JP2002319646A - Container for housing electronic component - Google Patents

Container for housing electronic component

Info

Publication number
JP2002319646A
JP2002319646A JP2001122850A JP2001122850A JP2002319646A JP 2002319646 A JP2002319646 A JP 2002319646A JP 2001122850 A JP2001122850 A JP 2001122850A JP 2001122850 A JP2001122850 A JP 2001122850A JP 2002319646 A JP2002319646 A JP 2002319646A
Authority
JP
Japan
Prior art keywords
weight
electronic component
sealing material
glass
filler
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2001122850A
Other languages
Japanese (ja)
Other versions
JP4514355B2 (en
Inventor
Yoshiaki Ito
吉明 伊藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kyocera Corp
Original Assignee
Kyocera Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kyocera Corp filed Critical Kyocera Corp
Priority to JP2001122850A priority Critical patent/JP4514355B2/en
Publication of JP2002319646A publication Critical patent/JP2002319646A/en
Application granted granted Critical
Publication of JP4514355B2 publication Critical patent/JP4514355B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C8/00Enamels; Glazes; Fusion seal compositions being frit compositions having non-frit additions
    • C03C8/24Fusion seal compositions being frit compositions having non-frit additions, i.e. for use as seals between dissimilar materials, e.g. glass and metal; Glass solders

Abstract

PROBLEM TO BE SOLVED: To provide a container for housing an electronic component, with which the electronic component is normally and stably operated over long periods of time. SOLUTION: The container for housing the electronic component is composed of an insulation base body 1, having a loading part 1a for loading the electronic component 5 on an upper surface, for which a plurality of external lead terminals 3 connected to the respective electrodes of the electronic component 5 are fixed around the loading part 1a via a joining material 4 composed of crystalline glass, and a lid body 2 for which a sealing material 7 to be softened and fused at a lower temperature compared to the jointing material 4 is put on a lower surface outer peripheral part. By heating and fusing the sealing material 7 and jointing the insulation base body 1 and the lid body 2, the electronic component 5 is housed airtightly in the inside.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、半導体素子や圧電
振動子等の電子部品を気密に封止して収納するための電
子部品収納用容器に関し、特に封止材にガラスを用いて
封止を行う電子部品収納用容器に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an electronic component storage container for hermetically sealing and storing electronic components such as a semiconductor element and a piezoelectric vibrator, and more particularly to sealing using glass as a sealing material. And a container for storing electronic components.

【0002】[0002]

【従来の技術】従来、半導体素子や圧電振動子等の電子
部品を収容するための電子部品収納用容器は、通常、酸
化アルミニウム質結晶体や窒化アルミニウム質焼結体、
ムライト質焼結体等の電気絶縁材料から成り、その上面
の略中央部に電子部品の搭載部を有し、上面にガラスか
らなる封止材が被着された絶縁基体と、同じく電気絶縁
材料から成り、その下面の略中央部に電子部品を収容す
る空所を形成するための凹部を有し、下面にガラスから
成る封止材を被着させた蓋体と、内部に収容する電子部
品を外部の電気回路に電気的に接続するための鉄−ニッ
ケル合金や鉄−ニッケル−コバルト合金等の金属材料か
ら成る外部リード端子とにより構成されており、絶縁基
体の上面に外部リード端子を載置させるとともに予め被
着させておいたガラスから成る封止材を溶融させること
によって外部リード端子を絶縁基体に仮止めし、次に絶
縁基体の凹部底面に半導体素子等の電子部品を取着する
とともに電子部品の各電極をボンディングワイヤを介し
て外部リード端子に接続し、しかる後、絶縁基体と蓋体
とをその相対向する主面に被着させておいた各々の封止
材を溶融一体化させ、絶縁基体と蓋体とから成る容器を
封止することによって製品としての電子装置となる。
2. Description of the Related Art Conventionally, an electronic component storage container for storing electronic components such as a semiconductor element and a piezoelectric vibrator usually includes an aluminum oxide-based crystal, an aluminum nitride-based sintered body,
An insulating base made of an electrically insulating material such as a mullite sintered body, having a mounting portion for electronic components at a substantially central portion of the upper surface, and a sealing material made of glass adhered to the upper surface; A lid having a concave portion for forming a space for accommodating an electronic component at a substantially central portion of a lower surface thereof, and a cover member having a lower surface covered with a sealing material made of glass; and an electronic component accommodated therein. And an external lead terminal made of a metal material such as an iron-nickel alloy or an iron-nickel-cobalt alloy for electrically connecting the external lead terminal to an external electric circuit. The external lead terminals are temporarily fixed to the insulating substrate by disposing and melting the sealing material made of glass which has been applied in advance, and then the electronic component such as a semiconductor element is attached to the bottom of the concave portion of the insulating substrate. With electronic components Each electrode is connected to an external lead terminal via a bonding wire, and thereafter, the respective sealing materials having the insulating base and the lid adhered to the opposing main surfaces are melted and integrated, and the insulation is performed. An electronic device as a product is obtained by sealing a container including a base and a lid.

【0003】近年、半導体素子等の電子部品の高集積化
に伴い、外部リード端子の多端子化が進んでおり、ま
た、外部リード端子間の間隔も狭くなってきている。し
かしながら上述の電子部品収納用容器では、封止材を溶
融一体化させ絶縁基体と蓋体とから成る容器を封止材を
介して封止する際に、絶縁基体側の封止材の溶融により
絶縁基体の上面の外部リード端子の取着位置が変動して
しまい外部リード端子と絶縁基体との相対的位置決めが
困難となるため、絶縁基体の上面に外部リード端子を固
定する接合材として封止の熱によって軟化溶融しない結
晶質ガラスが使用されている。
In recent years, with the increase in integration of electronic components such as semiconductor elements, the number of external lead terminals has been increased, and the distance between external lead terminals has been reduced. However, in the above electronic component storage container, when the sealing material is melted and integrated to seal the container including the insulating base and the lid via the sealing material, the sealing material on the insulating base side is melted. Since the mounting position of the external lead terminal on the upper surface of the insulating base fluctuates and the relative positioning of the external lead terminal and the insulating base becomes difficult, sealing is performed as a bonding material for fixing the external lead terminal on the upper surface of the insulating base. A crystalline glass that does not soften and melt due to the heat of is used.

【0004】このような結晶質ガラスとしては、一般に
酸化鉛61重量%、酸化亜鉛9.3重量%、酸化硼素8.8重量
%、酸化ジルコニウム9.2重量%および酸化珪素8.4重量
%から成るものが使用されている。
As such a crystalline glass, a glass composed of 61% by weight of lead oxide, 9.3% by weight of zinc oxide, 8.8% by weight of boron oxide, 9.2% by weight of zirconium oxide and 8.4% by weight of silicon oxide is generally used. .

【0005】なお、封止材としては、従来一般に、酸化
鉛56〜66重量%、酸化硼素4〜14重量%、酸化珪素1〜
6重量%および酸化亜鉛0.5〜3重量%を含むガラス成
分に、フィラーとしてコージェライト系化合物を9〜19
重量%、チタン酸錫系化合物を10〜20重量%添加したも
のが使用されていた。
Conventionally, as a sealing material, generally, 56 to 66% by weight of lead oxide, 4 to 14% by weight of boron oxide, and 1 to 14% by weight of silicon oxide
A cordierite compound as a filler is added to a glass component containing 6% by weight and 0.5 to 3% by weight of zinc oxide as a filler.
%, And 10 to 20% by weight of a tin titanate compound has been used.

【0006】しかしながら、従来の鉛硼酸系の結晶質ガ
ラスは1MHzにおける誘電率が18以上と大きく、外部
リード端子間の静電容量が大きくなり、近時の信号の高
速化に伴い静電容量によるノイズの発生が問題となって
きている。また、上記封止材は人体に対し有害である酸
化鉛を主成分としていたため、最近では酸化錫−酸化亜
鉛−燐酸系のガラスにフィラーとして低熱膨張係数のβ
−ユークリプタイト固溶体や溶融石英等を5〜10重量%
添加した鉛を使用しない(鉛フリー)ものが検討されて
いる。
However, the conventional lead borate-based crystalline glass has a large dielectric constant at 1 MHz of 18 or more, and the capacitance between the external lead terminals increases. The generation of noise has become a problem. In addition, since the above-mentioned sealing material mainly contains lead oxide which is harmful to the human body, it has recently been used as a filler for tin oxide-zinc oxide-phosphoric acid-based glass as a filler having a low thermal expansion coefficient β.
-5 to 10% by weight of eucryptite solid solution, fused quartz, etc.
Those that do not use added lead (lead-free) are being studied.

