JP2003049260A - Member for film deposition apparatus and method for manufacturing the same - Google Patents
Member for film deposition apparatus and method for manufacturing the sameInfo
- Publication number
- JP2003049260A JP2003049260A JP2001236124A JP2001236124A JP2003049260A JP 2003049260 A JP2003049260 A JP 2003049260A JP 2001236124 A JP2001236124 A JP 2001236124A JP 2001236124 A JP2001236124 A JP 2001236124A JP 2003049260 A JP2003049260 A JP 2003049260A
- Authority
- JP
- Japan
- Prior art keywords
- film
- aluminum
- film forming
- forming apparatus
- sprayed
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Manufacturing Of Magnetic Record Carriers (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Physical Vapour Deposition (AREA)
- Chemical Vapour Deposition (AREA)
- Coating By Spraying Or Casting (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は、記録媒体や半導体
の製造における成膜装置に係り、基板上への成膜中に部
材からの発塵を防止することに関するもので、特に、記
録媒体を固定して搬送する部品に好適な部材を提供する
ものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a film forming apparatus for manufacturing a recording medium or a semiconductor, and more particularly to preventing dust from a member during film formation on a substrate. It is intended to provide a member suitable for a component which is fixed and conveyed.
【0002】[0002]
【従来の技術】磁気ディスクや光ディスク等の記録媒体
や、半導体の製造における成膜時に、成膜装置内部の部
材に付着した膜が、成膜を重ねるにしたがって厚くなる
と剥離を起こして成膜基板を汚染することが知られてい
る。この問題は成膜基板の品質や歩留まりに大きく影響
を及ぼす。2. Description of the Related Art When a recording medium such as a magnetic disk or an optical disk or a semiconductor is manufactured, a film adhered to a member inside a film forming apparatus is peeled off as the film becomes thicker as the film is formed. Known to pollute. This problem greatly affects the quality and yield of film-forming substrates.
【0003】この問題を解決する方法として、従来か
ら、部材などの表面にブラスト処理を施して表面を梨地
状にすることにより膜付着強度を大きくして使用する方
法が採用されている。さらに、部材などの表面にMo,
W,Al,WCなどのプラズマ溶射膜を形成して内部応
力の分散と接着面積の増大を図ることにより、付着した
膜の剥離を防止する方法(特開昭60−120515号
公報参照)、特定の部材にアルミニウムを溶射して、付
着した膜の剥離を防止する方法(特開平4−26806
5号公報参照)、開口を有するマスクを使用して防着板
にアルミニウムを溶射し、アルミニウム層の表面形状を
制御して付着した膜の剥離を防止する方法(特開平8−
176816号公報参照)などが提案されている。As a method for solving this problem, there has been conventionally used a method in which the surface of a member or the like is blasted to have a satin-finished surface to increase the film adhesion strength and to be used. Furthermore, Mo,
A method for preventing the peeling of the adhered film by forming a plasma sprayed film of W, Al, WC, etc. to disperse the internal stress and increase the adhesion area (see JP-A-60-120515), Method of spraying aluminum on the above member to prevent peeling of the adhered film (JP-A-4-26806).
(See Japanese Patent Laid-Open No. 5), a method of spraying aluminum on the deposition-inhibitory plate using a mask having an opening to control the surface shape of the aluminum layer to prevent peeling of the adhered film (JP-A-8-
176816) and the like have been proposed.
【0004】[0004]
【発明が解決しようとする課題】表面に溶射される金属
は、アルミニウムあるいはアルミニウム合金が、再使用
の際に膜を剥離し易いために好適であるが、アルミニウ
ムあるいはアルミニウム合金溶射膜の基材への密着性や
溶射膜を構成する粒子(スプラット)間の密着性につい
ては必ずしも十分ではない。特に、静止対向で記録媒体
基板の両面に成膜する装置などにおいては、図3に示す
ように記録媒体基板の周囲に3点以上で接触することに
より固定して搬送するグリッパーと呼ばれる部品があ
り、グリッパー上への溶射膜および成膜による付着膜
が、記録媒体の成膜と媒体基板の脱着を繰り返すことで
剥がれやすくなり、スパッタリングターゲットの寿命よ
りも短い間隔で交換することを余儀なくされている。As the metal to be sprayed on the surface, aluminum or aluminum alloy is suitable because it is easy to peel off the film at the time of reuse, but to the base material of the aluminum or aluminum alloy sprayed film. And the adhesion between particles (splats) forming the sprayed coating are not always sufficient. In particular, in an apparatus for forming films on both sides of a recording medium substrate while facing each other statically, as shown in FIG. 3, there is a part called a gripper that is fixed and conveyed by contacting the periphery of the recording medium substrate at three or more points. , The sprayed film on the gripper and the deposited film due to film formation are easily peeled off by repeating the film formation of the recording medium and the attachment / detachment of the medium substrate, and it is unavoidable to replace them at intervals shorter than the life of the sputtering target. .
