JP2003121500A - Test device and test method of semiconductor device - Google Patents

Test device and test method of semiconductor device

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Publication number
JP2003121500A
JP2003121500A JP2001313093A JP2001313093A JP2003121500A JP 2003121500 A JP2003121500 A JP 2003121500A JP 2001313093 A JP2001313093 A JP 2001313093A JP 2001313093 A JP2001313093 A JP 2001313093A JP 2003121500 A JP2003121500 A JP 2003121500A
Authority
JP
Japan
Prior art keywords
signal
semiconductor device
test
connection lines
semiconductor devices
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2001313093A
Other languages
Japanese (ja)
Inventor
Takashi Yamada
孝 山田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP2001313093A priority Critical patent/JP2003121500A/en
Publication of JP2003121500A publication Critical patent/JP2003121500A/en
Pending legal-status Critical Current

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  • Tests Of Electronic Circuits (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)

Abstract

PROBLEM TO BE SOLVED: To provide a test device and a test method capable of properly testing other semiconductor devices even if one of plural semiconductor devices distributed and connected is a defective of a short circuit mode. SOLUTION: This test device is provided with: a test signal generation- determination device 2 having plural signal terminals and used for generating test signals for the semiconductor devices 1A and 1B from the respective signal terminals and for executing determination from response signals from the semiconductor devices; plural signal lines 3 connected to the respective signal terminals and respectively having plural parallel connection wires 4; and serial connection bodies each comprising a resistor 7 and a probe 5 and connected to the respective signal lines 3 and parallel connection wires 4. The probes connected to the respective signal lines and connection wires are respectively connected to corresponding pads of the plural semiconductor devices 1A and 1B to simultaneously test the plural semiconductor devices.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【発明の属する技術分野】この発明は、半導体装置の試
験装置及び試験方法、特に複数の半導体装置を同時に試
験する試験装置及び試験方法に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a semiconductor device test apparatus and test method, and more particularly to a test apparatus and test method for simultaneously testing a plurality of semiconductor devices.

【0002】[0002]

【従来の技術】図3は、従来のこの種の装置の構成を示
す概略図である。この図において、1A、1Bは同時に
試験される複数の半導体装置で、図は半導体装置が2つ
の場合を示している。IN1〜IN4は半導体装置に設けら
れた試験信号の受信端子、GNDは接地端子、I/Oは試験信
号を受けた半導体装置が内部の状況に応じた信号を返送
するための端子、VCCは電源電圧用の端子である。2は
上記半導体装置1A、1Bに与える試験信号(高周波信
号)を生成すると共に、各半導体装置からの返送信号を
受けて良否の判定を行なう試験信号生成・判定装置で、
図示していないが信号供給及び受信用の複数の信号端子
を有する。
2. Description of the Related Art FIG. 3 is a schematic view showing the structure of a conventional device of this type. In this figure, 1A and 1B are a plurality of semiconductor devices to be tested at the same time, and the figure shows a case where there are two semiconductor devices. IN1 to IN4 are test signal receiving terminals provided in the semiconductor device, GND is a ground terminal, I / O is a terminal for the semiconductor device receiving the test signal to return a signal according to the internal conditions, and VCC is a power supply This is a voltage terminal. Reference numeral 2 denotes a test signal generation / determination device that generates a test signal (high-frequency signal) to be given to the semiconductor devices 1A and 1B, and that receives a return signal from each semiconductor device to determine pass / fail.
Although not shown, it has a plurality of signal terminals for signal supply and reception.

【0003】3は各信号端子に接続された複数の信号線
で、半導体装置1A、1Bの受信端子IN1〜IN4に信号
を供給する信号線及び半導体装置1A、1Bの端子I/O
から信号を受ける信号線は高周波用の同軸線で構成さ
れ、接地端子GND及び電圧用端子VCCに電位を供給する信
号線は通常の信号線によって構成されている。4は受信
端子IN1〜IN4及び接地端子GNDに信号を与える各信号
線に設けられた並列接続線で、半導体装置1Aの受信端
子IN1に接続される信号線の並列接続線は、半導体装置
1Bの対応する端子である受信端子IN1に接続されてい
る。他の並列接続線も同様に半導体装置1A、1Bの対
応する端子にそれぞれ接続されている。5は各信号線に
接続され、試験時に半導体装置1A、1Bの各端子に接
続されるプローブ、6は各プローブを固定保持する周知
のプローブカードである。
Reference numeral 3 denotes a plurality of signal lines connected to the respective signal terminals. Signal lines for supplying signals to the receiving terminals IN1 to IN4 of the semiconductor devices 1A and 1B and terminal I / O of the semiconductor devices 1A and 1B.
The signal line for receiving the signal from is composed of a high frequency coaxial line, and the signal line for supplying the potential to the ground terminal GND and the voltage terminal VCC is composed of a normal signal line. Reference numeral 4 denotes a parallel connection line provided to each signal line that gives a signal to the reception terminals IN1 to IN4 and the ground terminal GND. The parallel connection line of the signal lines connected to the reception terminal IN1 of the semiconductor device 1A is the same as that of the semiconductor device 1B. It is connected to the corresponding receiving terminal IN1. Other parallel connection lines are similarly connected to the corresponding terminals of the semiconductor devices 1A and 1B, respectively. Reference numeral 5 is a probe that is connected to each signal line and is connected to each terminal of the semiconductor devices 1A and 1B during a test, and 6 is a known probe card that holds each probe fixedly.

