JP2004341334A - Substrate for liquid crystal device, its manufacturing method, and liquid crystal device - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To reduce the fraction defective of products by preventing exfoliation of an alignment layer in rubbing treatment. <P>SOLUTION: A plurality of projecting parts 10b having affinity to the alignment layer 16 are formed to the alignment layer 16 on the outer periphery of a TFT substrate 10 to be a non-pixel region other than a pixel region 10a where a plurality of pixel electrodes formed on the TFT substrate 10 are arranged and the alignment layer 16 is strongly fixed to the substrate by the projecting parts 16. Exfoliation of the alignment layer 16 can be prevented even if the alignment layer receives frictional force from a rubbing roll 112 when rubbing treatment is performed by strongly fixing the alignment layer 16 to the substrate by the projecting parts 10b. <P>COPYRIGHT: (C)2005,JPO&NCIPI

Description

[0001]
TECHNICAL FIELD OF THE INVENTION
The present invention relates to a substrate for a liquid crystal device which prevents peeling of an alignment film generated in a rubbing step, a method for manufacturing the same, and a liquid crystal device.
[0002]
[Prior art]
A liquid crystal device such as a liquid crystal light valve is configured by sealing liquid crystal between two substrates such as a glass substrate and a quartz substrate. In such a liquid crystal device, for example, a thin film transistor (TFT: Thin Film Transistor) is arranged in a matrix on one substrate, a counter electrode is arranged on the other substrate, and a liquid crystal layer sealed between the two substrates is formed. By changing the characteristics according to the image signal, an image can be displayed.
[0003]
The optical characteristics of the liquid crystal layer are controlled by applying a voltage based on a video signal to the liquid crystal layer to change the arrangement of liquid crystal molecules. In order to regulate the arrangement of liquid crystal molecules when no voltage is applied, an alignment film is formed on a surface of one substrate (active matrix substrate) and the other substrate (opposite substrate) that are in contact with the liquid crystal layer, and rubbing is performed on the alignment film. Perform processing.
[0004]
That is, the alignment film is formed by forming an organic film such as polyimide (PI) with a thickness of about several tens of nanometers on the surfaces of both substrates, and the liquid crystal molecules are aligned along the substrate surface by the alignment film. can do. Further, by performing a rubbing treatment on the surface of the alignment film, the alignment film is made an alignment anisotropic film and the alignment of the liquid crystal molecules is defined.
[0005]
As a specific rubbing method, first, a substrate having a polyimide film is arranged on a stage of a rubbing apparatus with the polyimide film facing upward. Then, a rubbing roll with a rubbing cloth attached around the roll is disposed so as to be in contact with the polyimide film, the rubbing roll is rotated, the rubbing roll and the stage are relatively moved, and the rubbing treatment is performed by rubbing the polyimide film. The formed alignment film is formed. The rubbing method is disclosed in Patent Document 1 and the like.
[0006]
[Patent Document 1]
JP 2002-156636 A
[Problems to be solved by the invention]
By the way, the rubbing treatment is performed on the entire substrate, but in the rubbing treatment, a portion of the alignment film having weak adhesion may be peeled off and re-attached in the pixel region. The adhesion of the alignment film depends on the affinity with the opposing substrate, pixel electrode, and the like, and the surface irregularities. In other words, in the pixel region, unevenness is formed on the substrate surface by a plurality of pixel electrodes, and this causes an anchor effect to firmly hold the alignment film. When the surface has a non-affinity for the alignment film, the adhesiveness is weak and the film is easily peeled off.
[0008]
If the alignment film that has peeled off at the weakly adherent part is re-attached in the pixel area, the surface characteristics of the part where the alignment film is adhered are different from those of other parts, and the arrangement of liquid crystal molecules is disturbed when the liquid crystal is brought into contact. As a result, an abnormally oriented portion is formed, resulting in a defective product.
[0009]
The present invention has been made in view of the above problems, and a liquid crystal device substrate and a method of manufacturing the same, which can prevent the alignment film from peeling off in a rubbing process and can reduce the product defect rate, and It is an object to provide a liquid crystal device.
