JP2002151460A - Liquid processing system - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a liquid processing system in which maintainability is enhanced at a liquid processing section. SOLUTION: The liquid processing system 1 comprises a tubular processing chamber 26, and a mechanism disposed in the processing chamber 26 and liquid processing an article, e.g. a wafer W held rotatably, while rotating by supplying a specific processing liquid thereto. The liquid processing mechanism can be accessed from two direction, i.e., side face direction and front face direction, of the processing chamber 26.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention
The present invention relates to a liquid processing apparatus used for performing predetermined liquid processing and drying processing on various substrates such as a CD substrate.

[0002]

2. Description of the Related Art For example, in a semiconductor device manufacturing process, a semiconductor wafer (hereinafter, referred to as a "wafer") as a substrate is washed with a predetermined chemical solution or a cleaning solution such as pure water.
Contaminants such as particles, organic contaminants, and metal impurities are removed from the wafer, and droplets are removed from the wafer by an inert gas such as nitrogen (N2) gas or a highly volatile and hydrophilic IPA vapor. Is used for drying the wafer. As such a wafer cleaning apparatus, there is known an apparatus that accommodates a plurality of wafers in a wafer cleaning / drying chamber and performs batch processing.

For example, in the wafer cleaning apparatus described in US Pat. Nos. 5,784,797 and 5,678,320, the front side of the wafer cleaning chamber (the surface facing the wafer transfer arm when the wafer transfer arm moves) is provided. The wafer chuck of the wafer transfer arm is moved into the wafer cleaning chamber from the front side of the wafer cleaning chamber (front side of the rotor) via the loading / unloading port provided, and the wafer gripped by the wafer chuck is transferred to the rotor, There is disclosed a wafer cleaning mechanism configured to receive a wafer held by a rotor by a wafer chuck.

Here, it is necessary to periodically perform maintenance on the wafer cleaning mechanism. If the wafer is damaged or the processing liquid leaks during the cleaning processing, the cleaning processing is interrupted. It is necessary to perform operations such as cleaning and restoration of the wafer cleaning mechanism. For this reason, it is preferable that the cleaning apparatus has a structure that allows easy access to the wafer cleaning mechanism.

[0005]

However, in the wafer cleaning mechanism disclosed in the above-mentioned U.S. Pat. Nos. 5,784,797 and 5,678,320, when the rotor is to be attached or detached for maintenance or the like, the cleaning chamber needs to be removed. There was a problem that workability was poor because access was possible only from the front.

The present invention has been made in view of the above circumstances, and provides a liquid processing apparatus in which access to a liquid processing mechanism for performing liquid processing of an object to be processed is facilitated and maintenance is improved. The purpose is to do.

[0007]

That is, the present invention provides the first aspect.
As an invention, a cylindrical processing chamber and a liquid processing mechanism for supplying a predetermined processing liquid to the processing object while rotating the processing object rotatably held in the processing chamber and performing the liquid processing are performed. And a liquid processing apparatus, wherein the liquid processing mechanism is accessible from at least a side.

According to a second aspect of the present invention, a predetermined processing liquid is supplied to a processing object while rotating a processing object provided in the processing chamber and having a cylindrical shape, and rotatably held in the processing chamber. And a liquid processing mechanism for performing liquid processing.
A liquid processing apparatus is provided, wherein the liquid processing mechanism is accessible from two directions, a side surface and a front surface.

According to a third aspect of the present invention, there is provided a liquid processing apparatus for performing a liquid processing by supplying a predetermined processing liquid to a processing object while rotating the processing object rotatably held, and comprising a cylindrical shape. A liquid processing apparatus comprising: a processing chamber; and a liquid processing mechanism provided in the processing chamber and configured to supply a predetermined processing liquid to the processing object while rotating the processing object held rotatably to perform the liquid processing. Unit, a container loading / unloading unit for loading / unloading a container capable of storing the workpiece, a transport mechanism for transporting the workpiece between the container loading / unloading unit and the liquid processing unit, and a container loading / unloading unit. A liquid processing apparatus, comprising: a discharge part and a wall part separating the liquid processing part, wherein the liquid processing mechanism is accessible at least from a side of the processing chamber.

According to a fourth aspect of the present invention, there is provided a liquid processing apparatus for performing a liquid processing by supplying a predetermined processing liquid to a target object while rotating the target object rotatably held, and comprising a cylindrical member. A liquid processing apparatus comprising: a processing chamber; and a liquid processing mechanism provided in the processing chamber and configured to supply a predetermined processing liquid to the processing object while rotating the processing object held rotatably to perform the liquid processing. Unit, a container loading / unloading unit for loading / unloading a container capable of storing the workpiece, a transport mechanism for transporting the workpiece between the container loading / unloading unit and the liquid processing unit, and a container loading / unloading unit. A detachable side wall panel for partitioning between the outlet section and the liquid processing section, wherein the container is loaded into the liquid processing mechanism by removing a side direction of the processing chamber and the detachable side wall panel. Accessible from the exit Liquid processing apparatus according to claim to provide.

According to a fifth aspect of the present invention, there is provided a liquid processing apparatus for performing a liquid processing by supplying a predetermined processing liquid to an object to be processed while rotating an object to be processed rotatably. A cylindrical processing chamber slidable in a horizontal direction between the retreat position and a predetermined processing liquid supplied to the processing object while rotating the processing object provided in the processing chamber and rotatably held; A liquid processing unit having a liquid processing mechanism for performing liquid processing, and a processing unit provided below the liquid processing unit and delivering the processing object to and from the liquid processing mechanism by driving in a vertical direction. A liquid delivery device provided with a body delivery mechanism, wherein the solution processing mechanism is accessible from at least a side of the processing chamber.

