JP2002264239A - Transparent conductive laminate - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a transparent conductive laminate excellent in transparent conductivity, input durability or the like and also excellent in the uniformity of transparent conductivity especially in the length direction of a long laminate. SOLUTION: The transparent conductive laminate is constituted by laminating a transparent conductive thin film on at least the single surface of a base material comprising a polymeric film. This laminate is a long homogeneous transparent conductive laminate of which the length is at least 3 m or more and, when the values of respective surface resistivities at the respective positions, which are set at a predetermined pitch in the length direction of the laminate at the almost center part in the width direction of the laminate, is set to ti (i: 1, 2, 3, 4...n. 0<=n<=30) and the simple average value of them is set to tAV, the number (m) of the respective surface resistivities ti larger than 1.2 tAV in the ratio of the simple average value tAV and each surface resistivity ti is 0.1 or less as m/n.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a transparent conductive laminate excellent in uniformity of transparent conductivity, and moreover, it is a long product which is industrially manufactured and excellent in quality having uniform transparent conductivity. In addition, the present invention relates to a transparent conductive laminate used particularly for various displays such as a touch panel.

[0002]

2. Description of the Related Art In recent years, displays using a transparent conductive film such as a transparent touch panel using a transparent conductive film have been frequently used. Among them, a transparent touch panel is used to input predetermined information to a computer or the like by pressing a predetermined position with a finger or a pen.

[0003]

When a predetermined position is pressed by a finger or a pen, the contact and non-contact between the transparent conductive layer of the transparent conductive film and the opposing transparent conductive layer are repeatedly performed, thereby causing distortion. Etc., which may cause problems such as the occurrence of Newton rings, and the fact that the contact does not become non-contact even if the finger or pen is released at the time of contact, that is, sticking occurs and cannot withstand use. Was. In addition, due to insufficient adhesion between the coating layer such as an anchor coat layer and the transparent conductive film, and weak film hardness of the organic resin coating layer, the input durability is poor, and particularly the surface roughness is low. In most cases, those having problems such as inferior abrasion resistance, input durability and solvent resistance were found. In addition to the above-mentioned problems, a technique of industrially using a long film as a base material and continuously forming a transparent conductive thin film with a vapor deposition apparatus is frequently used. It is cut to a small area from the body and used for touch panels, etc., but it is obtained when the transparent conductivity of conductivity (surface resistance), which is the most important function of the long transparent conductive laminate, is not uniform. The performance of a touch panel or the like varies and the production efficiency becomes extremely poor, and there is a demand for a long transparent conductive laminate that is uniform, particularly in the length direction, used in various displays such as high quality displays, especially in touch panels. Accordingly, the present invention is to provide a transparent conductive film having excellent transparent conductivity and input durability, and also having excellent uniformity of transparent conductivity in a long laminated body, particularly excellent uniformity in a length direction. It is.

The present invention solves the above-mentioned problems and problems of the conventional products, and has a long size and a uniform transparent conductive characteristic, particularly a uniform quality in the longitudinal direction, which is industrially manufactured. The present invention is to provide a transparent conductive laminate used in a touch panel and the like excellent in, and when the variation of the surface resistance value at a predetermined position in the transparent conductive laminate is not more than a certain value, the touch panel and the like for the first time Was found to be used with high production efficiency in the production of.

[0005]

According to the present invention, there is provided a transparent conductive laminate comprising a transparent conductive thin film (B) laminated on at least one surface of a substrate (A) made of a polymer film. It is a long body having a width of Wcm and a length of 3 m or more, and each surface resistivity at a position substantially at the center of the laminate in the width direction and at each position of the vertical Wcm pitch is represented by ti.
(I represents an integer of 1, 2, 3, 4,... N,
10 ≦ n ≦ 30), and the simple average value is tAV,
In the comparison between the simple average value tAV and each surface resistivity ti, the number m of each surface resistivity ti that is larger than 1.2 tAV
Is a homogeneous long transparent conductive laminate characterized by being 0.1 or less as represented by the relationship m / n with n, and the transparent conductive thin film (B) is made of indium tin・
The transparent conductive thin film is a transparent conductive thin film having a thickness of 10 nm to 200 nm and containing an oxide as a main component. In addition to the transparent conductive thin film (B), an anchor coat layer and a hard coat layer The transparent conductive laminate is formed by laminating an antifouling layer, an antireflection layer, and a transparent plastic thin film layer.