[0010]
[Means for Solving the Problems]
The present invention has a pixel region in which a plurality of pixel electrodes are arranged on a substrate, and in a liquid crystal device substrate provided with an alignment film on the substrate, a non-pixel region on the substrate and the alignment film An alignment film adhesion member is interposed therebetween.
[0011]
In such a configuration, by providing an alignment film adhesion member between the relatively flat non-pixel region on the substrate and the alignment film, the adhesion of the alignment film is improved, and the alignment during rubbing is performed. The peeling of the film can be prevented beforehand.
[0012]
In this case, by forming the alignment film adhesion member with a plurality of projections, the alignment film can be firmly adhered by the anchor effect by utilizing a step between the projections and the substrate.
[0013]
Further, by forming the alignment film adhesion member on the entire surface of the non-pixel region, the adhesion of the alignment film can be improved.
[0014]
In addition, when the alignment film adhesion member is made of a material having affinity for the alignment film, higher adhesion of the alignment film can be obtained.
[0015]
The present invention has a pixel region in which a plurality of pixel electrodes are arranged on a substrate, and in a liquid crystal device substrate provided with an alignment film on the substrate including the pixel region, a non-pixel region on the substrate A step portion lower than the pixel region is provided.
[0016]
In such a configuration, since the step portion lower than the pixel region is provided in the non-pixel region on the substrate, the alignment film provided in the step portion is one step lower than the alignment film provided in the pixel region. Since the rubbing roll is not in contact with the provided alignment film or is in contact with the frictional force, peeling of the alignment film can be prevented.
[0017]
In this case, the step portion is formed to a depth at which the rubbing roll when the rubbing treatment is performed on the alignment film is in a non-contact state or a low frictional force, so that the position or the alignment film where the rubbing roll is in the non-contact state is formed. A weak frictional force that does not cause peeling can be uniquely set.
[0018]
Further, by forming the step portion by cutting the substrate, it is possible to perform the step following the step of cutting a portion corresponding to another component on the substrate, thereby improving work efficiency.
[0019]
In addition, by forming the step portion by laminating the periphery of the step portion, another configuration can be performed following the laminating step, so that work efficiency is improved.
[0020]
In addition, since the step portion is formed by the wiring pattern formed around the step portion, a step of specially forming the step portion becomes unnecessary, so that the work process can be shortened and the production efficiency is improved.
[0021]
The method of manufacturing a substrate for a liquid crystal device according to the present invention includes a step of forming a pixel region in which a plurality of pixel electrodes are arranged on the substrate, and a step of forming an alignment film adhesion member in a non-pixel region on the substrate. A step of forming an alignment film on the substrate; and a step of performing a rubbing treatment on the alignment film.
[0022]
In such a configuration, first, a pixel region formed by arranging a plurality of pixel electrodes on a substrate is formed, then, an alignment film adhesive member is formed on a non-pixel region on the substrate, and then the alignment film is formed on the substrate. To form Then, a rubbing treatment is performed on the alignment film. At the time of the rubbing treatment, even if the alignment film on the non-pixel region is rubbed by the rubbing roll, the alignment film is in close contact with the alignment film adhesion member, so that peeling of the alignment film can be prevented beforehand. .
[0023]
In this case, by forming the alignment film adhesion member by patterning, the alignment film member can be easily formed.
[0024]
Further, by forming the alignment film adhesion member by screen printing, the alignment film adhesion member can be easily formed.
[0025]
Further, by forming the alignment film adhesion member using a material having an affinity for the alignment film, higher adhesion of the alignment film can be obtained.
[0026]
A method of manufacturing a substrate for a liquid crystal device according to the present invention includes a step of forming a pixel region in which a plurality of pixel electrodes are arranged on a substrate, and cutting a step portion lower than the pixel region in a non-pixel region on the substrate. Performing a step of forming an alignment film in a region including the pixel region on the substrate; and performing a rubbing process on the alignment film.