According to a sixth aspect of the present invention, there is provided a liquid processing apparatus for performing a liquid processing by supplying a predetermined processing liquid to an object to be processed while rotating the object to be processed rotatably. A cylindrical processing chamber slidable in a horizontal direction between the retreat position and a predetermined processing liquid supplied to the processing object while rotating the processing object provided in the processing chamber and rotatably held; A liquid processing unit having a liquid processing mechanism for performing liquid processing, a lid body capable of opening and closing a front surface of the processing chamber, and a liquid processing mechanism provided below the liquid processing unit and driven in a vertical direction. And a processing object delivery unit provided with a processing object delivery mechanism for delivering the processing object between the processing chamber and the liquid processing mechanism. Of the processing chamber opened by retreating Liquid processing apparatus, characterized in that the surface direction is accessible, provide.

According to a seventh aspect of the present invention, there is provided a liquid processing apparatus for performing a liquid processing by supplying a predetermined processing liquid to an object to be processed while rotating the object to be processed rotatably, wherein the processing position and A cylindrical processing chamber slidable in a horizontal direction between the retreat position and a predetermined processing liquid supplied to the processing object while rotating the processing object provided in the processing chamber and rotatably held; A liquid processing unit having a liquid processing mechanism for performing liquid processing, and a processing unit provided below the liquid processing unit and delivering the processing object to and from the liquid processing mechanism by driving in a vertical direction. A body delivery unit provided with a body delivery mechanism, a container loading / unloading unit for loading / unloading a container capable of storing the workpiece, and a container loading / unloading unit between the workpiece delivery unit and the container loading / unloading unit. Position, the container can be placed, and the A container relay unit provided with a first container transfer mechanism that transfers the container at a second position, and a second container transfer mechanism that transfers the container between the container relay unit and the container loading / unloading unit. A liquid processing apparatus is provided, wherein the liquid processing mechanism is accessible at least from a side of the processing chamber.

According to an eighth aspect of the present invention, there is provided a liquid processing apparatus for performing a liquid processing by supplying a predetermined processing liquid to a processing object while rotating the processing object held rotatably, Holding means for holding a body, housing the holding means,
Having a double structure consisting of a cylindrical outer chamber and an inner chamber, a processing chamber slidable horizontally between a processing position and a retracted position, and disposed in each of the outer chamber and the inner chamber; A liquid processing unit having a processing liquid supply mechanism that supplies a predetermined processing liquid to the object to be processed held by the holding unit; a casing that houses the liquid processing unit; and a casing provided below the liquid processing unit. An object delivery unit provided with an object delivery mechanism for delivering the object to and from the liquid processing unit by driving in a vertical direction,
A container loading / unloading section for loading / unloading a container capable of storing the processing object, and a container located between the processing object delivery section and the container loading / unloading section, and a container between the processing object delivery section A container relay unit provided with a first container transport mechanism that performs delivery of a container, and a second container transport mechanism that transports containers between the container relay unit and the container loading / unloading unit, The casing has a detachable first side wall panel facing a side surface of the processing chamber, and a detachable second side wall panel separating the liquid processing section and the container loading / unloading section. , The liquid processing apparatus is accessible from the direction of the first side wall panel and the direction of the second side wall panel.

In such a liquid processing apparatus of the present invention, an operator or a cleaning machine can access the liquid processing mechanism or the liquid processing section from at least a side surface during maintenance such as failure of the liquid processing mechanism or cleaning. In addition, since the workability can be improved from the front side as needed, the workability is improved, the work time is shortened, and it is possible to carefully perform the treatment of the inner part and details.

Further, in the liquid processing apparatus of the present invention, the worker, the cleaning machine, and the like are required to prevent the processing liquid from leaking into the casing from the processing chamber during the liquid processing, or to damage the workpiece during rotation. In the event of an accident or during regular maintenance, the inside of the casing can be accessed from at least the side, and if necessary, from the front, so that the casing floor The workability such as cleaning is improved, the work time is shortened, the work can be performed safely, and it is possible to carefully perform the treatment of the inner part and details. Thus, the environment inside the casing can be maintained well. This means
As a result, the amount of particles and the like adhered to the object to be processed is reduced, and the quality is improved. In addition, such workability | operativity becomes higher by using a slide type chamber.

[0017]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, a liquid processing apparatus of the present invention will be specifically described with reference to the accompanying drawings, taking a semiconductor wafer (wafer) cleaning processing apparatus as an embodiment thereof as an example. .

FIG. 1 is a perspective view of a cleaning apparatus 1, and FIG. 2 is a plan view thereof. As shown in FIGS. 1 and 2, the cleaning apparatus 1 includes an in / out port (container loading / unloading unit) 2 for loading / unloading a carrier C, which is a container capable of storing a wafer W, and a wafer W A cleaning processing unit (cleaning processing chamber) 3 for performing cleaning processing, and a wafer transfer unit 9 (not shown in FIGS. 1 and 2) provided below and separately from the cleaning processing unit 3 below the cleaning processing unit 3. And a carrier relay unit 4 provided between the wafer transfer unit 9 and the in / out port 2 for carrying the carrier C in and out of the wafer transfer unit 9.

The cleaning apparatus 1 includes a carrier cleaning unit 5 for cleaning the carrier C, a carrier stock unit 6 for stocking a plurality of carriers C, a power supply unit 7, and a predetermined liquid supply to the cleaning unit 3. A chemical tank box 8 storing a processing liquid is provided.

The in / out port 2 is movable along a mounting table 10 on which four carriers C can be mounted and a transport path 11 formed along the direction in which the carriers C are arranged.
The carrier C of the mounting table 10 is transported to the carrier relay section 4,
Conversely, it has a first carrier transport mechanism 12 for transporting the carrier C placed on the carrier relay section 4 to the mounting table 10. In the carrier C, for example, 26 wafers W can be stored, and the carrier C is mounted on the mounting table 10 such that the surface of the wafer W is vertically arranged.

The carrier cleaning unit 5 has a carrier cleaning tank 16, and the empty carrier C from which the wafer W is taken out in the wafer transfer section 9 is transferred to the first carrier transport mechanism 12 and a second carrier transport mechanism to be described later. 17 to be conveyed and washed.

