JP2002202596A - Photopolymerizable planographic printing plate - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a photopolymerizable planographic printing plate having high sensitivity, good shelf stability, good handleability in a light room and good scuffing resistance. SOLUTION: The photopolymerizable planographic printing plate has a photosensitive layer comprising a photopolymerizable composition containing a halogen-containing photopolymerization initiator and >=30 wt.% radical polymerizable monomer and an oxygen intercepting protective layer containing two or more water-soluble high molecular compounds on the photosensitive layer.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a photopolymerizable lithographic printing plate, and more particularly, to a photopolymerizable lithographic printing plate having high sensitivity, good storage stability, good scratch resistance and good light room handling.

[0002]

2. Description of the Related Art In the field of photosensitive lithographic printing plates, wavelength 3
Solid-state lasers, semiconductor lasers, and gas lasers that emit ultraviolet light, visible light, and infrared light with a wavelength of 00 nm to 1200 nm are easily available in high-output and small-sized lasers. It is very useful as a recording light source when making a plate directly from a plate. Various studies have been made on photosensitive lithographic printing plates (hereinafter also simply referred to as recording materials) that are sensitive to these various laser beams.
Examples of the material recordable with an infrared laser of nm or more include a positive recording material described in U.S. Pat. No. 4,708,925 and an acid-catalyzed cross-linkable negative recording material described in JP-A-8-276558. 300nm to 700n
US Pat. No. 2,850,445 and JP-B-44-2018 are examples of recording materials compatible with ultraviolet or visible light lasers of m.
There are many radical polymerization type negative recording materials and the like described in Japanese Patent Application Laid-Open No. 9-99.

Among them, radical photopolymerization type is highly sensitive and is advantageous for a so-called direct printing plate in which the image is exposed directly to the plate by a computer from various lasers without using a conventional lith film. In the field of the direct printing plate, 488 nm, 532
The combination of a visible light laser light source such as nm and a photopolymerizable lithographic printing plate has been put to practical use, but in addition to the need for higher sensitivity in order to respond to the increase in drawing speed in pursuit of higher productivity, In terms of workability, the demand for handling (light room) under a yellow light or white light instead of a dark room is increasing. Furthermore, the design and development of a photopolymerization initiator or a photopolymerization initiation system have been made to increase the sensitivity.
Attention has been paid to high-sensitivity photopolymerization initiators that contain various halogen atoms. Many of such photopolymerization initiators containing a halogen atom do not absorb visible light, and a photosensitive composition containing the same has a wavelength of 3 nm.
UV-violet laser of 00 nm to 450 nm and 800 to
Combination with an exposure method such as an infrared laser of 1200 nm has enabled a bright room.

[0004]

However, unfortunately,
Since the photopolymerization initiator containing a halogen atom has extremely high crystallinity and oil sensitivity due to the dipole effect of the halogen atom,
There is a phenomenon that the compatibility with the photosensitive layer is low, and crystals are precipitated from the photosensitive layer during long-term storage, causing a decrease in sensitivity. Therefore, the present invention is intended to overcome the above-mentioned problems and provide a photopolymerizable lithographic printing plate having high sensitivity, good storage stability, good handleability in a bright room, and good scratch resistance. .

[0005]

Means for Solving the Problems As a result of intensive studies, the present inventors have found that, in a photopolymerizable lithographic printing plate using a halogen atom-containing photopolymerization initiator, the radical polymerizable monomer content in the photosensitive layer and the By specifying the water-soluble polymer compound and its content to be contained in the oxygen-blocking protective layer of,
We have found that we achieve the above objectives. That is, the present invention has the following configuration. (1) A photosensitive layer composed of a photopolymerizable composition containing 30% by weight or more of a halogen atom-containing photopolymerization initiator and a radical polymerizable monomer, and an oxygen barrier containing two or more water-soluble polymer compounds thereon A photopolymerizable lithographic printing plate comprising a water-soluble overcoat layer. (2) The photopolymerizable lithographic printing plate is applied at a wavelength of 300 nm to 4 nm.
A method for making a lithographic printing plate, comprising exposing with a 50 nm laser.

[0006] Use a halogen atom-containing photopolymerization initiator.
The present inventors diligently studied the sensitivity reduction caused by
As a result, the photosensitive layer of the halogen atom-containing photopolymerization initiator
It is effective to improve the content of polymerizable monomer for compatibilization.
I discovered that. In other words, increasing the amount of polymerizable monomer
It was found that the degree improved. But unfortunately polymerization
The uppermost oxygen barrier protective layer (hereinafter referred to as the uppermost layer)
Also referred to simply as a protective layer, overcoat layer or OC layer
) Is easy to peel off, and the exposure system (exposure machine
Scratches on the surface due to rubbing etc. at the time of transfer in the machine)
It was found that this portion caused poor curing.
After further study to solve this problem,
-Two or more coating layers to improve the adhesion to the photosensitive layer
By containing the above water-soluble polymer compound, high sensitivity and
And scratch resistance while maintaining handling and storage stability.
I got it.

[0007]

BEST MODE FOR CARRYING OUT THE INVENTION A halogen atom-containing photopolymerization initiator contained in a photopolymerizable composition constituting a photosensitive layer of a photopolymerizable lithographic printing plate of the present invention (hereinafter, also simply referred to as a photopolymerization initiator or an initiator) ) Will be described.

Preferred photopolymerization initiators in the present invention include (a) aromatic ketones, (b) aromatic onium salt compounds, (c) organic peroxides, (d) thio compounds, and (e)
Hexaarylbiimidazole compounds, (f) borate compounds, (g) metallocene compounds, (h) compounds having a carbon-halogen bond, and the like, containing halogen atoms.

Preferred examples of (a) aromatic ketones include “RADIATION CURING IN POLYMERSCIENCE AND TECHN”.
OLOGY '' JPFOUASSIER JFRABEK (1993), p77-117 described in the compound having a benzophenone skeleton or thioxanthone skeleton, for example,

[0010]

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And the like. More preferred examples of (a) aromatic ketones include α-thiobenzophenone compounds described in JP-B-47-6416 and JP-B-47-3981.
Among the benzoin ether compounds described in

[0012]

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Among the α-substituted benzoin compounds described in JP-B-47-22326, for example,

[0014]

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And the like. Further, as another example of (b) the aromatic onium salt, elements of Groups V, VI and VII of the periodic table, specifically N, P, As,
Includes aromatic onium salts of Sb, Bi, O, S, Se, Te, or I. Examples of such aromatic onium salts include JP-B No. 52-14277 and JP-B No. 52-1.
No. 4278 and JP-B No. 52-14279. In particular,

[0016]

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[0017]

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[0018]

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[0019]

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The following can be mentioned. Further, the following diazonium salts can be mentioned.

[0021]

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[0022]

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[0023] Another example of the photopolymerization initiator used in the present invention, (c) "organic peroxide" includes oxygen-
Almost all organic compounds having one or more oxygen bonds are included, examples of which include 2,4-dichlorobenzoyl peroxide.

The thio compound (d) as a photopolymerization initiator used in the present invention is represented by the following general formula [I].

[0025]

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(Where R ²⁰ represents an alkyl group, an aryl group or a substituted aryl group, R ²¹ represents a hydrogen atom or an alkyl group. R ²⁰ and R ²¹ are bonded to each other to form oxygen, sulfur and Non-metallic atoms necessary for forming a 5- to 7-membered ring which may contain a heteroatom selected from nitrogen atoms are shown.)

The alkyl group in the above formula (I) is preferably one having 1 to 4 carbon atoms. The aryl group has 6 carbon atoms such as phenyl and naphthyl.
10 to 10 are preferable, and as the substituted aryl group,
The above aryl groups include those substituted with a halogen atom such as a chlorine atom, an alkyl group such as a methyl group, or an alkoxy group such as a methoxy group or an ethoxy group. R ²¹ is preferably an alkyl group having 1 to 4 carbon atoms. Specific examples of the thio compound represented by the general formula [I] include the following compounds.

[0028]

[Table 1]

As another example of the photopolymerization initiator used in the present invention, (e) hexaarylbiimidazole includes:
Among the lophin dimers described in JP-B-45-37377 and JP-B-44-86516, for example, 2,2'-bis (o-chlorophenyl) -4,4 ', 5,5'-tetraphenylbiimidazole, 2,2'-bis (o-bromophenyl) -4,4 ', 5,5'-tetraphenylbiimidazole, 2,2'-bis (o, p-dichlorophenyl) -4,4', 5,5 '-Tetraphenylbiimidazole, 2,2'-bis (o-chlorophenyl) -4,
4 ', 5,5'-tetra (m-methoxyphenyl) biimidazole, 2,2'-bis (o, o'-dichlorophenyl) -4,4', 5,5'-tetraphenylbiimidazole, 2, 2'-bis (o-trifluorophenyl)
-4,4 ', 5,5'-Tetraphenylbiimidazole and the like.

Examples of (f) borate salts which are other examples of the photopolymerization initiator in the present invention include compounds represented by the following general formula [II].

[0031]

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(Wherein R ²² , R ²³ , R ²⁴ and R ²⁵ may be the same or different from each other and each represents a substituted or unsubstituted alkyl group, a substituted or unsubstituted aryl group, a substituted or unsubstituted An alkenyl group, a substituted or unsubstituted alkynyl group, or a substituted or unsubstituted heterocyclic group, wherein R ²² , R ²³ , R ²⁴ and R ²⁵ form a cyclic structure by bonding of two or more of the groups; You can, however,
At least one of R ²² , R ²³ , R ²⁴ and R ²⁵ is a substituted or unsubstituted alkyl group. Z ⁺ represents an alkali metal cation or a quaternary ammonium cation). The alkyl group of R ^{22 to} R ²⁵ includes linear, branched and cyclic alkyl groups, and preferably has 1 to 18 carbon atoms. Specific examples include methyl, ethyl, propyl, isopropyl, butyl, pentyl, hexyl, octyl, stearyl, cyclobutyl, cyclopentyl, cyclohexyl and the like. Further, as the substituted alkyl group, a halogen atom (for example, -C
l, -Br etc.), a cyano group, a nitro group, an aryl group (preferably a phenyl group), a hydroxy group,

[0033]

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(Wherein R ²⁶ and R ²⁷ are independently a hydrogen atom,
It represents an alkyl group having 1 to 14 carbon atoms or an aryl group. ), -COOR ²⁸ (where R ²⁸ represents a hydrogen atom, an alkyl group having 1 to 14 carbon atoms, or an aryl group),-
OCOR ²⁹ or -OR ³⁰ (where R ²⁹ and R ^{30 each} have 1 carbon atom)
And 14 to 14 alkyl groups or aryl groups. ) As a substituent. Examples of the aryl group of R ^{22 to} R ²⁵ include a phenyl group and a naphthyl group.
A cyclic aryl group is included, and examples of the substituted aryl group include those having a substituent of the above-described substituted alkyl group or an alkyl group having 1 to 14 carbon atoms in the above-described aryl group. Examples of the alkenyl group of R ^{22 to} R ²⁵ include straight-chain, branched and cyclic ones having 2 to 18 carbon atoms. Examples of the substituent of the substituted alkenyl group include the substituents of the above-mentioned substituted alkyl group. Are included. Examples of the alkynyl group of R ^{22 to} R ²⁵ include straight-chain or branched ones having 2 to 28 carbon atoms. Examples of the substituent of the substituted alkynyl group include those described above as the substituent of the substituted alkyl group. included. The heterocyclic group of the R ²² ~R ²⁵ N, 5-membered ring or more, including at least one of S and O, preferably include heterocyclic groups 5- to 7-membered ring, this heterocyclic group May contain a fused ring. Further, it may have the substituents described above as the substituents of the substituted aryl group. Specific examples of the compound represented by the general formula [II] include US Pat. Nos. 3,567,453 and 4,343,8.
No. 91, European Patent Nos. 109,772 and 109,772.
No. 773 and the compounds shown below.

