JP2002305373A - High-frequency circuit board or antenna substrate, and manufacturing method thereof - Google Patents

High-frequency circuit board or antenna substrate, and manufacturing method thereof

Info

Publication number
JP2002305373A
JP2002305373A JP2001109587A JP2001109587A JP2002305373A JP 2002305373 A JP2002305373 A JP 2002305373A JP 2001109587 A JP2001109587 A JP 2001109587A JP 2001109587 A JP2001109587 A JP 2001109587A JP 2002305373 A JP2002305373 A JP 2002305373A
Authority
JP
Japan
Prior art keywords
metal
layer
metal layer
etching
circuit board
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2001109587A
Other languages
Japanese (ja)
Inventor
Katsuya Yamada
克弥 山田
Takuma Yoshizaka
琢磨 吉坂
Naota Uenishi
直太 上西
Toshihiro Sakamoto
敏宏 坂本
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Electric Fine Polymer Inc
Original Assignee
Sumitomo Electric Fine Polymer Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Electric Fine Polymer Inc filed Critical Sumitomo Electric Fine Polymer Inc
Priority to JP2001109587A priority Critical patent/JP2002305373A/en
Publication of JP2002305373A publication Critical patent/JP2002305373A/en
Pending legal-status Critical Current

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  • Laminated Bodies (AREA)
  • Insulated Metal Substrates For Printed Circuits (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Manufacturing Of Printed Wiring (AREA)

Abstract

PROBLEM TO BE SOLVED: To provide a circuit board or antenna substrate, together with manufacturing methods of them, which can be used in a high-frequency band about 0.5-30 GHz. SOLUTION: The surfaces, of two metal base materials, roughened to Ra0.1-20 μm are jointed directly, or through an anodic oxide coating, to both, upper and lower, surfaces of a dielectrics layer of a fluoro polymer. Thus a dielectrics substrate is provided where a metal layer is provided on both surfaces, with a physical bonding strength 1 kg/cm or higher between the metal layer and the dielectrics layer. The single surface or both surfaces of the metal layer are etched to form a circuit.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、高周波通信装置に
使用される、高周波回路基板あるいはアンテナ基板、及
びそれらの製造方法に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a high-frequency circuit board or an antenna board used for a high-frequency communication device, and a method of manufacturing the same.

【0002】[0002]

【従来の技術】近年、情報通信量は増大する一方であ
り、これに応えるため、マイクロ波、ミリ波といった、
より周波数の大きい領域での通信が盛んになってきて、
高周波領域での使用可能な回路基板やアンテナ基板が求
められている。
2. Description of the Related Art In recent years, the amount of information communication has been increasing.
Communication in the higher frequency area has become popular,
There is a need for a circuit board and an antenna board that can be used in a high frequency range.

【0003】高周波領域での使用が可能な回路基板とし
て、金属基材の、表面粗度がRa0.1μm以上20μm以
下に粗面化されてなる表面上に、直接、過弗素化ポリマ
ーの誘電体層が形成されていて、過弗素化ポリマーの誘
電体層の、金属基材の反対面に、金属の蒸着層を設け、
エッチングにより回路を形成(メタライズ配線)した回
路基板が提案されている。
[0003] As a circuit board that can be used in a high frequency region, a dielectric material of a perfluorinated polymer is directly formed on a surface of a metal substrate having a surface roughness of Ra 0.1 μm or more and 20 μm or less. Providing a vapor deposited layer of metal on the opposite side of the metal substrate of the dielectric layer of the perfluorinated polymer having a layer formed thereon;
A circuit board on which a circuit is formed by etching (metallized wiring) has been proposed.

【0004】[0004]