Further, the carrier stock unit 6 temporarily holds the carrier C containing the unwashed wafer W or the empty carrier C from which the unwashed wafer W has been taken out, or the wafer C after the washing. This is for waiting in advance for an empty carrier C for storing W, and a plurality of carriers C can be stocked in the vertical direction. The carrier stock unit 6 has a built-in carrier moving mechanism for mounting a predetermined carrier C in the carrier stock unit 6 on the mounting table 10 and stocking the carrier C at a predetermined position therein. .

Next, the carrier relay section 4, the wafer transfer section 9, and the cleaning unit 3 will be described with reference to FIGS. Here, as the processing chamber 26 disposed in the cleaning processing unit 3, a double-structured chamber including an outer chamber 26a and an inner chamber 26b that can be housed in the outer chamber 26a is used as an example.

FIG. 3 is a sectional view showing the arrangement of the carrier relay section 4, the wafer transfer section 9, and the cleaning unit 3.
5 is a cross-sectional view showing the configuration of the processing chamber 26 provided in the cleaning processing unit 3, and FIG. 4 is a state in which the inner chamber 26b is put out of the outer chamber 26a (the inner chamber 26b in such a state). Is referred to as a “retreat position”), and FIG.
3A shows a state in which the inner chamber 26b is disposed inside (a position of the inner chamber 26b in such a state is referred to as a “processing position”). In FIG. 3, both the outer chamber 26a and the inner chamber 26b are shown. The state at the evacuation position is shown.

The carrier relay section 4 is provided with a stage 13 on which the second carrier transport mechanism 1 is mounted.
7 are provided. The second carrier transport mechanism 17 has an arm 17a that can place and hold the carrier C and that can move forward and backward with the wafer transfer unit 9 by a telescoping mechanism (not shown). A hole (not shown) is formed at the center so that a wafer holding member 41 to be described later and a support rod 42 for supporting the wafer holding member 41 can pass therethrough.

The carrier transport mechanism 17 includes an arm 1
It has a not-shown reversing mechanism that can change the direction of the carrier C placed on 7a by 180 °. The reversing mechanism rotates the carrier C on the mounting table 10 by rotating the carrier transport arm of the first carrier transport mechanism 12 to the arm 17.
a, the carrier C on the arm 17a
Is used to return the direction of the carrier C since the direction of the carrier C is opposite to the direction of the carrier C. The reversing mechanism is also used similarly when returning the carrier C from the arm 17a to the mounting table 10.

A partition wall 14 is provided between the carrier relay section 4 and the wafer transfer section 9, and the carrier C and the arm 17a pass through the partition wall 14 to carry in and out the carrier C and the arm 17a. Possible carrier transport port 1
4a is formed, and the carrier transport port 14a can be opened and closed by the lid 15 on the carrier relay section 4 side. The lid 15 is movable in the horizontal and vertical directions as indicated by an arrow S1 shown in FIG.
The partition wall 1 is moved via the sealing member 18 by a moving / pressing mechanism such as an air cylinder (not shown) for moving the partition wall 1 horizontally.
4, the carrier transport port 14a can be hermetically closed.

In the wafer transfer section 9, a wafer holding member 41 for holding the wafer W, a support rod 42 which is vertically disposed to support the wafer holding member 41, and lifts and lowers the wafer holding member 41 via the support rod 42. A wafer delivery mechanism 40 having an elevation drive mechanism (not shown) is provided.

For example, the transfer of the wafer W from the carrier relay unit 4 to the cleaning unit 3 is performed as follows. First, the carrier transfer port 14a is opened, and the arm 17a holding the carrier C in which the wafer W is stored is inserted to a predetermined position of the wafer transfer unit 9, and in this state, the wafer holding member 41 is raised and After the wafer W is held by the wafer holding member 41, a wafer transfer port 19 a, which will be described later, is opened, and the wafer holding member 41 is further pushed up to the cleaning processing unit 3 to hold the wafer W stored in the processing chamber 26. The wafer W is transferred to the barrel rotor 24. Next, the wafer holding member 41 is lowered to close the wafer transfer port 19a, and after confirming that the wafer holding member 41 has moved below the arm 17a, the arm 17a is contracted and returned to the carrier relay section 4. ,
Thereafter, the carrier transport port 14a is closed.

When the wafer holding member 41 holding the wafer W is moved up and down, the line sensor 44 may be excessively or deficient or damaged, the number of the wafers W may be obliquely held instead of being held vertically. The state of the wafer W is monitored, and if there is an abnormality, the processing is interrupted or an alarm is issued.

A partition wall 19 is provided between the cleaning unit 3 and the wafer transfer section 9, and a wafer transfer port 19 a is formed on the partition wall 19 so that the wafer W and the wafer holding member 41 can pass therethrough. Have been. Wafer transfer port 19
a can be opened and closed by a lid 21 that can move in the horizontal direction and the vertical direction as indicated by an arrow S2 shown in FIG. The lid 21 is movable in the horizontal direction and the vertical direction as indicated by an arrow S2 shown in FIG. 3, and a moving / pressing mechanism such as an air cylinder or the like (not shown) for moving the lid 21 in the vertical direction. Thus, the wafer transfer port 19a can be hermetically closed by being brought into close contact with the partition wall 19 via the sealing material 22.

By the way, as described above, the wafer transfer section 9 is provided below the cleaning processing unit 3, and the wafer W moves vertically between the cleaning processing unit 3 and the wafer transfer section 9. However, there is no limitation on the moving direction of the wafer W, and for example, the wafer W may be loaded into the cleaning unit 3 and unloaded from the cleaning unit 3 from the side (lateral) direction or the like. .

Next, the cleaning unit 3 will be described. The cleaning unit 3 is used, for example, to remove and clean a resist mask, a polymer layer that is an etching residue, and the like after the wafer W is etched. A hole 25a is formed in a partition wall 25 which is one of the outer walls of the cleaning processing unit 3, and a rotating shaft 23a is horizontally disposed so as to pass through the hole 25a.

A rotor 24 is mounted on the rotating shaft 23a inside the cleaning processing unit 3 and a motor 23 is mounted outside the cleaning processing unit 3, and the rotation of the motor 23 causes the rotor 24 to rotate. Is possible. Note that, for example, the motor 23
Can be fixed to the partition wall 25 using a motor fixing jig 23b.

