JP2003163410A - Method of coating end face of semiconductor laser - Google Patents

Method of coating end face of semiconductor laser

Info

Publication number
JP2003163410A
JP2003163410A JP2001359462A JP2001359462A JP2003163410A JP 2003163410 A JP2003163410 A JP 2003163410A JP 2001359462 A JP2001359462 A JP 2001359462A JP 2001359462 A JP2001359462 A JP 2001359462A JP 2003163410 A JP2003163410 A JP 2003163410A
Authority
JP
Japan
Prior art keywords
semiconductor laser
spacer
laser bar
coating
face
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2001359462A
Other languages
Japanese (ja)
Inventor
Daigo Morioka
大悟 森岡
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Renesas Semiconductor Manufacturing Co Ltd
Kansai Nippon Electric Co Ltd
Original Assignee
Renesas Semiconductor Manufacturing Co Ltd
Kansai Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Renesas Semiconductor Manufacturing Co Ltd, Kansai Nippon Electric Co Ltd filed Critical Renesas Semiconductor Manufacturing Co Ltd
Priority to JP2001359462A priority Critical patent/JP2003163410A/en
Publication of JP2003163410A publication Critical patent/JP2003163410A/en
Pending legal-status Critical Current

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  • Semiconductor Lasers (AREA)

Abstract

<P>PROBLEM TO BE SOLVED: To provide a method of coating end face of semiconductor laser which does not result in the fear for generation of flaws and cracks, by improving workability and reducing mechanical stress to be applied on a semiconductor laser bar during the work to isolate the semiconductor laser bar and spacer after the coating of an optical thin film at the end surface of semiconductor laser bar. <P>SOLUTION: In the method of coating the end face of a semiconductor laser wherein a spacer 101 is inserted between the semiconductor laser bars 1, the predetermined optical thin film is formed between the light emitting surface 2a and the rear surface of light emitting surface. Thereafter, the semiconductor laser bar 101 is isolated from the spacer 101, a groove 102 which is opened to the external side is provided to the spacer 101 under the condition that the spacer 101, and semiconductor laser bar 1 are set in contact with each other. <P>COPYRIGHT: (C)2003,JPO

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【発明の属する技術分野】本発明は、半導体レーザバー
とスペーサとを交互に重ねて配列し、半導体レーザの端
面(発光面及び発光背面)に光学薄膜を形成する方法に
関し、特に、光学薄膜形成後の半導体レーザバーとスペ
ーサとの分離作業を容易にする半導体レーザの端面コー
ティング方法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for forming an optical thin film on an end surface (a light emitting surface and a light emitting rear surface) of a semiconductor laser by alternately arranging semiconductor laser bars and spacers, and particularly, after forming the optical thin film. And a method for coating an end face of a semiconductor laser, which facilitates the work of separating the semiconductor laser bar from the spacer.

【0002】[0002]

