JP2002235076A - Transition metal complex and light emission element material comprising the same, and light emission element - Google Patents

Transition metal complex and light emission element material comprising the same, and light emission element

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Publication number
JP2002235076A
JP2002235076A JP2001033684A JP2001033684A JP2002235076A JP 2002235076 A JP2002235076 A JP 2002235076A JP 2001033684 A JP2001033684 A JP 2001033684A JP 2001033684 A JP2001033684 A JP 2001033684A JP 2002235076 A JP2002235076 A JP 2002235076A
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JP
Japan
Prior art keywords
group
light
carbon atoms
transition metal
light emission
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2001033684A
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Japanese (ja)
Other versions
JP3988915B2 (en
Inventor
Tatsuya Igarashi
達也 五十嵐
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Fujifilm Holdings Corp
Original Assignee
Fuji Photo Film Co Ltd
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Priority to JP2001033684A priority Critical patent/JP3988915B2/en
Publication of JP2002235076A publication Critical patent/JP2002235076A/en
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Publication of JP3988915B2 publication Critical patent/JP3988915B2/en
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Abstract

PROBLEM TO BE SOLVED: To obtain a light emission element material which can be used for obtaining light emission elements capable of emitting light in high brightness, to provide the light emission element using the same, and to provide a new transition metal complex which can be used as the light emission element material. SOLUTION: The light emission element material comprises a transition metal complex comprising one or more isonitrile ligands and iridium, ruthenium or rhodium. The transition metal complex is preferably represented by formula 1 [M is indium, ruthenium or rhodium; R11 and R12 are each a substituent; n11 and n12 are each an integer of 0 to 4; L11 is a monovalent ligand]. The light emission element is characterized in that one or more layers among a light emission layer or a plurality of organic compound layers disposed between a pair of electrodes contain the light emission element material.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は電気エネルギーを光
に変換して発光する発光素子に関し、特に表示素子、デ
ィスプレイ、バックライト、電子写真、照明光源、記録
光源、露光光源、読み取り光源、標識、看板、インテリ
ア、光通信デバイス等に好適に使用できる発光素子に関
する。更に本発明はその発光素子に用いる発光素子用材
料、及び該発光素子用材料として使用できる新規遷移金
属錯体に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a light-emitting device which emits light by converting electric energy into light, and more particularly to a display device, a display, a backlight, an electrophotograph, an illumination light source, a recording light source, an exposure light source, a reading light source, a sign, The present invention relates to a light emitting element that can be suitably used for a signboard, an interior, an optical communication device, and the like. Further, the present invention relates to a light emitting device material used for the light emitting device and a novel transition metal complex that can be used as the light emitting device material.

【0002】[0002]

【従来の技術】今日、種々の表示素子に関する研究開発
が活発に行われており、中でも有機電界発光(EL)素子
は低電圧で高輝度の発光が可能であるため注目されてい
る。例えば、有機化合物の蒸着により形成した有機薄膜
を有する発光素子が知られている(アプライド フィジ
ックス レターズ, 51巻, 913頁, 1987年)。この発光
素子は、電子輸送材料(トリス(8-ヒドロキシキノリナ
ト)アルミニウム錯体(Alq))と正孔輸送材料(アミン
化合物)を積層した構造を有し、従来の単層型素子に比
べて大幅に向上した発光特性を示す。
2. Description of the Related Art At present, research and development on various display elements are being actively conducted, and among them, an organic electroluminescent (EL) element has attracted attention because it can emit light with high luminance at a low voltage. For example, a light emitting device having an organic thin film formed by vapor deposition of an organic compound is known (Applied Physics Letters, 51, 913, 1987). This light emitting device has a structure in which an electron transporting material (tris (8-hydroxyquinolinato) aluminum complex (Alq)) and a hole transporting material (amine compound) are laminated, and is much larger than a conventional single-layer device. Shows improved light emission characteristics.

【0003】また、オルトメタル化イリジウム錯体(Ir
(ppy)3:Tris-Ortho-Metalated Complex of Iridium(I
II) with 2-Phenylpyridine)からの発光を利用するこ
とにより、発光特性を改善した緑色発光素子が報告され
ている(Applied Physics Letters, 75, 4 (1999))。
この素子は外部量子収率8%を達しており、従来素子の
限界といわれていた外部量子収率5%を凌駕している
が、発光輝度、耐久性及び発光色の点で改良が求められ
ている。
[0003] Orthometalated iridium complexes (Ir
(ppy) 3 : Tris-Ortho-Metalated Complex of Iridium (I
II) A green light-emitting device having improved light-emitting characteristics by utilizing light emission from with 2-Phenylpyridine) has been reported (Applied Physics Letters, 75, 4 (1999)).
This device has an external quantum yield of 8%, which exceeds the external quantum yield of 5%, which has been regarded as the limit of the conventional device. However, improvements in light emission luminance, durability, and light emission color are required. ing.

【0004】[0004]

【発明が解決しようとする課題】本発明の目的は、高輝
度発光が可能で耐久性に優れた発光素子を得るために使
用する発光素子用材料、それを用いた発光素子、並びに
該発光素子用材料として使用でき、医療用途、蛍光増白
剤、写真用材料、UV吸収材料、レーザー色素、カラーフ
ィルター用染料、色変換フィルター、光学記録材料等に
も適用できる新規遷移金属錯体を提供することである。
SUMMARY OF THE INVENTION An object of the present invention is to provide a light emitting element material used for obtaining a light emitting element capable of emitting light of high luminance and having excellent durability, a light emitting element using the same, and the light emitting element. To provide new transition metal complexes that can be used as medical materials, optical brighteners, photographic materials, UV-absorbing materials, laser dyes, dyes for color filters, color conversion filters, optical recording materials, etc. It is.

【0005】[0005]

【課題を解決するための手段】上記目的に鑑み鋭意研究
の結果、本発明者は、特定の構造を有する遷移金属錯体
を発光素子用材料として使用した発光素子は高輝度発光
が可能であり、且つ耐久性に優れていることを発見し、
本発明に想到した。
As a result of intensive studies in view of the above-mentioned objects, the present inventors have found that a light-emitting element using a transition metal complex having a specific structure as a material for a light-emitting element can emit light with high luminance. And found that it has excellent durability,
The present invention has been made.

【0006】本発明の発光素子用材料は、イソニトリル
配位子、並びにイリジウム、ルテニウム及びロジウムか
らなる群から選ばれる遷移金属を含有する遷移金属錯体
からなることを特徴とする。
[0006] The material for a light emitting device of the present invention is characterized by comprising a transition metal complex containing an isonitrile ligand and a transition metal selected from the group consisting of iridium, ruthenium and rhodium.

【0007】上記遷移金属錯体は下記一般式(2)により
表されるのが好ましい。
The above transition metal complex is preferably represented by the following general formula (2).

【化3】 一般式(2)中、Mはイリジウム、ルテニウム又はロジウム
であり、R21は置換基を表し、L21は配位子を表し、X21
は対イオンを表す。n21は0〜5の整数を表し、n22は1
〜6の整数を表し、n23は0〜3の整数を表す。
Embedded image In the general formula (2), M is iridium, ruthenium or rhodium, R 21 represents a substituent, L 21 represents a ligand, X 21
Represents a counter ion. n21 represents an integer of 0 to 5;
And n23 represents an integer of 0 to 3.

【0008】本発明の発光素子は一対の電極間に、発光
層又は発光層を含む複数の有機化合物層を有し、この発
光層又は複数の有機化合物層のうち少なくとも一層が上
記発光素子用材料を含有することを特徴とする。発光素
子用材料を含有する層は塗布プロセスで成膜するのが特
に好ましい。
The light-emitting device of the present invention has a light-emitting layer or a plurality of organic compound layers including the light-emitting layer between a pair of electrodes, and at least one of the light-emitting layer and the plurality of organic compound layers is the material for the light-emitting device. It is characterized by containing. The layer containing the light emitting element material is particularly preferably formed by a coating process.

【0009】また、本発明の遷移金属錯体は下記一般式
(1)で表されることを特徴とする。
The transition metal complex of the present invention has the following general formula:
It is characterized by being represented by (1).

【化4】 一般式(1)中、Mはイリジウム、ルテニウム又はロジウム
であり、R11、R12及びR13はそれぞれ置換基を表し、n11
及びn12はそれぞれ0〜4の整数を表し、L11は1価の配
位子を表す。この遷移金属錯体は発光素子用材料として
使用でき、医療用途、蛍光増白剤、写真用材料、UV吸収
材料、レーザー色素、カラーフィルター用染料、色変換
フィルター、光学記録材料等にも適用できる。
Embedded image In the general formula (1), M is iridium, ruthenium or rhodium, R 11 , R 12 and R 13 each represent a substituent, n11
And n12 each represents an integer of 0 to 4, L 11 represents a monovalent ligand. The transition metal complex can be used as a material for a light emitting device, and can be applied to medical uses, optical brighteners, photographic materials, UV absorbing materials, laser dyes, dyes for color filters, color conversion filters, optical recording materials, and the like.

