JP2003057842A - Method and device for developing photosensitive resin plate - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a method and a device for developing a sheet type photosensitive resin printing plate by which waste disposal cost is reduced and also a long-time drying stage after developing processing is eliminated by using water developer in which surfactant is not incorporated and circularly using the developer. SOLUTION: The sheet type photosensitive resin printing plate on which a specified image is formed by exposure is developed by jetting the gas-liquid two-phase water developer obtained by mixing water singly or compressed gas to the surface of the photosensitive resin printing plate with high pressure while temperature-controlling unexposed resin to be in a melted state, and hydrophobic photosensitive resin mixed in the used water developer is separated and removed by a technique such as filtration, and then the used water developer is circularly reused as the developer.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method and an apparatus for manufacturing a photosensitive resin plate used for flexographic printing such as corrugated board printing, flexible packaging printing, film printing, preprint printing and label printing. In particular, the present invention relates to a developing method and a developing device which are environmentally friendly and have high productivity.

[0002]

2. Description of the Related Art A photosensitive resin plate is used as a plate material for letterpress printing represented by flexographic printing. One of the photosensitive resin plates, AFP (trade name, manufactured by Asahi Kasei), is a sheet-shaped photosensitive material. AFP-1500 / AFP-2000 (trade name, manufactured by Asahi Kasei Co., Ltd.) and the like are commercially available as a plate-making device, which is a typical product as a resin plate. As the sheet-shaped photosensitive resin plate structure, in JP-A-2000-155418, a transparent polyester film having a thickness of 125 μm is used as a support, on which a thermoplastic elastomer is added.
A photosensitive resin composed of a photosensitive elastomer composition containing at least one ethylenically unsaturated compound and at least one initiator sensitive to ultraviolet rays is coated to a thickness of about 3 mm, and a surface of the photosensitive resin is coated with a negative film. It is described that a thin film layer of ethyl cellulose having a thickness of 4 to 6 μm, which is called a slip layer or a protective layer, is provided for the purpose of smoothing the contact. To make a flexographic printing plate from such a sheet-shaped photosensitive resin plate structure, first, ultraviolet light exposure (referred to as back exposure) is performed on the entire surface through a film support to form a uniform photocurable layer. UV exposure (called relief exposure) is applied through a transparent image carrier such as a negative film that selectively transmits ultraviolet light from the layer side, and the exposed photosensitive resin is photocured to form an image, and then The photosensitive resin in the unexposed area is a chlorinated solvent, perchlorethylene (1,1,1-trichloroethylene) alone or in combination with an alcohol such as n-butanol, or a non-chlorinated alternative solvent, Solbit (trademark). A relief image is formed by washing and removing with a solvent developing solution such as (trade name, manufactured by McDamid).

Similarly, European Patent No. 261910 reports that
An example of a water-developable photosensitive resin plate in which an acrylate monomer and polymer and a ketone photopolymerization / photocrosslinking agent are coated on a support is described. This is also a relief image by selectively irradiating ultraviolet light through a negative film to promote crosslinking of the photosensitive resin and photocuring, and then washing and removing the unexposed portion of the photosensitive resin with an aqueous developer. Is formed. Not only the sheet-shaped photosensitive resin plate constructions of the above two examples, but also most of the photosensitive resin plate manufacturing processes, after the unexposed photosensitive resin washing / removing process, necessary post-treatment is applied to flexographic printing. The method of producing the photosensitive resin plate is adopted.

That is, by drying the photosensitive resin plate after the development treatment for a long time (1 to 12 hours), the solvent developing solution remaining on the photosensitive resin plate is evaporated, and then the finishing treatment (photochemical treatment And chemical treatment) to reduce the surface tackiness of the photosensitive resin plate and improve the physical strength to a level that can withstand the printing stress, and then used for subsequent printing. In these conventional techniques, in addition to the fact that the process time required for manufacturing the photosensitive resin plate is long, or it is necessary to continuously perform a plurality of processing steps, etc. Toxic by-product waste can be generated in. In the case of a washing step with a solvent developer, organic solvent wastes are produced which can be toxic both in the solvent form and in the form containing addition-polymerizable compounds having at least one terminal ethylene group. Similarly, in a wash-off process with an aqueous developer, contaminated wastewater by-products containing similar addition-polymerizable compounds, which can have toxic effects, can also be produced. Since such by-products are wastes that cannot be discharged directly to the natural environment or directly into the sewage, it is necessary to outsource the disposal to an industrial waste disposal company. The amount is large, and the cost of consigning the disposal is high, which is an economic problem.

Further, in JP-A-5-19469, as a method for developing a sheet-shaped photosensitive resin plate, the photosensitive resin plate after the exposure step is heated to a high temperature to melt the unexposed resin,
It proposes an absorption / removal step of absorbing the molten resin into a nonwoven fabric and removing at least 75% of the unexposed resin. Since this method is a dry development process, a large amount of non-woven fabric waste containing unexposed resin is generated instead of eliminating organic solvent waste and contaminated wastewater by-products generated in the washing and removing step. Further, since it is an absorption method using a non-woven fabric, the removal performance of the unexposed resin in the deep area of the relief image is not sufficient, and it is not suitable for the development processing of thick plates such as corrugated board printing that requires a deep relief depth. Is.

