JP2002346379A - Ultraviolet irradiation apparatus and ultraviolet irradiation method - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide an ultraviolet irradiation apparatus that hardly cause non-uniform cleanliness by the variation of the thickness of an object and non- uniform cleanliness by the position on the surface of the object and that does not interfere with the accompanying works, and to provide a method using the same. SOLUTION: The apparatus is characterized in that the ultraviolet irradiation lamp 1 is placed in an atmosphere under reduced pressure, the object 2 is stored in an irradiation vessel (3-1, 3-2) and is exposed to irradiation of ultraviolet light emitted from the ultraviolet irradiation lamp 1, the protection vessel 4 retains the ultraviolet irradiation lamp 1 and the irradiation vessels (3-1, 3-2) inside, an atmosphere maintenance device 5 reduces pressure inside the protection vessel 4 and a ventilator 6 ventilates the inside of the irradiation vessels (3-1, 3-2) in accordance with the predetermined condition, and to provide a method using the same.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an ultraviolet irradiation apparatus and an ultraviolet irradiation method for irradiating an object with ultraviolet rays using an ultraviolet irradiation lamp such as an excimer lamp to perform a cleaning treatment or a surface modification treatment on the surface of the object. .

[0002]

2. Description of the Related Art The expansion of production of semiconductor integrated circuits and liquid crystal display devices has supported the development of the electronics industry in recent years.
Many peripheral technologies are required to expand production of semiconductor integrated circuits and liquid crystal display devices. Among them, an ultraviolet irradiation method using an excimer lamp or the like is employed as a high-performance cleaning technique for a wafer serving as a substrate. In this apparatus, an object is placed in the atmosphere or in clean air, and ultraviolet light is irradiated using an excimer lamp. Impurities on the surface of the object are decomposed by the ultraviolet light. In addition, ozone gas is generated around the target object, and the decomposed impurities are oxidized. The oxidized impurities are gasified and exhausted out of the apparatus. Thus, the cleaning process is performed.

[0003]

However, the above-mentioned prior art has the following problems to be solved. If the lamp that irradiates the ultraviolet light is in the atmosphere, the ultraviolet light activates oxygen around the lamp and generates ozone gas, which may oxidize and degrade parts attached to the lamp. Therefore, a method has been developed in which the lamp is placed in a nitrogen atmosphere, a transparent window is provided on the object side, and ultraviolet light is irradiated on the object from this window (Japanese Patent No. 27050).
No. 23).

In this method, no ozone gas is generated around the lamp, so that the accessory parts of the lamp are not oxidized. However, the ultraviolet light emitted from the lamp is absorbed by nitrogen molecules around the lamp and attenuated. Thus, by the time the transparent window is reached, the illuminance is considerably reduced. To avoid this evil, the distance from the lamp to the transparent window is set extremely small. However, in this case, the workability at the time of replacing the lamp is poor, and the lamp may collide with the transparent window and be damaged.

[0005] Clean air exists between the transparent window and the object. The ultraviolet rays collide with oxygen molecules in the clean air to generate ozone and rapidly attenuate. Therefore, it is necessary to extremely shorten the distance from the transparent window to the surface of the object. As a result, if there is unevenness on the surface of the object, the distance from the transparent window to the surface of the object greatly varies due to the unevenness. That is, in a state where the distance from the transparent window to the convex portion of the object is 2 mm and the distance to the concave portion is 4 mm, a large difference occurs in the energy of the ultraviolet light applied to each portion.

In this case, the degree of cleaning (variation in surface modification depending on the application) occurs depending on the position on the same surface of the object. In particular, with the recent development of the electronics industry, the demand for such uneven objects has increased. Further, if the transparent window is too close to the object, it may hinder the taking in and out of the object and the work associated therewith.

[0007]

The present invention employs the following structure to solve the above problems. <Structure 1> An ultraviolet irradiation lamp, an irradiation container for storing an object to be processed by being irradiated with ultraviolet light emitted from the ultraviolet irradiation lamp, and a protective container for holding the ultraviolet irradiation lamp and the irradiation container therein. An ultraviolet irradiation device, comprising: a pressure reducing device in the protection container for maintaining the inside of the protection container in a reduced pressure state; and a ventilation device for ventilating the inside of the irradiation container based on predetermined conditions.

