JP2003158379A - Multi-layer wiring board - Google Patents

Multi-layer wiring board

Info

Publication number
JP2003158379A
JP2003158379A JP2001353562A JP2001353562A JP2003158379A JP 2003158379 A JP2003158379 A JP 2003158379A JP 2001353562 A JP2001353562 A JP 2001353562A JP 2001353562 A JP2001353562 A JP 2001353562A JP 2003158379 A JP2003158379 A JP 2003158379A
Authority
JP
Japan
Prior art keywords
liquid crystal
wiring board
crystal polymer
insulating film
multilayer wiring
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2001353562A
Other languages
Japanese (ja)
Inventor
Takahiro Matsunaga
隆弘 松永
Isao Miyatani
勲 宮谷
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kyocera Corp
Original Assignee
Kyocera Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kyocera Corp filed Critical Kyocera Corp
Priority to JP2001353562A priority Critical patent/JP2003158379A/en
Publication of JP2003158379A publication Critical patent/JP2003158379A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/10Bump connectors; Manufacturing methods related thereto
    • H01L2224/15Structure, shape, material or disposition of the bump connectors after the connecting process
    • H01L2224/16Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
    • H01L2224/161Disposition
    • H01L2224/16151Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/16221Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/16225Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/26Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
    • H01L2224/31Structure, shape, material or disposition of the layer connectors after the connecting process
    • H01L2224/32Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
    • H01L2224/321Disposition
    • H01L2224/32151Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/32221Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/32225Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/73Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
    • H01L2224/732Location after the connecting process
    • H01L2224/73201Location after the connecting process on the same surface
    • H01L2224/73203Bump and layer connectors
    • H01L2224/73204Bump and layer connectors the bump connector being embedded into the layer connector
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/151Die mounting substrate
    • H01L2924/153Connection portion
    • H01L2924/1531Connection portion the connection portion being formed only on the surface of the substrate opposite to the die mounting surface
    • H01L2924/15311Connection portion the connection portion being formed only on the surface of the substrate opposite to the die mounting surface being a ball array, e.g. BGA

Landscapes

  • Manufacturing Of Printed Wiring (AREA)
  • Production Of Multi-Layered Print Wiring Board (AREA)

Abstract

PROBLEM TO BE SOLVED: To solve the problem wherein it is impossible to satisfy the high density, insulating performance, continuity reliability, and high frequency trans mitting characteristics of wiring at the same time in a multi-layer wiring board constituted of organic materials. SOLUTION: This multi-layer wiring board 4 is constituted of organic materials, and formed by laminating a plurality of insulating films 1 where a wiring conductor 2 constituted of a metallic foil is disposed on at least either the upper face or lower face, and electrically connecting the wiring conductors 2 positioned at the upper and lower parts with the insulating films 1 interposed through a feed-through conductor 3 formed in the insulating films 1. The insulating films 1 are constituted by forming coating layers 6 constituted of cyanate resin on the upper and lower faces of a liquid crystal polymer layer 5. Thus, it is possible to provide the multi-layer wiring board 4 whose insulating performance, continuity reliability, and high frequency transmitting characteristics are excellent.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【発明の属する技術分野】本発明は、各種AV機器や家
電機器・通信機器・コンピュータやその周辺機器等の電
子機器に使用される絶縁フィルムおよびこれを用いた多
層配線基板に関し、特に液晶ポリマーを一部に用いた多
層配線基板に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an insulating film used in various kinds of electronic equipment such as AV equipment, home electric appliances, communication equipment, computers and peripheral equipment thereof, and a multilayer wiring board using the same, and particularly to a liquid crystal polymer. The present invention relates to a multilayer wiring board used in part.

【0002】[0002]

【従来の技術】従来、半導体素子等の能動部品や容量素
子・抵抗素子等の受動部品を多数搭載して所定の電子回
路を構成して成る混成集積回路に用いられる多層配線基
板は、通常、ガラスクロスにエポキシ樹脂を含浸させて
成る絶縁フィルムにドリルによって貫通孔を形成し、こ
の貫通孔内部および絶縁層表面に複数の配線導体を形成
した配線基板を、多数積層することによって形成されて
いる。
2. Description of the Related Art Conventionally, a multilayer wiring board used for a hybrid integrated circuit in which a large number of active components such as semiconductor elements and passive components such as capacitance elements and resistance elements are mounted to form a predetermined electronic circuit is usually A through hole is formed by drilling in an insulating film formed by impregnating glass cloth with epoxy resin, and a plurality of wiring boards, each having a plurality of wiring conductors formed inside the through hole and on the surface of the insulating layer, are laminated. .

【0003】一般に、現在の電子機器は、移動体通信機
器に代表されるように小型・薄型・軽量・高性能・高機
能・高品質・高信頼性が要求されており、このような電
子機器に搭載される混成集積回路等の電子部品も小型・
高密度化が要求されるようになってきている。そして、
このような高密度化の要求に応えるために、電子部品を
構成する多層配線基板も、配線導体の微細化や絶縁層の
薄層化・貫通孔の微細化が必要となってきている。この
ため、近年、貫通孔を微細化するために、ドリル加工よ
り微細加工が可能なレーザ加工が用いられるようになっ
てきた。
In general, current electronic devices are required to be small, thin, lightweight, high-performance, high-performance, high-quality and highly reliable, as represented by mobile communication devices. Electronic components such as hybrid integrated circuits mounted on
There is a growing demand for higher density. And
In order to meet such demands for higher density, it has become necessary to miniaturize wiring conductors, thin insulating layers, and miniaturize through-holes also in multilayer wiring boards constituting electronic components. For this reason, in recent years, in order to miniaturize the through holes, laser machining, which enables finer machining than drilling, has come to be used.

【0004】しかしながら、ガラスクロスにエポキシ樹
脂を含浸させて成る絶縁フィルムは、ガラスクロスをレ
ーザにより穿設加工することが困難なために貫通孔の微
細化には限界があり、また、ガラスクロスの厚みが不均
一のために均一な孔径の貫通孔を形成することが困難で
あるという問題点を有していた。
However, the insulating film formed by impregnating glass cloth with an epoxy resin has a limit in miniaturizing the through holes because it is difficult to drill the glass cloth with a laser, and the glass cloth of There is a problem that it is difficult to form a through hole having a uniform hole diameter due to the uneven thickness.

【0005】このような問題点を解決するために、アラ
ミド樹脂繊維で製作した不織布にエポキシ樹脂を含浸さ
せた絶縁フィルムや、ポリイミドフィルムにエポキシ系
接着剤を塗布した絶縁フィルムを絶縁層に用いた多層配
線基板が提案されている。
In order to solve such a problem, an insulating film obtained by impregnating a non-woven fabric made of aramid resin fiber with an epoxy resin or an insulating film obtained by coating a polyimide film with an epoxy adhesive is used as an insulating layer. Multilayer wiring boards have been proposed.

【0006】しかしながら、アラミド不織布やポリイミ
ドフィルムを用いた絶縁フィルムは吸湿性が高く、吸湿
した状態で半田リフローを行なうと半田リフローの熱に
より吸湿した水分が気化してガスが発生し、絶縁フィル
ム間で剥離してしまう等の問題点を有していた。
However, an insulating film using an aramid non-woven fabric or a polyimide film has a high hygroscopic property, and when solder reflow is performed in a moisture-absorbed state, moisture absorbed by the solder reflow is vaporized to generate a gas, and However, there is a problem such as peeling off.

【0007】このような問題点を解決するために、多層
配線基板の絶縁層の材料として液晶ポリマーを用いるこ
とが検討されている。液晶ポリマーから成る層は、剛直
な分子で構成されているとともに分子同士が規則的に並
んだ構成をしており分子間力が強いことから、高耐熱性
・高弾性率・高寸法安定性・低吸湿性を示し、ガラスク
ロスのような強化材を用いる必要がなく、また、微細加
工性にも優れるという特徴を有している。さらに、高周
波領域においても、低誘電率・低誘電正接であり高周波
特性に優れるという特徴を有している。
In order to solve such a problem, it has been studied to use a liquid crystal polymer as a material for an insulating layer of a multilayer wiring board. The liquid crystal polymer layer is composed of rigid molecules and has a structure in which the molecules are regularly arranged and the intermolecular force is strong, so high heat resistance, high elastic modulus, high dimensional stability, It has low hygroscopicity, does not require the use of a reinforcing material such as glass cloth, and has excellent fine workability. Further, even in a high frequency region, it has a characteristic that it has a low dielectric constant and a low dielectric loss tangent and is excellent in high frequency characteristics.

【0008】このような液晶ポリマーの特徴を活かし、
特開平8-97565号公報には、回路層が第1の液晶ポリマ
ーを含み、この回路層間に第1の液晶ポリマーの融点よ
りも低い融点を有する第2の液晶ポリマーを含む接着剤
層を挿入して成る多層プリント回路基板が提案されてお
り、また、特開平8-293579号公報には、表面に回路パ
ターンが形成された液晶ポリマーフィルムを間にプリプ
レグを介して積層して成る基板の片面にベアチップを複
数個実装して成るマルチチップモジュールが提案されて
いる。
Utilizing the characteristics of such a liquid crystal polymer,
JP-A-8-97565 discloses that a circuit layer contains a first liquid crystal polymer, and an adhesive layer containing a second liquid crystal polymer having a melting point lower than that of the first liquid crystal polymer is inserted between the circuit layers. A multi-layer printed circuit board has been proposed, and in Japanese Patent Laid-Open No. 8-293579, one side of a board is formed by laminating a liquid crystal polymer film having a circuit pattern formed on the surface via a prepreg therebetween. There has been proposed a multi-chip module in which a plurality of bare chips are mounted.