【0007】[0007]

【発明が解決しようとする課題】しかしながら、酸化錫
−酸化亜鉛−燐酸系のガラスにフィラーとして低熱膨張
係数のβ−ユークリプタイト固溶体や溶融石英等を5〜
10重量%添加した封止材は、その熱膨張係数が8.4〜9.6
ppm/℃であり、外部リード端子を形成する鉄−ニッ
ケル−コバルト合金等の金属材料の熱膨張係数(4pp
m/℃)と大きく相違することから、絶縁基体と蓋体と
の間に外部リード端子を挟み込んで封止材を介して接合
させる際、封止材と外部リード端子との間に各々の熱膨
張係数の相違に起因して応力が発生するとともに、その
応力が封止材に作用して封止材にクラックが入ってしま
い、その結果、電子部品収納用容器の気密封止が容易に
破れ、内部に収容する電子部品を長期間にわたり正常、
かつ安定に作動させることができないという問題点を有
していた。
However, a tin oxide-zinc oxide-phosphoric acid based glass having a low thermal expansion coefficient of β-eucryptite solid solution, fused quartz or the like as a filler may be used.
The thermal expansion coefficient of the sealing material to which 10% by weight is added is 8.4 to 9.6.
ppm / ° C., and the coefficient of thermal expansion of a metal material such as an iron-nickel-cobalt alloy forming the external lead terminal (4 pp
m / ° C.), when the external lead terminal is sandwiched between the insulating base and the lid and joined via the sealing material, each heat is generated between the sealing material and the external lead terminal. A stress is generated due to the difference in expansion coefficient, and the stress acts on the sealing material to cause cracks in the sealing material. As a result, the hermetic sealing of the electronic component storage container is easily broken. , The electronic components housed inside are normal for a long time,
In addition, there is a problem that the operation cannot be performed stably.

【0008】そこで、上記問題点を解消するために酸化
錫−酸化亜鉛−燐酸系ガラスにβ−ユークリプタイト固
溶体や溶融石英等のフィラーを50重量%以上添加し、封
止材の熱膨張係数を外部リード端子の熱膨張係数に合わ
せることが考えられる。
In order to solve the above problems, a filler such as a β-eucryptite solid solution or fused quartz is added to a tin oxide-zinc oxide-phosphate glass at 50% by weight or more, and the thermal expansion coefficient of the sealing material is increased. May be adjusted to the coefficient of thermal expansion of the external lead terminal.

【0009】しかしながら、酸化錫−酸化亜鉛−燐酸系
ガラスにβ−ユークリプタイト固溶体や溶融石英等のフ
ィラーを50重量%以上添加すると封止材の流動性が大き
く低下してしまい、その結果、封止材を介しての絶縁基
体と蓋体との接合信頼性が低下し、電子部品収納用容器
の気密封止が容易に破れて内部に収容する電子部品を長
期間にわたって正常、かつ安定に作動させることができ
ないという問題点が誘発されてしまう。
However, if a filler such as β-eucryptite solid solution or fused quartz is added in an amount of 50% by weight or more to the tin oxide-zinc oxide-phosphate glass, the fluidity of the sealing material is greatly reduced. The reliability of bonding between the insulating base and the lid via the sealing material is reduced, and the hermetic sealing of the electronic component storage container is easily broken, and the electronic components housed therein can be normally and stably maintained for a long time. The problem of being unable to operate is induced.

【0010】本発明は、上記問題点に鑑み案出されたも
のであり、その目的は絶縁基体と蓋体とから成る絶縁容
器の内部に電子部品を気密に封止し、電子部品を長期間
にわたり正常、かつ安定に作動させることができる電子
部品収納用容器を提供することにある。
SUMMARY OF THE INVENTION The present invention has been made in view of the above problems, and has as its object to hermetically seal electronic components inside an insulating container comprising an insulating base and a lid, so that the electronic components can be sealed for a long time. An object of the present invention is to provide an electronic component storage container that can be operated normally and stably over a long period of time.

【0011】[0011]

【問題を解決するための手段】本発明の電子部品収納用
容器は、上面に電子部品が搭載される搭載部を有し、か
つこの搭載部周辺に電子部品の各電極が接続される複数
個の外部リード端子が結晶質ガラスから成る接合材を介
して固着されている絶縁基体と、下面外周部に接合材よ
り低い温度で軟化溶融する封止材が被着されている蓋体
とから成り、封止材を加熱溶融させ、絶縁基体と蓋体と
を接合させることによって内部に電子部品を気密に収容
する電子部品収納用容器であって、接合材は五酸化燐30
〜40重量%、一酸化錫47〜60重量%、酸化亜鉛1〜6重
量%、酸化アルミニウム1〜4重量%および酸化珪素1
〜3重量%を含むガラス成分にフィラーとしてコージェ
ライト系化合物を外添加で16〜45重量%添加したものか
ら成り、かつ封止材は五酸化燐35〜55重量%、一酸化錫
20〜40重量%、酸化亜鉛10〜20重量%、酸化アルミニウ
ム2〜4重量%、酸化硼素1〜6重量%および酸化珪素
1〜3重量%を含むガラス成分にフィラーとしてコージ
ェライト系化合物を外添加で16〜45重量%添加したもの
から成ることを特徴とするものである。
An electronic component storage container according to the present invention has a mounting portion on which an electronic component is mounted on an upper surface, and a plurality of electrodes around which the electrodes of the electronic component are connected. An external lead terminal is fixed via a bonding material made of crystalline glass, and a lid body is provided with a sealing material that is softened and melted at a lower temperature than the bonding material on the outer peripheral surface of the lower surface. An electronic component storage container in which an electronic component is hermetically sealed by heat-melting a sealing material and bonding an insulating base and a lid, wherein the bonding material is phosphorus pentoxide 30
-40% by weight, 47-60% by weight of tin monoxide, 1-6% by weight of zinc oxide, 1-4% by weight of aluminum oxide and 1% by weight of silicon oxide
A glass component containing up to 3% by weight of a cordierite-based compound as a filler and 16-45% by weight as a filler, and a sealing material of 35-55% by weight of phosphorus pentoxide, tin monoxide
A cordierite-based compound is added as a filler to a glass component containing 20 to 40% by weight, zinc oxide 10 to 20% by weight, aluminum oxide 2 to 4% by weight, boron oxide 1 to 6% by weight and silicon oxide 1 to 3% by weight. It is characterized by comprising 16-45% by weight in addition.

【0012】また、本発明の電子部品収納用容器は、接
合材および封止材に添加されるフィラーの平均粒径が3
〜9μmであることを特徴とするものである。
Further, the electronic component storage container of the present invention has a filler added to the bonding material and the sealing material having an average particle size of 3%.
99 μm.

【0013】本発明の電子部品収納用容器によれば、接
合材を五酸化燐30〜40重量%、一酸化錫47〜60重量%、
酸化亜鉛1〜6重量%、酸化アルミニウム1〜4重量%
および酸化珪素1〜3重量%を含むガラス成分にフィラ
ーとしてコージェライト系化合物を外添加で16〜45重量
%添加した結晶質ガラスとしたことから、接合材は一旦
結晶化されると600℃程度の極めて高い温度にしない限
り軟化溶融することはなく、その結果、封止材を軟化溶
融して絶縁基体と蓋体とを気密封止する際の熱が接合材
に印加されたとしても、外部リード端子を常に所定位置
に固定しておくことができる。
According to the electronic component storage container of the present invention, the bonding material contains 30 to 40% by weight of phosphorus pentoxide, 47 to 60% by weight of tin monoxide,
1-6% by weight of zinc oxide, 1-4% by weight of aluminum oxide
And a glass component containing 1 to 3% by weight of silicon oxide, and a cordierite-based compound as a filler is added as a filler to a crystalline glass of 16 to 45% by weight. Is not softened and melted unless the temperature is extremely high, and as a result, even if heat is applied to the bonding material when the sealing material is softened and melted to hermetically seal the insulating base and the lid, the external The lead terminal can always be fixed at a predetermined position.

【0014】また、本発明の電子部品収納用容器によれ
ば、接合材および封止材は、その1MHzにおける誘電
率が8程度であり、外部リード端子間の静電容量を低く
することが可能となり、電子部品作動中のノイズによる
誤動作を減少させることができる。
According to the electronic component storage container of the present invention, the bonding material and the sealing material have a dielectric constant of about 8 at 1 MHz, so that the capacitance between the external lead terminals can be reduced. Thus, malfunction due to noise during operation of the electronic component can be reduced.

