JP2003017864A - Multilayer board - Google Patents

Multilayer board

Info

Publication number
JP2003017864A
JP2003017864A JP2001201427A JP2001201427A JP2003017864A JP 2003017864 A JP2003017864 A JP 2003017864A JP 2001201427 A JP2001201427 A JP 2001201427A JP 2001201427 A JP2001201427 A JP 2001201427A JP 2003017864 A JP2003017864 A JP 2003017864A
Authority
JP
Japan
Prior art keywords
land
transmission image
via hole
ray transmission
multilayer substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP2001201427A
Other languages
Japanese (ja)
Inventor
Hideo Hongo
英男 本郷
Kozo Takada
耕造 高田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP2001201427A priority Critical patent/JP2003017864A/en
Publication of JP2003017864A publication Critical patent/JP2003017864A/en
Withdrawn legal-status Critical Current

Links

Abstract

PROBLEM TO BE SOLVED: To prevent a junction section, between the electrode of components and the land of a multiplayer board, from being recognized as being abnormal by mistake and to accurately judge the junction section of electronic components being incorporated between inner layers. SOLUTION: A land 2b and an inner via hole 2c are arranged at a position, where the X-ray transmission image of the junction section of components and the land 2b on the surface overlaps with that of the inner via hole 2c. Additionally, the arrangement is such that the X-ray transmission image of the junction section of inner-layer components 11 and a land 23 and that of the via hole 2c do not overlap that of the junction section of an electrode 1a and the land 2b.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【発明の属する技術分野】本発明は、CSP(チップ・
サイズ・パッケージ)部品などの部品を実装するための
多層基板に関し、特に3層以上が厚み方向にインナビア
ホールを介して電気的に接続された多層基板に関する。
本発明はまた、内層間に電子部品が内蔵された多層基板
に関する。
TECHNICAL FIELD The present invention relates to a CSP (chip
The present invention relates to a multilayer substrate for mounting components such as size / package components, and more particularly to a multilayer substrate in which three or more layers are electrically connected in the thickness direction through inner via holes.
The present invention also relates to a multilayer substrate having electronic components built in between inner layers.

【0002】[0002]

【従来の技術】図9、図10はそれぞれ、従来の多層基
板の平面図、側面断面図を示し、CSP部品のチップキ
ャリア1の下面には電極1aが形成されている。多層基
板2の上面にはチップキャリア1の電極1aに略対向す
るように導電パターン2aが形成され、導電パターン2
aにはチップキャリア1の電極1aに対向するようラン
ド2bが形成されている。
2. Description of the Related Art FIGS. 9 and 10 are a plan view and a side sectional view, respectively, of a conventional multilayer substrate, in which an electrode 1a is formed on the lower surface of a chip carrier 1 of a CSP component. A conductive pattern 2a is formed on the upper surface of the multilayer substrate 2 so as to substantially face the electrode 1a of the chip carrier 1.
A land 2b is formed on a so as to face the electrode 1a of the chip carrier 1.

【0003】また、図9に分かり易く示すように、多層
基板2の内部の任意の位置には、内層間を厚み方向に電
気的に接続するためのインナビアホール(以下、簡単に
ビアホールという。)2cが形成されている。そして、
多層基板2上にCSP部品をLGA(ランド・グリッド
・アレイ)型で実装する場合には、多層基板2のランド
2b側にクリーム半田を配置してリフロー半田付けを行
う。なお、図10に示す半田3はクリーム半田がリフロ
ー半田付けされた状態を示す。
Further, as clearly shown in FIG. 9, an inner via hole (hereinafter simply referred to as a via hole) is formed at an arbitrary position inside the multilayer substrate 2 for electrically connecting the inner layers in the thickness direction. 2c is formed. And
When the CSP component is mounted on the multilayer substrate 2 in the LGA (land grid array) type, cream solder is arranged on the land 2b side of the multilayer substrate 2 for reflow soldering. The solder 3 shown in FIG. 10 shows a state in which cream solder is reflow-soldered.

