JP2003028632A - Warpage measuring instrument and baking apparatus using the same - Google Patents

Warpage measuring instrument and baking apparatus using the same

Info

Publication number
JP2003028632A
JP2003028632A JP2001214745A JP2001214745A JP2003028632A JP 2003028632 A JP2003028632 A JP 2003028632A JP 2001214745 A JP2001214745 A JP 2001214745A JP 2001214745 A JP2001214745 A JP 2001214745A JP 2003028632 A JP2003028632 A JP 2003028632A
Authority
JP
Japan
Prior art keywords
measuring
warpage
plate
setter
firing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2001214745A
Other languages
Japanese (ja)
Other versions
JP4605948B2 (en
Inventor
Koichi Asahi
晃一 旭
Hide Kurosawa
秀 黒澤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dai Nippon Printing Co Ltd
Original Assignee
Dai Nippon Printing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dai Nippon Printing Co Ltd filed Critical Dai Nippon Printing Co Ltd
Priority to JP2001214745A priority Critical patent/JP4605948B2/en
Publication of JP2003028632A publication Critical patent/JP2003028632A/en
Application granted granted Critical
Publication of JP4605948B2 publication Critical patent/JP4605948B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Tunnel Furnaces (AREA)
  • A Measuring Device Byusing Mechanical Method (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Length Measuring Devices With Unspecified Measuring Means (AREA)

Abstract

PROBLEM TO BE SOLVED: To provide a warpage measuring instrument capable of simply measuring the warpage state of the plate-shaped article fed on a roller conveyor. SOLUTION: The warpage measuring instrument is equipped with a holding means for holding the plate-shaped article B stopped at a predetermined position of the roller conveyor 10 for a constant time, height measuring means 11 and 12 for measuring the height positions of the plate-shaped article at a plurality of points, and a display means for displaying the measured values as they are or by operation. The plate-shaped article B is stopped at a predetermined position during feed, and the height positions of the plate-shaped article B at a plurality of points are measured by the height measuring means 11 and 12 to simply measure the warpage state of the plate-shaped article B. By using this warpage measuring instrument in a baking apparatus, the warpage of a substrate or setter can be measured in-line and the load of a worker can be sharply reduced as compared with warpage quantity measuring work performed manually up to now.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【発明の属する技術分野】本発明は、板状物の反り測定
装置であって、特にローラコンベア上を搬送されている
板状物の反り状態を測定する反り測定装置とそれを用い
た焼成装置に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a warp measuring device for a plate-like object, and more particularly to a warp measuring device for measuring the warp state of a plate-like object conveyed on a roller conveyor and a baking apparatus using the warp measuring device. It is about.

【0002】[0002]

【従来の技術】プラズマディスプレイ用基板などの電子
部品としてのガラス基板は、その上に電極やリブなどの
多数の構成要素を形成しているが、その構成要素の形成
工程を通じて、ガラス基板の反り状態を管理することが
重要である。特に、ガラス基板上に形成した構成要素を
焼き固める焼成工程においては、後述のように、ガラス
基板を載置するセッターの反りがガラス基板の反りに影
響するため、セッターの反りを管理することが重要にな
ってくる。
2. Description of the Related Art A glass substrate as an electronic component such as a substrate for a plasma display has a large number of constituent elements such as electrodes and ribs formed thereon. Managing state is important. In particular, in the firing step of baking and hardening the components formed on the glass substrate, as will be described later, since the warp of the setter on which the glass substrate is placed affects the warp of the glass substrate, it is possible to manage the warp of the setter. It becomes important.