[0027]
In such a configuration, first, a pixel region in which a plurality of pixel electrodes are arranged on a substrate is formed. Next, a step portion lower than the pixel region is cut in the non-pixel region on the substrate, and thereafter, an alignment film is formed in a region including the pixel region on the substrate. Then, a rubbing treatment is performed on the alignment film. At the time of the rubbing treatment, the rubbing roll is not in contact with the alignment film or is in contact with the alignment film with a low frictional force at the stepped portion lower than the pixel region, so that peeling of the alignment film can be prevented.
[0028]
The method for manufacturing a substrate for a liquid crystal device according to the present invention includes a step of stacking at least a portion corresponding to a pixel region on the substrate to form a step portion lower than the pixel region in a non-pixel region; The method includes a step of forming a plurality of pixel electrodes in a region corresponding to a region, a step of forming an alignment film on the substrate, and a step of rubbing the alignment film.
[0029]
In such a configuration, first, at least a portion corresponding to the pixel region on the substrate is laminated, and a step portion lower than the pixel region is formed in the non-pixel region. Next, a plurality of pixel electrodes are formed at portions corresponding to the pixel regions on the substrate. After that, an alignment film is formed on the substrate. Then, a rubbing treatment is performed on the alignment film. At the time of the rubbing treatment, the rubbing roll is not in contact with the alignment film or is in contact with the alignment film with a low frictional force at the stepped portion lower than the pixel region, so that peeling of the alignment film can be prevented.
[0030]
In this case, the rubbing roll is formed in such a depth that the rubbing roll is in non-contact or in contact with a weak frictional force when performing the rubbing treatment, so that the rubbing roll is in a non-contact state or the alignment film is not peeled off. Can be uniquely set.
[0031]
A liquid crystal device according to the present invention is characterized by being configured using the above-described liquid crystal device substrate.
[0032]
With such a configuration, the adhesion of the alignment film is good, so that an apparatus capable of preventing peeling of the alignment film during rubbing treatment can be obtained.
[0033]
BEST MODE FOR CARRYING OUT THE INVENTION
Hereinafter, an embodiment of the present invention will be described with reference to the drawings.
[0034]
(1st Embodiment)
1 to 7 show a first embodiment of the present invention. FIG. 1 is a plan view of a liquid crystal device formed using a substrate for a liquid crystal device together with components formed thereon as viewed from the counter substrate side. FIG. 2 is a diagram in which the element substrate and the counter substrate are bonded together to enclose liquid crystal. FIG. 3 is a cross-sectional view of the liquid crystal device after the completion of the assembling process, taken along the line HH ′ in FIG. 1. FIG. 3 shows a plurality of pixels constituting a pixel region of the liquid crystal device substrate in FIG. 1 and FIG. FIG. 4 is a schematic configuration diagram of each pixel constituting a pixel region, FIG. 5 is a plan view of a liquid crystal device substrate before applying a polyimide serving as an alignment film, and FIG. FIG. 7 is an enlarged cross-sectional view of a main part of the TFT substrate in a rubbing step corresponding to a portion cut along line II ′ in FIG. 4, and FIG. 7 is a schematic diagram showing a rubbing device.
[0035]
First, an overall configuration of a liquid crystal device configured using a substrate for a liquid crystal device employed in the present embodiment will be described with reference to FIGS.
[0036]
As shown in FIGS. 1 and 2, the liquid crystal device includes, for example, a TFT substrate 10 made of a quartz substrate, a glass substrate, and a silicon substrate, and an opposing substrate 20 made of, for example, a glass substrate or a quartz substrate. A liquid crystal 50 is sealed between the two. The TFT substrate 10 and the opposite substrate 20 that are arranged to be opposed to each other are bonded together with a sealant 52.
