JP2003089052A - Grinding device - Google Patents
Grinding deviceInfo
- Publication number
- JP2003089052A JP2003089052A JP2001281072A JP2001281072A JP2003089052A JP 2003089052 A JP2003089052 A JP 2003089052A JP 2001281072 A JP2001281072 A JP 2001281072A JP 2001281072 A JP2001281072 A JP 2001281072A JP 2003089052 A JP2003089052 A JP 2003089052A
- Authority
- JP
- Japan
- Prior art keywords
- grindstone
- workpiece
- polishing
- polishing apparatus
- reciprocating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B31/00—Machines or devices designed for polishing or abrading surfaces on work by means of tumbling apparatus or other apparatus in which the work and/or the abrasive material is loose; Accessories therefor
- B24B31/10—Machines or devices designed for polishing or abrading surfaces on work by means of tumbling apparatus or other apparatus in which the work and/or the abrasive material is loose; Accessories therefor involving other means for tumbling of work
- B24B31/112—Machines or devices designed for polishing or abrading surfaces on work by means of tumbling apparatus or other apparatus in which the work and/or the abrasive material is loose; Accessories therefor involving other means for tumbling of work using magnetically consolidated grinding powder, moved relatively to the workpiece under the influence of pressure
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B31/00—Machines or devices designed for polishing or abrading surfaces on work by means of tumbling apparatus or other apparatus in which the work and/or the abrasive material is loose; Accessories therefor
- B24B31/12—Accessories; Protective equipment or safety devices; Installations for exhaustion of dust or for sound absorption specially adapted for machines covered by group B24B31/00
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は、砥石と加工間に研
磨圧力を与えて相対運動を生じさせることにより加工物
を研磨する研磨装置に属する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a polishing apparatus for polishing a work piece by applying a polishing pressure between a grindstone and processing to cause relative movement.
【0002】[0002]
【従来の技術】技術革新の急速な進展と共に工業製品の
高品質化が求められ、研磨・研削等の仕上げに関する需
要が増大している。携帯電話等に代表される現代の製品
は形状が複雑で微細、且つ寸法精度が高い物となってい
る。製品を生み出す治具や金型にも同様に形状が複雑で
微細、且つ寸法精度が高いことが要求されている。この
ため、これら治具や金型等の加工物の製造工程において
研磨・研削作業が必要となっている。2. Description of the Related Art With the rapid progress of technological innovation, it is required to improve the quality of industrial products, and the demand for finishing such as polishing and grinding is increasing. Modern products such as mobile phones have complicated shapes, are fine, and have high dimensional accuracy. Similarly, jigs and molds for producing products are required to have complicated shapes, fine shapes, and high dimensional accuracy. For this reason, it is necessary to carry out polishing / grinding work in the manufacturing process of the jigs, dies and the like.
【0003】このような微細な表面仕上げや高い寸法精
度を要求される加工物の研磨・研削は形状が複雑である
ため、現在においても手作業に依存している。所定形状
の固体砥石を用いた機械力による研磨方法は一部の生産
で行われてはいるが、形状が簡単な物に限られている。
また、手作業による研磨作業であっても、熟練工の不
足、熟練度等により、加工形状や仕上げ面精度において
一定の限界がある。また、熟練工による手作業では研磨
屑や粉塵による人体への悪影響もでている。このような
工業製品の手作業による仕上げ工程を機械化または省力
化することができれば、加工コストの低減化、作業時間
の短縮化、安全性等が図れることとなる。Since polishing and grinding of a work requiring such a fine surface finish and high dimensional accuracy is complicated in shape, it still depends on manual work. Although a polishing method by mechanical force using a solid grindstone of a predetermined shape is performed in some productions, it is limited to a simple shape.
Further, even in the case of manual polishing work, there is a certain limit in the processed shape and finish surface accuracy due to lack of skilled workers, skill level, and the like. In addition, the manual work by a skilled worker has an adverse effect on the human body due to polishing dust and dust. If the manual finishing process for such industrial products can be mechanized or labor-saving, the processing cost can be reduced, the working time can be shortened, and the safety can be improved.
【0004】このような状況下において、加工物の高精
度な鏡面研磨を実現する方法として、固体砥石を用いた
ELID研削が行われてきた。これは固体砥石に電界を与
え、ドレッシングを行いながら研磨・研削を行う方法で
あり、研磨面のスクラッチ(ひっかき傷)が少なく、高
い仕上げ精度が可能ではあるが、平面、円柱等形状が限
定された物に適用されている。Under such circumstances, a solid grindstone is used as a method for realizing highly accurate mirror polishing of a workpiece.
ELID grinding has been performed. This is a method of polishing and grinding while applying an electric field to a solid whetstone and performing dressing. There are few scratches on the polished surface and high finishing accuracy is possible, but the shape such as flat surface or cylinder is limited. It has been applied to other things.
【0005】さらに、固体砥石以外では軟質ラッピング
砥石の研磨方法がある。これは、ポリビニール・アセタ
ール、アルギン酸ナトリュウム等の高分子ラップ材をセ
ーム皮の表面に溶かし込んでラッピングを行う方法であ
るが、研磨圧力(砥石押し付け圧)を大きく取れないた
め研磨効率が悪い。Further, there is a method of polishing a soft lapping grindstone other than the solid grindstone. This is a method in which a polymer wrap material such as polyvinyl acetal or sodium alginate is melted on the surface of the chamois and lapping is performed, but the polishing efficiency is poor because a large polishing pressure (grinding stone pressing pressure) cannot be obtained.
【0006】さらに、自由な形状を研磨する方法とし
て、結合剤に液体と固体に相変化を行う物質を用いた、
こんにゃく砥石、ゼラチン砥石、蝋砥石を用いた方法が
ある。これらは液体で形状を作り固体化を行うことで、
どんな形状の砥石でも自由に作ることができるという長
所があるが、加工物、砥粒、砥石結合剤との間で毛細管
現象があるため、砥石の表面には砥粒の突き出し量がほ
とんどなく、砥粒が偏析する。このため研磨効率が悪
い。Further, as a method of polishing a free shape, a substance that changes phase between liquid and solid is used as a binder.
There are methods using a konjac grindstone, a gelatin grindstone, and a wax grindstone. By making a shape with a liquid and solidifying these,
Although it has the advantage that any shape of grindstone can be freely made, because there is a capillary phenomenon between the workpiece, the abrasive grains, and the grindstone binder, there is almost no protrusion of the abrasive grains on the surface of the grindstone, Abrasive grains segregate. Therefore, the polishing efficiency is poor.
【0007】一方、本願の発明者らにより、磁界によっ
て砥粒の配列を制御する事が可能な、砥粒を含む磁性流
体やMR流体等を用いた研磨方法が提案されている。本
内容は磁性流体(砥粒を含む)を加工物表面に浸漬し、
所定の強さの磁界を磁性流体に与えた状態で、磁性流体
と加工物間に振動若しくは揺動等の相対運動を行うこと
により研磨を行う方法である。この様な磁性流体を利用
した研磨方法の例としては、特開平1−135466号
公報、特開平4−336954号公報、特開平4−41
173号公報、特許第3081911号、特開平11−
165252号公報、特開平11−165268号公報
等が挙げられる。On the other hand, the inventors of the present application have proposed a polishing method using a magnetic fluid or an MR fluid containing abrasive grains, in which the arrangement of the abrasive grains can be controlled by a magnetic field. The contents are magnetic fluid (including abrasive grains) immersed in the surface of the workpiece,
In this method, a magnetic field having a predetermined strength is applied to the magnetic fluid, and relative motion such as vibration or rocking is performed between the magnetic fluid and the workpiece to perform polishing. Examples of the polishing method using such a magnetic fluid include JP-A-1-135466, JP-A-4-336954, and JP-A-4-41.
173, Japanese Patent No. 3081911, Japanese Patent Laid-Open No. 11-
165252, JP-A-11-165268, and the like.
【0008】[0008]
【発明が解決しようとする課題】しかしながら、この様
に砥粒を含む流体を加工面に浸漬し、加工物との間に相
対運動を与えることにより加工物を研磨するこれらの従
来の方法は、研磨材が流動性の高い液体であることか
ら、加工面に対する砥粒の押しつけ圧力が弱く、研磨効
率が低い。したがって、加工物の研削及び研磨行程にお
ける最終工程に適用できるものの、研削工程若しくは研
磨中間工程には不向きである。However, these conventional methods for polishing a work piece by immersing a fluid containing abrasive grains in the work surface and applying relative motion to the work piece in this way are as follows. Since the abrasive material is a highly fluid liquid, the pressing pressure of the abrasive particles against the processed surface is weak and the polishing efficiency is low. Therefore, although it can be applied to the final step in the grinding and polishing steps of the workpiece, it is not suitable for the grinding step or the polishing intermediate step.
【0009】また、従来技術において、磁性流体を用
い、所定の強さの磁界を与えることにより砥粒を配列制
御した状態で研磨しても、磁性流体の流動性により研磨
効率は十分な物ではない。さらに、この磁性流体研磨方
法を3次元形状に適応すると、3次元形状の特徴である
コーナー部、シャープエッジの角が丸くなり、だれが生
じてしまうという問題がある。Further, in the prior art, even if a magnetic fluid is used and polishing is performed in a state where the abrasive grains are array-controlled by applying a magnetic field of a predetermined strength, the fluidity of the magnetic fluid does not provide sufficient polishing efficiency. Absent. Further, when this magnetic fluid polishing method is applied to a three-dimensional shape, there is a problem that the corners and sharp edges, which are the features of the three-dimensional shape, are rounded, causing sagging.
【0010】そこで、本発明は、研磨効率が高く、3次
元形状を研磨するのに適した研磨装置を提供することを
目的とする。Therefore, an object of the present invention is to provide a polishing apparatus which has a high polishing efficiency and is suitable for polishing a three-dimensional shape.
【0011】[0011]
【課題を解決するための手段】本発明者は、砥粒を含有
する流体砥石の長所である自由形状性(加工物形状に合
わせてその形を立体的に自由に変形できること、さら
に、狭い隙間から流し入れることによって、人間の手や
工具が入り込めないような狭く閉鎖的な形状の内部に流
体砥石を構成できる)を維持し、この流体砥石を固化若
しくはゲル化させた。そして磁場攪拌作用を用いて砥粒
を3次元的(X,Y,Z方向あるいは縦、横、上下方
向)に分散させることにより、研磨効率が高く、しかも
3次元形状の加工物を研磨するのに適した研磨装置が得
られることを知見した。The present inventor has found that the fluid grindstone containing abrasive grains has the advantage of being free-form (the shape can be freely deformed three-dimensionally in accordance with the shape of a work piece, and further, a narrow gap can be formed). By pouring it in from above, the fluid grindstone can be constructed inside a narrow and closed shape that human hands and tools cannot enter, and the fluid grindstone was solidified or gelled. By using the magnetic field stirring action to disperse the abrasive grains in three dimensions (X, Y, Z directions or in the vertical, horizontal, vertical directions), the polishing efficiency is high, and the three-dimensional shaped workpiece is polished. It was found that a polishing apparatus suitable for the above can be obtained.
【0012】周知の通り、固体である砥粒と結合剤を混
濁するとファンデーワールス力、表面力、重力等の影響
で、砥粒の偏析が発生し、砥粒間ピッチがバラツキを持
つ。この砥粒間ピッチを均一にする目的で砥粒、結合
剤、磁性体の3種を含む砥石原料に複数の方向から磁場
を与え攪拌を行う。すなわち請求項1の発明は、加工物
の空間に装入された磁性体を含む液体状の砥石原料を、
固化若しくはゲル化させた砥石を利用して加工物を研磨
する研磨装置であって、液体状の前記砥石原料に磁場を
与える磁場供給部が設けられ、該磁場供給部は、液体状
の前記砥石原料に対して互いに異なる複数の方向から磁
場を与えて砥粒の分散を行うことを特徴とする研磨装置
により、上述した課題を解決した。As is well known, when the solid abrasive grains and the binder are turbid, the segregation of the abrasive grains occurs due to the effects of van der Waals force, surface force, gravity, etc., and the pitch between the abrasive grains varies. In order to make the pitch between the abrasive grains uniform, a magnetic field is applied from a plurality of directions to a grindstone raw material containing three types of abrasive grains, a binder, and a magnetic substance, and stirring is performed. That is, the invention of claim 1 provides a liquid grindstone raw material containing a magnetic material, which is charged in a space of a workpiece,
A polishing apparatus for polishing a workpiece using a solidified or gelled grindstone, wherein a magnetic field supply unit for applying a magnetic field to the liquid grindstone raw material is provided, and the magnetic field supply unit is the liquid grindstone. The above-mentioned problems have been solved by a polishing apparatus which is characterized in that magnetic fields are applied to a raw material from a plurality of different directions to disperse abrasive grains.
【0013】この発明によれば、複数の方向から磁場を
与えることで砥粒を3次元的に略均一に分散させる(例
えば網目のように、あるいはビルディングの窓のように
分散させる)ことができるので、固体砥石のいずれの表
面にも砥粒の突き出しが得られる。したがって3次元自
由形状の任意の面を研磨するのに適した研磨装置が得ら
れる。これに対し、例えば砥石原料に一方向のみから磁
場を与えた場合は、固体砥石のある一つの表面において
のみ砥粒を均一に分散させることはできるが、固体砥石
のいずれの表面においても砥粒を均一に分散させること
はできない。According to the present invention, the abrasive grains can be three-dimensionally and substantially evenly dispersed (for example, like a mesh or like a window of a building) by applying magnetic fields from a plurality of directions. Therefore, protrusion of abrasive grains can be obtained on any surface of the solid whetstone. Therefore, a polishing apparatus suitable for polishing an arbitrary surface having a three-dimensional free shape can be obtained. On the other hand, for example, when a magnetic field is applied to the grindstone raw material from only one direction, it is possible to uniformly disperse the abrasive grains only on one surface of the solid grindstone, but the abrasive grains on any surface of the solid grindstone. Cannot be evenly dispersed.
【0014】また加工物と砥石の相対運動を行う研磨装
置内で、磁場攪拌砥石を製作することにより、砥石と加
工物との相対位置座標が砥石製作工程で一定位置に定め
られる。このため、研磨加工に対する初期位置合わせ
(段取り替え)が不要になり、作業時間が短縮される。Further, by producing a magnetic field stirring grindstone in a polishing apparatus which makes a relative motion between the work piece and the grindstone, the relative position coordinates of the grindstone and the work piece are set to a fixed position in the grindstone making process. For this reason, the initial positioning (replacement) for the polishing process becomes unnecessary, and the working time is shortened.
【0015】また本砥石は固体の長所である研磨圧力
(砥石押し付け圧)を大きくでき、更に、毛細管現象を
緩和させ砥粒の突き出し量が確保された砥石であるた
め、柔らかな砥石であっても研磨効率が良い砥石であ
る。3次元自由形状加工物を研磨する方法として、柔ら
かな砥石で研磨するのであれば、バレル研磨と同様にあ
らゆる方向に砥石を振動させれば加工物の表面が研磨さ
れる。堅い砥石で研磨する場合は加工物のコーナダレや
シャープエッジ等の形状が崩れやすいため、研磨圧力を
加工物面に与え、加工物面の接線方向に研磨相対運動を
与える必要がある。本発明は、砥粒偏析の少なく砥粒分
散性の良い形状転写砥石を用いた研磨装置であり、柔ら
かな砥石及び堅い砥石の双方を利用できる。Further, the present grindstone is a soft grindstone because it can increase the polishing pressure (grinding stone pressing pressure), which is an advantage of a solid, and further, the capillary phenomenon is alleviated and the protrusion amount of the abrasive grains is secured. Is a grindstone with good polishing efficiency. As a method of polishing a three-dimensional free-form work piece, if a soft grindstone is used for polishing, the surface of the work piece is polished by vibrating the grindstone in all directions, as in barrel polishing. When polishing with a hard grindstone, the shape of the work such as corners and sharp edges is likely to collapse, so it is necessary to apply a polishing pressure to the work surface and to provide relative polishing motion in the tangential direction of the work surface. INDUSTRIAL APPLICABILITY The present invention is a polishing apparatus using a shape transfer grindstone with less segregation of abrasive grains and good dispersibility of abrasive grains, and can use both a soft grindstone and a hard grindstone.