【0003】従来より、この種のガラス基板上に形成さ
れた構成要素を焼き固める焼成炉としては図1に示すタ
イプのものが一般に使用されている。通常、構成要素で
ある電極やリブの焼成温度は500〜600℃である
が、ローラコンベア上でガラス基板を搬送しながらこの
温度で焼成処理を行うと、搬送の影響でガラス基板に反
りや歪が生じてしまう。このため、図1に示すように、
焼成中でも軟化しない耐熱性のセッターSの上にガラス
基板Gを乗せた状態で焼成を行うようになっている。こ
れにより、ガラス基板の熱変形が防止されるとともに、
搬送系との接触による傷付きも防止される。プラズマデ
ィスプレイ用基板の焼成には、この焼成処理用セッター
として結晶化ガラス板(例えば、日本電気硝子製「ネオ
セラムN−O」)が用いられている。その他にセラミッ
クス等で大判の板状のものを使用することも好ましい。
Conventionally, a firing furnace of the type shown in FIG. 1 is generally used as a firing furnace for firing and hardening the constituent elements formed on a glass substrate of this type. Usually, the firing temperature of the electrodes and ribs that are the constituent elements is 500 to 600 ° C. However, if the firing process is performed at this temperature while the glass substrate is being transported on the roller conveyor, the glass substrate is warped or distorted due to the influence of the transportation. Will occur. Therefore, as shown in FIG.
Firing is performed with a glass substrate G placed on a heat-resistant setter S that does not soften even during firing. This prevents thermal deformation of the glass substrate,
Scratches due to contact with the transport system are also prevented. A crystallized glass plate (for example, "Neoceram N-O" manufactured by Nippon Electric Glass Co., Ltd.) is used as a setter for the baking treatment in baking the substrate for plasma display. In addition, it is also preferable to use a large-sized plate-like ceramic or the like.

【0004】図1に示す焼成装置では、まず焼成炉本体
1の外においてリフターコンベア2の上段位置にあるセ
ッターSの上にガラス基板Gが載せられる。そして、ガ
ラス基板GはセッターSと共に入口コンベア3により焼
成炉本体1における上段通路の中に導入され、そのまま
セッターSと共にローラコンベアで搬送されながら加熱
部にて常温から500〜600℃程度のピーク温度まで
加熱された後、徐冷部にて400℃程度にまで冷却され
る。次いで、上段通路の端まで搬送されたところでガラ
ス基板GはセッターSと共にリフターコンベア4により
下段通路に降下され、下段通路内をローラコンベアで逆
方向に搬送されながら冷却部にて常温まで戻される。ガ
ラス基板Gを載せたセッターSが出口まで到達すると、
出口コンベア5によりリフターコンベア2に移し替えら
れ、そこで焼成を終えたガラス基板Gが除去される。そ
して、空になったセッターSはリフターコンベア2で上
段位置に移動し、ここで次のガラス基板Gが載置されて
焼成工程が繰り返される。このタイプの焼成装置では、
上段通路の天井および床にヒーターが連続的に設置され
ており、これらのヒーターにより上記の如く焼成温度を
管理するようになっている。このタイプの焼成装置にお
いては、等速度で搬送する連続搬送方式が主流であった
が、ガラス基板の品質を維持したり焼成時の割れを防止
するため、最近では各処理ゾーンでガラス基板を所定時
間停止させる、いわゆるタクト搬送方式を採用したもの
が増加している。
In the firing apparatus shown in FIG. 1, first, a glass substrate G is placed on the setter S at the upper position of the lifter conveyor 2 outside the firing furnace body 1. Then, the glass substrate G is introduced into the upper passage of the firing furnace main body 1 by the inlet conveyor 3 together with the setter S, and is conveyed by the roller conveyor together with the setter S as it is from the room temperature to a peak temperature of about 500 to 600 ° C. in the heating section. After being heated up to, it is cooled down to about 400 ° C. in the slow cooling part. Next, when the glass substrate G is conveyed to the end of the upper passage, the glass substrate G is lowered to the lower passage by the lifter conveyor 4 together with the setter S, and is returned to room temperature in the cooling section while being conveyed in the reverse direction by the roller conveyor in the lower passage. When the setter S on which the glass substrate G is placed reaches the exit,
It is transferred to the lifter conveyor 2 by the exit conveyor 5, and the glass substrate G that has been fired is removed there. Then, the empty setter S moves to the upper position on the lifter conveyor 2, where the next glass substrate G is placed and the firing process is repeated. In this type of firing device,
Heaters are continuously installed on the ceiling and floor of the upper passage, and the firing temperature is controlled by these heaters as described above. In this type of baking apparatus, a continuous transfer method of transferring at a constant speed was the mainstream, but recently, in order to maintain the quality of the glass substrate and prevent cracks during baking, the glass substrate is recently specified in each processing zone. There is an increasing number of devices that employ a so-called tact transfer method of stopping for a time.