[0037]
On the TFT substrate 10, pixel electrodes (ITO) 9a and the like constituting pixels are arranged in a matrix. A counter electrode (ITO) 21 is provided on the entire surface of the counter substrate 20. On the TFT substrate 10, the rubbing-processed alignment film 16 is laminated over the entire surface. On the other hand, an alignment film 22 that has been subjected to a rubbing treatment is also laminated over the entire surface of the counter electrode 21 formed on the counter substrate 20. Each of the alignment films 16 and 22 is formed of a transparent organic film made of a polyimide polymer resin.
[0038]
On the other hand, as shown in FIG. 3, in the pixel region 10a on the TFT substrate 10, a plurality of scanning lines 11a and a plurality of data lines 6a are wired so as to intersect, and the scanning lines 11a and the data lines 6a are Pixel electrodes 9a are arranged in a matrix in a region defined by. Then, a TFT 30 is provided at each intersection of the scanning line 11a and the data line 6a, and the pixel electrode 9a is connected to the TFT 30.
[0039]
The TFT 30 is turned on by the ON signal of the scanning line 11a, whereby the image signal supplied to the data line 6a is supplied to the pixel electrode 9a. A voltage between the pixel electrode 9 a and the counter electrode 21 provided on the counter substrate 20 is applied to the liquid crystal 50. Further, a storage capacitor 70 is provided in parallel with the pixel electrode 9a, and the storage capacitor 70 enables the voltage of the pixel electrode 9a to be held for a time longer than the time when the source voltage is applied, for example, by three digits. The storage capacitor 70 improves voltage holding characteristics and enables image display with a high contrast ratio.
[0040]
As shown in FIG. 4, a plurality of pixel electrodes 9 a are provided in a matrix on the TFT substrate 10, and the surface of the TFT substrate 10 has unevenness due to the thickness of the pixel electrode 9 a. A data line 6a and a scanning line 11a are provided along the vertical and horizontal boundaries of the pixel electrode 9a. The data line 6a has a laminated structure including an aluminum film and the like, and the scanning line 11a is composed of, for example, a conductive polysilicon film.
[0041]
A gate electrode and a channel region (both not shown) connected to the scanning line 11a are disposed opposite to each other where the scanning line 11a intersects with the data line 6a, thereby forming a pixel switching TFT 30. I have. Although not shown, on the TFT substrate 10, in addition to the TFT 30 and the pixel electrode 9a, various configurations including these are provided in a laminated structure.
[0042]
As shown in FIGS. 1 and 2, the opposing substrate 20 is provided with a light-shielding film 53 serving as a frame for partitioning a display area set slightly in the pixel area 10 a. As described above, a transparent conductive film such as ITO is formed on the entire surface of the counter substrate 20 as the counter electrode 21, and a polyimide alignment film 22 is formed on the entire surface of the counter electrode 21. The alignment film 22 is rubbed in a predetermined direction so as to give a predetermined pretilt angle to liquid crystal molecules.
[0043]
In a region of the pixel region 10a, a sealing material 52 for sealing liquid crystal is formed between the TFT substrate 10 and the counter substrate 20. The sealing material 52 is disposed so as to substantially match the contour shape of the counter substrate 20, and fixes the TFT substrate 10 and the counter substrate 20 to each other. The sealing material 52 is missing at a part of one side of the TFT substrate 10, and a liquid crystal injection port 108 for injecting the liquid crystal 50 is formed in a gap between the bonded TFT substrate 10 and the counter substrate 20. You. After the liquid crystal is injected from the liquid crystal injection port 108, the liquid crystal injection port 108 is sealed with a sealing material 109.
[0044]
A data line driving circuit 101 for driving the data line 6a by supplying an image signal to the data line 6a at a predetermined timing and an external connection terminal 102 for connection to an external circuit are provided in a region outside the sealing material 52. Are provided along one side of the TFT substrate 10. Along the two sides adjacent to the one side, a scanning line driving circuit 104 for driving the gate electrode 3a by supplying a scanning signal to the scanning line 11a and the gate electrode 3a at a predetermined timing is provided. The scanning line driving circuit 104 is formed on the TFT substrate 10 at a position facing the light shielding film 53 inside the sealing material 52. On the TFT substrate 10, a wiring 105 for connecting the data line driving circuit 101, the scanning line driving circuit 104, the external connection terminal 102, and the upper / lower conduction terminal 107 is provided facing three sides of the light shielding film 53. I have.
