JP2002341330A - Liquid crystal display device and manufacturing method for liquid crystal display device - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a liquid crystal display device low in cost, high in manufacturing yield and excellent in display quality, and to provide a manufacturing method for the liquid crystal display device. SOLUTION: The liquid crystal display device of normally black mode is provided with a liquid crystal display panel 10 wherein a liquid crystal composition 300 is interposed between a pair of substrates 100 and 200. The array substrate 100 is provided with color filter layers 24 (R, G, B) disposed at every pixel in a display area 102 for displaying an image and a light shielding layer SP formed by using the same material with the material of the color filter layer of a prescribed color disposed in the display area 102 in a light shielding area 41 disposed along the outer periphery of the display area 102.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a liquid crystal display device and a method of manufacturing the liquid crystal display device, and more particularly to a normally black mode color liquid crystal display device in which a black display state is obtained when no voltage is applied. It relates to a manufacturing method.

[0002]

2. Description of the Related Art A liquid crystal display device generally used at present has a structure in which a liquid crystal layer is sandwiched between two glass substrates having electrodes. These two substrates are fixed around the periphery thereof by an adhesive applied except for a liquid crystal sealing opening. The liquid crystal sealing port is sealed with a sealing agent. A spacer is arranged between these two substrates, and the gap between the substrates is kept constant.

[0003] Among them, a liquid crystal display device for color display is as follows.
A color filter layer composed of red (R), green (G), and blue (B) coloring layers is provided for each pixel of one of the two glass substrates.

For example, in a color liquid crystal display device driven by a simple matrix, a Y substrate having Y electrodes patterned in a band in the horizontal (Y) direction and an X electrode patterned in a band in the vertical (X) direction are provided below. An X substrate having a colored layer is disposed so that the Y electrode and the X electrode face each other so as to be substantially orthogonal to each other, and a liquid crystal composition is sandwiched between them.

In a color liquid crystal display device driven by an active matrix, for example, a thin film transistor (T) using amorphous silicon (a-Si) as a semiconductor layer is used.
FT), an array substrate provided with pixel electrodes and the like connected to the TFTs, a counter electrode disposed opposite the array substrate, and a counter substrate provided with a color filter layer and the like. By sandwiching a liquid crystal composition between the substrates.

[0006] In these liquid crystal display devices, a light-shielding layer is provided in a light-shielding area around a display area for displaying an image. This light shielding layer is often provided on a substrate provided with a color filter layer. In particular, by providing both the color filter layer and the light shielding layer on the array substrate, the aperture ratio of the pixel portion can be improved, and a liquid crystal display device with high transmittance can be obtained.

As described above, in the configuration in which the color filter layer and the light shielding layer are provided on the same substrate, the black resist is processed by the photolithography process to form the light shielding layer.

[0008]

However, since a process for processing the black resist is required, there arises a problem that the lead time becomes long.

Further, when an attempt is made to pattern a black resist by a photolithography process, light does not reach the deep portion of the black resist in an exposure process for curing the black resist, and the photopolymerization reaction tends to be insufficient. In addition, there is a possibility that the yield may be reduced due to processing defects.

As described above, in the light-shielding structure using the black resist, there are problems that the manufacturing cost is increased and the manufacturing yield is reduced.

SUMMARY OF THE INVENTION The present invention has been made in view of the above-described problems, and has as its object to provide a liquid crystal display device which is inexpensive, has a high production yield, and has excellent display quality, and a method of manufacturing this liquid crystal display device. Is to do.

[0012]

In order to solve the above-mentioned problems and to achieve the object, a liquid crystal composition is sandwiched between a pair of substrates, and a black display state is obtained when no voltage is applied. In a normally black mode liquid crystal display device,
In one of the pair of substrates, in a display region for displaying an image, at least one color filter layer disposed for each pixel, and in a light shielding region disposed along an outer periphery of the display region, And a light-shielding layer formed of the same material as the color filter layer of a predetermined color disposed in a display area.

According to a seventh aspect of the present invention, there is provided a method of manufacturing a normally black mode liquid crystal display device in which a liquid crystal composition is sandwiched between a pair of substrates and a black display state is obtained when no voltage is applied. A display area for displaying an image of one of the substrates, and a light-shielding area arranged along the outer periphery of the display area, and a step of simultaneously forming a color filter layer and a light-shielding layer of a predetermined color. Features.

