JP2003094445A - Manufacturing method for fine structure, manufacturing method for device equipped with the fine structure, fine structure by the manufacturing method, device for manufacturing the fine structure, and device for manufacturing device equipped with the fine structure - Google Patents
Manufacturing method for fine structure, manufacturing method for device equipped with the fine structure, fine structure by the manufacturing method, device for manufacturing the fine structure, and device for manufacturing device equipped with the fine structureInfo
- Publication number
- JP2003094445A JP2003094445A JP2001287390A JP2001287390A JP2003094445A JP 2003094445 A JP2003094445 A JP 2003094445A JP 2001287390 A JP2001287390 A JP 2001287390A JP 2001287390 A JP2001287390 A JP 2001287390A JP 2003094445 A JP2003094445 A JP 2003094445A
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- mother stamper
- resin
- manufacturing
- fine structure
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は、回折格子等の光学
素子、反射板又は半透過反射型の液晶表示器等の分野に
利用される、基板上に微細なパターンを有する微細構造
体の製造方法に係り、より詳細には、スタンパーの表面
にある微細パターンを大型基板へ転写させることによる
微細構造体の製造方法、該微細構造体を備えた装置の製
造方法、該製造方法による微細構造体、該微細構造体製
造用装置並びに該微細構造体を備えた装置製造用装置に
関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to the production of a fine structure having a fine pattern on a substrate, which is used in the fields of optical elements such as diffraction gratings, reflectors or transflective liquid crystal displays. More specifically, the present invention relates to a method, a method for producing a fine structure by transferring a fine pattern on a surface of a stamper to a large substrate, a method for producing a device provided with the fine structure, and a fine structure by the production method. The present invention relates to an apparatus for manufacturing the fine structure and an apparatus for manufacturing an apparatus including the fine structure.
【0002】[0002]
【従来の技術】従来から、微細構造体である光ディスク
等の樹脂板の製造方法としては、射出成形法や2P法
(photo polymerization)等が公知である。射出成形
法は、溶融した樹脂を高圧力で、樹脂板のスタンパが配
置された金型内に注入して、この樹脂を硬化させること
により、スタンパの表面にある微細パターンが転写され
た微細構造体を得るものである。2. Description of the Related Art Conventionally, injection molding, 2P (photo polymerization) and the like have been known as methods for producing resin plates such as optical discs, which are fine structures. In the injection molding method, a molten resin is injected under high pressure into a mold in which a stamper of a resin plate is placed, and the resin is cured, so that a fine structure on which the fine pattern on the stamper surface is transferred. It is to get the body.
【0003】一方、2P法は、光学的特性の良いプラス
チック平板を準備し、当該平板とスタンパとの間に光硬
化樹脂を充填し、前記プラスチック平板側から光を当て
て、前記光硬化樹脂を硬化させることにより、スタンパ
の表面にある微細パターンが転写された微細構造体を得
るものである。On the other hand, in the 2P method, a plastic flat plate having good optical characteristics is prepared, a photocurable resin is filled between the flat plate and the stamper, and light is applied from the plastic flat plate side to cure the photocurable resin. By curing, a fine structure on which the fine pattern on the surface of the stamper has been transferred is obtained.
【0004】しかしながら、前述した射出成形法及び2
P法を利用して、大面積の微細構造体を製造するには装
置の大型化が必要であるが、その大型化は大変困難であ
る。However, the above-mentioned injection molding method and 2
In order to manufacture a large-area fine structure using the P method, it is necessary to upsize the device, but it is very difficult to upsize it.
【0005】特開平7−153124号には、スタンパ
を移動させて多面付けスタンパを作成する方法が開示さ
れている。しかし、微細パターンの転写の場合には樹脂
ムラが問題となり、また、樹脂中に存在する空気により
微細パターンの転写に悪影響を及ぼすおそれがある。さ
らに、上記文献での多面付けにおけるスタンパは一方向
にしか移動できない問題もある。Japanese Patent Laid-Open No. 7-153124 discloses a method of moving a stamper to form a multi-faced stamper. However, in the case of transferring a fine pattern, resin unevenness becomes a problem, and the air present in the resin may adversely affect the transfer of the fine pattern. Further, there is a problem that the stamper in the multi-faced mounting described in the above document can move only in one direction.
【0006】[0006]
【発明が解決しようとする課題】本発明は、かかる事情
に鑑み、微細構造体を製造するための装置を大型化する
必要性がなく、高精度で微細パターンの転写を可能にす
る、微細構造体の製造方法を提供することを目的とす
る。SUMMARY OF THE INVENTION In view of such circumstances, the present invention makes it possible to transfer a fine pattern with high accuracy without the need to upsize the apparatus for manufacturing the fine structure. It is an object to provide a method for manufacturing a body.
【0007】[0007]
【課題を解決するための手段】上記目的は、マザースタ
ンパの表面にある微細パターンを順次転写させることに
よる微細構造体の製造方法であって、(1)基板に対し
て前記マザースタンパを所定の位置に固定する工程と、
(2)前記マザースタンパと前記基板との間に樹脂を供
給する工程と、(3)真空中にて前記マザースタンパを
前記樹脂に押圧する工程と、(4)前記樹脂を硬化させ
る工程と、(5)前記マザースタンパを前記硬化樹脂か
ら離脱させる工程と、(6)前記マザースタンパと前記
基板との相対位置を変更させるように、前記マザースタ
ンパ若しくは前記基板を移動させる工程と、(7)前記
工程(6)の後、工程(2)〜工程(6)を所定の回数
繰り返す工程と、を含むことを特徴とする微細構造体の
製造方法により達成される。The above object is a method of manufacturing a fine structure by sequentially transferring a fine pattern on the surface of a mother stamper, which comprises (1) a predetermined mother stamper for a substrate. Fixing in position,
(2) supplying resin between the mother stamper and the substrate; (3) pressing the mother stamper against the resin in a vacuum; and (4) curing the resin. (5) removing the mother stamper from the cured resin; (6) moving the mother stamper or the substrate so as to change the relative position of the mother stamper and the substrate; and (7) After the step (6), the step (2) to the step (6) are repeated a predetermined number of times, and the method is achieved by a method for producing a fine structure.
【0008】また、上記目的は、マザースタンパの表面
にある微細パターンを順次転写させることによる微細構
造体を備えた装置の製造方法であって、前記微細構造体
は、(1)基板に対して前記マザースタンパを所定の位
置に固定する工程と、(2)前記マザースタンパと前記
基板との間に樹脂を供給する工程と、(3)真空中にて
前記マザースタンパを前記樹脂に押圧する工程と、
(4)前記樹脂を硬化させる工程と、(5)前記マザー
スタンパを前記硬化樹脂から離脱させる工程と、(6)
前記マザースタンパと前記基板との相対位置を変更させ
るように、前記マザースタンパ若しくは前記基板を移動
させる工程と、(7)前記工程(6)の後、工程(2)
〜工程(6)を所定の回数繰り返す工程と、を含む方法
により製造され、(8)前記微細構造体を前記装置に組
み込む工程と、を含む微細構造体を備えた装置の製造方
法により達成される。Further, the above object is a method of manufacturing an apparatus having a fine structure by sequentially transferring a fine pattern on the surface of a mother stamper, wherein the fine structure is (1) with respect to a substrate. Fixing the mother stamper at a predetermined position; (2) supplying resin between the mother stamper and the substrate; and (3) pressing the mother stamper against the resin in a vacuum. When,
(4) curing the resin, (5) releasing the mother stamper from the cured resin, and (6)
A step of moving the mother stamper or the substrate so as to change the relative position of the mother stamper and the substrate; and (7) a step (2) after the step (6).
