JP2002338823A - Heat-resistant film for substrate and printed wiring board obtained using the same - Google Patents

Heat-resistant film for substrate and printed wiring board obtained using the same

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Publication number
JP2002338823A
JP2002338823A JP2001150483A JP2001150483A JP2002338823A JP 2002338823 A JP2002338823 A JP 2002338823A JP 2001150483 A JP2001150483 A JP 2001150483A JP 2001150483 A JP2001150483 A JP 2001150483A JP 2002338823 A JP2002338823 A JP 2002338823A
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JP
Japan
Prior art keywords
weight
film
heat
inorganic filler
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2001150483A
Other languages
Japanese (ja)
Other versions
JP3955188B2 (en
Inventor
Shingetsu Yamada
紳月 山田
Koichiro Taniguchi
浩一郎 谷口
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Plastics Inc
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Mitsubishi Plastics Inc
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Publication date
Application filed by Mitsubishi Plastics Inc filed Critical Mitsubishi Plastics Inc
Priority to JP2001150483A priority Critical patent/JP3955188B2/en
Publication of JP2002338823A publication Critical patent/JP2002338823A/en
Application granted granted Critical
Publication of JP3955188B2 publication Critical patent/JP3955188B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Abstract

PROBLEM TO BE SOLVED: To provide a novel heat-resistant film for a substrate improved in heat resistance, flame retardancy, dimensional stability an low environmental load properties which have been heretofore deemed as drawbacks of a thermoplastic resin composition when used as an insulting material for a printed wiring board, and a printed wiring board obtained using the same. SOLUTION: The heat-resistant film for a substrate is a film comprising 100 pts.wt. of a thermoplastic resin, and incorporated therewith, at least 20 but less than 50 pts.wt. of a scaly inorganic filler, where the scaly inorganic filler has the following characteristics: (1) The 90% average particle size measured by a laser diffraction grain size distribution method is less than 15 μm. (2) The aspect ratio (an average particle size/an average thickness) is at least 35. (3) A decrease in weight measured by the thermobalance method when the temperature is raised from room temperature to 400 deg.C is less than 0.5 wt.%.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、主にプリント配線
基板の絶縁材料として用いられる基板用耐熱フィルムお
よびこれを用いたプリント配線基板に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a heat-resistant film for a substrate mainly used as an insulating material for a printed wiring board and a printed wiring board using the same.

【0002】[0002]

【従来の技術】電子機器の小型化、多機能化は、年々加
速度的に進行している。それを支える主要技術が、半導
体パッケージであり、電子部品を実装したプリント配線
基板である。これに伴いプリント配線基板にも高密度化
とそれに伴なう高性能化が要求されることになり、配線
基板の絶縁材料に関して高度の耐熱性、耐燃性が求めら
れ、また、昨今の環境意識の高まりに対して、低環境負
荷性(リサイクル性、ハロゲン元素の未含有、鉛フリー
半田の使用)の付与も求められている。また、高密度化
に対応するためにガラスクロスを用いない絶縁材料の要
求も極めて高い。これは、ガラスクロスを用いると基板
材料の内部に連続して樹脂/ガラス界面が発生しイオン
マイグレーションが起こり絶縁抵抗の低下を招くためで
ある。このため現状のガラスエポキシ樹脂を用いる場合
は穴間ピッチを350μm以下に小さくすることが出来
ず高密度化への対応は不可能である。また、近未来のプ
リント基板の技術予測によると、半導体パッケージに用
いられるプリント基板は、L/S(導体幅/導体間隔)
が15μm/15μm以下に狭ピッチ化することが予測
されており、従来の銅箔をサブトラクティブ法でエッチ
ングして回路を形成するという方法では対応が難かしく
なり、樹脂シートまたはフィルムの上にめっきやスパッ
タで回路を形成することが主流になると予測されてい
る。
2. Description of the Related Art The miniaturization and multi-functionality of electronic equipment are accelerating year by year. The main technology supporting this is a semiconductor package and a printed wiring board on which electronic components are mounted. As a result, printed wiring boards are also required to have higher densities and accompanying higher performance, and the insulating materials of the wiring boards are required to have high heat resistance and flame resistance. In response to the increase in demand, it is also required to provide low environmental load (recyclability, no halogen element, use of lead-free solder). In addition, there is an extremely high demand for an insulating material that does not use glass cloth in order to cope with high density. This is because when a glass cloth is used, a resin / glass interface is continuously generated inside the substrate material, ion migration occurs, and the insulation resistance is reduced. For this reason, when using the current glass epoxy resin, the pitch between holes cannot be reduced to 350 μm or less, and it is impossible to cope with high density. According to the technology forecast of the printed circuit board in the near future, the printed circuit board used for the semiconductor package is L / S (conductor width / conductor spacing).
It is predicted that the pitch will be reduced to 15 μm / 15 μm or less, and it will be difficult to cope with the conventional method of forming a circuit by etching a copper foil by a subtractive method, and plating on a resin sheet or film will be difficult. It is expected that circuit formation by sputtering or sputtering will become mainstream.

【0003】この場合も狭L/S化を達成するために
は、樹脂シートやフィルムの表面は、表面平滑性が要求
されることとなり、この点でも表面の平滑性に劣るガラ
スクロス入り材料は用いることが出来ない。また、表面
が平滑になる場合は、めっき銅やスパッタ銅の付着強度
の改善も必要となる。従来のプリント配線基板用絶縁材
料は、エポキシ樹脂、フェノール樹脂などの熱硬化性樹
脂と、紙、ガラス繊維などの補強材とを複合せしめて成
形されてなるものが長年広く用いられてきたが、これら
の従来基板は上述した要求にはもはや十分に応えうるも
のではない。また、従来からフレキはシブル基板の用途
にポリイミドが使われているが、リサイクル性や多層化
という点ではやはり十分に要求に応えうるものではな
い。これに対して、従来より、高耐熱性、耐燃性の熱可
塑性樹脂、例えば、ポリフェニレンサルファイド、ポリ
エチレンサルファイド、ポリエーテルイミド、ポリエー
テルエーテルケトンなどに、アスペクト比(平均直径/
平均厚み)が大きいマイカなどの鱗片状の無機充填材を
充填した組成物を、プリント配線基板用の絶縁材料にす
るという考え方が、特開昭61−41542号、特開平
4−348095号、特開平4−356991号、特開
平4−348096号等に記載されているが、上述した
ような高性能化の要求に対しては、従来の技術では、以
下に述べるような問題点が解決されず、全く実用化の域
には達していなかった。
[0003] In this case as well, in order to achieve a narrower L / S, the surface of the resin sheet or film is required to have a surface smoothness. Can not be used. Further, when the surface becomes smooth, it is necessary to improve the adhesion strength of plated copper or sputtered copper. Conventional insulating materials for printed wiring boards have been widely used for many years, formed by combining thermosetting resins such as epoxy resins and phenolic resins with reinforcing materials such as paper and glass fibers. These conventional substrates can no longer adequately meet the above requirements. Conventionally, polyimide has been used as a flexible substrate for a flexible substrate, but it still does not sufficiently meet demands in terms of recyclability and multilayering. On the other hand, conventionally, a high heat-resistant and flame-resistant thermoplastic resin, such as polyphenylene sulfide, polyethylene sulfide, polyetherimide, polyetheretherketone, etc., has an aspect ratio (average diameter /
The idea of using a composition filled with a scale-like inorganic filler such as mica having a large average thickness as an insulating material for a printed wiring board is disclosed in JP-A-61-41542 and JP-A-4-348095. As described in Japanese Unexamined Patent Publication No. Hei 4-356991, Japanese Unexamined Patent Publication No. Hei 4-348096, etc., the conventional technology does not solve the problems described below with respect to the above-described demand for high performance. However, it had not reached the level of practical use at all.