[0014]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, an embodiment of a liquid crystal display device of the present invention and a method of manufacturing the liquid crystal display device will be described with reference to the drawings.

A liquid crystal display device of the present invention, for example, an active matrix type liquid crystal display device has a liquid crystal display panel 10.

That is, as shown in FIGS. 1 and 2, the liquid crystal display panel 10 includes an array substrate 100, an opposing substrate 200 disposed opposite to the array substrate 100, and an intervening substrate between the array substrate 100 and the opposing substrate 200. And a liquid crystal composition 300 disposed in the liquid crystal display. In such a liquid crystal display panel 10, a display area 102 for displaying an image is formed in an area surrounded by an outer edge seal member 106 for bonding the array substrate 100 and the counter substrate 200. A peripheral region 104 arranged along the outer periphery of the display region 102 is formed in a region outside the outer edge seal member 106 and has a light-shielding region formed in a frame shape.

In the display area 102, the array substrate 10
0 is m arranged in a matrix as shown in FIG.
xn pixel electrodes 151, m scanning lines Y1 to Ym formed along the row direction of these pixel electrodes 151, and n signal lines X1 to Xn formed along the column direction of these pixel electrodes 151 , And m × n pixel electrodes 151, and m × n thin film transistors, ie, pixel TFTs 121, arranged as switching elements near intersections of the scanning lines Y1 to Ym and the signal lines X1 to Xn.

In the peripheral region 104, the array substrate 100 includes a scanning line driving circuit 18 for driving the scanning lines Y1 to Ym and a signal line driving circuit 1 for driving the signal lines X1 to Xn.
9 and the like.

As shown in FIG. 2, the liquid crystal capacitance CL is formed by the pixel electrode 151, the counter electrode 204, and the liquid crystal layer 300 sandwiched between these electrodes. The auxiliary capacitance Cs is formed electrically in parallel with the liquid crystal capacitance CL. The auxiliary capacitance Cs is formed by a pair of electrodes disposed opposite each other via an insulating film, that is, an auxiliary capacitance electrode 61 having the same potential as the pixel electrode 151 and an auxiliary capacitance line 52 set to a predetermined potential. .

As shown in FIG. 3, the liquid crystal display device comprises a liquid crystal composition 30 between an array substrate 100 and a counter substrate 200.
The liquid crystal display panel 10 includes a transmissive liquid crystal display panel 10 holding a zero, and a backlight unit 400 functioning as a lighting unit for illuminating the liquid crystal display panel 10 from the back.

Array substrate 100 of liquid crystal display panel 10
In the display area 102, a switching element formed corresponding to a plurality of pixels arranged in a matrix on the transparent insulating substrate 11 such as a glass substrate, that is, a display area 102 including a pixel TFT 121 and a pixel TFT 121. Color filter layer 24 formed to cover
(R, G, B), the pixel electrodes 151 arranged for each pixel on the color filter layer 24, the plurality of columnar spacers 31 formed on the color filter layer 24, and the plurality of pixel electrodes 151 so as to cover the whole. It has the formed orientation film 13A. In addition, the array substrate 100 is
1 includes a light shielding layer SP surrounding the outer periphery of the display area 102 and disposed in the light shielding area 41 of the transparent substrate 11.

The color filter layer 24 has a thickness of, for example, about 3.0.
It has a thickness of μm, is colored green (G), blue (B), and red (R), and is arranged for each pixel. The color filter layers 24 are formed of three colored resin layers that transmit light of each color component of green, blue, and red, respectively.

The pixel electrode 151 is formed of ITO (Indium Tin Oxide) formed on the color filter layers 24G, 24B, and 24R assigned to them.
And the like, and are connected to the pixel TFTs 121 through through holes 26 penetrating these color filter layers 24.

Each pixel TFT 121 is connected to a scanning line formed along a row of the pixel electrodes 151 and a signal line formed along a column of the pixel electrodes 151. A voltage is applied to the pixel electrode.

As shown in FIG. 4 in more detail, the array substrate 100 includes scanning lines Y formed along the rows of the pixel electrodes 151 and signal lines X formed along the columns of the pixel electrodes 151. And a pixel TFT 121 disposed near the intersection of the scanning line Y and the signal line X corresponding to the pixel electrode 151.

