JP2003078065A - Substrate for packaging semiconductor device and package for housing optical semiconductor device - Google Patents
Substrate for packaging semiconductor device and package for housing optical semiconductor deviceInfo
- Publication number
- JP2003078065A JP2003078065A JP2001270208A JP2001270208A JP2003078065A JP 2003078065 A JP2003078065 A JP 2003078065A JP 2001270208 A JP2001270208 A JP 2001270208A JP 2001270208 A JP2001270208 A JP 2001270208A JP 2003078065 A JP2003078065 A JP 2003078065A
- Authority
- JP
- Japan
- Prior art keywords
- electrode pad
- semiconductor element
- conductor
- inner layer
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- Semiconductor Lasers (AREA)
- Light Receiving Elements (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は、LSIやIC等の
半導体素子を搭載するための半導体素子搭載用基板およ
びそれを用いた光半導体素子収納用パッケージに関す
る。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a semiconductor element mounting substrate for mounting a semiconductor element such as an LSI or an IC and an optical semiconductor element housing package using the same.
【0002】[0002]
【従来の技術】従来の半導体レーザ(LD)や発光ダイ
オード(LED),フォトダイオード(PD)等の光半
導体素子を収納する光半導体素子収納用パッケージ(以
下、光半導体パッケージという)は、一般的に鉄(F
e)−ニッケル(Ni)−コバルト(Co)合金や銅
(Cu)−タングステン(W)合金等の金属からなる。
この光半導体パッケージは、上面の中央部に光半導体素
子が載置される載置部を有する基体と、Fe−Ni−C
o合金等からなり、載置部を囲繞するように基体上面の
周辺部に銀(Ag)ロウ等のロウ材を介して接合された
枠体とから主に構成される。この枠体は、その側部に設
けられた貫通孔に、アルミナセラミックス等からなり外
部接続用のリード端子を有するセラミック端子が嵌着さ
れる。2. Description of the Related Art A conventional package for storing an optical semiconductor element (hereinafter referred to as an optical semiconductor package) for storing an optical semiconductor element such as a semiconductor laser (LD), a light emitting diode (LED) or a photodiode (PD) is generally used. To iron (F
e) -Nickel (Ni) -Cobalt (Co) alloy and copper (Cu) -Tungsten (W) alloy.
This optical semiconductor package includes a base body having a mounting portion on which an optical semiconductor element is mounted at the center of the upper surface, and Fe-Ni-C.
It is made of an o alloy or the like, and is mainly composed of a frame body which is joined to the peripheral portion of the upper surface of the base body through a brazing material such as silver (Ag) brazing so as to surround the mounting portion. In this frame, a ceramic terminal made of alumina ceramics or the like and having a lead terminal for external connection is fitted into a through hole provided in a side portion thereof.
【0003】また、枠体の他の側部に形成された貫通孔
には、Fe−Ni−Co合金等からなる筒状の光ファイ
バ固定部材(以下、固定部材という)が嵌着される。こ
の固定部材は、枠体の側部の貫通孔にAg−Cuロウ材
等でロウ付けして接合される。また、固定部材の内側に
は、光半導体素子と外部との光信号の授受を行う光ファ
イバおよび集光用の透光性部材、即ちレンズ部材が設置
される。A cylindrical optical fiber fixing member (hereinafter referred to as a fixing member) made of Fe-Ni-Co alloy or the like is fitted in the through hole formed on the other side portion of the frame. This fixing member is brazed and joined to the through hole in the side portion of the frame body with Ag-Cu brazing material or the like. Further, inside the fixing member, an optical fiber for exchanging optical signals between the optical semiconductor element and the outside and a transparent member for condensing, that is, a lens member are installed.
【0004】さらに、枠体の上面に光半導体素子を気密
に封止する蓋体が接合される。この蓋体は、Fe−Ni
−Co合金等からなるシールリングを介して枠体上面に
Ag−Cuロウ材等によるシーム溶接で接合される。Further, a lid for hermetically sealing the optical semiconductor element is joined to the upper surface of the frame. This lid is made of Fe-Ni
It is joined to the upper surface of the frame body by a seam welding with Ag-Cu brazing material or the like through a seal ring made of -Co alloy or the like.
【0005】そして、このような光半導体パッケージを
用いた光半導体装置は、例えば、外部の駆動回路等から
供給される駆動信号によって光半導体素子を光励起さ
せ、光励起されたレーザ光等の光を透光性部材を通して
光ファイバに授受させるとともに、その光ファイバによ
り光信号を伝送させることによって大容量の情報を伝送
する光通信用の光電変換装置として機能する。In an optical semiconductor device using such an optical semiconductor package, for example, an optical semiconductor element is optically excited by a drive signal supplied from an external drive circuit or the like, and optically excited laser light or the like is transmitted. It functions as a photoelectric conversion device for optical communication that transmits and receives a large amount of information by transmitting and receiving an optical fiber through the optical member and transmitting an optical signal through the optical fiber.
【0006】近年、光通信網の拡大に伴い、光通信シス
テム、光通信機器および上記光半導体装置等の高速化が
要求されている。また、上記光半導体パッケージの外部
インターフェイス基板等の外部電気回路基板への接合、
実装が、自動化ライン上で行われるようになってきてお
り、このような自動実装に対応できるとともに、光信号
の高速伝送が可能な光半導体パッケージが求められてい
る。In recent years, with the expansion of optical communication networks, there has been a demand for speeding up of optical communication systems, optical communication devices, the above optical semiconductor devices, and the like. Also, the optical semiconductor package is bonded to an external electric circuit board such as an external interface board,
Mounting has come to be performed on an automated line, and there is a demand for an optical semiconductor package capable of supporting such automatic mounting and capable of high-speed transmission of optical signals.
【0007】そして、上記従来の光半導体パッケージを
外部電気回路基板に実装する場合、光半導体パッケージ
下面に接続したリード端子や半田等を介して接続し実装
する必要があり、このリード端子や半田等を接合するた
めの電極パッドを光半導体パッケージ下面に設ける必要
がある。そのために、光半導体パッケージの基体を多層
構成のセラミック基板とし、上記電極パッドは、例えば
タングステンの金属ペーストを塗布印刷した後、同時焼
成によりセラミック基板表面に強固に形成されていた。When the conventional optical semiconductor package is mounted on an external electric circuit board, it is necessary to connect and mount the lead terminals and solder connected to the lower surface of the optical semiconductor package. It is necessary to provide an electrode pad on the lower surface of the optical semiconductor package for joining the two. For this reason, the substrate of the optical semiconductor package is a multilayer ceramic substrate, and the electrode pads are firmly formed on the surface of the ceramic substrate by co-firing after applying and printing a metal paste of, for example, tungsten.