To a step of repeating the step (6) a predetermined number of times, and (8) incorporating the fine structure into the apparatus, and a method of manufacturing an apparatus having a fine structure. It
【0009】本発明の好ましい態様では、前記製造方法
において、前記硬化樹脂よりも柔軟性のあるクッション
材を介して、前記基板及び前記マザースタンパの各位置
が固定されることを特徴とする。In a preferred aspect of the present invention, the manufacturing method is characterized in that the respective positions of the substrate and the mother stamper are fixed via a cushioning material which is more flexible than the cured resin.
【0010】本発明の好ましい態様では、前記製造方法
において、前記工程(2)において、インクジェット法
により所定の位置に前記樹脂を供給することを特徴とす
る。In a preferred aspect of the present invention, in the manufacturing method, in the step (2), the resin is supplied to a predetermined position by an inkjet method.
【0011】本発明の好ましい態様では、前記製造方法
において、前記樹脂は光硬化性樹脂又は熱硬化性樹脂で
あることを特徴とする。In a preferred aspect of the present invention, in the manufacturing method, the resin is a photocurable resin or a thermosetting resin.
【0012】また、上記目的は、マザースタンパの表面
にある微細パターンを、熱可塑性樹脂からなる基板へ順
次転写させることによる微細構造体の製造方法であっ
て、(1)前記基板に対して前記マザースタンパを所定
の位置に固定する工程と、(2)前記基板を加熱圧着す
るように、真空中にて前記マザースタンパを前記基板へ
押圧する工程と、(3)前記マザースタンパを前記基板
から離脱させる工程と、(4)前記マザースタンパと前
記基板との相対位置を変更させるように、前記マザース
タンパ若しくは前記基板を移動させる工程と、(5)前
記工程(4)の後、工程(2)〜工程(4)を所定の回
数繰り返す工程と、を含むことを特徴とする微細構造体
の製造方法により達成される。Further, the above object is a method for producing a fine structure by sequentially transferring a fine pattern on the surface of a mother stamper to a substrate made of a thermoplastic resin, which is (1) A step of fixing the mother stamper at a predetermined position; (2) a step of pressing the mother stamper against the substrate in a vacuum so that the substrate is thermocompression bonded; and (3) a step of pressing the mother stamper from the substrate. And (4) moving the mother stamper or the substrate so as to change the relative position between the mother stamper and the substrate, and (5) after the step (4), the step (2) ) To step (4) are repeated a predetermined number of times, and a method for manufacturing a fine structure is achieved.
【0013】また、上記目的は、マザースタンパの表面
にある微細パターンを、熱可塑性樹脂からなる基板へ順
次転写させることによる微細構造体を備えた装置の製造
方法であって、前記微細構造体は、(1)前記基板に対
して前記マザースタンパを所定の位置に固定する工程
と、(2)前記基板を加熱圧着するように、真空中にて
前記マザースタンパを前記基板へ押圧する工程と、
(3)前記マザースタンパを前記基板から離脱させる工
程と、(4)前記マザースタンパと前記基板との相対位
置を変更させるように、前記マザースタンパ若しくは前
記基板を移動させる工程とを含み、(5)前記工程
(4)の後、工程(2)〜工程(4)を所定の回数繰り
返す工程と、を含む方法により製造され、(6)前記微
細構造体を前記装置に組み込む工程と、含むことを特徴
とする微細構造体を備えた装置の製造方法により達成さ
れる。Further, the above object is a method for manufacturing an apparatus having a fine structure by sequentially transferring a fine pattern on the surface of a mother stamper to a substrate made of a thermoplastic resin, wherein the fine structure is (1) fixing the mother stamper to a predetermined position with respect to the substrate, and (2) pressing the mother stamper against the substrate in vacuum so that the substrate is thermocompression bonded.
(3) removing the mother stamper from the substrate, and (4) moving the mother stamper or the substrate so as to change the relative position between the mother stamper and the substrate. And (6) after the step (4), repeating the steps (2) to (4) a predetermined number of times, and (6) incorporating the fine structure into the device. This is achieved by a method of manufacturing a device having a microstructure characterized by:
【0014】本発明の好ましい態様では、前記製造方法
において、前記硬化樹脂よりも柔軟性のあるクッション
材を介して、前記基板及び前記マザースタンパの各位置
が固定されることを特徴とする。In a preferred aspect of the present invention, the manufacturing method is characterized in that the respective positions of the substrate and the mother stamper are fixed via a cushioning material which is more flexible than the cured resin.
【0015】本発明の好ましい態様では、前記製造方法
において、前記基板の裏打ち材として緩衝材を用いるこ
とを特徴とする。In a preferred aspect of the present invention, in the manufacturing method, a cushioning material is used as a backing material for the substrate.
【0016】また、上記目的は、前記製造方法により製
造される微細構造体により達成される。The above object is also achieved by the microstructure manufactured by the above manufacturing method.
【0017】また、上記目的は、微細パターンを転写さ
せるための微細構造体製造用装置であって、基板を載置
させるステージと、第一及び第二のブロックと、表面に
前記微細パターンを有するマザースタンパーを配設さ
せ、前記第一及び第二のブロックに沿って前記ステージ
に対して上下に可動するチャンバーと、から構成され、
前記ステージとの相対位置が変更可能であるヘッドと、
前記基板上に供給される樹脂を硬化させて、該樹脂に前
記微細パターンを転写させる際に、前記ヘッド内を真空
にさせる真空ポンプと、を具備することを特徴とする装
置により達成される。Further, the above object is an apparatus for producing a fine structure for transferring a fine pattern, which has a stage on which a substrate is placed, first and second blocks, and the fine pattern on the surface. A chamber provided with a mother stamper and movable up and down with respect to the stage along the first and second blocks,
A head whose relative position to the stage is changeable,
A vacuum pump that cures the resin supplied onto the substrate and evacuates the inside of the head when the fine pattern is transferred to the resin.
【0018】また、上記目的は、微細パターンを転写さ
せるための、微細構造体を備えた装置製造用装置であっ
て、基板を載置させるステージと、第一及び第二のブロ
ックと、表面に前記微細パターンを有するマザースタン
パーを配設させ、前記第一及び第二のブロックに沿って
前記ステージに対して上下に可動するチャンバーと、か
ら構成され、前記ステージとの相対位置が変更可能であ
るヘッドと、前記基板上に供給される樹脂を硬化させ
て、該樹脂に前記微細パターンを転写させる際に、前記
ヘッド内を真空にさせる真空ポンプと、前記微細構造体
を前記装置に組み込むための組み込み手段と、を具備す
ることを特徴とする装置により達成される。Further, the above-mentioned object is an apparatus for manufacturing a device having a fine structure for transferring a fine pattern, the stage on which a substrate is placed, the first and second blocks, and the surface. A mother stamper having the fine pattern is arranged, and the chamber is movable up and down with respect to the stage along the first and second blocks, and the relative position to the stage can be changed. A head, a vacuum pump for curing the resin supplied onto the substrate to make the inside of the head a vacuum when the fine pattern is transferred to the resin, and a fine structure for incorporating the fine structure in the apparatus. And an embedding means.
