JP2003046365A - Two-layer electrode film for crystal vibrator - Google Patents
Two-layer electrode film for crystal vibratorInfo
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- JP2003046365A JP2003046365A JP2001233639A JP2001233639A JP2003046365A JP 2003046365 A JP2003046365 A JP 2003046365A JP 2001233639 A JP2001233639 A JP 2001233639A JP 2001233639 A JP2001233639 A JP 2001233639A JP 2003046365 A JP2003046365 A JP 2003046365A
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- JP
- Japan
- Prior art keywords
- film
- layer
- pure
- alloy
- alloy film
- Prior art date
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Abstract
Description
【０００１】[0001]
【発明に属する技術分野】本発明は、主として携帯電話
等の水晶振動子の電極膜として使用される、水晶（Si
O2）の基盤上に形成される水晶振動子用の２層電極膜に
関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a crystal (Si) which is mainly used as an electrode film of a crystal resonator of a mobile phone or the like.
The present invention relates to a two-layer electrode film for a crystal unit formed on a substrate of O 2 ).
【０００２】[0002]
【従来の技術】従来、主に携帯電話等に使用されている
水晶振動子用の電極膜の一般的構造は、機械的な振動を
電気信号に変えて出力する際最も有効に取り出すことの
できる水晶を基盤とし、その上に導電性に優れたＡｕ膜
あるいはＡｇ膜を成膜する。その際直接水晶基盤にＡｕ
膜あるいはＡｇ膜を成膜すると水晶基盤とＡｕ膜あるい
はＡｇ膜との界面に於いて密着性が悪いため、水晶基盤
に第１層として純Ｎｉあるいは純Ｃｒの金属薄膜を接合
材として１００〜１０００オングストロームの膜厚で成
膜している。その上に第２層として純Ａｕあるいは純Ａ
ｇの金属が１００〜２００００オングストロームの膜厚
で成膜された構造を持つ、水晶振動子用の２層電極膜が
一般的に用いられている。2. Description of the Related Art Conventionally, a general structure of an electrode film for a crystal resonator, which is mainly used in a mobile phone or the like, can be most effectively taken out when converting mechanical vibration into an electric signal and outputting the electric signal. Based on quartz, an Au film or an Ag film having excellent conductivity is formed on it. At that time, directly on the crystal substrate Au
When a film or Ag film is formed, the adhesion is poor at the interface between the quartz substrate and the Au film or Ag film. Therefore, a metal thin film of pure Ni or pure Cr is used as the first layer on the quartz substrate to form a bonding material of 100 to 1000. The film thickness is angstrom. On top of that, pure Au or pure A is used as the second layer.
A two-layer electrode film for a crystal resonator, which has a structure in which g of metal is formed in a film thickness of 100 to 20000 angstrom, is generally used.
【０００３】[0003]
【発明が解決しようとする課題】上記の構造を持つ水晶
振動子の２層電極膜は、図２に示す構成の引張り試験に
よる密着強度測定結果に於いて、第１層に純Ｎｉ膜を成
膜し第２層に純Ａｕまたは純Ａｇが成膜されたものは
０．８〜０．９ＭＰａであり、第１層に純Ｃｒ膜を成膜
し第２層に純Ａｕまたは純Ａｇが成膜されたものは１．
２〜１．５ＭＰａの密着強度を有する水晶振動子用の２
層電極膜である。The two-layer electrode film of the crystal unit having the above structure has a pure Ni film as the first layer in the adhesion strength measurement result by the tensile test of the structure shown in FIG. The film formed by depositing pure Au or pure Ag on the second layer is 0.8 to 0.9 MPa, and a pure Cr film is deposited on the first layer and pure Au or pure Ag is formed on the second layer. What was filmed was 1.
2 for crystal unit with adhesion strength of 2-1.5 MPa
It is a layer electrode film.