[0045]
The upper and lower conductive terminals 107 are formed on the four TFT substrates 10 at the corners of the sealing material 52. A vertical conductive material 106 is provided between the TFT substrate 10 and the counter substrate 20, the lower end of which contacts the upper and lower conductive terminals 107 and the upper end of which contacts the counter electrode 21. Electrical continuity is established between 10 and counter substrate 20.
[0046]
Furthermore, the TFT substrate 10 is provided with an orientation on an outer edge thereof which constitutes a region other than a region where the pixel region 10a and the plurality of external connection terminals 102 are arranged (hereinafter, referred to as a “non-pixel region”). A plurality of protrusions 10b as a film adhesion member are formed at predetermined intervals. The protrusions 10 b form a step on the surface of the TFT substrate 10 in order to enhance the adhesion of the alignment film 16 to the TFT substrate 10, and further have a material having an affinity for polyimide as a material of the alignment film 16. have. In addition, as a material having affinity, there are Al (aluminum), W (tungsten), SiO2 (silicon oxide) and the like in addition to ITO.
[0047]
The protrusions 10b are formed, for example, by forming a thin film for forming the protrusions 10b on the surface of the TFT substrate 10 with the above-mentioned material having the affinity, and patterning the film by etching or the like. The arrangement pattern of the portion 10b is not limited to the outer edge portion but may be formed randomly over the entire non-pixel region. The planar shape of each convex portion 10b is not limited to a quadrangle, but may be a polygon such as a triangle or a pentagon, or a circle, a donut, or the like, and these may be randomly arranged in a non-pixel region. good.
[0048]
Incidentally, the alignment film 16 laminated on the surface of the TFT substrate 10 is subjected to a rubbing treatment by a rubbing device as shown in FIG.
[0049]
The configuration of the rubbing device will be briefly described. In the following description, a substrate in which the alignment film 16 is laminated on the surface of the TFT substrate 10 is referred to as a liquid crystal device substrate 111 and is distinguished from the TFT substrate 10.
[0050]
The rubbing device includes a pallet 120 having a frame portion 121 for holding a plurality of liquid crystal device substrates 111 and moving in the horizontal direction, and a rubbing roll 112 disposed above a transport path of the pallet 120. A rubbing cloth 113 is attached to the outer periphery of the rubbing roll 112. When the pallet 120 is moved to convey and pass the liquid crystal device substrate 111 toward the rubbing roll 112 rotating at a predetermined speed, the tips of the rubbing cloth 113 rub the surface of the liquid crystal device substrate 111 to perform a rubbing process. Is performed.
[0051]
(Manufacturing process)
Next, the manufacturing process of the present embodiment having such a configuration will be briefly described.
[0052]
First, various configurations are stacked on the TFT substrate 10 to form the TFT 30, the scanning line 11a having a predetermined pattern, the data line 6a having a predetermined pattern, the external connection terminal 102, and the like. Next, a transparent conductive film such as an ITO film is laminated by a sputtering process or the like, and pixel electrodes 9a are formed in a matrix in the pixel region 10a (the region indicated by a dashed line in FIG. 5) by photolithography and etching.
[0053]
Thereafter, a thin film for forming the protrusion 10b is laminated on the upper surface of the TFT substrate 10. Then, the thin film is patterned by etching or the like to form a plurality of convex portions 10b (the convex portions 10b are indicated by hatching in FIG. 5 to distinguish them from the external connection terminals 102) in the non-pixel region. . The thin film for forming the protrusions 10 b has a material (ITO, Al, W, SiO 2, etc.) having an affinity for the polyimide to be the alignment film 16.
[0054]
Note that each projection 10b may be formed using a screen printing plate described in a second embodiment described later.