【0015】さらに、本発明の電子部品収納用容器によ
れば、接合材を五酸化燐30〜40重量%、一酸化錫47〜60
重量%、酸化亜鉛1〜6重量%、酸化アルミニウム1〜
4重量%および酸化珪素1〜3重量%を含むガラス成分
にフィラーとしてのコージェライト系化合物を外添加で
16〜45重量%添加したものとし、かつ封止材を五酸化燐
35〜55重量%、一酸化錫20〜40重量%、酸化亜鉛10〜20
重量%、酸化アルミニウム2〜4重量%、酸化硼素1〜
6重量%および酸化珪素1〜3重量%を含むガラス成分
にフィラーとしてコージェライト系化合物を外添加で16
〜45重量%添加したものとしたことから、接合材および
封止材の熱膨張係数が外部リード端子の熱膨張係数に近
似する5〜7ppm/℃となり、その結果、接合材およ
び封止材を介して絶縁基体と蓋体とを間に外部リード端
子を挟み込んで接合させる際、封止材と外部リード端子
との間に各々の熱膨張係数の相違に起因して応力が発生
することはなく、これによって接合材にクラックが入る
のが有効に防止され、電子部品収納用容器の気密封止を
完全として内部に収容する電子部品を長期間にわたり正
常、かつ安定に作動させることが可能となる。
Further, according to the electronic component storage container of the present invention, the joining material is composed of 30 to 40% by weight of phosphorus pentoxide and 47 to 60% of tin monoxide.
Wt%, zinc oxide 1-6 wt%, aluminum oxide 1-
A cordierite-based compound as a filler is externally added to a glass component containing 4% by weight and 1 to 3% by weight of silicon oxide.
16 to 45% by weight, and the sealing material is phosphorus pentoxide
35-55 wt%, tin monoxide 20-40 wt%, zinc oxide 10-20
Wt%, aluminum oxide 2-4 wt%, boron oxide 1-
A cordierite compound is added as a filler to a glass component containing 6% by weight and 1 to 3% by weight of silicon oxide by external addition.
4545% by weight, the thermal expansion coefficient of the bonding material and the sealing material becomes 577 ppm / ° C. which is close to the thermal expansion coefficient of the external lead terminal. When the insulating base and the cover are joined together with the external lead terminal sandwiched therebetween, no stress is generated between the sealing material and the external lead terminal due to the difference in the coefficient of thermal expansion of each. Thereby, cracks are effectively prevented from being formed in the bonding material, and the electronic components accommodating container can be completely and hermetically sealed, so that the electronic components accommodated therein can operate normally and stably for a long period of time. .

【0016】また、本発明の電子部品収納用容器によれ
ば、封止材において、フィラーとしてのコージェライト
系化合物の添加量を五酸化燐35〜55重量%、一酸化錫20
〜40重量%、酸化亜鉛10〜20重量%、酸化アルミニウム
2〜4重量%、酸化硼素1〜6重量%および酸化珪素1
〜3重量%を含むガラス成分に外添加で16〜45重量%と
少ない添加量としたことから、封止材の流動性が添加さ
れたフィラーによって阻害されることはなく430℃程度
の比較的低い温度での封止が可能となり、その結果、接
合材および封止材を介しての絶縁基体と蓋体との接合信
頼性が極めて高いものとなり、電子部品の気密封止を確
実として電子部品を長期間にわたり正常、かつ安定に作
動させることができる。
According to the electronic component storage container of the present invention, the cordierite compound as a filler is added in an amount of 35 to 55% by weight of phosphorus pentoxide and 20% by weight of tin monoxide.
-40% by weight, zinc oxide 10-20% by weight, aluminum oxide 2-4% by weight, boron oxide 1-6% by weight and silicon oxide 1
The external additive is added to the glass component containing up to 3% by weight to a small amount of 16-45% by weight, so that the fluidity of the sealing material is not hindered by the added filler and is relatively low at about 430 ° C. Sealing can be performed at a low temperature, and as a result, the bonding reliability between the insulating base and the lid via the bonding material and the sealing material is extremely high, and the electronic component can be hermetically sealed. Can be operated normally and stably for a long period of time.

【0017】[0017]

【発明の実施の形態】次に、本発明を添付の図面に基づ
き詳細に説明する。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Next, the present invention will be described in detail with reference to the accompanying drawings.

【0018】図1は本発明の電子部品収納用容器を半導
体素子を収容する半導体素子収容用パッケージに適用し
た場合の実施の形態の一例である。この図において、1
は絶縁基体、2は蓋体、3は外部リード端子であり、絶
縁基体1と蓋体2とで半導体素子5を収容するための容
器6が構成される。
FIG. 1 shows an example of an embodiment in which the container for accommodating an electronic component of the present invention is applied to a package for accommodating a semiconductor element for accommodating a semiconductor element. In this figure, 1
Is an insulating base, 2 is a lid, and 3 is an external lead terminal. The insulating base 1 and the lid 2 constitute a container 6 for housing the semiconductor element 5.

【0019】絶縁基体1は、酸化アルミニウム質焼結体
や窒化アルミニウム質焼結体等の電気絶縁材料から成
り、その上面の略中央部に半導体素子5を収容する空所
を形成するための凹部1aが設けてあり、凹部1aの底
面には半導体素子5がガラスや樹脂・ロウ材等から成る
接着材を介して接着固定される。
The insulating substrate 1 is made of an electrically insulating material such as an aluminum oxide sintered body or an aluminum nitride sintered body, and has a recess for forming a space for accommodating the semiconductor element 5 at a substantially central portion of the upper surface thereof. 1a is provided, and a semiconductor element 5 is bonded and fixed to the bottom surface of the concave portion 1a via an adhesive made of glass, resin, brazing material, or the like.

【0020】絶縁基体1は、例えば酸化アルミニウム質
焼結体から成る場合であれば、酸化アルミニウム・酸化
珪素・酸化マグネシウム・酸化カルシウム等の原料粉末
に適当な有機バインダ・溶剤・可塑剤・分散剤等を添加
混合して泥漿物を作り、この泥漿物を従来周知のドクタ
ーブレード法やカレンダーロール法等のシート成形法を
採用しシート状に成形してセラミックグリーンシート
(セラミック生シート)を得、しかる後、それらセラミ
ックグリーンシートに適当な打ち抜き加工を施すととも
にこれを複数枚積層し、約1600℃の高温で焼成すること
によって、あるいは酸化アルミニウム等の原料粉末に適
当な有機溶剤、溶媒を添加混合して原料粉末を調整する
とともに原料粉末をプレス成形によって所定形状に成形
し、しかる後、成形体を約1600℃の温度で焼成すること
によって製作される。
When the insulating substrate 1 is made of, for example, an aluminum oxide sintered body, an organic binder, a solvent, a plasticizer, and a dispersant suitable for a raw material powder such as aluminum oxide, silicon oxide, magnesium oxide, and calcium oxide. The mixture is added and mixed to form a slurry, and the slurry is formed into a sheet using a sheet forming method such as a doctor blade method or a calender roll method, which is conventionally known, to obtain a ceramic green sheet (ceramic green sheet). Thereafter, the ceramic green sheets are subjected to appropriate punching, and a plurality of the green sheets are laminated and fired at a high temperature of about 1600 ° C., or a suitable organic solvent or solvent is added to a raw material powder such as aluminum oxide and mixed. The raw material powder is adjusted and the raw material powder is formed into a predetermined shape by press molding. Is fired at a temperature of about 1600 ° C.

【0021】また、絶縁基体1の上面には鉄−ニッケル
合金や鉄−ニッケル−コバルト合金等の金属材料から成
る外部リード端子3の一端が結晶質ガラスから成る接合
材4を介して固着されている。外部リード端子3は、鉄
−ニッケル合金等のインゴットを従来周知の圧延加工法
および打ち抜き加工法を採用し所定の板状に形成するこ
とによって製作される。
One end of an external lead terminal 3 made of a metal material such as an iron-nickel alloy or an iron-nickel-cobalt alloy is fixed to the upper surface of the insulating base 1 via a bonding material 4 made of crystalline glass. I have. The external lead terminal 3 is manufactured by forming an ingot of an iron-nickel alloy or the like into a predetermined plate shape using a conventionally known rolling method and punching method.