【0010】[0010]

【発明の実施の形態】[1]発光素子用材料 本発明の発光素子用材料はイソニトリル配位子及び遷移
金属を含有する遷移金属錯体からなる。遷移金属錯体は
遷移金属原子を複数含んでいてもよく、即ち、いわゆる
複核錯体であってよい。この場合、複数の遷移金属原子
は同じでも異なっていてもよい。遷移金属の少なくとも
1つはイリジウム、ルテニウム及びロジウムからなる群
から選ばれるが、他の金属イオンを同時に含有していて
もよい。遷移金属原子は好ましくはイリジウム又はルテ
ニウムであり、より好ましくはイリジウムである。
BEST MODE FOR CARRYING OUT THE INVENTION [1] Material for Light Emitting Device The material for a light emitting device of the present invention comprises a transition metal complex containing an isonitrile ligand and a transition metal. The transition metal complex may include a plurality of transition metal atoms, that is, may be a so-called binuclear complex. In this case, the plurality of transition metal atoms may be the same or different. At least one of the transition metals is selected from the group consisting of iridium, ruthenium and rhodium, but may contain other metal ions at the same time. The transition metal atom is preferably iridium or ruthenium, more preferably iridium.

【0011】本発明で用いる遷移金属錯体は、イソニト
リル配位子以外に、他の配位子を有していてもよい。他
の配位子は特に限定されず、例えばH.Yersin著「Photoc
hemistry and Photophysics of Coordination Compound
s」, Springer-Verlag社(1987年)、山本明夫著「有機
金属化学−基礎と応用−」, 裳華房社(1982年)等に記
載の配位子が使用できる。中でも、ハロゲン配位子(塩
素配位子等)、含窒素ヘテロ環配位子(ビピリジル系配
位子、フェナントロリン系配位子、フェニルピリジン系
配位子等)、ジケトン配位子、ニトリル配位子、CO配位
子、リン配位子(ホスフィン系配位子、亜リン酸エステ
ル系配位子、ホスフィニン系配位子等)、及びカルボン
酸配位子(酢酸配位子等)が好ましい。
The transition metal complex used in the present invention may have another ligand in addition to the isonitrile ligand. Other ligands are not particularly limited. For example, Photoc by H. Yersin
hemistry and Photophysics of Coordination Compound
s ", Springer-Verlag (1987), Akio Yamamoto," Organic Metal Chemistry-Fundamentals and Applications-", and ligands described in Shokabosha (1982) can be used. Among them, halogen ligands (such as chlorine ligands), nitrogen-containing heterocyclic ligands (such as bipyridyl-based ligands, phenanthroline-based ligands, and phenylpyridine-based ligands), diketone ligands, and nitrile ligands Ligands, CO ligands, phosphorus ligands (phosphine-based ligands, phosphite-based ligands, phosphinine-based ligands, etc.), and carboxylic acid ligands (acetate-based ligands, etc.) preferable.

【0012】遷移金属錯体は複数種の配位子を含んでい
てもよいが、好ましくは1〜3種類、より好ましくは1
又は2種類の配位子を含む。
The transition metal complex may contain a plurality of kinds of ligands, but is preferably one to three kinds, more preferably one.
Or it contains two kinds of ligands.

【0013】遷移金属錯体は中性錯体であっても、対イ
オンを有するイオン性錯体であってもよい。対イオンは
特に限定されず、好ましくはアルカリ金属イオン、アル
カリ土類金属イオン、ハロゲンイオン、パークロレート
イオン、PF6イオン、アンモニウムイオン(テトラメチ
ルアンモニウムイオン等)、ボレートイオン又はホスホ
ニウムイオンであり、より好ましくはパークロレートイ
オン又はPF6イオンである。遷移金属錯体は中性金属錯
体であることが好ましい。
The transition metal complex may be a neutral complex or an ionic complex having a counter ion. Counterion is not particularly limited, but is preferably an alkali metal ion, alkaline earth metal ions, halogen ions, perchlorate ion, PF 6 ion, an ammonium ion (tetramethylammonium ion, etc.), borate ion or phosphonium ion, and more preferably a perchlorate ion or PF 6 ion. The transition metal complex is preferably a neutral metal complex.

【0014】本発明で用いる遷移金属錯体は、好ましく
は下記一般式(2)で表され、より好ましくは下記一般式
(1)で表される。
The transition metal complex used in the present invention is preferably represented by the following general formula (2), more preferably the following general formula:
It is represented by (1).

【0015】[0015]

【化5】 Embedded image

【0016】[0016]

【化6】 Embedded image

【0017】以下一般式(2)について説明する。一般式
(2)中、Mはイリジウム、ルテニウム又はロジウムであ
り、R21は後述のR11と同義であり、好ましい範囲も同じ
である。L21は配位子を表し、該配位子の例としては、
上記イソニトリル配位子以外の「他の配位子」の例とし
て示したもの等が挙げられる。L21は好ましくはハロゲ
ン配位子(塩素配位子等)、含窒素ヘテロ環配位子(ビ
ピリジル系配位子、フェナントロリン系配位子、フェニ
ルピリジン系配位子等)、ジケトン配位子、ニトリル配
位子、CO配位子、リン配位子(ホスフィン系配位子、亜
リン酸エステル系配位子、ホスフィニン系配位子等)、
又はカルボン酸配位子(酢酸配位子等)である。X21
対イオンを表す。対イオンX21は特に限定されないが、
好ましくはアルカリ金属イオン、アルカリ土類金属イオ
ン、ハロゲンイオン、パークロレートイオン、PF6イオ
ン、アンモニウムイオン(テトラメチルアンモニウムイ
オン等)、ボレートイオン又はホスホニウムイオンであ
り、より好ましくはパークロレートイオン又はPF6イオ
ンである。
The general formula (2) will be described below. General formula
In (2), M is iridium, ruthenium or rhodium, R 21 has the same meaning as R 11 described below, and the preferred range is also the same. L 21 represents a ligand, and examples of the ligand include:
Examples of the “other ligand” other than the above-mentioned isonitrile ligand include those described above. L 21 is preferably a halogen ligand (eg, a chlorine ligand), a nitrogen-containing heterocyclic ligand (eg, a bipyridyl-based ligand, a phenanthroline-based ligand, a phenylpyridine-based ligand), or a diketone ligand. , Nitrile ligand, CO ligand, phosphorus ligand (phosphine-based ligand, phosphite-based ligand, phosphinine-based ligand, etc.),
Or a carboxylic acid ligand (acetic acid ligand or the like). X 21 represents a counter ion. The counter ion X 21 is not particularly limited,
Preferably an alkali metal ion, alkaline earth metal ions, halogen ions, perchlorate ion, PF 6 ion, an ammonium ion (tetramethylammonium ion, etc.), borate ion or phosphonium ion, more preferably perchlorate ion or PF 6 It is an ion.

【0018】n21は0〜5の整数を表し、1〜3の整数
であるのが好ましい。n21が2以上のとき、複数のL21
同じであっても異なっていてもよい。n22は1〜6の整
数を表し、1〜4の整数であるのが好ましい。n22が2
以上のとき、複数のイソニトリル配位子は同じであって
も異なっていてもよい。n23は0〜3の整数を表し、0
又は1であるのが好ましい。n23が2又は3のとき、複
数のX21は同じであっても異なっていてもよい。n21、n2
2及びn23は、本発明の発光素子用材料として用いる遷移
金属錯体が中性錯体となるような組み合わせであるのが
好ましい。
N21 represents an integer of 0 to 5, preferably an integer of 1 to 3. When n21 is 2 or more, a plurality of L 21 may be different even in the same. n22 represents an integer of 1 to 6, and is preferably an integer of 1 to 4. n22 is 2
At this time, the plurality of isonitrile ligands may be the same or different. n23 represents an integer of 0 to 3;
Or 1 is preferred. When n23 is 2 or 3, a plurality of X 21 may be different even in the same. n21, n2
It is preferable that 2 and n23 are a combination such that the transition metal complex used as the material for a light emitting device of the present invention becomes a neutral complex.