【0004】(a)鉛フリー半田まで想定した部品実装
工程の温度領域(220〜300℃)における剛性の確
保が出来ずに部品を実装した基板が大きくたわむ。 (b)基板材料としての寸法安定性を満足させるために
用いる金属箔と同等の線膨張係数を達成することが出来
ず、高精度の無機充填材の仕様確立(構造、寸法、形
状、特性など)や、高充填化とその均一分散化が出来な
い。 (c)無機充填材の充填量が増加すると機械強度が大幅
に低下して、基板材料としての実用強度の領域に達しな
い。
(A) Rigidity cannot be ensured in a temperature range (220 to 300 ° C.) of a component mounting process assumed up to lead-free soldering, and a board on which components are mounted is largely bent. (B) It is not possible to achieve the same linear expansion coefficient as the metal foil used to satisfy the dimensional stability as a substrate material, and the specifications of high-precision inorganic fillers are established (structure, dimensions, shape, characteristics, etc.) ) And high packing and uniform dispersion cannot be achieved. (C) If the amount of the inorganic filler is increased, the mechanical strength is significantly reduced, and does not reach the range of practical strength as a substrate material.

【0005】[0005]

【発明が解決しようとする課題】本発明の目的は、鱗片
状の無機充填材を充填した熱可塑性樹脂組成物をプリン
ト配線基板用の絶縁材料として用いる場合の上記のこれ
までの問題点を克服し、高耐熱、耐燃性、寸法安定性に
低環境負荷性も兼ね備えたプリント配線基板用の絶縁材
料として、新規な基板用耐熱フィルムおよびこれを用い
たプリント配線基板を提供することにある。
SUMMARY OF THE INVENTION An object of the present invention is to overcome the above-mentioned problems in the case where a thermoplastic resin composition filled with a scaly inorganic filler is used as an insulating material for a printed wiring board. Another object of the present invention is to provide a novel heat-resistant film for a printed circuit board and a printed circuit board using the same as an insulating material for a printed circuit board having high heat resistance, flame resistance, dimensional stability and low environmental load.

【0006】[0006]

【課題を解決するための手段】本発明は上記問題点を解
消できる基板用耐熱フィルムおよびこれを用いたプリン
ト配線基板を見出したものであって、その要旨とすると
ころは、熱可塑性樹脂100重量部に対し、鱗片状無機
充填材を20重量部以上50重量部未満混合してなるフ
ィルムであって、鱗片状無機充填材が下記特性を有する
ことを特徴とする基板用耐熱フィルムにある。 (1) レーザー回折粒度分布法を用いて測定した90
%平均粒子径が15μm未満 (2)アスペクト比(平均粒径/平均厚み)が35以上 (3)熱天秤法で室温から400℃まで昇温した時に測
定される重量減少が0.5重量%未満 本発明では上記の鱗片状無機充填材が、溶融法で合成さ
れたフッ素金雲母であることを特徴とする基板用耐熱フ
ィルムを含み、また、上記の熱可塑性樹脂が、結晶融解
温度260℃以上であるポリアリールケトン樹脂70〜
25重量%と非晶性ポリエーテルイミド樹脂30〜75
重量%の混合物からなること、さらには上記基板用耐熱
フィルムに導体層を形成したことを特徴とするプリント
配線基板を含んでいる。
SUMMARY OF THE INVENTION The present invention has found a heat-resistant film for a substrate and a printed wiring board using the same, which can solve the above problems. The film is obtained by mixing the scaly inorganic filler in an amount of 20 parts by weight or more and less than 50 parts by weight per part, wherein the scaly inorganic filler has the following characteristics. (1) 90 measured by a laser diffraction particle size distribution method
(2) Aspect ratio (average particle size / average thickness) is 35 or more. (3) Weight loss measured by heating balance method from room temperature to 400 ° C. is 0.5% by weight. In the present invention, the scaly inorganic filler includes a heat-resistant film for a substrate, which is a fluorophlogopite synthesized by a melting method, and the thermoplastic resin has a crystal melting temperature of 260 ° C. The above polyaryl ketone resin 70-
25% by weight and amorphous polyetherimide resin 30 to 75
The printed wiring board is characterized by being composed of a mixture by weight, and further comprising a conductor layer formed on the heat-resistant film for a substrate.