【0009】[0009]

【発明が解決しようとする課題】しかしながら、特開平
8-97565号公報に提案された多層プリント回路基板は、
回路層同士、あるいは回路層の導体箔層同士を間に液晶
ポリマーを含む接着剤層を挿入して熱圧着により接着す
る際、液晶ポリマー分子が剛直であるとともにある程度
分子が規則正しく配向して分子が密に並んでいるために
分子が動き難く、回路層の液晶ポリマーと接着剤層の液
晶ポリマーとは表面のごく一部の分子だけしか絡み合う
ことができず密着性が悪くなり、高温バイアス試験にお
いて層間で剥離して絶縁不良が発生してしまうという問
題点を有していた。また液晶ポリマーを熱融着により接
着する際、液晶ポリマー分子が動き難いために導体箔表
面の微細な凹部に入ることができず、その結果、十分な
アンカー効果を発揮することができず、導体箔と液晶ポ
リマーとの密着性が悪くなって、高温高湿下において両
者間で剥離して導体箔が断線してしまうという問題点も
有していた。
However, the multilayer printed circuit board proposed in Japanese Unexamined Patent Publication No. 8-97565 has the following problems.
When an adhesive layer containing a liquid crystal polymer is inserted between the circuit layers or between the conductor foil layers of the circuit layers and they are bonded by thermocompression bonding, the liquid crystal polymer molecules are rigid and the molecules are regularly aligned to some extent. The molecules are difficult to move because they are densely arranged, and the liquid crystal polymer of the circuit layer and the liquid crystal polymer of the adhesive layer can only entangle only a part of the molecules on the surface, resulting in poor adhesion, and in the high temperature bias test There is a problem that the layers are peeled off to cause insulation failure. In addition, when the liquid crystal polymer is bonded by heat fusion, the liquid crystal polymer molecules cannot move easily into the fine recesses on the surface of the conductor foil, and as a result, a sufficient anchoring effect cannot be exerted. There is also a problem that the adhesiveness between the foil and the liquid crystal polymer is deteriorated, and the foil and the liquid crystal polymer are separated from each other under high temperature and high humidity, and the conductor foil is broken.

【0010】また、特開平8-293579号公報に提案され
たマルチチップモジュールは、低吸湿性であるとともに
低透湿性である液晶ポリマーフィルムでプリプレグを挟
むことによりマルチチップモジュール内部への水分の浸
透を防止して耐湿性を向上させることができるものの、
回路パターンに接する液晶ポリマーフィルムおよびプリ
プレグは、その誘電率が異なる材料であることから、10
0MHz以上の高周波信号を伝送する場合に、インピー
ダンスマッチングを行うことが非常に困難であるととも
に、回路パターンの上下面において高周波信号の伝播遅
延時間が異なるために信号に歪を生じて伝送損失が大き
くなってしまうという問題点を有していた。
Further, the multi-chip module proposed in Japanese Unexamined Patent Publication No. 8-293579 discloses a multi-chip module in which a prepreg is sandwiched between liquid crystal polymer films having low hygroscopicity and low moisture permeability. Although it can prevent moisture and improve the moisture resistance,
The liquid crystal polymer film and prepreg in contact with the circuit pattern are materials with different dielectric constants.
When transmitting a high frequency signal of 0 MHz or more, it is very difficult to perform impedance matching, and since the propagation delay time of the high frequency signal is different between the upper and lower surfaces of the circuit pattern, the signal is distorted and the transmission loss is large. It had a problem that it would become.

【0011】本発明はかかる従来技術の問題点に鑑み案
出されたものであり、その目的は、高密度な配線を有す
るとともに、絶縁信頼性・導通信頼性・高周波伝送特性
に優れた絶縁フィルムおよびこれを用いた多層配線基板
を提供することに有る。
The present invention has been devised in view of the problems of the prior art, and an object thereof is an insulating film having high-density wiring and excellent in insulation reliability, conduction reliability, and high frequency transmission characteristics. And to provide a multilayer wiring board using the same.

【0012】[0012]

【課題を解決するための手段】本発明の多層配線基板
は、有機材料から成り、上下面の少なくとも1つの面に
金属箔から成る配線導体が配設された複数の絶縁フィル
ムを積層して成るとともに、この絶縁フィルムを挟んで
上下に位置する前記配線導体間を前記絶縁フィルムに形
成された貫通導体を介して電気的に接続した多層配線基
板であって、前記絶縁フィルムが液晶ポリマー層の上下
面にシアネート樹脂から成る被覆層を形成して成ること
を特徴とするものである。
A multilayer wiring board of the present invention is formed by laminating a plurality of insulating films made of an organic material and having wiring conductors made of metal foil arranged on at least one of upper and lower surfaces thereof. A multilayer wiring board in which the wiring conductors located above and below the insulating film are electrically connected via a through conductor formed in the insulating film, wherein the insulating film is on a liquid crystal polymer layer. It is characterized in that a coating layer made of a cyanate resin is formed on the lower surface.

【0013】また、本発明の多層配線基板は、上記構成
において、前記被覆層が10〜70体積%の無機絶縁粉末を
含有することを特徴とするものである。
Further, the multilayer wiring board of the present invention is characterized in that, in the above constitution, the coating layer contains 10 to 70% by volume of inorganic insulating powder.

【0014】さらに、本発明の多層配線基板は、上記構
成において、前記液晶ポリマー層の水との接触角が5〜
60°であることを特徴とするものであるまた、本発明の
多層配線基板は、上記構成において、前記絶縁フィルム
に配設された配線導体の幅方向の断面形状が、前記絶縁
フィルム側の底辺の長さが対向する底辺の長さよりも短
い台形状であり、かつ、前記絶縁フィルム側の底辺と側
辺との成す角度が95〜150°であることを特徴とするも
のである。
Further, in the multilayer wiring board of the present invention having the above-mentioned structure, the liquid crystal polymer layer has a contact angle with water of 5 to 5.
The multilayer wiring board of the present invention is characterized in that the cross-sectional shape in the width direction of the wiring conductor disposed in the insulating film is the bottom side of the insulating film side. Has a trapezoidal shape whose length is shorter than the length of the opposite bottom side, and the angle formed by the bottom side and the side on the side of the insulating film is 95 to 150 °.

【0015】さらに、本発明の多層配線基板は、上記構
成において、前記絶縁フィルム間において、前記配線導
体の長さの短い底辺と前記液晶ポリマー層との間に位置
する前記被覆層の厚みx(μm)が、上下の前記液晶ポ
リマー層間の距離をT(μm)、前記配線導体の厚みを
t(μm)としたときに、3μm≦0.5T−t≦x≦0.5
T≦35μm(ただし、8μm≦T≦70μm、1μm≦t
≦32μm)であることを特徴とするものである。
Further, in the above-mentioned structure, the multilayer wiring board of the present invention has a thickness x (of the coating layer located between the insulating films and between the bottom of the wiring conductor having a short length and the liquid crystal polymer layer. μm), where T (μm) is the distance between the upper and lower liquid crystal polymer layers and t (μm) is the thickness of the wiring conductor, 3 μm ≦ 0.5T−t ≦ x ≦ 0.5
T ≦ 35 μm (however, 8 μm ≦ T ≦ 70 μm, 1 μm ≦ t
≦ 32 μm).

【0016】本発明の多層配線基板によれば、絶縁フィ
ルムを液晶ポリマー層の上下面にシアネート樹脂から成
る被覆層を形成して成るものとしたことから、シアネー
ト樹脂分子が液晶ポリマー分子ほど剛直でなく、また、
規則正しい配向性も示さないことから比較的分子が動き
やすく、その結果、絶縁フィルム同士の密着性が良好と
なり、高温バイアス試験において絶縁フィルム間で剥離
して絶縁不良が発生してしまうということはない。ま
た、シアネート樹脂分子が配線導体表面の微細な凹部に
入り込み十分なアンカー効果を発揮することができ、絶
縁フィルムと配線導体との密着性が良好となり、その結
果、高温高湿下で両者間で剥離して配線導体が断線して
しまうということもない。さらに、配線導体の上下面が
同一材料から成る被覆層と接することから、100MHz
以上の高周波信号を伝送する場合、インピーダンスマッ
チングを行なうことが容易であるとともに、高周波信号
の伝播遅延時間が配線導体の上下面で同じであるために
信号に歪を生じて伝送損失が大きくなってしまうという
こともない。
According to the multilayer wiring board of the present invention, since the insulating film is formed by forming the coating layers of the cyanate resin on the upper and lower surfaces of the liquid crystal polymer layer, the cyanate resin molecules are as rigid as the liquid crystal polymer molecules. Not again
Molecules are relatively easy to move because they do not show regular orientation, and as a result, the adhesion between insulating films is good, and there is no possibility of peeling between insulating films and causing insulation failure in the high temperature bias test. . In addition, the cyanate resin molecules can enter the fine recesses on the surface of the wiring conductor and exhibit a sufficient anchoring effect, resulting in good adhesion between the insulating film and the wiring conductor, and as a result, high temperature and high humidity between them. There is no possibility of peeling and breaking of the wiring conductor. Furthermore, since the upper and lower surfaces of the wiring conductor are in contact with the coating layers made of the same material, 100 MHz
When transmitting the above high-frequency signals, it is easy to perform impedance matching, and since the propagation delay time of the high-frequency signals is the same on the upper and lower surfaces of the wiring conductor, the signal is distorted and the transmission loss increases. It doesn't happen.