【発明が解決しようとする課題】前記の回路基板は、過
弗素化ポリマーと金属基板と組み合わせることにより、
誘電体層の厚みを0.1mm以下と十分薄くでき、その
結果、インピーダンスを所定の値に維持したまま、金属
の蒸着層を用いた、配線の高密度化のための、回路の細
線化ができ、0.1mm以下の細い回路でも十分に実用
に供し得るなどの優れた特徴を有している。しかし、一
般に、弗素樹脂による誘電体層の表面を蒸着等でメタラ
イズするのは難しい技術であり、テトラエッチを行った
り、特別の接着剤を用いるなど、大変手間がかかる。ま
た、温、湿度サイクルなどの厳しい環境中での使用によ
る、回路部への一抹の不安がある。0.1mm以下の細
い回路といったところまでは、回路の高密度化の必要は
ないが、もっと手軽に製造でき、0.5〜30GHz程
度の高周波の領域で使用可能で、温、湿度サイクルなど
の厳しい環境中でも安心して使用できる回路基板やアン
テナ基板をという要求も多い。
The above circuit board is formed by combining a perfluorinated polymer with a metal substrate.
The thickness of the dielectric layer can be sufficiently reduced to 0.1 mm or less. As a result, while maintaining the impedance at a predetermined value, it is possible to use a metal vapor deposition layer to reduce the thickness of the circuit to increase the wiring density. It has excellent features such that it can be used practically even with a thin circuit of 0.1 mm or less. However, in general, it is difficult to metallize the surface of the dielectric layer with a fluorine resin by vapor deposition or the like, and it takes a lot of trouble such as performing a tetra-etch or using a special adhesive. In addition, there is anxiety about the circuit part due to use in severe environments such as temperature and humidity cycles. There is no need to increase the density of the circuit up to a thin circuit of 0.1 mm or less, but it can be manufactured more easily and can be used in the high frequency range of about 0.5 to 30 GHz. There are many demands for circuit boards and antenna boards that can be used safely even in harsh environments.

【0005】[0005]

【課題を解決するための手段】本発明は、上述の要求を
考慮したもので、0.5〜30GHz程度の高周波の領
域で使用可能な回路基板あるいはアンテナ基板及び、そ
れらの製造方法を提供するものである。その特徴とする
ところは、過弗素化ポリマーの誘電体層の上下両面に、
2枚の金属基材で、それぞれ、表面粗度がRa0.1μm以
上20μm以下に粗面化されてなる表面を、直接、また
は、陽極酸化皮膜を介して、接合させて、両面に金属層
を有し、金属層と誘電体層との間に、物理的接着力によ
る1kg/cm以上の接着力を有する誘電体基板を作製
し、前記の片面または両面の金属層をエッチングして回
路を形成させることを特徴とする高周波回路基板あるい
はアンテナ基板、およびそれらの製造方法である。
SUMMARY OF THE INVENTION The present invention has been made in view of the above-mentioned requirements, and provides a circuit board or an antenna board which can be used in a high frequency range of about 0.5 to 30 GHz, and a method of manufacturing the same. Things. The feature is that on both upper and lower surfaces of the dielectric layer of perfluorinated polymer,
The two metal bases are joined to each other with the surface roughened to a surface roughness of Ra 0.1 μm or more and 20 μm or less, directly or via an anodic oxide film, to form a metal layer on both surfaces. A dielectric substrate having an adhesive force of 1 kg / cm or more due to physical adhesive force between the metal layer and the dielectric layer, and forming a circuit by etching the one or both metal layers. A high-frequency circuit board or an antenna board, and a method of manufacturing the same.

【0006】[0006]

【発明の実施の形態】本発明の過弗素化ポリマーの誘電
体層としては、PTFE、PFA、FEPのいずれかに
よるもの、若しくはそれらの任意の比率の混合物による
もの、若しくは積層物を用いることができる。誘電体の
厚さは特に限定するものではないが、基板を0.5〜3
0GHz程度の周波数で用いる場合は、0.1〜1.5m
mの厚さが好ましい。また、機械的補強や、熱膨張抑制
を目的として、過弗素化ポリマー中に硝子繊維を配合す
ることもできる。
BEST MODE FOR CARRYING OUT THE INVENTION As the dielectric layer of the perfluorinated polymer of the present invention, any one of PTFE, PFA, FEP, a mixture of any ratio thereof, or a laminate can be used. it can. The thickness of the dielectric is not particularly limited.
0.1 to 1.5 m when used at a frequency of about 0 GHz
m is preferred. Further, glass fibers can be blended in the perfluorinated polymer for the purpose of mechanical reinforcement and suppression of thermal expansion.

【0007】過弗素化ポリマーの誘電体層の上下両面に
形成する金属層に用いる金属としては、アルミニウム、
銅、ステンレス、ニッケルなど、任意の金属を使用する
ことができるが、導電性、加工性、エッチングによる表
面の粗面化形成性から、アルミニウムが好ましい。
The metal used for the metal layers formed on the upper and lower surfaces of the dielectric layer of the perfluorinated polymer is aluminum,
Any metal such as copper, stainless steel, nickel and the like can be used, but aluminum is preferred from the viewpoint of conductivity, workability, and formability of the surface roughened by etching.

