JP2002158352A - Method for manufacturing insulated gate semiconductor device - Google Patents

Abstract

(57) [Problem] A conventional power MOSFET uses a large number of masks, so that there is a limit in cost reduction. In addition, the interlayer insulating film extending to the trench opening covers part of the source region, and the contact area between the source region and the source electrode is very small.
There is a limit to the reduction in on-resistance. An N ⁺ -type impurity is diffused from a sidewall provided in an interlayer insulating film into a part of a body contact region provided in a first source region on a surface of a channel layer, and a part of the P ⁺ -type region is inverted. By forming a second source region integrated with the first source region, the source region and the body contact region are formed in a self-aligned manner. Further, since the side wall can be used as a source region, the contact area with the source electrode increases, and the on-resistance can be reduced.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

The present invention relates to a method of manufacturing an insulated gate type semiconductor device, and more particularly to a method of manufacturing an insulated gate type semiconductor device which realizes reduction of a mask and on-resistance.

[0002]

2. Description of the Related Art With the spread of portable terminals, a small-sized and large-capacity lithium-ion battery has been required. The protection circuit for performing the battery management of the charging and discharging of the lithium ion battery must be smaller and capable of sufficiently withstanding a load short due to the need for reducing the weight of the portable terminal. Such a protection circuit is required to be miniaturized because it is built in a container of a lithium ion battery, and a COB (Chip on Boar) using a lot of chip components is required.
d) Technology has been used to meet the demand for miniaturization. However, on the other hand, a power MOS in series with a lithium ion battery
Since the FET is connected, there is a need to make the on-resistance of the power MOSFET extremely small, which is an indispensable factor for a mobile phone to increase the talk time and the standby time.

[0003] For this reason, in the production of chips, developments have been made to increase the cell density by fine processing. Specifically, in the planar structure in which the channel is formed on the surface of the semiconductor substrate, the cell density is 7.4 million cells / square inch, but in the first generation of the trench structure in which the channel is formed on the side surface of the trench, the cell density is 2500. Significantly improved to 10,000 pieces per square inch. Furthermore, in the second generation of the trench structure,
The cell density could be increased to 72 million cells / square inch by miniaturization.

With reference to FIGS. 11 to 15, a manufacturing process of a conventional N-channel power MOSFET having a trench structure will be described.

In FIG. 11, an N ⁺ type silicon semiconductor substrate 2
A drain region 22 is formed by laminating an N ⁻ -type epitaxial layer on 1. After boron is selectively implanted into the intended channel layer 24, it is diffused to form a P-type channel layer 24.

An NSG (Non-d)
Then, a CVD oxide film 25 of an opto-silicate glass is formed, and after forming a mask, the film is partially removed by dry etching to form a trench opening 26 where the channel layer 24 is exposed.

Using the CVD oxide film 25 as a mask, the silicon semiconductor substrate in the trench opening 26 is
Anisotropic dry etching with a system gas, channel layer 2
4 through the trench 27 reaching the drain region 22
To form

In FIG. 12, dummy oxidation is performed to form trench 27.
An oxide film (not shown) is formed on the inner wall and the surface of the CVD oxide film 25, and thereafter, the oxide film and the CVD oxide film 25 are removed by etching. The reason for performing the dummy oxidation is to remove the etching damage at the time of dry etching and to form a gate oxide film later stably. Further, the trench opening 26 is rounded by thermal oxidation at a high temperature, and there is also an effect of avoiding electric field concentration in the trench opening 26. Thus, a trench 27 is formed.

In FIG. 13, a gate oxide film 31 is formed by thermally oxidizing the entire surface. Thereafter, a gate electrode 33 buried in the trench 27 is formed. That is, a non-doped polysilicon layer is attached to the entire surface, and phosphorus is injected and diffused at a high concentration to achieve high conductivity. Thereafter, the polysilicon layer deposited on the entire surface is dry-etched without a mask to form a trench 2
7, a gate electrode 33 buried in the gate electrode 7.

In FIG. 14, boron ions are selectively implanted using a mask made of a resist film PR to form a P ⁺ type body contact region 34, and then the resist film PR is removed.

Further, arsenic is ion-implanted by masking a new resist film PR so as to expose the intended source region 35 and gate electrode 33, and the N ⁺ type source region 35 is formed in a channel layer adjacent to the trench 27. After the formation on the surface 24, the resist film PR is removed.