[0035]

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Another example of the metallocene compound (g) which is another example of the photopolymerization initiator is described in JP-A-59-152396.
JP-A-61-151197, JP-A-63-414
No. 84, JP-A-2-249, JP-A-2-4705 and the titanocene compounds described in JP-A-1-30445.
No. 3 and JP-A-1-152109.

Specific examples of the titanocene compound include:
Di-cyclopentadienyl-Ti-di-chloride, di-cyclopentadienyl-Ti-bis-phenyl, di-
Cyclopentadienyl-Ti-bis-2,3,4,5
6-pentafluorophenyl-1-yl, di-cyclopentadienyl-Ti-bis-2,3,5,6-tetrafluorophenyl-1-yl, di-cyclopentadienyl-T
i-bis-2,4,6-trifluorophenyl-1-yl, di-cyclopentadienyl-Ti-2,6-difluorophenyl-1-yl, di-cyclopentadienyl-T
i-bis-2,4-difluorophenyl-1-yl, di-
Methylcyclopentadienyl-Ti-bis-2,3,
4,5,6-pentafluorophenyl-1-yl, di-methylcyclopentadienyl-Ti-bis-2,3,5
6-tetrafluorophenyl-1-yl, di-methylcyclopentadienyl-Ti-bis-2,4-difluorophenyl-1-yl, bis (cyclopentadienyl) -bis (2,6-difluoro-3 -(Pyri-1-yl) phenyl) titanium, bis (cyclopentadienyl) bis [2,6-difluoro-3- (methylsulfonamide)
Phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro-3- (N-butylbiaroyl-
Amino) phenyl] titanium,

Bis (cyclopentadienyl) bis [2,
6-difluoro-3- (N-ethylacetylamino) phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro-3- (N-methylacetylamino) phenyl] titanium, bis (cyclopentadi Enil)
Bis [2,6-difluoro-3- (N-ethylpropionylamino) phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro-3- (N-ethyl- (2,2-dimethylbuta Noyl) amino) phenyl]
Titanium, bis (cyclopentadienyl) bis [2,6-
Difluoro-3- (N-butyl- (2,2-dimethylbutanoyl) amino) phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro-3- (N-
Pentyl- (2,2-dimethylbutanoyl) amino) phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro-3- (N-hexyl)-(2,
2-dimethylbutanoyl) phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro-3-
(N-methylbutyrylamino) phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro-
3- (N-methylpentanoylamino) phenyl] titanium,

Bis (cyclopentadienyl) bis [2,
6-difluoro-3- (N-ethylcyclohexylcarbonylamino) phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro-3- (N-ethylisobutyrylamino) phenyl] titanium, bis ( Cyclopentadienyl) bis [2,6-difluoro-3-
(N-ethylacetylamino) phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro-
3- (2,2,5,5-tetramethyl-1,2,5-azadisirolidin-1-yl) phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro-
3- (octylsulfonamido) phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro-3- (4-tolylsulfonamido) phenyl] titanium, bis (cyclopentadienyl) bis [2 6-difluoro-3- (4-dodecylphenylsulfonylamido) phenyl] titanium,

Bis (cyclopentadienyl) bis [2,
6-difluoro-3- (4- (1-pentylheptyl)
Phenylsulfonylamido) phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro-
3- (ethylsulfonylamido) phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro-3-((4-bromophenyl) -sulfonylamide)
Phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro-3- (2-naphthylsulfonylamido) phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro-3- ( Hexadecylsulfonylamido) phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro-3- (N-methyl- (4-dodecylphenyl) sulfonylamido) phenyl] titanium,

Bis (cyclopentadienyl) bis [2
6-difluoro-3- (N-methyl-4- (1-pentylheptyl) phenyl) sulfonylamide)] titanium,
Bis (cyclopentadienyl) bis [2,6-difluoro-3- (N-hexyl- (4-tolyl) -sulfonylamido) phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro- 3- (pyrrolidine-
2,5-dion-1-yl) phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro-
3- (3,4-dimethyl-3-pyrrolidin-2,5-dion-1-yl) phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro-3- (phthalimido) phenyl] titanium , Bis (cyclopentadienyl) bis [2,6-difluoro-3-isobutoxycarbonylamino) phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro-3- (ethoxycarbonylamino) phenyl ] Titanium, bis (cyclopentadienyl) bis [2,6-difluoro-3-((2
-Chloroethoxy) -carbonylamino) phenyl] titanium,

Bis (cyclopentadienyl) bis [2,
6-difluoro-3- (phenoxycarbonylamino)
Phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro-3- (3-phenylthioureido) phenyl] titanium, bis (cyclopentadienyl)
Bis [2,6-difluoro-3- (3-butylthioureido) phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro-3- (3-phenylureido) phenyl] titanium, bis ( Cyclopentadienyl) bis [2,6-difluoro-3- (3-butylureido) phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro-3- (N, N-diacetylamino) Phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro-3- (3,3-dimethylureido) phenyl] titanium,

Bis (cyclopentadienyl) bis [2,
6-difluoro-3- (acetylamino) phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro-3- (butyrylamino) phenyl] titanium,
Bis (cyclopentadienyl) bis [2,6-difluoro-3- (decanoylamino) phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro-
3- (octadecanoylamino) phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro-3- (isobutyrylamino) phenyl] titanium, bis (cyclopentadienyl) bis [2 6-difluoro-
3- (2-ethylhexanoylamino) phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro-3- (2-methylbutanoylamino) phenyl] titanium, bis (cyclopentadienyl) Screw [2
6-difluoro-3- (pivaloylamino) phenyl]
Titanium,

Bis (cyclopentadienyl) bis [2,
6-difluoro-3- (2,2-dimethylbutanoylamino) phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro-3- (2-ethyl-2)
-Methylheptanoylamino) phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro-
3- (cyclohexylcarbonylamino) phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro-3- (2,2-dimethyl-3-chloropropanoylamino) phenyl] titanium, bis (cyclopentane Dienyl) bis [2,6-difluoro-3- (3-phenylpropanoylamino) phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro-3-
(2-chloromethyl-2-methyl-3-chloropropanoylamino) phenyl] titanium,

Bis (cyclopentadienyl) bis [2
6-difluoro-3- (3,4-xyloylamino) phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro-3- (4-ethylbenzoylamino) phenyl] titanium, bis (cyclo Pentadienyl) bis [2,6-difluoro-3- (2,4,6-mesitylcarbonylamino) phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro-3-
(Benzoylamino) phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro-3- (N
-(3-phenylpropyl) benzoylamino) phenyl] titanium, bis (cyclopentadienyl) bis [2
6-difluoro-3- (N- (3-ethylheptyl)-
2,2-dimethylpentanoylamino] phenyltitanium, bis (cyclopentadienyl) bis [2,6-difluoro-3- (N-isobutyl- (4-toluyl) amino) phenyl] titanium, bis (cyclopentadi Enil)
Bis [2,6-difluoro-3- (N-isobutylbenzoylamino) phenyl] titanium,

Bis (cyclopentadienyl) bis [2
6-difluoro-3- (N-cyclohexylmethylpivaloylamino) phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro-3- (N- (oxolan-2-ylmethyl) benzoylamino) Phenyl] titanium, bis (cyclopentadienyl) bis [2
6-difluoro-3- (N- (3-ethylheptyl)-
2,2-dimethylbutanoylamino) phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro-3- (N- (3-phenylpropyl- (4-toluyl) amino) phenyl] titanium, Bis (cyclopentadienyl) bis [2,6-difluoro-3- (N-
(Oxolani-2-ylmethyl)-(4-toluyl) amino) phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro-3- (N- (4-toluylmethyl) benzoylamino) phenyl] Titanium,

Bis (cyclopentadienyl) bis [2
6-difluoro-3- (N- (4-toluylmethyl)-
(4-toluyl) amino) phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro-3-
(N-butylbenzoylamino) phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro-3- (N-butyl- (4-toluyl) amino) phenyl] titanium, bis (cyclopentadienyl) ) Screw [2
6-difluoro-3- (N-hexyl- (4-toluyl) amino) phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro-3- (N- (2,
4-dimethylpentyl) -2,2-dimethylbutanoylamino) phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro-3- (2,4-dimethylpentyl) -2,2-dimethyl Pentanoylamino)
Phenyl) titanium,

Bis (cyclopentadienyl) bis [2,
6-difluoro-3-((4-toluyl) amino) phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro-3- (2,2-dimethylpentanoylamino) phenyl] titanium, bis (Cyclopentadienyl) bis [2,6-difluoro-3- (2,2-
Dimethyl-3-ethoxypropanoylamino) phenyl] titanium, bis (cyclopentadienyl) bis [2
6-difluoro-3- (2,2-dimethyl-3-allyloxypropanoylamino) phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro-
3- (N-allylacetylamino) phenyl] titanium,
Bis (cyclopentadienyl) bis [2,6-difluoro-3- (2-ethylbutanoylamino) phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro-3- (N-cyclohexyl) Methylbenzoylamino) phenyl] titanium,

Bis (cyclopentadienyl) bis [2,
6-difluoro-3- (N-cyclohexylmethyl-
(4-toluyl) amino) phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro-3-
(N- (2-ethylhexyl) benzoylamino) phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro-3- (N-isopropylbenzoylamino) phenyl] titanium, bis (cyclopentadienyl) Bis [2,6-difluoro-3- (N- (3-
Phenylpropyl) -2,2-dimethylpentanoyl)
Amino) phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro-3- (N-hexylbenzoylamino) phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro-3 -(N-cyclohexylmethyl-2,2-dimethylpentanoyl)
Amino) phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro-3- (N-butylbenzoylamino) phenyl] titanium,

Bis (cyclopentadienyl) bis [2,
6-difluoro-3- (N- (2-ethylhexyl)-
2,2-dimethylpentanoyl) amino) phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro-3- (N-hexyl-2,2-dimethylpentanoylamino) phenyl] titanium, bis (Cyclopentadienyl) bis [2,6-difluoro-3- (N-isopropyl-2,2-dimethylpentanoylamino) phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro-3 -(N- (3-phenylpropyl) pivaloylamino) phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro-3-
(N-butyl-2,2-dimethylpentanoylamino)
Phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro-3- (N- (2-methoxyethyl) benzoylamino) phenyl] titanium,

Bis (cyclopentadienyl) bis [2
6-difluoro-3- (N-benzylbenzoylamino) phenyl] titanium, bis (cyclopentadienyl)
Bis [2,6-difluoro-3- (N-benzyl- (4
-Toluyl) amino) phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro-3- (N
-(2-methoxyethyl)-(4-toluyl) amino)
Phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro-3- (N- (4-methylphenylmethyl) -2,2-dimethylpentanoylamino) phenyl] titanium, bis (cyclopentadi Enyl) bis [2,6-difluoro-3- (N- (2-methoxyethyl) -2,2-dimethylpentanoylamino) phenyl] titanium, bis (cyclopentadienyl) bis [2
6-difluoro-3- (N-cyclohexylmethyl-
(2-ethyl-2-methylheptanoyl) amino) phenyl] titanium,