[0006]

BEST MODE FOR CARRYING OUT THE INVENTION The substrate (A) comprising a polymer film in the present invention is not particularly limited as long as it is transparent and can form a transparent conductive thin film (B). However, preferred examples include polyethylene terephthalate film, polyethylene naphthalate film, poly (meth) acrylate film,
Polycarbonate film, polyimide film, polysulfone film, cellulose film such as triacetyl cellulose film and the like, among which transparency, heat resistance, mechanical properties such as strength and elongation, among others,
Polyethylene terephthalate film, polycarbonate film, and films of triacetyl cellulose film are particularly preferred, and these are multi-layer extruded,
It may take a form such as lamination. In addition, when forming these films, lubricants, antioxidants, ultraviolet absorbers, etc. are used in order to improve the film's processability, weather resistance, slip properties, flame retardancy, antibacterial properties, and electrical properties such as antistatic properties. ,
A coloring material such as a filler, an antistatic agent, a flame retardant, an antibacterial agent, and a dye may be added, or these additives may be contained in another resin or the like and applied to the film surface.

In forming the transparent conductive thin film (B) on the film, a pretreatment such as a low-temperature plasma treatment, a corona treatment, a glow discharge treatment, and a surface cleaning treatment such as a pre-cleaning may be performed. In order to improve the adhesion between the transparent conductive thin film (B) and the base film, an anchor coat layer may be formed on the surface of the base film to form the transparent conductive thin film (B). An anchor coat layer may be formed on the opposite surface of the base film. The thickness of these films is 3 to 500 μm.
m, and preferably 4 to 300 μm. The anchor coat layer used in the present invention is not particularly limited in the resin or the like of the layer constitution, but preferably as a layer after formation, it contributes to the improvement of the adhesion to the transparent conductive film and the improvement of the transparency. Further, those having excellent affinity with fine particles are preferable.

The constituents such as the resin forming the anchor coat layer are mainly thermosetting resins or ionizing radiation-curable resins, and are not particularly limited. Melamine resins, acrylate alcohol-modified polyfunctional compounds,
Trimethylolpropane acrylate, tripropylene glycol diacrylate, pentaerythritol triacrylate, 1,6-hexanediol acrylate,
Examples include titanate-based compounds and alkoxysilane hydrolysis-condensation-based resins (siloxane bond-containing resins). Among them, an alkoxysilane hydrolysis-condensation-based component (siloxane bond-containing resin) can be preferably used. The thickness of the anchor coat layer is not particularly limited, but is in the range of 0.02 to 10 μm from the balance between transparency and durability. The ionizing radiation-curable resin is formed from a paint containing at least a resin that is cured by irradiation with an electron beam or ultraviolet rays. Specifically, it contains a photopolymerizable prepolymer, a photopolymerizable monomer, and a photopolymerization initiator, and further contains, if necessary, additives such as a sensitizer, a non-reactive resin, and a leveling agent, and a solvent. It is. In the anchor coat layer, fine particles having an average particle diameter of 1 to 30 nm such as silica or zirconia for preventing the “sticking” of the transparent conductive laminate of the present invention or for preventing the New Wootton ring, etc. 20
Particles having a diameter of nm to 10 μm may be added and contained. The above-mentioned fine particles and particles may be added and contained in a hard coat layer and the like described later.

As the transparent conductive thin film (B) in the present invention, a coating layer mainly composed of an inorganic oxide formed by coating a hydrolyzate such as a metal alkoxide, or a CVD, EB evaporation, It is formed by ion plating, sputtering, or the like, and is made of indium-tin (ITO), ZnO2
System, CdO system, SnO2 system and the like are appropriately selected and used. Above all, indium-tin (ITO) is preferable, and those having a tin content of 3 to 15 mol% in indium-tin (ITO) are particularly preferable. In this indium-tin (ITO), non-tin is preferable. It may be a crystalline one, a crystalline one, or of course, an amorphous-crystalline intermediate (mixed type). The thin film thickness of the transparent conductive thin film (B) in the present invention is not limited as long as the gist of the present invention such as transparency and homogeneity is not impaired, but is preferably about 5 to 300 nm, more preferably 10 nm to 200 nm. is there.