【0016】なお、磁場攪拌と機械的振動等による攪拌
を併用することも本請求項1に含まれる。また砥石原料
は、磁性体、非磁性体の砥粒及び結合剤で構成されても
よいし、磁性体の砥粒及び結合剤で構成されてもよい。Note that the combined use of magnetic field stirring and stirring by mechanical vibration or the like is also included in claim 1. Further, the grindstone raw material may be composed of magnetic particles, non-magnetic particles and binder, or may be composed of magnetic particles and binder.
【0017】請求項2の発明は磁場攪拌を効果的に行う
手段である。すなわち請求項2の発明は、前記磁場供給
部は前記砥石原料に対して互いに直交するX,Y,Z方
向から磁場を与えることを特徴とする。The invention of claim 2 is a means for effectively performing magnetic field stirring. That is, the invention of claim 2 is characterized in that the magnetic field supply unit applies a magnetic field to the grindstone raw material in X, Y, and Z directions orthogonal to each other.
【0018】この発明によれば、砥粒をX,Y,Zいず
れの方向においても略等ピッチで配列することができ
る。According to the present invention, the abrasive grains can be arranged at substantially equal pitches in any of the X, Y and Z directions.
【0019】請求項3の発明は、砥石を保持すると共に
磁場回路の一部となる砥石保持部が設けられることを特
徴とする。The invention according to claim 3 is characterized in that a grindstone holding portion for holding the grindstone and being a part of the magnetic field circuit is provided.
【0020】磁場発生源は砥石に近いほど磁場効率が良
く磁場強度も強くできる。この発明によれば、磁場発生
源が砥石に近くなる。The closer the magnetic field generation source is to the grindstone, the higher the magnetic field efficiency and the stronger the magnetic field strength. According to this invention, the magnetic field generation source becomes closer to the grindstone.
【0021】請求項4の発明は、前記磁場供給部は、前
記砥石原料に磁場を与えるための複数のコイルを有し、
該コイルには交流が流され、あるいは該コイルに流され
る電流がON−OFF制御され、あるいは該コイルに流
される電流が変化されることを特徴とする。According to a fourth aspect of the present invention, the magnetic field supply unit has a plurality of coils for applying a magnetic field to the grindstone raw material,
It is characterized in that an alternating current is passed through the coil, or a current passed through the coil is ON-OFF controlled, or a current passed through the coil is changed.
【0022】この発明によれば、磁性を有する砥石に磁
場強弱や方向を変えて磁場を与えるので、磁場の作用で
砥粒間に磁性体が均一に入り込む。3次元加工物を研磨
するためには、砥粒間ピッチが3次元的に均一となるこ
とが必要であり、研磨装置が磁力線を変化させる手段を
持つことで、均一分散した高性能砥石が製作される。According to the present invention, the magnetic field is applied to the grindstone having magnetism by changing the strength and direction of the magnetic field, so that the magnetic substance uniformly enters between the abrasive grains by the action of the magnetic field. In order to polish a three-dimensional processed product, it is necessary that the pitch between the abrasive grains be three-dimensionally uniform, and the polishing apparatus has means for changing the magnetic force lines to produce a uniformly dispersed high-performance grindstone. To be done.
【0023】請求項5の発明は、加工物の空間に装入さ
れた砥石を利用して加工物を研磨する研磨装置であっ
て、前記加工物と前記砥石との間の相対運動を制御する
制御部が設けられ、該制御部は、前記加工物に対して前
記砥石が相対運動可能な第一の方向に前記加工物に対し
て前記砥石を相対運動させることによって、前記加工物
の第一面を研磨し、その後、前記砥石の減耗によって生
じた前記加工物の前記第一面と前記砥石との隙間を利用
して、前記第一の方向と異なる第二の方向に前記加工物
に対して前記砥石を相対運動させることによって、前記
加工物の第二面を研磨することを特徴とする研磨装置に
より、上述した課題を解決する。According to a fifth aspect of the present invention, there is provided a polishing apparatus for polishing a workpiece by using a grindstone placed in a space of the workpiece, and controlling relative movement between the workpiece and the grindstone. A control unit is provided, and the control unit causes the grindstone to move relative to the work piece in a first direction in which the grindstone can move relative to the work piece. Polishing the surface, then using the gap between the first surface and the grindstone of the workpiece caused by wear of the grindstone, to the workpiece in a second direction different from the first direction The above-mentioned problem is solved by a polishing apparatus characterized by polishing the second surface of the workpiece by relatively moving the grindstone.
【0024】この発明は半球形状で代表される金型、軸
受け等の加工物を研磨するのに適した研磨装置である。
この発明では、初期工程では研磨可能動作方向から研磨
を行い、砥石を減耗させ、砥石減耗を次の面への研磨動
作ストロークと関連させている。The present invention is a polishing apparatus suitable for polishing a workpiece such as a die and a bearing represented by a hemispherical shape.
In the present invention, in the initial step, polishing is performed from the direction in which polishing is possible to reduce the abrasion of the grindstone, and the abrasion of the grindstone is related to the polishing operation stroke to the next surface.
【0025】3次元自由形状を持つ加工物と相似形状の
砥石は加工物との隙間が非常に小さいため、研磨運動を
この隙間方向に行うことは不可能である。加工物である
金型の形状は構成面が半球の一部であることから、一つ
の方向(抜け方向)に研磨運動を行うことが可能であ
る。したがって、前記の方向に研磨運動を行うことによ
り、加工物と砥石は双方とも減耗し、加工物と砥石の隙
間が増大する。砥石減耗量が大きな砥石を用いて研磨を
行うことにより、加工物の表面が研磨されながら、研磨
運動可能な隙間が確保される。この研磨運動可能な確保
された隙間を利用して次面を研磨することにより、さら
に砥石が減耗し、その次の隙間が増大する。このように
研磨することにより、砥石が研磨面で減耗し、しだいに
小さくなり、加工物の3次元自由形状面が研磨される。Since the clearance between the work piece having a three-dimensional free shape and the shape similar to that of the work piece is very small, it is impossible to perform the polishing movement in the direction of the clearance. Since the shape of the mold, which is a processed product, is a part of a hemisphere, the polishing motion can be performed in one direction (the removal direction). Therefore, by performing the polishing movement in the above-mentioned direction, both the work piece and the grindstone wear down, and the gap between the work piece and the grindstone increases. By performing polishing with a grindstone having a large amount of wear of the grindstone, the surface of the workpiece is polished and a gap capable of polishing movement is secured. By polishing the next surface by utilizing this secured clearance that allows polishing movement, the grindstone further wears down and the next clearance increases. By polishing in this way, the grindstone wears on the polishing surface and gradually becomes smaller, and the three-dimensional free-form surface of the workpiece is polished.
【0026】本発明は、加工面を研磨することで砥石を
減耗させ、次の面を研磨する制御機能を持つ研磨装置で
ある。砥石の減耗量を検知し次の面を研磨するように制
御する研磨装置、あるいは規定回数までの研磨を行い、
研磨動作方向を変えて再度次の面を研磨するように制御
する研磨装置も請求項5に含まれる。The present invention is a polishing apparatus having a control function of abrading a grindstone by polishing a processed surface and polishing the next surface. A grinding device that detects the amount of wear of the grindstone and controls to grind the next surface, or grinds up to a specified number of times,
A polishing apparatus that controls the polishing operation direction to change and polish the next surface again is also included in claim 5.
【0027】請求項6の発明は、前記制御部は、さらに
前記砥石の減耗によって生じた前記加工物の前記第二面
と前記砥石との隙間を利用して、前記第二の方向と異な
る第三の方向に砥石を相対運動させることによって、前
記加工物の第三面を研磨することを特徴とする。According to a sixth aspect of the present invention, the control unit further utilizes a gap between the second surface of the workpiece and the grindstone caused by wear of the grindstone, and is different from the second direction. It is characterized in that the third surface of the workpiece is polished by relatively moving the grindstone in three directions.
【0028】この発明によれば3次元自由形状を持つ加
工物を研磨することができる。According to the present invention, a workpiece having a three-dimensional free shape can be polished.
【0029】請求項7の発明は、砥石を加工物の加工面
に交差する方向に付勢する付勢手段と、前記砥石を前記
加工物に対して加工面の接線方向に相対的に往復運動さ
せる往復運動手段と、前記加工物又は前記砥石の一方を
回転運動させる回転運動手段と、前記加工物又は前記砥
石の一方の回転運動に追従して前記加工物又は前記砥石
の他方を回転運動させる追従手段と、を備えることを特
徴とする研磨装置により、上述した課題を解決する。According to a seventh aspect of the present invention, an urging means for urging the grindstone in a direction intersecting the machining surface of the workpiece and a reciprocating motion of the grindstone relative to the workpiece in a tangential direction of the machining surface. Reciprocating means for rotating, one of the workpiece and the grindstone for rotating, and one of the workpiece and the grindstone for rotating the other of the workpiece and the grindstone. The above-described problems are solved by a polishing apparatus including a follow-up unit.
【0030】この発明によれば、砥石を加工物の加工面
の一つに押しつけ、相対運動を行うことで、押しつけ方
向の面だけが研磨される。加工物又は砥石の一方を回転
運動させると他方が追従するので、加工物の加工面と砥
石面を同時に変えて次の面を研磨することができる。し
たがって、簡単な機構で加工物の内面全周(360度)
を研磨することができる。本発明においては、加工物を
回転運動させ、砥石を加工物の回転運動に追従させても
よいし、これとは逆に砥石を回転運動させ、加工物を砥
石の回転運動に追従させてもよい。According to the present invention, the grindstone is pressed against one of the processed surfaces of the workpiece and the relative movement is performed, whereby only the surface in the pressing direction is polished. When one of the workpiece and the grindstone is rotated, the other follows, so that the machined surface of the workpiece and the grindstone surface can be simultaneously changed to polish the next surface. Therefore, with a simple mechanism, the entire circumference of the inner surface of the workpiece (360 degrees)
Can be polished. In the present invention, the workpiece may be rotated, and the grindstone may be made to follow the rotary movement of the workpiece, or conversely, the grindstone may be made to rotationally move and the workpiece may be made to follow the rotary movement of the grindstone. Good.
【0031】請求項8の発明は、前記付勢手段がばねを
有し、前記研磨装置が、前記砥石又は前記加工物を前記
加工物の加工面に対して交差する方向に移動可能に支持
する支持手段とを備えることを特徴とする。According to an eighth aspect of the present invention, the urging means has a spring, and the polishing device supports the grindstone or the workpiece so as to be movable in a direction intersecting a processing surface of the workpiece. And a supporting means.
【0032】この発明によれば、簡単な機構で略一定の
研磨圧力を生じさせることができる。According to the present invention, it is possible to generate a substantially constant polishing pressure with a simple mechanism.
【0033】請求項9の発明は、砥石を加工物の加工面
に交差する方向に付勢するための付勢手段と、前記砥石
を前記加工物に対して加工面の接線方向に相対的に往復
運動させる往復運動手段とを備え、前記付勢手段は、X
方向に前記砥石又は前記加工物を移動させるX軸移動機
構と、該X方向に直交するY方向に前記砥石又は前記加
工物を移動させるY軸移動機構とを有することを特徴と
する研磨装置により、上述した課題を解決する。According to a ninth aspect of the present invention, an urging means for urging the grindstone in a direction intersecting a machining surface of the workpiece, and the grindstone relative to the workpiece in a tangential direction of the machining surface. Reciprocating means for reciprocating, the biasing means is X
A polishing apparatus comprising: an X-axis moving mechanism that moves the grindstone or the workpiece in a direction, and a Y-axis moving mechanism that moves the grindstone or the workpiece in a Y direction orthogonal to the X direction. The above-mentioned problems are solved.
【0034】この発明によれば、砥石又は加工物をX,
Y方向に移動させながら、砥石を加工物に対して相対的
に往復運動させることで、加工物の内面全周(360
度)を研磨することができる。According to the present invention, the grindstone or the work piece is X,
By moving the whetstone back and forth relative to the work piece while moving in the Y direction, the entire circumference of the inner surface of the work piece (360
Degree) can be polished.
【0035】請求項10の発明は、前記往復運動手段は
スカラ型ロボットアームの終端部、又はガントリー型ロ
ボットの終端部に取り付けられることを特徴とする。According to a tenth aspect of the present invention, the reciprocating means is attached to the end of the SCARA type robot arm or the end of the gantry type robot.
【0036】この発明は、ロボットアームの終端部に往
復運動手段を取り付けることで慣性量の小さな部分で加
工物と砥石の相対運動が行われるようにした研磨装置で
ある。終端部で研磨運動を行うことにより、ロボットア
ーム等の構造物を運動させる必要がない。相対運動に対
する慣性力が小さいので高速相対運動が可能である。The present invention is a polishing apparatus in which a reciprocating means is attached to a terminal end portion of a robot arm so that a workpiece and a grindstone can be relatively moved in a portion having a small inertial amount. By performing the polishing motion at the terminal end, it is not necessary to move the structure such as the robot arm. Since the inertial force for the relative movement is small, high-speed relative movement is possible.
【0037】請求項11の発明は、前記往復運動手段
が、前記加工物に対して前記砥石を相対的に往復運動さ
せるカムを有することを特徴とする。The invention of claim 11 is characterized in that the reciprocating means has a cam for reciprocating the grindstone relative to the workpiece.
【0038】磁力を用いて砥粒を分散させる場合、砥粒
間ピッチは数百μm程度になることが多い。砥石のスト
ロークは、この砥粒間ピッチよりも大きいストローク
(具体的には数mm程度)であること望ましい。本発明
によれば、カムを用いて加工物に対して砥石を往復運動
させることで、適正なストロークを確保することができ
る。これに対し、ピエゾアクチュエータを用いた場合
は、ストロークが砥粒間ピッチよりも短くなり、研磨で
きない部分が生じるおそれがある。When the abrasive grains are dispersed by using a magnetic force, the pitch between the abrasive grains is often about several hundred μm. The stroke of the grindstone is preferably a stroke (specifically, about several mm) larger than the pitch between the abrasive grains. According to the present invention, an appropriate stroke can be secured by reciprocating the grindstone with respect to the workpiece using the cam. On the other hand, when the piezo actuator is used, the stroke becomes shorter than the pitch between the abrasive grains, and there is a possibility that some portions cannot be polished.
【0039】請求項12の発明は、砥石が取り付けら
れ、4関節を持つリンクで構成された第一のリンク装置
と、加工物が取り付けられ、4関節を持つリンクで構成
された第二のリンク装置と、前記第一のリンク装置と前
記第二のリンク装置の動作を関連させる連動機構と、を
備えることを特徴とする研磨装置により、上述した課題
を解決する。According to a twelfth aspect of the present invention, a first link device having a whetstone mounted thereon and having four joints and a second link having a workpiece mounted thereon and having four joints are provided. The above-described problem is solved by a polishing apparatus including an apparatus and an interlocking mechanism that associates the operations of the first link apparatus and the second link apparatus.