【0005】[0005]

【発明が解決しようとする課題】上記のように、ガラス
基板は耐熱性のセッターの上に載置された状態で焼成が
行われる。したがって、セッターの反り状態がガラス基
板の反りに直接影響する。このため、セッターはその反
り状態をチェックし、反りが大きくなったと判断されれ
ば交換する必要がある。しかしながら、セッターは焼成
炉本体内をローラコンベアで搬送されて循環しているの
で、焼成炉本体の出口を出たところで取り出し、手で直
定規を当てて反りを測定しているのが現状であり、人手
がかかる上に効率も悪いことから、簡便な反り測定手段
が望まれている。
As described above, the glass substrate is fired while being placed on the heat-resistant setter. Therefore, the warp state of the setter directly affects the warp of the glass substrate. For this reason, the setter needs to check the warp state and replace it if it is determined that the warp is large. However, since the setter is circulated in the firing furnace body by being conveyed by a roller conveyor, it is the current situation that the setter is taken out at the exit of the firing furnace body and the warp is measured by manually applying a straightedge. However, since it requires labor and is inefficient, a simple warp measuring means is desired.

【0006】本発明は、上記のような事情に鑑みてなさ
れたものであり、その目的とするところは、ローラコン
ベア上を搬送されている板状物の反り状態を簡便に測定
することのできる反り測定装置を提供し、併せてそれを
用いた焼成装置を提供することにある。
The present invention has been made in view of the above circumstances, and an object of the present invention is to easily measure the warped state of a plate-like object conveyed on a roller conveyor. An object of the present invention is to provide a warpage measuring device and a firing device using the same.

【0007】[0007]

【課題を解決するための手段】上記の目的を達成するた
め、本発明の反り測定装置は、ローラコンベア上を搬送
されている板状物の反り状態を測定する装置であって、
板状物をローラコンベアの所定位置で停止して一定時間
保持する保持手段と、板状物における複数のポイントの
高さ位置を測定する高さ測定手段と、測定した値をその
まま若しくは演算して表示する表示手段とを備えたこと
を特徴としている。
In order to achieve the above object, a warpage measuring apparatus of the present invention is an apparatus for measuring a warp state of a plate-like object conveyed on a roller conveyor,
Holding means for stopping the plate-like object at a predetermined position of the roller conveyor and holding it for a certain period of time, height measuring means for measuring height positions of a plurality of points on the plate-like object, and the measured value as it is or by calculating. And a display means for displaying.

【0008】そして、上記構成の反り測定装置におい
て、高さ測定手段にダイヤルゲージを用いることもでき
るし、レーザー変位計を用いることもできる。
In the warp measuring device having the above construction, a dial gauge or a laser displacement meter can be used as the height measuring means.

【0009】また、本発明の焼成装置は、耐熱性のセッ
ターにガラス基板を載せた状態で焼成炉本体の中を搬送
しながらガラス基板の焼成を行う焼成装置であって、セ
ッターの反り状態を測定するために、セッターの循環経
路内に上記構成の反り測定装置を設置したことを特徴と
している。
Further, the firing apparatus of the present invention is a firing apparatus for firing a glass substrate while transporting it inside the firing furnace main body in a state where the glass substrate is placed on a heat-resistant setter. For the measurement, the warpage measuring device having the above-mentioned configuration is installed in the circulation path of the setter.

