JP2002506946A - ガス処理反応器 - Google Patents
ガス処理反応器Info
- Publication number
- JP2002506946A JP2002506946A JP2000536471A JP2000536471A JP2002506946A JP 2002506946 A JP2002506946 A JP 2002506946A JP 2000536471 A JP2000536471 A JP 2000536471A JP 2000536471 A JP2000536471 A JP 2000536471A JP 2002506946 A JP2002506946 A JP 2002506946A
- Authority
- JP
- Japan
- Prior art keywords
- reactor
- bed
- wall structure
- beds
- gas
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/32—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by electrical effects other than those provided for in group B01D61/00
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J19/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
- B01J19/087—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy
- B01J19/088—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy giving rise to electric discharges
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J8/00—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes
- B01J8/02—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with stationary particles, e.g. in fixed beds
- B01J8/04—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with stationary particles, e.g. in fixed beds the fluid passing successively through two or more beds
- B01J8/0446—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with stationary particles, e.g. in fixed beds the fluid passing successively through two or more beds the flow within the beds being predominantly vertical
- B01J8/0449—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with stationary particles, e.g. in fixed beds the fluid passing successively through two or more beds the flow within the beds being predominantly vertical in two or more cylindrical beds
- B01J8/0453—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with stationary particles, e.g. in fixed beds the fluid passing successively through two or more beds the flow within the beds being predominantly vertical in two or more cylindrical beds the beds being superimposed one above the other
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J2219/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
- B01J2219/0894—Processes carried out in the presence of a plasma
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Organic Chemistry (AREA)
- Oil, Petroleum & Natural Gas (AREA)
- Analytical Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Health & Medical Sciences (AREA)
- General Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Treating Waste Gases (AREA)
- Exhaust Gas After Treatment (AREA)
- Separation Using Semi-Permeable Membranes (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| GBGB9805628.6A GB9805628D0 (en) | 1998-03-18 | 1998-03-18 | Gas processing reactors |
| GB9805628.6 | 1998-03-18 | ||
| PCT/GB1999/000647 WO1999047243A1 (en) | 1998-03-18 | 1999-03-05 | Gas processing reactors |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2002506946A true JP2002506946A (ja) | 2002-03-05 |
| JP2002506946A5 JP2002506946A5 (enExample) | 2006-04-27 |
Family
ID=10828683
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2000536471A Abandoned JP2002506946A (ja) | 1998-03-18 | 1999-03-05 | ガス処理反応器 |
Country Status (10)
| Country | Link |
|---|---|
| US (1) | US6372188B1 (enExample) |
| EP (1) | EP1064078B1 (enExample) |
| JP (1) | JP2002506946A (enExample) |
| KR (1) | KR20010041883A (enExample) |
| AT (1) | ATE230295T1 (enExample) |
| AU (1) | AU3264799A (enExample) |
| DE (1) | DE69904704T2 (enExample) |
| ES (1) | ES2190237T3 (enExample) |
| GB (1) | GB9805628D0 (enExample) |
| WO (1) | WO1999047243A1 (enExample) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB0020113D0 (en) * | 2000-08-11 | 2000-10-04 | Aea Technology Plc | Plasma assisted gas reactors |
| GB0030749D0 (en) * | 2000-12-15 | 2001-01-31 | Aea Technology Plc | Plasma reactor gas processing |
| US20030101936A1 (en) * | 2001-12-04 | 2003-06-05 | Dong Hoon Lee And Yong Moo Lee | Plasma reaction apparatus |
| KR100461516B1 (ko) * | 2002-07-25 | 2004-12-13 | 사단법인 고등기술연구원 연구조합 | 유전체 매입형 전극 보호 구조의 다단식 배리어 방전장치 |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5349922Y1 (enExample) * | 1970-10-24 | 1978-11-30 | ||
| US3983021A (en) * | 1971-06-09 | 1976-09-28 | Monsanto Company | Nitrogen oxide decomposition process |
| US5254231A (en) * | 1992-08-03 | 1993-10-19 | Battelle Memorial Institute | Method and apparatus for chemically altering fluids in continuous flow |
| GB9301433D0 (en) * | 1993-01-20 | 1993-03-17 | Atomic Energy Authority Uk | Gas purification |
-
1998
- 1998-03-18 GB GBGB9805628.6A patent/GB9805628D0/en not_active Ceased
-
1999
- 1999-03-05 ES ES99939833T patent/ES2190237T3/es not_active Expired - Lifetime
- 1999-03-05 AU AU32647/99A patent/AU3264799A/en not_active Abandoned
- 1999-03-05 WO PCT/GB1999/000647 patent/WO1999047243A1/en not_active Ceased
- 1999-03-05 EP EP99939833A patent/EP1064078B1/en not_active Expired - Lifetime
- 1999-03-05 DE DE69904704T patent/DE69904704T2/de not_active Expired - Fee Related
- 1999-03-05 US US09/622,643 patent/US6372188B1/en not_active Expired - Fee Related
- 1999-03-05 KR KR1020007010182A patent/KR20010041883A/ko not_active Withdrawn
- 1999-03-05 JP JP2000536471A patent/JP2002506946A/ja not_active Abandoned
- 1999-03-05 AT AT99939833T patent/ATE230295T1/de not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| ATE230295T1 (de) | 2003-01-15 |
| EP1064078B1 (en) | 2003-01-02 |
| US6372188B1 (en) | 2002-04-16 |
| ES2190237T3 (es) | 2003-07-16 |
| DE69904704D1 (de) | 2003-02-06 |
| GB9805628D0 (en) | 1998-05-13 |
| WO1999047243A1 (en) | 1999-09-23 |
| AU3264799A (en) | 1999-10-11 |
| DE69904704T2 (de) | 2003-10-23 |
| EP1064078A1 (en) | 2001-01-03 |
| KR20010041883A (ko) | 2001-05-25 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20060303 |
|
| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20060303 |
|
| A762 | Written abandonment of application |
Free format text: JAPANESE INTERMEDIATE CODE: A762 Effective date: 20070119 |