<Structure 2> A structure according to structure 1, wherein the inside of the irradiation container is maintained in a reduced pressure state, and the ventilation device for injecting a predetermined amount of oxygen gas into the reduced irradiation container is provided. The ultraviolet irradiation device as described in the above.

<Structure 3> The pressure inside the protective container is set to 15
The ultraviolet irradiation device according to Configuration 1, further comprising the pressure reducing device in the protective container that maintains the pressure at a level lower than Torr.

<Structure 4> The pressure inside the irradiation container is set to 15
The ultraviolet irradiating apparatus according to Configuration 1, further comprising the above-described arousing device that maintains the state lower than Torr.

<Structure 5> After the pressure inside the irradiation container is reduced,
The ultraviolet irradiation apparatus according to the fourth aspect, further comprising the above-described stimulating apparatus for injecting oxygen gas having a partial pressure lower than 200 Torr into the irradiation container.

<Structure 6> An ultraviolet irradiation lamp placed in an inert gas atmosphere, an irradiation container for storing an object to be processed by being irradiated with ultraviolet light emitted from the ultraviolet irradiation lamp, and the ultraviolet irradiation lamp An ultraviolet irradiation device, comprising: a protection container that holds the irradiation container therein; and a ventilation device that maintains the inside of the irradiation container in a reduced pressure state.

<Arrangement 7> The pressure inside the irradiation container is set to 15
7. The ultraviolet irradiation device according to Configuration 6, further comprising the above-described arousing device that maintains the state lower than Torr.

<Structure 8> After depressurizing the inside of the irradiation container,
8. The ultraviolet irradiation apparatus according to the seventh aspect, further comprising the above-described evacuation device that injects oxygen gas having a partial pressure lower than 200 Torr into the irradiation container.

<Structure 9> A transparent body disposed on the side of the ultraviolet irradiation lamp and transmitting the ultraviolet rays emitted from the ultraviolet irradiation lamp, and a support for supporting the object, the transparent body and the support Forming a closed space for surrounding and storing the object in the protective container, and including the irradiation container configured as a separate body that can separate the support and the transparent body. The ultraviolet irradiation device according to claim 1.

<Structure 10> An object storing step of storing an object to be processed by irradiation with ultraviolet rays in an irradiation container, and a pressure reducing step inside the protective container for reducing the pressure inside the protective container storing the irradiation container. An oxygen gas injection step of injecting a predetermined amount of oxygen gas after depressurizing the inside of the irradiation container, and an irradiation step of irradiating the object with a predetermined amount of ultraviolet rays, wherein the oxygen gas injection step and the irradiation step An ultraviolet irradiation method characterized by being repeated alternately a plurality of times.

[0017]

DESCRIPTION OF THE PREFERRED EMBODIMENTS Embodiments of the present invention will be described below using specific examples. FIG. 1 is a perspective view of the basic components of the present invention. FIG. 2 is a front sectional view (A of FIG. 1) of the present invention.
-A cross section).

1 and 2, the ultraviolet irradiation apparatus of the present invention comprises an ultraviolet irradiation lamp 1, an object 2, an irradiation container 3 (a transparent body 3-1 and a support 3-2), a protective container 4, and an atmosphere maintaining. A device (a pressure reducing device in a protective container) 5 and a ventilation device 6 are provided.

The ultraviolet irradiation lamp 1 is an ultraviolet generator such as an excimer lamp. Usually, a cylindrical lamp is used. In the present invention, it is disposed in a vacuum (in a reduced pressure atmosphere) or in an inert gas (usually nitrogen gas) atmosphere.

Contaminants (mainly organic substances) remaining on the surface of the object 2 to be described later are excited by the irradiation of the ultraviolet light generated by the ultraviolet irradiation lamp 1, and easily ionized (ionized). At the same time, the surrounding oxygen gas is also excited and partially converted into unstable ozone gas. The ozone gas and the excited contaminants combine to generate an oxidizing gas.