【0008】しかし、この電極パッドと光半導体パッケ
ージの基体内の内層接地導体との間で電気的容量(キャ
パシタンス)が発生し、これが電極パッドと光半導体素
子とを接続する貫通導体の特性インピーダンスに影響を
与え、駆動信号である1GHz以上の高周波信号を伝送
損失を小さくして送受信することが困難であるという問
題点があった。However, an electric capacitance (capacitance) is generated between this electrode pad and the inner-layer ground conductor in the base of the optical semiconductor package, and this causes a characteristic impedance of the through conductor connecting the electrode pad and the optical semiconductor element. However, there is a problem in that it is difficult to transmit and receive a high frequency signal of 1 GHz or more, which is a driving signal, with a small transmission loss.
【0009】そこで、この問題点を解決する手段とし
て、本出願人は、図3に示すように複数の絶縁層109
a,109b,109cを積層してなる絶縁基板109
の一方の主面に半導体素子(図示せず)を搭載し、他方
の主面に外部接続用の略円形の電極パッド113を設
け、電極パッド113および半導体素子を接続する貫通
導体112と、貫通導体112を取り囲むように略円形
の開口が形成された内層接地導体110,111とを配
設した絶縁基板109を用い、上記主面に平行な方向に
おける電極パッド113と内層接地導体110,111
との間隔dと、電極パッド113の直径wとが0<d≦
wを満足するように構成した半導体素子搭載用基板10
1を提案した(特開2001−160598参照)。Therefore, as a means for solving this problem, the applicant of the present invention, as shown in FIG.
Insulating substrate 109 formed by stacking a, 109b, and 109c
A semiconductor element (not shown) is mounted on one main surface, a substantially circular electrode pad 113 for external connection is provided on the other main surface, and a penetrating conductor 112 connecting the electrode pad 113 and the semiconductor element, and a penetrating conductor 112. Using the insulating substrate 109 in which the inner layer ground conductors 110 and 111 having the substantially circular opening formed so as to surround the conductor 112 are arranged, the electrode pad 113 and the inner layer ground conductors 110 and 111 in the direction parallel to the main surface are used.
And the distance d between the electrode pad 113 and the electrode pad 113 is 0 <d ≦
Semiconductor element mounting substrate 10 configured to satisfy w
1 was proposed (see Japanese Patent Laid-Open No. 2001-160598).
【0010】この半導体素子搭載用基板101によれ
ば、絶縁基板109内の内層接地導体110,111と
電極パッド113との間で不要なキャパシタンスが発生
し、これが電極パッド113と半導体素子とを接続する
貫通導体112の特性インピーダンスを所定値(50
Ω)から変化するのを防ぎ、その結果、1GHz以上の
高周波信号からなる駆動信号の伝送損失を小さくして送
受信することが可能となる。According to the semiconductor element mounting substrate 101, an unnecessary capacitance is generated between the inner layer ground conductors 110 and 111 in the insulating substrate 109 and the electrode pad 113, which connects the electrode pad 113 and the semiconductor element. The characteristic impedance of the through conductor 112 is set to a predetermined value (50
Ω), and as a result, it is possible to reduce the transmission loss of the drive signal composed of a high frequency signal of 1 GHz or more and to transmit and receive.
【0011】[0011]
【発明が解決しようとする課題】しかしながら、最近の
インターネットを利用した光伝送装置への高速化の要求
はさらに高まり、数10GHz帯域での高速化が切望さ
れているが、上記従来の半導体素子搭載用基板101で
は、数10GHz以上の高い周波数帯域においては、電
極パッド113と半導体素子とを接続する貫通導体11
2の導通抵抗およびインダクタンス成分により接地電位
が不安定になってしまう。その結果、周波数が高くなる
に従って特性インピーダンスの不連続が生じて入力信号
の反射が増大し、とりわけ20GHz以上での高周波信
号の伝送特性が劣化するという問題点があった。However, recent demands for speeding up of optical transmission devices using the Internet have further increased, and there is a strong demand for speeding up in several tens of GHz band. In the substrate 101 for use, the through conductor 11 that connects the electrode pad 113 and the semiconductor element in the high frequency band of several tens GHz or more.
The ground resistance becomes unstable due to the conduction resistance and the inductance component of 2. As a result, there has been a problem that discontinuity of the characteristic impedance occurs as the frequency increases, reflection of the input signal increases, and particularly, the transmission characteristic of the high frequency signal at 20 GHz or higher deteriorates.
【0012】従って、本発明は上記問題点に鑑みて完成
されたものであり、その目的は、外部電気回路に実装し
易い接続構造を有するとともに、20GHz以上の高周
波信号を伝送損失を小さくして効率良く伝達可能な半導
体素子搭載用基板およびそれを用いた光半導体パッケー
ジを提供することにある。Therefore, the present invention has been completed in view of the above problems, and an object thereof is to have a connection structure which can be easily mounted on an external electric circuit and to reduce a transmission loss of a high frequency signal of 20 GHz or more. It is an object to provide a semiconductor element mounting substrate capable of efficient transmission and an optical semiconductor package using the same.
【0013】[0013]
【課題を解決するための手段】本発明の半導体素子搭載
用基板は、複数の絶縁層を積層して成る絶縁基板の一方
の主面に半導体素子を載置する載置部が形成され、他方
の主面に外部接続用の略円形の電極パッドが設けられ、
かつ前記絶縁基板の内部に前記半導体素子と前記電極パ
ッドとを接続する貫通導体および該貫通導体を取り囲む
ように略円形の開口が形成された内層接地導体が設けら
れた半導体素子搭載用基板であって、前記主面に平行な
方向における前記電極パッドと前記内層接地導体との間
隔をd、前記電極パッドの直径をwとしたとき0<d≦
wであり、前記内層接地導体は前記絶縁層を介して複数
積層されているとともに前記内層接地導体間の前記絶縁
層の厚さが前記貫通導体により伝送される高周波信号の
波長の4分の1以下であることを特徴とする。A semiconductor element mounting substrate of the present invention has a mounting portion on which a semiconductor element is mounted on one main surface of an insulating substrate formed by laminating a plurality of insulating layers, and the other. A substantially circular electrode pad for external connection is provided on the main surface of
And a semiconductor element mounting substrate provided with a through conductor connecting the semiconductor element and the electrode pad inside the insulating substrate and an inner layer ground conductor having a substantially circular opening formed so as to surround the through conductor. When the distance between the electrode pad and the inner layer ground conductor in the direction parallel to the main surface is d and the diameter of the electrode pad is w, 0 <d ≦
w, and the thickness of the insulating layer between the inner layer ground conductors is one-fourth of the wavelength of the high frequency signal transmitted by the penetrating conductor. It is characterized by the following.