【従来の技術】半導体レーザにおいては、光出射面を酸
化から保護するためや反射率制御のために端面に光学薄
膜を形成することが一般に実施される。通常、これは半
導体レーザ素子が一列に連なった半導体レーザバーの状
態で、蒸着やスパッタリング法を用いて形成されるが、
このとき半導体レーザバー同士を直接重ねて並べると、
隣接する半導体レーザバーの高さの差や、並べるときに
生じる若干の段差によって、高い方の半導体レーザバー
の陰になる低い方の半導体レーザバーの端面には均一な
光学薄膜が形成されないという問題があり、半導体レー
ザバー同士を直接重ねるのではなく、半導体レーザバー
の間に半導体レーザバーよりも高さが低いスペーサを介
挿して、すべての半導体レーザバーの端面が両側のスペ
ーサより飛び出す格好にして端面コーティングがなされ
る。また、このスペーサは、半導体レーザバーの電極面
に不所望な光学薄膜が付着することを防止する被覆材と
しての役目も兼ねており、高さは電極の所定の領域を覆
う高さでなければならない。また、材質としては、例え
ばシリコン、金属、セラミックなどが用いられる。
2. Description of the Related Art In a semiconductor laser, it is generally practiced to form an optical thin film on the end face in order to protect the light emitting face from oxidation and to control the reflectance. Normally, this is a semiconductor laser bar in which semiconductor laser elements are arranged in a row, and is formed by vapor deposition or sputtering.
At this time, when the semiconductor laser bars are directly stacked and arranged,
There is a problem that a uniform optical thin film is not formed on the end surface of the lower semiconductor laser bar that is behind the higher semiconductor laser bar due to a difference in height between adjacent semiconductor laser bars or a slight step generated when the semiconductor laser bars are arranged. Instead of directly stacking the semiconductor laser bars on each other, spacers having a height lower than that of the semiconductor laser bars are inserted between the semiconductor laser bars so that the end surfaces of all the semiconductor laser bars are projected from the spacers on both sides so that the end surface coating is performed. Further, this spacer also serves as a covering material for preventing undesired optical thin film from adhering to the electrode surface of the semiconductor laser bar, and the height must be a height that covers a predetermined area of the electrode. . Further, as the material, for example, silicon, metal, ceramic or the like is used.

【0003】従来の端面コーティング方法の一例を斜視
図として示す図3を用いて説明する。半導体レーザバー
1は、相対向する発光面2a及び発光背面2bと、相対
向する2つの電極面3a,3bとを有する略直方体の半
導体レーザ素子が、これらの4つの面2a,2b,3
a,3b以外の面で一列に連なっている。例えば、半導
体レーザ素子が約40個から60個連なったもので、図
中の高さH2は約500μm、長さL1は約10mm程
度であり、非常に細長い形状を成している。
An example of a conventional end face coating method will be described with reference to FIG. 3 showing a perspective view. The semiconductor laser bar 1 has a substantially rectangular parallelepiped semiconductor laser element having a light emitting surface 2a and a light emitting back surface 2b facing each other, and two electrode surfaces 3a, 3b facing each other, and these four surfaces 2a, 2b, 3 are provided.
The surfaces other than a and 3b are arranged in a line. For example, the semiconductor laser element is composed of about 40 to 60 semiconductor laser elements, and the height H2 in the figure is about 500 μm and the length L1 is about 10 mm, which is a very elongated shape.

【0004】この半導体レーザバー1の発光面2a及び
発光背面2bに、それぞれ異なる反射率の光学薄膜を形
成する方法は、先ず、半導体レーザバー1とスペーサ4
とを発光面2a(または、発光背面2bでもよい)をす
べて上向きに揃えて交互に重ねて配列し、半導体レーザ
バー1の電極面3a,3bをスペーサ4の側面4aで被
覆する。ここで、スペーサの高さH1(例えば約480
μm)は、電極面3a,3bの所定の領域を被覆する高
さであるとともに、半導体レーザバー1の高さH2(例
えば約500μm)よりも低く、交互に配列した状態で
各半導体レーザバー1の発光面2aはスペーサ4よりも
飛び出す格好になり完全に露呈し均一な光学薄膜の形成
ができる。また、スペーサ4の長さL1(例えば約15
mm)は、半導体レーザバー1の長さL2(例えば約1
0mm)よりも長く、十分に電極面3a,3bを被覆で
き電極面3a,3bに光学薄膜材料が付着することを防
止できる。通常、この配列作業は作業者がピンセット
(図示せず)などを用いて手作業で実施するが、半導体
レーザバー1やスペーサ4は小さくて細長いため取扱い
が困難で習熟を要し、また、キズやクラックを生じさせ
ないように極力、半導体レーザバー1にストレスを加え
ない工夫が必要な作業であった。
In the method of forming optical thin films having different reflectances on the light emitting surface 2a and the light emitting back surface 2b of the semiconductor laser bar 1, first, the semiconductor laser bar 1 and the spacer 4 are formed.
And the light emitting surface 2a (or the light emitting back surface 2b) may be aligned in an upward direction so as to be alternately stacked, and the electrode surfaces 3a and 3b of the semiconductor laser bar 1 are covered with the side surface 4a of the spacer 4. Here, the height H1 of the spacer (for example, about 480
μm) is a height that covers a predetermined region of the electrode surfaces 3a and 3b, and is lower than the height H2 (for example, about 500 μm) of the semiconductor laser bars 1, and the semiconductor laser bars 1 emit light in an alternately arranged state. The surface 2a becomes more protruding than the spacer 4 and is completely exposed to form a uniform optical thin film. Further, the length L1 of the spacer 4 (for example, about 15
mm is the length L2 of the semiconductor laser bar 1 (for example, about 1).
0 mm), the electrode surfaces 3a and 3b can be sufficiently covered, and the optical thin film material can be prevented from adhering to the electrode surfaces 3a and 3b. Normally, this arrangement work is performed manually by an operator using tweezers (not shown) or the like, but the semiconductor laser bar 1 and the spacer 4 are small and long and slender, so they are difficult to handle and require proficiency. It was a work that required devising that stress was not applied to the semiconductor laser bar 1 as much as possible so as not to cause cracks.