Bis (cyclopentadienyl) bis [2,
6-difluoro-3- (N-butyl- (4-chlorobenzoyl) amino) phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro-3- (N-hexyl- (2-ethyl- 2-methylbutanoyl) amino) phenyl] titanium, bis (cyclopentadienyl)
Bis [2,6-difluoro-3- (N-cyclohexyl-2,2-dimethylpentanoyl) amino) phenyl]
Titanium, bis (cyclopentadienyl) bis [2,6-
Difluoro-3- (N- (oxolan-2-ylmethyl) -2,2-dimethylpentanoyl) amino) phenyl] titanium, bis (cyclopentadienyl) bis [2
6-difluoro-3- (N-cyclohexyl- (4-chlorobenzoyl) amino) phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro-3-
(N-cyclohexyl- (2-chlorobenzoyl) amino) phenyl] titanium, bis (cyclopentadienyl)
Bis [2,6-difluoro-3- (3,3-dimethyl-
2-azetidinoni-1-yl) phenyl] titanium,

Bis (cyclopentadienyl) bis [2,
6-difluoro-3-isocyanatophenyl) titanium,
Bis (cyclopentadienyl) bis [2,6-difluoro-3- (N-ethyl- (4-tolylsulfonyl) amino) phenyl] titanium, bis (cyclopentadienyl)
Bis [2,6-difluoro-3- (N-hexyl- (4
-Tolylsulfonyl) amino) phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro-
3- (N-butyl- (4-tolylsulfonyl) amino)
Phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro-3- (N-isobutyl- (4-
Tolylsulfonyl) amino) phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro-
3- (N-butyl- (2,2-dimethyl-3-chloropropanoyl) amino) phenyl] titanium,

Bis (cyclopentadienyl) bis [2,
6-difluoro-3- (N- (3-phenylpropanoyl) -2,2-dimethyl-3-chloropropanoyl) amino) phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro- 3- (N-cyclohexylmethyl- (2,2-dimethyl-3-chloropropanoyl) amino) phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro-3- (N-isobutyl- ( 2,2-dimethyl-3-chloropropanoyl) phenyl] titanium, bis (cyclopentadienyl)
Bis [2,6-difluoro-3- (N-butyl- (2-
Chloromethyl-2-methyl-3-chloropropanoyl)
Amino) phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro-3- (butylthiocarbonylamino) phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro-3- (Phenylthiocarbonylamino) phenyl] titanium,

Bis (cyclopentadienyl) bis [2,
6-difluoro-3-isocyanatophenyl) titanium,
Bis (cyclopentadienyl) bis [2,6-difluoro-3- (N-ethyl- (4-tolylsulfonyl) amino) phenyl] titanium, bis (cyclopentadienyl)
Bis [2,6-difluoro-3- (N-hexyl- (4
-Tolylsulfonyl) amino) phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro-
3- (N-butyl- (4-tolylsulfonyl) amino)
Phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro-3- (N-isobutyl- (4-
Tolylsulfonyl) amino) phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro-
3- (N-butyl- (2,2-dimethyl-3-chloropropanoyl) amino) phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro-3- (N
-(3-phenylpropanoyl) -2,2-dimethyl-
3-chloropropanoyl) amino) phenyl] titanium,

Bis (cyclopentadienyl) bis [2,
6-difluoro-3- (N-cyclohexylmethyl-
(2,2-dimethyl-3-chloropropanoyl) amino) phenyl] titanium, bis (cyclopentadienyl)
Bis [2,6-difluoro-3- (N-isobutyl-
(2,2-dimethyl-3-chloropropanoyl) phenyl] titanium, bis (cyclopentadienyl) bis [2
6-difluoro-3- (N-butyl- (2-chloromethyl-2-methyl-3-chloropropanoyl) amino) phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro-3- (Butylthiocarbonylamino) phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro-3- (phenylthiocarbonylamino) phenyl] titanium, bis (methylcyclopentadienyl) bis [2,6 -Difluoro-3-
(N-hexyl-2,2-dimethylbutanoyl) amino) phenyl] titanium,

Bis (methylcyclopentadienyl) bis [2,6-difluoro-3- (N-hexyl-2,2-
Dimethylpentanoylamino) phenyl] titanium, bis (methylcyclopentadienyl) bis [2,6-difluoro-3- (N-ethylacetylamino) phenyl] titanium, bis (methylcyclopentadienyl) bis [2
6-difluoro-3- (N-ethylpropionylamino) phenyl] titanium, bis (trimethylsilylpentadienyl) bis [2,6-difluoro-3- (N-butyl-2,2-dimethylpropanoylamino) phenyl]
Titanium, bis (cyclopentadienyl) bis [2,6-
Difluoro-3- (N- (2-methoxyethyl) -trimethylsilylamino) phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro-3- (N
-Butylhexyldimethylsilylamino) phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro-3- (N-ethyl- (1,1,2, -trimethylpropyl) dimethylsilylamino) phenyl] Titanium,

Bis (cyclopentadienyl) bis [2,
6-difluoro-3- (3-ethoxymethyl-3-methyl-2-azethiodinoni-1-yl) phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro-3- (3-allyloxy) Methyl-3-methyl-
2-azetidinoni-1-yl) phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro-
3- (3-chloromethyl-3-methyl-2-azetidinoni-1-yl) phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro-3- (N-benzyl-2,2- Dimethylpropanoylamino) phenyl] titanium, bis (cyclopentadienyl) bis [2
6-difluoro-3- (5,5-dimethyl-2-pyrrolidinoni-1-yl) phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro-3- (6,
6-diphenyl-2-piperidinoni-1-yl) phenyl] titanium,

Bis (cyclopentadienyl) bis [2,
6-difluoro-3- (N- (2,3-dihydro-1,
2-benzisothiazolo-3-one (1,1-dioxide) -2-yl) phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro-3- (N-hexyl- (4-chlorobenzoyl) ) Amino) phenyl]
Titanium, bis (cyclopentadienyl) bis [2,6-
Difluoro-3- (N-hexyl- (2-chlorobenzoyl) amino) phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro-3- (N-isopropyl- (4-chlorobenzoyl) amino] ) Phenyl] titanium, bis (cyclopentadienyl) bis [2
6-difluoro-3- (N- (4-methylphenylmethyl)-(4-chlorobenzoyl) amino) phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro-3- (N- ( 4-methylphenylmethyl)-
(2-chlorobenzoyl) amino) phenyl] titanium,

Bis (cyclopentadienyl) bis [2,
6-difluoro-3- (N-butyl- (4-chlorobenzoyl) amino) phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro-3- (N-benzyl-2,2-dimethyl) Pentanoylamino) phenyl] titanium, bis (cyclopentadienyl) bis [2
6-difluoro-3- (N- (2-ethylhexyl)-
4-tolyl-sulfonyl) amino) phenyl] titanium,
Bis (cyclopentadienyl) bis [2,6-difluoro-3- (N- (3-oxaheptyl) benzoylamino) phenyl] titanium, bis (cyclopentadienyl)
Bis [2,6-difluoro-3- (N- (3,6-dioxadecyl) benzoylamino) phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro-3- (trifluoromethylsulfonyl) Amino) phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro-3- (trifluoroacetylamino) phenyl] titanium,

Bis (cyclopentadienyl) bis [2
6-difluoro-3- (2-chlorobenzoyl) amino) phenyl] titanium, bis (cyclopentadienyl)
Bis [2,6-difluoro-3- (4-chlorobenzoyl) amino) phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro-3- (N- (3,
6-dioxadecyl) -2,2-dimethylpentanoylamino) phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro-3- (N- (3,7-
Dimethyl-7-methoxyoctyl) benzoylamino)
Phenyl] titanium and bis (cyclopentadienyl) bis [2,6-difluoro-3- (N-cyclohexylbenzoylamino) phenyl] titanium.

Preferred examples of the compound having a carbon-halogen bond (h), which is an example of a photopolymerization initiator, include those represented by the following general formulas [III] to [IX].

[0063]

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(Wherein, X ² represents a halogen atom. Y ² represents —C (X ² ) ₃ , —NH ₂ , —NHR ³² , —NR ³² , —O
Representing the R ^32. Here, R ³² represents an alkyl group, a substituted alkyl group, an aryl group, or a substituted aryl group. R ³¹ is-
C (X ² ) _{3 represents} an alkyl group, a substituted alkyl group, an aryl group, a substituted aryl group or a substituted alkenyl group. ).

[0065]

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(Where R ³³ is an alkyl group, a substituted alkyl group, an alkenyl group, a substituted alkenyl group, an aryl group, a substituted aryl group, a halogen atom, an alkoxy group, a substituted alkoxyl group, a nitro group or a cyano group; ^Three
Is a halogen atom, and n is an integer of 1 to 3. ).

[0067]

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(Where R ³⁴ is an aryl group or a substituted aryl group, and R ³⁵ is

[0069]

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Or Z ² is —C (＝ O)
—, —C (＝ S) — or —SO ₂ —, and R ³⁶ , R ³⁷
Is an alkyl group, a substituted alkyl group, an alkenyl group, a substituted alkenyl group, an aryl group or a substituted aryl group;
³⁸ is the same as R ³² in formula [III], X ³ is a halogen atom, and m is 1 or 2. ).

[0071]

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In the formula, R ³⁹ is an optionally substituted aryl group or a heterocyclic group, and R ⁴⁰ is carbon atom 1
A trihaloalkyl or trihaloalkenyl group having up to 3; and p is 1, 2 or 3.

[0073]

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(Where L is a hydrogen atom or a compound of the formula: CO—
(R ⁴¹ ) _q (C (X ⁴ ) ₃ ) a substituent of _r , wherein Q is a sulfur, selenium or oxygen atom, a dialkylmethylene group, an alkene-1,2-ylene group, a 1,2-phenylene group or N
-R group, M is a substituted or unsubstituted alkylene group or alkenylene group, or a 1,2-arylene group, R ⁴² is an alkyl group, an aralkyl group or an alkoxyalkyl group, and R ⁴¹ is X ⁴ is a carbocyclic or heterocyclic divalent aromatic group, X ⁴ is a chlorine, bromine or iodine atom, and q = 0 and r = 1, or q = 1 and r =
1 or 2. And a carbonylmethylene heterocyclic compound having a trihalogenomethyl group.

[0075]

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(Where X ⁵ is a halogen atom, t
Is an integer of 1 to 3, s is an integer of 1 to 4, R ⁴³
Is a hydrogen atom or a CH _3-t X ⁵ _t group, and R ⁴⁴ is an s-valent, optionally substituted unsaturated organic group).
4-halogeno-5- (halogenomethyl-phenyl) -oxazole derivatives.

[0077]

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(Where X ⁶ is a halogen atom;
Is an integer of 1 to 3, u is an integer of 1 to 4, R ⁴⁵
Is a hydrogen atom or a CH _3-v X ⁶ _v group, R ⁴⁶ is an unsaturated organic group which may be substituted for u-valent. A) 2- (halogenomethyl-phenyl) -4-halogeno-oxazole derivative.

Specific examples of such a compound having a carbon-halogen bond include, for example, Wakabayashi et al., Bull.
m. Soc. Japan, 42, 2924 (1969), for example, 2-phenyl-4,6-bis (trichloromethyl)
-S-triazine, 2- (p-chlorophenyl) -4,
6-bis (trichloromethyl) -S-triazine, 2-
(P-tolyl) -4,6-bis (trichloromethyl)-
S-triazine, 2- (p-methoxyphenyl) -4,
6-bis (trichloromethyl) -S-triazine, 2-
(2 ', 4'-dichlorophenyl) -4,6-bis (trichloromethyl) -S-triazine, 2,4,6-tris (trichloromethyl) -S-triazine, 2-methyl-4,6- Bis (trichloromethyl) -S-triazine, 2-n-nonyl-4,6-bis (trichloromethyl) -S-triazine, 2- (α, α, β-trichloroethyl) -4,6-bis (trichlor Methyl) -S-triazine and the like.