【0005】本発明の目的は、溶射膜および成膜による
付着膜の成膜装置用部材からの剥離を防止し、特にグリ
ッパーのように成膜と媒体基板の脱着を繰り返す部材の
メンテナンス寿命を高めることである。An object of the present invention is to prevent peeling of a sprayed film and an adhered film due to film formation from a member for a film forming apparatus, and particularly to extend the maintenance life of a member such as a gripper that repeats film formation and detachment of a medium substrate. That is.
【0006】[0006]
【課題を解決するための手段】本発明者は、上述のよう
な現状に鑑み、鋭意検討を行った結果、形成される溶射
膜のスプラットの偏平性を高めることにより、溶射膜の
基材への密着性およびスプラット間の密着性が高まり、
グリッパーに好適なことを見出し、本発明を完成させ
た。すなわち、本発明は成膜装置の成膜室内に存在する
部材であって、該部材の表面の、少なくとも成膜成分が
付着する部分に、アルミニウム若しくはアルミニウム合
金からなる膜が溶射されており、該アルミニウム若しく
はアルミニウム合金溶射膜のX線回折による(200)
面のピーク強度と(111)面のピーク強度の比が0.
4未満であることを特徴とする成膜装置用部材である。The inventors of the present invention have made earnest studies in view of the above-mentioned situation, and as a result, by increasing the flatness of the splats of the sprayed film to be formed, the base material of the sprayed film is improved. And the adhesion between the splats increase,
The inventors have found that they are suitable for grippers and completed the present invention. That is, the present invention is a member existing in a film forming chamber of a film forming apparatus, wherein a film made of aluminum or an aluminum alloy is sprayed on at least a portion of a surface of the member to which a film forming component is attached. X-ray diffraction of aluminum or aluminum alloy sprayed coating (200)
The ratio of the peak intensity of the (111) plane to the peak intensity of the (111) plane is 0.
It is a member for a film forming apparatus, which is less than 4.
【0007】本発明では、形成される溶射膜のスプラッ
トの偏平性を高めることにより、溶射膜の基材への密着
性およびスプラット間の密着性が高められる。また、偏
平性の高いスプラットの端面はオーバーハングとなりや
すいので、付着膜の引っ掛かりとなるオーバーハングの
多いフラクタル次元の高い面が得られ、付着膜の密着性
も高まる。In the present invention, by increasing the flatness of the splats of the sprayed coating to be formed, the adhesion of the sprayed coating to the substrate and the adhesion between the splats are enhanced. Further, since the end face of the splat having high flatness is likely to be overhanged, a surface having a large fractal dimension with many overhangs, which becomes a catch of the adhered film, is obtained, and the adhesion of the adhered film is enhanced.
【0008】本発明者の検討結果によれば、X線回折に
よる(200)面のピーク強度の(111)面のピーク
強度に対する比は、粉末のようなランダム配向では0.
47であるが、溶射膜では溶射粒子の偏平性が高まるに
つれて(111)面の配向が高まり、(200)/(1
11)ピーク強度比が小さくなる。According to the results of studies by the present inventor, the ratio of the peak intensity of the (200) plane to the peak intensity of the (111) plane by X-ray diffraction is 0.
47, the orientation of the (111) plane increases as the flatness of the sprayed particles increases in the sprayed film, resulting in (200) / (1
11) The peak intensity ratio becomes small.
【0009】溶射粒子の偏平性は、SEMによる表面観
察やレーザー顕微鏡による表面観察および計測により直
接評価できる。このような評価を行った場合、本発明
は、成膜装置の成膜室内に存在する部材であって、該部
材の表面の、少なくとも成膜成分が付着する部分に、ア
ルミニウム若しくはアルミニウム合金からなる膜が溶射
されており、該アルミニウム若しくはアルミニウム合金
溶射膜を構成する粒子であるスプラットの中で、偏平し
た粒子の割合が、該溶射膜の面積比で95%以上を占め
ることを特徴とする成膜装置用部材である。The flatness of the sprayed particles can be directly evaluated by observing the surface with an SEM, observing the surface with a laser microscope, and measuring. When such an evaluation is performed, the present invention is a member existing in the film forming chamber of the film forming apparatus, and at least a portion of the surface of the member to which the film forming component adheres is made of aluminum or an aluminum alloy. The film is sprayed, and in the splats, which are particles forming the aluminum or aluminum alloy sprayed film, the proportion of flat particles accounts for 95% or more of the area ratio of the sprayed film. It is a member for a membrane device.