[0006]

DISCLOSURE OF THE INVENTION The present invention meets the above-mentioned demand, and suppresses the amount of development waste liquid generated by circulating the use of the development liquid for the photosensitive resin plate after the exposure step, thereby significantly reducing the disposal cost. The present invention provides a developing method and a developing device that can reduce the manufacturing cost and reduce the need for a long drying step after development, improve productivity, and manufacture a thick plate requiring a deeper relief depth.

[0007]

As a result of intensive studies to solve the above problems, the present inventor has carried out temperature control of the sheet-shaped photosensitive resin plate after the exposure step to bring the unexposed resin into a molten state. In addition to preventing the thermal deformation of the film support, the developer does not contain a special cleaning agent component, and a developer consisting of almost water alone or a gas-liquid two-phase developer containing a gas is used. The unexposed resin is removed from the photosensitive resin plate by physical force. Next, rinse the developer off with a rinse treatment,
After the rinse water remaining on the surface of the photosensitive resin plate is blown off by the pressure water draining process, a short drying process and post-exposure process are performed, and the plate surface is not tacky and has excellent image reproducibility and printing durability during printing. Based on the finding that a photosensitive resin plate having good properties can be obtained, the present invention has been completed.

That is, the present invention is as follows. 1. A method for developing a photosensitive resin plate, comprising a step of spraying a developing solution at a high pressure while controlling the temperature of the photosensitive resin plate after exposure. 2. The developer is mixed with a gas,
1. The method for developing a photosensitive resin plate as described above. 3. The temperature of the developing solution is 40 ° C. or higher. ~ 2. 5. The method for developing a photosensitive resin plate according to any one of 1.

4. 1. The developing solution is jetted under a pressure of 1 MPa or more and 30 MPa or less. ~ 3. 5. The method for developing a photosensitive resin plate according to any one of 1. 5. 3. The temperature of the developer exceeds 100 ° C. The method for developing a photosensitive resin plate as described above. 6. 1. The photosensitive resin layer constituting the photosensitive resin plate is temperature-controlled at a temperature not lower than the melting temperature of the uncured photosensitive resin or 40 to 200 ° C. ~ 5. 5. The method for developing a photosensitive resin plate according to any one of 1.

7. The support constituting the photosensitive resin plate is temperature-controlled below the heat distortion temperature of the support, or at 40 to 200 ° C., independently of the temperature of the photosensitive resin layer,
1. ~ 6. 5. The method for developing a photosensitive resin plate according to any one of 1. 8. 1. The developer is an aqueous developer,
~ 7. 5. The method for developing a photosensitive resin plate according to any one of 1. 9. The developing solution obtained by removing the uncured photosensitive resin mixed in with a filter is circulated and used. ~
8. 5. The method for developing a photosensitive resin plate according to any one of 1.

10. 8. After spraying the developing solution, the surface of the photosensitive resin plate is rinsed with water, and the water is mixed into the developing solution as it is. The method for developing a photosensitive resin plate as described in 1. 11. 1. Use of a heater capable of heating the developing solution to 40 ° C. or higher, -10. 5. The method for developing a photosensitive resin plate according to any one of 1. 12. 1. A pump capable of discharging the developing solution under a pressure of 1 MPa or more and 30 MPa or less is used. ~ 11. 5. The method for developing a photosensitive resin plate according to any one of 1.

13. 11. A heater capable of heating the developing solution to a temperature higher than 100 ° C., or a mechanism for mixing a gas heated to a temperature higher than 100 ° C. is used. The method for developing a photosensitive resin plate as described in 1. 14. One or more nozzles for injecting a developing solution under a pressure of 1 MPa or more and 30 MPa or less are used,
1. ~ 13. 5. The method for developing a photosensitive resin plate according to any one of 1. 15. A feature of using a mechanism capable of controlling the temperature of the photosensitive resin layer constituting the photosensitive resin plate to the melting temperature of the uncured photosensitive resin or 40 to 200 ° C.
1. ~ 14. 5. The method for developing a photosensitive resin plate according to any one of 1.

16. 1. A mechanism which can control the temperature of the support constituting the photosensitive resin plate to a temperature not higher than the heat deformation temperature of the support or 40 to 200 ° C. independently of the photosensitive resin layer. ~ 15. 5. The method for developing a photosensitive resin plate according to any one of 1. 17. One or more filters selected from a mesh filter, an oil adsorption matte filter, a non-woven fabric filter, a paper filter, or a composite filter combining them in the surface layer of the developer stored in the tank and / or in the pipe through which the developer flows. Is provided and the developer is filtered through these filters.
~ 16. 5. The method for developing a photosensitive resin plate according to any one of 1.