【0010】[0010]

【発明の実施の形態】以下、本発明の実施の形態につい
て図面を参照して説明する。
BEST MODE FOR CARRYING OUT THE INVENTION Embodiments of the present invention will be described below with reference to the drawings.

【0011】図2は本発明の反り測定装置を示す概略構
成図であり、ローラコンベア10で搬送される板状物B
が図示の如く反り測定装置のところで停止した状態を示
している。
FIG. 2 is a schematic block diagram showing the warp measuring device of the present invention, which is a plate-like object B conveyed by the roller conveyor 10.
Shows the state where it stopped at the warp measuring device as shown in the figure.

【0012】図2において、11はローラコンベア10
の搬送ラインと平行で且つ昇降可能な横方向のフレーム
であり、両端と中央の3箇所にそれぞれダイヤルゲージ
12が取り付けられている。このダイヤルゲージ12の
付いたフレーム11は、図では見えないが、紙面に垂直
な方向に3本配置されている。板状物Bはローラコンベ
ア10上で図2に示す位置で停止して一定時間保持さ
れ、その保持される間にフレーム11とダイヤルゲージ
12からなる高さ測定手段により板状物Bの反り状態が
測定される。具体的には、フレーム11が上昇して、ダ
イヤルゲージ12のスピンドル先端の測定子が板状物B
の裏面に当接することで、図3に示すように、板状物B
における9つのポイントPの高さ位置を測定する。
In FIG. 2, 11 is a roller conveyor 10.
It is a horizontal frame that is parallel to the transport line and can move up and down, and dial gauges 12 are attached to the both ends and the center, respectively. Although not visible in the figure, three frames 11 with the dial gauges 12 are arranged in a direction perpendicular to the paper surface. The plate-like object B is stopped at the position shown in FIG. 2 on the roller conveyor 10 and is held for a certain period of time. While the plate-like object B is held, the warp state of the plate-like object B is measured by the height measuring means including the frame 11 and the dial gauge 12. Is measured. Specifically, the frame 11 rises, and the probe at the spindle tip of the dial gauge 12 is moved to the plate-like object B.
By contacting the back surface of the plate B, as shown in FIG.
Measure the height position of the nine points P at.

【0013】3つのダイヤルゲージ12で測定した値
は、演算装置13に送られ、ここで予め決められた手順
にしたがって演算が行われ、その演算結果が表示装置1
4に表示される。また、必要に応じてプリンター15に
より出力もできる。なお、場合によっては、ダイヤルゲ
ージ12で測定した結果をそのまま表示したりプリント
アウトするように構成することもできる。
The values measured by the three dial gauges 12 are sent to the arithmetic unit 13, where the arithmetic operation is performed according to a predetermined procedure, and the arithmetic result is displayed.
4 is displayed. In addition, the printer 15 can output the data as needed. In some cases, the result measured by the dial gauge 12 may be displayed or printed out as it is.

【0014】なお、図2に示した例では、高さ測定手段
に接触式のダイヤルゲージを用いたが、レーザー変位計
などの非接触式の測定手段を使用してもよい。
In the example shown in FIG. 2, a contact type dial gauge is used as the height measuring means, but a non-contact type measuring means such as a laser displacement meter may be used.

【0015】図4は図2に示す反り測定装置を用いた焼
成装置の一例を示す概略図である。この焼成装置は、焼
成炉本体20の入口21に焼成前のガラス基板をセッタ
ーに載せる搭載装置と、焼成炉本体20の出口22に焼
成後のガラス基板をセッターから取り外す除去装置とが
設けられ、さらに出口22と入口21とを繋ぐローラコ
ンベアからなる循環経路23が設けられ、この循環経路
23の途中に図2に示す如き反り測定装置24が設置さ
れている。
FIG. 4 is a schematic view showing an example of a firing apparatus using the warpage measuring apparatus shown in FIG. This baking device is provided with a mounting device for mounting a glass substrate before baking on a setter at an inlet 21 of the baking furnace body 20, and a removing device for removing a glass substrate after baking from the setter at an outlet 22 of the baking furnace body 20, Further, a circulation path 23 composed of a roller conveyor connecting the outlet 22 and the inlet 21 is provided, and a warp measuring device 24 as shown in FIG. 2 is installed in the middle of the circulation path 23.

