JP2003100245A - Sample holder for focused ion beam machining observation device - Google Patents
Sample holder for focused ion beam machining observation deviceInfo
- Publication number
- JP2003100245A JP2003100245A JP2001290515A JP2001290515A JP2003100245A JP 2003100245 A JP2003100245 A JP 2003100245A JP 2001290515 A JP2001290515 A JP 2001290515A JP 2001290515 A JP2001290515 A JP 2001290515A JP 2003100245 A JP2003100245 A JP 2003100245A
- Authority
- JP
- Japan
- Prior art keywords
- sample
- ion beam
- focused ion
- piece
- sample holder
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は、電子顕微鏡観察用
試料を作製する方法に係り、特に集束イオンビーム(以
下、FIB)加工装置で試料から、より微小な試料片を
摘出し、摘出した前記微小試料片を試料台に固定するす
る際に、摘出した前記微小試料片を水平に保たれた試料
台に確実に固定することが可能であり、前記微小試料片
を前記試料台から取り外すことなく、異なった方向から
観察できることが可能な集束イオンビーム加工観察装置
用試料ホールダに関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for preparing a sample for electron microscope observation, and in particular, a finer sample piece is extracted from a sample by a focused ion beam (hereinafter, FIB) processing apparatus, When fixing the micro sample piece to the sample table, it is possible to securely fix the extracted micro sample piece to the horizontally held sample table, without removing the micro sample piece from the sample table. , A sample holder for a focused ion beam processing and observation apparatus capable of observing from different directions.
【0002】[0002]
【従来の技術】従来の前記微小試料片は、前記試料台の
試料固定部に固定する際、前記試料台として、シリコン
ウエハからへき開やダイシングソーを利用して形成し
た、シリコン片端部に前記微小試料片を固定していた。
公知例として特開平11−108813号公報記載のように、バ
ルク試料から、所望の特定領域を含む試料片のみを摘出
して、1mm×2.5mm×0.1mmのナイフエッジ状に加工
したシリコン(Si)片の表面にFIB照射によって形成す
るデポジション膜を用いて固定する方法がある。しか
し、この方法では、試料固定部に試料片を固定する場
合、試料台に凹凸がある可能性があり、なおかつ試料台
の水平が確認できないため、確実に試料を固定できない
問題があった。2. Description of the Related Art A conventional micro sample piece is formed by using a cleavage or dicing saw from a silicon wafer as the sample table when fixing it to the sample fixing part of the sample table. The sample piece was fixed.
As a known example, as described in JP-A-11-108813, only a sample piece including a desired specific region is extracted from a bulk sample and processed into a knife edge shape of 1 mm × 2.5 mm × 0.1 mm. There is a method of fixing by using a deposition film formed by FIB irradiation on the surface of (Si) piece. However, in this method, when the sample piece is fixed to the sample fixing portion, there is a possibility that the sample table may be uneven and the horizontalness of the sample table cannot be confirmed, so that the sample cannot be reliably fixed.
【0003】また、特願2000−58020号公報記載のよう
に、微小試料を固定する端面を鏡面仕上げ加工し、微小
試料片を確実に試料台に固定する方法がある。しかし、
この方法では、試料台を一定の方向に固定することはで
きず、なおかつ試料を取り外すことなく、異なった方向
から観察することはできない問題があった。Further, as described in Japanese Patent Application No. 2000-58020, there is a method in which an end surface for fixing a micro sample is mirror-finished and a micro sample piece is securely fixed to a sample table. But,
This method has a problem that the sample stage cannot be fixed in a fixed direction, and the sample cannot be observed from different directions without being removed.
【0004】[0004]
【発明が解決しようとする課題】しかし、例えばSiデバ
イスなどのように一定の方向からの観察による微細構造
評価が要求される試料では、試料作製の段階から観察方
位を考慮した試料の作製とその試料台への固定が必要で
ある。However, in the case of a sample that requires fine structure evaluation by observing from a certain direction, such as a Si device, the preparation of the sample considering the observation orientation from the stage of sample preparation and its It is necessary to fix it to the sample table.
【0005】本発明の目的は、FIB加工で試料から、微
小な試料片を摘出し、TEM用試料に加工する際に、摘出
した前記微小試料片を水平に保たれた前記試料台に確実
に固定することが可能であり、前記試料台を一定の方向
に確実に固定することが可能な集束イオンビーム加工観
察装置用試料ホールダを提供することにある。An object of the present invention is to remove a minute sample piece from a sample by FIB processing, and when processing the sample piece for TEM, ensure that the extracted minute sample piece is placed on the sample table kept horizontally. An object of the present invention is to provide a sample holder for a focused ion beam processing and observation apparatus that can be fixed and that can surely fix the sample stage in a fixed direction.
