JP2003100844A5 - - Google Patents

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Publication number
JP2003100844A5
JP2003100844A5 JP2001296393A JP2001296393A JP2003100844A5 JP 2003100844 A5 JP2003100844 A5 JP 2003100844A5 JP 2001296393 A JP2001296393 A JP 2001296393A JP 2001296393 A JP2001296393 A JP 2001296393A JP 2003100844 A5 JP2003100844 A5 JP 2003100844A5
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JP
Japan
Prior art keywords
substrate
quadrilateral
cleaning
axis
quadrilateral substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2001296393A
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Japanese (ja)
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JP2003100844A (en
Filing date
Publication date
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Priority to JP2001296393A priority Critical patent/JP2003100844A/en
Priority claimed from JP2001296393A external-priority patent/JP2003100844A/en
Publication of JP2003100844A publication Critical patent/JP2003100844A/en
Publication of JP2003100844A5 publication Critical patent/JP2003100844A5/ja
Pending legal-status Critical Current

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Description

【0010】
請求項3に係る発明による四辺形基板反転装置は、例えば図1、図3に示すように、請求項2に記載の四辺形基板反転装置201において、前記ブイ字溝は、前記保持される基板Wを前記保持される基板Wの角部で挟持する。
請求項4に係る発明による四辺形基板反転装置は、例えば図1に示すように、請求項2または請求項3に記載の四辺形基板反転装置201において、基板保持部材202は、対称軸に対称に配置され、前記対称軸に対称に開閉動作をし、閉動作により基板Wを挟持する一対の部材241を含んで構成され;一対の部材241がそれぞれ2個の保持部品204を有している。典型的には、部材241の対称軸に基板Wの対角軸が一致するように基板Wを保持するとよい。
[0010]
The quadrilateral substrate reversing device according to the invention as set forth in claim 3 is, for example, as shown in FIGS. 1 and 3, in the quadrilateral substrate reversing device 201 according to claim 2, the buoyant groove is the substrate to be held. W is held at the corner of the substrate W to be held.
In the quadrilateral substrate reversing device according to the invention as set forth in claim 4 , for example, as shown in FIG. 1, in the quadrilateral substrate reversing device 201 according to claim 2 or claim 3 , the substrate holding member 202 is symmetrical about the symmetry axis. , And includes a pair of members 241 which open and close symmetrically about the symmetry axis and hold the substrate W by the closing operation; each pair of members 241 has two holding parts 204. . Typically, the substrate W may be held so that the diagonal axis of the substrate W coincides with the symmetry axis of the member 241.

【0011】
基板保持部材202は、対称軸に対称に配置され、対称軸に対称に開閉動作をし、閉動作により基板Wを挟持する一対の部材241を含み、この一対の部材241がそれぞれ2個の保持部品204を有するので、基板Wをスムーズにしっかりと挟持することができる。
[0011]
The substrate holding member 202 includes a pair of members 241 which are disposed symmetrically about the symmetry axis, open and close symmetrically about the symmetry axis, and hold the substrate W by the closing operation, and the pair of members 241 respectively hold two pieces Since the component 204 is provided, the substrate W can be held firmly and smoothly.

【0012】
請求項5に係る発明による四辺形基板反転装置は、例えば図1に示すように、請求項4に記載の四辺形基板反転装置201において、シリンダ軸214を有するシリンダ213を備え;シリンダ213は、シリンダ213にエアが供給されるとシリンダ軸214が移動して前記一対の部材241を作動させ、前記一対の部材241の基板の挟持を開放させるよう構成されている。
上記目的を達成するために、請求項6に係る発明による四辺形基板洗浄ユニット1002は、請求項1乃至請求項5のいずれか1項に記載の四辺形基板反転装置201と;四辺形の基板Wの表面または裏面のいずれか一方、及び対向する二つの側面を洗浄する洗浄装置401と;四辺形の基板Wを、四辺形基板反転装置201及び洗浄装置401間で搬送する搬送装置501とを備える。
[0012]
A quadrilateral substrate reversing device according to the invention according to claim 5 has a cylinder 213 having a cylinder axis 214 in the quadrilateral substrate reversing device 201 according to claim 4, for example, as shown in FIG. 1, the cylinder 213 is When air is supplied to the cylinder 213, the cylinder shaft 214 is moved to operate the pair of members 241, thereby releasing the sandwiching of the substrates of the pair of members 241.
In order to achieve the above object, a quadrilateral substrate cleaning unit 1002 according to the invention according to claim 6 comprises: a quadrilateral substrate reversing device 201 according to any one of claims 1 to 5 ; and a quadrilateral substrate A cleaning device 401 for cleaning one of the front surface and the back surface of W and two opposing side surfaces; and a transfer device 501 for transferring the quadrilateral substrate W between the quadrilateral substrate reversing device 201 and the cleaning device 401 Prepare.