The object 2 is a work to be processed by being irradiated with ultraviolet rays emitted from the ultraviolet irradiation lamp 1. Examples include a crystal wafer serving as a substrate of a semiconductor integrated circuit, a special glass used as a liquid crystal substrate, or a lens. With the recent development of the electronics industry, the surface may have irregularities.

The irradiation container 3 comprises a transparent body 3-1 and a support 3-
2 and a target 2 in a protective container 4 described later.
This is a part that forms a closed space that surrounds and accommodates. The transparent body 3-1 is a special glass plate which is disposed on the ultraviolet irradiation lamp 1 side and transmits ultraviolet light.

The support 3-2 is a portion for holding the object 2. The support 3-2 is configured separately from the transparent body 3-1 so as to be separable, and when the support 3-2 is separated from the transparent body 3-1, the object 2 held therein is separated. It is exchanged for a new object 2.

The air pressure in the closed space is reduced to a level lower than 15 Torr by a ventilator 6 described later. By doing so, the attenuation of ultraviolet rays in the closed space is suppressed. As a result, as will be described later in detail with reference to the drawings, it is possible to prevent the occurrence of cleaning unevenness (in some cases, surface modification unevenness) due to the unevenness of the surface of the object 2.
Oxygen gas at a partial pressure of less than 200 Torr may be injected to promote the generation of ozone gas which helps to decompose contaminants.

The protective container 4 is a part for holding the ultraviolet irradiation lamp 1 and the irradiation container 3 inside. Conventionally, this portion has been maintained in an inert gas (usually nitrogen gas) atmosphere by an atmosphere maintaining device 5 described later. The reason why the inert gas atmosphere is maintained is to suppress generation of ozone gas around the ultraviolet irradiation lamp 1. However, generation of ozone gas can be suppressed even if the inside of the protective container 4 is maintained in a reduced-pressure (vacuum) atmosphere.

In addition, the inside of the protective container 4 is depressurized (vacuum).
When the atmosphere is maintained, the attenuation of ultraviolet rays can be made much smaller than in the case where nitrogen gas is present. According to the experiment, the attenuation could be reduced to a fraction by reducing the pressure inside the protective container to a level lower than 300 Torr. A practical damping atmosphere is desirably lower than 15 Torr.

In such a state, it has been experimentally proved that there is no difference in the amount of ultraviolet light attenuation due to the unevenness on the surface of the object 2 as compared with the case where the object 2 is filled with nitrogen. On the other hand, if the pressure is reduced too much, the container is required to have more strength than necessary. Further, the difference between the pressure and the internal pressure of the irradiation container 3 for accommodating the target object 2 becomes large, and the strength of the transparent body becomes insufficient. From this, the lowest pressure is inevitably determined.

Atmosphere maintaining device (pressure reducing device in protective container) 5
Is a part for maintaining the inside of the protective container 4 in a reduced pressure atmosphere or an inert gas atmosphere as described above. Usually, it comprises a rotary pump and an on-off valve. As an example, in order to maintain a reduced-pressure atmosphere, the air inside the protection container 4 is exhausted by a rotary pump. or,
In order to maintain the atmosphere of the inert gas, the pressure is reduced, and then the inert gas is directly injected from the gas cylinder via the opening / closing valve.

The ventilator 6 is a part for ventilating the inside of the irradiation container 3 based on predetermined conditions. Usually, it comprises a rotary pump and an on-off valve. As an example, the inside of the irradiation container 3 is depressurized by a rotary pump. Thereby, the attenuation of the ultraviolet rays irradiated to the inside of the irradiation container 3 is suppressed.

In some cases, ozone gas is required to decompose organic substances to generate an oxidizing gas. Therefore, a minimum amount of oxygen gas required for generation of the ozone gas is injected from the gas cylinder into the irradiation container 3 via the opening / closing valve.

With reference to the drawings, a detailed description will be given of what functions the above-described configuration performs and what effects are brought about. FIG. 3 is a diagram illustrating a change in the attenuation coefficient with respect to the light wavelength. (A) is a figure showing the change of the attenuation coefficient in nitrogen gas atmosphere. (B) is a diagram showing a change in a damping coefficient in a reduced-pressure atmosphere.