【0019】以下一般式(1)について説明する。一般式
(1)中、Mはイリジウム、ルテニウム又はロジウムであ
り、R11、R12及びR13はそれぞれ置換基を表す。該置換
基の例としては、アルキル基(好ましくは炭素数1〜3
0、より好ましくは炭素数1〜20、特に好ましくは炭素
数1〜10であり、例えばメチル基、エチル基、イソプロ
ピル基、t-ブチル基、n-オクチル基、n-デシル基、n-ヘ
キサデシル基、シクロプロピル基、シクロペンチル基、
シクロヘキシル基等)、アルケニル基(好ましくは炭素
数2〜30、より好ましくは炭素数2〜20、特に好ましく
は炭素数2〜10であり、例えばビニル基、アリル基、2-
ブテニル基、3-ペンテニル基等)、アルキニル基(好ま
しくは炭素数2〜30、より好ましくは炭素数2〜20、特
に好ましくは炭素数2〜10であり、例えばプロパルギル
基、3-ペンチニル基等)、アリール基(好ましくは炭素
数6〜30、より好ましくは炭素数6〜20、特に好ましく
は炭素数6〜12であり、例えばフェニル基、p-メチルフ
ェニル基、ナフチル基、アンスリル基、フェナンスリル
基、ピレニル基等)、アミノ基(好ましくは炭素数0〜
30、より好ましくは炭素数0〜20、特に好ましくは炭素
数0〜10であり、例えばアミノ基、メチルアミノ基、ジ
メチルアミノ基、ジエチルアミノ基、ジベンジルアミノ
基、ジフェニルアミノ基、ジトリルアミノ基等)、アル
コキシ基(好ましくは炭素数1〜30、より好ましくは炭
素数1〜20、特に好ましくは炭素数1〜10であり、例え
ばメトキシ基、エトキシ基、ブトキシ基、2-エチルヘキ
シロキシ基等)、アリールオキシ基(好ましくは炭素数
6〜30、より好ましくは炭素数6〜20、特に好ましくは
炭素数6〜12であり、例えばフェニルオキシ基、1-ナフ
チルオキシ基、2-ナフチルオキシ基等)、ヘテロアリー
ルオキシ基(好ましくは炭素数1〜30、より好ましくは
炭素数1〜20、特に好ましくは炭素数1〜12であり、例
えばピリジルオキシ基、ピラジルオキシ基、ピリミジル
オキシ基、キノリルオキシ基等)、アシル基(好ましく
は炭素数1〜30、より好ましくは炭素数1〜20、特に好
ましくは炭素数1〜12であり、例えばアセチル基、ベン
ゾイル基、ホルミル基、ピバロイル基等)、アルコキシ
カルボニル基(好ましくは炭素数2〜30、より好ましく
は炭素数2〜20、特に好ましくは炭素数2〜12であり、
例えばメトキシカルボニル基、エトキシカルボニル基
等)、アリールオキシカルボニル基(好ましくは炭素数
7〜30、より好ましくは炭素数7〜20、特に好ましくは
炭素数7〜12であり、例えばフェニルオキシカルボニル
基等)、アシルオキシ基(好ましくは炭素数2〜30、よ
り好ましくは炭素数2〜20、特に好ましくは炭素数2〜
10であり、例えばアセトキシ基、ベンゾイルオキシ基
等)、アシルアミノ基(好ましくは炭素数2〜30、より
好ましくは炭素数2〜20、特に好ましくは炭素数2〜10
であり、例えばアセチルアミノ基、ベンゾイルアミノ基
等)、アルコキシカルボニルアミノ基(好ましくは炭素
数2〜30、より好ましくは炭素数2〜20、特に好ましく
は炭素数2〜12であり、例えばメトキシカルボニルアミ
ノ基等)、アリールオキシカルボニルアミノ基(好まし
くは炭素数7〜30、より好ましくは炭素数7〜20、特に
好ましくは炭素数7〜12であり、例えばフェニルオキシ
カルボニルアミノ基等)、スルホニルアミノ基(好まし
くは炭素数1〜30、より好ましくは炭素数1〜20、特に
好ましくは炭素数1〜12であり、例えばメタンスルホニ
ルアミノ基、ベンゼンスルホニルアミノ基等)、スルフ
ァモイル基(好ましくは炭素数0〜30、より好ましくは
炭素数0〜20、特に好ましくは炭素数0〜12であり、例
えばスルファモイル基、メチルスルファモイル基、ジメ
チルスルファモイル基、フェニルスルファモイル基
等)、カルバモイル基(好ましくは炭素数1〜30、より
好ましくは炭素数1〜20、特に好ましくは炭素数1〜12
であり、例えばカルバモイル基、メチルカルバモイル
基、ジエチルカルバモイル基、フェニルカルバモイル基
等)、アルキルチオ基(好ましくは炭素数1〜30、より
好ましくは炭素数1〜20、特に好ましくは炭素数1〜12
であり、例えばメチルチオ基、エチルチオ基等)、アリ
ールチオ基(好ましくは炭素数6〜30、より好ましくは
炭素数6〜20、特に好ましくは炭素数6〜12であり、例
えばフェニルチオ基等)、ヘテロアリールチオ基(好ま
しくは炭素数1〜30、より好ましくは炭素数1〜20、特
に好ましくは炭素数1〜12であり、例えばピリジルチオ
基、2-ベンズイミゾリルチオ基、2-ベンズオキサゾリル
チオ基、2-ベンズチアゾリルチオ基等)、スルホニル基
(好ましくは炭素数1〜30、より好ましくは炭素数1〜
20、特に好ましくは炭素数1〜12であり、例えばメシル
基、トシル基等)、スルフィニル基(好ましくは炭素数
1〜30、より好ましくは炭素数1〜20、特に好ましくは
炭素数1〜12であり、例えばメタンスルフィニル基、ベ
ンゼンスルフィニル基等)、ウレイド基(好ましくは炭
素数1〜30、より好ましくは炭素数1〜20、特に好まし
くは炭素数1〜12であり、例えばウレイド基、メチルウ
レイド基、フェニルウレイド基等)、リン酸アミド基
(好ましくは炭素数1〜30、より好ましくは炭素数1〜
20、特に好ましくは炭素数1〜12であり、例えばジエチ
ルリン酸アミド基、フェニルリン酸アミド基等)、ヒド
ロキシ基、メルカプト基、ハロゲン原子(例えばフッ素
原子、塩素原子、臭素原子、ヨウ素原子等)、シアノ
基、スルホ基、カルボキシル基、ニトロ基、ヒドロキサ
ム酸基、スルフィノ基、ヒドラジノ基、イミノ基、ヘテ
ロ環基(好ましくは炭素数1〜30、より好ましくは炭素
数1〜12であり、ヘテロ原子として窒素原子、酸素原
子、硫黄原子等を含み、脂肪族ヘテロ環基であってもヘ
テロアリール基であってもよく、例えばイミダゾリル
基、ピリジル基、キノリル基、フリル基、チエニル基、
ピペリジル基、モルホリノ基、ベンズオキサゾリル基、
ベンズイミダゾリル基、ベンズチアゾリル基、カルバゾ
リル基、アゼピニル基等)、シリル基(好ましくは炭素
数3〜40、より好ましくは炭素数3〜30、特に好ましく
は炭素数3〜24であり、例えばトリメチルシリル基、ト
リフェニルシリル基等)、ホスフィノ基(好ましくは炭
素数2〜30、より好ましくは炭素数2〜12であり、例え
ばジメチルホスフィノ基、ジフェニルホスフィノ基等)
等が挙げられる。これらの置換基は更に置換されてもよ
く、また置換基同士が結合して環構造を形成してもよ
い。
The general formula (1) will be described below. General formula
In (1), M is iridium, ruthenium or rhodium, and R 11 , R 12 and R 13 each represent a substituent. Examples of the substituent include an alkyl group (preferably having 1 to 3 carbon atoms).
0, more preferably 1 to 20 carbon atoms, particularly preferably 1 to 10 carbon atoms, for example, methyl group, ethyl group, isopropyl group, t-butyl group, n-octyl group, n-decyl group, n-hexadecyl Group, cyclopropyl group, cyclopentyl group,
A cyclohexyl group or the like, an alkenyl group (preferably having 2 to 30 carbon atoms, more preferably having 2 to 20 carbon atoms, particularly preferably having 2 to 10 carbon atoms, for example, a vinyl group, an allyl group,
A butenyl group, a 3-pentenyl group and the like, an alkynyl group (preferably having a carbon number of 2 to 30, more preferably a carbon number of 2 to 20, particularly preferably a carbon number of 2 to 10, for example, a propargyl group, a 3-pentynyl group and the like) ), An aryl group (preferably having 6 to 30 carbon atoms, more preferably having 6 to 20 carbon atoms, particularly preferably having 6 to 12 carbon atoms, for example, a phenyl group, a p-methylphenyl group, a naphthyl group, an anthryl group, a phenanthryl) Group, pyrenyl group, etc.), an amino group (preferably having 0 to 0 carbon atoms)
30, more preferably 0 to 20 carbon atoms, particularly preferably 0 to 10 carbon atoms, for example, an amino group, a methylamino group, a dimethylamino group, a diethylamino group, a dibenzylamino group, a diphenylamino group, a ditolylamino group, etc.) An alkoxy group (preferably having 1 to 30 carbon atoms, more preferably having 1 to 20 carbon atoms, particularly preferably having 1 to 10 carbon atoms, for example, a methoxy group, an ethoxy group, a butoxy group, a 2-ethylhexyloxy group, etc.) An aryloxy group (preferably having 6 to 30 carbon atoms, more preferably having 6 to 20 carbon atoms, particularly preferably having 6 to 12 carbon atoms, for example, a phenyloxy group, a 1-naphthyloxy group, a 2-naphthyloxy group, etc. ), A heteroaryloxy group (preferably having 1 to 30 carbon atoms, more preferably 1 to 20 carbon atoms, particularly preferably 1 to 12 carbon atoms, for example, a pyridyloxy group, Oxy group, pyrimidyloxy group, quinolyloxy group, etc.), acyl group (preferably having 1 to 30 carbon atoms, more preferably 1 to 20 carbon atoms, particularly preferably 1 to 12 carbon atoms, for example, acetyl group, benzoyl group, formyl Group, pivaloyl group, etc.), alkoxycarbonyl group (preferably having 2 to 30 carbon atoms, more preferably having 2 to 20 carbon atoms, particularly preferably having 2 to 12 carbon atoms,
For example, a methoxycarbonyl group, an ethoxycarbonyl group or the like, an aryloxycarbonyl group (preferably having 7 to 30 carbon atoms, more preferably having 7 to 20 carbon atoms, particularly preferably having 7 to 12 carbon atoms, such as a phenyloxycarbonyl group ), An acyloxy group (preferably having 2 to 30 carbon atoms, more preferably 2 to 20 carbon atoms, and particularly preferably 2 to 2 carbon atoms)
10, for example, an acetoxy group, a benzoyloxy group, etc.), an acylamino group (preferably having 2 to 30 carbon atoms, more preferably 2 to 20 carbon atoms, particularly preferably 2 to 10 carbon atoms).
For example, acetylamino group, benzoylamino group, etc., alkoxycarbonylamino group (preferably having 2 to 30 carbon atoms, more preferably having 2 to 20 carbon atoms, particularly preferably having 2 to 12 carbon atoms, for example, methoxycarbonyl An amino group), an aryloxycarbonylamino group (preferably having 7 to 30, more preferably 7 to 20, and particularly preferably having 7 to 12 carbon atoms, such as a phenyloxycarbonylamino group), a sulfonylamino Groups (preferably having 1 to 30 carbon atoms, more preferably having 1 to 20 carbon atoms, particularly preferably having 1 to 12 carbon atoms, such as a methanesulfonylamino group and a benzenesulfonylamino group), and a sulfamoyl group (preferably having a carbon number of 1). 0-30, more preferably 0-20 carbon atoms, particularly preferably 0-12 carbon atoms, such as sulfamoyl group, Rusurufamoiru group, dimethylsulfamoyl group, and phenyl sulfamoyl groups), a carbamoyl group (preferably having 1 to 30 carbon atoms, more preferably 1 to 20 carbon atoms, particularly preferably 1 to 12 carbon atoms
For example, a carbamoyl group, a methylcarbamoyl group, a diethylcarbamoyl group, a phenylcarbamoyl group or the like), an alkylthio group (preferably having 1 to 30 carbon atoms, more preferably 1 to 20 carbon atoms, particularly preferably 1 to 12 carbon atoms)
And a arylthio group (preferably having 6 to 30 carbon atoms, more preferably having 6 to 20 carbon atoms, particularly preferably having 6 to 12 carbon atoms, such as a phenylthio group), Arylthio group (preferably having 1 to 30 carbon atoms, more preferably 1 to 20 carbon atoms, particularly preferably 1 to 12 carbon atoms, for example, a pyridylthio group, a 2-benzimidisolylthio group, a 2-benzoxazolylthio group; Group, 2-benzthiazolylthio group, etc.), sulfonyl group (preferably having 1 to 30 carbon atoms, more preferably 1 to 3 carbon atoms)
20, particularly preferably 1 to 12 carbon atoms, for example, mesyl group, tosyl group, etc., sulfinyl group (preferably 1 to 30 carbon atoms, more preferably 1 to 20 carbon atoms, particularly preferably 1 to 12 carbon atoms) Such as a methanesulfinyl group and a benzenesulfinyl group), a ureido group (preferably having 1 to 30 carbon atoms, more preferably 1 to 20 carbon atoms, and particularly preferably 1 to 12 carbon atoms; Ureido group, phenylureido group, etc.), phosphoric acid amide group (preferably having 1 to 30 carbon atoms, more preferably 1 to 3 carbon atoms)
20, particularly preferably having 1 to 12 carbon atoms, for example, a diethylphosphoramide group, a phenylphosphoramide group, etc., a hydroxy group, a mercapto group, a halogen atom (for example, a fluorine atom, a chlorine atom, a bromine atom, an iodine atom, etc.) ), A cyano group, a sulfo group, a carboxyl group, a nitro group, a hydroxamic acid group, a sulfino group, a hydrazino group, an imino group, a heterocyclic group (preferably having 1 to 30 carbon atoms, more preferably 1 to 12 carbon atoms, Hetero atoms include a nitrogen atom, an oxygen atom, a sulfur atom and the like, and may be an aliphatic heterocyclic group or a heteroaryl group, such as an imidazolyl group, a pyridyl group, a quinolyl group, a furyl group, a thienyl group,
Piperidyl group, morpholino group, benzoxazolyl group,
A benzimidazolyl group, a benzthiazolyl group, a carbazolyl group, an azepinyl group, etc.), a silyl group (preferably having 3 to 40 carbon atoms, more preferably having 3 to 30 carbon atoms, particularly preferably having 3 to 24 carbon atoms, for example, a trimethylsilyl group, Triphenylsilyl group, etc.), phosphino group (preferably having 2 to 30 carbon atoms, more preferably having 2 to 12 carbon atoms, for example, dimethylphosphino group, diphenylphosphino group, etc.)
And the like. These substituents may be further substituted, and the substituents may combine with each other to form a ring structure.