【0014】本発明の半導体素子搭載用基板は、電極パ
ッドと内層接地導体との間隔dと、電極パッドの直径w
とが0<d≦wの関係となっており、かつ内層接地導体
間の絶縁層の厚さを貫通導体を伝送する高周波信号の波
長の4分の1以下とすることにより、20GHz以上の
高周波帯域において、電極パッドと貫通導体および貫通
導体同士を接続する接続パッド等から構成される信号線
路において、各絶縁層間で内層接地導体や電極パッドと
貫通導体との距離によって電極パッドと貫通導体との間
で発生する電磁波の共振および放射現象を有効に抑制す
ることができる。そのため、特性インピーダンスを所定
値(50Ω)から変化するのを防ぐことができ、その結
果、高周波信号からなる駆動信号を伝送損失を小さくし
て送受信することが可能となる。In the semiconductor element mounting substrate of the present invention, the distance d between the electrode pad and the inner layer ground conductor, and the diameter w of the electrode pad.
And 0 <d ≦ w, and the thickness of the insulating layer between the inner-layer ground conductors is set to 1/4 or less of the wavelength of the high-frequency signal transmitted through the through conductor, so that a high frequency of 20 GHz or higher is obtained. In a band, in a signal line composed of an electrode pad, a through conductor, and a connection pad that connects the through conductors to each other, in each insulating layer, the inner layer ground conductor or the distance between the electrode pad and the through conductor causes It is possible to effectively suppress the resonance and radiation phenomenon of electromagnetic waves generated between the two. Therefore, it is possible to prevent the characteristic impedance from changing from the predetermined value (50Ω), and as a result, it becomes possible to transmit and receive the drive signal composed of the high frequency signal with reduced transmission loss.
【0015】本発明の光半導体パッケージは、前記載置
部が光半導体素子用として形成された本発明の半導体素
子搭載用基板と、前記一方の主面に前記載置部を囲繞す
るように取着され、側部に貫通孔が形成された枠体と、
前記貫通孔に嵌着された筒状の光ファイバ固定部材と、
該光ファイバ固定部材の内側に設置された透光性部材と
を具備したことを特徴とする。In the optical semiconductor package of the present invention, the semiconductor element mounting substrate of the present invention, in which the mounting portion is formed for an optical semiconductor element, and the mounting surface are surrounded by the one main surface. And a frame body having a through hole formed on its side,
A tubular optical fiber fixing member fitted in the through hole,
And a translucent member installed inside the optical fiber fixing member.
【0016】本発明の光半導体パッケージは、上記の構
成により、20GHz以上の高周波信号を駆動信号とし
て用いるとともに、自動化ラインで外部電気回路に実装
し易い接続構造となるように電極パッドが光半導体パッ
ケージ下面に設けられた光半導体装置が構成でき、また
20GHz以上の高周波信号を伝送損失を小さくして伝
達可能なものとなる。The optical semiconductor package of the present invention has the above structure and uses a high frequency signal of 20 GHz or more as a drive signal, and has electrode pads with an optical semiconductor package so that the electrode pad has a connection structure that can be easily mounted on an external electric circuit in an automation line. An optical semiconductor device provided on the lower surface can be configured, and a high frequency signal of 20 GHz or higher can be transmitted with reduced transmission loss.
【0017】[0017]
【発明の実施の形態】本発明の半導体素子搭載用基板
(以下、半導体素子基板という)および光半導体パッケ
ージについて以下に詳細に説明する。そして、図1は、
本発明の半導体素子基板を基体として用いた光半導体パ
ッケージについて実施の形態の一例を示す断面図であ
り、図2は、図1の光半導体パッケージを構成する半導
体素子基板の要部を拡大した部分拡大断面図である。DETAILED DESCRIPTION OF THE INVENTION A semiconductor element mounting substrate (hereinafter referred to as a semiconductor element substrate) and an optical semiconductor package of the present invention will be described in detail below. And in FIG.
FIG. 2 is a cross-sectional view showing an example of an embodiment of an optical semiconductor package using the semiconductor element substrate of the present invention as a base, and FIG. 2 is an enlarged view of a main part of the semiconductor element substrate forming the optical semiconductor package of FIG. It is an expanded sectional view.
【0018】図1および図2において、1は本発明の半
導体素子基板からなる基体、2は枠体、20は蓋体であ
り、3は、基体1および枠体2から主に構成された光半
導体パッケージである。これらの基体1と枠体2と蓋体
20とで、内部に光半導体素子4とLSI,IC等から
なる駆動素子21が収納される容器が基本的に構成され
る。なお、枠体2の上面に蓋体20を接合することによ
り、光半導体装置が構成される。In FIGS. 1 and 2, 1 is a base made of the semiconductor element substrate of the present invention, 2 is a frame, 20 is a lid, and 3 is a light mainly composed of the base 1 and the frame 2. It is a semiconductor package. The base body 1, the frame body 2 and the lid body 20 basically constitute a container in which the optical semiconductor element 4 and the drive element 21 including an LSI, an IC and the like are housed. An optical semiconductor device is formed by joining the lid 20 to the upper surface of the frame 2.
【0019】本発明の基体1は、絶縁基板の一方の主面
に半導体素子4を載置する載置部が形成されており、側
部に貫通孔2aが設けられた枠体2が載置部5を囲繞す
るようにして基体1の上面に接合される。貫通孔2aに
は筒状の光ファイバ固定部材(以下、固定部材という)
8が嵌着されており、この固定部材8は、光半導体素子
4と外部との光信号の授受を行なう光ファイバ6および
集光用の透光性部材7(レンズ部材)が、内側に挿入さ
れ固定されている。更に、枠体2の上面には、光半導体
素子4を気密に封止する蓋体20が接合される。In the base 1 of the present invention, a mounting portion for mounting the semiconductor element 4 is formed on one main surface of the insulating substrate, and the frame body 2 having the through holes 2a on its side is mounted. It is bonded to the upper surface of the base 1 so as to surround the portion 5. A cylindrical optical fiber fixing member (hereinafter referred to as a fixing member) is provided in the through hole 2a.