In both figures, the horizontal axis represents the wavelength (nm) of the irradiation light, and the vertical axis represents the attenuation coefficient (-db / m).
As shown in (a) and (b), the light wavelength λb of the ultraviolet irradiation lamp (FIG. 2) is used in both the nitrogen gas atmosphere and the reduced pressure atmosphere.
(At around 180 nm), the attenuation coefficient shows the maximum value.
Further, it can be seen that the attenuation coefficient αo in the reduced pressure atmosphere is overwhelmingly smaller than the attenuation coefficient αn in the nitrogen gas atmosphere. The value of the damping coefficient αo is infinitely reduced to 0 db by increasing the degree of vacuum in a reduced-pressure atmosphere (state without damping).
Can be approximated. Further, in a nitrogen gas atmosphere, ultraviolet rays are absorbed by the nitrogen gas and the attenuation coefficient αn
(−db / m) increases, and as a result, the illuminance decreases.

The upper limit of the degree of vacuum is set from a compromise with the mechanical strength of the ultraviolet irradiation lamp (FIG. 2), the protective container 4 (FIG. 2) and the like against the reduced pressure. That is, as the degree of vacuum is increased (as the value of Torr is decreased), the attenuation coefficient αn (−db / m) is decreased, whereas the mechanical strength required for the protective container 4 (FIG. 2) and the like is reduced. This is because the strength increases steadily. Usually, it is set so that it can operate safely even in a state lower than 15 Torr. As a result, the ultraviolet light emitted from the ultraviolet irradiation lamp 1 (FIG. 2) is applied to the object 2 (FIG. 2) without attenuation.

FIG. 4 is a diagram showing the relationship between light intensity and distance. From the figure, the illuminance Q1 at a point P1 at a distance R from the ultraviolet irradiation lamp 1 is Q1 = A (α) / R...
··· (1) Further, when the reflecting mirror 20 is attached to the ultraviolet irradiation lamp 1, the illuminance Q2 at a point P2 away from the ultraviolet irradiation lamp 1 at a distance R is Q2 = A (α, β) / R ·
... (2)

FIG. 5 is a graph showing the relationship between the magnitude of the attenuation coefficient, the variation in distance, and the change in illuminance. The horizontal axis represents the distance R from the ultraviolet irradiation lamp, and the vertical axis represents the illuminance Q. The curve on the diagram represents A (α, β) in the above equation (2) as a parameter.
(0), A (1), A (2)... Respectively represent curves. Note that A
(Α, β) is a function of the attenuation coefficient α (−db / m) in FIG. 3, and the larger the value of α, the larger the value. That is,
In a reduced pressure atmosphere, A (α, β) increases.

Now, suppose that the illuminance required to clean (in some cases, modify the surface) the object 2 (FIG. 2) is Q2.
(Point Q2 on the Y axis in the figure), A in equation (2)
When (α, β) is A (α, β) = A0, it is necessary to place the object 2 (FIG. 2) at the point A on the curve A0, that is, at a position r0 away from the ultraviolet irradiation lamp. Also, A in equation (2)
When (α, β) is A (α, β) = A1, it is necessary to place the object 2 (FIG. 2) at the point B on the curve A1, that is, at a position r1 away from the ultraviolet irradiation lamp. Furthermore, A in equation (2)
When (α, β) is A (α, β) = A2, it is necessary to place the object 2 (FIG. 2) at a point C on the curve A2, that is, at a position r2 away from the ultraviolet irradiation lamp.

Next, the amount of change in the illuminance due to the variation in the distance between the points A, B and C will be described. Assuming now that the point A is changed by Δr0 around the point r0, the illuminance changes by Δq0 from the figure. Further, if the point B is changed by Δr1 around r1, the illuminance is Δq1
It can be seen that it changes. Further, if the point C is changed by Δr2 around r2, it can be seen from the figure that the illuminance changes by Δq2. Here, from the figure, Δq2 = Δq1 = Δq0
Then, it can be seen that Δr0>Δr1> Δr2. That is, it can be seen that as A (α, β) increases and the curve in FIG. 5 rises, the amount of change in the illuminance with respect to the change in the irradiation position decreases.