【0020】R11は好ましくはアルキル基又はアリール
基である。R11はL11と結合してキレート配位子を形成し
てもよい。R12及びR13はそれぞれ好ましくはアルキル
基、アリール基、ヘテロアリール基、アルコキシ基、フ
ッ素原子又は置換アミノ基であり、より好ましくはアル
キル基又はフッ素原子である。
R 11 is preferably an alkyl group or an aryl group. R 11 may combine with L 11 to form a chelating ligand. R 12 and R 13 are each preferably an alkyl group, an aryl group, a heteroaryl group, an alkoxy group, a fluorine atom or a substituted amino group, and more preferably an alkyl group or a fluorine atom.

【0021】L11は1価の配位子を表し、好ましくはハ
ロゲン配位子、スルホン酸配位子、カルボン酸配位子、
アルコキシ配位子又はニトリル配位子である。またn11
及びn12はそれぞれ0〜4の整数を表す。
L 11 represents a monovalent ligand, preferably a halogen ligand, a sulfonic acid ligand, a carboxylic acid ligand,
It is an alkoxy ligand or a nitrile ligand. Also n11
And n12 each represent an integer of 0 to 4.

【0022】本発明で用いる遷移金属錯体は低分子量で
あるのが好ましいが、繰り返し単位を有するいわゆるオ
リゴマーやポリマーであってもよい。オリゴマー又はポ
リマーである場合、その例としては上記一般式(1)で表
される残基がポリマー主鎖に結合した高分子量化合物
(例えば、一般式(1)中のフェニルピリジン配位子、R11
又はL11がポリマー主鎖に結合した高分子量化合物)、
一般式(1)で表される骨格を主鎖に持つ高分子量化合物
(例えば、一般式(1)中のフェニルピリジン配位子、R11
又はL11がポリマー主鎖に含まれる高分子量化合物)等
が挙げられ、質量平均分子量(ポリスチレン換算)は好
ましくは1000〜5000000、より好ましくは2000〜100000
0、特に好ましくは3000〜100000である。ここでポリマ
ーはホモポリマーであっても、他のモノマーとの共重合
体であってもよく、共重合体である場合はランダム共重
合体であっても、ブロック共重合体であってもよい。
The transition metal complex used in the present invention preferably has a low molecular weight, but may be a so-called oligomer or polymer having a repeating unit. When the compound is an oligomer or a polymer, examples thereof include a high molecular weight compound in which the residue represented by the general formula (1) is bonded to the polymer main chain (for example, a phenylpyridine ligand in the general formula (1), R 11
Or a high molecular weight compound in which L 11 is bonded to the polymer main chain),
High molecular weight compounds having a skeleton represented by the general formula (1) in the main chain (for example, a phenylpyridine ligand in the general formula (1), R 11
Or L 11 is a high molecular weight compound contained in the polymer backbone), and the like, the weight average molecular weight (polystyrene equivalent) is preferably 1000 to 5000000, more preferably 2000 to 100000
0, particularly preferably from 3000 to 100,000. Here, the polymer may be a homopolymer, may be a copolymer with another monomer, if it is a copolymer, may be a random copolymer, may be a block copolymer .

【0023】遷移金属錯体からなる本発明の発光素子用
材料は正孔注入材料、正孔輸送材料、発光材料、電子輸
送材料、電子注入材料等として機能するものであってよ
く、複数の機能を併せ持っていてもよい。本発明の発光
素子用材料は発光材料又は電荷輸送材料として使用する
のが好ましい。以下、本発明で用いる遷移金属錯体の具
体例を示すが、それらは本発明を限定するものではな
い。
The material for a light emitting device of the present invention comprising a transition metal complex may function as a hole injection material, a hole transport material, a light emitting material, an electron transport material, an electron injection material, etc. You may have them together. The material for a light emitting device of the present invention is preferably used as a light emitting material or a charge transport material. Hereinafter, specific examples of the transition metal complex used in the present invention are shown, but they do not limit the present invention.

【0024】[0024]

【化7】 Embedded image

【0025】[0025]

【化8】 Embedded image

【0026】[0026]

【化9】 Embedded image

【0027】本発明で用いる遷移金属錯体は種々の手法
で合成することができる。例えば、配位子又はその解離
体と遷移金属化合物とを、室温以下又は加熱しながら混
合して得ることができる。加熱する場合、通常の加熱以
外にマイクロウェーブで加熱する手法も有効である。必
要に応じて、溶媒(ハロゲン系溶媒、アルコール系溶
媒、エーテル系溶媒、水等)や、塩基(無機塩基であっ
ても有機塩基であってもよく、例えばナトリウムメトキ
サイド、t-ブトキシカリウム、トリエチルアミン、炭酸
カリウム等)を用いてもよい。
The transition metal complex used in the present invention can be synthesized by various methods. For example, it can be obtained by mixing a ligand or a dissociated product thereof with a transition metal compound at room temperature or lower or while heating. In the case of heating, a method of heating with microwaves other than ordinary heating is also effective. If necessary, a solvent (halogen-based solvent, alcohol-based solvent, ether-based solvent, water, etc.) or a base (which may be an inorganic base or an organic base, such as sodium methoxide, potassium t-butoxide, Triethylamine, potassium carbonate, etc.).

【0028】[2]発光素子 本発明の発光素子は、一対の電極(陽極及び陰極)間
に、発光層又は発光層を含む複数の有機化合物層を有す
る。この発光層又は複数の有機化合物層のうち少なくと
も一層は、前述した本発明の発光素子用材料を含有す
る。本発明の発光素子のシステム、駆動方法、利用形態
等は特に問わないが、本発明の発光素子用材料を発光材
料又は電荷輸送材料として利用したものであるのが好ま
しい。代表的な発光素子として、有機EL(エレクトロル
ミネッセンス)素子を挙げることができる。
[2] Light Emitting Element The light emitting element of the present invention has a light emitting layer or a plurality of organic compound layers including the light emitting layer between a pair of electrodes (anode and cathode). At least one of the light emitting layer and the plurality of organic compound layers contains the light emitting element material of the present invention described above. There is no particular limitation on the system, driving method, utilization form, and the like of the light emitting element of the present invention, but it is preferable that the light emitting element material of the present invention be used as a light emitting material or a charge transporting material. As a typical light emitting element, an organic EL (electroluminescence) element can be cited.

