JP2002506990A - マイクロメカニカル電位差センサ - Google Patents
マイクロメカニカル電位差センサInfo
- Publication number
- JP2002506990A JP2002506990A JP2000537052A JP2000537052A JP2002506990A JP 2002506990 A JP2002506990 A JP 2002506990A JP 2000537052 A JP2000537052 A JP 2000537052A JP 2000537052 A JP2000537052 A JP 2000537052A JP 2002506990 A JP2002506990 A JP 2002506990A
- Authority
- JP
- Japan
- Prior art keywords
- spring element
- sample
- microcantilever
- deflection
- chemical
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000000576 coating method Methods 0.000 claims abstract description 60
- 239000000126 substance Substances 0.000 claims abstract description 58
- 238000000034 method Methods 0.000 claims abstract description 55
- 239000011248 coating agent Substances 0.000 claims abstract description 51
- 238000001514 detection method Methods 0.000 claims abstract description 31
- 230000004044 response Effects 0.000 claims abstract description 19
- -1 hydrogen ions Chemical class 0.000 claims abstract description 12
- 239000001257 hydrogen Substances 0.000 claims abstract description 10
- 229910052739 hydrogen Inorganic materials 0.000 claims abstract description 10
- 239000000463 material Substances 0.000 claims description 66
- 230000008859 change Effects 0.000 claims description 32
- 150000002500 ions Chemical class 0.000 claims description 28
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims description 20
- 229910052581 Si3N4 Inorganic materials 0.000 claims description 19
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 18
- GPRLSGONYQIRFK-UHFFFAOYSA-N hydron Chemical compound [H+] GPRLSGONYQIRFK-UHFFFAOYSA-N 0.000 claims description 17
- 238000005259 measurement Methods 0.000 claims description 16
- 239000012528 membrane Substances 0.000 claims description 15
- 229920000642 polymer Polymers 0.000 claims description 13
- 229910052814 silicon oxide Inorganic materials 0.000 claims description 13
- 230000035945 sensitivity Effects 0.000 claims description 10
- HTXDPTMKBJXEOW-UHFFFAOYSA-N dioxoiridium Chemical compound O=[Ir]=O HTXDPTMKBJXEOW-UHFFFAOYSA-N 0.000 claims description 9
- 229910000457 iridium oxide Inorganic materials 0.000 claims description 9
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 claims description 9
- BPUBBGLMJRNUCC-UHFFFAOYSA-N oxygen(2-);tantalum(5+) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ta+5].[Ta+5] BPUBBGLMJRNUCC-UHFFFAOYSA-N 0.000 claims description 9
- 229910052751 metal Inorganic materials 0.000 claims description 8
- 239000002184 metal Substances 0.000 claims description 8
- PBCFLUZVCVVTBY-UHFFFAOYSA-N tantalum pentoxide Inorganic materials O=[Ta](=O)O[Ta](=O)=O PBCFLUZVCVVTBY-UHFFFAOYSA-N 0.000 claims description 8
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 claims description 6
- YBMRDBCBODYGJE-UHFFFAOYSA-N germanium dioxide Chemical compound O=[Ge]=O YBMRDBCBODYGJE-UHFFFAOYSA-N 0.000 claims description 6
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims description 6
- JBRZTFJDHDCESZ-UHFFFAOYSA-N AsGa Chemical compound [As]#[Ga] JBRZTFJDHDCESZ-UHFFFAOYSA-N 0.000 claims description 5
- 229910001218 Gallium arsenide Inorganic materials 0.000 claims description 5
- 239000000919 ceramic Substances 0.000 claims description 5
- 150000003377 silicon compounds Chemical class 0.000 claims description 5
- 229910052732 germanium Inorganic materials 0.000 claims description 4
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 claims description 4
- 229910000510 noble metal Inorganic materials 0.000 claims description 4
- 229940119177 germanium dioxide Drugs 0.000 claims description 3
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims description 3
- 229910052737 gold Inorganic materials 0.000 claims description 3
- 239000010931 gold Substances 0.000 claims description 3
- 229910052697 platinum Inorganic materials 0.000 claims description 3
- 239000011787 zinc oxide Substances 0.000 claims description 3