【0022】外部リード端子3は、内部に収容する半導
体素子5を外部電気回路基板の配線導体(図示せず)に
接続する作用をなし、その一端には半導体素子5の各電
極がボンディングワイヤ8を介して接続され、外部リー
ド端子3を外部電気回基板の配線導体に接続することに
よって半導体素子5は外部電気回路と電気的に接続され
ることとなる。
The external lead terminal 3 serves to connect the semiconductor element 5 housed therein to a wiring conductor (not shown) of an external electric circuit board, and one end of each of the electrodes of the semiconductor element 5 is provided with a bonding wire 8. The semiconductor element 5 is electrically connected to the external electric circuit by connecting the external lead terminal 3 to the wiring conductor of the external electric circuit board.

【0023】なお、外部リード端子3は、その表面にニ
ッケルや金等から成る良導電性で、かつ耐食性に優れた
金属をメッキ法により1〜20μmの厚さに被着させてお
くと外部リード端子3の酸化腐食を有効に防止するとと
もに外部リード端子3と外部電気回路との電気的接続を
良好となすことができる。そのため外部リード端子3
は、その表面にニッケルや金等の金属をメッキ法により
1〜20μmの厚さに被着させておくことが好ましい。
The external lead terminal 3 is formed by coating a metal having good conductivity and excellent corrosion resistance made of nickel, gold or the like to a thickness of 1 to 20 μm on its surface by plating. The oxidation corrosion of the terminal 3 can be effectively prevented, and the electrical connection between the external lead terminal 3 and the external electric circuit can be made good. Therefore, external lead terminal 3
It is preferable that a metal such as nickel or gold is applied to the surface thereof by plating to a thickness of 1 to 20 μm.

【0024】絶縁基体1の上面にリード端子3を固着す
る接合材4は、五酸化燐30〜40重量%、一酸化錫47〜60
重量%、酸化亜鉛1〜6重量%、酸化アルミニウム1〜
4重量%および酸化珪素1〜3重量%を含むガラス成分
にフィラーとしてコージェライト系化合物を外添加で16
〜45重量%添加したものから成り、これに有機バインダ
ーや可塑材・溶剤を添加混合してガラスペーストを作
り、このガラスペーストを従来周知のスクリーン印刷法
により絶縁基体1の上面に印刷塗布するとともに420℃
程度に加熱し軟化溶融させた後、冷却固化させることに
より絶縁基体1の上面に被着される。絶縁基体1への外
部リード端子3の固着は、絶縁基体1の上面に被着され
た接合材4の上に外部リード端子3の一端を載置し500
℃程度の温度に加熱し、接合材4を加熱溶融させ結晶状
態とすることによって行われる。
The bonding material 4 for fixing the lead terminal 3 on the upper surface of the insulating base 1 is composed of 30 to 40% by weight of phosphorus pentoxide and 47 to 60% of tin monoxide.
Wt%, zinc oxide 1-6 wt%, aluminum oxide 1-
A cordierite compound is added as a filler to a glass component containing 4% by weight and 1 to 3% by weight of silicon oxide by external addition.
To about 45% by weight, to which an organic binder, a plasticizer and a solvent are added and mixed to form a glass paste, and the glass paste is printed and coated on the upper surface of the insulating substrate 1 by a conventionally known screen printing method. 420 ° C
After being heated and softened and melted to a certain degree, it is adhered to the upper surface of the insulating base 1 by being cooled and solidified. The external lead terminal 3 is fixed to the insulating base 1 by placing one end of the external lead terminal 3 on a bonding material 4 attached to the upper surface of the insulating base 1.
This is performed by heating to a temperature of about ° C. and heating and melting the bonding material 4 to form a crystalline state.

【0025】また、外部リード端子3が結晶質ガラスか
ら成る接合材4によって固着された絶縁基体1は、蓋体
2の下面に被着させた封止材7を絶縁基体1の上面に載
置し430℃程度に加熱溶融させることによって蓋体2と
接合され、これによって絶縁基体1と蓋体2とから成る
容器6内部に半導体素子5が気密に封止される。
The insulating base 1 to which the external lead terminals 3 are fixed by the bonding material 4 made of crystalline glass is mounted on the upper surface of the insulating base 1 with a sealing material 7 attached to the lower surface of the lid 2. Then, the semiconductor element 5 is heated and melted at about 430 ° C. to be joined to the lid 2, whereby the semiconductor element 5 is hermetically sealed inside the container 6 including the insulating base 1 and the lid 2.

【0026】蓋体2は、絶縁基体1と同様の材料、具体
的には酸化アルミニウム質焼結体や窒化アルミニウム質
焼結体等の電気絶縁材料から成り、例えば酸化アルミニ
ウム質焼結体や窒化アルミニウム質焼結体等の電気絶縁
材料から成る場合は、絶縁基体1と同様の方法によって
製作される。
The lid 2 is made of the same material as the insulating substrate 1, specifically, an electrically insulating material such as an aluminum oxide sintered body or an aluminum nitride sintered body. When it is made of an electrically insulating material such as an aluminum sintered body, it is manufactured by the same method as that for the insulating base 1.

【0027】蓋体2の下面に被着された封止材7は、五
酸化燐35〜55重量%、一酸化錫20〜40重量%、酸化亜鉛
10〜20重量%、酸化アルミニウム2〜4重量%、酸化硼
素1〜6重量%および酸化珪素1〜3重量%を含むガラ
ス成分にフィラーとしてコージェライト系化合物を外添
加で16〜45重量%添加したものから成り、これに有機バ
インダーや可塑材・溶剤を添加混合してガラスペースト
を作り、このガラスペーストを従来周知のスクリーン印
刷法により蓋体2の下面に印刷塗布するとともに、この
ガラスペーストを400℃程度に加熱し軟化溶融させた
後、冷却固化させることにより被着される。
The sealing material 7 attached to the lower surface of the lid 2 is composed of 35 to 55% by weight of phosphorus pentoxide, 20 to 40% by weight of tin monoxide, and zinc oxide.
A cordierite compound is externally added as a filler to a glass component containing 10 to 20% by weight, aluminum oxide 2 to 4% by weight, boron oxide 1 to 6% by weight and silicon oxide 1 to 3% by weight as a filler, and 16 to 45% by weight. An organic binder, a plasticizer, and a solvent are added to and mixed with this to form a glass paste. The glass paste is printed and applied to the lower surface of the lid 2 by a conventionally known screen printing method, and the glass paste is coated with the glass paste. After heating to about 400 ° C to soften and melt, it is applied by cooling and solidifying.

【0028】接合材4および封止材7は、フィラーとし
てコージェライト系化合物を外添加で16〜45重量%添加
したものから成り、その熱膨張係数が5〜7ppm/℃
であり、外部リード端子3の熱膨張係数に近似すること
から接合材4と封止材7とを介して絶縁基体1と蓋体2
とを間に外部リード端子3を挟み込んで接合させる際、
接合材4および封止材7と外部リード端子3との間には
各々の熱膨張係数の相違に起因して大きな応力が発生す
ることはなく、これによって接合材4および封止材7に
クラックが入ることが有効に防止され、容器6の気密封
止を完全として内部に収容する半導体素子5を長期間に
わたり正常、かつ安定に作動させることが可能となる。
The joining material 4 and the sealing material 7 are made of a cordierite compound as a filler to which 16 to 45% by weight is externally added, and have a thermal expansion coefficient of 5 to 7 ppm / ° C.
Since the thermal expansion coefficient of the external lead terminal 3 is close to that of the external lead terminal 3, the insulating base 1 and the lid 2 are interposed via the bonding material 4 and the sealing material 7.
When joining by sandwiching the external lead terminal 3 between
A large stress does not occur between the bonding material 4 and the sealing material 7 and the external lead terminal 3 due to the difference in their respective thermal expansion coefficients. Is effectively prevented, and the container 6 can be completely and hermetically sealed, and the semiconductor element 5 housed therein can be operated normally and stably for a long period of time.

