JP2002235045A - Method for producing composite substrate - Google Patents

Method for producing composite substrate

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Publication number
JP2002235045A
JP2002235045A JP2001033898A JP2001033898A JP2002235045A JP 2002235045 A JP2002235045 A JP 2002235045A JP 2001033898 A JP2001033898 A JP 2001033898A JP 2001033898 A JP2001033898 A JP 2001033898A JP 2002235045 A JP2002235045 A JP 2002235045A
Authority
JP
Japan
Prior art keywords
substrate
adhesive
substrates
composite substrate
dropped
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2001033898A
Other languages
Japanese (ja)
Other versions
JP4736198B2 (en
Inventor
Tomohiro Shinpo
朋弘 新保
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dai Nippon Printing Co Ltd
Original Assignee
Dai Nippon Printing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dai Nippon Printing Co Ltd filed Critical Dai Nippon Printing Co Ltd
Priority to JP2001033898A priority Critical patent/JP4736198B2/en
Publication of JP2002235045A publication Critical patent/JP2002235045A/en
Application granted granted Critical
Publication of JP4736198B2 publication Critical patent/JP4736198B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Adhesives Or Adhesive Processes (AREA)

Abstract

PROBLEM TO BE SOLVED: To produce a composite substrate having high uniformity of film thickness of an adhesive and improved in a degree of parallelization between two substrates in a short time when producing the composite substrate by laminating a thin-film coating material on a substrate in which various kinds of functions are imparted to the surface through the adhesive. SOLUTION: This method comprises fixing a surface plate 2 having a flat surface improved in planarity on a spinner 1 in which a rotational speed can be changed so that the flat surface becomes the upper side, adhering the thin plate (a primary substrate 3) on the surface plate 2, dripping the adhesive 4 on the primary substrate 3 and mounting a secondary substrate 5 on the adhesive 4. The drip of the adhesive 4 is carried out so that the adhesive draws at least in two linear shapes such as X shape or Y shape at the time. The adhesive is extended to the vicinity to the peripheral part of the composite substrate by rotating the spinner 1 at a low speed. The surplus adhesive is then removed from the gap between the primary and secondary substrates by rotating the spinner 1 at a high speed to generate centrifugal force.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は2枚の基板を接着剤
を介して貼り合わせて作られる複合基板の製造方法に関
し、より具体的には、種々の機能が付与された基板に接
着剤を介して薄膜被覆材を貼り合わせて複合基板を製造
するのに好適な製造方法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for manufacturing a composite substrate formed by bonding two substrates via an adhesive, and more specifically, to a method for applying an adhesive to a substrate having various functions. The present invention relates to a manufacturing method suitable for manufacturing a composite substrate by laminating a thin film covering material through the intermediary.

【0002】[0002]

【従来の技術】2枚の基板を接着剤を介して貼り合わせ
た複合基板は種々の分野で知られている。例えば、電子
部品や光学部品においては、種々の機能を付与した基板
(第2の基板)の表面に薄板ガラスなど(第1の基板)
を薄膜被覆材として貼り合わせたものが用いられる。そ
のような部品においては、第1の基板である被覆に使用
した薄板表面には高い平面性が要求される。
2. Description of the Related Art Composite substrates in which two substrates are bonded together via an adhesive are known in various fields. For example, in the case of electronic components and optical components, thin glass or the like (first substrate) is provided on the surface of a substrate (second substrate) provided with various functions.
Bonded together as a thin film coating material. In such a component, a high flatness is required for the surface of the thin plate used for the coating as the first substrate.

【0003】そのような複合基板の改良された製造方法
として特開2000−160107号公報には次のよう
な製造方法が開示されている。すなちわ、回転塗布機に
設置されているスピンナー上に平面性を高めた平坦面を
持つ定盤を固定し、その上に薄板ガラス板やフィルムな
どである厚みの薄い第1の基板を置く。次に、該第1の
基板の表面に液状の接着剤を滴下し、該接着剤が未硬化
の状態でその上から第1の基板よりも厚みの厚い第2の
基板5を載置する。その状態で定盤を高速回転させて余
剰の接着剤を遠心力により振り切り、第1の基板と第2
の基板とが平行度の高い状態で接着剤を介して積層され
た複合基板を得る。その複合基板を、接着剤が熱硬化性
のものであれば、ヒーターまたは温風等で加熱し、接着
剤が電離放射線硬化性のものであれば、電離放射線放射
線(例えば、電子線や紫外線)を照射して、接着剤を硬
化させることにより、表面の平面性が高い薄板(第1の
基板)で被覆された複合基板が得られる。
As an improved method of manufacturing such a composite substrate, Japanese Patent Application Laid-Open No. 2000-160107 discloses the following method. That is, a platen having a flat surface with improved flatness is fixed on a spinner installed in a spin coating machine, and a thin first substrate such as a thin glass plate or a film is fixed thereon. Put. Next, a liquid adhesive is dropped on the surface of the first substrate, and a second substrate 5 having a thickness larger than that of the first substrate is placed on the adhesive in an uncured state. In this state, the platen is rotated at a high speed and excess adhesive is shaken off by centrifugal force.
To obtain a composite substrate laminated with the substrate with high parallelism via an adhesive. If the adhesive is thermosetting, the composite substrate is heated with a heater or warm air, and if the adhesive is ionizing radiation curable, ionizing radiation (eg, electron beam or ultraviolet). To cure the adhesive, thereby obtaining a composite substrate covered with a thin plate (first substrate) having high surface flatness.

【0004】[0004]

【発明が解決しようとする課題】上記の製造方法におい
て、接着剤は第1の基板のほぼ中央位置に山なりの状態
に滴下される。その上に第2の基板を載置すると、第2
の基板は山なり状態である接着剤の影響を受けてどうし
てもわずかに傾斜した姿勢になる。その状態のままで、
スピンナーを高速回転(通常1000〜5000rp
m)させると、接着剤の遠心力による広がりが不均一と
なり、第1の基板上での接着剤の厚みが不均一となる
(例えば、150mm角の面内で5μm程度の厚みムラ
が生じる)。その状態で接着剤を硬化させるので、製造
された複合基板の第1の基板と第2の基板の平行度が不
十分となり、製品として不良品となる。
In the manufacturing method described above, the adhesive is dropped in a mountain-like state substantially at the center of the first substrate. When the second substrate is placed thereon, the second substrate
The substrate is inevitably in a slightly inclined posture due to the influence of the adhesive in a mountainous state. In that state,
Spinner spins at high speed (usually 1000-5000rpm)
m), the spread of the adhesive due to the centrifugal force becomes uneven, and the thickness of the adhesive on the first substrate becomes uneven (for example, a thickness unevenness of about 5 μm occurs in a plane of 150 mm square). . Since the adhesive is cured in that state, the parallelism between the first substrate and the second substrate of the manufactured composite substrate becomes insufficient, resulting in a defective product.