【0008】金属基材の粗面化、および/もしくは、陽
極酸化処理は、過弗素化ポリマーとの接着性の点から必
要である。粗面化の程度はRa0.1μm以上必要で、大
きいほど、アンカー効果による接着性の向上が達成され
る。しかし、Ra20μm以上になると伝送ロスが大き
くなる。従って、Ra0.1〜20μmの範囲で粗面化する
必要がある。好ましくは0.5〜5.0μm、より好ましく
は、1.0〜3.0μmの範囲で粗面化するのがよい。粗面化
の手段としては、ブラスト、機械研磨、化学的エッチン
グ、電気化学的エッチングのいずれかもしくはそれらを
任意に組み合わせた方法を用いることができるが、少な
くとも、化学的もしくは電気化学的エッチングを工程中
に用いることが好ましい。もちろん、粗面化により、金
属基材に貫通孔ができては困るので、金属基材は、前記
の粗面化により貫通孔ができない程度の、充分な厚さを
有することが必要である。両面の2枚の金属層の内、片
面のみに回路を形成する場合は、回路を形成しない側の
金属層の厚さは、強度の点から0.1mm以上、さらに
は、0.5〜2mmであることが好ましい。一方、回路
を形成する側の金属層は、エッチングにより回路を形成
するため、厚さは前記の粗面化で貫通孔ができない範囲
で、できるだけ薄い方が好ましい。好ましくは、100
μm以下、さらには、70μm以下が好ましい。
[0008] Roughening and / or anodizing of the metal substrate is necessary from the viewpoint of adhesion to the perfluorinated polymer. The degree of surface roughening is required to be Ra 0.1 μm or more, and the larger the degree, the better the adhesion due to the anchor effect is achieved. However, when Ra is 20 μm or more, transmission loss increases. Therefore, it is necessary to roughen the surface in the range of Ra 0.1 to 20 μm. The surface is preferably roughened in a range of 0.5 to 5.0 μm, more preferably 1.0 to 3.0 μm. As a means for roughening, any one of blasting, mechanical polishing, chemical etching, electrochemical etching or a combination thereof can be used. It is preferable to use it inside. Of course, it is not possible to form a through hole in the metal substrate by roughening. Therefore, the metal substrate needs to have a sufficient thickness to such an extent that a through hole cannot be formed due to the roughening. When a circuit is formed only on one side of the two metal layers on both sides, the thickness of the metal layer on the side on which no circuit is formed is 0.1 mm or more in terms of strength, and further, 0.5 to 2 mm. It is preferred that On the other hand, the metal layer on the circuit forming side forms a circuit by etching. Therefore, it is preferable that the metal layer be as thin as possible within a range where a through hole cannot be formed due to the above-described roughening. Preferably, 100
μm or less, more preferably 70 μm or less.

【0009】陽極酸化処理は、金属基材を強酸に浸漬
し、金属基材の表面を酸化させる処理で、金属基材がア
ルミニウムの場合はアルマイト処理と呼ばれ、硫酸アル
マイト、燐酸アルマイト、蓚酸アルマイトなどがある。
また、粗面化処理をした上に陽極酸化処理をすることに
より、金属基材と過弗素化ポリマーとの接着性を、より
一層向上させることができる。
The anodic oxidation treatment is a treatment in which a metal substrate is immersed in a strong acid to oxidize the surface of the metal substrate. When the metal substrate is aluminum, it is called an alumite treatment. Alumite sulfate, alumite phosphate, and oxalate alumite are used. and so on.
In addition, by performing the anodic oxidation treatment after the surface roughening treatment, the adhesiveness between the metal substrate and the perfluorinated polymer can be further improved.

