JP2003059794A - Method and apparatus for partitioning pattern for writing, method for writing, method for making mask, semiconductor device and method for manufacturing the same, program for partitioning pattern for writing and computer readable recording medium recorded with the program - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a method and an apparatus for partitioning a pattern for writing which enable to optimize the partition of a pattern rapidly without generating any variation in the same shape, method for writing, mask and method for making the same, semiconductor device and method for manufacturing the same, program for partitioning a pattern for writing and computer readable recording medium recorded with the program. SOLUTION: In the case of a pattern having a shape which has never been handled as a target for partition, the pattern data and the partition result are registered in a hash table of a storage device 11. Thereafter, whether or not a pattern to be processed now has the same shape as one of the registered patterns is judged by searching the hash table. When the pattern to be processed now is judged to have the same shape as one of the registered patterns, the partition result of the registered pattern is applied to the pattern.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a drawing pattern division processing method, a drawing pattern division processing apparatus, a drawing method, a mask, a mask making method, a semiconductor, for a variable shaping type electron beam drawing apparatus, for example. The present invention relates to an apparatus, a semiconductor device manufacturing method, a drawing pattern division processing program, and a computer-readable recording medium recording the program.

[0002]

2. Description of the Related Art FIG. 6 shows an example of a variable shaping type electron beam drawing apparatus. The electron beam drawing apparatus 1 includes an electron gun 2, a first aperture 3 arranged below the electron gun 2 and having a rectangular opening 3a, and a shaping deflector 4 for deflecting an electron beam transmitted through the first aperture 3. And a second aperture 5 formed below the shaping deflector 4 and having a rectangular opening 5a, an objective lens 6 arranged below the second aperture 5, and a positioning arranged below the objective lens 6. Deflector 7 and semiconductor substrate 8 or mask substrate 9 coated with resist
And a stage (not shown) on which is mounted. The shaping deflector 4 and the positioning deflector 7 are electromagnetic deflectors or electrostatic deflectors.

The electron beam EB emitted from the electron gun 2 has a rectangular cross section by passing through the first aperture 3. The electron beam having the rectangular cross section is deflected by the shaping deflector 4 to the second aperture 5. Reach The electron beam that has reached the second aperture 5 is transmitted only through the portion (rectangle) of the opening 5 a formed in the second aperture 5. The electron beam transmitted through the second aperture 5 passes through the objective lens 6 and the positioning deflector 7, and is focused and imaged at a desired position on the resist on the semiconductor substrate 8 or the mask substrate 9. That is, the electron beam has a rectangular sectional shape by the first aperture 3 and the second aperture 5, and its size can be arbitrarily changed by adjusting the deflection amount by the shaping deflector 4.

As described above, in the variable shaping type electron beam drawing apparatus, since an electron beam having a rectangular cross section is used for drawing, it is necessary to divide the drawn pattern into rectangular units (shot division). For example, the design pattern 20 shown in FIG. 7 is divided into two rectangular patterns 20a and 20b. And
The pattern 20 is obtained by adjusting the cross-sectional size of the electron beam according to the size of each of the rectangular patterns 20a and 20b and performing two electron beam shots. The division unit may be a trapezoid other than a rectangle. In this case, the trapezoidal hypotenuse can be formed by multiple exposure in which electron beam shots having a rectangular cross section are overlapped while shifting their positions. here,
For example, if multiple exposure is performed 20 times, the dose amount per electron beam shot is reduced to 1/20.

In shot division of such a pattern, a minute pattern may occur depending on the division method. For example, the pattern 20b shown in FIG. In the electron beam drawing apparatus using the variable shaping method, if such a minute pattern exists, the minute pattern cannot be drawn according to the design data (for example, the corners are rounded) and the drawing accuracy deteriorates. The problem is known. In this specification, a pattern in which the minimum side width of the pattern is, for example, about 0.3 μm or less is a minute pattern.

In order to prevent this phenomenon, it is general to optimize the pattern division so that a minute pattern does not occur during shot division. For example, the pattern 20 is replaced by two patterns 20c as shown in FIG.
If it is divided into 20d, it is possible to avoid the generation of minute patterns.

[0007]

However, the same division result may not be obtained even if the patterns have the same shape, depending on the division optimization processing method for preventing the generation of minute patterns. For example, in a portion in which patterns of the same shape are repeated, such as a pattern of a semiconductor memory section, or in a portion in which patterns of the same shape are symmetrically arranged in the left-right direction or the vertical direction, the patterns of the same shape are The difference in the division result may cause variations in the pattern drawing accuracy, which may affect the performance as an element.

FIG. 9A shows an example in which two patterns of the same shape 23a, 23b are arranged in a mirror image relationship. At the time of pattern division, from the state of the design pattern shown in FIG. 9A, first, as shown in FIG. 9B, line segments extending in only one direction from each vertex are simply divided. And
As a result of this division, when a minute pattern that causes a decrease in drawing accuracy occurs, as shown in C of FIG. 9, division optimization processing is performed so as to avoid the minute pattern. As a result, although the patterns 23a and 23b have the same shape, the division result may be different. That is,
There may be cases where the symmetry is not maintained. In such a case, the pattern shapes to be drawn are not completely the same due to the influence of the difference in the division result, which causes variations in the pattern line width.

Further, since the LSI patterns have become finer and more complicated in recent years, the pattern data for the drawing apparatus created from the designed LSI pattern data has also become very huge and complicated. Therefore, it takes a very long time to perform the division optimization process for eliminating the above-mentioned minute pattern, and as a result, TAT (time required for product finishing) for mask making and semiconductor device manufacturing.
It is also a problem that it has a great influence on the. Therefore, it is desired to speed up the pattern division processing.

The present invention has been made in view of the above-mentioned problems, and it is possible to perform a pattern division optimization process without variations between the same shapes, and a pattern formation process for a drawing pattern that can speed up the process. Pattern processing device
It is an object of the present invention to provide a drawing method, a mask, a mask making method, a semiconductor device, a semiconductor device manufacturing method, a drawing pattern division processing program, and a computer-readable recording medium recording the program.

[0011]

In the method of dividing a drawing pattern according to a first aspect of the present invention, a division processing result is held in a storage device for a pattern having a shape that is first treated as a division processing target. The pattern division result held in the storage device is applied to the pattern having the same shape as the pattern held in the storage device.

According to a second aspect of the present invention, there is provided a method of dividing a drawing pattern, wherein, for a pattern having a shape that is first treated as a division target, the pattern data of this pattern and the division processing result depend on the shape of this pattern. The procedure of storing the shape information in the address on the storage device obtained by converting with the hash function, and obtaining the shape information for the divided unprocessed pattern, accessing the storage device using this shape information as a key The procedure for searching whether or not the division processing has been completed, and the procedure for calling the division processing result of the division-processed pattern from the storage device and applying it to the division-unprocessed pattern when the pattern of the same shape has been division-processed Have.

According to a third aspect of the present invention, there is provided a method for dividing a drawing pattern, in which a pattern having a shape to be treated for the first time is divided into pattern data, a division processing result, and the pattern and the division processing result. A procedure for storing pattern data of a pattern that is shared and only differs in the arrangement direction from the pattern at the address on the storage device that is obtained by converting the shape information that depends on the shape of these patterns with a hash function, and a division unprocessed pattern For the shape information, access the storage device using this shape information as a key, and search for a pattern in which the unprocessed pattern and the coordinate value change from the reference coordinates match, and the coordinate value change When a matching pattern is found, the division processing result for that pattern is called from the storage device. , And a procedure to be applied to the divided raw pattern.

According to a fourth aspect of the present invention, in the drawing pattern division processing apparatus, the pattern data of the pattern and the division processing result of the pattern which is first treated as the division processing object depend on the shape of the pattern. Registration means for storing the shape information at an address obtained by converting the shape information with a hash function, a storage device having a storage area designated by the address, shape information for a divided unprocessed pattern, and storing this shape information as a key Retrieval means for accessing the device and searching for whether or not the pattern of the same shape has already been subjected to division processing, and, if the pattern of the same shape has been subjected to division processing, the division processing result of the division processed pattern is stored in the storage device. And a division result extracting means for applying the division result to the division unprocessed pattern.

According to a fifth aspect of the present invention, there is provided a drawing pattern division processing apparatus which, for a pattern of a shape which is first treated as a division processing target, outputs pattern data of this pattern, a division processing result, and the pattern and the division processing result. Registration means for storing pattern data of a pattern which is shared and only differs in the arrangement direction from the pattern to an address obtained by converting shape information depending on the shape of these patterns by a hash function, and a memory designated by the address Shape information is obtained for a storage device having an area and a divided unprocessed pattern, and the shape information is used as a key to access the storage device to determine whether a pattern is stored in which the divided unprocessed pattern and the coordinate value change from the reference coordinates match. If a pattern that matches the change in coordinate values is found with the search method for searching, Call the divided-processing result with respect to the turn from the storage device, and a division result extraction means for applying the divided raw pattern.