【0004】[0004]

【発明が解決しようとする課題】ところで、図9、図1
0に示すように多層基板2上にCSP部品を実装した場
合、チップキャリア1の電極1a側と多層基板2のラン
ド2b側の接合部における半田3が多すぎてショートし
ていないかを試験するために、多層基板2の上方からX
線を透過させて、X線透過像を多層基板2の下方側でX
線CCDカメラなどにより撮像する。
By the way, FIG. 9 and FIG.
When CSP components are mounted on the multilayer substrate 2 as shown in 0, it is tested whether there is too much solder 3 at the joint between the electrode 1a side of the chip carrier 1 and the land 2b side of the multilayer substrate 2 to cause a short circuit. Therefore, from the upper side of the multilayer substrate 2, X
X-ray transmission image is transmitted through the X-ray on the lower side of the multilayer substrate 2.
An image is taken with a line CCD camera or the like.

【0005】しかしながら、上記の従来の多層基板2で
は、ビアホール2cが任意の位置、すなわちランド2b
の位置に関係なく形成されているので、X線透過像では
図11に示すように、ビアホール2cの透過像がチップ
キャリア1の電極1aと多層基板2のランド2bの接合
部の透過像に隣接したり、離れたりして見え、このた
め、接合部が正常であっても異常と誤認識するという問
題点がある。ここで、ビアホール2cの径は0.1〜
0.15mm程度、ランド2bの径は0.3〜0.5mm程
度であり、図11に示すようにランド像より小さいビア
ホール像がランド像の近くに見えると、異常と誤認識す
る場合が多くなる。
However, in the above-mentioned conventional multilayer substrate 2, the via hole 2c is located at an arbitrary position, that is, the land 2b.
In the X-ray transmission image, the transmission image of the via hole 2c is adjacent to the transmission image of the junction between the electrode 1a of the chip carrier 1 and the land 2b of the multilayer substrate 2 as shown in FIG. There is a problem in that they appear to be separated or separated, and therefore, even if the joint is normal, it is erroneously recognized as abnormal. Here, the diameter of the via hole 2c is 0.1 to
The land 2b has a diameter of about 0.15 mm and a diameter of about 0.3 to 0.5 mm. When a via hole image smaller than the land image is seen near the land image as shown in FIG. Become.

【0006】また、電子部品は多層基板の表面のみなら
ず、内層間に実装する場合がある。この場合には、内層
における電子部品の電極とランドの接合部をX線透過像
で確認する際、この接合部がビアホール2cや、表面上
の電極1aとランド2bの接合部の透過像と重なるよう
に配置されていると、正確な判定が困難となる。
Electronic parts may be mounted not only on the surface of the multilayer board but also on the inner layers. In this case, when the junction of the electrode of the electronic component and the land in the inner layer is confirmed by the X-ray transmission image, this junction overlaps with the transmission image of the via hole 2c and the junction of the electrode 1a and the land 2b on the surface. If it is arranged like this, it becomes difficult to make an accurate determination.

【0007】本発明は上記従来例の問題点に鑑み、部品
の電極と多層基板のランドとの接合部が正常であっても
異常と誤認識することを防止することができる多層基板
を提供することを目的とする。本発明はまた、内層間に
内蔵された電子部品の接合部の良否を正確に判定するこ
とができる多層基板を提供することを目的とする。
In view of the above-mentioned problems of the conventional example, the present invention provides a multi-layered substrate capable of preventing erroneous recognition as abnormal even if the joint between the electrode of the component and the land of the multi-layered substrate is normal. The purpose is to Another object of the present invention is to provide a multi-layer substrate capable of accurately judging the quality of the joint portion of the electronic component embedded between the inner layers.