【0004】試験に際しては、対象となる複数の半導体
装置(図3では2つ)に対し、信号線3のプローブ5及
び並列接続線4のプローブ5を図3に示すように接続
し、試験信号生成・判定装置2から所定の高周波信号を
与えることにより、2つの半導体装置1A、1Bの同時
試験が行なわれる。半導体装置1A、1Bからは、それ
ぞれの端子I/Oを経て各半導体装置の内部状況に応じた
信号が試験信号生成・判定装置2に返送されるため、こ
れによって各試験信号に対応した試験結果の判定が行な
われる。
In the test, the probe 5 of the signal line 3 and the probe 5 of the parallel connection line 4 are connected to a plurality of target semiconductor devices (two in FIG. 3) as shown in FIG. By applying a predetermined high frequency signal from the generation / determination device 2, the two semiconductor devices 1A and 1B are simultaneously tested. From the semiconductor devices 1A and 1B, signals corresponding to the internal conditions of each semiconductor device are returned to the test signal generation / judgment device 2 via the respective terminal I / O, so that the test results corresponding to each test signal Is determined.

【0005】[0005]

【発明が解決しようとする課題】従来の半導体装置の試
験装置及び試験方法は以上のようになされていたため、
例えば半導体装置1Aの受信端子IN1に接続されている
ロジックがメタルショート等の短絡不良モードになって
いる場合には、受信端子IN1に接続されたプローブ5か
ら大電流が流出するため、並列接続線4によって半導体
装置1Aの受信端子IN1と同じ信号端子に接続されてい
る半導体装置1Bの対応受信端子IN1に接続されている
ロジックは、試験ができなくなるという問題点があっ
た。
Since the conventional semiconductor device testing apparatus and testing method are as described above,
For example, when the logic connected to the reception terminal IN1 of the semiconductor device 1A is in a short circuit failure mode such as a metal short circuit, a large current flows out from the probe 5 connected to the reception terminal IN1, and therefore the parallel connection line is connected. The logic connected to the corresponding reception terminal IN1 of the semiconductor device 1B connected to the same signal terminal as the reception terminal IN1 of the semiconductor device 1A by 4 cannot be tested.

【0006】この発明は、上記のような問題点に対処す
るためになされたもので、分配接続した複数の半導体装
置のうち、1つの半導体装置が短絡モードの不良品であ
っても、他の半導体装置を正常に試験することができる
半導体装置の試験装置及び試験方法を提供することを目
的とする。
The present invention has been made to solve the above-mentioned problems, and even if one semiconductor device among a plurality of semiconductor devices connected in a distributed manner is a defective product in a short circuit mode, another semiconductor device can be used. An object of the present invention is to provide a semiconductor device testing apparatus and a testing method capable of testing a semiconductor device normally.

【0007】[0007]

【課題を解決するための手段】この発明に係る半導体装
置の試験装置は、複数の信号端子を有し、各信号端子か
らそれぞれ半導体装置用の試験信号を生成すると共に、
半導体装置からの返送信号により判定を行なう試験信号
生成・判定装置と、各信号端子に接続され、それぞれが
複数の並列接続線を有する複数の信号線と、各信号線及
び並列接続線に接続された抵抗器とプローブの直列接続
体とを備え、各接続線及び並列接続線に接続されたプロ
ーブを複数の半導体装置の対応パッドにそれぞれ接続
し、複数の半導体装置を同時に試験するようにしたもの
である。
A semiconductor device testing apparatus according to the present invention has a plurality of signal terminals, and generates a test signal for the semiconductor device from each signal terminal.
A test signal generator / judgment device for making a judgment based on a return signal from a semiconductor device, a plurality of signal lines each connected to each signal terminal, each having a plurality of parallel connection lines, and connected to each signal line and the parallel connection line. And a series connection body of a probe and a probe connected to each connection line and a parallel connection line are respectively connected to corresponding pads of a plurality of semiconductor devices to simultaneously test a plurality of semiconductor devices. Is.