18. It has means for controlling the temperature of the photosensitive resin plate after exposure and means for injecting a developing solution at a high pressure. ~ 1
7. A developing device for a photosensitive resin plate, which is used in the method for developing a photosensitive resin plate according to any one of 1. 19. There is a filter in the surface layer of the developer stored in the tank, and / or in the pipe through which the developer flows, and the filter is provided in a roll-wound manner. 17. A mechanism which is wound up by a roll. The developing device for the photosensitive resin plate as described in 1.

[0015]

BEST MODE FOR CARRYING OUT THE INVENTION As shown in FIG. 1, the embodiment of the present invention holds the photosensitive resin plate by bringing the back surface of the support of the sheet-shaped photosensitive resin plate after the exposure step into close contact with the outer peripheral surface of the drum. While rotating the drum, the temperature of the photosensitive resin layer is controlled to bring the unexposed resin into a molten state, and a single aqueous developer or a gas-liquid two-phase aqueous developer in which gas is mixed is provided under specific conditions. This is a developing method called a drum method, which is composed of a series of processes including a rinsing process using mainly water and a water removing process using pressurized air after developing by spraying under high pressure. In addition to this, it is also possible to use a plane system in which the photosensitive resin plate is held in a flat state on a plane platen and the same processing is performed.

The outline of the embodiments of the developing method and the developing apparatus according to the present invention will be described below. FIG. 1 is a schematic diagram of an example of a developing device to which a developing method called a drum method is applied. As shown in the figure, the plate mounting drum 12 that holds and rotates the sheet-shaped photosensitive resin plate after the exposure step
0, a plate heating heater box 140 that controls the temperature of the photosensitive resin plate, a processing tank 110 that continuously performs high-pressure developer injection and subsequent rinse water treatment and pressure air draining treatment, and stores and heats the developer. Developing solution tank 112, a high-pressure plunger pump 130 for increasing the pressure of the developing solution, and a high-pressure water heater 13 for further heating the high-pressure developing solution.
It is composed of 5.

First, the structure of the plate mounting drum 120 will be described. The material of the plate mounting drum 120 is a martensitic stainless steel on which a magnet acts, and a plate front end clamp mechanism 122 that clamps the front end of the photosensitive resin plate 200 to be developed by a spring action method and a detachment that fixes the plate bottom. Equipped with a rotary magnet clamp 123 and is connected to a drum rotation mechanism 121 equipped with a motor.

Spray for spraying a high-pressure developing solution onto the photosensitive resin plate 200 held on the outer peripheral surface of the plate mounting drum 120 with the photosensitive resin layer facing outward (the back surface of the support is in close contact with the outer peripheral surface of the drum). A plurality of nozzles 132 are arranged at equal intervals on a nozzle header 131 having means for reciprocating at a predetermined speed along the drum axis direction. The input side of the nozzle header 131 is connected to the high-pressure plunger pump 130 via a high-temperature / high-pressure dedicated pipe 134 and a high-pressure water heater 135 having excellent heat resistance and pressure resistance, and the input side of the high-pressure plunger pump 130. The supply pipe 13
A developing solution tank 112 is connected via 3. In addition, a plate heating heater 141 that radiates heat rays in the infrared to far infrared region to control the temperature of the photosensitive resin plate 200 and melts the unexposed resin is accommodated in the outer periphery of the plate mounting drum 120. A plate heating heater box 140 is provided.

FIG. 2 is a detailed illustration of the internal structure of the plate mounting drum 120 and the temperature control mechanism of the drum outer peripheral surface. As a support that constitutes the photosensitive resin plate 200,
Generally, a thin film such as polyester is used, and the melting temperature of the polyester film is around 220 ° C, but when it exceeds a predetermined temperature, it has a characteristic of gradually shrinking and being thermally deformed. Even if heated at 110 ° C for about 10 minutes, Shrinks by a few percent. In order to prevent thermal deformation of the film support, the temperature of the support alone is controlled independently from the temperature control mechanism of the photosensitive resin plate 200 from the outer peripheral surface of the plate mounting drum 120 that is in close contact with the back surface of the support. Is preferred. As an example of the temperature control of the support, the plate mounting drum 120 has a hollow structure in FIG.
2, the temperature control fluid 400 stored in the temperature control tank 180 and having its temperature controlled is delivered in the direction of the arrow in FIG. 2, and is supplied into the plate mounting drum 120 via the liquid supply pipe 182 and the rotary joint 183. The temperature control fluid 400 supplied to the inside of the drum 120 keeps the outer peripheral surface of the drum 120 at a predetermined temperature while exchanging heat with the cylindrical body of the drum 120, so that the temperature does not rise to a temperature at which the support body is thermally deformed. ing. The temperature control fluid 400 that has undergone heat conversion is returned to the temperature control tank 180 via the rotary joint 184 and the drainage pipe 185 and is reused. Further, the same effect can be obtained by using gas as the temperature control fluid in addition to liquid.