The following can be understood from the above description. The smaller the attenuation coefficient α (FIGS. 3 and 4) (the lower the pressure) (2)
A (α, β) in the equation increases, and the curve in FIG. 5 changes in the direction of A0. Also, the larger the damping coefficient α (FIGS. 3 and 4), the smaller A (α, β) in the equation (2), and the curve in FIG.
Transition to the direction of 2.

Accordingly, the distance R for obtaining the illuminance of Q2 on the object 2 (FIG. 2) using the same ultraviolet irradiation lamp 1 (FIG. 2) is expressed by A (α, β) in the equation (2). The larger, the larger. Further, the variation Δr in the distance allowed to obtain the illuminance of Q2 increases as A (α, β) increases.

That is, by reducing the atmosphere around the ultraviolet irradiation lamp 1 (FIG. 2), the distance to the object 2 (FIG. 2) is set to be large even if the same ultraviolet irradiation lamp 1 (FIG. 2) is used. As a result, it is possible to reduce the amount of change (Δq) in illuminance due to the variation in distance. As a result, even if the surface of the object 2 (FIG. 2) has irregularities, unevenness in cleaning (in some cases, unevenness in surface modification) is less likely to occur.

The above description will be proved using mathematical expressions. FIG.
The illuminance Q at a point farther from the ultraviolet irradiation lamp 1 provided with a reflecting mirror is represented by the following equation. Q = A (α, β) / r (3) Equation (3) is differentiated by r. DQ / dr = −A (α, β) / r ^2. (4) Equation r is obtained from Equation (3), and r in Equation (4) is eliminated. DQ / dr = −Q ² / A (α, β) Equation (5) Equation (5) indicates that Q Is constant, the rate of change dQ / dr of the illuminance Q due to the change in the distance r is inversely proportional to the magnitude of A (α, β). That is, it means that the larger the A (α, β), the smaller the amount of change in the illuminance Q due to the variation in the distance r. This proves that the result described with reference to FIG. 5 is correct.

An embodiment that effectively utilizes the principle described above will be described. FIG. 6 is a front sectional view of another embodiment. The difference from FIG. 2 is only the shape of the object 21. That is, the object 2 shown in FIG. 2 is a flat plate, but here, a step is provided in the thickness of the object 21.

For example, in the case of a substrate of a liquid crystal display device, the surface of the substrate may be etched using hydrogen fluoride or the like. In such a conventional ultraviolet irradiation apparatus, in such a case, a step on the surface of the substrate may immediately lead to unevenness in cleaning (in some cases, unevenness in surface modification). However, in the ultraviolet irradiation apparatus according to the present invention, even in such a case, cleaning unevenness (in some cases, surface modification unevenness) is less likely to occur. In the same manner, the present invention is not limited to the case where the target is made a step, and is also suitable for a case where a lens or the like is cleaned.

The above description is more effectively applied to the case where the pressure inside the protective container 4 (FIG. 2) is reduced, but the present invention is not limited to this example. That is, the present invention is also applicable to a case where the inside of the protective container 4 (FIG. 2) is set to a nitrogen gas atmosphere. In this case, the pressure in the irradiation container 3 (3-1, 3-2) is reduced to reduce the decrease in the illuminance in the irradiation container 3 (3-1, 3-2). As a result, when the object 2 (FIG. 2) is a lens or the like, there is no cleaning unevenness (in some cases, surface modification unevenness) between the thick and thin portions.

Next, the operational effects when using the ultraviolet irradiation apparatus according to the present invention will be described. FIG. 7 is an explanatory diagram of the operation of the present invention. FIG. 7 shows a state when the object 2 is replaced in FIG. After the cleaning of the object 2 is completed, the on-off valve of the atmosphere maintaining device 5 is opened, and the inside of the protective container 4 is returned to the atmospheric pressure. At the same time, the on-off valve of the ventilator 6 is also opened, and the inside of the closed space formed by the transparent body 3-1 and the support 3-2 is returned to the atmospheric pressure.