The rotating shaft 23a is also provided with a cylindrical support tube 3.
The support cylinder 32 is attached to the second vertical wall 34. Support tube 32 and rotating shaft 23
a between the second vertical wall 34 and the tip of the support cylinder 32.
The structure is such that particles and the like generated in the gap between the rotation shaft 23a and the support cylinder 32 due to the rotation of the rotation shaft 23a are not diffused to the rotor 24 side.

A locking member 33 for locking the inner chamber 26b is provided on the motor 23 side of the support cylinder 32.
The locking member 33 is fixed to the partition wall 25. In this manner, the motor 23 is disposed so as to be separated from the room of the cleaning processing unit 3, so that particles generated in the motor 23 are prevented from entering the cleaning processing unit 3, whereby the cleaning processing unit 3 Pollution is suppressed.

As described above, by adopting a structure in which the inside of the cleaning processing unit 3 is hardly contaminated, it is possible to reduce the load of cleaning and maintenance in the cleaning processing unit 3.
Further, even when the processing liquid leaks from the processing chamber 26, the motor 23 is not affected by the processing liquid, so that the service life can be maintained long.

In the rotor 24, locking members 71a, 71b, 72a, 72b are arranged between the disks 70a, 70b, and a plurality of (for example, 26) wafers W which have been made vertical by the wafer holding members 73a, 73b. It has a structure that can be held inside it while being arranged in the horizontal direction. Disk 7
0b is attached to the rotating shaft 23a using, for example, four screws 76. When the motor 23 is rotated, the rotor 24 rotates together with the wafer W held therein via the rotating shaft 23a. Has become. The locking members 71a, 71b, 72a, 72b are, for example, screws 7
The discs 70a and 70b can be fixed using the 4a and 74b. 4 and 5, locking members 71b and 72b are respectively provided with locking members 7b.
1a and 72a, and the wafer holding member 7
3b is located on the back surface of the wafer holding member 73a.

The outer chamber 26a provided so as to surround the rotor 24 has a cylindrical member 61a and ring members 62a and 62b disposed on end surfaces of the cylindrical member 61a as constituent members. The body 61a is configured such that the outer diameter on the ring member 62a side is larger than the outer diameter on the ring member 62b side. The outer chamber 26a is slidably disposed between the retracted position shown in FIG. 3 and the processing position shown in FIG.

On the other hand, the inner chamber 26b is
and a substantially cylindrical tubular body 61b having a smaller outer diameter than a.
1b has ring members 67a and 67b disposed on the end surface thereof, and is slidably movable between the retracted position shown in FIGS. 3 and 4 and the processing position shown in FIG. I have. When the wafer W is loaded and unloaded, the outer chamber 26a and the inner chamber 26b are both located at the retracted position as shown in FIG.

When the outer chamber 26a is at the retreat position, the inner chamber 26b is normally not at the processing position, but is controlled to be at the retreat position. This is because of the configuration of the slide mechanism for holding and sliding the outer chamber 26a and the inner chamber 26b, and the inner chamber 2
This is because interference occurs due to the presence of the drainage pipe 65c disposed below the bottom 6b.

When the outer chamber 26a is in the processing position as shown in FIG.
The space between the frame member 31b and the ring member 62a, which are connected and fixed to the outer wall or the frame or the like of the cleaning processing unit 3, is sealed via a seal material 63a. 67a is sealed via the sealing material 63b. In addition, the sealing material 63a is provided on the frame member 31b,
b is provided on the ring member 62b.

As shown in FIG. 4, when the inner chamber 26b is at the retracted position, the space between the ring member 67a and the end face of the second vertical wall 34 is sealed via the sealing material 68a, and the ring member 67a and the ring The space between the member 62b and the member 62b is sealed via the sealing material 63b. Further, the space between the ring member 67b and the locking member 33 is sealed via the sealing material 68b. And the inner chamber 2
In the case where 6b is moved to the processing position, as shown in FIG. 5, there is a gap between the ring member 67a and a horizontally formed portion of the lid 31a which is one of the members constituting the first vertical wall 31. Sealing is performed via the sealing material 68a, and the space between the ring member 67b and the end face of the second vertical wall 34 is sealed by the sealing material 68a.
b, and the space between the ring member 67b and the ring member 62b is sealed via the sealing material 63b. Note that the sealing member 68a is
7a, and the sealing material 68b is provided on the ring member 67b.

As described above, the sealing materials 63a, 63b, 6
Since the portion where the ring member 62b and the like are arranged through the seal members 8a and 68b has a sealing structure, as shown in FIG. 4, when the outer chamber 26a is in the processing position and the inner chamber 26b is in the retracted position, Is the first vertical wall 3
1, second vertical wall 34, cylindrical body 61a, ring member 62a
The closed processing space 51 is formed by 62b and 67a. Further, as shown in FIG.
When both the inner chamber 26a and the inner chamber 26b are at the processing position, a closed processing space 52 is formed by the lid 31a, the second vertical wall 34, the cylindrical body 61b, and the ring members 67a and 67b.

A processing liquid discharge nozzle 54 having a large number of processing liquid discharge ports 53 disposed in a horizontal direction is mounted on the upper part of the cylindrical body 61a in a state housed in a nozzle case 57, and the processing liquid is discharged. The liquid discharge nozzle 54 is supplied with a processing liquid such as pure water, IPA, or various chemicals, or a dry gas such as N 2 gas from a processing liquid supply source such as the chemical tank box 8, and is held by the processing liquid discharge port 53 on the rotor 24. The liquid can be discharged toward the processed wafer W.

A processing liquid discharge nozzle 56 having a large number of processing liquid discharge ports 55 disposed in a horizontal direction is attached to the upper part of the cylindrical body 61b in a state housed in a nozzle case 58. The processing liquid discharge nozzle 56 is supplied with processing liquids such as various chemicals, pure water, and IPA from a processing liquid supply source such as the chemical tank box 8.
5 can be discharged toward the wafer W held by the rotor 24. These processing liquid discharge nozzles 54 and 56
Although only one is shown in each of FIGS. 3 to 5, it is also possible to arrange a plurality of each of them, and it is also necessary to provide them directly above the cylindrical bodies 61 a and 61 b. Absent.