In the processing tank 110, an injection nozzle 151 for spraying rinsing water in order to wash away the developing solution remaining on the surface of the photosensitive resin plate 200 after the development processing is provided with a nozzle header 1
A plurality of 50 are arranged at equal intervals. The input side of the nozzle header 150 is connected to a tap water pipe via a hose 152 and a solenoid valve 153. After the rinse treatment, the draining nozzle 160 for blowing away the rinse water remaining on the surface of the photosensitive resin plate 200 with the compressed air is the compressed air pipe 161 and the solenoid valve 1.
It is connected to the compressor via 62.

Next, the structure of the developer tank 112 will be described. A heating heater 113 for heating the developer to a predetermined temperature or keeping it at a predetermined temperature is provided, and the surface layer of the developer contained in the developer tank 112 is not mixed with the developer. To filter the cured resin,
Depending on the filtering characteristics of the uncured resin, a mesh filter, an oil adsorption matte filter, a non-woven fabric filter, a paper filter, or a composite filter combining them is installed. Here, as an example, the nonwoven fabric filter 17
1 is provided, and a non-woven fabric roll supply mechanism 1
70, a non-woven fabric winding mechanism 172, and a roll group are provided, so that the non-woven fabric filter 171 is wound for a predetermined length in accordance with the filtration area after developing a predetermined number of photosensitive resin plates. The filter can also be provided in a pipe through which the developing solution flows.

In the developing device having the above-described structure, when the drum 120 on which the photosensitive resin plate 200 is mounted starts rotating in the direction of the arrow in FIG. 1, infrared rays to far infrared rays are emitted from the plate heating heater 141 to be exposed. The resin plate 200 is heated and the high-pressure plunger pump 130 starts operating. The developing solution 300 heated to a predetermined temperature in the developing solution tank 112 is sucked by the high-pressure plunger pump 130 and passes through the high-pressure water heating heater 135 in a state where high pressure is applied, and if necessary, 100 ° C. It is heated to a temperature exceeding 100 ° C. and supplied to the nozzle header 131. The developing solution 300 supplied to the nozzle header 131 is sprayed from the spray port of the nozzle 132 onto the photosensitive resin plate 200 in the state of atomization or equalization. Injection nozzle 13
The developer 300 blown out from No. 2 is the photosensitive resin plate 200.
After hitting, the uncured resin is removed via the non-woven fabric filter-171, and it returns to the developer tank 112 again. Then, it is sucked into the high-pressure plunger pump 130 via the supply pipe 133 connected to the developer tank 112 and is circulated for use. Subsequently, in order to wash off the developing solution 300 remaining on the surface of the photosensitive resin plate 200, the electromagnetic valve 153 is opened and the water directly supplied from the tap water is sprayed from the rinse water jet nozzle 151. This rinse water flows into the developer tank 112 as it is and is used as the developer 300. After the rinsing process is completed, the solenoid valve 162 is opened and the compressed air supplied from the compressor is sprayed from the draining nozzle 160 onto the photosensitive resin plate 200 to blow away the remaining rinse water. After this, drum 12
The photosensitive resin plate 200 is removed from No. 0, and the printing plate is obtained by performing the drying and the post-exposure process in the next step.

As described above in the embodiments, by controlling the temperature of the sheet-shaped photosensitive resin plate from both the front side and the back side, the unexposed resin is melted while the thermal deformation of the support is prevented, and high pressure is applied. The method and apparatus for performing spray development are
It can be applied to a sheet-shaped photosensitive resin printing plate that has been subjected to an exposure step by a usual method. That is, the sheet-shaped photosensitive resin plate exposed through a negative film on which a predetermined image is designed is opened by opening the opening / closing door 111 of the developing device, and the resin plate 200 is inserted into the processing tank 110 to make the plate front end. After being clamped by the clamp mechanism 122, the plate mounting drum 120 is rotated to an appropriate position to fix the plate bottom with the magnet clamp 123. In this way, after the photosensitive resin layer of the resin plate 200 before development is wound around the outer peripheral surface of the drum 120 and fixed, the above-described development processing can be performed.

The embodiments of the present invention will be described more specifically below. In the present invention, an aqueous developer is used. The term “aqueous developer” as used herein means that the proportion of water in the composition of the developer is the maximum. Conventionally, as a general aqueous developer for a sheet-shaped photosensitive resin plate capable of aqueous development, 1 to 5% of an aqueous surfactant solution is contained in order to develop by dissolving the resin by a chemical action. However, in this developing method, the uncured resin removed in the developing step dissolves in the developing solution, so that it is difficult to remove only the resin component from the developing solution. Such a developer containing an uncured photosensitive resin not only lowers the solubility of the resin, but also exerts an unfavorable effect on the effect of removing tackiness on the surface of the printing plate by the subsequent post-exposure step. On the other hand, the aqueous developer used in the present invention is tap water containing no aqueous surfactant solution, and the hydrophobic resin component cannot be dissolved in the aqueous developer of the present invention. It becomes easy to remove only the uncured resin component from the used aqueous developer.

