JP2003147582A - Continuous wet treatment method and apparatus and liquid sealing method and device - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a continuous wet treatment method and apparatus which can continuously and stably apply a wet treatment to belt-like objects, such as base materials of flexible printed circuit boards, and can suppress the occurrence of flaws on the surfaces of the objects and a liquid sealing method and device for use in this wet treatment. SOLUTION: The sealing device has a sealing vessel 50 which is formed with a slit 54 to be penetrated with the base material 12 in the state of approximately perpendicularly holding its width direction and a pair of sealing rolls 52 which are approximately perpendicularly arranged near the slit 54 on the side wall of the sealing vessel 50 and act to hold the base material 12 between these rolls.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a continuous wet processing method and apparatus for performing wet processing such as plating on a strip-shaped object such as a base material of a flexible printed circuit board, and a liquid sealing method and apparatus for wet processing. .

[0002]

2. Description of the Related Art A flexible printed circuit board used for an IC card or the like is plated in order to electrically connect the mounted elements. As a method for plating a flexible printed circuit board, a single wafer method in which a strip-shaped flexible printed circuit board substrate is cut and immersed in a plating solution has been used. Further, a continuous method has also been used in which the strip-shaped base material itself is continuously immersed in the plating solution.

[0003]

However, in the above-described conventional continuous plating method, since the plating is performed with the board surface of the flexible printed board being horizontal, there are the following inconveniences. That is, the thickness of the formed plating becomes nonuniform on the same surface of the substrate or on the front and back surfaces, and the plating characteristics vary from substrate to substrate.
In addition, a scratch may occur on the surface of the substrate due to the device configuration for feeding the strip-shaped base material into the plating solution. Further, due to the structure of the apparatus, it is difficult to replenish the plating tank with metal that serves as an anode, and it is difficult to clean the plating tank.

An object of the present invention is to continuously and stably subject a strip-shaped object such as a base material of a flexible printed circuit board to wet treatment, and to suppress the occurrence of scratches on the surface of the object. It is an object of the present invention to provide a continuous wet processing method and apparatus, and a liquid sealing method and apparatus during wet processing.

[0005]

Means for Solving the Problems The above object is to provide a side wall having an opening through which a strip member penetrates in a state where the width direction is substantially vertical, and arranged substantially vertically in the vicinity of the opening of the side wall.
This is achieved by a liquid sealing device having a pair of cylindrical members for sandwiching the strip.

Further, in the above liquid sealing device, the pair of cylindrical members may be in contact with the side wall in the vicinity of the opening of the side wall. In addition, in this specification, "contacting" also includes a state of being in close proximity so as to suppress liquid leakage.

Further, in the above liquid sealing device, there is a peripheral wall surrounding the pair of columnar members in the vicinity of the opening of the side wall, and the peripheral wall has the strip member in a state where the width direction is substantially vertical. You may make it the opening part which penetrates.

Further, in the above liquid sealing device, the pair of columnar members have a stepped shape having large diameter portions at upper and lower ends, and the upper and lower ends of the strip are sandwiched by the large diameter portions. You may do it.

In the above liquid sealing device, the cylindrical member holding means for holding the cylindrical member so that the central axis thereof can be rotated and the rotational axis can be moved in the horizontal direction. May be further provided.

Further, in the above liquid sealing device, the side wall is a side wall of a liquid tank filled with liquid, and the pair of columnar members are arranged inside the liquid tank and filled in the liquid tank. The pair of columnar members may be in contact with the side wall and the strip by the liquid pressure of the liquid to be applied, thereby suppressing liquid leakage from the opening.

Further, the above object is to arrange a first side wall in which an opening for penetrating a strip is formed in a state where the width direction is substantially vertical, and to arrange the first side wall in the vicinity of the opening substantially vertically. And a pair of first columnar members for sandwiching the strip and an opening through which the strip is disposed in a state where the strip is arranged so as to face the first side wall and the width direction is substantially vertical. A second side wall and a pair of second side walls arranged substantially vertically in the vicinity of the opening of the second side wall and for sandwiching the strip.
And a columnar member.

[0012] Further, the above object is to provide a first side wall having a first opening through which a strip penetrates in a state where the width direction is substantially vertical, and a first side wall facing the first side wall. A second side wall having a second opening through which the strip penetrates in a substantially vertical state, and a liquid tank filled with a liquid for performing a predetermined process on the strip, The first in the liquid tank
A pair of first columnar members, which are arranged substantially vertically in the vicinity of the first opening of the side wall of the liquid crystal, for sandwiching the strip, and the second opening of the second side wall in the liquid tank. A pair of second members arranged substantially vertically in the vicinity of the portion for sandwiching the strip member.
Continuous columnar member, and a strip material moving means for continuously moving the strip material in the longitudinal direction from the facing first opening portion to the second opening portion. Achieved by

In the above continuous wet processing apparatus,
The first cylindrical member is in contact with the first side wall in the vicinity of the first opening of the first side wall, and the second columnar member is in the vicinity of the second opening of the second side wall. A cylindrical member may be in contact with the second side wall.