Next, the support 3-2 descends and the object 2
Is held only by the protruding pin 32. At the same time, the front lid (not shown) of the protective container 4 is opened. At this time, the object exchange arm 31 is inserted into the protection container from below the object 2 from outside the ultraviolet irradiation device. The object exchange arm 31 returns to the outside of the ultraviolet irradiation device so as to support the object 2. However, it is also possible to preserve the inside of the protective container 4 with the pressure reduced without taking out the object 2 after the cleaning operation. In this case, the same effect as in vacuum storage can be obtained.

It is also necessary to remove the transparent body 3-1 relatively frequently to remove contaminants. Therefore, if the ultraviolet irradiation lamp 1 is disposed close to the transparent body 3-1, the work is difficult, and sometimes the ultraviolet irradiation lamp 1 is damaged. As described above, in the ultraviolet irradiation apparatus according to the present invention, the distance between the ultraviolet irradiation lamp 1 and the object 2 can be set relatively large, so that the operation is not hindered.

Furthermore, in the present invention, the atmosphere inside the irradiation container 3 (FIG. 2) and the atmosphere inside the protection container 4 (FIG. 2) can be set separately, so that it is impossible with the conventional apparatus as shown below. Operation can be performed, and an extremely excellent effect can be obtained. Returning to FIG. 2 for such an operation, two application examples will be described.

First Application Example After the object 2 is stored in the irradiation container 3, the atmosphere inside the protection container 4 is maintained at a predetermined reduced pressure using the atmosphere maintaining device 5. At the same time, the inside of the irradiation container 3 is brought into a predetermined reduced pressure state using the ventilation device 6, and then a predetermined partial pressure of oxygen gas is injected. In this state, a predetermined amount of ultraviolet rays is irradiated. Thereafter, unnecessary gas generated inside the irradiation container 3 is exhausted using the ventilation device 6 while maintaining the inside of the protection container 4 at a predetermined reduced pressure state.

Thereafter, oxygen gas of a predetermined partial pressure is injected again, and a predetermined amount of ultraviolet rays is irradiated. The above operation is repeated several times. Of course, the operation of exhausting the unnecessary gas inside the irradiation container 3 and injecting the oxygen gas at a predetermined partial pressure again may be repeated while the ultraviolet irradiation is continued. As a result, an extremely excellent cleaning effect (a surface modification effect depending on the application) can be obtained.

Second Application Example A case where the present invention is applied to the formation of an optical thin film or the like will be described. Here, as an example, a case will be described in which an optical filter is obtained by laminating an optical thin film on the object 2 in multiple layers.
After storing the target object 2 inside the irradiation container 3, the atmosphere inside the protection container 4 is maintained at a predetermined reduced pressure state using the atmosphere maintaining device 5.

At the same time, after the inside of the irradiation container 3 is brought into a predetermined reduced pressure state using the ventilation device 6, a predetermined amount of titanium tetraisopox seed gas is injected. In this state, a predetermined amount of ultraviolet rays is irradiated. After that, the irradiation container 3 is
The remaining titanium tetraisopox seed gas is exhausted. Thereafter, a predetermined amount of tetramethoxysilane gas is injected. In this state, a predetermined amount of ultraviolet rays is irradiated. After irradiation,
The ventilator 6 is used to exhaust the tetramethoxysilane gas remaining inside the irradiation container 3. By repeating the above cycle as many times as necessary, an optical filter can be obtained by laminating optical thin films in multiple layers.

[Brief description of the drawings]

FIG. 1 is a perspective view of a basic component of the present invention.

FIG. 2 is a front sectional view (AA section of FIG. 1) of the present invention.

FIG. 3 is a diagram illustrating a change in an attenuation coefficient with respect to a light wavelength.

FIG. 4 is a relationship diagram between light intensity and distance.

FIG. 5 is a diagram illustrating a relationship between a magnitude of an attenuation coefficient, a variation in distance, and a change in illuminance.

FIG. 6 is a front sectional view of another embodiment.

FIG. 7 is a diagram illustrating the operation of the present invention.