【0005】本発明は、上記の事情に鑑みてなされたも
のであり、その目的は、2枚の基板を接着剤を介して貼
り合わせて作られる複合基板、より具体的には、薄膜被
覆材の表面に滴下した接着剤を介して種々の機能が表面
に付与された基板を貼り合わせて複合基板を製造するに
際して、該滴下された接着剤に起因して生じる2枚の基
板間の平行度の不足を効果的に回避することができ、そ
れにより、不良品が発生する確率を大きく低減すること
のできる複合基板の製造方法を提供することにある。
The present invention has been made in view of the above circumstances, and has as its object to provide a composite substrate formed by bonding two substrates via an adhesive, and more specifically, a thin film coating material. When a composite substrate is manufactured by bonding substrates having various functions to the surface through an adhesive dropped on the surface of the substrate, the parallelism between the two substrates caused by the dropped adhesive is produced. It is an object of the present invention to provide a method of manufacturing a composite substrate, which can effectively avoid shortage of components and thereby greatly reduce the probability of occurrence of defective products.

【0006】[0006]

【課題を解決するための手段】上記の課題を解決するた
めの本発明による複合基板の製造方法は、回転速度が可
変とされかつ平面性を高めた平坦面を表面に持つ定盤の
上に第1の基板を密着させる工程、前記第1の基板の上
に接着剤を滴下する工程、前記接着剤の上から前記第1
の基板の上に第2の基板を載置する工程、前記定盤の回
転により前記第1と第2の基板を回転させ遠心力の作用
により第1と第2の基板の間から余分な接着剤を除去す
る工程、とを順次行う複合基板の製造方法において、前
記第1の基板上への接着剤を滴下を、少なくとも2本以
上の線状体となるように、好ましくは、該第1の基板の
ほぼ中央位置から周辺部に向けて少なくとも2本以上の
放射状の線状体となるようにして行うことを特徴とす
る。
A method for manufacturing a composite substrate according to the present invention for solving the above-mentioned problems is provided on a surface plate having a flat surface with a variable rotation speed and improved flatness. A step of bringing a first substrate into close contact, a step of dropping an adhesive on the first substrate,
Placing the second substrate on the first substrate, rotating the first and second substrates by rotating the platen, and applying extra centrifugal force between the first and second substrates by the action of centrifugal force. And a step of sequentially removing the agent. In the method of manufacturing a composite substrate, the adhesive is dropped onto the first substrate so as to form at least two or more linear bodies. This is characterized in that at least two or more radial linear bodies are formed from the substantially central position of the substrate toward the peripheral portion.

【0007】本発明の製造方法によれば、第1の基板の
上へ滴下された直後の接着剤は、実質的にほぼ同じ厚み
とされた少なくとも2本以上の線状体として、より好ま
しくは、第1の基板のほぼ中央位置から周辺部に向けて
延びる実質的にほぼ同じ厚みとされた少なくとも2本以
上の放射状の線状体として形成されているので、滴下さ
れた接着剤の上から第1の基板の上に第2の基板を載置
するときに、等量の接着剤が山なりの状態に滴下される
従来方式と比較して、第2の基板の第1の基板に対する
傾斜度は大きく低減し、実質的に両者は平行状態に維持
される。そのために、第2の基板を載置した後に定盤を
高速回転(通常1000〜5000rpm)させても、
接着剤の遠心力による広がりは均一なものとなり、第1
の基板上での接着剤の厚みは均一となる。結果として、
接着剤の硬化後に製造される複合基板の第1の基板と第
2の基板の平行度は非常に高くなり、不良品発生の歩留
まり率は大きく低減する。
According to the manufacturing method of the present invention, the adhesive immediately after being dropped on the first substrate is preferably at least two or more linear bodies having substantially the same thickness, more preferably. Is formed as at least two or more radial linear bodies having substantially the same thickness and extending from the substantially central position of the first substrate toward the peripheral portion. When the second substrate is placed on the first substrate, the inclination of the second substrate with respect to the first substrate is smaller than that of the conventional method in which an equal amount of adhesive is dropped in a mountain shape. The degree is greatly reduced and both are kept substantially parallel. Therefore, even if the surface plate is rotated at a high speed (usually 1000 to 5000 rpm) after the second substrate is placed,
The spread of the adhesive due to centrifugal force becomes uniform,
The thickness of the adhesive on the substrate becomes uniform. as a result,
The parallelism between the first substrate and the second substrate of the composite substrate manufactured after the curing of the adhesive becomes very high, and the yield of defective products is greatly reduced.

【0008】好ましい態様において、本発明による複合
基板の製造方法は、前記定盤の回転により余分な接着剤
を除去する工程の前工程として、滴下した接着剤を第1
と第2の基板の間で周辺部近傍にまで行き渡らせる工程
をさらに含むようにされる。本発明者らの実験によれ
ば、そのような前工程を行うことにより、第1と第2の
基板の間での接着剤の膜厚がさらに均一となり、気泡が
含まれることもなく、双方の基板の平行度はさらに高く
なることを確認できた。そして、第1の基板がきわめて
薄い(50μm程度)ものである場合にも、高い平坦度
は確保された。また、滴下した接着剤が第1と第2の基
板の間で周辺部近傍にまで行き渡るのに要する時間は、
等量の接着剤を第1の基板のほぼ中央に山なりの状態に
滴下する従来方式の場合と比較して、本発明による場合
には大きく短縮され、複合基板の製造に要する時間を短
縮することが可能となった。
In a preferred aspect, in the method for manufacturing a composite substrate according to the present invention, the dropped adhesive is used as a first step before the step of removing excess adhesive by rotating the platen.
And a step of extending the vicinity of the peripheral portion between the first substrate and the second substrate. According to the experiments of the present inventors, by performing such a pre-process, the film thickness of the adhesive between the first and second substrates becomes more uniform, and no air bubbles are contained. It was confirmed that the parallelism of the substrate was further increased. Then, even when the first substrate was extremely thin (about 50 μm), high flatness was ensured. The time required for the dropped adhesive to reach the vicinity of the peripheral portion between the first and second substrates is as follows:
Compared with the conventional method in which an equal amount of the adhesive is dripped in a mountain-like state substantially at the center of the first substrate, the time according to the present invention is greatly reduced, and the time required for manufacturing the composite substrate is reduced. It became possible.