【0019】本発明の好ましい態様では、前記装置にお
いて、前記ヘッドは、前記第一及び第二のブロックに固
着され、前記ステージ上の基板と接するクッション材を
さらに備え、前記クッション材は硬化した樹脂よりも柔
軟性があることを特徴とする。In a preferred aspect of the present invention, in the apparatus, the head further comprises a cushion material fixed to the first and second blocks and in contact with the substrate on the stage, and the cushion material is a cured resin. It is characterized by being more flexible.
【0020】本発明の好ましい態様では、前記装置にお
いて、前記真空ポンプは、前記ヘッド内を真空にするこ
とを特徴とする。In a preferred aspect of the present invention, in the apparatus, the vacuum pump evacuates the inside of the head.
【0021】本発明の好ましい態様では、前記装置は樹
脂を供給する供給手段をさらに具備することを特徴とす
る。In a preferred aspect of the present invention, the apparatus is characterized by further comprising a supply means for supplying a resin.
【0022】本発明の好ましい態様では、前記装置にお
いて、前記供給手段はインクジェット法に利用されるノ
ズルであることを特徴とする。In a preferred aspect of the present invention, in the above apparatus, the supply means is a nozzle used in an ink jet method.
【0023】本発明の好ましい態様では、前記装置は、
チャンバーを加熱する加熱手段をさらに具備することを
特徴とする。In a preferred embodiment of the invention said device is
It is characterized by further comprising heating means for heating the chamber.
【0024】本発明の好ましい態様では、前記装置は、
前記ヘッドと一体となって移動し、前記樹脂を硬化させ
るための紫外線照射手段をさらに具備することを特徴と
する。In a preferred embodiment of the invention said device is
It is characterized by further comprising ultraviolet irradiation means for moving integrally with the head to cure the resin.
【0025】なお、本発明で用いる微細パターンのサイ
ズは、サブミクロンの領域であり、オーダとしては、約
0.1μmである。また、本発明で用いる微細構造体と
は、前記微細パターンを有する構造体のことをいう。The size of the fine pattern used in the present invention is in the submicron region, and is on the order of about 0.1 μm. The fine structure used in the present invention means a structure having the fine pattern.
【0026】[0026]
【発明の実施の形態】本発明の実施の形態を詳細に説明
するが、本発明は、以下の実施態様に限定されるもので
はない。BEST MODE FOR CARRYING OUT THE INVENTION The embodiments of the present invention will be described in detail, but the present invention is not limited to the following embodiments.
【0027】まず、金属金型であるマザースタンパの製
造方法を説明する。図1は、本発明に利用されるマザー
スタンパの製造工程を示す断面図である。First, a method of manufacturing a mother stamper, which is a metal mold, will be described. FIG. 1 is a sectional view showing a manufacturing process of a mother stamper used in the present invention.
【0028】薬液にて再生されたガラス原盤10を研磨
洗浄した後で、図1(a)に示すように、ガラス原盤上
にフォトレジスト膜20を塗布する。このフォトレジス
ト膜20上に記録信号に応じたレーザ光にて照射する。
図1(b)に示す現像工程にて、露光部を除去し、微細
な凹凸を有するパターンを形成する。図1(c)に示す
ように、このフォトレジストの微細パターンに導電膜3
0を付ける。この導電膜はスパッタリング及び蒸着、無
電解めっき法にて形成される。一般には、導電膜はA
g、Niが使用される。その後、当該導電膜を電極とし
て、Ni電鋳を行い所定の厚さにし(図1(d)を参
照)、ガラス原盤から剥離すると、表面に微細パターン
を有するマザースタンパ40が得られる(図1
(e))。図1(e)には、半球上の微細パターンを示
すが、本発明にて転写できる微細パターンはこれに限定
されるものではない。After the glass master disk 10 regenerated with a chemical solution is polished and washed, as shown in FIG. 1A, a photoresist film 20 is applied onto the glass master disk. The photoresist film 20 is irradiated with laser light according to a recording signal.
In the developing step shown in FIG. 1B, the exposed portion is removed and a pattern having fine irregularities is formed. As shown in FIG. 1C, the conductive film 3 is formed on the fine pattern of the photoresist.
0 is attached. This conductive film is formed by sputtering, vapor deposition, and electroless plating. Generally, the conductive film is A
g, Ni are used. Then, using the conductive film as an electrode, Ni electroforming is performed to a predetermined thickness (see FIG. 1D), and when peeled from the glass master, a mother stamper 40 having a fine pattern on its surface is obtained (FIG. 1).
(E)). FIG. 1E shows a fine pattern on a hemisphere, but the fine pattern that can be transferred in the present invention is not limited to this.
【0029】図2は、本発明による微細構造体の製造方
法の一の態様を説明する図である。後述する本発明によ
る微細構造体製造用の装置100を構成するヘッド20
0に、前述のように製造したマザースタンパ40(図2
には図示せず)を所定の位置に配設させる。なお、図2
は前記装置100の正面図である。大型基板310を前
記装置のステージ300に載置させ、マザースタンパ4
0が有する微細パターンを転写したい前記大型基板の領
域の位置決めを行い、例えば、前記ヘッドを図2の実線
で囲まれた領域へ移動する。あるいは、前記ヘッドを固
定したままの状態で、大型基板が載置されたステージ3
00を移動させることも可能である。図2に示すよう
に、大型基板310を固定するステージ300に対し
て、マザースタンパ400を配設させるヘッド200の
大きさは小さくてよい。FIG. 2 is a diagram for explaining one embodiment of the method for manufacturing a fine structure according to the present invention. A head 20 constituting an apparatus 100 for manufacturing a microstructure according to the present invention described later.
0 to the mother stamper 40 (see FIG. 2) manufactured as described above.
(Not shown) is arranged at a predetermined position. Note that FIG.
FIG. 3 is a front view of the device 100. The large substrate 310 is placed on the stage 300 of the apparatus, and the mother stamper 4
The area of the large-sized substrate to which the fine pattern of 0 is to be transferred is positioned, and the head is moved to the area surrounded by the solid line in FIG. 2, for example. Alternatively, with the head fixed, a stage 3 on which a large substrate is placed
It is also possible to move 00. As shown in FIG. 2, the size of the head 200 for disposing the mother stamper 400 may be smaller than that of the stage 300 for fixing the large substrate 310.
【0030】図2の実線に示す領域にて、マザースタン
パの微細パターンの転写後、ヘッド200又はステージ
300を移動させて、次に転写させたい領域へ移動する
ことができる。例えば、図3に示すように、領域、
、の順(X軸方向)や、領域、、の順(Y軸
方向)に、ヘッド200又はステージ300を移動させ
て、マザースタンパ40の微細パターンを順次転写させ
ることができる。かかるヘッド200又はステージ30
0の移動を順次繰り返すことにより、大型基板にマザー
スタンパ40の微細パターンの転写が実現される。な
お、前記ヘッドはX、Y、Z(図3の紙面に対して垂直
方向)軸方向に移動可能であり、前記ステージはX及び
Y軸方向に移動可能である。After the fine pattern of the mother stamper is transferred in the area indicated by the solid line in FIG. 2, the head 200 or the stage 300 can be moved to move to the area to be transferred next. For example, as shown in FIG.