Further, the array substrate 100 includes a liquid crystal capacitor C
A storage capacitor electrode 61 having the same potential as the pixel electrode 151 disposed opposite to the pixel electrode 151 via the gate insulating film 62 to form a storage capacitor CS electrically parallel to L, and a storage capacitor line 52 set to a predetermined potential And

The signal line X is disposed so as to be substantially perpendicular to the scanning line Y and the auxiliary capacitance line 52 via the interlayer insulating film 76. The auxiliary capacitance line 52 is formed of the same material in the same layer as the scanning line Y, and is formed substantially parallel to the scanning line Y. A part of the auxiliary capacitance line 52 is arranged to face the auxiliary capacitance electrode 61 via the gate insulating film 62. This auxiliary capacitance electrode 61 is formed of an impurity-doped polysilicon film.

The wiring portions such as the signal lines X, the scanning lines Y, and the auxiliary capacitance lines 52 are formed of a light-shielding low-resistance material such as aluminum or molybdenum-tungsten. In this embodiment, the scanning lines Y and the auxiliary capacitance lines 52 are formed of molybdenum-tungsten, and the signal lines X are mainly formed of aluminum.

The pixel TFT 121 includes a semiconductor layer 11 formed of the same polysilicon film as the auxiliary capacitance electrode 61.
Two. The semiconductor layer 112 is formed on the glass substrate 1
The drain region 112 is formed on the undercoating layer 60 disposed on the first region 1 by doping impurities on both sides of the channel region 112C.
D and a source region 112S. This pixel TF
T121 corresponds to the semiconductor layer 112 via the gate insulating film 62.
Gate electrode 63 integrated with scanning line Y disposed opposite to
It has.

The drain electrode 88 of the pixel TFT 121 is
It is formed integrally with the signal line X, and is formed by being electrically connected to the drain region 112D of the semiconductor layer 112 through a contact hole 77 penetrating the gate insulating film 62 and the interlayer insulating film 76. The source electrode 89 of the pixel TFT 121 includes the gate insulating film 62 and the interlayer insulating film 7.
6 through a contact hole 78 penetrating through the semiconductor layer 1.
It is formed by being electrically connected to the twelve source regions 112S.

On the interlayer insulating film 76 of the array substrate 100, red (R), green (G), blue (B)
Color filter layers 24 (R, G,
B) is provided. Then, the color filter layer 24
A pixel electrode 151 is provided above. Pixel electrode 1
Reference numeral 51 is electrically connected to the source electrode 89 of the pixel TFT 121 via the through hole 26.

The auxiliary capacitance electrode 61 is electrically connected to a contact electrode 80 formed of the same material as the signal line X via a contact hole 79 penetrating the gate insulating film 62 and the interlayer insulating film 76. Pixel electrode 151
Are electrically connected to a contact electrode 80 via a contact hole 81 penetrating the color filter layer 24. Thereby, the source electrode 8 of the pixel TFT 121 is
9, the pixel electrode 30, and the auxiliary capacitance electrode 61 have the same potential.

As shown in FIG. 3, the light shielding layer SP is formed of a light shielding region 4 provided in a frame shape along the outer periphery of the display region 102.
In No. 1, it is formed of a colored resin in order to block transmission of light. The columnar spacer 31 is formed of a transparent resin. This spacer 31 is about 5 μm
It is formed in the thickness of.

In the display area 40, the columnar spacer 31 is provided with a light-shielding wiring portion (for example, a scanning line or an auxiliary capacitance line formed of a molybdenum-tungsten alloy film, and a signal line formed of aluminum. , Etc.) on each color filter layer 24 (R, G, B).

The alignment film 13 A aligns liquid crystal molecules contained in the liquid crystal composition 300 in a direction substantially perpendicular to the array substrate 100.

The counter substrate 120 has a counter electrode 22 formed on a transparent insulating substrate 21 such as a glass substrate, and an alignment film 13B covering the counter electrode 22.

The counter electrode 22 is formed of a light-transmissive conductive member such as ITO which is disposed so as to face the entire pixel electrode 151 on the array substrate 110 side. Alignment film 13
B aligns the liquid crystal molecules contained in the liquid crystal composition 300 in a direction substantially perpendicular to the counter substrate 200.