【0009】滴下した接着剤を第1と第2の基板の間に
周辺部近傍にまで行き渡らせるには、基本的には、第2
の基板の重さを接着剤に作用させて接着剤を延伸させる
ことによって行う。上位となる第2の基板は通常厚みの
厚いものでありある程度の質量を有するので、接着剤の
延伸はスムースに進行する。他の処理を同時に行って時
間を短縮することもできる。他の処理としては、例え
ば、接着剤を加熱してその粘性を下げる処理や接着剤に
振動を与えるような処理でもよく、遠心力の作用により
余分な接着剤を除去するときの回転数よりも遅い回転数
(100〜500rpm程度)で前記スピンナーを回転
させるようにしてもよい。複数の処理を同時に行っても
よい。
In order for the dropped adhesive to spread to the vicinity of the peripheral portion between the first and second substrates, basically the second adhesive is used.
This is performed by applying the weight of the substrate to the adhesive to stretch the adhesive. Since the upper second substrate is usually thick and has a certain amount of mass, the stretching of the adhesive proceeds smoothly. Other processes can be performed simultaneously to reduce the time. As other processing, for example, a processing of heating the adhesive to reduce its viscosity or a processing of giving vibration to the adhesive may be performed, and may be performed at a speed lower than the number of rotations when removing excess adhesive by the action of centrifugal force. The spinner may be rotated at a low rotation speed (about 100 to 500 rpm). A plurality of processes may be performed simultaneously.

【0010】上記のようにして製造された複合基板は、
次いで、接着剤を硬化する工程におかれる。用いる接着
剤の種類に応じた最適の硬化処理が施されるが、硬化の
一律性と迅速性から、接着剤として電離放射線硬化性の
接着剤を用い、硬化処理を電離放射線照射によって行う
ことは特に好ましい態様である。
The composite substrate manufactured as described above is
Next, a step of curing the adhesive is performed. The optimal curing process is performed according to the type of adhesive used.However, due to the uniformity and rapidity of curing, it is not possible to use an ionizing radiation curable adhesive as the adhesive and perform the curing process by ionizing radiation irradiation. This is a particularly preferred embodiment.

【0011】本発明の方法は、2枚の基板がその間に接
着剤を介して積層されている任意の複合基板の製造方法
に用いることができ、2枚の基板に特に制限はないが、
前記のように、下位となる第1の基板がごく薄いもので
あり、上位となる第2の基板が厚く質量の大きいもので
ある場合に、特に有効な製造方法となる。例えば、第2
の基板が光学フィルムなどの機能性材料を貼り合せた機
能性を有する基板であり、第1の基板が薄板ガラス板や
フィルムなどである薄膜被覆材である場合に、本発明の
製造方法は有効であり、表面の均平度が高くかつ2枚の
基板の平行度も高くされた複合基板を、容易かつ迅速
に、また、高い再現性下で製造することができる。
The method of the present invention can be used for a method of manufacturing an arbitrary composite substrate in which two substrates are laminated with an adhesive therebetween, and the two substrates are not particularly limited.
As described above, this is a particularly effective manufacturing method when the lower first substrate is very thin and the upper second substrate is thick and large in mass. For example, the second
The method of the present invention is effective when the first substrate is a functional substrate obtained by laminating a functional material such as an optical film, and the first substrate is a thin glass covering material such as a thin glass plate or a film. Thus, a composite substrate having a high surface flatness and a high degree of parallelism between two substrates can be easily and quickly manufactured with high reproducibility.

【0012】[0012]

【発明の実施の形態】以下、図面を参照しながら本発明
を詳細に説明する。図1は本発明の製造方法を工程順に
説明する図である。この例において、装置としては、ス
ピンナー1を備える回転塗布機を使用している。スピン
ナー1の一端には真空吸引により塗布体が固定される。
塗布液は別の加圧タンクに溜めておき、電磁弁の開閉時
間の調整により一定量の塗料を吐出させて被塗布体上に
滴下し、滴下後、スピンナー1を高速回転させて、遠心
力により滴下された塗料を被塗布体表面に拡げる。この
ような回転塗布機は、比較的小型の板状体に塗布を行う
のに適し、電子部品等の製造においてレジストの塗布等
によく使用されているものである。以下の例では上記装
置を接着剤の滴下装置として用いている。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, the present invention will be described in detail with reference to the drawings. FIG. 1 is a view for explaining the manufacturing method of the present invention in the order of steps. In this example, a spin coater provided with a spinner 1 is used as an apparatus. An application body is fixed to one end of the spinner 1 by vacuum suction.
The coating liquid is stored in another pressurized tank, and a certain amount of paint is discharged by adjusting the opening and closing time of the solenoid valve and dropped on the object to be coated. Is spread on the surface of the object to be coated. Such a spin coater is suitable for coating a relatively small plate-like body, and is often used for coating a resist in the production of electronic components and the like. In the following example, the above device is used as a device for dropping an adhesive.