【0007】[0007]

【発明の実施の形態】以下、本発明を詳しく説明する。
本発明の基板用耐熱フィルムおよびこれを用いたプリン
ト配線基板に適用する熱可塑性樹脂に混合する鱗片状無
機充填材は、(1)レーザー回折粒度分布法を用いて測
定した90%平均粒子径が15μm未満、(2)アスペ
クト比(平均粒径/平均厚み)が35以上、(3)熱天
秤法で室温から400℃まで昇温した時に測定される重
量減少が0.5重量%未満の特性を有するものであり、
この鱗片状無機充填材を、熱可塑性樹脂100重量部に
対し20重量部以上50重量部未満で混合する必要があ
る。上記(1)の90%平均粒子径が15μm以上であ
ると、フィルムを例えば厚み50μm以下に薄膜化して
いった場合に、フィルム表面の平滑性が極端に悪くな
り、前述したようなアディティブめっき法によるL/S
=15μm/15μm以下の達成が困難となる。また、
90%平均粒子径が15μm未満で、(2)アスペクト
比(平均粒径/平均厚み)が35以上の無機充填材が、
平面方向の線膨張係数を低く抑えることができ、基板の
そりを低減することが出来る。
DESCRIPTION OF THE PREFERRED EMBODIMENTS The present invention will be described below in detail.
The scaly inorganic filler mixed with the thermoplastic resin applied to the heat-resistant film for a substrate and the printed wiring board using the same according to the present invention has a (1) 90% average particle diameter measured by a laser diffraction particle size distribution method. (2) Aspect ratio (average particle diameter / average thickness) of 35 or more, (3) Weight loss measured by heating balance method from room temperature to 400 ° C. is less than 0.5% by weight. Which has
It is necessary to mix the flaky inorganic filler in an amount of 20 parts by weight or more and less than 50 parts by weight with respect to 100 parts by weight of the thermoplastic resin. When the 90% average particle diameter of the above (1) is 15 μm or more, when the film is thinned to a thickness of 50 μm or less, for example, the smoothness of the film surface becomes extremely poor. L / S by
= 15 μm / 15 μm or less. Also,
An inorganic filler having a 90% average particle diameter of less than 15 μm and (2) an aspect ratio (average particle diameter / average thickness) of 35 or more,
The coefficient of linear expansion in the plane direction can be kept low, and the warpage of the substrate can be reduced.

【0008】また、上述した無機充填材の混合量は、樹
脂組成物100重量部に対して50重量部を超えるとフ
ィルムの端裂強度が大きく低下し、また20重量部未満
では、線膨張係数を低下させて寸法安定性を向上させる
効果が小さく、部品搭載工程であるリフロー工程やフロ
ー工程において、線膨張係数差に起因した内部応力が発
生し、基板のそりやねじれが発生する。このことから好
適な無機充填材の混合量は、上述した樹脂組成物100
重量部に対して20〜50重量部である。
When the amount of the above-mentioned inorganic filler exceeds 50 parts by weight with respect to 100 parts by weight of the resin composition, the end crack strength of the film is greatly reduced. The effect of reducing dimensional stability and improving dimensional stability is small, and in a reflow process or a flow process as a component mounting process, an internal stress due to a difference in linear expansion coefficient is generated, and warpage or torsion of the substrate occurs. For this reason, the preferable mixing amount of the inorganic filler is 100%.
It is 20 to 50 parts by weight based on parts by weight.

【0009】また、本発明で使用する鱗片状の無機充填
材は、無機充填材の構造中に結晶水を持たないことが有
効であり、(3)熱天秤法で室温から400℃まで昇温
した時に測定される重量減少が0.5%未満のものを使
用する。これは、高耐熱性の熱可塑性樹脂をフィルム化
する場合には300℃から450℃の高温で樹脂を溶融
させるため、この温度で無機充填材の脱水が起こると、
樹脂の劣化やフィルムの発泡を誘発し、フィルムの機械
強度が大幅に低下するためである。構造中に結晶水を持
つ無機充填材の結晶水を取り除く手段としては、熱可塑
性樹脂と混合する前に無機充填剤を焼成処理することが
最も有効である。
It is effective that the scaly inorganic filler used in the present invention does not have water of crystallization in the structure of the inorganic filler. (3) The temperature is raised from room temperature to 400 ° C. by a thermobalance method. Use a material having a weight loss of less than 0.5% when measured. This is because, when a thermoplastic resin having high heat resistance is formed into a film, the resin is melted at a high temperature of 300 ° C. to 450 ° C., and when the inorganic filler is dehydrated at this temperature,
This is because it induces deterioration of the resin and foaming of the film, and the mechanical strength of the film is greatly reduced. The most effective means for removing the water of crystallization of the inorganic filler having water of crystallization in its structure is to bake the inorganic filler before mixing with the thermoplastic resin.

【0010】以上のように、90%平均粒子径が15μ
m未満でアスペクト比が35以上で、かつ構造中に結晶
水を持たない鱗片状の無機充填材として、溶融法で合成
されたマイカの一種であるフッ素金雲母(例えばトピー
工業(株)製「PDM−5B」)が好適に使用できる。
天然の金雲母(例えば(株)レプコ製「W−40」)に
は280℃に結晶水の脱水開始温度があり、また、水熱
法で合成された金フッ素雲母(例えばコープケミカル
(株)製「MK−200」)はタルクを出発原料とする
ためアスペクト比が30以上のものを得ることが出来な
い。また、溶融法で合成されるフッ素金雲母の他にも、
カリ四ケイ素雲母やカリウムテニオライトなども、目的
とする樹脂組成物の用途、機能に応じて適宜選択すれば
良い。
As described above, the 90% average particle diameter is 15 μm.
m, an aspect ratio of 35 or more, and a scaly inorganic filler having no water of crystallization in its structure, a fluorophlogopite mica that is a kind of mica synthesized by a melting method (for example, manufactured by Topy Industries, Ltd. PDM-5B ") can be preferably used.
Natural phlogopite (eg, “W-40” manufactured by Repco Corp.) has a dehydration start temperature of crystallization water at 280 ° C., and fluorinated mica synthesized by a hydrothermal method (eg, Corp Chemical Co., Ltd.) Manufactured by "MK-200"), talc is used as a starting material, so that an aspect ratio of 30 or more cannot be obtained. Also, besides fluorophlogopite synthesized by the melting method,
Potassium tetrasilicic mica, potassium teniolite and the like may be appropriately selected according to the intended use and function of the resin composition.