【0040】請求項12の発明は、4関節リンク構造体
を2セット持つ研磨装置である。4関節リンク特徴であ
る平行四辺形の一部に砥石保持部又は砥石を取り付け、
もう一つの4関節リンク構造体に加工物を取り付け、リ
ンクのクランクの角度を同時に変化させると、加工物か
ら見て常にさだまった定点座標に砥石がとどまる。相互
のリンク装置を角度ギヤ、リンク、ベルト、ワイヤー等
の連動機構で関連づけることで構造が簡単で、加工物と
砥石姿勢が常に一定となる。本構造の中でクランクの長
さ方向に研磨相対運動を発生させると、砥石と加工物の
相対位置が一定で研磨方向が自由に選択できる研磨装置
が構成される。砥石と加工物の相対姿勢が常に一定であ
るので位置合わせ精度が良く、小型・軽量で、且つ、研
磨ストローク精度が良い研磨装置が構成できる。The invention of claim 12 is a polishing apparatus having two sets of four joint link structures. Attaching a grindstone holding part or grindstone to a part of the parallelogram which is a 4-joint link feature,
When a work piece is attached to another 4-joint link structure and the crank angle of the link is changed at the same time, the grindstone stays at the fixed point coordinates that are always seen from the work piece. By linking the mutual link devices with an interlocking mechanism such as an angle gear, a link, a belt, and a wire, the structure is simple, and the workpiece and the grindstone posture are always constant. In this structure, when a relative polishing motion is generated in the length direction of the crank, the relative position of the grindstone and the work piece is constant, and the polishing direction is freely selectable. Since the relative posture of the grindstone and the workpiece is always constant, it is possible to configure a polishing apparatus that has good positioning accuracy, is small and lightweight, and has high polishing stroke accuracy.
【0041】請求項13の発明は、前記第一のリンク装
置を構成しているクランクの長さを変化させて、前記加
工物と前記砥石の相対運動を行うことを特徴とする。According to a thirteenth aspect of the present invention, the length of a crank constituting the first link device is changed to perform relative movement between the workpiece and the grindstone.
【0042】請求項13の発明はクランクの長さを変え
ることで、慣性量が小さい研磨装置を提供することがで
きる。クランクを伸縮する手段としてカム、プランジ
ャ、電磁ソレノイド等を用いる。可動部分の慣性量が小
さく軽量でクランクの伸縮寸法精度が良いため、研磨ス
トローク精度が良く高速動作が可能な研磨装置が構成さ
れる。According to the thirteenth aspect of the present invention, by changing the length of the crank, it is possible to provide a polishing apparatus having a small amount of inertia. A cam, a plunger, an electromagnetic solenoid or the like is used as a means for expanding and contracting the crank. Since the amount of inertia of the movable part is small and the weight is small, and the expansion and contraction dimensional accuracy of the crank is good, a polishing device having a high polishing stroke precision and capable of high speed operation is configured.
【0043】請求項14の発明は、加工物に対して砥石
を相対的に往復運動することによって加工物を研磨する
研磨装置であって、往復運動の行きの際に、前記砥石か
ら前記加工物の加工面に研磨圧力を与え、往復運動の帰
りの際に、前記砥石から前記加工物の加工面に与える研
磨圧力を減じ、あるいは前記加工物の加工面より前記砥
石を離間させることを特徴とする研磨装置により、上述
した課題を解決する。According to a fourteenth aspect of the present invention, there is provided a polishing apparatus for polishing a workpiece by reciprocating the grindstone relative to the workpiece, wherein the grindstone moves the workpiece toward the workpiece during the reciprocating movement. The polishing pressure is applied to the processed surface of the workpiece, and when the reciprocating motion returns, the polishing pressure applied to the processed surface of the workpiece is reduced from the grindstone, or the grindstone is separated from the processed surface of the workpiece. The above-mentioned problem is solved by the polishing apparatus.
【0044】この発明は、加工物より砥石を引き抜く動
作の方向で研磨を行い、押し込み動作の方向で加工物の
加工面に研磨圧力を与えない構造を持つ研磨装置であ
る。砥石がこの様な動作を行うことにより、研磨による
研磨屑や砥石屑が一方向に排出される。したがって、ス
クラッチ防止と仕上げ面精度向上が可能になる。The present invention is a polishing apparatus having a structure in which polishing is performed in the direction of pulling out a grindstone from a workpiece and no polishing pressure is applied to the processed surface of the workpiece in the direction of pushing operation. By the grindstone performing such an operation, the polishing scraps and grindstone scraps due to the polishing are discharged in one direction. Therefore, it becomes possible to prevent scratches and improve the finish surface accuracy.
【0045】請求項15の発明は、前記研磨装置は、前
記加工物が取り付けられるフレームと、前記加工物の加
工面と交差する方向に移動可能に前記フレームに取り付
けられ、前記砥石を加工面の接線方向に往復運動させる
第一の往復運動部と、該第一の往復運動部を加工面と交
差する方向に往復運動させる第二の往復運動部とを備え
ることを特徴とする。According to a fifteenth aspect of the present invention, the polishing apparatus is attached to the frame to which the workpiece is attached and to the frame so as to be movable in a direction intersecting the processing surface of the workpiece, and the grindstone is attached to the processing surface. It is characterized by comprising a first reciprocating part for reciprocating in a tangential direction and a second reciprocating part for reciprocating the first reciprocating part in a direction intersecting the machining surface.
【0046】この発明によれば、往復運動の行きの際
に、前記砥石から前記加工物の加工面に研磨圧力を与
え、往復運動の帰りの際に、前記砥石から前記加工物の
加工面に与える研磨圧力を減じ、あるいは前記加工物の
加工面より前記砥石を離間させることができる。なお、
砥石の運動の軌跡は四角形でも楕円でもよい。According to the present invention, a polishing pressure is applied from the grindstone to the processed surface of the workpiece during the reciprocating motion, and from the grindstone to the processed surface of the workpiece during the return of the reciprocating motion. The polishing pressure applied can be reduced, or the grindstone can be separated from the processed surface of the workpiece. In addition,
The locus of movement of the grindstone may be square or elliptical.
【0047】請求項16の発明は、前記研磨装置は、加
工物の空間に装入された磁性体を含む液体状の前記砥石
原料を、固化若しくはゲル化させた砥石を利用して加工
物を研磨し、前記研磨装置には、液体状の前記砥石原料
に対して互いに異なる複数の方向から磁場を与えて砥粒
の分散を行う磁場供給部が設けられることを特徴とす
る。According to a sixteenth aspect of the present invention, the polishing apparatus uses a grindstone obtained by solidifying or gelling the liquid grindstone raw material containing a magnetic material, which is charged in the space of the work. The polishing apparatus is characterized in that the polishing apparatus is provided with a magnetic field supply unit that applies magnetic fields to the liquid grindstone raw material from a plurality of different directions to disperse the abrasive grains.
【0048】この発明によれば、研磨効率が高く、3次
元形状を研磨するのに適した研磨装置が得られる。According to the present invention, a polishing apparatus having a high polishing efficiency and suitable for polishing a three-dimensional shape can be obtained.
【0049】請求項17の発明は、前記研磨装置は、液
体状の前記砥石原料に対して互いに直交するX,Y,Z
方向から磁場を与えて砥粒の分散を行うことを特徴とす
る。According to a seventeenth aspect of the present invention, in the polishing apparatus, X, Y and Z which are orthogonal to each other with respect to the liquid grindstone raw material
It is characterized in that a magnetic field is applied from the direction to disperse the abrasive grains.
【0050】この発明によれば、磁場攪拌を効果的に行
うことができる。According to the present invention, magnetic field stirring can be effectively performed.
【0051】また本発明は、請求項18に記載のよう
に、加工物の空間に装入された磁性体を含む液体状の前
記砥石原料を、固化若しくはゲル化させた砥石を利用し
て加工物を研磨する研磨装置であって、基台と、前記基
台に回転可能に設けられ、前記加工物が取り付けられる
取り付け台と、前記取り付け台を回転させる取り付け台
回転部と、前記基台に設けられ、前記砥石を水平方向に
移動可能に支持する支持部と、前記砥石を前記加工物に
付勢するばねと、前記砥石を前記加工物に対して加工面
の接線方向に相対的に往復運動させる往復運動部と、該
往復運動部に回転自在に設けられ、前記砥石を保持する
砥石保持部と、液体状の前記砥石原料に対して磁場を与
える磁場供給部と、を備えることを特徴とする研磨装置
としても構成することができる。According to the eighteenth aspect of the present invention, the liquid grindstone raw material containing the magnetic material charged in the space of the workpiece is processed by using a solidified or gelled grindstone. A polishing apparatus for polishing an object, comprising: a base, an attachment base rotatably provided on the base, to which the workpiece is attached, an attachment rotation unit that rotates the attachment base, and A support portion that is provided to support the grindstone so as to be movable in the horizontal direction, a spring that urges the grindstone toward the workpiece, and reciprocates the grindstone relative to the workpiece in the tangential direction of the machining surface. A reciprocating part for moving, a revolving part rotatably provided, a grindstone holding part for holding the grindstone, and a magnetic field supplying part for applying a magnetic field to the liquid grindstone raw material. Can also be configured as a polishing device. Can.
【0052】また本発明は、請求項19に記載のよう
に、加工物の空間に装入された磁性体を含む液体状の前
記砥石原料を、固化若しくはゲル化させた砥石を利用し
て加工物を研磨する研磨装置であって、基台と、前記基
台に設けられ、前記加工物が取り付けられる取り付け台
と、前記基台に設けられ、前記砥石をX方向及びY方向
に移動させると共に前記砥石を前記加工物の加工面に対
して交差する方向に付勢するX軸移動機構及びY軸移動
機構と、前記X軸移動機構及びY軸移動機構に設けら
れ、前記砥石を前記加工物に対して加工面の接線方向に
相対的に往復運動させる往復運動部と、液体状の前記砥
石原料に対して磁場を与える磁場供給部と、を備えるこ
とを特徴とする研磨装置としても構成することができ
る。According to a nineteenth aspect of the present invention, the liquid grindstone raw material containing a magnetic material charged in the space of the workpiece is processed by using a solidified or gelled grindstone. A polishing apparatus for polishing an object, comprising: a base, an attachment base provided on the base, on which the workpiece is attached, and provided on the base for moving the grindstone in the X direction and the Y direction. The X-axis moving mechanism and the Y-axis moving mechanism for urging the grindstone in a direction intersecting the machining surface of the workpiece, and the X-axis moving mechanism and the Y-axis moving mechanism are provided, and the grindstone is the workpiece. A reciprocating part that relatively reciprocates in the tangential direction of the machining surface, and a magnetic field supply part that applies a magnetic field to the liquid grindstone material are also configured as a polishing apparatus. be able to.
【0053】さらに本発明は、請求項20に記載のよう
に、加工物の空間に装入された磁性体を含む液体状の前
記砥石原料を、固化若しくはゲル化させた砥石を利用し
て加工物を研磨する研磨装置であって、フレームと、4
関節を持つリンクで構成され、一対の第一のクランク及
び前記フレームと平行に運動する第一の平行リンクを有
する第一の平行クランク機構と、4関節を持つリンクで
構成され、一対の第二のクランク及び前記フレームと平
行に運動する第二の平行リンクを有する第二の平行クラ
ンク機構と、前記第一の平行リンクと前記第二の平行リ
ンクとがその相対位置を変化することなく運動するよう
に、前記第一のクランクと前記第二のクランクの動作を
関連させる連動機構とを備え、前記砥石が前記第一の平
行リンクに取り付けられ、前記加工物が前記第二の平行
リンクに取り付けられることを特徴とする研磨装置とし
ても構成することができる。Further, according to the present invention, as described in claim 20, the liquid grindstone raw material containing the magnetic material charged in the space of the workpiece is processed by using a solidified or gelled grindstone. A polishing device for polishing an object, comprising a frame, a 4
A first parallel crank mechanism having a pair of first cranks and a first parallel link that moves in parallel with the frame, and a pair of second cranks. Second parallel crank mechanism having a second parallel link moving parallel to the crank and the frame, and the first parallel link and the second parallel link move without changing their relative positions. Such that the whetstone is attached to the first parallel link and the work piece is attached to the second parallel link, the interlocking mechanism relating the operations of the first crank and the second crank. It can also be configured as a polishing apparatus characterized by being provided.
【0054】さらに本発明は、請求項21に記載のよう
に、加工物の空間に装入された磁性体を含む液体状の前
記砥石原料を、固化若しくはゲル化させた砥石を利用し
て加工物を研磨する研磨装置であって、フレームと、該
フレームに取り付けられる加工物と、該フレームに加工
物の加工面と交差する方向に移動可能に取り付けられ、
砥石を加工面の接線方向に往復運動させる第一の往復運
動部と、該第一の往復運動部を加工面と交差する方向に
往復運動させる第二の往復運動部とを備え、往復運動の
行きの際に、前記砥石から前記加工物の加工面に研磨圧
力を与え、往復運動の帰りの際に、前記砥石から前記加
工物の加工面に与える研磨圧力を減じ、あるいは前記加
工物の加工面より前記砥石を離間させることを特徴とす
る研磨装置としても構成することができる。Further, according to a twenty-first aspect of the present invention, the liquid grindstone raw material containing the magnetic material charged in the space of the workpiece is processed by using a solidified or gelled grindstone. A polishing device for polishing an object, comprising a frame, a work piece attached to the frame, and a movably attached to the frame in a direction intersecting a processing surface of the work piece.
A first reciprocating part that reciprocates the grindstone in a tangential direction of the machining surface; and a second reciprocating part that reciprocates the first reciprocating part in a direction intersecting the machining surface. When going, apply a polishing pressure from the grindstone to the processed surface of the workpiece, reduce the polishing pressure applied from the grindstone to the processed surface of the workpiece when returning from the reciprocating motion, or process the workpiece It can also be configured as a polishing device characterized in that the grindstone is separated from the surface.
【0055】[0055]
【発明の実施の形態】本発明は、砥粒を含有する粉体又
は液体を、離型剤を塗布した加工物に充填し、液体状態
で撹拌させ、固化させ加工物に相似形の固体砥石を製作
する。このため、本発明は少量生産若しくは単品生産に
対応した研磨装置である。また、人の手の届かない箇
所、狭い空間を持つ加工物など、加工全般にわたる幅広
い適応範囲に対応した研磨装置である。BEST MODE FOR CARRYING OUT THE INVENTION The present invention relates to a solid grindstone having a shape similar to that of a work piece, which is obtained by filling a work piece coated with a release agent with a powder or liquid containing abrasive grains, stirring in a liquid state, and solidifying the work piece. To produce. Therefore, the present invention is a polishing apparatus that can be used for small-quantity production or single-item production. In addition, it is a polishing device that supports a wide range of application over the entire process, such as places that are out of the reach of people and workpieces with narrow spaces.
【0056】本発明の具体的な利用分野は砥粒加工全般
にわたる。主な利用分野例としては光学分野として、眼
鏡レンズ、特定形状のプリズム、ミラー等を挙げること
ができる。また各種工業製品の金型、ケーシング部品、
宝飾品、時計部品等、さらに高度な寸法精度が要求され
るゲージ類、シリンダー、軸受け、ベアリング、カム、
歯車等の研削及び研磨に適応できる。また半導体分野で
は集積回路の基本となるシリコンウェハの仕上げ、特殊
な例としては入れ歯、人工骨、等の医療製品にも適用で
きる。A specific field of application of the present invention is in general abrasive processing. Examples of main fields of use include spectacle lenses, prisms of specific shapes, mirrors, and the like as optical fields. Also, molds for various industrial products, casing parts,
Jewelery, watch parts, and other gauges, cylinders, bearings, bearings, cams, etc. that require higher dimensional accuracy.