【0013】最初に、図1aに示すように、スピンナー
1上に定盤2を固定する。通常、この種のスピンナー1
は、図示しない駆動装置と制御機構とにより、停止状態
から10000rpm程度の高速回転までの間の任意の
回転数で回転できるようにされている。定盤2の固定
は、機械的に行うなど、真空吸引以外の手段で固定して
も構わない。定盤2の表側の面、すなわち、スピンナー
1で固定したのとは反対側の面は、平面性を高めた平坦
面とされている。定盤2としては、好ましくは、平面度
が0.5μm以下である石英ガラス製のものを使用す
る。このように平面性を高めることにより、定盤2と第
1の基板3(本発明でいう、「第1の基板」に相当す
る、以下、第1の基板3という)が隙間無しに接するの
で、真空吸引を続けるような操作を伴うことなく、定盤
2と第1の基板3との密着が保たれる。
First, as shown in FIG. 1A, a platen 2 is fixed on a spinner 1. Usually this kind of spinner 1
Can be rotated at an arbitrary rotational speed from a stopped state to a high-speed rotation of about 10,000 rpm by a drive device and a control mechanism (not shown). The platen 2 may be fixed by means other than vacuum suction, such as mechanically. The front surface of the platen 2, that is, the surface opposite to the surface fixed by the spinner 1, is a flat surface with improved flatness. The platen 2 is preferably made of quartz glass having a flatness of 0.5 μm or less. By increasing the planarity in this way, the surface plate 2 and the first substrate 3 (corresponding to the “first substrate” in the present invention, hereinafter referred to as the first substrate 3) come into contact with each other without any gap. The close contact between the platen 2 and the first substrate 3 is maintained without performing an operation of continuing vacuum suction.

【0014】定盤2と第1の基板3とは平坦度が高いこ
とからそのままでも密着するが、密着性をより良好にす
るために、第1の基板上から加圧するようにしてもよ
い。定盤2の表面は高度の平面性が保たれているため
に、ここに密着した第1の基板3は、第1の基板3自身
の厚みムラや多少のたわみがあっても、定盤2により矯
正され、第1の基板3の下面、すなわち、定盤2に接し
ている面が、定盤2の持つ平面性を持つようになる。そ
の状態で、第1の基板3の表面に少なくとも2本以上の
線状体となるようにして液状の接着剤4を滴下し(図1
b)、その上に、機能性材料層6と第2の基板5との積
層板5aを機能性材料層6が第1の基板3側として載置
する。なお、接着剤4の滴下の態様については、後に詳
細に説明する。
Although the surface plate 2 and the first substrate 3 are in close contact with each other because of their high flatness, they may be pressed from above the first substrate in order to improve the adhesion. Since the surface of the surface plate 2 maintains a high degree of flatness, the first substrate 3 adhered to the surface of the surface plate 2 is not affected even if the first substrate 3 itself has a thickness unevenness or some bending. The lower surface of the first substrate 3, that is, the surface in contact with the surface plate 2 has the flatness of the surface plate 2. In this state, the liquid adhesive 4 is dropped onto the surface of the first substrate 3 so as to form at least two or more linear bodies (FIG. 1).
b) A laminate 5 a of the functional material layer 6 and the second substrate 5 is placed thereon with the functional material layer 6 facing the first substrate 3. The mode of dropping the adhesive 4 will be described later in detail.

【0015】好ましくは、その状態でしばらく放置し、
積層板5aの重量により接着剤4が延伸して、図1cに
示すように、接着剤4が第1の基板3と積層板5aの間
にその周辺部近傍にまで行き渡らるようにする。それに
より、接着剤4は第1の基板3と積層板5aとの間に一
層均一な厚さで広がり、かつ、第1の基板3と積層板5
a(第2の基板5)との平行度も一層高く確保される。
放置の間に、延伸の補完的手段として、接着剤の種類に
応じて、適宜の振動発生手段により接着剤4に振動を与
えてもよく、接着剤4を加熱してその粘性を下げるよう
な処理を行ってもよい。さらに、前記スピンナー1を1
00〜500rpm程度の低速で回転させ、それによ
り、第1の基板3と積層板5aの間で遠心力の作用によ
って接着剤4を延伸させるようにしてもよい。上記の処
理を複数同時に行ってもよい。
Preferably, leave in that state for a while,
The adhesive 4 is stretched by the weight of the laminate 5a so that the adhesive 4 spreads between the first substrate 3 and the laminate 5a to the vicinity of the periphery thereof as shown in FIG. 1c. As a result, the adhesive 4 spreads between the first substrate 3 and the laminate 5a with a more uniform thickness, and the first substrate 3 and the laminate 5
a (parallel with the second substrate 5) is further ensured.
During the standing, vibration may be applied to the adhesive 4 by an appropriate vibration generating means according to the type of the adhesive as a complementary means of stretching, and the adhesive 4 may be heated to reduce its viscosity. Processing may be performed. Further, the spinner 1 is
The adhesive 4 may be rotated at a low speed of about 00 to 500 rpm, whereby the adhesive 4 is stretched between the first substrate 3 and the laminate 5a by the action of centrifugal force. A plurality of the above processes may be performed simultaneously.

【0016】上記のようにして、接着剤4が第1の基板
3と積層板5aの間にその周辺部近傍にまで広がった段
階(図1cの状態)で、スピンナー1を高速回転(10
00〜5000rpm程度)させると、接着剤4の第1
の基板3と積層板5aとの間の厚みが均一に減少してい
き、余剰の接着剤4は周囲よりはみ出して、遠心力によ
り振り切られる(図1d)。なお、このとき、接着剤の
粘度、経過時間に対する回転数(rpm)および回転時
間を調整することにより、接着剤4の厚みを適宜制御す
ることができる。以上の工程により、第1の基板3と第
2の基板5(積層板5a)が接着剤4により積層され
る。
As described above, at the stage where the adhesive 4 has spread to the vicinity of the periphery between the first substrate 3 and the laminate 5a (the state shown in FIG. 1C), the spinner 1 is rotated at a high speed (10 degrees).
When it is set to about 00 to 5000 rpm, the first adhesive 4
The thickness between the substrate 3 and the laminate 5a decreases uniformly, and the excess adhesive 4 protrudes from the surroundings and is shaken off by centrifugal force (FIG. 1d). At this time, the thickness of the adhesive 4 can be appropriately controlled by adjusting the viscosity of the adhesive, the number of rotations (rpm) with respect to the elapsed time, and the rotation time. Through the above steps, the first substrate 3 and the second substrate 5 (laminate 5a) are laminated with the adhesive 4.