【０００４】上記の引張り試験による密着強度の測定結
果より、第１層に純Ｎｉ膜を成膜し第２層に純Ａｕまた
は純Ａｇが成膜されたものは０．８〜０．９ＭＰａであ
るため、長時間通電することにより水晶基盤と第１層の
界面及び第１層と第２層の界面に於いて剥離を起こす可
能性がある。また水晶基盤に第１層として純Ｃｒが使用
された場合、第１層の膜として成膜された純Ｃｒ膜は第
１層の膜として成膜された純Ｎｉ膜に比べ上記の引張り
試験による密着強度が１．２〜１．５ＭＰａと若干高い
ものの、第１層の膜として使用されるＣｒが環境問題と
なっている。From the results of the measurement of the adhesion strength by the above tensile test, the pure Ni film is formed on the first layer and the pure Au or pure Ag is formed on the second layer at 0.8 to 0.9 MPa. Therefore, there is a possibility that peeling may occur at the interface between the quartz substrate and the first layer and at the interface between the first layer and the second layer by energizing for a long time. When pure Cr is used as the first layer in the quartz substrate, the pure Cr film formed as the first layer film is compared with the pure Ni film formed as the first layer film by the above tensile test. Although the adhesion strength is slightly high at 1.2 to 1.5 MPa, Cr used as the first layer film is an environmental problem.
【０００５】更に機械的振動による膜の密着性を確認す
るため、図３に示すスクラッチテストによる測定を行っ
た結果、第１層に純Ｎｉ膜あるいは純Ｃｒ膜を成膜し第
２層に純Ａｕが成膜されたものは１４Ｎ〜１７Ｎである
ため、機械的な振動を長時間受けた際、水晶基盤と第１
層の界面及び第１層と第２層の界面に於いて剥離を起こ
す可能性がある。Further, in order to confirm the adhesion of the film due to mechanical vibration, the scratch test shown in FIG. 3 was carried out. As a result, a pure Ni film or a pure Cr film was formed on the first layer and a pure film was formed on the second layer. Since the deposited Au film has a thickness of 14N to 17N, when it is subjected to mechanical vibration for a long time,
Delamination may occur at the interface of the layers and at the interface of the first and second layers.
【０００６】したがって、本発明の目的は、水晶基盤に
第１層として使用される純Ｎｉ膜および純Cr膜よりも密
着強度が優れ、また第１層で使用されるＣｒによる環境
問題の緩和を考慮した水晶振動子用２層電極膜を提供す
ることにある。Therefore, the object of the present invention is that the adhesion strength is superior to the pure Ni film and the pure Cr film used as the first layer on the quartz substrate, and that the Cr used in the first layer alleviates environmental problems. It is to provide a two-layer electrode film for a crystal unit in consideration.
【０００７】[0007]
【課題を解決するための手段】上記の課題を解決するた
めの手段として、水晶を基盤とし第１層としてＮｉ―Ｃ
ｒ合金膜、Ｎｉ―Ｔｉ合金膜、Ｎｉ―W合金膜のいずれ
かの金属薄膜からなり、第２層として純Ａｕあるいは純
Ａｇの金属膜を有する構造を持つことを特徴とする水晶
振動子用の２層電極膜を採用するものである。[Means for Solving the Problems] As a means for solving the above-mentioned problems, quartz is used as a base and Ni—C is used as the first layer.
For a crystal oscillator, characterized by comprising a metal thin film of any one of an r alloy film, a Ni-Ti alloy film, and a Ni-W alloy film, and having a structure having a pure Au or pure Ag metal film as the second layer. The two-layer electrode film is used.
【０００８】その際、第１層合金膜に含まれるＣｒ、Ｔ
ｉ、Wの含有量は４〜４０％であるが、４〜２５％であ
ることが最も望ましい。第１層及び第２層の成膜に於い
ては、スパッターリング法の物理的蒸着法によって成膜
することで、水晶基盤と第１層間の界面または第１層と
第２層間の界面に於いての密着性に優れ、引張り試験に
於いて１．６MＰａ以上、またはスクラッチテストに於
いて２０Ｎ以上であることを特徴とする水晶振動子用の
２層電極膜が得られる。At this time, Cr and T contained in the first layer alloy film
The content of i and W is 4 to 40%, but the most preferable content is 4 to 25%. In the film formation of the first layer and the second layer, the film is formed by a physical vapor deposition method such as a sputtering method so that the film is formed at the interface between the quartz substrate and the first layer or the interface between the first layer and the second layer. A double-layer electrode film for a crystal resonator is obtained which is excellent in adhesiveness and has a tensile test of 1.6 MPa or more, or a scratch test of 20 N or more.