【0008】[0008]

【課題を解決するための手段】本発明は上記目的を達成
するために、第1の部品の電極を接続するための第1の
ランドが表面に形成されるとともに、内層間を厚み方向
に電気的に接続するためのインナビアホールが形成され
た多層基板において、前記第1の部品の電極及び前記第
1のランドの接合部のX線透過像と、前記インナビアホ
ールのX線透過像とが重なる位置に前記第1のランドと
前記インナビアホールとを配置するように構成した。上
記構成により、ビアホールの透過像がチップキャリアの
電極と多層基板のランドの接合部の透過像に隣接した
り、離れたりして見えることがなくなり、したがって、
部品の電極と多層基板のランドの接合部が正常であって
も異常と誤認識することを防止することができる。
In order to achieve the above-mentioned object, the present invention has a first land for connecting electrodes of a first component formed on the surface thereof, and electrically connecting the inner layers in the thickness direction. In the multilayer substrate in which the inner via hole for electrically connecting is formed, the X-ray transmission image of the joint between the electrode of the first component and the first land overlaps with the X-ray transmission image of the inner via hole. The first land and the inner via hole are arranged at the positions. With the above configuration, the transmission image of the via hole is not seen as being adjacent to or separated from the transmission image of the junction between the electrode of the chip carrier and the land of the multilayer substrate.
Even if the joint between the electrode of the component and the land of the multilayer substrate is normal, it can be prevented from being erroneously recognized as abnormal.

【0009】本発明はまた、上記目的を達成するため
に、内層間を厚み方向に電気的に接続するためのインナ
ビアホールが形成されるとともに、内層間のランド上に
第2の部品が接続された多層基板において、前記第2の
部品の電極及び前記第2のランドの接合部のX線透過像
と、前記インナビアホールのX線透過像とが重ならない
位置に前記第2のランドと前記インナビアホールとを配
置するように構成した。上記構成により、内層間に内蔵
された電子部品の接合部を正確に判定することができ
る。
In order to achieve the above object, the present invention also forms an inner via hole for electrically connecting the inner layers in the thickness direction, and connects a second component on the land between the inner layers. In the multilayer substrate, the X-ray transmission image of the junction of the electrode of the second component and the second land does not overlap with the X-ray transmission image of the inner via hole, and the second land and the inner The via hole and the via hole are arranged. With the above configuration, it is possible to accurately determine the joint portion of the electronic component embedded between the inner layers.

【0010】本発明はまた、上記目的を達成するため
に、第1の部品の電極を接続するための第1のランドが
表面に形成されるとともに、内層間の第2のランド上に
第2の部品が接続された多層基板において、前記第1の
部品の電極及び前記第1のランドの接合部のX線透過像
と、前記第2の部品及び前記第2のランドの接合部のX
線透過像が重ならない位置に前記第1及び第2のランド
を配置するように構成した。上記構成により、内層間に
内蔵された電子部品の接合部を正確に判定することがで
きる。
In order to achieve the above object, the present invention also has a first land for connecting the electrodes of the first component formed on the surface, and a second land on the second land between the inner layers. X-ray transmission image of the joint of the electrode of the first component and the first land, and X-ray of the joint of the second component and the second land in the multilayer substrate to which the component of FIG.
The first and second lands are arranged at positions where the line transmission images do not overlap. With the above configuration, it is possible to accurately determine the joint portion of the electronic component embedded between the inner layers.

【0011】本発明はまた、請求項1において、内層間
の第3のランド上に第3の部品が接続され、前記第2の
部品の電極及び前記第2のランドの接合部のX線透過像
と、第3の部品の電極及び前記第3のランドの接合部の
X線透過像と、前記インナビアホールのX線透過像とが
重ならない位置に前記第2あるいは第3のランドと前記
インナビアホールとを配置するように構成した。上記構
成により、表面上に実装された電子部品と内層間に内蔵
された電子部品の接合部を正確に判定することができ
る。
According to the present invention, the third component is connected to the third land between the inner layers, and the X-ray transmission of the joint between the electrode of the second component and the second land is performed. The second land or the third land and the inner land at a position where the image, the X-ray transmission image of the junction of the electrode of the third component and the third land, and the X-ray transmission image of the inner via hole do not overlap. The via hole and the via hole are arranged. With the above configuration, it is possible to accurately determine the joint portion between the electronic component mounted on the surface and the electronic component embedded between the inner layers.

