JP2003064306A5 - - Google Patents
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- Publication number
- JP2003064306A5 JP2003064306A5 JP2001257112A JP2001257112A JP2003064306A5 JP 2003064306 A5 JP2003064306 A5 JP 2003064306A5 JP 2001257112 A JP2001257112 A JP 2001257112A JP 2001257112 A JP2001257112 A JP 2001257112A JP 2003064306 A5 JP2003064306 A5 JP 2003064306A5
- Authority
- JP
- Japan
- Prior art keywords
- group
- different
- same
- siloxane
- hydrolyzing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001257112A JP4972834B2 (ja) | 2001-08-28 | 2001-08-28 | シロキサン樹脂 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001257112A JP4972834B2 (ja) | 2001-08-28 | 2001-08-28 | シロキサン樹脂 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2003064306A JP2003064306A (ja) | 2003-03-05 |
| JP2003064306A5 true JP2003064306A5 (US20040106767A1-20040603-C00005.png) | 2005-10-13 |
| JP4972834B2 JP4972834B2 (ja) | 2012-07-11 |
Family
ID=19084824
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2001257112A Expired - Fee Related JP4972834B2 (ja) | 2001-08-28 | 2001-08-28 | シロキサン樹脂 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4972834B2 (US20040106767A1-20040603-C00005.png) |
Families Citing this family (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7687590B2 (en) | 2002-02-27 | 2010-03-30 | Hitachi Chemical Company, Ltd. | Composition for forming silica based coating film, silica based coating film and method for preparation thereof, and electronic parts |
| WO2003072668A1 (en) * | 2002-02-27 | 2003-09-04 | Hitachi Chemical Co., Ltd. | Composition for forming silica based coating film, silica based coating film and method for preparation thereof, and electronic parts |
| US7682701B2 (en) | 2002-02-27 | 2010-03-23 | Hitachi Chemical Co., Ltd. | Composition for forming silica based coating film, silica based coating film and method for preparation thereof, and electronic parts |
| JP2004277502A (ja) * | 2003-03-13 | 2004-10-07 | Hitachi Chem Co Ltd | シリカ系被膜形成用組成物、シリカ系被膜及びその形成方法並びにシリカ系被膜を備える電子部品 |
| TW200605220A (en) * | 2004-06-21 | 2006-02-01 | Hitachi Chemical Co Ltd | Organic siloxane film, semiconductor device using same, flat panel display and raw material liquid |
| US8901268B2 (en) | 2004-08-03 | 2014-12-02 | Ahila Krishnamoorthy | Compositions, layers and films for optoelectronic devices, methods of production and uses thereof |
| US20060047034A1 (en) | 2004-09-02 | 2006-03-02 | Haruaki Sakurai | Composition for forming silica-based film, method of forming silica-based film, and electronic component provided with silica-based film |
| US20080260956A1 (en) * | 2004-12-21 | 2008-10-23 | Haruaki Sakurai | Film, Silica Film and Method of Forming the Same, Composition for Forming Silica Film, and Electronic Part |
| JP2006213908A (ja) * | 2004-12-21 | 2006-08-17 | Hitachi Chem Co Ltd | シリカ系被膜形成用組成物、シリカ系被膜の形成方法、シリカ系被膜、及び、電子部品 |
| JP2009193911A (ja) * | 2008-02-18 | 2009-08-27 | Sony Corp | 色素増感光電変換素子およびその製造方法ならびに色素増感光電変換素子モジュールおよびその製造方法ならびに電子機器ならびに多孔質シリカ膜の製造方法 |
| US8557877B2 (en) | 2009-06-10 | 2013-10-15 | Honeywell International Inc. | Anti-reflective coatings for optically transparent substrates |
| US8864898B2 (en) | 2011-05-31 | 2014-10-21 | Honeywell International Inc. | Coating formulations for optical elements |
| WO2016167892A1 (en) | 2015-04-13 | 2016-10-20 | Honeywell International Inc. | Polysiloxane formulations and coatings for optoelectronic applications |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3287119B2 (ja) * | 1994-07-13 | 2002-05-27 | 住友化学工業株式会社 | シリカ系絶縁膜形成用塗布液 |
| JPH08245792A (ja) * | 1995-03-10 | 1996-09-24 | Mitsubishi Electric Corp | シリコーンラダーポリマー、シリコーンラダープレポリマーおよびそれらの製造方法 |
| JP3328545B2 (ja) * | 1997-05-28 | 2002-09-24 | 東レ・ダウコーニング・シリコーン株式会社 | 半導体装置の製造方法 |
| JP2978879B1 (ja) * | 1998-05-26 | 1999-11-15 | 静岡日本電気株式会社 | Ｌｓｉパッケージ用モールド材 |
| US6592980B1 (en) * | 1999-12-07 | 2003-07-15 | Air Products And Chemicals, Inc. | Mesoporous films having reduced dielectric constants |
| JP4195773B2 (ja) * | 2000-04-10 | 2008-12-10 | Ｊｓｒ株式会社 | 層間絶縁膜形成用組成物、層間絶縁膜の形成方法およびシリカ系層間絶縁膜 |
| US6576568B2 (en) * | 2000-04-04 | 2003-06-10 | Applied Materials, Inc. | Ionic additives for extreme low dielectric constant chemical formulations |
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2001
- 2001-08-28 JP JP2001257112A patent/JP4972834B2/ja not_active Expired - Fee Related