In FIG. 15, after an NSG layer is formed on the entire surface,
PSG (Boron Phosphorus Sili)
(Cate Glass) layer is deposited by a CVD method,
An interlayer insulating film 36 is formed. Thereafter, the interlayer insulating film 36 is formed on at least the gate electrode 33 using the resist film as a mask.
Leave. After that, aluminum is adhered to the entire surface by a sputtering apparatus, so that the source region 35 and the body contact region 3 are formed.
4 is formed.

Referring to FIG. 15, an N-channel type power MOSFET is shown as an example of a conventional power MOSFET having a trench structure.

On the N ⁺ type silicon semiconductor substrate 21, N ⁻
A drain region 22 made of a p-type epitaxial layer is provided, and a p-type channel layer 24 is provided on the surface thereof. A trench 27 penetrating through the channel layer 24 and reaching the drain region 22 is provided.
1 and a gate electrode 33 made of polysilicon filled in the trench 27 is provided. An N ⁺ type source region 35 is formed on the surface of the channel layer 24 adjacent to the trench 27, and a P ⁺ type body contact region 34 is formed on the surface of the channel layer 24 between the source regions 35 of two adjacent cells.
Is provided. Further, a channel region (not shown) is formed in the channel layer 24 from the source region 35 along the trench 27. The gate electrode 33 is covered with an interlayer insulating film 36,
A source electrode 37 that contacts the source region 35 and the body contact region 34 is provided.

[0015]

The conventional power M
In the method of manufacturing an OSFET, a mask is frequently used in each manufacturing process. In particular, since there are many types of power MOSFETs, reduction of the mask is desired in order to reduce cost.

Further, since the gate oxide film and the interlayer insulating film extending over the trench opening cover a part of the source region,
The contact area between the source region and the source electrode is small, which has been a major factor in reducing the contact resistance. Since the contact resistance is directly related to the on-resistance, its reduction is desired. At present, the on-resistance is reduced by increasing the cell density, but as the miniaturization progresses to increase the cell density, the source region becomes smaller and the contact area with the source electrode cannot be increased. There is a problem that the resistance increases and the on-resistance increases.

[0017]

SUMMARY OF THE INVENTION The present invention has been made in consideration of the above problems, and has been made in view of the above-mentioned circumstances, and includes a step of forming a channel layer of an opposite conductivity type on a surface of a semiconductor substrate of one conductivity type; Forming a trench to be formed;
Forming a gate insulating film on at least the channel layer of the trench, forming a gate electrode made of a semiconductor material embedded in the trench, and forming a first gate electrode on a surface of the channel layer between adjacent trenches. Forming a source region, forming an interlayer insulating film on at least the gate electrode, and forming a body contact region of the opposite conductivity type on the channel layer surface between the adjacent interlayer insulating films; Polysilicon is deposited on the entire surface and etched back to form a sidewall on the side surface of the interlayer insulating film. After introducing one conductivity type impurity on the entire surface, it is diffused into the sidewall and the surface of the channel layer to form a second source region. And forming a source electrode in contact with the sidewall and the second source region. It features a, it is possible to form the source regions and the body contact region by self-alignment, the mask can be reduced, it can realize significant cost savings.

Further, since the side wall can be used as a source region, a contact area with the source electrode can be increased on the side surface of the side wall, so that it is possible to provide a method of manufacturing an insulated gate semiconductor device capable of reducing on-resistance.

[0019]

DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment of the present invention will be described with reference to FIGS. 1 to 10 by taking an N-channel trench MOSFET as an example.

In the trench power MOSFET, a step of forming a channel layer of the opposite conductivity type on the surface of the semiconductor substrate of one conductivity type, a step of forming a trench penetrating the channel layer and reaching the semiconductor substrate, Forming a gate insulating film on the layer, forming a gate electrode made of a semiconductor material buried in the trench, forming a first source region on a channel layer surface between adjacent trenches, A step of forming an interlayer insulating film on the gate electrode; a step of forming a body contact region of the opposite conductivity type on the surface of the channel layer between the adjacent interlayer insulating films; After forming a sidewall on the side surface of the insulating film and introducing an impurity of one conductivity type over the entire surface, the sidewall and the surface of the channel layer are formed. Composed of a step of forming a step of forming a second source region are diffused, the source electrode in contact with the side wall and the second source region.