[0055]
Next, polyimide serving as an alignment film 16 is applied to the entire surface of the TFT substrate 10 configured as described above. Then, a rubbing process is performed on the alignment film 16 on the surface of the TFT substrate 10 using a rubbing device shown in FIG.
[0056]
In the rubbing treatment, as shown in FIG. 6, the surface of the alignment film 16 is rubbed by the tips 114 of the rubbing cloth 113 wound around the outer periphery of the rubbing roll 112. In the non-pixel region where the adhesion of the TFT substrate 10 is relatively weak, unevenness is formed by a plurality of protrusions 10b. Since the alignment film 16 is formed of a material having an affinity, the alignment film 16 can firmly adhere to the alignment film 16 in addition to the anchor effect due to the step around the protrusion 10 b, thereby effectively preventing peeling of the alignment film 16. Can be.
[0057]
Thereafter, dust generated by the rubbing process in the cleaning step is removed. Then, after forming the sealing material 52, the TFT substrate 10 and the opposing substrate 20 on which various components are laminated through the same process as the TFT substrate 10 are bonded, and pressure-bonded while performing alignment. To cure. Finally, the liquid crystal is sealed through a liquid crystal injection port 108 formed by cutting out a part of the sealing material 52, and after a predetermined injection, the liquid crystal injection port 108 is sealed with a sealing material 109.
[0058]
As described above, in the present embodiment, the protrusions 10 b formed of a material having an affinity for polyimide as the material of the alignment film 16 are formed in the non-pixel region of the TFT substrate 10 on which various configurations are stacked. Since a plurality of alignment films 16 are formed, the alignment film 16 has high adhesion due to the anchor effect due to the step around the protrusion 10b and the affinity for the protrusion 10b. The product defect rate can be reduced without peeling.
[0059]
(2nd Embodiment)
8 and 9 show a second embodiment of the present invention. FIG. 8 is a plan view of the TFT substrate before applying a polyimide serving as an alignment film, and FIG. 9 is an enlarged cross-sectional view of a main part of the TFT substrate in a rubbing step corresponding to a portion cut along line JJ ′ in FIG. is there.
[0060]
In the first embodiment, the adhesion of the alignment film 16 to the TFT substrate 10 is increased by forming a plurality of protrusions 10b in the non-pixel region of the TFT substrate 10. However, in the present embodiment, The adhesion is improved by providing an adhesion film 130 between the non-pixel region of the TFT substrate 10 and the alignment film 16. The adhesion film 130 is formed of a material having an affinity for both the surface of the TFT substrate 10 and the alignment film 16. In addition, as a material having affinity, there is an acrylic resin, a polyimide resin, or the like.
[0061]
For example, there is screen printing as a means for applying an acrylic resin or a polyimide resin on the surface of the TFT substrate 10. Screen printing is performed by opening an emulsion layer formed on a fine mesh screen made of stainless steel, nylon, silk, or the like at a portion corresponding to a region other than the region where the pixel region 10a and the plurality of external connection terminals 102 are formed. The holes are photoengraved to make a screen printing plate. Then, the screen printing plate is brought into contact with the TFT substrate 10 while being positioned at a predetermined position, and a paste made of an acrylic resin or a polyimide resin is applied to the surface of the TFT substrate 10 from the opening portion with a rubber squeegee or the like, thereby bringing the TFT printing plate into close contact. A film 130 is formed. When a plurality of TFT substrates 10 are formed at one time, a screen printing plate corresponding to the TFT substrate 10 is prepared.
[0062]
In the screen printing, as shown by hatching in FIG. 8, an adhesion film 130 made of an acrylic resin is formed in a region other than the pixel region 10a and the region where the plurality of external connection terminals 102 are provided on the TFT substrate 10. You.
[0063]
It is desirable that the thickness of the adhesion film 130 be the same as the thickness of the pixel electrode 9a. By making the film thickness of the adhesion film 130 and the pixel electrode 9a the same, the alignment film 16 can be applied on the TFT substrate 10 with a substantially uniform thickness.