【0010】また、前記アルミニウム若しくはアルミニ
ウム合金溶射膜の膜厚は、50μm以上500μm以
下、さらに好ましくは100μm以上400μm以下で
あることが好ましい。50μm未満では溶射膜の付着膜
剥離防止効果が十分でなく、500μmを越えると溶射
膜自身の応力が問題となったり、部材の寸法精度が劣る
などの問題が生じる。The film thickness of the aluminum or aluminum alloy sprayed film is preferably 50 μm or more and 500 μm or less, more preferably 100 μm or more and 400 μm or less. If it is less than 50 μm, the effect of preventing the peeling of the deposited film of the sprayed film is not sufficient, and if it exceeds 500 μm, the stress of the sprayed film itself becomes a problem and the dimensional accuracy of the member becomes poor.
【0011】また、前記アルミニウム若しくはアルミニ
ウム合金溶射膜の中心線平均表面粗さ(Ra)が10μ
m以上50μm以下であることが好ましい。10μm未
満では溶射膜の付着膜剥離防止効果が十分でなく、50
μmを越える場合は、偏平していない溶射粒子の割合が
高まる。The center line average surface roughness (Ra) of the aluminum or aluminum alloy sprayed film is 10 μm.
It is preferably m or more and 50 μm or less. If it is less than 10 μm, the effect of preventing the adhesion film peeling off of the sprayed film is not sufficient.
If it exceeds μm, the proportion of non-flat spray particles increases.
【0012】本発明は、記録媒体や半導体の製造におけ
る成膜装置の部材に適用可能である。適用される成膜装
置としては、たとえば、スパッタ装置やCVD(Che
mical Vapor Deposition)装置
などが挙げられる。成膜装置の成膜室内に存在する部材
としては、その表面に成膜成分が付着する可能性がある
部材であれば、特段限定されるものではなく、スパッタ
装置を例にとると、防着板、基板ホルダ、シャッターな
どが挙げられる。これらは固定式であっても、着脱可能
式であってもよい。また、本発明は着脱できない成膜装
置の成膜室内面にも適用することができる。The present invention can be applied to a member of a film forming apparatus in manufacturing a recording medium or a semiconductor. As a film forming apparatus to be applied, for example, a sputtering apparatus or a CVD (Che
A medical vapor deposition device and the like can be mentioned. The member existing in the film forming chamber of the film forming apparatus is not particularly limited as long as the film forming component may adhere to the surface of the film forming apparatus. Examples include plates, substrate holders, shutters, and the like. These may be fixed or removable. Further, the present invention can be applied to the inner surface of a film forming chamber of a film forming apparatus that cannot be attached and detached.
【0013】本発明の成膜装置用部材を、温度を上昇さ
せてCVDを伴うプロセスに適用する場合、アルカリ土
類金属は、しばしばCVDのガスにより部材から揮発し
て異物を形成する場合があるため、前記アルミニウム若
しくはアルミニウム合金溶射膜に含まれるアルカリ土類
金属の量は、該当するいずれの元素においても0.02
wt%以下であることが好ましい。When the film forming apparatus member of the present invention is applied to a process involving CVD by raising the temperature, the alkaline earth metal is often volatilized from the member by the CVD gas to form a foreign substance. Therefore, the amount of alkaline earth metal contained in the aluminum or aluminum alloy sprayed coating is 0.02 for any of the corresponding elements.
It is preferably not more than wt%.
【0014】本発明の溶射膜を形成した部材は、溶射膜
の基材への密着性およびスプラット間の密着性が高く、
図1に示すような基材がステンレスで構成され、磁気デ
ィスク等のディスク状基板を固定し搬送するグリッパー
部材に適用した場合、基板の脱着を非常に多くの回数繰
り返すため、特に効果が高い。The member formed with the sprayed film of the present invention has high adhesion of the sprayed film to the substrate and adhesion between the splats,
When the base material as shown in FIG. 1 is made of stainless steel and applied to a gripper member for fixing and transporting a disk-shaped substrate such as a magnetic disk, the substrate is repeatedly attached and detached a very large number of times, which is particularly effective.
【0015】前記ディスク状基板を固定し搬送するグリ
ッパー部材の該ディスク状基板に接触する部分の前記ア
ルミニウム若しくはアルミニウム合金溶射膜は、図2に
示すように研削されてステンレス基材が露出しているこ
とが好ましい。The aluminum or aluminum alloy sprayed film on the portion of the gripper member that fixes and conveys the disc-shaped substrate and contacts the disc-shaped substrate is ground as shown in FIG. 2 to expose the stainless steel base material. It is preferable.