As described above, in the present invention, the use of the aqueous developer facilitates the separation of the uncured resin contained in the aqueous developer after the development from the developer, and thus the circulation of the developer and the development of the developer. It is possible to extend the life of the. In the present invention, the effect of extending the life of the developer can be further increased by installing filters at appropriate places of the apparatus for separating and removing the resin component in the aqueous developer. For example, after spraying the developer onto the photosensitive resin plate, a mesh filter, an oil adsorption matte filter, a non-woven fabric filter, a paper filter, or the like may be provided on the surface of the developer tank (112 in FIG. 1) in which the used developer is stored. A filter such as a combined composite filter (FIG. 1, 171) is installed. By passing the developing solution through these filters and returning to the developing solution tank, most of the uncured resin in the developing solution is filtered by the filter, and the aqueous developing solution can be recycled.

The aqueous developer used in the present invention may contain a gas in order to improve the removal efficiency of the uncured resin when the developer is sprayed. Air or water vapor is preferable as the gas, and the temperature of the aqueous developer is 100 ° C.
When it is desired to raise the temperature above, it is preferable to use steam. When air is mixed in the aqueous developer, the air pressure is preferably 0.1 MPa or more from the viewpoint of the developing effect.

The temperature of the aqueous developer used in the present invention is 40 ° C.
The above is preferable. By setting the temperature of the aqueous developer to 40 ° C. or higher, the uncured resin of the photosensitive resin plate which is generally heated to 40 ° C. or higher to be in a molten state is cooled by the aqueous developer to increase the viscous resistance. It is possible to prevent the removal effect from being adversely affected. In order to obtain a stable uncured resin removal effect, it is preferable that the temperature of the aqueous developer is kept near the melting temperature of the uncured resin, and when the melting temperature of the uncured resin exceeds 100 ° C. Since the boiling temperature of the aqueous developer under atmospheric pressure is higher than that,
It is preferable to heat the high-pressure aqueous developer after being pressurized to not less than MPa and not more than 30 MPa by the high-pressure water heater 135 to a temperature exceeding 100 ° C., or to mix the steam exceeding 100 ° C.

Further, the aqueous developing solution is used at a high pressure of 1 MPa or more and 30 MPa or less in order to sufficiently exert the effect of removing the uncured resin by physical impact when sprayed on the photosensitive resin plate. It is preferable to inject it into
1 MPa or more from the standpoint of development effect due to physical impact, and 30 from the viewpoint of preventing damage to relief shapes, especially independent lines having a line width of 500 μm or less and highlight halftone dots having an area ratio of 5% or less.
MPa or less is preferable.

The sheet-shaped photosensitive resin plate used in the present invention has a melting temperature of the uncured resin or more, or 4 or more in order to obtain a stable uncured resin removing effect by the high-pressure aqueous developer.
The temperature is preferably controlled to 0 to 200 ° C. Also,
Since the sheet-shaped photosensitive resin plate used in the present invention is heated to a high temperature by controlling the temperature as described above, the support is independent of the photosensitive resin layer at a temperature not higher than the heat deformation temperature of the support or 40 to 200 ° C. It is preferable that the temperature be controlled.

The embodiments will be described in detail below. A typical developing device for carrying out the above-mentioned developing step is a hollow drum whose outer peripheral surface is temperature-controllable by flowing a temperature control fluid therein, and a photosensitive resin layer on the outer peripheral surface of which a photosensitive resin layer is directed outward. Heating while controlling the temperature of the uncured resin of the photosensitive resin plate by radiating infrared rays to far infrared rays from the outer periphery of the drum while holding the photosensitive resin plate and rotating at a rotational speed of several to several tens of RPM. Equipped with a heater, the aqueous developer is 1 MPa or more 30
A high-pressure pump capable of discharging at a pressure of MPa or less and a high-pressure water heater capable of heating the pressurized aqueous developer at 100 ° C. or higher are used to direct the aqueous developer to the photosensitive resin layer. It is composed of a nozzle that ejects.

In the developing step, the jetting or jetting direction of the aqueous developing solution is not particularly limited as long as the uncured resin can be removed, and may be slightly oblique to the surface of the photosensitive resin layer. The direction substantially perpendicular to the surface of the photosensitive resin layer (for example, about 0 to 15 °) is preferable. The aqueous developer can be jetted using a single nozzle or a plurality of nozzles (for example, a nozzle group arranged in parallel), and when the nozzle development processing width is less than the processing width of the photosensitive resin plate, The jetting nozzle moves along the axial direction of the drum to jet the aqueous developer. The distance between the nozzle and the surface of the photosensitive resin layer is not particularly limited as long as the uncured resin can be removed according to the discharge pressure at the nozzle (or pump) outlet and the nozzle type, and the high-pressure uniform fan-shaped nozzle VNP-1 / 8M. -6549
If it is a model such as (made by Ikeuchi), it is generally 50-
It is about 200 mm.