【0016】この図4に示す焼成装置では、焼成炉本体
20の入口21にてセッターの上にガラス基板が載せら
れ、次いでガラス基板はセッターと共に焼成炉本体20
に投入され、焼成炉本体20内をローラコンベアにて搬
送されながら焼成が行われた後、出口22においてセッ
ター上から取り出される。次いで、空になったセッター
がローラコンベアで構成された循環経路23を搬送さ
れ、入口21へと戻っていくが、この循環経路23の途
中にある反り測定装置24でセッターの反り状態を測定
するようになっている。そして、測定したセッターの反
りが大きいと新しいものと入れ替える。
In the firing apparatus shown in FIG. 4, a glass substrate is placed on the setter at the inlet 21 of the firing furnace body 20, and then the glass substrate is set together with the setter in the firing furnace body 20.
And is fired while being conveyed in the firing furnace main body 20 by the roller conveyor, and then taken out from the setter at the outlet 22. Next, the emptied setter is conveyed through the circulation path 23 formed of a roller conveyor and returns to the entrance 21, but the warp measuring device 24 in the middle of the circulation path 23 measures the warp state of the setter. It is like this. If the measured warp of the setter is large, replace it with a new one.

【0017】図5は図2に示す反り測定装置を用いた焼
成装置の別の例を示す概略図である。この焼成装置で
は、焼成炉本体20の入口21に焼成前のガラス基板を
セッターに載せる搭載装置が設けられ、焼成炉本体20
の出口22と入口21を繋ぐローラコンベアからなる循
環経路23が設けられており、この循環経路23が焼成
炉本体20の入口21に至る直前のところに焼成後のガ
ラス基板をセッターから取り外す除去装置が設けられ、
循環経路23の途中に図2に示す如き反り測定装置24
が設置されている。
FIG. 5 is a schematic view showing another example of a firing apparatus using the warpage measuring apparatus shown in FIG. In this firing apparatus, a mounting device for placing a glass substrate before firing on a setter is provided at the inlet 21 of the firing furnace body 20.
A circulation path 23 including a roller conveyor connecting the exit 22 and the entrance 21 of the baking machine is provided. Just before the circulation path 23 reaches the entrance 21 of the baking furnace main body 20, a removing device for removing the baked glass substrate from the setter is provided. Is provided,
A warp measuring device 24 as shown in FIG. 2 is provided in the middle of the circulation path 23.
Is installed.

【0018】この図5に示す焼成装置では、焼成炉本体
20の入口21にてセッターの上にガラス基板が載せら
れ、次いでガラス基板はセッターと共に焼成炉本体20
に投入され、焼成炉本体20内をローラコンベアにて搬
送されながら焼成が行われた後、出口22から排出され
る。次いで、ガラス基板を載せたままのセッターがロー
ラコンベアで構成された循環経路23を搬送され、焼成
炉本体20の入口21の手前にある除去装置のところに
到達するが、この循環経路23の途中にある反り測定装
置20でセッターの反り状態を測定するようになってい
る。除去装置により焼成後のガラス基板がセッター上か
ら取り出される。次いで、空になったセッターが焼成炉
本体20の入口21に運ばれ、そこで再び焼成前のガラ
ス基板がセッターに載置される。この時、測定したセッ
ターの反りが大きいと新しいものと入れ替える。
In the firing apparatus shown in FIG. 5, the glass substrate is placed on the setter at the inlet 21 of the firing furnace body 20, and then the glass substrate is set together with the setter in the firing furnace body 20.
And is fired while being conveyed in the firing furnace main body 20 by the roller conveyor, and then discharged from the outlet 22. Next, the setter with the glass substrate placed thereon is conveyed through the circulation path 23 constituted by the roller conveyor and reaches the removal device in front of the inlet 21 of the firing furnace main body 20, but on the way of the circulation path 23. The warp measuring device 20 in FIG. 2 measures the warp state of the setter. The glass substrate after firing is taken out from the setter by the removing device. Next, the emptied setter is carried to the inlet 21 of the firing furnace main body 20, where the glass substrate before firing is placed on the setter again. At this time, if the measured warp of the setter is large, replace it with a new one.