The bottom of the cylindrical body 61a is formed in a slanted shape so that the first vertical wall 31 side becomes lower, and when the liquid processing is performed in the processing space 51 by the outer chamber 26a, the bottom of the cylindrical body 61a is discharged from the processing liquid discharge nozzle 54. Various processing liquids discharged into the processing space 51 are discharged to the outside through a hole 65a formed in a lower portion of the frame member 31b and a drain pipe 65b provided in communication with the hole 65a. Has become.

The outer chamber 2 is located below the cylindrical body 61a.
When the liquid 6a is slid between the processing position and the retracted position, even if liquid dripping occurs from inside the outer chamber 26a, the liquid receivers 64a and 64 can collect the liquid.
b is provided, thereby preventing the inside of the cleaning processing unit 3 from being contaminated by the dripping processing liquid. Since the dripping from the inside of the outer chamber 26a occurs on the side of the ring member 62a having a low height, the ring member 62a
a, the processing liquid collected in the liquid receiver 64a below the liquid receiver 6a.
4b, and is discharged from the drain. The discharge port of the processing liquid from the liquid receiver 64a (the right end of the liquid receiver 64a in FIG. 4) is always in the slidable range of the outer chamber 26a. 64b.

On the other hand, a groove 69 whose bottom is inclined is formed in the lower part of the cylindrical body 61b so as to protrude from the cylindrical body 61b, and the lower side of the groove 69 is formed below the ring member 67b. The drain port 66 is connected to the drain port 66, and the drain port 65 c is connected to the drain port 66. In this way, in the liquid processing in the processing space 52 by the inner chamber 26b, various processing liquids discharged from the processing liquid discharge nozzle 56 flow into the drain pipe 65c from the groove 69 through the drain port 66, and are discharged. It has become.

The lid 31a is provided with cleaning liquid discharge nozzles 79a at two locations.
The cleaning processing can be performed by discharging a predetermined cleaning liquid onto the surface facing the surface a. The second vertical wall 34 has a cleaning liquid discharge nozzle 79 for cleaning the surface of the disk 70b facing the second vertical wall 34.
b are provided in two places. The cleaning liquid discharged from these cleaning liquid discharge nozzles 79a and 79b is supplied to drain pipes 65b and 65 according to the processing spaces 51 and 52 formed.
c.

A cleaning liquid supply pipe (not shown) can be easily attached to and detached from the cleaning liquid discharge nozzle 79a provided on the lid 31a. It is preferable that the pipe has a structure that can be easily attached and detached because the opening and closing work of the lid 31a can be easily performed.

The cleaning liquid discharge nozzles 79a and 79b
Is an atmosphere adjusting gas such as N
2 gas, argon (Ar) gas, carbon dioxide (CO2)
It can also be used for the purpose of supplying various gases such as gas and oxygen (O2) gas. As will be described later, the atmosphere adjusting gas thus supplied to the processing spaces 51 and 52 is supplied to the gas exhaust mechanism 80 provided in the lid 31a.
This is performed using

Subsequently, taking the outer chamber 26a as an example,
The slide mechanism will be described with reference to FIG. FIG. 6A shows the slide mechanism 90 and the outer chamber 26.
FIG. 6B is a plan view of FIG. The slide mechanism 90 has a guide 93 formed with a convex portion 93a extending in the longitudinal direction, a linear drive mechanism 94 such as an air cylinder, and a concave portion 92a formed to fit with the convex portion 93a. Guide 9 connected to mechanism 94
3 has a connecting jig 92 that moves along the longitudinal direction. The longitudinal end of the guide 93 can be fixed to, for example, a frame or the like forming the cleaning unit 3.

In order to prevent particles or the like generated from the linear drive mechanism 94 from diffusing, the linear drive mechanism 94 is used.
A cover 95a having a seal structure is attached to the cover member 95. In order to prevent diffusion of particles and the like generated from a fitting portion between the concave portion 92a and the convex portion 93a, a seal member 95a is provided.
b is attached to the guide 93.

A cylindrical body holding jig 91 is fixed to the cylindrical body 61a, and the cylindrical body holding jig 91 is fixed to a connecting jig 92 by screws 91a. Thus, by driving the linear drive mechanism 94, the outer chamber 26a
Can be slid in the longitudinal direction of the guide 93. Stoppers 96a and 96b are provided on one side of the guide 93. The stopper 96a abuts on the connecting jig 92 to position the outer chamber 26a at the processing position, and the stopper 96b abuts on the connecting jig 92. The outer chamber 26a is positioned at the retracted position in contact with the portion 92b.

Note that the cylindrical body holding jig 91 and the connecting jig 92
The outer chamber 26a can be easily removed from the connecting jig 92 by using a simple structure using the screws 91a. The connection between the cylindrical body holding jig 91 and the connection jig 92 can be performed by, for example, a pin or a fitting instead of the screw 91a. Further, the slide mechanism of the inner chamber 26b can be configured similarly to the slide mechanism 90 of the outer chamber 26a, for example, by providing a guide in a gap between the outer chamber 26a and the inner chamber 26b.

Next, the structure of the first vertical wall 31 will be described in detail with reference to FIGS. 4 and 5 and a perspective view of the first vertical wall 31 shown in FIG. I do. The first vertical wall 31 includes a lid 31a and a frame member 31b, and a gas exhaust mechanism 80 is disposed on the lid 31a.