In the drawing method according to the sixth aspect of the present invention, the division processing result is held in the storage device for the pattern of the shape that is first treated as the division processing target, and thereafter, the same shape as the pattern held in the storage device is stored. The pattern division result of the held pattern is applied to the pattern of, and the pattern to be drawn on the resist is divided into patterns that can be drawn by the drawing device, and for each of the divided patterns. Drawing on the resist with a drawing device.

According to a seventh aspect of the present invention, in regard to a pattern of a shape which is first treated as a division processing target, pattern data of this pattern and division processing result are used, and shape information depending on the shape of the pattern is used as a hash function. The procedure of storing at the address on the storage device obtained by conversion with, and obtaining the shape information for the divided unprocessed pattern, accessing the storage device using this shape information as a key,
The procedure to search whether the pattern of the same shape has already been divided, and if the pattern of the same shape has been divided, call the divided processing result of the divided processed pattern from the storage device and In a division process having a procedure for applying to a pattern, a pattern to be drawn on a resist is divided into patterns that can be drawn by a drawing device, and each divided pattern is drawn on the resist by the drawing device. To go.

In the drawing method according to the eighth aspect of the present invention, regarding the pattern of the shape which is first treated as the division processing target, the pattern data of this pattern, the division processing result, and the pattern and the division processing result are shared and Is the pattern data of the pattern that only the arrangement direction is different,
The procedure for storing the shape information depending on the shape of these patterns in the address on the storage device obtained by converting with the hash function, and the shape information for the divided unprocessed pattern,
A procedure for accessing the storage device using this shape information as a key and searching for a pattern in which the division unprocessed pattern and the pattern whose coordinate value change from the reference coordinate match are stored,
When a pattern with the same coordinate value change is found, the division processing result for the pattern is called from the storage device, and the pattern to be drawn on the resist in the division processing having a procedure of applying to the division unprocessed pattern, The pattern is divided into patterns that can be drawn by the drawing device, and each divided pattern is drawn on the resist by the drawing device.

In the mask according to claim 9 of the present invention, a division processing result is held in a storage device for a pattern having a shape which is first treated as a division processing target, and thereafter, the pattern having the same shape as the pattern held in the storage device is held. For the pattern, the divided pattern is divided by the dividing process to which the held pattern dividing result is applied. The divided pattern is drawn on the resist formed on the mask substrate by the drawing device. Then, the drawn pattern is transferred and formed on the mask substrate.

According to a tenth aspect of the present invention, for a pattern of a shape which is first treated as a division processing target, pattern data of this pattern and the division processing result are used as a hash function for shape information depending on the shape of the pattern. The procedure of storing at the address on the storage device obtained by conversion and the shape information for the divided unprocessed pattern, and accessing the storage device using this shape information as a key,
The procedure to search whether the pattern of the same shape has already been divided, and if the pattern of the same shape has been divided, call the divided processing result of the divided processed pattern from the storage device and A pattern divided by a dividing process having a procedure of applying to the pattern is drawn on a resist formed on the mask substrate by a drawing device for each divided pattern, and the drawn pattern is formed on the mask substrate. It is transferred and formed.

The mask according to claim 11 of the present invention shares the pattern data of this pattern, the division processing result, and the pattern and the division processing result with respect to the pattern of the shape that is first treated as the division processing target, and the pattern is The pattern data of the pattern only the arrangement direction is different,
The procedure for storing the shape information depending on the shape of these patterns in the address on the storage device obtained by converting with the hash function, and the shape information for the divided unprocessed pattern,
A procedure for accessing the storage device using this shape information as a key and searching for a pattern in which the division unprocessed pattern and the pattern whose coordinate value change from the reference coordinate match are stored,
When a pattern whose coordinate value changes match is found, a pattern obtained by performing a division process that has a procedure of calling a division process result for the pattern from a storage device and applying it to a division-unprocessed pattern is a divided pattern. Each pattern is drawn on a resist formed on the mask substrate by a drawing device, and the drawn pattern is transferred to the mask substrate to be formed.

According to a twelfth aspect of the present invention, in a mask making method, a division processing result is held in a storage device for a pattern having a shape which is first treated as a division processing target, and thereafter, a pattern held in the storage device is stored. For a pattern of the same shape, the procedure for dividing the pattern by applying the held pattern division processing result, and drawing on the resist formed on the mask substrate by the drawing device for each divided pattern And a procedure for transferring the drawn pattern onto the mask substrate.

In the mask making method according to the thirteenth aspect of the present invention, for the pattern of the shape which is first treated as the division processing target, the pattern data of this pattern and the division processing result are converted into shape information depending on the shape of this pattern. The procedure of storing at the address on the storage device obtained by conversion with the hash function, and obtaining the shape information for the unprocessed pattern, accessing the storage device using this shape information as a key, and dividing the pattern of the same shape already If the pattern of the same shape has already been divided, the pattern division process result of the divided pattern is called from the storage device and the pattern is applied to the unprocessed pattern. The procedure of division processing and the resist formed on the mask substrate by the drawing device for each divided pattern Having a step of drawing, and a procedure for transferring the pattern drawn on the mask substrate.

In the mask making method according to the fourteenth aspect of the present invention, the pattern data of this pattern, the division processing result, and the pattern and the division processing result are shared for the pattern of the shape which is first treated as the division processing target. A procedure for storing pattern data of a pattern whose layout direction is different from that of a pattern into an address on a storage device obtained by converting the shape information depending on the shape of these patterns with a hash function, and the shape information for the unprocessed pattern Then, the shape information is used as a key to access the storage device, and a procedure for searching whether or not a pattern in which the coordinate value change from the reference coordinate matches the divided unprocessed pattern is stored, and a pattern in which the coordinate value change matches If found, the result of the division process for that pattern is called from the storage device and the The procedure of dividing the pattern according to the procedure applied to the processing pattern, the procedure of drawing each divided pattern on the resist formed on the mask substrate by the drawing device, and the transfer of the drawn pattern to the mask substrate And the procedure to

In the semiconductor device according to the fifteenth aspect of the present invention, the division processing result is held in the storage device for the pattern of the shape that is first treated as the division processing target, and thereafter, the same shape as the pattern held in the storage device is stored. For the pattern of, the pattern that is divided by the dividing process to which the divided pattern of the held pattern is applied is
Each divided pattern is drawn on the resist formed on the mask substrate by a drawing device, and the drawn pattern is transferred to the mask substrate and the pattern is exposed and transferred to the semiconductor substrate using the mask formed. There is.

In the semiconductor device according to the sixteenth aspect of the present invention, for the pattern of the shape that is first treated as the division processing target, the pattern data of this pattern and the division processing result, the shape information depending on the shape of the pattern is used as a hash function. The procedure of storing at the address on the storage device obtained by converting with the above, and the shape information for the divided unprocessed pattern is obtained, the storage device is accessed by using this shape information as a key, and the pattern of the same shape has already been divided. If the pattern having the same shape has been subjected to the division processing, the division processing including the division processing result of the division-processed pattern is called from the storage device and applied to the division unprocessed pattern. The divided pattern is divided into patterns that are formed on the mask substrate by the drawing device for each divided pattern. Draw on strike pattern the drawing pattern by using a mask formed by transferring the mask substrate is exposed and transferred to the semiconductor substrate.

In the semiconductor device according to the seventeenth aspect of the present invention, regarding the pattern of the shape that is first treated as the division processing target, the pattern data of this pattern, the division processing result, and the pattern and the division processing result are shared, and Is a procedure for storing pattern data of patterns that differ only in the arrangement direction at addresses on a storage device obtained by converting shape information that depends on the shape of these patterns with a hash function, and obtaining shape information for unprocessed patterns. , This shape information is used as a key to access the storage device, and the procedure for searching whether a pattern in which the coordinate values change from the reference coordinates match the unprocessed divided pattern and the pattern in which the coordinate value changes match are found. If the pattern is divided, the division processing result for that pattern is called from the storage device and the division is not processed. A pattern divided by a dividing process having a procedure for applying to a turn is drawn on a resist formed on a mask substrate by a drawing device for each divided pattern, and the drawn pattern is written on the mask substrate. The pattern is exposed and transferred onto the semiconductor substrate using a mask formed by transfer.