After the development is completed, water is sprayed onto the surface of the photosensitive resin plate to rinse it in order to wash away the aqueous developer remaining on the surface of the photosensitive resin plate while continuing the rotation of the drum. The composition of the rinse water is preferably single water, and the water pressure of the rinse water, the jetting direction, the time, the temperature, and the method are not particularly limited as long as the developer remaining on the surface of the photosensitive resin plate can be washed away. The rinse water is mixed in the developer as it is, and then used as a developer. In the developing step in the present invention, the water component in the developer composition is evaporated by the atomization of the developer by spray injection under high temperature and high pressure, and the developer is discharged into the atmosphere by the exhaust mechanism. The liquid decreases. Therefore, the amount of the developing solution can be kept constant by incorporating the rinse water into the developing solution. Unlike a developer with a high chemical activity that contains a conventional surfactant, even if rinse water is mixed into the developer, the developing effect is reduced due to a decrease in the proportion of the surfactant in the developer. As a result, there is no possibility of accelerating the time for exchanging the developing waste liquid.

After the rinsing process is completed, a water draining process using a compressed air blow nozzle is usually provided in order to remove the rinse water remaining on the surface of the photosensitive resin plate while continuing to rotate the drum. The pressure and pressure of the compressed air blow, the injection direction, the time, the temperature, and the method are not particularly limited as long as the rinse water remaining on the surface of the photosensitive resin plate can be blown off. If the rinse water remains on the surface of the photosensitive resin plate, the water will drip when the photosensitive resin plate is conveyed to the subsequent step, and the working environment will be deteriorated.

After the draining step is completed, the rotation of the drum is stopped, the photosensitive resin plate after the developing step is removed from the drum, and a known printing or post-exposure is performed to obtain a printing plate. Next, it will be described in more detail by Examples and Comparative Examples that the aqueous developer has a performance not inferior to or higher than that of a conventional developer having high chemical activity. The embodiment of the present invention is not limited to this embodiment.

[0035]

Example 1 Plate thickness 2.54 mm (polyester film support thickness 125 μm), size 762 mm 1016 m
m sheet-shaped photosensitive resin plate AFP-HD (manufactured by Asahi Kasei; hereinafter referred to as resin plate HD) was prepared using an AFP-1500 exposure machine (manufactured by Asahi Kasei) until the exposure step.
Exposure amount is relief depth 1.0mm, 133LPI /
Back exposure of 255 mJ / cm ² and relief exposure of 6000, which are proper exposure conditions that enable 3% highlight formation.
It was set to mJ / cm ² .

An outer diameter of 350 mm, a width of 1,200 mm and a resin plate HD are held in a horizontally long state, and a hollow drum is provided which rotates while controlling the temperature of the outer peripheral surface of the drum by flowing a temperature control fluid (water or oil) inside the drum. While radiating heat rays from the outer periphery of the drum to control the temperature of the unexposed resin of the resin plate HD in a molten state, water is poured into a developer tank (capacity 200 L) of a drum type experimental machine capable of high pressure spray development at the same time.
High-pressure spray development is performed using hot water that has been heated to 90 ° C. in advance. A spunbonded nonwoven fabric (made by Asahi Kasei) that removes unexposed resin mixed in the developed hot water is provided above the developer tank, and the filtered hot water is returned to the developer tank for recycling and reuse. It has a structure.

After the exposure step, the back surface of the support of the resin plate HD is held in close contact with the outer peripheral surface of the drum, and 1 rpm (peripheral speed: 1
While rotating the drum at a rotation speed of 100 mm / min), the resin plate HD having the heat-melting property in which the unexposed resin softens from around 80 ° C is temperature-controlled to 110 ° C with a hot wire heater, and is also hollow. Thermal deformation is prevented by causing a temperature control fluid of 80 ° C. or less to flow inside the drum to suppress the temperature rise of the resin plate HD polyester film support to 100 ° C. or less. As a high-pressure spray mechanism, discharge pressure 15
Using a high-pressure plunger pump of MPa, a high-pressure uniform fan-shaped nozzle (manufactured by Ikeuchi, model: VNP-1 / 8M-65 at a distance of 100 mm between the nozzle ejection port and the resin plate HD).
49) was developed for 15 minutes with a plurality of nozzles arranged in parallel. Then, the developed plate was rinsed with tap water, and the rinse water remaining on the surface of the rinsed plate was blown off with an air gun and left in a dryer for about 5 minutes. Then 370 nm
1000mJ / using an ultraviolet fluorescent lamp with a central wavelength at
cm ² and then a sterilizing lamp having a central wavelength of 254 nm was used to perform a post-exposure treatment on the entire plate surface at 1750 mJ / cm ² to obtain a printing plate.

The surface of the obtained printing plate was evaluated by touch, but it was neither sticky nor tacky, and even if foreign matter adhered to the surface, it was easy to remove them. When a relief image of a printing plate corresponding to an independent line of 100 μm width and a white line of 500 μm width was measured with a negative film,
Relief width of about 100 μm for 100 μm independent lines, 50
The relief width is about 480μ in the 0μm width outline line.
m and the depth was about 210 μm. 133LPI /
The damage to the root of the dot with 3% halftone dots was confirmed with a microscope, but no particular cracks were observed, and good print quality was maintained even during long-term printing.