In the present invention, a SiOx layer may be provided on the side opposite to the side on which the transparent conductive thin film (B) is formed on the substrate (A) made of a polymer film, or the substrate made of a polymer film may be provided. (A) Anchor coat layer, SiOx
Layer and the transparent conductive thin film (B) may be provided in this order.
The x layer contributes to improving the transparency, writing durability, and the like of the transparent conductive laminate of the present invention. X of the SiOx layer is preferably 1.5 to 2.0, and its thickness is 2 to 50 n.
m is more preferably 5 to 15 nm. 2n
When it is less than m, the effect of forming the SiOx layer is slight, and when it exceeds 50 nm, there arises a problem that it is difficult to obtain an effect such as a post heat treatment for improving the transparency of the transparent conductive layer (B). It is not economically good. The method for forming the SiOx layer is not particularly limited, and a known method such as an electron beam evaporation method, a heating evaporation method, and a sputtering method is appropriately selected and adopted. By forming the SiOx layer, the transparency of the obtained transparent conductive film is improved and the transparent conductive thin film (B) which can withstand pen input and the like and which is considered to be due to the water vapor barrier property of the SiOx layer is prevented from deteriorating. The durability is also improved, for example, by suppressing it.

[0011] The transparent conductive laminate of the present invention comprises an anchor coat layer, a SiO 2 film and a base film (A) made of a polymer film.
Although it may be obtained by providing the x layer and the transparent conductive thin film (B), a hard coat is applied to the other surface of the base material (A) made of a polymer film on the side where the transparent conductive thin film (B) is provided. A layer may be provided, and an antifouling layer such as a silicon-fluorine type may be provided on the hard coat layer, or a hard coat may be provided between the base (A) made of a polymer film and the anchor coat layer. A coat layer may be provided. In addition to the base (A) made of a polymer film and the transparent conductive thin film (B), an anchor coat layer, a hard coat layer, an antifouling layer, an antireflection layer, a transparent plastic Thin-film layers and other metallic transparent conductive thin films such as metallic palladium, metallic gold, silver,
A thin film of copper, platinum, rhodium or the like may be provided.

The hard coat layer in the present invention has a pencil hardness of H or more.
Although not particularly limited, a resin thermosetting resin, or an ionizing radiation-curable resin may be mentioned, and a melamine-based resin, an acrylate-based alcohol-modified polyfunctional compound, trimethylolpropane acrylate, tripropylene glycol diacrylate, pentaerythritol triacrylate,
Examples thereof include 1,6-hexanediol acrylate, titanate compounds, and alkoxysilane hydrolysis-condensation resins (siloxane bond-containing resins). For example, as a method of forming a hard coat layer using an ionizing radiation paint, a normal coating method, for example, a reverse roll, a bar, a blade,
It can be performed by coating such as spin, gravure, and spray. The antifouling layer referred to in the present invention is a layer having a known water repellency and oil repellency such as a fluorine-containing compound having a thickness of 0.1 mm.
A thickness of about 1 to 100 nm is preferably formed on the outermost layer of the hard coat layer on the opposite side of the transparent conductive thin film forming surface of the transparent conductive laminate. The antireflection layer in the present invention is a layer which is applied as necessary to the transparent conductive laminate of the present invention using a high refractive index layer and a low refractive index layer. For example, ZnO, TiO ₂ , CeO ₂ , SnO ₂ , ZrO ₂ , I
TO or the like may be formed by vapor deposition, sputtering, or the like, or fine particles (particle diameter: 1 to 50 nm) of the metal oxide or the like may be dispersed in a transparent binder resin to be applied and formed, and the thickness is 20 nm to 2 μm. is there. As the low refractive index layer,
It may be formed by vapor deposition, sputtering or the like with a low refractive index such as MgF2 or SiO2, or may be formed by applying a sol such as SiO2, and has a thickness of 50 nm to 2 μm.
m. The transparent plastic thin film layer in the present invention includes an adhesive layer, a pressure-sensitive adhesive layer, a release film and the like which can be formed on the transparent conductive laminate of the present invention as required.