It can be applied to grinding and polishing of gears. Further, in the field of semiconductors, it can be applied to the finishing of silicon wafers, which are the basis of integrated circuits, and as a special example, medical products such as dentures and artificial bones.
【0057】以下、本発明の砥粒を含む砥石原料で形状
転写砥石(形状適合性砥石)を作成し研磨を行う研磨装
置の実施例を説明する。Hereinafter, an example of a polishing apparatus will be described in which a shape transfer grindstone (shape conforming grindstone) is prepared from a grindstone raw material containing abrasive grains according to the present invention and used for polishing.
【0058】本発明に係る研磨装置の適応領域は上記し
たように広範囲に及ぶため、使用する砥粒及び砥粒を含
有させた砥石原料の配合内容は加工物の材質、形状、仕
上げ程度に応じて定まることになる。Since the applicable range of the polishing apparatus according to the present invention covers a wide range as described above, the content of the abrasive grains to be used and the content of the grindstone raw material containing the abrasive grains to be used depend on the material, shape and finish of the workpiece. Will be decided.
【0059】使用する砥粒の材質としては、磁気感応性
砥粒の場合は、具体的には酸化鉄砥粒(Fe2O3、Fe3O4)、
コーティング砥粒(SiCにメッキ、ダイヤモンドにメッ
キ)、非磁性砥粒の場合は、アルミナ(Al2O3)、シリカ(S
iO3)、炭化珪素(SiC)、ダイヤモンド(C)等が挙げられ
る。砥粒の粒子径は要求される仕上げ精度が高ければ高
いほど粒子径の小さな物を用いる。As the material of the abrasive grains used, in the case of magnetically sensitive abrasive grains, specifically, iron oxide abrasive grains (Fe 2 O 3 , Fe 3 O 4 ),
Coated abrasive grains (SiC plated, diamond plated), non-magnetic abrasive grains include alumina (Al 2 O 3 ) and silica (S
iO 3 ), silicon carbide (SiC), diamond (C) and the like. Regarding the particle size of the abrasive grains, the higher the required finishing accuracy, the smaller the particle size used.
【0060】砥石原料として非磁性砥粒を使用する場合
の砥石原料は、砥粒と磁性体と結合剤を含む。磁性体の
材質としてはMnZn・Fe2O3、Co-γ-Fe2O3、BaO-6Fe2O3、
等が挙げられる。When the non-magnetic abrasive grains are used as the raw material of the grindstone, the raw material of the grindstone contains the abrasive grains, the magnetic substance and the binder. M n Z n · Fe 2 O 3 as the material for the magnetic, Co-γ-Fe 2 O 3, BaO-6Fe 2 O 3,
Etc.
【0061】また、結合剤としては水、各種オイル、蝋
(ロウ)、石鹸、オレイン酸、等であり、結合剤が1種
類の場合もあれば、数種類の場合もある。また砥粒及び
磁性体の凝結を防止するためには界面活性剤を加えると
良い。The binder may be water, various oils, wax, soap, oleic acid, etc., and there may be one binder or several binders. Further, a surfactant may be added to prevent the abrasive grains and the magnetic substance from coagulating.
【0062】液体と固体の相変化をさせる方法として、
融点温度以下ではゲル又は固体、融点温度以上ではゾル
又は液体となる温度相変化を利用する方法を挙げること
ができる。油脂の場合は温度相変化の他に化学反応を利
用する方法が考えられる。また高分子結合剤の場合は光
重合反応を利用する方法が考えられる。As a method for changing the phase of liquid and solid,
There can be mentioned a method utilizing a temperature phase change in which a gel or solid is formed at a melting point temperature or lower, and a sol or a liquid is formed at a melting point temperature or higher. In the case of fats and oils, a method of utilizing a chemical reaction in addition to the temperature phase change can be considered. Further, in the case of a polymer binder, a method utilizing a photopolymerization reaction can be considered.
【0063】ゲル若しくは固化させる前に液体中におけ
る砥粒の分散を制御することは、本発明においてきわめ
て重要である。加工物の加工面と接する砥石面は砥粒状
態により、研磨速度、研磨精度及び研磨効率に大きな影
響を与えるからである。砥石原料は比重の異なる結合
剤、磁性体、砥粒が含まれている(磁気感応性砥粒を使
用する場合は結合剤と磁気感応性砥粒が含まれている)
ため、液体状態では砥粒の偏析が発生し研磨面の有効砥
粒数がばらつく。加工物が3次元形状の場合には、この
有効砥粒数を3次元形状内で均一に制御する必要があ
る。Controlling the dispersion of the abrasive particles in the liquid before gelling or solidifying is extremely important in the present invention. This is because the grindstone surface in contact with the processed surface of the workpiece has a great influence on the polishing rate, the polishing accuracy, and the polishing efficiency depending on the state of the abrasive grains. The raw material of the grindstone contains a binder, a magnetic substance, and abrasive grains having different specific gravities (when the magnetic sensitive abrasive is used, the binder and the magnetic sensitive abrasive are included).
Therefore, in the liquid state, segregation of abrasive grains occurs and the number of effective abrasive grains on the polished surface varies. When the workpiece has a three-dimensional shape, it is necessary to uniformly control the number of effective abrasive grains within the three-dimensional shape.
【0064】磁性体を含む流体と加工物を磁界環境下に
おいた場合、磁性体は磁力線に沿って配列する。また単
位面積当たりの磁力線の数は、磁界強度に比例するの
で、磁場強度を制御することにより磁性体の密度を制御
することができる。磁場強度を与える方向を上下(Z方
向)、左右(X方向)、前後(Y方向)等に変化させる
ことで、磁性体が液体中で撹拌をするため、砥粒もそれ
につられて撹拌される。このようにして、液体中におけ
る砥粒の分布を要求に応じて制御することができる。When the fluid containing the magnetic substance and the workpiece are placed in a magnetic field environment, the magnetic substances are arranged along the lines of magnetic force. Moreover, since the number of magnetic lines of force per unit area is proportional to the magnetic field strength, the density of the magnetic substance can be controlled by controlling the magnetic field strength. By changing the direction in which the magnetic field strength is applied up and down (Z direction), left and right (X direction), front and back (Y direction), the magnetic substance is stirred in the liquid, and the abrasive grains are also stirred accordingly. . In this way, the distribution of abrasive grains in the liquid can be controlled as required.
【0065】固化させる際において液体中における砥粒
の分散を制御する方法としては、磁性体又は磁気感応性
砥粒を含む流体に色々な方向から磁場を与えて分散を制
御する方法が用いられる。As a method of controlling the dispersion of the abrasive grains in the liquid when solidifying, a method of applying a magnetic field to the fluid containing the magnetic substance or the magnetically sensitive abrasive grains from various directions to control the dispersion is used.
【0066】このようにして、ゲル化若しくは固化させ
た砥粒を含む砥石は、加工物の加工面との間で振動若し
くは振動等の相対運動を起こさせることによって、研削
若しくは研磨を行う。研磨運動の方向は、加工物の加工
面の形状に応じて変化させる必要がある。研磨運動とし
て、1次元や2次元の動作を3次元面の各構成面に対し
適用して逐次部分研磨を行うことにより、3次元面の研
磨が可能である。In this way, the grindstone containing the gelled or solidified abrasive grains is ground or polished by causing relative motion such as vibration or vibration with the processed surface of the workpiece. The direction of the polishing movement needs to be changed according to the shape of the processed surface of the workpiece. As a polishing motion, a three-dimensional surface can be polished by applying a one-dimensional or two-dimensional operation to each constituent surface of the three-dimensional surface and successively performing partial polishing.
【0067】研磨ストロークは、目的とする加工に応じ
て調整する。単位時間に大きな研削を行いたい場合は、
大きな砥粒を含有した砥石で加工物との間で大きなスト
ロークの相対運動を生じさせることにより行い、精密な
寸法精度が要求される鏡面加工の場合は、小さな砥粒を
含有した砥石で加工物との間で小さなストロークの相対
運動を生じさせることによって行う。The polishing stroke is adjusted according to the intended processing. If you want to perform large grinding in a unit time,
It is performed by using a grindstone containing large abrasive grains to generate a relative movement of a large stroke with the workpiece, and in the case of mirror-finishing that requires precise dimensional accuracy, the grindstone containing small abrasive grains is used to machine the workpiece. By creating a small stroke of relative motion between and.
【0068】これらの砥粒や研磨運動方向や研磨ストロ
ークの設定は、加工物の仕上げ目的により変化するの
で、加工物ごとに調整を行う。砥石保持部を研磨装置に
取り付けて研磨条件、加工物の仕上げ程度、加工物形状
等に適応した制御により、研削及び研磨が自動で行われ
る。Since the setting of the abrasive grains, the polishing movement direction, and the polishing stroke change depending on the finishing purpose of the workpiece, adjustment is made for each workpiece. The grindstone holding unit is attached to the polishing apparatus, and the grinding and polishing are automatically performed under the control adapted to the polishing conditions, the finish degree of the workpiece, the shape of the workpiece, and the like.
【0069】砥粒分散効果により、微少ストロークで研
磨可能な砥石を用いた加工装置としては、汎用のロボッ
トや工作機械を利用することも可能である。しかし、磁
場攪拌を別工程で用意すると、砥粒分散された砥石と加
工物を再度汎用加工機に取り付ける必要があり、砥石と
加工物の相対位置関係を正確に決めなくてはならない。
他の方法としては、既存の上記装置に磁場攪拌機能を組
み入れる必要がある。A general-purpose robot or machine tool can be used as a processing device using a grindstone capable of polishing with a minute stroke due to the effect of dispersing abrasive grains. However, if magnetic field agitation is prepared in a separate process, the grindstone in which the abrasive grains are dispersed and the workpiece must be attached to the general-purpose processing machine again, and the relative positional relationship between the grindstone and the workpiece must be accurately determined.
Alternatively, it is necessary to incorporate the magnetic stirring function into the existing device.
【0070】これら微少ストロークでの研磨が可能な砥
石(柔らかな砥石や堅い砥石及び、従来の砥石を製作す
る工程で砥粒攪拌工程を付加した砥石)を用いた加工装
置は高速微少ストローク動作が要求される。このため、
加工装置は研磨運動慣性が少なく、且つ、磁場攪拌機能
を持つことが理想である。A processing apparatus using a grindstone capable of polishing with these minute strokes (a soft grindstone, a hard grindstone, and a grindstone to which an abrasive grain stirring step is added in the conventional grindstone manufacturing process) is capable of high-speed minute stroke operation. Required. For this reason,
Ideally, the processing device should have a low inertia of polishing motion and also have a magnetic field stirring function.
【0071】上記、要求を満たす加工装置としては磁場
攪拌機能や砥石保持機能や砥石駆動機能が3次元位置決
め機構の終端部に構成されている装置がのぞましい。こ
の様に、既存の機構に磁場攪拌機能、砥石保持機能、砥
石駆動機能を合わせ持つことで、砥石と加工物との相対
位置を確保することで段取り替えをなくし、高速研磨が
可能な加工装置ができあがる。As a processing apparatus that satisfies the above requirements, an apparatus in which a magnetic field stirring function, a grindstone holding function, and a grindstone driving function are formed at the end of the three-dimensional positioning mechanism is preferable. In this way, by combining the existing mechanism with the magnetic field stirring function, grindstone holding function, and grindstone driving function, the relative position between the grindstone and the workpiece is secured, eliminating setup changes and enabling high-speed polishing. Is completed.
【0072】次に、本発明の具体例として、新しい研磨
装置について、図に基づいて説明する。図1は本発明の
第1の実施形態における研磨装置を示す。Next, as a specific example of the present invention, a new polishing apparatus will be described with reference to the drawings. FIG. 1 shows a polishing apparatus according to the first embodiment of the present invention.
【0073】図1(1)において、加工物1の加工面2
に離型剤3を塗布する。離型剤には、砥粒及び結合剤を
溶解する成分が含まれている。塗布は筆ぬりでも良い
し、スプレーで吹き付けても良い。離型剤を塗布するこ
とにより、離型剤層4の厚さ分だけ、加工面で囲われた
空間より小さな相似空間5ができる。この実施形態で
は、加工物の形状が凹であり、相似空間5は加工物の形
状より僅かに小さい。一方加工物の形状が凸の場合に
は、相似空間5は加工物の形状よりもわずかに大きい。In FIG. 1 (1), the machined surface 2 of the workpiece 1
Then, the release agent 3 is applied. The release agent contains components that dissolve the abrasive grains and the binder. The application may be brush painting or spraying. By applying the release agent, a similar space 5 smaller than the space surrounded by the processed surface is formed by the thickness of the release agent layer 4. In this embodiment, the shape of the work piece is concave, and the similar space 5 is slightly smaller than the shape of the work piece. On the other hand, when the shape of the workpiece is convex, the similar space 5 is slightly larger than the shape of the workpiece.
【0074】図1(2)において、相似空間5に砥石原
料6と砥石保持部7を挿入する。砥石原料には砥粒、結
合剤及び磁性体が含まれる。相似空間5の中で温度を上
昇させ液体化をおこなう(図はヒータ8で温度を上昇す
る場合を示す)。このとき加工物1の温度は砥石原料の
融点に近ければ常温のままでも良い。融点の高い砥石原
料を使用する場合は、加工物1を予め余熱しておくと良
い。なお、この実施形態では、粉体状の砥石原料が相似
空間5に装入されているが、勿論液体状の砥石原料を流
し込んでも良い。In FIG. 1B, the grindstone raw material 6 and the grindstone holding portion 7 are inserted into the similar space 5. The grindstone raw material contains abrasive grains, a binder and a magnetic material. Liquefaction is performed by raising the temperature in the similar space 5 (the figure shows the case where the temperature is raised by the heater 8). At this time, the temperature of the workpiece 1 may be normal temperature as long as it is close to the melting point of the raw material of the grindstone. When using a grindstone raw material having a high melting point, it is preferable to preheat the workpiece 1 in advance. In this embodiment, the powdery grindstone raw material is charged in the similar space 5, but of course, the liquid grindstone raw material may be poured.
【0075】砥石保持部7は、複数本の支柱を有する。
砥石保持部と砥石との締結面積を大きくとれるように、
砥石保持部に溝あるいは段差が形成され、又は砥石保持
部に他部品が取り付けられる。The grindstone holding portion 7 has a plurality of columns.
In order to make the fastening area between the whetstone holding part and the whetstone large,
A groove or a step is formed in the grindstone holding portion, or another component is attached to the grindstone holding portion.
【0076】図1(3)において、液体状態の砥石原料
9に磁場を与え撹拌を行う。砥石原料に磁場を与える磁
場供給部として3つの磁場発生源10,11,12が設
けられる。それぞれの磁場発生源にはコイル13,1
4,15が巻かれる。そして、コイル13,14,15
に電流を流し、互いに異なる複数の方向(この実施形態
では上、左右の3方向)から砥石原料9に磁場を与えて
砥粒を分散させる。これらのコイル13,14,15か
ら発生される磁場の方向は互いに交差する。そして、コ
イル13から生じる磁力線は放射状に拡がる。In FIG. 1 (3), a magnetic field is applied to the grindstone raw material 9 in a liquid state and stirring is performed. Three magnetic field generation sources 10, 11 and 12 are provided as magnetic field supply units for applying a magnetic field to the grindstone raw material. Each magnetic field source has a coil 13,1
4,15 are wound. And the coils 13, 14, 15
An electric current is applied to the grinding stone raw material 9 from a plurality of mutually different directions (upper, left and right three directions in this embodiment) to disperse the abrasive grains. The directions of the magnetic fields generated by these coils 13, 14, 15 intersect each other. Then, the magnetic force lines generated from the coil 13 spread radially.