【0016】このようにすることでディスク状基板と柔
らかいアルミニウム若しくはアルミニウム合金溶射膜の
表面が当たらなくなり、基板の脱着により溶射膜がはが
れる可能性が低くなる。この場合、磁気ディスクに接触
する部分は、影になる部分なので成膜による膜付着はわ
ずかしか起こらない。By doing this, the disk-shaped substrate and the surface of the soft aluminum or aluminum alloy sprayed film do not come into contact with each other, and the possibility that the sprayed film will peel off due to desorption of the substrate is reduced. In this case, since the portion in contact with the magnetic disk is a shadowed portion, film adhesion due to film formation occurs only slightly.
【0017】また、前記アルミニウム若しくはアルミニ
ウム合金溶射膜は、アーク溶射法、プラズマ溶射法、ロ
ーカイド溶射法、フレーム溶射法などによって形成可能
ではあるが、アルミニウム若しくはアルミニウム合金の
ワイヤーを用いて、ローカイド溶射法により、特に好適
に作製される。The aluminum or aluminum alloy sprayed film can be formed by an arc spraying method, a plasma spraying method, a rocaide spraying method, a flame spraying method, or the like. According to this, it is particularly preferably produced.
【0018】[0018]
【実施例】本発明を実施例に基づき更に詳細に説明する
が本発明はこれらの実施例のみに限定されるものではな
い。EXAMPLES The present invention will be described in more detail based on examples, but the present invention is not limited to these examples.
【0019】(実施例1)図1に概略を示すような基材
がステンレスで構成され、磁気ディスクを固定し搬送す
るグリッパー部材を作製した。アーム部品12にクリッ
プ部品11をねじ13で取り付け、溶剤を用いて洗浄
し、WA#60のブラスト剤でブラスト後、99.7%
アルミニウムワイヤーを送りながら、酸素アセチレン炎
で溶融し、その溶滴を圧縮空気で加速し噴射するローカ
イド溶射法により面粗度(Ra)25μm、膜厚200
μmの溶射膜を形成した。溶射膜形成後、図2のように
クリップ部品21の先端で磁気ディスクに接触する部分
24の溶射膜23をステンレス基材のつらに合わせて研
削した。研削後、できあがったグリッパー部材を洗浄剤
で超音波洗浄し、超純水でリンスし、クリーンエアの温
風で乾燥させた。(Example 1) A gripper member for fixing and transporting a magnetic disk was manufactured by using a base material made of stainless steel as schematically shown in FIG. Attach the clip part 11 to the arm part 12 with the screw 13, wash with a solvent, and after blasting with the blasting agent of WA # 60, 99.7%
A surface roughness (Ra) of 25 μm and a film thickness of 200 by a rokaide spraying method in which an aluminum wire is fed and melted by an oxyacetylene flame, and the droplets are accelerated and injected with compressed air.
A sprayed film of μm was formed. After the sprayed film was formed, the sprayed film 23 of the portion 24 in contact with the magnetic disk at the tip of the clip component 21 was ground to match the sill of the stainless base material as shown in FIG. After grinding, the resulting gripper member was ultrasonically cleaned with a cleaning agent, rinsed with ultrapure water, and dried with warm air of clean air.
【0020】(比較例1)2本の99%アルミニウムワ
イヤーに電圧をかけてアークを発生させ、そのエネルギ
ーでワイヤを溶融し、圧縮空気で微粒子化、加速し噴射
するアーク溶射法によりRa30μm、膜厚220μm
の溶射膜を形成した他は、実施例1と同様の工程でグリ
ッパー部材を作製した。(Comparative Example 1) A voltage was applied to two 99% aluminum wires to generate an arc, and the energy was used to melt the wires, atomize the particles with compressed air, accelerate and spray to obtain Ra of 30 μm, film. 220 μm thickness
A gripper member was produced by the same steps as in Example 1 except that the sprayed film of No. 1 was formed.
【0021】(比較例2)ノズルと電極の間隙に不活性
ガスを流し込み、通電によるアークで生成した熱プラズ
マに99%アルミニウム粉末を投入して溶融噴射するプ
ラズマ溶射法によりRa28μm、膜厚180μmの溶
射膜を形成した他は、実施例1と同様の工程でグリッパ
ー部材を作製した。(Comparative Example 2) An inert gas was flown into the gap between the nozzle and the electrode, and 99% aluminum powder was introduced into the thermal plasma generated by the arc by energization and melt injection was performed to obtain Ra 28 μm and film thickness 180 μm. A gripper member was produced in the same process as in Example 1 except that the sprayed film was formed.
【0022】実施例1、比較例1、2ではいずれも同時
に20mm角のステンレス板に研削以外はグリッパー部
材と同様の処理を施した。In each of Example 1 and Comparative Examples 1 and 2, the 20 mm square stainless steel plate was simultaneously treated in the same manner as the gripper member except for grinding.