【0017】また、本発明の多層配線基板によれば、上
記構成において、被覆層に10〜70体積%の無機絶縁粉末
を含有させたことから、被覆層が適度な弾性を有し、そ
の結果、絶縁フィルムを積層しプレスする際に貫通導体
の位置ずれや被覆層の厚みバラツキの少ない接続信頼性
に優れた多層配線基板とすることができる。
Further, according to the multilayer wiring board of the present invention, in the above structure, since the coating layer contains 10 to 70% by volume of the inorganic insulating powder, the coating layer has an appropriate elasticity, and as a result, It is possible to obtain a multi-layer wiring board with excellent connection reliability, in which displacement of the through conductor and variation in the thickness of the coating layer are small when the insulating films are laminated and pressed.

【0018】さらに、本発明の多層配線基板によれば、
上記構成において、液晶ポリマー層の水との接触角を5
〜60°としたことから、液晶ポリマー層の上下面の水素
結合可能な活性基と被覆層とが強い分子間力により良好
に結合することができ、その結果、両者の密着性をさら
に向上させることができる。
Further, according to the multilayer wiring board of the present invention,
In the above structure, the contact angle of the liquid crystal polymer layer with water is 5
Since it is set to -60 °, the active groups capable of hydrogen bonding on the upper and lower surfaces of the liquid crystal polymer layer and the coating layer can be bonded well by a strong intermolecular force, and as a result, the adhesion between them can be further improved. be able to.

【0019】また、本発明の多層配線基板によれば、上
記構成において、絶縁フィルムに配設された配線導体の
幅方向の断面形状を、絶縁フィルム側の底辺の長さが対
向する底辺の長さよりも短い台形状とし、かつ、絶縁フ
ィルム側の底辺と側辺との成す角度を95〜150°とした
ことから、配線導体を被覆層に容易に埋設することがで
きるとともに配線導体を埋設した後の被覆層表面をほぼ
平坦にすることができ、その結果、絶縁フィルムを多層
化する際に絶縁フィルム間に空気をかみ込むことはな
く、絶縁信頼性の高い多層配線基板とすることができ
る。
Further, according to the multilayer wiring board of the present invention, in the above-mentioned structure, the width direction cross-sectional shape of the wiring conductors arranged on the insulating film is determined by the length of the bottom side on which the insulating film side is opposed to the bottom side. Since the trapezoid is shorter than that, and the angle between the bottom side and the side on the insulating film side is 95 to 150 °, the wiring conductor can be easily embedded in the coating layer and the wiring conductor is embedded. The surface of the subsequent coating layer can be made substantially flat, and as a result, air can not be caught between the insulating films when the insulating films are multilayered, and a multilayer wiring board with high insulation reliability can be obtained. .

【0020】さらに、本発明の多層配線基板によれば、
上記構成において、絶縁フィルム間において、配線導体
の長さの短い底辺と液晶ポリマー層との間に位置する被
覆層の厚みx(μm)が、上下の液晶ポリマー層間の距
離をT(μm)、配線導体の厚みをt(μm)としたと
きに、3μm≦0.5T−t≦x≦0.5T≦35μm(ただ
し、8μm≦T≦70μm、1μm≦t≦32μm)とした
ことから、配線導体の長さの短い底辺と液晶ポリマー層
間の距離および配線導体の長さの長い底辺と隣接する液
晶ポリマー層間の距離の差をt(μm)未満と小さくで
き、配線導体周囲の誘電正接バラツキを小さなものとす
ることができ、その結果、伝送特性をさらに向上させる
ことができる。
Further, according to the multilayer wiring board of the present invention,
In the above structure, the thickness x (μm) of the coating layer located between the insulating film and the short base of the wiring conductor and the liquid crystal polymer layer is equal to the distance between the upper and lower liquid crystal polymer layers by T (μm), When the thickness of the wiring conductor is t (μm), 3 μm ≦ 0.5T−t ≦ x ≦ 0.5T ≦ 35 μm (however, 8 μm ≦ T ≦ 70 μm, 1 μm ≦ t ≦ 32 μm). The difference in the distance between the short length bottom and the liquid crystal polymer layer and the distance between the long length wiring conductor and the adjacent liquid crystal polymer layer can be reduced to less than t (μm), and the variation in the dielectric loss tangent around the wiring conductor is small. As a result, the transmission characteristics can be further improved.

【0021】[0021]

【発明の実施の形態】次に本発明の多層配線基板を添付
の図面に基づいて詳細に説明する。
BEST MODE FOR CARRYING OUT THE INVENTION Next, a multilayer wiring board of the present invention will be described in detail with reference to the accompanying drawings.

【0022】図1は、本発明の多層配線基板に半導体素
子等の電子部品を搭載して成る混成集積回路の実施の形
態の一例を示す断面図であり、また、図2は、図1に示
す多層配線基板における配線導体の幅方向の要部拡大断
面図である。これらの図において5は液晶ポリマー層、
6は被覆層で、主にこれらで絶縁フィルム1が構成され
ている。また、2は配線導体、3は貫通導体で、主に絶
縁フィルム1と配線導体2と貫通導体3とで本発明の多
層配線基板4が構成されている。なお、本例の多層配線
基板4では、絶縁フィルム1を4層積層して成るものを
示している。
FIG. 1 is a sectional view showing an example of an embodiment of a hybrid integrated circuit in which electronic parts such as semiconductor elements are mounted on a multilayer wiring board of the present invention, and FIG. 2 is shown in FIG. FIG. 6 is an enlarged cross-sectional view of a main part of a wiring conductor in the width direction of the multilayer wiring board shown. In these figures, 5 is a liquid crystal polymer layer,
Reference numeral 6 denotes a coating layer, which mainly constitutes the insulating film 1. Further, 2 is a wiring conductor, 3 is a through conductor, and the insulating film 1, the wiring conductor 2, and the through conductor 3 mainly form the multilayer wiring board 4 of the present invention. The multilayer wiring board 4 of this example is formed by laminating four insulating films 1.

【0023】絶縁フィルム1は、液晶ポリマー層5と、
その上下面に被着形成された被覆層6とから構成されて
おり、これを用いて多層配線基板4を形成した場合、配
線導体2や多層配線基板4に搭載される電子部品7の支
持体としての機能を有する。
The insulating film 1 comprises a liquid crystal polymer layer 5 and
And a coating layer 6 formed on the upper and lower surfaces thereof, and when a multilayer wiring board 4 is formed using this, a support for the wiring conductor 2 and an electronic component 7 mounted on the multilayer wiring board 4. Has the function of.

【0024】なお、ここで液晶ポリマーとは、溶融状態
あるいは溶液状態で液晶性を示すポリマーあるいは光学
的に複屈折する性質を有するポリマーを指し、一般に溶
液状態で液晶性を示すリオトロピック液晶ポリマーや溶
融時に液晶性を示すサーモトロピック液晶ポリマー、あ
るいは、熱変形温度で分類される1型・2型・3型すべ
ての液晶ポリマーを含むものであり、本発明に用いる液
晶ポリマーとしては、温度サイクル信頼性・半田耐熱性
・加工性の観点からは200〜400℃の温度、特に250〜350
℃の温度に融点を有するものが好ましい。
Here, the liquid crystal polymer refers to a polymer exhibiting liquid crystallinity in a molten state or a solution state or a polymer having an optical birefringence property, and generally, a lyotropic liquid crystal polymer exhibiting liquid crystallinity in a solution state or a molten polymer. The thermotropic liquid crystal polymer which sometimes exhibits liquid crystallinity, or all of the type 1, type 2, and type 3 liquid crystal polymers classified by heat distortion temperature are included, and the liquid crystal polymer used in the present invention has temperature cycle reliability.・ A temperature of 200-400 ℃, especially 250-350 from the viewpoint of soldering heat resistance and workability.
Those having a melting point at a temperature of ° C are preferred.

【0025】このような液晶ポリマーとしては、温度サ
イクル信頼性・半田耐熱性・加工性の観点からは200〜4
00℃の温度、特に250〜350℃の温度に融点を有するもの
が好ましい。また、液晶ポリマー層5は、層としての物
性を損なわない範囲内で、熱安定性を改善するための酸
化防止剤や耐光性を改善するための紫外線吸収剤等の光
安定剤、難燃性を付加するためのハロゲン系もしくはリ
ン酸系の難燃性剤、アンチモン系化合物やホウ酸亜鉛・
メタホウ酸バリウム・酸化ジルコニウム等の難燃助剤、
潤滑性を改善するための高級脂肪酸や高級脂肪酸エステ
ル・高級脂肪酸金属塩・フルオロカーボン系界面活性剤
等の滑剤、熱膨張係数を調整するため、および/または
機械的強度を向上するための酸化アルミニウム・酸化珪
素・酸化チタン・酸化バリウム・酸化ストロンチウム・
酸化ジルコニウム・酸化カルシウム・ゼオライト・窒化
珪素・窒化アルミニウム・炭化珪素・チタン酸カリウム
・チタン酸バリウム・チタン酸ストロンチウム・チタン
酸カルシウム・ホウ酸アルミニウム・スズ酸バリウム・
ジルコン酸バリウム・ジルコン酸ストロンチウム等の充
填材を含有してもよい。
As such a liquid crystal polymer, from the viewpoint of temperature cycle reliability, solder heat resistance and workability, it is 200 to 4
Those having a melting point at a temperature of 00 ° C, particularly at a temperature of 250 to 350 ° C are preferable. Further, the liquid crystal polymer layer 5 is a light stabilizer such as an antioxidant for improving thermal stability or a light stabilizer such as an ultraviolet absorber for improving light resistance, and flame retardancy within a range that does not impair the physical properties of the layer. Halogen-based or phosphoric acid-based flame retardants, antimony compounds and zinc borate for adding
Flame retardant aids such as barium metaborate and zirconium oxide,
Lubricants such as higher fatty acids and higher fatty acid esters / higher fatty acid metal salts / fluorocarbon-based surfactants for improving lubricity; aluminum oxide for adjusting the thermal expansion coefficient and / or improving mechanical strength. Silicon oxide, titanium oxide, barium oxide, strontium oxide,
Zirconium oxide, calcium oxide, zeolite, silicon nitride, aluminum nitride, silicon carbide, potassium titanate, barium titanate, strontium titanate, calcium titanate, aluminum borate, barium stannate,
A filler such as barium zirconate or strontium zirconate may be contained.