【0077】本実施形態では、上、左右の3方向から砥
石原料に磁場を与えているが、砥粒を3次元内で均一に
分散させるためには、砥石原料に対して、上(Z方
向)、左右(X方向)、前後(Y方向)の5方向から磁
場を与えるのが望ましい。In the present embodiment, magnetic fields are applied to the grindstone raw material from the upper, right, left, and right directions. ), Left and right (X direction), and front and rear (Y direction).
【0078】砥石保持部7には磁場発生源10が結合さ
れ、砥石保持部7も磁場回路の一部となる。この砥石保
持部7には軟磁性体が使用される。また、形状に適応し
た砥粒撹拌が行われるように、それぞれのコイルに流れ
る電流は変化され、あるいはコイルには交流が流され、
あるいはコイルに流される電流がON−OFF制御され
ることもある。本図において△は砥粒を示す。A magnetic field generation source 10 is coupled to the grindstone holding section 7, and the grindstone holding section 7 also becomes a part of the magnetic field circuit. A soft magnetic material is used for the grindstone holding portion 7. In addition, the current flowing through each coil is changed, or an alternating current is applied to the coils, so that the abrasive grain agitation suitable for the shape is performed.
Alternatively, the current passed through the coil may be ON-OFF controlled. In the figure, Δ indicates an abrasive grain.
【0079】図1(4)において、相似空間内5で砥石
を冷却し、固化を行わせ砥石を抜け方向に引き出す。こ
のとき砥石保持部の溝16には砥石原料が入り込むので
固化砥石17の引き抜きが容易となる。このように砥石
保持部7と固化砥石17の接触断面積を大きく取れる構
造にしておくことで、研磨相対運動に対し大きな研磨圧
力をかけることができる。In FIG. 1 (4), the grindstone is cooled in the similar space 5 to be solidified, and the grindstone is pulled out in the removal direction. At this time, since the grindstone raw material enters the groove 16 of the grindstone holding portion, the solidified grindstone 17 can be easily pulled out. With such a structure that allows a large contact cross-sectional area between the grindstone holding portion 7 and the solidified grindstone 17, a large polishing pressure can be applied to the relative movement of polishing.
【0080】図2は本発明の第2の実施形態における研
磨装置を示す。FIG. 2 shows a polishing apparatus according to the second embodiment of the present invention.
【0081】図2(1)において、図1(4)で作成さ
れた固化砥石17(形状転写砥石)を相似空間内5に置
き、砥石保持部7又は砥石5に左右方向(加工面の法線
方向)に研磨圧力を加え、加工物に対して砥石が相対運
動可能な第一の方向としての上下方向(加工面の接線方
向)に相対運動(←→)を与える。このとき砥石溶解液1
9を適度に与え、砥石を減耗させながら第一面の研磨を
行う。この砥石溶解液19は離型剤と兼用されている。
砥石5の往復運動の回数はあらかじめ設定され、この回
数の研磨動作が完了すると次の面の研磨を行うように、
砥石5の往復運動は制御されている。In FIG. 2 (1), the solidified grindstone 17 (shape transfer grindstone) created in FIG. 1 (4) is placed in the similar space 5, and the grindstone holding portion 7 or grindstone 5 is moved in the left-right direction (the method of processing surface). A polishing pressure is applied in the (line direction) to give relative movement (← →) in the vertical direction (tangential direction of the processing surface) as the first direction in which the grindstone can move relative to the workpiece. At this time, grindstone solution 1
No. 9 is given to polish the first surface while depleting the grindstone. The grindstone solution 19 is also used as a release agent.
The number of reciprocating movements of the grindstone 5 is set in advance, and when the polishing operation of this number is completed, the next surface is polished,
The reciprocating movement of the grindstone 5 is controlled.
【0082】図2(2)において、図2(1)にて研磨
することにより、本図の様に加工面に接していた砥石面
は減耗し、加工面と砥石の隙間が増大する。この隙間を
利用して、さらに本図の様に、砥石保持部又は砥石に斜
め方向(加工面の法線方向)に研磨圧力を加え、これと
ほぼ直交する、第一の方向と異なる第二の方向としての
斜め方向(加工面の接線方向)に相対運動(←→)を与え
る。相対運動のストロークは隙間より小さく設定され
る。このときも、砥石溶解液19を適度に与え、砥石を
減耗させながら第二面の研磨を行う。In FIG. 2 (2), by grinding in FIG. 2 (1), the grindstone surface in contact with the machined surface as shown in this figure is depleted and the gap between the machined surface and the grindstone increases. Using this gap, as shown in the figure, a polishing pressure is applied to the grindstone holding portion or the grindstone in an oblique direction (the normal direction of the processing surface), and a second direction that is substantially orthogonal to this and different from the first direction Relative motion (← →) is given in the diagonal direction (tangential direction of the machined surface) as the direction of. The stroke of relative movement is set smaller than the gap. Also at this time, the second surface is polished while the grindstone dissolving liquid 19 is appropriately applied to reduce the wear of the grindstone.
【0083】図2(3)において、図2(2)にて研磨
することにより、本図の様に加工面に接していた砥石面
は減耗し加工面と砥石の隙間が増大する。この隙間を利
用して、さらに本図の様に、砥石保持部又は砥石に上下
方向(加工面の放線方向)に研磨圧力を加え、第二の方
向と異なる第三の方向としての左右方向(加工面の接線
方向)に相対運動(←→)を与える。相対運動のストロー
クは隙間より小さく設定される。このときも、砥石溶解
液19を適度に与え、砥石を減耗させながら第三面の研
磨を行う。In FIG. 2 (3), by grinding in FIG. 2 (2), the grindstone surface in contact with the machined surface as shown in this figure is depleted and the gap between the machined surface and the grindstone increases. Utilizing this gap, as shown in the figure, a polishing pressure is applied to the grindstone holding portion or the grindstone in the up-down direction (radial direction of the processing surface), and the left-right direction as a third direction different from the second direction ( Relative motion (← →) is applied in the tangential direction of the machined surface. The stroke of relative movement is set smaller than the gap. At this time as well, the grindstone dissolving liquid 19 is appropriately applied to polish the third surface while depleting the grindstone.
【0084】図2(4)において、最終的に砥石は小さ
くなり、本図の様に転写形状が劣化することになる。本
発明の研磨方法によれば、加工物の加工面がどのような
傾斜の組み合わせであっても、研磨が可能である。さら
に、寸法精度を向上させたり、鏡面に研磨したりする場
合は、前記図1、図2の行程を繰り返し行うことで、寸
法精度や仕上げ面粗さの向上が可能である。なお砥石減
耗屑や研磨屑を加工面から排除するために、図示しない
ブロワ等により加工面に送風を行ってもよい。In FIG. 2 (4), the grindstone finally becomes small, and the transfer shape deteriorates as shown in this figure. According to the polishing method of the present invention, polishing is possible regardless of the combination of inclinations of the processed surface of the workpiece. Further, in the case of improving the dimensional accuracy or polishing to a mirror surface, it is possible to improve the dimensional accuracy and the finished surface roughness by repeating the steps of FIGS. 1 and 2. In order to remove grindstone debris and polishing debris from the work surface, air may be blown to the work surface by a blower (not shown) or the like.
【0085】図3及び図4は本発明の第3の実施形態に
おける研磨装置を示す。この研磨装置はスカラ型ロボッ
トアームを用いている。基台200に支柱201をネジ
202で取り付ける。支柱201に第一アーム205を
回動可能に取り付ける。第一アームに設けたネジ206
にネジ軸207を取り付け、第一アーム205の上下高
さの調節を行う。また第一アーム205は第一アームロ
ックネジ208により、第一アーム205の回動及び上
下動を阻止される。3 and 4 show a polishing apparatus according to the third embodiment of the present invention. This polishing apparatus uses a SCARA type robot arm. The support 201 is attached to the base 200 with screws 202. The first arm 205 is rotatably attached to the column 201. Screw 206 provided on the first arm
A screw shaft 207 is attached to and the vertical height of the first arm 205 is adjusted. The first arm 205 is blocked by the first arm lock screw 208 from rotating and moving up and down.
【0086】第一アーム205の先端部には第二アーム
軸210と第二アーム211がネジ212により取り付
けられる。第二アーム211は第一アーム205の先端
部を中心に回動可能である。第二アームロックネジ21
3を締めることにより第二アーム211の回動が阻止さ
れる。砥石を加工物の加工面に交差する方向に付勢する
ばね(付勢手段)としての引張りバネ215により、第
二アーム211には反時計回りのモーメントが加わる。
これにより、加工物1に砥石17を押し当てることがで
きる。A second arm shaft 210 and a second arm 211 are attached to the tip of the first arm 205 by screws 212. The second arm 211 is rotatable around the tip of the first arm 205. Second arm lock screw 21
By tightening 3, the rotation of the second arm 211 is blocked. A counterclockwise moment is applied to the second arm 211 by the tension spring 215 as a spring (biasing means) that biases the grindstone in a direction intersecting the machining surface of the workpiece.
Thereby, the grindstone 17 can be pressed against the workpiece 1.
【0087】ここで、支柱201、第一アーム205、
第二アーム軸210、第二アーム211等が砥石を加工
物の加工面に対して交差する方向(この実施形態では水
平方向)に移動可能に支持する支持部(支持手段)とし
て機能する。Here, the column 201, the first arm 205,
The second arm shaft 210, the second arm 211, and the like function as a supporting portion (supporting means) that movably supports the grindstone in a direction intersecting the processing surface of the workpiece (horizontal direction in this embodiment).
【0088】第二アームの先端部216に、砥石17を
保持する砥石保持部220、砥石を加工物に対して加工
面の接線方向に相対的に往復運動させる往復運動部(往
復運動手段)として機能する砥石駆動部230、砥石原
料に磁場を与えるための磁場供給部として機能するコイ
ル240、ワイヤー245を取り付ける。ワイヤー24
5は砥石駆動部230と第一モータ250に結合され、
第一モータ250の動力を砥石駆動部230に伝達す
る。At the tip portion 216 of the second arm, a grindstone holding portion 220 for holding the grindstone 17 and a reciprocating part (reciprocating means) for reciprocating the grindstone relative to the workpiece in the tangential direction of the machining surface. A whetstone driving unit 230 that functions, a coil 240 that functions as a magnetic field supply unit for applying a magnetic field to the whetstone raw material, and a wire 245 are attached. Wire 24
5 is connected to the grindstone driving unit 230 and the first motor 250,
The power of the first motor 250 is transmitted to the grindstone driving unit 230.
【0089】取り付け台260の上部に加工物1を取り
付け、X−Yコイル265とリフト270とギヤA27
1を取り付ける。取り付け台260はギヤA271、ギ
ヤB272、ギヤC273、第二モータ275により、
ゆっくり回転される。ここで、ギヤA271、ギヤB2
72、ギヤC273、第二モータ275が加工物を回転
運動させる取り付け台回転部(回転運動手段)として機
能する。The workpiece 1 is attached to the upper part of the mounting table 260, and the XY coil 265, the lift 270 and the gear A27 are attached.
Attach 1. The mounting base 260 is composed of the gear A 271, the gear B 272, the gear C 273, and the second motor 275.
It is rotated slowly. Here, gear A271 and gear B2
The 72, the gear C273, and the second motor 275 function as a mounting base rotating unit (rotating motion unit) that rotates the workpiece.
【0090】X−Yコイル265は磁場攪拌用であり、
加工物1に対してX−Y2次元に磁力線を発生する。コ
イル240も磁場攪拌用であり、加工物1に対してZ方
向に磁力線を発生する。The XY coil 265 is for magnetic field stirring.
Lines of magnetic force are generated in the X-Y two dimensions with respect to the workpiece 1. The coil 240 is also for magnetic field stirring, and generates magnetic force lines in the Z direction with respect to the workpiece 1.
【0091】リフト270は加工物1を上下移動させる
ためのものであり、加工物1の上下高さの微調整を行
う。The lift 270 is for moving the workpiece 1 up and down, and finely adjusts the vertical height of the workpiece 1.
【0092】取り付け台260に加工物1を取り付け、
離型剤を塗布し、砥石原料を加工物内(ハッチング部)
に液体状態で挿入する。挿入時固体状態の場合は加工物
内で液体状態にする。同時に、第一アーム205と第二
アーム211を操作し、砥石保持部220を加工物1内
に挿入する。第一アーム205、第二アーム211を第
一アームロックネジ208、第二アームロックネジ21
3で固定する。The work piece 1 is attached to the attachment table 260,
Apply release agent and grindstone raw material inside the work (hatching part)
Insert it in the liquid state. If it is in the solid state at the time of insertion, it should be in the liquid state in the work piece. At the same time, the first arm 205 and the second arm 211 are operated to insert the grindstone holding portion 220 into the workpiece 1. The first arm 205 and the second arm 211 are connected to the first arm lock screw 208 and the second arm lock screw 21.
Fix at 3.
【0093】コイル240、X−Yコイル265に電流
を流し形状に適応した磁場攪拌を行う。砥石原料の冷却
固化を加工物内で行う。無駄な磁場エネルギーを使わな
いように固化前に攪拌を停止する。コイル240とX−
Yコイル265とは直交しているので、コイル240及
びX−Yコイル265に電流を流すと、図4に示すよう
にコイル240から発生する磁力線は下方に向かって放
射状に拡がる。An electric current is passed through the coil 240 and the XY coil 265 to stir the magnetic field adapted to the shape. Cooling and solidifying the raw material of the grindstone is performed in the work piece. Stop stirring before solidification to avoid wasting magnetic field energy. Coil 240 and X-
Since it is orthogonal to the Y coil 265, when a current is passed through the coil 240 and the XY coil 265, the magnetic force lines generated from the coil 240 radially expand downward as shown in FIG.
【0094】砥石原料の固化後、第二アームロックネジ
213をゆるめ第二アーム211を回転自在にする。回
転可能となった第二アーム211を引っ張りバネ215
で引き寄せることにより、砥石17と加工物1の面が圧
接する。After the grindstone raw material is solidified, the second arm lock screw 213 is loosened to make the second arm 211 rotatable. The second arm 211 that has become rotatable is pulled by a spring 215.
The whetstone 17 and the surface of the work piece 1 are brought into pressure contact with each other by being pulled by.
【0095】第一モータ250に電流を流しワイヤー2
45のインナケーブル246を回転させ動力を砥石駆動
部230に伝える。砥石駆動部230のカム221が回
転を行い、ピン222を仲介し、従動節としての砥石駆
動部スリーブ223が上下に往復運動し、最終的には砥
石保持部220と砥石17が上下運動を行う。An electric current is passed through the first motor 250 and the wire 2
The inner cable 246 of 45 is rotated to transmit the power to the grindstone driving unit 230. The cam 221 of the grindstone driving unit 230 rotates, the pin 222 is interposed, the grindstone driving unit sleeve 223 as a follower moves up and down, and finally the grindstone holding unit 220 and the grindstone 17 move up and down. .
【0096】砥石駆動部板225は砥石駆動部スリーブ
223に取り付けられているので、砥石駆動部スリーブ
223の上下動に合わせて上下動を行う。スリーブガイ
ド229と砥石駆動部板225の間に砥石保持部220
を入れることで、砥石保持部220は砥石駆動部スリー
ブ223に同期し上下動作を行いながら、自在に回転で
きる様になる。ここで、スリーブガイド229と砥石駆
動部板225の間に回転自在に設けられた砥石保持部2
20が、加工物の回転運動に追従して砥石を回転運動さ
せる追従手段として機能する。Since the grindstone drive unit plate 225 is attached to the grindstone drive unit sleeve 223, it moves up and down in accordance with the vertical movement of the grindstone drive unit sleeve 223. The grindstone holding portion 220 is provided between the sleeve guide 229 and the grindstone driving portion plate 225.