【0006】また、前記微小試料片を前記試料台から取
り外すことなく、異なった方向から観察できる試料台と
機構を備えた集束イオンビーム加工観察装置用試料ホー
ルダを提供することにある。Another object of the present invention is to provide a sample holder for a focused ion beam processing / observing apparatus equipped with a sample stage and a mechanism capable of observing from different directions without removing the minute sample piece from the sample stage.
【0007】[0007]
【課題を解決するための手段】上記目的は、集束イオン
ビーム加工観察装置用試料ホールダに備え付ける試料台
の微小試料片固定面が常に水平に保たれており、前記試
料台を一定の方向に固定するための試料台固定部を備え
たことで達成される。[Means for Solving the Problems] The above-mentioned object is to fix a small sample piece fixed surface of a sample table provided in a sample holder for a focused ion beam processing and observation apparatus at a constant level, and fix the sample table in a fixed direction. This is achieved by providing a sample table fixing part for
【0008】また、前記集束イオンビーム加工観察装置
用試料ホールダにおいて、前記微小試料片を前記試料台
から取り外すことなく、異なった方向から観察できる試
料台と機構を備えたことで達成される。Further, the sample holder for the focused ion beam processing / observing apparatus is provided with a sample stage and a mechanism for observing from different directions without removing the minute sample piece from the sample stage.
【0009】[0009]
【発明の実施の形態】図1に本発明の一実施例である試
料台1の斜視図を示す。試料台1には、微小試料片2が
デポジション膜3により固定されている。試料台1の微
小試料片固定部4は、常に水平に保たれた形状をしてい
る。試料片2の固定部4は表面の凹凸がなく平坦であ
る。試料片2を固定部4に固定する際、デポジション用
ガスを流出させつつFIBを走査させ、FIB照射領域
にデポジション膜3を形成し試料片2を固定している。
固定部4はデポジション用ガスが固定部4の凹凸に遮ら
れることなく、容易にFIB照射領域にデポジション膜
3を形成することができる。さらに、固定部4は水平で
あるため、試料片2の底部は固定部4に密接し、デポジ
ション膜3で確実に固定することができる。試料固定部
は固定部4のみならず微小試料片固定部5も常に水平に
保たれているため、試料固定部として使用することがで
きる。FIG. 1 is a perspective view of a sample table 1 which is an embodiment of the present invention. A micro sample piece 2 is fixed to the sample table 1 by a deposition film 3. The small sample piece fixing portion 4 of the sample table 1 has a shape which is always kept horizontal. The fixed part 4 of the sample piece 2 is flat without surface irregularities. When fixing the sample piece 2 to the fixing portion 4, the FIB is scanned while allowing the deposition gas to flow out, and the deposition film 3 is formed in the FIB irradiation region to fix the sample piece 2.
The fixing portion 4 can easily form the deposition film 3 in the FIB irradiation region without the deposition gas being blocked by the irregularities of the fixing portion 4. Furthermore, since the fixing part 4 is horizontal, the bottom part of the sample piece 2 is in close contact with the fixing part 4 and can be reliably fixed by the deposition film 3. Since the sample fixing part is always kept horizontal not only in the fixing part 4 but also in the minute sample piece fixing part 5, it can be used as a sample fixing part.
【0010】図2に、FIBによりくさび型となるよう
に加工し、摘出された試料片2の形状を示す。試料片2
はバルク状の試料から摘出する際、底部は固定部4に対
して水平になるように加工し、確実に固定できる形状に
している。サイズはこれによらないが、摘出加工工程お
よび透過型電子顕微鏡で観察するための薄膜加工工程の
加工時間を短縮するために、電子顕微鏡で目的箇所の観
察が十分にできる領域が残る範囲で、できるだけ小さな
サイズにする。FIG. 2 shows the shape of a sample piece 2 that has been processed by FIB to have a wedge shape and then extracted. Sample piece 2
When the sample is extracted from a bulk sample, the bottom part is processed to be horizontal with respect to the fixing part 4 so that it can be reliably fixed. Although the size does not depend on this, in order to shorten the processing time of the thin film processing step for observing with the extraction processing step and the transmission electron microscope, in the range where the area where the target location can be sufficiently observed with the electron microscope remains, Make it as small as possible.