- 229910052782 aluminium Inorganic materials 0.000 claims 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims 2
- 239000007888 film coating Substances 0.000 claims 1
- 238000009501 film coating Methods 0.000 claims 1
- 230000001678 irradiating effect Effects 0.000 claims 1
- 229910001936 tantalum oxide Inorganic materials 0.000 claims 1
- 238000009825 accumulation Methods 0.000 abstract description 4
- 239000000523 sample Substances 0.000 description 49
- 239000010410 layer Substances 0.000 description 17
- 238000005452 bending Methods 0.000 description 16
- 238000012937 correction Methods 0.000 description 12
- 102000004190 Enzymes Human genes 0.000 description 8
- 108090000790 Enzymes Proteins 0.000 description 8
- CNQCVBJFEGMYDW-UHFFFAOYSA-N lawrencium atom Chemical compound [Lr] CNQCVBJFEGMYDW-UHFFFAOYSA-N 0.000 description 8
- 239000011540 sensing material Substances 0.000 description 8
- 239000012620 biological material Substances 0.000 description 7
- 229920001222 biopolymer Chemical class 0.000 description 7
- 150000001875 compounds Chemical class 0.000 description 6
- 239000007788 liquid Substances 0.000 description 6
- 239000012212 insulator Substances 0.000 description 5
- 239000007789 gas Substances 0.000 description 4
- 238000012544 monitoring process Methods 0.000 description 4
- 229910052710 silicon Inorganic materials 0.000 description 4
- 239000010703 silicon Substances 0.000 description 4
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
- 239000011575 calcium Substances 0.000 description 3
- 229910052791 calcium Inorganic materials 0.000 description 3
- 230000000875 corresponding effect Effects 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 230000003993 interaction Effects 0.000 description 3
- 150000002736 metal compounds Chemical class 0.000 description 3
- 230000007935 neutral effect Effects 0.000 description 3
- 102000004169 proteins and genes Human genes 0.000 description 3
- 108090000623 proteins and genes Proteins 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- 230000005641 tunneling Effects 0.000 description 3
- BSYNRYMUTXBXSQ-UHFFFAOYSA-N Aspirin Chemical compound CC(=O)OC1=CC=CC=C1C(O)=O BSYNRYMUTXBXSQ-UHFFFAOYSA-N 0.000 description 2
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 2
- FKNQFGJONOIPTF-UHFFFAOYSA-N Sodium cation Chemical compound [Na+] FKNQFGJONOIPTF-UHFFFAOYSA-N 0.000 description 2
- 108010067973 Valinomycin Proteins 0.000 description 2
- 229960001138 acetylsalicylic acid Drugs 0.000 description 2
- 239000000427 antigen Substances 0.000 description 2
- 102000036639 antigens Human genes 0.000 description 2
- 108091007433 antigens Proteins 0.000 description 2
- 150000001720 carbohydrates Chemical class 0.000 description 2
- 235000014633 carbohydrates Nutrition 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 239000011247 coating layer Substances 0.000 description 2
- FCFNRCROJUBPLU-UHFFFAOYSA-N compound M126 Natural products CC(C)C1NC(=O)C(C)OC(=O)C(C(C)C)NC(=O)C(C(C)C)OC(=O)C(C(C)C)NC(=O)C(C)OC(=O)C(C(C)C)NC(=O)C(C(C)C)OC(=O)C(C(C)C)NC(=O)C(C)OC(=O)C(C(C)C)NC(=O)C(C(C)C)OC1=O FCFNRCROJUBPLU-UHFFFAOYSA-N 0.000 description 2
- 238000006073 displacement reaction Methods 0.000 description 2
- 229940079593 drug Drugs 0.000 description 2
- 239000003814 drug Substances 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 238000003018 immunoassay Methods 0.000 description 2
- 239000011810 insulating material Substances 0.000 description 2
- 238000000691 measurement method Methods 0.000 description 2
- 210000000653 nervous system Anatomy 0.000 description 2
- 102000039446 nucleic acids Human genes 0.000 description 2
- 108020004707 nucleic acids Proteins 0.000 description 2
- 150000007523 nucleic acids Chemical class 0.000 description 2
- 230000010355 oscillation Effects 0.000 description 2
- 230000000144 pharmacologic effect Effects 0.000 description 2
- 229920000915 polyvinyl chloride Polymers 0.000 description 2
- 239000004800 polyvinyl chloride Substances 0.000 description 2