【0008】この発明に係る半導体装置の試験装置は、
また、抵抗器の抵抗値を設定する場合に、半導体装置が
短絡不良の時、プローブに流れる電流が試験信号生成・
判定装置の電流供給能力以下となるようにする抵抗値を
下限とし、試験時の高周波追従性を損なわない抵抗値を
上限とするものである。
A semiconductor device testing apparatus according to the present invention is
Also, when setting the resistance value of the resistor, if the semiconductor device has a short circuit failure, the current flowing through the probe will generate a test signal.
The lower limit of the resistance value is the current supply capacity of the determination device, and the upper limit is the resistance value that does not impair the high-frequency follow-up property during the test.

【0009】この発明に係る半導体装置の試験装置は、
また、抵抗器の抵抗値を10Ω〜10KΩの範囲で設定
するものである。
A semiconductor device testing apparatus according to the present invention is
Further, the resistance value of the resistor is set within the range of 10Ω to 10KΩ.

【0010】この発明に係る半導体装置の試験装置は、
また、抵抗器とプローブとを一体化して構成するもので
ある。
A semiconductor device testing apparatus according to the present invention comprises:
Further, the resistor and the probe are integrally formed.

【0011】この発明に係る半導体装置の試験装置は、
また、複数の信号端子を有し、各信号端子からそれぞれ
半導体装置用の試験信号を生成すると共に、半導体装置
からの返送信号により判定を行なう試験信号生成・判定
装置と、各信号端子に接続され、それぞれが複数の並列
接続線を有する複数の信号線と、各接続線及び並列接続
線に接続された高抵抗プローブとを備え、各接続線及び
並列接続線に接続された高抵抗プローブを複数の半導体
装置の対応パッドにそれぞれ接続し、複数の半導体装置
を同時に試験するようにしたものである。
The semiconductor device testing apparatus according to the present invention is
In addition, a test signal generation / determination device that has a plurality of signal terminals and that generates a test signal for a semiconductor device from each signal terminal and that makes a determination by a return signal from the semiconductor device is connected to each signal terminal. , A plurality of signal lines each having a plurality of parallel connection lines, and a high resistance probe connected to each connection line and parallel connection line, a plurality of high resistance probes connected to each connection line and parallel connection line The semiconductor device is connected to the corresponding pads, and a plurality of semiconductor devices are simultaneously tested.

【0012】この発明に係る半導体装置の試験方法は、
複数の信号端子を有し、各信号端子からそれぞれ半導体
装置用の試験信号を生成すると共に、半導体装置からの
返送信号により判定を行なう試験信号生成・判定装置
と、各信号端子に接続され、それぞれが複数の並列接続
線を有する複数の信号線と、各接続線及び並列接続線に
接続された抵抗器とプローブの直列接続体とを備え、各
接続線及び並列接続線に接続されたプローブを複数の半
導体装置の対応パッドにそれぞれ接続し、複数の半導体
装置を同時に試験するようにしたものである。
A method of testing a semiconductor device according to the present invention is
A test signal generation / determination device that has a plurality of signal terminals and that generates a test signal for a semiconductor device from each signal terminal and that makes a determination by a return signal from the semiconductor device, and is connected to each signal terminal, respectively. A plurality of signal lines having a plurality of parallel connection lines, and a series connection body of a resistor and a probe connected to each connection line and parallel connection line, a probe connected to each connection line and parallel connection line. The semiconductor device is connected to corresponding pads of a plurality of semiconductor devices, and a plurality of semiconductor devices are simultaneously tested.

【0013】この発明に係る半導体装置の試験方法は、
また、複数の信号端子を有し、各信号端子からそれぞれ
半導体装置用の試験信号を生成すると共に、半導体装置
からの返送信号により判定を行なう試験信号生成・判定
装置と、各信号端子に接続され、それぞれが複数の並列
接続線を有する複数の信号線と、各接続線及び並列接続
線に接続された高抵抗プローブとを備え、各接続線及び
並列接続線に接続された高抵抗プローブを複数の半導体
装置の対応パッドにそれぞれ接続し、複数の半導体装置
を同時に試験するようにしたものである。
A method of testing a semiconductor device according to the present invention is
In addition, a test signal generation / determination device that has a plurality of signal terminals, generates a test signal for the semiconductor device from each signal terminal, and makes a determination based on a return signal from the semiconductor device, and is connected to each signal terminal. , A plurality of signal lines each having a plurality of parallel connection lines, and a high resistance probe connected to each connection line and parallel connection line, a plurality of high resistance probes connected to each connection line and parallel connection line The semiconductor device is connected to the corresponding pads, and a plurality of semiconductor devices are simultaneously tested.