【0005】次に、この配列された半導体レーザバー1
とスペーサ4とを固定用治具5上に、発光面2aが上向
きになるように載置し、例えばコイルバネ6の圧縮力な
どを利用したスライド式の押え部7で押えつけて固定す
る。次に、このセットが完了した固定用治具5をスパッ
タ装置(図示せず)に入れ、スパッタリングし発光面2
aに所定の光学薄膜のコーティングを行う。コーティン
グが完了したら、固定用治具5をスパッタ装置(図示せ
ず)から取出し、スライド式の押え部7を緩め、半導体
レーザバー1とスペーサ4とを交互に重ねた状態のまま
ピンセット(図示せず)などで発光背面3b(コーティ
ング未了面)が上向きになるように固定用治具5上で反
転させる。このとき、固定用治具5側の半導体レーザバ
ー1とスペーサ4の面は不揃いとなっているため、半導
体レーザバー1の下面(コーティング完了面)及びスペ
ーサ4の下面が固定用治具5にしっかり密着するように
押えて高さを揃え直してやる。この反転作業と高さ揃え
作業とが完了したら、再びスライド式の押え部7で押え
つけて固定する。こうすることで、発光背面2b(コー
ティング未了面)はスペーサ4よりも飛び出す格好にな
り完全に露呈し均一な光学薄膜の形成ができる。次に、
このセットが完了した固定用治具5をスパッタ装置(図
示せず)に入れ、発光背面2b(コーティング未了面)
に所定の光学薄膜のコーティングを行う。コーティング
が完了したら、固定用治具5をスパッタ装置(図示せ
ず)から取出し、スライド式の押え部7を緩め、半導体
レーザバー1とスペーサ4とを交互に重ねたままの状態
で固定用治具5から離脱して、半導体レーザバー1とス
ペーサ4とを分離し端面コーティング作業が完了する。
尚、上記では発光面2aを先にコーティングし、その
後、反転させ発光背面2bをコーティングする順で説明
したが、この順は反対であってもよい。
Next, this arrayed semiconductor laser bar 1
The spacer 4 and the spacer 4 are placed on the fixing jig 5 so that the light emitting surface 2a faces upward, and are fixed by being pressed by the slide-type pressing portion 7 utilizing the compressive force of the coil spring 6, for example. Next, the fixture 5 for which this setting is completed is put into a sputtering device (not shown), and is sputtered to emit light.
A predetermined optical thin film is coated on a. After the coating is completed, the fixing jig 5 is taken out from the sputter device (not shown), the slide type holding part 7 is loosened, and the semiconductor laser bar 1 and the spacer 4 are alternately piled up with tweezers (not shown). ) Or the like, the light emitting back surface 3b (uncoated surface) is turned upside down on the fixing jig 5. At this time, since the surfaces of the semiconductor laser bar 1 and the spacer 4 on the fixing jig 5 side are not aligned, the lower surface (coating completion surface) of the semiconductor laser bar 1 and the lower surface of the spacer 4 firmly adhere to the fixing jig 5. Hold it down and adjust the heights. When the reversing work and the height aligning work are completed, the work is fixed again by pressing with the slide-type pressing portion 7. By doing so, the light emitting back surface 2b (uncoated surface) becomes more protruding than the spacer 4 and is completely exposed, and a uniform optical thin film can be formed. next,
The fixture 5 for which this setting has been completed is put into a sputtering device (not shown), and the light emitting back surface 2b (uncoated surface)
Then, a predetermined optical thin film is coated. After the coating is completed, the fixing jig 5 is taken out from the sputtering device (not shown), the slide type holding portion 7 is loosened, and the semiconductor laser bar 1 and the spacer 4 are alternately piled up. 5, the semiconductor laser bar 1 and the spacer 4 are separated, and the end face coating operation is completed.
In the above description, the light emitting surface 2a is first coated, and then the light emitting surface 2a is inverted and the light emitting rear surface 2b is coated. However, this order may be reversed.

