is vertically aligned in the in-plane direction, in the conventional alignment film formed only by an inorganic oblique deposition film of silicon oxide or the like, for example, when performing oblique deposition, rotary oblique deposition is performed. It is necessary to adopt such a complicated method. Further, it was possible to form an alignment film which is vertically aligned by an organic alignment film such as vertical polyimide, but in this case, there may occur a problem of deterioration due to light or heat. However, in the case of the present embodiment, it is possible to easily obtain an alignment film which is vertically aligned by forming a vapor deposition film of PE on the inorganic alignment film.

[Projection Display Device] Next, the configuration of a projection display device equipped with the liquid crystal device of the above embodiment as a light modulator will be described with reference to FIG. FIG. 8 is a schematic configuration diagram showing a main part of a projection type display device using the liquid crystal device of the above embodiment as a light modulation device. In FIG. 8, 8
10 is a light source, 813 and 814 are dichroic mirrors,
Reference numerals 815, 816, and 817 are reflection mirrors, 818 is an entrance lens, 819 is a relay lens, 820 is an exit lens, and 8
Reference numerals 22, 823 and 824 denote liquid crystal light modulators, 825 denotes a cross dichroic prism, and 826 denotes a projection lens.

The light source 810 is a lamp 8 such as a metal halide.
11 and a reflector 812 that reflects the light of the lamp. Dichroic mirror 813 that reflects blue light and green light
Transmits the red light of the light flux from the light source 810 and reflects the blue light and the green light. The transmitted red light is reflected by the reflection mirror 817, and the liquid crystal light modulation device 822 for red light including the above-described liquid crystal device as an example of the present invention is provided.
Is incident on. On the other hand, the green light of the color light reflected by the dichroic mirror 813 is reflected by the green light reflecting dichroic mirror 814 and is incident on the liquid crystal light modulator for green light 823 including the above-described liquid crystal device as an example of the present invention. . The blue light also passes through the second dichroic mirror 814. In order to compensate for the difference in the optical path length between blue light and green light or red light, the incident lens 8
18, a relay lens 819, and a light guide means 821 including a relay lens system including an emission lens 820, via which a blue light is provided, and a blue light liquid crystal light modulator including the above-described liquid crystal device according to an example of the present invention is provided. It is incident on 824. The liquid crystal light modulators 822, 823, and 824 for each color are
Incident side polarization means 822a, 823a, 8
24a and output side polarization means 822b, 823b, 824
b is a liquid crystal light valve including a liquid crystal device arranged between them.

The three color lights modulated by the respective light modulators enter the cross dichroic prism 825. This prism is formed by laminating four right-angled prisms, and a dielectric multilayer film that reflects red light and a dielectric multilayer film that reflects blue light are formed in a cross shape on the inner surface thereof. Three color lights are combined by these dielectric multilayer films to form light representing a color image. The combined light is projected on the screen 827 by the projection lens 826 which is a projection optical system, and the image is enlarged and displayed.

The projection type display device having the above structure is provided with the above-mentioned liquid crystal device as an example of the present invention.
The display device has excellent durability against light and heat and can maintain display quality for a long period of time.

[0079]

EXAMPLES Next, examples according to the present invention and comparative examples will be described. Example 1 First, on a glass substrate (pre-substrate) on which necessary elements other than an alignment film such as electrodes and TFT elements are formed, and on a counter substrate, an oblique vapor deposition apparatus 300 shown in FIG.
An oblique evaporation film of iO was formed. Specifically, an oblique vapor deposition film of SiO 2 having a film thickness of about 20 nm is formed in a direction inclined by 60 ° from the vertical direction of these substrates, and thereafter, the direction of the vapor deposition beam is changed by 90 ° to obtain 80 ° from the vertical direction of the substrate. From the tilted direction, also deposit a SiO vapor-deposited film with a thickness of about 0.3n.
m formed. Subsequently, a number average molecular weight of 20 as a vapor deposition material is formed on the surface of such a SiO oblique vapor deposition film (inorganic alignment film).
Vapor deposition was performed using PTFE of No. 00 to form a PTFE film (organic alignment film) having a film thickness of about 50 nm.