[Explanation of symbols]

 DESCRIPTION OF SYMBOLS 1 Ultraviolet irradiation lamp 2 Object 3-1 Transparent body 3-2 Support (3-1, 3-2) Irradiation container 4 Protective container 5 Atmosphere maintenance device 6 Ventilation device

[Procedure amendment]

[Submission date] May 25, 2001 (2001.5.2)
5)

[Procedure amendment 1]

[Document name to be amended] Drawing

[Correction target item name] Figure 2

[Correction method] Change

[Correction contents]

FIG. 2

──────────────────────────────────────────────────続 き Continued on the front page (51) Int.Cl. ⁷ Identification symbol FI theme coat ゛ (Reference) H01L 21/304 645 H01L 21/304 645D 645Z 648 648L 21/3065 21/68 N 21/68 21/302 N F term (reference) 3B116 AA03 AB01 BC01 CD11 4G075 AA30 AA61 AA62 BA05 BA06 BD14 CA05 CA33 CA62 CA63 DA02 5F004 AA14 BA19 BB04 BC02 CA02 DA26 5F031 CA02 CA05 HA33 HA58 MA21 MA23 NA01 NA07

Claims (10)

[Claims] 1. An ultraviolet irradiation lamp, an irradiation container for storing an object to be processed by receiving irradiation of ultraviolet light emitted from the ultraviolet irradiation lamp, and a protection container for holding the ultraviolet irradiation lamp and the irradiation container therein. An ultraviolet irradiation device, comprising: a pressure reducing device in the protection container that maintains the inside of the protection container in a reduced pressure state; and a ventilation device that ventilates the inside of the irradiation container based on predetermined conditions. 2. The ventilation device according to claim 1, further comprising a ventilator for maintaining a reduced pressure inside the irradiation container and injecting a predetermined amount of oxygen gas into the reduced irradiation container. UV irradiation equipment. 3. The pressure inside the protective container is 15 Torr.
The ultraviolet irradiation device according to claim 1, further comprising the pressure reducing device in the protection container that maintains the pressure at a lower level. 4. The pressure inside the irradiation container is set to 15 Torr.
The ultraviolet irradiation device according to claim 1, further comprising the arousing device that keeps the state lower than the above. 5. The stimulating device according to claim 4, further comprising the step of injecting oxygen gas having a partial pressure lower than 200 Torr into the irradiation container after depressurizing the inside of the irradiation container.
3. The ultraviolet irradiation device according to claim 1. 6. An ultraviolet irradiation lamp disposed in an inert gas atmosphere, an irradiation container for storing an object to be processed by receiving irradiation of ultraviolet light emitted from the ultraviolet irradiation lamp, the ultraviolet irradiation lamp and the irradiation An ultraviolet irradiation device, comprising: a protection container that holds a container therein; and a ventilation device that maintains the inside of the irradiation container in a reduced pressure state. 7. The pressure inside the irradiation container is set to 15 Torr.
The ultraviolet irradiating apparatus according to claim 6, further comprising the stimulating device that maintains the lower state. 8. The pumping device according to claim 7, further comprising the step of injecting oxygen gas having a partial pressure lower than 200 Torr into the irradiation container after depressurizing the inside of the irradiation container.
3. The ultraviolet irradiation device according to claim 1. 9. A transparent body disposed on the side of the ultraviolet irradiation lamp and transmitting the ultraviolet rays emitted from the ultraviolet irradiation lamp, and a support for supporting the object, wherein the protection is performed by the transparent body and the support. The irradiation container which forms a closed space which surrounds and stores the object in a container, and is provided with the support body and the transparent body, which are separate and separable. The ultraviolet irradiation device according to claim 1. 10. An object storage step of storing an object to be processed by being irradiated with ultraviolet rays in an irradiation container, a pressure reduction step inside the protection container for reducing the pressure inside the protection container storing the irradiation container, An oxygen gas injection step of injecting a predetermined amount of oxygen gas after depressurizing the inside of the irradiation container, and an irradiation step of irradiating a predetermined amount of ultraviolet rays to the object, wherein the oxygen gas injection step and the irradiation step are alternately performed. An ultraviolet irradiation method characterized by repeating a plurality of times.