In this fixing member 8, an optical fiber 6 for transmitting and receiving an optical signal between the optical semiconductor element 4 and the outside and a transparent member 7 (lens member) for condensing are inserted inside. Has been fixed. Further, a lid 20 that hermetically seals the optical semiconductor element 4 is joined to the upper surface of the frame 2.
【0020】また、本発明の半導体素子基板からなる基
体1は、図2に示すように、複数の絶縁層9a,9b,
9cを積層して成る絶縁基板9の一方の主面に半導体素
子4を載置する載置部が形成され、他方の主面に外部接
続用の略円形の電極パッド13が設けられ、かつ絶縁基
板9の内部に半導体素子4と電極パッド13とを接続す
る貫通導体12および貫通導体12を取り囲むように略
円形の開口が形成された内層接地導体10,10’,1
1,11’が設けられている。また、図1のように、電
極パッド13は外部電気回路基板22の電極パッド27
に導体バンプ23を介して電気的に接続される。The base 1 made of the semiconductor element substrate of the present invention has a plurality of insulating layers 9a, 9b, as shown in FIG.
A mounting portion for mounting the semiconductor element 4 is formed on one main surface of an insulating substrate 9 formed by stacking 9c, and a substantially circular electrode pad 13 for external connection is provided on the other main surface. Inner layer ground conductors 10, 10 ', 1 in which a substantially circular opening is formed so as to surround the penetrating conductor 12 connecting the semiconductor element 4 and the electrode pad 13 inside the substrate 9 and the penetrating conductor 12.
1, 11 'are provided. In addition, as shown in FIG. 1, the electrode pad 13 is the electrode pad 27 of the external electric circuit board 22.
Is electrically connected via the conductor bump 23.
【0021】本発明では、図2に示すように、基体1の
主面に平行な方向における電極パッド13と内層接地導
体10,11との間隔および電極パッド13と内層接地
導体10’,11’との間隔をd、略円形の電極パッド
13の直径をwとしたとき、0<d≦wの関係を有す
る。即ち、内層接地導体10と内層接地導体11の間隔
および内層接地導体10’と内層接地導体11’の間隔
w1は、w<w1≦3wとなる。In the present invention, as shown in FIG. 2, the distance between the electrode pad 13 and the inner layer ground conductors 10 and 11 in the direction parallel to the main surface of the substrate 1 and the electrode pad 13 and the inner layer ground conductors 10 'and 11'. And d is the distance between the two electrodes and w is the diameter of the substantially circular electrode pad 13, the relationship 0 <d ≦ w is satisfied. That is, the distance between the inner layer ground conductor 10 and the inner layer ground conductor 11 and the distance w1 between the inner layer ground conductor 10 'and the inner layer ground conductor 11' are w <w1≤3w.
【0022】なお、内層接地導体10,11および内層
接地導体10’,11’は、貫通導体12を取り囲むよ
うに形成された略円形の開口を有している。また、図2
において、24は貫通導体(ビア導体)12の接続パッ
ド、25は高周波信号の信号パッドである。The inner layer ground conductors 10 and 11 and the inner layer ground conductors 10 ′ and 11 ′ have substantially circular openings formed so as to surround the through conductor 12. Also, FIG.
In the above, reference numeral 24 is a connection pad of the through conductor (via conductor) 12, and 25 is a signal pad for a high frequency signal.
【0023】上記間隔dが0以下、即ち基体1の厚さ方
向において電極パッド13と、内層接地導体10,11
および内層接地導体10’,11’とが重なる場合、電
極パッド13と内層接地導体10,11および内層接地
導体10’,11’との間に不要なキャパシタンスが発
生し、電極パッド13、貫通導体12、内層接地導体1
0,11および内層接地導体10’,11’による伝送
路の特性インピーダンスが所定値よりも低くなり、高周
波信号の伝達損失が増大する。The distance d is 0 or less, that is, in the thickness direction of the substrate 1, the electrode pad 13 and the inner layer ground conductors 10 and 11 are formed.
And the inner-layer ground conductors 10 ′ and 11 ′ overlap, an unnecessary capacitance is generated between the electrode pad 13 and the inner-layer ground conductors 10 and 11 and the inner-layer ground conductors 10 ′ and 11 ′, and the electrode pads 13 and the through conductors. 12, inner layer ground conductor 1
The characteristic impedance of the transmission line formed by 0, 11 and the inner-layer ground conductors 10 ', 11' becomes lower than a predetermined value, and the transmission loss of high frequency signals increases.
【0024】また、間隔dがwを超えると、上記特性イ
ンピーダンスが高くなり、同様に伝送損失が増大する。When the distance d exceeds w, the characteristic impedance increases, and the transmission loss also increases.
【0025】なお、本発明では、絶縁層を介して複数の
内層接地導体を設け、複数の内層接地導体について上記
構成とすることによって、不要なキャパシタンス成分を
有効に除去でき、20GHzを超える高周波帯域で伝送
損失を抑制するうえできわめて有効である。In the present invention, by providing a plurality of inner layer ground conductors through the insulating layer and having the above-mentioned configuration with respect to the plurality of inner layer ground conductors, unnecessary capacitance components can be effectively removed and a high frequency band exceeding 20 GHz can be obtained. Is extremely effective in suppressing transmission loss.
【0026】そして、本発明においては、図2に示すよ
うに、内層接地導体10,11とその直上の内層接地導
体層10’,11’との間の絶縁層9bの厚さ14、即
ち内層接地導体10,11と内層接地導体層10’,1
1’との間の間隔は、貫通導体12で伝送される高周波
信号の波長の4分の1以下である。従って、具体的な厚
さ14は、使用する高周波信号の周波数によって以下の
ようになる。例えば、20GHzの高周波信号の場合
1.2mm以下、30GHzの場合0.8mm以下、4
0GHzの場合0.6mm以下、50GHzの場合0.
5mm以下、60GHzの場合0.4mm以下である。In the present invention, as shown in FIG. 2, the thickness 14 of the insulating layer 9b between the inner-layer ground conductors 10 and 11 and the inner-layer ground conductor layers 10 'and 11' immediately above the inner-layer ground conductors 10 and 11, that is, the inner layer. Ground conductors 10 and 11 and inner ground conductor layers 10 'and 1
The distance between 1'and 1'is less than or equal to a quarter of the wavelength of the high-frequency signal transmitted through the through conductor 12. Therefore, the specific thickness 14 is as follows depending on the frequency of the high frequency signal used. For example, 1.2 mm or less for a high frequency signal of 20 GHz, 0.8 mm or less for a 30 GHz signal, 4
0.6 mm or less in the case of 0 GHz, 0.
It is 5 mm or less and 0.4 mm or less in the case of 60 GHz.