Other compounds described in British Patent No. 1388492, for example, 2-styryl-4,6-bis (trichloromethyl) -S-triazine, 2- (p-methylstyryl) -4,6-bis ( Trichloromethyl)-
S-triazine, 2- (p-methoxystyryl) -4,
6-bis (trichloromethyl) -S-triazine, 2-
(P-methoxystyryl) -4-amino-6-trichloromethyl-S-triazine and the like;
No. 8, for example, 2- (4-methoxy-naphth-1-yl) -4,6-bis-trichloromethyl-S
-Triazine, 2- (4-ethoxy-naphth-1-yl) -4,6-bis-trichloromethyl-S-triazine, 2- [4- (2-ethoxyethyl) -naphth-1-.
Yl] -4,6-bis-trichloromethyl-S-triazine, 2- (4,7-dimethoxy-naphth-1-yl)
-4,6-bis-trichloromethyl-S-triazine), 2- (acenaphth-5-yl) -4,6-bis-
German Patent 333, such as trichloromethyl-S-triazine
No. 7024, for example,

[0081]

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[0082]

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And the like. Also, FC Sc
Compounds described in J. Org. Chem. 29, 1527 (1964) by Haefer et al., for example, 2-methyl-4,6-bis (tribromomethyl) -S-triazine, 2,4,6-tris (tribromomethyl) ) -S-Triazine, 2,4,6-tris (dibromomethyl) -S-triazine, 2-amino-4
-Methyl-6-tribromomethyl-S-triazine, 2
-Methoxy-4-methyl-6-trichloromethyl-S-
Triazine and the like can be mentioned. Furthermore, Japanese Patent Laid-Open No. 62
-58241 compound, for example,

[0084]

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[0085]

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And the like. Further, Japanese Patent Laid-Open No. 5-
No. 281,728, for example,

[0087]

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And the like. Or even
Jou by MP Hutt, EF Elslager and LM Herbel
rnalof Heterocyclic chemistry ”Vol.7 (No.3), Vol.5
The following compounds that can be easily synthesized by those skilled in the art according to the synthesis method described on page 11 and thereafter (1970)

[0089]

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[0090]

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[0091]

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[0092]

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[0093]

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[0094]

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Alternatively, compounds such as those described in German Patent No. 2641100, such as 4- (4-methoxy-styryl) -6- (3,3,3-trichloropropenyl) -2-pyrone and 4- (3,4,5-trimethoxy-styryl) -6-trichloromethyl-2-pyrone or the compounds described in DE 3333450, for example,

[0096]

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In the formula, R ⁴¹ represents a benzene ring, and R ⁴² represents an alkyl group, an aralkyl group or an alkoxyalkyl group.

[0098]

[Table 2]

Alternatively, a group of compounds described in German Patent No. 3021590,

[0100]

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[0101]

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Alternatively, a group of compounds described in German Patent No. 3021599, for example,

[0103]

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The following can be mentioned. Even more preferred examples of the photopolymerization initiator in the present invention include the above-mentioned (b) aromatic onium salt, (e) hexaarylbiimidazole, (g) metallocene compound, and (h) compound having a carbon-halogen bond. The most preferred examples include (e) hexaarylbiimidazole and (h) a compound having a carbon-halogen bond. The photopolymerization initiator in the present invention is suitably used alone or in combination of two or more.

The amount of the photopolymerization initiator used in the composition of the present invention is from 0.01 to 0.01 based on the weight of all components of the photopolymerizable composition.
It is 60% by weight, more preferably 0.05 to 30% by weight. The photopolymerization initiator in the present invention can be referred to as a photopolymerization initiator alone or as a mixture of sensitizing dyes described below.

The photopolymerizable composition used in the present invention contains the following in addition to the above-mentioned polymerization initiator. [Sensitizing Dye] The photopolymerizable composition of the present invention may contain a sensitizing dye in combination with the above photopolymerization initiator.
The sensitizing dye that can be a component of the photopolymerizable composition of the present invention includes a spectral sensitizing dye, and a dye or pigment that absorbs light from a light source and interacts with a photopolymerization initiator. Preferred spectral sensitizing dyes or dyes include polynuclear aromatics (eg, pyrene, perylene, triphenylene) and xanthenes (eg, fluorescein, eosin,
Erythrosine, rhodamine B, rose bengal cyanines (eg, thiacarbocyanine, oxacarbocyanine) merocyanines (eg, merocyanine, carbomerocyanine) thiazines (eg, thionin, methylene blue, toluidine blue) acridines (eg, acridine orange, Chloroflavin, acriflavin) phthalocyanines (eg, phthalocyanine, metal phthalocyanine) porphyrins (eg, tetraphenylporphyrin, central metal-substituted porphyrin) chlorophylls (eg, chlorophyll, chlorophyllin, central metal-substituted chlorophyll) metal complexes, eg,

[0107]

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Anthraquinones, for example, (anthraquinone) squariums, for example, (squarium). Examples of more preferred spectral sensitizing dyes or dyes are styryl dyes described in JP-B-37-13034, for example,

[0109]

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Cationic dyes described in JP-A-62-143044, for example,

[0111]

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The quinoxalinium salts described in JP-B-59-24147, for example,

[0113]

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A new methylene blue compound described in JP-A-64-33104, for example,

[0115]

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Anthraquinones described in JP-A-64-56767, for example,

[0117]

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Benzoxanthene dyes described in JP-A-2-1714. JP-A-2-226148 and JP-A-2-2-2
No. 26149, acridines, for example,

[0119]

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Pyrylium salts described in JP-B-40-28499, for example,

[0121]

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Cyanines described in JP-B-46-43363, for example,

[0123]

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Benzofuran dyes described in JP-A-2-63053, for example,

[0125]

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JP-A-2-85858, JP-A-2-21
No. 6154 conjugated ketone dyes, for example

[0127]

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Dyes described in JP-A-57-10605. Azocinnamylidene derivatives described in JP-B-2-30321, for example,

[0129]

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Cyanine dyes described in JP-A-1-287105, for example,

[0131]

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JP-A-62-31844, JP-A-62-31844
No. 31848, Xanthene dyes described in JP-A-62-143043, for example,

[0133]

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An aminostyryl ketone described in JP-B-59-28325, for example,

[0135]

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Merocyanine dyes represented by the following general formulas [1] to [8] described in JP-B-61-9621, for example,

[0137]

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In the general formulas [3] to [8], X ⁸
Is a hydrogen atom, an alkyl group, a substituted alkyl group, an alkoxy group, an aryl group, a substituted aryl group, an aryloxy group,
Represents an aralkyl group or a halogen atom. General formula [2]
In the above, Ph represents a phenyl group. In the general formulas [1] to [8], R ⁴⁸ , R ⁴⁹ and R ⁵⁰ each represent an alkyl group, a substituted alkyl group, an alkenyl group, an aryl group, a substituted aryl group or an aralkyl group. Good. The following general formula described in Japanese Patent Application Laid-Open No. H2-179643

Dyes represented by [9] to [11], for example,

[0139]

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A: oxygen atom, sulfur atom, selenium atom,
Represents a tellurium atom, an alkyl or aryl substituted nitrogen atom or a dialkyl substituted carbon atom. Y ^{3 represents a} hydrogen atom, an alkyl group, a substituted alkyl group, an aryl group, a substituted aryl group, an aralkyl group, an acyl group, or a substituted alkoxycarbonyl group. R ⁵¹ and R ⁵² : a hydrogen atom, an alkyl group having 1 to 18 carbon atoms,
Alternatively, as a substituent, R ⁵³ O—,

[0141]

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-(CH ₂ CH ₂ O) w-R ⁵³ , a substituted alkyl group having 1 to 18 carbon atoms and having a halogen atom (F, Cl, Br, I). However, R ⁵³ is a hydrogen atom or a carbon number of 1 to 1.
0 represents an alkyl group, B represents a dialkylamino group,
Represents a hydroxyl group, an acyloxy group, a halogen atom, and a nitro group. w represents an integer of 0 to 4; x represents an integer of 1 to 20; The following general formula [1] described in JP-A-2-244050
2) a merocyanine dye represented by, for example,

[0143]

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(Wherein R ⁵⁴ and R ⁵⁵ each independently represent a hydrogen atom, an alkyl group, a substituted alkyl group, an alkoxycarbonyl group, an aryl group, a substituted aryl group or an aralkyl group. A ² represents an oxygen atom, a sulfur atom , A selenium atom, a tellurium atom, an alkyl- or aryl-substituted nitrogen atom, or a dialkyl-substituted carbon atom, and X ⁹ represents a group of non-metallic atoms necessary to form a nitrogen-containing 5-membered hetero ring. ⁴ represents a substituted phenyl group, an unsubstituted or substituted polynuclear aromatic ring, or an unsubstituted or substituted heteroaromatic ring, and Z ³ represents a hydrogen atom, an alkyl group, a substituted alkyl group, an aryl group, a substituted aryl group,
Represents an aralkyl group, an alkoxy group, an alkylthio group, an arylthio group, a substituted amino group, an acyl group, or an alkoxycarbonyl group, which may be mutually bonded to Y ⁴ to form a ring. Preferred specific examples are

[0145]

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A merocyanine dye represented by the following formula [13] described in JP-B-59-28326, for example,

[0147]

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In the above formula, R ⁵⁶ and R ⁵⁷ each represent a hydrogen atom, an alkyl group, a substituted alkyl group, an aryl group,
Represents a substituted aryl group or an aralkyl group, which may be the same or different from each other. X ¹⁰ is Hammett (Hamm
ett) represents a substituent within the range of -0.9 to +0.5. A merocyanine dye represented by the following general formula [14] described in JP-A-59-89303, for example,

[0149]

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(Wherein R ⁵⁸ and R ⁵⁹ each independently represent a hydrogen atom, an alkyl group, a substituted alkyl group, an aryl group, a substituted aryl group or an aralkyl group. X ¹¹ is Hammett's sigma (σ)) Values from -0.9 to +0.
Represents up to 5 substituents. Y ⁵ represents a hydrogen atom, an alkyl group, a substituted alkyl group, an aryl group, a substituted aryl group, an aralkyl group, an acyl group or an alkoxycarbonyl group. As a preferred specific example,

[0151]

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A merocyanine dye represented by the following general formula [15] described in JP-A-8-129257, for example,

[0153]

[Of 60]

(Wherein R ⁶⁰ , R ⁶¹ , R ⁶² , R ⁶³ , R ⁶⁸ ,
R ⁶⁹ , R ⁷⁰ and R ⁷¹ each independently represent a hydrogen atom, a halogen atom, an alkyl group, a substituted alkyl group, an aryl group,
Substituted aryl group, hydroxyl group, substituted oxy group, mercapto group, substituted thio group, amino group, substituted amino group, substituted carbonyl group, sulfo group, sulfonato group, substituted sulfinyl group, substituted sulfonyl group, phosphono group, substituted phosphono group, phosphonato group, a substituted phosphonato group, a cyano group, or a nitro group, or, R ⁶⁰ and R ^61, R ⁶¹ and R ^62, R ⁶² and R ^63, R ⁶⁸ and R ^69, R ⁶⁹ and R ^70, R ⁷⁰ And R
⁷¹ may combine with each other to form an aliphatic or aromatic ring, R ⁶⁴ represents a hydrogen atom, an alkyl group, a substituted alkyl group, an aryl group, or a substituted aryl group; R ⁶⁵ represents a substituted or unsubstituted group; substituted alkenyl group, or a substituted or unsubstituted alkynyl group, R ^66, R ⁶⁷
Are each independently a hydrogen atom, a halogen atom, an alkyl group, a substituted alkyl group, an aryl group, a substituted aryl group,
Preferred examples of the substituted carbonyl group)

[0155]

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Benzopyran dyes represented by the following general formula [16] described in JP-A-8-334897, for example,

[0157]

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(Wherein, R ^{72 to} R ⁷⁵ independently represent a hydrogen atom, a halogen atom, an alkyl group, an aryl group, a hydroxyl group, an alkoxy group or an amino group; and R ^{72 to} R ⁷⁵
May form a ring composed of non-metallic atoms together with the carbon atoms to which they can each be attached. R ⁷⁶ represents a hydrogen atom, an alkyl group, an aryl group, a heteroaromatic group, a cyano group, an alkoxy group, a carboxy group or an alkenyl group. R ⁷⁷
Is a group represented by R ⁷⁶ or —Z—R ⁷⁶ , and Z represents a carbonyl group, a sulfonyl group, a sulfinyl group, or an arylenedicarbonyl group. R ⁷⁶ and R ⁷⁷ may together form a ring composed of a non-metallic atom. A is O atom, S
Represents an atom, NH or an N atom having a substituent. B is O
Represents an atom or a group of = C (G1) (G2). G1, G2
May be the same or different, and represent a hydrogen atom, a cyano group,
Represents an alkoxycarbonyl group, an aryloxycarbonyl group, an acyl group, an arylcarbonyl group, an alkylthio group, an arylthio group, an alkylsulfonyl group, an arylsulfonyl group, or a fluorosulfonyl group. However, G1 and G2 are not simultaneously hydrogen atoms. G1 and G2 may form a ring composed of a nonmetallic atom together with the carbon atom). And the like.