【0011】図3に、従来の試料台6および試料ホール
ダ7の斜視図を示す。試料台6および試料ホールダ7の
試料台固定部8は円形であり、試料台6が容易に回転し
てしまうため、固定部4を水平にするのは難しい。ま
た、試料台6を試料ホールダ7からはずして、再度試料
台6を試料ホールダ7に取り付け、FIB加工あるいは観
察する場合、FIB加工あるいは観察位置を正確に再現で
きない。FIG. 3 shows a perspective view of the conventional sample table 6 and sample holder 7. Since the sample table 6 and the sample table fixing part 8 of the sample holder 7 are circular and the sample table 6 easily rotates, it is difficult to make the fixing part 4 horizontal. Further, when the sample table 6 is removed from the sample holder 7 and the sample table 6 is attached to the sample holder 7 again to perform FIB processing or observation, the FIB processing or observation position cannot be accurately reproduced.
【0012】図4に本発明の一実施例である試料台1お
よび試料ホールダ9の斜視図を示す。試料台1に直角部
10、および試料ホールダ9の試料台1固定部に、直角
部11を設けることにより、試料台1は回転することは
ない。なおかつ、試料台1および試料ホールダ9の試料
台固定部に隙間はなく、回転せずに密接して取り付ける
ことができるため、試料台1を試料ホールダ9からはず
して、再度試料台1を試料ホールダ9に取り付けする場
合、イオンビームあるいは電子ビーム照射位置が正確に
再現できる。FIG. 4 is a perspective view of the sample table 1 and the sample holder 9 according to one embodiment of the present invention. By providing the right angle part 10 on the sample base 1 and the right angle part 11 on the sample base 1 fixed part of the sample holder 9, the sample base 1 does not rotate. Moreover, since there is no gap between the sample table 1 and the sample table fixing part of the sample holder 9 and the sample table 1 can be closely attached without rotating, the sample table 1 is removed from the sample holder 9 and the sample table 1 is again attached. When it is attached to No. 9, the ion beam or electron beam irradiation position can be accurately reproduced.
【0013】図5に本発明の一実施例である試料台1お
よび試料ホールダ9に備え付けられた、試料台変形機構
12の斜視図を示す。試料台1にはSn,Cu,Alな
ど塑性変形する材質が用いられる。試料台変形機構12
の主軸13は試料ホールダ9の内部に組み込まれてい
る。主軸の先端に取り付けられた板、棒、あるいは針状
の2本のつまみで試料台1をはさみ、主軸13を回転す
ることで試料台が塑性変形し、微小試料片2の観察方位
を変えることができる。試料台回転機構は、先端の2本
のつまみを自由自在に動かすことが可能で、微小試料片
2をあらゆる観察方位に合わせることができる。FIG. 5 is a perspective view of the sample table deforming mechanism 12 provided on the sample table 1 and the sample holder 9 according to an embodiment of the present invention. A material that is plastically deformed, such as Sn, Cu, or Al, is used for the sample table 1. Sample stage deformation mechanism 12
The main shaft 13 of is incorporated in the sample holder 9. A plate, rod, or two needle-shaped knobs attached to the tip of the main shaft sandwiches the sample base 1, and the main shaft 13 is rotated to plastically deform the sample base, changing the observation direction of the minute sample piece 2. You can The sample stage rotation mechanism can freely move the two knobs at the tip, and the micro sample piece 2 can be adjusted to any observation orientation.
【0014】[0014]
【発明の効果】本発明による集束イオンビーム加工観察
装置用試料ホールダを用いることにより、微小試料片を
試料台に一定の方向に確実に固定することができる。By using the sample holder for the focused ion beam processing / observing apparatus according to the present invention, it is possible to securely fix the minute sample piece on the sample table in a fixed direction.
【図1】本発明の一実施例である試料台の斜視図。FIG. 1 is a perspective view of a sample table which is an embodiment of the present invention.
【図2】一実施例である微小試料片の斜視図。FIG. 2 is a perspective view of a micro sample piece which is an example.
【図3】従来技術の一実施例である集束イオンビーム加
工観察装置用試料ホールダを示す図。FIG. 3 is a diagram showing a sample holder for a focused ion beam processing / observing apparatus, which is an example of a conventional technique.
【図4】本発明の一実施例である集束イオンビーム加工
観察装置用試料ホールダを示す図。FIG. 4 is a diagram showing a sample holder for a focused ion beam processing / observing apparatus according to an embodiment of the present invention.