In the semiconductor device according to the eighteenth aspect of the present invention, the division processing result is held in the storage device for the pattern of the shape that is first treated as the division processing target, and thereafter, the same shape as the pattern held in the storage device is stored. For the pattern of, the pattern that is divided by the dividing process to which the divided pattern of the held pattern is applied is
Each of the divided patterns is drawn on a resist formed on a mask substrate by a drawing device, and the drawn pattern is transferred to the semiconductor substrate.

In the semiconductor device according to the nineteenth aspect of the present invention, for a pattern of a shape that is first treated as a division processing target, the pattern data of this pattern and the division processing result are used as a hash function for shape information depending on the shape of the pattern. The procedure of storing at the address on the storage device obtained by converting with the above, and the shape information for the divided unprocessed pattern is obtained, the storage device is accessed by using this shape information as a key, and the pattern of the same shape has already been divided. If the pattern having the same shape has been subjected to the division processing, the division processing including the division processing result of the division-processed pattern is called from the storage device and applied to the division unprocessed pattern. The divided pattern is divided into patterns that are formed on the mask substrate by the drawing device for each divided pattern. Draw on strike, the drawn pattern is transferred onto a semiconductor substrate.

In the semiconductor device according to the twentieth aspect of the present invention, for a pattern of a shape which is first treated as a division processing target, the pattern data of this pattern, the division processing result, and the pattern and the division processing result are shared, and Is a procedure for storing pattern data of patterns that differ only in the arrangement direction at addresses on a storage device obtained by converting shape information that depends on the shape of these patterns with a hash function, and obtaining shape information for unprocessed patterns. , This shape information is used as a key to access the storage device, and the procedure for searching whether a pattern in which the coordinate values change from the reference coordinates match the unprocessed divided pattern and the pattern in which the coordinate value changes match are found. When the pattern is divided, the division processing result for that pattern is called from the storage device and the division is not processed. A pattern divided by a dividing process having a procedure for applying to a turn is drawn on a resist formed on a mask substrate by a drawing device for each divided pattern, and the drawn pattern is formed on a semiconductor substrate. It has been transcribed.

In the method of manufacturing a semiconductor device according to a twenty-first aspect of the present invention, a division processing result is held in a storage device for a pattern having a shape that is first treated as a division processing target, and thereafter, a pattern held in the storage device is held. For a pattern having the same shape as the above, the procedure for dividing the pattern by applying the divided pattern division result to the pattern and the resist formed on the mask substrate by the drawing device for each divided pattern. It has a procedure of drawing on the top, a procedure of transferring the drawn pattern to a mask substrate to obtain a mask, and a procedure of exposing and transferring the pattern to a semiconductor substrate using the mask.

According to a twenty-second aspect of the present invention, in a method for manufacturing a semiconductor device, for a pattern having a shape that is first treated as a division target, the pattern data of this pattern and the division processing result are given shape information depending on the shape of the pattern. The procedure of storing in the address on the storage device obtained by converting with a hash function, and obtaining the shape information for the unprocessed pattern, accessing the storage device using this shape information as a key, and dividing the pattern of the same shape already It has a procedure of searching for whether or not the pattern has the same shape, and a procedure of calling the division processing result of the division-processed pattern from the storage device and applying it to the division-unprocessed pattern when the pattern of the same shape has been division-processed. Pattern division processing procedure,
A procedure for drawing each divided pattern on a resist formed on a mask substrate by a drawing device, a procedure for transferring the drawn pattern to a mask substrate to obtain a mask, and a pattern using this mask for a semiconductor And a procedure of exposing and transferring to a substrate.

A semiconductor device manufacturing method according to a twenty-third aspect of the present invention shares the pattern data of this pattern, the division processing result, and the pattern and the division processing result with respect to the pattern of the shape which is first treated as the division processing target. A procedure for storing pattern data of a pattern that is different from the pattern only in the arrangement direction at an address on the storage device obtained by converting the shape information that depends on the shape of these patterns with a hash function, and the shape of the unprocessed pattern The information is obtained, the storage device is accessed by using this shape information as a key, and the coordinate value change is matched with the procedure of searching for a pattern in which the divided unprocessed pattern and the coordinate value change from the reference coordinate match. If a pattern is found, the division processing result for that pattern is called from the storage device and A pattern division processing procedure including a procedure for applying to an unprocessed pattern, a procedure for drawing each divided pattern on a resist formed on a mask substrate by a drawing device, and a transfer of the drawn pattern to a mask substrate Then, there is a procedure for obtaining a mask, and a procedure for exposing and transferring a pattern onto a semiconductor substrate using this mask.

According to a twenty-fourth aspect of the present invention, in a semiconductor device manufacturing method, a division processing result is held in a storage device for a pattern having a shape which is first treated as a division processing target, and thereafter, a pattern held in the storage device is held. For a pattern having the same shape as the above, the procedure for dividing the pattern by applying the divided pattern division result of the held pattern, and the resist formed on the semiconductor substrate by the drawing device for each divided pattern. It has a procedure of drawing on the top and a procedure of transferring the drawn pattern to the semiconductor substrate.

According to a twenty-fifth aspect of the present invention, in a method for manufacturing a semiconductor device, for a pattern having a shape that is first treated as a division target, pattern data of this pattern and division processing results are given shape information depending on the shape of the pattern. The procedure of storing in the address on the storage device obtained by converting with the hash function, and obtaining the shape information for the divided unprocessed pattern, accessing the storage device using this shape information as a key, and dividing the pattern of the same shape already It has a procedure of searching for whether the pattern has the same shape and a procedure of calling the division processing result of the division-processed pattern from the storage device and applying it to the division-unprocessed pattern when the pattern of the same shape has been division-processed. Pattern division processing procedure,
Each of the divided patterns has a procedure of drawing on a resist formed on a semiconductor substrate by a drawing apparatus and a procedure of transferring the drawn pattern to the semiconductor substrate.

A semiconductor device manufacturing method according to a twenty-sixth aspect of the present invention shares the pattern data of this pattern, the division processing result, and the pattern and the division processing result with respect to the pattern of the shape which is first treated as the division processing target. A procedure for storing pattern data of a pattern that is different from the pattern only in the arrangement direction at an address on the storage device obtained by converting the shape information that depends on the shape of these patterns with a hash function, and the shape of the unprocessed pattern The information is obtained, the storage device is accessed by using this shape information as a key, and the coordinate value change is matched with the procedure of searching for a pattern in which the divided unprocessed pattern and the coordinate value change from the reference coordinate match. If a pattern is found, the division processing result for that pattern is called from the storage device and A pattern division processing procedure including a procedure for applying to an unprocessed pattern, a procedure for drawing each divided pattern on a resist formed on a semiconductor substrate by a drawing device, and a transfer of the drawn pattern to a semiconductor substrate And the procedure to

According to a twenty-seventh aspect of the present invention, there is provided a drawing pattern division processing program for a pattern having a shape that is first treated as a division processing target. The pattern data of this pattern and the division processing result depend on the shape of this pattern. The procedure of storing the shape information in the address on the storage device obtained by converting with the hash function, and obtaining the shape information for the divided unprocessed pattern, accessing the storage device using this shape information as a key The procedure for searching whether or not the division processing has been completed, and the procedure for calling the division processing result of the division-processed pattern from the storage device and applying it to the division-unprocessed pattern when the pattern of the same shape has been division-processed Causes the computer to execute.

According to a twenty-eighth aspect of the present invention, there is provided a drawing pattern division processing program which, for a pattern of a shape that is first treated as a division processing target, outputs the pattern data of this pattern, the division processing result, and the pattern and the division processing result. A procedure for storing pattern data of a pattern that is shared and only differs in the arrangement direction from the pattern at the address on the storage device that is obtained by converting the shape information that depends on the shape of these patterns with a hash function, and a division unprocessed pattern For the shape information, access the storage device using this shape information as a key, and search for a pattern in which the unprocessed pattern and the coordinate value change from the reference coordinates match, and the coordinate value change If a matching pattern is found, the division processing result for that pattern is stored in the storage device. Calls, to execute a procedure to be applied to split unprocessed pattern to a computer.

In a computer-readable recording medium according to claim 29 of the present invention, for a pattern having a shape that is first treated as a division processing target, the pattern data of this pattern and the division processing result depend on the shape of this pattern. The procedure of storing the shape information in the address on the storage device obtained by converting with the hash function, and obtaining the shape information for the divided unprocessed pattern, accessing the storage device using this shape information as a key If the pattern of the same shape has already been divided and the procedure for searching whether or not it has been divided, the divided processing result of the divided pattern is called from the storage device,
A division processing program for a drawing pattern that causes a computer to execute the procedure applied to the division unprocessed pattern is recorded.