The head 200 or the stage 300 can be moved in this order (X-axis direction) or in the area (Y-axis direction) to sequentially transfer the fine pattern of the mother stamper 40. Such head 200 or stage 30
By sequentially repeating the movement of 0, the fine pattern of the mother stamper 40 is transferred to the large substrate. The head is movable in the X, Y, and Z (vertical direction with respect to the paper surface of FIG. 3) axial directions, and the stage is movable in the X and Y axial directions.
【0031】本発明に利用される基板310の材料とし
ては、特に限定されないが、後述するように紫外線を用
いて樹脂を硬化させる場合には、紫外線等を通過させる
ガラス製や透明な樹脂であることが望ましい。The material of the substrate 310 used in the present invention is not particularly limited, but when the resin is cured using ultraviolet rays, as will be described later, it is a glass or transparent resin that transmits ultraviolet rays and the like. Is desirable.
【0032】図4及び図5は、本発明による微細構造体
の製造方法の第一の態様を説明する図である。本発明に
よる微細構造体製造用装置100を用いて、マザースタ
ンパ40が有する微細パターンを転写させる。図4に示
す微細構造体製造装置100は、ヘッド200とステー
ジ300とから構成される。なお、図4及び図5では、
説明を簡潔にするために一つのヘッドを例示するが、パ
ターンの転写効率を向上させるためには、複数のヘッド
を用いてもよい。FIGS. 4 and 5 are views for explaining the first embodiment of the method for producing a fine structure according to the present invention. The fine pattern of the mother stamper 40 is transferred using the apparatus 100 for producing a fine structure according to the present invention. The microstructure manufacturing apparatus 100 shown in FIG. 4 includes a head 200 and a stage 300. In addition, in FIG. 4 and FIG.
Although one head is illustrated for simplification of description, a plurality of heads may be used to improve the pattern transfer efficiency.
【0033】前記ステージ300には基板310を設置
させることができる。前記ヘッド200は第一のブロッ
ク210及び第二のブロック220と、チャンバー23
0とを有し、前記チャンバー230には、前述のように
製造されたマクタースタンパ40が配設され、前記第一
のブロック210及び第二のブロック220を介して、
基板310に対して上下に可動する。また、第一のブロ
ック210には樹脂400を供給するための手段250
を具有し、第二のブロック220は、基板310及びマ
ザースタンパ40により画成される空間と連通した管を
有し、真空ポンプ260の作用により該管を介して前記
空間を真空にさせる。なお、前記第一のブロック210
が前記管を有し、一方、前記第二のブロック220が前
記手段250を有する構造でもよい。A substrate 310 may be installed on the stage 300. The head 200 includes a first block 210, a second block 220, and a chamber 23.
0, and the maker stamper 40 manufactured as described above is disposed in the chamber 230, and through the first block 210 and the second block 220,
It can move up and down with respect to the substrate 310. Also, means 250 for supplying the resin 400 to the first block 210.
The second block 220 has a tube communicating with the space defined by the substrate 310 and the mother stamper 40, and the vacuum pump 260 operates to evacuate the space through the tube. The first block 210
May have the tube while the second block 220 has the means 250.
【0034】また、前記第一のブロック210及び第二
のブロック220は、基板310と接するクッション材
240を備える。マザースタンパ40の有する微細パタ
ーンを転写させたい領域は、前記クッション材240に
より囲まれ、前述したヘッド内の真空を可能にする。そ
の他のクッション材240の働きについては、後述す
る。In addition, the first block 210 and the second block 220 are provided with a cushion material 240 which is in contact with the substrate 310. The area of the mother stamper 40 to which the fine pattern is to be transferred is surrounded by the cushion material 240, which enables the vacuum in the head described above. Other functions of the cushion member 240 will be described later.
【0035】本発明による微細構造体の製造方法は、前
記チャンバー230に配設されたマザースタンパ40が
基板310に対して、図4に示すように、所定の位置に
固定される。次いで、前記マザースタンパ40と前記基
板310との間に、被硬化樹脂400を供給する。供給
方法としては、ブロックに設けられた樹脂供給手段25
0を介して、一定量の樹脂をムラなく供給するインクジ
ェット法が好ましい。インクジェット法により樹脂を供
給する場合には、前記手段250はノズルであることが
好ましい。In the method of manufacturing a fine structure according to the present invention, the mother stamper 40 arranged in the chamber 230 is fixed to the substrate 310 at a predetermined position as shown in FIG. Next, the curable resin 400 is supplied between the mother stamper 40 and the substrate 310. As a supply method, a resin supply means 25 provided in the block
An ink jet method in which a constant amount of resin is uniformly supplied via 0 is preferable. When the resin is supplied by the inkjet method, the means 250 is preferably a nozzle.
【0036】次に、ヘッド200に備えられている真空
ポンプ260によりヘッド内部を真空にする。その際
に、樹脂400中に存在する空気等の脱気や脱泡が可能
となる。真空状態に保ちながら、供給された樹脂400
を前記マザースタンパ40により押圧し、樹脂を硬化さ
せる。硬化させる方法としては、熱硬化又は光硬化があ
るが、使用する樹脂の性質に左右される。よって、本発
明にて供給される樹脂としては、光硬化性樹脂又は熱硬
化性樹脂が好ましい。Next, the inside of the head is evacuated by the vacuum pump 260 provided in the head 200. At that time, it is possible to deaerate or deaerate the air present in the resin 400. The supplied resin 400 while maintaining a vacuum
Is pressed by the mother stamper 40 to cure the resin. The curing method may be heat curing or light curing, but it depends on the properties of the resin used. Therefore, the resin supplied in the present invention is preferably a photocurable resin or a thermosetting resin.
【0037】光硬化性樹脂を利用する場合、前記基板3
10は紫外線を透過させる材質であることが好ましい。
つまり、前記基板310を介して紫外線照射手段500
からの紫外線により樹脂400が硬化される(図5を参
照)。紫外線照射手段500はヘッド200と一体とな
って移動し、ヘッド200が被転写領域に移動した場合
に、当該領域にて光硬化製樹脂を硬化させることができ
る。紫外線照射手段500の具体例としては、水銀灯な
どが挙げられる。When a photocurable resin is used, the substrate 3
It is preferable that 10 is a material that transmits ultraviolet rays.
That is, the ultraviolet irradiation means 500 is provided through the substrate 310.
The resin 400 is hardened by the ultraviolet rays from (see FIG. 5). The ultraviolet irradiation means 500 moves integrally with the head 200, and when the head 200 moves to the transferred area, the photo-curing resin can be cured in the area. A specific example of the ultraviolet irradiation means 500 is a mercury lamp.
【0038】また、熱硬化性樹脂を利用する場合には、
スタンパを加熱させる手段、例えばヒータ等により、ス
タンパを介して熱を樹脂に伝播させ、樹脂を硬化させ
る。When a thermosetting resin is used,
Heat is transmitted to the resin through the stamper by means of heating the stamper, for example, a heater, and the resin is cured.
