JP2002350801A - Method for manufacturing liquid crystal display element and liquid crystal display device - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a method for manufacturing a liquid crystal display element which prevents dielectric breakdown inferiority of a TFT array substrate due to static electricity generated in a base film exfoliating process when a resin film pattern is formed on the TFT array substrate and to provide a liquid crystal display device. SOLUTION: A film formed by laminating the base film and the resin film is fixed by thermal compression onto the TFT array substrate in which a switching active element for driving a pixel electrode is formed, then the base film is exfoliated from the resin film and the resin film is exposed and developed to form the resin film pattern on the TFT array substrate. In this manufacturing method of the liquid crystal display element, an interface between the base film and the resin film and an upper surface of the base film are irradiated with ions from an ionizer when the base film is exfoliated from the resin film.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for manufacturing a liquid crystal display element such as a thin film transistor (hereinafter referred to as TFT) array substrate having a resin film formed thereon, and a liquid crystal display device.

[0002]

2. Description of the Related Art Conventionally, when a film having a resin film formed on the surface of a base film is thermocompression-bonded onto a TFT array substrate, and exposed and developed to form a resin film pattern on the TFT array substrate, FIG. As shown, a film 4 having a resin film 2 formed on the surface of a base film 3 is attached to a pixel electrode 6.
After the thermocompression bonding on the TFT array substrate 1 on which the switching active element 7 for driving the base film 3 is formed, the base film 3 is separated from the resin film 2 in the step of separating the base film 3 from the resin film 2. The surface of the resin film 2 was neutralized using a static eliminator.

[0003]

However, in recent years,
With the application of liquid crystal to device fields in which CRTs have conventionally been used, such as large monitors and televisions, liquid crystal display devices have been required to have further improved performance. In particular,
2. Description of the Related Art A high-brightness, high-definition liquid crystal panel is required for application of a liquid crystal panel to medical applications such as radiographic display and Internet commerce. Under such a background, a color filter-on TFT array type liquid crystal display device for forming a color filter pattern on a TFT array substrate on which a switching active element for driving a pixel electrode is formed, or a pixel electrode is driven. Of a high-aperture type liquid crystal display device in which a transparent resin film is formed on a TFT array substrate on which a switching active element is formed for switching.

However, in the conventional method, when a resin film pattern is formed on a TFT array substrate, static electricity is generated in a step of peeling a base film, which causes a failure in electrostatic breakdown of the TFT array substrate and lowers the yield. There was a problem of inviting.

Accordingly, the present invention provides a method of manufacturing a liquid crystal display element capable of preventing electrostatic breakdown failure of a TFT array substrate, and a liquid crystal display device provided with the liquid crystal display element manufactured by the above method. With the goal.

[0006]

In order to achieve the above object, a method of manufacturing a liquid crystal display device according to the present invention comprises forming a laminated film of a base film and a resin film on a switching active element for driving a pixel electrode. A liquid crystal display element that forms the resin film pattern on the TFT array substrate by thermocompression bonding on the TFT array substrate, exfoliating the base film from the resin film, exposing and developing the resin film. In the manufacturing method of (1), when the base film is peeled from the resin film, ions are irradiated from an ionizer to an interface between the base film and the resin film and an upper surface of the base film.

As a result, a failure in electrostatic breakdown of the TFT array substrate can be prevented, so that a TFT array substrate having a resin film pattern formed thereon can be obtained at a high yield.

[0008] In the manufacturing method of the present invention, it is preferable that at least one ionizer is provided on the interface between the base film and the resin film and on the upper surface of the base film. Thereby, static elimination can be performed while following the peeling speed of the base film.

Further, in the manufacturing method of the present invention, the substrate is moved, and the interface between the base film and the resin film and the upper surface of the base film are irradiated with ions.

Further, in the manufacturing method of the present invention, the ionizer is moved to irradiate ions to an interface between the base film and the resin film and an upper surface of the base film.

Further, in the manufacturing method of the present invention, the ionizer and the substrate are moved to irradiate ions to an interface between the base film and the resin film and an upper surface of the base film.