The lid 31a is formed on the frame member 31b by using a hinge mechanism 85 disposed so as to connect the frame 75a, which is a part of the frame forming the cleaning unit 3, to the lid 31a. The window 31c can be opened and closed, and the cover 3 is provided near the window 31c.
1a can be moved in the horizontal direction by a predetermined distance, and the window portion 31c is fully opened by the rotation driving about the hinge mechanism 85 (see FIGS. 3 to 5).
When the right side is viewed from the left side of each drawing, the lid 31a is the window portion 31c.
(The state where the whole window part 31c looks open without blocking)
It is possible to retreat to a position where

The lid 31a is formed by fastening the lid 31a to the frame member 31b with bolts 78a by using a rotatable fixing jig 78 provided on a frame 75b provided to face the frame 75a. , Lid 31a
Is fixed to the frame member 31b so that the window 31c can be hermetically closed. In several places (four places in FIG. 7), the lid 31a can be more securely fixed to the frame member 31b using the bolts 77.

The gas exhaust mechanism 80 provided on the lid 31a
Are "Exhaust 1" and "Exhaust 2" shown in FIGS.
And two types of gas exhaust lines, which are selectively used depending on the atmosphere of the processing spaces 51 and 52 and the type of chemical solution used. The gas to be exhausted passes through the pipe members 83 and 84 from the processing spaces 51 and 52 and is exhausted from a predetermined gas exhaust line. The pipe holding member 81 provided with the pipe member 83 has a lid 31a. By pulling out the pin 82 fixing the pipe holding member 81 to the cover member 31a, it can be easily separated from the lid 31a, so that the pipe member 83 and the pipe member 84 can be easily attached and detached while maintaining the sealing property. It has a simple structure.

In this way, when the lid 31a must be moved to open and close the window 31c, the gas is easily exhausted so that the piping of the gas exhaust mechanism 80 does not hinder the movement of the lid 31a. The mechanism 80 can be removed and retracted, and the lid 31a can be easily moved. Conversely, the pipe holding member 81 can be easily attached to a predetermined position of the lid 31a in which the window 31c is closed and closed.

Next, other devices provided in the cleaning unit 3 will be described. A fire sensor 50 for detecting the occurrence of a fire inside the cleaning processing unit 3 is provided. When the fire sensor 50 detects a fire, a fire extinguishing agent or a fire extinguishing gas is injected from a fire extinguishing mechanism (not shown). It has become. Such fires are, for example, I
During processing using a flammable solvent such as PA, there is a possibility that the rotating wafer W may be broken or scattered around and may be damaged. As described above, since the wafer transfer port 19a can be hermetically sealed using the lid 21, the effect of the accident in the cleaning processing unit 3 is unlikely to affect other units.

Further, a filter fan unit (FFU) 20 is provided above the cleaning processing unit 3, and clean air is blown into the cleaning processing unit 3.
Further, the air is exhausted from an exhaust port 27 provided in the partition wall 25. Here, as described above, the wafer transfer port 19a is sealed by the lid 21, and the space between the rotary shaft 23a provided through the partition wall 25 and the partition wall 25 is hermetically sealed. The exhaust in the cleaning processing unit 3 can be performed only from the exhaust port 27, so that the atmosphere in the cleaning processing unit 3 can be easily adjusted.

Next, a method of accessing the processing chamber 26 and the rotor 24 provided in the cleaning processing unit 3 will be described. The carrier relay unit 4 indicated by an arrow A1 in FIG.
Is detachable, so that workers, working machines, cleaning machines and the like can easily access the inside of the carrier relay section 4. Then, a side wall panel 14b that partitions the carrier relay section 4 and the cleaning unit 3 from each other.
Is also removable, so that the side wall panel 14
By removing b, the inside of the cleaning unit 3 can be accessed from the carrier relay unit 4 side (the front side of the cleaning unit 3).

With the side wall panel 14b removed,
It is possible to move the lid 31a to open the window portion 31c, thereby accessing the disk 70a of the rotor 24 from the window portion 31c.
Attachment and removal of 4a can be easily performed. Further, since the rotor 24 is easily removed by accessing from the side of the processing chamber 26 as described later, if the outer chamber 26a is arranged at the processing position with the rotor 24 removed, the outer chamber 26a is passed through the window 31c. The inside can be easily accessed and the inside can be easily maintained. Of course, similarly, when the inner chamber 26b is arranged at the processing position,
It is possible to easily perform internal maintenance through the window 31c.

In the cleaning apparatus 1, in addition to the access from the front of the processing chamber 26 described above, an arrow A2 shown in FIG.
Since the side wall panel of the cleaning unit 3 shown in FIG. 3 is also detachable, the inside of the cleaning unit 3 can be easily accessed from the side of the cleaning unit 3 by removing the side wall panel. It has become. By removing the side wall panel, the wafer delivery mechanism 40 can be easily accessed from the side.

For example, as described above, since the rotor 24 is fixed to the rotating shaft 23a using the screw 76, the rotor 24 is attached to the rotating shaft 23a,
Removal from the cleaning process unit 3a can be easily performed by moving the outer chamber 26a and the inner chamber 26b to the retracted position and accessing the screw 76 from the side surface of the cleaning processing unit 3.

Since the wafer delivery mechanism 40 can be accessed, the wafer holding member 41 and the rotor 24
The transfer position of the wafer W between the outer chamber 26a and the outer chamber 26a can be easily adjusted from the side.
The attachment and detachment of the inner chamber 26b and the access to various piping members (not shown in FIGS. 3 to 5) disposed on the outer peripheral surfaces of the outer chamber 26a and the inner chamber 26b are also performed from this side direction. Is possible. Of course, these operations can be performed more easily by accessing the cleaning processing unit 3 from the front side.

As described above, the cleaning processing apparatus 1 has a structure in which the inside of the cleaning processing unit 3 can be easily accessed from two directions of the front and side surfaces of the cleaning processing unit 3.
It has a structure that is particularly excellent in maintainability as compared with the case where work cannot be performed with access from one side. Since a suitable access direction can be appropriately selected according to the contents of the work in the cleaning processing unit 3, the work can be efficiently performed. Further, when performing various types of maintenance in this manner, careful processing can be performed in detail. Such good maintainability can be further enhanced by using the slide-type processing chamber 26.