In the transparent conductive laminate of the present invention, wherein a transparent conductive thin film (B) is laminated on at least one surface of a substrate (A) made of a polymer film, the laminate has a width of at least Wcm and a length of 3 m or more. It is a long body (that is, it is different from a short body manufactured in a batch-type and sheet-like system from a size of about A4 to a size of at most A3 at most) at a substantially central portion in the width direction of the laminate. And Wc in the vertical direction
When each surface resistivity at each position in the m pitch is ti (i is an integer of 1, 2, 3, 4,... n and 10 ≦
n ≦ 30, preferably 20 ≦ n ≦ 30),
The simple average value is defined as tAV, and in the comparison between the simple average value tAV and each surface resistivity value ti, the number m of each surface resistivity value ti that is larger than 1.2 tAV is a relation m / n with n. In a homogeneous and long transparent conductive laminate characterized in that it is 0.1 or less when expressed by a long transparent material that is transparent and conductive and has a width of at least W and a length of 3 m or more. The conductive laminate is a homogeneous one having the above-mentioned performance. Here, the long body having a width of at least Wcm and a length of 3 m or more is an industrially produced long transparent conductive laminate, and a substantially central portion in the width direction of the laminate, that is, a width 25c.
In the case of m, the surface resistivity value, which is an index of conductivity at one position (i = 1) at a position of 12.5 cm in the width direction, is measured, and a substantially central portion in the width direction at a pitch of 25 cm in the vertical direction. When each surface resistivity value at each position (i = 2, 3, 4,... N) is measured, each position (i = 2, 3, 4,.
n) are sequentially measured from one position (i = 1) at a pitch of 25 cm in the vertical direction. When each surface resistance value is ti (i is 1, 2, 3, 4,. ≦ n ≦ 30
), The simple average value is defined as tAV, and the simple average value t
1.2 × tA in comparison between AV and each surface resistivity value ti
The number m of each surface resistance value ti greater than V is not more than 0.1 when expressed by m / n. This m / n is preferably 0.07 or less, more preferably 0.05 or less. When m / n is 0.1 or less, the surface resistivity in the whole area of the long transparent conductive laminate falls within an acceptable range in terms of quality. It was found that the resistivity was unacceptable for quality. W in the present invention is 2
~ 210, i.e. the width is 2-210 cm,
The pitch measured in the vertical direction according to this width is also 2-210c
m. Here, 1, 2, 3,
The positions of 4,... N indicate arbitrary continuous positions.

Further, in the transparent conductive laminate in which the transparent conductive thin film (B) is laminated on at least one surface of the substrate (A) made of the polymer film of the present invention, the laminate is preferably formed in any given width direction. Vertical direction W / 1 to divide the body into squares of width W / 10cm x length (length direction) W / 10cm
When a parallel line is drawn at a pitch of 0 cm and a pitch of W / 10 cm in the width direction, and each surface resistivity value of a substantially central portion of each of the squares, which is divided by each parallel line, is defined as tj (j is 1, 2, 3, 4,... N, and 10 ≦ n ≦ 30), and the simple average value is set as tav, and the simple average value tav
And the number p of each surface resistivity tj that is greater than 1.2 tav in comparison with each surface resistivity tj, the number p may be 0.1 or less when expressed by p / n. Transparent conductive laminate. This p / n is preferably 0.07 or less, more preferably 0.05 or less. 1, 2, 3, 4,... Of each j in the transparent conductive laminate
For the position of n, priority is given to taking the total number of the divided squares in one width direction, and when the number is 10 or less, another arbitrary square (preferably a square close to the square).
Is adopted. When the W / 10 cm is less than 1 cm, the measurement of the uniformity in the width direction becomes particularly meaningless.

In the present invention, the surface resistivity is measured, for example, using Loresta MP manufactured by Mitsubishi Chemical Corporation (measuring conditions at a temperature of 20 ° C. and a relative humidity of 65%) according to JIS K.
A method of measuring (in a size of 1 to 8 cm square) according to 7194 can be adopted. Examples of the method for obtaining the transparent conductive laminate of the present invention include, for example, carefully selecting a film having no foreign matter or irregularities of a specific size or more on a substrate (A) made of a polymer film, and a substrate made of a polymer film. (A) is subjected to a cleaning and cleaning treatment before forming the transparent conductive thin film (B), and when forming the transparent conductive thin film (B) on the base material (A) made of a polymer film, Subjecting the substrate (A) made of a film to static elimination, suppressing the scattering of particulate foreign matter from the surface of the metal or metal oxide deposition source, suppressing the rate of forming a thin film from the metal or metal oxide deposition source, Forming a thin transparent film, controlling the winding hardness of the base material (A) made of a long polymer film, and suppressing as much as possible abrasion when manufacturing a long transparent conductive laminate in a roll shape. Long transparent conductive laminate When manufacturing a roll, the hardness of the roll is adjusted so that the transparent conductive thin film (B) is not scratched, the composition of the transparent conductive thin film is made uniform, the thickness of the transparent conductive thin film is made uniform, etc. And the like, but all of them may be employed or some of them may be employed.