After the two substrates thus formed are adhered to each other with a cell gap of 5 μm, a fluorine-based liquid crystal is injected between the substrates to seal them, and the active matrix type transmissive liquid crystal device of the present invention is manufactured. did. Note that the two substrates were attached by shifting each by 90 ° with respect to the direction of the second oblique SiO vapor deposition, to fabricate a TN (Twisted Nematic) mode liquid crystal display device.

(Embodiment 2) As in Embodiment 1, electrodes and T
A diagonal vapor deposition film of SiO was formed using a diagonal vapor deposition apparatus 300 shown in FIG. 6 on a glass substrate (pre-substrate) on which necessary elements other than an alignment film such as an FT element were formed, and a counter substrate. Subsequently, the SiO oblique vapor deposition film (inorganic alignment film) created
PE with a number average molecular weight of 2000 as a vapor deposition material on the surface of
Was used to form an organic alignment film (PE film) having a thickness of about 50 nm. Using the two substrates thus formed, a liquid crystal layer was sandwiched in the same manner as in Example 1 to produce a vertical alignment type liquid crystal display device.

(Third Embodiment) Similar to the first embodiment, electrodes and T
A diagonal vapor deposition film of SiO was formed using a diagonal vapor deposition apparatus 300 shown in FIG. 6 on a glass substrate (pre-substrate) on which necessary elements other than an alignment film such as an FT element were formed, and a counter substrate. Subsequently, the SiO oblique vapor deposition film (inorganic alignment film) created
On the surface of the above, vapor-deposited biphenyl-4,4′-dimethacrylate shown in M34 of Table 4 was used to perform vapor deposition by an ion vapor deposition method to form a polymerized organic alignment film having a thickness of about 50 nm. Using the two substrates thus formed, a TN mode liquid crystal display device was manufactured in the same manner as in Example 1.

(Comparative Example) Similar to Example 1, electrodes and TF were used.
An oblique vapor deposition film of SiO was formed on a glass substrate (pre-substrate) on which necessary elements other than an alignment film such as a T element were formed and a counter substrate by using an oblique vapor deposition device 300 shown in FIG.
Then, Example 1 was repeated except that the organic vapor deposition film was not formed.
A TN mode liquid crystal display device was produced in the same manner as in.

(Durability Test) The durability test of the liquid crystal device obtained in each of the examples and the conventional example was conducted as follows. The applied voltage (V) and the light transmittance (T) when the liquid crystal device obtained in each of the examples and the conventional example is irradiated with visible light having a luminous flux density of 40 lm / mm ² at a temperature of 60 ° C. The relationship between them, that is, the V / T curve was measured over time, and the durability time until the light transmittance significantly changed when the applied voltage was low and the V / T curve significantly changed was measured.

(Evaluation Results) The durability times of the liquid crystal devices obtained in Examples 1 to 3 are about twice as long as the durability times of the liquid crystal devices obtained in the conventional examples, respectively. For example, it was found that the durability of the alignment film can be significantly improved by forming the organic vapor deposition film on the inorganic alignment film. In addition, the display characteristics of the liquid crystal devices obtained in Examples 1 to 3 are almost the same as those of the liquid crystal devices obtained in the conventional example, or it is confirmed that the contrast is improved, and the alignment film of this embodiment has sufficient liquid crystal alignment control. It turned out to have the function.

[0086]

As described above in detail, according to the present invention, an alignment film capable of maintaining the alignment control function for a long period of time, excellent in durability and high in the alignment control function, and the formation thereof. A method can be provided. Further, by providing the alignment film of the present invention, it is possible to provide a liquid crystal device which is excellent in durability and hardly causes liquid crystal alignment defects. Further, by providing the liquid crystal device of the present invention, it is possible to provide a projection display device having excellent durability and display characteristics.

[Brief description of drawings]

FIG. 1 is an equivalent circuit diagram of a switching element, a signal line, and the like in a liquid crystal device that is an embodiment of the present invention.

FIG. 2 is a plan view showing the structure of a plurality of pixel groups adjacent to each other on the TFT array substrate of the liquid crystal device of FIG.