【0014】[0014]

【発明の実施の形態】実施の形態1.以下、この発明の
実施の形態1を図にもとづいて説明する。図1は、実施
の形態1の構成及び試験方法を示す概略図である。この
図において、1A、1Bは同時に試験される複数の半導
体装置で、図は半導体装置が2つの場合を示している。
IN1〜IN4は半導体装置に設けられた試験信号の受信端
子、GNDは接地端子、I/Oは試験信号を受けた半導体装置
が内部の状況に応じた信号を返送するための端子、VCC
は電源電圧用の端子である。2は上記半導体装置1A、
1Bに与える試験信号(高周波信号)を生成すると共
に、各半導体装置からの返送信号を受けて良否の判定を
行なう試験信号生成・判定装置で、図示していないが信
号供給及び受信用の複数の信号端子を有する。
BEST MODE FOR CARRYING OUT THE INVENTION Embodiment 1. Embodiment 1 of the present invention will be described below with reference to the drawings. FIG. 1 is a schematic diagram showing the configuration and test method of the first embodiment. In this figure, 1A and 1B are a plurality of semiconductor devices to be tested at the same time, and the figure shows a case where there are two semiconductor devices.
IN1 to IN4 are test signal receiving terminals provided on the semiconductor device, GND is a ground terminal, I / O is a terminal for the semiconductor device receiving the test signal to return a signal according to the internal condition, VCC
Is a terminal for power supply voltage. 2 is the semiconductor device 1A,
A test signal generation / judgment device that generates a test signal (high-frequency signal) to be given to 1B and judges whether the signal is good or bad by receiving a return signal from each semiconductor device. It has a signal terminal.

【0015】3は各信号端子に接続された複数の信号線
で、半導体装置1A、1Bの受信端子IN1〜IN4に信号
を供給する信号線及び半導体装置1A、1Bの端子I/O
から信号を受ける信号線は高周波用の同軸線で構成さ
れ、接地端子GND及び電圧用端子VCCに電位を供給する信
号線は通常の信号線によって構成されている。4は受信
端子IN1〜IN4及び接地端子GNDに信号を与える各信号
線に設けられた並列接続線で、半導体装置1Aの受信端
子IN1に接続される信号線の並列接続線は、半導体装置
1Bの対応する端子である受信端子IN1に接続されてい
る。他の並列接続線も同様に半導体装置1A、1Bの対
応する端子にそれぞれ接続されている。5は各信号線に
接続され、試験時に半導体装置1A、1Bの各端子に接
続されるプローブ、6は各プローブを固定保持する周知
のプローブカードである。
Reference numeral 3 denotes a plurality of signal lines connected to the respective signal terminals. The signal lines supply signals to the receiving terminals IN1 to IN4 of the semiconductor devices 1A and 1B and the terminal I / O of the semiconductor devices 1A and 1B.
The signal line for receiving the signal from is composed of a high frequency coaxial line, and the signal line for supplying the potential to the ground terminal GND and the voltage terminal VCC is composed of a normal signal line. Reference numeral 4 denotes a parallel connection line provided to each signal line that gives a signal to the reception terminals IN1 to IN4 and the ground terminal GND. The parallel connection line of the signal lines connected to the reception terminal IN1 of the semiconductor device 1A is the same as that of the semiconductor device 1B. It is connected to the corresponding receiving terminal IN1. Other parallel connection lines are similarly connected to the corresponding terminals of the semiconductor devices 1A and 1B, respectively. Reference numeral 5 is a probe that is connected to each signal line and is connected to each terminal of the semiconductor devices 1A and 1B during a test, and 6 is a known probe card that holds each probe fixedly.