【0039】しかる後、前記マザースタンパ40を硬化
樹脂から離脱させ、硬化樹脂が基板310上に形成され
る。図3にて説明したように、マザースタンパ40又は
前記基板310の相対位置を変更させるように、ヘッド
200又はステージ300を移動させ、次に転写させた
い基板の領域へ、前述と同様な方法により転写させる。
これを繰り返すことにより、大型基板へ所望の微細パタ
ーンが形成され得る。Thereafter, the mother stamper 40 is separated from the hardened resin, and the hardened resin is formed on the substrate 310. As described with reference to FIG. 3, the head 200 or the stage 300 is moved so as to change the relative position of the mother stamper 40 or the substrate 310, and is moved to the region of the substrate to be transferred next by the same method as described above. Transfer.
By repeating this, a desired fine pattern can be formed on the large-sized substrate.
【0040】前記したクッション材240は、マザース
タンパの有する微細パターンを転写させたい領域を囲
み、一回の転写部分を限定し、供給された樹脂の拡散を
防止する働きがある。さらに、クッション材240は、
微細パターンが転写された硬化樹脂よりも柔軟性を有す
る必要がある。図4では、前記クッション材240は基
板に直接接しているが、図5の左側のクッション材24
0では、そのクッション材240は先に硬化した樹脂3
20上に載置されている。この場合、前記クッション材
が硬化樹脂320に対して縮む必要がある。つまり、硬
化樹脂320よりも柔軟性を有しなければ、クッション
材240と硬化樹脂320との間に隙間が生じ、マザー
スタンパ40により樹脂400を押圧する際に真空を保
持できなくなり、前述したように、樹脂中に存在する空
気等に起因した樹脂ムラが発生するおそれがある。The above-mentioned cushion material 240 has a function of surrounding a region of the mother stamper where a fine pattern is to be transferred, limiting a transfer portion for one time, and preventing the supplied resin from diffusing. Further, the cushion material 240 is
It needs to be more flexible than the cured resin on which the fine pattern is transferred. Although the cushion member 240 is in direct contact with the substrate in FIG. 4, the cushion member 24 on the left side of FIG.
At 0, the cushion material 240 is the resin 3 that was previously cured.
20 is mounted. In this case, the cushion material needs to shrink with respect to the cured resin 320. That is, if the resin is not more flexible than the cured resin 320, a gap is created between the cushion material 240 and the cured resin 320, and the vacuum cannot be maintained when the resin 400 is pressed by the mother stamper 40. In addition, resin unevenness may occur due to air or the like present in the resin.
【0041】前記した本発明による製造方法によれば、
図6に示すような転写された微細パターンを有する微細
構造体が得られる。さらに、ヘッド200又はステージ
300を移動させて、得られた微細パターンの隣りにお
いて同様に微細パターンを転写すれば、図7に示すよう
な転写パターンが得られる。かかる転写を順次行えば、
大型基板にマザースタンパが有する転写パターンを、広
範囲に同一の転写パターンを形成されることが可能とな
る。According to the above-mentioned manufacturing method of the present invention,
A fine structure having a transferred fine pattern as shown in FIG. 6 is obtained. Further, by moving the head 200 or the stage 300 and similarly transferring the fine pattern next to the obtained fine pattern, a transfer pattern as shown in FIG. 7 is obtained. If such transfer is performed sequentially,
The transfer pattern of the mother stamper can be formed on a large substrate over a wide range.
【0042】以上の繰り返しで、図8に示すように、大
面積の大型基板全体に微細構造体を得ることができる。By repeating the above, as shown in FIG. 8, a fine structure can be obtained over the entire large substrate having a large area.
【0043】次に、本発明による別の実施態様を説明す
る。Next, another embodiment according to the present invention will be described.
【0044】図9は、本発明による微細構造体の製造方
法の第二の態様を説明する図である。図4及び図5に示
した方法とは異なり、樹脂400を使用する代わりに、
基板310が熱可塑性樹脂から構成されることを特徴と
する。FIG. 9 is a diagram for explaining the second embodiment of the method for producing a fine structure according to the present invention. Unlike the method shown in FIGS. 4 and 5, instead of using the resin 400,
The substrate 310 is characterized by being made of a thermoplastic resin.
【0045】ステージ300には熱可塑性樹脂からなる
大型基板を配置する。基板として利用され得る具体的な
例としては、ポリカーボネート、ポリスチレン、アクリ
ル樹脂等が挙げられる。前記基板の厚みは特に限定され
ないが、100μm〜200μmのフィルムの場合に
は、フィルム単体での使用も可能である。基板として、
フィルム形態の熱可塑性樹脂を利用する場合には、後述
する加熱圧着の際に、未転写部分の熱変形を防止するた
めに、基板の下に裏打ち材として、例えば、シリコーン
ゴムのような緩衝材を設けることができる。A large substrate made of a thermoplastic resin is placed on the stage 300. Specific examples that can be used as the substrate include polycarbonate, polystyrene, acrylic resin and the like. The thickness of the substrate is not particularly limited, but in the case of a film of 100 μm to 200 μm, it is possible to use the film alone. As a substrate
When a thermoplastic resin in the form of a film is used, in order to prevent thermal deformation of the untransferred portion at the time of thermocompression bonding, which will be described later, as a backing material under the substrate, for example, a cushioning material such as silicone rubber. Can be provided.
【0046】第二の態様による具体的な製造方法は、前
記した第一の態様と同じように、マザースタンパ40
を、チャンバー230を介してヘッド200に固定す
る。ヘッド200を移動させて、転写させたい位置を決
定する。あるいは、ステージ300の移動により転写位
置を決定することもできる。第二の態様では、後述する
理由から、チャンバー230には、ヒータなどの加熱手
段を具有する。ヘッド200のチャンバー230を加熱
させ、マザースタンパ40が所望の温度へ上昇させる。
加熱する温度は、使用する基板の軟化温度以上、融点以
下であることが望ましい。例えば、ポリカーボネートを
使用する場合には、マザースタンパ40の温度を130
〜260℃に加熱する。The concrete manufacturing method according to the second embodiment is similar to that of the first embodiment described above.
Are fixed to the head 200 via the chamber 230. The head 200 is moved to determine the position to be transferred. Alternatively, the transfer position can be determined by moving the stage 300. In the second aspect, the chamber 230 has a heating means such as a heater for the reason described below. The chamber 230 of the head 200 is heated and the mother stamper 40 is heated to a desired temperature.
The heating temperature is preferably higher than or equal to the softening temperature of the substrate used and lower than or equal to the melting point. For example, when using polycarbonate, the temperature of the mother stamper 40 is set to 130
Heat to ~ 260 ° C.
【0047】また、予め基板自体を加熱しておいてもよ
い。ただし、その場合の温度は基板の軟化温度以下に設
定するが、できるだけ高温であることが望ましい。The substrate itself may be heated in advance. However, the temperature in that case is set to be equal to or lower than the softening temperature of the substrate, but it is desirable to be as high as possible.
