JP2003133335A5 - - Google Patents

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Publication number
JP2003133335A5
JP2003133335A5 JP2001330194A JP2001330194A JP2003133335A5 JP 2003133335 A5 JP2003133335 A5 JP 2003133335A5 JP 2001330194 A JP2001330194 A JP 2001330194A JP 2001330194 A JP2001330194 A JP 2001330194A JP 2003133335 A5 JP2003133335 A5 JP 2003133335A5
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JP
Japan
Prior art keywords
znte
single crystal
compound semiconductor
semiconductor single
based compound
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Application number
JP2001330194A
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English (en)
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JP3976543B2 (ja
JP2003133335A (ja
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Publication date
Priority to JP2001330194A priority Critical patent/JP3976543B2/ja
Application filed filed Critical
Priority claimed from JP2001330194A external-priority patent/JP3976543B2/ja
Priority to EP02705375A priority patent/EP1388597B1/en
Priority to US10/472,446 priority patent/US7358159B2/en
Priority to PCT/JP2002/002642 priority patent/WO2002081789A1/ja
Priority to CNB028078659A priority patent/CN100360721C/zh
Priority to TW091106609A priority patent/TW593801B/zh
Publication of JP2003133335A publication Critical patent/JP2003133335A/ja
Publication of JP2003133335A5 publication Critical patent/JP2003133335A5/ja
Application granted granted Critical
Publication of JP3976543B2 publication Critical patent/JP3976543B2/ja
Priority to US11/984,941 priority patent/US7517720B2/en
Priority to US11/984,944 priority patent/US7629625B2/en
Priority to US11/984,943 priority patent/US7696073B2/en
Priority to US11/984,942 priority patent/US7521282B2/en
Priority to US11/984,950 priority patent/US20080089831A1/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Claims (6)

  1. 基板上にZnTe系化合物半導体単結晶をエピタキシャル成長させる際、ZnTe系化合物半導体単結晶の導電型をn型に制御する第13(3B)族元素からなる第1のドーパントと、Te元素との結合エネルギーが、Zn元素とTe元素との結合エネルギーと同等またはそれ以上である第2(2A)族元素からなる第2のドーパントとを、前記ZnTe系化合物半導体単結晶中に同時にドーピングすることを特徴とするZnTe系化合物半導体単結晶の製造方法。
  2. 前記第2のドーパントは、原子個数でZn空孔の濃度以上(〜1018cm−3以上)、かつ、前記ZnTe系化合物半導体単結晶中の濃度が1at%以下となるようにドーピングされることを特徴とする請求項1に記載のZnTe系化合物半導体単結晶の製造方法。
  3. 前記第13(3B)族元素はAl、Ga、Inのうちの少なくとも一つを含み、前記第2(2A)族元素はBe、Mg、Caのうち少なくとも一つ含むことを特徴とする請求項1または請求項2に記載のZnTe系化合物半導体単結晶の製造方法。
  4. 前記ZnTe系化合物半導体単結晶は、ZnTe、CdTe、CdZnTe、ZnOTe、ZnSTe、ZnSeTe、CdSeTe、CdSTe、CdOTe、CdZnOTe、CdZnSTe、CdZnSeTeのいずれかであることを特徴とする請求項1から請求項3のいずれかに記載のZnTe系化合物半導体単結晶の製造方法。
  5. 請求項1から請求項4の何れかに記載の製造方法により得られるn型ZnTe系化合物半導体単結晶であって、キャリア濃度が1×1018cm−3以上で、かつキャリア移動度が130cm/V・sec以上であることを特徴とするZnTe系化合物半導体単結晶
  6. 抵抗が0.05Ω・m以下であることを特徴とする請求項5に記載のZnTe系化合物半導体単結晶。
JP2001330194A 2001-04-04 2001-10-29 ZnTe系化合物半導体の製造方法およびZnTe系化合物半導体並びに半導体装置 Expired - Fee Related JP3976543B2 (ja)

Priority Applications (11)

Application Number Priority Date Filing Date Title
JP2001330194A JP3976543B2 (ja) 2001-10-29 2001-10-29 ZnTe系化合物半導体の製造方法およびZnTe系化合物半導体並びに半導体装置
EP02705375A EP1388597B1 (en) 2001-04-04 2002-03-20 METHOD FOR MANUFACTURING n-type ZnTe COMPOUND SEMICONDUCTOR SINGLE CRYSTAL ON A ZNTE SUBSTRATE AND SEMICONDUCTOR DEVICE
US10/472,446 US7358159B2 (en) 2001-04-04 2002-03-20 Method for manufacturing ZnTe compound semiconductor single crystal ZnTe compound semiconductor single crystal, and semiconductor device
PCT/JP2002/002642 WO2002081789A1 (fr) 2001-04-04 2002-03-20 Procede de fabrication de monocristal semi-conducteur a compose znte et dispositif semi-conducteur mettant en oeuvre un tel monocristal
CNB028078659A CN100360721C (zh) 2001-04-04 2002-03-20 ZnTe系化合物半导体单晶的制造方法和ZnTe系化合物半导体单晶及半导体器件
TW091106609A TW593801B (en) 2001-04-04 2002-04-02 Method for manufacturing ZnTe compound semiconductor single crystal, ZnTe compound semiconductor single crystal, and semiconductor device
US11/984,941 US7517720B2 (en) 2001-04-04 2007-11-26 Method for producing ZnTe system compound semiconductor single crystal, ZnTe system compound semiconductor single crystal, and semiconductor device
US11/984,950 US20080089831A1 (en) 2001-04-04 2007-11-26 Method for producing ZnTe system compound semiconductor single crystal, ZnTe system compound semiconductor single crystal, and semiconductor device
US11/984,942 US7521282B2 (en) 2001-04-04 2007-11-26 Method for producing ZnTe system compound semiconductor single crystal, ZnTe system compound semiconductor single crystal, and semiconductor device
US11/984,943 US7696073B2 (en) 2001-04-04 2007-11-26 Method of co-doping group 14 (4B) elements to produce ZnTe system compound semiconductor single crystal
US11/984,944 US7629625B2 (en) 2001-04-04 2007-11-26 Method for producing ZnTe system compound semiconductor single crystal, ZnTe system compound semiconductor single crystal, and semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2001330194A JP3976543B2 (ja) 2001-10-29 2001-10-29 ZnTe系化合物半導体の製造方法およびZnTe系化合物半導体並びに半導体装置

Publications (3)

Publication Number Publication Date
JP2003133335A JP2003133335A (ja) 2003-05-09
JP2003133335A5 true JP2003133335A5 (ja) 2005-03-17
JP3976543B2 JP3976543B2 (ja) 2007-09-19

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Family Applications (1)

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JP2001330194A Expired - Fee Related JP3976543B2 (ja) 2001-04-04 2001-10-29 ZnTe系化合物半導体の製造方法およびZnTe系化合物半導体並びに半導体装置

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JP (1) JP3976543B2 (ja)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1695388A2 (en) * 2003-12-01 2006-08-30 The Regents Of The University Of California Multiband semiconductor compositions for photovoltaic devices
US7709728B2 (en) 2004-11-29 2010-05-04 The Regents Of The University Of California Multiband semiconductor compositions for photovoltaic devices

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