【0011】また、本発明に適用する樹脂は、部品実装
時の温度(220℃〜300℃)において十分な耐熱性
と剛性を確保していれば特に制限はなく種々の熱可塑性
樹脂混合物を用いることが出来る。本発明では、結晶性
ポリアリールケトン樹脂70〜25重量%と非晶性ポリ
エーテルイミド樹脂30〜75重量%とからなる樹脂組
成物が好適に使用できる。ここで、結晶性ポリアリール
ケトン樹脂は、その構造単位に芳香核結合、エーテル結
合およびケトン結合を含む熱可塑性樹脂であり、その代
表例としては、ポリエーテルケトン、ポリエーテルエー
テルケトン、ポリエーテルケトンケトン等がある。ポリ
エーテルエーテルケトンは、ビクトレックスエムシー
(株)製の商品名「PEEK151G」、「PEEK3
81G」、「PEEK450G」等として市販されてい
る。
The resin used in the present invention is not particularly limited as long as it has sufficient heat resistance and rigidity at the temperature at which components are mounted (220 ° C. to 300 ° C.), and various thermoplastic resin mixtures are used. I can do it. In the present invention, a resin composition comprising 70 to 25% by weight of a crystalline polyarylketone resin and 30 to 75% by weight of an amorphous polyetherimide resin can be suitably used. Here, the crystalline polyarylketone resin is a thermoplastic resin having an aromatic nucleus bond, an ether bond and a ketone bond in its structural unit, and typical examples thereof include polyetherketone, polyetheretherketone, and polyetherketone. There are ketones and the like. Polyetheretherketone is available from Victrex MC Corporation under the trade names “PEEK151G” and “PEEK3”.
81G "," PEEK450G "and the like.

【0012】また、非晶性ポリエーテルイミド樹脂は、
その構造単位に芳香核結合、エーテル結合およびイミド
結合を含む非晶性熱可塑性樹脂であり、特に制限される
ものでない。ポリエーテルイミドは、ゼネラルエレクト
リック(株)製の商品名「Ultem CRS5001
−1000」、「Ultem 1000−1000」等
として市販されている。上記樹脂組成物において、結晶
性ポリアリールケトン樹脂が70重量%を越えたり、非
晶性ポリエーテルイミド樹脂が30重量%未満では、組
成物全体としての結晶性が高く、結晶化速度が速くな
り、銅箔との熱融着による接着の際にビール強度が低下
する傾向にある。また、結晶性ポリアリールケトン樹脂
が25重量%未満であったり、非晶性ポリエーテルイミ
ド樹脂が75重量%を越えると組成物全体としての結晶
性自体が低く、結晶融解温度が260℃以上であって
も、はんだ耐熱性が低下する。以上より、本発明におい
ては、上記ポリアリールケトン樹脂70〜25重量%と
非晶性ポリエーテルイミド樹脂30〜75重量%とから
なる混合組成物が好適に用いられる。
Further, the amorphous polyetherimide resin is
It is an amorphous thermoplastic resin having an aromatic nucleus bond, an ether bond and an imide bond in its structural unit, and is not particularly limited. Polyetherimide is available from General Electric Co., Ltd. under the trade name “Ultem CRS5001”.
-1000 "," Ultem 1000-1000 "and the like. In the above resin composition, if the content of the crystalline polyarylketone resin exceeds 70% by weight or the content of the amorphous polyetherimide resin is less than 30% by weight, the crystallinity of the entire composition is high, and the crystallization rate is increased. In addition, beer strength tends to decrease during adhesion by heat fusion with a copper foil. When the content of the crystalline polyarylketone resin is less than 25% by weight or the content of the amorphous polyetherimide resin exceeds 75% by weight, the crystallinity itself of the composition as a whole is low, and the crystal melting temperature is 260 ° C or higher. Even so, the solder heat resistance is reduced. As described above, in the present invention, a mixed composition comprising 70 to 25% by weight of the polyarylketone resin and 30 to 75% by weight of the amorphous polyetherimide resin is suitably used.

【0013】本発明を構成する樹脂組成物には、その特
性を損なわない程度に、他の樹脂や無機充填材以外の各
種添加剤、例えば、熱安定剤、紫外線吸収剤、光安定
剤、核剤、着色剤、滑剤、難燃剤等を適宜配合してもか
まわない。また無機充填材を含めた各種添加剤の混合方
法は、公知の方法を用いることができる。例えば、
(a)各種添加剤をポリアリールケトン樹脂及び/また
は非晶性ポリエーテルイミド樹脂などの適当なベース樹
脂に高濃度(代表的な含有量としては10〜60重量%
程度)に混合したマスターバッチを別途作製しておき、
これを使用する樹脂に濃度を調整して混合し、ニーダー
や押出機等を用いて機械的にブレンドする方法、(b)
使用する樹脂に直接各種添加剤をニーダーや押出機等を
用いて機械的にブレンドする方法などが挙げられる。上
記混合方法の中では、(a)のマスターバッチを作製
し、混合する方法が分散性や作業性の点から好ましい。
さらに、フィルムの表面にはハンドリング性の改良等の
ために、エンボス加工やコロナ処理等を適宜施しても良
い。
The resin composition constituting the present invention contains various additives other than other resins and inorganic fillers, for example, heat stabilizers, ultraviolet absorbers, light stabilizers, nuclei, so long as the properties of the resin composition are not impaired. An agent, a coloring agent, a lubricant, a flame retardant, and the like may be appropriately blended. A known method can be used as a method for mixing various additives including the inorganic filler. For example,
(A) A high concentration of various additives in a suitable base resin such as a polyarylketone resin and / or an amorphous polyetherimide resin (a typical content is 10 to 60% by weight).
Separately) to prepare a master batch mixed with
(B) a method of mixing and adjusting the concentration to a resin to be used, and mechanically blending using a kneader or an extruder;
Examples include a method of mechanically blending various additives directly with the resin to be used using a kneader or an extruder. Among the above mixing methods, a method of preparing and mixing the master batch (a) is preferable from the viewpoint of dispersibility and workability.
Furthermore, the surface of the film may be appropriately subjected to embossing, corona treatment, or the like, for the purpose of improving handling properties and the like.

【0014】本発明の基板用耐熱フィルムおよびこれを
用いたプリント配線基板を構成する組成物は、フィルム
またはシート状で提供される。成形方法としては、公知
の方法、例えばTダイを用いる押出キャスト法やカレン
ダー法等を採用することができ、特に限定されるもので
はないが、シートの製膜性や安定生産性等の面から、T
ダイを用いる押出キャスト法が好ましい。Tダイを用い
る押出キャスト法での成形温度は、組成物の流動特性や
製膜性等によって適宜調整されるが、概ね融点以上、4
30℃以下である。また、該フィルムの厚みは、通常2
5〜200μmである。
The heat-resistant film for a substrate of the present invention and the composition constituting a printed wiring board using the same are provided in the form of a film or sheet. As a forming method, a known method, for example, an extrusion casting method using a T-die, a calendar method, or the like can be adopted, and is not particularly limited, but from the viewpoints of film forming properties and stable productivity of the sheet. , T
Extrusion casting using a die is preferred. The molding temperature in the extrusion casting method using a T die is appropriately adjusted depending on the flow characteristics, film forming properties, and the like of the composition.
30 ° C. or less. The thickness of the film is usually 2
5 to 200 μm.