In a computer-readable recording medium according to claim 30 of the present invention, for a pattern having a shape to be handled for the first time as a division processing object, pattern data of this pattern, division processing results, and the patterns and the division processing results are displayed. A procedure for storing pattern data of a pattern that is shared and only differs in the arrangement direction from the pattern to an address on the storage device obtained by converting the shape information that depends on the shape of these patterns with a hash function, and a divided unprocessed pattern Shape information is obtained, the storage device is accessed using this shape information as a key, and a procedure for searching whether a pattern in which the unprocessed pattern and the coordinate value change from the reference coordinates match is stored, and the coordinate value change When a matching pattern is found, the division processing result for that pattern is stored in the storage device. Et call division processing program of the drawing pattern to execute the steps of applying to the divided raw pattern in a computer is recorded.

That is, according to the present invention, the division processing result of the pattern which has been processed once is registered and stored in the database so that when a pattern having the same shape as the registered pattern appears as the next processing target. , The division result of the pattern that has already been processed and registered in the database can be applied to the pattern to be processed. As a result, the division process can be performed so that the division results are the same among the patterns having the same shape. Further, when there are a plurality of patterns having the same shape as the processing target, the division optimization processing only needs to be performed on the first one, so that the processing speed can be increased. In addition, by using the hash method as the method of registering and searching in the database, it is not necessary to newly perform division optimization processing even for patterns in which patterns of the same shape are only rotated or inverted, and already processed. The already-divided results can be applied in the same manner, so that the patterns having the same shape can all have the same division result regardless of the difference in the arrangement direction.

The drawing pattern data divided in this way is input to the drawing device, and in response to this, the drawing device forms a pattern on a resist formed on a mask substrate or a semiconductor substrate by a charged particle beam (for example, an electron beam). Draw with a line. The pattern drawn on the resist is transferred to a mask substrate or a semiconductor substrate through subsequent development and etching treatments. The mask substrate thus obtained is used as a mask for exposing and transferring a pattern onto a semiconductor substrate. On the other hand, a semiconductor substrate on which a pattern is directly drawn by a drawing device is a semiconductor substrate on which a pattern is formed by a so-called direct drawing method without using a mask. The semiconductor substrate manufactured by direct drawing or using a mask is then subjected to various processes, and a semiconductor device is completed through a chip dividing process, a bonding process, a packaging process, and the like.

[0043]

BEST MODE FOR CARRYING OUT THE INVENTION Embodiments of the present invention will be described below with reference to the drawings.

FIG. 2 is a block diagram showing the configuration of the drawing pattern division processing apparatus according to the embodiment of the present invention. The division processing device includes a retrieval unit 12 that receives an input of a design pattern, a division optimization processing unit 13 and a division result extraction unit 15 that receive the output of the retrieval unit 12, and a registration unit 14 that receives the output of the division optimization processing unit 13. And search means 1
2, a registration unit 14, and a storage device 11 accessible by the division result extraction unit 15. The processing results of the division optimization processing unit 13 and the division result extraction unit 15 are the drawing device 1
Is output to. The drawing apparatus 1 is the electron beam drawing apparatus 1 described above with reference to FIG. 6, and the operation is the same.

The division processing device is specifically a computer, and the processes of the various processing means 12 to 15 are executed by a central processing unit (CPU).

The drawing pattern division processing program according to this embodiment is stored in the above-mentioned storage device 11 or a storage device provided separately, and the central processing unit decodes the program when the program is executed.
The pattern data (for example, the coordinate value data of the vertices) stored in the storage device is read and the procedure described below is executed.

Next, referring to the flowchart of FIG.
The flow of the pattern division processing according to this embodiment will be described.

First, as step S1, input processing of pattern data to be divided is performed. That is, the design pattern data is input to the search means 12.

Then, a search process is performed. In this, the search means 12 accesses the database (hash table) in the storage device 11 to search whether the pattern having the same shape as the input pattern has already been divided (steps S2 and S3). Note that registration and search in the hash table will be described in detail later.

As a result of this search, the pattern to be divided now (hereinafter referred to as the input pattern)
If the pattern having the same shape as is not registered in the hash table (No in step S3), that is, if the pattern having the same shape as the input pattern has not been divided yet, The optimization processing means 13 performs division optimization processing on the input pattern so as to avoid the generation of minute patterns (step S4).

When this division optimizing process is completed, the registration means 14 registers the result of the division optimizing process and the pattern data of the pattern subjected to the division optimizing process in the hash table (step S5), and the division is performed. The processing result (pattern data in which the dividing line is set) is output as drawing pattern data to be input to the drawing apparatus 1.

As a result of the search, if the pattern having the same shape as the input pattern has already been divided (Yes in step S3), the division result extracted by the division result extracting means 15 is registered. Is extracted from the hash table (step S4 ′) and is set as an output result (step S6). Specifically, in step S4 ′, the division processing result for the pattern having the same shape as the input pattern is copied and extracted from the hash table, and the extracted pattern is rotated so as to have the same arrangement orientation as the input pattern. And a reversing process are performed, and the result is output as a division process result for the input pattern.

That is, if the pattern having the same shape as the input pattern has already been divided, the steps S4 and S5 can be omitted, so that the processing can be speeded up. In particular, not having to newly perform the processing based on the determination such as how to divide a minute pattern to be generated in step S4 greatly contributes to shortening the processing time. Further, since the same division result can be obtained between the patterns having the same shape, it is possible to suppress the variation in the drawing accuracy between the patterns having the same shape. In particular, in a portion where patterns of the same shape are repeatedly arranged or a portion where they are arranged in a mirror image relationship, variation in performance between patterns can be suppressed, and quality deterioration can be prevented.

In step S7, it is determined whether or not there is an input pattern, and the series of processes described above is performed until there is no input pattern.

Next, the details of the database for storing the divided pattern data and the divided result will be described.

As this database, a hash table generally known as a data structure capable of realizing high-speed search is used. When registering / searching data,
A certain arithmetic operation is performed on the key that identifies each data, and the data is converted into a numerical value that fits within a certain number of addresses. If the key is k and the function for performing this conversion is f, the address p at which the data having the key k is stored
Is determined as p = f (k).

The method of converting the key k given in this way into another numerical value by a certain function and obtaining the storage address (address) p on the recording medium is called hashing (hash method), and its function f is Hash function, function value p = f
(K) is called a hash value (hash address). Various hash functions have been adopted, but it is often adopted to perform a division and adopt the remainder.

For example, as shown in Table 1, product number 30
The product A of 15 and the product B of the product number 3034 and the product C of the product number 3035 have a size of 16 (the storage area is 16
There will be a case where the hash table is stored in each storage area (each of which has an address).

[0059]

[Table 1]

In this case, each product number is a key, and Table 1
As shown in, the hash value (address) is obtained by dividing each key by the size 16 of the table. That is, the product A with the product number 3015 is stored at the address 7 on the hash table. In this way, since the correspondence between the key for identifying each product and the address is obtained, the area in which the product of this product number is stored can be easily and quickly accessed using the product number as a key.

In this embodiment, the key uses shape information depending on the shape of each pattern (for example, the perimeter which is the sum of each side). As a result, as in the two patterns 24a and 24b shown in FIG. 3, if the arrangement directions are different from each other but the shapes are the same, the keys (peripheral length) are the same, so the same hash value (address) is obtained. The
Patterns of the same shape can be stored at the same address regardless of the arrangement direction. That is, even if the orientations are various, if they have the same shape, they can be collectively treated as the same shape pattern.

No in the determination in step S3 described above.
In this case, division optimization processing is performed on the input pattern (step S4), and the result is registered in the hash table (step S5). As shown in FIG. 4, consider a case where the division optimization process is performed on the F-shaped pattern 25, for example. First, pattern 2
The perimeter of 5 is obtained, and this is used as a key k, and this key k is divided by the size of the hash table to obtain N, and various data are registered at address N on the hash table as shown in FIG. To do.

As the data to be registered, the pattern data of the pattern 25 itself which is actually subjected to the division optimization processing, the division processing result (data indicated by reference numeral 25a in FIG. 5), and further the pattern 25 is 90 °, for example. It is pattern data of a pattern rotated for each of them and a pattern obtained by reversing each of these rotated patterns.

Then, the search is performed as follows. After the registration of the pattern 25 as described above, when a pattern having the same shape as the pattern 25 comes in as an input pattern, the perimeter of this input pattern is obtained, and this perimeter is used as a key k to obtain a hash value N. Is obtained. Since the input pattern has the same shape as the registered pattern 25, the perimeter (= key k) is naturally the same and the obtained hash values are also the same. Then, when the obtained hash value (address) N is accessed, as shown in FIG. 5, the pattern 25 that has already been divided and the data of the pattern having a different direction, and further the divided processing result 25a are stored. Has been done. The division processing result 25a
Is for pattern 25, but pattern 25
It is also a division result for other patterns having the same shape, which are different from each other and are stored only in the same orientation.