Array substrate 1 in liquid crystal display panel 10
A polarizing plate PL1 is provided on the surface of the counter substrate 200, and a polarizing plate PL2 is provided on the surface of the counter substrate 200.

In such a liquid crystal display device, the light emitted from the backlight unit 400 illuminates the liquid crystal display panel 10 from the back side of the array substrate 100. Light that has passed through the polarizing plate PL1 on the array substrate 100 side of the liquid crystal display panel 10 and entered the inside of the liquid crystal display panel 10 is modulated via the liquid crystal composition 300, and
The light is selectively transmitted by the 00-side polarizing plate PL2.

In this liquid crystal display device, a pixel electrode 151 on the array substrate 100 side and a counter electrode 204 on the counter substrate 200 side are used.
In a normally black mode in which no backlight is applied and no backlight is applied when no voltage is applied, a black display state is obtained by applying a voltage between the two electrodes to include the liquid crystal composition 300. By driving liquid crystal molecules,
The backlight light is selectively transmitted from the counter substrate 200 side, and thereby, the display area 102 of the liquid crystal display panel 10 is
The image is displayed on.

In such a normally black mode liquid crystal display device, when a backlight unit that generates high-luminance backlight light is mounted, sufficient light-blocking properties cannot be obtained at a normally black black display level. ing. In particular, the light shielding area 41 around the display area 102
In the case where a sufficient light-shielding property cannot be obtained, a phenomenon of so-called light leakage in which backlight light is transmitted occurs, and display quality is significantly deteriorated.

Therefore, in the normally black mode liquid crystal display device according to this embodiment, the array substrate 10
The light-shielding layer SP is provided in the light-shielding region 41 of 0, and the light-shielding layer SP is formed of the same material as the color filter layer 24 of a predetermined color arranged for each pixel of the display region 102. In this embodiment, the light shielding layer SP is formed of a blue resin of the same material as the blue color filter layer 24B in which the blue pigment is dispersed.

As described above, in addition to the black display in the normally black mode, by forming the light-shielding layer SP with the color filter layer of a color having a relatively low transmittance, that is, the blue color filter layer 24B, the light-shielding region with high light-shielding properties 41
Can be realized.

When the color filter layer is formed on the array substrate 100 as in the embodiment shown in FIG. 3, the light shielding film SP is disposed in the light shielding region 41 in the peripheral region 104 of the array substrate 100. Thus, the display area 102
The wiring portion drawn out from the peripheral region 104 is covered with a light shielding layer SP including the color filter layer 24.

Therefore, the voltage applied from the wiring portion to the liquid crystal composition 300 can be made extremely small, and the liquid crystal molecules contained in the liquid crystal composition 300 can be kept in a state where they are hardly driven. That is, it becomes possible to maintain the liquid crystal molecules of the liquid crystal composition 300 arranged in the light shielding region 41 in a black display state in the normally black mode.

In the above-described embodiment, an example in which the present invention is applied to a normally black mode liquid crystal display device has been described. Among them, the most suitable liquid crystal display mode is a vertical alignment mode liquid crystal display device.

That is, even in the normally black STN mode in which the color is compensated using the optical retardation plate, it is possible to form the light-shielding layer SP having excellent light-shielding properties as in the above-described embodiment. Since the black display in the STN mode is obtained by color compensation using an optical phase difference plate, if the retardation of the optical phase difference plate deviates from the optimum value, the transmittance of the black display increases and the optical density of the light-shielding region slightly decreases. May be.

On the other hand, in the black display in the normally black vertical alignment mode, color compensation is not required, and the optical density obtained by the polarizing plates arranged in a crossed Nicols state can be obtained with almost the same value. For this reason, the display mode of the normally black liquid crystal display device used in combination with the light shielding layer SP formed of a colored color filter layer is preferably a vertical alignment mode.

The required value of the optical density of the light-shielding region 41 (ie, the total optical density at the black display level and the optical density of the light-shielding layer) varies depending on the use conditions, but is required to be 4.0 or more. In this case, the visibility is not impaired.
The present invention is applied to a normally black type liquid crystal display device such as a PS mode or a homogeneous mode to have an optical density of 4.0.
By designing as described above, it is possible to obtain a sufficient light shielding property as in the above-described embodiment.