【0017】高速回転終了後、接着剤が熱硬化性のもの
であれば、ヒーターまたは温風等で加熱し、接着剤が電
離放射線硬化性のものであれば、電離放射線放射線を照
射して、接着剤を硬化させる(図1e)。この後、第2
の基板5(積層板5a)と第1の基板3が一体になった
複合基板Bをエアブロウまたはプラスチック製のへラの
ようなセパレーター7を用いて定盤2から剥離する(図
1f)。そして、剥離後の複合基板8をオーブンなどに
入れて、加熱処理(例えば、120℃、1時間)を加
え、接着剤を完全硬化させる。上記の工程を経ることに
より、本発明による複合基板は作られる。
After the high-speed rotation, if the adhesive is thermosetting, it is heated with a heater or warm air, and if the adhesive is ionizing radiation-curable, it is irradiated with ionizing radiation. The adhesive is cured (FIG. 1e). After this, the second
The composite substrate B in which the substrate 5 (laminated plate 5a) and the first substrate 3 are integrated is separated from the surface plate 2 using a separator 7 such as an air blow or a plastic spatula (FIG. 1f). Then, the peeled composite substrate 8 is placed in an oven or the like, and a heat treatment (for example, 120 ° C., 1 hour) is applied to completely cure the adhesive. Through the above steps, a composite substrate according to the present invention is produced.

【0018】次に、第1の基板3の表面に液状の接着剤
4を滴下する態様と、滴下に用いる滴下装置とについて
説明する。図2は接着剤滴下装置の一実施の形態を示し
ている。図2において、10は先端に接着剤吐出ノズル
11を備えたディスペンサーであり、内部に液状の接着
剤の吐出開始と停止及び吐出量の調整を行う流量調整開
閉弁や液状接着剤の流路としての配管類などを備えてい
る。なお、ディスペンサー10自体は従来知られたもの
である。
Next, a mode of dropping the liquid adhesive 4 on the surface of the first substrate 3 and a dropping device used for dropping will be described. FIG. 2 shows an embodiment of the adhesive dropping device. In FIG. 2, reference numeral 10 denotes a dispenser having an adhesive discharge nozzle 11 at its tip, which serves as a flow control opening / closing valve for starting and stopping the discharge of the liquid adhesive and adjusting the discharge amount, and a flow path of the liquid adhesive. And other piping. The dispenser 10 itself is conventionally known.

【0019】前記ディスペンサー10はコンピュータ制
御される3軸(XYZ)方向移動ステージ20に支持さ
れており、被滴下材である平板3(実際の例では、本発
明でいう「第1の基板」、以下、第1の基板3という)
上の任意の位置に移動できるようX軸、Y軸方向(水平
方向)に移動可能に、また、第1の基板3の表面から所
定の高さまでノズル11の先端位置を調整できるように
Z軸方向(上下方向)にも移動可能とされている。この
ような3軸(XYZ)方向移動ステージ20も従来知ら
れたものであり、詳細な説明は省略する。
The dispenser 10 is supported by a computer-controlled three-axis (XYZ) moving stage 20, and is a flat plate 3 (in a practical example, a "first substrate", Hereinafter, it is referred to as a first substrate 3)
Z axis so that it can be moved in the X-axis and Y-axis directions (horizontal direction) so that it can be moved to any position above, and the tip position of the nozzle 11 can be adjusted from the surface of the first substrate 3 to a predetermined height. It is also possible to move in the direction (vertical direction). Such a three-axis (XYZ) direction moving stage 20 is also conventionally known, and a detailed description thereof will be omitted.

【0020】30は液状接着剤を収容するタンクであ
り、内部に加圧装置(不図示)を備えていて、収容した
液状接着剤をタンク内圧力により送出できるようになっ
ている。このような液送圧力タンクも従来知られたもの
であってよい。ディスペンサー10とタンク30とは液
送配管31により接続されており、ディスペンサー10
に配置した流量調整開閉弁を制御することにより、所定
量の接着剤がディスペンサー10のノズル11から吐出
される。
Reference numeral 30 denotes a tank for storing the liquid adhesive, which is provided with a pressurizing device (not shown) therein so that the stored liquid adhesive can be sent out by the pressure in the tank. Such a liquid sending pressure tank may be a conventionally known one. The dispenser 10 and the tank 30 are connected by a liquid feed pipe 31 and the dispenser 10
A predetermined amount of adhesive is discharged from the nozzle 11 of the dispenser 10 by controlling the flow rate control on / off valve disposed in the dispenser 10.

【0021】40はシステムコントローラであり、図3
に示すように、前記3軸方向移動ステージ20を制御す
る制御回路41と、ディスペンサー10の流量調整開閉
弁の開閉タイミング及び開度を制御するディスペンサー
制御回路42とを備えるとともに、前面パネルには、入
力用キーボート43やディスプレー44などが備えられ
ている。
Reference numeral 40 denotes a system controller.
As shown in FIG. 5, a control circuit 41 for controlling the three-axis direction moving stage 20 and a dispenser control circuit 42 for controlling the opening / closing timing and opening of the flow rate adjusting on / off valve of the dispenser 10 are provided. An input keyboard 43 and a display 44 are provided.

【0022】図2に示すように、滴下作業の開始に当た
り、作業台(定盤)上に第1の基板3をセットする。そ
して、第1の基板3における接着剤の滴下開始位置r
(1個又は複数個)と滴下停止位置R(1個又は複数
個)とを座標入力し、次いで、吐出開始信号を入力す
る。それにより、ディスペンサー10は開始位置rへ移
動し、到達後に、ディスペンサー10のノズル11が降
下して所定の高さで接着剤の吐出が開始する。接着剤の
吐出を継続しながら、ディスペンサー10は停止位置R
へ移動し、そこで接着剤の吐出を停止する。それによ
り、例えば図4B−1に示すように、第1の基板3のほ
ぼ中央を通過し、かつ、一方の辺近傍から他方の辺近傍
に向けて延びる、接着剤による第1の線状体L1が形成
される。次に、第1の基板3を90度回転させるか、デ
ィスペンサー10を90度変位させた後、同じ滴下操作
を行う。それにより、第1の線状体L1の長手方向のほ
ぼ中央位置において90度の角度で交差する第2の線状
体L2が形成される。
As shown in FIG. 2, at the start of the dropping operation, the first substrate 3 is set on a worktable (table). Then, the drop start position r of the adhesive on the first substrate 3
(One or more) and the drop stop position R (one or more) are input as coordinates, and then an ejection start signal is input. As a result, the dispenser 10 moves to the start position r, and after arriving, the nozzle 11 of the dispenser 10 descends to start discharging the adhesive at a predetermined height. While continuing to discharge the adhesive, the dispenser 10 moves to the stop position R.
And discharge of the adhesive is stopped there. Thereby, as shown in FIG. 4B-1, for example, the first linear body made of an adhesive passes through substantially the center of the first substrate 3 and extends from the vicinity of one side to the vicinity of the other side. L1 is formed. Next, after rotating the first substrate 3 by 90 degrees or displacing the dispenser 10 by 90 degrees, the same dropping operation is performed. Thereby, a second linear body L2 that intersects at an angle of 90 degrees at a substantially central position in the longitudinal direction of the first linear body L1 is formed.