【0029】本発明の発光素子用材料を含有する層の形
成方法は特に限定されず、抵抗加熱蒸着法、電子ビーム
法、スパッタリング法、分子積層法、コーティング法、
インクジェット法、印刷法、転写法等の方法が使用可能
である。中でも、素子の特性及び製造面から抵抗加熱蒸
着法及びコーティング法が好ましい。発光素子用材料を
含有する層は塗布プロセスで成膜するのが特に好まし
い。
The method for forming the layer containing the material for a light emitting device of the present invention is not particularly limited, and includes a resistance heating evaporation method, an electron beam method, a sputtering method, a molecular lamination method, a coating method, and the like.
Methods such as an ink jet method, a printing method, and a transfer method can be used. Among them, the resistance heating vapor deposition method and the coating method are preferable from the viewpoint of the characteristics of the device and the production. The layer containing the light emitting element material is particularly preferably formed by a coating process.

【0030】本発明の発光素子は、発光層に加えて正孔
注入層、正孔輸送層、電子注入層、電子輸送層、保護層
等を含んでいてよく、これらの各層はそれぞれ他の機能
を備えたものであってもよい。前述の通り、本発明の発
光素子用材料はこれらの層のいずれに含まれていてもよ
く、好ましくは発光層又は電荷輸送層に含まれる。以
下、各層について詳述する。
The light emitting device of the present invention may include a hole injection layer, a hole transport layer, an electron injection layer, an electron transport layer, a protective layer, and the like, in addition to the light emitting layer. May be provided. As described above, the light emitting device material of the present invention may be contained in any of these layers, and is preferably contained in the light emitting layer or the charge transport layer. Hereinafter, each layer will be described in detail.

【0031】(A)陽極 陽極は正孔注入層、正孔輸送層、発光層等に正孔を供給
するものである。陽極を形成する材料としては、金属、
合金、金属酸化物、電気伝導性化合物、これらの混合物
等を用いることができ、好ましくは仕事関数が4eV以上
の材料を用いる。具体例としては、金属(金、銀、クロ
ム、ニッケル等)、導電性金属酸化物(酸化スズ、酸化
亜鉛、酸化インジウム、酸化インジウムスズ(ITO)
等)、これら金属と導電性金属酸化物との混合物又は積
層物、無機導電性物質(ヨウ化銅、硫化銅等)、有機導
電性材料(ポリアニリン、ポリチオフェン、ポリピロー
ル等)及びこれらとITOとの積層物等が挙げられる。陽
極は導電性金属酸化物からなるのが好ましく、生産性、
高導電性、透明性等の観点からITOが特に好ましい。
(A) Anode The anode supplies holes to the hole injection layer, the hole transport layer, the light emitting layer and the like. Materials for forming the anode include metals,
An alloy, a metal oxide, an electrically conductive compound, a mixture thereof, or the like can be used, and a material having a work function of 4 eV or more is preferably used. Specific examples include metals (gold, silver, chromium, nickel, etc.) and conductive metal oxides (tin oxide, zinc oxide, indium oxide, indium tin oxide (ITO)
Etc.), mixtures or laminates of these metals and conductive metal oxides, inorganic conductive substances (copper iodide, copper sulfide, etc.), organic conductive materials (polyaniline, polythiophene, polypyrrole, etc.) Laminates and the like are mentioned. The anode is preferably made of a conductive metal oxide, and the productivity,
ITO is particularly preferred from the viewpoint of high conductivity, transparency and the like.

【0032】陽極の形成法は用いる材料に応じて適宜選
択すればよく、例えばITOの場合、電子ビーム法、スパ
ッタリング法、抵抗加熱蒸着法、化学反応法(ゾル−ゲ
ル法等)、酸化インジウムスズ分散物の塗布等の方法を
用いることができる。陽極に洗浄等の処理を施すことに
より、発光素子の駆動電圧を下げたり、発光効率を高め
たりすることも可能である。例えばITOからなる陽極の
場合、UV-オゾン処理、プラズマ処理等が効果的であ
る。陽極のシート抵抗は数百Ω/□以下とするのが好ま
しい。陽極の膜厚は材料に応じて適宜選択可能である
が、通常10nm〜5μmとするのが好ましく、50nm〜1μm
とするのがより好ましく、100〜500nmとするのが特に好
ましい。
The method for forming the anode may be appropriately selected according to the material used. For example, in the case of ITO, an electron beam method, a sputtering method, a resistance heating evaporation method, a chemical reaction method (such as a sol-gel method), and indium tin oxide A method such as application of a dispersion can be used. By performing a treatment such as washing on the anode, the driving voltage of the light-emitting element can be reduced or the luminous efficiency can be increased. For example, in the case of an anode made of ITO, UV-ozone treatment, plasma treatment and the like are effective. The sheet resistance of the anode is preferably several hundreds Ω / □ or less. The thickness of the anode can be appropriately selected according to the material, but is usually preferably from 10 nm to 5 μm, more preferably from 50 nm to 1 μm.
More preferably, it is particularly preferably 100 to 500 nm.

【0033】陽極は通常、ソーダライムガラス、無アル
カリガラス、透明樹脂等からなる基板上に形成する。ガ
ラス基板の場合、ガラスからの溶出イオンを低減するた
めには無アルカリガラスを用いるのが好ましい。ソーダ
ライムガラス基板を用いる場合は、予めその表面にシリ
カ等のバリアコートを形成するのが好ましい。基板の厚
さは機械的強度を保つのに十分であれば特に制限はない
が、ガラス基板の場合は通常0.2mm以上、好ましくは0.7
mm以上とする。
The anode is usually formed on a substrate made of soda lime glass, non-alkali glass, transparent resin or the like. In the case of a glass substrate, it is preferable to use an alkali-free glass in order to reduce ions eluted from the glass. When a soda lime glass substrate is used, it is preferable to previously form a barrier coat such as silica on the surface thereof. The thickness of the substrate is not particularly limited as long as it is sufficient to maintain mechanical strength, but in the case of a glass substrate, it is usually 0.2 mm or more, preferably 0.7 mm or more.
mm or more.

【0034】(B)陰極 陰極は電子注入層、電子輸送層、発光層等に電子を供給
するものである。陰極の材料としては、金属、合金、金
属ハロゲン化物、金属酸化物、電気伝導性化合物、これ
らの混合物等を用いることができ、発光層等の隣接する
層との密着性やイオン化ポテンシャル、安定性等を考慮
して選択すればよい。具体例としては、アルカリ金属
(Li、Na、K等)及びそのフッ化物や酸化物、アルカリ
土類金属(Mg、Ca等)及びそのフッ化物や酸化物、金、
銀、鉛、アルミニウム、ナトリウム及びカリウムを含む
合金及び混合金属、リチウム及びアルミニウムを含む合
金及び混合金属、マグネシウム及び銀を含む合金及び混
合金属、希土類金属(インジウム、イッテリビウム
等)、それらの混合物等が挙げられる。陰極は仕事関数
が4eV以下の材料からなるのが好ましく、アルミニウ
ム、リチウムとアルミニウムを含む合金又は混合金属、
或いはマグネシウムと銀を含む合金又は混合金属からな
るのがより好ましい。
(B) Cathode The cathode supplies electrons to the electron injection layer, the electron transport layer, the light emitting layer and the like. As the material of the cathode, metals, alloys, metal halides, metal oxides, electrically conductive compounds, mixtures thereof, and the like can be used. Adhesion with an adjacent layer such as a light emitting layer, ionization potential, and stability can be used. Etc. may be selected in consideration. Specific examples include alkali metals (Li, Na, K, etc.) and their fluorides and oxides, alkaline earth metals (Mg, Ca, etc.) and their fluorides and oxides, gold,
Alloys and mixed metals containing silver, lead, aluminum, sodium and potassium, alloys and mixed metals containing lithium and aluminum, alloys and mixed metals containing magnesium and silver, rare earth metals (such as indium and ytterbium), and mixtures thereof No. The cathode is preferably made of a material having a work function of 4 eV or less; aluminum, an alloy or a mixed metal containing lithium and aluminum,
Alternatively, it is more preferable to use an alloy or a mixed metal containing magnesium and silver.

【0035】陰極は、上記のような材料からなる単層構
造であっても、上記材料からなる層を含む積層構造であ
ってもよい。例えば、アルミニウム/フッ化リチウム、
アルミニウム/酸化リチウム等の積層構造が好ましい。
陰極は電子ビーム法、スパッタリング法、抵抗加熱蒸着
法、コーティング法等により形成することができる。蒸
着法の場合、材料を単独で蒸着することも、二種以上の
材料を同時に蒸着することもできる。合金電極を形成す
る場合は、複数の金属を同時蒸着して形成することが可
能であり、また予め調整した合金を蒸着してもよい。陰
極のシート抵抗は数百Ω/□以下とするのが好ましい。
陰極の膜厚は材料に応じて適宜選択可能であるが、通常
10nm〜5μmとするのが好ましく、50nm〜1μmとするの
がより好ましく、100nm〜1μmとするのが特に好まし
い。
The cathode may have a single-layer structure made of the above-described material, or may have a laminated structure including a layer made of the above-described material. For example, aluminum / lithium fluoride,
A laminated structure of aluminum / lithium oxide or the like is preferred.
The cathode can be formed by an electron beam method, a sputtering method, a resistance heating evaporation method, a coating method, or the like. In the case of a vapor deposition method, a material can be vapor-deposited alone or two or more materials can be vapor-deposited simultaneously. When an alloy electrode is formed, a plurality of metals can be formed by simultaneous evaporation, or an alloy prepared in advance may be evaporated. The sheet resistance of the cathode is preferably several hundreds Ω / □ or less.
The thickness of the cathode can be appropriately selected according to the material,
It is preferably from 10 nm to 5 μm, more preferably from 50 nm to 1 μm, particularly preferably from 100 nm to 1 μm.