【０００９】[0009]
【発明の実施の形態】本発明に於ける水晶振動子用の２
層電極膜は、表面研磨及び洗浄処理が施された水晶基盤
と第１層として使用されるＮｉ―Ｃｒ合金、Ｎｉ―Ｔｉ
合金、Ｎｉ―W合金のスパッターリングターゲットと第
２層として使用される純Ａｕ及び純Ａｇのスパッターリ
ングターゲットを用意し、水晶基盤に第１層としてＮｉ
―Ｃｒ合金、Ｎｉ―Ｔｉ合金、Ｎｉ―W合金のスパッタ
ーリングターゲットのいずれかを用いて真空中もしくは
不活性ガス雰囲気中にてスパッターリング法による成膜
を行う。その成膜されたものに第２層として純Ａｕある
いは純Ａｇのスパッターリングターゲットを用いて真空
中もしくは不活性ガス雰囲気中にてスパッターリング法
により成膜する。この製作された２層電極膜の張り試験
による密着強度は１．６ＭＰa以上であり、またスクラ
ッチテストによる密着強度は２．０Ｎ以上と第１層に使
用される純Ｎｉまたは純Ｃｒよりも密着強度に優れた構
造を持ち、更にＣｒによる環境問題の緩和を考慮した水
晶振動子用の２層電極膜が得られる。BEST MODE FOR CARRYING OUT THE INVENTION 2 for a crystal unit according to the present invention
The layer electrode film includes a quartz substrate that has been surface-polished and cleaned, and a Ni-Cr alloy and Ni-Ti used as the first layer.
Alloy and Ni-W alloy sputtering targets and pure Au and pure Ag sputtering targets used as the second layer are prepared.
A film is formed by a sputtering method in a vacuum or in an inert gas atmosphere using any of a sputtering target of a --Cr alloy, a Ni--Ti alloy, and a Ni--W alloy. The formed film is formed as a second layer by a sputtering method in a vacuum or in an inert gas atmosphere using a sputtering target of pure Au or pure Ag. The adhesion strength of the produced two-layer electrode film in the tension test is 1.6 MPa or more, and the adhesion strength in the scratch test is 2.0 N or more, which is higher than that of pure Ni or pure Cr used for the first layer. It is possible to obtain a two-layer electrode film for a crystal unit, which has an excellent structure and further considers mitigation of environmental problems due to Cr.
【００１０】[0010]
【実施例】（実施例１）成膜された膜の密着強度を確認
するため、図１に示すように、研磨及び表面洗浄を行っ
た２０×３０mmの水晶を基盤１０とし第１層１２にＮｉ
―７％Ｃｒ合金、Ｎｉ―７．５％Ｔｉ合金、Ｎｉ―１９
％W合金の３種類を真空中でスパッターリング法により
膜厚を１２５オングストロームにて成膜し、これらの３
種類に第２層１４として純Ａｕと純Ａｇの２種類を真空
中でスパッターリング法により膜厚を２５００オングス
トロームにて成膜し熱処理を行った水晶振動子用の２層
電極膜を製作した。EXAMPLES (Example 1) In order to confirm the adhesion strength of the formed film, as shown in FIG. 1, a 20 × 30 mm quartz crystal that had been subjected to polishing and surface cleaning was used as a substrate 10 and a first layer 12 was formed. Ni
-7% Cr alloy, Ni-7.5% Ti alloy, Ni-19
% W alloy was formed into a film with a film thickness of 125 Å by a sputtering method in vacuum.
As the second layer 14, two kinds of electrodes, that is, pure Au and pure Ag, were formed into a film with a film thickness of 2500 angstroms in a vacuum by a sputtering method and heat-treated to produce a two-layer electrode film for a crystal unit.
【００１１】この製作した水晶振動子の２層膜電極６種
類を用いて、成膜された膜の密着強度を測定するため、
図２に示す引張り試験を行った。引張り試験の条件とし
て、上記の製作した水晶振動子用の２層電極膜各類にエ
ポキシ系接着剤にてSUS板及び角棒を接合して共試材と
し、引張り方向が垂直となるように共試材をＣ型フック
にぶら下げ、静止を確認してから引張り試験を行い、水
晶基盤と第１層の界面または第１層と第２層の界面に於
いて破断した最大力を測定した。In order to measure the adhesion strength of the formed film by using 6 kinds of the two-layer film electrodes of the manufactured crystal unit,
The tensile test shown in FIG. 2 was performed. As a condition for the tensile test, a SUS plate and a square bar are bonded to each of the above-prepared two-layer electrode films for a crystal unit with an epoxy adhesive to form a co-test material so that the tensile direction is vertical. The co-test material was hung on a C-shaped hook and, after confirming that it was stationary, a tensile test was carried out to measure the maximum force at which fracture occurred at the interface between the quartz substrate and the first layer or at the interface between the first layer and the second layer.
