JP2002538229A5 - - Google Patents

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Publication number
JP2002538229A5
JP2002538229A5 JP2000603793A JP2000603793A JP2002538229A5 JP 2002538229 A5 JP2002538229 A5 JP 2002538229A5 JP 2000603793 A JP2000603793 A JP 2000603793A JP 2000603793 A JP2000603793 A JP 2000603793A JP 2002538229 A5 JP2002538229 A5 JP 2002538229A5
Authority
JP
Japan
Prior art keywords
gel
strength
gelatin
gel strength
determined
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2000603793A
Other languages
English (en)
Japanese (ja)
Other versions
JP2002538229A (ja
JP4823420B2 (ja
Filing date
Publication date
Application filed filed Critical
Priority claimed from PCT/EP2000/002197 external-priority patent/WO2000053309A1/de
Publication of JP2002538229A publication Critical patent/JP2002538229A/ja
Publication of JP2002538229A5 publication Critical patent/JP2002538229A5/ja
Application granted granted Critical
Publication of JP4823420B2 publication Critical patent/JP4823420B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

JP2000603793A 1999-03-11 2000-03-13 Dnaチップの製造における固定化ヌクレオシド誘導体の光分解脱保護方法 Expired - Fee Related JP4823420B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
DE19910808.0 1999-03-11
DE19910808 1999-03-11
DE19953289.3 1999-11-05
DE19953289 1999-11-05
PCT/EP2000/002197 WO2000053309A1 (de) 1999-03-11 2000-03-13 Verfahren zur photolytischen abspaltung von schutzgruppen von immobilisierten nucleosid-derivaten, insbesondere in der dna-chip-herstellung

Publications (3)

Publication Number Publication Date
JP2002538229A JP2002538229A (ja) 2002-11-12
JP2002538229A5 true JP2002538229A5 (enExample) 2010-11-11
JP4823420B2 JP4823420B2 (ja) 2011-11-24

Family

ID=26052312

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000603793A Expired - Fee Related JP4823420B2 (ja) 1999-03-11 2000-03-13 Dnaチップの製造における固定化ヌクレオシド誘導体の光分解脱保護方法

Country Status (8)

Country Link
US (1) US6552182B2 (enExample)
EP (1) EP1159064B1 (enExample)
JP (1) JP4823420B2 (enExample)
AT (1) ATE265270T1 (enExample)
AU (1) AU3429400A (enExample)
CA (1) CA2362699A1 (enExample)
DE (2) DE10011400A1 (enExample)
WO (1) WO2000053309A1 (enExample)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10209203A1 (de) 2002-03-04 2003-09-25 Ulrich Steiner Verfahren zur Abspaltung von labilen funktionellen Gruppen aus chemischen Verbindungen
EP1480927B1 (en) * 2002-03-04 2012-12-26 Universität Konstanz A method for cleavage of labile functional groups from chemical compounds
DE10237704A1 (de) * 2002-08-09 2004-03-11 Chemogenix Gmbh Verfahren und Vorrichtung zum intermolekularen Transfer von Aktivierungsenergie zur Bindungsspaltung durch den Raum
WO2004024955A1 (en) * 2002-09-13 2004-03-25 Lg Chem, Ltd. Bio-chip prepared by gelation on a chip substrate
US20070224616A1 (en) * 2006-03-24 2007-09-27 Erdogan Gulari Method for forming molecular sequences on surfaces
KR100801080B1 (ko) * 2006-08-07 2008-02-05 삼성전자주식회사 광분해성 화합물 및 상기 화합물이 결합된 올리고머 프로브어레이용 기판
KR20090034571A (ko) * 2007-10-04 2009-04-08 삼성전자주식회사 감광성 물질의 코팅을 이용한 폴리머 어레이의 제조 방법
US12187760B2 (en) * 2021-05-26 2025-01-07 Microsoft Technology Licensing, Llc Photon generating substrates for oligonucleotide synthesis
CN114989094B (zh) * 2022-04-12 2023-09-29 云南民族大学 一种可见光催化合成苯并咪唑衍生物的方法

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0608983B1 (en) * 1993-01-25 1997-11-12 AT&T Corp. A process for controlled deprotection of polymers and a process for fabricating a device utilizing partially deprotected resist polymers
US5658734A (en) * 1995-10-17 1997-08-19 International Business Machines Corporation Process for synthesizing chemical compounds
US6147205A (en) * 1995-12-15 2000-11-14 Affymetrix, Inc. Photocleavable protecting groups and methods for their use
JP3624227B2 (ja) * 1997-03-12 2005-03-02 独立行政法人理化学研究所 反応チップ及びその作製方法

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