In the above continuous wet processing apparatus,
A first peripheral wall surrounding the first columnar member near the first opening of the first side wall, and the second columnar member near the second opening of the second side wall. And a second peripheral wall that surrounds the first peripheral wall, wherein the first peripheral wall is formed with a third opening through which the strip extends in a state where the width direction is substantially vertical.
A fourth opening may be formed in the second peripheral wall so that the strip penetrates in a state where the width direction is substantially vertical.

Further, in the above continuous wet processing apparatus,
The first columnar member and / or the second columnar member is a stepped shape having large diameter portions at the upper end and the lower end,
The upper and lower ends of the strip may be sandwiched by the large diameter portion.

Further, in the above continuous wet processing apparatus,
The strip may be a base material of a flexible printed circuit board. A flexible printed circuit board may be manufactured by the continuous wet processing apparatus.

Further, the above object is a liquid sealing method which is formed on a side wall of a liquid tank filled with liquid and which suppresses liquid leakage from an opening through which a strip material penetrates in a state where the width direction is substantially vertical. In the vicinity of the opening of the side wall in the liquid tank, a pair of columnar members are arranged substantially vertically to sandwich the strip, and when the liquid tank is filled with liquid, the pair of cylindrical members is hydraulically pressured. The liquid sealing method is characterized in that the cylindrical member is in contact with the side wall and the strip to suppress liquid leakage from the opening.

Further, the above object is to provide a first side wall having a first opening through which a strip penetrates in a state where the width direction is substantially vertical, and a first side wall facing the first side wall. In a liquid tank having a second side wall in which a second opening through which the strip is formed is formed in a substantially vertical state, and which is filled with a liquid for performing a predetermined process on the strip, A continuous wet processing method for performing the predetermined treatment on the strip material by continuously moving the strip material in the longitudinal direction from the facing first opening portion to the second opening portion, A pair of first columnar members are arranged substantially vertically in the vicinity of the first opening of the first side wall in the liquid tank to sandwich the strip, and the second side wall in the liquid tank. A pair of second columnar members are arranged substantially vertically in the vicinity of the second opening, and the strip member is sandwiched therebetween, When the liquid tank is filled with liquid, the first columnar member is brought into contact with the first side wall and the strip by hydraulic pressure, and the second columnar member is brought into contact with the second side wall and the strip. This can be achieved by a continuous wet processing method characterized by suppressing liquid leakage from the liquid tank by contacting the material.

[0019]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS A continuous wet processing method and apparatus according to an embodiment of the present invention will be described with reference to FIGS. FIG. 1 is a top view showing the structure of the continuous wet processing apparatus according to the present embodiment, FIG. 2 is a schematic view showing the structure of a power supply roll unit in the continuous wet processing apparatus according to the present embodiment, and FIG. 3 is a plating tank. It is a schematic diagram showing a structure, FIG. 4 is a schematic diagram showing a structure of a seal roll of a liquid sealing device, FIG. 5 is a diagram explaining a liquid leakage prevention mechanism of the liquid sealing device, and FIGS. 6 and 7 are It is the schematic which shows the other example of the structure of the seal roll of a liquid sealing device, and FIG. 8 is sectional drawing which shows the structure of a plating tank.

The continuous wet processing method and apparatus according to the present embodiment is for subjecting a strip-shaped object to be plated to electrolytic copper plating.

[1] Continuous Wet Treatment Apparatus First, the continuous wet treatment apparatus according to the present embodiment is shown in FIG.
It will be described with reference to FIGS.

The continuous wet processing apparatus according to the present embodiment, as shown in FIG. 1, is a plating processing unit 1 in which plating processing is performed.
0, a base material unwinding portion 14 that continuously feeds the strip-shaped base material 12 to be plated to the plating processing portion 10, and a base that continuously recovers the base material 12 plated in the plating processing portion 10. The material winding unit 16 is provided.

The substrate unwinding section 14 is provided with an uncoiler 18 for feeding the coiled strip-shaped substrate 12 in the longitudinal direction with its width direction substantially vertical and introducing it into the plating treatment section 10. ing. An accumulator 20 is provided between the uncoiler 18 and the plating unit 10 to keep the tension of the substrate 12 sent from the uncoiler 18 constant.

The plating processing section 10 has a plurality of plating tanks 22a, 22b, 22c and 22d filled with a plating solution. Each plating tank 22a, 22b, 22c, 22d
Are provided with liquid sealing devices 24 on the opposite side walls, respectively.
2 is a plating tank 22a, 22b, 2 with the width direction substantially vertical
It is designed to be introduced into 2c and 22d. Base material 1 introduced into plating tanks 22a, 22b, 22c, 22d
2 is led out to the outside of the plating tanks 22a, 22b, 22c and 22d through the liquid sealing device 24 on the other side wall as it is.