【0027】そして、この構成によって、電極パッドや
貫通導体等から構成される信号線路において、各絶縁層
間で電極パッド13と貫通導体12の距離によって電極
パッド13と貫通導体12との間で発生する電磁波の共
振および放射現象を抑制することができる。その結果、
20GHz以上の高周波帯域で伝送特性の良好な半導体
素子基板となる。With this configuration, in the signal line composed of the electrode pads, the through conductors, etc., it is generated between the electrode pads 13 and the through conductors 12 depending on the distance between the electrode pads 13 and the through conductors 12 between the insulating layers. Resonance and radiation phenomenon of electromagnetic waves can be suppressed. as a result,
The semiconductor element substrate has excellent transmission characteristics in a high frequency band of 20 GHz or higher.
【0028】また、図2の構成において、内層接地導体
10,11とその直上の内層接地導体層10’,11’
との間隔、即ち絶縁層9bの厚さ14を、高周波信号の
波長の4分の1以下としたことにより、適用できる周波
数帯域が広がる。従って、本発明においては、高周波信
号の好ましい周波数範囲は60GHz以下であり、60
GHzを超えると、電流の表皮効果によって電極パッド
13と信号パッド25の表面に電流が集中し、電極パッ
ド13と内層接地導体10,11との間のキャパシタン
スおよび電極パッド13と内層接地導体10’,11’
との間のキャパシタンスが低下するが、磁界による信号
の伝搬が生じて電界の伝搬が劣化し、伝送損失が増大す
る傾向にある。Further, in the structure of FIG. 2, the inner layer ground conductors 10 and 11 and the inner layer ground conductor layers 10 'and 11' immediately above them.
And the thickness 14 of the insulating layer 9b are set to 1/4 or less of the wavelength of the high frequency signal, the applicable frequency band is expanded. Therefore, in the present invention, the preferable frequency range of the high frequency signal is 60 GHz or less,
When the frequency exceeds GHz, the current is concentrated on the surfaces of the electrode pad 13 and the signal pad 25 due to the skin effect of the current, and the capacitance between the electrode pad 13 and the inner-layer ground conductors 10 and 11 and the electrode pad 13 and the inner-layer ground conductor 10 '. , 11 '
The capacitance between and decreases, but signal propagation due to the magnetic field occurs, propagation of the electric field deteriorates, and transmission loss tends to increase.
【0029】また、高周波信号の周波数範囲の下限につ
いては特に限定するものではないが、昨今の要求に応え
る光通信の高速伝送用としては、20GHz以上が実用
的である。The lower limit of the frequency range of the high frequency signal is not particularly limited, but 20 GHz or more is practical for high speed transmission of optical communication which meets the recent demands.
【0030】また、基体1は光半導体素子4を支持する
支持部材として機能する。その上面には光半導体素子4
を載置する載置部5を有し、その載置部5に光半導体素
子4が、シリコン等からなる放熱性および加工性の良好
な載置用基板26を介してAu−Ge等の半田により接
着固定される。また、基体1は複数の絶縁層9a,9
b,9cを積層して成る多層セラミック基板としての絶
縁基板9から成る。一方、枠体2も基体1と同様にセラ
ミックスを成形して作製しても良いし、またはFe−N
i−Co合金等の金属により構成しても良い。The base 1 also functions as a support member for supporting the optical semiconductor element 4. The optical semiconductor element 4 is on the upper surface.
Is mounted on the mounting portion 5, and the optical semiconductor element 4 is mounted on the mounting portion 5 via a mounting substrate 26 made of silicon or the like having good heat dissipation and workability. It is fixed by adhesion. In addition, the base 1 is composed of a plurality of insulating layers 9a, 9
The insulating substrate 9 is a multilayer ceramic substrate formed by stacking b and 9c. On the other hand, the frame body 2 may be formed by molding ceramics similarly to the base body 1, or Fe-N.
It may be made of a metal such as an i-Co alloy.
【0031】なお、基体1と枠体2の表面あるいは内部
に内層接地導体10,11等の配線パターン用として形
成されるWやMn等からなるメタライズ層は、その外表
面に耐食性に優れかつロウ材に対して濡れ性の良好な金
属層、例えば厚さ2〜6μmのNiメッキ層と厚さ0.
5〜5μmのAuメッキ層を順次被着させておくのがよ
く、基体1が酸化腐食するのを有効に防止できるととも
に基体1上面に配置される載置用基板26を強固に接着
固定することができる。The metallized layer made of W, Mn or the like formed on the surface or inside of the substrate 1 and the frame 2 for the wiring pattern of the inner layer ground conductors 10 and 11 has excellent corrosion resistance and solder on the outer surface. A metal layer having good wettability with respect to the material, for example, a Ni plating layer having a thickness of 2 to 6 μm and a thickness of 0.
It is preferable to sequentially deposit an Au plating layer of 5 to 5 μm so that oxidative corrosion of the substrate 1 can be effectively prevented and the mounting substrate 26 disposed on the upper surface of the substrate 1 can be firmly adhered and fixed. You can
【0032】上記のごとく、複数のセラミック層を積層
してなる多層セラミック基板からなる基体1の一方の主
面に光半導体素子4を載置し、他方の主面に外部接続用
の略円形の電極パッド13を設ける。この電極パッド1
3は、高周波信号を伝送損失を小さくして外部インター
フェイス基板等の外部電気回路基板22に伝達させるた
めに設けられ、WやMo−Mn等のメタライズ層からな
る。As described above, the optical semiconductor element 4 is mounted on one main surface of the base 1 made of a multilayer ceramic substrate formed by laminating a plurality of ceramic layers, and the other main surface has a substantially circular shape for external connection. The electrode pad 13 is provided. This electrode pad 1
3 is provided to reduce the transmission loss of the high frequency signal and to transmit the high frequency signal to the external electric circuit board 22 such as the external interface board, and is composed of a metallized layer such as W or Mo-Mn.
【0033】また、電極パッド13の表面にはNiメッ
キ層およびAuメッキ層等の耐食性に優れかつロウ付け
性および半田材との濡れ性の良好な金属メッキ層を、
0.2〜20μmの厚さで被着させておくのがよく、導
体バンプ23の酸化腐食も有効に防止できる。そして、
略円形の電極パッド13の直径は0.2〜10mmが良
く、0.2mm未満では、製造時の外部雰囲気との温度
差から半田破壊が生じ易く、その結果高周波信号の損失
が大きくなる。一方、10mmを超えると、導体バンプ
23での高周波信号の反射損失が大きくなり、20GH
z以上の高周波信号の伝送には不向きなものとなる。On the surface of the electrode pad 13, a metal plating layer such as a Ni plating layer and an Au plating layer, which has excellent corrosion resistance, brazing properties and wettability with a solder material, is formed.