【００１２】引張り試験の測定結果としては、図４のよ
うに第１層にＮｉ―７％Ｃｒ合金膜、Ｎｉ―７．５％Ｔ
ｉ合金膜、Ｎｉ―１９％W合金膜を使用し第２層にＡｕ
膜を成膜したものはいずれの合金膜に於いても１．６Ｍ
Ｐa以上の安定した密着強度が得られた。また図５に示
すように第２層に純Ａｇを成膜したものは２．０ＭＰa
以上の密着強度が得られ、特に第１層にＮｉ―７．５％
Ｔｉ合金膜を成膜したものは５．１ＭＰaの密着強度が
得られ、従来第１層にＣｒ膜を成膜したものより密着強
度が優れた水晶振動子用の２層電極膜が得られた。As the measurement results of the tensile test, as shown in FIG. 4, a Ni-7% Cr alloy film and a Ni-7.5% T film were used as the first layer.
i alloy film, Ni-19% W alloy film is used, and Au is used for the second layer.
Any alloy film with a film thickness of 1.6M
A stable adhesion strength of Pa or more was obtained. Also, as shown in FIG. 5, the film having pure Ag deposited on the second layer has a pressure of 2.0 MPa.
The above adhesion strength is obtained, especially Ni-7.5% in the first layer.
The one with the Ti alloy film formed had an adhesion strength of 5.1 MPa, and the two-layer electrode film for a quartz oscillator having the adhesion strength superior to the one with the conventional Cr film formed on the first layer was obtained. .
【００１３】（実施例２）研磨及び表面洗浄を行った２
０×３０mmの水晶を基盤とし第１層にＮｉ―７％Ｃｒ合
金、Ｎｉ―７．５％Ｔｉ合金、Ｎｉ―１９％W合金の３
種類を真空中でスパッターリング法により膜厚を１２５
オングストロームにて成膜し、これらの３種類に第２層
として純Ａｕと純Ａｇを真空中でスパッターリング法に
より膜厚を２５００オングストロームにて成膜し熱処理
を行った水晶振動子用の２層電極膜を３種類製作した。Example 2 Polishing and surface cleaning 2
Based on 0x30mm crystal, Ni-7% Cr alloy, Ni-7.5% Ti alloy and Ni-19% W alloy are used for the first layer.
The film thickness is 125 by the sputtering method in the vacuum.
Two layers for quartz resonators, which were formed by angstrom, and pure Au and pure Ag were formed as a second layer on these three kinds by sputtering in vacuum to a film thickness of 2500 angstrom and heat-treated. Three kinds of electrode films were manufactured.
【００１４】この製作した水晶振動子の２層膜電極３種
類を用いて、機械的な振動による密着強度を測定するた
め、皮膜内部または表面で起きる破壊をアコースティッ
ク・エミッションセンサーで検出する自動スクラッチ試
験機にて図３に示すスクラッチテストを行った。スクラ
ッチテストの測定条件として、圧子に半径０．２mmのダ
イヤモンドを使用し加重変化量約８Ｎmmにて測定した結
果、図６に示すように第２層にＡｕ膜を使用し第１層に
Ｎｉ―Ｃｒ合金膜、Ｎｉ―Ｔｉ合金膜、Ｎｉ―W合金膜
を使用したものはいずれの合金膜に於いても２．０Ｎ以
上と従来第１層にＣｒ膜を成膜したもの以上の密着強度
が得られ、密着強度に優た水晶振動子用の２層電極膜が
得られた。An automatic scratch test in which the acoustic emission sensor detects the damage occurring inside or on the surface of the film in order to measure the adhesion strength due to mechanical vibration using the three kinds of the two-layer film electrodes of the produced crystal unit. The scratch test shown in FIG. 3 was performed on the machine. As a measurement condition of the scratch test, a diamond having a radius of 0.2 mm was used as an indenter, and the measurement was performed at a weight change of about 8 Nmm. As a result, as shown in FIG. 6, an Au film was used for the second layer and a Ni- layer was used for the first layer. All of the alloy films using the Cr alloy film, the Ni-Ti alloy film, and the Ni-W alloy film have an adhesion strength of 2.0 N or more, which is higher than that of the conventional Cr film formed on the first layer. Thus obtained was a two-layer electrode film for a crystal oscillator having excellent adhesion strength.