【0013】
このように構成すると、請求項1乃至請求項5のいずれか1項に記載の四辺形基板反転装置201を備えるので、洗浄装置401によって四辺形の基板Wの表面または裏面のいずれか一方、及び対向する二つの側面を洗浄した後、基板Wを運搬装置501で四辺形基板反転装置201に搬送し、基板Wを第2の軸線L2回りに180度回転することにより、基板Wの表裏反転と、垂直中心軸回りの90度回転を同時に行うことができる。次に、基板Wを運搬装置501で洗浄装置401に搬送し、洗浄装置401によって、表面または裏面の残りの一方、及び残りの対向する二つの側面を洗浄することができる。よって、洗浄ユニット1002による洗浄時間を短縮することができる。
請求項7に記載の四辺形基板洗浄ユニットは、例えば図4、図5に示すように、請求項6に記載の四辺形基板洗浄ユニット1002において、洗浄装置401が、前記四辺形の基板Wの表面または裏面のいずれか一方を洗浄する上面洗浄ロール402と、前記対向する二つの側面を洗浄する側面洗浄ロール403とを有する。
[0013]
With such a configuration, since the quadrilateral substrate inverting device 201 according to any one of claims 1 to 5 is provided , either one of the front surface or the back surface of the quadrilateral substrate W is selected by the cleaning device 401, and After cleaning the two opposing side surfaces, the substrate W is transported by the transport device 501 to the quadrilateral substrate reversing device 201, and the substrate W is rotated 180 degrees around the second axis L2 to reverse the front and back of the substrate W , 90 degrees rotation about the vertical central axis can be performed simultaneously. Next, the substrate W is transferred by the transfer device 501 to the cleaning device 401, and the cleaning device 401 can clean the remaining one of the front surface or the back surface, and the remaining two opposite side surfaces. Therefore, the cleaning time by the cleaning unit 1002 can be shortened.
In the quadrilateral substrate cleaning unit according to claim 7 , for example, as shown in FIG. 4 and FIG. 5, in the quadrilateral substrate cleaning unit 1002 according to claim 6, the cleaning device 401 is the substrate W of the quadrilateral. It has a top cleaning roll 402 for cleaning one of the front and back sides, and a side cleaning roll 403 for cleaning the two opposite sides.

Claims (7)