【0015】次に、本発明の基板用耐熱フィルムを用い
たプリント配線基板を作製する方法であるが、以下に示
す公知のいかなる方法も採用することができ、特に限定
されるものではない。 1)フィルムの少なくとも片面に接着層を介することな
く導体箔を熱融着・結晶化処理し、この導体箔にサブト
ラクティブエッチングにより導電性回路を形成する方
法。ここで、フィルムと導体箔とを接着層を介すること
なく熱融着させる方法としては、加熱、加圧できる方法
であれば公知の方法を採用することができ、特に限定さ
れない。例えば、熱プレス法や熱ラミネートロール法、
又はこれらを組み合わせた方法も好適に採用することが
できる。導体箔としては、例えば銅、金、銀、アルミニ
ウム、ニッケル、錫等の、厚さ5〜70μm程度の金属
箔が挙げられる。金属箔としては、通常銅箔が使用さ
れ、導体箔は、接着効果を高めるために、フィルムとの
接触面(重ねる面)側を予め化学的または機械的に粗化
したものを用いることが好ましい。表面粗化処理された
導体箔の具体例としては、電解銅箔を製造する際に電気
化学的に処理された粗化銅箔などが挙げられる。
Next, a method for producing a printed wiring board using the heat-resistant film for a substrate of the present invention can be adopted, and any known method described below can be adopted, and there is no particular limitation. 1) A method in which a conductive foil is thermally fused and crystallized on at least one surface of a film without an adhesive layer therebetween, and a conductive circuit is formed on the conductive foil by subtractive etching. Here, as a method of heat-sealing the film and the conductor foil without interposing an adhesive layer, a known method can be adopted as long as it can be heated and pressed, and is not particularly limited. For example, hot press method or hot laminating roll method,
Alternatively, a method in which these are combined can be suitably adopted. Examples of the conductive foil include a metal foil having a thickness of about 5 to 70 μm, such as copper, gold, silver, aluminum, nickel, and tin. As the metal foil, a copper foil is usually used, and as the conductor foil, it is preferable to use a material whose contact surface (overlapping surface) with the film is chemically or mechanically roughened in advance in order to enhance the bonding effect. . Specific examples of the conductor foil subjected to the surface roughening treatment include a roughened copper foil that has been electrochemically treated when producing an electrolytic copper foil.

【0016】2)フィルムの表面に機械的または化学的
な方法により表面粗化処理を施し、この上にめっき法に
より導電性回路を形成する方法。フィルムの表面粗化処
理は銅めっきの付着強度を高めるために実施し、化学的
な粗化処理の方法としては過マンガン酸カリウム溶液に
よる酸化処理などが挙げられる。
2) A method in which a surface of a film is subjected to a surface roughening treatment by a mechanical or chemical method, and a conductive circuit is formed thereon by a plating method. The surface roughening treatment of the film is performed in order to increase the adhesion strength of the copper plating, and the chemical roughening method includes, for example, an oxidation treatment with a potassium permanganate solution.

【0017】3)フィルムの表面に導電性ペーストをス
クリーン印刷法によりパターン印刷し導電性回路を形成
する方法。 4)フィルムの表面に金属のスパッタリングにより導電
性回路を設ける方法。
3) A method of forming a conductive circuit by pattern-printing a conductive paste on the surface of a film by screen printing. 4) A method of providing a conductive circuit on the surface of a film by sputtering metal.

【0018】[0018]

【実施例】以下に実施例でさらに詳しく説明するが、こ
れらにより本発明は何ら制限を受けるものではない。な
お、本明細書中の種々の測定値および評価試験は以下の
ようにして実施した。
The present invention will be described in more detail with reference to the following Examples, which should not be construed as limiting the present invention. In addition, various measurement values and evaluation tests in this specification were performed as follows.

【0019】(1)90%平均粒子径 (株)セイシン企業製レーザー回折粒度分布計「LMS
―30」(波長680nm)を用いて鱗片状無機充填剤
の90%平均粒子径を求めた。
(1) 90% average particle diameter Laser diffraction particle size distribution analyzer “LMS” manufactured by Seishin Enterprise Co., Ltd.
-30 "(wavelength: 680 nm) was used to determine the 90% average particle size of the flaky inorganic filler.

【0020】(2)アスペクト比 (株)セイシン企業製レーザー回折粒度分布計「LMS
―30」を用いて求めた鱗片状無機充填材の50%平均
粒子径を、電子顕微鏡を用い実際に観察し求めた鱗片状
無機充填材の平均厚みで除してアスペクト比とした。
(2) Aspect ratio Laser diffraction particle size distribution analyzer “LMS” manufactured by Seishin Enterprise Co., Ltd.
The aspect ratio was obtained by dividing the 50% average particle diameter of the flaky inorganic filler obtained using “-30” by the average thickness of the flaky inorganic filler actually observed and obtained using an electron microscope.

【0021】(3)400℃重量減少 リガク(株)製熱天秤「TAS−200」を用い、一度
120℃で十分に乾燥させた鱗片状無機充填材を室温か
ら400℃まで昇温した時の重量減少%を求めた。
(3) Weight loss at 400 ° C. The scale-like inorganic filler once sufficiently dried at 120 ° C. was heated from room temperature to 400 ° C. using a thermal balance “TAS-200” manufactured by Rigaku Corporation. The weight loss% was determined.

【0022】(4)フィルムの表面平滑性 厚さ50μmのフィルムを用いて、2次元表面粗さ計に
より断面曲線を求め、この断面曲線より基準長さ10m
mをとり、この基準長さにおける高い方から5番目まで
の凸部の高さの平均値と低い方から5番目までの凹部の
平均値の差より十点平均粗さ(Rz)を求めた。このR
zが5μm以上のものを(×)、5μm未満を(○)と
した。
(4) Surface Smoothness of Film A cross-sectional curve was obtained by a two-dimensional surface roughness meter using a film having a thickness of 50 μm, and a reference length of 10 m was obtained from the cross-sectional curve.
m, and the ten-point average roughness (Rz) was determined from the difference between the average of the heights of the five highest projections and the average of the five lowest depressions in this reference length. . This R
When z was 5 μm or more, it was evaluated as (x), and when it was less than 5 μm, it was evaluated as (○).