The base material lead-out side of the plating tank 22b and the plating tank 2
In the vicinity of the base material introduction side of 2c, the U-turn part 26 for redirecting the base material 12 led out from the liquid sealing device 24 of the plating tank 22b and introducing it into the plating tank 22c via the liquid sealing device 24. Is provided.

Each plating tank 22a, 22b, 22c, 22
A power supply roll unit 28 for supplying power to the base material 12 is provided near the liquid sealing device 24 on the base material introduction side and the base material discharge side of d.

A pretreatment tank 30 is provided between the base material introduction side of the plating tank 22a and the base material unwinding portion 14 for removing dirt on the base material 12 fed from the substrate unwinding portion 14. ing. As for the pretreatment tank 30, the plating tank 22
A liquid sealing device (not shown) similar to a, 22b, 22c, 22d is provided.

A washing chamber 32 for shower-washing the plated substrate 12 is provided near the liquid sealing device 24 on the substrate outlet side of the plating tank 22d. In the vicinity of the cleaning chamber 32, a drying chamber 34 for drying the base material 12 cleaned in the cleaning chamber with hot air is provided.

In the vicinity of the drying chamber 34, a substrate winding section 16 for winding and collecting the substrate 12 dried in the drying chamber 34.
Are arranged.

The base material winding portion 16 includes a plating treatment portion 1
There is provided a recoiler 36 for winding up and collecting the base material 12 which is plated by 0 and is sent out in a substantially vertical direction in the width direction. A drive device 38 for feeding the base material 12 to the recoiler 36 at a predetermined speed is provided between the recoiler 36 and the drying chamber 34 of the plating unit 10.

Thus, the base material 12 is fed from the base material unwinding portion 14 in the longitudinal direction with its width direction being substantially vertical.
Is the pretreatment tank 30 and the plating tank 22 of the plating processing unit 10.
a, 22b, 22c, 22d, cleaning chamber 32, drying chamber 34
It is configured to be sequentially collected by the base material winding unit 16 after passing through.

As described above, the continuous wet processing apparatus according to the present embodiment has the strip-shaped base material 12 which is the object of the plating processing.
However, the plating tanks 22a, 22b, 22c, 22d are arranged in the longitudinal direction with the width direction thereof substantially vertical through the liquid sealing device 24.
It passes through. And the liquid sealing device 24
However, the main feature is to effectively reduce the leakage of the plating solution from the plating tanks 22a, 22b, 22c, 22d. Details of the mechanism of the liquid sealing device 24 will be described later.

Next, the object of the plating process by the continuous wet processing apparatus according to the present embodiment and each component of the continuous wet processing apparatus according to the present embodiment will be described in detail.

(1) Substrate 12 The substrate 12 is a wide strip material such as a substrate of a flexible printed circuit board having a width of 250 mm and a thickness of 25 μm, and a strip having a length of, for example, about 50 meters. Is. Such a base material 12 is set in the uncoiler 18 of the base material unwinding part 14 in a state of being wound in a coil shape.

(2) Base material unwinding section 14 The uncoiler 18 is a strip-shaped base material 1 wound in a coil shape.
2, with its width direction substantially vertical, and sending it out in the longitudinal direction,
It is introduced into the plating processing section 10.

The accumulator 20 includes an uncoiler 18
The tension of the base material 12 sent out from is kept constant to prevent the sent base material 12 from being bent and damaged or the surface being scratched. In addition, the accumulation device 20
As a result, it is possible to increase the time required to replace the coil-shaped substrate 12 sent by the uncoiler 18, and the substrate 12 can be easily replaced.

(3) Plating Processing Section 10 (a) Pretreatment Bath 30 The pretreatment bath 30 is for cleaning the surface of the base material 12 by etching or the like before performing the plating treatment. Is filled with such a chemical solution for surface treatment. Further, the pretreatment bath 30 includes plating baths 22a, 22 to be described later.
It has a liquid sealing device similar to the liquid sealing device 24 of b, 22c and 22d. Substrate 1 through this liquid sealing device
2 passes through the inside of the pretreatment tank 30 in a state where the width direction is substantially vertical, so that a predetermined pretreatment is performed before the plating treatment.

(B) Power Supply Roll Unit 28 The power supply roll unit 28 will be described with reference to FIG. Figure 2
FIG. 2A is a top view showing the structure of the power feeding roll unit, and FIG.
2B is a sectional view taken along the line AA ′ of FIG.

The power feeding roll unit 28 is constructed so that the base material 12 fed out with its width direction substantially vertical is sandwiched by three rolls 42 which are not driven and can rotate freely. A rotary connector 44 is connected to the upper end of each roll 42, and is electrically connected even when the roll 42 is rotated so that power can be supplied to the base material 12. To prevent sparks, each roll 42 is always wet by washing with water during power supply.