It is preferable that the conductive bumps 23 are deposited in a thickness of 0.2 to 20 μm, and the oxidative corrosion of the conductor bumps 23 can be effectively prevented. And
The diameter of the substantially circular electrode pad 13 is preferably 0.2 to 10 mm. If the diameter is less than 0.2 mm, solder breakdown is likely to occur due to the temperature difference with the external atmosphere during manufacturing, and as a result, high frequency signal loss increases. On the other hand, when it exceeds 10 mm, the reflection loss of the high frequency signal at the conductor bump 23 becomes large, and
It is unsuitable for transmission of high frequency signals of z or higher.
【0034】また、導体バンプ23が突起状や球状の場
合、電極パッド13の直径は上記範囲で良いが、導体バ
ンプ23がリード端子(図示せず)の場合、電極パッド
13の直径は0.2〜0.8mmが好ましい。When the conductor bump 23 is a protrusion or a sphere, the diameter of the electrode pad 13 may be in the above range, but when the conductor bump 23 is a lead terminal (not shown), the diameter of the electrode pad 13 is 0. 2 to 0.8 mm is preferable.
【0035】即ち、電極パッド13の直径が0.2mm
未満では、平板状のリード端子の先端部の主面に接続さ
れる電極パッド13の面積がリード端子の先端部の主面
に対して小さくなり過ぎるため、リード端子の先端部の
縁部周囲にロウ材のメニスカスが形成され難くなり、リ
ード端子の接合強度が劣化し易い。That is, the diameter of the electrode pad 13 is 0.2 mm.
If less than, the area of the electrode pad 13 connected to the main surface of the tip portion of the flat lead terminal becomes too small with respect to the main surface of the tip portion of the lead terminal. The meniscus of the brazing material is less likely to be formed, and the bonding strength of the lead terminal is likely to deteriorate.
【0036】また、電極パッド13の直径が0.8mm
を超えると、電極パッド13の面積がリード端子の先端
部の主面に対して大きくなるため、リード端子の先端部
の縁部周囲にロウ材のメニスカスが形成され易くなり、
リード端子の接合強度は確保できるものの、電極パッド
13の面積が不必要に大きくなるため、電極パッド13
とリード端子との接続部での高周波信号の反射損失が大
きくなり、20GHz以上の高周波信号の伝送には不向
きなものとなる。The diameter of the electrode pad 13 is 0.8 mm.
If it exceeds, the area of the electrode pad 13 becomes large with respect to the main surface of the tip portion of the lead terminal, so that the brazing material meniscus is easily formed around the edge portion of the tip portion of the lead terminal,
Although the bonding strength of the lead terminals can be secured, the area of the electrode pad 13 unnecessarily increases, so the electrode pad 13
The reflection loss of the high frequency signal at the connection between the lead terminal and the lead terminal becomes large, which is not suitable for the transmission of the high frequency signal of 20 GHz or more.
【0037】また、本発明においては、電極パッド13
は導体バンプ23を介して外部電気回路基板の電極パッ
ド27に接続される構造、所謂BGA(Ball Grid Arra
y)構造とすることが好ましい。この場合、高周波信号
のさらなる高周波化に対して接続部での伝送損失を少な
くすることができ、導体バンプ23での高周波信号の反
射を小さくすることができる。その結果、外部電気回路
基板22に実装し易い接続構造となるとともに、高周波
信号を伝送損失を小さくして伝達可能となる。Further, in the present invention, the electrode pad 13
Is a structure connected to the electrode pad 27 of the external electric circuit board through the conductor bump 23, a so-called BGA (Ball Grid Arra).
y) The structure is preferable. In this case, it is possible to reduce the transmission loss at the connection portion with respect to the higher frequency of the high frequency signal, and to reduce the reflection of the high frequency signal on the conductor bump 23. As a result, the connection structure can be easily mounted on the external electric circuit board 22, and the high-frequency signal can be transmitted with reduced transmission loss.
【0038】この導体バンプ23は、Sn−Pb合金共
晶半田、Sn−Ag合金半田等の低融点のロウ材等から
なり、そのサイズは電極パッド13と同程度の直径のも
のが、実装信頼性や電気特性の面で好ましい。導体バン
プ23の直径が電極パッド13の直径よりも大きくなる
と、それらのピッチが狭まり、キャパシタンスの増加や
電気絶縁性の点で問題が生じ易くなる。The conductor bump 23 is made of a low melting point brazing material such as Sn-Pb alloy eutectic solder or Sn-Ag alloy solder, and its size is about the same as that of the electrode pad 13. It is preferable in terms of properties and electrical characteristics. If the diameter of the conductor bumps 23 is larger than the diameter of the electrode pads 13, the pitch between them is narrowed, and problems tend to occur in terms of increased capacitance and electrical insulation.
【0039】本発明の枠体2は、その側部に貫通孔2a
が設けてあり、貫通孔2aに筒状の固定部材8が銀ロウ
材等を介して嵌着接合される。この固定部材8はFe−
Ni−Co合金やFe−Ni合金等の金属材料からな
り、例えば、その金属材料のインゴット(塊)をプレス
加工により筒状とすることによって作製される。The frame body 2 of the present invention has a through hole 2a in its side portion.
The cylindrical fixing member 8 is fitted and joined to the through hole 2a via a silver brazing material or the like. This fixing member 8 is Fe-
It is made of a metal material such as a Ni—Co alloy or an Fe—Ni alloy, and is produced, for example, by pressing an ingot (lump) of the metal material into a cylindrical shape by pressing.
【0040】そして、筒状の固定部材8の内部には光フ
ァイバ6が挿入固定され、固定部材8の枠体2内側の端
部には集光用の透光性部材7が配置され、光ファイバ6
と光半導体素子4との間で光信号の授受を行い得るよう
になっている。この固定部材8と光ファイバ6とは、半
田や樹脂接着剤により光半導体パッケージ3の内部が気
密になるように接合され固定される。このとき、半田に
より接合する場合、予め接合部にメタライズ層をスパッ
タリング法等の薄膜形成法で形成しておくと、接合強度
が向上して好ましい。The optical fiber 6 is inserted and fixed inside the cylindrical fixing member 8, and the transparent member 7 for condensing light is arranged at the end of the fixing member 8 inside the frame 2. Fiber 6
Optical signals can be exchanged between the optical semiconductor element 4 and the optical semiconductor element 4. The fixing member 8 and the optical fiber 6 are joined and fixed by solder or resin adhesive so that the inside of the optical semiconductor package 3 becomes airtight. At this time, in the case of joining with solder, it is preferable to previously form a metallized layer on the joining portion by a thin film forming method such as a sputtering method because the joining strength is improved.