【0023】(5)フィルムの端裂強度 JISC2151の端裂抵抗試験に準拠して、厚さ50
μmのフィルム から幅15mm、長さ300mmの試
験片を切り出し、試験金具Bを用いて、引張り速度50
mm/分の条件で縦方向および横方向を測定し、測定値
が39N/mm 以上を(○)、39N/mm未満を
(×)とした。
(5) End Crack Strength of Film According to the end crack resistance test of JIS C2151, the thickness is 50%.
From a μm film to a 15 mm wide and 300 mm long sample
A test piece was cut out, and a tensile speed of 50
Measure the length and width in mm / min and measure
Is 39 N / mm 2The above is (○), 39 N / mm2Less than
(X).

【0024】(6)銅箔のピール強度 フィルムの片側に銅箔(厚さ:18μm、表面粗面化)
を重ね、熱プレスにより片面銅張板を作製し、JISC
6481に準拠して銅箔のピール強度を求めた。ピール
強度が7.8N/cm以上を(○)、5.9N/cm以
上を(△)、5.9N/cm未満を(×)とした。
(6) Peel strength of copper foil Copper foil (thickness: 18 μm, surface roughening) on one side of the film
To make a one-sided copper-clad board by hot pressing, JISC
The peel strength of the copper foil was determined according to 6481. A peel strength of 7.8 N / cm or more was evaluated as (○), a 5.9 N / cm or more was evaluated as (△), and a peel strength of less than 5.9 N / cm was evaluated as (x).

【0025】(7)半田耐熱性 片面銅張板を用い、JISC6481に準拠して、26
0℃の半田浴に20秒間浮かべ、目視で膨れや変形の有
無を調査した。膨れや変形がないものを(○)、変形が
僅かに認められるものを(△)、膨れや変形が認められ
るものを(×)とした。
(7) Solder heat resistance Using a single-sided copper-clad board, according to JIS C6481,
Floating in a 0 ° C. solder bath for 20 seconds, and visually inspected for swelling or deformation. Those without swelling or deformation were rated as (○), those with slight deformation were rated as (△), and those with swelling or deformation were rated as (x).

【0026】(8)基板のそり 片面銅張板を作製し、100mm×100mmの正方形
に切り出し、凸面を下側にして定盤の上にのせて、一箇
所の角を抑えた時に、その角の対角部の浮き上がり量を
測定して基板のそり量とした。そりの高さが2mm未満
を(○)、2mm以上を(×)とした。
(8) Warpage of substrate A single-sided copper-clad plate is prepared, cut into a square of 100 mm x 100 mm, and placed on a surface plate with the convex surface on the lower side to suppress one corner. The floating amount of the diagonal part was measured and defined as the amount of warpage of the substrate. (O) when the height of the warp was less than 2 mm, and (X) when the height was 2 mm or more.

【0027】(実施例1)表1に示すようにポリエーテ
ルエーテルケトン樹脂[ビクトレックスエムシー(株)
製、PEEK450G、Tg:147.6℃、Tm:3
34℃](以下、単にPEEKと略記する)50重量部
と、ポリエーテルイミド樹脂[ゼネラルエレクトリック
(株)製、Ultem-1000、Tg:216℃]
(以下、単にPEIと略記する)50重量部およびトピ
ー工業(株)製の溶融合成法で合成されたフッ素金雲母
「PDM―5B」(90%平均粒子径:13.6μm、ア
スペクト比:50)30重量部とからなる混合組成物
を、Tダイを備えた押出機を用いて設定温度380℃
で、厚さ75μmのフィルムに押出した後、必要によっ
ては、その片側に銅箔(厚さ:18μm、表面粗面化)
を重ね、250℃×30分で熱プレスすることにより結
晶化処理済銅箔積層板を得た。得られたフィルムまたは
片面銅張基板を用いて、評価した熱特性や信頼性試験等
の評価結果を表1に示した。
(Example 1) As shown in Table 1, polyether ether ketone resin [Victrex MC Co., Ltd.
PEEK450G, Tg: 147.6 ° C., Tm: 3
34 ° C.] (hereinafter simply abbreviated as PEEK) 50 parts by weight, and a polyetherimide resin [Ultem-1000, manufactured by General Electric Co., Ltd., Tg: 216 ° C.]
(Hereinafter simply abbreviated as PEI) 50 parts by weight and fluorophlogopite mica “PDM-5B” (90% average particle diameter: 13.6 μm, aspect ratio: 50) synthesized by a melt synthesis method manufactured by Topy Industries, Ltd. ) At a set temperature of 380 ° C using an extruder equipped with a T-die.
After extruding into a film having a thickness of 75 μm, if necessary, a copper foil (thickness: 18 μm, surface roughening) is provided on one side thereof.
And heat pressed at 250 ° C. for 30 minutes to obtain a crystallized copper foil laminate. Using the obtained film or the single-sided copper-clad substrate, the evaluation results such as thermal characteristics and reliability tests are shown in Table 1.

【0028】(実施例2)表1に示すように、実施例1
においてPEEKとPEIの混合重量比を65/35重
量部に変更した以外は、実施例1と同様に目的とするフ
ィルムまたは片面銅張板を得た。得られたフィルムまた
は片面銅張板を用いて、評価した熱特性や信頼性試験等
の評価結果を表1に示した。
(Example 2) As shown in Table 1, Example 1
In Example 1, except that the mixing weight ratio of PEEK and PEI was changed to 65/35 parts by weight, a target film or a single-sided copper-clad board was obtained in the same manner as in Example 1. Table 1 shows the evaluation results of the thermal characteristics, reliability tests, and the like evaluated using the obtained film or single-sided copper-clad board.

【0029】(実施例3)表1に示すように、実施例1
においてPEEKとPEIの混合重量比を30/70重
量部に変更した以外は、実施例1と同様に目的とするフ
ィルムまたは片面銅張板を得た。得られたフィルムまた
は片面銅張板を用いて、評価した熱特性や信頼性試験等
の評価結果を表1に示した。
Example 3 As shown in Table 1, Example 1
In Example 1, except that the mixing weight ratio of PEEK and PEI was changed to 30/70 parts by weight, a target film or a single-sided copper-clad board was obtained in the same manner as in Example 1. Table 1 shows the evaluation results of the thermal characteristics, reliability tests, and the like evaluated using the obtained film or single-sided copper-clad board.