Hereinafter, the present invention will be described with reference to examples, but the present invention is not limited to these examples.

EXAMPLES Example 1 Transparent polyethylene terephthalate film with a thickness of 175 μm
Lum width 120cm length 12000m long film
Screen, and then select and remove parts with little wrinkles, foreign matter, surface contamination, etc.
Then, the surface of the film on which the transparent conductive thin film is formed is ultrasonically treated with pure water.
Wash and dry together, clear 70cm wide and 1500m long
Adopted as a film for forming the conductive thin film (B) (A-
1). Of the film (A-1) as the base film
On one side, 50 parts of a hexafunctional acrylate monomer,
31 parts of urethane acrylate, 3 parts of photoinitiator, 1 part of toluene
Hard coating resin binder part
With a Meyer bar so that the thickness of the cured product becomes 3 μm
Apply and dry the solvent.
J / cm^TwoIrradiation and curing to form a hard coat layer
(The pencil hardness of the hard coat layer was 2H). Poly
The hard coat layer of the ethylene terephthalate film
On the opposite side of the surface provided, hydrolyzate of alkoxysilane
(The same siloxane bond-containing resin component content as in Example 1),
Cyclohexanone, methyl isobutyl ketone, average particle size
12nm organosilica sol methyl isobutyl ketone
Dispersion (containing the same siloxane bond-containing resin component as in Example 1)
Amount) (solid content ratio, siloxane bond-containing resin composition)
(Minute: organosilica sol component = 5.2: 4.8 weight ratio)
Is applied with a kiss coat and dried with an anchor having a thickness of 0.02 μm.
Layer was formed. Ra of the anchor layer is 7.57 nm.
(Rz is 56.3 nm, measurement range is 500 μm).
Was. On this anchor coat layer, SiO_Two10nm
A thin film is formed by sputtering,_TwoOn thin film
And an ITO film as a transparent conductive thin film, indium: tin
= 95: 5 (metal, molar ratio)
The vacant room is set to 10-3 Pa, and a mixed gas of Ar and O2 is introduced.
DC sputtering at 2 × 10-1 Pa
And heat-treated at 150 ° C for 24 hours
Thus, a transparent conductive laminate was obtained. This transparent conductive laminate
The total light transmittance was 85.3%. This transparent conductive product
Cut both ends of the layer body in the width direction by 10 cm, and measure the length direction
Cut both ends 10m each, obtained 50cm width
50 cm from one end of the transparent conductive laminate having a length of 1490 m
And the surface resistivity of the center in the width direction of about 25 cm in the width direction
Uses Lorester MP measuring device manufactured by Mitsubishi Chemical Corporation
And measure 5cm x 5cm (temperature 20 ° C, relative humidity
Measurement condition of 65%) and a value tO of 470Ω / □ _Two1 (i
= 1). Hereinafter, 5 in the longitudinal direction at the substantially central position.
The surface resistivity at each position at a 0 cm pitch was measured in the same manner.
ti (i = 2, 3, 4,... n, n is 30) were obtained. This transparent
The tAV of the conductive laminate is 475Ω / □, and 1.2tAV
The number m of ti which is larger than 570Ω / □ is 1
M / n was 0.03. Also, this transparent conductive
Cut out 1m length to the full width of any part of the laminate,
5cm vertical to divide into 5cm x 5cm squares
H, draw parallel lines at 5 cm horizontal pitch
Consecutive one-width section and its division
Select 30 points from consecutive widthwise sections, and select each square
The surface resistivity of each part was measured in the same manner as above, and the surface resistance of each part was measured.
When the drag rate is tj (j is 1, 2, 3, 4,... N)
And n = 20), and its simple average value tav is 475Ω.
/ □, which is larger than 570Ω / □ which is 1.2 tav.
The number p of tj was 1 and p / n was 0.03.
 The resulting transparent conductive laminate is homogeneous throughout
It was found to have a high surface resistivity.