【００１５】[0015]
【発明の効果】本発明の、水晶を基盤とし第１層として
Ｎｉ―Ｃｒ合金膜、Ｎｉ―Ｔｉ合金膜、Ｎｉ―W合金膜
のいずれかの密着強度に優れた金属薄膜からなり、第２
層として純Ａｕあるいは純Ａｇの耐腐食性の金属を有す
る構造の２層電極膜により、従来使用されている第１層
の純Ｎｉ膜または純Ｃｒ膜より密着強度に優れ、また従
来第１層に使用されているＣｒによる環境問題を配慮し
た水晶振動子用の２層電極膜が得られる。According to the present invention, a quartz-based metal thin film having a high adhesion strength is used as the first layer of any one of a Ni--Cr alloy film, a Ni--Ti alloy film and a Ni--W alloy film.
A two-layer electrode film having a structure containing a corrosion-resistant metal of pure Au or pure Ag as a layer has superior adhesion strength to the conventionally used first layer of pure Ni film or pure Cr film, and also has a conventional first layer. It is possible to obtain a two-layer electrode film for a crystal unit in consideration of environmental problems due to the Cr used in.
【図１】図１は水晶振動子用の２層電極膜構造を示す断
面図である。FIG. 1 is a cross-sectional view showing a two-layer electrode film structure for a crystal resonator.
【図２】図２は引張り試験の構成を説明するための図で
ある。FIG. 2 is a diagram for explaining a configuration of a tensile test.
【図３】図３はスクラッチテストの構成を説明するため
の図である。FIG. 3 is a diagram for explaining a structure of a scratch test.
【図４】図４は水晶基盤/合金膜/Ａｕ膜に於ける引張り
強度試験結果を示すグラフである。FIG. 4 is a graph showing tensile strength test results for a quartz substrate / alloy film / Au film.
【図５】図５は水晶基盤/合金膜/Ａｇ膜に於ける引張り
強度試験結果を示すグラフである。FIG. 5 is a graph showing tensile strength test results for a quartz substrate / alloy film / Ag film.
【図６】図６は水晶基盤/合金膜/Ａｕ膜に於けるスクラ
ッチテスト結果を示すグラフである。FIG. 6 is a graph showing the results of a scratch test on a quartz substrate / alloy film / Au film.
１０ 水晶基盤
１２ 第１層（Ｎｉ−Ｃｒ，Ｎｉ−Ｔｉ，Ｎｉ−Ｗ
のいずれかの合金膜）
１４ 第２層（Ａｕ膜あるいはＡｇ膜）10 Crystal substrate 12 First layer (Ni-Cr, Ni-Ti, Ni-W
Any of the above alloy films) 14 Second layer (Au film or Ag film)
───────────────────────────────────────────────────── フロントページの続き (72)発明者 永田 純一 千葉県市川市中国分３−18−５ 住友金属 鉱山株式会社中央研究所内 Ｆターム(参考） 4K029 AA08 BA04 BA05 BA25 BB02 BD03 CA05 5J108 BB02 FF03 FF05 ─────────────────────────────────────────────────── ─── Continued front page (72) Inventor Junichi Nagata 3-18-5 Chugoku, Ichikawa, Chiba Sumitomo Metals Central Research Laboratory, Mining Co., Ltd. F-term (reference) 4K029 AA08 BA04 BA05 BA25 BB02 BD03 CA05 5J108 BB02 FF03 FF05
Claims (5)
金膜、Ｎｉ―Ｔｉ合金膜、Ｎｉ―W合金膜のいずれかの
金属薄膜からなり、第２層として純Ａｕあるいは純Ａｇ
の金属膜を有する構造を持つことを特徴とする水晶振動
子用の２層電極膜。1. A quartz-based first layer comprising a metal thin film of any one of a Ni—Cr alloy film, a Ni—Ti alloy film and a Ni—W alloy film, and a second layer of pure Au or pure Ag.
A two-layer electrode film for a crystal unit, which has a structure having the metal film of.
金膜、Ｎｉ―Ｔｉ合金膜、Ｎｉ―W合金膜のいずれかの
金属薄膜からなり、第２層として純Ａｕあるいは純Ａｇ
の金属膜を有する構造であり、物理的蒸着法によって成
膜することを特徴とする請求項１記載の水晶振動子用の
２層電極膜。2. A quartz-based first layer made of a metal thin film of any one of a Ni—Cr alloy film, a Ni—Ti alloy film and a Ni—W alloy film, and a second layer of pure Au or pure Ag.