Since each roll 42 rotates, the base material 12 sandwiched between these rolls is fed out while being supplied with power. Here, although the rolls 42 themselves are not driven, they freely rotate in accordance with the passing speed of the base material 12, so that a speed error does not occur in the sent base material 12 and the occurrence of scratches by the rolls 42 is suppressed. You can

Further, the power feeding roll section 28 has a meandering correction device (EPC, Ed) for correcting the meandering of the substrate 12 sent out.
ge Position Controller) (not shown). The EPC has a sensor that detects the edge of the base material 12, and when the base material 12 meanders in the vertical direction, the sensor detects the amount of deviation. Based on this deviation amount, the EPC tilts the roll 42 so as to correct the meandering.

The power supply roll section 28 is used for each plating tank 2
2a, 22b, 22c and 22d are provided in the vicinity of the liquid sealing device 24 on both sides of the base material introduction side and the base material introduction side. The power supply roll unit 28 is used for each plating tank 22a, 22b,
Since it is provided outside 22c and 22d, the influence of the power supply roll portion 28 does not affect the quality of plating formed on the base material 12. That is, the plating tanks 22a, 22
When the power feeding roll portion 28 is provided in the rolls b, 22c, 22d, the surface of the roll 42 is also plated.
Therefore, the diameter of the roll 42 becomes thicker,
Since the surface condition is rough, the base material 12 is adversely affected. The power supply roll unit 28 is connected to each plating tank 22a, 22b, 2
By providing it outside of 2c and 22d, such an adverse effect can be avoided.

(C) Plating tanks 22a, 22b, 22c,
22d Plating tanks 22a, 22b, 22c and 22d are shown in FIG.
It will be described with reference to FIGS. 3 (a) is a top view showing the structure of the plating tank, and FIG. 3 (b) is A- of FIG. 3 (a).
It is an A'line sectional view. FIG. 4 is a schematic view showing the structure of the seal roll of the liquid sealing device, FIG. 5 is a view for explaining the liquid leakage prevention mechanism of the liquid sealing device, and FIGS. 6 and 7 are the structures of the seal roll of the liquid sealing device. It is the schematic which shows the other example. Although the plating tank 22a is described here as an example, the other plating tanks 22b, 22c, and 22d have the same structure and function as the plating tank 22a shown in FIG.

As shown in FIG. 3A, a slit 48 having a width that allows the base material 12 to pass therethrough is provided in a substantially vertical direction on the opposing side walls 46 of the plating tank 22a where the liquid sealing device 24 is provided. Has been.

The liquid sealing device 24 comprises a seal tank 50 provided so as to surround the slit 48, and two seal rolls 52 accommodated in the seal tank 50.
A slit 54 having a width that allows the base material 12 to pass therethrough is provided on the side wall of the sealing tank 50 facing the slit 48 of the plating tank 22a, like the slit 48. Also,
The vicinity of the liquid sealing device 24 is a compartment for collecting the plating liquid leaked from the liquid sealing device 24, and a drain port 58 is provided at the bottom. The plating solution recovered from the drainage port 58 is returned to the plating tank 22a by a pump (not shown) and circulated.

The seal roll 52 in the seal tank 50 is, for example, a hollow pipe-shaped rigid body made of a resin such as polyvinyl chloride or Teflon (registered trademark). FIG. 4 is a sectional view showing the structure of the seal roll housed in the seal tank 50. As shown in the figure, at the bottom inside the seal roll 52,
A weight 60 is provided to stabilize the posture of the seal roll 52.

Recesses 62a and 62b are provided at the central portions of the lower end and the upper end of the sheet roll 52. The recess 62a at the lower end is provided with a protrusion 64 provided at the bottom of the seal tank 50.
a is fitted. Further, a convex portion 64b fixed to the upper portion of the seal tank 50 is fitted into the recess 62b at the upper end. These recesses 62a and 62b and convex portions 64a and 64b
An appropriate gap is provided as a play for fitting with. In this way, the seal roll 52 is prevented from falling in the seal tank 50, and the rotation center axis can move in the horizontal direction.

When plating is performed, as shown in FIG. 3A, one slit 54, the space between the two seal rolls 52 described above, and the slit 48 are sequentially passed through the base material 12 in the width direction. It is introduced into the plating tank 22a in a substantially vertical state. Then, the other slit 48, the space between the two seal rolls 52 described above, and the slit 54 are sequentially passed to lead the base material 12 out of the plating tank 22a in a state where the width direction is vertical.

Here, the mechanism for preventing the liquid leakage of the plating liquid from the plating tank 22a by the liquid sealing device 24 will be described with reference to FIG. FIG. 5 is a top view of the vicinity of the liquid sealing device on the substrate introduction side of FIG.

When the plating of the base material 12 is started, first, before the plating bath 22a is filled with the plating solution, the base material 12 is
Is installed so as to be sandwiched between two seal rolls 52.

Next, when the plating bath 22a is filled with the plating liquid, the sealing bath 50 is also filled with the plating liquid through the slit 48. Then, as shown in FIG. 5, the seal roll 52 is automatically moved to the substrate 12 by the liquid pressure of the plating solution.
Then, the seal roll 52 is pressed against the side wall of the seal tank 50 where the slit 54 is provided.