【0026】なお、上記の充填材等の粒子形状は、略球
状・針状・フレーク状等があり、充填性の観点からは略
球状が好ましい。また、粒子径は、通常0.1〜15μm程
度であり、液晶ポリマー層5の厚みよりも小さい。
The particle shape of the above-mentioned filler and the like may be substantially spherical, needle-like, flake-like, etc. From the viewpoint of filling properties, substantially spherical shape is preferable. The particle diameter is usually about 0.1 to 15 μm, which is smaller than the thickness of the liquid crystal polymer layer 5.

【0027】また、液晶ポリマー層5は、被覆層6との
密着性を高めるために、その表面をバフ研磨・ブラスト
研磨・ブラシ研磨・プラズマ処理・コロナ処理・紫外線
処理・薬品処理等の方法を用いて水との接触角が5〜60
゜となるように処理しておくことが好ましい。
Further, the liquid crystal polymer layer 5 is subjected to buffing, blasting, brushing, plasma treatment, corona treatment, ultraviolet treatment, chemical treatment, etc. on its surface in order to improve the adhesion with the coating layer 6. The contact angle with water is 5-60
It is preferable that the treatment is carried out so that

【0028】なお、接触角を評価するための水は、JIS
K 0050「化学分析方法通則」に規定される蒸留法も
しくはイオン交換法によって精製した水、または逆浸透
法・蒸留法・イオン交換法等を組み合わせた方法によっ
て精製した水を示す。
Water for evaluating the contact angle is JIS
K 0050 shows water purified by a distillation method or an ion exchange method defined in "General Rules for Chemical Analysis Method", or water purified by a method combining a reverse osmosis method, a distillation method, an ion exchange method and the like.

【0029】液晶ポリマー層5に対する水の濡れ性は、
液晶ポリマー層5表面の水素結合可能な活性基の存在す
る割合と相関関係にあり、液晶ポリマー層5の上下面の
水との接触角を5〜60°とすることにより、被覆層6が
液晶ポリマー層5の上下面と強い分子間力で結合して、
液晶ポリマー層5と被覆層6との密着性を良好となすこ
とができ、その結果、高温バイアス試験においても両者
間で剥離することのない絶縁フィルム1とすることがで
きる。なお、水との接触角が5°より小さいと、被覆層
6が液晶ポリマー層5上に極端に広がってしまって位置
精度が低下して、絶縁フィルム1を複数枚重ねるととも
に加熱・加圧して多層化する際に、絶縁フィルム1の表
面に形成される配線導体2や内部に形成される貫通導体
3の位置がずれて断線し易くなる傾向があり、また、60
°を超えると高温バイアス試験において液晶ポリマー層
5と被覆層6との密着性が低下して両者間で剥離し易く
なる傾向がある。したがって、液晶ポリマー層5表面
は、その水との接触角を5〜60°とすることが好まし
い。
The wettability of water to the liquid crystal polymer layer 5 is
It has a correlation with the ratio of active groups capable of hydrogen bonding on the surface of the liquid crystal polymer layer 5, and when the contact angle between the upper and lower surfaces of the liquid crystal polymer layer 5 with water is set to 5 to 60 °, the coating layer 6 becomes liquid crystal. By bonding with the upper and lower surfaces of the polymer layer 5 by a strong intermolecular force,
Adhesion between the liquid crystal polymer layer 5 and the coating layer 6 can be made good, and as a result, the insulating film 1 that does not peel off between the two even in the high temperature bias test can be obtained. When the contact angle with water is less than 5 °, the coating layer 6 spreads extremely over the liquid crystal polymer layer 5 and the positional accuracy deteriorates, and a plurality of insulating films 1 are stacked and heated / pressed. When the multilayer structure is adopted, the positions of the wiring conductor 2 formed on the surface of the insulating film 1 and the through conductors 3 formed inside tend to be displaced to easily cause disconnection.
If it exceeds 50 °, the adhesion between the liquid crystal polymer layer 5 and the coating layer 6 in the high temperature bias test tends to be low, and there is a tendency for peeling between the two to easily occur. Therefore, the surface of the liquid crystal polymer layer 5 preferably has a contact angle with water of 5 to 60 °.

【0030】また、液晶ポリマー層5は、その表面の中
心線表面粗さRaを0.05〜5μmとしておくことが好ま
しい。液晶ポリマー層5の上下面の中心線表面粗さRa
を0.05〜5μmとすることにより、液晶ポリマー層5の
上下面が被覆層6と良好なアンカー効果を有する密着性
の良好なものとなり、液晶ポリマー層5と被覆層6とが
より強固に密着したものとすることができる。
The liquid crystal polymer layer 5 preferably has a center line surface roughness Ra of 0.05 to 5 μm. Centerline surface roughness Ra of the upper and lower surfaces of the liquid crystal polymer layer 5
Is 0.05 to 5 μm, the upper and lower surfaces of the liquid crystal polymer layer 5 have a good anchoring effect with the coating layer 6 and have good adhesiveness, and the liquid crystal polymer layer 5 and the coating layer 6 are more firmly adhered. Can be one.

【0031】なお、中心線表面粗さRaは、半田リフロ
ーの際に液晶ポリマー層5と被覆層6との剥離を防止す
るという観点からは0.05μm以上であることが好まし
く、表面に被覆層6を形成する際に空気のかみ込みを防
止するという観点からは5μm以下であることが好まし
い。したがって、液晶ポリマー層5は、その表面の中心
線表面粗さRaを0.05〜5μmとすることが好ましい。
The center line surface roughness Ra is preferably 0.05 μm or more from the viewpoint of preventing separation of the liquid crystal polymer layer 5 and the coating layer 6 during solder reflow, and the coating layer 6 is formed on the surface. The thickness is preferably 5 μm or less from the viewpoint of preventing the entrapment of air when forming the film. Therefore, the liquid crystal polymer layer 5 preferably has a center line surface roughness Ra of the surface of 0.05 to 5 μm.

【0032】次に、液晶ポリマー層5の表面に形成され
る被覆層6は、シアネート樹脂から成り、配線導体2を
被着形成する際の接着剤の機能を有するとともに、絶縁
フィルム1を用いて多層配線基板4を形成する際に、絶
縁フィルム1同士を積層する接着剤の役目を果たす。
Next, the coating layer 6 formed on the surface of the liquid crystal polymer layer 5 is made of a cyanate resin and has a function of an adhesive when the wiring conductor 2 is adhered and formed, and the insulating film 1 is used. When forming the multilayer wiring board 4, it serves as an adhesive for laminating the insulating films 1 to each other.

【0033】ここでシアネート樹脂とは、分子中に2個
以上のシアナト基を有し、加熱により三量化してシアヌ
レート環を生成して三次元的な網目構造を形成すること
が可能な物質を指し、例えば、分子骨格としてビスフェ
ノールAやビスフェノールE・ビスフェノールF・フェ
ノールノボラック・ジシクロペンタジエン型の樹脂を持
つものが挙げられる。
Here, the cyanate resin means a substance having two or more cyanato groups in the molecule and capable of forming a three-dimensional network structure by being trimerized by heating to form a cyanurate ring. For example, those having a bisphenol A or bisphenol E / bisphenol F / phenol novolac / dicyclopentadiene type resin as a molecular skeleton are mentioned.

【0034】このような被覆層6は、硬化を促進するた
めの遷移金属の脂肪酸エステル加工物や錯体化合物等の
金属触媒、弾性率を調整するためのゴム成分や熱安定性
を改善するための酸化防止剤、耐光性を改善するための
紫外線吸収剤等の光安定剤、難燃性を付加するためのハ
ロゲン系もしくはリン酸系の難燃性剤、アンチモン系化
合物やホウ酸亜鉛・メタホウ酸バリウム・酸化ジルコニ
ウム等の難燃助剤、潤滑性を改善するための高級脂肪酸
や高級脂肪酸エステルや高級脂肪酸金属塩・フルオロカ
ーボン系界面活性剤等の滑剤、熱膨張係数を調整したり
機械的強度を向上するための酸化アルミニウムや酸化珪
素・酸化チタン・酸化バリウム・酸化ストロンチウム・
酸化ジルコニウム・酸化カルシウム・ゼオライト・窒化
珪素・窒化アルミニウム・炭化珪素・チタン酸カリウム
・チタン酸バリウム・チタン酸ストロンチウム・チタン
酸カルシウム・ホウ酸アルミニウム・スズ酸バリウム・
ジルコン酸バリウム・ジルコン酸ストロンチウム等の充
填材、あるいは、充填材との親和性を高めこれらの接合
性向上と機械的強度を高めるためのシラン系カップリン
グ剤やチタネート系カップリング剤等のカップリング剤
を含有してもよい。
The coating layer 6 as described above is used to improve the fatty acid ester processed product of a transition metal for promoting the curing, a metal catalyst such as a complex compound, the rubber component for adjusting the elastic modulus, and the thermal stability. Antioxidants, light stabilizers such as UV absorbers to improve light resistance, halogen-based or phosphoric acid-based flame retardants to add flame retardancy, antimony compounds and zinc borate / metaboric acid Flame retardant aids such as barium and zirconium oxide, lubricants such as higher fatty acids and higher fatty acid esters to improve lubricity, higher fatty acid metal salts and higher fatty acid metal salts, fluorocarbon surfactants, etc., adjusting thermal expansion coefficient and mechanical strength. Aluminum oxide, silicon oxide, titanium oxide, barium oxide, strontium oxide
Zirconium oxide, calcium oxide, zeolite, silicon nitride, aluminum nitride, silicon carbide, potassium titanate, barium titanate, strontium titanate, calcium titanate, aluminum borate, barium stannate,
Fillers such as barium zirconate and strontium zirconate, or couplings such as silane coupling agents and titanate coupling agents to improve the bondability and mechanical strength of the fillers by increasing their affinity with them. You may contain an agent.