The two-layer electrode film for a crystal resonator according to claim 1, wherein the two-layer electrode film has a metal film according to claim 1 and is formed by a physical vapor deposition method.
ｉ合金膜、Ｎｉ―W合金膜におけるＣｒ、Ｔｉ、Wの含有
量は４〜２５％であることを特徴とする請求項１または
２に記載の水晶振動子用の２層電極膜。3. A Ni—Cr alloy film, Ni—T as the first layer.
The two-layer electrode film for a crystal resonator according to claim 1 or 2, wherein the contents of Cr, Ti, and W in the i alloy film and the Ni-W alloy film are 4 to 25%.
金膜、Ｎｉ―Ｔｉ合金膜、Ｎｉ―W合金膜のいずれかの
金属薄膜からなり、第２層として純Ａｕあるいは純Ａｇ
金属膜を有する構造であり、引張り試験に於いて水晶基
盤と第１層の界面または第１層と第２層の界面に於ける
密着強度が１．６MＰａ以上であることを特徴とする請
求項１または２に記載の水晶振動子用の２層電極膜。4. A quartz-based first layer comprising a metal thin film of any one of a Ni—Cr alloy film, a Ni—Ti alloy film and a Ni—W alloy film, and a second layer of pure Au or pure Ag.
A structure having a metal film, wherein the adhesion strength at the interface between the quartz substrate and the first layer or at the interface between the first layer and the second layer in the tensile test is 1.6 MPa or more. A two-layer electrode film for a crystal resonator according to 1 or 2.
金膜、Ｎｉ―Ｔｉ合金膜、Ｎｉ―W合金膜のいずれかの
金属薄膜からなり、第２層として純Ａｕあるいは純Ａｇ
金属膜を有する構造であり、スクラッチテストに於いて
水晶基盤と第１層の界面または第１層と第２層の界面に
於ける密着強度が２０Ｎ以上であることを特徴とする請
求項１または２のいずれかに記載の水晶振動子用の２層
電極膜。5. A quartz-based first layer comprising a metal thin film of any one of a Ni—Cr alloy film, a Ni—Ti alloy film and a Ni—W alloy film, and a second layer of pure Au or pure Ag.
A structure having a metal film, wherein the adhesion strength at the interface between the quartz substrate and the first layer or at the interface between the first layer and the second layer in the scratch test is 20 N or more. 2. A two-layer electrode film for a crystal resonator according to any one of 2.
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|---|---|---|---|
| JP2001233639A JP2003046365A (en) | 2001-08-01 | 2001-08-01 | Two-layer electrode film for crystal vibrator |
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| JP2001233639A JP2003046365A (en) | 2001-08-01 | 2001-08-01 | Two-layer electrode film for crystal vibrator |
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Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS54132187A (en) * | 1978-04-06 | 1979-10-13 | Seiko Instr & Electronics Ltd | Crystal oscillator |
| JPS5798033U (en) * | 1980-12-05 | 1982-06-16 | ||
| JP2000278077A (en) * | 1999-03-25 | 2000-10-06 | Tdk Corp | Piezoelectric resonator |
| JP2000299514A (en) * | 1999-04-15 | 2000-10-24 | Murata Mfg Co Ltd | Electronic component and manufacture thereof |
| JP2000353931A (en) * | 1999-06-11 | 2000-12-19 | Murata Mfg Co Ltd | Electronic part and manufacture of the same |
| JP2002252390A (en) * | 2001-02-27 | 2002-09-06 | Murata Mfg Co Ltd | Electrode-forming method for piezoelectric component |
-
2001
- 2001-08-01 JP JP2001233639A patent/JP2003046365A/en active Pending
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS54132187A (en) * | 1978-04-06 | 1979-10-13 | Seiko Instr & Electronics Ltd | Crystal oscillator |
| JPS5798033U (en) * | 1980-12-05 | 1982-06-16 | ||
| JP2000278077A (en) * | 1999-03-25 | 2000-10-06 | Tdk Corp | Piezoelectric resonator |
| JP2000299514A (en) * | 1999-04-15 | 2000-10-24 | Murata Mfg Co Ltd | Electronic component and manufacture thereof |
| JP2000353931A (en) * | 1999-06-11 | 2000-12-19 | Murata Mfg Co Ltd | Electronic part and manufacture of the same |
| JP2002252390A (en) * | 2001-02-27 | 2002-09-06 | Murata Mfg Co Ltd | Electrode-forming method for piezoelectric component |
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