JP2002522453A5 - - Google Patents
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- Publication number
- JP2002522453A5 JP2002522453A5 JP2000563846A JP2000563846A JP2002522453A5 JP 2002522453 A5 JP2002522453 A5 JP 2002522453A5 JP 2000563846 A JP2000563846 A JP 2000563846A JP 2000563846 A JP2000563846 A JP 2000563846A JP 2002522453 A5 JP2002522453 A5 JP 2002522453A5
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR1019980032069A KR20000013302A (ko) | 1998-08-06 | 1998-08-06 | 화학 증착법을 위한 유기 구리 전구체 |
| KR1998/32069 | 1998-08-06 | ||
| PCT/KR1999/000438 WO2000008225A2 (en) | 1998-08-06 | 1999-08-06 | Organocopper precursors for chemical vapor deposition |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2002522453A JP2002522453A (ja) | 2002-07-23 |
| JP2002522453A5 true JP2002522453A5 (enExample) | 2005-12-22 |
Family
ID=19546633
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2000563846A Pending JP2002522453A (ja) | 1998-08-06 | 1999-08-06 | 化学蒸着のための有機銅前駆体 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US6538147B1 (enExample) |
| EP (1) | EP1121474A2 (enExample) |
| JP (1) | JP2002522453A (enExample) |
| KR (2) | KR20000013302A (enExample) |
| TW (1) | TW499497B (enExample) |
| WO (1) | WO2000008225A2 (enExample) |
Families Citing this family (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE10319454A1 (de) * | 2003-04-29 | 2004-11-18 | Merck Patent Gmbh | Dikupfer(I)oxalat-Komplexe als Precursor zur metallischen Kupferabscheidung |
| US7344753B2 (en) * | 2003-09-19 | 2008-03-18 | The Board Of Trustees Of The University Of Illinois | Nanostructures including a metal |
| US8030833B2 (en) | 2003-09-19 | 2011-10-04 | The Board Of Trustees Of The University Of Illinois | Electron emission device incorporating free standing monocrystalline nanowires |
| US7166732B2 (en) * | 2004-06-16 | 2007-01-23 | Advanced Technology Materials, Inc. | Copper (I) compounds useful as deposition precursors of copper thin films |
| US7034169B1 (en) | 2004-12-30 | 2006-04-25 | Air Products And Chemicals, Inc. | Volatile metal β-ketoiminate complexes |
| US7205422B2 (en) * | 2004-12-30 | 2007-04-17 | Air Products And Chemicals, Inc. | Volatile metal β-ketoiminate and metal β-diiminate complexes |
| US20090162550A1 (en) * | 2006-06-02 | 2009-06-25 | Advanced Technology Materials, Inc. | Copper (i) amidinates and guanidinates, mixed ligand copper complexes, and compositions for chemical vapor deposition, atomic layer deposition, and rapid vapor deposition of copper |
| US20110060165A1 (en) * | 2006-12-05 | 2011-03-10 | Advanced Technology Materials, Inc. | Metal aminotroponiminates, bis-oxazolinates and guanidinates |
| US8263795B2 (en) * | 2007-11-05 | 2012-09-11 | Air Products And Chemicals, Inc. | Copper precursors for thin film deposition |
| DE102007058571B4 (de) * | 2007-12-05 | 2012-02-16 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Substrat mit einer Kupfer enthaltenden Beschichtung und Verfahren zu deren Herstellung mittels Atomic Layer Deposition und Verwendung des Verfahrens |
| US9540730B2 (en) | 2012-09-21 | 2017-01-10 | Wayne State University | Deposition of metal films based upon complementary reactions |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5098516A (en) * | 1990-12-31 | 1992-03-24 | Air Products And Chemicals, Inc. | Processes for the chemical vapor deposition of copper and etching of copper |
| AU662451B2 (en) | 1992-10-06 | 1995-08-31 | Walkerville Pty Ltd | Wood flooring system |
| US5441766A (en) * | 1994-08-25 | 1995-08-15 | Korea Institute Of Science And Technology | Method for the production of highly pure copper thin films by chemical vapor deposition |
| US5767301A (en) | 1997-01-21 | 1998-06-16 | Sharp Microelectronics Technology, Inc. | Precursor with (alkyloxy)(alkyl)-silylolefin ligand to deposit copper |
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1998
- 1998-08-06 KR KR1019980032069A patent/KR20000013302A/ko not_active Abandoned
-
1999
- 1999-08-06 KR KR1020017001526A patent/KR100582619B1/ko not_active Expired - Fee Related
- 1999-08-06 WO PCT/KR1999/000438 patent/WO2000008225A2/en not_active Ceased
- 1999-08-06 EP EP99935166A patent/EP1121474A2/en not_active Withdrawn
- 1999-08-06 JP JP2000563846A patent/JP2002522453A/ja active Pending
- 1999-08-06 US US09/744,619 patent/US6538147B1/en not_active Expired - Fee Related
- 1999-09-03 TW TW088115303A patent/TW499497B/zh not_active IP Right Cessation