[0064]
As described above, in the present embodiment, the adhesion film 130 is formed in a region between the TFT substrate 10 and the alignment film 16 other than the region where the pixel region 10a and the plurality of external connection terminals 102 are provided. Since the adhesiveness of the alignment film 16 is enhanced by the film 130, as shown in FIG. 9, in the rubbing step, the surface of the alignment film 16 is formed by the tips 114 of the rubbing cloth 113 wound around the outer periphery of the rubbing roll 112. Even if it is rubbed, peeling can be prevented beforehand because the alignment film 16 is firmly adhered.
[0065]
In addition, since the adhesion film 130 is formed by printing, the adhesion film 130 can be formed in all regions except the pixel region 10a and the external connection terminals 102, so that a higher adhesion of the alignment film 16 can be obtained.
[0066]
In FIG. 8, the adhesive film 130 is formed over the entire area other than the pixel area 10a and the external connection terminals 102. However, printing may be performed so that a plurality of protrusions are scattered. In this case, the shape and arrangement of each protrusion are the same as those of the protrusion 10b shown in the first embodiment.
[0067]
(Third embodiment)
10 and 11 show a third embodiment of the present invention. FIG. 10 is a plan view of the TFT substrate before applying a polyimide serving as an alignment film, and FIG. 11 is an enlarged cross-sectional view of a main part of the TFT substrate in a rubbing step corresponding to a portion cut along the line KK ′ in FIG. is there.
[0068]
In the present embodiment, a step portion 131 which is lower by one step is formed in a region (a region indicated by hatching in FIG. 10) excluding the pixel region 10a of the TFT substrate 10 and the region of the external connection terminal 102.
[0069]
As shown in FIG. 11, when the rubbing is performed by the rubbing roll 112 in the rubbing step after applying the alignment film 16, the tip of the rubbing cloth 113 does not contact or does not contact The position is set at a position that can withstand a frictional force to the extent that the alignment film 16 does not peel off.
[0070]
The step of forming the step portion 131 is performed continuously when cutting the portions corresponding to the pixel electrode 9a, the data line driving circuit 101, and the scanning line driving circuit 104, so that the working efficiency can be improved.
[0071]
In this case, conversely, the TFT substrate 10 may be formed to have a film thickness corresponding to the stepped portion 131 and the periphery of the stepped portion 131 may be formed one layer higher by lamination, so that a relatively lower portion may be the stepped portion 131. In addition, since the lamination on the TFT substrate 10 can be performed following the lamination process of other components, the work efficiency is improved.
[0072]
Alternatively, when manufacturing the TFT substrate 10, there is generally a step of cutting a portion corresponding to the wiring region in order to make the height of the wiring such as the data line 6a the same as the surrounding height. By not performing this cutting step, a step portion 131 lower than the wiring portion may be formed on the outer periphery of the TFT substrate 10 by a wiring pattern such as the data line 6a.
[0073]
As described above, in the present embodiment, the step portion 131 formed on the TFT substrate 10 prevents the alignment film 16 from being peeled off in the rubbing step. It is possible to cope sufficiently and to reduce equipment costs.
[Brief description of the drawings]
FIG. 1 is a plan view of a liquid crystal device, which is an electro-optical device configured using a liquid crystal device substrate according to a first embodiment, together with components formed thereon, viewed from a counter substrate side.
FIG. 2 is a cross-sectional view of the liquid crystal device after completion of an assembling step of bonding an element substrate and a counter substrate and enclosing a liquid crystal at the line HH ′ in FIG. 1;
3 is an equivalent circuit diagram of various elements, wiring, and the like in a plurality of pixels forming a pixel region of the liquid crystal device in FIGS. 1 and 2. FIG.
FIG. 4 is a schematic configuration diagram of each pixel constituting a pixel region.
FIG. 5 is a plan view of the TFT substrate before a polyimide serving as an alignment film is applied.