Further, by simultaneously forming the color filter layers constituting the light-shielding layer SP with the same material as the color filter layers arranged in each pixel in the display area 102, it is possible to reduce the manufacturing cost. Becomes Moreover, as compared with the case where a black resist is used as the light-shielding layer SP, the incidence of processing defects can be significantly reduced, and the production yield can be improved.

Next, a method of manufacturing the above-described liquid crystal display panel 10 will be described.

In the manufacturing process of the array substrate 100, first,
On the glass substrate 11 having a thickness of 0.7 mm, a silicon nitride film and a silicon oxide film are successively formed by the CVD method to form the undercoating layer 60 having a two-layer structure.

Subsequently, an amorphous silicon film is formed on the undercoating layer 60 by a CVD method or the like. Then, the amorphous silicon film is irradiated with an excimer laser beam and is annealed to be polycrystallized. Thereafter, the polycrystallized silicon film, that is, the polysilicon film 112 is patterned by a photolithography process to form the semiconductor layer of the TFT 121 and the auxiliary capacitance electrode 61.

Subsequently, a gate insulating film 62 is formed by forming a silicon oxide film on the entire surface by the CVD method. Subsequently, tantalum (Ta), chromium (Cr), aluminum (Al), molybdenum (Mo), tungsten (W),
A simple substance such as copper (Cu), a laminated film thereof, or an alloy film thereof (in this embodiment, Mo-W
Alloy film), and is patterned into a predetermined shape by a photolithography process. Accordingly, the scanning line Y, the auxiliary capacitance line 52, and the gate electrode 63 integrated with the scanning line Y
And various wirings are formed.

Subsequently, using the gate electrode 63 as a mask,
Impurities are implanted into the polysilicon film 112 by an ion implantation method or an ion doping method. Thereby, the TFT 12
One drain region 112D and one source region 112S are formed. Then, the impurities are activated by annealing the entire substrate.

Subsequently, a silicon oxide film is formed on the entire surface by the CVD method, and an interlayer insulating film 76 is formed.

Subsequently, by a photolithography process,
Through the gate insulating film 62 and the interlayer insulating film 76, the TFT
The contact hole 77 reaching the drain region 112D of 121 and the contact hole 7 reaching the source region 112S
8 and a contact hole 79 reaching the auxiliary capacitance electrode 61
And form

Subsequently, Ta, Cr, Al, Mo, W, and C are formed on the entire surface of the interlayer insulating film 76 by sputtering.
A single film of u or the like, a laminated film thereof, or an alloy film thereof (in this embodiment, a laminated film of Mo—Al) is formed and patterned into a predetermined shape by a photolithography process. Thus, the signal line X is formed, and the drain electrode 88 of the TFT 121 is formed integrally with the signal line X. At the same time, a contact electrode 80 that contacts the source electrode 89 of the TFT 121 and the auxiliary capacitance electrode 61 is formed.

Subsequently, an ultraviolet curable acrylic resin resist in which a red pigment is dispersed is applied to the entire surface of the substrate by a spinner. Then, the resist film is exposed at a wavelength of 365 nm with an exposure amount of 100 mJ / cm ² through a photomask that irradiates light to a portion corresponding to the red pixel. The resist film is developed with a 1% aqueous solution of KOH for 20 seconds, washed with water, and baked. Thus, a red color filter layer 24R is formed.

Subsequently, by repeating the same steps, a green color filter layer 24G made of an ultraviolet-curable acrylic resin resist in which a green pigment is dispersed, and an ultraviolet-curable acrylic resin resist in which a blue pigment is dispersed are formed. The blue color filter layer 24B is formed. In the step of forming the blue color filter layer 24B, the light shielding layer SP is formed in the light shielding region 41 using the same blue resin resist.

That is, after a UV curable acrylic resin resist is applied to the entire surface of the substrate by a spinner, the resist film is applied to a portion corresponding to the blue pixel and the light-shielding region through a photomask such that light is irradiated to 365 nm.
Exposure at a wavelength of 100 mJ / cm ² . The resist film is developed with a 1% aqueous solution of KOH for 20 seconds, washed with water, and baked. Thereby, the blue color filter layer 24B and the light shielding layer SP are formed.