【0029】また、フィラーとしてコージェライト系化
合物の添加量を五酸化燐25〜35重量%、一酸化錫40〜60
重量%、酸化亜鉛1〜6重量%、酸化アルミニウム1〜
4重量%および酸化珪素1〜3重量%を含むガラス成分
に外添加で16〜45重量%と少ない添加量としたことか
ら、封止材7の流動性が添加されたフィラーによって低
下することはなく、その結果、封止材7を介しての絶縁
基体1と蓋体2との接合信頼性は極めて高いものとな
り、半導体素子5の気密封止を確実として半導体素子5
を長期間にわたり正常、かつ安定に作動させることがで
きる。
The amount of the cordierite compound added as a filler is 25 to 35% by weight of phosphorus pentoxide, 40 to 60% of tin monoxide.
Wt%, zinc oxide 1-6 wt%, aluminum oxide 1-
Since the glass composition containing 4% by weight and 1 to 3% by weight of silicon oxide is externally added to a small amount of 16 to 45% by weight, the flowability of the sealing material 7 is not reduced by the added filler. As a result, the joining reliability between the insulating base 1 and the lid 2 via the sealing material 7 is extremely high, and the hermetic sealing of the semiconductor element 5 is ensured.
Can be operated normally and stably for a long period of time.

【0030】さらに、接合材4および封止材7は、それ
ぞれ1MHzにおける誘電率が8程度と低く、外部リー
ド端子3間の静電容量を低くすることが可能となり、半
導体素子5の作動中のノイズによる誤動作を防止するこ
とが可能となり半導体素子5を長期間にわたり正常、か
つ安定に作動させることができる。
Further, the bonding material 4 and the sealing material 7 each have a low dielectric constant of about 8 at 1 MHz, so that the capacitance between the external lead terminals 3 can be reduced. A malfunction due to noise can be prevented, and the semiconductor element 5 can be normally and stably operated for a long time.

【0031】また、接合材4および封止材7は、ともに
鉛を含有していないことから人体に害を与えることはな
く、安心して使用することができる。
Since the bonding material 4 and the sealing material 7 do not contain lead, they do not harm the human body and can be used with confidence.

【0032】なお、接合材4は鉛を含まない結晶質ガラ
スから成り、その組成範囲については本件発明者らの実
験によって、五酸化燐30〜40重量%、一酸化錫47〜60重
量%、酸化亜鉛1〜6重量%、酸化アルミニウム1〜4
重量%および酸化珪素1〜3重量%を含むガラス成分に
フィラーとしてのコージェライト系化合物を外添加で16
〜45重量%添加したものから成り、さらに接合材4中の
コージェライト系化合物フィラーの平均粒径が3〜9μ
mである。
The bonding material 4 is made of a lead-free crystalline glass, and its composition range is determined by experiments of the present inventors to be 30 to 40% by weight of phosphorus pentoxide, 47 to 60% by weight of tin monoxide, Zinc oxide 1-6% by weight, aluminum oxide 1-4
16% by weight of a cordierite-based compound as a filler to a glass component containing 1% by weight and 1 to 3% by weight of silicon oxide.
And the average particle size of the cordierite-based compound filler in the bonding material 4 is 3 to 9 μm.
m.

【0033】接合材4に上述の組成のガラスを使用する
場合、五酸化燐(P25)が30重量%未満であるとガラ
スの溶融結晶化する温度が高くなり外部リード端子3の
表面の酸化腐食が進行し、外部リード端子3と外部電気
回路との良好な電気的接続が困難となる傾向があり、40
重量%を超えると接合材4の耐薬品性が低下し、容器6
の気密封止の信頼性が大きく低下する傾向にある。従っ
て、五酸化燐(P25)は、その量が30〜40重量%の範
囲に特定される。
When glass having the above composition is used as the bonding material 4, if the content of phosphorus pentoxide (P 2 O 5 ) is less than 30% by weight, the temperature at which the glass melts and crystallizes increases, and the surface of the external lead terminal 3 becomes high. Of the external lead terminal 3 and the external electric circuit tend to be difficult to achieve.
If it exceeds 10% by weight, the chemical resistance of the bonding material 4 decreases, and the container 6
, The reliability of hermetic sealing tends to be greatly reduced. Thus, phosphorous pentoxide (P 2 O 5), the amount is specified in the range of 30 to 40 wt%.

【0034】また、一酸化錫(SnO)は、その量が47
重量%未満であるとガラスの溶融結晶化する温度が高く
なり外部リード端子3の表面の酸化腐食が進行し、外部
リード端子3と外部電気回路との良好な電気的接続が困
難となる傾向があり、60重量%を超えると接合材4の耐
薬品性が低下し、容器6の気密封止の信頼性が大きく低
下する傾向にある。従って、一酸化錫(SnO)は、そ
の量が47〜60重量%の範囲に特定される。
The amount of tin monoxide (SnO) is 47
When the content is less than about 10% by weight, the temperature at which the glass melts and crystallizes increases, and the surface of the external lead terminal 3 is oxidized and corroded. If it exceeds 60% by weight, the chemical resistance of the bonding material 4 is reduced, and the reliability of hermetic sealing of the container 6 tends to be greatly reduced. Therefore, tin monoxide (SnO) is specified in the range of 47 to 60% by weight.

【0035】さらに、酸化亜鉛(ZnO)は、その量が
1重量%未満であると接合材4の耐薬品性が低下し、容
器6の気密封止の信頼性が大きく低下する傾向にあり、
6重量%を超えるとガラスの結晶化が進み過ぎて流動性
が低下し、外部リード端子の溶着が困難となる傾向があ
る。従って、酸化亜鉛(ZnO)は、その量が1〜6重
量%の範囲に特定される。
Further, when the amount of zinc oxide (ZnO) is less than 1% by weight, the chemical resistance of the bonding material 4 tends to decrease, and the reliability of hermetic sealing of the container 6 tends to greatly decrease.
If it exceeds 6% by weight, the crystallization of the glass tends to proceed too much, and the fluidity tends to decrease, so that the welding of the external lead terminals tends to be difficult. Therefore, the amount of zinc oxide (ZnO) is specified in the range of 1 to 6% by weight.

【0036】酸化アルミニウム(Al23)は、その量
が1重量%未満であると接合材4の耐湿性が低下し、容
器6の気密封止の信頼性が大きく低下する傾向にあり、
4重量%を超えるとガラスの溶融結晶化する温度が高く
なり外部リード端子3の表面の酸化腐食が進行し、外部
リード端子3と外部電気回路との良好な電気的接続が困
難となる傾向がある。従って、酸化アルミニウム(Al
23)は、その量が1〜4重量%の範囲に特定される。
If the amount of aluminum oxide (Al 2 O 3 ) is less than 1% by weight, the moisture resistance of the bonding material 4 tends to decrease, and the reliability of hermetic sealing of the container 6 tends to decrease significantly.
If the content exceeds 4% by weight, the temperature at which the glass melts and crystallizes increases, and oxidative corrosion of the surface of the external lead terminal 3 progresses, so that good electrical connection between the external lead terminal 3 and the external electric circuit tends to be difficult. is there. Therefore, aluminum oxide (Al
2 O 3 ) is specified in the range of 1 to 4% by weight.

【0037】酸化珪素(SiO2)は、その量が1重量
%未満であると接合材4の熱膨張係数が大きくなって絶
縁基体1および蓋体2の熱膨張係数と外部リード端子3
の熱膨張係数とが大きく相違して、容器6の気密封止の
信頼性が低下してしまう傾向があり、3重量%を超える
とガラスの溶融結晶化する温度が高くなり外部リード端
子3の表面の酸化腐食が進行し、外部リード端子3と外
部電気回路との良好な電気的接続が困難となる傾向があ
る。従って、酸化珪素(SiO2)は、その量が1〜3
重量%の範囲に特定される。
When the amount of silicon oxide (SiO 2 ) is less than 1% by weight, the thermal expansion coefficient of the bonding material 4 increases, and the thermal expansion coefficients of the insulating base 1 and the lid 2 and the external lead terminals 3
Is significantly different from the thermal expansion coefficient of the external lead terminal 3 because the reliability of hermetic sealing of the container 6 tends to decrease. Oxidation corrosion of the surface proceeds, and good electrical connection between the external lead terminal 3 and the external electric circuit tends to be difficult. Therefore, the amount of silicon oxide (SiO 2 ) is 1 to 3
It is specified in the range of weight%.

【0038】また、フィラーとして添加されるコージェ
ライト系化合物は、その量が16重量%未満であると接合
材4のガラスの強度が低下し、容器6の気密封止の信頼
性が大きく低下する傾向があり、45重量%を超えると接
合材4の熱膨張係数が小さくなって絶縁基体1および蓋
体2の熱膨張係数と外部リード端子3の熱膨張係数とが
大きく相違して、容器6の気密封止の信頼性が低下して
しまう傾向がある。従って、コージェライト系化合物
は、その量が16〜45重量%の範囲に特定される。
If the amount of the cordierite-based compound added as a filler is less than 16% by weight, the strength of the glass of the bonding material 4 is reduced, and the reliability of hermetic sealing of the container 6 is greatly reduced. When the content exceeds 45% by weight, the thermal expansion coefficient of the bonding material 4 becomes small, and the thermal expansion coefficients of the insulating base 1 and the lid 2 and the external lead terminal 3 greatly differ from each other. , The reliability of hermetic sealing tends to decrease. Therefore, the cordierite compound is specified in the range of 16 to 45% by weight.