Then, the change in the coordinate value of each vertex in a predetermined direction from a certain reference coordinate (for example, the coordinate of the lower left vertex) is compared between each pattern stored as processed and the input pattern. If there is a match in the coordinate value change, it is determined that the division optimization process has already been performed on the pattern having the same shape as the input pattern (that is, Yes in S3).

If, as the processed pattern data, only the pattern 25 having a certain arrangement orientation for which the division optimization process has been actually performed is registered, the shape is the same as that of the pattern 25 as the input pattern and the arrangement orientation is set. When there is a different pattern, even if the address N is accessed using the perimeter as the key k, it is determined that the coordinate value change does not match, and it is determined that the processing has not been completed, and the division optimization processing is performed again in step S4. Will be done. That is, if the patterns have the same shape, useless processing will be performed although the same division result can be applied regardless of the difference in the arrangement direction. Furthermore, the division optimization process performed again for the input pattern does not always divide the pattern 25 in the same manner as the division result 25a of the pattern 25 that has already been processed. There is also a risk of being invited.

In addition, even if the patterns have different shapes, the perimeter may be the same. For example, as shown in FIG. 5, when the perimeters of the pattern 25 and the pattern 26 are the same, the hash values (addresses) N obtained are also the same, so the patterns 25 and 26 having different shapes are formed.
And are stored at the same address N. In this case, the division results are stored in association with each of the patterns 25 and 26. Then, at the time of search, one input pattern and one processed pattern data are sequentially input as described above.
A pattern having the same shape as the input pattern is searched by looking at the change in the coordinate value from the reference coordinate.

As a result of the above search, if it is found that the pattern having the same shape as the input pattern has already been divided (Yes in step S3), it is registered as described above. The division processing result (for example, 25a) is copied and extracted from the hash table (step S4 ′), and further, the division processing result 25a is rotated or inverted so that it has the same arrangement orientation as the input pattern, and the result Is output as the division processing result for the input pattern.

The pattern thus divided is input to the drawing apparatus 1 as drawing data.
When a pattern is drawn on the resist formed on the semiconductor substrate (for example, a silicon wafer) 8 by the drawing apparatus 1 (in the case of so-called direct drawing), the resist is then developed to remove this resist. As a mask, the semiconductor substrate 8 is etched, a thin film is formed, and the like.

On the other hand, for example, when a pattern is drawn on the resist formed on the mask substrate 9 in which the chromium film is formed on the quartz substrate, the resist is developed after this and the chromium is used as a mask. The film is etched to obtain a mask with the desired pattern. Then, by exposure transfer using this mask, the pattern on the mask is transferred and formed on the semiconductor substrate.

As described above, in the present embodiment, since the division optimization process for the pattern of the same shape is performed only once, the processing speed of the pattern data of the semiconductor memory unit having a large number of patterns of the same shape is particularly high. Higher speed can be realized. As a result, a semiconductor device obtained by the time required for mask formation, the manufacture of a semiconductor substrate obtained by exposure transfer or direct writing using the mask, and the step of dividing the semiconductor substrate into chips and packaging. It is also possible to reduce the time required for manufacturing. In addition, since the division results for the patterns of the same shape are the same regardless of the arrangement direction, it is possible to suppress phenomena such as variations in line width between patterns of the same shape due to differences in division. It is possible to prevent the deterioration of the quality of the semiconductor substrate obtained by the above-mentioned exposure transfer or direct drawing, and further the semiconductor device obtained through the step of dividing the semiconductor substrate into chips and the packaging.

Although the embodiments of the present invention have been described above, needless to say, the present invention is not limited to these, and various modifications can be made based on the technical idea of the present invention.

In the above-mentioned embodiment, the perimeter of the pattern is used as the shape information of the pattern used as the key, but in addition, depending on the shape of each pattern, for example, the area of the pattern, the number of vertices, the sum of interior angles, etc. You may use.
Alternatively, a combination of these may be used as a key.

Further, the present invention can be applied not only to division processing for eliminating minute patterns, but also to division processing of a donut pattern, which must be divided for mask making, for example.

[0075]

According to the first and sixth aspects of the present invention, the same division result can be obtained between the same shape patterns.
It is possible to suppress variations in drawing accuracy between patterns of the same shape due to differences in division results. Further, once the same shape pattern has been subjected to the division optimization processing, the division result can be used as it is thereafter. Therefore, particularly when the division processing has to be performed for a large number of the same shape patterns, the processing time is significantly increased. It will be shortened.

According to claims 2, 4, 7, 27 and 29 of the present invention, since the same division result can be obtained between the same shape patterns, the drawing precision between the same shape patterns due to the difference in the division result can be improved. Variations can be suppressed. Furthermore, once the same shape pattern has been subjected to division optimization processing, the division result can be used as it is.
In particular, the processing time is greatly shortened when the division processing has to be performed on many patterns of the same shape.
Furthermore, when searching whether or not a pattern having the same shape as the input pattern has already been divided, a hash that stores the processed pattern and the division processing result in advance at the address calculated by the key value. High speed search can be performed by adopting the method.

According to claims 3, 5, 8, 28, and 30 of the present invention, since the same division result can be obtained between the same shape patterns, the drawing precision between the same shape patterns due to the difference in the division result can be improved. Variations can be suppressed. Furthermore, once the same shape pattern has been subjected to division optimization processing, the division result can be used as it is.
In particular, the processing time is greatly shortened when the division processing has to be performed on many patterns of the same shape.
Furthermore, when searching whether or not a pattern having the same shape as the input pattern has already been divided, a hash that stores the processed pattern and the division processing result in advance at the address calculated by the key value. High speed search can be performed by adopting the method. Further, even with respect to the same shape pattern having different arrangement directions, the division result can be made the same between these patterns, and unnecessary processing is not required.

According to the ninth and the twelfth aspects of the present invention, since the same division pattern can be obtained with the same division result, it is possible to suppress the variation in the drawing precision between the same formation patterns due to the difference in the division result. Further, once the same shape pattern has been subjected to the division optimization processing, the division result can be used as it is thereafter. Therefore, particularly when the division processing has to be performed for a large number of the same shape patterns, the processing time is significantly increased. It will be shortened. As a result, it is possible to shorten the creation time of the mask on which the pattern divided as described above is drawn and to prevent the quality from deteriorating.

According to the tenth and thirteenth aspects of the present invention, it is possible to obtain the same division result between the same shape patterns, so that it is possible to suppress the variation in the drawing accuracy between the same shape patterns due to the difference in the division result. Further, once the same shape pattern has been subjected to the division optimization processing, the division result can be used as it is thereafter. Therefore, particularly when the division processing has to be performed for a large number of the same shape patterns, the processing time is significantly increased. It will be shortened. Furthermore, when searching whether or not a pattern having the same shape as the input pattern has already been divided, a hash that stores the processed pattern and the division processing result in advance at the address calculated by the key value. High speed search can be performed by adopting the method. As a result, it is possible to shorten the creation time of the mask on which the pattern divided as described above is drawn and to prevent the quality from deteriorating.

According to the eleventh and fourteenth aspects of the present invention, it is possible to obtain the same division result between the same shape patterns, so that it is possible to suppress the variation in the drawing accuracy between the same shape patterns due to the difference in the division result. Further, once the same shape pattern has been subjected to the division optimization processing, the division result can be used as it is thereafter. Therefore, particularly when the division processing has to be performed for a large number of the same shape patterns, the processing time is significantly increased. It will be shortened. Furthermore, when searching whether or not a pattern having the same shape as the input pattern has already been divided, a hash that stores the processed pattern and the division processing result in advance at the address calculated by the key value. High speed search can be performed by adopting the method. Further, even with respect to the same shape pattern having different arrangement directions, the division result can be made the same between these patterns, and unnecessary processing is not required. As a result, it is possible to shorten the creation time of the mask on which the pattern divided as described above is drawn and to prevent the quality from deteriorating.

According to the fifteenth and twenty-first aspects of the present invention, it is possible to obtain the same division result between the same shape patterns, so that it is possible to suppress the variation in the drawing accuracy between the same shape patterns due to the difference in the division result. Further, once the same shape pattern has been subjected to the division optimization processing, the division result can be used as it is thereafter. Therefore, particularly when the division processing has to be performed for a large number of the same shape patterns, the processing time is significantly increased. It will be shortened. As a result, it is possible to shorten the manufacturing time and prevent the quality deterioration of the semiconductor substrate obtained by using the mask on which the divided pattern is drawn as described above and the semiconductor device obtained from the semiconductor substrate.