In addition, the following infrared absorbers (dyes or pigments) are particularly preferably used as sensitizing dyes. Preferred examples of the dye include, for example, JP-A-58-12524.
No. 6, JP-A-59-84356, JP-A-59-202
No. 829, JP-A-60-78787 and the like, and cyanine dyes described in British Patent No. 434,875.

The near-infrared absorption sensitizer described in US Pat. No. 5,156,938 is also preferably used, and further, the substituted sensitizer described in US Pat. No. 3,881,924 is used. Arylbenzo (thio) pyrylium salts described in JP-A-57-142645 (U.S. Pat. No. 4,327,169).
No. 5) Trimethine thiapyrylium salts described in JP-A-58-181051, JP-A-58-220143, and JP-A-58-220143.
Nos. 9-41363, 59-84248 and 59-8
No. 4249, No. 59-146063, No. 59-146
No. 061, JP-A-5961
Cyanine dyes described in JP-A-216146, pentamethine thiopyrylium salts described in U.S. Pat. No. 4,283,475, and Japanese Patent Publication Nos.
Pyrylium compounds described in 19702 are also preferably used.

Also preferred are near infrared absorbing dyes described as formulas (I) and (II) in US Pat. No. 4,756,993 and phthalocyanine dyes described in EP 916 513 A2. It can be mentioned as.

Further, the anionic infrared absorber described in Japanese Patent Application No. 10-79912 can also be suitably used. The anionic infrared absorbing agent refers to a dye that substantially has no anionic structure in the mother nucleus of a dye that absorbs infrared light and has an anionic structure. For example, (c1) an anionic metal complex, (c2) anionic carbon black,
(C3) an anionic phthalocyanine, and (c4) a compound represented by the following general formula (X). The counter cation of these anionic infrared absorbers is a monovalent cation containing a proton or a polyvalent cation.

[0163]

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Here, the (c1) anionic metal complex refers to an anion in which the central metal and the ligand in the complex part which substantially absorbs light become anions.

(C2) The anionic carbon black is
Examples of the substituent include carbon black to which an anionic group such as a sulfonic acid, a carboxylic acid, and a phosphonic acid group is bonded. To introduce these groups into carbon black,
Carbon Black Handbook Third Edition (edited by The Carbon Black Association, April 5, 1995)
As described on page 12, means such as oxidation of carbon black with a predetermined acid may be employed.

(C3) Anionic phthalocyanine refers to an anionic phthalocyanine in which the anion group described in (c2) above is bonded as a substituent to the phthalocyanine skeleton to form an anion as a whole.

Next, the compound (c4) represented by formula (X) will be described in detail. In the general formula 6,
G _a ^- represents an anionic substituent, G _b represents a neutral substituent. X ^{m +} represents a cation having 1 to m valences including a proton, and m represents an integer of 1 to 6. M represents a conjugated chain,
This conjugated chain M may have a substituent or a ring structure. The conjugated chain M can be represented by the following formula.

[0168]

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In the above formula, R ¹ , R ² and R ³ each independently represent a hydrogen atom, a halogen atom, a cyano group, an alkyl group,
It represents an aryl group, an alkenyl group, an alkynyl group, a carbonyl group, a thio group, a sulfonyl group, a sulfinyl group, an oxy group, or an amino group, and these may be linked to each other to form a ring structure. n represents an integer of 1 to 8.

Of the anionic infrared absorbers represented by the general formula (X), the following A-1 to A-5 are preferably used.

[0171]

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Also, cationic infrared absorbers represented by the following CA-1 to CA-44 can be preferably used.

[0173]

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[0174]

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[0175]

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[0176]

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[0177]

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[0178]

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[0179]

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[0180]

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[0181]

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[0182]

[Of 75]

[0183]

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[0184]

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[0185]

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[0186]

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[0187]

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In the above structural formula, T ⁻ represents a monovalent counter anion, preferably a halogen anion (F ⁻ , Cl ⁻ ,
Br ^-, I ^-), a Lewis acid anion _{^{(BF 4 -, PF 6 -}} , S
bCl ₆ ⁻ , ClO ₄ ⁻ ), an alkylsulfonic acid anion,
Aryl sulfonate anion.

The alkyl of the alkyl sulfonic acid is
A linear, branched, or cyclic alkyl group having 1 to 20 carbon atoms, specifically, a methyl group, an ethyl group, a propyl group, a butyl group, a pentyl group, a hexyl group, a heptyl group , Octyl, nonyl, decyl, undecyl, dodecyl, tridecyl, hexadecyl, octadecyl, eicosyl, isopropyl,
Isobutyl, s-butyl, t-butyl, isopentyl, neopentyl, 1-methylbutyl, isohexyl, 2-ethylhexyl, 2-methylhexyl, cyclohexyl, cyclopentyl, 2-norbornyl be able to. Among these, straight-chains having 1 to 12 carbon atoms, 3 to 12 carbon atoms.
And a cyclic alkyl group having 5 to 10 carbon atoms is more preferred.

The aryl of the above-mentioned arylsulfonic acid includes one consisting of one benzene ring, two or three benzene rings forming a condensed ring, and a benzene ring and a five-membered unsaturated ring forming a condensed ring. The specific example is,
Examples include a phenyl group, a naphthyl group, an anthryl group, a phenanthryl group, an indenyl group, an acenabutenyl group, and a fluorenyl group. Of these, a phenyl group and a naphthyl group are more preferred.

Further, the following non-ionic infrared absorbers represented by NA-1 to NA-12 can also be preferably used.

[0192]

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[0193]

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[0194]

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[0195]

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Among the above exemplified compounds, A-1 is particularly preferable as the anionic infrared absorber, CA-7, CA-30, CA-40 and CA-42 are preferable as the cationic infrared absorber. NA as infrared absorber
-11.

Examples of other dyes include commercially available dyes and, for example, “Dye Handbook” (edited by the Society of Synthetic Organic Chemistry, published in 1970).
And the like can be used. Specifically, dyes such as azo dyes, metal complex salt azo dyes, pyrazolone azo dyes, naphthoquinone dyes, anthraquinone dyes, phthalocyanine dyes, carbonium dyes, quinone imine dyes, methine dyes, diimmonium dyes, aminium dyes, squalilium dyes, metal thiolate complexes and the like Is mentioned.

As other sensitizing dyes, commercially available pigments and Color Index (CI) Handbook, “Latest Pigment Handbook” (edited by Japan Pigment Technical Association, 1977)
Annual Publication), “Latest Pigment Application Technology” (CMC Publishing, 1986)
Pigments described in "Printing Ink Technology", CMC Publishing, 1984). For example, the types of pigments include black pigments, yellow pigments, orange pigments, brown pigments, red pigments, purple pigments, blue pigments, green pigments, fluorescent pigments, metal powder pigments, and polymer-bound dyes. Specifically, insoluble azo pigments, azo lake pigments, condensed azo pigments, chelated azo pigments, phthalocyanine pigments, anthraquinone pigments, perylene and perinone pigments, thioindigo pigments, quinacridone pigments, dioxazine pigments, isoindolinone pigments And quinophthalone pigments, dyed lake pigments, azine pigments, nitroso pigments, nitro pigments, natural pigments, fluorescent pigments, inorganic pigments, carbon black, and the like. Preferred among these pigments is carbon black.

These pigments may be used without being subjected to a surface treatment, or may be used after being subjected to a surface treatment. Examples of the surface treatment include a method of surface coating a resin or wax, a method of attaching a surfactant, and a method of bonding a reactive substance (eg, a silane coupling agent, an epoxy compound, a polyisocyanate, etc.) to the pigment surface. Can be considered. The surface treatment method is described in "Properties and Applications of Metal Soap" (Koshobo)
It is described in "Printing Ink Technology" (CMC Publishing, 1984) and "Latest Pigment Application Technology" (CMC Publishing, 1986).

The particle size of the pigment is preferably from 0.01 μm to 10 μm, more preferably from 0.05 μm to 1 μm, particularly preferably from 0.1 μm to 1 μm. When the particle size of the pigment is less than 0.01 μm, the dispersion is not preferred in terms of stability in the coating solution for the photosensitive layer, and when it exceeds 10 μm, the uniformity of the photosensitive layer is not preferred.

As a method for dispersing the pigment, a known dispersion technique used in the production of ink or toner can be used. Examples of the disperser include an ultrasonic disperser, a sand mill, an attritor, a pearl mill, a super mill, a ball mill, an impeller, a disperser, a KD mill, a colloid mill, a dynatron, a three-roll mill, and a pressure kneader. For details, refer to “Latest Pigment Application Technology” (CMC Publishing, 1
986).

More preferred examples of the sensitizing dye in the present invention include the merocyanine dye described in JP-B-61-9621, the merocyanine dye described in JP-A-2-179463, and the merocyanine described in JP-A-2-244050. Dyes, merocyanine dyes described in JP-B-59-28326, merocyanine dyes described in JP-A-59-89303, merocyanine dyes described in JP-A-8-129257, and benzopyran-based dyes described in JP-A-8-334897 are listed. Can be. And the above-mentioned JP-A-11-2
The infrared absorber described in No. 09001 can be mentioned. The sensitizing dye in the present invention is also preferably used alone or in combination of two or more. Further, a known compound having an action of further improving sensitivity or suppressing polymerization inhibition by oxygen may be added to the photopolymerizable composition of the present invention as a cosensitizer.

Examples of such co-sensitizers include amines, for example, “Journal of Polymer Soc” by MR Sander et al.
Society, Vol. 10, p. 3173 (1972);
No. 20189, JP-A-51-82102, JP-A-52
-134692, JP-A-59-138205, JP-A-60-84305, JP-A-62-18537, JP-A-64-33104, Research Disclosure 3382
No. 5 and the like, and specific examples include triethanolamine, ethyl p-dimethylaminobenzoate, p-formyldimethylaniline, p-methylthiodimethylaniline and the like.

Other examples of the co-sensitizer include thiols and sulfides, for example, thiol compounds described in JP-A-53-702, JP-B-55-500806, and JP-A-5-142772; No. 75643, specifically, 2-mercaptobenzothiazole, 2-mercaptobenzoxazole, 2-mercaptobenzimidazole, 2-mercapto-4 (3H) -quinazoline, β-mercaptonaphthalene, and the like. Is raised.

Further examples include amino acid compounds (eg, N-phenylglycine, etc.) and JP-B-48-429.
No. 65, organometallic compounds (eg, tributyltin acetate, etc.), hydrogen donors described in JP-B-55-34414, sulfur compounds described in JP-A-6-308727 (eg, trithiane, etc.), JP-A-6-250389. No. 6 (Diethyl phosphite, etc.)
191605, Si-H and Ge-H compounds.