【図5】本発明の一実施例である試料台と集束イオンビ
ーム加工観察装置用試料ホールダを示す図。FIG. 5 is a diagram showing a sample stage and a sample holder for a focused ion beam processing / observing apparatus according to an embodiment of the present invention.
1…試料台、2…微小試料片、3…デポジション膜、4
…微小試料片固定部、5…微小試料片固定部、6…従来
技術試料台、7…試料ホールダ、8…試料台固定部、9
…試料ホールダ、10…試料台直角部、11…試料ホー
ルダ直角部、12…試料台変形機構、13…試料台変形
機構主軸。1 ... Sample stand, 2 ... Micro sample piece, 3 ... Deposition film, 4
Micro sample piece fixing part, 5 Micro sample piece fixing part, 6 Conventional sample holder, 7 Sample holder, 8 Sample holder fixing part, 9
... sample holder, 10 ... sample holder right angle part, 11 ... sample holder right angle part, 12 ... sample table deformation mechanism, 13 ... sample table deformation mechanism main shaft.
───────────────────────────────────────────────────── フロントページの続き (72)発明者 小池 英巳 茨城県ひたちなか市大字市毛882番地 株 式会社日立製作所計測器グループ内 (72)発明者 上野 武夫 茨城県ひたちなか市大字市毛1040番地 株 式会社日立サイエンスシステムズ内 Fターム(参考) 2G052 AD32 AD52 DA33 EC18 EC22 GA33 5C001 AA01 AA02 AA05 CC03 ─────────────────────────────────────────────────── ─── Continued front page (72) Inventor Hidemi Koike 882 Ichige, Ichima, Hitachinaka City, Ibaraki Prefecture Ceremony company Hitachi measuring instruments group (72) Inventor Takeo Ueno 1040 Ichimo, Ichima, Hitachinaka City, Ibaraki Prefecture Inside the company Hitachi Science Systems F term (reference) 2G052 AD32 AD52 DA33 EC18 EC22 GA33 5C001 AA01 AA02 AA05 CC03
Claims (3)
小試料片を摘出し、摘出した前記微小試料片を固定する
試料ホールダにおいて、前記微小試料片を固定する試料
台の試料固定面が常に水平に保たれていることを特徴と
する集束イオンビーム加工観察装置用試料ホールダ。1. In a sample holder for picking up a minute sample piece from a sample by using a focused ion beam and fixing the extracted minute sample piece, the sample fixing surface of a sample table for fixing the minute sample piece is always horizontal. A sample holder for a focused ion beam processing and observation device, characterized in that
察装置用試料ホールダにおいて、前記試料台を一定の方
向に固定するための試料台固定部を備えたことを特徴と
する集束イオンビーム加工観察装置用試料ホールダ。2. The focused ion beam processing / observing apparatus according to claim 1, further comprising a sample table fixing portion for fixing the sample table in a fixed direction. Device sample holder.
察装置用試料ホールダにおいて、前記微小試料片を前記
試料台から取り外すことなく、異なった方向から観察で
きる試料台と機構を備えたことを特徴とする集束イオン
ビーム加工観察装置用試料ホールダ。3. The sample holder for a focused ion beam processing / observing apparatus according to claim 1, further comprising a sample stage and a mechanism capable of observing from different directions without removing the minute sample piece from the sample stage. Sample holder for focused ion beam processing and observation device.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2001290515A JP2003100245A (en) | 2001-09-25 | 2001-09-25 | Sample holder for focused ion beam machining observation device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2001290515A JP2003100245A (en) | 2001-09-25 | 2001-09-25 | Sample holder for focused ion beam machining observation device |
Publications (1)
Publication Number | Publication Date |
---|---|
JP2003100245A true JP2003100245A (en) | 2003-04-04 |
Family
ID=19112814
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2001290515A Pending JP2003100245A (en) | 2001-09-25 | 2001-09-25 | Sample holder for focused ion beam machining observation device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2003100245A (en) |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2005228608A (en) * | 2004-02-13 | 2005-08-25 | Matsushita Electric Ind Co Ltd | Electron microscope device and observation method with electron microscope |
JP2013524244A (en) * | 2010-04-11 | 2013-06-17 | ガタン インコーポレイテッド | Ion beam sample preparation apparatus and method |
JP2013524243A (en) * | 2010-04-11 | 2013-06-17 | ガタン インコーポレイテッド | Ion beam sample preparation thermal management apparatus and method |
JP2013524242A (en) * | 2010-04-11 | 2013-06-17 | ガタン インコーポレイテッド | Ion beam sample preparation apparatus and method |
JP2013527435A (en) * | 2010-04-11 | 2013-06-27 | ガタン インコーポレイテッド | Ion beam sample preparation apparatus and method |