6 is an enlarged cross-sectional view of a main part of the TFT substrate in a rubbing step corresponding to a portion cut along the line II ′ in FIG. 4;
FIG. 7 is a schematic diagram showing the rubbing device.
FIG. 8 is a plan view of a TFT substrate before a polyimide serving as an alignment film according to a second embodiment is applied.
9 is an enlarged cross-sectional view of a main part of the TFT substrate in a rubbing step corresponding to a portion cut along the line JJ ′ in FIG. 8;
FIG. 10 is a plan view of a TFT substrate before a polyimide serving as an alignment film according to a third embodiment is applied.
11 is an enlarged cross-sectional view of a main part of the TFT substrate in a rubbing step corresponding to a portion cut along the line KK ′ in FIG. 10;
[Explanation of symbols]
6a data line (wiring pattern), 9a pixel electrode, 10 TFT substrate, 10a pixel area, 10b convex portion (alignment film adhesion member), 16 alignment film, 111 liquid crystal device substrate, 112 rubbing roll, 130 adhesion film (alignment film) (Adhering member), 131 step

Claims (17)

Having a pixel region in which a plurality of pixel electrodes are arranged on a substrate,
In a liquid crystal device substrate provided with an alignment film on the substrate,
A substrate for a liquid crystal device, wherein an alignment film adhesion member is interposed between a non-pixel region on the substrate and the alignment film. 2. The substrate for a liquid crystal device according to claim 1, wherein the alignment film adhesion member is constituted by a plurality of projections. 2. The substrate for a liquid crystal device according to claim 1, wherein the alignment film adhesion member is formed on an entire surface of the non-pixel region. The substrate for a liquid crystal device according to claim 1, wherein the alignment film adhesion member has an affinity for the alignment film. Having a pixel region in which a plurality of pixel electrodes are arranged on a substrate,
In a liquid crystal device substrate provided with an alignment film on the substrate including the pixel region,
A liquid crystal device substrate, wherein a step portion lower than the pixel region is provided in a non-pixel region on the substrate. 6. The substrate for a liquid crystal device according to claim 5, wherein the step portion is formed at a depth at which a rubbing roll for performing a rubbing treatment on the alignment film is in non-contact or in contact with a weak frictional force. 7. The substrate for a liquid crystal device according to claim 5, wherein the step portion is formed by cutting the substrate. 7. The substrate for a liquid crystal device according to claim 5, wherein the step portion is formed by laminating the periphery of the step portion. 7. The substrate for a liquid crystal device according to claim 5, wherein the step portion is formed by a wiring pattern around the step portion. Forming a pixel region formed by arranging a plurality of pixel electrodes on a substrate;
Forming an alignment film adhesion member in a non-pixel region on the substrate,
Forming an alignment film on the substrate,
Subjecting the alignment film to a rubbing process. The method for manufacturing a substrate for a liquid crystal device according to claim 10, wherein the alignment film adhesion member is formed by patterning. The method for manufacturing a substrate for a liquid crystal device according to claim 10, wherein the alignment film adhesion member is formed by screen printing. The method for manufacturing a substrate for a liquid crystal device according to claim 10, wherein the alignment film adhesion member is formed using a material having an affinity for the alignment film. Forming a pixel region formed by arranging a plurality of pixel electrodes on a substrate;
Cutting a step portion lower than the pixel region in the non-pixel region on the substrate,
Forming an alignment film in a region including the pixel region on the substrate,
Subjecting the alignment film to a rubbing process. A step of stacking at least a portion corresponding to the pixel region on the substrate and forming a step portion lower than the pixel region in the non-pixel region,
Forming a plurality of pixel electrodes on a portion corresponding to the pixel region on the substrate,
Forming an alignment film on the substrate,
Subjecting the alignment film to a rubbing process. The method according to claim 13, wherein the step portion is formed at a depth at which the rubbing roll is in non-contact or in contact with a weak frictional force when performing the rubbing treatment. A liquid crystal device comprising the liquid crystal device substrate according to claim 1.

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