In the step of forming the color filter layer 24, a through hole 26 for contacting the switching element 121 with the pixel electrode 151 is formed at the same time. Further, a contact hole 81 for contacting the pixel electrode 151 and the contact electrode 80 is also formed at the same time.

Subsequently, an ITO film is formed on the color filter layer 24 by a sputtering method, and is patterned into a predetermined pixel pattern by a photolithography process, thereby forming a pixel electrode 151 in contact with the switching element 121.

Subsequently, a photosensitive acrylic transparent resin material is applied on the surface of the substrate to a thickness of about 5 μm by a spinner. After the resin material is dried at 90 ° C. for 10 minutes, it is exposed at a wavelength of 365 nm using a photomask having a predetermined pattern at an exposure amount of 100 mJ / cm ² . Then, the resin material is developed with an aqueous alkaline solution having a pH of 11.5 and baked at 200 ° C. for 60 minutes. Thereby, the columnar spacer 31 having a height of about 4.5 μm is formed.

Subsequently, a vertical alignment film material such as polyimide is applied to the entire surface of the substrate and baked to form an alignment film 13A.

Thus, the array substrate 100 is manufactured.

On the other hand, in the manufacturing process of the opposing substrate 200, first, an ITO film is formed on a glass substrate 21 having a thickness of 0.7 mm by a sputtering method, and the opposing electrode 22 is formed by patterning. And the counter electrode 2
2 is coated with a vertical alignment film material such as polyimide over the entire surface of the transparent substrate 21 and is baked.
Form 3B.

Thus, the opposing substrate 200 is manufactured.

In the manufacturing process of the liquid crystal display panel 10, the outer edge sealing member 106 is printed and applied along the outer edge of the array substrate 100 so as to surround the liquid crystal accommodating space except for the liquid crystal injection port 32. An electrode transfer material for applying a voltage to
Is formed on the electrode transition electrode in the vicinity of. Subsequently, the alignment film 13A of the array substrate 100 and the alignment film 13
The array substrate 100 and the opposing substrate 200 are arranged so that B faces each other, and the two substrates are bonded by heating to cure the outer edge seal member 106. Outer edge seal member 10
Reference numeral 6 denotes a thermosetting epoxy adhesive, for example.

Subsequently, a liquid crystal composition 300 having a negative dielectric anisotropy is injected from the liquid crystal injection port 32, and the liquid crystal injection port 32 is sealed with an injection port sealing member 33 which is a thermosetting epoxy adhesive. I do.

A liquid crystal display panel is manufactured by the above manufacturing method.

The normally black mode color liquid crystal display thus manufactured has a very high cell gap of 4.4 ± 0.2 μm, and an optical density of 4.2 in the light-shielding region. A sufficient black level was obtained.

Further, in the liquid crystal display device according to this embodiment, since the acrylic resin is disposed as the light shielding layer SP on the wiring portion extended to the peripheral region 104,
The electric field applied to the liquid crystal molecules in the light shielding region 41 becomes very weak, and the liquid crystal molecules can be maintained in a black display state.

Therefore, when displaying an image in the display area 102, the pixel electrode 151 and the counter electrode 204
In this case, the optical density of the light-blocking region 41 can be maintained at 4.2 regardless of the display pattern, even when the liquid crystal molecules are driven by applying a voltage between them. For this reason, it is possible to prevent the light leakage phenomenon in the light shielding region 41, and it is possible to improve the display quality.

The present invention is not limited to the above-described embodiment, but can be variously modified. Hereinafter, another embodiment of the present invention will be described.

That is, as shown in FIG. 5, the liquid crystal display device according to this embodiment includes a transmission type liquid crystal display panel 10 having a liquid crystal composition 300 sandwiched between an array substrate 100 and a counter substrate 200, A backlight unit 400 functioning as an illuminating means for illuminating the liquid crystal display panel 10 from behind.