In the production method of the present invention, it is preferable that the resin film is a film formed of a photosensitive resin.

Next, a liquid crystal display device according to the present invention includes a liquid crystal display element manufactured by the above method and a counter electrode substrate.

[0014]

Embodiments of the present invention will be described below with reference to the drawings.

(Embodiment 1) FIG. 1 is a sectional view showing a manufacturing process of a liquid crystal display device according to a first embodiment of the present invention. First, a laminated film 4 having an acrylic resin-based negative photosensitive resin film 2 formed on the surface of a base film 3
(Trade name "R35", manufactured by Fuji Photo Film Co., Ltd.)
After thermocompression bonding on the TFT array substrate 1, as shown in FIG. 1A, in a step of peeling the base film 3 from the resin film 2, the AC type bar type ionizer 5 is separated from the base film 3 and the resin film 2. And one on each of the interface side of the base film 3 and the upper surface side of the base film 3.

Next, as shown in FIGS. 1B and 1C,
The base film 3 is peeled off while the TFT array substrate 1 placed on the moving table is moved. Was irradiated to remove static electricity to produce a liquid crystal display device.

As a result, the electrostatic charge of the obtained liquid crystal display element is ± 0.5 kV or less, and the TFT array substrate 1
No electrostatic breakdown occurred.

(Embodiment 2) FIG. 2 is a cross-sectional view showing a manufacturing process of a liquid crystal display device according to a second embodiment of the present invention. First, a laminated film 4 having an acrylic resin-based negative photosensitive resin film 2 formed on the surface of a base film 3
(Trade name "R35", manufactured by Fuji Photo Film Co., Ltd.)
After thermocompression bonding on the TFT array substrate 1, as shown in FIG. 2A, in a step of peeling the base film 3 from the resin film 2, the AC type bar type ionizer 5 is connected And fixed to a moving table so that static elimination was possible.

Next, as shown in FIGS. 2B and 2C,
While peeling the base film 3 and moving the ionizer 5 following the peeling speed of the base film 3, the interface between the base film 3 and the resin film 2 and the upper surface of the base film 3 are used by using the ionizer 5 at the time of peeling. Was irradiated with ions to remove electricity, thereby producing a liquid crystal display device.

As a result, the amount of electrostatic charge of the obtained liquid crystal display element is ± 0.5 kV or less, and the TFT array substrate 1
No electrostatic breakdown occurred.

(Embodiment 3) A liquid crystal display device shown in FIG. 4 was manufactured using the liquid crystal display device manufactured in the above embodiment. A TFT array substrate 12 having a predetermined resin film pattern formed thereon and a glass substrate 15 previously formed on indium tin oxide (IT)
After an alignment film 9 for aligning the liquid crystal material is formed on the surface of the opposing substrate 13 on which the transparent electrode made of O) is formed, the TFT array substrate 12 is separated from the TFT array substrate 12 using a sealant via a predetermined spacer 10. The opposing substrate 13 was bonded, and a liquid crystal material was sealed in a gap between both substrates to form a liquid crystal layer 11.

Further, a polarizing plate 14 is provided on the glass substrate 15 side of the TFT array substrate 12 and the counter substrate 13.
And a TFT array type liquid crystal display device having a resin film pattern formed thereon was manufactured. As a result, a liquid crystal display device having high liquid crystal display performance and high yield was obtained.

In the embodiment of the present invention, the liquid crystal display device is formed by using the spacer. However, any device that can maintain a predetermined gap, such as a column spacer, can be used as appropriate.

The resin film-forming material that can be used in the present invention is not limited to the acrylic resin-based negative photosensitive material used in the above embodiment, but may be a positive or negative acrylic resin or a novolak resin. For example, any photosensitive resin that can be patterned using an exposure process can be used.

It is sufficient that at least one ionizer is provided on the interface side between the base film and the resin film and on the upper surface side of the base film, and the ionizer is not limited to the present embodiment (one for each). Depending on the type of base film or resin film to be formed, two or more films can be used as appropriate. Further, the ionizer is not limited to the AC type bar type used in the present embodiment, and may be an AC type, a DC type, a soft X-ray type or a bar type, a fan type, a brush, a ribbon, as long as static electricity can be removed. Types and the like can also be used.