【0023】実施例1、比較例1、2のそれぞれの部材
表面についてSEMを用いて観察した結果を各々図4〜
6に示す。The results of observing the surface of each member of Example 1 and Comparative Examples 1 and 2 using SEM are shown in FIGS.
6 shows.
【0024】図4の実施例1のローカイドワイヤ溶射法
による溶射膜は大きさが20〜300μm程度の範囲で
よく分散し、また、ほとんど偏平した粒子(スプラッ
ト)が積み重なって構成されている。The sprayed film formed by the rocaide wire spraying method of Example 1 shown in FIG. 4 is well dispersed in a size range of about 20 to 300 μm, and is composed of stacked flat particles (splats).
【0025】図5の比較例1のアーク溶射法による溶射
膜は、大きさ300μm前後の大きな偏平したスプラッ
トが多いが、スプラット周辺部が捩じれて先端がバット
のグリップのような形状をして偏平してない部分が15
%程度みられる。The sprayed film by the arc spraying method of Comparative Example 1 in FIG. 5 has a large flat splat having a size of about 300 μm, but the periphery of the splat is twisted so that the tip has a shape like a grip of a bat and is flat. The part not done is 15
It can be seen around%.
【0026】図6の比較例2のプラズマ溶射法による溶
射膜は、大きさが10〜300μm程度の範囲でよく分
散しているが、スプラット周辺部が捩じれて先端がバッ
トのグリップのような形状をしている偏平してない部分
が10%程度みられる。The sprayed film by the plasma spraying method of Comparative Example 2 in FIG. 6 is well dispersed in the size range of about 10 to 300 μm, but the periphery of the splat is twisted and the tip is shaped like a butt grip. About 10% of the non-flat parts are seen.
【0027】図7は実施例1の、図8は比較例1の20
mm角の試料のX線回折パターンである。(200)/
(111)ピーク強度比は、実施例1で0.32、比較
例1で0.48、また、図示してないが、比較例2では
0.44であった。前述のように、粉末のようなランダ
ム配向では0.47であるため比較例1ではランダム配
向で、実施例1では(111)面の配向が高まってい
る。従って、アルミニウムの溶射膜は溶射粒子の偏平性
が高まるにつれて(111)面の配向が高まることが示
された。FIG. 7 is a graph of Example 1 and FIG. 8 is a graph of Comparative Example 1 20.
It is an X-ray diffraction pattern of a sample of a square mm. (200) /
The (111) peak intensity ratio was 0.32 in Example 1, 0.48 in Comparative Example 1, and 0.44 in Comparative Example 2 although not shown. As described above, since the random orientation such as powder is 0.47, the random orientation is in Comparative Example 1, and the orientation of the (111) plane is increased in Example 1. Therefore, it was shown that the orientation of the (111) plane in the aluminum sprayed film increases as the flatness of the sprayed particles increases.
【0028】実施例1、比較例1、2のグリッパー部材
を、必用な個数成膜装置に装着して、磁気ディスクの成
膜テストを行った。実施例1はターゲット交換寿命まで
グライド欠陥が増加することなく成膜が可能であった
が、比較例1ではターゲット交換寿命の1/3、比較例
2ではターゲット交換寿命の1/2から徐々に欠陥数が
増加した。The gripper members of Example 1 and Comparative Examples 1 and 2 were mounted in a required number of film forming apparatuses, and a film forming test of magnetic disks was conducted. In Example 1, it was possible to form a film without increasing glide defects until the target exchange life, but in Comparative Example 1, 1/3 of the target exchange life and in Comparative Example 2 gradually changed from 1/2 of the target exchange life. The number of defects has increased.
【0029】また、実施例1、比較例1、2と同様のグ
リッパー部材を、クリップ部品12の先端部溶射膜の研
削を省いて製作したところ、いずれも上記寿命の半分程
度で欠陥数が増加始めたが、寿命の序列は変わらなかっ
た。Further, the same gripper members as in Example 1 and Comparative Examples 1 and 2 were manufactured by omitting the grinding of the sprayed film at the tip of the clip part 12, and the number of defects increased in about half of the above life. I started, but the order of longevity did not change.
【0030】実施例1、比較例1、2の溶射膜の組成を
蛍光X線法で分析したところ、いずれもアルカリ土類の
量は0.01wt%の検出限界以下であった。これらの
部材では、イオンビームCVD法によるカーボン成膜に
おいても、アルカリ土類金属パーティクル生成による媒
体欠陥は見られなかった。アルミニウムワイヤーをJI
SAl−Mg合金の5052材に変えたところイオンビ
ームCVD法によるカーボン成膜においてMg起因の欠
陥が見られた。When the compositions of the sprayed coatings of Example 1 and Comparative Examples 1 and 2 were analyzed by the fluorescent X-ray method, the amount of alkaline earth was below the detection limit of 0.01 wt% in all cases. In these members, no medium defect due to the generation of alkaline earth metal particles was observed even in the carbon film formation by the ion beam CVD method. Aluminum wire JI
When the SAl-Mg alloy 5052 material was used, defects due to Mg were found in the carbon film formation by the ion beam CVD method.