According to the sixteenth and twenty-second aspects of the present invention, since the same division result can be obtained between the same shape patterns, it is possible to suppress the variation of the drawing accuracy between the same shape patterns due to the difference of the division result. Further, once the same shape pattern has been subjected to the division optimization processing, the division result can be used as it is thereafter. Therefore, particularly when the division processing has to be performed for a large number of the same shape patterns, the processing time is significantly increased. It will be shortened. Furthermore, when searching whether or not a pattern having the same shape as the input pattern has already been divided, a hash that stores the processed pattern and the division processing result in advance at the address calculated by the key value. High speed search can be performed by adopting the method. As a result, it is possible to shorten the manufacturing time and prevent the quality deterioration of the semiconductor substrate obtained by using the mask on which the divided pattern is drawn as described above and the semiconductor device obtained from the semiconductor substrate.

According to the seventeenth and twenty-third aspects of the present invention, it is possible to obtain the same division result between the same shape patterns, so that it is possible to suppress the variation in the drawing accuracy between the same shape patterns due to the difference in the division result. Further, once the same shape pattern has been subjected to the division optimization processing, the division result can be used as it is thereafter. Therefore, particularly when the division processing has to be performed for a large number of the same shape patterns, the processing time is significantly increased. It will be shortened. Furthermore, when searching whether or not a pattern having the same shape as the input pattern has already been divided, a hash that stores the processed pattern and the division processing result in advance at the address calculated by the key value. High speed search can be performed by adopting the method. Further, even with respect to the same shape pattern having different arrangement directions, the division result can be made the same between these patterns, and unnecessary processing is not required. As a result, it is possible to shorten the manufacturing time and prevent the quality deterioration of the semiconductor substrate obtained by using the mask on which the divided pattern is drawn as described above and the semiconductor device obtained from the semiconductor substrate.

According to the eighteenth and twenty-fourth aspects of the present invention, it is possible to obtain the same division result between the same shape patterns, so that it is possible to suppress the variation of the drawing accuracy between the same shape patterns due to the difference of the division result. Further, once the same shape pattern has been subjected to the division optimization processing, the division result can be used as it is thereafter. Therefore, particularly when the division processing has to be performed for a large number of the same shape patterns, the processing time is significantly increased. It will be shortened. As a result, it is possible to shorten the manufacturing time and prevent the quality deterioration of the semiconductor substrate on which the pattern divided as described above is drawn and the semiconductor device obtained from this semiconductor substrate.

According to the nineteenth and twenty-fifth aspects of the present invention, it is possible to obtain the same division result between the same shape patterns, so that it is possible to suppress the variation in the drawing accuracy between the same shape patterns due to the difference in the division result. Further, once the same shape pattern has been subjected to the division optimization processing, the division result can be used as it is thereafter. Therefore, particularly when the division processing has to be performed for a large number of the same shape patterns, the processing time is significantly increased. It will be shortened. Furthermore, when searching whether or not a pattern having the same shape as the input pattern has already been divided, a hash that stores the processed pattern and the division processing result in advance at the address calculated by the key value. High speed search can be performed by adopting the method. As a result, it is possible to shorten the manufacturing time and prevent the quality deterioration of the semiconductor substrate on which the pattern divided as described above is directly drawn by the drawing apparatus or the semiconductor device obtained from this semiconductor substrate.

According to the twentieth and twenty-sixth aspects of the present invention, it is possible to obtain the same division result between the same shape patterns, so that it is possible to suppress the variation in the drawing accuracy between the same shape patterns due to the difference in the division result. Further, once the same shape pattern has been subjected to the division optimization processing, the division result can be used as it is thereafter. Therefore, particularly when the division processing has to be performed for a large number of the same shape patterns, the processing time is significantly increased. It will be shortened. Furthermore, when searching whether or not a pattern having the same shape as the input pattern has already been divided, a hash that stores the processed pattern and the division processing result in advance at the address calculated by the key value. High speed search can be performed by adopting the method. Further, even with respect to the same shape pattern having different arrangement directions, the division result can be made the same between these patterns, and unnecessary processing is not required. As a result, it is possible to shorten the manufacturing time and prevent the quality deterioration of the semiconductor substrate on which the pattern divided as described above is directly drawn by the drawing apparatus or the semiconductor device obtained from this semiconductor substrate.

[Brief description of drawings]

FIG. 1 is a flowchart showing a flow of a drawing pattern division process according to an embodiment of the present invention.

FIG. 2 is a block diagram showing a configuration of a division processing device according to the same embodiment.

FIG. 3 is a diagram illustrating shape information of an input pattern.

FIG. 4 is a diagram showing processed patterns registered in a hash table.

FIG. 5 is a diagram showing a hash table.

FIG. 6 is a schematic perspective view of a variable shaping type electron beam drawing apparatus.

FIG. 7 is a diagram showing an example of division of minute pattern generation.

FIG. 8 is a diagram showing an example of division in which a minute pattern does not occur.

FIG. 9 is a diagram showing an example of division processing of a conventional symmetrical arrangement pattern.

[Explanation of symbols]

1 ... Electron beam drawing apparatus, 2 ... Electron gun, 3 ... First aperture, 3a ... Aperture, 4 ... Molding deflector, 5 ... Second
Aperture, 5a ... Aperture, 6 ... Objective lens, 7 ...
Positioning deflector, 8 ... Semiconductor substrate, 9 ... Mask substrate, 11 ... Storage device, 12 ... Search means, 14 ... Registration means, 15 ... Division result extraction means.

   ─────────────────────────────────────────────────── ─── Continued front page    (54) [Title of Invention] Drawing pattern division processing method, drawing pattern division processing device, drawing method, mask, mask                     Creation method, semiconductor device, semiconductor device manufacturing method, drawing pattern division processing program, and                     Computer-readable recording medium recording program

Claims (30)