FIG. 3 is a cross-sectional view showing a structure of a main part of the liquid crystal device of FIG.

FIG. 4 is an enlarged cross-sectional view showing a structure of an alignment film provided in the liquid crystal device of FIG.

FIG. 5 is a diagram schematically showing a configuration of an ionization vapor deposition device.

FIG. 6 is a diagram schematically showing the configuration of an oblique vapor deposition apparatus.

FIG. 7 is a diagram schematically showing an orientation mode of an organic polymer film.

FIG. 8 is a diagram showing an example of a projection type display device including the liquid crystal device of the above embodiment.

[Explanation of symbols]

10 TFT array substrate 20 Counter substrate 10A, 20A Substrate body 30 Pixel switching TFT element 50 liquid crystal layer 40,60 Alignment film 41 Inorganic alignment film layer 42 organic alignment layer

─────────────────────────────────────────────────── ─── Continuation of front page (51) Int.Cl. ⁷ Identification code FI theme code (reference) G02F 1/1337 520 G02F 1/1337 520 F term (reference) 2H090 HB03Y HB07Y HB15Y HB19Y HC05 HC15 HC17 HC18 JB02 4F100 AA01A AA20A AG00 AK01B AK03B AK17B AK18 AK25B BA02 BA03 EH66A EH66B EH662 GB41 JA11B JA20A JA20B JD15B JL00 4J100 AL03P AL04P AL05P AL08P AL66P AT08P BA04P BA20P BA40P BB01P BB07P BC04P BC43P BC44P BC73P CA01 JA32 4K029 AA08 AA09 BA46 BA62 BB02 BB07 BC08 BD00 CA01 CA15

Claims (13)

[Claims] 1. In an alignment film capable of controlling the alignment of target molecules, an organic alignment film having a smaller hygroscopicity than the inorganic alignment film and capable of aligning the target molecules is formed on the inorganic alignment film. An alignment film having the above structure. 2. The alignment film according to claim 1, wherein the inorganic alignment film is an inorganic vapor deposition film mainly composed of silicon oxide. 3. The alignment film according to claim 1, wherein the organic alignment film is an organic vapor deposition film formed on the inorganic alignment film by vapor deposition. 4. The alignment film according to claim 1, wherein the organic alignment film is mainly composed of a crystalline fluorine-containing polymer. 5. The alignment film according to claim 1, wherein the organic alignment film is mainly composed of polyolefin. 6. The organic alignment film according to claim 1, wherein the organic alignment film is mainly composed of a liquid crystal monomer-derived polymer obtained by polymerizing a liquid crystal monomer. Alignment film. 7. The liquid crystalline monomer is mainly composed of one or more compounds represented by any one of the following general formulas (1), (2) and (3). The alignment film according to claim 6. [Chemical 1] [Chemical 2] [Chemical 3] 8. The alignment film according to claim 1, wherein the organic alignment film is mainly composed of polyalkyl acrylate or polyalkyl methacrylate. 9. The method for forming an alignment film according to claim 1, wherein the inorganic alignment film is formed on the inorganic alignment film, and the target molecule is aligned on the inorganic alignment film. And a step of forming an organic alignment film capable of forming the organic alignment film, wherein the organic alignment film is formed by a vapor deposition method in the organic alignment film forming step. 10. The method for forming an alignment film according to claim 9, wherein, in the step of forming the inorganic alignment film, the inorganic alignment film is formed by an oblique vapor deposition method. 11. The method for forming an alignment film according to claim 9, wherein in the organic alignment film forming step, the organic alignment film is formed by an ion deposition method. 12. A liquid crystal device having a configuration in which a liquid crystal layer is sandwiched between a pair of substrates facing each other, wherein at least one of the pair of substrates has an outermost surface on the liquid crystal layer side. 9. A liquid crystal device comprising the alignment film according to any one of items 8. 13. A light source, a light modulation means comprising the liquid crystal device according to claim 12 for modulating the light from said light source, and a projection means for projecting the light modulated by said light modulation means. A projection type display device characterized by.