【0006】ここで、スペーサ4の側面4aは、スパッ
タリングのときに光学薄膜材料が半導体レーザバー1と
の隙間から侵入しないように、また、接触する電極面3
a,3bに擦りキズを付けたりしないように、平面度の
高い鏡面となっている。ところが、このため半導体レー
ザバー1とスペーサ4とは互いに鏡面同士で密着するこ
とになり、また、固定用治具5上でコイルバネ6の圧力
で押付けられているため、両者間にファンデルワールス
力による密着力を生じ、固定用治具5から離脱しただけ
では容易に分離できなくなっているものがあった。この
ような場合、作業者は、ピンセット(図示せず)や粘着
シート(図示せず)を利用して、密着した一方を粘着シ
ート(図示せず)に貼付けて固定し、他方をピックアッ
プするなどの方法で両者を分離しなければならず神経を
使う繊細な作業を強いられることになっていた。また、
ピンセット(図示せず)などで取扱う作業が増えるとわ
ずかながらも、機械的ストレスを加えることになり半導
体レーザバー1にキズやクラックを生じさせる虞があっ
た。
Here, the side surface 4a of the spacer 4 prevents the optical thin film material from entering through the gap with the semiconductor laser bar 1 during sputtering, and is in contact with the electrode surface 3.
The mirror surface has a high flatness so as not to scratch the a and 3b. However, because of this, the semiconductor laser bar 1 and the spacer 4 are in close contact with each other at their mirror surfaces, and because they are pressed against each other by the pressure of the coil spring 6 on the fixing jig 5, a van der Waals force is exerted between them. In some cases, an adhesive force was generated, and it was not possible to easily separate the fixing jig 5 by simply removing it. In such a case, the worker uses tweezers (not shown) or an adhesive sheet (not shown) to attach and fix one of the closely attached ones to the adhesive sheet (not shown) and pick up the other. It was necessary to separate the two by the method of, and the delicate work using nerves was forced. Also,
If the work of handling with tweezers (not shown) or the like increases, mechanical stress is applied to the semiconductor laser bar 1 although it is slight, which may cause scratches or cracks in the semiconductor laser bar 1.

【0007】[0007]

【発明が解決しようとする課題】本発明はかかる問題に
鑑みてなされたものであって、半導体レーザバーの両端
面を光学薄膜でコーティングした後、半導体レーザバー
とスペーサとを分離する作業において、作業性を改善す
るとともに、半導体レーザバーに加わる機械的ストレス
を低減しキズやクラックを生じさせる虞のない端面コー
ティング方法を提供することを目的とする。
SUMMARY OF THE INVENTION The present invention has been made in view of the above problems, and in the work of separating the semiconductor laser bar and the spacer after coating both end surfaces of the semiconductor laser bar with an optical thin film, workability is improved. It is an object of the present invention to provide an end face coating method that improves mechanical properties and reduces mechanical stress applied to a semiconductor laser bar, and that does not cause scratches or cracks.