【0019】以上、本発明の実施の形態について詳細に
説明してきたが、本発明による反り測定装置及びそれを
用いた焼成装置は、上記した実施の形態に何ら限定され
るものではなく、本発明の趣旨を逸脱しない範囲におい
て種々の変更が可能であることは当然のことである。
Although the embodiments of the present invention have been described in detail above, the warpage measuring apparatus and the firing apparatus using the same according to the present invention are not limited to the above-described embodiments, and the present invention is not limited thereto. It goes without saying that various modifications can be made without departing from the spirit of the above.

【0020】[0020]

【発明の効果】以上説明したように、本発明の反り測定
装置は、ローラコンベア上を搬送されている板状物の反
り状態を測定する装置であって、板状物をローラコンベ
アの所定位置で停止して一定時間保持する保持手段と、
板状物における複数のポイントの高さ位置を測定する高
さ測定手段と、測定した値をそのまま若しくは演算して
表示する表示手段とを備えたことを特徴としているの
で、搬送中に所定の位置で板状物を停止させ、高さ測定
手段にて複数のポイントの高さ位置を測定することによ
り、板状物の反り状態を簡単に測定することができる。
As described above, the warp measuring device of the present invention is a device for measuring the warp state of a plate-like object being conveyed on a roller conveyor, and the plate-like object is placed at a predetermined position of the roller conveyor. Holding means to stop at and hold for a certain time,
Since the height measuring means for measuring the height positions of a plurality of points on the plate-like object and the display means for displaying the measured value as it is or as an arithmetic operation are provided, a predetermined position during conveyance is provided. The warp state of the plate-shaped object can be easily measured by stopping the plate-shaped object with and measuring the height positions of a plurality of points by the height measuring means.

【0021】そして、この反り測定装置を焼成装置に用
いることにより、インラインで基板やセッターの反りを
測定することができ、今まで手で行っていた反り量の測
定作業に比べ、作業者の負担を大幅に減らすことができ
る。
By using this warpage measuring apparatus in a firing apparatus, it is possible to measure the warpage of a substrate or a setter in-line, which is a burden on the operator as compared with the manual operation of measuring the warpage amount. Can be significantly reduced.

【図面の簡単な説明】[Brief description of drawings]

【図1】焼成装置の一例を示す概略構成図である。FIG. 1 is a schematic configuration diagram showing an example of a firing apparatus.

【図2】本発明の反り測定装置を示す概略構成図であ
る。
FIG. 2 is a schematic configuration diagram showing a warp measuring device of the present invention.

【図3】板状物の測定ポイントを示す説明図である。FIG. 3 is an explanatory diagram showing measurement points of a plate-like object.

【図4】図2に示す反り測定装置を用いた焼成装置の一
例を示す概略図である。
FIG. 4 is a schematic view showing an example of a firing apparatus using the warpage measuring apparatus shown in FIG.

【図5】図2に示す反り測定装置を用いた焼成装置の別
の例を示す概略図である。
5 is a schematic view showing another example of a firing apparatus using the warpage measuring apparatus shown in FIG.