【0041】枠体2の上面には、Fe−Ni−Co合金
やFe−Ni合金等の金属材料からなる蓋体20が接合
され、これによって基体1と枠体2と蓋体20とから成
る容器の内部に光半導体素子4が気密状態で収納される
こととなる。蓋体20の枠体2上面への接合は、シーム
ウエルド法等の溶接法によって行われる。A lid 20 made of a metal material such as an Fe-Ni-Co alloy or an Fe-Ni alloy is joined to the upper surface of the frame body 2, so that the base body 1, the frame body 2 and the lid body 20 are formed. The optical semiconductor element 4 is housed in the container in an airtight state. The lid 20 is joined to the upper surface of the frame 2 by a welding method such as a seam weld method.
【0042】かくして、本発明は、20GHz以上の高
周波帯域において、電極パッドや貫通導体等で構成され
る信号線路において、各絶縁層間で電極パッドと貫通導
体の距離によって電極パッドと貫通導体との間で発生す
る電磁波の共振および貫通導体を通過する高周波信号の
放射現象を抑制することができる。Thus, according to the present invention, in a high frequency band of 20 GHz or more, in a signal line composed of an electrode pad, a through conductor, etc., the distance between the electrode pad and the through conductor is different between each insulating layer depending on the distance between the electrode pad and the through conductor. It is possible to suppress the resonance of the electromagnetic wave generated in 1 and the radiation phenomenon of the high frequency signal passing through the through conductor.
【0043】即ち、使用する高周波帯域(60GHz以
下)で高周波信号の伝送性に影響を及ぼさない程度に抑
制することができるため、特性インピーダンスを所定値
(50Ω)から変化するのを防ぐことができ、その結
果、貫通導体に流れる高周波信号の伝送損失を小さくし
て、光半導体素子4と外部電気回路との間で高周波信号
を送受信することが可能となる。That is, it is possible to suppress the characteristic impedance from changing from a predetermined value (50Ω) because it can be suppressed to the extent that it does not affect the transmission property of the high frequency signal in the high frequency band used (60 GHz or less). As a result, it is possible to reduce the transmission loss of the high frequency signal flowing through the through conductor and to transmit and receive the high frequency signal between the optical semiconductor element 4 and the external electric circuit.
【0044】なお、本発明は上記実施の形態に限定され
るものではなく、本発明の要旨を逸脱しない範囲であれ
ば種々の変更は何等差し支えない。例えば、光ファイバ
6を挿入固定する固定部材8は筒状に限らず、上面に溝
を形成した断面形状がU字状のものでも良い。また、基
体1は多層セラミック基板でなくても良く、例えばポリ
イミド等の樹脂層を多層に積層させたものでも良い。さ
らに、上記実施の形態では光半導体パッケージについて
主に説明したが、LSIやIC等の半導体素子用の半導
体素子基板および半導体パッケージについても本発明の
構成を適用し得る。The present invention is not limited to the above embodiment, and various modifications may be made without departing from the scope of the present invention. For example, the fixing member 8 into which the optical fiber 6 is inserted and fixed is not limited to a tubular shape, and may have a U-shaped cross section with a groove formed on the upper surface. Further, the base 1 does not have to be a multilayer ceramic substrate, and may be, for example, a multilayer of resin layers such as polyimide. Further, although the optical semiconductor package has been mainly described in the above embodiments, the configuration of the present invention can be applied to a semiconductor element substrate and a semiconductor package for semiconductor elements such as LSI and IC.
【0045】[0045]
【発明の効果】本発明の半導体素子基板は、絶縁基板の
主面に平行な方向における電極パッドと内層接地導体と
の間隔をd、電極パッドの直径をwとしたとき0<d≦
wであり、内層接地導体は絶縁層を介して複数積層され
ているとともに内層接地導体間の絶縁層の厚さが貫通導
体により伝送される高周波信号の波長の4分の1以下で
あることにより、電極パッドと貫通導体および貫通導体
同士を接続する接続パッド等から構成される信号線路に
おいて、各絶縁層間で電極パッドと貫通導体の距離によ
って電極パッドと貫通導体との間で発生する電磁波の共
振および放射現象を抑制することができ、特性インピー
ダンスが所定値(50Ω)から変化するのを防ぐことが
できる。その結果、特に20GHz以上の高周波帯域に
おいて、高周波信号からなる駆動信号を伝送損失を小さ
くして送受信することが可能となる。According to the semiconductor element substrate of the present invention, when the distance between the electrode pad and the inner layer ground conductor in the direction parallel to the main surface of the insulating substrate is d and the diameter of the electrode pad is w, 0 <d ≦.
w, and the thickness of the insulating layer between the inner-layer ground conductors is one-fourth or less of the wavelength of the high-frequency signal transmitted by the through conductors, because the inner-layer ground conductors are laminated with the insulating layer in between. , Resonance of electromagnetic wave generated between the electrode pad and the through conductor depending on the distance between the electrode pad and the through conductor between the insulating layers in the signal line composed of the electrode pad, the through conductor, and the connecting pad connecting the through conductors to each other. Also, the radiation phenomenon can be suppressed, and the characteristic impedance can be prevented from changing from a predetermined value (50Ω). As a result, particularly in a high frequency band of 20 GHz or more, it becomes possible to transmit and receive a drive signal composed of a high frequency signal with a small transmission loss.
【0046】また、半導体素子基板の他方の主面に形成
された電極パッドは、導体バンプを介して外部電気回路
基板の電極パッドに接続されることにより、リード端
子、ピン等を介して外部電気回路基板に接続する場合と
比較して、導体バンプでの高周波信号の反射を小さくす
ることができ、その結果、外部電気回路に実装し易い接
続構造になるとともに、高周波信号の伝送損失を小さく
して伝達可能なものとなる。Further, the electrode pad formed on the other main surface of the semiconductor element substrate is connected to the electrode pad of the external electric circuit board via the conductor bump, so that the external electric power is supplied via the lead terminal, the pin and the like. Compared to the case of connecting to a circuit board, the reflection of high frequency signals on the conductor bumps can be reduced, resulting in a connection structure that is easy to mount on an external electric circuit and a reduction in transmission loss of high frequency signals. Can be transmitted.