【0039】さらに、フィラーとして添加されるコージ
ェライト系化合物は、その平均粒径が3μm未満である
と接合材4の流動性が低下し、接合材4を介して容器6
を気密封止することが困難となる傾向があり、9μmを
超えると接合材4の強度が低下し、容器6の気密封止の
信頼性が大きく低下する傾向がある。従って、コージェ
ライト系化合物は、その平均粒径を3〜9μmの範囲と
しておくことが好ましい。
Further, if the cordierite compound added as a filler has an average particle size of less than 3 μm, the fluidity of the joining material 4 decreases, and the container 6
Tends to be difficult to hermetically seal, and if it exceeds 9 μm, the strength of the bonding material 4 tends to decrease, and the reliability of hermetic sealing of the container 6 tends to greatly decrease. Therefore, the cordierite-based compound preferably has an average particle size in the range of 3 to 9 μm.

【0040】封止材7は、鉛を含まない低融点ガラスか
ら成り、その組成範囲については本件発明者らの実験に
よって、五酸化燐35〜55重量%、一酸化錫20〜40重量
%、酸化亜鉛10〜20重量%、酸化アルミニウム2〜4重
量%、酸化硼素1〜6重量%および酸化珪素1〜3重量
%を含むガラス成分にフィラーとしてコージェライト系
化合物を外添加で16〜45重量%添加したものから成る。
The sealing material 7 is made of a low-melting glass not containing lead. The composition range of the sealing material 7 was determined by experiments of the present inventors to be 35 to 55% by weight of phosphorus pentoxide, 20 to 40% by weight of tin monoxide, A glass component containing 10 to 20% by weight of zinc oxide, 2 to 4% by weight of aluminum oxide, 1 to 6% by weight of boron oxide, and 1 to 3% by weight of silicon oxide is externally added with a cordierite-based compound as a filler to 16 to 45% by weight. %.

【0041】封止材7に上述の組成のガラスを使用する
場合、五酸化燐(P25)が35重量%未満であるとガラ
スの軟化溶融温度が高くなり、封止材7を軟化溶融させ
る熱によって半導体素子5に特性の劣化を招来してしま
う傾向があり、また55重量%を超えると封止材7の耐薬
品性が低下し、容器6の気密封止の信頼性が大きく低下
する傾向にある。従って、五酸化燐(P25)は、その
量が35〜55重量%の範囲に特定される。
When glass having the above composition is used for the sealing material 7, if the content of phosphorus pentoxide (P 2 O 5 ) is less than 35% by weight, the softening and melting temperature of the glass increases, and the sealing material 7 is softened. The heat to be melted tends to cause deterioration of the characteristics of the semiconductor element 5, and if it exceeds 55% by weight, the chemical resistance of the sealing material 7 deteriorates, and the reliability of hermetic sealing of the container 6 increases. It tends to decrease. Thus, phosphorous pentoxide (P 2 O 5), the amount is specified in the range of 35 to 55 wt%.

【0042】また、一酸化錫(SnO)は、その量が20
重量%未満であるとガラスの軟化溶融温度が高くなり、
封止材7を軟化溶融させる熱によって半導体素子5に特
性の劣化を招来してしまう傾向があり、40重量%を超え
ると封止材7の耐薬品性が低下し、容器6の気密封止の
信頼性が大きく低下する傾向にある。従って、一酸化錫
(SnO)は、その量が20〜40重量%の範囲に特定され
る。
The amount of tin monoxide (SnO) is 20
If the amount is less than 10% by weight, the softening and melting temperature of the glass increases,
The heat of softening and melting the sealing material 7 tends to cause deterioration of the characteristics of the semiconductor element 5, and if it exceeds 40% by weight, the chemical resistance of the sealing material 7 is reduced, and the container 6 is hermetically sealed. Tends to be greatly reduced. Therefore, tin monoxide (SnO) is specified in the range of 20 to 40% by weight.

【0043】さらに、酸化亜鉛(ZnO)は、その量が
10重量%未満であるとガラスの軟化溶融温度が高くな
り、封止材7を軟化溶融させる熱によって半導体素子5
に特性の劣化を招来してしまう傾向があり、20重量%を
超えるとガラスの結晶化が進んで流動性が低下し、封止
材7を介して容器6を気密封止することが困難となる傾
向がある。従って、酸化亜鉛(ZnO)は、その量が10
〜20重量%の範囲に特定される。
Further, the amount of zinc oxide (ZnO) is
If it is less than 10% by weight, the softening and melting temperature of the glass increases, and the heat of softening and melting the sealing material 7 causes the semiconductor element 5 to melt.
If the content exceeds 20% by weight, the crystallization of the glass proceeds and the fluidity decreases, and it is difficult to hermetically seal the container 6 via the sealing material 7. Tend to be. Therefore, zinc oxide (ZnO) has an amount of 10
It is specified in the range of ~ 20% by weight.

【0044】酸化アルミニウム(Al23)は、その量
が1重量%未満であるとガラスの耐湿性が低下し、封止
材7を介して容器6を気密封止する信頼性が低下する傾
向にあり、4重量%を超えるとガラスの軟化溶融温度が
高くなり、封止材7を軟化溶融させる熱によって半導体
素子5に特性の劣化を招来してしまう傾向がある。従っ
て、酸化アルミニウム(Al23)は、その量が1〜4
重量%の範囲に特定される。
If the amount of aluminum oxide (Al 2 O 3 ) is less than 1% by weight, the moisture resistance of the glass decreases, and the reliability of hermetically sealing the container 6 via the sealing material 7 decreases. If the content exceeds 4% by weight, the softening and melting temperature of the glass increases, and the heat of softening and melting the sealing material 7 tends to cause deterioration of the characteristics of the semiconductor element 5. Therefore, the amount of aluminum oxide (Al 2 O 3 ) is 1 to 4
It is specified in the range of weight%.

【0045】酸化硼素(B23)は、その量が1重量%
未満であると封止材7の結晶化が進行し過ぎて、低温で
の気密封止が困難となり、6重量%超えると封止材7の
耐薬品性が劣化し気密封止の信頼性が低下する。従っ
て、酸化硼素(B23)は、その量が1〜6重量%の範
囲に特定される。
The amount of boron oxide (B 2 O 3 ) was 1% by weight.
If the amount is less than the above, crystallization of the sealing material 7 proceeds too much, so that it is difficult to hermetically seal at a low temperature. If the amount exceeds 6% by weight, the chemical resistance of the sealing material 7 is deteriorated and the reliability of the hermetic sealing is reduced. descend. Thus, boron oxide (B 2 O 3), the amount is specified in the range of 1-6 wt%.

【0046】酸化珪素(SiO2)は、その量が1重量
%未満であると封止材7の熱膨張係数が大きくなって絶
縁基体1および蓋体2の熱膨張係数と外部リード端子3
の熱膨張係数とが大きく相違して、容器6の気密封止の
信頼性が低下してしまう傾向があり、3重量%を超える
とガラスの軟化溶融温度が高くなり、封止材7を軟化溶
融させる熱によって半導体素子5に特性の劣化を招来し
てしまう傾向がある。従って、酸化珪素(SiO2
は、その量が1〜3重量%の範囲に特定される。
When the amount of silicon oxide (SiO 2 ) is less than 1% by weight, the thermal expansion coefficient of the sealing material 7 increases, and the thermal expansion coefficients of the insulating base 1 and the lid 2 and the external lead terminals 3
Is significantly different from the thermal expansion coefficient of the container 6, and the reliability of hermetic sealing of the container 6 tends to decrease. If it exceeds 3% by weight, the softening and melting temperature of the glass increases, and the sealing material 7 is softened. The heat to be melted tends to cause deterioration of the characteristics of the semiconductor element 5. Therefore, silicon oxide (SiO 2 )
Is specified in the range of 1 to 3% by weight.