- 229910052700 potassium Inorganic materials 0.000 description 2
- 239000011591 potassium Substances 0.000 description 2
- 102000004196 processed proteins & peptides Human genes 0.000 description 2
- 108090000765 processed proteins & peptides Proteins 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- 229910001415 sodium ion Inorganic materials 0.000 description 2
- FCFNRCROJUBPLU-DNDCDFAISA-N valinomycin Chemical compound CC(C)[C@@H]1NC(=O)[C@H](C)OC(=O)[C@@H](C(C)C)NC(=O)[C@@H](C(C)C)OC(=O)[C@H](C(C)C)NC(=O)[C@H](C)OC(=O)[C@@H](C(C)C)NC(=O)[C@@H](C(C)C)OC(=O)[C@H](C(C)C)NC(=O)[C@H](C)OC(=O)[C@@H](C(C)C)NC(=O)[C@@H](C(C)C)OC1=O FCFNRCROJUBPLU-DNDCDFAISA-N 0.000 description 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- NPYPAHLBTDXSSS-UHFFFAOYSA-N Potassium ion Chemical compound [K+] NPYPAHLBTDXSSS-UHFFFAOYSA-N 0.000 description 1
- UCKMPCXJQFINFW-UHFFFAOYSA-N Sulphide Chemical compound [S-2] UCKMPCXJQFINFW-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 239000012491 analyte Substances 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 150000001450 anions Chemical class 0.000 description 1
- 230000003851 biochemical process Effects 0.000 description 1
- 230000004071 biological effect Effects 0.000 description 1
- 229910052792 caesium Inorganic materials 0.000 description 1
- TVFDJXOCXUVLDH-UHFFFAOYSA-N caesium atom Chemical compound [Cs] TVFDJXOCXUVLDH-UHFFFAOYSA-N 0.000 description 1
- 150000001768 cations Chemical class 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 230000002596 correlated effect Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 230000005672 electromagnetic field Effects 0.000 description 1
- 230000005669 field effect Effects 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 238000005305 interferometry Methods 0.000 description 1
- 229910052744 lithium Inorganic materials 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 230000002503 metabolic effect Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000000615 nonconductor Substances 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- MUMZUERVLWJKNR-UHFFFAOYSA-N oxoplatinum Chemical compound [Pt]=O MUMZUERVLWJKNR-UHFFFAOYSA-N 0.000 description 1
- 238000001139 pH measurement Methods 0.000 description 1
- 229910003446 platinum oxide Inorganic materials 0.000 description 1
- 229910001414 potassium ion Inorganic materials 0.000 description 1
- 238000004313 potentiometry Methods 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 238000012827 research and development Methods 0.000 description 1
- 238000005070 sampling Methods 0.000 description 1
- 125000005372 silanol group Chemical group 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 238000013519 translation Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N19/00—Investigating materials by mechanical methods
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
- B81B3/00—Devices comprising flexible or deformable elements, e.g. comprising elastic tongues or membranes
- B81B3/0018—Structures acting upon the moving or flexible element for transforming energy into mechanical movement or vice versa, i.e. actuators, sensors, generators
- B81B3/0021—Transducers for transforming electrical into mechanical energy or vice versa
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y35/00—Methods or apparatus for measurement or analysis of nanostructures
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2203/00—Investigating strength properties of solid materials by application of mechanical stress
- G01N2203/02—Details not specific for a particular testing method
- G01N2203/026—Specifications of the specimen
- G01N2203/0286—Miniature specimen; Testing on microregions of a specimen
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Investigating Or Analyzing Materials By The Use Of Electric Means (AREA)
- Investigating Or Analysing Biological Materials (AREA)
- Length Measuring Devices With Unspecified Measuring Means (AREA)