As described above, the base material 12 and the seal roll 52 are in close contact with each other, and the seal roll 52 and the side wall of the seal tank 50 where the slit 54 is provided are in close contact with each other. As a result, the slit 54 of the sealing tank 50 is sealed, and leakage of the plating solution in the plating tank 22a from the slit 54 can be sufficiently suppressed. Also, two seal rolls 5
Since the liquid pressure of the plating solution is evenly applied to 2, the central position of the base material 12 sandwiched between the two seal rolls 52 can be maintained, and the base material 12 does not bend.

Since the base material 12 is only sandwiched between the seal rolls 52 by the hydraulic pressure, the load applied to the base material 12 is small. Since the load on the liquid sealing device 24 is small as described above, the base material 12 is continuously and stably stable.
It is possible to pass through the inside of a, and at that time, generation of scratches on the surface of the base material 12 and deformation of the base material 12 can be suppressed.

As described above, when the plating solution is filled, the base material introduction side and the base material introduction side of the plating tank 22a are effectively sealed by the liquid sealing device 24.

Further, the structure of the seal roll 52 used in the liquid sealing device 24 may be other structure.

For example, as shown in FIG. 6, the stepped seal roll 52 has a large diameter portion 66 in which the diameter near the upper end and the lower end of the seal roll 52 is increased. 2 like this
You may make it hold down the upper end and lower end of the base material 12 by the large diameter part 66 of the book seal roll 52. This allows
Since the seal roll 52 does not come into contact with anything other than the lower end and the upper end of the base material 12, the occurrence of scratches on the surface of the base material 12 can be prevented. In this case, the slit 5
Although the plating solution leaks from No. 4, the amount of the plating solution leaking from the slit 54 can be adjusted by adjusting the size of the large diameter portion 66.

The seal roll 52 may have a rotatable structure. For example, as shown in FIG. 7, instead of the protrusions 64a and 64b for preventing fall, a conical piece 68a,
68b holds the seal roll 52 by sandwiching it from above and below. By doing so, the base material 12 becomes the seal roll 52.
Since the seal roll 52 rotates while passing through the gap, the frictional resistance between the base material 12 and the seal roll 52 is reduced. Accordingly, it is possible to suppress the occurrence of scratches on the surface of the base material 12.

Next, other components of the plating tank 22a will be described with reference to FIGS. 8 is shown in FIG.
It is a BB 'sectional view taken on the line of (a).

An anode basket 70 is provided near the side wall of the plating tank 22a where the liquid sealing device 24 is not provided, as shown in FIGS. 3 (a) and 8.
In the anode basket 70, for example, copper balls are accommodated as an anode for electroplating. The anode can be replenished from directly above the plating tank 22a.
At this time, in the plating tank 22a, as shown in FIG. 3A, the base material 12 is in a state in which the width direction is substantially vertical. Therefore, the anode can be easily replenished into the plating tank 22a without the base material 12 getting in the way. The anode metal accommodated in the anode basket can be appropriately selected according to the type of plating.

Further, in order to prevent shaking of the base material 12 sent in the plating tank 22a in a state where the base material 12 is substantially vertical in the width direction, as shown in FIGS. 3 (a) and 3 (b). As described above, the plurality of glass rods 72 arranged in the substantially vertical direction along the width direction are provided on both sides of the base material 12. This allows the base material 12 to stably pass through the plating tank 22a in a state where the width direction is substantially vertical.

In the plating tank 22a, as shown in FIG. 8, the base material 12 is passed with the width direction thereof being substantially vertical.
An edge cover 74 is provided to shield the upper end and the lower end from both sides. The edge cover 74 is attached to a holding plate 75 for adjusting the distance to the base material 12. As a result, it is possible to prevent thick plating from being formed on the upper and lower end surfaces of the base material 12.
It is possible to uniformly coat the entire surface of the. In addition, the width of the upper end and the lower end of the base material 12 shielded by the edge cover 74 can be appropriately adjusted according to the plating state.

An air inlet 76 is provided at the bottom of the plating tank 22a, as shown in FIG. By introducing air from the air introduction port 76, the plating solution in the plating tank 22a can be stirred. Thereby, the surface of the base material 12 can be plated more uniformly.

During maintenance, the plating tank 22
The plating solution can be completely drained from a and the inside of the bath can be easily cleaned.

(D) U-turn section 26 The U-turn section 26 has two rolls which are rotationally driven. By rotating these and sending the base material 12, the base material 1 led out from the liquid sealing device 24 of the plating tank 22b.
2 can be turned into a U shape and introduced into the plating tank 22c through the liquid sealing device 24. Thus, U
From the plating tank 22b to the plating tank 22 via the turn portion 26
By sending the base material 12 to c, the area of the place required to install the device can be reduced. In addition, in order to prevent the base material 12 from being dried, the U-turn portion 26 includes the base material 12
There is provided a shower (not shown) for spraying water or a predetermined solution.