When a sensitizing dye is used in the present invention, the molar ratio of the photopolymerization initiator to the sensitizing dye in the photopolymerizable composition is from 100: 0 to 1:99, and more preferably from 9 to 9.
0:10 to 10:90, most preferably 80: 2
0:20:80. When the co-sensitizer is used, it is suitably used in an amount of 0.01 to 50 parts by weight, more preferably 0.02 to 50 parts by weight, based on 1 part by weight of the photopolymerization initiator.
20 parts by weight, most preferably 0.05 to 10 parts by weight.

[Radical polymerizable monomer] Next, the radical polymerizable monomer contained in the photopolymerizable composition of the present invention will be described. The radical polymerizable monomer contained in the photopolymerizable composition of the present invention contains 30 radicals in the photopolymerizable composition.
There is no particular limitation as long as the content is at least wt%. The radical polymerizable monomer is a compound having an ethylenically unsaturated bond capable of addition polymerization, for example, an unsaturated carboxylic acid (eg, acrylic acid, methacrylic acid, itaconic acid, crotonic acid, isocrotonic acid, maleic acid, etc.) And amides of the above unsaturated carboxylic acids and aliphatic polyamine compounds.

Specific examples of the ester monomer of the aliphatic polyhydric alcohol compound and the unsaturated carboxylic acid include acrylates such as ethylene glycol diacrylate, triethylene glycol diacrylate, and 1,3.
-Butanediol diacrylate, tetramethylene glycol diacrylate, propylene glycol diacrylate, neopentyl glycol diacrylate, trimethylolpropane triacrylate, trimethylolpropane tri (acryloyloxypropyl) ether, trimethylolethane triacrylate, hexanediol diacrylate Acrylate, 1,4-cyclohexanediol diacrylate, tetraethylene glycol diacrylate, pentaerythritol diacrylate, pentaerythritol triacrylate, pentaerythritol tetraacrylate, dipentaerythritol diacrylate, dipentaerythritol hexaacrylate, sorbitol triacrylate, sorbitol tetra Acrylate, SO Bi penta acrylate, sorbitol hexaacrylate, tri (acryloyloxyethyl) isocyanurate, polyester acrylate oligomer.

Examples of the methacrylate include tetramethylene glycol dimethacrylate, triethylene glycol dimethacrylate, neopentyl glycol dimethacrylate, trimethylolpropane trimethacrylate, trimethylolethane trimethacrylate, ethylene glycol dimethacrylate, and 1,3-butanediol. Dimethacrylate, hexanediol dimethacrylate, pentaerythritol dimethacrylate, pentaerythritol trimethacrylate, pentaerythritol tetramethacrylate, dipentaerythritol dimethacrylate, dipentaerythritol hexamethacrylate, sorbitol trimethacrylate, sorbitol tetramethacrylate, bis [p- (3 -Methacryloxy-2-h Rokishipuropokishi) phenyl] dimethyl methane, bis - [p- (acryloxy ethoxy)
Phenyl] dimethylmethane. Examples of itaconic acid esters include ethylene glycol diitaconate, propylene glycol diitaconate, 1,3-butanediol diitaconate, 1,4-butanediol diitaconate, tetramethylene glycol diitaconate, and pentaerythritol diitaconate. And sorbitol tetritaconate.

Examples of crotonates include ethylene glycol dicrotonate, tetramethylene glycol dicrotonate, pentaerythritol dicrotonate,
Sorbitol tetradicrotonate and the like. Examples of the isocrotonic acid ester include ethylene glycol diisocrotonate, pentaerythritol diisocrotonate, and sorbitol tetraisocrotonate. Examples of the maleic acid ester include ethylene glycol dimaleate, triethylene glycol dimaleate, pentaerythritol dimaleate, and sorbitol tetramaleate. Furthermore, a mixture of the above-mentioned ester monomers can also be mentioned. Specific examples of the amide monomer of the aliphatic polyamine compound and the unsaturated carboxylic acid include methylenebis-acrylamide, methylenebis-methacrylamide, 1,6-hexamethylenebis-acrylamide, and 1,6-hexane. Examples include methylenebis-methacrylamide, diethylenetriaminetrisacrylamide, xylylenebisacrylamide, and xylylenebismethacrylamide.

Another example is described in JP-B-48-417.
JP-A-08-208, in which a hydroxyl-containing vinyl monomer represented by the following general formula (A) is added to a polyisocyanate compound having two or more isocyanate groups in one molecule. Vinyl urethane compounds containing the above polymerizable vinyl groups are exemplified. CH ₂ ＣC (R) COOCH ₂ CH (R ′) OH (A) (where R and R ′ represent H or CH ₃ ). Further, as described in JP-A-51-37193. Urethane acrylates, JP-A-48-64183
No., JP-B-49-43191, JP-B-52-3049
Polyfunctional acrylates and methacrylates such as polyester acrylates and epoxy acrylates obtained by reacting an epoxy resin with (meth) acrylic acid as described in Japanese Patent Publication No. 0 are mentioned. Furthermore, the Journal of the Adhesion Society of Japan vol.20, No. 7, pages 300 to 308 (19
(1984) as photocurable monomers and oligomers can also be used. In the present invention, these monomers may be used in a chemical form such as a prepolymer, that is, a dimer, a trimer and an oligomer, or a mixture thereof and a copolymer thereof.

In addition, α-hetero type monomers having a structure represented by the general formula (I) described in Japanese Patent Application No. 11-268842 can also be suitably used. Hereinafter, specific examples of the α-hetero type monomer will be shown.

[0213]

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[0214]

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[0215]

[Table 5]

[0216]

[Table 6]

[0219]

[Table 7]

[0218]

[Table 8]

[0219]

[Table 9]

[0220]

[Table 10]

[0221]

[Table 11]

[0222]

[Table 12]

[0223]

[Table 13]

[0224]

[Table 14]

[0225]

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[0226]

[Table 16]

[0227]

[Table 17]

[0228]

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[0230]

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The amount of all the polymerizable group-containing compounds used is not particularly limited as long as it is 30% by weight or more based on the weight of all components of the photopolymerizable composition, but is usually 30 to 99.99% by weight, preferably 35. 0 to 90.0 wt%, more preferably 4
An amount of 0.0 to 70.0 wt% is used.

[Linear Organic High Polymer] The photopolymerizable composition of the present invention preferably contains a linear organic high polymer as a binder. As such a “linear organic high molecular polymer”, any linear organic high molecular polymer having compatibility with the photopolymerizable ethylenically unsaturated compound may be used. Absent. Preferably, a water- or weakly alkaline water-soluble or swellable linear organic high molecular polymer that enables water development or weakly alkaline water development is selected. The linear organic polymer is appropriately selected and used depending on whether water, weakly alkaline water or an organic solvent is used as a developer as well as a film-forming agent of the composition. For example, when a water-soluble organic high molecular polymer is used, water development becomes possible. Examples of such a linear organic high-molecular polymer include addition polymers having a carboxylic acid group in a side chain, such as JP-A-59-44615 and JP-B-54.
-34327, JP-B-58-12577, JP-B-5
Nos. 4,25,957, JP-A-54-92723, JP-A-59-53836, and JP-A-59-71048, that is, methacrylic acid copolymers, acrylic acid copolymers, itacone There are acid copolymers, crotonic acid copolymers, maleic acid copolymers, partially esterified maleic acid copolymers and the like. Similarly, there is an acidic cellulose derivative having a carboxylic acid group in the side chain. In addition, those obtained by adding a cyclic acid anhydride to an addition polymer having a hydroxyl group are useful. In particular, among these, [benzyl (meth) acrylate / (meth) acrylic acid / optionally other addition-polymerizable vinyl monomers] copolymer and [allyl (meth) acrylate / (meth) acrylic acid / optionally And other addition-polymerizable vinyl monomers] copolymers. In addition, polyvinyl pyrrolidone, polyethylene oxide, and the like are useful as the water-soluble linear organic polymer. In order to increase the strength of the cured film, an alcohol-soluble polyamide, a polyether of 2,2-bis- (4-hydroxyphenyl) -propane and epichlorohydrin, and the like are also useful. These linear organic high molecular polymers can be mixed in any amount in the entire composition. However, if the amount exceeds 90% by weight based on the weight of all components of the composition, no favorable result is obtained in terms of the strength of the formed image and the like.
Preferably it is 30 to 85%. The weight ratio of the photopolymerizable ethylenically unsaturated compound and the linear organic high molecular polymer is preferably in the range of 1/9 to 7/3. A more preferred range is 3/7 to 5/5.

Polymerization Inhibitor In the present invention, unnecessary thermal polymerization of a compound having an ethylenically unsaturated double bond which can be polymerized during the production or storage of the photopolymerizable composition in addition to the above basic components is prevented. For this purpose, it is desirable to add a small amount of a thermal polymerization inhibitor. Suitable thermal polymerization inhibitors include hydroquinone, p
-Methoxyphenol, di-t-butyl-p-cresol, pyrogallol, t-butylcatechol, benzoquinone, 4,4'-thiobis (3-methyl-6-t-butylphenol), 2,2'-methylenebis (4- Methyl-
6-t-butylphenol), cerium N-nitrosophenylhydroxyamine, and the like. The addition amount of the thermal polymerization inhibitor is about 0.01 to the weight of the whole composition.
% By weight to about 5% by weight is preferred. Further, if necessary, a higher fatty acid derivative such as behenic acid or behenic acid amide may be added to prevent polymerization inhibition by oxygen, and may be unevenly distributed on the surface of the photosensitive layer in a drying process after coating. Good. The amount of the higher fatty acid derivative to be added is about 0.5% by weight of the total composition.
About 10% by weight is preferred.

Colorant, etc. Further, a dye or pigment may be added for the purpose of coloring the photosensitive layer. This makes it possible to improve the so-called plate inspection, such as the visibility of the printing plate after plate making and the suitability for an image density measuring device. As many colorants, pigments are particularly preferable because many dyes lower the sensitivity of the photopolymerizable photosensitive layer. Specific examples include pigments such as phthalocyanine pigments, azo pigments, carbon black, and titanium oxide, and dyes such as ethyl violet, crystal violet, azo dyes, anthraquinone dyes, and cyanine dyes. The amount of the dye or pigment added is preferably about 0.5% to about 5% by weight of the total composition.

Other Additives In order to improve the physical properties of the cured film, known additives such as inorganic fillers, other plasticizers, and oil-sensitizing agents capable of improving the ink adhesion on the surface of the photosensitive layer are used. May be added. Examples of the plasticizer include dioctyl phthalate, didodecyl phthalate, triethylene glycol dicaprylate, dimethyl glycol phthalate, tricresyl phosphate, dioctyl adipate, dibutyl sebacate, triacetyl glycerin, and the like.When a binder is used,
It can be added in an amount of 10% by weight or less based on the total weight of the compound having an ethylenically unsaturated double bond and the binder.

Further, a UV initiator, a thermal crosslinking agent, and the like can be added to enhance the effects of heating and exposure after development for the purpose of improving the film strength (printing durability) described later. In addition, it is possible to provide an additive and an intermediate layer for improving the adhesion between the photosensitive layer and the support and for improving the development and removability of the unexposed photosensitive layer. For example, by adding or undercoating a compound having a relatively strong interaction with the substrate, such as a compound having a diazonium structure or a phosphone compound, the adhesion can be improved and the printing durability can be increased. Addition of an acid or a hydrophilic polymer such as polysulfonic acid or undercoating improves the developability of the non-image area and improves the stainability.

When the photopolymerizable composition of the present invention is coated on a support, it is used after being dissolved in various organic solvents.
As the solvent used here, acetone, methyl ethyl ketone, cyclohexane, ethyl acetate, ethylene dichloride, tetrahydrofuran, toluene, ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol dimethyl ether,
Propylene glycol monomethyl ether, propylene glycol monoethyl ether, acetylacetone, cyclohexanone, diacetone alcohol, ethylene glycol monomethyl ether acetate, ethylene glycol ethyl ether acetate, ethylene glycol monoisopropyl ether, ethylene glycol monobutyl ether acetate, 3-methoxypropanol, methoxymethoxy Ethanol, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol dimethyl ether, diethylene glycol diethyl ether, propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate, 3-methoxypropyl acetate, N N- dimethylformamide, dimethyl sulfoxide, .gamma.-butyrolactone, methyl lactate and ethyl lactate. These solvents can be used alone or as a mixture. The appropriate concentration of the solid content in the coating solution is 2 to 50% by weight.