【0031】以上本発明の部材を磁気ディスク製造の為
のグリッパーの例で説明したが、前述のように、本発明
は、記録媒体や半導体の製造における成膜装置の部材に
適用可能である。適用される成膜装置としては、たとえ
ば、スパッタ装置やCVD(Chemical Vap
or Deposition)装置などが挙げられる。
成膜装置の成膜室内に存在する部材としては、その表面
に成膜成分が付着する可能性がある部材であれば、特段
限定されるものではなく、スパッタ装置を例にとると、
防着板、基板ホルダ、シャッターなどが挙げられる。こ
れらは固定式であっても、着脱可能式であってもよい。
また、本発明は着脱できない成膜装置の成膜室内面にも
適用することができる。The member of the present invention has been described above with reference to an example of a gripper for manufacturing a magnetic disk, but as described above, the present invention can be applied to a member of a film forming apparatus in manufacturing a recording medium or a semiconductor. As a film forming apparatus to be applied, for example, a sputtering apparatus or a CVD (Chemical Vap) is used.
or Deposition) device and the like.
The member existing in the film forming chamber of the film forming apparatus is not particularly limited as long as the film forming component may adhere to the surface of the member, and a sputtering apparatus is taken as an example.
Examples thereof include a deposition preventive plate, a substrate holder, and a shutter. These may be fixed or removable.
Further, the present invention can be applied to the inner surface of a film forming chamber of a film forming apparatus that cannot be attached and detached.
【0032】[0032]
【発明の効果】本発明では、成膜装置用部材表面に形成
される溶射膜のスプラットの偏平性を高めることによ
り、溶射膜の基材への密着性、スプラット間の密着性、
付着膜の密着性が高まる。このため、溶射膜および成膜
による付着膜の剥離を防止し、特にグリッパーのように
成膜と媒体基板の脱着を繰り返す成膜装置用部材のメン
テナンス寿命を高めることができる。According to the present invention, by increasing the flatness of the splats of the sprayed film formed on the surface of the member for film forming apparatus, the adhesion of the sprayed film to the substrate, the adhesion between the splats,
The adhesion of the adhered film is enhanced. Therefore, peeling of the sprayed film and the adhered film due to film formation can be prevented, and in particular, the maintenance life of a film forming apparatus member such as a gripper that repeats film formation and attachment / detachment of the medium substrate can be increased.
【図1】本発明における磁気ディスクを固定し搬送する
(グリッパー)部材の一例を示す図である。FIG. 1 is a diagram showing an example of a (gripper) member that fixes and conveys a magnetic disk according to the present invention.
【図2】本発明における磁気ディスクを固定し搬送する
(グリッパー)部材への溶射膜の被着状況および部材先
端の磁気ディスクと接触する部分の溶射後の加工方法の
一例を示す図である。FIG. 2 is a diagram showing an example of a coating state of a sprayed film on a (gripper) member for fixing and transporting a magnetic disk and a processing method after thermal spraying of a portion of a tip of the member in contact with the magnetic disk according to the present invention.
【図3】磁気ディスクを固定し搬送する(グリッパー)
部材の磁気ディスクを固定する状況を示す図である。[Fig. 3] Fixing and transporting a magnetic disk (gripper)
It is a figure which shows the condition which fixes the magnetic disk of a member.
【図4】本発明の実施例1のアルミニウム溶射膜のSE
M写真である。FIG. 4 SE of the aluminum sprayed film of Example 1 of the present invention
It is an M photograph.
【図5】比較例1のアルミニウム溶射膜のSEM写真で
ある。5 is an SEM photograph of an aluminum sprayed film of Comparative Example 1. FIG.
【図6】比較例2のアルミニウム溶射膜のSEM写真で
ある。6 is an SEM photograph of an aluminum sprayed film of Comparative Example 2. FIG.
【図7】本発明の実施例1のアルミニウム溶射膜のX線
回折パターンである。FIG. 7 is an X-ray diffraction pattern of the aluminum sprayed film of Example 1 of the present invention.
【図8】比較例1のアルミニウム溶射膜のX線回折パタ
ーンである。FIG. 8 is an X-ray diffraction pattern of the aluminum sprayed film of Comparative Example 1.