【0012】本発明はまた、請求項1に記載の前記第1
の部品の電極及び前記第1のランドの接合部と、請求項
4に記載の前記第2の部品及び第2のランドの接合部の
X線透過像が重ならない位置に配置するように構成し
た。上記構成により、表面上に実装された電子部品と内
層間に内蔵された電子部品の接合部を正確に判定するこ
とができる。
The present invention also provides the first aspect of claim 1.
The X-ray transmission image of the electrode of the component and the joint of the first land and the joint of the second component and the second land of claim 4 are arranged at positions not overlapping. . With the above configuration, it is possible to accurately determine the joint portion between the electronic component mounted on the surface and the electronic component embedded between the inner layers.

【0013】本発明はまた、前記X線透過像が、X線を
多層基板の厚み方向に透過させた場合の像であることを
特徴とする。本発明はまた、前記X線透過像が、X線を
多層基板の厚み方向に対して斜めに透過させた場合の像
であることを特徴とする。本発明はまた、前記X線透過
像が、略点光源のX線を多層基板の厚み方向又は厚み方
向に対して斜めに透過させた場合の像であることを特徴
とする。上記構成により、ランドの配置位置の自由度を
高めることができる。
The present invention is also characterized in that the X-ray transmission image is an image when X-rays are transmitted in the thickness direction of the multilayer substrate. The present invention is also characterized in that the X-ray transmission image is an image when X-rays are transmitted obliquely with respect to the thickness direction of the multilayer substrate. The present invention is also characterized in that the X-ray transmission image is an image when X-rays of a substantially point light source are transmitted in the thickness direction of the multilayer substrate or obliquely with respect to the thickness direction. With the above configuration, it is possible to increase the degree of freedom in the arrangement position of the land.

【0014】[0014]

【発明の実施の形態】以下、図面を参照して本発明の実
施の形態について説明する。図1は本発明に係る多層基
板の第1の実施の形態を示す平面図、図2は図1の多層
基板を示す側面断面図、図3は図1の多層基板のX線透
過像を示す説明図、図4は従来例と本発明の実際のX線
透過像を比較して示す説明図である。
BEST MODE FOR CARRYING OUT THE INVENTION Embodiments of the present invention will be described below with reference to the drawings. 1 is a plan view showing a first embodiment of a multilayer substrate according to the present invention, FIG. 2 is a side sectional view showing the multilayer substrate of FIG. 1, and FIG. 3 is an X-ray transmission image of the multilayer substrate of FIG. FIGS. 4A and 4B are explanatory views showing a comparison between a conventional example and an actual X-ray transmission image of the present invention.

【0015】本発明の多層基板2では、図1、図2に示
すように全てのビアホール2cが多層基板2の厚み方向
にランド2bに重なるように形成されている。したがっ
て、X線透過像では図3に示すように,ビアホール2c
の透過像がチップキャリア1の電極1aと多層基板2の
ランド2bとの接合部の透過像に重なる。なお、他の構
成は従来例と同じであるので説明を省略する。
In the multilayer substrate 2 of the present invention, as shown in FIGS. 1 and 2, all the via holes 2c are formed so as to overlap the lands 2b in the thickness direction of the multilayer substrate 2. Therefore, in the X-ray transmission image, as shown in FIG.
Is superimposed on the transmission image of the junction between the electrode 1a of the chip carrier 1 and the land 2b of the multilayer substrate 2. Note that the other configurations are the same as those of the conventional example, and thus description thereof will be omitted.