【0016】7は半導体装置1A、1Bの受信端子IN1
〜IN4に接続された信号線3に、プローブ5と直列接続
体を構成するように挿入接続された抵抗器で、半導体装
置1A、1Bが短絡不良の場合に、プローブ5に流れる
電流が試験信号生成・判定装置2の電流供給能力以下と
なるような抵抗値を下限とし、試験時の高周波追従性を
損なわない抵抗値を上限とする範囲内での抵抗値に設定
されるものである。即ち、半導体装置1Aが短絡不良モ
ードの不良品である場合には、信号線3から半導体装置
1Aに向けて短絡電流が流れ、この電流が抵抗器7によ
って制限されるが、この時の制限電流が試験信号生成・
判定装置2の電流供給能力以下となるように抵抗値の下
限を設定するものである。
Reference numeral 7 is a reception terminal IN1 of the semiconductor devices 1A and 1B.
In the case where the semiconductor device 1A, 1B has a short circuit failure, the current flowing through the probe 5 is a test signal when a resistor is inserted and connected to the signal line 3 connected to the IN4 so as to form a series connection body with the probe 5. The resistance value is set so that the lower limit is a resistance value that is equal to or lower than the current supply capacity of the generation / determination device 2 and the upper limit is a resistance value that does not impair the high frequency follow-up property during a test. That is, when the semiconductor device 1A is a defective product in the short circuit failure mode, a short circuit current flows from the signal line 3 toward the semiconductor device 1A, and this current is limited by the resistor 7. Generates test signal
The lower limit of the resistance value is set so as to be equal to or less than the current supply capacity of the determination device 2.

【0017】また、抵抗値を大にすると半導体装置1A
への最大供給電流が減少し、短絡不良モード対策効果は
十分得られるが、代わりに試験時の高周波追従性が損な
われ半導体装置の機能試験に支障を来たすため、試験時
の高周波追従性が損なわれない抵抗値を上限の抵抗値と
して設定するものである。具体的には、抵抗器7の抵抗
値を10Ω〜10KΩの範囲で設定する。
If the resistance value is increased, the semiconductor device 1A
The maximum supply current to the IC is reduced, and the short-circuit failure mode countermeasure effect is sufficiently obtained. The resistance value that does not exist is set as the upper limit resistance value. Specifically, the resistance value of the resistor 7 is set within the range of 10Ω to 10KΩ.

【0018】抵抗値の下限を10Ωとする根拠は次の通
りである。試験信号生成・判定装置2から半導体装置1
A、1Bの受信端子IN1〜IN4に与える高周波電圧VIの
最高電圧を1[V]、電流の供給能力を100[mA]、半導
体装置の不良パッド電圧を0[V](GND)、分配数(接続さ
れる半導体装置の数)を2と仮定し、不良パッドから電
流が流出しても、ターゲットパッドに電流を供給する余
裕を出すための抵抗値Rを算出すると、 R≧(1[V]−0[V])÷{100[mA]÷(2分配−1本)}=
10Ω となる。
The grounds for setting the lower limit of the resistance value to 10Ω are as follows. Test signal generation / determination device 2 to semiconductor device 1
The maximum voltage of the high-frequency voltage VI applied to the receiving terminals IN1 to IN4 of A and 1B is 1 [V], the current supply capacity is 100 [mA], the defective pad voltage of the semiconductor device is 0 [V] (GND), the number of distributions Assuming that (the number of connected semiconductor devices) is 2, and calculating the resistance value R to provide a margin for supplying the current to the target pad even if the current flows from the defective pad, R ≧ (1 [V ] -0 [V]) ÷ {100 [mA] ÷ (2 distribution-1 line)} =
It becomes 10Ω.

【0019】また、抵抗値の上限を10KΩとする根拠
は次の通りである。10[pF]の入力容量をもつ半導体装
置に、スルーレート20[nS]を要求する場合、充電電流
Iは、 I=10[pF]÷20[nS]=0.5[mA] であり、電圧VIの最高、最低差が5[V]の時にこれを満
足する経路抵抗Rを算出すると、 R≦5[V]÷0.5[mA]=10KΩ となる。
The grounds for setting the upper limit of the resistance value to 10 KΩ are as follows. When a slew rate of 20 [nS] is required for a semiconductor device having an input capacitance of 10 [pF], the charging current I is I = 10 [pF] / 20 [nS] = 0.5 [mA], and the voltage VI When the maximum and minimum difference of 5 [V] is satisfied and the path resistance R satisfying this is calculated, R ≦ 5 [V] ÷ 0.5 [mA] = 10 KΩ.

【0020】また、抵抗値が上限値と下限値の中間値で
ある300Ωの場合について検証すると、印加電圧Vaが
3.3[V]の場合、短絡電流Isは、 Is=Va/R=3.3/300=11[mA] となる。また、入力容量Ca(=10[pF])を立ち上がり、
立ち下がりさせる時間Trは、印加電圧Va(=3.3[V])とし
て交流電流Icは、 Ic=Va/R=11[mA] なので、 Tr=Ca÷Ic=10÷11≒1[nS] となる。この値ならば短絡電流値、高周波追従性ともに
大きな問題とはならず、試験信号生成・判定装置2の信
号源を複数の半導体装置に分配供給して同時試験個数を
増大させる実用的な手段となり得る。
When the resistance value is 300Ω which is an intermediate value between the upper limit value and the lower limit value, the applied voltage Va is
In the case of 3.3 [V], the short circuit current Is is Is = Va / R = 3.3 / 300 = 11 [mA]. In addition, the input capacitance Ca (= 10 [pF]) rises,
The falling time Tr is the applied voltage Va (= 3.3 [V]), and the AC current Ic is Ic = Va / R = 11 [mA], so Tr = Ca ÷ Ic = 10 ÷ 11 ≒ 1 [nS] Become. With this value, the short-circuit current value and the high frequency followability do not become a big problem, and it is a practical means for increasing the number of simultaneous tests by distributing and supplying the signal source of the test signal generation / determination device 2 to a plurality of semiconductor devices. obtain.

