JP2003114387A5 - - Google Patents

Download PDF

Info

Publication number
JP2003114387A5
JP2003114387A5 JP2001308754A JP2001308754A JP2003114387A5 JP 2003114387 A5 JP2003114387 A5 JP 2003114387A5 JP 2001308754 A JP2001308754 A JP 2001308754A JP 2001308754 A JP2001308754 A JP 2001308754A JP 2003114387 A5 JP2003114387 A5 JP 2003114387A5
Authority
JP
Japan
Prior art keywords
optical system
image
mirror
disposed
catadioptric
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2001308754A
Other languages
English (en)
Japanese (ja)
Other versions
JP2003114387A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2001308754A priority Critical patent/JP2003114387A/ja
Priority claimed from JP2001308754A external-priority patent/JP2003114387A/ja
Publication of JP2003114387A publication Critical patent/JP2003114387A/ja
Publication of JP2003114387A5 publication Critical patent/JP2003114387A5/ja
Pending legal-status Critical Current

Links

JP2001308754A 2001-10-04 2001-10-04 反射屈折光学系および該光学系を備える投影露光装置 Pending JP2003114387A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2001308754A JP2003114387A (ja) 2001-10-04 2001-10-04 反射屈折光学系および該光学系を備える投影露光装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2001308754A JP2003114387A (ja) 2001-10-04 2001-10-04 反射屈折光学系および該光学系を備える投影露光装置

Publications (2)

Publication Number Publication Date
JP2003114387A JP2003114387A (ja) 2003-04-18
JP2003114387A5 true JP2003114387A5 (US06195213-20010227-M00001.png) 2005-08-18

Family

ID=19128013

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2001308754A Pending JP2003114387A (ja) 2001-10-04 2001-10-04 反射屈折光学系および該光学系を備える投影露光装置

Country Status (1)

Country Link
JP (1) JP2003114387A (US06195213-20010227-M00001.png)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7859748B2 (en) 2000-01-14 2010-12-28 Carl Zeiss Smt Gmbh Microlithographic reduction projection catadioptric objective