- Investigating Or Analysing Materials By The Use Of Chemical Reactions (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US09/042,601 | 1998-03-16 | ||
| US09/042,601 US6016686A (en) | 1998-03-16 | 1998-03-16 | Micromechanical potentiometric sensors |
| PCT/US1999/005747 WO1999047908A1 (en) | 1998-03-16 | 1999-03-16 | Micromechanical potentiometric sensors |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2002506990A true JP2002506990A (ja) | 2002-03-05 |
| JP2002506990A5 JP2002506990A5 (https=) | 2006-03-30 |
Family
ID=21922792
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2000537052A Pending JP2002506990A (ja) | 1998-03-16 | 1999-03-16 | マイクロメカニカル電位差センサ |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US6016686A (https=) |
| EP (1) | EP1084392A4 (https=) |
| JP (1) | JP2002506990A (https=) |
| AU (1) | AU3093399A (https=) |
| CA (1) | CA2322518A1 (https=) |
| WO (1) | WO1999047908A1 (https=) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100785007B1 (ko) | 2005-02-05 | 2007-12-12 | 삼성전자주식회사 | 센싱 스위치 및 그를 이용한 검출방법 |
Families Citing this family (96)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB9801286D0 (en) * | 1998-01-21 | 1998-03-18 | Univ Cambridge Tech | Sensor |
| US6167748B1 (en) * | 1998-08-31 | 2001-01-02 | Lockheed Martin Energy Research Corporation | Capacitively readout multi-element sensor array with common-mode cancellation |
| GB9819319D0 (en) * | 1998-09-05 | 1998-10-28 | Aea Technology Plc | Assay of chemical binding |
| US6289717B1 (en) * | 1999-03-30 | 2001-09-18 | U. T. Battelle, Llc | Micromechanical antibody sensor |
| US6575020B1 (en) * | 1999-05-03 | 2003-06-10 | Cantion A/S | Transducer for microfluid handling system |
| US6308553B1 (en) * | 1999-06-04 | 2001-10-30 | Honeywell International Inc | Self-normalizing flow sensor and method for the same |
| US6924476B2 (en) * | 2002-11-25 | 2005-08-02 | Microvision, Inc. | Resonant beam scanner with raster pinch compensation |
| US6245590B1 (en) * | 1999-08-05 | 2001-06-12 | Microvision Inc. | Frequency tunable resonant scanner and method of making |
| US6653621B2 (en) * | 2001-03-23 | 2003-11-25 | Microvision, Inc. | Frequency tunable resonant scanner and method of making |
| JP3564366B2 (ja) * | 1999-08-13 | 2004-09-08 | 三菱重工業株式会社 | 除塵装置 |
| JP2003507723A (ja) * | 1999-08-19 | 2003-02-25 | ザ・リージェンツ・オブ・ザ・ユニバーシティー・オブ・カリフォルニア | カンチレバーアレイブロックのパレットにより微小力を可視的に識別する装置及び方法 |
| US6269685B1 (en) * | 1999-09-23 | 2001-08-07 | Ut Battelle, Llc | Viscosity measuring using microcantilevers |
| WO2001033226A1 (en) | 1999-11-03 | 2001-05-10 | International Business Machines Corporation | Cantilever sensors and transducers |
| US20060210440A1 (en) * | 1999-11-17 | 2006-09-21 | General Electric Company | Opto-acoustic sensor system and associated method |
| US6523392B2 (en) * | 2000-01-25 | 2003-02-25 | Arizona Board Of Regents | Microcantilever sensor |
| EP1573416A4 (en) * | 2000-07-07 | 2010-01-27 | Fenwal Inc | MEDICAL SYSTEM, METHOD AND DEVICE USING MEMS |
| US7148017B1 (en) * | 2000-07-12 | 2006-12-12 | Cornell Research Foundation, Inc. | High sensitivity mechanical resonant sensor |
| AUPR007500A0 (en) * | 2000-09-13 | 2000-10-05 | Mulvaney, Paul | Micro cantilever rheometer |
| FR2816407B1 (fr) * | 2000-11-06 | 2003-03-28 | Centre Nat Rech Scient | Appareil de detection en parallele du comportement de microoscillateurs mecaniques |
| KR100393188B1 (ko) * | 2000-12-29 | 2003-07-31 | 삼성전자주식회사 | 다초점 렌즈를 이용한 위상공액 홀로그래픽 정보 저장장치 및 정보 저장 방법 |
| US6545495B2 (en) | 2001-04-17 | 2003-04-08 | Ut-Battelle, Llc | Method and apparatus for self-calibration of capacitive sensors |
| US7044911B2 (en) * | 2001-06-29 | 2006-05-16 | Philometron, Inc. | Gateway platform for biological monitoring and delivery of therapeutic compounds |
| US20060198760A1 (en) * | 2001-08-02 | 2006-09-07 | General Electric Company | Opto-acoustic sensor device and associated method |