[Claims] 1. A method of dividing a drawing pattern, which divides a pattern to be drawn on a resist into patterns that can be drawn by a drawing apparatus, and a division result of a pattern having a shape that is first treated as a division processing target. Is stored in a storage device, and thereafter, for a pattern having the same shape as the held pattern, the division processing result of the held pattern is applied. . 2. A method for dividing a drawing pattern, which divides a pattern to be drawn on a resist into patterns that can be drawn by a drawing apparatus, wherein the pattern has a shape that is first treated as a division target. And a step of storing the pattern data and the division processing result of the pattern information in an address on the storage device obtained by converting the shape information depending on the shape of the pattern with a hash function, The procedure of accessing the storage device by using the shape information as a key and searching whether or not the pattern of the same shape has already been divided, and if the pattern of the same shape has been divided, A procedure of calling the division processing result from the storage device and applying it to the division unprocessed pattern. A method for dividing a characteristic drawing pattern. 3. A drawing pattern division processing method for dividing a pattern to be drawn on a resist into patterns that can be drawn by a drawing apparatus, wherein the pattern is a pattern that is first treated as a division processing target. Pattern data, division processing results,
And storing pattern data of a pattern that shares a division processing result with the pattern and is different from the pattern only in an arrangement direction, at an address on a storage device obtained by converting shape information depending on the shape of the pattern with a hash function. And the shape information for the divided unprocessed pattern is accessed, the storage device is accessed by using the shape information as a key, and whether the divided unprocessed pattern and the pattern whose coordinate value change from the reference coordinates match are stored. If a pattern that matches the coordinate value change is found,
A method of dividing a drawing pattern, comprising a step of calling a division processing result for the pattern from the storage device and applying it to the division unprocessed pattern. 4. A drawing pattern division processing apparatus for dividing a pattern to be drawn on a resist into patterns that can be drawn by a drawing apparatus, wherein the pattern is a pattern that is first treated as a division processing target. Registering means for storing the pattern data of and the division processing result in an address obtained by converting the shape information depending on the shape of the pattern with a hash function; a storage device having a storage area specified by the address; Retrieval means for obtaining the shape information of an unprocessed pattern, accessing the storage device by using the shape information as a key, and searching whether or not the pattern of the same shape has already been divided, and dividing the pattern of the same shape If the division processing result of the division processing completed pattern is called from the storage device, Division processing unit of the drawing pattern characterized by comprising a dividing result extraction means for applying the divided raw pattern. 5. A division processing device for a drawing pattern, which divides a pattern to be drawn on a resist into patterns that can be drawn by a drawing device, wherein the pattern has a shape that is first treated as a division processing target. Pattern data, division processing results,
And storing pattern data of a pattern that shares a division processing result with the pattern and is different from the pattern only in the orientation, at an address on a storage device obtained by converting shape information depending on the shape of the pattern with a hash function. Registration means for storing, a storage device having a storage area specified by the address, obtaining the shape information for the divided unprocessed pattern, accessing the storage device using the shape information as a key, and the divided unprocessed pattern and the reference. Retrieval means for searching whether or not a pattern in which coordinate value changes from coordinates match is stored, and when a pattern in which the coordinate value changes match is found,
A division processing device for a drawing pattern, comprising division result extraction means for calling a division processing result for the pattern from the storage device and applying it to the division unprocessed pattern. 6. A drawing method in which a pattern to be drawn on a resist is divided into patterns which can be drawn by a drawing device, and the divided pattern is drawn on the resist by the drawing device. At the time of the division processing, the division processing result is held in the storage device for the pattern of the shape that is first treated as the division processing target, and thereafter, for the pattern of the same shape as the held pattern, A drawing method characterized by applying the division processing result of. 7. A drawing method in which a pattern to be drawn on a resist is divided into patterns which can be drawn by a drawing device, and the divided pattern is drawn on the resist by the drawing device, The division processing is an address on a storage device obtained by converting the pattern data of the pattern and the division processing result for the pattern of the shape which is first treated as the division processing target, by using the hash function to convert the shape information depending on the shape of the pattern. And a procedure for obtaining the shape information for the divided unprocessed pattern, accessing the storage device using the shape information as a key, and searching for a pattern of the same shape that has already been divided. When the shape pattern has been divided, the divided processing result of the divided pattern is stored in the storage device. Et call, drawing method and having a procedure to be applied to the divided unprocessed pattern. 8. A drawing method in which a pattern to be drawn on a resist is divided into patterns that can be drawn by a drawing device, and the divided pattern is drawn on the resist by the drawing device, The division processing is performed on the pattern data of the shape that is first treated as the division processing target, the pattern data of the pattern, the division processing result,
And storing pattern data of a pattern that shares a division processing result with the pattern and is different from the pattern only in an arrangement direction, at an address on a storage device obtained by converting shape information depending on the shape of the pattern with a hash function. And the shape information for the divided unprocessed pattern is accessed, the storage device is accessed by using the shape information as a key, and whether the divided unprocessed pattern and the pattern whose coordinate value change from the reference coordinates match are stored. If a pattern that matches the coordinate value change is found,
And a procedure of calling a division processing result for the pattern from the storage device and applying the division processing result to the division unprocessed pattern. 9. The divided pattern is drawn on a resist formed on a mask substrate by a drawing device for each divided pattern, and the drawn pattern is transferred and formed on the mask substrate. In the mask, at the time of the division processing, a division processing result is held in a storage device for a pattern of a shape that is first treated as a division processing target, and thereafter, for a pattern of the same shape as the held pattern, A mask to which the result of division processing of the held pattern is applied. 10. The divided pattern is drawn on a resist formed on a mask substrate by a drawing device for each divided pattern, and the drawn pattern is transferred and formed on the mask substrate. In the mask, the division processing is a memory obtained by converting the pattern data of the pattern and the division processing result for the pattern of the shape that is first treated as the division processing target, by converting the shape information depending on the shape of the pattern with a hash function. Procedure for storing in the address on the device: Obtaining the shape information for the unprocessed pattern, accessing the storage device using the shape information as a key, and searching whether the pattern of the same shape has already been subjected to the dividing process. If the pattern and the pattern of the same shape have already been divided, A call from the storage device, the mask being characterized in that made by the procedure to be applied to the divided unprocessed pattern. 11. The divided pattern is drawn on a resist formed on a mask substrate by a drawing device for each divided pattern, and the drawn pattern is transferred and formed on the mask substrate. In the mask, the division processing is: pattern data of the pattern, division processing result,
And storing pattern data of a pattern that shares a division processing result with the pattern and is different from the pattern only in an arrangement direction, at an address on a storage device obtained by converting shape information depending on the shape of the pattern with a hash function. And the shape information for the divided unprocessed pattern is accessed, the storage device is accessed by using the shape information as a key, and whether the divided unprocessed pattern and the pattern whose coordinate value change from the reference coordinates match are stored. If a pattern that matches the coordinate value change is found,
A mask obtained by calling a division processing result for the pattern from the storage device and applying the division processing result to the division unprocessed pattern. 12. A step of dividing a pattern, a step of drawing each divided pattern on a resist formed on a mask substrate by a drawing device, and a step of transferring the drawn pattern to the mask substrate. In the method of creating a mask having, a division processing result is stored in a storage device for a pattern having a shape that is first treated as a division processing target, and thereafter, a pattern having the same shape as the held pattern is stored. For the above, a method for creating a mask is characterized in that the held pattern division processing result is applied. 13. A step of dividing a pattern, a step of drawing each divided pattern on a resist formed on a mask substrate by a drawing device, and a step of transferring the drawn pattern to the mask substrate. In the method for creating a mask having and, for the pattern of the shape that is first treated as a target of the partitioning process, The procedure of storing at the address on the storage device obtained by conversion, obtaining the shape information for the division unprocessed pattern, accessing the storage device with the shape information as a key, and dividing the pattern of the same shape already If the pattern of the same shape has already been divided, the procedure for searching A method of creating a mask, comprising a step of calling a division processing result of a processed pattern from the storage device and applying it to the division unprocessed pattern. 14. A step of dividing a pattern, a step of drawing each divided pattern on a resist formed on a mask substrate by a drawing device, and a step of transferring the drawn pattern to the mask substrate. In the method of creating a mask having and, the division processing includes pattern data of the pattern, division processing results,
And storing pattern data of a pattern that shares a division processing result with the pattern and is different from the pattern only in an arrangement direction, at an address on a storage device obtained by converting shape information depending on the shape of the pattern with a hash function. And the shape information for the divided unprocessed pattern is accessed, the storage device is accessed by using the shape information as a key, and whether the divided unprocessed pattern and the pattern whose coordinate value change from the reference coordinates match are stored. If a pattern that matches the coordinate value change is found,
And a step of calling a division processing result for the pattern from the storage device and applying the division processing result to the division unprocessed pattern. 15. The divided pattern is drawn on a resist formed on a mask substrate by a drawing device for each divided pattern, and the drawn pattern is transferred and formed on the mask substrate. In a semiconductor device in which the pattern is exposed and transferred onto a semiconductor substrate using a mask, the division processing result is held in a storage device for a pattern having a shape that is first treated as a division processing target during the division processing. A semiconductor device, wherein a division processing result of the held pattern is applied to a pattern having the same shape as the held pattern. 16. The divided pattern is drawn on a resist formed on a mask substrate by a drawing device for each divided pattern, and the drawn pattern is transferred and formed on the mask substrate. In a semiconductor device in which the pattern is exposed and transferred to a semiconductor substrate by using a mask, the division processing is performed by dividing the pattern data of the pattern and the division processing result with respect to the shape of the pattern that is first treated as a division processing target. The procedure for storing the shape information that depends on the hash value in the address on the storage device obtained by conversion with a hash function, and obtaining the shape information for the divided unprocessed pattern, accessing the storage device using the shape information as a key, and The procedure to search whether the shape pattern has already been divided and the pattern of the same shape is divided. If it was management already, the divided processed division processing result of the pattern calls from said storage device, and wherein a made by the procedure to be applied to the divided unprocessed pattern. 17. The divided pattern is drawn on a resist formed on a mask substrate by a drawing device for each divided pattern, and the drawn pattern is transferred and formed on the mask substrate. In a semiconductor device in which the pattern is exposed and transferred to a semiconductor substrate using a mask, the division processing is performed on a pattern having a shape that is first treated as a division processing target, pattern data of the pattern, division processing results,