【0008】[0008]

【課題を解決するための手段】本発明の半導体レーザの
端面コーティング方法は、半導体レーザバー間にスペー
サを介挿し、発光面及び発光背面に所定の光学薄膜を形
成した後、半導体レーザバーとスペーサとを分離する半
導体レーザの端面コーティング方法において、スペーサ
にスペーサと半導体レーザバーとを密着させた状態で外
部に開放された凹部を設けることを特徴とした半導体レ
ーザの端面コーティング方法である。
According to the method of coating an end surface of a semiconductor laser of the present invention, a spacer is inserted between semiconductor laser bars to form a predetermined optical thin film on a light emitting surface and a light emitting back surface, and then the semiconductor laser bar and the spacer are formed. In the method for coating the end face of a semiconductor laser, the end face coating method for a semiconductor laser is characterized in that a recess opened to the outside is provided in the spacer in a state where the spacer and the semiconductor laser bar are in close contact with each other.

【0009】[0009]

【発明の実施の形態】本発明の端面コーティング方法の
一例を斜視図として示す図1を用いて説明する。従来技
術と異なるところは、半導体レーザバー間に介挿するス
ペーサの形状に係る点であり、図3と同一部分には同一
符号を用いて説明を省略する。本発明の端面コーティン
グ方法に用いるスペーサ101は、スペーサ101の半
導体レーザバー1と重ねる側面101aにスペーサ10
1の長手方向に沿った両端開放の溝102を有してい
る。この溝102の短手方向の長さWはスペーサ101
の高さH1(例えば約480μm)の半分とし、深さ
は、特に限定しない。ここで、溝102の開口面積をス
ペーサが半導体レーザバーを被覆する面積の40%乃至
70%になるようにしておくとスペーサの機械的強度を
著しく劣化させることがない。スペーサ101は、側面
101aの溝102以外の部分で半導体レーザバー1と
密着し、半導体レーザバー1とスペーサ101との密着
面積及び密着強度は半減し、両者が分離しやすくなる。
このため、ピンセット(図示せず)や粘着シート(図示
せず)を用いて両者を強制的に分離しなくてもよく作業
性が改善されるとともに、半導体レーザバー1にキズや
クラックを生じさせる虞がない。また、両端が開放した
溝102であるため半導体レーザバー1と重ねた状態
で、溝102に空気を内包することがなくスパッタ装置
(図示せず)のチャンバ(図示せず)を真空にする際、
悪影響を及ぼす虞がない。
BEST MODE FOR CARRYING OUT THE INVENTION An example of an end face coating method of the present invention will be described with reference to FIG. 1 which is a perspective view. The difference from the prior art is the shape of the spacer inserted between the semiconductor laser bars, and the same parts as those in FIG. The spacer 101 used in the end face coating method of the present invention has a spacer 10 on the side surface 101 a of the spacer 101 which overlaps the semiconductor laser bar 1.
1 has a groove 102 whose both ends are open along the longitudinal direction. The length W of the groove 102 in the lateral direction is determined by the spacer 101.
Height H1 (for example, about 480 μm), and the depth is not particularly limited. Here, if the opening area of the groove 102 is set to 40% to 70% of the area where the spacer covers the semiconductor laser bar, the mechanical strength of the spacer is not significantly deteriorated. The spacer 101 is in close contact with the semiconductor laser bar 1 at portions other than the groove 102 on the side surface 101a, the contact area and contact strength between the semiconductor laser bar 1 and the spacer 101 are halved, and the two are easily separated.
For this reason, it is not necessary to forcibly separate the both by using tweezers (not shown) or an adhesive sheet (not shown), workability is improved, and there is a risk that the semiconductor laser bar 1 will be damaged or cracked. There is no. Further, since the groove 102 is open at both ends, when the chamber 102 (not shown) of the sputtering apparatus (not shown) is evacuated without enclosing air in the groove 102 in a state of being overlapped with the semiconductor laser bar 1,
There is no risk of adverse effects.