【0023】図2に示した装置を用い、滴下開始位置r
と滴下停止位置Rの座標位置を適宜設定することによ
り、第1の基板3の上に実質的にほぼ同じ厚みとされた
2本以上の線状体、好ましくは第1の基板3のほぼ中央
位置から周辺部に向けて延びる実質的にほぼ同じ厚みと
された少なくとも2本以上の放射状の線状体として、接
着剤4を滴下することが可能となる。図4C−1は、第
1の基板3の対角線上を走る2本の放射状の線状体とし
て接着剤を滴下した態様であり、図4D−1は全体とし
てYの字となる3本の放射状の線状体として接着剤を滴
下した態様である。他にも多くの態様をとることができ
る。滴下された接着剤は、静置しておくことにより、例
えばB−1→B−2→B−3のように、次第に第1の基
板3の周辺部近傍にまで広がっていく。
Using the apparatus shown in FIG. 2, the drop start position r
By appropriately setting the coordinate position of the dropping stop position R, two or more linear bodies having substantially the same thickness on the first substrate 3, preferably substantially the center of the first substrate 3. The adhesive 4 can be dropped as at least two or more radial linear bodies having substantially the same thickness extending from the position toward the peripheral portion. FIG. 4C-1 shows an embodiment in which an adhesive is dropped as two radial linear bodies running on a diagonal line of the first substrate 3, and FIG. 4D-1 shows three radial bodies as a whole having a Y shape. In this embodiment, the adhesive is dropped as a linear body. Many other aspects can be taken. The dropped adhesive gradually spreads to the vicinity of the peripheral portion of the first substrate 3, for example, as B-1 → B-2 → B-3 by being left standing.

【0024】[0024]

【実施例】次に、実施例により本発明を説明する。 [実施例1]第1の基板3に相当する薄板ガラス(AF
45:ショット社製、熱膨張係数45×10−7/℃、
厚さ50μm、140mm角)を定盤2(AL硝子:旭
硝子社製、熱膨張係数37×10−7/℃、厚さ6.3
5mm、140mm角、平坦性5μm以下)に貼り付
け、第1の基板3側を上にして、平坦性を有する定盤2
をスピンナー1上に固定した。定盤2、第1の基板3の
双方共、洗浄済のものを使用し、貼り付け時に、異物等
の混入を防ぐためクリーンルーム内の清浄度の高いクリ
ーンベンチ内で行った。
Next, the present invention will be described by way of examples. [Example 1] A thin glass (AF) corresponding to the first substrate 3
45: manufactured by Shott Co., thermal expansion coefficient 45 × 10−7 / ° C.,
Surface plate 2 (AL glass: manufactured by Asahi Glass Co., Ltd., thermal expansion coefficient: 37 × 10 −7 / ° C., thickness: 6.3)
5 mm, 140 mm square, flatness 5 μm or less), and a flat surface plate 2 with the first substrate 3 side facing up.
Was fixed on the spinner 1. Both the surface plate 2 and the first substrate 3 were cleaned and used in a clean bench with a high degree of cleanliness in a clean room in order to prevent the entry of foreign matter and the like at the time of sticking.

【0025】次に、第1の基板3の上にディスペンサー
(エッペンドルフ社製:マルチペット4980)を用い
て前記したようにX形、Y形に接着剤4(ノーランド社
製ノーランド65、粘度1000[cps]23℃)を
4g滴下した。滴下後、その上に機能性を有する第2の
基板5(ブランクス(石英:旭ガラス社製、厚さ2.3
mm、150mm角、平坦度5μm以下))を積載し
た。その状態でしばらく放置した後、回転チャック1を
高速回転(1000〜5000rpm)させると接着剤
は完全に複合基板全体に均一に行き渡り、それに伴って
接着剤の厚みが減少し複合基板からはみ出た接着剤は複
合基板を汚すことなく周辺に振り切れた。接着剤4の硬
化後、定盤2から複合基板をエアブロウを用いて剥離し
た。以上の工程より複合基板10が完成した。
Next, the adhesive 4 (Norland 65, Norland Co., viscosity: 1000 [Y]) was formed on the first substrate 3 by using a dispenser (Multipen 4980, manufactured by Eppendorf) as described above. [cps] 23 ° C) was added dropwise. After dropping, a second substrate 5 (blanks (quartz: manufactured by Asahi Glass Co., Ltd., thickness 2.3)
mm, 150 mm square, flatness 5 μm or less)). When the rotary chuck 1 is rotated at a high speed (1000 to 5000 rpm) after being left for a while in this state, the adhesive completely and uniformly spreads over the entire composite substrate. The agent shook off to the periphery without soiling the composite substrate. After the adhesive 4 was cured, the composite substrate was separated from the surface plate 2 using an air blow. The composite substrate 10 was completed through the above steps.

【0026】[実施例2]実施例1におけるディスペン
サーによる接着剤4gの滴下を、図4B−1,図4C−
1,図4D−1に示す形状となるように行った。そのま
ま静止状態で放置し、接着剤が有効領域(この例では、
150mm角の第1の基板内の110m角の領域)まで
行き渡る時間(実質的に、図4B−3,図4C−3,図
4D−3に示される状態となるまでの時間)を測定し
た。その結果を表1に示す。
Example 2 FIGS. 4B-1 and 4C- 4 show the dripping of 4 g of the adhesive by the dispenser in Example 1.
1, and performed so as to have a shape shown in FIG. 4D-1. Leave it standing still and allow the adhesive to reach the active area (in this example,
The time (the time until the state shown in FIGS. 4B-3, 4C-3, and 4D-3 is substantially reached) reaching the area of 110 m square in the 150 mm square first substrate was measured. Table 1 shows the results.