【0010】過弗素化ポリマーの誘電体層の両面に金属
層を形成する方法は、過弗素化ポリマー層と金属層とを
接着させる通常の方法を用いることができ、特に限定さ
れない。例えば、粗面化した金属表面に直接、または、
陽極酸化処理面を介して、過弗素化ポリマーのシートを
ホットプレスまたは、フィルムラミネートで接合しても
よく、粗面化した金属表面に直接、または、陽極酸化処
理面を介して、フッ素樹脂ディスパージョンを、スピン
コート、スプレーコート、ロールコート、スクリーン印
刷、パッド印刷、インクジェット、粉体静電塗装、湿式
静電塗装などで、コーティング、焼結しておき、このコ
ーティング面どうし、あるいは、それらの間に、過弗素
化ポリマーのシートをサンドイッチ状に挟んで、ホット
プレスまたは、フィルムラミネートで接合してもよい。
The method for forming the metal layers on both sides of the dielectric layer of the perfluorinated polymer can be a conventional method of bonding the perfluorinated polymer layer and the metal layer, and is not particularly limited. For example, directly on a roughened metal surface, or
A sheet of perfluorinated polymer may be joined by hot pressing or film lamination through an anodized surface, directly on the roughened metal surface, or through the anodized surface, John is coated and sintered by spin coating, spray coating, roll coating, screen printing, pad printing, ink jet, powder electrostatic coating, wet electrostatic coating, etc., and this coated surface or In between, a sheet of perfluorinated polymer may be sandwiched and joined by hot pressing or film lamination.

【0011】両面に金属層を有する誘電体基板への回路
形成は、公知の方法、すなわち、回路部分をマスクした
上での溶解エッチングにより行うことができる。両面に
回路を形成してもよく、片面に回路を形成してもよく、
又、多層に積層して用いてもよい。
The formation of a circuit on a dielectric substrate having a metal layer on both sides can be performed by a known method, that is, by dissolving etching after masking the circuit portion. Circuits may be formed on both sides, circuits may be formed on one side,
Moreover, you may laminate | stack and use it in multiple layers.

【0012】[0012]

【実施例】2枚の金属基材として、厚みの厚い方は、厚
さ1.2mmのアルミニウム合金板(神戸製鋼社製AB
S材)を、薄い方は、厚さ60μmのアルミニウム合金
箔(神戸製鋼社製ABS材)を用意した。これらの金属基
材の表面を、7wt%のNH4Cl水溶液中で、23ク
ーロン/cm2の電気量で電気化学エッチングし、さら
に、陽極酸化処理を施しアルマイト層を形成した。
EXAMPLE As the two metal substrates, the thicker one was a 1.2 mm thick aluminum alloy plate (AB manufactured by Kobe Steel, Ltd.).
S material) and a thinner aluminum alloy foil (ABS material manufactured by Kobe Steel) having a thickness of 60 μm was prepared. The surfaces of these metal substrates were electrochemically etched in a 7 wt% NH 4 Cl aqueous solution with an amount of electricity of 23 coulombs / cm 2 , and further subjected to anodizing treatment to form an alumite layer.

【0013】(実施例1)2枚の金属基材を、前記のアル
マイト層を内側に向けて、厚さ0.5mmのPTFEシ
ートを両側からサンドイッチ状に挟み、ホットプレスで
接合して、両面金属基板を得た。続いて、厚さ60μm
のアルミニウム金属箔の側を、溶解エッチングし、ニッ
ケル、金のメッキ積層を行い、誘電特性評価用のリング
共振回路を形成した。
(Example 1) Two metal bases were sandwiched by sandwiching a 0.5 mm thick PTFE sheet from both sides with the alumite layer facing inward, and joined by hot pressing. A metal substrate was obtained. Subsequently, the thickness of 60 μm
The side of the aluminum metal foil was melt-etched and plated with nickel and gold to form a ring resonance circuit for dielectric property evaluation.

【0014】(実施例2)電気化学エッチングし、さら
に陽極酸化処理を施した前記の2枚の金属基材の上に、
PTFEディスバージョン(ダイキン社製D−1F)
を、膜厚が20μmになるようにコーティングした後、
100℃15分乾燥、380℃15分焼結して、2枚の
複合基材を得た。これらの2枚の複合基材を、前記のP
TFEコーティングした面を内側に向けて、厚さ0.5
mmのPTFEシートを両側からサンドイッチ状に挟
み、ホットプレスで接合して、両面金属基板を得た。続
いて、厚さ60μmのアルミニウム金属箔の側を、溶解
エッチングし、ニッケル、金のメッキ積層を行い、誘電
特性評価用のリング共振回路を形成した。
(Example 2) On the above-mentioned two metal substrates subjected to electrochemical etching and further subjected to anodizing treatment,
PTFE disversion (D-1F manufactured by Daikin)
After coating so that the film thickness becomes 20 μm,
After drying at 100 ° C. for 15 minutes and sintering at 380 ° C. for 15 minutes, two composite substrates were obtained. These two composite base materials are combined with the P
With the TFE-coated side facing inward, a thickness of 0.5
mm PTFE sheet was sandwiched from both sides in a sandwich shape and joined by hot pressing to obtain a double-sided metal substrate. Subsequently, the side of the aluminum metal foil having a thickness of 60 μm was melt-etched and plated with nickel and gold to form a ring resonance circuit for dielectric property evaluation.