【0016】図4(a)、(b)はそれぞれ、従来例と
本発明の実際のX線透過像を示し、図4(a)に示す従
来例では、ビアホール2cの透過像が接合部の透過像に
隣接したり、離れたりして見え、接合部が正常であって
も異常と誤認識する。これに対し、図4(b)に示す本
発明では、ビアホール2cの透過像が接合部の透過像に
重なるので、ビアホール2cの透過像が接合部の透過像
に隣接したり、離れたりして見えることがなくなり、し
たがって、接合部が正常であっても異常と誤認識するこ
とを防止することができる。
FIGS. 4 (a) and 4 (b) show an actual X-ray transmission image of the conventional example and the present invention, respectively. In the conventional example shown in FIG. 4 (a), the transmission image of the via hole 2c is a junction portion. They appear to be adjacent to or separated from the transmission image, and are erroneously recognized as abnormal even if the joint is normal. On the other hand, in the present invention shown in FIG. 4B, the transmission image of the via hole 2c overlaps with the transmission image of the joint portion, so that the transmission image of the via hole 2c may be adjacent to or separated from the transmission image of the joint portion. Therefore, it can be prevented from being erroneously recognized as abnormal even if the joint is normal.

【0017】ところで、電極1a及びランド2bの接合
部とビアホール2cの各X線透過像が重なるように配置
する場合、略平行なX線を多層基板2の真上から照射す
る場合に限定されず、図5に示すように略平行なX線を
斜め(例えば−30°〜30°)に照射する場合に重な
るように配置するようにしてもよい。また、照射するX
線を略平行にして等倍のX線透過像を得る場合に限定さ
れず、図6に示すようにX線を点光源にして拡大像を得
る場合にも、電極1a及びランド2bの接合部とビアホ
ール2cの各X線透過像が重なるように配置してもよ
い。
By the way, when the X-ray transmission images of the via hole 2c and the junction of the electrode 1a and the land 2b are arranged to overlap with each other, it is not limited to the case of irradiating substantially parallel X-rays from directly above the multilayer substrate 2. Alternatively, as shown in FIG. 5, the X-rays may be arranged so as to overlap each other when they are obliquely irradiated (for example, −30 ° to 30 °). Also, X to irradiate
It is not limited to the case where X-ray transmission images of equal magnification are obtained by making the lines substantially parallel to each other, and also when the enlarged image is obtained by using X-rays as a point light source as shown in FIG. 6, the joint portion of the electrode 1a and the land 2b And the X-ray transmission images of the via hole 2c may be arranged to overlap each other.

【0018】次に図7を参照して第2の実施の形態につ
いて説明する。第2の実施の形態ではさらに、多層基板
2の内層間のランド12に部品11が実装される構造に
対処している。このような構造では、部品11の電極と
ランド12との接合部の透過像がビアホール2cや表面
上の電極1aの透過像や、表面のランド2bの接合部の
透過像が重なるように配置されていると、正確な判定が
困難となる。そこで、内層間に部品11を実装する構造
では、部品11の電極とランド12との接合部の透過像
が、ビアホール2cの透過像と、表面上の電極1aとラ
ンド2bの接合部の透過像が重ならないように配置する
ことにより正確な判定が可能となる。
Next, a second embodiment will be described with reference to FIG. The second embodiment further deals with the structure in which the component 11 is mounted on the land 12 between the inner layers of the multilayer substrate 2. In such a structure, the transmission image of the junction between the electrode of the component 11 and the land 12 is arranged so that the transmission image of the via hole 2c or the electrode 1a on the surface and the transmission image of the junction of the land 2b on the surface overlap. If so, accurate determination becomes difficult. Therefore, in the structure in which the component 11 is mounted between the inner layers, the transmission image of the joint between the electrode of the component 11 and the land 12 is the transmission image of the via hole 2c and the transmission image of the joint between the electrode 1a and the land 2b on the surface. By arranging so that they do not overlap, accurate determination is possible.