By putting in, the grindstone holding portion 220 can be freely rotated while performing vertical movement in synchronization with the grindstone driving portion sleeve 223. Here, the grindstone holding part 2 rotatably provided between the sleeve guide 229 and the grindstone drive part plate 225.
The reference numeral 20 functions as a follow-up unit that follows the rotational movement of the workpiece to rotate the grindstone.
【0097】砥石保持部220を上下動させながら、第
二モータ275に電流を流しギヤC273、ギヤB27
2、ギヤA271を回転させ、取り付け台260と加工
物1をゆっくり回転させると、砥石17と砥石保持部2
20も上下動しながら加工物1に対し追従回転を行う。While moving the grindstone holding portion 220 up and down, an electric current is passed through the second motor 275 to cause the gear C273 and the gear B27 to move.
2. When the gear A271 is rotated and the mount 260 and the workpiece 1 are slowly rotated, the grindstone 17 and the grindstone holding portion 2
20 also moves up and down and follows the workpiece 1.
【0098】追従回転して行く段階で引張りバネ215
による圧接は同一方向なため、加工物17の加工面に圧
接する砥石面が上下動を行いながら変わっていき、これ
により加工全面(360°全周)縦の研磨ができる。At the stage of following and rotating, the tension spring 215
Since the pressing by means of the same direction is in the same direction, the grindstone surface pressed against the working surface of the workpiece 17 changes while moving up and down, which enables vertical polishing of the entire surface (360 ° circumference).
【0099】縦の研磨終了後、砥石保持部220、コイ
ル240と砥石駆動部230を傾け、上記と同様の工程
を行うことにより、加工物の傾斜面が研磨できる。After the vertical polishing is completed, the grindstone holding section 220, the coil 240 and the grindstone driving section 230 are tilted, and the same steps as above are performed, whereby the inclined surface of the workpiece can be ground.
【0100】スカラ型ロボットアームの終端部に砥石駆
動部230を取り付けることで慣性量の小さな部分で砥
石の上下運動が行われる。終端部で上下運動を行うこと
により、ロボットアーム等の構造物を上下運動させる必
要がない。上下運動に対する慣性力が小さいので高速上
下運動が可能である。By attaching the grindstone driving unit 230 to the end portion of the SCARA type robot arm, the grindstone moves up and down in a portion having a small amount of inertia. By vertically moving at the terminal end, it is not necessary to vertically move a structure such as a robot arm. Since the inertial force against vertical movement is small, high-speed vertical movement is possible.
【0101】また第一モータ250は基台200上に配
置され、第一モータ250からの動力は遠隔操作用のワ
イヤー245を介し砥石駆動部230に伝えられる。こ
のため、慣性量のより小さな部分で砥石の上下動が行わ
れる。鉛直な加工面を研磨するときには、砥石が上下運
動することによる慣性の力が加工面に加わらないが、斜
めの加工面を研磨するときには、砥石が上下運動しよう
とすることによる慣性の力が加工面に加わる。慣性の力
が加わると加工面に加わる圧力が増えすぎる。第一モー
タ250を基台200上に配置し、砥石駆動部230を
遠隔操作することで、砥石駆動部230の慣性をより小
さくできる。The first motor 250 is arranged on the base 200, and the power from the first motor 250 is transmitted to the grindstone driving unit 230 via the wire 245 for remote operation. Therefore, the whetstone is moved up and down in a portion having a smaller inertial amount. When polishing a vertical machining surface, the inertial force due to the vertical movement of the grindstone is not applied to the machining surface, but when polishing an oblique machining surface, the inertial force due to the grindstone trying to move up and down causes machining. Join the surface. When inertial force is applied, the pressure applied to the machined surface increases too much. By arranging the first motor 250 on the base 200 and operating the grindstone driving unit 230 remotely, the inertia of the grindstone driving unit 230 can be further reduced.
【0102】図5及び図6は本発明の第4の実施形態に
おける研磨装置を示す。この実施形態ではガントリー型
ロボットを用いている。FIGS. 5 and 6 show a polishing apparatus according to the fourth embodiment of the present invention. In this embodiment, a gantry type robot is used.
【0103】基台300にX動作モータ310をネジ3
05で取り付け、基台300のX方向に細長く延びるス
リット301にX動作台320を入れ、X動作モータ3
10のボールネジ311にX動作台320を挿入する。
X動作台320は雌ネジとなっており、X動作モータ3
10が回転を行うとX動作台320がX方向に移動す
る。ここでX動作モータ310及びX動作台320がX
軸移動機構として機能する。The X motion motor 310 is attached to the base 300 with the screw 3
The X operation table 320 is attached to the slit 301 extending in the X direction of the base 300, and the X operation motor 3 is attached.
The X operation table 320 is inserted into the ball screw 311 of 10.
The X operation table 320 is a female screw, and the X operation motor 3
When 10 rotates, the X operation table 320 moves in the X direction. Here, the X operation motor 310 and the X operation table 320 are X
Functions as an axis moving mechanism.
【0104】基台300にリフト330をネジ331で
取り付け、リフト330の上板332上にX−Yコイル
333を形成し、X−Yコイルの上に取り付け台340
を取り付ける。加工物1はリフト330により昇降す
る。The lift 330 is attached to the base 300 with screws 331, the XY coil 333 is formed on the upper plate 332 of the lift 330, and the mount 340 is placed on the XY coil.
Attach. The workpiece 1 is lifted and lowered by the lift 330.
【0105】X動作台320の軸325にY動作台35
0をY方向に摺動可能に取り付ける。X動作台320に
Y動作モータ351を取り付ける。Y動作モータ351
のボールネジ352にY動作台350を挿入する。Y動
作台350には雌ネジがあり、Y動作モータが回転を行
うとY動作台がY方向に移動する。ここでY動作モータ
351及びY動作台350がY軸移動機構として機能す
る。The Y operation table 35 is attached to the shaft 325 of the X operation table 320.
0 is attached so that it can slide in the Y direction. The Y operation motor 351 is attached to the X operation table 320. Y operation motor 351
The Y operation table 350 is inserted into the ball screw 352 of. The Y operation table 350 has a female screw, and when the Y operation motor rotates, the Y operation table moves in the Y direction. Here, the Y operation motor 351 and the Y operation table 350 function as a Y axis moving mechanism.
【0106】また、X−Yコイル333に電流を流すこ
とにより、X−Yコイル333の磁気ダクト334が磁
化し、加工物1にX−Y2次元磁場が発生する。By passing a current through the XY coil 333, the magnetic duct 334 of the XY coil 333 is magnetized, and an XY two-dimensional magnetic field is generated in the workpiece 1.
【0107】Y動作台の先端部360に砥石駆動部36
1、駆動モータ368を取り付ける。コイル370、砥
石保持部375は砥石駆動部361に連結されている。The grindstone drive unit 36 is attached to the tip 360 of the Y operation table.
1. Attach the drive motor 368. The coil 370 and the grindstone holding unit 375 are connected to the grindstone driving unit 361.
【0108】砥石原料及び砥石保持部375を加工物内
に挿入し、X−Yコイル333とコイル370で磁場攪
拌を行い、その後冷却することで砥石1が作成される。The grindstone 1 is prepared by inserting the grindstone raw material and the grindstone holding portion 375 into the workpiece, stirring the magnetic field with the XY coil 333 and the coil 370, and then cooling.
【0109】駆動モータ368に電流を流し、モータ軸
367を回転させ動力を砥石駆動部361に伝える。砥
石駆動部361のカム362が回転を行い、ピン363
を仲介し、砥石駆動部スリーブ364が上下に往復運動
し、砥石保持部375と砥石17が上下運動を行う。こ
こで駆動モータ368及び砥石駆動部361が、砥石1
7を加工物1に対して加工面の接線方向に相対的に往復
運動させる往復運動手段として機能する。An electric current is passed through the drive motor 368 to rotate the motor shaft 367 and transmit the power to the grindstone drive unit 361. The cam 362 of the grindstone driving unit 361 rotates and the pin 363 rotates.
, The grindstone drive unit sleeve 364 reciprocates up and down, and the grindstone holding unit 375 and the grindstone 17 move up and down. Here, the drive motor 368 and the grindstone driving unit 361 are arranged so that the grindstone 1
It functions as a reciprocating means for relatively reciprocating the work piece 7 relative to the work piece 1 in the tangential direction of the work surface.
【0110】砥石保持部375を上下動させながら、X
動作モータ310及びY動作モータ351に電流を流
し、X−Y2次元方向の研磨圧力を砥石17に与えるこ
とで、360°全方向に研磨圧力を砥石に与えることが
できる。加工物1の形状に合わせて研磨圧力を制御しな
がら、駆動モータ368を回転し砥石保持部375を上
下動させ加工物1を研磨する。While moving the grindstone holding portion 375 up and down, X
By supplying a current to the operation motor 310 and the Y operation motor 351, and applying the polishing pressure in the XY two-dimensional directions to the grindstone 17, the grinding pressure can be applied to the grindstone in all directions of 360 °. While controlling the polishing pressure according to the shape of the workpiece 1, the drive motor 368 is rotated to move the grindstone holding portion 375 up and down to polish the workpiece 1.
【0111】図7は本発明の第5の実施形態における研
磨装置を示す。この研磨装置は4関節リンクを用いてい
る。FIG. 7 shows a polishing apparatus according to the fifth embodiment of the present invention. This polishing device uses a 4-joint link.
【0112】図7(1)は初期位置状態の平面図、図7
(2)は初期位置状態の側面図を示す。FIG. 7 (1) is a plan view of the initial position state, and FIG.
(2) shows a side view of the initial position state.
【0113】フレーム400に軸A401、軸D404
を設け、第一のクランクとしてのレバー1405の先端
に軸B402、第一のクランクとしての扇形ギヤ140
6の先端に軸C403を設け、第一の平行リンクとして
の加工物基台410を挿入し、平行四辺形A、B、C、
Dを構成させる。A、Dはフレーム上の点であり、固定
されているので、BCはADに平行に動く。ここでフレ
ーム400、レバー1405、扇形ギヤ1406、及び加
工物基台410が、第一のリンク装置(第一の平行クラ
ンク機構)を構成する。Axis A 401, axis D 404 on frame 400
The provided shaft B402 at the tip of the lever 1 405 as a first crank, sector gear 1 40 of the first crank
A shaft C403 is provided at the tip of 6, and a workpiece base 410 serving as a first parallel link is inserted, and parallelograms A, B, C,
Let D be configured. Since A and D are points on the frame and are fixed, BC moves parallel to AD. Here, the frame 400, the lever 1 405, the fan-shaped gear 1 406, and the workpiece base 410 constitute a first link device (first parallel crank mechanism).
【0114】フレーム400に軸E421、軸H424
を設け、第二のクランクとしてのレバー2425の先端
に軸F422、第二のクランクとしての扇形ギヤ242
6の先端に軸G423を設け、第二の平行リンクとして
の砥石台430を挿入し、平行四辺形E、F、G、Hを
構成させる。E、Hはフレーム上の点であり、固定され
ているので、FGはEHに平行に動く。ここでフレーム
400、レバー2425、扇形ギヤ2426、及び砥石台
430が第二のリンク装置(第二の平行クランク機構)
を構成する。The axis E421 and the axis H424 are attached to the frame 400.
And a shaft F422 at the tip of a lever 2 425 as a second crank, and a fan-shaped gear 2 42 as a second crank.
A shaft G423 is provided at the tip of 6 and a grindstone base 430 as a second parallel link is inserted to form parallelograms E, F, G and H. Since E and H are points on the frame and are fixed, FG moves parallel to EH. Here, the frame 400, the lever 2 425, the fan-shaped gear 2 426, and the grindstone 430 are the second link device (second parallel crank mechanism).
Make up.
【0115】角度モータ435はフレーム400に取り
付けられ、扇形ギヤ1406を回転させる。ギヤ1436
はフレームに移動可能に取り付けられ、攪拌工程及び研
磨角度変化中はP1位置を中心に回転をする。扇形ギヤ
2426と扇形ギヤ1406はギヤ1436がP1位置の
時に連動し回転を行う。P2位置の時は扇形ギヤ242
6がギヤ1436より離間する。ここで扇形ギヤ140
6、扇形ギヤ2426、ギヤ1436及び角度モータ43
5が、第一のリンク装置及び第二のリンク装置の動作を
関連させる連動機構として機能する。[0115] angle motor 435 is mounted to the frame 400, rotates the sector gear 1 406. Gear 1 436
Is movably attached to the frame and rotates about the P1 position during the stirring process and polishing angle change. Fan gear
2 426 and fan-shaped gear 1 406 rotate together when gear 1 436 is in the P1 position. When in P2 position, fan-shaped gear 2 42
6 is separated from the gear 1 436. Here, the fan-shaped gear 1 40
6, fan-shaped gear 2 426, gear 1 436 and angle motor 43
5 functions as an interlocking mechanism that associates the operations of the first link device and the second link device.
【0116】ギヤ1436がP1位置の時、平行四辺形
ABCDの内角T1、平行四辺形EFGH内角T2は角
度モータ435により同時に変化を行う。P1位置では
常時T1=T2である。また、レバー1405と扇形ギ
ヤ1406、レバー2425と扇形ギヤ2426の長さが
等しく、しかも内角T1、T2が等しく変化をする為、
加工物と砥石保持部の相対位置は角度モータ435を回
転しても変化しない。When the gear 1 436 is in the P1 position, the internal angle T1 of the parallelogram ABCD and the internal angle T2 of the parallelogram EFGH are simultaneously changed by the angle motor 435. At the P1 position, T1 = T2 is always maintained. Further, since the lever 1 405 and the sector gear 1 406, the lever 2 425 and the sector gear 2 426 have the same length, and the internal angles T1 and T2 change equally,
The relative position between the work piece and the grindstone holder does not change even if the angle motor 435 is rotated.
【0117】レバー2425、扇形ギヤ2426には伸縮
機構465がある。電流を流すとバネ466に逆らって
縮み、その長さが短くなる。The lever 2 425 and the fan-shaped gear 2 426 have a telescopic mechanism 465. When an electric current is applied, it contracts against the spring 466 and its length becomes shorter.
【0118】加工物基台410上にリフト440、X−
Yコイル、その上に加工物台450を設け、砥石台43
0の下部にコイル431、砥石保持部432を取り付け
る。A lift 440, X- on the workpiece base 410.
The Y coil and the work table 450 are provided on the Y coil, and the grindstone table 43 is provided.
The coil 431 and the grindstone holding portion 432 are attached to the lower part of 0.
【0119】平行四辺形EFGHを構成しているレバー
2425はバネ460により時計回り方向のモーメント
が与えられている。これにより砥石から加工物に圧力を
かけることができる。Lever constituting parallelogram EFGH
A clockwise moment is applied to 2425 by a spring 460. This allows the grindstone to apply pressure to the workpiece.
【0120】図7(3)は、P1位置で砥石を作成し、
角度モータ435を回転した状態を示す。角度モータ4
35をバネ460に逆らって回転すると、砥石台430
及び加工物基台410が同期しながら移動する。In FIG. 7C, a grindstone is made at the P1 position,
The state where the angle motor 435 is rotated is shown. Angle motor 4
When 35 is rotated against spring 460, grindstone 430
And the workpiece base 410 moves in synchronization.