【0015】こうして作製した (実施例1)、および
(実施例2)のリング共振回路について、電気特性、およ
び、金属層と誘電体層との接着力の測定、ヒートサイク
ルテスト、熱衝撃テストを行った。
(Example 1)
With respect to the ring resonance circuit of (Example 2), the electrical characteristics and the adhesion between the metal layer and the dielectric layer were measured, a heat cycle test, and a thermal shock test were performed.

【0016】電気特性としては、ネットワークアナライ
ザーを用いて、10GHzでの伝送特性を評価した。
As the electrical characteristics, the transmission characteristics at 10 GHz were evaluated using a network analyzer.

【0017】金属層と誘電体層との接着力は次のように
して測定した。金属面に、強力粘着テープを貼りつける
か、または、接着剤で、テープを貼り付けた後、所定の
幅で、誘電体層に達する深さの切り込みを入れ、金属層
が剥離する方向にテープを引っ張って、180°剥離強
度を測定し、幅1cm単位に換算する。
The adhesion between the metal layer and the dielectric layer was measured as follows. After sticking a strong adhesive tape on the metal surface, or pasting the tape with an adhesive, make a cut with a predetermined width and a depth that reaches the dielectric layer, and tape in the direction in which the metal layer is peeled. , And the 180 ° peel strength is measured and converted to a unit of 1 cm in width.

【0018】電気特性、接着力の測定結果を表1に示
す。
Table 1 shows the measurement results of the electrical characteristics and the adhesive strength.

【0019】[0019]

【表1】 [Table 1]

【0020】ヒートサイクルは、気相で、120℃ 2
0分、−30℃ 20分のサイクルを1日20サイクル
繰り返し、これを10日間実施して、200回のヒート
サイクルとした。熱衝撃は、120℃ オイルバスへの
浸漬 10分の直後、ドライアイス−メタノール中に浸
漬することで行った。
The heat cycle is performed in the gas phase at 120 ° C. 2
A cycle of 0 minutes and −30 ° C. for 20 minutes was repeated 20 times a day, and this was performed for 10 days to obtain 200 heat cycles. Thermal shock was performed by immersion in dry ice-methanol immediately after immersion in a 120 ° C. oil bath for 10 minutes.

【0021】前記の、ヒートサイクル、熱衝撃の結果、
実施例1、実施例2ともに、回路の剥離等を生じること
がなかった。また、表1に示された通り、電気特性、接
着力も良好な結果が得られた。
As a result of the above heat cycle and thermal shock,
In both Example 1 and Example 2, peeling off of the circuit did not occur. In addition, as shown in Table 1, good results were obtained in the electrical properties and the adhesive strength.

【0022】[0022]

【発明の効果】本発明の回路基板は、金属層と誘電体層
との接合力が強く、回路形成加工時に剥離等の問題もな
く、PTFEの低誘電率、低誘電損失の特性を充分に活
用でき、0.5〜30GHz程度の周波数の高周波回路
基板として大変好ましい。また、耐環境信頼性も高く、
回路形成後に、回路面を外側にして、基板をR10で曲
げ加工したが、回路の剥離もなく、後加工も可能であ
る。
The circuit board of the present invention has a strong bonding force between the metal layer and the dielectric layer, has no problem such as peeling during the circuit forming process, and has a low dielectric constant and low dielectric loss characteristics of PTFE. It can be utilized and is very preferable as a high frequency circuit board having a frequency of about 0.5 to 30 GHz. In addition, environmental reliability is high,
After the circuit was formed, the substrate was bent at R10 with the circuit surface outside, but the circuit was not peeled off and post-processing was possible.