【0021】実施の形態2.次に、この発明の実施の形
態2を図にもとづいて説明する。図2は、実施の形態2
の構成及び試験方法を示す概略図である。この図におい
て、図1と同一または相当部分には同一符号を付して説
明を省略する。図1と異なる点は、半導体装置1A、1
Bの受信端子IN1〜IN4に接続されるプローブを抵抗器
と一体に構成した点である。即ち、図において、50は
半導体装置1A、1Bの受信端子IN1〜IN4に接続され
るプローブで、図1に示すプローブ5と抵抗器7とを一
体に構成したものである。具体的には、図1に示すプロ
ーブ5と抵抗器7とをそのまま接合し、適宜の手段で固
着する構成でもよいが、望ましくは、セラミック等の高
抵抗材料でプローブ50を形成することにより、高抵抗
プローブを構成し、プローブの電流経路となる部分を抵
抗器として利用するようにするのがよい。
Embodiment 2. Next, a second embodiment of the present invention will be described with reference to the drawings. FIG. 2 shows the second embodiment.
2 is a schematic diagram showing the configuration and test method of FIG. In this figure, parts that are the same as or equivalent to those in FIG. The difference from FIG. 1 is that semiconductor devices 1A, 1
The probe connected to the receiving terminals IN1 to IN4 of B is integrated with the resistor. That is, in the figure, reference numeral 50 denotes a probe connected to the receiving terminals IN1 to IN4 of the semiconductor devices 1A and 1B, which is configured by integrating the probe 5 and the resistor 7 shown in FIG. Specifically, the probe 5 and the resistor 7 shown in FIG. 1 may be directly joined and fixed by an appropriate means, but preferably, the probe 50 is formed of a high resistance material such as ceramic, It is preferable to construct a high resistance probe and use the portion of the probe that becomes the current path as a resistor.

【0022】[0022]

【発明の効果】この発明に係る半導体装置の試験装置及
び試験方法は、複数の信号端子を有し、各信号端子から
それぞれ半導体装置用の試験信号を生成すると共に、半
導体装置からの返送信号により判定を行なう試験信号生
成・判定装置と、各信号端子に接続され、それぞれが複
数の並列接続線を有する複数の信号線と、各信号線及び
並列接続線に接続された抵抗器とプローブの直列接続体
とを備え、各接続線及び並列接続線に接続されたプロー
ブを複数の半導体装置の対応パッドにそれぞれ接続し、
複数の半導体装置を同時に試験するようにしたため、試
験信号生成・判定装置に分配接続した複数の半導体装置
のうち、1つの半導体装置が短絡モードの不良品であっ
ても他の半導体装置を正常に試験することができる。
The semiconductor device test apparatus and test method according to the present invention have a plurality of signal terminals, generate test signals for the semiconductor device from the respective signal terminals, and use a return signal from the semiconductor device. A test signal generation / judgment device for making a judgment, a plurality of signal lines connected to each signal terminal and each having a plurality of parallel connection lines, and a series of a resistor and a probe connected to each signal line and the parallel connection line. A connecting body is provided, and the probes connected to each connection line and the parallel connection line are respectively connected to corresponding pads of a plurality of semiconductor devices,
Since a plurality of semiconductor devices are tested at the same time, even if one semiconductor device among the plurality of semiconductor devices distributed and connected to the test signal generation / judgment device is a defective product in the short circuit mode, other semiconductor devices are normally operated. Can be tested.