[0026]

As described above, according to the present invention, a laminated film having a resin layer formed on the surface of a base film is thermocompression-bonded to a TFT array substrate on which switching active elements for driving pixel electrodes are formed. Thereafter, when the base film is peeled from the resin film, the interface between the base film and the resin film and the upper surface of the base film are irradiated with ions from an ionizer to remove static electricity, so that the electrostatic charge amount is ± 0. A liquid crystal display element substrate of 5 kV or less can be manufactured. As a result, it is possible to prevent electrostatic breakdown failure of the TFT array substrate, and to obtain a TFT array substrate on which a resin film pattern with a high yield is formed. Further, by mounting this in a liquid crystal display device, a liquid crystal display device having excellent display performance can be provided. Therefore, its industrial value is great.

[Brief description of the drawings]

FIG. 1 is a schematic process diagram illustrating a method for manufacturing a TFT array substrate on which a resin film pattern according to a first embodiment of the present invention is formed.

FIG. 2 is a schematic process diagram illustrating a method for manufacturing a TFT array substrate on which a resin film pattern according to a second embodiment of the present invention is formed.

FIG. 3 is a schematic process diagram showing a conventional method for manufacturing a TFT array substrate on which a resin film pattern is formed.

FIG. 4 is a cross-sectional view of a TFT array type liquid crystal display device (color filter-on TFT array type liquid crystal display device) on which a resin film pattern is formed.

[Explanation of symbols]

 REFERENCE SIGNS LIST 1 TFT array substrate 2 resin film 3 base film 4 laminated film 5 ionizer (static eliminator) 6 pixel electrode (ITO) 6 ′ opposed transparent electrode (ITO) 7 switching active element 8 contact part 9 alignment film 10 spacer 11 liquid crystal layer 12 resin Film forming TFT array substrate 13 Opposite substrate 14 Polarizing plate 15 Glass substrate

 ──────────────────────────────────────────────────続 き Continuing on the front page (72) Inventor Yoshio Taniguchi 1006 Kadoma Kadoma, Osaka Prefecture Matsushita Electric Industrial Co., Ltd. (72) Inventor Masanori Yoshida 1006 Kadoma Kadoma, Kadoma City Osaka Pref. Terms (reference) 2H088 FA00 HA12 MA20 2H090 HC00 HC01 LA15 5G435 AA16 AA17 BB12 EE10 EE47 GG31 KK05 KK09 KK10 LL04 LL08

Claims (7)

[Claims] 1. After laminating a laminated film of a base film and a resin film on a TFT array substrate on which a switching active element for driving a pixel electrode is formed, the base film is peeled off from the resin film. And exposing and developing the resin film to form the resin film pattern on the TFT array substrate. A method for manufacturing a liquid crystal display element, comprising: removing the base film from the resin film;
A method for manufacturing a liquid crystal display device, comprising irradiating an ion from an ionizer to an interface between the base film and the resin film and an upper surface of the base film. 2. The method according to claim 1, wherein at least one ionizer is provided on an interface between the base film and the resin film and on an upper surface of the base film. 3. The method according to claim 1, wherein the substrate is moved to irradiate ions on an interface between the base film and the resin film and on an upper surface of the base film. 4. The method for manufacturing a liquid crystal display device according to claim 1, wherein the ionizer is moved to irradiate ions on an interface between the base film and the resin film and on an upper surface of the base film. 5. The method for manufacturing a liquid crystal display device according to claim 1, wherein the ionizer and the substrate are moved to irradiate ions on an interface between the base film and the resin film and on an upper surface of the base film. . 6. The method for manufacturing a liquid crystal display element according to claim 1, wherein said resin film is a film formed of a photosensitive resin. 7. A liquid crystal display device comprising a liquid crystal display element manufactured by the method according to claim 1 and a counter electrode substrate.