11、21 クリップ部品
12、22 アーム部品
13 ねじ
23 溶射膜
24 切削面(磁気ディスクに接触する部分)
31 磁気ディスク基板
32 磁気ディスクを固定し搬送する(グリッパ
ー)部材11, 21 Clip parts 12, 22 Arm parts 13 Screws 23 Sprayed film 24 Cutting surface (portion in contact with magnetic disk) 31 Magnetic disk substrate 32 Member for fixing and conveying magnetic disk (gripper) member
───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.7 識別記号 FI テーマコート゛(参考) C23C 16/44 C23C 16/44 J G11B 5/851 G11B 5/851 H01L 21/68 H01L 21/68 U ─────────────────────────────────────────────────── ─── Continued Front Page (51) Int.Cl. 7 Identification Code FI Theme Coat (Reference) C23C 16/44 C23C 16/44 J G11B 5/851 G11B 5/851 H01L 21/68 H01L 21/68 U
Claims (8)
て、該部材の表面の、少なくとも成膜成分が付着する部
分に、アルミニウム若しくはアルミニウム合金からなる
膜が溶射されており、該アルミニウム若しくはアルミニ
ウム合金溶射膜のX線回折による(200)面のピーク
強度の(111)面のピーク強度に対する比が0.4未
満であることを特徴とする成膜装置用部材。1. A member existing in a film forming chamber of a film forming apparatus, wherein a film made of aluminum or an aluminum alloy is sprayed on at least a portion of a surface of the member to which a film forming component adheres. A member for a film forming apparatus, wherein the ratio of the peak intensity of the (200) plane to the peak intensity of the (111) plane by X-ray diffraction of the aluminum or aluminum alloy sprayed film is less than 0.4.
て、該部材の表面の、少なくとも成膜成分が付着する部
分に、アルミニウム若しくはアルミニウム合金からなる
膜が溶射されており、該アルミニウム若しくはアルミニ
ウム合金溶射膜を構成する粒子であるスプラットの中
で、偏平したスプラットの割合が、該溶射膜の面積比で
95%以上を占めることを特徴とする成膜装置用部材。2. A member existing in a film forming chamber of a film forming apparatus, wherein a film made of aluminum or an aluminum alloy is sprayed on at least a portion of a surface of the member to which a film forming component adheres. A member for a film forming apparatus, wherein flat splats account for 95% or more of the area ratio of the sprayed film among the splats that are particles constituting the aluminum or aluminum alloy sprayed film.
金溶射膜に含まれるアルカリ土類金属の量が、該当する
いずれの元素においても0.02wt%以下であること
を特徴とする請求項1または2に記載の成膜装置用部
材。3. The amount of alkaline earth metal contained in the aluminum or aluminum alloy sprayed coating is 0.02 wt% or less for any of the applicable elements, according to claim 1 or 2. Member for film forming apparatus.
金溶射膜の膜厚が、50μm以上500μm以下である
ことを特徴とする請求項1〜3のいずれか1項に記載の
成膜装置用部材。4. The film forming apparatus member according to claim 1, wherein the film thickness of the aluminum or aluminum alloy sprayed film is 50 μm or more and 500 μm or less.
金溶射膜の中心線平均表面粗さ(Ra)が10μm以上
50μm以下であることを特徴とする請求項1〜4のい
ずれか1項に記載の成膜装置用部材。5. The film forming apparatus according to claim 1, wherein the center line average surface roughness (Ra) of the aluminum or aluminum alloy sprayed film is 10 μm or more and 50 μm or less. Parts.
構成され、ディスク状基板を固定し搬送する部材である
ことを特徴とする請求項1〜5のいずれか1項に記載の
成膜装置用部材。6. The film forming apparatus member according to claim 1, wherein a base material of the film forming apparatus member is made of stainless steel, and is a member for fixing and transporting the disk-shaped substrate. Member for membrane device.
の該ディスク状基板に接触する部分の前記アルミニウム
若しくはアルミニウム合金溶射膜が、研削されてステン
レス基材が露出していることを特徴とする請求項6に記
載の成膜装置用部材。7. The stainless steel base material is exposed by grinding the aluminum or aluminum alloy sprayed film on the portion of the member for fixing and carrying the disk-shaped substrate that comes into contact with the disk-shaped substrate. The member for a film forming apparatus according to claim 6.