四辺形の基板を表裏反転する四辺形基板反転装置において;
第1の軸線に沿って搬送された前記基板を保持し、第2の軸線回りに180度回転させる基板保持部材を備え;
前記第1の軸線と前記第2の軸線とは、45度の角度をなしている;
四辺形基板反転装置。
In a quadrilateral substrate inverting apparatus that inverts a quadrilateral substrate;
A substrate holding member for holding the substrate transported along the first axis and rotating the substrate about the second axis by 180 degrees;
Said first axis and said second axis form an angle of 45 degrees;
Quadrilateral substrate reversing device.
前記基板保持部材は、保持される基板を挟持するブイ字溝の形成された4個の保持部品を有する;
請求項1に記載の四辺形基板反転装置。
The substrate holding member has four holding parts formed with buoyant grooves for holding the substrate to be held;
The quadrilateral substrate inverting apparatus according to claim 1.
前記ブイ字溝は、前記保持される基板を前記保持される基板の角部で挟持する;The buoy groove sandwiches the held substrate at the corner of the held substrate;
請求項2に記載の四辺形基板反転装置。  The quadrilateral substrate inverting apparatus according to claim 2.
前記基板保持部材は、対称軸に対称に配置され、前記対称軸に対称に開閉動作をし、閉動作により前記基板を挟持する一対の部材を含んで構成され;
前記一対の部材がそれぞれ2個の前記保持部品を有している;
請求項2または請求項3に記載の四辺形基板反転装置。
The substrate holding member includes a pair of members disposed symmetrically about the symmetry axis, opening and closing symmetrically about the symmetry axis, and holding the substrate by the closing operation;
The pair of members each having two of the holding parts;
The quadrilateral substrate inverting device according to claim 2 or claim 3 .
シリンダ軸を有するシリンダを備え;Comprising a cylinder having a cylinder axis;
前記シリンダは、前記シリンダにエアが供給されると前記シリンダ軸が移動して前記一対の部材を作動させ、前記一対の部材の基板の挟持を開放させるよう構成されている;  The cylinder is configured such that, when air is supplied to the cylinder, the cylinder shaft moves to operate the pair of members to release the sandwiching of the substrates of the pair of members;
請求項4に記載の四辺形基板反転装置。  The quadrilateral substrate inverting device according to claim 4.
請求項1乃至請求項5のいずれか1項に記載の四辺形基板反転装置と;
前記四辺形の基板の表面または裏面のいずれか一方、及び対向する二つの側面を洗浄する洗浄装置と;
前記四辺形の基板を、前記四辺形基板反転装置及び前記洗浄装置間で搬送する搬送装置とを備えた;
四辺形基板洗浄ユニット。
A quadrilateral substrate reversing device according to any one of claims 1 to 5 ;
A cleaning device for cleaning either the front surface or the back surface of the quadrilateral substrate, and two opposing side surfaces;
A transfer device for transferring the quadrilateral substrate between the quadrilateral substrate reversing device and the cleaning device;
Quadrilateral substrate cleaning unit.
前記洗浄装置が、前記四辺形の基板の表面または裏面のいずれか一方を洗浄する上面洗浄ロールと、前記対向する二つの側面を洗浄する側面洗浄ロールとを有する;The cleaning device has a top cleaning roll for cleaning either the front surface or the back surface of the quadrilateral substrate, and a side cleaning roll for cleaning the two opposing side surfaces;
請求項6に記載の四辺形基板洗浄ユニット。  The quadrilateral substrate cleaning unit according to claim 6.
JP2001296393A 2001-09-27 2001-09-27 Inverter for quadrilateral substrate and unit for cleaning quadrilateral substrate Pending JP2003100844A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2001296393A JP2003100844A (en) 2001-09-27 2001-09-27 Inverter for quadrilateral substrate and unit for cleaning quadrilateral substrate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2001296393A JP2003100844A (en) 2001-09-27 2001-09-27 Inverter for quadrilateral substrate and unit for cleaning quadrilateral substrate

Publications (2)

Publication Number Publication Date
JP2003100844A JP2003100844A (en) 2003-04-04
JP2003100844A5 true JP2003100844A5 (en) 2005-01-06

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Family Applications (1)

Application Number Title Priority Date Filing Date
JP2001296393A Pending JP2003100844A (en) 2001-09-27 2001-09-27 Inverter for quadrilateral substrate and unit for cleaning quadrilateral substrate

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JP (1) JP2003100844A (en)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007053154A (en) * 2005-08-16 2007-03-01 Pre-Tech Co Ltd Cleaning device for mask substrate, and cleaning method for mask substrate using the device
KR100814506B1 (en) 2005-12-29 2008-03-18 주식회사 탑 엔지니어링 Apparatus for Turn Over of Substrate
JP5111285B2 (en) * 2008-08-06 2013-01-09 株式会社日立ハイテクノロジーズ Sample transport mechanism
TWI626091B (en) * 2016-10-28 2018-06-11 旭東機械工業股份有限公司 Panel cleaning system
WO2023106041A1 (en) * 2021-12-08 2023-06-15 株式会社村田製作所 Handling device

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