[0039]

Comparative Example 1 A resin plate HD was prepared under the same exposure conditions as in Example 1. Then, using Solbit (made by MacDamid) as a developing solution, the plate was attached to a rotating drum of an AFP-1500 developing machine with a double-sided tape, development was performed at a liquid temperature of 25 ° C for 5 minutes, and drying was performed at 60 ° C for 1 hour. Let Then, post-exposure treatment was performed under the same post-exposure conditions as in Example 1 to obtain a printing plate. The surface of the obtained printing plate was evaluated by touch,
There was no stickiness or tackiness, and it was easy to remove foreign matter even if it adhered to the surface. Moreover, when a relief image of a printing plate corresponding to a 100 μm width independent line and a 500 μm width white line was measured with a negative film, it was 10
Relief width of about 98 μm for 0 μm independent line, 500 μm
The relief outline width of the outline outline was about 480 μm and the depth was about 207 μm. Furthermore, damage to the root part of the dot of 133 LPI / 3% halftone dots was confirmed with a microscope, but no particular cracks were observed, and good print quality was maintained even during long-term printing.

[0040]

[Example 2] Plate thickness 7.0 mm (polyester film support thickness 188 µm), size 762 mm 1016 mm
The sheet-shaped photosensitive resin plate AFP-SQ (manufactured by Asahi Kasei; hereinafter referred to as resin plate SQ) was subjected to an exposure process using an AFP-1500 exposure machine to prepare a plate. The exposure amount is a back exposure 200, which is an appropriate exposure condition that enables a relief depth of 2.0 mm and a highlight formation of 85 LPI / 5%.
The exposure was 0 mJ / cm 2 and the relief exposure was 5000 mJ / cm 2.

The resin plate SQ was developed under the same development conditions by using the drum type experimental machine used in Example 1. Then, the plate developed in the same manner as in Example 1 was rinsed with tap water, and the rinse water remaining on the surface of the rinsed plate was blown off with an air gun and left in a dryer for about 5 minutes. Then 370
1000m using UV fluorescent lamp with center wavelength in nm
A post-exposure treatment of 1000 mJ / cm ² was performed on the entire surface of the plate using a germicidal lamp having a center wavelength of 254 nm, followed by J / cm ² . The surface of the printing plate thus obtained was evaluated by touch, but it was neither sticky nor tacky, and it was easy to remove foreign matter even if it adhered to the surface. In addition, 250 μm width independent lines and 500
When the relief image of the printing plate corresponding to the white line having a width of μm was measured, the relief width of the independent line of 250 μm was about 220 μm, and the width of the white blank having a width of 500 μm was about 550 μm and the depth was about 196 μm. 85 more
The damage of the dot root part of LPI / 5% halftone dot was confirmed by a microscope, but no particular cracks were observed, and good print quality was maintained even after printing for a long time.

[0042]

Comparative Example 2 A resin plate SQ was prepared under the same exposure conditions as in Example 2. Then, as in Comparative Example 1, using sorbit as a developing solution, the plate was attached to a rotating drum of an AFP-1500 developing machine with a double-sided tape, and development was carried out at a liquid temperature of 25 ° C. for 10 minutes. Allowed to dry for hours. Then, post-exposure treatment was performed under the same post-exposure conditions as in Example 2 to obtain a printing plate. The surface of the obtained printing plate was evaluated by touch,
There was no stickiness or tackiness, and it was easy to remove foreign matter even if it adhered to the surface. Moreover, the relief image of the printing plate corresponding to the 250 μm-width independent line and the 500 μm-width blank line was measured with the negative film.
Relief width of about 215 μm for a 0 μm independent line, 500 μm
In the m-width blank line, the relief blank width was about 555 μm, and the depth was about 190 μm. Further, the damage of the root part of the dot of 85 LPI / 5% halftone dot was confirmed by a microscope, but no particular cracks were observed, and good print quality was maintained even after printing for a long time.

[0043]

As described above, in the method for developing a photosensitive resin plate according to the present invention, high-pressure jet development utilizing physical action is performed while controlling the temperature of the unexposed resin in a molten state, so that the photosensitive resin Printing plate development using an insoluble aqueous developer is possible. After separating and removing the photosensitive resin from the used developer, it is easy to reuse it as a developer, which reduces the amount of developing waste liquid, which is advantageous for environmental protection and significantly reduces the waste liquid disposal cost. Reductions can also be achieved. Further, a long drying process after development is unnecessary, productivity is improved, and a thick plate requiring a deeper relief depth can be manufactured.

[Brief description of drawings]

FIG. 1 is a vertical sectional view showing a schematic configuration of a developing device suitable for carrying out the present invention.