【0019】また、この第2の実施の形態においても、
図7に示すようにX線を多層基板2の真上から照射する
場合の他に、斜めに照射する場合や、図8に示すように
X線を点光源にして拡大像を得る場合に部品11の電極
とランド12との接合部の透過像が、ビアホール2cの
透過像と、表面上の電極1aとランド2bの接合部の透
過像が重ならないように配置することにより正確な判定
が可能となる。
Also in the second embodiment,
In addition to the case of irradiating the X-ray from directly above the multilayer substrate 2 as shown in FIG. 7, the case of obliquely irradiating or obtaining a magnified image by using the X-ray as a point light source as shown in FIG. Accurate determination is possible by arranging the transmission image of the junction between the electrode 11 and the land 12 so that the transmission image of the via hole 2c does not overlap with the transmission image of the junction between the electrode 1a and the land 2b on the surface. Becomes

【0020】[0020]

【発明の効果】以上説明したように請求項1に記載の発
明によれば、表面上の部品の電極及びランドの接合部の
X線透過像と、インナビアホールのX線透過像が重なる
位置にランドとインナビアホールを配置するように構成
したので、ビアホールの透過像がチップキャリアの電極
と多層基板のランドの接合部の透過像に隣接したり、離
れたりして見えることがなくなり、したがって、部品の
電極と多層基板のランドの接合部が正常であっても異常
と誤認識することを防止することができる。請求項2に
記載の発明によれば、内層間に配置された部品及びラン
ドの接合部のX線透過像と、インナビアホールのX線透
過像が重ならない位置にしたので、内層間に内蔵された
電子部品の接合部を正確に判定することができる。請求
項3に記載の発明によれば、表面に配置された部品の電
極及びランドの接合部のX線透過像と、内層間に配置さ
れた部品及びランドの接合部のX線透過像が重ならない
位置にしたので、内層間に内蔵された電子部品の接合部
を正確に判定することができる。請求項4、5に記載の
発明によれば、表面上に実装された電子部品と内層間に
内蔵された電子部品の接合部を正確に判定することがで
きる。請求項6、7、8に記載の発明によれば、ランド
の配置位置の自由度を高めることができる。
As described above, according to the first aspect of the present invention, the X-ray transmission image of the contact portion of the electrode and the land of the component on the surface and the X-ray transmission image of the inner via hole overlap each other. Since the land and the inner via hole are arranged, the transmission image of the via hole is not seen adjacent to or away from the transmission image of the junction of the electrode of the chip carrier and the land of the multilayer substrate, and therefore Even if the joint between the electrode and the land of the multilayer substrate is normal, it can be prevented from being erroneously recognized as abnormal. According to the invention described in claim 2, since the X-ray transmission image of the joint portion of the component and the land arranged between the inner layers and the X-ray transmission image of the inner via hole do not overlap each other, it is built in between the inner layers. The joint portion of the electronic component can be accurately determined. According to the invention described in claim 3, the X-ray transmission image of the joint portion of the electrode and the land of the component arranged on the surface and the X-ray transmission image of the joint portion of the component and the land arranged between the inner layers are overlapped. Since the position is set so as not to become, it is possible to accurately determine the joint portion of the electronic component embedded between the inner layers. According to the invention described in claims 4 and 5, it is possible to accurately determine the joint portion between the electronic component mounted on the surface and the electronic component embedded between the inner layers. According to the invention described in claims 6, 7 and 8, the degree of freedom in the arrangement position of the land can be increased.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明に係る多層基板の第1の実施の形態を示
す平面図
FIG. 1 is a plan view showing a first embodiment of a multilayer substrate according to the present invention.

【図2】図1の多層基板を示す側面断面図FIG. 2 is a side sectional view showing the multilayer substrate of FIG.

【図3】図1の多層基板のX線透過像を示す説明図FIG. 3 is an explanatory diagram showing an X-ray transmission image of the multilayer substrate of FIG.