| US20030068655A1 (en) * | 2001-09-12 | 2003-04-10 | Protiveris, Inc. | Microcantilever apparatus and methods for detection of enzymes |
| US6926864B2 (en) * | 2001-11-09 | 2005-08-09 | Protiveris Inc | Microfluidics apparatus and methods for use thereof |
| US20060121502A1 (en) * | 2001-11-09 | 2006-06-08 | Robert Cain | Microfluidics apparatus for cantilevers and methods of use therefor |
| US6866819B1 (en) | 2001-11-13 | 2005-03-15 | Raytheon Company | Sensor for detecting small concentrations of a target matter |
| US7329273B2 (en) * | 2001-11-29 | 2008-02-12 | Palomar Medicaltechnologies, Inc. | Tissue penetrating oral phototherapy applicator |
| US6671631B2 (en) | 2002-01-04 | 2003-12-30 | General Electric Company | Systems and methods for analyzing viscoelastic properties of combinatorial libraries of materials |
| US7064834B2 (en) * | 2002-01-22 | 2006-06-20 | Praxair Technology, Inc. | Method for analyzing impurities in carbon dioxide |
| EP1467948A1 (en) * | 2002-01-24 | 2004-10-20 | Cantion A/S | A sensor |
| US20050034542A1 (en) * | 2002-02-08 | 2005-02-17 | Jacob Thaysen | Sensor comprising mechanical amplification of surface stress sensitive cantilever |
| US20030154149A1 (en) * | 2002-02-13 | 2003-08-14 | Dilip Gajendragadkar | System and method of creating and executing a restricted stock sale plan |
| JP3828030B2 (ja) * | 2002-03-25 | 2006-09-27 | エスアイアイ・ナノテクノロジー株式会社 | 温度測定プローブおよび温度測定装置 |
| US6860939B2 (en) * | 2002-04-23 | 2005-03-01 | Sharp Laboratories Of America, Inc. | Semiconductor crystal-structure-processed mechanical devices, and methods and systems for making |
| US7125451B2 (en) * | 2002-04-23 | 2006-10-24 | Sharp Laboratories Of America, Inc. | Crystal-structure-processed mechanical devices and methods and systems for making |
| US7135070B2 (en) * | 2002-04-23 | 2006-11-14 | Sharp Laboratories Of America, Inc. | Monolithic stacked/layered crystal-structure-processed mechanical, and combined mechanical and electrical, devices and methods and systems for making |
| US7128783B2 (en) * | 2002-04-23 | 2006-10-31 | Sharp Laboratories Of America, Inc. | Thin-film crystal-structure-processed mechanical devices, and methods and systems for making |
| US20030196591A1 (en) * | 2002-04-23 | 2003-10-23 | Hartzell John W. | Formation of crystal-structure-processed mechanical, and combined mechanical and electrical, devices on low-temperature substrates |
| US7156916B2 (en) * | 2002-04-23 | 2007-01-02 | Sharp Laboratories Of America, Inc. | Monolithic integrated crystal-structure-processed mechanical, and combined mechanical and electrical devices, and methods and systems for making |
| US7395693B2 (en) * | 2004-12-02 | 2008-07-08 | The Arizona Board of Regents, a body corporate of the state of Arizona acting for Northern Arizona University | Embedded piezoelectric microcantilever sensors |
| US6823717B2 (en) * | 2002-06-03 | 2004-11-30 | Timothy L. Porter | Hybrid microcantilever sensors |
| US7270952B2 (en) * | 2002-09-24 | 2007-09-18 | Intel Corporation | Detecting molecular binding by monitoring feedback controlled cantilever deflections |
| EP1543328B1 (en) * | 2002-09-24 | 2006-11-22 | Intel Corporation | Detecting molecular binding by monitoring feedback controlled cantilever deflections |
| JP4329322B2 (ja) * | 2002-10-04 | 2009-09-09 | ソニー株式会社 | 相互反応作用検出方法及びバイオアッセイ装置、並びにバイオアッセイ用基板 |
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- 1999-03-16 AU AU30933/99A patent/AU3093399A/en not_active Abandoned
- 1999-03-16 EP EP99912589A patent/EP1084392A4/en not_active Withdrawn
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100785007B1 (ko) | 2005-02-05 | 2007-12-12 | 삼성전자주식회사 | 센싱 스위치 및 그를 이용한 검출방법 |
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|---|---|
| CA2322518A1 (en) | 1999-09-23 |
| EP1084392A4 (en) | 2001-06-27 |
| US6016686A (en) | 2000-01-25 |
| EP1084392A1 (en) | 2001-03-21 |
| AU3093399A (en) | 1999-10-11 |
| WO1999047908A1 (en) | 1999-09-23 |
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