【0036】(C)正孔注入層及び正孔輸送層 正孔注入層及び正孔輸送層に用いる材料は、陽極から正
孔を注入する機能、正孔を輸送する機能、及び陰極から
注入された電子を障壁する機能のいずれかを有している
ものであればよい。その具体例としては、カルバゾー
ル、トリアゾール、オキサゾール、オキサジアゾール、
イミダゾール、ポリアリールアルカン、ピラゾリン、ピ
ラゾロン、フェニレンジアミン、アリールアミン、アミ
ノ置換カルコン、スチリルアントラセン、フルオレノ
ン、ヒドラゾン、スチルベン、シラザン、芳香族第三級
アミン化合物、スチリルアミン化合物、芳香族ジメチリ
ディン系化合物、ポルフィリン系化合物、ポリシラン系
化合物、ポリ(N-ビニルカルバゾール)、アニリン系共重
合体、チオフェンオリゴマーやポリチオフェン等の導電
性高分子オリゴマー、有機シラン、これらの誘導体、カ
ーボン膜、本発明の発光素子用材料等が挙げられる。
(C) Hole Injection Layer and Hole Transport Layer The materials used for the hole injection layer and the hole transport layer have a function of injecting holes from the anode, a function of transporting holes, and a material injected from the cathode. Any function that has any of the functions of blocking electrons may be used. Specific examples thereof include carbazole, triazole, oxazole, oxadiazole,
Imidazole, polyarylalkane, pyrazoline, pyrazolone, phenylenediamine, arylamine, amino-substituted chalcone, styrylanthracene, fluorenone, hydrazone, stilbene, silazane, aromatic tertiary amine compound, styrylamine compound, aromatic dimethylidin compound, porphyrin -Based compounds, polysilane-based compounds, poly (N-vinylcarbazole), aniline-based copolymers, conductive polymer oligomers such as thiophene oligomers and polythiophenes, organic silanes, derivatives thereof, carbon films, materials for light emitting devices of the present invention And the like.

【0037】正孔注入層及び正孔輸送層は1種又は2種
以上の上記材料からなる単層構造であってもよいし、同
一組成又は異種組成の複数層からなる多層構造であって
もよい。正孔注入層及び正孔輸送層の形成方法として
は、真空蒸着法、LB法、上記材料を溶媒中に溶解又は分
散させてコーティングする方法(スピンコート法、キャ
スト法、ディップコート法等)、インクジェット法、印
刷法、転写法等が用いられる。コーティング法の場合、
上記材料を樹脂成分と共に溶解又は分散させて塗布液を
調製してもよく、該樹脂成分としては、ポリ塩化ビニ
ル、ポリカーボネート、ポリスチレン、ポリメチルメタ
クリレート、ポリブチルメタクリレート、ポリエステ
ル、ポリスルホン、ポリフェニレンオキシド、ポリブタ
ジエン、ポリ(N-ビニルカルバゾール)、炭化水素樹脂、
ケトン樹脂、フェノキシ樹脂、ポリアミド、エチルセル
ロース、ポリ酢酸ビニル、ABS樹脂、ポリウレタン、メ
ラミン樹脂、不飽和ポリエステル樹脂、アルキド樹脂、
エポキシ樹脂、シリコン樹脂等が使用できる。正孔注入
層及び正孔輸送層の膜厚は特に限定されないが、通常1
nm〜5μmとするのが好ましく、5nm〜1μmとするのが
より好ましく、10〜500nmとするのが特に好ましい。
The hole injection layer and the hole transport layer may have a single-layer structure composed of one or more of the above-mentioned materials, or a multilayer structure composed of a plurality of layers having the same composition or different compositions. Good. As a method for forming the hole injection layer and the hole transport layer, a vacuum evaporation method, an LB method, a method in which the above material is dissolved or dispersed in a solvent and coated (spin coating, casting, dip coating, etc.), An ink jet method, a printing method, a transfer method and the like are used. In the case of the coating method,
A coating solution may be prepared by dissolving or dispersing the above materials together with a resin component. Examples of the resin component include polyvinyl chloride, polycarbonate, polystyrene, polymethyl methacrylate, polybutyl methacrylate, polyester, polysulfone, polyphenylene oxide, and polybutadiene. , Poly (N-vinylcarbazole), hydrocarbon resin,
Ketone resin, phenoxy resin, polyamide, ethyl cellulose, polyvinyl acetate, ABS resin, polyurethane, melamine resin, unsaturated polyester resin, alkyd resin,
Epoxy resin, silicon resin and the like can be used. The thickness of the hole injection layer and the hole transport layer is not particularly limited, but is usually 1
It is preferably from 5 nm to 5 μm, more preferably from 5 nm to 1 μm, and particularly preferably from 10 to 500 nm.

【0038】(D)発光層 発光素子に電界を印加すると、発光層において陽極、正
孔注入層又は正孔輸送層から注入された正孔と、陰極、
電子注入層又は電子輸送層から注入された電子とが再結
合し、光を発する。発光層をなす材料は、電界印加時に
陽極等から正孔を受け取る機能、陰極等から電子を受け
取る機能、電荷を移動させる機能、及び正孔と電子の再
結合の場を提供して発光させる機能を有する層を形成す
ることができるものであれば特に限定されない。発光層
の材料は一重項励起子及び三重項励起子のいずれから発
光するものであってもよく、例えばベンゾオキサゾー
ル、ベンゾイミダゾール、ベンゾチアゾール、スチリル
ベンゼン、ポリフェニル、ジフェニルブタジエン、テト
ラフェニルブタジエン、ナフタルイミド、クマリン、ペ
リレン、ペリノン、オキサジアゾール、アルダジン、ピ
ラリジン、シクロペンタジエン、ビススチリルアントラ
セン、キナクリドン、ピロロピリジン、チアジアゾロピ
リジン、シクロペンタジエン、スチリルアミン、芳香族
ジメチリディン化合物、金属錯体(8-キノリノール誘導
体の金属錯体、希土類錯体等)、高分子発光材料(ポリ
チオフェン、ポリフェニレン、ポリフェニレンビニレン
等)、有機シラン、これらの誘導体、本発明の発光素子
用材料等が使用できる。
(D) Light Emitting Layer When an electric field is applied to the light emitting device, holes injected from an anode, a hole injection layer or a hole transporting layer, a cathode,
The electrons injected from the electron injection layer or the electron transport layer are recombined to emit light. The material forming the light emitting layer has a function of receiving holes from an anode or the like when an electric field is applied, a function of receiving electrons from a cathode or the like, a function of transferring electric charges, and a function of emitting light by providing a field for recombination of holes and electrons. Is not particularly limited as long as it can form a layer having The material of the light-emitting layer may emit light from either a singlet exciton or a triplet exciton, and examples thereof include benzoxazole, benzimidazole, benzothiazole, styrylbenzene, polyphenyl, diphenylbutadiene, tetraphenylbutadiene, and naphthalene. Phthalimide, coumarin, perylene, perinone, oxadiazole, aldazine, pyrazine, cyclopentadiene, bisstyrylanthracene, quinacridone, pyrrolopyridine, thiadiazolopyridine, cyclopentadiene, styrylamine, aromatic dimethylidin compound, metal complex (8-quinolinol Derivative metal complexes, rare earth complexes, etc.), polymer light emitting materials (polythiophene, polyphenylene, polyphenylene vinylene, etc.), organic silanes, derivatives thereof, and the light emitting element material of the present invention are used. It can be.

【0039】発光層の形成方法は特に限定されず、抵抗
加熱蒸着法、電子ビーム法、スパッタリング法、分子積
層法、コーティング法(スピンコート法、キャスト法、
ディップコート法等)、インクジェット法、印刷法、LB
法、転写法等が使用可能である。中でも抵抗加熱蒸着法
及びコーティング法が好ましい。発光層の膜厚は特に限
定されず、通常1nm〜5μmとするのが好ましく、5nm
〜1μmとするのがより好ましく、10〜500nmとするのが
特に好ましい。
The method for forming the light-emitting layer is not particularly limited, and includes a resistance heating evaporation method, an electron beam method, a sputtering method, a molecular lamination method, a coating method (spin coating method, casting method,
Dip coating method), inkjet method, printing method, LB
Method, transfer method and the like can be used. Among them, the resistance heating evaporation method and the coating method are preferred. The thickness of the light emitting layer is not particularly limited, and is usually preferably 1 nm to 5 μm, and preferably 5 nm.
The thickness is more preferably from 1 to 1 μm, and particularly preferably from 10 to 500 nm.