【図4】従来例と本発明の実際のX線透過像を比較して
示す説明図である。
FIG. 4 is an explanatory diagram showing an actual X-ray transmission image of a conventional example in comparison with an actual X-ray transmission image of the present invention.

【図5】図1の多層基板の変形例を示す図 (a)側面断面図 (b)X線透過像を示す説明図5 is a diagram showing a modification of the multilayer substrate of FIG. (A) Side sectional view (B) Explanatory drawing showing an X-ray transmission image

【図6】図1の多層基板の他の変形例を示す側面断面図6 is a side sectional view showing another modified example of the multilayer substrate of FIG.

【図7】本発明の第2の実施の形態の多層基板を示す図 (a)側面断面図 (b)X線透過像を示す説明図FIG. 7 is a diagram showing a multilayer substrate according to a second embodiment of the present invention. (A) Side sectional view (B) Explanatory drawing showing an X-ray transmission image

【図8】図7の多層基板の変形例を示す側面断面図8 is a side sectional view showing a modified example of the multilayer substrate of FIG.

【図9】従来の多層基板を示す平面図FIG. 9 is a plan view showing a conventional multilayer substrate.

【図10】図9の多層基板を示す側面断面図FIG. 10 is a side sectional view showing the multilayer substrate of FIG.

【図11】図9の多層基板のX線透過像を示す説明図11 is an explanatory diagram showing an X-ray transmission image of the multilayer substrate of FIG.

【符号の説明】[Explanation of symbols]

1 チップキャリア 1a 電極 2 多層基板 2b、12 ランド 2c インナビアホール 11 部品 1 chip carrier 1a electrode 2 Multi-layer board 2b, 12 lands 2c Inna beer hall 11 parts

───────────────────────────────────────────────────── フロントページの続き Fターム(参考) 2G001 AA01 BA11 CA01 DA09 GA01 GA06 HA09 HA13 KA03 KA05 LA11 MA05 5E346 AA43 BB16 FF45 GG32 GG33 HH33    ─────────────────────────────────────────────────── ─── Continued front page    F-term (reference) 2G001 AA01 BA11 CA01 DA09 GA01                       GA06 HA09 HA13 KA03 KA05                       LA11 MA05                 5E346 AA43 BB16 FF45 GG32 GG33                       HH33

Claims (8)