───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.7 識別記号 FI テーマコート゛(参考) H01P 3/02 H01P 3/02 H05K 1/05 H05K 1/05 A 3/06 3/06 A 3/44 3/44 A (72)発明者 上西 直太 大阪市此花区島屋一丁目1番3号 住友電 気工業株式会社大阪製作所内 (72)発明者 坂本 敏宏 大阪市此花区島屋一丁目1番3号 住友電 気工業株式会社大阪製作所内 Fターム(参考) 4F100 AB01B AB01C AB10B AB10C AB31B AB31C AB33 AK17A AK17D AK18 BA03 BA04 BA06 BA10B BA10C BA13 DD07B DD07C EH462 EJ15B EJ15C EJ151 EJ153 EJ17 EJ42 EJ61B EJ61C EJ611 EJ613 GB41 JG05 JK06 JL01 YY00 YY00B YY00C 5E315 AA03 BB01 BB03 BB14 CC01 CC14 CC25 DD05 DD16 GG14 5E339 AB02 AB07 AD01 BC03 BE11 FF02 FF10 GG01 5E343 AA02 AA22 AA36 AA38 BB05 BB28 BB67 DD76 EE42 EE52 GG04 ──────────────────────────────────────────────────続 き Continued on the front page (51) Int.Cl. 7 Identification symbol FI Theme coat ゛ (Reference) H01P 3/02 H01P 3/02 H05K 1/05 H05K 1/05 A 3/06 3/06 A 3/44 3/44 A (72) Inventor Naota Kaminishi 1-3-1 Shimaya, Konohana-ku, Osaka-shi Sumitomo Electric Industries, Ltd. Osaka Works (72) Inventor Toshihiro Sakamoto 1-1-3, Shimaya, Konohana-ku, Osaka-shi Sumitomo Electric Industries, Ltd. Osaka Works F-term (reference) 4F100 AB01B AB01C AB10B AB10C AB31B AB31C AB33 AK17A AK17D AK18 BA03 BA04 BA06 BA10B BA10C BA13 DD07B DD07C EH462 EJ15B EJ15J EJ15J06 EJ17 EJ17 J06 EJ17 EJ17 EJ17 YY00C 5E315 AA03 BB01 BB03 BB14 CC01 CC14 CC25 DD05 DD16 GG14 5E339 AB02 AB07 AD01 BC03 BE11 FF02 FF10 GG01 5E343 AA02 AA22 AA36 AA38 BB05 BB28 BB67 DD76 EE42 EE52 GG 04

Claims (5)