【0010】上記では、半導体レーザバー1とスペーサ
101との接触面積を減少させるために、スペーサ10
1の側面101aに両端開放の溝102を設ける構成で
説明したが、図2(a),(b)に他の構成のスペーサ
として、いずれか一端を閉塞した溝103、または、両
端を閉塞した溝104を設けた実施例を各々、斜視図と
して示す。この場合、両端開放の溝102を設ける構成
に比べてスペーサ101の機械的強度は向上する。溝1
03,104の開口の長手方向の長さL3,L4は半導
体レーザバー1の長さより長くして空気を内包しないよ
うにしておく。また、図2(c)に他の構成として、貫
通孔105を設けた実施例を斜視図として示す。この場
合も、貫通孔105の開口の長手方向の長さL5を半導
体レーザバー1の長さより長くし空気を内包しないよう
にしておく。
In the above, in order to reduce the contact area between the semiconductor laser bar 1 and the spacer 101, the spacer 10
Although the groove 102 with both ends open is provided on the side surface 101a of FIG. 1, one of the grooves 103 having one end closed, or the other end having both ends closed is used as a spacer having another structure in FIGS. 2A and 2B. Each of the embodiments provided with the groove 104 is shown as a perspective view. In this case, the mechanical strength of the spacer 101 is improved as compared with the structure in which the groove 102 with both ends open is provided. Groove 1
The lengths L3 and L4 of the openings 03 and 104 in the longitudinal direction are made longer than the length of the semiconductor laser bar 1 so that air is not contained therein. Further, FIG. 2C shows a perspective view of an embodiment in which a through hole 105 is provided as another configuration. In this case as well, the length L5 of the opening of the through hole 105 in the longitudinal direction is made longer than the length of the semiconductor laser bar 1 so as not to contain air.

【0011】[0011]

【発明の効果】本発明の端面コーティング方法による
と、半導体レーザバーとスペーサとの間にファンデルワ
ールス力による密着力が生じても、スペーサに凹部を設
けるため、密着面積及び密着強度を減少させることがで
き半導体レーザバーとスペーサとを容易に分離でき作業
性が改善されるとともにピンセットなどによる強制的な
分離作業を不要とするためキズやクラックの生じる虞が
減少する。また、凹部は半導体レーザバーとスペーサと
を重ねた状態で一部が開放されているため、凹部に空気
を内包することがなくスパッタリングのときの真空度に
悪影響を及ぼす虞がない。また、凹部の面積をスペーサ
が半導体レーザバーを被覆する面積の40%乃至70%
に選択するとスペーサの機械的強度を著しく劣化させる
ことなくかつ、密着強度を低減できて好適である。
According to the end face coating method of the present invention, even if the adhesive force due to the van der Waals force is generated between the semiconductor laser bar and the spacer, since the recess is provided in the spacer, the adhesive area and the adhesive strength are reduced. Therefore, the semiconductor laser bar and the spacer can be easily separated, the workability is improved, and the forced separation work by tweezers or the like is unnecessary, so that the risk of scratches and cracks is reduced. Further, since the recess is partially opened in a state where the semiconductor laser bar and the spacer are overlapped with each other, air is not contained in the recess, and there is no possibility that the degree of vacuum during sputtering is adversely affected. Further, the area of the recess is 40% to 70% of the area where the spacer covers the semiconductor laser bar.
It is preferable to select (1) because it is possible to reduce the adhesion strength without significantly deteriorating the mechanical strength of the spacer.

【図面の簡単な説明】[Brief description of drawings]

【図1】 本発明の端面コーティング方法の一例を示す
斜視図
FIG. 1 is a perspective view showing an example of an end face coating method of the present invention.