* Example 2 Ra of the anchor layer is 7.12 nm (Rz is 66.3 n)
m, measurement range 500 μm) to obtain a transparent conductive laminate in the same manner as in Example 1. The total light transmittance of the transparent conductive laminate was 85.6%. The obtained transparent conductive laminate was cut into a size of 10 cm × 15 cm,
With two sheets facing the ITO film, fix the ends,
It is fixed on a glass plate and drawn at a speed of 10 cm / sec while pressing with a pressure of 1 kg / cm ² at a circular end (1 cm ² area) of a polyacetal resin rod from the hard coat layer side of one of the polyethylene terephthalate films. did.
No sticking (sticking) between the ITO films due to this drawing was observed, no apparent change in the ITO film was observed, and there was no problem in input durability and solvent resistance. Both ends in the width direction of this transparent conductive laminate are 10 cm
Cut and cut both ends 10m in length direction amount,
Example 1 The surface resistivity of the center of the obtained transparent conductive laminate having a width of 50 cm and a length of 1490 m and approximately 25 cm in the width direction at 50 cm from one end was measured using a Lorester MP measuring device manufactured by Mitsubishi Chemical Corporation. Measurement in the same manner as above (temperature 20 ° C,
Measurement conditions of 65% relative humidity) and a value t1 of 480Ω / □
(I = 1) was obtained. Hereinafter, the surface resistivity of each position was measured at a pitch of 50 cm in the length direction of the substantially central position, and each t was measured.
i (i = 2, 3, 4,... n, n is 30) was obtained. The transparent conductive laminate had a tAV of 481 Ω / □, a number m of ti larger than 577.2 Ω / □, which is 1.2 tAV, was 0, and m / n was 0. Also, the transparent conductive laminate was cut out to a length of 1 m to the entire width at an arbitrary position, and it was cut into 5 cm.
5cm vertical, 5 horizontal to divide into × 5cm squares
Example: A parallel line was drawn at a pitch of cm, and 30 points were selected from a continuous width direction section and a continuous width direction section where the parallel lines were separated by each parallel line, and the individual surface resistivity of each square was determined. 1, and the surface resistivity of each part is defined as tj (j indicates 1, 2, 3, 4,... N, and n
= 20), and its simple average value tav is 480 Ω / □, which is larger than 1.2 tav which is 576 Ω / □.
Was 1 and p / n was 0.03. It was found that the obtained transparent conductive laminate had a uniform surface resistivity over the entire area.