【0040】(E)電子注入層及び電子輸送層 電子注入層及び電子輸送層をなす材料は、陰極から電子
を注入する機能、電子を輸送する機能、並びに陽極から
注入された正孔を障壁する機能のいずれかを有している
ものであればよい。具体例としては、トリアゾール、オ
キサゾール、オキサジアゾール、イミダゾール、フルオ
レノン、アントラキノジメタン、アントロン、ジフェニ
ルキノン、チオピランジオキシド、カルボジイミド、フ
ルオレニリデンメタン、ジスチリルピラジン、ナフタレ
ンやペリレン等の芳香環を有するテトラカルボン酸無水
物、フタロシアニン、金属錯体(8-キノリノール誘導体
の金属錯体、メタルフタロシアニン、ベンゾオキサゾー
ルやベンゾチアゾールを配位子とする金属錯体等)、有
機シラン、これらの誘導体、本発明の発光素子用材料等
が挙げられる。
(E) Electron injection layer and electron transport layer The material forming the electron injection layer and the electron transport layer has a function of injecting electrons from the cathode, a function of transporting electrons, and a barrier against holes injected from the anode. What is necessary is just to have any of the functions. Specific examples include aromatic rings such as triazole, oxazole, oxadiazole, imidazole, fluorenone, anthraquinodimethane, anthrone, diphenylquinone, thiopyrandioxide, carbodiimide, fluorenylidenemethane, distyrylpyrazine, naphthalene and perylene. Anhydrides, phthalocyanines, metal complexes (metal complexes of 8-quinolinol derivatives, metal phthalocyanines, metal complexes having benzoxazole or benzothiazole as ligands), organic silanes, derivatives thereof of the present invention Light emitting element materials and the like.

【0041】電子注入層及び電子輸送層は1種又は2種
以上の上記材料からなる単層構造であってもよいし、同
一組成又は異種組成の複数層からなる多層構造であって
もよい。電子注入層及び電子輸送層の形成方法として
は、真空蒸着法、LB法、上記材料を溶媒中に溶解又は分
散させてコーティングする方法(スピンコート法、キャ
スト法、ディップコート法等)、インクジェット法、印
刷法、転写法等が用いられる。コーティング法の場合、
上記材料を樹脂成分と共に溶解又は分散させて塗布液を
調製してもよい。該樹脂成分としては、前述した正孔注
入層及び正孔輸送層の場合と同様のものが使用できる。
電子注入層及び電子輸送層の膜厚は特に限定されず、通
常1nm〜5μmとするのが好ましく、5nm〜1μmとする
のがより好ましく、10〜500nmとするのが特に好まし
い。
The electron injection layer and the electron transport layer may have a single-layer structure composed of one or more of the above-mentioned materials, or may have a multilayer structure composed of a plurality of layers having the same composition or different compositions. Examples of the method for forming the electron injection layer and the electron transport layer include a vacuum evaporation method, an LB method, a method of dissolving or dispersing the above materials in a solvent and coating (a spin coating method, a casting method, a dip coating method, etc.), and an ink jet method. , A printing method, a transfer method and the like are used. In the case of the coating method,
The coating material may be prepared by dissolving or dispersing the above materials together with the resin component. As the resin component, the same one as in the case of the hole injection layer and the hole transport layer described above can be used.
The thickness of the electron injection layer and the electron transport layer is not particularly limited, but is usually preferably 1 nm to 5 μm, more preferably 5 nm to 1 μm, and particularly preferably 10 to 500 nm.

【0042】(F)保護層 保護層は水分、酸素等の素子劣化を促進するものが素子
内に入ることを抑止する機能を有する。保護層の材料と
しては、金属(In、Sn、Pb、Au、Cu、Ag、Al、Ti、Ni
等)、金属酸化物(MgO、SiO、SiO2、Al2O3、GeO、Ni
O、CaO、BaO、Fe2O3、Y2O3、TiO2等)、金属フッ化物
(MgF2、LiF、AlF3、CaF2等)、窒化物(SiN、SiNxO
y等)、ポリエチレン、ポリプロピレン、ポリメチルメ
タクリレート、ポリイミド、ポリウレア、ポリテトラフ
ルオロエチレン、ポリクロロトリフルオロエチレン、ポ
リジクロロジフルオロエチレン、クロロトリフルオロエ
チレンとジクロロジフルオロエチレンとの共重合体、テ
トラフルオロエチレンと少なくとも1種のコモノマーと
を含むモノマー混合物を共重合させて得られる共重合
体、共重合主鎖に環状構造を有する含フッ素共重合体、
吸水率1%以上の吸水性物質、吸水率0.1%以下の防湿
性物質等が使用できる。
(F) Protective Layer The protective layer has a function of preventing moisture, oxygen, and the like that promotes device deterioration from entering the device. Metals (In, Sn, Pb, Au, Cu, Ag, Al, Ti, Ni
Etc.), metal oxides (MgO, SiO, SiO 2 , Al 2 O 3 , GeO, Ni
O, CaO, BaO, Fe 2 O 3 , Y 2 O 3 , TiO 2 etc.), metal fluorides (MgF 2 , LiF, AlF 3 , CaF 2 etc.), nitrides (SiN, SiN x O)
y, etc.), polyethylene, polypropylene, polymethyl methacrylate, polyimide, polyurea, polytetrafluoroethylene, polychlorotrifluoroethylene, polydichlorodifluoroethylene, a copolymer of chlorotrifluoroethylene and dichlorodifluoroethylene, tetrafluoroethylene A copolymer obtained by copolymerizing a monomer mixture containing at least one comonomer, a fluorinated copolymer having a cyclic structure in a copolymer main chain,
A water-absorbing substance having a water absorption of 1% or more and a moisture-proof substance having a water absorption of 0.1% or less can be used.

【0043】保護層の形成方法は特に限定されず、真空
蒸着法、スパッタリング法、反応性スパッタリング法、
MBE(分子線エピタキシ)法、クラスターイオンビーム
法、イオンプレーティング法、プラズマ重合法(高周波
励起イオンプレーティング法)、プラズマCVD法、レー
ザーCVD法、熱CVD法、ガスソースCVD法、コーティング
法、印刷法、転写法等が適用できる。
The method for forming the protective layer is not particularly limited, and may be a vacuum deposition method, a sputtering method, a reactive sputtering method,
MBE (molecular beam epitaxy) method, cluster ion beam method, ion plating method, plasma polymerization method (high frequency excitation ion plating method), plasma CVD method, laser CVD method, thermal CVD method, gas source CVD method, coating method, Printing method, transfer method and the like can be applied.

【0044】[0044]

【実施例】以下、実施例により本発明をさらに詳細に説
明するが、本発明はそれらに限定されるものではない。
EXAMPLES The present invention will be described in more detail with reference to the following Examples, but it should not be construed that the present invention is limited thereto.

【0045】比較例1 40mgのポリ(N-ビニルカルバゾール)、12mgのPBD(2-(4-
ビフェニル)-5-(4-t-ブチルフェニル)-1,3,4-オキサジ
アゾール)、及び1mgの下記化合物Aを2.5mlのジクロロ
エタンに溶解し、得られた溶液を洗浄した基板上にスピ
ンコート(1500rpm、20sec)して有機層を形成した。得
られた有機層の膜厚は98nmであった。次に得られた有機
層上に発光面積が4mm×5mmとなるようにパターニング
したマスクを設置し、蒸着装置内でマグネシウム及び銀
(マグネシウム:銀=10:1(モル比))を50nm共蒸着
し、更に銀を50nm蒸着して、比較例1の発光素子を作成
した。得られた発光素子に、東陽テクニカ製「ソースメ
ジャーユニット2400型」を用いて直流定電圧を印加して
発光させ、その発光輝度をトプコン社製「輝度計BM-8」
を用いて測定した。その結果、緑色発光が得られ、最高
輝度は3300cd/m2であり、最低駆動電圧(発光が得られ
る駆動電圧の最低値)は11Vであった。また発光素子を
大気下に1日放置し再度測定したところ、最高輝度は41
0cd/m2であった。
Comparative Example 1 40 mg of poly (N-vinylcarbazole) and 12 mg of PBD (2- (4-
Biphenyl) -5- (4-t-butylphenyl) -1,3,4-oxadiazole) and 1 mg of the following compound A were dissolved in 2.5 ml of dichloroethane, and the resulting solution was placed on a washed substrate. An organic layer was formed by spin coating (1500 rpm, 20 sec). The thickness of the obtained organic layer was 98 nm. Next, a mask patterned so as to have a light emitting area of 4 mm × 5 mm is set on the obtained organic layer, and magnesium and silver (magnesium: silver = 10: 1 (molar ratio)) are co-deposited in a vapor deposition apparatus at 50 nm. Then, silver was further evaporated to a thickness of 50 nm to produce a light-emitting device of Comparative Example 1. To the obtained light-emitting element, a DC constant voltage is applied using Toyo Technica's “Source Measure Unit 2400” to emit light, and the emission luminance is measured by Topcon's “Brightness Meter BM-8”.
It measured using. As a result, green light was emitted, the highest luminance was 3300 cd / m 2 , and the lowest driving voltage (the lowest driving voltage at which light emission was obtained) was 11 V. When the light emitting device was left in the air for one day and measured again, the highest luminance was 41.
It was 0 cd / m 2 .

【0046】[0046]

【化10】 [Formula 10]

【0047】実施例1 以下のように遷移金属錯体(1-2)を合成した。 Example 1 A transition metal complex (1-2) was synthesized as follows.