【0047】また、フィラーとして添加されるコージェ
ライト系化合物は、その量が16重量%未満であると封止
材7のガラスの強度が低下し、容器6の気密封止の信頼
性が大きく低下する傾向があり、45重量%を超えると封
止材7の熱膨張係数が小さくなって絶縁基体1および蓋
体2の熱膨張係数と外部リード端子3の熱膨張係数とが
大きく相違して、容器6の気密封止の信頼性が低下して
しまう傾向がある。従って、コージェライト系化合物
は、その量が16〜45重量%の範囲に特定される。
When the amount of the cordierite-based compound added as a filler is less than 16% by weight, the strength of the glass of the sealing material 7 is reduced, and the reliability of hermetic sealing of the container 6 is greatly reduced. When the content exceeds 45% by weight, the thermal expansion coefficient of the sealing material 7 decreases, and the thermal expansion coefficients of the insulating base 1 and the lid 2 and the thermal expansion coefficient of the external lead terminal 3 greatly differ from each other. The reliability of hermetic sealing of the container 6 tends to be reduced. Therefore, the cordierite compound is specified in the range of 16 to 45% by weight.

【0048】さらに、フィラーとして添加されるコージ
ェライト系化合物は、その平均粒径が3μm未満である
と封止材7の流動性が低下し、封止材7を介して容器6
を気密封止することが困難となる傾向があり、9μmを
超えると封止材7の強度が低下し、容器6の気密封止の
信頼性が大きく低下する傾向がある。従って、コージェ
ライト系化合物は、その平均粒径を3〜9μmの範囲と
しておくことが好ましい。
Further, if the cordierite compound added as a filler has an average particle size of less than 3 μm, the fluidity of the sealing material 7 decreases, and the
Tends to be difficult to hermetically seal, and if it exceeds 9 μm, the strength of the sealing material 7 tends to decrease, and the reliability of hermetic sealing of the container 6 tends to greatly decrease. Therefore, the cordierite-based compound preferably has an average particle size in the range of 3 to 9 μm.

【0049】かくして、上述の半導体素子収納用パッケ
ージによれば、半導体素子5を外部回路に電気的に接続
する外部リード端子3が結晶質ガラスから成る接合材4
によって固着された絶縁基体1の搭載部1aに半導体素
子5をガラスや樹脂・ロウ材等の接着材を介して接着固
定するとともに半導体素子5の各電極をボンディングワ
イヤ8により外部リード端子3に接続させ、しかる後、
絶縁基体1と蓋体2との間に外部リード端子3を挟み封
止材7を介して接合させることによって絶縁基体1と蓋
体2とから成る容器6内部に半導体素子5を気密に封止
し、これによって製品としての半導体装置が完成する。
Thus, according to the package for accommodating the semiconductor element described above, the external lead terminal 3 for electrically connecting the semiconductor element 5 to the external circuit is formed by the bonding material 4 made of crystalline glass.
The semiconductor element 5 is bonded and fixed to the mounting portion 1a of the insulating base 1 fixed by the adhesive via an adhesive such as glass, resin or brazing material, and each electrode of the semiconductor element 5 is connected to the external lead terminal 3 by a bonding wire 8. And then
The semiconductor element 5 is hermetically sealed in the container 6 composed of the insulating base 1 and the lid 2 by sandwiching the external lead terminals 3 between the insulating base 1 and the lid 2 and joining them via the sealing material 7. Thus, a semiconductor device as a product is completed.

【0050】なお、本発明は上述の実施例に限定される
ものではなく、本発明の要旨を逸脱しない範囲であれば
種々の変更は可能であり、例えば、上述の実施例では絶
縁基体1の材料として酸化アルミニウム質焼結体を例示
したが、容器の熱放散性が要求される場合には熱伝導率
が高い窒化アルミニウム質焼結体を、また、電気信号の
高速伝播が要求される場合は誘電率の低いムライト質焼
結体を用いるとよい。
It should be noted that the present invention is not limited to the above-described embodiment, and various modifications can be made without departing from the spirit of the present invention. Although the aluminum oxide sintered body is exemplified as the material, an aluminum nitride sintered body having a high thermal conductivity is required when heat dissipation of the container is required, and a high speed propagation of an electric signal is required. It is preferable to use a mullite sintered body having a low dielectric constant.

【0051】[0051]

【発明の効果】本発明の電子部品収納用容器によれば、
接合材を五酸化燐30〜40重量%、一酸化錫47〜60重量
%、酸化亜鉛1〜6重量%、酸化アルミニウム1〜4重
量%および酸化珪素1〜3重量%を含むガラス成分にフ
ィラーとしてコージェライト系化合物を外添加で16〜45
重量%添加した結晶質ガラスとしたことから、接合材は
一旦結晶化されると600℃程度の極めて高い温度にしな
い限り軟化溶融することはなく、その結果、封止材を軟
化溶融して絶縁基体と蓋体とを気密封止する際の熱が接
合材に印加されたとしても、外部リード端子を常に所定
位置に固定しておくことができる。
According to the electronic component storage container of the present invention,
Filler is added to a glass component containing 30 to 40% by weight of phosphorus pentoxide, 47 to 60% by weight of tin monoxide, 1 to 6% by weight of zinc oxide, 1 to 4% by weight of aluminum oxide, and 1 to 3% by weight of silicon oxide. 16-45 by external addition of cordierite compound as
Once the crystalline material is crystallized, it does not soften and melt once it is crystallized unless it is heated to an extremely high temperature of about 600 ° C. As a result, the sealing material softens and melts, and Even when heat is applied to the bonding material when the base and the lid are hermetically sealed, the external lead terminals can always be fixed at predetermined positions.

【0052】また、本発明の電子部品収納用容器によれ
ば、接合材および封止材は、その1MHzにおける誘電
率が8程度であり、外部リード端子間の静電容量を低く
することが可能となり、電子部品作動中のノイズによる
誤動作を減少させることができる。
Further, according to the electronic component housing of the present invention, the bonding material and the sealing material have a dielectric constant of about 8 at 1 MHz, so that the capacitance between the external lead terminals can be reduced. Thus, malfunction due to noise during operation of the electronic component can be reduced.

【0053】さらに、本発明の電子部品収納用容器によ
れば、接合材を五酸化燐30〜40重量%、一酸化錫47〜60
重量%、酸化亜鉛1〜6重量%、酸化アルミニウム1〜
4重量%および酸化珪素1〜3重量%を含むガラス成分
にフィラーとしてのコージェライト系化合物を外添加で
16〜45重量%添加したものとし、かつ封止材を五酸化燐
35〜55重量%、一酸化錫20〜40重量%、酸化亜鉛10〜20
重量%、酸化アルミニウム2〜4重量%、酸化硼素1〜
6重量%および酸化珪素1〜3重量%を含むガラス成分
にフィラーとしてコージェライト系化合物を外添加で16
〜45重量%添加したものとしたことから、接合材および
封止材の熱膨張係数が外部リード端子の熱膨張係数に近
似する5〜7ppm/℃となり、その結果、接合材およ
び封止材を介して絶縁基体と蓋体とを間に外部リード端
子を挟み込んで接合させる際、封止材と外部リード端子
との間に各々の熱膨張係数の相違に起因して応力が発生
することはなく、これによって接合材にクラックが入る
のが有効に防止され、電子部品収納用容器の気密封止を
完全として内部に収容する電子部品を長期間にわたり正
常、かつ安定に作動させることが可能となる。
Further, according to the electronic component storage container of the present invention, the bonding material is composed of 30 to 40% by weight of phosphorus pentoxide and 47 to 60% of tin monoxide.
Wt%, zinc oxide 1-6 wt%, aluminum oxide 1-
A cordierite-based compound as a filler is externally added to a glass component containing 4% by weight and 1 to 3% by weight of silicon oxide.
16 to 45% by weight, and the sealing material is phosphorus pentoxide
35-55 wt%, tin monoxide 20-40 wt%, zinc oxide 10-20
Wt%, aluminum oxide 2-4 wt%, boron oxide 1-
A cordierite compound is added as a filler to a glass component containing 6% by weight and 1 to 3% by weight of silicon oxide.
4545% by weight, the thermal expansion coefficient of the bonding material and the sealing material is 5-7 ppm / ° C. which is close to the thermal expansion coefficient of the external lead terminal. When the external lead terminal is sandwiched between the insulating base and the lid through the intermediary and joined, no stress is generated between the sealing material and the external lead terminal due to the difference in their respective thermal expansion coefficients. Thereby, cracks are effectively prevented from being formed in the bonding material, and the electronic components accommodating container can be completely and hermetically sealed, so that the electronic components accommodated therein can operate normally and stably for a long period of time. .