Comparative Example 1 From a long film of transparent polyethylene terephthalate film having a thickness of 175 μm, a width of 120 cm and a length of 12000 m, a portion having little wrinkles, foreign matter, surface dirt and the like was selected, and a width of 7 was selected.
A film having a length of 0 cm and a length of 1500 m was adopted as a film for forming a transparent conductive thin film (B). (A-1) A 70 cm wide and a length of 1500 m was adopted as a film for forming a transparent conductive thin film (B) from the remaining portion (A ′). -1). On one surface of the film (A'-1) as the base film, a coating comprising 50 parts of a hexafunctional acrylate monomer, 31 parts of a bifunctional urethane acrylate, 3 parts of a photoinitiator, and 100 parts of toluene was coated with a hard coat resin binder part. Thickness after curing is 3
After coating with a Mayer bar and drying with a solvent, ultraviolet rays were irradiated at 300 mJ / cm ² with a high-pressure mercury lamp and cured to form a hard coat layer (the pencil hardness of the hard coat layer was 2H. ). On a surface of the polyethylene terephthalate film opposite to the surface on which the hard coat layer was provided, a hydrolyzate of alkoxysilane (the same content of a siloxane bond-containing resin component as in Example 1), cyclohexanone, methyl isobutyl ketone, and an organo with an average particle diameter of 12 nm A mixture of silica sol methyl isobutyl ketone dispersion (the same content of siloxane bond-containing resin component as in Example 1) (solid content ratio, siloxane bond-containing resin component: organosilica sol component = 5.2: 4.8 weight ratio) was kiss-coated. To form an anchor layer having a dry thickness of 0.02 μm. Ra of the anchor layer is 7.57 nm (Rz is 56.5 nm).
3 nm, measurement range 500 μm). This anchor coat layer, to form a thin film by 10nm sputtering of SiO _2, to the SiO ₂ thin film, an ITO film as a transparent conductive film, indium: tin = 95: the target 5 (metal molar ratio) Use, 10- in the vacuum chamber
3 Pa and 2 × while introducing a mixed gas of Ar and O2.
30 nm in thickness by DC sputtering as 10-1 Pa
And heat-treated at 150 ° C. for 24 hours to obtain a transparent conductive laminate. The total light transmittance of this transparent conductive laminate is 8
It was 5.3%. Both ends of the transparent conductive laminate in the width direction are cut out by 10 cm, and both ends in the length direction are cut by 10 m.
50 cm in width and 25 cm in width direction 50 cm from one end of the obtained transparent conductive laminate having a length of 1490 m.
The surface resistivity of the substantially central portion was measured using a Lorester MP measuring device manufactured by Mitsubishi Chemical Corporation in the same manner as in Example 1 (measuring conditions at a temperature of 20 ° C. and a relative humidity of 65%).
The value t1 (i = 1) of Ω / □ was obtained. The surface resistivity of each position was measured at a pitch of 50 cm in the length direction of the substantially central portion, and each ti (i = 2, 3, 4,... N, n was 30) was obtained. The transparent conductive laminate had a tAV of 475 Ω / □, a number m of ti larger than 570 Ω / □ of 1.2 tAV was 4, and m / n was 0.13. In addition, a 1 m length is cut into an arbitrary width of the transparent conductive laminate, and parallel lines are drawn at a pitch of 5 cm in length and a pitch of 5 cm in width in order to divide it into a square of 5 cm × 5 cm. When 30 points were selected from the continuous one width direction section and the continuous width direction section, and each surface resistivity of each square was measured, and the surface resistivity of each portion was defined as tj ( j represents 1, 2, 3, 4,... n
n = 20), and its simple average value tav is 475Ω / □.
And t larger than 570 Ω / □ which is 1.2 tav
The number p of j was 5, and p / n was 0.17. It was found that the obtained transparent conductive laminate had an inhomogeneous surface resistivity.

Touch panels were manufactured using the transparent conductive laminates obtained in Examples and Comparative Examples. When the transparent conductive laminates of Examples were used, the touch panel was manufactured with high production efficiency. When a transparent conductive laminate was used, the performance as a touch panel varied, resulting in extremely low production efficiency.

[0020]

According to the present invention, in the case of a long transparent conductive laminate which can be produced industrially, a uniform transparent conductive film can be obtained by carefully selecting a base film, selecting a manufacturing method, controlling a thin film thickness and the like. It was found that a functional laminate was obtained. It is essential that the uniform long transparent conductive laminate has a surface resistance value variation of a predetermined value or less by a predetermined measurement method, and it can be achieved only by having this performance. did.

Continued on front page F term (reference) 4F100 AA20 AA28B AA33B AK01A AK01E AK25 AK42 AR00D AR00E AT00A BA02 BA03 BA04 BA05 BA10A BA10B BA10C BA10D BA10E CC00C EA02 EH46 EH66 GB41 JA20B JG01 J01JG01 JG01B01 FB16 FB17 FD02 LG02 5G307 FA02 FB01 FC02 FC10

Claims (3)

[Claims] 1. A transparent conductive laminate comprising a transparent conductive thin film (B) laminated on at least one surface of a substrate (A) made of a polymer film, wherein the laminate has a width of at least Wcm.
, And each surface resistivity at each position substantially at the center in the width direction of the laminate and at each position at a vertical Wcm pitch is defined as ti (i is 1, 2, 3 ,
4,... N, where 10 ≦ n ≦ 30), and the simple average value thereof is tAV, and the simple average value tAV is greater than 1.2 tAV in comparison with each surface resistivity ti. A uniform long transparent conductive laminate characterized in that the number m of the surface resistivity ti is 0.1 or less as represented by the relationship m / n with n. 2. The method according to claim 1, wherein the transparent conductive thin film (B) is made of indium.
Thickness mainly composed of tin / oxide 10nm-200nm
The transparent conductive laminate according to claim 1, which is a transparent conductive thin film of (1). 3. The method according to claim 1, wherein an anchor coat layer, a hard coat layer, an antifouling layer, an antireflection layer, and a transparent plastic thin film layer are further laminated in addition to the transparent conductive thin film (B). 3. The transparent conductive laminate according to 2.