And storing pattern data of a pattern that shares a division processing result with the pattern and is different from the pattern only in an arrangement direction, at an address on a storage device obtained by converting shape information depending on the shape of the pattern with a hash function. And the shape information for the divided unprocessed pattern is accessed, the storage device is accessed by using the shape information as a key, and whether the divided unprocessed pattern and the pattern whose coordinate value change from the reference coordinates match are stored. If a pattern that matches the coordinate value change is found,
And a procedure of calling a division processing result for the pattern from the storage device and applying the division processing result to the division unprocessed pattern. 18. A semiconductor device in which a divided pattern is drawn on a resist formed on a semiconductor substrate by a drawing device for each divided pattern, and the drawn pattern is transferred to the semiconductor substrate. At the time of the division processing, the division processing result is stored in the storage device for the pattern of the shape that is first treated as the division processing target, and thereafter, for the pattern of the same shape as the held pattern, the storage is performed. A semiconductor device, to which the result of the pattern division processing is applied. 19. A semiconductor device in which a divided pattern is drawn on a resist formed on a semiconductor substrate by a drawing device for each divided pattern, and the drawn pattern is transferred to the semiconductor substrate. On the storage device obtained by converting the pattern data of the pattern and the division processing result of the shape information depending on the shape of the pattern with a hash function for the pattern of the shape that is first treated as the division processing target. And a step of obtaining the shape information for the divided unprocessed pattern, accessing the storage device using the shape information as a key, and searching whether the pattern of the same shape has already been divided. , If the pattern of the same shape has been divided, the divided result of the divided pattern is Retrieved from the storage device, and wherein a made by the procedure to be applied to the divided unprocessed pattern. 20. A semiconductor device in which a divided pattern is drawn on a resist formed on a semiconductor substrate by a drawing device for each divided pattern, and the drawn pattern is transferred to the semiconductor substrate. , The division processing is, for a pattern of a shape that is first treated as a division processing target, the pattern data of the pattern, the division processing result,
And storing pattern data of a pattern that shares a division processing result with the pattern and is different from the pattern only in an arrangement direction, at an address on a storage device obtained by converting shape information depending on the shape of the pattern with a hash function. And the shape information for the divided unprocessed pattern is accessed, the storage device is accessed by using the shape information as a key, and whether the divided unprocessed pattern and the pattern whose coordinate value change from the reference coordinates match are stored. If a pattern that matches the coordinate value change is found,
And a procedure of calling a division processing result for the pattern from the storage device and applying the division processing result to the division unprocessed pattern. 21. A step of dividing a pattern, a step of drawing each divided pattern on a resist formed on a mask substrate by a drawing device, and a step of transferring the drawn pattern to the mask substrate. In a method of manufacturing a semiconductor device having a step of obtaining a mask and a step of exposing and transferring the pattern onto a semiconductor substrate using the mask, in the division processing, a division processing is performed on a pattern of a shape which is first treated as a division processing target. A method of manufacturing a semiconductor device, wherein a result is held in a storage device, and thereafter, a division processing result of the held pattern is applied to a pattern having the same shape as the held pattern. 22. A step of dividing a pattern, a step of drawing each divided pattern on a resist formed on a mask substrate by a drawing device, and a step of transferring the drawn pattern to the mask substrate. In a method of manufacturing a semiconductor device having a procedure of obtaining a mask and a procedure of exposing and transferring the pattern onto a semiconductor substrate using the mask, the division processing is a pattern of a shape that is first treated as a division processing object, And a step of storing the pattern data and the division processing result of the pattern information in an address on the storage device obtained by converting the shape information depending on the shape of the pattern with a hash function, and obtaining the shape information for the divided unprocessed pattern, The storage device is accessed using the shape information as a key, and the pattern of the same shape has already been divided. And if the patterns of the same shape have been divided, the divided processing result of the divided pattern is called from the storage device and applied to the divided unprocessed pattern. A method for manufacturing a characteristic semiconductor device. 23. A step of dividing a pattern, a step of drawing each divided pattern on a resist formed on a mask substrate by a drawing device, and a step of transferring the drawn pattern to the mask substrate. In a method of manufacturing a semiconductor device having a procedure of obtaining a mask and a procedure of exposing and transferring the pattern onto a semiconductor substrate using the mask, the division processing is a pattern of a shape that is first treated as a division processing object, Pattern data, division processing results,
And storing pattern data of a pattern that shares a division processing result with the pattern and is different from the pattern only in an arrangement direction, at an address on a storage device obtained by converting shape information depending on the shape of the pattern with a hash function. And the shape information for the divided unprocessed pattern is accessed, the storage device is accessed by using the shape information as a key, and whether the divided unprocessed pattern and the pattern whose coordinate value change from the reference coordinates match are stored. If a pattern that matches the coordinate value change is found,
A method of manufacturing a semiconductor device, comprising a step of calling a division processing result for the pattern from the storage device and applying the division processing result to the division unprocessed pattern. 24. A step of dividing a pattern, a step of drawing each divided pattern on a resist formed on a semiconductor substrate by a drawing device, and a step of transferring the drawn pattern to the semiconductor substrate. In the method of manufacturing a semiconductor device having the above, in the division processing, a division processing result is held in a storage device for a pattern having a shape that is first treated as a division processing target, and thereafter, the same shape as the held pattern is stored. A method of manufacturing a semiconductor device, wherein the divided pattern division result of the held pattern is applied to a pattern. 25. A step of dividing a pattern, a step of drawing each divided pattern on a resist formed on a semiconductor substrate by a drawing device, and a step of transferring the drawn pattern to the semiconductor substrate. In the method for manufacturing a semiconductor device having, the division processing is performed on a pattern of a shape that is treated as a division processing target for the first time, by using pattern data of the pattern and division processing results, shape information that depends on the shape of the pattern is calculated by The procedure of storing in the address on the storage device obtained by conversion in step 2. Obtaining the shape information for the unprocessed pattern, accessing the storage device using the shape information as a key, and dividing the pattern of the same shape already If the pattern of the same shape has already been divided, A method of manufacturing a semiconductor device, comprising a step of calling a division processing result of a division processed pattern from the storage device and applying the division processing result to the division unprocessed pattern. 26. A step of dividing a pattern, a step of drawing each divided pattern on a resist formed on a semiconductor substrate by a drawing device, and a step of transferring the drawn pattern to the semiconductor substrate. In the method for manufacturing a semiconductor device having, the division processing includes: pattern data of the pattern, division processing results,
And storing pattern data of a pattern that shares a division processing result with the pattern and is different from the pattern only in an arrangement direction, at an address on a storage device obtained by converting shape information depending on the shape of the pattern with a hash function. And the shape information for the divided unprocessed pattern is accessed, the storage device is accessed by using the shape information as a key, and whether the divided unprocessed pattern and the pattern whose coordinate value change from the reference coordinates match are stored. If a pattern that matches the coordinate value change is found,
A method of manufacturing a semiconductor device, comprising a step of calling a division processing result for the pattern from the storage device and applying the division processing result to the division unprocessed pattern. 27. In order to divide a pattern to be drawn on a resist into patterns which can be drawn by a drawing apparatus, pattern data of the pattern and a result of the dividing process are obtained for a pattern of a shape which is first treated as a dividing process target. A procedure of storing shape information depending on the shape of the pattern at an address on a storage device obtained by converting the shape information with a hash function, obtaining the shape information for a divided unprocessed pattern, and using the shape information as a key To search whether the pattern of the same shape has already been divided, and if the pattern of the same shape has already been divided, the division processing result of the divided pattern is stored in the storage device. A pattern for drawing that causes a computer to execute the procedure for calling and applying the divided unprocessed pattern. Split processing program. 28. For dividing a pattern to be drawn on a resist into patterns that can be drawn by a drawing apparatus, pattern data of the pattern, division processing results,
And storing pattern data of a pattern that shares a division processing result with the pattern and is different from the pattern only in an arrangement direction, at an address on a storage device obtained by converting shape information depending on the shape of the pattern with a hash function. And the shape information for the divided unprocessed pattern is accessed, the storage device is accessed by using the shape information as a key, and whether the divided unprocessed pattern and the pattern whose coordinate value change from the reference coordinates match are stored. If a pattern that matches the coordinate value change is found,
A drawing pattern division processing program for causing a computer to execute a division processing result for the pattern from the storage device and to apply the division unprocessed pattern to the computer. 29. In order to divide a pattern to be drawn on a resist into patterns that can be drawn by a drawing apparatus, pattern data of the pattern and division result of the pattern are treated for the first time as a division processing target. A procedure of storing shape information depending on the shape of the pattern at an address on a storage device obtained by converting the shape information with a hash function, obtaining the shape information for a divided unprocessed pattern, and using the shape information as a key To search whether the pattern of the same shape has already been divided, and if the pattern of the same shape has already been divided, the division processing result of the divided pattern is stored in the storage device. A pattern for drawing that causes a computer to execute the procedure for calling and applying the divided unprocessed pattern. A computer-readable recording medium in which a partition processing program for a computer is recorded. 30. In order to divide a pattern to be drawn on a resist into patterns that can be drawn by a drawing apparatus, pattern data of the pattern, a division processing result,
And storing pattern data of a pattern that shares a division processing result with the pattern and is different from the pattern only in an arrangement direction, at an address on a storage device obtained by converting shape information depending on the shape of the pattern with a hash function. And the shape information for the divided unprocessed pattern is accessed, the storage device is accessed by using the shape information as a key, and whether the divided unprocessed pattern and the pattern whose coordinate value change from the reference coordinates match are stored. If a pattern that matches the coordinate value change is found,
A computer-readable recording medium recording a division processing program of a drawing pattern for causing a computer to execute a procedure of calling a division processing result for the pattern from the storage device and applying the division processing result to the division unprocessed pattern.