Families Citing this family (39)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1857880B1 (en) 2003-04-09 2015-09-16 Nikon Corporation Exposure method and apparatus and device manufacturing method
JP2005115127A (ja) * 2003-10-09 2005-04-28 Nikon Corp 反射屈折投影光学系、露光装置及び露光方法
JP2004333761A (ja) * 2003-05-06 2004-11-25 Nikon Corp 反射屈折型の投影光学系、露光装置、および露光方法
US7348575B2 (en) 2003-05-06 2008-03-25 Nikon Corporation Projection optical system, exposure apparatus, and exposure method
KR101521407B1 (ko) 2003-05-06 2015-05-18 가부시키가이샤 니콘 투영 광학계, 노광 장치 및 노광 방법
US7085075B2 (en) 2003-08-12 2006-08-01 Carl Zeiss Smt Ag Projection objectives including a plurality of mirrors with lenses ahead of mirror M3
US8208198B2 (en) 2004-01-14 2012-06-26 Carl Zeiss Smt Gmbh Catadioptric projection objective
TW201834020A (zh) 2003-10-28 2018-09-16 日商尼康股份有限公司 照明光學裝置、曝光裝置、曝光方法以及元件製造方法
TWI519819B (zh) 2003-11-20 2016-02-01 尼康股份有限公司 光束變換元件、光學照明裝置、曝光裝置、以及曝光方法
US7466489B2 (en) 2003-12-15 2008-12-16 Susanne Beder Projection objective having a high aperture and a planar end surface
JP5102492B2 (ja) 2003-12-19 2012-12-19 カール・ツァイス・エスエムティー・ゲーエムベーハー 結晶素子を有するマイクロリソグラフィー投影用対物レンズ
CN102207609B (zh) 2004-01-14 2013-03-20 卡尔蔡司Smt有限责任公司 反射折射投影物镜
US20080151364A1 (en) 2004-01-14 2008-06-26 Carl Zeiss Smt Ag Catadioptric projection objective
TWI511182B (zh) 2004-02-06 2015-12-01 尼康股份有限公司 光學照明裝置、曝光裝置、曝光方法以及元件製造方法
WO2005098504A1 (en) 2004-04-08 2005-10-20 Carl Zeiss Smt Ag Imaging system with mirror group
US8107162B2 (en) 2004-05-17 2012-01-31 Carl Zeiss Smt Gmbh Catadioptric projection objective with intermediate images
JP4954067B2 (ja) 2004-07-14 2012-06-13 カール・ツァイス・エスエムティー・ゲーエムベーハー カタディオプトリック投影対物レンズ
JP5065031B2 (ja) 2004-10-08 2012-10-31 カール・ツァイス・エスエムティー・ゲーエムベーハー 投影光学系
DE102005042005A1 (de) 2004-12-23 2006-07-06 Carl Zeiss Smt Ag Hochaperturiges Objektiv mit obskurierter Pupille
CN101713864B (zh) * 2004-12-23 2013-10-30 卡尔蔡司Smt有限责任公司 具有暗化光瞳的大孔径物镜
US7218453B2 (en) 2005-02-04 2007-05-15 Carl Zeiss Smt Ag Projection system, in particular for a microlithographic projection exposure apparatus
US7324185B2 (en) 2005-03-04 2008-01-29 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP2006309220A (ja) 2005-04-29 2006-11-09 Carl Zeiss Smt Ag 投影対物レンズ
US8248577B2 (en) 2005-05-03 2012-08-21 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
KR101455551B1 (ko) * 2005-05-12 2014-10-27 가부시키가이샤 니콘 투영 광학계, 노광 장치 및 노광 방법
JP2009508150A (ja) 2005-09-13 2009-02-26 カール・ツァイス・エスエムティー・アーゲー マイクロリソグラフィ投影光学系、ある機器を製造するための方法、光学面を設計する方法
WO2007093433A1 (de) 2006-02-17 2007-08-23 Carl Zeiss Smt Ag Beleuchtungssystem für die mikro-lithographie, projektionsbelichtungsanlage mit einem derartigen beleuchtungssystem
DE102006014380A1 (de) 2006-03-27 2007-10-11 Carl Zeiss Smt Ag Projektionsobjektiv und Projektionsbelichtungsanlage mit negativer Schnittweite der Eintrittspupille
US7920338B2 (en) 2006-03-28 2011-04-05 Carl Zeiss Smt Gmbh Reduction projection objective and projection exposure apparatus including the same
US7738188B2 (en) 2006-03-28 2010-06-15 Carl Zeiss Smt Ag Projection objective and projection exposure apparatus including the same
DE102007023411A1 (de) 2006-12-28 2008-07-03 Carl Zeiss Smt Ag Optisches Element, Beleuchtungsoptik für die Mikrolithographie mit mindestens einem derartigen optischen Element sowie Beleuchtungssystem mit einer derartigen Beleuchtungsoptik
JP5267029B2 (ja) 2007-10-12 2013-08-21 株式会社ニコン 照明光学装置、露光装置及びデバイスの製造方法
US8379187B2 (en) 2007-10-24 2013-02-19 Nikon Corporation Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
US9116346B2 (en) 2007-11-06 2015-08-25 Nikon Corporation Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method
JP2010026526A (ja) * 2009-10-26 2010-02-04 Nikon Corp 反射屈折型の投影光学系、露光装置、および露光方法
JP5877965B2 (ja) * 2011-07-04 2016-03-08 株式会社ニコン 投影光学系、露光装置、露光方法、およびデバイス製造方法
JP5664697B2 (ja) * 2013-05-13 2015-02-04 株式会社ニコン 反射屈折型の投影光学系、露光装置、および露光方法
JP2014194552A (ja) * 2014-04-28 2014-10-09 Nikon Corp 反射屈折型の投影光学系、露光装置、および露光方法
JP6358242B2 (ja) * 2015-11-30 2018-07-18 株式会社ニコン 露光装置、露光方法、デバイス製造方法およびパターン形成方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7859748B2 (en) 2000-01-14 2010-12-28 Carl Zeiss Smt Gmbh Microlithographic reduction projection catadioptric objective

Similar Documents

Publication Publication Date Title
JP2003114387A5 (US06195213-20010227-M00001.png)
TWI445999B (zh) 空間光調變單元、照明光學裝置、曝光裝置以及元件製造方法
TWI358615B (en) Illumination system
JP2002277742A5 (US06195213-20010227-M00001.png)
JP2004214242A5 (US06195213-20010227-M00001.png)
EP1059550A4 (en) REFRACTION REFLECTION IMAGE FORMING SYSTEM AND PROJECTION EXPOSURE APPARATUS INCLUDING THE OPTICAL SYSTEM
JP2001027727A5 (US06195213-20010227-M00001.png)
CN108107685B (zh) 曝光装置、曝光方法、器件制造方法及评价方法
JPH11249313A (ja) 環状面縮小投影光学系
EP1293834A2 (en) Illumination apparatus
JP2003107354A (ja) 結像光学系および露光装置
TW200949459A (en) Spatial light modulating unit, illumination optical system, aligner, and device manufacturing method
TW200937138A (en) Spatial light modulator, illumination optical system, aligner, and device manufacturing method
JP2018063406A5 (US06195213-20010227-M00001.png)
JP2002244046A5 (US06195213-20010227-M00001.png)
CN104854510B (zh) 微光刻投射曝光设备的光学系统
JP2005141158A5 (US06195213-20010227-M00001.png)
JP2005093693A5 (US06195213-20010227-M00001.png)
JP2004158786A5 (US06195213-20010227-M00001.png)
JP2009205011A (ja) 照明光学系、露光装置及びデバイス製造方法
JPH0684759A (ja) 照明装置
JP2000039557A5 (US06195213-20010227-M00001.png)
JP2002244035A5 (US06195213-20010227-M00001.png)
KR20180064306A (ko) 카타디옵트릭 광학계, 조명 광학계, 노광 장치 및 물품 제조 방법
JP2010272631A (ja) 照明装置、露光装置、及びデバイス製造方法