【0048】マザースタンパ40の温度が安定した後、
ヘッド200のチャンバー230のみを下降させて、マ
ザースタンパ40を熱可塑性樹脂基板に押圧する。この
際にマザースタンパ40により加熱圧着させ、マザース
タンパ40を剥離すると、図10に示す転写パターンが
形成される。圧着時間は加熱温度に影響されるので、適
切な時間を設定することが望ましい。After the temperature of the mother stamper 40 is stabilized,
Only the chamber 230 of the head 200 is lowered to press the mother stamper 40 against the thermoplastic resin substrate. At this time, the mother stamper 40 is heated and pressure-bonded, and the mother stamper 40 is peeled off, whereby the transfer pattern shown in FIG. 10 is formed. Since the pressure bonding time is affected by the heating temperature, it is desirable to set an appropriate time.
【0049】ヘッド200のブロック210、220に
はクッション材240を備え、ヘッド200が、既にパ
ターンが形成された位置に載置される場合には、第一の
態様にて説明したのと同じ理由により、熱可塑性樹脂か
ら構成される基板よりも柔軟性がなければならない。ま
た、本発明の第二の態様による製造方法において、前記
クッション材240は、基板である熱可塑性樹脂の未転
写部分への熱の伝播を防ぎ、基板の変形を防止する機能
も有する。When the blocks 210 and 220 of the head 200 are provided with the cushion material 240 and the head 200 is placed at the position where the pattern is already formed, the same reason as described in the first mode is given. Therefore, it must be more flexible than a substrate composed of a thermoplastic resin. Further, in the manufacturing method according to the second aspect of the present invention, the cushion material 240 also has a function of preventing heat from propagating to an untransferred portion of the thermoplastic resin which is the substrate and preventing deformation of the substrate.
【0050】図10及び図11は、本発明による製造方
法の第二の態様により形成される転写パターンの概略断
面図を示す。マザースタンパ40を有するヘッド200
を移動、若しくは基板310である熱可塑性樹脂が固定
されているステージ300を順次移動させることによ
り、大型基板の広範囲に同一パターンが転写され、大型
基板に微細構造体を形成することが可能となる。10 and 11 are schematic sectional views of a transfer pattern formed by the second embodiment of the manufacturing method according to the present invention. Head 200 having mother stamper 40
Or the stage 300 on which the thermoplastic resin, which is the substrate 310, is sequentially moved, the same pattern is transferred to a wide area of the large substrate, and a fine structure can be formed on the large substrate. .
【0051】前述した本発明による第一及び第二の態様
の製造方法により製造された大型基板の微細構造体をマ
スタースタンパとして用いて、以下に説明するように大
型金型を製造することができる。By using the microstructure of the large-sized substrate manufactured by the above-described manufacturing method of the first and second aspects of the present invention as a master stamper, a large-sized mold can be manufactured as described below. .
【0052】本発明の製造方法の第一の態様により得ら
れた微細パターンを有する大型基板表面を、図12
(b)工程に示すように、導体化処理を施し、ニッケル
電鋳し(図12(c))、大型基板から剥離することに
より、図12(d)に示す大型金属金型を製造すること
ができる。A large-sized substrate surface having a fine pattern obtained by the first embodiment of the manufacturing method of the present invention is shown in FIG.
As shown in the step (b), a large metal mold shown in FIG. 12 (d) is manufactured by conducting a conductor treatment, electroforming nickel (FIG. 12 (c)), and peeling the nickel from the large substrate. You can
【0053】上述したような微細構造体の製造方法は、
種々の微細構造体を備える部材、表示装置をはじめとす
る電子装置等の装置の製造において適用可能である。例
えば、反射型又は半透過反射型液晶表示装置の反射体に
おける凹凸構造等の微細構造の形成に適用するなど、微
細構造体を備えた液晶装置、有機EL装置、これらを含
む表示装置、その他光学素子を含む装置等の電子装置の
製造に適用することができる。The method for manufacturing a fine structure as described above is
It can be applied to the manufacture of devices such as electronic devices such as members including various fine structures and display devices. For example, the invention is applied to the formation of a fine structure such as a concavo-convex structure in a reflector of a reflection type or semi-transmissive reflection type liquid crystal display device. It can be applied to the manufacture of electronic devices such as devices including elements.
【0054】例えば、前述の製造方法により製造された
微細構造体を、組み込み手段により液晶表示装置に組み
込む工程により、反射型又は半透過反射型液晶表示装置
が製造される。For example, a reflection type or semi-transmissive reflection type liquid crystal display device is manufactured by the step of incorporating the fine structure manufactured by the above-described manufacturing method into the liquid crystal display device by the assembling means.
【0055】[0055]
【発明の効果】請求項1、3乃至6、8、9に記載の製
造方法によれば、微細パターンを有するマザースタンパ
から大型基板前面に繋ぎ目のない連続パターンの微細構
造体の形成が実現できる。また、その基板をもとに、金
属金型も製造可能である。According to the manufacturing method of claims 1, 3 to 6, 8 and 9, it is possible to form a continuous pattern fine structure from a mother stamper having a fine pattern on the front surface of a large substrate. it can. Also, a metal mold can be manufactured based on the substrate.
【0056】請求項2、7に記載の製造方法によれば、
微細パターンを有するマザースタンパから大型基板前面
に繋ぎ目のない連続パターンの微細構造体を備えた装置
の製造が実現される。According to the manufacturing method of claims 2 and 7,
It is possible to manufacture a device including a seamless pattern of a fine structure from a mother stamper having a fine pattern to a front surface of a large substrate.
【0057】また、請求項3及び8に記載の本発明の製
造方法によれば、柔軟性のあるクッション材を介してヘ
ッドと基板とが接することにより、一回の微細パターン
の転写する範囲を限定させることができ、樹脂を硬化さ
せる場合には、樹脂自体の拡散を防止することができ
る。また、基板に熱可塑性樹脂を用いた場合には、未転
写部分の変形を最小限に抑制し、保護することができ
る。さらに、パターンを転写する際の真空を確実にし、
樹脂の脱泡を可能とし、もって微細パターンの転写が実
現される。Further, according to the manufacturing method of the present invention as set forth in claims 3 and 8, the head and the substrate are in contact with each other through the cushioning material having flexibility, so that a range in which a fine pattern is transferred once is set. When the resin is cured, diffusion of the resin itself can be prevented. Further, when a thermoplastic resin is used for the substrate, it is possible to suppress the deformation of the untransferred portion to a minimum and protect it. Furthermore, ensure the vacuum when transferring the pattern,
The resin can be degassed, and thus a fine pattern can be transferred.
【0058】請求項4に記載の製造方法によれば、イン
クジェット法により樹脂をムラなく均一に供給すること
ができ、もって微細パターンの転写を可能とする。According to the manufacturing method of the fourth aspect, the resin can be evenly and uniformly supplied by the ink jet method, and thus the fine pattern can be transferred.
【0059】請求項9に記載の製造方法によれば、熱可
塑性樹脂の未転写部分の変形を防止することができる。According to the manufacturing method of the ninth aspect, the deformation of the untransferred portion of the thermoplastic resin can be prevented.