Since the cleaning apparatus 1 is composed of a combination of a plurality of processing units, for example,
The inside of the cleaning processing unit 3 can also be accessed by moving the power supply unit 7 and the chemical tank box 8 adjacent to the cleaning processing unit 3 and removing the side wall panel of the cleaning processing unit 3 that forms a boundary therewith. It is possible to

Although the embodiments of the present invention have been described above, it goes without saying that the present invention is not limited to the above embodiments, and various modifications are possible.
For example, in the above embodiment, the case where the processing is performed by the two processing chambers of the outer chamber 26a and the inner chamber 26b has been described, but the number of chambers may be three or more, or may be one. Also, the outer chamber 2
Either the cleaning chamber 6a or the inner chamber 26b may be used for cleaning and any of the inner chamber 26b may be used for drying, and the cleaning chamber 6a and the inner chamber 26b may be used for an application in which both cleaning and drying are continuously performed. Furthermore, in the above-described embodiment, the case where the present invention is applied to the cleaning process is described. However, the present invention is not limited to this, and other liquid processes such as a coating process of applying a predetermined coating solution, or processes other than the liquid process, for example, The present invention can be applied to a CVD process, an etching process, and the like. Furthermore, the case where the present invention is applied to a semiconductor wafer has been described. However, the present invention is not limited to this, and the present invention can be applied to processing of other substrates such as a substrate for a liquid crystal display (LCD).

[0072]

As described above, in the liquid processing apparatus of the present invention, since the worker can access the liquid processing chamber from two directions, the workability of various maintenances in the liquid processing chamber is improved and the work time is reduced. The effect of shortening can be obtained, and such improvement in workability can be further enhanced by using a slide-type processing chamber. Further, even when parts need to be replaced in a narrow space in the liquid processing chamber, the work can be easily performed by accessing from two directions.
This has the effect of preventing the occurrence of injuries to workers and damage to the machine caused by difficulty in work. Furthermore, in the treatment after the leakage or damage accident of the treatment liquid in the liquid treatment chamber, and in the periodic maintenance, it is possible to carefully perform the treatment of the back and details, so that the environment inside the liquid treatment chamber Can be satisfactorily held, and thereby, the quality of the object to be processed can be kept high, for example, the amount of particles attached to the object to be processed is reduced. Note that the liquid processing apparatus of the present invention can access the liquid processing chamber from two directions, but does not increase the footprint of the liquid processing apparatus.

[Brief description of the drawings]

FIG. 1 is a perspective view showing an appearance of a cleaning apparatus which is an embodiment of a liquid processing apparatus of the present invention.

FIG. 2 is a plan view of the cleaning apparatus shown in FIG. 1;

FIG. 3 is a cross-sectional view illustrating a configuration of a carrier relay section, a wafer transfer section, and a cleaning processing unit in the cleaning processing apparatus illustrated in FIG. 1;

FIG. 4 is a sectional view of a processing chamber provided in the cleaning processing unit shown in FIG. 3;

FIG. 5 is another sectional view of a processing chamber provided in the cleaning processing unit shown in FIG. 3;

FIGS. 6A and 6B are a front view and a cross-sectional view showing a slide mechanism of an outer chamber constituting the processing chamber.

FIG. 7 is a perspective view showing a lid constituting the processing chamber.

[Explanation of symbols]

 DESCRIPTION OF SYMBOLS 1; Cleaning processing apparatus 2; In-out port 3; Cleaning processing unit 4: Carrier relay part 9; Wafer transfer part 14; Partition wall 14b; Side wall panel 24; Rotor 26a; · 56; treatment liquid discharge nozzle 90; slide mechanism W; semiconductor wafer (substrate) C; carrier (storage container)

Claims (19)