【0030】(実施例4)表1に示すように、実施例1
においてPEEKとPEIの混合重量比を 70/30
重量部に変更した以外は、実施例1と同様に目的とする
フィルムまたは片面銅張板を得た。得られたフィルムま
たは片面銅張板を用いて、評価した熱特性や信頼性試験
等の評価結果を表1に示した。
Example 4 As shown in Table 1, Example 1
The mixing weight ratio of PEEK and PEI was 70/30
A film or a single-sided copper clad board was obtained in the same manner as in Example 1 except that the amount was changed to parts by weight. Table 1 shows the evaluation results of the thermal characteristics, reliability tests, and the like evaluated using the obtained film or single-sided copper-clad board.

【0031】(実施例5)表1に示すように、実施例1
においてPEEKとPEIの混合重量比を 25/75
重量部に変更した以外は、実施例1と同様に目的とする
フィルムまたは片面銅張板を得た。得られたフィルムま
たは片面銅張板を用いて、評価した熱特性や信頼性試験
のなどの評価結果を表1に示した。
(Embodiment 5) As shown in Table 1, Embodiment 1
The mixing weight ratio of PEEK and PEI is 25/75
A film or a single-sided copper clad board was obtained in the same manner as in Example 1 except that the amount was changed to parts by weight. Table 1 shows the evaluation results such as the thermal characteristics and reliability tests evaluated using the obtained film or single-sided copper-clad board.

【0032】(比較例1)表1に示すように、実施例1
において無機充填材として(株)レプコ製の金雲母「W
−40」を用いた以外は実施例1と同様に目的とするフ
ィルムまたは片面銅張板を得た。得られたフィルムまた
は片面銅張板を用いて、評価した熱特性や信頼性試験等
の評価結果を表1に示した。
Comparative Example 1 As shown in Table 1, Example 1
Of phlogopite "W" manufactured by Repco Co., Ltd.
Except for using "-40", a target film or a single-sided copper-clad board was obtained in the same manner as in Example 1. Table 1 shows the evaluation results of the thermal characteristics, reliability tests, and the like evaluated using the obtained film or single-sided copper-clad board.

【0033】(比較例2)表1に示すように、実施例1
において無機充填材として(株)レプコ製の金雲母「W
−40」を用い、分級条件を変更することにより90%
平均粒径を13μmに調整した以外は実施例1と同様に
目的とするフィルムまたは片面銅張板を得た。得られた
フィルムまたは片面銅張板を用いて、評価した熱特性や
信頼性試験等の評価結果を表1に示した。
Comparative Example 2 As shown in Table 1, Example 1
Of phlogopite "W" manufactured by Repco Co., Ltd. as an inorganic filler
90% by changing the classification conditions using “-40”
A target film or a single-sided copper-clad board was obtained in the same manner as in Example 1 except that the average particle size was adjusted to 13 μm. Table 1 shows the evaluation results of the thermal characteristics, reliability tests, and the like evaluated using the obtained film or single-sided copper-clad board.

【0034】(比較例3)表1に示すように、実施例1
において無機充填材としてコープケミカル(株)製の固
相反応法を用いたフッ素金雲母「MK−200」を用い
た以外は、 実施例1と同様に目的とするフィルムまた
は片面銅張板を得た。得られ たフィルムまたは片面銅
張板を用いて、評価した熱特性や信頼性試験のなどの評
価結果を表1に示した。
Comparative Example 3 As shown in Table 1, Example 1
In the same manner as in Example 1 except that fluorphlogopite mica “MK-200” using a solid-phase reaction method manufactured by Corp Chemical Co., Ltd. was used as an inorganic filler, a target film or a single-sided copper-clad board was obtained. Was. Table 1 shows the evaluation results such as the thermal characteristics and reliability tests evaluated using the obtained film or single-sided copper clad board.

【0035】(比較例4)表1に示すように、実施例1
において無機充填材を分級条件の変更により90%平均
粒子径を21μmに調整したフッ素金雲母「PDM−5
B」を用いた以外は実施例1と同様に目的とするフィル
ムまたは片面銅張板を得た。得られたフィルムまたは片
面銅張板を用いて、評価した熱特性や信頼性試験等の評
価結果を表1に示した。
Comparative Example 4 As shown in Table 1, Example 1
Fluorophlogopite “PDM-5” in which the 90% average particle diameter was adjusted to 21 μm by changing the classification conditions of the inorganic filler in
A film or a single-sided copper-clad board was obtained in the same manner as in Example 1 except that "B" was used. Table 1 shows the evaluation results of the thermal characteristics, reliability tests, and the like evaluated using the obtained film or single-sided copper-clad board.

【0036】(比較例5)表1に示すように、実施例1
において無機充填材の充填量を15重量部 にしたこと
以外は、実施例1と同様に目的とするフィルムまたは片
面銅張板を得た。得られたフィルムまたは片面銅張板を
用いて、評価した熱特性や信頼性試験等の評価結果を表
1に示した。
Comparative Example 5 As shown in Table 1, Example 1
A film or single-sided copper clad board was obtained in the same manner as in Example 1 except that the amount of the inorganic filler was changed to 15 parts by weight. Table 1 shows the evaluation results of the thermal characteristics, reliability tests, and the like evaluated using the obtained film or single-sided copper-clad board.

【0037】(比較例6)表1に示すように、実施例1
において無機充填材の充填量を55重量部 にしたこと
以外は、実施例1と同様に目的とするフィルムまたは片
面銅張板を得た。得られたフィルムまたは片面銅張板を
用いて、評価した熱特性や信頼性試験等の評価結果を表
1に示した。
Comparative Example 6 As shown in Table 1, Example 1
A film or a single-sided copper clad board was obtained in the same manner as in Example 1 except that the amount of the inorganic filler was changed to 55 parts by weight. Table 1 shows the evaluation results of the thermal characteristics, reliability tests, and the like evaluated using the obtained film or single-sided copper-clad board.

【0038】[0038]

【表1】 [Table 1]

【0039】[0039]

【発明の効果】本発明によれば、添加する鱗片状フィラ
ーを最適化することにより、鱗片状の無機充填材を充填
した熱可塑性樹脂組成物をプリント配線基板用の絶縁材
料として用いる場合の従来の問題点を解消し、高耐熱、
耐燃性、寸法安定性、低環境負荷性に加え、従来のプリ
ント基板用絶縁材料が達し得なかった高密度対応を兼ね
備えたプリント配線基板用の絶縁材料およびこれを用い
たプリント配線基板を提供することが可能となった。
According to the present invention, by optimizing a scaly filler to be added, a conventional thermoplastic resin composition filled with a scaly inorganic filler is used as an insulating material for a printed wiring board. The problem of high heat resistance,
To provide an insulating material for a printed wiring board, which has not only the flame resistance, the dimensional stability, and the low environmental load, but also the high density that the conventional insulating material for a printed circuit board could not reach, and a printed wiring board using the same. It became possible.