【0027】[実施例3]実施例1におけるディスペン
サーによる接着剤4gの滴下を、図4B−1,図4C−
1,図4D−1に示す形状となるように行い、その上に
機能性を有する第2の基板5(ブランクス(石英:旭ガ
ラス社製、厚さ2.3mm、150mm角、平坦度5μ
m以下)を積載して4分間放置した。その後、回転チャ
ック1を高速回転(1000〜5000rpm)させて
余分な接着剤を振り切った後、電離放射線を照射して接
着剤を硬化させて、複合基板を完成した。それぞれにつ
いて、接着剤膜厚の均一性σと平均膜厚を測定した。ま
た、2枚の基板間の平行度も測定した。その結果を表1
に示す。
[Embodiment 3] 4 g of the adhesive was dropped by the dispenser in the embodiment 1 as shown in FIGS. 4B-1 and 4C-.
1, a second substrate 5 (blanks (quartz: made by Asahi Glass Co., thickness 2.3 mm, 150 mm square, flatness 5 μm) made of Asahi Glass Co., Ltd.) having a shape shown in FIG.
m or less) and left for 4 minutes. Thereafter, the rotating chuck 1 was rotated at a high speed (1000 to 5000 rpm) to shake off excess adhesive, and then irradiated with ionizing radiation to cure the adhesive, thereby completing a composite substrate. For each, the uniformity σ of the adhesive film thickness and the average film thickness were measured. The parallelism between the two substrates was also measured. Table 1 shows the results.
Shown in

【0028】[比較例1]基板の中央に同じ接着剤4g
を図4A−1に示すように山なりに滴下し、以下、実施
例2及び3と同様にして、有効利用域に行き渡るまでの
時間、膜厚均一性、平均膜厚、平行度を測定した。その
結果を表1に示す。
[Comparative Example 1] 4 g of the same adhesive at the center of the substrate
4A-1 was dropped in a mountain-like manner as shown in FIG. 4A-1, and thereafter, in the same manner as in Examples 2 and 3, the time required to reach the effective use area, film thickness uniformity, average film thickness, and parallelism were measured. . Table 1 shows the results.

【0029】[0029]

【表1】 (なお、滴下時での室温は22℃、滴下時間はすべて1
0秒で行った。膜厚は有効領域110mm角の面内16
箇所(碁盤目状)のポイントを測定した。)
[Table 1] (The room temperature at the time of dropping was 22 ° C, and the dropping time was 1
Performed at 0 seconds. The film thickness is 16 within the effective area of 110 mm square.
The points (in a grid pattern) were measured. )

【0030】表1から、従来の滴下方法(図4A−1)
に対して、本発明による滴下方法では、接着剤が行き渡
るまでの時間が短縮され、かつ、得られる複合基板の膜
厚均一性、平行度ともに向上する結果となっていること
がわかる。
Table 1 shows that the conventional dropping method (FIG. 4A-1)
On the other hand, in the dropping method according to the present invention, it can be seen that the time required for the adhesive to spread is shortened, and that the thickness uniformity and the parallelism of the obtained composite substrate are both improved.

【0031】なお、前記平行度の測定には、フィゾー干
渉計(フジノン社製:Fuji Fix05)を使用し
た。平行度の測定は、複合基板の底面の反射光の情報が
得られるように平坦性を有する白紙の上に複合基板を置
き、薄板表面反射光と複合基板底面反射光との干渉によ
る干渉縞の本数をカウントし、平行度を算出した。測定
位置は、複合基板中央の有効領域(110mm角)のう
ち8箇所の設定領域(25H×35W[mm])の干渉
縞本数を測定した。また、干渉縞のカウントは、一旦、
画像を静止画像としてビデオプリンタに取り込みカウン
トした。また、2枚の基板間の接着剤の厚みは表面解析
装置(キーエンス社製:LT8100,2点間モード)
を用いて測定した。
For the measurement of the parallelism, a Fizeau interferometer (Fujinon: Fuji Fix 05) was used. The parallelism is measured by placing the composite substrate on a flat white paper so that information on the reflected light from the bottom surface of the composite substrate can be obtained. The number was counted and the parallelism was calculated. As the measurement position, the number of interference fringes in eight set areas (25H × 35 W [mm]) in the effective area (110 mm square) at the center of the composite substrate was measured. Also, the interference fringe count is
The images were captured as still images in a video printer and counted. The thickness of the adhesive between the two substrates is measured by a surface analysis device (manufactured by Keyence: LT8100, two-point mode).
It measured using.

【0032】[実施例4]4gではなく3.5gの量の
接着剤を図4B−1のパターンに滴下して、図4B−3
に示す形状となるまでの時間を測定したところ、4分1
2秒であった。これは、図4A−1に示す従来例での所
要時間とほぼ同じ時間であり、従来の製造速度でもって
本発明の製造方法により複合基板を製造する場合には、
より少ない接着剤量で所要の複合基板を製造できること
を示している。この点からも、本発明の製造方法の有効
性が示される。
Example 4 An adhesive of 3.5 g instead of 4 g was dropped on the pattern of FIG.
When the time required to obtain the shape shown in FIG.
2 seconds. This is almost the same time as the time required in the conventional example shown in FIG. 4A-1, and when the composite substrate is manufactured by the manufacturing method of the present invention at the conventional manufacturing speed,
This shows that the required composite substrate can be manufactured with a smaller amount of adhesive. This also shows the effectiveness of the production method of the present invention.

【0033】[0033]

【発明の効果】本発明によれば、例えば、種々の機能が
表面に付与された基板に接着剤を介して薄膜被覆材を貼
り合わせて複合基板を製造するような場合に、接着剤の
膜厚均一性が高く、かつ、2つの基板間の平行度の向上
した複合基板をより短い時間で製造することができる。
According to the present invention, for example, when a composite substrate is manufactured by laminating a thin film coating material via an adhesive to a substrate provided with various functions on the surface thereof, A composite substrate with high thickness uniformity and improved parallelism between two substrates can be manufactured in a shorter time.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の製造方法の製造過程を説明するための
図。
FIG. 1 is a view for explaining a manufacturing process of a manufacturing method according to the present invention.

【図2】本発明の製造方法において用いられる接着剤滴
下装置の一実施の形態を説明する図。
FIG. 2 is a diagram illustrating an embodiment of an adhesive dropping device used in the manufacturing method of the present invention.