The array substrate 100 of the liquid crystal display panel 10
In the display area 102, a switching element formed corresponding to a plurality of pixels arranged in a matrix on the transparent insulating substrate 11 such as a glass substrate, that is, a display area 102 including a pixel TFT 121 and a pixel TFT 121. Insulating layer 25 formed over the insulating layer, insulating layer 25
The pixel electrode 151 disposed on each pixel, the plurality of columnar spacers 31 formed on the insulating layer 25, and the alignment film 13A formed so as to cover the whole of the plurality of pixel electrodes 151.
It has.

The pixel electrode 151 is formed of a light-transmissive conductive member such as ITO (Indium Tin Oxide) formed on the insulating layer 25 for each pixel, and a through hole 26 penetrating the insulating layer 25 is formed. Each is connected to the pixel TFT 121 via the corresponding TFT.

Each of the pixel TFTs 121 is connected to a scanning line formed along the row of the pixel electrodes 151 and a signal line formed along the column of the pixel electrodes 151, and is turned on by a driving voltage from the scanning line. A voltage is applied to the pixel electrode.

The alignment film 13 A aligns liquid crystal molecules contained in the liquid crystal composition 300 in a direction substantially perpendicular to the array substrate 100.

The counter substrate 120 is formed of a color filter layer 24 assigned to each pixel in the display area 102 on a transparent insulating substrate 21 such as a glass substrate.
(R, G, B). Also, the counter substrate 120
Has a common electrode 22 common to all pixels formed on the color filter layer 24 (R, G, B), and an alignment film 13B covering the common electrode 22. Further, in the peripheral region 104, the counter substrate 200
A light-shielding layer SP is provided around the outer periphery of the transparent substrate 02 and disposed in the light-shielding region 41 of the transparent substrate 12.

The color filter layer 24 has a thickness of, for example, about 3.0.
It has a thickness of μm, is colored green (G), blue (B), and red (R), and is arranged for each pixel. The color filter layers 24 (R, G, B) are formed of three colored resin layers that transmit light of each color component of green, blue, and red, respectively.

The opposing electrode 22 is formed of a light-transmissive conductive member such as ITO which is disposed so as to oppose the entire pixel electrode 151 on the array substrate 110 side. Alignment film 13
B aligns the liquid crystal molecules contained in the liquid crystal composition 300 in a direction substantially perpendicular to the counter substrate 200.

Array substrate 1 in liquid crystal display panel 10
A polarizing plate PL1 is provided on the surface of the counter substrate 200, and a polarizing plate PL2 is provided on the surface of the counter substrate 200.

Such a normally black mode color liquid crystal display device has a cell gap of 4.4 ± 0.5.
The uniformity was as high as 2 μm, and the optical density in the light-shielding area was 4.2, which was a practically sufficient black level.

Comparative Example 1 The liquid crystal display device according to the embodiment described with reference to FIG. 5 is exactly the same as the liquid crystal display device except that the light-shielding layer is formed of an acrylic resin added with a carbon black pigment instead of the blue color filter layer. Then, a liquid crystal display device was manufactured. When this liquid crystal display device was evaluated, light leakage of about 0.5% occurred in the light-shielded region. When the cross section of the light-shielding region was analyzed by disassembling the liquid crystal display device in which light leakage occurred, reverse taper occurred due to insufficient curing of the deep part of the light-shielding layer, and this was lost in the process from cleaning to assembly. all right. In the manufacturing process, since the number of photolithography steps for forming the light shielding layer for one step increased, the manufacturing cost of about 3% corresponding to this one step increased.

As described above, according to the liquid crystal display device of the present invention and the method of manufacturing this liquid crystal display device, in a normally black mode liquid crystal display device in which a black display state is obtained when no voltage is applied, black display and By using a color filter layer of a color having a relatively low transmittance as a light-shielding layer, it is possible to improve the optical density of a frame-shaped light-shielding area along the periphery of the display area, thereby improving display quality. Becomes

According to the present invention, since the light-shielding layer is formed in the same step with the same material as the color filter layer of at least one color disposed in the display area, the number of manufacturing steps can be reduced. Thus, the manufacturing cost can be reduced. Further, the incidence of processing defects can be reduced in the step of forming the light shielding layer, and the production yield can be improved.

In the above embodiment, the light shielding layer S
P is formed by a blue color filter layer, but is formed by a color filter layer of another color (a red color filter layer or a green color filter layer) if it has a light-shielding property that sufficiently satisfies the condition of optical density. May be.