【特許請求の範囲】[Claims] 【請求項1】 第1の部品の電極を接続するための第1
のランドが表面に形成されるとともに、内層間を厚み方
向に電気的に接続するためのインナビアホールが形成さ
れた多層基板において、 前記第1の部品の電極及び前記第1のランドの接合部の
X線透過像と、前記インナビアホールのX線透過像とが
重なる位置に前記第1のランドと前記インナビアホール
とを配置したことを特徴とする多層基板。
1. A first for connecting electrodes of a first part
Of the land of the first component is formed on the surface and an inner via hole for electrically connecting the inner layers in the thickness direction is formed. A multilayer substrate, wherein the first land and the inner via hole are arranged at a position where the X-ray transmission image and the X-ray transmission image of the inner via hole overlap each other.
【請求項2】 内層間を厚み方向に電気的に接続するた
めのインナビアホールが形成されるとともに、内層間の
ランド上に第2の部品が接続された多層基板において、 前記第2の部品の電極及び前記第2のランドの接合部の
X線透過像と、前記インナビアホールのX線透過像とが
重ならない位置に前記第2のランドと前記インナビアホ
ールとを配置したことを特徴とする多層基板。
2. A multilayer board in which an inner via hole is formed for electrically connecting the inner layers in the thickness direction, and a second component is connected to a land between the inner layers, wherein: A multilayer structure in which the second land and the inner via hole are arranged at a position where the X-ray transmission image of the junction between the electrode and the second land does not overlap with the X-ray transmission image of the inner via hole. substrate.
【請求項3】 第1の部品の電極を接続するための第1
のランドが表面に形成されるとともに、内層間の第2の
ランド上に第2の部品が接続された多層基板において、 前記第1の部品の電極及び前記第1のランドの接合部の
X線透過像と、前記第2の部品の電極及び前記第2のラ
ンドの接合部のX線透過像が重ならない位置に前記第1
及び第2のランドを配置したことを特徴とする多層基
板。
3. A first for connecting electrodes of a first part
Of the above-mentioned land are formed on the surface, and the second component is connected to the second land between the inner layers, the X-ray of the junction of the electrode of the first component and the first land The first image is placed at a position where the transmission image and the X-ray transmission image of the joint between the electrode of the second component and the second land do not overlap.
And a second land is arranged.
【請求項4】 内層間の第3のランド上に第3の部品が
接続され、前記第2の部品の電極及び前記第2のランド
の接合部のX線透過像と、第3の部品の電極及び前記第
3のランドの接合部のX線透過像と、前記インナビアホ
ールのX線透過像とが重ならない位置に前記第2あるい
は第3のランドと前記インナビアホールとを配置したこ
とを特徴とする請求項1に記載の多層基板。
4. A third part is connected on a third land between inner layers, and an X-ray transmission image of an electrode of the second part and a joint portion of the second land and a third part of the third part are connected. The second or third land and the inner via hole are arranged at positions where the X-ray transmission image of the junction between the electrode and the third land does not overlap with the X-ray transmission image of the inner via hole. The multilayer substrate according to claim 1.
【請求項5】 請求項1に記載の前記第1の部品の電極
及び前記第1のランドの接合部と、請求項4に記載の前
記第2の部品及び第2のランドの接合部のX線透過像が
重ならない位置に配置したことを特徴とする多層基板。
5. The X of the joint between the electrode and the first land of the first component according to claim 1 and the joint of the second component and the second land according to claim 4. A multi-layer substrate, which is arranged at a position where line-transmission images do not overlap.
【請求項6】 前記X線透過像は、X線を多層基板の厚
み方向に透過させた場合の像であることを特徴とする請
求項1ないし5のいずれか1つに記載の多層基板。
6. The multilayer substrate according to claim 1, wherein the X-ray transmission image is an image when X-rays are transmitted in the thickness direction of the multilayer substrate.
【請求項7】 前記X線透過像は、X線を多層基板の厚
み方向に対して斜めに透過させた場合の像であることを
特徴とする請求項1ないし5のいずれか1つに記載の多
層基板。
7. The X-ray transmission image is an image when X-rays are transmitted obliquely with respect to the thickness direction of the multilayer substrate, according to any one of claims 1 to 5. Multilayer board.
【請求項8】 前記X線透過像は、略点光源のX線を多
層基板の厚み方向又は厚み方向に対して斜めに透過させ
た場合の像であることを特徴とする請求項1ないし5の
いずれか1つに記載の多層基板。
8. The X-ray transmission image is an image when X-rays of a substantially point light source are transmitted in the thickness direction of the multilayer substrate or obliquely with respect to the thickness direction. The multilayer substrate according to any one of 1.
JP2001201427A 2001-07-02 2001-07-02 Multilayer board Withdrawn JP2003017864A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2001201427A JP2003017864A (en) 2001-07-02 2001-07-02 Multilayer board

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2001201427A JP2003017864A (en) 2001-07-02 2001-07-02 Multilayer board

Publications (1)

Publication Number Publication Date
JP2003017864A true JP2003017864A (en) 2003-01-17

Family

ID=19038388

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2001201427A Withdrawn JP2003017864A (en) 2001-07-02 2001-07-02 Multilayer board

Country Status (1)

Country Link
JP (1) JP2003017864A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009152281A (en) * 2007-12-19 2009-07-09 Denso Corp Through substrate

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009152281A (en) * 2007-12-19 2009-07-09 Denso Corp Through substrate

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