JP2002246339A5 - - Google Patents
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- Publication number
- JP2002246339A5 JP2002246339A5 JP2001350635A JP2001350635A JP2002246339A5 JP 2002246339 A5 JP2002246339 A5 JP 2002246339A5 JP 2001350635 A JP2001350635 A JP 2001350635A JP 2001350635 A JP2001350635 A JP 2001350635A JP 2002246339 A5 JP2002246339 A5 JP 2002246339A5
- Authority
- JP
- Japan
- Prior art keywords
- semiconductor substrate
- substrate
- analysis
- back surface
- pad
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000758 substrate Substances 0.000 claims 47
- 239000004065 semiconductor Substances 0.000 claims 34
- 238000004458 analytical method Methods 0.000 claims 20
- 238000000034 method Methods 0.000 claims 8
- 230000001678 irradiating effect Effects 0.000 claims 3
- 238000005498 polishing Methods 0.000 claims 3
- 239000004020 conductor Substances 0.000 claims 1
- 238000005530 etching Methods 0.000 claims 1
- 239000011521 glass Substances 0.000 claims 1
- 238000007517 polishing process Methods 0.000 claims 1
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2001350635A JP2002246339A (ja) | 2000-11-15 | 2001-11-15 | 半導体装置の製造方法 |
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2000347516 | 2000-11-15 | ||
JP2000-347516 | 2000-11-15 | ||
JP2001350635A JP2002246339A (ja) | 2000-11-15 | 2001-11-15 | 半導体装置の製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2002246339A JP2002246339A (ja) | 2002-08-30 |
JP2002246339A5 true JP2002246339A5 (enrdf_load_stackoverflow) | 2005-06-30 |
Family
ID=26603985
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2001350635A Pending JP2002246339A (ja) | 2000-11-15 | 2001-11-15 | 半導体装置の製造方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2002246339A (enrdf_load_stackoverflow) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4596968B2 (ja) * | 2005-05-11 | 2010-12-15 | 株式会社リコー | 半導体装置の不良箇所観察のためのシリコン基板加工方法及び不良箇所特定方法 |
KR100801857B1 (ko) | 2006-08-24 | 2008-02-11 | 피에스케이 주식회사 | 기판 에싱 방법 |
KR101056146B1 (ko) * | 2009-02-23 | 2011-08-10 | 한국기계연구원 | 프로브카드의 전기적 전달특성 측정을 위한 프로브카드 고정장치 |
JP2017028140A (ja) * | 2015-07-24 | 2017-02-02 | 株式会社ディスコ | プラズマ援用加工装置及び加工方法 |
JP7289592B2 (ja) * | 2019-03-26 | 2023-06-12 | 株式会社ディスコ | 検査用基板及び検査方法 |
JP7306566B2 (ja) * | 2020-03-12 | 2023-07-11 | 株式会社島津製作所 | イオン分析装置 |
-
2001
- 2001-11-15 JP JP2001350635A patent/JP2002246339A/ja active Pending
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