Further, in the above-described embodiment, the columnar spacer 31 is formed of a transparent resin, but may be formed of a black resin.

[0091]

As described above, according to the present invention, it is possible to provide a liquid crystal display device which is inexpensive, has a high production yield, and is excellent in display quality, and a method of manufacturing this liquid crystal display device.

[Brief description of the drawings]

FIG. 1 is a diagram schematically showing a structure of a liquid crystal display panel applied to a liquid crystal display device of the present invention.

FIG. 2 is a circuit block diagram schematically showing a configuration of the liquid crystal display panel shown in FIG.

FIG. 3 is a sectional view schematically showing a structure of a liquid crystal display device according to the embodiment of the present invention.

FIG. 4 is a sectional view schematically showing a structure of an array substrate constituting the liquid crystal display device shown in FIG.

FIG. 5 is a sectional view schematically showing a structure of a liquid crystal display device according to another embodiment of the present invention.

[Explanation of symbols]

 DESCRIPTION OF SYMBOLS 10 ... Liquid crystal display panel 24 (R, G, B) ... Color filter layer 31 ... Columnar spacer 41 ... Light shielding area 100 ... Array substrate 102 ... Display area 104 ... Peripheral area 106 ... Outer edge sealing member 121 ... Switching element 151 ... Pixel electrode 200: Counter substrate 204: Counter electrode 300: Liquid crystal composition SP: Light shielding layer

──────────────────────────────────────────────────続 き Continued on the front page (51) Int.Cl. ⁷ Identification symbol FI Theme coat ゛ (Reference) G09F 9/30 G09F 9/30 349C 9/35 9/35 F-term (Reference) 2H048 BA02 BA11 BA45 BB01 BB03 BB42 2H090 LA01 LA04 LA05 LA15 MA01 2H091 FA02Y FA34Y GA02 GA06 GA11 LA12 LA16 5C094 AA08 AA42 AA43 AA44 AA48 BA03 BA43 BA45 CA19 CA24 DA13 DB01 DB04 EA04 EA05 EA07 EB02 EC03 ED03 ED15 FA01 GB10 JA11

Claims (9)

[Claims] 1. A normally black mode liquid crystal display device in which a liquid crystal composition is sandwiched between a pair of substrates, and is in a black display state when no voltage is applied, wherein one of the pair of substrates is In a display area for displaying an image, at least one color filter layer arranged for each pixel, and in a light-shielding area arranged along an outer periphery of the display area, a color filter layer of a predetermined color arranged in the display area. A liquid crystal display device comprising: a light-shielding layer formed of the same material as a color filter layer. 2. The color filter layer and the light shielding layer,
The liquid crystal display device according to claim 1, wherein the liquid crystal display device is a blue resin. 3. The one substrate includes a scanning line arranged in a row direction, a signal line arranged in a column direction, and a switching element arranged near an intersection of the scanning line and the signal line. 2. The liquid crystal display device according to claim 1, further comprising: a pixel electrode connected to the switching element and formed in a matrix. 4. The liquid crystal display device according to claim 1, wherein said one substrate has a common electrode common to all pixels. 5. The liquid crystal display device according to claim 1, wherein the liquid crystal molecules contained in the liquid crystal composition are aligned substantially perpendicular to the one substrate. 6. The liquid crystal display device according to claim 1, wherein the optical density of the light shielding layer has a value of 4.0 or more. 7. A method of manufacturing a normally black mode liquid crystal display device, wherein a liquid crystal composition is sandwiched between a pair of substrates and a black display state is obtained when no voltage is applied, the method comprising: A step of simultaneously forming a color filter layer and a light-shielding layer of a predetermined color in a display area for displaying an image of the substrate and a light-shielding area arranged along the outer periphery of the display area. A method for manufacturing a liquid crystal display device. 8. The color filter layer and the light shielding layer,
8. The method according to claim 7, wherein the resin is a blue resin. 9. A step of forming a scanning line arranged in a row direction on the one substrate, a step of forming a signal line arranged in a column direction, and an intersection of the scanning line and the signal line. The method for manufacturing a liquid crystal display device according to claim 7, further comprising: a step of forming a switching element near a portion; and a step of forming a pixel electrode connected to the switching element.