FIG. 2 is a cross-sectional view illustrating a schematic configuration of drum outer peripheral surface temperature control according to an embodiment of the present invention.

[Explanation of symbols]

100: Developing device 110: Treatment tank 111: Open / close door 112: developer tank 113: heater for developing solution 120: Plate mounting drum 121: Drum rotation mechanism 122: Plate edge clamp mechanism 123: Magnet clamp 130: High pressure plunger pump 131: Nozzle header with swing function 132: Developer injection nozzle 133: Supply piping 134: High temperature / high pressure piping 135: High pressure water heater 140: Plate heating heater box 141: Plate heating heater 150: Rinse water nozzle header 151: Rinse water injection nozzle 152: Rinse water hose 153: Rinse water solenoid valve 160: Pneumatic drainer nozzle 161: Pneumatic piping 162: Pneumatic solenoid valve 170: Non-woven roll roll fabric supply mechanism 171: Nonwoven filter 172: Non-woven fabric winding mechanism 180: Temperature control tank 181: Liquid sending pump 182: Supply pipe 183, 184: rotary joint 185: Drainage pipe 200: Sheet-shaped photosensitive resin plate 300: Developer 400: Temperature control fluid

Claims (19)

[Claims] 1. A method of developing a photosensitive resin plate, comprising the step of spraying a developing solution at a high pressure while controlling the temperature of the exposed photosensitive resin plate. 2. The method for developing a photosensitive resin plate according to claim 1, wherein a gas is mixed in the developing solution. 3. The method for developing a photosensitive resin plate according to claim 1, wherein the temperature of the developing solution is 40 ° C. or higher. 4. The method for developing a photosensitive resin plate according to claim 1, wherein the developing solution is jetted under a pressure of 1 MPa or more and 30 MPa or less. 5. The method for developing a photosensitive resin plate according to claim 4, wherein the temperature of the developing solution exceeds 100 ° C. 6. The photosensitive resin layer constituting the photosensitive resin plate is not less than the melting temperature of the uncured photosensitive resin, or 40 to 200.
The method for developing a photosensitive resin plate according to claim 1, wherein the temperature is controlled to be ° C. 7. A support constituting the photosensitive resin plate is temperature-controlled below the heat distortion temperature of the support or at 40 to 200 ° C. independently of the photosensitive resin layer. Item 7. A method for developing a photosensitive resin plate according to any one of Items 1 to 6. 8. The method for developing a photosensitive resin plate according to claim 1, wherein the developing solution is an aqueous developing solution. 9. The method for developing a photosensitive resin plate according to claim 1, wherein a developer obtained by removing the uncured photosensitive resin mixed therein with a filter is circulated and used. 10. The development of a photosensitive resin plate according to claim 9, wherein after the developing solution is sprayed, the surface of the photosensitive resin plate is rinsed with water and the water is mixed into the developing solution as it is. Method. 11. A heater capable of heating the developing solution to 40 ° C. or higher is used, wherein
11. The method for developing a photosensitive resin plate as described in 10 above. 12. The method for developing a photosensitive resin plate according to claim 1, wherein a pump capable of discharging the developing solution under a pressure of 1 MPa or more and 30 MPa or less is used. 13. The method according to claim 12, wherein a heater capable of heating the developing solution to a temperature exceeding 100 ° C. or a mechanism for mixing a gas heated to a temperature exceeding 100 ° C. is used. Method of developing photosensitive resin plate. 14. The method for developing a photosensitive resin plate according to claim 1, wherein one or more nozzles for ejecting the developing solution under a pressure of 1 MPa or more and 30 MPa or less are used. 15. The photosensitive resin layer constituting the photosensitive resin plate is formed at a temperature not lower than the melting temperature of the uncured photosensitive resin, or 40 to 20.
The method for developing a photosensitive resin plate according to claim 1, wherein a mechanism capable of controlling the temperature to 0 ° C. is used. 16. A mechanism for controlling the temperature of the support constituting the photosensitive resin plate independently of the heat distortion temperature of the support or at 40 to 200 ° C. independently of the photosensitive resin layer. The method for developing a photosensitive resin plate according to claim 1, wherein 17. A surface layer of the developer stored in the tank,
And / or a mesh filter, an oil adsorption matte filter, a non-woven fabric filter, in a pipe through which the developing solution flows.
17. The photosensitive material according to claim 1, further comprising one or more filters selected from a paper filter and a composite filter in which they are combined, and the developer is filtered by these filters. Of developing a flexible resin plate. 18. A means for controlling the temperature of a photosensitive resin plate after exposure and a means for injecting a developing solution at a high pressure, wherein:
7. A developing device for a photosensitive resin plate, which is used in the method for developing a photosensitive resin plate according to any of 7. 19. A surface layer of a developer stored in a tank,
And / or has a filter in the pipe through which the developer flows,
19. The development of a photosensitive resin plate according to claim 18, wherein the filter is provided in a roll winding manner, and has a mechanism for winding a predetermined number of photosensitive resin plates in a predetermined length after development processing. apparatus.