(E) Washing chamber 32, drying chamber 34 The washing chamber 32 is provided with a shower (not shown) for spraying pure water or the like. By spraying pure water or the like onto the base material 12 with a shower, the plating tanks 22a, 22a
The base material 12 having the surface plated can be washed by sequentially passing through b, 22c and 22d.

A dryer (not shown) for generating hot air is provided in the drying chamber 34, and the substrate 12 washed in the washing chamber 32 can be dried with hot air.

(3) Substrate winding unit 16 The drive unit 38 feeds the substrate 12 after the plating treatment dried in the drying chamber 34 to the recoiler 36 at a constant speed. For example, the drive device 38 pulls the base material 12 with a rotating rubber roll to feed the base material 12 at a constant speed.

The recoiler 36 winds up and collects the base material 12 sent out from the drive device 38 with its width direction substantially vertical.

The base material winding section 16 may be provided with a slitter (cutting device) which cuts the recovered base material 12 after the plating treatment into a predetermined length according to the subsequent steps.

[2] Continuous Wet Treatment Method Next, the continuous wet treatment method according to the present embodiment will be described with reference to FIG.
It will be described with reference to FIGS.

First, the plating tanks 22a, 22b, 22c,
Before filling the inside of 22d with the plating solution, the strip-shaped substrate 12 to be plated is set in a continuous wet processing apparatus. That is, the coiled base material 12 is set on the uncoiler 18. Next, the base material 12 is sent out from the uncoiler 18 in the longitudinal direction in a state where the width direction is substantially vertical and is introduced into the plating processing section 10 via the accumulation device 20.

In the plating processing section 10, the base material 12 is treated with a pretreatment tank 30, plating tanks 22a, 22b, 22c, 22d, and
The cleaning chamber 32 and the drying chamber 34 are set so as to sequentially pass therethrough.

In the plating tank 22a, the base material 12 is introduced into the plating tank 22a through the slit 54 of the liquid sealing device 24 on the base material introduction side, the two seal rolls 52, and the slit 48 of the side wall 46. Then, the plating tank 2 passes through the slit 54 between the slit 48 of the side wall 46 on the substrate lead-out side and the two seal rolls 52 of the liquid sealing device 24 facing each other.
Lead out of 2a. Base material 1 led out of the plating bath 22a
2 is similarly passed into the plating tank 22b, and then the base material 12 is placed in the plating tanks 22c and 22d via the U-turn portion 26.
Pass through. At this time, in the power feeding roll unit 28,
The base material 12 is sandwiched by the rolls 42 as shown in FIG. 2, and the rolls 42 are brought into contact with the base material 12.

The plating baths 22a, 22b, 22c,
A 22d anode basket 70 accommodates, for example, a copper ball as an anode. After the start of the plating process, it is desirable that the anode basket 70 be replenished with copper balls from immediately above the plating tank as the copper balls decrease.

After the base material 12 that has passed through the plating tank 22d is successively passed through the cleaning chamber 32 and the drying chamber 34, the end of the base material 12 is transferred to the recoiler 36 via the drive device 38 of the base material winding section 16. Install the section. In this way, the base material 12 can be wound up by the recoiler 36.

As described above, the introduction of the base material 12 into the continuous wet processing apparatus is completed.

Next, each plating tank 22a, 22b, 22
Fill the plating solution into c and 22d. At this time, the liquid leakage is effectively suppressed by the seal roll 52 of each liquid sealing device 24.

Each plating tank 22a, 22b, 22c, 22
After d is filled with a predetermined amount of plating solution, electroplating of the base material 12 is started.

First, the substrate 12 is fed by the power feeding rolls 28.
To start power supply to.

Next, the substrate 12 by the uncoiler 18
And the winding of the base material 12 by the recoiler 36 is started. At this time, the tension of the base material 12 is adjusted by the accumulation device 20 and the feed speed of the base material 12 is adjusted by the drive device 38, if necessary.

Thus, the base material 12 is fed in the longitudinal direction while the width direction is substantially vertical, and the plating treatment part 10 is carried out.
In the above, after being cleaned in the pretreatment tank 30, plating is performed in each of the plating tanks 22a, 22b, 22c and 22d. The plated substrate 12 is washed in the washing chamber 32 and dried in the drying chamber 34.

The base material 12 plated in the plating processing section 10 is successively wound into a coil by the recoiler 36 of the base material winding section 16.

Thus, the base material 12 is continuously plated while being fed in the longitudinal direction with the width direction of the base material 12 being substantially vertical.

As described above, according to the present embodiment, the strip-shaped base material 12 is formed through the liquid sealing device 24 having the two seal rolls 52 which sandwich the base material 12 by hydraulic pressure in the vicinity of the slit 54. The plating baths 22a, 22b, 22 are continuously fed in the longitudinal direction with the width direction being substantially vertical.
Since the plating is performed by passing through the inside of c and 22d, the base material 12
Can be uniformly plated, and the occurrence of scratches on the surface of the base material 12 can be suppressed. Also, the plating tank 22
Since the base material 12 passes through the insides of a, 22b, 22c, and 22d in the longitudinal direction with the width direction being substantially vertical, it is possible to easily replenish the metal serving as the anode from directly above the tank. It is possible to improve the property.