───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.7 識別記号 FI テーマコート゛(参考) H05K 1/03 610 H05K 1/03 610H 610R Fターム(参考) 4F071 AA02 AA41 AA60 AA84 AB30 AD05 AD06 AE17 AF45 AF45Y AH13 BA01 BB06 BC01 4J002 AA01W CJ00W CM04X DJ056 FA006 FA016 ──────────────────────────────────────────────────続 き Continued on the front page (51) Int.Cl. 7 Identification symbol FI Theme coat ゛ (Reference) H05K 1/03 610 H05K 1/03 610H 610R F term (Reference) 4F071 AA02 AA41 AA60 AA84 AB30 AD05 AD06 AD06 AE17 AF45 AF45Y AH13 BA01 BB06 BC01 4J002 AA01W CJ00W CM04X DJ056 FA006 FA016

Claims (4)

【特許請求の範囲】[Claims] 【請求項1】 熱可塑性樹脂100重量部に対し、鱗片
状無機充填材を20重量部以上50重量部未満混合して
なるフィルムであって、鱗片状無機充填材が下記特性を
有することを特徴とする基板用耐熱フィルム。 (1) レーザー回折粒度分布法を用いて測定した90
%平均粒子径が15μm未満 (2)アスペクト比(平均粒径/平均厚み)が35以上 (3) 熱天秤法で室温から400℃まで昇温した時に
測定される重量減少が0.5重量%未満
1. A film obtained by mixing a scaly inorganic filler in an amount of 20 parts by weight or more and less than 50 parts by weight with respect to 100 parts by weight of a thermoplastic resin, wherein the scaly inorganic filler has the following characteristics. Heat-resistant film for substrates. (1) 90 measured by a laser diffraction particle size distribution method
(2) Aspect ratio (average particle diameter / average thickness) is 35 or more. (3) Weight loss measured by heating balance method from room temperature to 400 ° C. is 0.5% by weight. Less than
【請求項2】 請求項1記載の鱗片状無機充填材が、溶
融法で合成されたフッ素金雲母であることを特徴とする
基板用耐熱フィルム。
2. A heat-resistant film for a substrate, wherein the scaly inorganic filler according to claim 1 is fluorophlogopite synthesized by a melting method.
【請求項3】 請求項1記載の熱可塑性樹脂が、結晶融
解温度260℃以上であるポリアリールケトン樹脂70
〜25重量%と非晶性ポリエーテルイミド樹脂30〜7
5重量%の混合物からなることを特徴とする基板用耐熱
フィルム。
3. The polyaryl ketone resin 70, wherein the thermoplastic resin according to claim 1 has a crystal melting temperature of 260 ° C. or higher.
-25% by weight and amorphous polyetherimide resin 30-7
A heat-resistant film for a substrate, comprising a 5% by weight mixture.
【請求項4】 請求項1乃至3のいずれか1項記載の基
板用耐熱フィルムに導体層を形成したことを特徴とする
プリント配線基板。
4. A printed wiring board, wherein a conductor layer is formed on the heat-resistant film for a board according to claim 1.
JP2001150483A 2001-05-21 2001-05-21 Heat-resistant film for substrate and printed wiring board using the same Expired - Fee Related JP3955188B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
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Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2001150483A JP3955188B2 (en) 2001-05-21 2001-05-21 Heat-resistant film for substrate and printed wiring board using the same

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Publication Number Publication Date
JP2002338823A true JP2002338823A (en) 2002-11-27
JP3955188B2 JP3955188B2 (en) 2007-08-08

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Country Link
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Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2005054345A1 (en) * 2003-12-05 2005-06-16 Sumitomo Bakelite Co., Ltd. Production process tape for film-shaped wiring board
WO2005056684A1 (en) * 2003-12-15 2005-06-23 Sekisui Chemical Co., Ltd. Thermoplastic resin composition, material for substrate and film for substrate
JP2006008986A (en) * 2004-03-31 2006-01-12 Mitsubishi Plastics Ind Ltd Thermoplastic resin film and its production method
JP2009060124A (en) * 2008-10-20 2009-03-19 Mitsubishi Plastics Inc Film for spacer base of chip carrier
JP2009060123A (en) * 2008-10-20 2009-03-19 Mitsubishi Plastics Inc Film for spacer base of chip carrier
JP2010274540A (en) * 2009-05-29 2010-12-09 Mitsubishi Plastics Inc White film, metal laminate, substrate for mounting led, and light source device
WO2020213527A1 (en) * 2019-04-19 2020-10-22 信越ポリマー株式会社 Resin film, high-frequency circuit board, and production method for high-frequency circuit board

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2005054345A1 (en) * 2003-12-05 2005-06-16 Sumitomo Bakelite Co., Ltd. Production process tape for film-shaped wiring board
JPWO2005054345A1 (en) * 2003-12-05 2007-06-28 住友ベークライト株式会社 Film circuit board production process tape
WO2005056684A1 (en) * 2003-12-15 2005-06-23 Sekisui Chemical Co., Ltd. Thermoplastic resin composition, material for substrate and film for substrate
JP2006008986A (en) * 2004-03-31 2006-01-12 Mitsubishi Plastics Ind Ltd Thermoplastic resin film and its production method
JP2009060124A (en) * 2008-10-20 2009-03-19 Mitsubishi Plastics Inc Film for spacer base of chip carrier
JP2009060123A (en) * 2008-10-20 2009-03-19 Mitsubishi Plastics Inc Film for spacer base of chip carrier
JP2010274540A (en) * 2009-05-29 2010-12-09 Mitsubishi Plastics Inc White film, metal laminate, substrate for mounting led, and light source device
WO2020213527A1 (en) * 2019-04-19 2020-10-22 信越ポリマー株式会社 Resin film, high-frequency circuit board, and production method for high-frequency circuit board
CN113784838A (en) * 2019-04-19 2021-12-10 信越聚合物株式会社 Resin film, high-frequency circuit board and method for producing same
TWI809265B (en) * 2019-04-19 2023-07-21 日商信越聚合物股份有限公司 Resin film, high-frequency circuit substrate and manufacturing method thereof

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