【図2】 本発明の端面コーティング方法に使用する他
のスペーサの例を示す斜視図
FIG. 2 is a perspective view showing an example of another spacer used in the end surface coating method of the present invention.

【図3】 従来の端面コーティング方法の斜視図FIG. 3 is a perspective view of a conventional end face coating method.

【符号の説明】[Explanation of symbols]

1 半導体レーザバー 2a 発光面 2b 発光背面 101 スペーサ 102 溝 1 Semiconductor laser bar 2a Light emitting surface 2b light emission back 101 spacer 102 groove

Claims (5)

【特許請求の範囲】[Claims] 【請求項1】半導体レーザバー間にスペーサを介挿し、
発光面及び発光背面に所定の光学薄膜を形成した後、半
導体レーザバーとスペーサとを分離する半導体レーザの
端面コーティング方法において、スペーサにスペーサと
半導体レーザバーとを密着させた状態で外部に開放され
た凹部を設けることを特徴とした半導体レーザの端面コ
ーティング方法。
1. A spacer is inserted between semiconductor laser bars,
In a method of coating an end face of a semiconductor laser, in which a semiconductor laser bar and a spacer are separated after forming a predetermined optical thin film on a light emitting surface and a light emitting back surface, a recess opened to the outside in a state where the spacer and the semiconductor laser bar are closely attached to the spacer. A method for coating an end face of a semiconductor laser, which comprises:
【請求項2】凹部の開口面積は、スペーサが半導体レー
ザバーを被覆する面積の40%乃至70%であることを
特徴とした請求項1に記載の半導体レーザの端面コーテ
ィング方法。
2. The method for coating an end surface of a semiconductor laser according to claim 1, wherein an opening area of the recess is 40% to 70% of an area where the spacer covers the semiconductor laser bar.
【請求項3】凹部は、スペーサ長手方向に沿って形成さ
れた両端開放の溝であることを特徴とした請求項1に記
載の半導体レーザの端面コーティング方法。
3. The method for coating an end surface of a semiconductor laser according to claim 1, wherein the recess is a groove formed along the spacer longitudinal direction and having both ends open.
【請求項4】凹部は、スペーサ長手方向に沿って形成さ
れた両端または一端を閉塞した半導体レーザバーの長さ
よりも長い溝であることを特徴とした請求項1に記載の
半導体レーザの端面コーティング方法。
4. The method for coating an end surface of a semiconductor laser according to claim 1, wherein the recess is a groove formed along the longitudinal direction of the spacer and longer than the length of the semiconductor laser bar having both ends or one end closed. .
【請求項5】凹部は、スペーサ長手方向に沿って形成さ
れた貫通孔であり、貫通孔の開口の長手方向の長さは半
導体レーザバーの長さよりも長いことを特徴とした請求
項1に記載の半導体レーザの端面コーティング方法。
5. The recess according to claim 1, wherein the recess is a through hole formed along the longitudinal direction of the spacer, and the length of the opening of the through hole in the longitudinal direction is longer than the length of the semiconductor laser bar. End face coating method for semiconductor laser.
JP2001359462A 2001-11-26 2001-11-26 Method of coating end face of semiconductor laser Pending JP2003163410A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2001359462A JP2003163410A (en) 2001-11-26 2001-11-26 Method of coating end face of semiconductor laser

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2001359462A JP2003163410A (en) 2001-11-26 2001-11-26 Method of coating end face of semiconductor laser

Publications (1)

Publication Number Publication Date
JP2003163410A true JP2003163410A (en) 2003-06-06

Family

ID=19170463

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2001359462A Pending JP2003163410A (en) 2001-11-26 2001-11-26 Method of coating end face of semiconductor laser

Country Status (1)

Country Link
JP (1) JP2003163410A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113913743A (en) * 2021-08-18 2022-01-11 武汉云岭光电有限公司 Preparation method of semiconductor laser

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113913743A (en) * 2021-08-18 2022-01-11 武汉云岭光电有限公司 Preparation method of semiconductor laser

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