【符号の説明】[Explanation of symbols]

G ガラス基板 S セッター B 板状物 1 焼成炉本体 2 リフターコンベア 3 入口コンベア 4 リフターコンベア 5 出口コンベア 10 ローラコンベア 11 フレーム 12 ダイヤルゲージ 13 演算装置 14 表示装置 15 プリンター 20 焼成炉本体 21 入口 22 出口 23 循環経路 24 反り測定装置 G glass substrate S setter B Plate 1 firing furnace body 2 lifter conveyor 3 entrance conveyor 4 lifter conveyor 5 Exit conveyor 10 roller conveyor 11 frames 12 dial gauge 13 Arithmetic device 14 Display 15 Printer 20 Main body of firing furnace 21 entrance 22 exit 23 Circulation path 24 Warpage measuring device

───────────────────────────────────────────────────── フロントページの続き Fターム(参考) 2F062 AA41 AA55 BB14 BC00 BC25 CC27 EE64 FF12 GG18 LL00 LL12 2F065 AA25 AA47 BB01 CC00 CC25 DD06 GG04 MM02 2F069 AA42 AA58 BB36 BB40 DD16 GG01 GG04 GG07 GG58 HH09 HH30 PP07 QQ05 QQ13 4K050 AA04 BA07 EA02    ─────────────────────────────────────────────────── ─── Continued front page    F term (reference) 2F062 AA41 AA55 BB14 BC00 BC25                       CC27 EE64 FF12 GG18 LL00                       LL12                 2F065 AA25 AA47 BB01 CC00 CC25                       DD06 GG04 MM02                 2F069 AA42 AA58 BB36 BB40 DD16                       GG01 GG04 GG07 GG58 HH09                       HH30 PP07 QQ05 QQ13                 4K050 AA04 BA07 EA02

Claims (4)

【特許請求の範囲】[Claims] 【請求項1】 ローラコンベア上を搬送されている板状
物の反り状態を測定する装置であって、板状物をローラ
コンベアの所定位置で停止して一定時間保持する保持手
段と、板状物における複数のポイントの高さ位置を測定
する高さ測定手段と、測定した値をそのまま若しくは演
算して表示する表示手段とを備えたことを特徴とする反
り測定装置。
1. A device for measuring a warp state of a plate-like object being conveyed on a roller conveyor, comprising a holding means for stopping the plate-like object at a predetermined position of the roller conveyor and holding the plate-like object for a certain period of time. A warp measuring device comprising: height measuring means for measuring height positions of a plurality of points on an object; and display means for displaying the measured values as they are or by calculating them.
【請求項2】 高さ測定手段にダイヤルゲージを用いた
ことを特徴とする請求項1に記載の反り測定装置。
2. The warpage measuring device according to claim 1, wherein a dial gauge is used as the height measuring means.
【請求項3】 高さ測定手段にレーザー変位計を用いた
ことを特徴とする請求項1に記載の反り測定装置。
3. The warpage measuring device according to claim 1, wherein a laser displacement meter is used as the height measuring means.
【請求項4】 耐熱性のセッターにガラス基板を載せた
状態で焼成炉本体の中を搬送しながらガラス基板の焼成
を行う焼成装置であって、セッターの反り状態を測定す
るために、セッターの循環経路内に請求項1〜3のいず
れかに記載の反り測定装置を設置したことを特徴とする
焼成装置。
4. A firing apparatus for firing a glass substrate while transporting it in a firing furnace main body in a state where the glass substrate is placed on a heat-resistant setter, wherein the setter of the setter is used for measuring the warp state of the setter. A warpage measuring apparatus having the warpage measuring apparatus according to any one of claims 1 to 3 installed in a circulation path.
JP2001214745A 2001-07-16 2001-07-16 Warpage measuring apparatus and firing apparatus using the same Expired - Fee Related JP4605948B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2001214745A JP4605948B2 (en) 2001-07-16 2001-07-16 Warpage measuring apparatus and firing apparatus using the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2001214745A JP4605948B2 (en) 2001-07-16 2001-07-16 Warpage measuring apparatus and firing apparatus using the same

Publications (2)

Publication Number Publication Date
JP2003028632A true JP2003028632A (en) 2003-01-29
JP4605948B2 JP4605948B2 (en) 2011-01-05