【0047】本発明の光半導体パッケージは、載置部が
光半導体素子用として形成された本発明の半導体素子搭
載用基板と、一方の主面に載置部を囲繞するように取着
され、側部に貫通孔が形成された枠体と、貫通孔に嵌着
された筒状の光ファイバ固定部材と、光ファイバ固定部
材の内側に設置された透光性部材とを具備したことによ
り、20GHz以上の高周波信号を駆動信号として用い
る光半導体装置が、自動化ラインで外部電気回路基板に
実装し易い接続構造となるとともに、高周波信号を伝送
損失を小さくして伝達可能なものとなる。In the optical semiconductor package of the present invention, the mounting portion is attached to the semiconductor element mounting substrate of the present invention in which the mounting portion is formed for an optical semiconductor element, and the mounting portion is surrounded by one main surface, By including a frame body in which a through hole is formed in the side portion, a cylindrical optical fiber fixing member fitted in the through hole, and a translucent member installed inside the optical fiber fixing member, An optical semiconductor device that uses a high-frequency signal of 20 GHz or higher as a drive signal has a connection structure that can be easily mounted on an external electric circuit board in an automation line, and can transmit a high-frequency signal with reduced transmission loss.
【図面の簡単な説明】[Brief description of drawings]
【図1】本発明の半導体素子基板を基体として用いた光
半導体パッケージについて実施の形態の一例を示す断面
図である。FIG. 1 is a sectional view showing an example of an embodiment of an optical semiconductor package using a semiconductor element substrate of the present invention as a base.
【図2】図1の光半導体パッケージにおける半導体素子
基板の要部を拡大した部分拡大断面図である。2 is a partial enlarged cross-sectional view showing an enlarged main part of a semiconductor element substrate in the optical semiconductor package of FIG.
【図3】従来の半導体素子基板の要部を示す部分拡大断
面図である。FIG. 3 is a partial enlarged cross-sectional view showing a main part of a conventional semiconductor element substrate.
1:基体 2:枠体 2a:貫通孔 3:光半導体パッケージ 4:光半導体素子 5:載置部 6:光ファイバ 7:透光性部材 8:光ファイバ固定部材 9:絶縁基板 9a,9b,9c:絶縁層 10,10’,11,11’:内層接地導体 12:貫通導体 13:電極パッド 14:絶縁層の厚さ 1: Base 2: Frame body 2a: through hole 3: Optical semiconductor package 4: Optical semiconductor element 5: Placement section 6: Optical fiber 7: Translucent member 8: Optical fiber fixing member 9: Insulating substrate 9a, 9b, 9c: insulating layer 10, 10 ', 11, 11': inner layer ground conductor 12: Through conductor 13: Electrode pad 14: Thickness of insulating layer
Claims (2)
一方の主面に半導体素子を載置する載置部が形成され、
他方の主面に外部接続用の略円形の電極パッドが設けら
れ、かつ前記絶縁基板の内部に前記半導体素子と前記電
極パッドとを接続する貫通導体および該貫通導体を取り
囲むように略円形の開口が形成された内層接地導体が設
けられた半導体素子搭載用基板であって、前記主面に平
行な方向における前記電極パッドと前記内層接地導体と
の間隔をd、前記電極パッドの直径をwとしたとき0<
d≦wであり、前記内層接地導体は前記絶縁層を介して
複数積層されているとともに前記内層接地導体間の前記
絶縁層の厚さが前記貫通導体により伝送される高周波信
号の波長の4分の1以下であることを特徴とする半導体
素子搭載用基板。1. A mounting portion on which a semiconductor element is mounted is formed on one main surface of an insulating substrate formed by laminating a plurality of insulating layers,
A substantially circular electrode pad for external connection is provided on the other main surface, and a through conductor connecting the semiconductor element and the electrode pad is provided inside the insulating substrate, and a substantially circular opening so as to surround the through conductor. A semiconductor element mounting substrate provided with an inner layer grounding conductor having a groove formed therein, wherein a distance between the electrode pad and the inner layer grounding conductor in a direction parallel to the main surface is d, and a diameter of the electrode pad is w. 0 <
d ≦ w, a plurality of the inner layer ground conductors are stacked with the insulating layer interposed therebetween, and the thickness of the insulating layer between the inner layer ground conductors is 4 minutes of the wavelength of the high frequency signal transmitted by the penetrating conductor. 1. A semiconductor element mounting substrate characterized by being 1 or less.
された請求項1記載の半導体素子搭載用基板と、前記一
方の主面に前記載置部を囲繞するように取着され、側部
に貫通孔が形成された枠体と、前記貫通孔に嵌着された
筒状の光ファイバ固定部材と、該光ファイバ固定部材の
内側に設置された透光性部材とを具備したことを特徴と
する光半導体素子収納用パッケージ。2. The substrate for mounting a semiconductor element according to claim 1, wherein the mounting portion is formed for an optical semiconductor element, and the one main surface is attached so as to surround the mounting portion, and a side thereof. A frame body having a through hole formed therein, a cylindrical optical fiber fixing member fitted into the through hole, and a translucent member installed inside the optical fiber fixing member. Characteristic package for optical semiconductor device storage.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2001270208A JP2003078065A (en) | 2001-09-06 | 2001-09-06 | Substrate for packaging semiconductor device and package for housing optical semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2001270208A JP2003078065A (en) | 2001-09-06 | 2001-09-06 | Substrate for packaging semiconductor device and package for housing optical semiconductor device |
Publications (1)
Publication Number | Publication Date |
---|---|
JP2003078065A true JP2003078065A (en) | 2003-03-14 |
Family
ID=19095892
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2001270208A Pending JP2003078065A (en) | 2001-09-06 | 2001-09-06 | Substrate for packaging semiconductor device and package for housing optical semiconductor device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2003078065A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2005340636A (en) * | 2004-05-28 | 2005-12-08 | Renesas Technology Corp | Multilayer wiring board |
JP2017183684A (en) * | 2016-03-29 | 2017-10-05 | 京セラ株式会社 | Semiconductor element mounting substrate and semiconductor device |
-
2001
- 2001-09-06 JP JP2001270208A patent/JP2003078065A/en active Pending
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2005340636A (en) * | 2004-05-28 | 2005-12-08 | Renesas Technology Corp | Multilayer wiring board |
JP4606776B2 (en) * | 2004-05-28 | 2011-01-05 | ルネサスエレクトロニクス株式会社 | Semiconductor device |
JP2017183684A (en) * | 2016-03-29 | 2017-10-05 | 京セラ株式会社 | Semiconductor element mounting substrate and semiconductor device |
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