【0121】図7(2)はギヤ14361をP1位置よ
りP2位置に移動した状態を示す。この状態で伸縮機構
465に電流を流しレバー2425と扇形ギヤ2426を
同時に縮めると、砥石保持部432が上方向に移動す
る。電流を遮断するとバネ466のバネ力により下方向
に移動する(初期位置)。この様に電流をON―OFFする
ことにより、砥石保持部432が上下に振動を起こし縦
方向面が研磨される。[0121] FIG. 7 (2) shows a state in which moving the gear 1 4361 in the P2 position from P1 position. In this state, when a current is applied to the expansion mechanism 465 to simultaneously contract the lever 2 425 and the fan gear 2 426, the grindstone holding portion 432 moves upward. When the current is cut off, the spring force of the spring 466 causes the spring 466 to move downward (initial position). By turning the current on and off in this manner, the grindstone holding portion 432 vibrates up and down, and the vertical surface is polished.
【0122】図7(4)は(3)の状態から角度モータ
435を回転し、研磨適正状態に停止させた状態を示
す。本図において、ギヤをP1からP2状態に切り替
え、伸縮機構465に電流を流し、レバー2425と扇
形ギヤ2426を同時に縮めると、砥石保持部432が
斜め上方向に移動する。電流を遮断するとバネ466の
バネ力により斜め下方向に移動する(初期位置)。この
様に電流をON―OFFすることにより、砥石保持部432
が斜めに振動を起こし傾斜面が研磨される。また、リフ
ト440、X−Yコイル445、加工物台450と加工
物1は加工物モータ470によりゆっくり回転され、砥
石1と砥石保持部432が追従回転を行う。FIG. 7 (4) shows a state in which the angle motor 435 is rotated from the state of (3) and stopped in the proper polishing state. In this figure, when the gear is switched from the P1 state to the P2 state, a current is passed through the expansion mechanism 465, and the lever 2 425 and the sector gear 2 426 are simultaneously contracted, the grindstone holding portion 432 moves diagonally upward. When the current is cut off, the spring force of the spring 466 causes the spring to move diagonally downward (initial position). By turning the current on and off in this way, the grindstone holding portion 432
Vibrates obliquely and the inclined surface is polished. Further, the lift 440, the XY coil 445, the workpiece table 450 and the workpiece 1 are slowly rotated by the workpiece motor 470, and the grindstone 1 and the grindstone holding portion 432 perform follow-up rotation.
【0123】この様に、加工物1の縦方向研磨は図7
(2)で示され、縦方向以外の斜め方向の研磨は図7
(4)で示される。更に、各々上記の状態で加工物モー
タ470が回転し、加工物17が回転することにより、
縦面から斜め面までの内面形状がすべて研磨される。本
装置において、内角T1,T2を180°とすると水平
面までもが研磨できる。As described above, the vertical polishing of the workpiece 1 is performed as shown in FIG.
(2), polishing in the diagonal direction other than the vertical direction is shown in FIG.
It is shown by (4). Further, in each of the above states, the workpiece motor 470 rotates and the workpiece 17 rotates,
The entire inner surface shape from the vertical surface to the oblique surface is polished. In this apparatus, if the interior angles T1 and T2 are set to 180 °, even horizontal surfaces can be polished.
【0124】なお上記実施形態では連動機構にギヤ機構
を用いているが、ギヤ以外にリンク、ベルト、ワイヤー
等の連動機構を用いてもよい。Although the gear mechanism is used as the interlocking mechanism in the above embodiment, a link mechanism such as a link, a belt or a wire may be used instead of the gear.
【0125】図8は本発明の第6の実施形態における研
磨装置を示す。この研磨装置は、研磨屑の排出運動機構
を有している。FIG. 8 shows a polishing apparatus according to the sixth embodiment of the present invention. This polishing apparatus has a mechanism for discharging polishing dust.
【0126】図8(1)はプランジャA510 of
f、プランジャB520 offの状態を示し、フレー
ム500に加工物1を取り付けた例である。FIG. 8A shows the plunger A510 of.
f, the state of the plunger B520 off is shown, and is an example in which the workpiece 1 is attached to the frame 500.
【0127】フレーム500にプランジャA510をネ
ジ511で取り付け、プランジャA510のアーマチュ
ア515とプランジャB520をネジ521で締結す
る。The plunger A 510 is attached to the frame 500 with the screw 511, and the armature 515 of the plunger A 510 and the plunger B 520 are fastened with the screw 521.
【0128】フレーム500の軸501にプランジャB
520の左右方向に細長く延びるスリット522を挿入
し、プランジャA510にアーマチュア515を挿入す
る。プランジャB520はバネ518により右方向へ移
動し、砥石17も右方向に移動し、加工物1の加工面5
50に突き当たる。The plunger B is attached to the shaft 501 of the frame 500.
A slit 522 elongated in the left-right direction of 520 is inserted, and an armature 515 is inserted into the plunger A510. The plunger B 520 is moved to the right by the spring 518, the grindstone 17 is also moved to the right, and the work surface 5 of the workpiece 1 is moved.
Hit 50.
【0129】図8(1)において、プランジャA510
に電流を流すと、アーマチュア515とプランジャB5
20はバネ518のバネ力に逆らって左方向へ移動し、
電流を遮断するとバネ518のバネ力により右方向へ移
動する。In FIG. 8 (1), the plunger A510
When an electric current is applied to the armature 515 and the plunger B5
20 moves to the left against the spring force of the spring 518,
When the current is cut off, the spring force of the spring 518 causes the spring 518 to move to the right.
【0130】図8(1)において、プランジャB520
のアーマチュア525はバネ528のバネ力により下方
に押され、フレームのストッパ503に突き当たってい
る。プランジャB520のアーマチュア525に砥石保
持部530が結合されている。In FIG. 8A, the plunger B520
The armature 525 is pushed downward by the spring force of the spring 528 and abuts on the stopper 503 of the frame. The whetstone holding portion 530 is coupled to the armature 525 of the plunger B520.
【0131】図8(2)において、プランジャB520
に電流を流すとバネ528のバネ力に逆らって、アーマ
チュア525と砥石保持部530と砥石17が上方に移
動する。電流を遮断するとバネ528のバネ力によりア
ーマチュアB525、砥石保持部530、砥石17は下
方に移動する。In FIG. 8 (2), the plunger B520
When a current is applied to the armature 525, the armature 525, the grindstone holding portion 530, and the grindstone 17 move upward against the spring force of the spring 528. When the current is cut off, the armature B 525, the grindstone holding portion 530, and the grindstone 17 are moved downward by the spring force of the spring 528.
【0132】ここでプランジャB520、アーマチュア
525、バネ528及び砥石保持部530が砥石17を
加工面の接線方向に往復運動させる第一の往復運動部と
して機能し、プランジャA510、アーマチュア515
及びバネ518が、該第一の往復運動部を加工面と交差
する方向に往復運動させる第二の往復運動部として機能
する。Here, the plunger B 520, the armature 525, the spring 528 and the grindstone holding portion 530 function as a first reciprocating part that reciprocates the grindstone 17 in the tangential direction of the machining surface, and the plunger A 510 and the armature 515.
The spring 518 functions as a second reciprocating part that reciprocates the first reciprocating part in a direction intersecting the machining surface.
【0133】図8(1)〜(4)はプランジャA、Bが
通電onあるいは無通電offの状態を示した物であ
り、以下の表に状態を示す。FIGS. 8 (1) to 8 (4) show the state in which the plungers A and B are energized or de-energized, and the states are shown in the table below.
【0134】[0134]
【表1】 【table 1】
【0135】このようにプランジャA、Bを動作させる
と、砥石17の往復運動の行きの際に、砥石17から加
工物1の加工面550に研磨圧力を与え、往復運動の帰
りの際に、加工物1の加工面550より砥石1を離間さ
せることができる。By operating the plungers A and B in this manner, when the reciprocating motion of the grindstone 17 is performed, a polishing pressure is applied from the grindstone 17 to the machined surface 550 of the workpiece 1, and when the reciprocating motion is returned, The grindstone 1 can be separated from the processed surface 550 of the workpiece 1.
【0136】砥石保持部530と砥石1の動きは往路と
復路が異なり、一方向の動作のみが研磨に寄与するの
で、研磨屑の排出が行われる。なお、往路と復路とで砥
石1の軌跡を異ならせなくても、復路の際に砥石17か
ら加工物1の加工面550に与える研磨圧力を減ずるこ
とで研磨屑を排出してもよい。The movements of the grindstone holding portion 530 and the grindstone 1 are different in the forward path and the backward path, and only the operation in one direction contributes to the polishing, so that the polishing dust is discharged. It should be noted that even if the trajectories of the grindstones 1 are not different between the forward path and the return path, the polishing debris may be discharged by reducing the polishing pressure applied from the grindstone 17 to the processing surface 550 of the workpiece 1 during the return path.
【図1】本発明の第1の実施形態における研磨装置を示
す。FIG. 1 shows a polishing apparatus according to a first embodiment of the present invention.
【図2】本発明の第2の実施形態における研磨装置を示
す。FIG. 2 shows a polishing apparatus according to a second embodiment of the present invention.
【図3】本発明の第3の実施形態における研磨装置を示
す平面図。FIG. 3 is a plan view showing a polishing device according to a third embodiment of the present invention.
【図4】本発明の第3の実施形態における研磨装置を示
す側面図。FIG. 4 is a side view showing a polishing device according to a third embodiment of the present invention.
【図5】本発明の第4の実施形態における研磨装置を示
す平面図。FIG. 5 is a plan view showing a polishing device according to a fourth embodiment of the present invention.
【図6】本発明の第4の実施形態における研磨装置を示
す側面図。FIG. 6 is a side view showing a polishing device according to a fourth embodiment of the present invention.
【図7】本発明の第5の実施形態における研磨装置を示
す。FIG. 7 shows a polishing apparatus according to a fifth embodiment of the present invention.
【図8】本発明の第6の実施形態における研磨装置を示
す。FIG. 8 shows a polishing apparatus according to a sixth embodiment of the present invention.
1…加工物
2,550…加工面
6…砥石原料
7…砥石保持部
9…液体状態の砥石原料
10…磁場発生源(磁場供給部)
11…磁場発生源(磁場供給部)
12…磁場発生源(磁場供給部)
13…コイル(磁場供給部)
14…コイル(磁場供給部)
15…コイル(磁場供給部)
17…砥石
200…基台
201…支柱(支持手段、支持部)
205…第一アーム(支持手段、支持部)
210…第二アーム軸(支持手段、支持部)
211…第二アーム(支持手段、支持部)
215…引張りばね(付勢手段)
221,362…カム
230…砥石駆動部(往復運動手段、往復運動部)
260…取り付け台
271…ギヤA(回転運動手段、取り付け台回転部)
272…ギヤB(回転運動手段、取り付け台回転部)
273…ギヤC(回転運動手段、取り付け台回転部)
275…第二モータ(回転運動手段、取り付け台回転
部)
220…砥石保持部(追従手段)
300…基台
310…X動作モータ(X軸移動機構、付勢手段)
320…X動作台(X軸移動機構、付勢手段)
350…Y動作台(Y軸移動機構、付勢手段)
351…Y動作モータ(Y軸移動機構、付勢手段)
361…砥石駆動部(往復運動手段、往復運動部)
375…砥石保持部
400…フレーム
405…レバー1(第一のクランク)
406…扇形ギヤ1(第一のクランク)
410…加工物基台(第一の平行リンク)
425…レバー2(第二のクランク)
426…扇形ギヤ2(第二のクランク)
430…砥石台(第二の平行クランク)
436…ギヤ1(連動機構)
435…角度モータ(連動機構)
500…フレーム
510…プランジャA(第二の往復運動部)
515…アーマチュア(第二の往復運動部)
518…バネ(第二の往復運動部)
520…プランジャB(第一の往復運動部)
525…アーマチュア(第一の往復運動部)
528…バネ(第一の往復運動部)
530…砥石保持部(第一の往復運動部)DESCRIPTION OF SYMBOLS 1 ... Workpiece 2, 550 ... Processing surface 6 ... Grindstone raw material 7 ... Grindstone holding part 9 ... Liquid-state grindstone raw material 10 ... Magnetic field generation source (magnetic field supply section) 11 ... Magnetic field generation source (magnetic field supply section) 12 ... Magnetic field generation Source (magnetic field supply unit) 13 ... Coil (magnetic field supply unit) 14 ... Coil (magnetic field supply unit) 15 ... Coil (magnetic field supply unit) 17 ... Grinding stone 200 ... Base 201 ... Strut (supporting means, support unit) 205 ... One arm (supporting means, supporting part) 210 ... Second arm shaft (supporting means, supporting part) 211 ... Second arm (supporting means, supporting part) 215 ... Tension spring (biasing means) 221, 362 ... Cam 230 ... Grindstone drive unit (reciprocating motion unit, reciprocating motion unit) 260 ... Mounting base 271 ... Gear A (rotating motion unit, mounting base rotating unit) 272 ... Gear B (rotating motion unit, mounting base rotating unit) 273 ... Gear C (rotation) Means of exercise Attaching table rotating part) 275 ... Second motor (rotating motion means, mounting table rotating part) 220 ... Grinding stone holding part (following means) 300 ... Base 310 ... X operation motor (X axis moving mechanism, biasing means) 320 ... X operation table (X-axis moving mechanism, biasing means) 350 ... Y operation table (Y-axis moving mechanism, biasing means) 351 ... Y operation motor (Y-axis moving mechanism, biasing means) 361 ... Grindstone drive unit (reciprocating) Movement means, reciprocating part) 375 ... Grindstone holding part 400 ... Frame 405 ... Lever 1 (first crank) 406 ... Fan gear 1 (first crank) 410 ... Workpiece base (first parallel link) 425 ... Lever 2 (second crank) 426 ... Fan-shaped gear 2 (second crank) 430 ... Grindstone (second parallel crank) 436 ... Gear 1 (interlocking mechanism) 435 ... Angle motor (interlocking mechanism) 500 ... Frame 510 ... Ranger A (second reciprocating part) 515 ... Armature (second reciprocating part) 518 ... Spring (second reciprocating part) 520 ... Plunger B (first reciprocating part) 525 ... Armature (first) Reciprocating part) 528 ... Spring (first reciprocating part) 530 ... Whetstone holding part (first reciprocating part)
───────────────────────────────────────────────────── フロントページの続き (72)発明者 梅原 徳次 東京都八王子市別所2丁目46−3−102 (72)発明者 萩原 親作 山梨県甲府市羽黒町1241−5 (72)発明者 芝田 勲 山梨県中巨摩郡田富町布施1198−87 (72)発明者 文 炳俊 大韓民国慶尚南道昌原市盤林洞3−1現代 アパートメント107−302 Fターム(参考) 3C058 AA02 AA09 AA12 AA16 CB03 ─────────────────────────────────────────────────── ─── Continued front page (72) Inventor Tokuji Umehara Tokyo Hachioji City Bessho 2-chome 46-3-102 (72) Inventor Hagiwara 1241-5 Haguro-cho, Kofu City, Yamanashi Prefecture (72) Inventor Isao Shibata 1198-87 Fuse, Tatomi Town, Nakakoma District, Yamanashi Prefecture (72) Inventor Bun Shun 3-1 Hanglin-dong, Changwon-si, Gyeongsangnam-do, Republic of Korea Apartment 107-302 F term (reference) 3C058 AA02 AA09 AA12 AA16 CB03
Claims (21)
液体状の砥石原料を、固化若しくはゲル化させた砥石を
利用して加工物を研磨する研磨装置であって、 液体状の前記砥石原料に磁場を与える磁場供給部が設け
られ、 該磁場供給部は、液体状の前記砥石原料に対して互いに
異なる複数の方向から磁場を与えて砥粒の分散を行うこ
とを特徴とする研磨装置。1. A polishing apparatus for polishing a work by using a grindstone in which a liquid grindstone raw material containing a magnetic material charged in a space of the work is solidified or gelled. A magnetic field supply unit for applying a magnetic field to the grindstone raw material is provided, and the magnetic field supply unit applies magnetic fields to the liquid grindstone raw material from a plurality of different directions to disperse the abrasive grains. Polishing equipment.