【0054】また、本発明の電子部品収納用容器によれ
ば、封止材において、フィラーとしてのコージェライト
系化合物の添加量を五酸化燐35〜55重量%、一酸化錫20
〜40重量%、酸化亜鉛10〜20重量%、酸化アルミニウム
2〜4重量%、酸化硼素1〜6重量%および酸化珪素1
〜3重量%を含むガラス成分に外添加で16〜45重量%と
少ない添加量としたことから、封止材の流動性が添加さ
れたフィラーによって阻害されることはなく430℃程度
の比較的低い温度での封止が可能となり、その結果、接
合材および封止材を介しての絶縁基体と蓋体との接合信
頼性が極めて高いものとなり、電子部品の気密封止を確
実として電子部品を長期間にわたり正常、かつ安定に作
動させることができる。
According to the electronic component storage container of the present invention, the cordierite compound as a filler is added in an amount of 35 to 55% by weight of phosphorus pentoxide and 20% of tin monoxide in the sealing material.
-40% by weight, zinc oxide 10-20% by weight, aluminum oxide 2-4% by weight, boron oxide 1-6% by weight and silicon oxide 1
The external additive is added to the glass component containing up to 3% by weight to a small amount of 16-45% by weight, so that the fluidity of the sealing material is not hindered by the added filler and is relatively low at about 430 ° C. Sealing can be performed at a low temperature, and as a result, the bonding reliability between the insulating base and the lid via the bonding material and the sealing material is extremely high, and the electronic component can be hermetically sealed. Can be operated normally and stably for a long period of time.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の電子部品収納容器の実施の形態の一例
を示す断面図である。
FIG. 1 is a cross-sectional view illustrating an example of an embodiment of an electronic component storage container according to the present invention.

【符号の説明】[Explanation of symbols]

1・・・・・・・絶縁基体 1a・・・・・・搭載部 2・・・・・・・蓋体 3・・・・・・・外部リード端子 4・・・・・・・接合材 5・・・・・・・半導体素子 6・・・・・・・容器 7・・・・・・・封止材 DESCRIPTION OF SYMBOLS 1 ... Insulating base 1a ... Mounting part 2 ... Lid 3 ... External lead terminal 4 ... Joining material 5 Semiconductor device 6 Container 7 Sealing material

───────────────────────────────────────────────────── フロントページの続き Fターム(参考) 4G062 AA09 BB01 DA03 DB03 DC01 DD05 DE03 DF01 EA01 EA10 EB01 EC01 ED01 EE01 EF01 EG01 FA01 FB01 FC01 FD01 FE04 FE05 FF01 FG01 FH01 FJ01 FK01 FL01 GA01 GA10 GB01 GC01 GD01 GE01 HH01 HH03 HH05 HH07 HH09 HH11 HH13 HH15 HH17 HH20 JJ01 JJ03 JJ05 JJ07 JJ10 KK01 KK03 KK05 KK07 KK10 MM23 NN32 PP06  ──────────────────────────────────────────────────続 き Continued on the front page F-term (reference) 4G062 AA09 BB01 DA03 DB03 DC01 DD05 DE03 DF01 EA01 EA10 EB01 EC01 ED01 EE01 EF01 EG01 FA01 FB01 FC01 FD01 FE04 FE05 FF01 FG01 FH01 FJ01 FK01 FL01 GA01 H0101 HH07 HH09 HH11 HH13 HH15 HH17 HH20 JJ01 JJ03 JJ05 JJ07 JJ10 KK01 KK03 KK05 KK07 KK10 MM23 NN32 PP06

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 上面に電子部品が搭載される搭載部を有
し、かつ該搭載部周辺に前記電子部品の各電極が接続さ
れる複数個の外部リード端子が結晶質ガラスから成る接
合材を介して固着されている絶縁基体と、下面外周部に
前記接合材より低い温度で軟化溶融する封止材が被着さ
れている蓋体とから成り、前記封止材を加熱溶融させ、
前記絶縁基体と前記蓋体とを接合させることによって内
部に前記電子部品を気密に収容する電子部品収納用容器
であって、前記接合材は五酸化燐30〜40重量%、一
酸化錫47〜60重量%、酸化亜鉛1〜6重量%、酸化
アルミニウム1〜4重量%および酸化珪素1〜3重量%
を含むガラス成分にフィラーとしてコージェライト系化
合物を外添加で16〜45重量%添加したものから成
り、かつ前記封止材は五酸化燐35〜55重量%、一酸
化錫20〜40重量%、酸化亜鉛10〜20重量%、酸
化アルミニウム2〜4重量%、酸化硼素1〜6重量%お
よび酸化珪素1〜3重量%を含むガラス成分にフィラー
としてコージェライト系化合物を外添加で16〜45重
量%添加したものから成ることを特徴とする電子部品収
納用容器。
1. A bonding material having a mounting portion on which an electronic component is mounted on an upper surface, and a plurality of external lead terminals to which each electrode of the electronic component is connected is formed of a crystalline glass around the mounting portion. Insulating base fixed via, and a lid on which a sealing material that softens and melts at a lower temperature than the bonding material is adhered to the lower surface outer peripheral portion, and the sealing material is heated and melted,
An electronic component storage container for hermetically housing the electronic component therein by joining the insulating base and the lid, wherein the joining material is 30 to 40% by weight of phosphorus pentoxide and 47 to 50% of tin monoxide. 60% by weight, zinc oxide 1-6% by weight, aluminum oxide 1-4% by weight and silicon oxide 1-3% by weight
A glass component containing a cordierite-based compound as a filler by 16 to 45% by weight as an external additive, and the sealing material is 35 to 55% by weight of phosphorus pentoxide, 20 to 40% by weight of tin monoxide, A cordierite compound is added as a filler to a glass component containing 10 to 20% by weight of zinc oxide, 2 to 4% by weight of aluminum oxide, 1 to 6% by weight of boron oxide and 1 to 3% by weight of silicon oxide as a filler, and 16 to 45% by weight. %. An electronic component storage container comprising:
【請求項2】 前記フィラーの平均粒径が3〜9μmで
あることを特徴とする請求項1記載の電子部品収納用容
器。
2. The electronic component storage container according to claim 1, wherein the filler has an average particle size of 3 to 9 μm.
JP2001122850A 2001-04-20 2001-04-20 Electronic component storage container Expired - Fee Related JP4514355B2 (en)

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CN108423998A (en) * 2018-05-31 2018-08-21 北京北旭电子材料有限公司 Glass powder composition, glass sealing material and preparation method thereof and battery

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JPH0758231A (en) * 1993-08-11 1995-03-03 Ngk Spark Plug Co Ltd Integrated circuit container main body
JPH0769672A (en) * 1993-06-21 1995-03-14 Corning Inc Lead-free tin phosphate glass
JPH08148593A (en) * 1994-11-22 1996-06-07 Kyocera Corp Semiconductor element storing package
JP2000072479A (en) * 1998-06-19 2000-03-07 Asahi Glass Co Ltd Low melting point glass and its use
JP2000219536A (en) * 1999-01-27 2000-08-08 Asahi Glass Co Ltd Low moisture absorbing glass frit and glass ceramics composition
JP2001031446A (en) * 1999-07-22 2001-02-06 Okuno Chem Ind Co Ltd Low melting point glass composition

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JPH0769672A (en) * 1993-06-21 1995-03-14 Corning Inc Lead-free tin phosphate glass
JPH0758231A (en) * 1993-08-11 1995-03-03 Ngk Spark Plug Co Ltd Integrated circuit container main body
JPH08148593A (en) * 1994-11-22 1996-06-07 Kyocera Corp Semiconductor element storing package
JP2000072479A (en) * 1998-06-19 2000-03-07 Asahi Glass Co Ltd Low melting point glass and its use
JP2000219536A (en) * 1999-01-27 2000-08-08 Asahi Glass Co Ltd Low moisture absorbing glass frit and glass ceramics composition
JP2001031446A (en) * 1999-07-22 2001-02-06 Okuno Chem Ind Co Ltd Low melting point glass composition

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108423998A (en) * 2018-05-31 2018-08-21 北京北旭电子材料有限公司 Glass powder composition, glass sealing material and preparation method thereof and battery
CN108423998B (en) * 2018-05-31 2021-10-08 北京北旭电子材料有限公司 Glass powder composition, glass sealing material, preparation method of glass sealing material and battery

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