The amount of the photosensitive layer to be coated on the support mainly affects the sensitivity of the photosensitive layer, the developability, and the strength and printing durability of the exposed film, and is desirably appropriately selected depending on the application. If the coating amount is too small, the printing durability will be insufficient. On the other hand, if the amount is too large, the sensitivity is lowered, the exposure takes time, and the developing process requires a longer time, which is not preferable. As is the principal object lithographic printing plate for scan exposure of the present invention, the coating amount in the range of about 0.1 g / m ² ~ about 10 g / m ² in weight after drying is suitable. More preferably 0.5 to
It is 5 g / m ² .

"Support" In order to obtain the photopolymerizable lithographic printing plate of the invention, the photosensitive layer is provided on a support having a hydrophilic surface. As the hydrophilic support, a conventionally known hydrophilic support used for a lithographic printing plate can be used without limitation. The support used is preferably a dimensionally stable plate, for example, paper, plastic (eg,
Paper, metal plate (eg, aluminum, zinc, copper, etc.), plastic film (eg, cellulose diacetate, cellulose triacetate, cellulose propionate, cellulose butyrate, cellulose acetate butyrate) on which polyethylene, polypropylene, polystyrene, etc. are laminated; Cellulose nitrate, polyethylene terephthalate, polyethylene, polystyrene, polypropylene, polycarbonate, polyvinyl acetal, etc.), and paper or plastic films on which the above-mentioned metals are laminated or vapor-deposited. Known physical and chemical treatments may be performed for the purpose of imparting, improving the strength, and the like.

Particularly preferred examples of the support include paper, polyester film and aluminum plate. Among them, the dimensional stability is good, the cost is relatively low, and the hydrophilicity and strength are excellent by surface treatment as required. Aluminum plates that can provide a surface are particularly preferred. Further, a composite sheet in which an aluminum sheet is bonded to a polyethylene terephthalate film as described in JP-B-48-18327 is also preferable.

Suitable aluminum plates are a pure aluminum plate and an alloy plate containing aluminum as a main component and containing a trace amount of a different element, and may be a plastic film on which aluminum is laminated or vapor-deposited. The foreign elements contained in the aluminum alloy include silicon, iron, manganese, copper, magnesium, chromium, zinc, bismuth, nickel, titanium and the like. The content of the foreign element in the alloy is at most 10% by weight or less. Particularly preferred aluminum in the present invention is pure aluminum. However, completely pure aluminum is difficult to produce due to refining technology, and therefore may contain a slightly different element. As described above, the composition of the aluminum plate applied to the present invention is not specified, and an aluminum plate of a conventionally known and used material can be appropriately used. The thickness of the aluminum plate used in the present invention is about 0.1 mm to 0.6 mm, preferably 0.15 mm to 0.4 mm, particularly preferably 0.2 mm to 0.4 mm.
mm to 0.3 mm.

In the case of a support having a metal surface, particularly an aluminum surface, a roughening (graining) treatment, an immersion treatment in an aqueous solution of sodium silicate, potassium fluorozirconate, phosphate or the like, or anodic oxidation Preferably, a surface treatment such as a treatment is performed. The surface roughening treatment of the surface of the aluminum plate is performed by various methods, for example,
It is performed by a method of mechanically roughening the surface, a method of electrochemically dissolving and roughening the surface, and a method of chemically selectively dissolving the surface. As the mechanical method, a known method such as a ball polishing method, a brush polishing method, a blast polishing method, a buffing method and a polishing method can be used. In addition, as an electrochemical surface roughening method, there is a method of performing an alternating or direct current in an electrolytic solution such as hydrochloric acid or nitric acid. Further, a method combining both of them can be used as disclosed in JP-A-54-63902. Also, prior to roughening the aluminum plate, if desired, to remove rolling oil on the surface,
For example, a degreasing treatment with a surfactant, an organic solvent or an alkaline aqueous solution is performed.

Further, an aluminum plate which has been roughened and then immersed in an aqueous solution of sodium silicate can be preferably used. As described in JP-B-47-5125, an aluminum plate which is anodized and then immersed in an aqueous solution of an alkali metal silicate is preferably used. The anodizing treatment is performed, for example, in an electrolytic solution of an inorganic acid such as phosphoric acid, chromic acid, sulfuric acid, or boric acid, or an organic acid such as oxalic acid or sulfamic acid, or an aqueous solution or a non-aqueous solution of a salt thereof alone or in combination of two or more. This is performed by flowing a current using an aluminum plate as an anode.

Also, silicate electrodeposition as described in US Pat. No. 3,658,662 is effective. Furthermore, JP-B-46-27481 and JP-A-52-5860.
No. 2, Japanese Patent Application Laid-Open No. 52-30503, and a surface treatment obtained by combining the support subjected to electrolytic graining with the above anodic oxidation treatment and sodium silicate treatment are also useful.
It is also preferable to sequentially perform mechanical roughening, chemical etching, electrolytic graining, anodizing treatment, and sodium silicate treatment as disclosed in JP-A-56-28893.

Further, after these treatments, water-soluble resins such as polyvinylphosphonic acid, polymers and copolymers having a sulfonic acid group in the side chain, polyacrylic acid, and water-soluble metal salts (eg, zinc borate) ) Or those undercoated with a yellow dye, an amine salt or the like are also suitable. Furthermore, a sol-gel treated substrate having a functional group capable of causing an addition reaction by a radical covalently disclosed in JP-A-7-159983 is also preferably used.

As other preferred examples, there can be mentioned those in which a water-resistant hydrophilic layer is provided as a surface layer on an arbitrary support. As such a surface layer, for example, US3
No. 055295, a layer composed of an inorganic pigment and a binder described in JP-A-56-13168, a hydrophilic swelling layer described in JP-A-9-80744, a titanium oxide and a polyvinyl oxide described in JP-A-8-507727. A sol-gel film made of alcohol or silicic acid can be used. These hydrophilic treatments are performed not only to make the surface of the support hydrophilic, but also to prevent harmful reactions of the photopolymerizable composition provided thereon and to improve the adhesion of the photosensitive layer. Etc.

"Protective Layer" The photopolymerizable lithographic printing plate of the present invention further has a protective layer on the photosensitive layer since the exposure is usually performed in the air. The protective layer prevents contamination of the photosensitive layer with low-molecular compounds such as basic substances present in the air that inhibit an image forming reaction caused by exposure in the photosensitive layer,
Enables exposure in the atmosphere. Therefore, the property desired for such a protective layer is that the low molecular compound has low permeability, and further, does not substantially inhibit the transmission of light used for exposure, has excellent adhesion to the photosensitive layer, and Desirably, it can be easily removed in a developing step after exposure. Such a device for the protective layer has been conventionally devised and described in detail in U.S. Pat. No. 3,458,311 and JP-A-55-49729. As a material that can be used for the protective layer, for example, it is preferable to use two or more kinds of water-soluble polymer compounds (also referred to as water-soluble polymers) having relatively excellent crystallinity, and specifically, polyvinyl alcohol, polyvinyl pyrrolidone, Water-soluble polymers such as acidic celluloses, gelatin, gum arabic, and polyacrylic acid are known. Of these, use of polyvinyl alcohol as a main component has basic characteristics such as oxygen barrier properties and development removability. Gives the best results. The polyvinyl alcohol used for the protective layer may be partially substituted with an ester, an ether, or an acetal as long as it contains an unsubstituted vinyl alcohol unit for obtaining necessary oxygen barrier properties and water solubility. Similarly, a part thereof may have another copolymer component. As a specific example of polyvinyl alcohol, 71 to 100 mol% is hydrolyzed,
Those having a weight average molecular weight in the range of 300 to 2400 can be mentioned. Specifically, Kuraray's PVA-105, PVA-110, and PVA-11
7, PVA-117H, PVA-120, PVA-12
4, PVA-124H, PVA-CS, PVA-CS
T, PVA-HC, PVA-203, PVA-204,
PVA-205, PVA-210, PVA-217, P
VA-220, PVA-224, PVA-217EE,
PVA-217E, PVA-220E, PVA-224
E, PVA-405, PVA-420, PVA-61
3, L-8 and the like.

The components of the protective layer (selection of PVA, use of additives), coating amount, etc. are selected in consideration of fogging properties, adhesion and scratch resistance in addition to low molecular substance blocking properties and development removability. .
Generally, the higher the hydrolysis rate of the PVA used (the higher the content of unsubstituted vinyl alcohol units in the protective layer) and the thicker the film thickness, the higher the barrier properties of low molecular substances, which is advantageous in terms of sensitivity. . However, if the low-molecular substance blocking property is extremely increased, an unnecessary polymerization reaction occurs during production or raw storage,
Further, at the time of image exposure, there is a problem that unnecessary fogging and thickening of image lines occur. Further, the adhesion to the image area and the scratch resistance are also extremely important in handling the plate. That is, when a hydrophilic layer made of a water-soluble polymer is laminated on a lipophilic polymer layer, film peeling due to insufficient adhesive strength tends to occur. In particular, in the photopolymerizable lithographic printing plate of the present invention, when the radical polymerizable monomer is contained in the photosensitive layer in an amount of 30% by weight or more, the overcoat layer on the upper layer is easily peeled off. The surface is liable to be scratched due to rubbing during transportation, etc., and this specific part causes poor curing.In addition to polyvinyl alcohol which is a component of the overcoat layer, another specific water-soluble polymer which improves the adhesion with the photosensitive layer is used. Must be included. Specific water-soluble polymers that improve the adhesion include, for example, US Pat.
And US Patent No. 44563 describe an acrylic emulsion or a water-insoluble vinylpyrrolidone-vinyl acetate copolymer. Particularly, a polymer having a tertiary amide structure is preferable. Based polymer. They are,
The overcoat layer preferably contains 5 wt% to 15 wt%. The method of applying such a protective layer is described, for example, in U.S. Pat. No. 3,458,311 and JP-A-55-49
No. 729.

Further, other functions can be imparted to the protective layer. For example, when a laser beam is used as a light source, the photosensitive composition may have excellent photosensitivity at the wavelength of the light source, but may not want to be exposed at other wavelengths. For example, if the light source is in the infrared region of 750 nm or more, the light source can be used substantially in a bright room, but in practice, it may be exposed to short-wave light such as light from a fluorescent lamp. In this case, it is preferable to add a colorant (a water-soluble dye or the like) which is excellent in light transmittance of the light source and can efficiently absorb light having a wavelength of less than 700 nm. As another example, the light source is 45
If it is in the ultraviolet region of 0 nm or less, it can be used substantially under safelight. But in fact, 50
It may be exposed to visible light of 0 nm or more. In this case, the addition of a colorant (such as a water-soluble dye), which is excellent in light transmittance of the light source and can efficiently absorb light of 500 nm or more, further enhances safe light suitability without lowering sensitivity. be able to.

The photopolymerizable lithographic printing plate of the present invention is usually subjected to image exposure and then removing the unexposed portions of the photosensitive layer with a developing solution.
Get an image. Preferable developers for use in the preparation of lithographic printing plates from these photopolymerizable lithographic printing plates include those described in JP-B-57-7427, such as sodium silicate and silicate. Potassium, sodium hydroxide, potassium hydroxide, lithium hydroxide, tribasic sodium phosphate, dibasic sodium phosphate, tribasic ammonium phosphate, dibasic ammonium phosphate, sodium metasilicate, sodium bicarbonate, aqueous ammonia, etc. An aqueous solution of such an inorganic alkali agent or an organic alkali agent such as monoethanolamine or diethanolamine is suitable. The alkaline solution is added so that the concentration of the alkaline solution is 0.1 to 10% by weight, preferably 0.5 to 5% by weight.