【0060】請求項11乃至18に記載の装置によれ
ば、微細パターンを有するマザースタンパから大型基板
前面に繋ぎ目のない連続パターンの微細構造体と、当該
微細構造体を有する装置を製造するための装置が提供さ
れる。According to the apparatus described in claims 11 to 18, in order to manufacture a fine structure having a continuous pattern from a mother stamper having a fine pattern to a front surface of a large substrate and a device having the fine structure. Apparatus is provided.
【図1】 本発明に利用されるマザースタンパーの製造
工程の断面図である。FIG. 1 is a sectional view of a manufacturing process of a mother stamper used in the present invention.
【図2】 本発明による微細構造体の製造方法の第一の
態様を説明する図である。FIG. 2 is a diagram illustrating a first aspect of a method for manufacturing a fine structure according to the present invention.
【図3】 本発明による微細構造体の製造方法による微
細パターンの転写順序の例を説明する図である。FIG. 3 is a diagram illustrating an example of a transfer order of fine patterns by the method for manufacturing a fine structure according to the present invention.
【図4】 本発明の実施態様による微細構造体の製造方
法を説明する図である。FIG. 4 is a diagram illustrating a method of manufacturing a fine structure according to an embodiment of the present invention.
【図5】 本発明の実施態様による微細構造体の製造方
法を説明する図である。FIG. 5 is a diagram illustrating a method of manufacturing a fine structure according to an embodiment of the present invention.
【図6】 本発明の製造方法により転写された樹脂の微
細パターンの概略断面図である。FIG. 6 is a schematic cross-sectional view of a fine pattern of resin transferred by the manufacturing method of the present invention.
【図7】 本発明の製造方法により、順次転写された微
細パターンの概略断面図である。FIG. 7 is a schematic cross-sectional view of fine patterns sequentially transferred by the manufacturing method of the present invention.
【図8】 本発明の製造方法により製造された大面積基
板の転写パターンの概略図である。FIG. 8 is a schematic view of a transfer pattern of a large area substrate manufactured by the manufacturing method of the present invention.
【図9】 本発明による微細構造体の製造方法の第二の
態様を説明する図である。FIG. 9 is a diagram illustrating a second aspect of the method for producing a fine structure according to the present invention.
【図10】 本発明による製造方法の第二の態様により
形成される転写パターンの概略断面図を示す。FIG. 10 is a schematic cross-sectional view of a transfer pattern formed by the second embodiment of the manufacturing method according to the present invention.
【図11】 本発明による製造方法の第二の態様により
形成される転写パターンの概略断面図を示す。FIG. 11 is a schematic cross-sectional view of a transfer pattern formed by the second aspect of the manufacturing method according to the present invention.
【図12】 本発明による製造方法により製造された微
細構造体を有する大型基板をマスタースタンパとして用
いて、大型金属金型の製造工程の断面図である。FIG. 12 is a cross-sectional view of a manufacturing process of a large metal mold using a large substrate having a fine structure manufactured by the manufacturing method according to the present invention as a master stamper.
10 ガラス原盤 20 フォトレジスト膜 30 導電膜 40 マザースタンパ 100 微細構造体製造用装置 200 ヘッド 210 第一のブロック 220 第二のブロック 230 チャンバー 240 クッション材 250 樹脂供給手段 260 真空ポンプ 300 ステージ 310 基板 320 微細パターンを有する、先に硬化した樹脂 400 樹脂 500 紫外線照射手段 10 glass master 20 Photoresist film 30 conductive film 40 Mother Stamper 100 Microstructure manufacturing equipment 200 heads 210 First Block 220 Second Block 230 chamber 240 cushion material 250 Resin supply means 260 vacuum pump 300 stages 310 substrate 320 Pre-cured resin with fine pattern 400 resin 500 UV irradiation means
───────────────────────────────────────────────────── フロントページの続き Fターム(参考) 4F204 AG05 AH73 EA03 EA04 EB02 EK01 EK09 EK10 4F209 AG05 AH73 PA02 PB02 PC05 PN03 PN06 PN07 PW41 ─────────────────────────────────────────────────── ─── Continued front page F-term (reference) 4F204 AG05 AH73 EA03 EA04 EB02 EK01 EK09 EK10 4F209 AG05 AH73 PA02 PB02 PC05 PN03 PN06 PN07 PW41
Claims (18)
ンを順次転写させることによる微細構造体の製造方法で
あって、 (1) 基板に対して前記マザースタンパを所定の位置
に固定する工程と、 (2) 前記マザースタンパと前記基板との間に樹脂を
供給する工程と、 (3) 真空中にて前記マザースタンパを前記樹脂に押
圧する工程と、 (4) 前記樹脂を硬化させる工程と、 (5) 前記マザースタンパを前記硬化樹脂から離脱さ
せる工程と、 (6) 前記マザースタンパと前記基板との相対位置を
変更させるように、前記マザースタンパ若しくは前記基
板を移動させる工程と、 (7) 前記工程(6)の後、工程(2)〜工程(6)
を所定の回数繰り返す工程と、を含むことを特徴とする
微細構造体の製造方法。1. A method of manufacturing a fine structure by sequentially transferring a fine pattern on the surface of a mother stamper, comprising: (1) fixing the mother stamper to a substrate at a predetermined position; 2) supplying resin between the mother stamper and the substrate; (3) pressing the mother stamper against the resin in a vacuum; (4) curing the resin; 5) A step of separating the mother stamper from the cured resin; (6) A step of moving the mother stamper or the substrate so as to change a relative position between the mother stamper and the substrate; After step (6), steps (2) to (6)
And a step of repeating the step a predetermined number of times, the method for manufacturing a fine structure.
ンを順次転写させることによる微細構造体を備えた装置
の製造方法であって、 前記微細構造体は、 (1) 基板に対して前記マザースタンパを所定の位置
に固定する工程と、 (2) 前記マザースタンパと前記基板との間に樹脂を
供給する工程と、 (3) 真空中にて前記マザースタンパを前記樹脂に押
圧する工程と、 (4) 前記樹脂を硬化させる工程と、 (5) 前記マザースタンパを前記硬化樹脂から離脱さ
せる工程と、 (6) 前記マザースタンパと前記基板との相対位置を
変更させるように、前記マザースタンパ若しくは前記基
板を移動させる工程と、 (7) 前記工程(6)の後、工程(2)〜工程(6)
を所定の回数繰り返す工程と、を含む方法により製造さ
れ、 (8) 前記微細構造体を前記装置に組み込む工程と、
を含む微細構造体を備えた装置の製造方法。2. A method of manufacturing an apparatus having a fine structure by sequentially transferring a fine pattern on the surface of a mother stamper, wherein the fine structure comprises (1) a substrate having the mother stamper. (2) supplying resin between the mother stamper and the substrate; and (3) pressing the mother stamper against the resin in a vacuum; ) Step of curing the resin, (5) Step of releasing the mother stamper from the cured resin, (6) The mother stamper or the substrate so as to change the relative position between the mother stamper and the substrate. And (7) after the step (6), steps (2) to (6)
Is repeated a predetermined number of times, and (8) a step of incorporating the microstructure in the device,
A method of manufacturing a device having a microstructure including :.
ョン材を介して、前記基板及び前記マザースタンパの各
位置が固定されることを特徴とする請求項1又は2に記
載の製造方法。3. The manufacturing method according to claim 1, wherein the respective positions of the substrate and the mother stamper are fixed via a cushion material that is more flexible than the cured resin.