[Modified Embodiments] Various modifications are possible without being limited to the above-mentioned embodiments of the present invention.

For example, in the above embodiment, one liquid seal device 24 is provided on each of the base material introduction side and the base material discharge side of the plating tank. However, a plurality of liquid seal devices 24 may be provided. 9A is a top view showing the structure when the liquid sealing device 24 has two stages, and FIG. 9B is a sectional view taken along the line AA ′ of FIG. 9A.

As shown in FIG. 9, the liquid sealing device 24 is further provided on the slit 54 side of the liquid sealing device 24 provided in the plating tank 22a. As a result, the plating tank 22a
Since the liquid sealing device 24 further suppresses the leakage of the plating liquid from the liquid sealing device 24 provided in the above, the plating tank 22a can be effectively sealed.

Further, in the above embodiment, the substrate 12 was subjected to the plating treatment, but the liquid sealing device 24 can be applied to a treatment tank for performing other wet treatment.

In the above embodiment, the seal roll 52 is housed in the seal tank 50.
Alternatively, the two seal rolls 52 may be arranged directly in the plating tank in the vicinity of the slit 48 to sandwich the substrate 12 passing through the slit 48.

Further, in the above embodiment, the seal roll 5
Although 2 is a hollow pipe made of resin such as polyvinyl chloride or Teflon, it is not limited to this. For example, the seal roll 52 may be made of metal, or may be cylindrical instead of hollow pipe.

Further, in the above embodiment, the U-turn portion 26
Although the feeding direction of the substrate 12 is changed by the above, the angle of the changing direction may be changed according to the space of the installation location of the continuous wet processing apparatus and the like. Further, the plating tanks 22a, 22b, 22c, 22d may be arranged in a straight line without providing the U-turn portion 26.

[0092]

As described above, according to the present invention, the liquid leakage from the opening formed on the side wall of the liquid tank filled with the liquid and having the width direction substantially vertical is suppressed. In the liquid sealing method, a pair of columnar members are arranged substantially vertically in the vicinity of the opening of the side wall in the liquid tank to sandwich the strip, and when the liquid tank is filled with the liquid, a pair of columnar members is formed by hydraulic pressure. Since the member is in contact with the side wall and the strip, it is possible to suppress liquid leakage from the opening of the side wall of the liquid tank.

According to the present invention, the first side wall having the first opening through which the strip penetrates is formed in a state where the width direction is substantially vertical, and the first side wall is opposed to the first side wall. A second opening in which the strip is penetrated in a state in which the strip is substantially vertical
And a side wall of the strip, and the strip is filled with a liquid for performing a predetermined treatment on the strip, the strip is continuously moved in the longitudinal direction from the first opening to the second opening facing each other. By doing so, in the continuous wet processing method of performing a predetermined treatment on the strip material, the pair of first columnar members are arranged substantially vertically in the vicinity of the first opening of the first side wall in the liquid tank. Then, the strip is sandwiched, and near the second opening of the second side wall in the liquid tank,
When the pair of second columnar members are arranged substantially vertically and the strip is sandwiched and the liquid tank is filled with the liquid, the first pressure is applied to the first member by the liquid pressure.
Since the columnar member contacts the first side wall and the strip, and the second columnar member contacts the second side wall and the strip, liquid leakage from the liquid tank can be suppressed and continuously stable. Then, the strip material can be subjected to a predetermined treatment, and the occurrence of scratches on the surface of the strip material can be suppressed.

[Brief description of drawings]

FIG. 1 is a top view showing the structure of a continuous wet processing apparatus according to an embodiment of the present invention.

FIG. 2 is a schematic view showing a structure of a power feeding roll unit in a continuous wet processing apparatus according to an embodiment of the present invention.

FIG. 3 is a schematic view showing a structure of a plating tank in a continuous wet processing apparatus according to an embodiment of the present invention.

FIG. 4 is a schematic view showing a structure of a seal roll of a liquid sealing device in a continuous wet processing apparatus according to an embodiment of the present invention.

FIG. 5 is a diagram illustrating a liquid leakage prevention mechanism of the liquid sealing device in the continuous wet processing apparatus according to the embodiment of the present invention.

FIG. 6 is a schematic view showing another example (No. 1) of the structure of the seal roll of the liquid sealing device in the continuous wet processing apparatus according to the embodiment of the present invention.

FIG. 7 is a schematic view showing another example (No. 2) of the structure of the seal roll of the liquid sealing device in the continuous wet processing apparatus according to the embodiment of the present invention.

FIG. 8 is a sectional view showing a structure of a plating tank in the continuous wet processing apparatus according to the embodiment of the present invention.

FIG. 9 is a schematic view showing a structure of a liquid sealing device in a continuous wet processing apparatus according to a modified example of the embodiment of the present invention.