[Claims] 1. A liquid processing apparatus for supplying a predetermined processing liquid to a processing object while rotating a processing object provided in the processing chamber and rotatably held in the processing chamber. And a processing mechanism, wherein the liquid processing mechanism is accessible from at least a side. 2. A liquid processing apparatus for supplying a predetermined processing liquid to a processing object while rotating a processing object provided in the processing chamber and rotatably held in the processing chamber. And a processing mechanism, wherein the liquid processing mechanism is accessible from two directions, a side surface and a front surface. 3. A liquid processing mechanism comprising: a lid which can open and close the front surface of the processing chamber; and evacuation of the lid to open the front surface of the processing chamber, whereby the liquid processing mechanism can be accessed from the front surface. The liquid processing apparatus according to claim 2, wherein: 4. A liquid processing apparatus for performing a liquid processing by supplying a predetermined processing liquid to an object to be processed while rotating the object to be processed rotatably, comprising: a cylindrical processing chamber; A liquid processing unit provided in the chamber, the liquid processing unit having a liquid processing mechanism for supplying a predetermined processing liquid to the object to be processed while rotating the object rotatably held and performing liquid processing; A container loading / unloading unit for loading / unloading a container capable of storing a body, a transport mechanism for transporting a target object between the container loading / unloading unit and the liquid processing unit, the container loading / unloading unit, and the liquid processing And a wall part for partitioning the processing part, wherein the liquid processing mechanism is accessible at least from a side of the processing chamber. 5. A liquid processing apparatus for performing a liquid processing by supplying a predetermined processing liquid to an object to be processed while rotating the object to be processed rotatably, comprising: a cylindrical processing chamber; A liquid processing unit provided in the chamber, the liquid processing unit having a liquid processing mechanism for supplying a predetermined processing liquid to the object to be processed while rotating the object rotatably held and performing liquid processing; A container loading / unloading unit for loading / unloading a container capable of storing a body, a transport mechanism for transporting a target object between the container loading / unloading unit and the liquid processing unit, the container loading / unloading unit, and the liquid processing A detachable side wall panel for partitioning between the container and the container, wherein the liquid processing mechanism can be accessed from the side of the processing chamber and the direction of the container loading / unloading section by removing the detachable side wall panel. A liquid treatment device characterized by the following: Place. 6. A processing apparatus comprising: a lid capable of opening and closing a front surface of the processing chamber; removing the detachable side wall panel; and retracting the lid to open the front surface of the processing chamber. The liquid processing apparatus according to claim 5, wherein an access to the inside of the processing chamber and the liquid processing unit is enabled from a container loading / unloading unit. 7. The processing chamber is slidable between a processing position and a retracted position, and the liquid processing mechanism can be accessed from a side by positioning the processing chamber in the retracted position. The liquid processing apparatus according to claim 1. 8. The liquid processing apparatus according to claim 7, wherein the processing chamber has a double structure including an outer chamber and an inner chamber. 9. The processing chamber and the liquid processing mechanism are disposed in a casing, and constitute the casing. At least one side wall panel facing a side surface of the processing chamber is detachable or openable and closable. 9. The liquid processing mechanism according to claim 1, wherein an opening is formed, and the liquid processing mechanism is accessible from a side by removing the side wall panel or opening the opening. The liquid processing apparatus according to claim 1. 10. A liquid processing apparatus for performing a liquid processing by supplying a predetermined processing liquid to an object to be processed while rotating an object to be processed rotatably, wherein a liquid between the processing position and the retreat position is provided. A cylindrical processing chamber slidable in a horizontal direction; and a liquid processing unit for supplying a predetermined processing liquid to the object while rotating the object rotatably held in the processing chamber. A liquid processing unit having a liquid processing mechanism; and a processing object delivery mechanism that is provided below the liquid processing unit and that transfers the processing object to and from the liquid processing mechanism by driving in a vertical direction. A liquid processing apparatus, wherein the liquid processing mechanism is accessible from at least a side of the processing chamber. 11. A liquid processing apparatus for performing a liquid processing by supplying a predetermined processing liquid to an object to be processed while rotating an object to be processed rotatably disposed between the processing position and the retreat position. A cylindrical processing chamber slidable in a horizontal direction; and a liquid processing unit for supplying a predetermined processing liquid to the object while rotating the object rotatably held in the processing chamber. A liquid processing unit having a liquid processing mechanism; a lid body capable of opening and closing the front surface of the processing chamber; and a processing unit disposed below the liquid processing unit and driven between the liquid processing mechanism and driven vertically. An object delivery unit provided with an object delivery mechanism for delivering the body, wherein the liquid processing mechanism is opened by retracting the side direction of the processing chamber and the lid. From the front of the processing chamber Liquid processing apparatus, characterized in that possible is. 12. A liquid processing apparatus for performing a liquid processing by supplying a predetermined processing liquid to an object to be processed while rotating an object to be processed rotatably disposed between the processing position and the retreat position. A cylindrical processing chamber slidable in a horizontal direction; and a liquid processing unit for supplying a predetermined processing liquid to the object while rotating the object rotatably held in the processing chamber. A liquid processing unit having a liquid processing mechanism; and a processing object delivery mechanism that is provided below the liquid processing unit and that transfers the processing object to and from the liquid processing mechanism by driving in a vertical direction. And a container loading / unloading unit for loading / unloading a container capable of storing the processing target object, and a container loading / unloading unit located between the processing object delivery unit and the container loading / unloading unit. The container can be placed and delivered to and from the object delivery section. A container relay unit provided with a first container transport mechanism for performing the transfer, and a second container transport mechanism for transporting the container between the container relay unit and the container carry-in / out unit. The liquid processing apparatus is accessible from at least the side of the processing chamber. 13. The liquid processing apparatus according to claim 10, wherein the processing chamber has a double structure including an outer chamber and an inner chamber. 14. A processing apparatus comprising: a casing having a detachable side wall panel facing a side surface of the processing chamber; and a casing in which the liquid processing unit is disposed; 11. The device according to claim 10, wherein the device is accessible.
The liquid processing apparatus according to any one of claims 1 to 13. 15. The liquid processing section is disposed in a casing, and constitutes the casing, and at least one side wall panel facing a side surface of the processing chamber is detachable, or the side wall panel is opened and closed. The liquid processing mechanism is provided with a side opening by removing the side wall panel or by opening the opening. The liquid treatment apparatus according to any one of the above. 16. A liquid processing apparatus for performing a liquid processing by supplying a predetermined processing liquid to a processing object while rotating the processing object rotatably held, and holding means for holding the processing object. A processing chamber that houses the holding means, has a double structure including a cylindrical outer chamber and an inner chamber, and is slidable in a horizontal direction between a processing position and a retracted position; A liquid processing unit that is provided in each of the inner chambers and has a processing liquid supply mechanism that supplies a predetermined processing liquid to the object to be processed held by the holding unit; and a casing that houses the liquid processing unit; An object delivery unit provided below the liquid processing unit and provided with an object delivery mechanism for delivering the object to and from the liquid processing unit by driving in a vertical direction; Loading and unloading of containers that can store processing objects A container loading / unloading unit that performs the following; a first unit that is located between the object delivery unit and the container loading / unloading unit and that delivers a container to and from the object delivery unit;
A container relay unit provided with a container transport mechanism; and a second container transport mechanism for transporting the container between the container relay unit and the container loading / unloading unit. A detachable first side wall panel opposing a side surface of the container, and a detachable second side wall panel separating the liquid processing section and the container carrying-in / out section; A liquid processing apparatus which is accessible from a side wall panel direction and the second side wall panel direction. 17. When the second side wall panel is removed, a lid for opening and closing the front surface of the processing chamber is rotated from a direction perpendicular to a wall surface of the second side wall panel by a hinge mechanism. 17. The liquid processing apparatus according to claim 16, wherein the liquid processing apparatus can be retracted such that the front surface of the processing chamber is fully opened when viewed from the direction of the arrow. 18. A rotary drive mechanism for rotating the holding means is provided outside the casing, and a rotary shaft connecting the holding means and the rotary drive mechanism is provided through one side of the casing. The liquid processing apparatus according to claim 16 or 17, wherein: 19. The processing mechanism according to claim 20, wherein a slide mechanism for sliding the processing chamber and the processing chamber are connected by screwing, pinning, or fitting, so that the processing chamber can be easily attached and detached. The liquid processing apparatus according to any one of claims 7 to 18.