JP2002184759A5 - - Google Patents

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Publication number
JP2002184759A5
JP2002184759A5 JP2000379540A JP2000379540A JP2002184759A5 JP 2002184759 A5 JP2002184759 A5 JP 2002184759A5 JP 2000379540 A JP2000379540 A JP 2000379540A JP 2000379540 A JP2000379540 A JP 2000379540A JP 2002184759 A5 JP2002184759 A5 JP 2002184759A5
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JP
Japan
Prior art keywords
power
frequency
reaction gas
plasma
supplying
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JP2000379540A
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English (en)
Japanese (ja)
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JP2002184759A (ja
JP3835983B2 (ja
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Priority to JP2000379540A priority Critical patent/JP3835983B2/ja
Priority claimed from JP2000379540A external-priority patent/JP3835983B2/ja
Publication of JP2002184759A publication Critical patent/JP2002184759A/ja
Publication of JP2002184759A5 publication Critical patent/JP2002184759A5/ja
Application granted granted Critical
Publication of JP3835983B2 publication Critical patent/JP3835983B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP2000379540A 2000-12-14 2000-12-14 プラズマ処理装置およびプラズマ処理方法 Expired - Fee Related JP3835983B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2000379540A JP3835983B2 (ja) 2000-12-14 2000-12-14 プラズマ処理装置およびプラズマ処理方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2000379540A JP3835983B2 (ja) 2000-12-14 2000-12-14 プラズマ処理装置およびプラズマ処理方法

Publications (3)

Publication Number Publication Date
JP2002184759A JP2002184759A (ja) 2002-06-28
JP2002184759A5 true JP2002184759A5 (cg-RX-API-DMAC7.html) 2005-07-14
JP3835983B2 JP3835983B2 (ja) 2006-10-18

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ID=18847888

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000379540A Expired - Fee Related JP3835983B2 (ja) 2000-12-14 2000-12-14 プラズマ処理装置およびプラズマ処理方法

Country Status (1)

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JP (1) JP3835983B2 (cg-RX-API-DMAC7.html)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1933605B1 (en) 2005-09-16 2019-05-15 Toyo Advanced Technologies Co., Ltd. Plasma generating device and plasma generating method
JP2013191687A (ja) * 2012-03-13 2013-09-26 Sekisui Chem Co Ltd 光半導体装置の製造方法及び光半導体装置

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