In the first step of the present invention, as shown in FIG.
An object is to form an opposite conductivity type channel layer on the surface of a semiconductor substrate of one conductivity type.

A drain region 2 is formed by laminating an N ⁻ type epitaxial layer on an N ⁺ type silicon semiconductor substrate 1. After boron is selectively implanted into the intended channel layer 4, it is diffused to form a P-type channel layer 4.

In the second step of the present invention, as shown in FIG.
It is to form a trench that penetrates a channel layer and reaches a semiconductor substrate.

An NSG (Non-d)
An oxide silicide glass (CVD) film 5 is formed and partially removed by dry etching to form a trench opening 6 exposing the channel layer 4.

Using the CVD oxide film 5 as a mask, the silicon semiconductor substrate in the trench opening 6 is anisotropically dry-etched with a CF-based gas and an HBr-based gas to form a trench 7 penetrating through the channel layer 4 and reaching the drain region 2. .

In the third step of the present invention, as shown in FIG.
It is to form a gate insulating film at least on the channel layer of the trench.

After dummy oxidation, the inner wall of the trench 7 is
An oxide film (not shown) is formed on the surface of the oxide film 5, and thereafter,
The oxide film and the CVD oxide film 5 are removed by etching.
The reason for performing the dummy oxidation is to remove the etching damage at the time of dry etching and to form a gate oxide film later stably. Also, the trench opening 6 is rounded by thermal oxidation at a high temperature,
This also has the effect of avoiding electric field concentration at the surface.

Thereafter, the entire surface is thermally oxidized to form a gate oxide film 11 having a thickness of several hundred Å on at least the channel layer on the inner wall of the trench 7.

In the fourth step of the present invention, as shown in FIG.
It is to form a gate electrode made of a semiconductor material to be buried in a trench.

A non-doped polysilicon layer is attached to the entire surface, and N ⁺ -type impurities such as phosphorus are implanted and diffused at a high concentration to achieve high conductivity. Thereafter, the polysilicon layer adhered to the entire surface is dry-etched without a mask to form a gate electrode 13 buried in the trench 7.

In the fifth step of the present invention, as shown in FIG.
The first source region is formed on the surface of the channel layer between the adjacent trenches.

Arsenic is ion-implanted and diffused over the entire surface without a mask to form a first source region 12 on the surface of the channel layer 4. At this time, the impurity concentration is about 2 × 10 ¹⁵ cm ⁻² . Thereby, the channel layer 4 between the adjacent trenches 7 is formed.
The surface becomes the first source region 12. In addition, N ⁺ -type impurities are also introduced into the gate electrode 13 by ion implantation over the entire surface, but there is no effect since the impurity is of the same type as the impurity diffused in order to increase the conductivity of the gate electrode 13. .

In the sixth step of the present invention, as shown in FIG.
An object is to form an interlayer insulating film at least on a gate electrode.

On the entire surface, the NSG layer 16a and the BPSG layer 1
Deposit 6b silicate glass layer. N with high pressure resistance
After depositing the SG layer 16a at 1000 °, the BPSG layer 16b is deposited at 4000 ° in order to suppress the parasitic capacitance between the gate and the source. Further, a nitride film 16 is formed on these silicate glass layers.
Deposit c by 1000 mm.

Conventionally, since only an oxide film such as a BPSG layer is used as an interlayer insulating film, it is contaminated during ion implantation in each manufacturing process and during sputtering of a metal such as a source electrode. As a result, a leak current is generated between the gate and the source. May occur. Thus, by depositing a nitride film 16c having a high ion blocking effect on the BPSG layer 16b, contamination of the interlayer insulating film 16 can be prevented, and a leak current can be reduced.

Further, a resist mask is formed, and the interlayer insulating film 16 is partially removed by etching.
An interlayer insulating film 16 covering at least the gate electrode 13 is formed. At this time, in order to prevent the gate electrode 13 from being exposed due to misalignment of the mask, the etching is performed so that the interlayer insulating film 16 and the gate oxide film 11 remain in the trench opening 6.

In the seventh step of the present invention, as shown in FIG.
An object is to form a body contact region of a reverse conductivity type on the surface of a channel layer between adjacent interlayer insulating films.