【0035】特に絶縁フィルム1を積層・加圧して多層
配線基板4を形成する際に、被覆層6の流動性を抑制
し、貫通導体3の位置ずれや被覆層6の厚みばらつきを
防止するという観点からは、被覆層6は充填材として10
体積%以上の無機絶縁粉末を含有することが好ましい。
また、液晶ポリマー層5との接着界面および配線導体2
との接着界面での半田リフロー時の剥離を防止するとい
う観点からは、充填材の含有量を70体積%以下とするこ
とが好ましい。したがって、被覆層6に、10〜70体積%
の充填材を含有させておくことが好ましい。
In particular, when the insulating film 1 is laminated and pressed to form the multilayer wiring board 4, the fluidity of the coating layer 6 is suppressed and the displacement of the through conductor 3 and the variation in the thickness of the coating layer 6 are prevented. From the viewpoint, the coating layer 6 serves as a filler.
It is preferable to contain the inorganic insulating powder in a volume% or more.
Also, the adhesive interface with the liquid crystal polymer layer 5 and the wiring conductor 2
The content of the filler is preferably 70% by volume or less from the viewpoint of preventing peeling during solder reflow at the adhesive interface with. Therefore, the coating layer 6 contains 10 to 70% by volume.
It is preferable to include the above filler.

【0036】なお、上記の充填材等の形状は、略球状・
針状・フレーク状等があり、充填性の観点からは、略球
状が好ましい。また、粒子径は、0.1〜15μm程度であ
り、被覆層6の厚みよりも小さい。
The shape of the above-mentioned filling material is substantially spherical.
There are needle-like shapes and flake-like shapes, and a substantially spherical shape is preferable from the viewpoint of filling properties. The particle size is about 0.1 to 15 μm, which is smaller than the thickness of the coating layer 6.

【0037】本発明の多層配線基板4によれば、絶縁フ
ィルム1を液晶ポリマー層5の上下面にシアネート樹脂
から成る被覆層6を形成して成るものとしたことから、
シアネート樹脂分子が液晶ポリマー分子ほど剛直でな
く、また、規則正しい配向性も示さないことから比較的
分子が動きやすく、その結果、絶縁フィルム1同士の密
着性が良好となり、高温バイアス試験においてフィルム
間で剥離して絶縁不良が発生してしまうということはな
い。また、シアネート樹脂分子が配線導体2表面の微細
な凹部に入り込み十分なアンカー効果を発揮することが
でき、絶縁フィルム1と配線導体2との密着性が良好と
なり、その結果、高温高湿下で両者間で剥離して配線導
体2が断線してしまうということもない。さらに、配線
導体2の上下面が同一材料から成る被覆層6と接するこ
とから、100MHz以上の高周波信号を伝送する場合、
インピーダンスマッチングを行なうことが容易であると
ともに、高周波信号の伝播遅延時間が配線導体2の上下
面で同じであるために信号に歪を生じて伝送損失が大き
くなってしまうということもない。
According to the multilayer wiring board 4 of the present invention, the insulating film 1 is formed by forming the coating layers 6 made of cyanate resin on the upper and lower surfaces of the liquid crystal polymer layer 5,
Since the cyanate resin molecules are not as rigid as the liquid crystal polymer molecules and they do not show a regular orientation, the molecules are relatively easy to move, resulting in good adhesion between the insulating films 1 and between the films in the high temperature bias test. There is no possibility of peeling to cause insulation failure. Further, the cyanate resin molecules can enter into the fine recesses on the surface of the wiring conductor 2 and exhibit a sufficient anchoring effect, and the adhesion between the insulating film 1 and the wiring conductor 2 becomes good, and as a result, under high temperature and high humidity. There is no possibility that the wiring conductor 2 will be disconnected due to separation between the two. Furthermore, since the upper and lower surfaces of the wiring conductor 2 are in contact with the coating layer 6 made of the same material, when transmitting a high frequency signal of 100 MHz or more,
Impedance matching is easy to perform, and since the propagation delay time of the high-frequency signal is the same on the upper and lower surfaces of the wiring conductor 2, the signal is not distorted and the transmission loss does not increase.

【0038】このような絶縁フィルム1は、次の方法に
より製作される。まず、周知のインフレーション法でフ
ィルムの引取方向と幅方向に延伸してフィルム化した液
晶ポリマーフィルムをO2およびCF4を使用ガスとして
用いた真空プラズマ装置で表面処理することにより水と
の接触角が5〜60°の上下面を有する液晶ポリマー層5
を製作する。そして、この上下表面に、例えば粒径が0.
1〜15μm程度の酸化珪素等の無機絶縁粉末に、シアネ
ート樹脂と溶剤・触媒・可塑剤・分散剤等を添加して得
たペーストを、従来周知のドクタブレード法等のシート
成型法を採用して被覆層6を形成した後、あるいは上記
のペースト中に液晶ポリマー層5浸漬し垂直に引き上げ
ることによって液晶ポリマー層5の表面に被覆層6を形
成した後、これを60〜100℃の温度で5分〜3時間加熱
・乾燥することにより製作される。
Such an insulating film 1 is manufactured by the following method. First, a liquid crystal polymer film stretched in the take-up direction and the width direction by a well-known inflation method to form a film is subjected to surface treatment with a vacuum plasma apparatus using O 2 and CF 4 as a working gas to obtain a contact angle with water. Liquid crystal polymer layer 5 having upper and lower surfaces of 5 to 60 °
To produce. Then, on the upper and lower surfaces, for example, the particle size is 0.
A paste obtained by adding a cyanate resin, a solvent, a catalyst, a plasticizer, a dispersant, etc. to an inorganic insulating powder of about 1 to 15 μm, such as silicon oxide, is adopted by a conventionally known sheet molding method such as a doctor blade method. To form the coating layer 6, or by forming the coating layer 6 on the surface of the liquid crystal polymer layer 5 by immersing the liquid crystal polymer layer 5 in the above paste and pulling it up vertically, the coating layer 6 is formed at a temperature of 60 to 100 ° C. It is manufactured by heating and drying for 5 minutes to 3 hours.

【0039】なお、絶縁フィルム1の厚みは絶縁信頼性
を確保するという観点からは10〜200μmであることが
好ましく、また、高耐熱性・低吸湿性・高寸法安定性を
確保するという観点からは液晶ポリマー層5の厚みを絶
縁フィルム1の厚みの40〜90%の範囲としておくことが
好ましい。
The thickness of the insulating film 1 is preferably 10 to 200 μm from the viewpoint of ensuring insulation reliability, and from the viewpoint of ensuring high heat resistance, low hygroscopicity and high dimensional stability. It is preferable that the thickness of the liquid crystal polymer layer 5 be within the range of 40 to 90% of the thickness of the insulating film 1.

【0040】また、絶縁フィルム1には、上下面の少な
くとも1つの面に配線導体2が被着形成されている。配
線導体2は、その厚みが2〜30μm程度で銅・金等の良
導電性の金属箔から成り、多層配線基板4に搭載される
電子部品7を外部電気回路(図示せず)に電気的に接続
する機能を有する。
The insulating film 1 has wiring conductors 2 adhered to at least one of the upper and lower surfaces thereof. The wiring conductor 2 has a thickness of about 2 to 30 μm and is made of a highly conductive metal foil such as copper or gold. The electronic component 7 mounted on the multilayer wiring board 4 is electrically connected to an external electric circuit (not shown). Has the function of connecting to.