In addition, such an alkaline aqueous solution includes:
If necessary, a small amount of a surfactant or an organic solvent such as benzyl alcohol, 2-phenoxyethanol or 2-butoxyethanol can be contained. For example, those described in U.S. Pat. Nos. 3,375,171 and 3,615,480 can be mentioned. Further, Japanese Unexamined Patent Publication No.
No. 0-26601, No. 58-54341, Tokubo Sho56
The developing solutions described in JP-A-39464 and JP-A-56-42860 are also excellent.

In the plate making process of the lithographic printing plate from the photopolymerizable lithographic printing plate of the present invention, the whole surface may be heated before exposure, during exposure, or between exposure and development, if necessary. . By such heating, an image forming reaction in the photosensitive layer is promoted, and advantages such as improvement of sensitivity and printing durability and stabilization of sensitivity can be brought about. Further, for the purpose of improving image strength and printing durability, it is also effective to post-heat or expose the entire surface of the developed image. Usually, heating before development is preferably performed under mild conditions of 150 ° C. or less. If the temperature is too high, there arises a problem that a non-image portion is covered. Very strong conditions are used for heating after development. Usually, it is in the range of 200 to 500 ° C. If the temperature is too low, a sufficient image strengthening effect cannot be obtained. If the temperature is too high, problems such as deterioration of the support and thermal decomposition of the image area occur. Known methods can be used for the exposure method of the scanning exposure planographic printing plate according to the present invention without any limitation. A laser is preferred as the light source. For example, as an available laser light source having a wavelength of 350 to 450 nm, the following can be used.

As a gas laser, an Ar ion laser (364 nm, 351 nm, 10 mW to 1 W), a Kr ion laser (356 nm, 351 nm, 10 mW to 1 W), He-
Cd laser (441nm, 325nm, 1mW ~ 100m
W), a combination of Nd: YAG (YVO ₄ ) and SHG crystal × 2 times (355 mm, 5 mW to 1
W), Cr: Combination of LiSAF and SHG crystal (4
30nm, 10mW), KNbO as a semiconductor laser system
_3. Ring resonator (430 nm, 30 mW), combination of waveguide type wavelength conversion element and AlGaAs or InGaAs semiconductor (380 nm to 450 nm, 5 mW to 100 mW), combination of waveguide type wavelength conversion element and AlGaInP, AlGaAs semiconductor (300 nm to 350nm, 5mW ~ 100mW),
AlGaInN (350 nm to 450 nm, 5 mW to 30 mW) Other pulsed laser as a N ₂ laser (337N
m, pulse 0.1 to 10 mJ), XeF (351 nm, pulse 10 to 250 mJ)

Particularly, among these, an AlGaInN semiconductor laser (commercially available InGaN semiconductor laser 400 to 410 n
m, 5 to 30 mW) is preferable in terms of wavelength characteristics and cost. In addition, available light sources of 450 nm to 700 nm include Ar + laser (488 nm), YAG-SHG laser (532 nm), and He-Ne laser (633 n).
m), He-Cd laser, red semiconductor laser (65
Semiconductor lasers (800 to 850 nm) as available light sources of 700 nm to 1200 nm.
m), Nd-YAG laser (1064 nm) can be suitably used.

In addition, ultra-high pressure, high pressure, medium pressure, low pressure mercury lamps, chemical lamps, carbon arc lamps, xenon lamps, metal halide lamps, ultraviolet laser lamps (ArF excimer laser, KrF excimer laser, etc.) Although rays, X-rays, ion beams, far-infrared rays, etc. can be used, the above-mentioned laser light source having a wavelength of 350 nm or more is particularly preferable in terms of inexpensiveness. The exposure mechanism may be any of an internal drum type, an external drum type, a flat bed type, and the like. The photosensitive layer component of the present invention can be made soluble in neutral water or weakly alkaline water by using a highly water-soluble one.However, a lithographic printing plate having such a configuration can be used on a printing press. After loading, a system such as exposure-development can be performed on the machine.

[0262]

Hereinafter, the present invention will be described with reference to Examples.
The present invention is not limited to these examples. (Preparation of support) An aluminum plate having a thickness of 0.3 mm
After etching by immersion in 60% by weight of sodium hydroxide at 60 ° C for 25 seconds, it was washed with running water, neutralized and washed with 20% by weight nitric acid, and then washed with water. This was subjected to electrolytic surface roughening treatment in a 1% by weight nitric acid aqueous solution using a sinusoidal alternating waveform current at an anode electricity of 300 coulomb / dm ² . Followed by 1
After immersion in a 30% by weight aqueous solution of sulfuric acid at 40 ° C. for 5 seconds, immersion in a 30% by weight aqueous solution of sulfuric acid and desmutting at 60 ° C. for 40 seconds, a current density of 2 A / dm ² in a 20% by weight aqueous solution of sulfuric acid 1. The thickness of the anodic oxide film is 2.
Anodizing treatment was performed for 2 minutes so as to obtain 7 g / m ² . The surface roughness was measured to be 0.3 μm (JIS B06
Ra display of 01). The following sol-gel reaction solution was coated on the back surface of the substrate treated in this manner with a bar coater and dried at 100 ° C. for 1 minute.
A support having a back coat layer of mg / m ² was prepared.

Sol-gel reaction liquid Tetraethyl silicate 50 parts by weight Water 20 parts by weight Methanol 15 parts by weight Phosphoric acid 0.05 parts by weight

When the above components were mixed and stirred, exotherm started in about 5 minutes. After reacting for 60 minutes, the following solution was added to prepare a back coat coating solution.

Pyrogallol formaldehyde condensation resin (molecular weight: 2000) 4 parts by weight Dimethyl phthalate 5 parts by weight Fluorinated surfactant (N-butyl perfluorooctane 0.7 parts by weight) Sulfonamidoethyl acrylate / polyoxyethylene acrylate copolymer: molecular weight 2 10,000) Methanol silica sol (manufactured by Nissan Chemical Industries, Ltd., methanol 30% by weight) 50 parts by weight Methanol 800 parts by weight

(Preparation of photosensitive layer) A solution for forming a photosensitive layer having the following composition was applied onto the aluminum plate thus treated so that the dry coating amount was 1.5 g / m ² ,
After drying for a minute, a photosensitive layer was formed.

(Sensitive layer forming solution) 0.4 g of photopolymerization initiator [X] in Table 8 below 0.2 g of sensitizing dye [Y] in Table 8 below (4.0-r) g Polymerizable compound [R] in Table 8 below r g Additive [S] in Table 8 below 0.3 g Fluorosurfactant 0.03 g (Mechanical Fac-F-177) : Dai Nippon Ink Chemical Industry Co., Ltd.) Thermal polymerization inhibitor N-nitrosophenylhydroxylamici aluminum salt 0.01 g Pigment dispersion 2.0 g Composition of pigment dispersion Pigment Blue 15: 6 15 parts by weight Allyl methacrylate / Methacrylic acid copolymer 10 parts by weight (copolymerization molar ratio / 83/17) cyclohexanone 15 parts by weight methoxypropyl acetate 20 parts by weight propylene glycol monomethyl ether 40 parts by weight methyl ethyl ketone 20 g B propylene glycol monomethyl ether 20 g

(Adjustment of Protective Layer) Polyvinyl alcohol (degree of saponification 98%, degree of polymerization 550)
A 10% by weight aqueous solution and a 3% by weight aqueous solution of a specific water-soluble polymer shown in Table 7 below were mixed at a ratio of 85:15 wt%, and coated so that the dry coating weight was 2 g / m ^2.
After drying at 0 ° C. for 2 minutes, a photopolymerizable lithographic printing plate (sensitive material) was prepared in combination with the photosensitive layer as shown in Table 8 below.
For comparison, a sample to which a specific water-soluble polymer was not added was prepared.

[0269]

[Table 19]

[0270]

[Table 20]

The photopolymerization initiator [X], sensitizing dye [Y], polymer binder [Z], polymerizable compound [R], and additive [S] used in the photosensitive layer are shown below.

[0272]

Embedded image

[0273]

Embedded image

[0274]

Embedded image

(Evaluation of Sensitivity) The light-sensitive materials thus obtained were evaluated for sensitivity by using different light sources according to the exposure wavelengths shown in Table 8 above. For example, 400n
Exposure was performed in the air using a semiconductor laser of 532 nm, an FD-YAG laser of 532 nm, and a semiconductor laser of 830 nm. The film was immersed in a developer having the following composition at 25 ° C. for 10 seconds, developed, and the sensitivity under each exposure condition was calculated in mJ / cm ² from the minimum exposure amount at which an image could be formed. The smaller the value, the higher the sensitivity. However, if the light source wavelength is different, the amount of energy per photon is different.
Even if it is simply considered, usually, the shorter the wavelength, the smaller the amount of exposure described above, the more the photosensitivity becomes possible, and the shorter the wavelength, the higher the sensitivity. Therefore, Table 9 has no meaning in comparing the sensitivity under different exposure conditions, and is merely to see the difference between the example and the comparative example under the same exposure condition. The results are shown in Table 9 below.

(Composition of Developer) DP-4 (manufactured by Fuji Photo Film Co., Ltd.) 65.0 g water 880.0 g lipomin LA (20% aqueous solution, manufactured by Lion Corporation) 50.0 g

(Evaluation of Storage Stability) The above-mentioned photosensitive material before laser exposure was left under high-temperature conditions (60 ° C.) for 3 days, and then the photosensitive material after storage was exposed to laser in the same manner as described above to perform recording. The amount of energy was calculated, and the energy ratio before and after high-temperature storage (energy after high-temperature storage / energy before high-temperature storage) was determined. It is preferable in terms of production that the energy ratio is 1.1 or less, and it can be said that storage stability is also good. This evaluation result is also shown in Table 9 below.

(Brightroom Stability) Sensitivity is evaluated after exposing the above coated photographic material to yellow or yellow-orange light having a filter capable of cutting OD 6 or more and 450 nm or less at 200 lux for 30 minutes in a fluorescent lamp. The change in sensitivity is 1.
A range of 0 to 1.1 times is allowable. The results are shown in the following table.
It is shown in FIG. (Scratch resistance) A commercially available cellophane tape (Nitto Denko polyester adhesive tape, 20 mm width) was applied to the above-mentioned coated sensitizing material by 25 cm.
And then slowly peeled off by hand, and examined the degree of peeling of the overcoat layer. Desirably, it does not peel or is very small. The results are shown in Table 9 below.

[0279]

[Table 21]

From Table 9, it can be seen that the photographic material of the present invention can provide a printing plate having high sensitivity, good storage stability and good scratch resistance. In the 400 nm and 830 nm exposure systems, the bright room is further improved.

[0281]

The photopolymerizable lithographic printing plate of the present invention comprises a photosensitive layer using a halogen atom-containing photopolymerization initiator containing 30% by weight or more of a radically polymerizable monomer, so that the photosensitive layer of the initiator crystal can be used. Prevents sensitivity drop due to precipitation of
In addition, by including two or more water-soluble polymer compounds in the oxygen-blocking protective layer on the photosensitive layer, the adhesion to the photosensitive layer could be improved. As a result, the photopolymerizable lithographic printing plate of the present invention became excellent in scratch resistance while maintaining high sensitivity, light room handling property and storage stability.

Claims (1)

[Claims] 1. A photosensitive layer comprising a photopolymerizable composition containing a halogen atom-containing photopolymerization initiator and a radical polymerizable monomer in an amount of 30% by weight or more, and two or more water-soluble polymer compounds on the photosensitive layer. A photopolymerizable lithographic printing plate comprising an oxygen-blocking protective layer.