Using the interlayer insulating film 16 as a mask, a P ⁺ -type impurity such as boron is introduced into the entire surface to form the first source region 12.
The body contact region 14 is formed in the exposed portion. At this time, in order to invert the exposed N ⁺ type region of the first source region 12 to the P ⁺ type region, the impurity concentration is 7 × 1.
The impurity concentration is set at about ¹⁵ cm ^−2, which is higher than the conventional concentration. By this step, body contact region 14 can be formed in a self-aligned manner on the surface of channel layer 4 between adjacent interlayer insulating films 16.

In the eighth step of the present invention, as shown in FIGS. 8 and 9, polysilicon is deposited on the entire surface and then etched back to form sidewalls on the side surfaces of the interlayer insulating film. Is introduced, and then diffused into the side wall and the surface of the channel layer to form a second source region.

This step is a characteristic step of the present invention.
In FIG. 8, non-doped polysilicon is deposited on the entire surface to a thickness of 2000 °, and then etched back. As a result, a side wall 17 reaching the semiconductor substrate along the side surface of the interlayer insulating film 16 is formed.

In FIG. 9, an NSG layer 18 is deposited on the entire surface at 6000.degree., Etched back until the upper portion of the side wall 17 is exposed, and arsenic, which is an N.sup. ⁺ Type impurity, is ion-implanted on the entire surface using the NSG layer 18 as a mask. At this time, the impurity concentration is higher than that of the P ⁺ -type impurity in which the body contact region 14 is formed, and is about 9 × 10 ¹⁵ cm ⁻² . After that, N ⁺ -type impurities are diffused into the side wall 17 and the surface of the channel layer 4.

As a result, arsenic having a higher concentration than the N ⁺ -type and P ⁺ -type impurities diffused in the previous steps is diffused again on the surface of the channel layer 4 in contact with the side wall 17. That is, the P ⁺ -type region immediately below the sidewall 17 on the outer periphery of the body contact region 14 is inverted to the N ⁺ -type region to form the second source region 15. Since the diffusion also spreads in the horizontal direction, the second source region 15 is integrated with the first source region 12 adjacent to the trench 7 and is exposed from the side surface of the sidewall 17 so that it can contact a source electrode formed later.

Therefore, the first source region 12 adjacent to the trench 7 and the second source region 15 and the body contact region 14 which are in contact with the source electrode can be formed in a self-aligned manner.

Furthermore, since the N ⁺ -type impurities are diffused in the side walls 17, they can be used as source regions.
In this aspect, a contact area with a source electrode formed in a later step can be significantly increased. As a result, the contact resistance can be significantly reduced, which can greatly contribute to the reduction of the on-resistance.

The ninth step of the present invention is to form a source electrode in contact with the sidewall and the second source region as shown in FIG.

The NSG layer 18 is removed by wet etching, a titanium nitride film serving as a barrier metal layer 19a is formed, and tungsten 19b is deposited by a CVD method. Thereafter, aluminum 19c is sputtered to form source electrode 19 in contact with sidewall 17 and second source region 15.

In the case of a miniaturized cell as in the embodiment of the present invention, since the interval between adjacent trenches is very small, if aluminum is directly sputtered on a thick interlayer insulating film, the step coverage is large, and Voids are likely to occur in the electrode film formation part.

Further, there is a case where the aluminum wiring is disconnected due to the stress of the interlayer insulating film and stress migration occurs.

Therefore, a barrier metal is sputtered so that the metal can easily enter a fine portion, and tungsten with good stress migration resistance and good coatability is formed by a CVD method.

As a result, the metal enters the fine portions, so that the generation of voids can be suppressed and the disconnection of the aluminum wiring can be prevented.

The structure of the power MOSFET of the present invention will be described with reference to the sectional view shown in FIG.

The trench type power MOSFET includes a semiconductor substrate, a channel layer, a trench, a gate oxide film,
It is composed of a gate electrode, a source region, an interlayer insulating film, a sidewall, and a metal electrode.

The semiconductor substrate is formed as a drain region 2 by laminating an N ⁻ type epitaxial layer on an N ⁺ type silicon semiconductor substrate 1.

The channel layer 4 is formed to be shallower than the depth of the trench 7 by selectively diffusing P-type boron into the surface of the drain region 2. A channel region (not shown) is formed in a region of the channel layer 4 adjacent to the trench 7.