【0041】このような配線導体2は、絶縁フィルム1
を複数積層する際、配線導体2の周囲にボイドが発生す
るのを防止するという観点から、被覆層6に少なくとも
配線導体2の表面と被覆層6の表面とが平坦となるよう
に埋設されていることが好ましい。また、配線導体2を
被覆層6に埋設する際に、被覆層6の乾燥状態での気孔
率を3〜40体積%としておくと、配線導体2周囲の被覆
層6の樹脂盛り上がりを生じさせず平坦化することがで
きるとともに配線導体2と被覆層6の間に挟まれる空気
の排出を容易にして気泡の巻き込みを防止することがで
きる。なお、乾燥状態での気孔率が40体積%を超える
と、複数積層した絶縁フィルム1を加圧・加熱硬化した
後に被覆層6内に気孔が残存し、この気孔が空気中の水
分を吸着して絶縁性が低下してしまうおそれがあるの
で、被覆層6の乾燥状態での気孔率を3〜40体積%の範
囲としておくことが好ましい。
Such a wiring conductor 2 is composed of the insulating film 1
From the viewpoint of preventing voids from being generated around the wiring conductor 2 when a plurality of wiring conductors are stacked, the wiring conductor 2 is buried so that at least the surface of the wiring conductor 2 and the surface of the coating layer 6 are flat. Is preferred. Moreover, when the wiring layer 2 is embedded in the coating layer 6, if the porosity of the coating layer 6 in the dry state is set to 3 to 40% by volume, resin swelling of the coating layer 6 around the wiring layer 2 does not occur. In addition to flattening, air trapped between the wiring conductor 2 and the covering layer 6 can be easily discharged to prevent air bubbles from being trapped. When the porosity in the dry state exceeds 40% by volume, pores remain in the coating layer 6 after pressurizing and heating and curing the laminated insulating films 1, and the pores adsorb moisture in the air. Therefore, it is preferable that the porosity of the coating layer 6 in the dry state is in the range of 3 to 40% by volume because the insulating property may be deteriorated.

【0042】このような被覆層6の乾燥状態での気孔率
は、被覆層6を液晶ポリマー層5の表面上に塗布し乾燥
する際に、乾燥温度や昇温速度等の乾燥条件を適宜調整
することにより所望の値とすることができる。
The porosity of the coating layer 6 in the dry state is appropriately adjusted by drying conditions such as a drying temperature and a heating rate when the coating layer 6 is applied on the surface of the liquid crystal polymer layer 5 and dried. By doing so, a desired value can be obtained.

【0043】さらに、絶縁フィルム1に配設された配線
導体2の幅方向の断面形状を、絶縁フィルム1側の底辺
の長さが対向する底辺の長さよりも短い台形状とすると
ともに、絶縁フィルム1側の底辺と側辺との成す角度を
95〜150°とすることが好ましい。絶縁フィルム1に配
設された配線導体2の幅方向の断面形状を、絶縁フィル
ム1側の底辺の長さが対向する底辺の長さよりも短い台
形状とするとともに、絶縁フィルム1側の底辺と側辺と
の成す角度を95〜150°とすることにより、配線導体2
を被覆層6に埋設する際に、配線導体2を被覆層6に容
易に埋設して配線導体2を埋設した後の被覆層6表面を
ほぼ平坦にすることができ、積層の際に空気をかみ込ん
で絶縁性を低下させることのない多層配線基板4とする
ことができる。なお、気泡をかみ込むことなく埋設する
という観点からは、絶縁フィルム1側の底辺と側辺との
成す角度を95°以上とすることが好ましく、配線導体2
を微細化するという観点からは150°以下とすることが
好ましい。
Further, the cross-sectional shape in the width direction of the wiring conductor 2 arranged on the insulating film 1 is a trapezoidal shape in which the length of the base on the side of the insulating film 1 is shorter than the length of the opposite base, and the insulating film is formed. The angle formed by the base and the side on the 1st side
It is preferably set to 95 to 150 °. The cross-sectional shape of the wiring conductor 2 arranged in the insulating film 1 in the width direction is a trapezoid in which the length of the bottom side on the side of the insulation film 1 is shorter than the length of the opposite bottom side and the bottom side on the side of the insulation film 1 By setting the angle formed with the side edges to be 95 to 150 °, the wiring conductor 2
When the wiring conductor 2 is embedded in the coating layer 6, the wiring conductor 2 can be easily embedded in the coating layer 6 so that the surface of the coating layer 6 after the wiring conductor 2 is embedded can be made substantially flat. It is possible to obtain the multilayer wiring board 4 that does not bite into and deteriorate the insulation. From the viewpoint of embedding air bubbles without biting in, it is preferable that the angle formed by the bottom side and the side side of the insulating film 1 be 95 ° or more.
From the viewpoint of miniaturization, it is preferable that the angle be 150 ° or less.

【0044】また、絶縁フィルム1の層間において、配
線導体2の長さの短い底辺と液晶ポリマー層5との間に
位置する被覆層6の厚みx(μm)が、上下の液晶ポリ
マー層5間の距離をT(μm)、配線導体2の厚みをt
(μm)としたときに、3μm≦0.5T−t≦x≦0.5T
≦35μm(ただし、8μm≦T≦70μm、1μm≦t≦
32μm)であることが好ましい。
In addition, the thickness x (μm) of the coating layer 6 located between the short base of the wiring conductor 2 and the liquid crystal polymer layer 5 between the insulating film 1 is between the upper and lower liquid crystal polymer layers 5. Is T (μm), and the thickness of the wiring conductor 2 is t
(Μm), 3 μm ≦ 0.5T−t ≦ x ≦ 0.5T
≦ 35 μm (however, 8 μm ≦ T ≦ 70 μm, 1 μm ≦ t ≦
32 μm) is preferable.

【0045】液晶ポリマー層5間の距離をT(μm)、
配線導体2の厚みをt(μm)としたときに、配線導体
2の長さの短い底辺と液晶ポリマー層5間の被覆層6の
厚みx(μm)を3μm≦0.5T−t≦x≦0.5T≦35μ
mとすることにより、配線導体2の長さの短い底辺と液
晶ポリマー層5間の距離および配線導体2の長さの長い
底辺と隣接する液晶ポリマー層5間の距離の差をt(μ
m)未満と小さくすることができ、被覆層6の厚みが大
きく異なることから生じる多層配線基板4の反りを防止
することができる。したがって、配線導体2の台形状の
上底側表面と液晶ポリマー層5の間に位置する、被覆層
6の厚みx(μm)を、液晶ポリマー層5間の距離をT
(μm)、配線導体2の厚みをt(μm)としたとき
に、3μm≦0.5T−t≦x≦0.5T≦35μmの範囲とす
ることが好ましい。
The distance between the liquid crystal polymer layers 5 is T (μm),
When the thickness of the wiring conductor 2 is t (μm), the thickness x (μm) of the coating layer 6 between the liquid crystal polymer layer 5 and the short base of the wiring conductor 2 is 3 μm ≦ 0.5T−t ≦ x ≦ 0.5T ≦ 35μ
By setting m, the difference between the distance between the short base of the wiring conductor 2 and the liquid crystal polymer layer 5 and the distance between the long bottom of the wiring conductor 2 and the adjacent liquid crystal polymer layer 5 is t (μ
The thickness can be made smaller than m) and the warp of the multilayer wiring board 4 caused by the large difference in the thickness of the coating layer 6 can be prevented. Therefore, the thickness x (μm) of the coating layer 6 located between the trapezoidal upper bottom surface of the wiring conductor 2 and the liquid crystal polymer layer 5 is set to T
(Μm), where t (μm) is the thickness of the wiring conductor 2, it is preferable that the range is 3 μm ≦ 0.5T−t ≦ x ≦ 0.5T ≦ 35 μm.

【0046】このような配線導体2は、絶縁フィルム1
となる前駆体シートに、公知のフォトレジストを用いた
サブトラクティブ法によりパターン形成した、例えば銅
から成る金属箔を転写法等により被着形成することによ
り形成される。先ず、支持体と成るフィルム上に銅から
成る金属箔を接着剤を介して接着した金属箔転写用フィ
ルムを用意し、次に、フィルム上の金属箔を公知のフォ
トレジストを用いたサブトラクティブ法を使用してパタ
ーン状にエッチングする。この時、パターンの表面側の
側面は、フィルム側の側面に較べてエッチング液に接す
る時間が長いためにエッチングされやすく、パターンの
幅方向の断面形状を台形状とすることができる。なお、
台形の形状は、エッチング液の濃度やエッチング時間を
調整することにより短い底辺と側辺とのなす角度を95〜
150°の台形状とすることができる。そして、この金属
箔転写用フィルムを絶縁フィルム1と成る前駆体シート
に積層し、温度が100〜200℃で圧力が0.5〜10MPaの
条件で10分〜1時間ホットプレスした後、支持体と成る
フィルムを剥離除去して金属箔を絶縁フィルム1と成る
前駆体シート表面に転写させることにより、台形状の上
底側が被覆層6に埋設された配線導体2を形成すること
ができる。
Such a wiring conductor 2 is composed of the insulating film 1
It is formed by depositing a metal foil made of, for example, copper, which is patterned by a subtractive method using a known photoresist, on the precursor sheet to be formed by a transfer method or the like. First, a metal foil transfer film is prepared by adhering a metal foil made of copper on a film serving as a support through an adhesive, and then a metal foil on the film is subjected to a subtractive method using a known photoresist. Is used to etch in a pattern. At this time, the side surface on the surface side of the pattern is more likely to be etched because the side surface on the surface side is in contact with the etching solution for a longer time than the side surface on the film side, and the cross-sectional shape in the width direction of the pattern can be trapezoidal. In addition,
The trapezoidal shape allows the angle between the short base and the side to be adjusted to 95 ~ by adjusting the concentration of the etching solution and the etching time.
It can be trapezoidal at 150 °. Then, this metal foil transfer film is laminated on a precursor sheet to be the insulating film 1, and hot pressed for 10 minutes to 1 hour under the conditions of a temperature of 100 to 200 ° C. and a pressure of 0.5 to 10 MPa, and then becomes a support. By peeling off the film and transferring the metal foil to the surface of the precursor sheet which becomes the insulating film 1, the wiring conductor 2 having the trapezoidal upper bottom side embedded in the coating layer 6 can be formed.