ト法により所定の位置に前記樹脂を供給することを特徴
とする請求項1又は2に記載の製造方法。4. The manufacturing method according to claim 1, wherein in the step (2), the resin is supplied to a predetermined position by an inkjet method.
脂であることを特徴とする請求項1又は2に記載の製造
方法。5. The manufacturing method according to claim 1, wherein the resin is a photocurable resin or a thermosetting resin.
ンを、熱可塑性樹脂からなる基板へ順次転写させること
による微細構造体の製造方法であって、 (1) 前記基板に対して前記マザースタンパを所定の
位置に固定する工程と、 (2) 前記基板を加熱圧着するように、真空中にて前
記マザースタンパを前記基板へ押圧する工程と、 (3) 前記マザースタンパを前記基板から離脱させる
工程と、 (4) 前記マザースタンパと前記基板との相対位置を
変更させるように、前記マザースタンパ若しくは前記基
板を移動させる工程と、 (5) 前記工程(4)の後、工程(2)〜工程(4)
を所定の回数繰り返す工程と、を含むことを特徴とする
微細構造体の製造方法。6. A method of manufacturing a fine structure by sequentially transferring a fine pattern on the surface of a mother stamper to a substrate made of a thermoplastic resin, comprising: (1) providing the mother stamper on the substrate in a predetermined manner. And (2) pressing the mother stamper against the substrate in a vacuum so that the substrate is thermocompression bonded, and (3) separating the mother stamper from the substrate. (4) a step of moving the mother stamper or the substrate so as to change the relative position of the mother stamper and the substrate, (5) after the step (4), the steps (2) to () 4)
And a step of repeating the step a predetermined number of times, the method for manufacturing a fine structure.
ンを、熱可塑性樹脂からなる基板へ順次転写させること
による微細構造体を備えた装置の製造方法であって、前
記微細構造体は、 (1) 前記基板に対して前記マザースタンパを所定の
位置に固定する工程と、 (2) 前記基板を加熱圧着するように、真空中にて前
記マザースタンパを前記基板へ押圧する工程と、 (3) 前記マザースタンパを前記基板から離脱させる
工程と、 (4) 前記マザースタンパと前記基板との相対位置を
変更させるように、前記マザースタンパ若しくは前記基
板を移動させる工程と、 (5) 前記工程(4)の後、工程(2)〜工程(4)
を所定の回数繰り返す工程と、を含む方法により製造さ
れ、 (6) 前記微細構造体を前記装置に組み込む工程と、
含むことを特徴とする微細構造体を備えた装置の製造方
法。7. A method for manufacturing an apparatus having a fine structure by sequentially transferring a fine pattern on the surface of a mother stamper to a substrate made of a thermoplastic resin, wherein the fine structure comprises (1) Fixing the mother stamper at a predetermined position with respect to the substrate; (2) pressing the mother stamper against the substrate in vacuum so that the substrate is thermocompression bonded; (3) (4) moving the mother stamper or the substrate so as to change the relative position between the mother stamper and the substrate; (5) the process (4) After, steps (2) to (4)
Is repeated a predetermined number of times, and (6) a step of incorporating the microstructure in the device,
A method of manufacturing a device having a fine structure, comprising:
ョン材を介して、前記基板及び前記マザースタンパの各
位置が固定されることを特徴とする請求項6又は7に記
載の製造方法。8. The manufacturing method according to claim 6, wherein the respective positions of the substrate and the mother stamper are fixed through a cushion material that is more flexible than the cured resin.
ることを特徴とする請求項6又は7に記載の製造方法。9. The manufacturing method according to claim 6, wherein a cushioning material is used as a backing material for the substrate.
載された製造方法により製造されることを特徴とする微
細構造体。10. A microstructure manufactured by the manufacturing method according to any one of claims 1 to 9.
構造体製造用装置であって、 基板を載置させるステージと、 第一及び第二のブロックと、表面に前記微細パターンを
有するマザースタンパーを配設させ、前記第一及び第二
のブロックに沿って前記ステージに対して上下に可動す
るチャンバーと、から構成され、前記ステージとの相対
位置が変更可能であるヘッドと、 前記基板上に供給される樹脂を硬化させて、該樹脂に前
記微細パターンを転写させる際に、前記ヘッド内を真空
にさせる真空ポンプと、を具備することを特徴とする装
置。11. An apparatus for producing a fine structure for transferring a fine pattern, comprising: a stage on which a substrate is placed; first and second blocks; and a mother stamper having the fine pattern on its surface. A head that is provided and configured to move up and down with respect to the stage along the first and second blocks, and the relative position of the stage is changeable; and the head is supplied onto the substrate. And a vacuum pump that evacuates the inside of the head when the resin is cured and the fine pattern is transferred to the resin.
細構造体を備えた装置製造用装置であって、 基板を載置させるステージと、 第一及び第二のブロックと、表面に前記微細パターンを
有するマザースタンパーを配設させ、前記第一及び第二
のブロックに沿って前記ステージに対して上下に可動す
るチャンバーと、から構成され、前記ステージとの相対
位置が変更可能であるヘッドと、 前記基板上に供給される樹脂を硬化させて、該樹脂に前
記微細パターンを転写させる際に、前記ヘッド内を真空
にさせる真空ポンプと、 前記微細構造体を前記装置に組み込むための組み込み手
段と、を具備することを特徴とする装置。12. A device manufacturing apparatus comprising a fine structure for transferring a fine pattern, comprising a stage on which a substrate is mounted, first and second blocks, and the fine pattern on the surface. A head having a mother stamper disposed therein, and a chamber movable up and down with respect to the stage along the first and second blocks, the relative position of which is changeable; A vacuum pump that cures the resin supplied onto the substrate to make the inside of the head a vacuum when the fine pattern is transferred to the resin, and an assembling means for incorporating the fine structure into the apparatus, An apparatus comprising:
ロックに固着され、前記ステージ上の基板と接するクッ
ション材をさらに備え、前記クッション材は硬化した樹
脂よりも柔軟性があることを特徴とする請求項11又は
12に記載の装置。13. The head further comprises a cushion material fixed to the first and second blocks and in contact with the substrate on the stage, wherein the cushion material is more flexible than a cured resin. The device according to claim 11 or 12.
空にすることを特徴とする請求項11又は12に記載の
装置。14. The apparatus according to claim 11, wherein the vacuum pump creates a vacuum inside the head.
さらに具備することを特徴とする請求項11又は12に
記載の装置。15. The apparatus according to claim 11, wherein the apparatus further comprises a supply means for supplying resin.
用されるノズルであることを特徴とする請求項15に記
載の装置。16. The apparatus according to claim 15, wherein the supply unit is a nozzle used in an inkjet method.
熱手段をさらに具備することを特徴とする請求項11又
は12に記載の装置。17. The apparatus according to claim 11, wherein the apparatus further comprises heating means for heating the chamber.
て移動し、前記樹脂を硬化させるための紫外線照射手段
をさらに具備することを特徴とする請求項11又は12
に記載の装置。18. The apparatus according to claim 11, further comprising ultraviolet irradiation means for moving integrally with the head to cure the resin.
The device according to.
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