The trench 7 is formed by anisotropic dry etching of the semiconductor substrate, and penetrates the channel layer 4 to reach the drain region 2. Generally, trenches 7 are formed in a lattice or stripe shape on a semiconductor substrate. A gate oxide film 11 is provided on the inner wall of the trench 7, and the gate electrode 1
3 is buried with polysilicon.

Gate oxide film 11 is formed at least on the inner wall of trench 7 in contact with channel layer 4 to have a thickness of several hundreds of mm. Since the gate oxide film 11 is an insulating film, the trench 7
It has a MOS structure sandwiched between a gate electrode 13 provided therein and a semiconductor substrate.

In the embodiment of the present invention, the gate oxide film 11 also remains on the surface of the semiconductor substrate in the trench opening 6 in order to take account of mask misalignment in forming the contact hole.

The gate electrode 13 is made of polysilicon buried in the trench 7, and a P-type impurity is introduced into the polysilicon to reduce the resistance. The gate electrode 13 extends to a gate connection electrode (not shown) surrounding the periphery of the semiconductor substrate, and is connected to a gate pad electrode (not shown) provided on the semiconductor substrate.

The first source region 12 is formed by diffusing N ⁺ -type impurities on the surface of the channel layer 4 adjacent to the trench 7. Most of the first source region 12 has an interlayer insulating film 16 and a gate oxide film 11 which spread over the trench opening 6.
Covered in.

The second source region 15 is formed on the side wall 1
It is formed by diffusing N ⁺ -type impurities on the surface of the channel layer 4 immediately below 7. The trench 7 side of the second source region 15 is integrated with the first source region 12, and the body contact region 14 side is exposed from a side surface of the sidewall 17 and contacts the source electrode 19.

The body contact region 14 is formed by diffusing P ⁺ -type impurities on the surface of the channel layer 4 between the adjacent second source regions 15 in order to stabilize the potential of the substrate.

The interlayer insulating film 16 is made of an NSG layer 16a, BP
The silicate glass layer of the SG layer 16b and the nitride film 16c are formed so as to cover at least the gate electrode 13, and a part thereof is left in the trench opening 6.

The sidewall 17 is formed on the side surface of the interlayer insulating film 16 along the thickness direction of the interlayer insulating film 16.
Its height and width are each 2000 °, and the side surface of sidewall 17 is located on the inner side (trench 7 side) of the boundary between second source region 15 and body contact region 14. In addition, since it is in contact with the second source region 15 and the source electrode 19 and N ⁺ -type impurities are introduced,
This sidewall 17 can be used as a source region.

The source electrode 19 is formed by forming a barrier metal layer 19a of titanium nitride or the like and then forming a tungsten 19b.
Is formed, and then aluminum 19c is sputtered and etched into a desired shape.

[0065]

According to the present invention, first, the first and second source regions and the body contact region can be formed in a self-aligned manner. After forming the first source region on the entire surface, a body contact region is formed using the interlayer insulating film as a mask, and N ⁺ -type impurities are again diffused from sidewalls provided in the interlayer insulating film, thereby integrating with the first source region. In addition, a second source region that contacts the source electrode can be formed.

That is, the number of masks for forming the source region and the body contact region can be reduced, so that the cost can be significantly reduced.

Further, since the alignment margin of the source region and the body contact region is ± 0, an improvement in cell density can be expected.

Second, since the side wall made of polysilicon doped with the same type of impurity as the source region can be used as the source region, a contact area with the source electrode can be obtained on the side wall of the side wall, so that the contact resistance can be reduced. This has the advantage that the on-resistance is reduced.

In other words, the on-resistance of the cell itself can be reduced. More specifically, the contact resistance can be reduced to about 1/3 as compared with the conventional trench power MOSFET of the same rule. This can also contribute significantly to a reduction in on-resistance.

Third, by the nitride film provided on the uppermost layer of the interlayer insulating film, process contamination such as ion implantation and external contamination when sputtering metal such as a source electrode can be suppressed, and a leakage current between the gate and the source can be reduced. Can be reduced.

Fourth, by using a barrier metal layer and tungsten for the metal wiring of the source electrode, voids that are likely to be generated in the metal wiring layer between fine cells can be reduced, and stress migration can be suppressed. Can be prevented.