【0047】なお、配線導体2の長さの短い底辺と対向
する液晶ポリマー層5間の被覆層6の厚みx(μm)
は、金属箔転写時のホットプレスの圧力を調整すること
により所望の範囲とすることができる。また、配線導体
2は被覆層6との密着性を高めるためにその表面にバフ
研磨・ブラスト研磨・ブラシ研磨・薬品処理等の処理で
表面を粗化しておくことが好ましい。
The thickness x (μm) of the coating layer 6 between the liquid crystal polymer layers 5 opposed to the short base of the wiring conductor 2 is small.
Can be set to a desired range by adjusting the pressure of the hot press at the time of transferring the metal foil. Further, in order to improve the adhesion to the coating layer 6, it is preferable that the surface of the wiring conductor 2 is roughened by a treatment such as buffing, blasting, brushing, or chemical treatment.

【0048】また、絶縁フィルム1には、直径が20〜15
0μm程度の貫通導体3が形成されている。貫通導体3
は、絶縁フィルム1を挟んで上下に位置する配線導体2
を電気的に接続する機能を有し、絶縁フィルム1にレー
ザにより穿設加工を施すことにより貫通孔を形成した
後、この貫通孔に銅・銀・金・半田等から成る導電性ペ
ーストを従来周知のスクリーン印刷法により埋め込むこ
とにより形成される。
The insulating film 1 has a diameter of 20 to 15
The through conductor 3 having a thickness of about 0 μm is formed. Through conductor 3
Is a wiring conductor 2 located above and below the insulating film 1.
Has a function of electrically connecting to each other, and after forming a through hole by performing a drilling process on the insulating film 1 with a laser, a conductive paste made of copper, silver, gold, solder or the like is conventionally provided in the through hole. It is formed by embedding by a known screen printing method.

【0049】本発明の多層配線基板4によれば、絶縁フ
ィルム1を液晶ポリマー層5の上下面にシアネート樹脂
から成る被覆層6を有したものとしたことから、液晶ポ
リマー層5が高耐熱性・高弾性率・高寸法安定性・低吸
湿性であり、ガラスクロスのような強化材を用いなくと
も絶縁フィルム1を構成することが可能となり、その結
果、レーザによる穿設加工が容易となり微細で均一な貫
通孔を形成できる。
According to the multilayer wiring board 4 of the present invention, since the insulating film 1 has the coating layers 6 made of cyanate resin on the upper and lower surfaces of the liquid crystal polymer layer 5, the liquid crystal polymer layer 5 has high heat resistance.・ High elastic modulus, high dimensional stability, and low hygroscopicity make it possible to construct the insulating film 1 without using a reinforcing material such as glass cloth. As a result, laser drilling is easy and fine processing is possible. It is possible to form uniform through holes.

【0050】このような多層配線基板4は、上述したよ
うな方法で製作した絶縁フィルム1と成る前駆体シート
の所望の位置に貫通導体3を形成した後、パターン形成
した例えば銅の金属箔を、温度が100〜200℃で圧力が0.
5〜10MPaの条件で10分〜1時間ホットプレスして転
写し、これらを積層して最終的に温度が150〜300℃で圧
力が0.5〜10MPaの条件で30分〜24時間ホットプレス
して完全硬化させることにより製作される。
In such a multilayer wiring board 4, a through conductor 3 is formed at a desired position on a precursor sheet to be the insulating film 1 manufactured by the above-described method, and then a patterned metal foil of copper, for example, is formed. , The temperature is 100-200 ℃ and the pressure is 0.
Transfer by hot pressing for 10 minutes to 1 hour under the condition of 5 to 10 MPa, stacking these, and finally hot pressing under the condition of temperature of 150 to 300 ° C and pressure of 0.5 to 10 MPa for 30 minutes to 24 hours. It is manufactured by being completely cured.

【0051】かくして本発明の多層配線基板4によれ
ば、上記構成の多層配線基板4の上面に形成した配線導
体2の一部から成る接続パッド8に半田等の導体バンプ
9を介して半導体素子等の電子部品7を電気的に接続す
るとともに、多層配線基板4の下面に形成した配線導体
2の一部から成る接続パッド8に半田等の導体バンプ9
を形成することにより配線密度が高く絶縁性に優れた混
成集積回路とすることができる。
Thus, according to the multilayer wiring board 4 of the present invention, the semiconductor element is connected to the connection pad 8 formed of a part of the wiring conductor 2 formed on the upper surface of the multilayer wiring board 4 having the above-mentioned structure via the conductive bump 9 such as solder. Etc. while electrically connecting the electronic components 7 such as the above, and the conductor bumps 9 such as solder to the connection pads 8 formed of a part of the wiring conductor 2 formed on the lower surface of the multilayer wiring board 4.
By forming the above, it is possible to obtain a hybrid integrated circuit having a high wiring density and an excellent insulating property.

【0052】なお、本発明の多層配線基板4は上述の実
施例に限定されるものではなく、本発明の要旨を逸脱し
ない範囲であれば種々の変更は可能であり、例えば、上
述の実施例では4層の絶縁フィルム1を積層することに
よって多層配線基板4を製作したが、2層や3層、ある
いは5層以上の絶縁フィルム1を積層して多層配線基板
4を製作してもよい。また、本発明の多層配線基板4の
上下表面に、1層や2層、あるいは3層以上の有機樹脂
を主成分とする絶縁フィルムから成るビルドアップ層や
ソルダーレジスト層10、あるいは、電子部品7を搭載し
た後、電子部品7との間にアンダーフィル材11を形成し
てもよい。
The multi-layer wiring board 4 of the present invention is not limited to the above-mentioned embodiments, but various modifications can be made without departing from the scope of the present invention. Then, the multilayer wiring board 4 is manufactured by laminating the four layers of the insulating film 1, but the multilayer wiring board 4 may be manufactured by laminating two, three, or five or more layers of the insulating film 1. Further, on the upper and lower surfaces of the multilayer wiring board 4 of the present invention, a build-up layer or a solder resist layer 10 made of an insulating film containing one, two, or three or more layers of organic resin as a main component, or the electronic component 7 is provided. After mounting, the underfill material 11 may be formed between it and the electronic component 7.

【0053】[0053]

【発明の効果】本発明の多層配線基板によれば、絶縁フ
ィルムを液晶ポリマー層の上下面にシアネート樹脂から
成る被覆層を形成して成るものとしたことから、シアネ
ート樹脂分子が液晶ポリマー分子ほど剛直でなく、ま
た、規則正しい配向性も示さないことから比較的分子が
動きやすく、その結果、絶縁フィルム同士の密着性が良
好となり、高温バイアス試験においてフィルム間で剥離
して絶縁不良が発生してしまうということはない。ま
た、シアネート樹脂分子が配線導体表面の微細な凹部に
入り込み十分なアンカー効果を発揮することができ、絶
縁フィルムと配線導体との密着性が良好となり、その結
果、高温高湿下で両者間で剥離して配線導体が断線して
しまうということもない。さらに、配線導体の上下面が
同一材料から成る被覆層と接することから、100MHz
以上の高周波信号を伝送する場合、インピーダンスマッ
チングを行なうことが容易であるとともに、高周波信号
の伝播遅延時間が配線導体の上下面で同じであるために
信号に歪を生じて伝送損失が大きくなってしまうという
こともない。
According to the multi-layer wiring board of the present invention, since the insulating film is formed by forming the coating layers of the cyanate resin on the upper and lower surfaces of the liquid crystal polymer layer, the cyanate resin molecules are almost the same as the liquid crystal polymer molecules. Since it is not rigid and does not show a regular orientation, the molecules move relatively easily, and as a result, the adhesion between insulating films is good and peeling occurs between the films in the high temperature bias test, resulting in insulation failure. It doesn't end up. In addition, the cyanate resin molecules can enter the fine recesses on the surface of the wiring conductor and exhibit a sufficient anchoring effect, resulting in good adhesion between the insulating film and the wiring conductor, and as a result, high temperature and high humidity between them. There is no possibility of peeling and breaking of the wiring conductor. Furthermore, since the upper and lower surfaces of the wiring conductor are in contact with the coating layers made of the same material, 100 MHz
When transmitting the above high-frequency signals, it is easy to perform impedance matching, and since the propagation delay time of the high-frequency signals is the same on the upper and lower surfaces of the wiring conductor, the signal is distorted and the transmission loss increases. It doesn't happen.

【0054】また、本発明の多層配線基板によれば、上
記構成において、被覆層に10〜70体積%の無機絶縁粉末
を含有させたことから、被覆層が適度な弾性を有し、そ
の結果、絶縁フィルムを積層しプレスする際に貫通導体
の位置ずれや被覆層の厚みバラツキの少ない接続信頼性
に優れた多層配線基板とすることができる。
Further, according to the multilayer wiring board of the present invention, in the above structure, since the coating layer contains 10 to 70% by volume of the inorganic insulating powder, the coating layer has an appropriate elasticity, and as a result, It is possible to obtain a multi-layer wiring board with excellent connection reliability, in which displacement of the through conductor and variation in the thickness of the coating layer are small when the insulating films are laminated and pressed.

【0055】さらに、本発明の多層配線基板によれば、
上記構成において、液晶ポリマー層の水との接触角を5
〜60°としたことから、液晶ポリマー層の上下面の水素
結合可能な活性基と被覆層とが強い分子間力により良好
に結合することができ、その結果、両者の密着性をさら
に向上させることができる。
Further, according to the multilayer wiring board of the present invention,
In the above structure, the contact angle of the liquid crystal polymer layer with water is 5
Since it is set to -60 °, the active groups capable of hydrogen bonding on the upper and lower surfaces of the liquid crystal polymer layer and the coating layer can be bonded well by a strong intermolecular force, and as a result, the adhesion between them can be further improved. be able to.