【0023】この発明に係る半導体装置の試験装置及び
試験方法は、また、抵抗器の抵抗値を設定する場合に、
半導体装置が短絡不良の時、プローブに流れる電流が試
験信号生成・判定装置の電流供給能力以下となるように
する抵抗値を下限とし、試験時の高周波追従性を損なわ
ない抵抗値を上限とするものであるため、短絡不良モー
ドの半導体装置が発生しても、他の半導体装置を支障な
く試験することができる他、試験時の高周波追従性が損
なわれることもない。
The semiconductor device testing apparatus and the testing method according to the present invention, when the resistance value of the resistor is set,
When the semiconductor device has a short circuit failure, the lower limit is the resistance value that keeps the current flowing through the probe below the current supply capacity of the test signal generation / judgment device, and the upper limit is the resistance value that does not impair the high-frequency follow-up during testing. Therefore, even if a semiconductor device in the short-circuit failure mode occurs, other semiconductor devices can be tested without any trouble, and the high-frequency followability during the test is not impaired.

【0024】この発明に係る半導体装置の試験装置及び
試験方法は、また、抵抗器とプローブとを一体化または
プローブを高抵抗プローブとして構成するようにしたた
め、試験装置をコンパクトに構成することができる。
In the semiconductor device test apparatus and test method according to the present invention, since the resistor and the probe are integrated or the probe is configured as a high resistance probe, the test apparatus can be compactly configured. .

【図面の簡単な説明】[Brief description of drawings]

【図1】 この発明の実施の形態1の構成及び試験方法
を示す概略図である。
FIG. 1 is a schematic diagram showing a configuration and a test method according to a first embodiment of the present invention.

【図2】 この発明の実施の形態2の構成及び試験方法
を示す概略図である。
FIG. 2 is a schematic diagram showing a configuration and a testing method according to a second embodiment of the present invention.

【図3】 従来の半導体装置の試験装置の構成を示す概
略図である。
FIG. 3 is a schematic diagram showing a configuration of a conventional semiconductor device test apparatus.

【符号の説明】[Explanation of symbols]

1A,1B 半導体装置、 2 試験信号生成・判定装
置、 3 信号線、4 並列接続線、 5 プローブ、
6 プローブカード、 7 抵抗器、 50 高抵抗
プローブ。
1A, 1B semiconductor device, 2 test signal generation / determination device, 3 signal lines, 4 parallel connection lines, 5 probes,
6 probe card, 7 resistor, 50 high resistance probe.

Claims (7)