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Country Status (1)

Country Link
JP (1) JP4605948B2 (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20150032654A (en) 2012-07-24 2015-03-27 니폰 덴키 가라스 가부시키가이샤 Apparatus for inspecting warpage of board-like body and method for inspecting warpage of board-like body
CN110672042A (en) * 2019-09-25 2020-01-10 深圳市铭辉源科技有限公司 Warping degree tester
CN111854577A (en) * 2020-07-02 2020-10-30 张家港扬子江冷轧板有限公司 Measure tinplate warpage's device

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101363715B1 (en) * 2012-12-17 2014-02-18 한국항공우주연구원 Dual dial gauge with measuring device and mesuring method of flatness

Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0523006U (en) * 1991-09-03 1993-03-26 三菱重工業株式会社 Cylinder tailoring machine for printing machine
JPH067008U (en) * 1992-06-30 1994-01-28 株式会社エー・オー・ワイ・システム研究所 Plate material flatness detection device
JPH07294246A (en) * 1994-04-26 1995-11-10 Sumitomo Rubber Ind Ltd Method and apparatus for measuring surface accuracy of planar body
JPH09505662A (en) * 1993-11-25 1997-06-03 シーメンス アクチエンゲゼルシヤフト Continuous furnace
JPH11211443A (en) * 1998-01-27 1999-08-06 Matsushita Electric Works Ltd Three-dimensional shape measuring device
JP2001066070A (en) * 1999-08-27 2001-03-16 Dainippon Printing Co Ltd Kiln
JP2001066069A (en) * 1999-08-31 2001-03-16 Dainippon Printing Co Ltd Setter for baking treatment
JP2001116467A (en) * 1999-10-22 2001-04-27 Dainippon Printing Co Ltd Setter for baking treatment
JP2001156425A (en) * 1999-11-26 2001-06-08 Anritsu Corp Printed board checker

Patent Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0523006U (en) * 1991-09-03 1993-03-26 三菱重工業株式会社 Cylinder tailoring machine for printing machine
JPH067008U (en) * 1992-06-30 1994-01-28 株式会社エー・オー・ワイ・システム研究所 Plate material flatness detection device
JPH09505662A (en) * 1993-11-25 1997-06-03 シーメンス アクチエンゲゼルシヤフト Continuous furnace
JPH07294246A (en) * 1994-04-26 1995-11-10 Sumitomo Rubber Ind Ltd Method and apparatus for measuring surface accuracy of planar body
JPH11211443A (en) * 1998-01-27 1999-08-06 Matsushita Electric Works Ltd Three-dimensional shape measuring device
JP2001066070A (en) * 1999-08-27 2001-03-16 Dainippon Printing Co Ltd Kiln
JP2001066069A (en) * 1999-08-31 2001-03-16 Dainippon Printing Co Ltd Setter for baking treatment
JP2001116467A (en) * 1999-10-22 2001-04-27 Dainippon Printing Co Ltd Setter for baking treatment
JP2001156425A (en) * 1999-11-26 2001-06-08 Anritsu Corp Printed board checker

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20150032654A (en) 2012-07-24 2015-03-27 니폰 덴키 가라스 가부시키가이샤 Apparatus for inspecting warpage of board-like body and method for inspecting warpage of board-like body
US9273953B2 (en) 2012-07-24 2016-03-01 Nippon Electric Glass Co., Ltd. Apparatus for inspecting warpage of sheet-like member and method for inspecting warpage of sheet-like member
TWI586958B (en) * 2012-07-24 2017-06-11 日本電氣硝子股份有限公司 Warpage inspection device for plate body and warpage inspection method for the same
CN110672042A (en) * 2019-09-25 2020-01-10 深圳市铭辉源科技有限公司 Warping degree tester
CN111854577A (en) * 2020-07-02 2020-10-30 张家港扬子江冷轧板有限公司 Measure tinplate warpage's device

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