【0056】また、本発明の多層配線基板によれば、上
記構成において、絶縁フィルムに配設された配線導体の
幅方向の断面形状を、絶縁フィルム側の底辺の長さが対
向する底辺の長さよりも短い台形状とし、かつ、絶縁フ
ィルム側の底辺と側辺との成す角度を95〜150°とした
ことから、配線導体を被覆層に容易に埋設することがで
きるとともに配線導体を埋設した後の被覆層表面をほぼ
平坦にすることができ、その結果、絶縁フィルムを多層
化する際に絶縁フィルム間に空気をかみ込むことはな
く、絶縁信頼性の高い多層配線基板とすることができ
る。
Further, according to the multilayer wiring board of the present invention, in the above-mentioned structure, the width direction cross-sectional shape of the wiring conductor arranged on the insulating film is determined by the length of the bottom side on which the insulating film side is opposed. Since the trapezoid is shorter than that, and the angle between the bottom side and the side on the insulating film side is 95 to 150 °, the wiring conductor can be easily embedded in the coating layer and the wiring conductor is embedded. The surface of the subsequent coating layer can be made substantially flat, and as a result, air can not be caught between the insulating films when the insulating films are multilayered, and a multilayer wiring board with high insulation reliability can be obtained. .

【0057】さらに、本発明の多層配線基板によれば、
上記構成において、絶縁フィルム間において、配線導体
の長さの短い底辺と液晶ポリマー層との間に位置する被
覆層の厚みx(μm)が、上下の液晶ポリマー層間の距
離をT(μm)、配線導体の厚みをt(μm)としたと
きに、3μm≦0.5T−t≦x≦0.5T≦35μm(ただ
し、8μm≦T≦70μm、1μm≦t≦32μm)とした
ことから、配線導体の長さの短い底辺と液晶ポリマー層
間の距離および配線導体の長さの長い底辺と隣接する液
晶ポリマー層間の距離の差をt(μm)未満と小さくで
き、配線導体周囲の誘電正接バラツキを小さなものとす
ることができ、その結果、伝送特性をさらに向上させる
ことができる。
Further, according to the multilayer wiring board of the present invention,
In the above structure, the thickness x (μm) of the coating layer located between the insulating film and the short base of the wiring conductor and the liquid crystal polymer layer is equal to the distance between the upper and lower liquid crystal polymer layers by T (μm), When the thickness of the wiring conductor is t (μm), 3 μm ≦ 0.5T−t ≦ x ≦ 0.5T ≦ 35 μm (however, 8 μm ≦ T ≦ 70 μm, 1 μm ≦ t ≦ 32 μm). The difference in the distance between the short length bottom and the liquid crystal polymer layer and the distance between the long length wiring conductor and the adjacent liquid crystal polymer layer can be reduced to less than t (μm), and the variation in the dielectric loss tangent around the wiring conductor is small. As a result, the transmission characteristics can be further improved.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の多層配線基板に半導体素子等の電子部
品を搭載して成る混成集積回路の実施の形態の一例を示
す断面図である。
FIG. 1 is a cross-sectional view showing an example of an embodiment of a hybrid integrated circuit in which electronic components such as semiconductor elements are mounted on a multilayer wiring board of the present invention.

【図2】図1に示す多層配線基板の要部拡大断面図であ
る。
FIG. 2 is an enlarged cross-sectional view of a main part of the multilayer wiring board shown in FIG.

【符号の説明】[Explanation of symbols]

1・・・・・絶縁フィルム 2・・・・・配線導体 3・・・・・貫通導体 4・・・・・多層配線基板 5・・・・・液晶ポリマー層 6・・・・・被覆層 T・・・・・上下の液晶ポリマー層間の距離 t・・・・・配線導体の厚み x・・・・・配線導体の長さの短い底辺と液晶ポリマー
層との間に位置する被覆層の厚み
DESCRIPTION OF SYMBOLS 1 ... Insulating film 2 ... Wiring conductor 3 ... Penetrating conductor 4 ... Multilayer wiring substrate 5 ... Liquid crystal polymer layer 6 ... Covering layer T: Distance between upper and lower liquid crystal polymer layers t: Thickness of wiring conductor x: Coating layer located between bottom of wiring conductor having short length and liquid crystal polymer layer Thickness

───────────────────────────────────────────────────── フロントページの続き Fターム(参考) 5E343 AA02 AA16 AA33 AA38 BB05 BB15 BB24 BB66 DD56 DD62 EE42 ER50 ER52 GG01 5E346 AA05 AA06 AA12 AA15 AA32 AA38 AA43 BB01 BB15 CC02 CC08 CC12 CC32 DD02 DD33 EE02 EE06 EE07 EE18 EE19 EE20 EE42 FF18 GG27 GG28 HH07 HH08 HH11    ─────────────────────────────────────────────────── ─── Continued front page    F-term (reference) 5E343 AA02 AA16 AA33 AA38 BB05                       BB15 BB24 BB66 DD56 DD62                       EE42 ER50 ER52 GG01                 5E346 AA05 AA06 AA12 AA15 AA32                       AA38 AA43 BB01 BB15 CC02                       CC08 CC12 CC32 DD02 DD33                       EE02 EE06 EE07 EE18 EE19                       EE20 EE42 FF18 GG27 GG28                       HH07 HH08 HH11

Claims (5)

【特許請求の範囲】[Claims] 【請求項1】 有機材料から成り、上下面の少なくとも
1つの面に金属箔から成る配線導体が配設された複数の
絶縁フィルムを積層して成るとともに、該絶縁フィルム
を挟んで上下に位置する前記配線導体間を前記絶縁フィ
ルムに形成された貫通導体を介して電気的に接続した多
層配線基板であって、前記絶縁フィルムは、液晶ポリマ
ー層の上下面にシアネート樹脂から成る被覆層を形成し
て成ることを特徴とする多層配線基板。
1. A plurality of insulating films, which are made of an organic material and have wiring conductors made of a metal foil disposed on at least one of the upper and lower surfaces, are laminated, and the insulating films are located above and below each other. A multilayer wiring board in which the wiring conductors are electrically connected to each other through a penetrating conductor formed in the insulating film, wherein the insulating film has a coating layer made of a cyanate resin on upper and lower surfaces of a liquid crystal polymer layer. A multilayer wiring board characterized by comprising the following.
【請求項2】 前記被覆層が10〜70体積%の無機絶
縁粉末を含有することを特徴とする請求項1記載の多層
配線基板。
2. The multilayer wiring board according to claim 1, wherein the coating layer contains 10 to 70% by volume of inorganic insulating powder.
【請求項3】 前記液晶ポリマー層は水との接触角が5
〜60°であることを特徴とする請求項1または請求項
2記載の多層配線基板。
3. The liquid crystal polymer layer has a contact angle with water of 5
The multilayer wiring board according to claim 1 or 2, wherein the multilayer wiring board has an angle of -60 °.
【請求項4】 前記絶縁フィルムに配設された配線導体
の幅方向の断面形状は、前記絶縁フィルム側の底辺の長
さが対向する底辺の長さよりも短い台形状であり、か
つ、前記絶縁フィルム側の底辺と側辺との成す角度が9
5〜150°であることを特徴とする請求項1乃至請求
項3のいずれかに記載の多層配線基板。
4. The cross-sectional shape in the width direction of the wiring conductor disposed on the insulating film is a trapezoidal shape in which the length of the base on the side of the insulating film is shorter than the length of the opposite base, and The angle between the bottom side of the film and the side is 9
The multilayer wiring board according to any one of claims 1 to 3, wherein the multilayer wiring board has an angle of 5 to 150 °.
【請求項5】 前記絶縁フィルム間において、前記配線
導体の長さの短い底辺と前記液晶ポリマー層との間に位
置する前記被覆層の厚みx(μm)が、上下の前記液晶
ポリマー層間の距離をT(μm)、前記配線導体の厚み
をt(μm)としたときに、3μm≦0.5T−t≦x
≦0.5T≦35μm(ただし、8μm≦T≦70μ
m、1μm≦t≦32μm)であることを特徴とする請
求項4記載の多層配線基板。
5. The thickness x (μm) of the coating layer located between the insulating film and the short base of the wiring conductor and the liquid crystal polymer layer is a distance between the upper and lower liquid crystal polymer layers. Is T (μm) and the thickness of the wiring conductor is t (μm), 3 μm ≦ 0.5T−t ≦ x
≦ 0.5T ≦ 35μm (however, 8μm ≦ T ≦ 70μ
m, 1 μm ≦ t ≦ 32 μm), The multilayer wiring board according to claim 4, wherein
JP2001353562A 2001-11-19 2001-11-19 Multi-layer wiring board Pending JP2003158379A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2001353562A JP2003158379A (en) 2001-11-19 2001-11-19 Multi-layer wiring board

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2001353562A JP2003158379A (en) 2001-11-19 2001-11-19 Multi-layer wiring board

Publications (1)

Publication Number Publication Date
JP2003158379A true JP2003158379A (en) 2003-05-30

Family

ID=19165559

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2001353562A Pending JP2003158379A (en) 2001-11-19 2001-11-19 Multi-layer wiring board

Country Status (1)

Country Link
JP (1) JP2003158379A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8952270B2 (en) 2009-12-25 2015-02-10 Shinko Electric Industries, Co., Ltd Multilayer wiring board having lands with tapered side surfaces

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8952270B2 (en) 2009-12-25 2015-02-10 Shinko Electric Industries, Co., Ltd Multilayer wiring board having lands with tapered side surfaces

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