て互いに直交するX,Y,Z方向から磁場を与えること
を特徴とする請求項1に記載の研磨装置。2. The polishing apparatus according to claim 1, wherein the magnetic field supply unit applies a magnetic field to the grindstone raw material in X, Y, and Z directions orthogonal to each other.
なる砥石保持部が設けられることを特徴とする請求項1
又は2に記載の研磨装置。3. A grindstone holding portion for holding the grindstone and forming a part of a magnetic field circuit is provided.
Or the polishing apparatus according to 2.
を与えるための複数のコイルを有し、 該コイルには交流が流され、あるいは該コイルに流され
る電流がON−OFF制御され、あるいは該コイルに流
される電流が変化されることを特徴とする請求項1ない
し3いずれかに記載の研磨装置。4. The magnetic field supply unit has a plurality of coils for applying a magnetic field to the grindstone raw material, and an alternating current is passed through the coils, or an electric current passed through the coils is ON-OFF controlled, Alternatively, the polishing apparatus according to any one of claims 1 to 3, wherein an electric current applied to the coil is changed.
て加工物を研磨する研磨装置であって、 前記加工物と前記砥石との間の相対運動を制御する制御
部が設けられ、 該制御部は、前記加工物に対して前記砥石が相対運動可
能な第一の方向に前記加工物に対して前記砥石を相対運
動させることによって、前記加工物の第一面を研磨し、
その後、前記砥石の減耗によって生じた前記加工物の前
記第一面と前記砥石との隙間を利用して、前記第一の方
向と異なる第二の方向に前記加工物に対して前記砥石を
相対運動させることによって、前記加工物の第二面を研
磨することを特徴とする研磨装置。5. A polishing apparatus for polishing a workpiece using a grindstone loaded in the space of the workpiece, wherein a control unit for controlling relative motion between the workpiece and the grindstone is provided. The control unit polishes the first surface of the workpiece by moving the grindstone relative to the workpiece in a first direction in which the grindstone can move relative to the workpiece,
Then, using the gap between the first surface of the workpiece and the grindstone caused by wear of the grindstone, the grindstone relative to the workpiece in a second direction different from the first direction. A polishing apparatus for polishing the second surface of the workpiece by moving the workpiece.
よって生じた前記加工物の前記第二面と前記砥石との隙
間を利用して、前記第二の方向と異なる第三の方向に砥
石を相対運動させることによって、前記加工物の第三面
を研磨することを特徴とする請求項5に記載の研磨装
置。6. The grindstone in a third direction different from the second direction by utilizing a gap between the second surface of the workpiece and the grindstone caused by wear of the grindstone. The polishing apparatus according to claim 5, wherein the third surface of the workpiece is polished by relatively moving the workpiece.
付勢する付勢手段と、 前記砥石を前記加工物に対して前記加工面の接線方向に
相対的に往復運動させる往復運動手段と、 前記加工物又は前記砥石の一方を回転運動させる回転運
動手段と、 前記加工物又は前記砥石の一方の回転運動に追従して前
記加工物又は前記砥石の他方を回転運動させる追従手段
と、を備えることを特徴とする研磨装置。7. An urging means for urging the grindstone in a direction intersecting a machining surface of the workpiece, and a reciprocating means for relatively reciprocating the grindstone with respect to the workpiece in a tangential direction of the machining surface. And a rotary movement means for rotating one of the workpiece or the grindstone, and a follow-up means for rotating the other one of the workpiece or the grindstone by following the rotary movement of one of the workpiece or the grindstone, A polishing apparatus comprising:
の加工面に対して交差する方向に移動可能に支持する支
持手段とを備えることを特徴とする請求項7に記載の研
磨装置。8. The biasing means includes a spring, and the polishing device includes a supporting means for supporting the grindstone or the workpiece so as to be movable in a direction intersecting a processing surface of the workpiece. The polishing apparatus according to claim 7, wherein the polishing apparatus is a polishing apparatus.
付勢するための付勢手段と、 前記砥石を前記加工物に対して加工面の接線方向に相対
的に往復運動させる往復運動手段と、を備え、 前記付勢手段は、X方向に前記砥石又は前記加工物を移
動させるX軸移動機構と、該X軸に直交するY方向に前
記砥石又は前記加工物を移動させるY軸移動機構とを有
することを特徴とする研磨装置。9. An urging means for urging the grindstone in a direction intersecting a machining surface of the workpiece, and a reciprocating motion for relatively reciprocating the grindstone with respect to the workpiece in a tangential direction of the machining surface. And a biasing means for moving the grindstone or the workpiece in the X direction, and an Y-axis for moving the grindstone or the workpiece in the Y direction orthogonal to the X-axis. A polishing device having a moving mechanism.
アームの終端部、又はガントリー型ロボットの終端部に
取り付けられることを特徴とする請求項7ないし9いず
れかに記載の研磨装置。10. The polishing apparatus according to claim 7, wherein the reciprocating means is attached to a terminal end of a SCARA type robot arm or a terminal end of a gantry type robot.
して前記砥石を相対的に往復運動させるカムを有するこ
とを特徴とする請求項7ないし10いずれかに記載の研
磨装置。11. The polishing apparatus according to claim 7, wherein the reciprocating means has a cam that relatively reciprocates the grindstone with respect to the workpiece.
ンクで構成された第一のリンク装置と、 加工物が取り付けられ、4関節を持つリンクで構成され
た第二のリンク装置と、 前記第一のリンク装置と前記第二のリンク装置の動作を
関連させる連動機構と、を備えることを特徴とする研磨
装置。12. A first link device, to which a grindstone is attached, and which is composed of a link having four joints, and a second link device, to which a workpiece is attached, which is composed of a link having four joints, A polishing apparatus comprising: one link device and an interlocking mechanism that associates the operation of the second link device.
クランクの長さを変化させて、前記加工物と前記砥石の
相対運動を行うことを特徴とする請求項12に記載の研
磨装置。13. The polishing apparatus according to claim 12, wherein a relative motion between the workpiece and the grindstone is performed by changing a length of a crank that constitutes the first link device.
動することによって加工物を研磨する研磨装置であっ
て、 往復運動の行きの際に、前記砥石から前記加工物の加工
面に研磨圧力を与え、 往復運動の帰りの際に、前記砥石から前記加工物の加工
面に与える研磨圧力を減じ、あるいは前記加工物の加工
面より前記砥石を離間させることを特徴とする研磨装
置。14. A polishing apparatus for polishing a workpiece by reciprocally moving a grindstone with respect to the workpiece, wherein the grindstone grinds a processed surface of the workpiece when the reciprocating movement goes. A polishing apparatus for applying a pressure to reduce the polishing pressure applied from the grindstone to the processed surface of the workpiece when returning from the reciprocating motion, or to separate the grindstone from the processed surface of the workpiece.
レームに取り付けられ、前記砥石を加工面の接線方向に
往復運動させる第一の往復運動部と、 該第一の往復運動部を加工面と交差する方向に往復運動
させる第二の往復運動部とを備えることを特徴とする請
求項14に記載の研磨装置。15. The polishing apparatus includes a frame to which the workpiece is attached, and a frame that is movably attached to the frame in a direction intersecting a processing surface of the workpiece, and reciprocates the grindstone in a tangential direction of the processing surface. The polishing apparatus according to claim 14, further comprising: a first reciprocating part for moving the first reciprocating part, and a second reciprocating part for reciprocating the first reciprocating part in a direction intersecting a processing surface.
された磁性体を含む液体状の前記砥石原料を、固化若し
くはゲル化させた砥石を利用して加工物を研磨し、 前記研磨装置には、液体状の前記砥石原料に対して互い
に異なる複数の方向から磁場を与えて砥粒の分散を行う
磁場供給部が設けられることを特徴とする請求項5ない
し15のいずれかに記載の研磨装置。16. The polishing apparatus polishes a workpiece using a grindstone obtained by solidifying or gelling the liquid grindstone raw material containing a magnetic material charged in a space of the workpiece, 16. The apparatus is provided with a magnetic field supply unit that applies magnetic fields to the liquid grindstone raw material from a plurality of different directions to disperse the abrasive grains. Polishing equipment.
料に対して互いに直交するX,Y,Z方向から磁場を与
えて砥粒の分散を行うことを特徴とする請求項16に記
載の研磨装置。17. The polishing apparatus disperses abrasive grains by applying magnetic fields to the liquid grinding stone raw material in X, Y, and Z directions orthogonal to each other. Polishing equipment.
む液体状の前記砥石原料を、固化若しくはゲル化させた
砥石を利用して加工物を研磨する研磨装置であって、 基台と、 前記基台に回転可能に設けられ、前記加工物が取り付け
られる取り付け台と、 前記取り付け台を回転させる取り付け台回転部と、 前記基台に設けられ、前記砥石を水平方向に移動可能に
支持する支持部と、 前記砥石を前記加工物の加工面に付勢するばねと、 前記砥石を前記加工物に対して加工面の接線方向に相対
的に往復運動させる往復運動部と、 該往復運動部に対して回転自在に設けられ、前記砥石を
保持する砥石保持部と、 液体状の前記砥石原料に対して磁場を与える磁場供給部
と、を備えることを特徴とする研磨装置。18. A polishing apparatus for polishing a work by using a grindstone obtained by solidifying or gelling the liquid grindstone raw material containing a magnetic material charged in a space of the work, the base being a base. And a mounting base rotatably provided on the base, on which the workpiece is mounted, a mounting base rotating unit that rotates the mounting base, and the mounting base provided on the base so that the grindstone can be moved in the horizontal direction. A support portion that supports the spring, a spring that biases the grindstone toward the machining surface of the workpiece, a reciprocating portion that relatively reciprocates the grindstone in the tangential direction of the machining surface with respect to the workpiece, A grinding apparatus comprising: a grindstone holding section that is rotatably provided with respect to a moving section and holds the grindstone; and a magnetic field supply section that applies a magnetic field to the liquid grindstone raw material.
む液体状の前記砥石原料を、固化若しくはゲル化させた
砥石を利用して加工物を研磨する研磨装置であって、 基台と、 前記基台に設けられ、前記加工物が取り付けられる取り
付け台と、 前記基台に設けられ、前記砥石をX方向及びY方向に移
動させると共に前記砥石を前記加工物の加工面に対して
交差する方向に付勢するX軸移動機構及びY軸移動機構
と、 前記X軸移動機構及びY軸移動機構に設けられ、前記砥
石を前記加工物に対して加工面の接線方向に相対的に往
復運動させる往復運動部と、 液体状の前記砥石原料に対して磁場を与える磁場供給部
と、を備えることを特徴とする研磨装置。19. A polishing apparatus for polishing a work by using a grindstone obtained by solidifying or gelating the liquid-state grindstone raw material containing a magnetic material charged in a space of the work, the base being a base. A mounting base provided on the base to which the workpiece is mounted; and a mounting base provided on the base to move the grindstone in the X direction and the Y direction and to move the grindstone with respect to the processed surface of the workpiece. An X-axis moving mechanism and a Y-axis moving mechanism for urging in a direction intersecting with each other; A polishing apparatus comprising: a reciprocating unit that reciprocates; and a magnetic field supply unit that applies a magnetic field to the liquid grindstone raw material.
む液体状の前記砥石原料を、固化若しくはゲル化させた
砥石を利用して加工物を研磨する研磨装置であって、 フレームと、 4関節を持つリンクで構成され、一対の第一のクランク
及び前記フレームと平行に運動する第一の平行リンクを
有する第一の平行クランク機構と、 4関節を持つリンクで構成され、一対の第二のクランク
及び前記フレームと平行に運動する第二の平行リンクを
有する第二の平行クランク機構と、 前記第一の平行リンクと前記第二の平行リンクとがその
相対位置を変化することなく運動するように、前記第一
のクランクと前記第二のクランクの動作を関連させる連
動機構とを備え、 前記砥石が前記第一の平行リンクに取り付けられ、 前記加工物が前記第二の平行リンクに取り付けられるこ
とを特徴とする研磨装置。20. A polishing apparatus for polishing a workpiece using a grindstone obtained by solidifying or gelling the liquid grindstone raw material containing a magnetic material, which is charged in the space of the workpiece, and comprising a frame and a frame. A first parallel crank mechanism having a pair of first cranks and a first parallel link that moves in parallel with the frame, and a pair of links having four joints, A second parallel crank mechanism having a second crank and a second parallel link moving in parallel with the frame, and the relative positions of the first parallel link and the second parallel link without changing their relative positions. An interlocking mechanism that associates movements of the first crank and the second crank so as to move, the grindstone is attached to the first parallel link, and the workpiece is the second parallel link. The polishing device is characterized by being attached to a link.
む液体状の前記砥石原料を、固化若しくはゲル化させた
砥石を利用して加工物を研磨する研磨装置であって、 フレームと、 該フレームに取り付けられる加工物と、 該フレームに加工物の加工面と交差する方向に移動可能
に取り付けられ、砥石を加工面の接線方向に往復運動さ
せる第一の往復運動部と、 該第一の往復運動部を加工面と交差する方向に往復運動
させる第二の往復運動部とを備え、 往復運動の行きの際に、前記砥石から前記加工物の加工
面に研磨圧力を与え、 往復運動の帰りの際に、前記砥石から前記加工物の加工
面に与える研磨圧力を減じ、あるいは前記加工物の加工
面より前記砥石を離間させることを特徴とする研磨装
置。21. A polishing apparatus for polishing a workpiece using a grindstone obtained by solidifying or gelling the liquid grindstone raw material containing a magnetic material, which is charged in the space of the workpiece, and comprising a frame and A workpiece to be attached to the frame, a first reciprocating portion movably attached to the frame in a direction intersecting a machining surface of the workpiece, and reciprocating a grindstone in a tangential direction of the machining surface; A second reciprocating part that reciprocates one reciprocating part in a direction intersecting the machining surface, and when the reciprocating motion goes, applying a polishing pressure from the grindstone to the machining surface of the workpiece, A polishing apparatus for reducing the polishing pressure applied from the grindstone to the processed surface of the workpiece or returning the grindstone from the processed surface of the workpiece when returning from the movement.
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2001281072A JP2003089052A (en) | 2001-09-17 | 2001-09-17 | Grinding device |
KR1020020021645A KR20030024549A (en) | 2001-09-17 | 2002-04-19 | Apparatus of polishing |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2001281072A JP2003089052A (en) | 2001-09-17 | 2001-09-17 | Grinding device |
Publications (1)
Publication Number | Publication Date |
---|---|
JP2003089052A true JP2003089052A (en) | 2003-03-25 |
Family
ID=19104964
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2001281072A Pending JP2003089052A (en) | 2001-09-17 | 2001-09-17 | Grinding device |
Country Status (2)
Country | Link |
---|---|
JP (1) | JP2003089052A (en) |
KR (1) | KR20030024549A (en) |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58192737A (en) * | 1982-04-28 | 1983-11-10 | Inoue Japax Res Inc | Method of polishing machining |
US5125191A (en) * | 1982-09-08 | 1992-06-30 | Extrude Hone Corporation | Abrasive flow machining with an in situ viscous plastic medium |
JPS5947166A (en) * | 1982-09-10 | 1984-03-16 | Tokiwa Seiki Kogyo Kk | Working tool for superfine cutting and manufacture thereof |
JPS63272457A (en) * | 1987-05-01 | 1988-11-09 | Seibu Electric & Mach Co Ltd | Polishing method for workpiece |
-
2001
- 2001-09-17 JP JP2001281072A patent/JP2003089052A/en active Pending
-
2002
- 2002-04-19 KR KR1020020021645A patent/KR20030024549A/en active IP Right Grant
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KR20030024549A (en) | 2003-03-26 |
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