【化11】 3.5gの2-(4-フルオロフェニル)-ピリジン及び5gのK3Ir
Cl6に、50mlの2-メトキシエタノール及び30mlの水を加
え、還流下撹拌した。6時間撹拌した後、室温に冷却
し、析出した黄色固体をろ別して3.4gの化合物aを得
た。続いて0.2gの化合物aに20mlのクロロホルムを加
え、更に0.06mlのt-C4H9NCを加えた。この溶液を還流下
で4時間撹拌し、室温に冷却した。これをシリカゲルカ
ラムクロマトグラフィー(展開溶媒:クロロホルム)で
精製した後、クロロホルム/ヘキサン系で再結晶し、0.
1gの遷移金属錯体(1-2)を得た。FAB-MSスペクトル(pos
i 655, 620, 572, 535)により錯体(1-2)の生成を確認
した。
[Formula 11] 3.5 g of 2- (4-fluorophenyl) -pyridine and 5 g of K 3 Ir
50 ml of 2-methoxyethanol and 30 ml of water were added to Cl 6 and stirred under reflux. After stirring for 6 hours, the mixture was cooled to room temperature, and the precipitated yellow solid was separated by filtration to obtain 3.4 g of compound a. Subsequently, 20 ml of chloroform was added to 0.2 g of the compound a, and 0.06 ml of tC 4 H 9 NC was further added. The solution was stirred under reflux for 4 hours and cooled to room temperature. This was purified by silica gel column chromatography (developing solvent: chloroform), and then recrystallized from chloroform / hexane to give a solution of 0.1.
1 g of the transition metal complex (1-2) was obtained. FAB-MS spectrum (pos
i 655, 620, 572, 535) to confirm the formation of complex (1-2).

【0048】化合物Aに替えて上記のように得た遷移金
属錯体(1-2)を用いたこと以外は上記比較例1と同様
に、実施例1の発光素子を作成した。得られた発光素子
の発光輝度を上記比較例1と同様に測定した結果、青緑
色発光が得られ、最高輝度は3500cd/m2であり、最低駆
動電圧は10Vであった。また発光素子を大気下に1日放
置し再度測定したところ、最高輝度は3000cd/m2であっ
た。
A light emitting device of Example 1 was prepared in the same manner as in Comparative Example 1 except that the transition metal complex (1-2) obtained as described above was used in place of Compound A. The light emission luminance of the obtained light emitting device was measured in the same manner as in Comparative Example 1 above. As a result, blue-green light was obtained. The maximum luminance was 3500 cd / m 2 and the minimum drive voltage was 10 V. When the light-emitting element was left in the air for one day and measured again, the highest luminance was 3000 cd / m 2 .

【0049】実施例2 化合物Aに替えて遷移金属錯体(1-23)を用い、上記比較
例1と同様に発光素子を作成したところ、高輝度、高耐
久性の赤色発光素子を得ることができた。
Example 2 A light emitting device was prepared in the same manner as in Comparative Example 1 using the transition metal complex (1-23) in place of the compound A. As a result, a red light emitting device having high luminance and high durability was obtained. did it.

【0050】実施例3 1mgの化合物Aに替えて遷移金属錯体(1-1)及び(1-25)の
混合物を用い、上記比較例1と同様に発光素子を作成し
たところ、高輝度、高耐久性の青緑色発光素子を得るこ
とができた。
Example 3 A light-emitting device was prepared in the same manner as in Comparative Example 1 except that 1 mg of the compound A was replaced with a mixture of the transition metal complexes (1-1) and (1-25). A durable blue-green light emitting element was obtained.

【0051】実施例4 洗浄したITO基板を蒸着装置に入れ、TPD(N,N'-ジフェ
ニル-N,N'-ジ(m-トリル)-ベンジジン)を40nm蒸着し、
この上に下記化合物Bと遷移金属錯体(1-2)を9対1の比
率(質量比)で20nm共蒸着し、更にこの上に下記アゾー
ル化合物Cを40nm蒸着して有機薄膜を形成した。次に得
られた有機薄膜上に発光面積が4mm×5mmとなるように
パターニングしたマスクを設置し、蒸着装置内でマグネ
シウム及び銀(マグネシウム:銀=10:1(質量比))
を50nm共蒸着し、更に銀を50nm蒸着して、実施例4の発
光素子を作成した。得られた発光素子の発光輝度を上記
比較例1と同様に測定した結果、青緑色発光が得られ、
最高輝度は2400cd/m2であった。
Example 4 A washed ITO substrate was placed in a vapor deposition apparatus, and TPD (N, N′-diphenyl-N, N′-di (m-tolyl) -benzidine) was vapor-deposited to a thickness of 40 nm.
On this, the following compound B and the transition metal complex (1-2) were co-evaporated at a ratio (mass ratio) of 9: 1 to 20 nm, and then the following azole compound C was evaporated to a thickness of 40 nm to form an organic thin film. Next, a mask patterned so as to have a light emitting area of 4 mm × 5 mm is set on the obtained organic thin film, and magnesium and silver (magnesium: silver = 10: 1 (mass ratio)) in a vapor deposition apparatus.
Was co-evaporated to a thickness of 50 nm, and silver was further evaporated to a thickness of 50 nm to produce a light-emitting element of Example 4. As a result of measuring the light emission luminance of the obtained light emitting device in the same manner as in Comparative Example 1, blue-green light was obtained,
The highest luminance was 2400 cd / m 2 .

【0052】[0052]

【化12】 Embedded image

【0053】[0053]

【発明の効果】以上詳述したように、本発明の発光素子
用材料を用いた発光素子は高輝度発光が可能であり、耐
久性に優れており、発光素子用材料を適宜選択すること
により種々の発光色が可能である。そのため本発明の発
光素子は表示素子、ディスプレイ、バックライト、電子
写真、照明光源、記録光源、露光光源、読み取り光源、
標識、看板、インテリア、光通信デバイス等に好適に使
用できる。また、本発明の発光素子用材料をなす遷移金
属錯体は、医療用途、蛍光増白剤、写真用材料、UV吸収
材料、レーザー色素、カラーフィルター用染料、色変換
フィルター、光学記録材料等に適用可能である。
As described in detail above, the light emitting device using the light emitting device material of the present invention can emit light with high luminance, is excellent in durability, and can be obtained by appropriately selecting the light emitting device material. Various emission colors are possible. Therefore, the light emitting device of the present invention is a display device, a display, a backlight, an electrophotograph, an illumination light source, a recording light source, an exposure light source, a reading light source,
It can be suitably used for signs, signs, interiors, optical communication devices, and the like. Further, the transition metal complex forming the material for the light emitting device of the present invention is applied to medical uses, fluorescent brighteners, photographic materials, UV absorbing materials, laser dyes, color filter dyes, color conversion filters, optical recording materials, and the like. It is possible.

───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.7 識別記号 FI テーマコート゛(参考) C07F 15/00 C07F 15/00 B ──────────────────────────────────────────────────続 き Continued on the front page (51) Int.Cl. 7 Identification symbol FI Theme coat ゛ (Reference) C07F 15/00 C07F 15/00 B

Claims (5)

【特許請求の範囲】[Claims] 【請求項1】 イソニトリル配位子、並びにイリジウ
ム、ルテニウム及びロジウムからなる群から選ばれる遷
移金属を含有する遷移金属錯体からなることを特徴とす
る発光素子用材料。
1. A light-emitting element material comprising an isonitrile ligand and a transition metal complex containing a transition metal selected from the group consisting of iridium, ruthenium and rhodium.
【請求項2】 請求項1に記載の発光素子用材料におい
て、前記遷移金属錯体が下記一般式(2)により表される
ことを特徴とする発光素子用材料。 【化1】 一般式(2)中、Mはイリジウム、ルテニウム又はロジウム
であり、R21は置換基を表し、L21は配位子を表し、X21
は対イオンを表す。n21は0〜5の整数を表し、n22は1
〜6の整数を表し、n23は0〜3の整数を表す。
2. The material for a light-emitting element according to claim 1, wherein the transition metal complex is represented by the following general formula (2). Embedded image In the general formula (2), M is iridium, ruthenium or rhodium, R 21 represents a substituent, L 21 represents a ligand, X 21
Represents a counter ion. n21 represents an integer of 0 to 5;
And n23 represents an integer of 0 to 3.
【請求項3】 一対の電極間に、発光層又は発光層を含
む複数の有機化合物層を有する発光素子において、前記
発光層又は前記複数の有機化合物層のうち少なくとも一
層が、請求項1又は2に記載の発光素子用材料を含有す
ることを特徴とする発光素子。
3. A light-emitting element having a light-emitting layer or a plurality of organic compound layers including the light-emitting layer between a pair of electrodes, wherein at least one of the light-emitting layer and the plurality of organic compound layers is one or more. A light-emitting device comprising the light-emitting device material described in 1 above.
【請求項4】 請求項3に記載の発光素子において、前
記発光素子用材料を含有する層が塗布プロセスで成膜し
た層であることを特徴とする発光素子。
4. The light-emitting element according to claim 3, wherein the layer containing the light-emitting element material is a layer formed by a coating process.
【請求項5】 下記一般式(1)で表されることを特徴と
する遷移金属錯体。 【化2】 一般式(1)中、Mはイリジウム、ルテニウム又はロジウム
であり、R11、R12及びR13はそれぞれ置換基を表し、n11
及びn12はそれぞれ0〜4の整数を表し、L11は1価の配
位子を表す。
5. A transition metal complex represented by the following general formula (1). Embedded image In the general formula (1), M is iridium, ruthenium or rhodium, R 11 , R 12 and R 13 each represent a substituent, n11
And n12 each represents an integer of 0 to 4, L 11 represents a monovalent ligand.
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