[Explanation of symbols] 10 ... Plating processing section 12 ... Base material 14 ... Base material unwinding section 16 ... Base material winding section 18 ... Uncoiler 20 ... Accumulator 22a, 22b, 22c, 22d ... Plating tank 24 ... Liquid sealing device 26 ... U-turn section 28 ... Power supply roll section 30 ... Pretreatment tank 32 ... Washing room 34 ... Drying room 36 ... Recoiler 38 ... Drive device 42 ... roll 44 ... Rotary connector 46 ... Side wall 48 ... slit 50 ... Seal tank 52 ... Seal roll 54 ... Slit 58 ... Drainage port 60 ... weight 62a, 62b ... dents 64a, 62b ... Convex portion 66 ... Large diameter part 68a, 68b ... Conical coma 70 ... Anode basket 72 ... Glass rod 74 ... Edge cover 75 ... Holding plate

Claims (11)

[Claims] 1. A side wall formed with an opening through which a strip penetrates in a state where the width direction is substantially vertical, and a pair arranged substantially vertically near the opening of the side wall for sandwiching the strip. And a columnar member. 2. The liquid sealing device according to claim 1, wherein the pair of columnar members are in contact with the side wall in the vicinity of the opening of the side wall. 3. The liquid sealing device according to claim 1, wherein the pair of cylindrical members have a stepped shape having a large diameter portion at an upper end and a lower end, and the pair of cylindrical members are formed by the large diameter portion. A liquid sealing device having an upper end and a lower end sandwiched therebetween. 4. The liquid sealing device according to claim 1, wherein the cylindrical member can rotate about a central axis of the cylindrical member, and the rotating shaft is in a horizontal direction. A liquid sealing device further comprising a cylindrical member holding means for holding the cylindrical member so that the liquid sealing device can be moved. 5. The liquid sealing device according to claim 1, wherein the side wall is a side wall of a liquid tank filled with a liquid, and the pair of columnar members are provided in the liquid tank. The pair of cylindrical members are disposed inside, and the pair of columnar members are in contact with the side wall and the strip by the liquid pressure of the liquid filled in the liquid tank, thereby suppressing liquid leakage from the opening. Liquid sealing device. 6. A first side wall having a first opening through which a strip penetrates in a state where the width direction is substantially vertical, and the first side wall.
A second side wall facing the side wall of the strip and having a second opening through which the strip penetrates in a state where the width direction is substantially vertical, and for performing a predetermined treatment on the strip. A liquid tank filled with the liquid, and a pair of first columnar members arranged substantially vertically in the vicinity of the first opening of the first side wall in the liquid tank and for sandwiching the strip. A pair of second columnar members arranged substantially vertically in the vicinity of the second opening of the second side wall in the liquid tank, for sandwiching the strip, and the first opening facing each other And a strip moving means for continuously moving the strip in the longitudinal direction from the section to the second opening. 7. The continuous wet processing apparatus according to claim 6, wherein the first columnar member is in contact with the first side wall in the vicinity of the first opening of the first side wall, and A continuous wet processing apparatus, wherein the second columnar member is in contact with the second side wall in the vicinity of the second opening of the second side wall. 8. The continuous wet processing apparatus according to claim 6, wherein the first columnar member and / or the second columnar member has a stepped shape having large diameter portions at upper and lower ends. And
A continuous wet processing apparatus, wherein the upper and lower ends of the strip are sandwiched by the large diameter portion. 9. The continuous wet processing apparatus according to claim 6, wherein the strip is a base material of a flexible printed circuit board. 10. A liquid sealing method, which is formed on a side wall of a liquid tank filled with liquid and suppresses liquid leakage from an opening through which a strip material penetrates in a state where the width direction is substantially vertical, In the vicinity of the opening of the side wall inside, a pair of columnar members are arranged substantially vertically to sandwich the strip, and when the liquid tank is filled with liquid, the pair of columnar members are hydraulically moved. A liquid sealing method, wherein liquid leakage from the opening is suppressed by contacting the side wall and the strip. 11. A first side wall in which a first opening through which a strip penetrates is formed in a state where the width direction is substantially vertical, and a first side wall facing the first side wall, and the width direction is substantially vertical. A second side wall in which a second opening is formed through which the strip penetrates in a state, and a second tank facing the strip is filled with a liquid for performing a predetermined treatment on the strip. In the continuous wet treatment method of performing the predetermined treatment on the strip by continuously moving the strip from the first opening to the second opening in the longitudinal direction, In the vicinity of the first opening of the first side wall, a pair of first cylindrical members are arranged substantially vertically to sandwich the strip, and the second side wall of the second side wall in the liquid tank is sandwiched. A pair of second columnar members are arranged substantially vertically in the vicinity of the opening, and the strip member is sandwiched between the second columnar members. When the first columnar member is in contact with the first side wall and the strip by hydraulic pressure,
A continuous wet processing method, wherein the second cylindrical member is in contact with the second side wall and the strip to suppress liquid leakage from the liquid tank.