【特許請求の範囲】[Claims] 【請求項1】 複数の信号端子を有し、各信号端子から
それぞれ半導体装置用の試験信号を生成すると共に、上
記半導体装置からの返送信号により判定を行なう試験信
号生成・判定装置と、上記各信号端子に接続され、それ
ぞれが複数の並列接続線を有する複数の信号線と、上記
各信号線及び並列接続線に接続された抵抗器とプローブ
の直列接続体とを備え、上記各接続線及び並列接続線に
接続されたプローブを複数の半導体装置の対応パッドに
それぞれ接続し、複数の半導体装置を同時に試験するよ
うにしたことを特徴とする半導体装置の試験装置。
1. A test signal generation / judgment device having a plurality of signal terminals, each of which generates a test signal for a semiconductor device, and which makes a judgment by a return signal from the semiconductor device; A plurality of signal lines connected to signal terminals, each having a plurality of parallel connection lines, and a series connection body of a resistor and a probe connected to each of the signal lines and the parallel connection lines, and each of the connection lines and A semiconductor device testing apparatus, wherein probes connected to parallel connection lines are respectively connected to corresponding pads of a plurality of semiconductor devices so as to simultaneously test a plurality of semiconductor devices.
【請求項2】 上記抵抗器の抵抗値は、上記半導体装置
が短絡不良の場合にプローブに流れる電流が上記試験信
号生成・判定装置の電流供給能力以下となるようにする
抵抗値を下限とし、試験時の高周波追従性を損なわない
抵抗値を上限とする範囲で設定されることを特徴とする
請求項1記載の半導体装置の試験装置。
2. The lower limit of the resistance value of the resistor is such that the current flowing through the probe when the semiconductor device has a short circuit failure is below the current supply capacity of the test signal generating / determining device. 2. The semiconductor device testing apparatus according to claim 1, wherein the resistance value is set within a range in which a resistance value that does not impair the high frequency follow-up property during testing is set as an upper limit.
【請求項3】 上記抵抗器の抵抗値を10Ω〜10KΩ
の範囲で設定することを特徴とする請求項2記載の半導
体装置の試験装置。
3. The resistance value of the resistor is 10Ω to 10KΩ.
The semiconductor device test apparatus according to claim 2, wherein the test apparatus is set within the range.
【請求項4】 上記抵抗器とプローブとを一体化して構
成することを特徴とする請求項1記載の半導体装置の試
験装置。
4. The semiconductor device testing apparatus according to claim 1, wherein the resistor and the probe are integrated with each other.
【請求項5】 複数の信号端子を有し、各信号端子から
それぞれ半導体装置用の試験信号を生成すると共に、上
記半導体装置からの返送信号により判定を行なう試験信
号生成・判定装置と、上記各信号端子に接続され、それ
ぞれが複数の並列接続線を有する複数の信号線と、上記
各接続線及び並列接続線に接続された高抵抗プローブと
を備え、上記各接続線及び並列接続線に接続された高抵
抗プローブを複数の半導体装置の対応パッドにそれぞれ
接続し、複数の半導体装置を同時に試験するようにした
ことを特徴とする半導体装置の試験装置。
5. A test signal generation / judgment device having a plurality of signal terminals, each of which generates a test signal for a semiconductor device, and which makes a judgment by a return signal from the semiconductor device; A plurality of signal lines connected to signal terminals, each having a plurality of parallel connection lines, and a high resistance probe connected to each of the connection lines and the parallel connection lines, and connected to each of the connection lines and the parallel connection lines The test apparatus for a semiconductor device, wherein the high resistance probe is connected to corresponding pads of a plurality of semiconductor devices, respectively, and the plurality of semiconductor devices are simultaneously tested.
【請求項6】 複数の信号端子を有し、各信号端子から
それぞれ半導体装置用の試験信号を生成すると共に、上
記半導体装置からの返送信号により判定を行なう試験信
号生成・判定装置と、上記各信号端子に接続され、それ
ぞれが複数の並列接続線を有する複数の信号線と、上記
各接続線及び並列接続線に接続された抵抗器とプローブ
の直列接続体とを備え、上記各接続線及び並列接続線に
接続されたプローブを複数の半導体装置の対応パッドに
それぞれ接続し、複数の半導体装置を同時に試験するよ
うにしたことを特徴とする半導体装置の試験方法。
6. A test signal generation / judgment device having a plurality of signal terminals, each of which generates a test signal for a semiconductor device, and which makes a judgment based on a return signal from the semiconductor device; A plurality of signal lines connected to signal terminals, each having a plurality of parallel connection lines, and a series connection body of a resistor and a probe connected to each of the connection lines and the parallel connection lines, and each of the connection lines and A method for testing a semiconductor device, wherein probes connected to parallel connection lines are respectively connected to corresponding pads of a plurality of semiconductor devices so that the plurality of semiconductor devices are tested simultaneously.
【請求項7】 複数の信号端子を有し、各信号端子から
それぞれ半導体装置用の試験信号を生成すると共に、上
記半導体装置からの返送信号により判定を行なう試験信
号生成・判定装置と、上記各信号端子に接続され、それ
ぞれが複数の並列接続線を有する複数の信号線と、上記
各接続線及び並列接続線に接続された高抵抗プローブと
を備え、上記各接続線及び並列接続線に接続された高抵
抗プローブを複数の半導体装置の対応パッドにそれぞれ
接続し、複数の半導体装置を同時に試験するようにした
ことを特徴とする半導体装置の試験方法。
7. A test signal generation / judgment device having a plurality of signal terminals, each of which generates a test signal for a semiconductor device from each signal terminal, and which makes a judgment by a return signal from the semiconductor device; A plurality of signal lines connected to signal terminals, each having a plurality of parallel connection lines, and a high resistance probe connected to each of the connection lines and the parallel connection lines, and connected to each of the connection lines and the parallel connection lines The method for testing a semiconductor device is characterized in that the high resistance probe is connected to corresponding pads of a plurality of semiconductor devices, respectively, and the plurality of semiconductor devices are simultaneously tested.
JP2001313093A 2001-10-10 2001-10-10 Test device and test method of semiconductor device Pending JP2003121500A (en)

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Country Link
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Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006196546A (en) * 2005-01-11 2006-07-27 Nec Electronics Corp Device and method of inspecting wafer
JP2012189607A (en) * 2005-01-07 2012-10-04 Formfactor Inc Apparatus for increasing operating frequency of system for testing electronic devices
US9379029B2 (en) 2012-07-18 2016-06-28 Toyota Jidosha Kabushiki Kaisha Inspection apparatus, inspection system, inspection method of semiconductor devices, and manufacturing method of inspected semiconductor devices

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012189607A (en) * 2005-01-07 2012-10-04 Formfactor Inc Apparatus for increasing operating frequency of system for testing electronic devices
JP2006196546A (en) * 2005-01-11 2006-07-27 Nec Electronics Corp Device and method of inspecting wafer
US9379029B2 (en) 2012-07-18 2016-06-28 Toyota Jidosha Kabushiki Kaisha Inspection apparatus, inspection system, inspection method of semiconductor devices, and manufacturing method of inspected semiconductor devices

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