JP2014146493A (en) * | 2013-01-29 | 2014-08-14 | Sumitomo Metal Mining Co Ltd | Sample table for electron microscope observation and cross section observation method of sample |
-
2001
- 2001-09-25 JP JP2001290515A patent/JP2003100245A/en active Pending
Cited By (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2005228608A (en) * | 2004-02-13 | 2005-08-25 | Matsushita Electric Ind Co Ltd | Electron microscope device and observation method with electron microscope |
JP2013524244A (en) * | 2010-04-11 | 2013-06-17 | ガタン インコーポレイテッド | Ion beam sample preparation apparatus and method |
JP2013524243A (en) * | 2010-04-11 | 2013-06-17 | ガタン インコーポレイテッド | Ion beam sample preparation thermal management apparatus and method |
JP2013524242A (en) * | 2010-04-11 | 2013-06-17 | ガタン インコーポレイテッド | Ion beam sample preparation apparatus and method |
JP2013527435A (en) * | 2010-04-11 | 2013-06-27 | ガタン インコーポレイテッド | Ion beam sample preparation apparatus and method |
JP2016026374A (en) * | 2010-04-11 | 2016-02-12 | ガタン インコーポレイテッドGatan Inc. | Ion beam sample preparation thermal management apparatus and methods |
EP2708870B1 (en) * | 2010-04-11 | 2022-05-18 | Gatan Inc. | Ion beam shield |
EP2558837B1 (en) * | 2010-04-11 | 2022-05-25 | Gatan Inc. | Ion beam sample preparation thermal management apparatus and methods |
EP2558836B1 (en) * | 2010-04-11 | 2022-05-25 | Gatan, Inc. | Ion beam sample preparation apparatus and methods |
EP2558839B1 (en) * | 2010-04-11 | 2022-06-15 | Gatan, Inc. | Ion beam sample preparation apparatus and methods |
JP2014146493A (en) * | 2013-01-29 | 2014-08-14 | Sumitomo Metal Mining Co Ltd | Sample table for electron microscope observation and cross section observation method of sample |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
KR100253145B1 (en) | Sample separating method & analyzing method of separated sample | |
US6995380B2 (en) | End effector for supporting a microsample | |
US6188068B1 (en) | Methods of examining a specimen and of preparing a specimen for transmission microscopic examination | |
US20130340936A1 (en) | Method for ex-situ lift-out specimen preparation | |
US20010045511A1 (en) | Method for sample separation and lift-out | |
JP4699168B2 (en) | Electron microscope sample preparation method | |
US6300631B1 (en) | Method of thinning an electron transparent thin film membrane on a TEM grid using a focused ion beam | |
JP2001124676A (en) | Sample support member for electron microscopic observation | |
US10801926B2 (en) | Probe with solid beveled tip and method for using same for specimen extraction | |
JP4890373B2 (en) | Sample preparation method | |
JP3711018B2 (en) | TEM sample thinning method | |
US7112790B1 (en) | Method to prepare TEM samples | |
JP2003194681A (en) | Tem sample preparation method | |
JP2003100245A (en) | Sample holder for focused ion beam machining observation device | |
JP2009259556A (en) | Electron microscope observation sample supporting member | |
JP3751062B2 (en) | Sample holder for cross-sectional TEM observation and TEM apparatus including the same | |
JP2003007241A (en) | Common sample holder for scanning electron microscope and focused-ion beam device, and sample-preparation method for transmission electron microscope | |
JP2001311681A (en) | Method for preparing sample for transmission electron microscope observation and sampling apparatus | |
JPH08304243A (en) | Sample having cross sectional thin-film, its manufacture, and its holder | |
CN113466268B (en) | Combined sample and preparation method thereof | |
EP3364444A1 (en) | A method and apparatus for transmission electron microscopy | |
EP3023763B1 (en) | Specimen preparation device | |
JP4845452B2 (en) | Sample observation method and charged particle beam apparatus | |
JP3106846U (en) | Sample holder for charged particle beam equipment | |
JP2013205017A (en) | Apparatus and method for preparing minute thin film sample for transmission electron microscope |