【図3】図3に示す接着剤滴下装置のシステムコントロ
ーラのブロック図。
FIG. 3 is a block diagram of a system controller of the adhesive dropping device shown in FIG. 3;

【図4】第1の基板への接着剤の滴下態様とその広がり
具合を説明する図であり、図4A−1〜図4A−3は従
来のものを示しており、図4B−1〜図4B−3、図4
C−1〜図4C−3、及び、図4D−1〜図4D−3は
本発明によるものを示している。
FIGS. 4A-1 to 4A-3 are views for explaining a mode of dropping an adhesive onto a first substrate and how the adhesive spreads, and FIGS. 4A-1 to 4A-3 show conventional ones; FIGS. 4B-3, FIG.
FIGS. C-1 to 4C-3 and FIGS. 4D-1 to 4D-3 show an embodiment according to the present invention.

【符号の説明】[Explanation of symbols]

1…スピンナー、2…定盤、3…第1の基板(薄板)、
4…接着剤、5…第2の基板、10…ディスペンサー、
11…ノズル、20…3軸(XYZ)方向移動ステー
ジ、30…液状接着剤の収容タンク、40…システムコ
ントローラ、r…接着剤滴下開始位置、R…接着剤滴下
終了位置
1. Spinner, 2. Platen, 3. First substrate (thin plate),
4 adhesive, 5 second substrate, 10 dispenser,
11: Nozzle, 20: 3-axis (XYZ) direction moving stage, 30: Liquid adhesive storage tank, 40: System controller, r: Adhesive drop start position, R: Adhesive drop end position

Claims (5)

【特許請求の範囲】[Claims] 【請求項1】 回転速度が可変とされかつ平面性を高め
た平坦面を表面に持つ定盤の上に第1の基板を密着させ
る工程、前記第1の基板の上に接着剤を滴下する工程、
前記接着剤の上から前記第1の基板の上に第2の基板を
載置する工程、前記定盤の回転により前記第1と第2の
基板を回転させ遠心力の作用により第1と第2の基板の
間から余分な接着剤を除去する工程、接着剤を硬化させ
る工程とを順次行う複合基板の製造方法において、 前記第1の基板上への接着剤を滴下を、少なくとも2本
以上の線状体となるようにして行うことを特徴とする複
合基板の製造方法。
1. A step of bringing a first substrate into close contact with a surface plate having a flat surface with a variable rotation speed and improved flatness on its surface, wherein an adhesive is dropped on the first substrate. Process,
Placing the second substrate on the first substrate from above the adhesive, rotating the first and second substrates by rotating the surface plate, and applying the first and second substrates by the action of centrifugal force. A method of manufacturing a composite substrate, comprising sequentially removing an excess adhesive from between two substrates and curing the adhesive, wherein at least two or more adhesives are dropped on the first substrate. A method for manufacturing a composite substrate, wherein the method is performed so as to obtain a linear body.
【請求項2】 前記第1の基板の上への接着剤を滴下
を、該第1の基板のほぼ中央位置から周辺部に向けて少
なくとも2本以上の放射状の線状体となるようにして行
うことを特徴とする請求項1記載の複合基板の製造方
法。
2. An adhesive is dropped onto the first substrate so as to form at least two or more radial linear bodies from a substantially central position to a peripheral portion of the first substrate. The method according to claim 1, wherein the method is performed.
【請求項3】 前記定盤の回転により余分な接着剤を除
去する工程の前工程として、滴下した接着剤を第1と第
2の基板の間で周辺部近傍にまで行き渡らせる工程をさ
らに有することを特徴とする請求項1又は2記載の複合
基板の製造方法。
3. The method according to claim 1, further comprising a step of distributing the dropped adhesive to the vicinity of the peripheral portion between the first and second substrates as a step before the step of removing excess adhesive by rotating the surface plate. 3. The method for manufacturing a composite substrate according to claim 1, wherein:
【請求項4】 前記接着剤が電離放射線硬化型であるこ
とを特徴とする請求項1ないし3いずれか記載の複合基
板の製造方法。
4. The method according to claim 1, wherein the adhesive is of an ionizing radiation curing type.
【請求項5】 前記第2の基板が光学フィルムなどの機
能性材料を貼り合せた機能性を有する基板であり、前記
第1の基板が薄板ガラス板やフィルムなどである薄膜被
覆材であることを特徴とする請求項1ないし4いずれか
記載の複合基板の製造方法。
5. The method according to claim 1, wherein the second substrate is a functional substrate obtained by laminating a functional material such as an optical film, and the first substrate is a thin film covering material such as a thin glass plate or a film. The method for manufacturing a composite substrate according to any one of claims 1 to 4, wherein:
JP2001033898A 2001-02-09 2001-02-09 Manufacturing method of composite substrate Expired - Fee Related JP4736198B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
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Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2001033898A JP4736198B2 (en) 2001-02-09 2001-02-09 Manufacturing method of composite substrate

Publications (2)

Publication Number Publication Date
JP2002235045A true JP2002235045A (en) 2002-08-23
JP4736198B2 JP4736198B2 (en) 2011-07-27

Family

ID=18897583

Family Applications (1)

Application Number Title Priority Date Filing Date
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Country Status (1)

Country Link
JP (1) JP4736198B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2021131367A1 (en) * 2019-12-23 2021-07-01 住友化学株式会社 Method for manufacturing optical laminate

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000012423A (en) * 1998-06-18 2000-01-14 Matsushita Electric Ind Co Ltd Method and device for applying resist
JP2000160107A (en) * 1998-11-30 2000-06-13 Dainippon Printing Co Ltd Production of substrate covered with thin plate
JP2001014738A (en) * 1999-06-28 2001-01-19 Victor Co Of Japan Ltd Production of optical recording medium
JP2001056967A (en) * 1999-08-11 2001-02-27 Sony Disc Technology Inc Apparatus and method for producing optical disk

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000012423A (en) * 1998-06-18 2000-01-14 Matsushita Electric Ind Co Ltd Method and device for applying resist
JP2000160107A (en) * 1998-11-30 2000-06-13 Dainippon Printing Co Ltd Production of substrate covered with thin plate
JP2001014738A (en) * 1999-06-28 2001-01-19 Victor Co Of Japan Ltd Production of optical recording medium
JP2001056967A (en) * 1999-08-11 2001-02-27 Sony Disc Technology Inc Apparatus and method for producing optical disk

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2021131367A1 (en) * 2019-12-23 2021-07-01 住友化学株式会社 Method for manufacturing optical laminate

Also Published As

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