【特許請求の範囲】[Claims] 【請求項1】 過弗素化ポリマーの誘電体層の上下両面
に、2枚の金属基材で、それぞれ、少なくとも化学的も
しくは電気化学的エッチングを工程中に含む粗面化によ
り、表面粗度がRa0.1μm以上20μm以下に粗面化さ
れてなる表面を、直接接合させて、金属層と誘電体層と
の間に、物理的接着力による1kg/cm以上の接着力
を付与させ、両面に金属層を有する誘電体基板を作製
し、前記の片面または両面の金属層をエッチングして回
路を形成させたことを特徴とする高周波回路基板あるい
はアンテナ基板。
1. Surface roughness of two metal substrates on both upper and lower surfaces of a dielectric layer of a perfluorinated polymer, respectively, by surface roughening including at least chemical or electrochemical etching in the process. The surface roughened to Ra 0.1 μm or more and 20 μm or less is directly joined to give an adhesive force of 1 kg / cm or more due to physical adhesive force between the metal layer and the dielectric layer. A high-frequency circuit board or antenna board, wherein a dielectric substrate having a metal layer is manufactured, and a circuit is formed by etching the one or both metal layers.
【請求項2】 過弗素化ポリマーの誘電体層の上下両面
に、2枚の金属基材で、それぞれ、少なくとも化学的も
しくは電気化学的エッチングを工程中に含む粗面化によ
り、表面粗度がRa0.1μm以上20μm以下に粗面化さ
れてなる表面を、陽極酸化皮膜を介して、接合させて、
金属層と誘電体層との間に、物理的接着力による1kg
/cm以上の接着力を付与させ、両面に金属層を有する
誘電体基板を作製し、前記の片面または両面の金属層を
エッチングして回路を形成させたことを特徴とする高周
波回路基板あるいはアンテナ基板。
2. The surface roughness of two metal substrates on both upper and lower surfaces of a dielectric layer of a perfluorinated polymer, each of which includes at least chemical or electrochemical etching during the process, thereby reducing the surface roughness. Ra0.1μm or more surface roughened to 20μm or less, via an anodized film, bonded,
1 kg due to physical adhesion between metal layer and dielectric layer
A high-frequency circuit board or antenna, wherein a dielectric substrate having a metal layer on both sides is produced by applying an adhesive force of at least / cm, and a circuit is formed by etching the metal layer on one or both sides. substrate.
【請求項3】 金属基材がアルミニウムもしくはアルミ
ニウム合金であることを特徴とする請求項1または請求
項2に記載の高周波回路基板あるいはアンテナ基板。
3. The high-frequency circuit board or antenna board according to claim 1, wherein the metal base is aluminum or an aluminum alloy.
【請求項4】 2枚の金属基材のそれぞれの少なくとも
片面を、それぞれ、少なくとも化学的もしくは電気化学
的エッチングを工程中に含む粗面化により、表面粗度が
Ra0.1μm以上20μm以下に粗面化し、プライマーや
接着剤を介さず、過弗素化ポリマーの誘電体層の上下両
面に接合させて、金属層と誘電体層との間に、物理的接
着力による1kg/cm以上の接着力を付与させ、両面
に金属層を有する誘電体基板を作製し、前記の片面ある
いは両面の金属層をエッチングして回路を形成させるこ
とを特徴とする高周波回路基板あるいはアンテナ基板の
製造方法。
4. The surface roughness of at least one surface of each of the two metal substrates is increased by performing a surface roughening process including at least chemical or electrochemical etching during the process.
Ra Roughened to 0.1μm or more and 20μm or less, bonded to the upper and lower surfaces of the dielectric layer of perfluorinated polymer without using a primer or an adhesive, and the physical adhesion between the metal layer and the dielectric layer A high-frequency circuit board, wherein an adhesive force of 1 kg / cm or more is applied to produce a dielectric substrate having metal layers on both sides, and a circuit is formed by etching the metal layer on one or both sides. A method for manufacturing an antenna substrate.
【請求項5】2枚の金属基材のそれぞれの少なくとも片
面を、それぞれ、少なくとも化学的もしくは電気化学的
エッチングを工程中に含む粗面化により、表面粗度がRa
0.1μm以上20μm以下に粗面化し、その金属面に、
プライマーや接着剤を介さず、過弗素化ポリマーのディ
スパージョンをコーティング、焼結して、金属層とコー
ティング層との間に、物理的接着力による1kg/cm
以上の接着力を付与させた複合基材を2枚作製し、該複
合基材どうしの過弗素化ポリマーのコーティング層を向
かい合わせて、直接、または、他の過弗素化ポリマーの
誘電体層を介して、貼り合せて、両面に金属層を有する
誘電体基板を作製し、前記の片面あるいは両面の金属層
をエッチングして回路を形成させることを特徴とする高
周波回路基板あるいはアンテナ基板の製造方法。
5. The method of claim 1, wherein at least one surface of each of the two metal substrates has a surface roughness of at least one surface by performing at least chemical or electrochemical etching during the process.
The surface is roughened to 0.1 μm or more and 20 μm or less.
Coating and sintering a perfluorinated polymer dispersion without a primer or adhesive, and 1 kg / cm of physical adhesion between metal layer and coating layer
Two composite base materials provided with the above adhesive force are prepared, and the composite base materials are opposed to each other with the perfluorinated polymer coating layer facing each other, or directly or with another dielectric layer of the perfluorinated polymer. Producing a dielectric substrate having a metal layer on both surfaces by etching, and forming a circuit by etching the metal layer on one or both surfaces. .
JP2001109587A 2001-04-09 2001-04-09 High-frequency circuit board or antenna substrate, and manufacturing method thereof Pending JP2002305373A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
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Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2001109587A JP2002305373A (en) 2001-04-09 2001-04-09 High-frequency circuit board or antenna substrate, and manufacturing method thereof

Publications (1)

Publication Number Publication Date
JP2002305373A true JP2002305373A (en) 2002-10-18

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Publication number Priority date Publication date Assignee Title
KR101736554B1 (en) * 2014-12-22 2017-05-17 주식회사 포스코 Structural member and method for manufacturing same
WO2018180866A1 (en) * 2017-03-30 2018-10-04 日本バルカー工業株式会社 Laminate, method for producing same, and gate seal
JP2018171912A (en) * 2017-03-30 2018-11-08 日本バルカー工業株式会社 Laminate and method for producing the same, and gate seal
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US11220089B2 (en) 2017-03-30 2022-01-11 Valqua, Ltd. Laminate, its manufacturing method, and gate seal
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