[Brief description of the drawings]

FIG. 1 is a cross-sectional view illustrating a method for manufacturing an insulated gate semiconductor device of the present invention.

FIG. 2 is a cross-sectional view illustrating a method for manufacturing an insulated gate semiconductor device of the present invention.

FIG. 3 is a cross-sectional view illustrating the method of manufacturing the insulated gate semiconductor device of the present invention.

FIG. 4 is a cross-sectional view illustrating the method of manufacturing the insulated gate semiconductor device of the present invention.

FIG. 5 is a cross-sectional view illustrating the method of manufacturing the insulated gate semiconductor device of the present invention.

FIG. 6 is a sectional view illustrating the method of manufacturing the insulated gate semiconductor device of the present invention.

FIG. 7 is a sectional view illustrating the method of manufacturing the insulated gate semiconductor device of the present invention.

FIG. 8 is a cross-sectional view for explaining the method for manufacturing the insulated gate semiconductor device of the present invention.

FIG. 9 is a cross-sectional view illustrating the method of manufacturing the insulated gate semiconductor device of the present invention.

FIG. 10 is a cross-sectional view illustrating the insulated gate semiconductor device of the present invention and a method for manufacturing the same.

FIG. 11 is a cross-sectional view illustrating a method of manufacturing a conventional insulated gate semiconductor device.

FIG. 12 is a cross-sectional view illustrating a method for manufacturing a conventional insulated gate semiconductor device.

FIG. 13 is a cross-sectional view illustrating a method for manufacturing a conventional insulated gate semiconductor device.

FIG. 14 is a cross-sectional view illustrating a method for manufacturing a conventional insulated gate semiconductor device.

FIG. 15 is a sectional view illustrating a method for manufacturing a conventional insulated gate semiconductor device.

Claims (6)

[Claims] A step of forming a channel layer of the opposite conductivity type on the surface of the semiconductor substrate of one conductivity type; a step of forming a trench penetrating the channel layer and reaching the semiconductor substrate; and at least the channel of the trench Forming a gate insulating film on a layer; forming a gate electrode made of a semiconductor material embedded in the trench; forming a first gate electrode on a surface of the channel layer between adjacent trenches;
Forming a source region; forming an interlayer insulating film on at least the gate electrode; forming a body contact region of the opposite conductivity type on the surface of the channel layer between the adjacent interlayer insulating films; Polysilicon is deposited on the entire surface and etched back to form a sidewall on the side surface of the interlayer insulating film. After introducing one conductivity type impurity on the entire surface, it is diffused into the sidewall and the surface of the channel layer to form a second source region. And forming a source electrode in contact with the sidewall and the second source region. 2. a step of forming a channel layer of the opposite conductivity type on the surface of the semiconductor substrate of one conductivity type; a step of forming a trench penetrating the channel layer and reaching the semiconductor substrate; and at least the channel of the trench Forming a gate insulating film on the layer, forming a gate electrode made of a semiconductor material embedded in the trench, introducing a one-conductivity-type impurity over the entire surface, and forming the surface of the channel layer between the adjacent trenches Forming a first source region on at least the gate electrode; forming a first interlayer insulating film and a second interlayer insulating film on at least the gate electrode; adjoining using the first and second interlayer insulating films as a mask Forming a body contact region of the opposite conductivity type on the surface of the channel layer between the interlayer insulating films; and Sidewalls are formed on the side surfaces of the first and second interlayer insulating films, and impurities of one conductivity type are introduced into the entire surface, and then diffused into the surface of the channel layer adjacent to the sidewalls and the first source region to form a second side wall. A method of manufacturing an insulated gate semiconductor device, comprising: forming a source region; and forming a source electrode in contact with the sidewall and the second source region. 3. The method according to claim 1, wherein the first and second source regions and the body contact region are formed in a self-aligned manner. 4. The semiconductor device according to claim 1, wherein an impurity concentration diffused into said sidewall is higher than an impurity concentration forming said first source region and an impurity concentration forming said body contact region. 3. The method for manufacturing an insulated gate semiconductor device according to claim 1. 5. The insulated gate semiconductor device according to claim 2, wherein said first interlayer insulating film is formed of a silicate glass layer, and said second interlayer insulating film is formed of a nitride film. Manufacturing method. 6. The method according to claim 2, wherein the source electrode is formed by stacking three layers of a barrier metal layer, tungsten, and aluminum.