金溶射膜を、アルミニウム若しくはアルミニウム合金の
ワイヤーを用いて、ローカイド溶射法により作製するこ
とを特徴とする請求項1〜7のいずれか1項に記載の成
膜装置用部材の製造方法。8. The film according to any one of claims 1 to 7, wherein the aluminum or aluminum alloy sprayed film is produced by a rokaide spraying method using a wire of aluminum or aluminum alloy. A method for manufacturing a device member.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2001236124A JP2003049260A (en) | 2001-08-03 | 2001-08-03 | Member for film deposition apparatus and method for manufacturing the same |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2001236124A JP2003049260A (en) | 2001-08-03 | 2001-08-03 | Member for film deposition apparatus and method for manufacturing the same |
Publications (1)
Publication Number | Publication Date |
---|---|
JP2003049260A true JP2003049260A (en) | 2003-02-21 |
Family
ID=19067458
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2001236124A Pending JP2003049260A (en) | 2001-08-03 | 2001-08-03 | Member for film deposition apparatus and method for manufacturing the same |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2003049260A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007105721A (en) * | 2005-07-29 | 2007-04-26 | Boc Group Inc:The | Method and apparatus for the application of twin wire arc spray coating |
WO2011001640A1 (en) * | 2009-06-29 | 2011-01-06 | 新日本製鐵株式会社 | Zinc-aluminum galvanized iron wire and manufacturing method therefor |
JP2011112294A (en) * | 2009-11-27 | 2011-06-09 | Kobe Steel Ltd | Heat transfer tube and header pipe for open rack type vaporizer |
-
2001
- 2001-08-03 JP JP2001236124A patent/JP2003049260A/en active Pending
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007105721A (en) * | 2005-07-29 | 2007-04-26 | Boc Group Inc:The | Method and apparatus for the application of twin wire arc spray coating |
WO2011001640A1 (en) * | 2009-06-29 | 2011-01-06 | 新日本製鐵株式会社 | Zinc-aluminum galvanized iron wire and manufacturing method therefor |
CN102084018A (en) * | 2009-06-29 | 2011-06-01 | 新日本制铁株式会社 | Zinc-aluminum galvanized iron wire and manufacturing method therefor |
JP4782247B2 (en) * | 2009-06-29 | 2011-09-28 | 新日本製鐵株式会社 | Zn-Al plated iron wire and method for producing the same |
KR101261126B1 (en) * | 2009-06-29 | 2013-05-06 | 신닛테츠스미킨 카부시키카이샤 | Zn-Al PLATED IRON WIRE AND PRODUCING METHOD THEREFOR |
JP2011112294A (en) * | 2009-11-27 | 2011-06-09 | Kobe Steel Ltd | Heat transfer tube and header pipe for open rack type vaporizer |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
TWI336354B (en) | Cleaning and refurbishing chamber components having metal coatings | |
JP5197935B2 (en) | Method for the application of twin wire arc spray coating | |
US8053058B2 (en) | Spray-coated member having an excellent resistance to plasma erosion and method of producing the same | |
KR100631275B1 (en) | Sputtering target producing few particles or backing plate and sputtering method producing few particles | |
JP4546447B2 (en) | Thermal spray coating coated member having excellent plasma erosion resistance and method for producing the same | |
JPH10330971A (en) | Production of member for thin film forming apparatus and member for the apparatus | |
US7531232B2 (en) | Component for vacuum apparatus, production method thereof and apparatus using the same | |
JP4546448B2 (en) | Thermal spray coating coated member having excellent plasma erosion resistance and method for producing the same | |
JP4894158B2 (en) | Vacuum equipment parts | |
JP5283880B2 (en) | Vacuum deposition system | |
JP3076768B2 (en) | Method for manufacturing member for thin film forming apparatus | |
JP2003049260A (en) | Member for film deposition apparatus and method for manufacturing the same | |
JP4820508B2 (en) | Sputtering target and manufacturing method thereof, sputtering apparatus, thin film manufacturing method, electronic component manufacturing method | |
JP4604640B2 (en) | Vacuum device parts, manufacturing method thereof, and apparatus using the same | |
US20080268281A1 (en) | Shield Components With Enhanced Thermal and Mechanical Stability | |
JP2007100218A (en) | Component for vacuum film deposition system, vacuum film deposition system using the same, and target and backing plate | |
JP2007077421A (en) | Member for plasma treatment apparatus, and its manufacturing method | |
JP2000204469A (en) | Member for film forming device, film forming device, film formation and film-formed substrate for magnetic head | |
JP3521583B2 (en) | Method of improving peel resistance of thermal barrier coating layer on metal substrate surface | |
JP2002069627A (en) | Sputtering target and sputtering apparatus using the same | |
JP2009048877A (en) | Ion implanter | |
JP2002088464A (en) | Parts for vacuum film deposition system, vacuum film deposition system using the same, target device, and vacuum film deposition method | |
TW202311055A (en) | Antifouling film and use thereof that enhances quality and yield of products, and protects and reduces equipment loss | |
JP2003049259A (en) | Substrate transport member | |
JP2717710B2 (en) | Film etching equipment |